WO2020065278A1

WO2020065278A1 - Lavatory with gas injection device

Info

Publication number: WO2020065278A1
Application number: PCT/GB2019/052660
Authority: WO
Inventors: Trystan HOLTBROOK
Original assignee: Bubblebog Limited
Priority date: 2018-09-24
Filing date: 2019-09-23
Publication date: 2020-04-02
Also published as: GB2592523B; GB202105458D0; WO2020065278A9; GB2592523A; GB201815488D0

Abstract

A lavatory comprising at least one flush water inlet, a flush water outlet; and a bowl located between the flush water inlet and the flush water outlet. The bowl includes at least one gas injection device, the at least one air injection device being arranged to inject gas into flush water located in the bowl during use of the lavatory.

Description

LAVATORY WITH GAS INJECTION DEVICE

Field of the invention The present invention relates to a lavatory, an apparatus for injecting gas into the bowl of a lavatory, and methods of using the same.

Background to the invention Lavatories are typically known to include a bowl that holds flush water and equipment for flushing the bowl and deposited contents to a waste pipe after use by a user. Such lavatories are effective at flushing the contents of the bowl to the waste pipe and replacing the flush water in the bowl for the next user.

However, existing lavatories are limited in that they are not equipped to effectively deal with odours and unhygienic messes that are created during use. The inventor has appreciated the shortcomings in these known lavatories.

According to a first aspect of the present invention there is provided a lavatory comprising:

at least one flush water inlet;

a flush water outlet; and

a bowl located between the flush water inlet and the flush water outlet,

wherein the bowl includes at least one gas injection device, the at least one air injection device being arranged to inject gas into flush water located in the bowl during use of the lavatory. The at least one flush water inlet may be a conduit, channel, or the like.

The at least one flush water inlet may be located towards an upper portion of the lavatory. The at least one flush water inlet may be located towards the seat portion of the lavatory. The at least one flush water inlet may be located underneath a rim portion of an upper portion of the lavatory.

The at least one flush water inlet may be connectable to a source of flush water. The source of flush water may be a cistern, the cistern being capable of delivering a pre-determ ined amount of flush water to the bowl. The at least one flush water inlet may be configured to allow flush water to flow from the cistern to the bowl. The lavatory may comprise a plurality of flush water inlets.

The flush water inlets may be arranged around the upper portion of the lavatory. The flush water inlets may be arranged around the rim portion of the lavatory. The flush water inlets may be spaced apart around the upper portion of the lavatory. The flush water inlets may be spaced apart around the rim portion of the lavatory. The flush water inlets may be substantially evenly spaced apart around the upper portion/rim portion of the lavatory.

The flush water outlet may be arranged to allow flush water to exit the bowl after use of the lavatory. The flush water outlet may be connectable to a waste pipe, a sewer pipe, or the like.

The flush water outlet may be a conduit, channel, or the like. The at least one flush water inlet, bowl and flush water outlet are fluidly connected, such that flush water may flow from the at least one flush water to the bowl, and then from the bowl to the flush water outlet. The at least one gas injection device may be operable to inject

compressed gas into the flush water located in the bowl. The compressed gas may be, or include, air. The compressed gas may include a significant portion of air. The at least one gas injection device may be connectable to a source of gas. The at least one gas injection device may be connectable to a source of compressed, or pressurised, gas. The source of compressed, or pressurised, gas may be a compressor, or the like. The source of compressed or, pressurised gas, may be operable to increase the pressure of a gas by reducing its volume. The source of compressed, or pressurised, gas may be operable to compress atmospheric air.

The at least one gas injection device may include one or more nozzles, each nozzle being configured to inject gas from the bowl into the flush water during use.

The lavatory may comprise a plurality of gas injection devices. Each gas injection device may be configured to inject gas from the bowl into the flush water during use.

The, or each, gas injection device may be located on an outer wall portion of the bowl. The, or each, gas injection device may be arranged to cooperate with a bore hole located in the outer wall portion of the bowl.

The bore hole may be configured to allow gas from the gas injection device to flow through the bowl and into the flush water located therein during use. The bowl may comprise a plurality of bore holes, each bore hole being associated with a gas injection device.

The gas injection devices may have a concentrated arrangement towards a front portion of the bowl. In this arrangement, the gas injection devices are arranged to direct gas towards the centre and rear portion of the bowl.

The bowl may have an inner surface which is at least partially substantially spherical in shape. The gas injection devices may be at least generally concentrated around a portion of the inner surface of the bowl that represents substantially a quarter to half portion of a full spherical surface. In this arrangement, the gas injection devices are arranged to direct gas towards the centre and rear portion of the bowl. The lavatory may comprise at least one gas injection device located towards a lower portion of the bowl. The at least one gas injection device may be located substantially below the flush water outlet. The at least one gas injection device may be arranged to direct gas towards a front portion of the bowl. The at least one gas injection device may include, or be operable with, a gas diffusion element.

The, or each, gas injection device may be operable to deliver a jet of pressurised gas into the bowl that impacts the opposite side of the bowl from which the gas is injected. That is, the, or each, gas injection device may be operable to deliver a jet of pressurised gas from one side of the bowl to the other with sufficient force that it impacts and exerts a force on the opposing surface wall of the bowl.

The, or each, gas injection device may be operable to deliver pressurised gas to one or more areas of the inner surface of the bowl. The, or each, gas injection device may include, or be operable with, a gas diffusion element. The gas diffusion element may be, or include, a microporous material.

The microporous material may be made from a resilient material. The microporous material may be configured to allow gas to flow from the, or each, gas injection device into the bowl, and prevent gas and/or fluid flowing out of the bowl.

The, or each, gas injection device may be operable to generate bubbles with a diameter between 0.001 mm and 1 pm. The, or each, gas injection device may be operable to generate bubbles with a diameter between 0.001 mm and 5mm. The, or each, gas injection device may be operable to generate bubbles with a diameter between 0.001 mm and 4mm

The, or each, gas diffusion element may be operable to generate bubbles with a diameter between 0.001 mm and 1 pm. The, or each, gas diffusion element, may be operable to generate bubbles with a diameter between 0.001 mm and 5mm. The, or each, gas diffusion element may be operable to generate bubbles with a diameter between 0.001 mm and 4mm

The, or each, gas injection device may be operable to generate a flush water and gas mixture. The flush water and gas mixture may be a froth. That is, the flush water and gas mixture may be a mass of bubbles in the water caused by the injection of the gas therein. The froth may be a homogenous froth. The flush water and gas mixture may have a lower average specific gravity than the flush water. The froth may have a lower average specific gravity than the flush water. The flush water and gas mixture may have substantially zero surface tension. The froth may have substantially zero surface tension.

The, or each, gas diffusion element may be operable to generate a flush water and gas mixture. The flush water and gas mixture may be a froth. That is, the flush water and gas mixture may be a mass of bubbles in the water caused by the injection of the gas through the gas diffusion element. The froth may be a homogenous froth. The flush water and gas mixture may have a lower average specific gravity than the flush water. The froth may have a lower average specific gravity than the flush water. The flush water and gas mixture may have substantially zero surface tension. The froth may have substantially zero surface tension.

The, or each, gas injection device may be arranged to direct the gas downwards towards a lower portion of the bowl.

At least one of the gas injections devices may be arranged to direct the gas downwards towards a lower portion of the bowl. The, or each, gas injection device may be operable to inject gas into the bowl at a pressure of between 0.2 bar to 10 bar. The, or each, gas injection device may be operable to inject gas into the bowl at a pressure of between 0.2 bar to 20 bar. The, or each, gas injection device may be positioned below a maximum flush water level in the bowl. That is, the, or each, gas injection device may be arranged to deliver gas directly into the flush water.

The lavatory may comprise between 1 and 20 gas injection devices. The lavatory may further comprise a gas extraction device. The gas extraction device may be operable to remove gas from the bowl. The gas extraction device may be operable to remove gas from the bowl after use of the lavatory. The removed gas may be considered as contaminated gas. That is, this gas may contain odours that are created after use of the lavatory.

The gas extraction device may include at least one gas outlet. The at least one gas outlet may be a conduit, channel, or the like.

The at least one gas outlet may be located at any suitable point above the maximum flush water line of the bowl. The at least one gas outlet may be located in a wall portion of the lavatory. The at least one gas outlet may be located towards an upper portion of the lavatory. The at least one gas outlet may be located towards the seat portion of the lavatory. The at least one gas outlet may be located underneath a rim portion of an upper portion of the lavatory.

The gas extraction device may include a compressor, vacuum pump, or the like.

The gas extraction device may be operable to remove contaminated gas from the bowl and release the same to atmosphere. The at least one gas outlet may be provided by the at least one flush water inlet. That is, the lavatory may not include separate gas outlets and the flush water inlets may be used as gas outlets.

The at least one gas outlet may include a first end and the second end. The first end may be positioned to remove contaminated gas from the bowl and the second end may be connected to the flush water outlet. In this arrangement, the at least one gas outlet may be configured to provide a fluid flow path between the bowl and the flush water outlet. The gas extraction device may be operable to remove contaminated gas from the bowl and pass it to the flush water outlet.

The second end of the at least one gas outlet may include a one-way valve. The one-way valve may be configured to allow contaminated gas to enter the flush water outlet, but prevent gas, or fluid, entering the at least one gas outlet.

The lavatory may further comprise a compressor. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device. The compressor may be the suction device that removes contaminated gas from the bowl. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device, and the suction device for removal of the contaminated gas from the bowl. The lavatory may comprise a first compressor which is the source of compressed, or pressurised, gas for the at least one gas injection device, and a second compressor which removes the contaminated gas from the bowl.

The compressor may be operable to ensure that a controlled amount of gas is injected into the bowl.

The compressor may be configured to remove contaminated gas from the bowl and compress the same gas to inject back into the bowl. The compressor may be configured to remove at least a portion of the contaminated gas from the bowl and compress at least a portion of the same gas to inject back into the bowl. The compressor, the at least one gas injection device and the at least one gas outlet may be connected together to form a feedback loop for removing contaminated gas from the bowl, compressing the same, and injecting back into the bowl. The compressor, the at least one gas injection device and the at least one gas outlet may be connected together to form a feedback loop for removing at least a portion of contaminated gas from the bowl, compressing the same, and injecting back into the bowl.

The compressor may be connectable to the at least one gas injection device to provide compressed, or pressurised, gas thereto, and

connectable to the at least one gas outlet to remove contaminated gas therefrom.

The lavatory may further include a contaminated gas diverter. The contaminated gas diverter may be part of the compressor. The

contaminated gas diverter may be operable to direct a first portion of the contaminated gas to the flush water outlet, and a second portion of the contaminated gas to the compressor. In this arrangement, the diverter may be operable to divert between 0% and 100% of the contaminated gas between either the flush water outlet and the compressor. The diverter may be operable to direct between 10% and 30% of the contaminated gas to the compressor, with the remaining contaminated gas being directed to the flush water outlet.

The contaminated gas diverter may be selectively operable to divert a desired amount of contaminated gas to the flush water outlet and compressor. The contaminated gas diverter and the compressor may be operable to ensure that a controlled amount of gas is injected into the bowl. The volume of gas being selected to ensure that the substantially all of the contaminated gas can be removed from the bowl. This may be done by controlling the amount of diversion provided by the diverter and the operational characteristics of the compressor.

The compressor may be an 18 volt DC motor of approximately 200W, a 240 volt AC supply, or the like. The compressor may be powered by a mains supply, or be battery-operated. The compressor may be powered by a detachable rechargeable battery, or power pack, or the like.

The compressor may be a high pressure, low flow, pump. The lavatory may comprise separate compressors for the gas injection and gas extraction.

The lavatory may further comprise a control unit, the control unit being operable to control the operation of the compressor(s). The control unit may be operable to control one or more of: the length of operation of the compressor, the flow rate of gas therethrough and the contaminated gas diverter.

The control unit may be operable to include start/stop functionality for the compressor based on proximity sensing of a user and/or manual switch operation by the user.

The control unit may be operable to include a pressure boost functionality to increase the gas pressure through the gas injection device. The gas extraction device may be located in a housing. The housing may be attached to the lavatory. The housing may be integrally formed within a portion of the lavatory. The housing may be attachable to the lavatory. The control unit may be part of the gas extraction device.

According to a second aspect of the present invention there is provided an apparatus for injecting gas into the bowl of a lavatory, the apparatus comprising:

at least one gas injection device, the at least one gas injection device being configured to inject gas into flush water located in the bowl during use of the lavatory.

The apparatus may be attachable to a lavatory. The apparatus may be configured to be fitted to a lavatory. The apparatus may be retro-fitted to a lavatory.

The lavatory may comprise:

at least one flush water inlet;

a flush water outlet; and

a bowl located between the flush water inlet and the flush water outlet.

The apparatus may comprise a plurality of gas injection devices. Each gas injection device may be configured to inject gas from the bowl into the flush water during use.

The apparatus may further comprise a gas extraction device. The gas extraction device may be operable to remove gas from the bowl. The gas extraction device may be operable to remove gas from the bowl after use of the lavatory. The removed gas may be considered as contaminated gas. That is, this gas may contain odours that are created after use of the lavatory. The apparatus may further comprise a compressor. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device. The compressor may be the suction device that removes contaminated gas from the bowl. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device, and the suction device for removal of the contaminated gas from the bowl. The apparatus may comprise a first compressor which is the source of compressed, or pressurised, gas for the at least one gas injection device, and a second compressor which removes the contaminated gas from the bowl.

The apparatus may further include a contaminated gas diverter. The contaminated gas diverter may be part of the compressor. The

The apparatus may comprise separate compressors for the gas injection and gas extraction. The apparatus may further comprise a control unit, the control unit being operable to control the operation of the compressor(s). The control unit may be operable to control one or more of: the length of operation of the compressor, the flow rate of gas therethrough and the contaminated gas diverter.

Embodiments of the second aspect of the present invention may include one or more features of the first aspect of the present invention or its embodiments.

According to a third aspect of the present invention there is provided a method of injecting gas into the bowl of a lavatory, the method comprising the steps of:

providing a lavatory comprising:

at least one flush water inlet;

a flush water outlet; and

a bowl located between the flush water inlet and the flush water outlet,

wherein the bowl includes at least one gas injection device, the at least one air injection device being arranged to inject gas into flush water located in the bowl during use of the lavatory;

operating the at least one gas injection device to inject gas into the bowl to generate a flush water and gas mixture in the bowl. The at least one gas injection device may be operable to generate bubbles with a diameter between 0.001 mm and 1 pm. The, or each, gas injection device may be operable to generate bubbles with a diameter between 0.001 mm and 5mm. The, or each, gas injection device may be operable to generate bubbles with a diameter between 0.001 mm and 4mm The flush water and gas mixture may be a froth. That is, the flush water and gas mixture may be a mass of bubbles in the water caused by the injection of the gas therein. The froth may be a homogenous froth. The flush water and gas mixture may have a lower average specific gravity than the flush water. The froth may have a lower average specific gravity than the flush water. The flush water and gas mixture may have substantially zero surface tension. The froth may have substantially zero surface tension. The, or each, gas injection device may be operable to inject gas into the bowl at a pressure of between 0.2 bar to 10 bar. The, or each, gas injection device may be operable to inject gas into the bowl at a pressure of between 0.2 bar to 20 bar. The lavatory may further comprise a gas extraction device. The gas extraction device may be operable to remove gas from the bowl. The gas extraction device may be operable to remove gas from the bowl after use of the lavatory. The removed gas may be considered as contaminated gas. That is, this gas may contain odours that are created after use of the lavatory.

The at least one gas outlet may be located at any suitable point above the maximum flush water line of the bowl. The at least one gas outlet may be located in a wall portion of the lavatory. The at least one gas outlet may be located towards an upper portion of the lavatory. The at least one gas outlet may be located towards the seat portion of the lavatory. The at least one gas outlet may be located underneath a rim portion of an upper portion of the lavatory. The gas extraction device may include a compressor, vacuum pump, or the like.

The lavatory may further comprise a compressor. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device. The compressor may be the suction device that removes contaminated gas from the bowl. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device, and the suction device for removal of the contaminated gas from the bowl. The lavatory may comprise a first compressor which is the source of compressed, or pressurised, gas for the at least one gas injection device, and a second compressor which removes the contaminated gas from the bowl. The compressor may be configured to remove contaminated gas from the bowl and compress the same gas to inject back into the bowl. The compressor may be configured to remove at least a portion of the contaminated gas from the bowl and compress at least a portion of the same gas to inject back into the bowl.

The compressor, the at least one gas injection device and the at least one gas outlet may be connected together to form a feedback loop for removing contaminated gas from the bowl, compressing the same, and injecting back into the bowl. The compressor, the at least one gas injection device and the at least one gas outlet may be connected together to form a feedback loop for removing at least a portion of contaminated gas from the bowl, compressing the same, and injecting back into the bowl. The method may comprise the step of operating the compressor to inject gas into the bowl and extract contaminated gas from the bowl. The operation of the compressor may result in simultaneous injection and extraction of gas. The operation of the compressor may be such that the injection of the gas into the bowl and the extraction of the gas from the bowl occur separately. The injection of the gas into the bowl may be a first step, before use of the lavatory by a user, and the extraction of the contaminated gas from the bowl may be a second step, after use of the lavatory by a user.

The method may comprise the step of operating the contaminated gas diverter to control the amount of contaminated gas this is passed to the flush water outlet and the compressor.

The lavatory may further comprise a control unit, the control unit being operable to control the operation of the compressor(s). The control unit may be operable to control one or more of: the length of operation of the compressor, the flow rate of gas therethrough and the contaminated gas diverter. The method may comprise the step of operating the control unit to control the operation of the compressor. Embodiments of the third aspect of the present invention may include one or more features of the first or second aspects of the present invention or their embodiments. Similarly, embodiments of the first or second aspects of the present invention may include one or more features of the third aspect of the present invention or its embodiments.

According to a fourth aspect of the present invention there is provided a method of injecting gas into the bowl of a lavatory, the method comprising the steps of:

providing an apparatus for injecting gas into the bowl of a lavatory comprising:

at least one gas injection device, the at least one gas injection device being configured to inject gas into flush water located in the bowl during use of the lavatory;

locating the at least one gas injection device at the bowl; and operating the at least one gas injection device to inject gas into the bowl to generate a flush water and gas mixture in the bowl.

The method may comprise the step of generating at least one bore hole in the bowl, such that the at least one gas injecting device may be located on the outside of the bowl and inject gas through the bore hole into the bowl.

The apparatus may comprise a plurality of gas injection devices. Each gas injection device may be configured to inject gas from the bowl into the flush water during use. The method may include the step of locating the, or each, gas injection device on an outer wall portion of the bowl. The, or each, gas injection device may be arranged to cooperate with a bore hole located in the outer wall portion of the bowl. The bore hole may be configured to allow gas from the gas injection device to flow through the bowl and into the flush water located therein during use. The bowl may comprise a plurality of bore holes, each bore hole being associated with a gas injection device.

The apparatus may comprise between 1 and 20 gas injection devices

The apparatus may further comprise a gas extraction device. The gas extraction device may be operable to remove gas from the bowl. The gas extraction device may be operable to remove gas from the bowl after use of the lavatory. The removed gas may be considered as contaminated gas. That is, this gas may contain odours that are created after use of the lavatory.

The apparatus may further comprise a compressor. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device. The compressor may be the suction device that removes contaminated gas from the bowl. The compressor may be the source of compressed, or pressurised, gas for the at least one gas injection device, and the suction device for removal of the contaminated gas from the bowl. The apparatus may comprise a first compressor which is the source of compressed, or pressurised, gas for the at least one gas injection device, and a second compressor which removes the contaminated gas from the bowl.

The method may comprise the step of operating the compressor to inject gas into the bowl and extract contaminated gas from the bowl. The operation of the compressor may result in simultaneous injection and extraction of gas. The operation of the compressor may be such that the injection of the gas into the bowl and the extraction of the gas from the bowl occur separately. The injection of the gas into the bowl may be a first step, before use of the lavatory by a user, and the extraction of the contaminated gas from the bowl may be a second step, after use of the lavatory by a user.

contaminated gas diverter may be operable to direct a first portion of the contaminated gas to the flush water outlet, and a second portion of the contaminated gas to the compressor. In this arrangement, the diverter may be operable to divert between 0% and 100% of the contaminated gas between either the flush water outlet and the compressor. The diverter may be operable to direct between 10% and 30% of the contaminated gas to the compressor, with the remaining contaminated gas being directed to the flush water outlet. The method may comprise the step of operating the contaminated gas diverter to control the amount of contaminated gas this is passed to the flush water outlet and the compressor.

The apparatus may comprise separate compressors for the gas injection and gas extraction.

The apparatus may further comprise a control unit, the control unit being operable to control the operation of the compressor(s). The control unit may be operable to control one or more of: the length of operation of the compressor, the flow rate of gas therethrough and the contaminated gas diverter.

The control unit may be operable to include a pressure boost functionality to increase the gas pressure through the gas injection device.

The method may comprise the step of operating the control unit to control the operation of the compressor.

Embodiments of the fourth aspect of the present invention may include one or more features of the first, second or third aspects of the present invention or their embodiments. Similarly, embodiments of the first, second or third aspects of the present invention may include one or more features of the fourth aspect of the present invention or its embodiments. Brief description of the drawings

An embodiment of the invention will now be described, by way of example only, with reference to the drawings, in which: Fig. 1 is a schematic, cross-sectional, side view of a lavatory according to the present invention;

Fig. 2 is a perspective view of the lavatory of Fig. 1 ;

Figs. 3 and 4 are right and left side views of the lavatory of Fig. 2;

Figs. 5 and 6 are front and back views of the lavatory of Fig. 2;

Figs. 7 and 8 are top and bottom views of the lavatory of Fig. 2; Fig. 9 is a cross-sectional, left side view of the lavatory of Fig. 2

Fig. 10 is a perspective view of the lavatory of Fig. 9;

Fig. 1 1 is a top perspective view of the gas diffusion element of the lavatory of Fig. 1 ; and

Fig. 12 is a left side, perspective view of the lavatory of Fig. 2.

Description of preferred embodiments

With reference to Fig. 1 , a lavatory 10 is illustrated comprising a flush water inlets 12, a flush water outlet 14 and a bowl 16 located between the flush water inlet 12 and the flush water outlet 14. As described further below, the bowl 16 includes a gas injection device 18, which is operable to inject gas into flush water 20 located in the bowl 16 during use of the lavatory 10. It should be appreciated that the gas may be, or include air. The gas may include a significant portion of air. The air may be

atmospheric air.

As best illustrated in Figs. 1 and 9, the flush water inlets 12 are conduits, or channels. The flush water inlets 12 are configured to deliver flush water 20 from a cistern (no illustrated) to the bowl 16. The cistern is capable of delivering a pre-determ ined amount of flush water 20 to the bowl 16.

In the embodiment illustrated and described here, the flush water inlets 12 are located in the rim portion 10a of the lavatory. Furthermore, the flush water inlets 12 are spaced apart around the rim portion 10a.

The flush water outlet 14 is a conduit, or channel, that may be termed a “waste pipe”, and is typically connectable to a sewer, or the like. As will be described further below, the flush water outlet 14 is arranged to allow flush water 20 to exit the bowl 26 after use of the lavatory 10. As illustrated in Fig. 1 , the gas injection device 18 is configured to inject compressed gas into the flush water 20 in the bowl 16. In the embodiment illustrated and described here, the gas injection device 18 includes a plurality of nozzle members (nozzles) 18a. The plurality of nozzles 18a may be considered an array of nozzles. Each nozzle 18a is configured to inject gas into the flush water 20 in the bowl 16 during use. The lavatory 10 may include around 12 nozzles 18a. However, the number may be more or less than this, as required.

In the embodiment illustrated and described here, each nozzle 18a is located on an outer wall portion 16a of the bowl 16 and is arranged to cooperate with a bore hole 16b located in the outer wall portion 16a of the bowl 16. The bore holes 16b are configured to allow gas from the nozzles 18a to flow through the bowl 16 and into the flush water 10 located therein during use. As illustrated in Figs. 7, 9 and 10, the bowl 16 includes a plurality of bore holes 16b, each bore hole 16b being associated with a nozzle 18a.

As best illustrated in Figs. 3 and 4, the nozzles 18a may be concentrated towards a front portion 16c of the bowl 16. In this arrangement, the nozzles 18a are arranged to direct gas towards the centre and rear portion of the bowl 16. In the embodiment illustrated and described here, the bowl 16 may be generally spherical-shaped and the nozzles 18a may be concentrated around a portion of the inner surface of the bowl 16 that represents a quarter to half portion of its full spherical surface. In addition, the bowl 16 may include a nozzle 18a that is located substantially below the flush water outlet 14. In this arrangement, the nozzle 18a is arranged to direct gas towards the inner surface of the front portion 16c of the bowl 16. Each nozzle 18a is positioned below a maximum flush water level 20a in the bowl 16. In this arrangement, each nozzle 18a is submerged in the flush water 20 so that it can deliver gas directly into the flush water 20. It should be appreciated that the number and arrangement of the nozzles 18a in the bowl 16 may be varied as required. It should also be appreciated that the pressure and flow rate of the injected gas may be varied as required. As described further below, each nozzle 18 is operable to deliver a jet of pressurised gas into the flush water 20 in the bowl 16. The jets of pressurised gas may impact the opposite side of the bowl 16 from which the gas is injected. The jets of pressurised gas are delivered with sufficient force to impact and exert a force on the opposing surface wall of the bowl 16.

The nozzles 18a may be operable to inject gas into the bowl 16 at a pressure of between 0.2 bar and 10 bar. However, it should be appreciated that higher pressures may be used, if required.

It should be appreciated that the pressure and flow rate of the injected gas may be varied as required.

As best illustrated in Figs. 9 to 12, the lavatory 10 may include a gas diffusion element 22. In the embodiment illustrated and described here, the gas diffusion element 22 is associated with the nozzle 18a that is located beneath the flush water outlet 14. However, it should be appreciated that any or more of the nozzles 18a may include a gas diffusion element 22. The gas diffusion element 22 is operable to generate microbubbles (i.e. , bubbles with a diameter of between 0.001 mm and 1 pm) in the flush water 20 as the pressurised gas passes therethrough. The gas diffusion element may be, or include, a microporous resilient material. The microporous material may be configured to allow

pressurised gas to flow from the nozzle 18a into the bowl 16, and prevent gas and/or fluid flowing out of the bowl 16. As described further below, the nozzles 18a (and gas diffusion element 22, if present) are operable to generate a flush water and gas mixture 24 in the bowl 16. With the generation of microbubbles in the flush water 20, the flush water and gas mixture 24 may be a homogeneous froth. The flush water and gas mixture 24 may have a lower average specific gravity than the flush water 20. The flush water and gas mixture 24 may also have substantially zero surface tension. (Note that it should be appreciated that the inclusion of the gas diffusion element 22 may not be necessary to generate the homogeneous microbubble froth.) As best illustrated in Fig. 1 , the lavatory 10 may further include a gas extraction device 26. As described further below, the gas extraction device 26 is operable to remove gas from the bowl 16 after use. The gas in the bowl 16 after use may be termed contaminated gas, as it typically contains odours that are created after use of the lavatory 10.

The gas extraction device 26 includes a contaminated gas outlet 26a (an example of at least one gas outlet). The contaminated gas outlet 26a may be a conduit(s), channel(s), or the like, and is located above the maximum flush water level 20a. All best illustrated in Fig. 1 , in the embodiment illustrated and described here, the contaminated gas outlet 26a is provided by the flush water inlets 12. That is, the lavatory 10 does not include separate gas outlets, and the flush water inlets 12 are used as gas outlets. In this arrangement the contaminated gas outlets 26a have a first end 26b positioned to remove contaminated gas from the bowl 16, and a second end 26c connected to the flush water outlet 14. In this arrangement, the contaminated gas outlets 26a are configured to provide a fluid flow path 26d between the bowl 16 and the flush water outlet 14. The contaminated gas outlets 26a are therefore operable to remove contaminated gas from the bowl 16 and pass it to the flush water outlet 14. The second end 26c of the

contaminated gas outlet 26a includes a one-way valve 28 to allow contaminated gas to enter the flush water outlet 14, but prevent gas, or fluid, entering the contaminated gas outlet 26a.

As illustrated in Fig. 1 , the gas extraction device 26 includes a compressor 30. As described further below, the compressor 30 may operate as a compressor and a vacuum pump. The compressor is operable to remove contaminated gas from the bowl 16. The compressor 30 may be a high pressure, low flow, pump.

The compressor 30 is the source of the compressed gas for the gas injection device 18 and the source of suction to remove the contaminated gas from the bowl 16. However, it should be appreciated that the lavatory 10 may include two separate compressors, suction devices, for this purpose.

In the embodiment illustrated and described here, the compressor 30 is configured to remove contaminated gas from the bowl 16 and compress at least a portion of this gas to inject back into the bowl 16. That is, the compressor 30, the gas injection device 18 and the contaminated gas outlets 26a are connected together to form a feedback loop for removing at least a portion of contaminated gas from the bowl 16, compressing the same, and injecting back into the bowl 16 through nozzles 18a.

As illustrated in Fig. 1 , the gas extraction device 26 includes a

contaminated gas diverter 26e. The contaminated gas diverter 26e may be part of the compressor 30. The contaminated gas diverter 26e is operable to direct a first portion of the contaminated gas to the flush water outlet 14, and a second portion of the contaminated gas to the compressor 30. In this arrangement, the diverter may be operable to divert between 0% and 100% of the contaminated gas between either the flush water outlet 14 and the compressor 30. One operation of the gas extraction device may be to direct between 10% and 30% of the contaminated gas to the compressor 30, with the remaining contaminated gas being directed to the flush water outlet 14. The contaminated gas diverter 26e is selectively operable to divert a desired amount of contaminated gas to the flush water outlet 14 and compressor 30. It is desirable to control the amount of gas that is injected into the bowl 16 and the amount that is diverted to the flush water outlet 14 to maximise the amount of contaminated gas that can be removed from the bowl 16 by the gas extraction device 26. The compressor 30 may be an 18 volt DC motor of approximately 200W, a 240 volt AC supply, or the like. The compressor 30 may be powered by a mains supply, or be battery-operated. The compressor 30 may be powered by a detachable rechargeable battery, or power pack, or the like. The lavatory 10 may further comprise a control unit 32, the control unit 32 being operable to control the operation of the compressor 30. The control unit 32 may be operable to control one or more of: the length of operation of the compressor 30, the flow rate of gas therethrough and the

contaminated gas diverter 26e. The control unit 32 may also be operable to provide a pressure boost function to increase the gas injection pressure into the bowl 16, if required.

The gas extraction device 26 may be located in a housing attached to the lavatory 10. The housing may be attached to the lavatory 10, or integrally formed within a portion of the lavatory 10. Alternatively, the housing may be attachable to the lavatory 10.

A description of the use of the lavatory 10 will follow. It should be appreciated that this description is only an example of the operation of the lavatory 10, and the order, or omission, of some of the steps may be altered as required.

In use, prior to use of the lavatory by a person, the compressor 30 is operated to draw gas from the bowl 16 through the contaminated gas outlets 26a. As described above, a portion of this gas is diverted to the flush water outlet 14, with the remining being compressed by the compressor 30. The compressed gas is injected into the flush water 20 in the bowl 16 by the nozzles 18a.

Through the arrangement of the nozzles 18a and the gas diffusion element 22, if present, the flush water and gas mixture 24 is created in the bowl. As described above, the flush water and gas mixture 24 is a homogeneous froth of microbubbles with a lower average specific gravity than the flush water 20 and substantially zero surface tension. The operation of the compressor 30 may be halted at this point while the lavatory 10 is used, or the compressor 30 may continue to operate while the lavatory 10 is being used.

After use of the lavatory flush water in the cistern is released and contaminated flush water and deposited materials are flushed from the bowl 16 to the flush water outlet 14. The bowl 16 is then re-filled with flush water 20 for the next user.

The operation of the gas injection device 18 and the gas extraction device 26 may be operated during some or all stages of use of the lavatory. The control unit 32 may be operable to control the operation, and control parameters, of the compressor 30. The control unit 32 may control, inter alia, the duration of operation of the compressor 30. The lavatory 10 may also include one or more sensors (not illustrated) to facilitate automatic operation of the compressor 30. The sensors may be part of the control unit 32. The sensors may, for example, be operable to detect when a user approaches the lavatory 10 and start the operation of the gas injection device 18 and gas extraction device 26.

In embodiments where there is a compressor for the injection of the gas to the bowl and a separate compressor for the extraction of the gas from the bowl, independent selective operation of each compressor is possible, as required.

The gas extraction device 26 removes contaminated gas from within the bowl 16. This creates a more pleasant environment for the user. This also removes the need for a“courtesy flush” during use of the lavatory 10 by the user, which reduces the amount of water used by the lavatory 10. The gas extraction device 26 also removes airborne (satellite)

contaminated droplets from the bowl 16 and the area in the vicinity of the lavatory 10. The gas extraction device 26 may also be used to function as an gas/air extraction system for the entire bathroom where the lavatory 10 is fitted. That is, the gas extraction device 26 may remove contaminated (or humid) air from the bathroom. The control unit 32 may be operable to function with a timer or hygrometer switch to operate the gas extraction device 26 after a certain period of time, or upon receipt of a signal from the hygrometer switch.

The generation of microbubbles in the flush water 20 to create a homogeneous froth creates a flush water and gas mixture 24 that has substantially zero surface tension. This creates a“splashless” surface that reduces splashes of flush water 20/contaminated flush water/deposited materials within the bowl 16. This improves the cleanliness of the bowl 16 and improves hygiene. Furthermore, with a flush water and gas mixture 24 having a lower average specific gravity than the flush water 20, the buoyancy of deposited waste material within the flush water 20 in the bowl 16 is reduced. Trapped air within the deposited waste material is released by the agitation of the flush water 20 by the injected gas into the bowl 16. This means that deposited solids in the bowl 16 will not float in the flush water 20 and avoid the flushing action.

Also, as the flush water 20 in the cistern is released for flushing, this introduces flush water 20 with a specific gravity of 1 into the bowl 16. This flush water 20 impacts the flush water and gas mixture 24 with the lower average specific gravity. The introduction of this flush water 20 produces a more effective flush, as the low density fluid in the bowl 16 has a lower inertia, which allows a cleaner sweep. This, the need for a second flush is avoided. Also, the injection of gas into the flush water 20 results in a reduced weight of the fluid and deposited materials within the bowl 16 a lower volume of water is required to flush the bowl 16, which saves on water requirements. Furthermore, the reduced weight of the fluid and deposited materials within the bowl 16 means that the flush water 20 introduced from the cistern accelerates the sweep action of the flush water 20, which cleans the submerges inner surfaces of the bowl 16.

Also, during operation of the gas injection device 18 bubbles that are formed in the flush water 20 continuously burst at the surface (i.e.

continuously bubbling trapped water). This bursting of bubbles creates localised wetting of the inner surface of the bowl 16 at an area above and around the maximum flush water level 20a. The effect of this is to provide lubrication to the inner surface of the bowl 16, which reduces stains created on the bowl 16 as deposited materials impact the bowl 16 during use of the lavatory 10. Without wishing to be bound by theory, it is understood that the injection and extraction of gas in this partial feedback loop reduces local surface contamination by a factor of 4, and air contamination by a factor of 10.

Furthermore, since the operation of the gas injection device 18 and the gas extraction device 26, and the compressor 30 in particular, generates noise, this overshadows any noises made by a user during use of the lavatory 10. The compressor 30 may generate a white noise, which assists in masking any noises made by the user. In addition, since the flush water gas mixture 24 is a homogeneous froth of microbubbles, noise of deposited materials entering this mixture is quietened, as these materials do not break the surface tension of this mixture in the same way they would were they entering a regular fluid with a specific gravity of 1.

In addition, since each nozzle 18a is operable to deliver a jet of

pressurised gas into the flush water 20 in the bowl 16 which impacts the opposite wall, the jets of pressurised gas are capable of washing any deposited materials or stains from this wall. This assists in the cleaning of the bowl 16. Furthermore, since the nozzles 18a are operable to deliver a jet of pressurised gas into the flush water 20 in the bowl 16 any deposited solid materials in the bowl 16 may be broken down by these jets. This therefore reduces the chance of the flush water outlet 14 being blocked by deposited materials during use of the lavatory 10. This also assists with subsequent decomposition and treatment of the materials in the sewerage system.

Should the control unit 32, the gas injection device 18, the gas extraction device 26, the power, or any other associated component fail, the lavatory 10 will revert to a standard lavatory operation, i.e. , being flushed by the cistern in the known manner.

The lavatory 10 removes the need for chemical air sprays, or the like. Removal of detritus and contaminated gas at source, by forced movement, results in a clean environment which avoids the need to used powerful aromatics.

In addition, the lavatory 10 reduces the spread of infection, as faecal matter with its associated microbial hazards such as C. difficile and novo virus, is contained within the bowl 16 by the provision of the splashless surface and extraction of airborne contamination.

Modifications may be made to the foregoing embodiment within the scope of the present invention. For example, although the gas injection device 18 and the gas extraction device 26 have been illustrated and described above as being in arranged in a partial feedback loop, it should be appreciated that the operation of the gas injection and the gas extraction may be separated and independent. In which case the lavatory 10 may include separate compressors for gas injection and extraction.

Also, the lavatory 10 may include a single compressor, but the compressor may compress and inject fresh atmospheric air into the bowl 16 and remove contaminated gas therefrom.

Furthermore, although the flush water inlets 12 have been illustrated and described above as being used as the contaminated gas outlets 26a, it should be appreciated that the lavatory 10 may include a separate contaminated gas outlet, which may be located at any suitable position in the lavatory 10 to facilitate removal of contaminated gas from the bowl 16.

Also, it should be appreciated that the gas injection device 18 may include any suitable number of nozzles 18a, at any suitable location, to generate the bubbles in the flush water 20. This may include only one nozzle 18a.

Furthermore, although the bubbles have been described as microbubbles, it should be appreciated that bubbles of any size may be generated to create the low density, low surface tension, medium within the bowl 16. Furthermore, although the lavatory 10 has been illustrated and described above as including the gas injection device 18 and gas extraction device 26, it should be appreciated that the gas injection device 18 and gas extraction device 26 may be retrofitted to a lavatory. In this case, the present invention provides an apparatus for injecting gas into the bowl of a lavatory. The apparatus comprising at least one gas injection device, the at least one gas injection device being configured to inject gas into flush water located in the bowl during use of the lavatory. The lavatory may be modified to include bore holes for operation with the nozzles of the gas injection device.

Claims

1. A lavatory comprising:

at least one flush water inlet;

a flush water outlet; and

a bowl located between the flush water inlet and the flush water outlet,

wherein the bowl includes at least one gas injection device, the at least one air injection device being arranged to inject gas into flush water located in the bowl during use of the lavatory.

2. The lavatory of claim 1 , wherein the at least one gas injection device includes one or more nozzles, each nozzle being configured to inject gas from the bowl into the flush water.

3. The lavatory of claim 2, wherein the, or each, nozzle is arranged to cooperate with a bore hole located in the outer wall portion of the bowl to allow gas from the gas injection device to flow through the bowl and into the flush water located therein during use.

4. The lavatory of any preceding claim, wherein the, or each, gas injection device operable to deliver a jet of pressurised gas into the bowl that impacts the opposite side of the bowl from which the gas is injected.

5. The lavatory of any preceding claim, wherein the, or each, gas injection device includes, or is operable with, a gas diffusion element.

6. The lavatory of claim 5, wherein the gas diffusion element is, or includes, a microporous material.

7. The lavatory of any preceding claim, wherein the or each, gas injection device may be operable to generate a flush water and gas mixture, the flush water and gas mixture being a substantially

homogeneous mass of bubbles.

8. The lavatory of any preceding claim, wherein the or each, gas injection device is operable to generate a flush water and gas mixture having a lower average specific gravity than the flush water.

9. The lavatory of claim 7 or claim 8, wherein the flush water and gas mixture has substantially zero surface tension.

10. The lavatory of any preceding claim, wherein the lavatory further comprises a gas extraction device, the gas extraction device gas extraction device being operable to remove gas from the bowl after use of the lavatory.

1 1. The lavatory of claim 10, wherein the gas extraction device includes at least one gas outlet, the at least one gas outlet being configured to provide a fluid flow path between the bowl and the flush water outlet.

12. The lavatory of claim 1 1 , wherein the at least one gas outlet is provided by the at least one flush water inlet.

13. The lavatory of claim 1 1 or claim 12, wherein the at least one gas outlet includes a first end and the second end, the first end being positioned to remove gas from the bowl and the second end being connected to the flush water outlet, and wherein the second end of the at least one gas outlet includes a one-way valve, the one-way valve being configured to allow contaminated gas to enter the flush water outlet, but prevent gas, or fluid, entering the at least one gas outlet.

14. The lavatory of any preceding claim, wherein the lavatory further comprises a compressor, the compressor being the source of compressed gas for the at least one gas injection device, and the suction device for removal of the gas from the bowl.

15. The lavatory of claim 14, wherein the compressor is configured to remove at least a portion of gas from the bowl and compress at least a portion of the same gas to inject back into the bowl.

16. The lavatory of claim 15, wherein the compressor, the at least one gas injection device and the at least one gas outlet are connected together to form a feedback loop for removing at least a portion of gas from the bowl, compressing the same, and injecting back into the bowl.

17. The lavatory of claim 15 or 16, wherein the lavatory further includes a gas diverter, the gas diverter being operable to direct a first portion of gas from the at least one gas outlet to the flush water outlet, and a second portion of the contaminated gas to the compressor.

18. The lavatory of claim 17, wherein the gas diverter is selectively operable to divert a certain amount of gas to the flush water outlet and compressor.

19. The lavatory of claim 17 or claim 18, wherein the gas diverter and the compressor are operable to ensure that a controlled amount of gas is injected into the bowl.

20. The lavatory of any of claims 14 to 19, wherein the lavatory further comprise a control unit, the control unit being operable to control the operation of the compressor, such that the length of operation of the compressor, the flow rate of gas therethrough and the contaminated gas diverter may be controlled.

21. The lavatory of any of claims 1 to 13, wherein the lavatory comprises a compressor, the compressor being operable to inject atmospheric air into the bowl and remove gas from the bowl to the flush water outlet.

22. The lavatory of any of claims 1 to 13, wherein the lavatory comprises a first compressor, the first compressor being operable to inject gas into the bowl, and a second compressor, the second compressor being operable to extract gas from the bowl.

23. The lavatory of claim 22, wherein the first compressor may inject atmospheric air into the bowl, or a portion of gas that has already been removed from the bowl back into the bowl.

24. An apparatus for injecting gas into the bowl of a lavatory, the apparatus being attachable to a lavatory and comprising:

25. A method of injecting gas into the bowl of a lavatory, the method comprising the steps of:

providing a lavatory comprising:

at least one flush water inlet; a flush water outlet; and

a bowl located between the flush water inlet and the flush water outlet,

operating the at least one gas injection device to inject gas into the bowl to generate a flush water and gas mixture in the bowl.