WO2018038179A1 - 樹脂組成物、プリプレグ、金属箔張積層板、樹脂シート及びプリント配線板 - Google Patents
樹脂組成物、プリプレグ、金属箔張積層板、樹脂シート及びプリント配線板 Download PDFInfo
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- WO2018038179A1 WO2018038179A1 PCT/JP2017/030202 JP2017030202W WO2018038179A1 WO 2018038179 A1 WO2018038179 A1 WO 2018038179A1 JP 2017030202 W JP2017030202 W JP 2017030202W WO 2018038179 A1 WO2018038179 A1 WO 2018038179A1
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B32B15/00—Layered products comprising a layer of metal
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- B32B15/088—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyamides
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- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
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- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
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- C08G18/3842—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring
- C08G18/3844—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring containing one nitrogen atom in the ring
- C08G18/3846—Low-molecular-weight compounds having heteroatoms other than oxygen having nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring containing one nitrogen atom in the ring containing imide groups
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- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
- C08G18/76—Polyisocyanates or polyisothiocyanates cyclic aromatic
- C08G18/7657—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
- C08G18/7664—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
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- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
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- H05K1/0313—Organic insulating material
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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Definitions
- the present invention relates to a resin composition, a prepreg, a metal foil-clad laminate, a resin sheet, and a printed wiring board.
- Thermosetting resins such as epoxy resins used for printed wiring board insulation layers themselves have low thermal conductivity. Therefore, in order to improve thermal conductivity as a printed wiring board, a method of highly filling an inorganic filler excellent in thermal conductivity into a thermosetting resin is known.
- the inorganic filler is highly filled in the thermosetting resin composition, the volume ratio of the thermosetting resin is decreased, the moldability is deteriorated, and cracks and voids are easily generated between the resin and the inorganic filler. Therefore, there is a problem that the moisture absorption heat resistance is deteriorated, the elastic modulus is lowered, the adhesion between the resin and the inorganic filler is insufficient, and the copper foil peel strength is lowered. In view of such a problem, it has been proposed to use various resin compositions.
- Patent Document 1 a resin composition containing a naphthol aralkyl-type cyanate ester resin and an epoxy resin, in which a resin composition containing a specific amount of an inorganic filler has excellent heat resistance, thermal conductivity and It describes that it exhibits water absorption.
- Patent Document 2 a resin composition containing a cyanate ester compound and an epoxy resin, in which a resin composition containing two kinds of inorganic fillers having different particle diameters has good moldability, and It describes that it exhibits high heat dissipation characteristics, high glass transition temperature, copper foil peel strength, and moisture absorption heat resistance.
- Patent Document 3 a resin composition containing an epoxy resin and a curing agent, wherein a resin composition containing borate particles coated with hexagonal boron nitride as an inorganic filler has a high glass transition temperature.
- a resin composition containing borate particles coated with hexagonal boron nitride as an inorganic filler has a high glass transition temperature.
- the present invention has been made in view of the above problems, and provides a resin composition, a prepreg, a metal foil-clad laminate, a resin sheet, and a printed wiring board that can exhibit excellent thermal conductivity and copper foil peel strength. For the purpose.
- the present inventors diligently studied to solve the above problems. As a result, in a resin composition containing a cyanate ester compound and / or a maleimide compound, the boron nitride particle aggregate in which the (0001) faces of the boron nitride primary particles overlap and agglomerate is blended as an inorganic filler. The present inventors have found that the problem can be achieved and have completed the present invention.
- a resin composition comprising:
- the inorganic filler (C) is a boron nitride particle aggregate containing hexagonal boron nitride primary particles, and includes a boron nitride particle aggregate in which (0001) faces of the hexagonal boron nitride primary particles overlap each other. , Resin composition.
- the cyanate ester compound (A) includes at least one of a cyanate ester compound represented by the following general formula (1) and a cyanate ester compound represented by the formula (2):
- the resin composition in any one of. R represents a hydrogen atom or a methyl group, and n represents an integer of 1 or more.
- the maleimide compound (B) is bis (4-maleimidophenyl) methane, 2,2-bis ⁇ 4- (4-maleimidophenoxy) -phenyl ⁇ propane, bis (3-ethyl-5-methyl-4-maleimidophenyl)
- each R 5 independently represents a hydrogen atom or a methyl group, and n 1 represents an integer of 1 or more.
- Cyanate ester compound (A) represented by formula (1) and cyanate ester compound other than cyanate ester compound (A) represented by formula (2), epoxy resin, oxetane resin, phenol resin, benzoxazine compound The resin composition according to any one of [6] to [9], further comprising at least one selected from the group consisting of a compound having a polymerizable unsaturated group.
- the present invention it is possible to provide a resin composition, a prepreg, a metal foil-clad laminate, a resin sheet, and a printed wiring board that can exhibit excellent thermal conductivity and copper foil peel strength.
- FIG. 1 is an explanatory diagram for explaining R and r in the present embodiment.
- FIG. 2A is an SEM image of the boron nitride particle aggregate according to Example 1 at a magnification of 120,000 times.
- FIG. 2B is an SEM image of the boron nitride particle aggregate according to Example 1 at a magnification of 50000 times.
- FIG. 3A is an SEM image of the hexagonal boron nitride primary particles not aggregated, that is, a magnification of 25,000 times that of the conventional hexagonal boron nitride primary particles.
- FIG. 2A is an SEM image of the boron nitride particle aggregate according to Example 1 at a magnification of 120,000 times.
- FIG. 2B is an SEM image of the boron nitride particle aggregate according to Example 1 at a magnification of 50000 times.
- FIG. 3A is an SEM image of the hexagonal boron nitride primary
- FIG. 3B shows a portion where the end face side is observed in the SEM image of the hexagonal boron nitride primary particles in which the hexagonal boron nitride primary particles are not aggregated.
- FIG. 4 is a view for showing a scale of the boron nitride particle aggregates observed in FIG.
- FIG. 5 is a diagram showing the scale of the three boron nitride particle aggregates observed in FIG.
- the present embodiment a mode for carrying out the present invention (hereinafter referred to as “the present embodiment”) will be described in detail.
- the present invention is not limited to this, and various modifications can be made without departing from the gist thereof. Is possible.
- the resin composition of the present embodiment is a resin composition comprising a cyanate ester compound (A) and / or a maleimide compound (B) and an inorganic filler (C), wherein the inorganic filler (C) Is a boron nitride particle aggregate including hexagonal boron nitride primary particles, and includes boron nitride particle aggregates in which the (0001) faces of the hexagonal boron nitride primary particles overlap each other. Since it is comprised in this way, the resin composition of this embodiment can express the outstanding heat conductivity and copper foil peel strength.
- each component which comprises the resin composition of this embodiment is demonstrated.
- the cyanate ester compound (A) is an optional component and may not be contained, but from the viewpoint of desmear resistance and high thermal modulus, the resin composition of the present embodiment.
- the resin composition of the present embodiment Preferably contains a cyanate ester compound (A).
- cyanate ester compound (A) the novolak-type cyanate ester represented by the following general formula (A), the cyanate ester compound represented by the following general formula (1) ( Naphthol aralkyl cyanate), cyanate ester compound represented by formula (2) (diallyl bisphenol A cyanate), biphenyl aralkyl cyanate, bis (3,3-dimethyl-4-cyanatophenyl) methane Bis (4-cyanatophenyl) methane, 1,3-dicyanatobenzene, 1,4-dicyanatobenzene, 1,3,5-tricyanatobenzene, 1,3-dicyanatonaphthalene, 1,4-disi Anatonaphthalene, 1,6-dicyanatonaphthalene, 1,8-dicyanatonaphthalene, 2,6-dicyanatonaphthal 2,7-dicyanatonaphthalene, 1,3,6-tricyanatonaphthalene,
- the above-described cyanate ester compound (A) may be used alone or in combination of two or more.
- the cyanate ester compound (A) includes at least one of the cyanate ester compound represented by the general formula (1) and the cyanate ester compound represented by the formula (2).
- R represents a hydrogen atom or a methyl group, and n represents an integer of 1 or more.
- the R is preferably a hydrogen atom.
- the n is an integer of 10 or less. It is preferably an integer of 7 or less.
- R represents a hydrogen atom or a methyl group, and n represents an integer of 1 or more.
- the R is preferably a hydrogen atom.
- the n is an integer of 10 or less. It is preferably an integer of 6 or less.
- the content of the cyanate ester compound (A) is preferably 1 to 90 parts by mass and preferably 5 to 85 parts by mass with respect to 100 parts by mass of the resin solid content. Is more preferable, and the amount is more preferably 10 to 80 parts by mass.
- the content of the cyanate ester compound in the above range it is possible to maintain excellent moldability even when filling with an inorganic filler, and to further improve the curability, thermal elastic modulus, desmear resistance, etc. is there.
- “resin solid content” means a component in the resin composition excluding the solvent and the inorganic filler (C) unless otherwise specified, and “resin solid content 100 parts by mass”.
- total amount of components excluding the solvent and the inorganic filler (C) in the resin composition means 100 parts by mass.
- the maleimide compound (B) is an optional component and may not be included, but from the viewpoint of heat resistance, the resin composition of the present embodiment includes the maleimide compound (B). It is preferable.
- the maleimide compound is not particularly limited as long as it is a compound having one or more maleimide groups in the molecule.
- Preferred examples thereof include N-phenylmaleimide, N-hydroxyphenylmaleimide, bis (4-maleimidophenyl) methane, 2,2-bis ⁇ 4- (4-maleimidophenoxy) -phenyl ⁇ propane, bis (3,5 -Dimethyl-4-maleimidophenyl) methane, bis (3-ethyl-5-methyl-4-maleimidophenyl) methane, bis (3,5-diethyl-4-maleimidophenyl) methane, polytetramethylene oxide-bis (4 -Maleimidobenzoate), maleimide compounds represented by the following general formula (3), prepolymers of these maleimide compounds, or prepolymers of maleimide compounds and amine compounds.
- the maleimide compound (B) is bis (4-maleimidophenyl) methane, 2,2-bis ⁇ 4- (4-maleimidophenoxy) -phenyl ⁇ propane, bis (3-ethyl-5-methyl). It is preferable to include at least one selected from the group consisting of -4-maleimidophenyl) methane and a maleimide compound represented by the following formula (3). In that case, the thermal expansion coefficient of the obtained cured product is further lowered, and the heat resistance and the glass transition temperature tend to be further improved.
- each R 5 independently represents a hydrogen atom or a methyl group, and n 1 represents an integer of 1 or more.
- R 5 preferably represents a hydrogen atom.
- n 1 is preferably 10 or less, more preferably 7 or less.
- the content of the maleimide compound (B) is preferably 1 to 90 parts by mass, more preferably 5 to 85 parts by mass, and further preferably 10 to 80 parts by mass with respect to 100 parts by mass of the resin solid content. Part.
- content of a maleimide compound (B) exists in the said range, it exists in the tendency for the thermal expansion coefficient of the hardened
- the resin composition of the present embodiment contains at least one of a cyanate ester compound (A) and a maleimide compound (B), and has heat resistance, combustion resistance, mechanical properties, long-term heat resistance, chemical resistance, and electricity. From the viewpoint of insulation, it is preferable that both of the cyanate ester compound (A) and the maleimide compound (B) are included.
- the inorganic filler (C) includes a boron nitride particle aggregate including hexagonal boron nitride primary particles.
- the (0001) faces of hexagonal boron nitride primary particles overlap each other. Examples of the method for confirming that the boron nitride particle aggregate is contained in the resin composition of the present embodiment and that the boron nitride particle aggregate has a preferable shape to be described later are described later.
- the method as described in an Example is mentioned. That is, it can be easily confirmed by observing the resin composition of the present embodiment with an SEM.
- the structure can be confirmed similarly to the above.
- the boron nitride particle aggregate in the present embodiment can be said to easily maintain a laminated structure in which (0001) faces of hexagonal boron nitride primary particles overlap each other from the viewpoint described later, and is prepared as a resin composition.
- the structure tends to be maintained in each step such as the step of molding the resin composition. That is, if it can be confirmed that the boron nitride particle aggregate as the raw material of the inorganic filler (C) satisfies the desired configuration of the present embodiment, the resin composition of the present embodiment will provide the boron nitride particle aggregate. It can be said that it contains.
- the particle shape of the hexagonal boron nitride primary particles constituting the boron nitride particle aggregate in the present embodiment is not particularly limited, and examples thereof include a scale shape, a flat shape, a granular shape, a spherical shape, a fibrous shape, and a whisker shape. Of these, scale-like is preferable.
- the average particle diameter of the hexagonal boron nitride primary particles is not particularly limited, but the median diameter is preferably 0.1 to 50 ⁇ m, more preferably 0.1 to 5 ⁇ m, and particularly preferably 0.1 to 1 ⁇ m.
- the average particle diameter is in the above range, the (0001) faces of the hexagonal boron nitride primary particles are easily overlapped and aggregated, and as a result, the thermal conductivity of the resin sheet tends to be improved.
- the average particle diameter of the hexagonal boron nitride primary particles can be measured by, for example, a wet laser diffraction / scattering method.
- the aggregation form of the boron nitride particle aggregate in which the (0001) faces of the hexagonal boron nitride primary particles are aggregated and aggregated is not particularly limited, but includes natural aggregation, aggregation by an aggregating agent, physical aggregation, and the like. Can be mentioned. Examples of natural aggregation include, but are not limited to, aggregation caused by van der Waals force, electrostatic force, adsorbed moisture, and the like. Aggregation by the aggregating agent is not limited to the following, and examples include aggregating by an aggregating agent such as a coupling agent, an inorganic salt, and a polymer substance.
- the hexagonal boron nitride primary particles are agglomerated by changing the surface state to a state where the surface energy is high, that is, a state where the primary particles tend to aggregate.
- Examples of physical agglomeration include methods of agglomeration by operations such as mixed granulation, extrusion granulation, and spray drying. Among these, from the viewpoint of cohesive strength, aggregation with a coupling agent is preferable.
- the “boron nitride particle aggregate” is an aggregate unit of secondary particles formed by agglomerating filler containing hexagonal boron nitride primary particles, and can take various shapes. That is, the shape of the boron nitride particle aggregate is not particularly limited as long as the (0001) faces of the hexagonal boron nitride primary particles overlap each other, for example, columnar, flat, granular, massive, It may be spherical or fibrous.
- the a-axis direction of the hexagonal boron nitride primary particles may coincide with the thickness direction of the resin sheet (hereinafter, simply This is also preferable because it tends to increase.
- “columnar” means a shape derived from the aggregation mode of hexagonal boron nitride primary particles, and means a shape including a prismatic shape, a cylindrical shape, a rod shape, and the like, which is different from a spherical shape. .
- the columnar shape includes those that extend straight in the vertical direction, those that extend in an inclined shape, those that extend while curving, and those that branch and extend in a branch shape. It can be easily confirmed that the boron nitride particle aggregate has a columnar shape by observation with a scanning electron microscope (SEM).
- a typical example of the method for confirming that the boron nitride particle aggregate in the present embodiment has a columnar shape is not limited to the following, but includes the longest diameter R in the stacking direction of the boron nitride particle aggregate and the boron nitride particle aggregate. And the longest diameter r in the width direction is identified by SEM observation, and a method of confirming the magnitude relationship between them is exemplified.
- the boron nitride particle aggregate satisfies R> 0.3r from the viewpoint of increasing the orientation.
- R> r is satisfied from the viewpoint of further improving the orientation.
- the “stacking direction” here is a direction substantially parallel to the c-axis direction of the hexagonal boron nitride primary particles.
- the “width direction” is a direction substantially perpendicular to the stacking direction. In other words, the width direction is a direction substantially parallel to the surface direction (a-axis direction) of the (0001) plane in at least one hexagonal boron nitride primary particle.
- the longest diameter in the width direction is, for example, the longest diameter in the surface direction of the (0001) plane of the hexagonal boron nitride primary particles when the boron nitride particle aggregate has a columnar shape extending straight in the vertical direction.
- the longest diameter in the width direction may be larger than the longest diameter in the surface direction of the (0001) plane of the hexagonal boron nitride primary particles.
- substantially parallel means a state within ⁇ 10 ° from the parallel direction
- substantially perpendicular means a state within ⁇ 10 ° from the vertical direction.
- 1B is obtained by agglomerating rectangular hexagonal boron nitride primary particles so that their long sides, that is, (0001) planes overlap each other.
- the short side of the aggregate corresponds to r (that is, the longest diameter in the width direction of the boron nitride particle aggregate), and the long side corresponds to R (that is, the longest diameter in the stacking direction of the boron nitride particle aggregate). is doing.
- the boron nitride particle aggregate in the present embodiment has a structure in which hexagonal boron nitride primary particles are stacked.
- the stacked structure is not particularly limited, but the hexagonal boron nitride primary per layer is not particularly limited.
- the number of particles is preferably 2 or less, more preferably 1. Since it has the tendency for orientation to improve when it has such a laminated structure, it is preferable.
- the longest diameter in the stacking direction of the boron nitride particle aggregate is not particularly limited, and the longest diameter in the width direction of the boron nitride particle aggregate is not particularly limited.
- the average particle diameter of the hexagonal boron nitride primary particles is A ( ⁇ m)
- R 0.3 ⁇ A to 10 ⁇ A ( ⁇ m)
- r 0.3 ⁇ A to 3 ⁇ A ( ⁇ m) is preferably satisfied.
- the method for measuring the longest diameter are not limited to the following, but in a captured SEM image, if the boron nitride particle aggregate is columnar, the shape approximates a rectangle, and the long side of the rectangle and For example, the length of the short side is measured.
- the state in which “(0001) planes of hexagonal boron nitride primary particles overlap” is not limited to an aspect in which (0001) planes completely overlap, but in the width direction. A mode in which they overlap each other is also included.
- the longest diameter r in the width direction of the boron nitride particle aggregate tends to depend on the particle size and the degree of aggregation of the hexagonal boron nitride primary particles, and is not particularly limited.
- the thickness of the molded product is preferably less than T (r ⁇ T), more preferably r ⁇ 0.9 ⁇ T, and even more preferably r ⁇ 0.5 ⁇ T.
- r tends to be able to prevent a decrease in smoothness due to unevenness on the surface of the molded product, and r is sufficiently smaller than T from the viewpoint that it can be used as a raw material for a thinner resin sheet. Is preferred.
- the boron nitride particle aggregate in the present embodiment may contain a filler other than the hexagonal boron nitride primary particles.
- a filler include, but are not limited to, for example, aluminum nitride, aluminum oxide, Metal oxides such as zinc oxide, silicon carbide, aluminum hydroxide, metals and alloys such as metal nitrides, metal carbides, metal hydroxides, spheres, powders, fibers, needles made of carbon, graphite, diamond, Examples include scale-like and whisker-like fillers. These may be contained independently and may contain multiple types.
- the boron nitride particle aggregate in the present embodiment may contain a binder from the viewpoint of increasing the robustness of the boron nitride particle aggregate.
- “robustness” is a property indicating the strength of bonding when the hexagonal boron primary particles are bonded together in the present embodiment.
- the binder originally acts to firmly bind the primary particles to each other and stabilize the shape of the aggregate.
- Such a binder is preferably a metal oxide, and specifically, aluminum oxide, magnesium oxide, yttrium oxide, calcium oxide, silicon oxide, boron oxide, cerium oxide, zirconium oxide, titanium oxide, and the like are preferably used. Among these, aluminum oxide and yttrium oxide are preferable from the viewpoints of thermal conductivity and heat resistance as an oxide, and bonding strength for bonding hexagonal boron nitride primary particles.
- the binder may be a liquid binder such as alumina sol, or an organic metal compound that is converted into a metal oxide by firing. These binders may be used individually by 1 type, and may mix 2 or more types.
- the boron nitride particle aggregate in the present embodiment is not particularly limited as long as the above-described configuration is obtained, but is preferably manufactured by the following method. That is, a preferable method for producing an aggregate of boron nitride particles in the present embodiment includes the step (A) of adding a coupling agent to hexagonal boron nitride primary particles and the coupling agent obtained by the step (A). A step (B) of dispersing boron nitride primary particles in a solvent. More preferably, the method further includes a step (C) of separating the boron nitride particle aggregates from the dispersion obtained from the step (B).
- the hexagonal boron nitride primary particles to which the coupling agent is added are aggregated between the (0001) faces due to surface charges in the dispersion, and the binder phase is coupled between the coupling agents.
- a boron nitride particle aggregate having the desired configuration of the present embodiment is easily obtained.
- the hexagonal boron nitride primary particles have a component derived from the coupling agent.
- the method for adding the coupling agent to the hexagonal boron nitride primary particles is not particularly limited, but the coupling agent stock solution is uniformly dispersed in the filler that is stirred at high speed by a stirrer.
- a dry method for processing, a wet method in which a filler is immersed in a dilute solution of a coupling agent, and agitation are suitable.
- the hexagonal boron nitride primary particles to which a coupling agent is added are bonded to form a boron nitride particle aggregate.
- the stirring temperature is not particularly limited, but special temperature control such as heating and cooling is not necessary.
- the temperature rises by stirring but is preferably 200 ° C. or lower.
- the stirring speed is not particularly limited, however, it is usually preferable to stir at 10 to 10,000 rpm, and more preferably 100 to 3000 rpm.
- the stirring time is preferably 5 minutes to 180 minutes, and more preferably 10 minutes to 60 minutes in view of effective stirring time and productivity.
- the above-mentioned coupling agent preferably has at least one selected from the group consisting of an aryl group, an amino group, an epoxy group, a cyanate group, a mercapto group, and a halogen from the viewpoint of cohesive strength and robustness.
- a coupling agent include, but are not limited to, coupling agents such as silane, titanate, zirconate, zirconium aluminate, and aluminate.
- silane coupling agent is preferable from the viewpoint of cohesive strength.
- the above-mentioned silane coupling agent preferably has one or more selected from the group consisting of an aryl group, amino group, epoxy group, cyanate group, mercapto group and halogen.
- an aryl group is more preferable because it has a ⁇ - ⁇ bond and the bond between silane coupling agents becomes stronger.
- Examples of such a coupling agent include, but are not limited to, phenyltrimethoxysilane, phenyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, p-styryltrimethoxysilane, and naphthyltrimethoxysilane. Naphthyltriethoxysilane, (trimethoxysilyl) anthracene, (triethoxysilyl) anthracene, and the like.
- silane coupling agent having a crosslinked structure as the above-mentioned coupling agent.
- silane coupling agents include, but are not limited to, 1,6-bis (trimethoxysilyl) hexane, tris- (trimethoxysilylpropyl) isocyanurate, bis (triethoxysilylpropyl) tetra Examples thereof include sulfide and hexamethyldisilazane.
- the silane coupling agent having the above-mentioned crosslinked structure can be obtained by reacting between organic functional groups and crosslinking.
- the combination of organic functional groups in this case is not limited to the following, but examples include amino group-epoxy group, epoxy group-cyanate group, amino group-cyanate group, amino group-sulfonic acid group, amino group-halogen, mercapto.
- Examples include a combination of organic functional groups of a coupling agent such as a group-cyanate group.
- the amount of the coupling agent added in the step (A) depends on the surface area of the filler, that is, the surface area of the hexagonal boron nitride primary particles, but is 0.01 to 10 with respect to the hexagonal boron nitride primary particles. It is preferable to add by mass%, and it is more preferable to add 1 to 2 mass%.
- the stirring method that can be used when adding the coupling agent is not particularly limited, and examples thereof include a vibration mill, a bead mill, a ball mill, a Henschel mixer, a drum mixer, a vibration stirrer, a V-shaped mixer, and the like. Stirring can be performed using a general stirrer.
- step (B) in the present embodiment the hexagonal boron nitride primary particles added with the coupling agent obtained in step (A) are dispersed in a solvent.
- the method for dispersing the hexagonal boron nitride primary particles added with the coupling agent in a solvent is not particularly limited. Since the hexagonal boron nitride primary particles to which a coupling agent having an aromatic skeleton is added tend to aggregate (0001) faces, it is preferably ultrasonically dispersed in a solvent.
- the solvent used at a process (B) Water and / or various organic solvents can be used.
- a highly polar solvent is preferable.
- the amount of the solvent used is 0.5 to 20 times the mass of the hexagonal boron nitride primary particles from the viewpoint of reducing the load during separation in the step (C) and from the viewpoint of uniform dispersion in the step (B). It is preferable to do.
- various surfactants may be added from the viewpoint of adjusting the degree of aggregation of the boron nitride particle aggregate.
- the surfactant is not particularly limited, and for example, an anionic surfactant, a cationic surfactant, a nonionic surfactant and the like can be used, and these may be used alone. Two or more kinds may be mixed and used.
- the surfactant concentration in the dispersion obtained from the step (B) is not particularly limited, but can be usually 0.1% by mass or more and 10% by mass or less, and 0.5% by mass or more and 5% by mass or less. It is preferable to do.
- step (C) boron nitride particle aggregates are separated from the dispersion obtained in step (B).
- the method for separating the boron nitride particle aggregates from the dispersion obtained from the step (B) is not particularly limited, and for example, stationary separation, filtration, centrifuge, heat treatment and the like can be used.
- surface oxidation that is temperature-treated under oxygen, steam treatment, surface modification with an organic metal compound or polymer using a carrier or a reaction gas at room temperature or under heating, sol-gel method using boehmite or SiO 2 , etc. can be used It is. These treatments may be used alone or in combination of two or more.
- typical post-processes such as scrutiny, pulverization, classification, purification, washing, and drying may be performed on the boron nitride particle aggregate in the present embodiment produced as described above, if necessary. If fines are included, they may be removed first.
- the pulverization of the boron nitride particle agglomerates may be performed using a sieving net, a classification mill, a structured roller crusher or a cutting wheel. For example, dry milling in a ball mill is also possible.
- the inorganic filler (C) in the present embodiment may contain various known inorganic fillers in addition to the above-described boron nitride particle aggregates.
- Such an inorganic filler is not particularly limited as long as it has insulating properties.
- silica such as natural silica, fused silica, amorphous silica, and hollow silica, alumina, aluminum nitride, boron nitride (this embodiment) Except for boron nitride particle aggregate in the form.
- Boehmite molybdenum oxide, titanium oxide, silicone rubber, silicone composite powder, zinc borate, zinc stannate, clay, kaolin, talc, calcined clay, calcined kaolin, Examples thereof include calcined talc, mica, short glass fibers (fine glass powders such as E glass and D glass), hollow glass, and spherical glass. These may be used individually by 1 type and may use 2 or more types together.
- silica is preferable from the viewpoint of low thermal expansion
- alumina, aluminum nitride, and boron nitride are preferable from the viewpoint of high thermal conductivity.
- the resin composition of the present embodiment is inorganicly filled with a silane coupling agent, a wetting dispersant and the like as components other than the inorganic filler. It can also be used in combination with the material (C).
- the silane coupling agent is not particularly limited as long as it is a silane coupling agent generally used for surface treatment of inorganic substances.
- Specific examples include aminosilane-based silane coupling agents such as ⁇ -aminopropyltriethoxysilane and N- ⁇ - (aminoethyl) - ⁇ -aminopropyltrimethoxysilane; epoxies such as ⁇ -glycidoxypropyltrimethoxysilane.
- Silane-based silane coupling agents such as ⁇ -acryloxypropyltrimethoxysilane; N- ⁇ - (N-vinylbenzylaminoethyl) - ⁇ -aminopropyltrimethoxysilane hydrochloride, etc.
- the wetting and dispersing agent is not particularly limited as long as it is a dispersion stabilizer used for paints.
- DISPERBYK-110 “DISPERBYK-111”, “DISPERBYK-118”, “DISPERBYK-180”, “DISPERBYK-161”, “BYK-W996”, “BYK-W9010”, “BigKemi Japan”
- Wetting and dispersing agents such as “BYK-W903”. These may be used individually by 1 type and may use 2 or more types together.
- the content of the inorganic filler (C) is not particularly limited, but is preferably 1 to 1600 parts by mass, and 50 to 1500 parts by mass with respect to 100 parts by mass of the resin solid content. More preferred is 80 to 700 parts by mass.
- content of an inorganic filler (C) is in the said range, it is preferable from a viewpoint of characteristics, such as moisture absorption heat resistance, low thermal expansion, and high thermal conductivity.
- the content of the boron nitride particle aggregate in the resin composition is more preferably 20 to 200 parts by mass, and even more preferably 30 to 140 parts by mass with respect to 100 parts by mass of the resin solid content. .
- the content of the boron nitride particle aggregate in the resin composition is 200 parts by mass or less, a better copper foil peel strength tends to be obtained.
- the content is 20 parts by mass or more, more excellent thermal conductivity is obtained. It tends to be obtained.
- the content of the boron nitride particle aggregate in the inorganic filler (C) is not particularly limited, but is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the inorganic filler (C).
- the amount is more preferably 5 to 100 parts by mass, further preferably 10 to 100 parts by mass, further preferably 50 to 100 parts by mass, and further preferably 90 to 100 parts by mass.
- the orientation tends to be further improved.
- the resin composition of the present embodiment can contain other components in addition to the components described above as long as the desired characteristics of the present embodiment are not impaired.
- cyanic acid other than the cyanate ester compound (A) represented by the formula (1) and the cyanate ester compound (A) represented by the formula (2) It is preferable to further include one or more selected from the group consisting of an ester compound, an epoxy resin, an oxetane resin, a phenol resin, a benzoxazine compound, and a compound having a polymerizable unsaturated group.
- cyanate ester compound other than the cyanate ester compound (A) represented by the formula (1) and the cyanate ester compound (A) represented by the formula (2) are not particularly limited, but as described above.
- the cyanate ester compound is exemplified.
- epoxy resin By including an epoxy resin, the resin composition of the present embodiment tends to be more excellent in adhesiveness, moisture absorption heat resistance, flexibility, and the like.
- the epoxy resin as long as it is a compound having two or more epoxy groups in one molecule, generally known ones can be used, and the kind thereof is not particularly limited. Specific examples thereof include bisphenol A type epoxy resin, bisphenol E type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol A novolac type epoxy resin, biphenyl type epoxy resin, phenol novolac type epoxy resin, cresol novolak.
- Type epoxy resin xylene novolac type epoxy resin, polyfunctional phenol type epoxy resin, naphthalene type epoxy resin, naphthalene skeleton modified novolak type epoxy resin, naphthylene ether type epoxy resin, phenol aralkyl type epoxy resin, anthracene type epoxy resin, trifunctional Phenol type epoxy resin, tetrafunctional phenol type epoxy resin, triglycidyl isocyanurate, glycidyl ester type epoxy resin, alicyclic epoxy Fatty, dicyclopentadiene novolak type epoxy resin, biphenyl novolak type epoxy resin, phenol aralkyl novolak type epoxy resin, naphthol aralkyl novolak type epoxy resin, aralkyl novolak type epoxy resin, biphenyl aralkyl type epoxy resin, naphthol aralkyl type epoxy resin, dicyclo Pentadiene type epoxy resin, polyol type epoxy resin, phosphorus-containing epoxy resin,
- the epoxy resin is preferably at least one selected from the group consisting of a biphenyl aralkyl type epoxy resin, a naphthylene ether type epoxy resin, a polyfunctional phenol type epoxy resin, and a naphthalene type epoxy resin.
- a biphenyl aralkyl type epoxy resin preferably at least one selected from the group consisting of a biphenyl aralkyl type epoxy resin, a naphthylene ether type epoxy resin, a polyfunctional phenol type epoxy resin, and a naphthalene type epoxy resin.
- the content of the epoxy resin is not particularly limited, but is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably with respect to 100 parts by mass of the resin solid content in the resin composition. Is 3 to 80 parts by mass. When the content of the epoxy resin is within the above range, the adhesiveness and flexibility tend to be excellent.
- the resin composition of the present embodiment tends to be superior in adhesiveness, flexibility, and the like by including the oxetane resin.
- the oxetane resin generally known oxetane resins can be used, and the kind thereof is not particularly limited.
- alkyloxetanes such as oxetane, 2-methyloxetane, 2,2-dimethyloxetane, 3-methyloxetane, and 3,3-dimethyloxetane, 3-methyl-3-methoxymethyloxetane, 3,3 ′ -Di (trifluoromethyl) perfluoxetane, 2-chloromethyloxetane, 3,3-bis (chloromethyl) oxetane, biphenyl type oxetane, OXT-101 (trade name, manufactured by Toagosei), OXT-121 (produced by Toagosei) Product name).
- These oxetane resins can be used alone or in combination of two or more.
- the content of the oxetane resin is not particularly limited, but is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably with respect to 100 parts by mass of the resin solid content in the resin composition. Is 3 to 80 parts by mass. When the content of the oxetane resin is within the above range, the adhesiveness and flexibility tend to be excellent.
- phenol resin When the resin composition of this embodiment contains a phenol resin, it tends to be more excellent in adhesiveness and flexibility.
- the phenol resin generally known resins can be used as long as they are phenol resins having two or more hydroxy groups in one molecule, and the kind thereof is not particularly limited. Specific examples thereof include bisphenol A type phenol resin, bisphenol E type phenol resin, bisphenol F type phenol resin, bisphenol S type phenol resin, phenol novolac resin, bisphenol A novolac type phenol resin, glycidyl ester type phenol resin, aralkyl novolac type.
- the content of the phenol resin is not particularly limited, but is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably with respect to 100 parts by mass of the resin solid content in the resin composition. Is 3 to 80 parts by mass. When the content of the phenol resin is within the above range, the adhesiveness and flexibility tend to be more excellent.
- the resin composition of the present embodiment tends to be more excellent in flame retardancy, heat resistance, low water absorption, low dielectric constant, and the like.
- the benzoxazine compound generally known compounds can be used as long as they have two or more dihydrobenzoxazine rings in one molecule, and the kind thereof is not particularly limited. Specific examples include bisphenol A type benzoxazine BA-BXZ (trade name, manufactured by Konishi Chemical) bisphenol F type benzoxazine BF-BXZ (trade name, manufactured by Konishi Chemical), bisphenol S type benzoxazine BS-BXZ (product manufactured by Konishi Chemical). Name). These benzoxazine compounds can be used alone or in combination.
- the content of the benzoxazine compound is not particularly limited, but is preferably 0 to 99 parts by weight, more preferably 1 to 90 parts by weight with respect to 100 parts by weight of the resin solid content in the resin composition.
- the amount is preferably 3 to 80 parts by mass.
- the resin composition of this embodiment contains a compound having a polymerizable unsaturated group, it tends to be superior in heat resistance, toughness, and the like.
- the compound having a polymerizable unsaturated group generally known compounds can be used, and the kind thereof is not particularly limited.
- vinyl compounds such as ethylene, propylene, styrene, divinylbenzene and divinylbiphenyl; methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, polypropylene glycol di ( Mono- or polyhydric alcohol (meth) such as (meth) acrylate, trimethylolpropane di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate Acrylates; Epoxy (meth) acrylates such as bisphenol A type epoxy (meth) acrylate and bisphenol F type epoxy (meth) acrylate; Benzocyclobutene resin; Scan) maleimide resins. These compounds having an unsaturated group can be used alone or in combination.
- the content of the compound having a polymerizable unsaturated group is not particularly limited, but is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts per 100 parts by mass of the resin solid content in the resin composition. Parts by weight, more preferably 3 to 80 parts by weight. When the content of the polymerizable unsaturated group-containing compound is within the above range, the heat resistance and toughness tend to be superior.
- the resin composition of the present embodiment further includes a cyanate ester compound, an epoxy resin, an oxetane resin, a polymerization catalyst that catalyzes the polymerization of a compound having a polymerizable unsaturated group, and A curing accelerator for appropriately adjusting the curing rate can be blended.
- a cyanate ester compound an epoxy resin, an oxetane resin, a polymerization catalyst that catalyzes the polymerization of a compound having a polymerizable unsaturated group
- a curing accelerator for appropriately adjusting the curing rate can be blended.
- the polymerization catalyst and / or curing accelerator generally known ones can be used, and the kind thereof is not particularly limited.
- metal salts such as zinc octylate, zinc naphthenate, cobalt naphthenate, copper naphthenate, and iron acetylacetone
- organometallic salts such as nickel octylate and manganese octylate
- phenol, xylenol, cresol, resorcin Phenol compounds such as catechol, octylphenol and nonylphenol
- alcohols such as 1-butanol and 2-ethylhexanol
- 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 1-cyanoethyl-2-phenylimidazole Derivatives such as 1-cyanoethyl-2-ethyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole Derivatives of these imidazoles such as
- catalysts such as Amicure PN-23 (Ajinomoto Fine Techno Co., NovaCure HX-3721 (Asahi Kasei Co., Ltd.), Fujicure FX-1000 (Fuji Kasei Kogyo Co., Ltd.), etc. These polymerization catalysts and / or curing accelerators can be used alone or in combination.
- the contents of the polymerization catalyst and the curing accelerator can be appropriately adjusted in consideration of the degree of curing of the resin, the viscosity of the resin composition, and the like, and are not particularly limited.
- the resin solid content in the resin composition is 100 masses.
- the amount is preferably 0.005 to 10 parts by mass with respect to parts.
- the resin composition of the present embodiment may include other thermosetting resins, thermoplastic resins and oligomers thereof, various polymer compounds such as elastomers, curing catalysts, curing accelerators, coloring pigments, if necessary.
- the flame retardant generally known ones can be used, and the kind thereof is not particularly limited. Specific examples thereof include bromine compounds such as 4,4′-dibromobiphenyl; phosphoric acid esters, melamine phosphates, phosphorus-containing epoxy resins, nitrogen compounds such as melamine and benzoguanamine; oxazine ring-containing compounds, silicone compounds, and the like. .
- the resin composition which concerns on this embodiment can use an organic solvent as needed.
- the resin composition of this embodiment can be used as an aspect (solution or varnish) in which at least a part, preferably all, of the various resin components described above are dissolved or compatible in an organic solvent.
- the solvent is not particularly limited as long as it can dissolve or be compatible with at least a part, preferably all of the above-described various resin components.
- Specific examples thereof include ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; cellosolv solvents such as propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate; ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, and acetic acid.
- Ester solvents such as isoamyl, ethyl lactate, methyl methoxypropionate and methyl hydroxyisobutyrate; polar solvents such as amides such as dimethylacetamide and dimethylformamide; methanol, ethanol, isopropanol, 1-ethoxy-2-propanol, etc. Alcohol solvents; aromatic hydrocarbons such as toluene, xylene, anisole and the like. These solvents can be used alone or in combination.
- the resin composition of this embodiment can be prepared according to a conventional method. For example, a method in which a resin composition containing the cyanate ester compound (A) and / or maleimide compound (B), the inorganic filler (C), and other optional components described above is obtained is preferable. Specifically, for example, the resin composition of this embodiment can be easily prepared by sequentially blending each component in a solvent and sufficiently stirring.
- an organic solvent can be used as necessary.
- the kind of the organic solvent is not particularly limited as long as it can dissolve the resin in the resin composition. Specific examples thereof are as described above.
- a known process for uniformly dissolving or dispersing each component can be performed.
- a stirring tank provided with a stirrer having an appropriate stirring ability.
- the above stirring, mixing, and kneading treatment can be appropriately performed using, for example, a known device such as a ball mill or a bead mill for mixing, or a revolving or rotating mixing device.
- the prepreg of this embodiment includes a base material (D) and the resin composition of this embodiment impregnated or coated on the base material (D).
- the prepreg of this embodiment can be obtained, for example, by combining the above resin composition with the base material (D), specifically by impregnating or applying the above resin composition to the base material (D). it can.
- the manufacturing method of the prepreg of this embodiment can be performed according to a conventional method, and is not specifically limited.
- the substrate (D) is impregnated or coated with the above resin composition, and then semi-cured (B stage) by heating in a dryer at 100 to 200 ° C. for 1 to 30 minutes. And the method of obtaining a prepreg is mentioned.
- the amount of the resin composition relative to the total amount of prepreg is not particularly limited, but is preferably in the range of 30 to 90% by mass.
- the substrate (D) used in the prepreg of the present embodiment is not particularly limited, and known materials used for various printed wiring board materials are appropriately selected depending on the intended use and performance. Can be used. Specific examples thereof include glass fibers such as E glass, D glass, S glass, Q glass, spherical glass, NE glass and T glass, inorganic fibers other than glass such as quartz, polyparaphenylene terephthalamide (Kevlar), and the like.
- E glass cloth, T glass cloth, S glass cloth, Q glass cloth, and organic fiber are preferable from the viewpoint of low thermal expansion.
- These base materials (D) may be used alone or in combination of two or more.
- a shape of a base material (D) For example, a woven fabric, a nonwoven fabric, roving, a chopped strand mat, a surfacing mat, etc. are mentioned.
- the weaving method of the woven fabric is not particularly limited, and for example, plain weave, Nanako weave, twill weave and the like are known, and can be appropriately selected from these known ones depending on the intended use and performance. .
- a glass woven fabric whose surface is treated with a fiber-opening treatment or a silane coupling agent is preferably used.
- the thickness and mass of the substrate (D) are not particularly limited, those having a thickness of about 0.01 to 0.3 mm are preferably used.
- the base material (D) is preferably a glass woven fabric having a thickness of 200 ⁇ m or less and a mass of 250 g / m 2 or less, and is made of glass fibers such as E glass, S glass, and T glass.
- a glass woven fabric is more preferable.
- the laminated board of the present embodiment is formed by stacking at least one selected from the group consisting of the above prepreg and a resin sheet described later, and at least selected from the group consisting of the above prepreg and resin sheet.
- cured material of the resin composition contained in 1 type is included.
- This laminated board can be obtained by, for example, stacking and curing one or more of the above prepregs.
- the metal foil-clad laminate of the present embodiment has at least one selected from the group consisting of the above prepreg and resin sheet, and at least one type selected from the group consisting of the above prepreg and resin sheet.
- This metal foil-clad laminate can be obtained, for example, by laminating and curing the above prepreg and metal foil.
- the metal foil-clad laminate of this embodiment can be obtained, for example, by laminating at least one prepreg as described above and laminating and forming the metal foil on one or both sides. More specifically, by stacking one or a plurality of the above-mentioned prepregs and arranging a metal foil such as copper or aluminum on one side or both sides as desired, by laminating and forming as necessary A metal foil-clad laminate can be produced.
- the metal foil used here will not be specifically limited if it is used for printed wiring board material, Well-known copper foils, such as a rolled copper foil and an electrolytic copper foil, are preferable.
- the thickness of the metal foil is not particularly limited, but is preferably 1 to 70 ⁇ m, more preferably 1.5 to 35 ⁇ m.
- a multi-stage press, a multi-stage vacuum press, a continuous molding machine, an autoclave molding machine, etc. can be used at the time of forming a metal foil-clad laminate.
- the temperature is generally 100 to 300 ° C.
- the pressure is 2 to 100 kgf / cm 2
- the heating time is generally 0.05 to 5 hours.
- post-curing can be performed at a temperature of 150 to 300 ° C., if necessary.
- a multilayer board can be formed by laminating and combining the above prepreg and a separately prepared wiring board for the inner layer.
- the metal foil-clad laminate of this embodiment can be suitably used as a printed wiring board by forming a predetermined wiring pattern.
- the metal foil-clad laminate of this embodiment has a low coefficient of thermal expansion, good formability, metal foil peel strength, and chemical resistance (particularly desmear resistance), and a semiconductor that requires such performance. It can be used particularly effectively as a printed wiring board for a package.
- the resin sheet of the present embodiment refers to a support and the resin composition layer (laminated sheet) disposed on the surface of the support, and only the resin composition layer from which the support is removed (single layer sheet) ). That is, the resin sheet of this embodiment has at least the resin composition of this embodiment.
- the resin sheet is used as one means for thinning.
- a thermosetting resin (including an inorganic filler) used for a prepreg is directly applied to a support such as a metal foil or a film and dried. Can be manufactured.
- the resin sheet of the present embodiment preferably has a strength ratio (I ⁇ 002> / I ⁇ 100>) of ⁇ 002> X-ray diffraction and ⁇ 100> X-ray diffraction of 30 or less.
- the intensity ratio between ⁇ 002> X-ray diffraction and ⁇ 100> X-ray diffraction is the X-ray in the thickness direction of the resin composition sheet. That is, the ratio of ⁇ 002> diffraction line intensity and ⁇ 100> diffraction line peak intensity (I ⁇ 002> / I ⁇ ) obtained by irradiation at an angle of 90 ° with respect to the sheet length direction. 100>).
- the strength ratio of 30 or less suggests that the orientation is sufficiently high, and the thermal conductivity of the resin sheet tends to be higher.
- the support used in producing the resin sheet of the present embodiment is not particularly limited, and known materials used for various printed wiring board materials can be used. Examples thereof include a polyimide film, a polyamide film, a polyester film, a polyethylene terephthalate (PET) film, a polybutylene terephthalate (PBT) film, a polypropylene (PP) film, a polyethylene (PE) film, an aluminum foil, a copper foil, and a gold foil. Among these, electrolytic copper foil and PET film are preferable.
- the resin sheet of the present embodiment is particularly preferably a resin sheet obtained by applying the above resin composition to a support and then semi-curing (B-stage).
- the resin sheet production method of the present embodiment is preferably a method for producing a composite of a B-stage resin and a support.
- the resin composition is coated on a support such as a copper foil, and then semi-cured by a method of heating in a dryer at 100 to 200 ° C. for 1 to 60 minutes to produce a resin sheet. The method of doing is mentioned.
- the amount of the resin composition attached to the support is preferably in the range of 1 to 300 ⁇ m in terms of the resin thickness of the resin sheet.
- the resin sheet of this embodiment can be used as, for example, a build-up material for a printed wiring board.
- the laminated board of this embodiment can be obtained by, for example, stacking and curing one or more of the above resin sheets.
- the metal foil tension laminated board of this embodiment can be obtained by laminating
- the metal foil-clad laminate of the present embodiment can be obtained by, for example, using the above resin sheet and arranging and laminating metal foil on one side or both sides thereof. More specifically, for example, a single sheet of the above-mentioned resin sheet or a plurality of sheets from which the support is peeled off is stacked, and a metal foil such as copper or aluminum is disposed on one or both sides thereof.
- a metal foil-clad laminate can be produced by laminating as necessary.
- the metal foil used here will not be specifically limited if it is used for printed wiring board material, Well-known copper foils, such as a rolled copper foil and an electrolytic copper foil, are preferable.
- the method for forming the metal foil-clad laminate and the molding conditions thereof There are no particular limitations on the method for forming the metal foil-clad laminate and the molding conditions thereof, and general methods and conditions for a laminate for a printed wiring board and a multilayer board can be applied.
- a multi-stage press, a multi-stage vacuum press, a continuous molding machine, an autoclave molding machine, etc. can be used at the time of forming a metal foil-clad laminate.
- the temperature is generally 100 to 300 ° C.
- the pressure is 2 to 100 kgf / cm 2
- the heating time is generally 0.05 to 5 hours.
- post-curing can be performed at a temperature of 150 to 300 ° C., if necessary.
- the laminate of this embodiment may be a laminate obtained by laminating and curing one or more resin sheets and prepregs each, and is obtained by laminating and curing a resin sheet, prepreg and metal foil. It may be a metal foil-clad laminate.
- the printed wiring board of the present embodiment is a printed wiring board including an insulating layer and a conductor layer formed on the surface of the insulating layer, and the insulating layer includes the resin composition described above.
- the printed wiring board according to the present embodiment is produced, for example, by forming a conductive layer serving as a circuit on an insulating layer by metal foil or electroless plating.
- the conductor layer is generally made of copper or aluminum.
- the insulating layer for printed wiring board on which the conductor layer is formed can be suitably used for a printed wiring board by forming a predetermined wiring pattern.
- the printed wiring board of the present embodiment effectively warps the semiconductor plastic package by maintaining an excellent elastic modulus even under a reflow temperature during semiconductor mounting by including the above resin composition in the insulating layer. Therefore, it can be used particularly effectively as a printed wiring board for semiconductor packages.
- the printed wiring board of the present embodiment can be manufactured by the following method, for example.
- the metal foil-clad laminate such as a copper-clad laminate
- An inner layer circuit is formed by etching the surface of the metal foil-clad laminate to produce an inner layer substrate.
- the inner layer circuit surface of the inner layer substrate is subjected to a surface treatment to increase the adhesive strength as necessary, then the required number of the prepregs are stacked on the inner layer circuit surface, and a metal foil for the outer layer circuit is stacked on the outer side. Then, it is integrally molded by heating and pressing.
- a multilayer laminate is produced in which an insulating layer made of a cured material of the base material and the thermosetting resin composition is formed between the inner layer circuit and the metal foil for the outer layer circuit.
- desmear treatment is performed to remove smears, which are resin residues derived from the resin component contained in the cured product layer.
- a plated metal film is formed on the wall surface of this hole to connect the inner layer circuit and the metal foil for the outer layer circuit, and the outer layer circuit is formed by etching the metal foil for the outer layer circuit to produce a printed wiring board. Is done.
- the prepreg the base material and the resin composition attached thereto
- the resin sheet the resin composition layer of the metal foil-clad laminate (the resin composition described above).
- the layer made of a material constitutes an insulating layer containing the above resin composition.
- the reaction solution was allowed to stand to separate the organic phase and the aqueous phase.
- the obtained organic phase was washed with 2 L of 0.1N hydrochloric acid and then washed 6 times with 2000 g of water.
- the electrical conductivity of the waste water in the sixth washing with water was 20 ⁇ S / cm, and it was confirmed that the ionic compounds that could be removed were sufficiently removed by washing with water.
- the end faces of the hexagonal boron nitride primary particles are observed more than the (0001) face of the hexagonal boron nitride primary particles.
- the aggregate A it was found that 80% or more of the boron nitride primary particles were aggregated with the (0001) planes overlapping. That is, the boron nitride particle aggregate A contained 80% or more of boron nitride particles (boron nitride particle aggregate) in which the (0001) faces of the boron nitride primary particles overlapped and aggregated.
- the number of hexagonal boron nitride primary particles per layer is 1, the longest diameter R in the stacking direction of the boron nitride particle aggregate, and the boron nitride particles
- R 0.66 ⁇ m
- r 0.49 ⁇ m
- R / r 1.35
- R was specified as shown in FIG.
- three boron nitride particle aggregates (boron nitride particle aggregates 1 to 3) having a particularly typical columnar shape are selected, and the particle size is measured by the method described above. did.
- FIG. 3 (a) An SEM observation image is shown in FIG.
- FIG. 3 (a) it was observed that the (0001) plane of many hexagonal boron nitride primary particles faced the upper surface of the sample. That is, a structure in which (0001) of hexagonal boron nitride primary particles overlapped was not observed.
- FIG. 3B it was observed that the surface direction of the end face of the hexagonal boron nitride primary particles partially coincided with the thickness direction of the sample. Boron nitride particles observed in these SEM images were approximated to a rectangle as shown in FIG.
- the longest diameter r ′ in the width direction of the hexagonal boron nitride primary particles is 0.3 to 1.0 ⁇ m, and the longest diameter R ′ in the direction perpendicular to the width direction of the hexagonal boron nitride primary particles is 0.01. It was ⁇ 0.05 ⁇ m. That is, all of the observed hexagonal boron nitride primary particles had R ′ ⁇ 0.3r ′.
- Synthesis Example 2-2 Production of Boron Nitride Particle Aggregate B Except for using hexagonal boron nitride primary particles having an average particle diameter of 1.0 ⁇ m (“MBN-010T” manufactured by Mitsui Chemicals) instead of UHP-S2. Produced boron nitride particle aggregate B in the same manner as in Synthesis Example 2-1. Next, SEM observation was performed in the same manner as in Synthesis Example 2-1, and it was confirmed that the hexagonal boron nitride primary particles had a laminated structure in which the (0001) faces overlap each other.
- MBN-010T average particle diameter of 1.0 ⁇ m
- the boron nitride particle aggregate B contained 20 to 30% of boron nitride particles (boron nitride particle aggregates) aggregated by overlapping (0001) faces of boron nitride primary particles.
- the MBN-010T before the surface treatment with the coupling agent was similarly observed by SEM. As a result, a laminated structure in which the (0001) faces of the hexagonal boron nitride primary particles overlapped could not be confirmed. .
- Example 1-1 50 parts by mass of DABPA-CN (allyl equivalent: 179.2 g / eq.) Obtained in Synthesis Example 1 and a novolac maleimide compound (manufactured by Daiwa Kasei Kogyo Co., Ltd., “BMI-2300”, maleimide functional equivalent 186 g / eq.) 50 parts by mass, 15.0 parts by mass of a silane coupling agent (Z6040, manufactured by Toray Dow Corning Co., Ltd.), and a wetting and dispersing agent containing an acid group (BYK-W903, manufactured by Big Chemie Japan Co., Ltd.) 5.0 1. Part by mass is dissolved and mixed in methyl ethyl ketone.
- a silane coupling agent Z6040, manufactured by Toray Dow Corning Co., Ltd.
- a wetting and dispersing agent containing an acid group BYK-W903, manufactured by Big Chemie Japan Co., Ltd.
- This resin varnish was impregnated and coated on a 0.04 mm T-glass woven fabric and dried by heating at 165 ° C. for 5 minutes to produce a 0.1 mmt prepreg.
- 8 sheets of the obtained prepregs were stacked, and 12 ⁇ m thick electrolytic copper foil (3EC-III, manufactured by Mitsui Mining & Smelting Co., Ltd.) was placed on the upper and lower surfaces of the obtained laminate, and the pressure was 30 kgf / cm 2.
- a metal foil-clad laminate double-sided copper-clad laminate having a thickness of 0.8 mm was produced by performing vacuum pressing at a temperature of 230 ° C. for 120 minutes to perform lamination molding.
- Table 2 shows the results of measurement of the thermal conductivity, copper foil peel strength, and moisture absorption heat resistance of the metal foil-clad laminate of Example 1-1.
- Example 1-2 A composite of metal foil-clad laminate and composite was made in the same manner as in Example 1-1, except that the amount of boron nitride particle aggregate A was changed to 100 parts by mass and the amount of zinc octylate was changed to 0.275 parts by mass. A sheet was prepared. These evaluation results are shown in Table 2.
- Example 1-1 An attempt was made to produce a metal foil-clad laminate in the same manner as in Example 1-1, except that 140 parts by mass of boron nitride particle aggregate A was changed to 140 parts by mass of UHP-S2. However, molding could not be performed due to generation of voids and the like. On the other hand, Table 2 shows the results of producing and evaluating the composite sheet.
- Example 1-2 In the same manner as in Example 1-1, except that 140 parts by mass of boron nitride particle aggregate A was changed to 100 parts by mass of UHP-S2, and the amount of zinc octylate was changed to 0.30 parts by mass, A foil-clad laminate and a composite sheet were prepared. These evaluation results are shown in Table 2.
- Example 2-1 140 parts by mass of boron nitride particle aggregate A was changed to 140 parts by mass of boron nitride particle aggregate B, and the amount of zinc octylate was changed to 0.05 parts by mass in the same manner as in Example 1-1. Thus, a metal foil-clad laminate and a composite sheet were produced. These evaluation results are shown in Table 3.
- Example 2-2 In the same manner as in Example 2-1, except that the amount of boron nitride particle aggregate B was changed to 110 parts by mass and the amount of zinc octylate was changed to 0.175 parts by mass, A composite sheet was prepared. These evaluation results are shown in Table 3.
- Example 2-1 A metal foil-clad laminate was prepared in the same manner as in Example 2-1, except that 140 parts by mass of boron nitride particle aggregate B was changed to 140 parts by mass of MBN-010T. However, molding could not be performed due to generation of voids and the like. On the other hand, Table 3 shows the results of producing and evaluating the composite sheet.
- Example 2-3 In the same manner as in Example 2-1, except that 140 parts by mass of boron nitride particle aggregate B was changed to 110 parts by mass of MBN-010T and the amount of zinc octylate was changed to 0.25 parts by mass, A foil-clad laminate and a composite sheet were prepared. These evaluation results are shown in Table 2.
- the resin composition of the present invention has industrial applicability as a material for prepregs, metal foil-clad laminates, laminated resin sheets, resin sheets, printed wiring boards and the like.
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Abstract
Description
[1]
シアン酸エステル化合物(A)及び/又はマレイミド化合物(B)と、
無機充填材(C)と、
を含む樹脂組成物であって、
前記無機充填材(C)が、六方晶窒化ホウ素一次粒子を含む窒化ホウ素粒子凝集体であって、当該六方晶窒化ホウ素一次粒子の(0001)面同士が重なってなる窒化ホウ素粒子凝集体を含む、樹脂組成物。
[2]
前記窒化ホウ素粒子凝集体が、柱状の形状を有する、[1]に記載の樹脂組成物。
[3]
前記窒化ホウ素粒子凝集体の積層方向の最長径が、前記窒化ホウ素粒子凝集体の幅方向の最長径より大きい、[1]又は[2]に記載の樹脂組成物。
[4]
前記六方晶窒化ホウ素一次粒子が、カップリング剤に由来する成分を有する、[1]~[3]のいずれかに記載の樹脂組成物。
[5]
前記無機充填材(C)の含有量が、樹脂固形分100質量部に対して、1~1600質量部である、[1]~[4]のいずれかに記載の樹脂組成物。
[6]
前記シアン酸エステル化合物(A)が、下記一般式(1)で表されるシアン酸エステル化合物及び式(2)で表されるシアン酸エステル化合物の少なくとも一方を含む、[1]~[5]のいずれかに記載の樹脂組成物。
前記シアン酸エステル化合物(A)の含有量が、樹脂固形分100質量部に対して、1~90質量部である、[1]~[6]のいずれかに記載の樹脂組成物。
[8]
前記マレイミド化合物(B)が、ビス(4-マレイミドフェニル)メタン、2,2-ビス{4-(4-マレイミドフェノキシ)-フェニル}プロパン、ビス(3-エチル-5-メチル-4-マレイミドフェニル)メタン、及び下記一般式(3)で表されるマレイミド化合物からなる群より選ばれる少なくとも1種を含む、[1]~[7]のいずれかに記載の樹脂組成物。
[9]
前記マレイミド化合物(B)の含有量が、樹脂固形分100質量部に対して、1~90質量部である、[1]~[8]のいずれかに記載の樹脂組成物。
[10]
式(1)で表されるシアン酸エステル化合物(A)及び式(2)で表されるシアン酸エステル化合物(A)以外のシアン酸エステル化合物、エポキシ樹脂、オキセタン樹脂、フェノール樹脂、ベンゾオキサジン化合物、並びに重合可能な不飽和基を有する化合物からなる群より選択される1種以上をさらに含む、[6]~[9]のいずれかに記載の樹脂組成物。
[11]
基材(D)と、
前記基材(D)に含浸又は塗布された、[1]~[10]のいずれかに記載の樹脂組成物と、
を備える、プリプレグ。
[12]
[11]に記載のプリプレグと、
前記プリプレグの片面又は両面に配された金属箔と、
を有する金属箔張積層板であって、
前記プリプレグに含まれる樹脂組成物の硬化物を含む、金属箔張積層板。
[13]
[1]~[10]のいずれかに記載の樹脂組成物を有する、樹脂シート。
[14]
絶縁層と、
前記絶縁層の表面に形成された導体層と、
を含むプリント配線板であって、
前記絶縁層が、[1]~[10]のいずれかに記載の樹脂組成物を含む、プリント配線板。
本実施形態の樹脂組成物において、シアン酸エステル化合物(A)は任意成分であり、含まれていなくてもよいが、耐デスミア性及び高熱時弾性率の観点から、本実施形態の樹脂組成物がシアン酸エステル化合物(A)を含むことが好ましい。シアン酸エステル化合物(A)の種類としては、特に限定されないが、例えば、下記一般式(A)で表されるノボラック型シアン酸エステル、下記一般式(1)で表されるシアン酸エステル化合物(ナフトールアラルキル型シアン酸エステル)、式(2)で表されるシアン酸エステル化合物(ジアリルビスフェノールA型シアネート)、ビフェニルアラルキル型シアン酸エステル、ビス(3,3-ジメチル-4-シアナトフェニル)メタン、ビス(4-シアナトフェニル)メタン、1,3-ジシアナトベンゼン、1,4-ジシアナトベンゼン、1,3,5-トリシアナトベンゼン、1,3-ジシアナトナフタレン、1,4-ジシアナトナフタレン、1,6-ジシアナトナフタレン、1,8-ジシアナトナフタレン、2,6-ジシアナトナフタレン、2、7-ジシアナトナフタレン、1,3,6-トリシアナトナフタレン、4、4’-ジシアナトビフェニル、ビス(4-シアナトフェニル)エーテル、ビス(4-シアナトフェニル)チオエーテル、ビス(4-シアナトフェニル)スルホン、2、2-ビス(4-シアナトフェニル)プロパン等が挙げられる。上記したシアン酸エステル化合物(A)は、1種単独で用いてもよいし、2種以上を併用してもよい。本実施形態においては、シアン酸エステル化合物(A)が一般式(1)で表されるシアン酸エステル化合物及び式(2)で表されるシアン酸エステル化合物の少なくとも一方を含むことが好ましい。
なお、本明細書において、「樹脂固形分」とは、特に断りのない限り、樹脂組成物における、溶剤、及び無機充填材(C)を除いた成分をいい、「樹脂固形分100質量部」とは、樹脂組成物における溶剤、及び無機充填材(C)を除いた成分の合計が100質量部であることをいうものとする。
本実施形態の樹脂組成物において、マレイミド化合物(B)は任意成分であり、含まれていなくてもよいが、耐熱性の観点から、本実施形態の樹脂組成物がマレイミド化合物(B)を含むことが好ましい。マレイミド化合物は、分子中に1個以上のマレイミド基を有する化合物であれば、特に限定されるものではない。その好適例としては、N-フェニルマレイミド、N-ヒドロキシフェニルマレイミド、ビス(4-マレイミドフェニル)メタン、2,2-ビス{4-(4-マレイミドフェノキシ)-フェニル}プロパン、ビス(3,5-ジメチル-4-マレイミドフェニル)メタン、ビス(3-エチル-5-メチル-4-マレイミドフェニル)メタン、ビス(3,5-ジエチル-4-マレイミドフェニル)メタン、ポリテトラメチレンオキシド-ビス(4-マレイミドベンゾエート)、下記一般式(3)で表されるマレイミド化合物、これらマレイミド化合物のプレポリマー、若しくはマレイミド化合物とアミン化合物のプレポリマー等が挙げられる。これらは1種を単独で用いてもよいし、2種以上を併用してもよい。本実施形態においては、マレイミド化合物(B)が、ビス(4-マレイミドフェニル)メタン、2,2-ビス{4-(4-マレイミドフェノキシ)-フェニル}プロパン、ビス(3-エチル-5-メチル-4-マレイミドフェニル)メタン、及び下記式(3)で表されるマレイミド化合物からなる群より選ばれる少なくとも1種を含むことが好ましい。その場合、得られる硬化物の熱膨張率がより低下し、耐熱性、ガラス転移温度がより向上する傾向にある。
無機充填材(C)は、六方晶窒化ホウ素一次粒子を含む窒化ホウ素粒子凝集体を含む。この窒化ホウ素粒子凝集体は、六方晶窒化ホウ素一次粒子の(0001)面同士が重なってなる。本実施形態の樹脂組成物中において、窒化ホウ素粒子凝集体が含まれていること、及び当該窒化ホウ素粒子凝集体が後述する好ましい形状を有していることの確認方法としては、例えば、後述する実施例に記載の方法が挙げられる。すなわち、本実施形態の樹脂組成物をSEMで観察することによって容易に確認することができる。なお、樹脂組成物として調製する前の窒化ホウ素粒子凝集体についても、上記と同様にその構成を確認することができる。本実施形態における窒化ホウ素粒子凝集体は、後述する観点から、六方晶窒化ホウ素一次粒子の(0001)面同士が重なった積層構造を維持しやすいということができ、樹脂組成物として調製する段階、当該樹脂組成物を成形する段階等の各段階においてもその構造が維持される傾向にある。すなわち、無機充填材(C)の原料としての窒化ホウ素粒子凝集体が本実施形態の所望の構成を満たすことが確認できていれば、本実施形態の樹脂組成物が当該窒化ホウ素粒子凝集体を含むものということができる。
本実施形態における窒化ホウ素粒子凝集体を構成する六方晶窒化ホウ素一次粒子の粒子形状としては、特に限定されないが、例えば、鱗片状、偏平状、顆粒状、球状、繊維状、ウィスカー状などが挙げられ、中でも鱗片状が好ましい。
ここで、六方晶窒化ホウ素一次粒子の平均粒径は、例えば、湿式レーザー回折・散乱法により測定することができる。
R及びrについて、図1を参照して具体的に説明する。図1(a)に例示された六方晶窒化ホウ素一次粒子は、その典型例として、二次元的に長方形として示したものであり、長辺側(r)が(0001)面に対応しており、短辺側(R)が端面に対応している。図1(b)に例示された窒化ホウ素粒子凝集体は、長方形状の六方晶窒化ホウ素一次粒子が、その長辺側、すなわち、(0001)面側同士を重ねるように凝集したものである。この凝集体の短辺側がr(すなわち、窒化ホウ素粒子凝集体の幅方向の最長径)に対応しており、長辺側がR(すなわち、窒化ホウ素粒子凝集体の積層方向の最長径)に対応している。
本実施形態における窒化ホウ素粒子凝集体は、上述した構成が得られる限り特に限定されないが、好ましくは、次の方法により製造される。すなわち、本実施形態において好ましい窒化ホウ素粒子凝集体の製造方法は、六方晶窒化ホウ素一次粒子にカップリング剤を付加する工程(A)と、工程(A)により得られたカップリング剤が付加した窒化ホウ素一次粒子を、溶媒中で分散する工程(B)と、を含むものである。また、工程(B)より得られた分散液から窒化ホウ素粒子凝集体を分離する工程(C)をさらに含むことがより好ましい。
工程(A)及び工程(B)を含む場合、カップリング剤を付加した六方晶窒化ホウ素一次粒子が、分散液中で表面電荷によって(0001)面同士が凝集し、カップリング剤間で結合相を形成する傾向にあり、本実施形態の所望とする構成を有する窒化ホウ素粒子凝集体が得られやすくなるため好ましい。上記のとおり、本実施形態においては、六方晶窒化ホウ素一次粒子が、カップリング剤に由来する成分を有することが好ましい。
工程(A)の段階において、カップリング剤付加した六方晶窒化ホウ素一次粒子間で結合し、窒化ホウ素粒子凝集体が作製される場合もある。撹拌温度は特に限定されないが、加熱や冷却などの特別な温度コントロールは必要ない。通常、撹拌により温度が上昇するが、200℃以下であることが好ましい。撹拌速度も特に限定されないが、通常10~10000rpmで撹拌することが好ましく、より好ましくは100~3000rpmで撹拌される。撹拌時間は5分~180分が好ましく、有効な撹拌時間と生産性から10分~60分がより好ましい。
溶媒の使用量は、工程(C)における分離時の負荷を低減する観点、及び工程(B)において均一に分散させる観点から、六方晶窒化ホウ素一次粒子に対して0.5~20質量倍とすることが好ましい。
上記の中でも、シリカ、アルミナ、窒化アルミニウム、及び窒化ホウ素からなる群より選ばれる、少なくとも1種を含むことが好ましい。とりわけ、低熱膨張の観点からシリカが好ましく、高熱伝導性の観点からアルミナや窒化アルミニウム、窒化ホウ素が好ましい。
さらに、樹脂組成物における窒化ホウ素粒子凝集体の含有量は、樹脂固形分100質量部に対して、20~200質量部であることが一層好ましく、30~140質量部であることがより一層好ましい。樹脂組成物における窒化ホウ素粒子凝集体の含有量が200質量部以下である場合、より良好な銅箔ピール強度が得られる傾向にあり、20質量部以上とする場合、より優れた熱伝導性が得られる傾向にある。
本実施形態の樹脂組成物は、本実施形態の所望の特性が損なわれない範囲において、上記した成分に加え、他の成分を含むことができる。本実施形態においては、諸物性をより向上させる観点から、式(1)で表されるシアン酸エステル化合物(A)及び式(2)で表されるシアン酸エステル化合物(A)以外のシアン酸エステル化合物、エポキシ樹脂、オキセタン樹脂、フェノール樹脂、ベンゾオキサジン化合物、並びに重合可能な不飽和基を有する化合物からなる群より選択される1種以上をさらに含むことが好ましい。式(1)で表されるシアン酸エステル化合物(A)及び式(2)で表されるシアン酸エステル化合物(A)以外のシアン酸エステル化合物の具体例は、特に限定されないが、前述したとおりのシアン酸エステル化合物が例示される。
本実施形態の樹脂組成物は、エポキシ樹脂を含むことにより、接着性、吸湿耐熱性、可撓性等により優れる傾向にある。エポキシ樹脂としては、1分子中に2個以上のエポキシ基を有する化合物であれば、一般に公知のものを用いることができ、その種類は特に限定されない。その具体例としては、ビスフェノールA型エポキシ樹脂、ビスフェノールE型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビフェニル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、キシレンノボラック型エポキシ樹脂、多官能フェノール型エポキシ樹脂、ナフタレン型エポキシ樹脂、ナフタレン骨格変性ノボラック型エポキシ樹脂、ナフチレンエーテル型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂、アントラセン型エポキシ樹脂、3官能フェノール型エポキシ樹脂、4官能フェノール型エポキシ樹脂、トリグリシジルイソシアヌレート、グリシジルエステル型エポキシ樹脂、脂環式エポキシ樹脂、ジシクロペンタジエンノボラック型エポキシ樹脂、ビフェニルノボラック型エポキシ樹脂、フェノールアラルキルノボラック型エポキシ樹脂、ナフトールアラルキルノボラック型エポキシ樹脂、アラルキルノボラック型エポキシ樹脂、ビフェニルアラルキル型エポキシ樹脂、ナフトールアラルキル型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、ポリオール型エポキシ樹脂、リン含有エポキシ樹脂、グリシジルアミン、ブタジエンなどの二重結合をエポキシ化した化合物、水酸基含有シリコーン樹脂類とエピクロルヒドリンとの反応により得られる化合物、或いはこれらのハロゲン化物等が挙げられる。これらのエポキシ樹脂は、1種を単独で又は2種以上を組み合わせて用いることができる。
本実施形態の樹脂組成物は、オキセタン樹脂を含むことにより、接着性や可撓性等により優れる傾向にある。オキセタン樹脂としては、一般に公知のものを使用でき、その種類は特に限定されない。その具体例としては、オキセタン、2-メチルオキセタン、2,2-ジメチルオキセタン、3-メチルオキセタン、3,3-ジメチルオキセタン等のアルキルオキセタン、3-メチル-3-メトキシメチルオキセタン、3,3’-ジ(トリフルオロメチル)パーフルオキセタン、2-クロロメチルオキセタン、3,3-ビス(クロロメチル)オキセタン、ビフェニル型オキセタン、OXT-101(東亞合成製商品名)、OXT-121(東亞合成製商品名)等が挙げられる。これらのオキセタン樹脂は、1種又は2種以上を組み合わせて用いることができる。
本実施形態の樹脂組成物がフェノール樹脂を含むことにより、接着性や可撓性等により優れる傾向にある。フェノール樹脂としては、1分子中に2個以上のヒドロキシ基を有するフェノール樹脂であれば、一般に公知のものを使用でき、その種類は特に限定されない。その具体例としては、ビスフェノールA型フェノール樹脂、ビスフェノールE型フェノール樹脂、ビスフェノールF型フェノール樹脂、ビスフェノールS型フェノール樹脂、フェノールノボラック樹脂、ビスフェノールAノボラック型フェノール樹脂、グリシジルエステル型フェノール樹脂、アラルキルノボラック型フェノール樹脂、ビフェニルアラルキル型フェノール樹脂、クレゾールノボラック型フェノール樹脂、多官能フェノール樹脂、ナフトール樹脂、ナフトールノボラック樹脂、多官能ナフトール樹脂、アントラセン型フェノール樹脂、ナフタレン骨格変性ノボラック型フェノール樹脂、フェノールアラルキル型フェノール樹脂、ナフトールアラルキル型フェノール樹脂、ジシクロペンタジエン型フェノール樹脂、ビフェニル型フェノール樹脂、脂環式フェノール樹脂、ポリオール型フェノール樹脂、リン含有フェノール樹脂、水酸基含有シリコーン樹脂類等が挙げられるが、特に制限されるものではない。これらのフェノール樹脂は、1種を単独で又は2種以上を組み合わせて用いることができる。
本実施形態の樹脂組成物は、ベンゾオキサジン化合物を含むことにより、難燃性、耐熱性、低吸水性、低誘電等により優れる傾向にある。ベンゾオキサジン化合物としては、1分子中に2個以上のジヒドロベンゾオキサジン環を有する化合物であれば、一般に公知のものを用いることができ、その種類は特に限定されない。その具体例としては、ビスフェノールA型ベンゾオキサジンBA-BXZ(小西化学製商品名)ビスフェノールF型ベンゾオキサジンBF-BXZ(小西化学製商品名)、ビスフェノールS型ベンゾオキサジンBS-BXZ(小西化学製商品名)等が挙げられる。これらのベンゾオキサジン化合物は、1種又は2種以上混合して用いることができる。
本実施形態の樹脂組成物が重合可能な不飽和基を有する化合物を含むことにより、耐熱性や靱性等により優れる傾向にある。重合可能な不飽和基を有する化合物としては、一般に公知のものを使用でき、その種類は特に限定されない。その具体例としては、エチレン、プロピレン、スチレン、ジビニルベンゼン、ジビニルビフェニル等のビニル化合物;メチル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、トリメチロールプロパンジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート等の1価又は多価アルコールの(メタ)アクリレート類;ビスフェノールA型エポキシ(メタ)アクリレート、ビスフェノールF型エポキシ(メタ)アクリレート等のエポキシ(メタ)アクリレート類;ベンゾシクロブテン樹脂;(ビス)マレイミド樹脂等が挙げられる。これらの不飽和基を有する化合物は、1種又は2種以上混合して用いることができる。
本実施形態の樹脂組成物には、上記した化合物ないし樹脂に加えて、更に、シアン酸エステル化合物、エポキシ樹脂、オキセタン樹脂、重合可能な不飽和基を有する化合物の重合を触媒する重合触媒、及び/又は硬化速度を適宜調節するための硬化促進剤を配合することができる。重合触媒及び/又は硬化促進剤としては、一般に公知のものを使用でき、その種類は特に限定されない。その具体例としては、オクチル酸亜鉛、ナフテン酸亜鉛、ナフテン酸コバルト、ナフテン酸銅、アセチルアセトン鉄等の金属塩;オクチル酸ニッケル、オクチル酸マンガン等の有機金属塩類;フェノール、キシレノール、クレゾール、レゾルシン、カテコール、オクチルフェノール、ノニルフェノール等のフェノール化合物;1-ブタノール、2-エチルヘキサノール等のアルコール類;2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-フェニルイミダゾール、1-シアノエチル-2-フェニルイミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール、2-フェニル-4,5-ジヒドロキシメチルイミダゾール、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾール等のイミダゾール誘導体;これらのイミダゾール類のカルボン酸もしくはその酸無水類の付加体等の誘導体;ジシアンジアミド、ベンジルジメチルアミン、4-メチル-N,N-ジメチルベンジルアミン等のアミン化合物;ホスフィン系化合物、ホスフィンオキサイド系化合物、ホスホニウム系化合物、ダイホスフィン系化合物等のリン化合物;エポキシ-イミダゾールアダクト系化合物、ベンゾイルパーオキサイド、p-クロロベンゾイルパーオキサイド、ジ-t-ブチルパーオキサイド、ジイソプロピルパーオキシカーボネート、ジ-2-エチルヘキシルパーオキシカーボネート等の過酸化物;及びアゾビスイソブチロニトリル等のアゾ化合物等が挙げられる。これら触媒は市販のものを使用してもよく、例えば、アミキュアPN?23(味の素ファインテクノ社製、ノバキュアHX?3721(旭化成社製)、フジキュアFX?1000(富士化成工業社製)等が挙げられる。これらの重合触媒及び/又は硬化促進剤は、1種又は2種以上混合して用いることができる。
更に、本実施形態の樹脂組成物は、必要に応じて、他の熱硬化性樹脂、熱可塑性樹脂及びそのオリゴマー、エラストマー類などの種々の高分子化合物、硬化触媒、硬化促進剤、着色顔料、消泡剤、表面調整剤、難燃剤、溶媒、紫外線吸収剤、酸化防止剤、光重合開始剤、蛍光増白剤、光増感剤、染料、顔料、増粘剤、滑剤、流動調整剤、消泡剤、分散剤、レベリング剤、光沢剤、重合禁止剤、シランカップリング剤等の公知の添加剤を含有していてもよい。また、必要に応じて、溶媒を含有していてもよい。これら任意の添加剤は、1種又は2種以上混合して使用することができる。
本実施形態の樹脂組成物は、常法に従って調製することができる。例えば、シアン酸エステル化合物(A)及び/又はマレイミド化合物(B)と、無機充填材(C)と、上記したその他の任意成分とを均一に含有する樹脂組成物が得られる方法が好ましい。具体的には、例えば、各成分を順次溶剤に配合し、十分に攪拌することで本実施形態の樹脂組成物を容易に調製することができる。
本実施形態のプリプレグは、基材(D)と、当該基材(D)に含浸又は塗布された、本実施形態の樹脂組成物と、を備える。本実施形態のプリプレグは、例えば、上記の樹脂組成物を基材(D)と組み合わせる、具体的には、上記の樹脂組成物を基材(D)に含浸又は塗布させることにより、得ることができる。本実施形態のプリプレグの製造方法は、常法にしたがって行うことができ、特に限定されない。例えば、上記の樹脂組成物を基材(D)に含浸又は塗布させた後、100~200℃の乾燥機中で1~30分加熱するなどして半硬化(Bステ-ジ化)させることで、プリプレグを得る方法が挙げられる。なお、本実施形態において、プリプレグの総量に対する上記の樹脂組成物の量は、特に限定されないが、30~90質量%の範囲であることが好ましい。
本実施形態の樹脂シートは、支持体と、その支持体の表面に配された、上記樹脂組成物層(積層シート)とを指し、また支持体を取り除いた樹脂組成物層のみ(単層シート)も指す。すなわち、本実施形態の樹脂シートは、少なくとも、本実施形態の樹脂組成物を有するものである。樹脂シートは、薄葉化の1つの手段として用いられるもので、例えば、金属箔やフィルムなどの支持体に、直接、プリプレグ等に用いられる熱硬化性樹脂(無機充填材を含む)を塗布及び乾燥して製造することができる。
(1)熱伝導率
後述する絶縁層厚さ0.8mmの両面銅張積層板の両面全銅箔をエッチング除去した後、試験片(10mm×10mm×厚さ1mm)を切り出した。この試験片に対し、NETZSCH製キセノンフラッシュアナライザーLFA447型熱伝導率計を用いて、レーザーフラッシュで熱伝導率を測定した。
後述する絶縁層厚さ0.8mmの両面銅張積層板の試験片(30mm×150mm×厚さ0.8mm)を用い、JIS C6481のプリント配線板用銅張積層板試験方法(5.7 引き剥がし強さ参照。)に準じて、銅箔の引き剥がし強度を3回測定し、下限値の平均値を測定値とした。
両面銅張積層板(50mm×50mm×絶縁層厚さ0.8mm)の片面の半分以外の全銅箔をエッチング除去して試験片を得た。得られた試験片を、プレッシャークッカー試験機(平山製作所社製、PC-3型)で121℃、2気圧で1時間又は3時間処理し、その後260℃のはんだの中に60秒浸漬した。3つのサンプルに対し、上記試験をそれぞれ行い、浸漬後の膨れの有無を目視で観察し、下記評価基準により吸湿耐熱性を評価した。すなわち、各実施例及び比較例の吸湿耐熱性は、○と評価されたサンプルの数に応じて0~3の4段階で評価した。
○:異常なし
×:膨れ発生
ジアリルビスフェノールA700g(ヒドロキシル基当量154.2g/eq.)(OH基換算4.54mol)(DABPA、大和化成工業(株)製)及びトリエチルアミン459.4g(4.54mol)(ヒドロキシル基1モルに対して1.0モル)をジクロロメタン2100gに溶解させ、これを溶液1とした。
後述する窒化ホウ素粒子凝集体の形態を確認するため、2.5μm×1.8μm四方の複数のSEM観察像を電子顕微鏡(FE-SEM-EDX(SU8220):株式会社日立ハイテクノロジー社製)により解析した。上記観察範囲に存在する、窒化ホウ素一次粒子の(0001)面が重なって凝集した窒化ホウ素粒子(窒化ホウ素粒子凝集体)のRとrとを測定した。その際、SEM画像において観察された窒化ホウ素粒子を図1(b)に示すような長方形に近似し、Rに相当する辺の長さ及びrに相当する辺の長さを計測した。
平均粒径0.5μmの六方晶窒化ホウ素一次粒子(昭和電工製「UHP-S2」)に対して、カップリング剤としてフェニルトリメトキシラン(東京化成製)を1.5質量%滴下し、ミキサーで攪拌し、カップリング剤を付加した六方晶窒化ホウ素一次粒子を得た。続いて、メチルエチルケトンに上記カップリング剤を付加した六方晶窒化ホウ素一次粒子を加え、超音波分散機で十分に分散し、分散液を得た。この分散液を6時間静置し、上精を取り除き、窒化ホウ素粒子凝集体Aを得た。この窒化ホウ素粒子凝集体Aをさらにエタノール中で超音波分散し、アルミホイルに撒き、溶媒が蒸発した後、カーボンテープに押し付け、窒化ホウ素粒子凝集体AのSEM像を観測した。その結果を図2(a)及び図2(b)に示す。
UHP-S2に代えて、平均粒径1.0μmの六方晶窒化ホウ素一次粒子(三井化学製「MBN-010T」)を用いたこと以外は合成例2-1と同様にして、窒化ホウ素粒子凝集体Bを得た。次いで、合成例2-1と同様にSEM観察を行い、六方晶窒化ホウ素一次粒子の(0001)面同士が重なっている積層構造を有することを確認した。なお、窒化ホウ素粒子凝集体Bは、窒化ホウ素一次粒子の(0001)面が重なって凝集した窒化ホウ素粒子(窒化ホウ素粒子凝集体)を20~30%含むものであった。一方、カップリング剤による表面処理を行う前のMBN-010Tについても、同様にSEM観察を行ったところ、六方晶窒化ホウ素一次粒子の(0001)面同士が重なっている積層構造は確認できなかった。
合成例1で得たDABPA-CN(アリル当量:179.2g/eq.)50質量部と、ノボラック型マレイミド化合物(大和化成工業社製、「BMI-2300」、マレイミド官能当量186g/eq.)50質量部と、シランカップリング剤(Z6040、東レダウコーニング(株)製)15.0質量部と、酸基を含む湿潤分散剤(BYK-W903、ビッグケミー・ジャパン(株)製)5.0質量部とをメチルエチルケトン中で溶解混合し、これに、合成例2-1で得られた窒化ホウ素粒子凝集体A140質量部と、分散剤(ビックケミー・ジャパン社製、「DISPERBYK-161」)1.0質量部、湿潤分散剤1(ビックケミー・ジャパン社製、「DISPERBYK-111」)1.0質量部、湿潤分散剤2(ビックケミー・ジャパン社製、「DISPERBYK-2009」)0.3質量部、トリフェニルイミダゾール(東京化成工業社製、硬化促進剤)0.50質量部、オクチル酸亜鉛(日本化学産業株式会社製、商標ニッカオクチックス亜鉛、金属含有量18%)を0.025質量部加えて混合し、メチルエチルケトンで希釈することで固形分濃度が65wt%の樹脂ワニスを得た。
この樹脂ワニスを0.04mmのTガラス織布に含浸塗工し、165℃で5分間加熱乾燥することにより0.1mmmtのプリプレグを作製した。
次に、得られたプリプレグを8枚重ね合わせ、得られた積層体の上下面に12μm厚の電解銅箔(3EC-III、三井金属鉱業(株)製)を配置し、圧力30kgf/cm2、温度230℃、120分間の真空プレスを行い積層成形することで、厚さ0.8mmの金属箔張り積層板(両面銅張積層板)を作製した。
実施例1-1の金属箔張り積層板の熱伝導率、銅箔ピール強度及び吸湿耐熱性を測定した結果を表2に示す。
窒化ホウ素粒子凝集体Aの配合量を100質量部に変更し、オクチル酸亜鉛の配合量を0.275質量部に変更した以外は実施例1-1と同様にして金属箔張り積層板と複合シートとを作製した。これらの評価結果を表2に示す。
140質量部の窒化ホウ素粒子凝集体Aを140質量部のUHP-S2に変更した以外は実施例1-1と同様にして、金属箔張り積層板の作製を試みた。しかし、ボイド等の発生により成形ができなかった。一方、複合シートを作製し、評価した結果を表2に示す。
140質量部の窒化ホウ素粒子凝集体Aを100質量部のUHP-S2に変更し、オクチル酸亜鉛の配合量を0.30質量部に変更した以外は実施例1-1と同様にして、金属箔張り積層板と複合シートとを作製した。これらの評価結果を表2に示す。
140質量部の窒化ホウ素粒子凝集体Aを140質量部の窒化ホウ素粒子凝集体Bに変更し、オクチル酸亜鉛の配合量を0.05質量部に変更した以外は実施例1-1と同様にして、金属箔張り積層板と複合シートとを作製した。これらの評価結果を表3に示す。
窒化ホウ素粒子凝集体Bの配合量を110質量部に変更し、オクチル酸亜鉛の配合量を0.175質量部に変更した以外は実施例2-1と同様にして、金属箔張り積層板と複合シートとを作製した。これらの評価結果を表3に示す。
140質量部の窒化ホウ素粒子凝集体Bを140質量部のMBN-010Tに変更した以外は実施例2-1と同様にして、金属箔張り積層板の作製を試みた。しかし、ボイド等の発生により成形ができなかった。一方、複合シートを作製し、評価した結果を表3に示す。
140質量部の窒化ホウ素粒子凝集体Bを130質量部のMBN-010Tに変更し、オクチル酸亜鉛をオクチル酸マンガン(日本化学産業株式会社製、商標ニッカオクチックスマンガン、金属含有量8%)0.01質量部に変更し、樹脂ワニスを塗工するガラスクロスを0.04mmのEガラス織布に変更した以外は実施例2-1と同様にして、金属箔張り積層板と複合シートとを作製した。これらの評価結果を表3に示す。
140質量部の窒化ホウ素粒子凝集体Bを110質量部のMBN-010Tに変更し、オクチル酸亜鉛の配合量を0.25質量部に変更した以外は実施例2-1と同様にして、金属箔張り積層板と複合シートとを作製した。これらの評価結果を表2に示す。
Claims (14)
- シアン酸エステル化合物(A)及び/又はマレイミド化合物(B)と、
無機充填材(C)と、
を含む樹脂組成物であって、
前記無機充填材(C)が、六方晶窒化ホウ素一次粒子を含む窒化ホウ素粒子凝集体であって、当該六方晶窒化ホウ素一次粒子の(0001)面同士が重なってなる窒化ホウ素粒子凝集体を含む、樹脂組成物。 - 前記窒化ホウ素粒子凝集体が、柱状の形状を有する、請求項1に記載の樹脂組成物。
- 前記窒化ホウ素粒子凝集体の積層方向の最長径が、前記窒化ホウ素粒子凝集体の幅方向の最長径より大きい、請求項1又は2に記載の樹脂組成物。
- 前記六方晶窒化ホウ素一次粒子が、カップリング剤に由来する成分を有する、請求項1~3のいずれか一項に記載の樹脂組成物。
- 前記無機充填材(C)の含有量が、樹脂固形分100質量部に対して、1~1600質量部である、請求項1~4のいずれか一項に記載の樹脂組成物。
- 前記シアン酸エステル化合物(A)の含有量が、樹脂固形分100質量部に対して、1~90質量部である、請求項1~6のいずれか一項に記載の樹脂組成物。
- 前記マレイミド化合物(B)の含有量が、樹脂固形分100質量部に対して、1~90質量部である、請求項1~8のいずれか一項に記載の樹脂組成物。
- 式(1)で表されるシアン酸エステル化合物(A)及び式(2)で表されるシアン酸エステル化合物(A)以外のシアン酸エステル化合物、エポキシ樹脂、オキセタン樹脂、フェノール樹脂、ベンゾオキサジン化合物、並びに重合可能な不飽和基を有する化合物からなる群より選択される1種以上をさらに含む、請求項6~9のいずれか一項に記載の樹脂組成物。
- 基材(D)と、
前記基材(D)に含浸又は塗布された、請求項1~10のいずれか一項に記載の樹脂組成物と、
を備える、プリプレグ。 - 請求項11に記載のプリプレグと、
前記プリプレグの片面又は両面に配された金属箔と、
を有する金属箔張積層板であって、
前記プリプレグに含まれる樹脂組成物の硬化物を含む、金属箔張積層板。 - 請求項1~10のいずれか一項に記載の樹脂組成物を有する、樹脂シート。
- 絶縁層と、
前記絶縁層の表面に形成された導体層と、
を含むプリント配線板であって、
前記絶縁層が、請求項1~10のいずれか一項に記載の樹脂組成物を含む、プリント配線板。
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008510878A (ja) * | 2004-08-23 | 2008-04-10 | ゼネラル・エレクトリック・カンパニイ | 熱伝導性組成物およびその作製方法 |
WO2011152402A1 (ja) | 2010-06-02 | 2011-12-08 | 三菱瓦斯化学株式会社 | 樹脂組成物およびこれを用いたプリプレグ及び積層板 |
WO2012121224A1 (ja) | 2011-03-07 | 2012-09-13 | 三菱瓦斯化学株式会社 | 樹脂組成物ならびにこれを用いたプリプレグおよび積層板 |
WO2013069479A1 (ja) | 2011-11-07 | 2013-05-16 | 三菱瓦斯化学株式会社 | 樹脂組成物、これを用いたプリプレグ及び積層板 |
WO2013081061A1 (ja) * | 2011-11-29 | 2013-06-06 | 三菱化学株式会社 | 窒化ホウ素凝集粒子、該粒子を含有する組成物、及び該組成物からなる層を有する三次元集積回路 |
JP2013543834A (ja) * | 2010-11-10 | 2013-12-09 | イーエスケイ セラミクス ゲーエムベーハー アンド カンパニー カーゲー | 窒化ホウ素凝集体、その製造方法およびその使用 |
JP2014208818A (ja) * | 2013-03-28 | 2014-11-06 | 三菱化学株式会社 | 積層型半導体装置の層間充填材用の組成物、積層型半導体装置、および積層型半導体装置の製造方法 |
JP2015209529A (ja) * | 2014-04-30 | 2015-11-24 | 日東電工株式会社 | 熱伝導性ポリマー組成物及び熱伝導性成形体 |
JP2016113592A (ja) * | 2014-12-18 | 2016-06-23 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ、金属箔張積層板及びプリント配線板 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5898009A (en) * | 1996-03-19 | 1999-04-27 | Advanced Ceramics Corporation | High density agglomerated boron nitride particles |
US7445797B2 (en) | 2005-03-14 | 2008-11-04 | Momentive Performance Materials Inc. | Enhanced boron nitride composition and polymer-based compositions made therewith |
US7976941B2 (en) | 1999-08-31 | 2011-07-12 | Momentive Performance Materials Inc. | Boron nitride particles of spherical geometry and process for making thereof |
US20060121068A1 (en) | 1999-08-31 | 2006-06-08 | General Electric Company | Boron nitride particles of spherical geometry and process for making thereof |
US20070241303A1 (en) | 1999-08-31 | 2007-10-18 | General Electric Company | Thermally conductive composition and method for preparing the same |
US6764975B1 (en) * | 2000-11-28 | 2004-07-20 | Saint-Gobain Ceramics & Plastics, Inc. | Method for making high thermal diffusivity boron nitride powders |
US20070259211A1 (en) * | 2006-05-06 | 2007-11-08 | Ning Wang | Heat spread sheet with anisotropic thermal conductivity |
EP2716676B1 (en) * | 2011-05-27 | 2016-04-13 | Mitsubishi Gas Chemical Company, Inc. | Resin composition, prepreg and laminate |
CN104379668B (zh) * | 2012-06-12 | 2016-12-07 | 三菱瓦斯化学株式会社 | 树脂组合物、预浸料、覆金属箔层叠板及印刷布线板 |
JP6249345B2 (ja) * | 2013-03-22 | 2017-12-20 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ、積層板及びプリント配線板 |
WO2014157626A1 (ja) | 2013-03-28 | 2014-10-02 | 三菱化学株式会社 | 積層型半導体装置の層間充填材用の組成物、積層型半導体装置、および積層型半導体装置の製造方法 |
KR20160140258A (ko) * | 2015-05-29 | 2016-12-07 | 삼성전기주식회사 | 패키지용 수지 조성물, 이를 이용한 절연 필름 및 인쇄회로기판 |
-
2017
- 2017-08-23 KR KR1020197009398A patent/KR102208589B1/ko active IP Right Grant
- 2017-08-23 JP JP2017565326A patent/JP6319533B1/ja active Active
- 2017-08-23 WO PCT/JP2017/030202 patent/WO2018038179A1/ja active Application Filing
- 2017-08-23 EP EP17843657.2A patent/EP3375822B1/en active Active
- 2017-08-23 CN CN201780005157.5A patent/CN108431133B/zh active Active
- 2017-08-23 US US16/063,429 patent/US10689496B2/en active Active
- 2017-08-23 KR KR1020187018042A patent/KR20180080336A/ko active Application Filing
- 2017-08-24 TW TW106128694A patent/TWI715799B/zh active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008510878A (ja) * | 2004-08-23 | 2008-04-10 | ゼネラル・エレクトリック・カンパニイ | 熱伝導性組成物およびその作製方法 |
WO2011152402A1 (ja) | 2010-06-02 | 2011-12-08 | 三菱瓦斯化学株式会社 | 樹脂組成物およびこれを用いたプリプレグ及び積層板 |
JP2013543834A (ja) * | 2010-11-10 | 2013-12-09 | イーエスケイ セラミクス ゲーエムベーハー アンド カンパニー カーゲー | 窒化ホウ素凝集体、その製造方法およびその使用 |
WO2012121224A1 (ja) | 2011-03-07 | 2012-09-13 | 三菱瓦斯化学株式会社 | 樹脂組成物ならびにこれを用いたプリプレグおよび積層板 |
WO2013069479A1 (ja) | 2011-11-07 | 2013-05-16 | 三菱瓦斯化学株式会社 | 樹脂組成物、これを用いたプリプレグ及び積層板 |
WO2013081061A1 (ja) * | 2011-11-29 | 2013-06-06 | 三菱化学株式会社 | 窒化ホウ素凝集粒子、該粒子を含有する組成物、及び該組成物からなる層を有する三次元集積回路 |
JP2015006985A (ja) * | 2011-11-29 | 2015-01-15 | 三菱化学株式会社 | 窒化ホウ素凝集粒子、窒化ホウ素凝集粒子を含有する組成物、及び該組成物からなる層を有する三次元集積回路 |
JP2014208818A (ja) * | 2013-03-28 | 2014-11-06 | 三菱化学株式会社 | 積層型半導体装置の層間充填材用の組成物、積層型半導体装置、および積層型半導体装置の製造方法 |
JP2015209529A (ja) * | 2014-04-30 | 2015-11-24 | 日東電工株式会社 | 熱伝導性ポリマー組成物及び熱伝導性成形体 |
JP2016113592A (ja) * | 2014-12-18 | 2016-06-23 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ、金属箔張積層板及びプリント配線板 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3786230A4 (en) * | 2018-04-27 | 2021-06-09 | Mitsubishi Gas Chemical Company, Inc. | THERMOSETTING COMPOSITION, PRE-IMPREGNATED, METAL SHEET PLATED LAMINATE, RESIN SHEET AND PRINTED CIRCUIT BOARD |
US11939447B2 (en) | 2018-04-27 | 2024-03-26 | Mitsubishi Gas Chemical Company, Inc. | Thermosetting composition, prepreg, metal foil-clad laminate, resin sheet, and printed wiring board |
TWI854977B (zh) | 2018-04-27 | 2024-09-11 | 日商三菱瓦斯化學股份有限公司 | 熱硬化性組成物、預浸體、覆金屬箔疊層板、樹脂片及印刷配線板 |
KR102728873B1 (ko) * | 2018-04-27 | 2024-11-11 | 미츠비시 가스 가가쿠 가부시키가이샤 | 열경화성 조성물, 프리프레그, 금속박 피복 적층판, 수지 시트 및 프린트 배선판 |
CN111662592A (zh) * | 2020-07-16 | 2020-09-15 | 焦作卓立膜材料有限责任公司 | 一种抗静电阻燃热转印碳带用油墨及其制备方法 |
CN111662592B (zh) * | 2020-07-16 | 2022-08-30 | 焦作卓立膜材料股份有限公司 | 一种抗静电阻燃热转印碳带用油墨及其制备方法 |
CN113956481A (zh) * | 2021-09-07 | 2022-01-21 | 江苏诺德新材料股份有限公司 | 一种5g高频高速覆铜板用树脂组合物、半固化片及层压板 |
WO2024154715A1 (ja) * | 2023-01-16 | 2024-07-25 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ、樹脂シート、積層板、金属箔張積層板、及びプリント配線板 |
WO2024202840A1 (ja) * | 2023-03-31 | 2024-10-03 | パナソニックIpマネジメント株式会社 | 樹脂組成物、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及び配線板 |
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WO2018038179A9 (ja) | 2018-07-26 |
EP3375822A4 (en) | 2019-09-04 |
US20190153177A1 (en) | 2019-05-23 |
JPWO2018038179A1 (ja) | 2018-08-30 |
TWI715799B (zh) | 2021-01-11 |
KR102208589B1 (ko) | 2021-01-27 |
KR20190038689A (ko) | 2019-04-08 |
KR20180080336A (ko) | 2018-07-11 |
EP3375822B1 (en) | 2020-03-11 |
CN108431133B (zh) | 2019-06-14 |
TW201815957A (zh) | 2018-05-01 |
CN108431133A (zh) | 2018-08-21 |
US10689496B2 (en) | 2020-06-23 |
JP6319533B1 (ja) | 2018-05-09 |
EP3375822A1 (en) | 2018-09-19 |
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