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WO2016086470A1 - 基板清洗装置和使用其清洗基板的方法 - Google Patents

基板清洗装置和使用其清洗基板的方法 Download PDF

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Publication number
WO2016086470A1
WO2016086470A1 PCT/CN2014/094526 CN2014094526W WO2016086470A1 WO 2016086470 A1 WO2016086470 A1 WO 2016086470A1 CN 2014094526 W CN2014094526 W CN 2014094526W WO 2016086470 A1 WO2016086470 A1 WO 2016086470A1
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WO
WIPO (PCT)
Prior art keywords
substrate
water
sprinkler
shield
blower
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Application number
PCT/CN2014/094526
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English (en)
French (fr)
Inventor
邓海峰
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深圳市华星光电技术有限公司
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Publication of WO2016086470A1 publication Critical patent/WO2016086470A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0211—Case coverings

Definitions

  • the present invention relates to the field of liquid crystal display manufacturing, and in particular to a substrate cleaning apparatus.
  • the present invention also relates to a method of cleaning a substrate using such a substrate cleaning apparatus.
  • the yield of a liquid crystal panel is affected by many factors, for example, a spot generated in a process of a field effect transistor (i.e., TFT) (i.e., Mura) has a significant influence on the panel, thereby greatly affecting the yield of the liquid crystal panel.
  • TFT field effect transistor
  • the wet process in the TFT process generally includes a strong acid or strong base (i.e., pharmaceutical) process followed by a water wash process in which a strong acid or alkali process is used for etching, and a water wash process is used to rinse away the etchant.
  • the water washing process is usually carried out by uniformly applying a water film on the substrate using a water jet to quickly wash off the residual liquid on the substrate.
  • a water jet to quickly wash off the residual liquid on the substrate.
  • the water droplets in the external environment may drip onto the substrate before the substrate contacts the water jet, and finally cause irreparable spots on the prepared liquid crystal panel, the yield of the liquid crystal panel is seriously affected.
  • the present invention proposes a substrate cleaning apparatus.
  • the substrate is cleaned by using the substrate cleaning device according to the present invention, water droplets in the external environment do not drip onto the substrate, thereby avoiding a situation in which the substrate has different etching degrees, and thereby avoiding irreparable spots of the liquid crystal panel. problem.
  • a substrate cleaning apparatus comprising: a shroud including a top plate and a side wall extending downward from the top plate, a sprinkler disposed within the shroud, a width of the shroud and the sprinkler The width of the substrate is covered and the sidewall extends to near the surface of the substrate.
  • the shield covers the substrate.
  • the water droplets in the external environment can only fall onto the shield rather than the substrate.
  • the chemical liquid film remaining on the substrate is not partially diluted, and the overall etching degree of the substrate is the same.
  • the unrecoverable spots of the liquid crystal panel are fundamentally avoided, and the yield of the liquid crystal panel is improved.
  • the width of the water sprayer covers the width of the substrate, the water sprayer can form a uniform water film on the substrate, that is, uniformly dilute the chemical liquid remaining on the substrate, which also ensures the substrate.
  • the overall etching degree is the same, and the yield of the liquid crystal panel is finally improved.
  • the sprinkler includes a water nozzle that is adjustable in direction. In this way, the water spray direction of the water sprayer can be adjusted at any time according to the actual situation, thereby ensuring a uniform water film on the substrate.
  • the water nozzle is angled forward. In this way, the water sprayed by the water sprayer can more effectively wash the surface of the substrate, thereby improving the cleaning effect of the substrate.
  • the sprinkler is a water jet. The water jet can spray a very thin water curtain, which is very beneficial to control the amount of water sprayed onto the substrate, so as not only to clean the substrate but also to save water.
  • a blower for forming a directional airflow over the surface of the substrate is also disposed behind the sprinkler.
  • the blower is a wind knife.
  • the blower includes a gas nozzle that is positioned adjacent the intersection of the substrate and the intersection of the line at which the water nozzle is located and the substrate. In this way, the wind generated by the blower will blow the water sprayer onto the water on the substrate to prevent the water from spreading backward. Thereby, it is possible to prevent the chemical liquid remaining on the substrate from being unevenly diluted to cause the etching degree of the substrate to be different, thereby avoiding occurrence of irreparable spots on the prepared liquid crystal panel.
  • the height of the blower is lower than the height of the sprinkler. In this way, the air flow from the blower is not blocked, but is directly blown onto the substrate, thereby further preventing the water sprayed onto the substrate from the sprayer from diffusing backward.
  • the apparatus further includes a pumping assembly having an exhaust port disposed on the top plate of the shroud.
  • the air suction component can remove the water vapor in the shield, thereby preventing the water vapor in the shield from condensing into water droplets dripping onto the substrate, thereby avoiding uneven etching of the residual liquid on the substrate and causing different etching degrees of the substrate. , thereby avoiding irreparable spots on the LCD panel.
  • a method of cleaning a substrate using the apparatus described above comprising: passing a substrate through a shroud in a rear-to-front direction, and adjusting a water nozzle of the sprinkler to The slanting is toward the front to wash the water onto the substrate for cleaning.
  • a pumping assembly is also included within the apparatus to draw moisture out of the shroud.
  • a blower is also disposed behind the sprinkler, the blower forming a forward directional airflow over the surface of the substrate to blow water on the substrate forward.
  • orientation term “front” refers to the direction in which the substrate moves.
  • rear refers to the opposite direction to "front”.
  • the substrate cleaning device includes a shield, and the water droplets in the external environment can only fall onto the shield at most until the substrate encounters the water sprayer. Not on the substrate. Thereby, the chemical liquid film remaining on the substrate is not partially diluted, and the overall etching degree of the substrate is the same. In this way, the unrecoverable spots of the liquid crystal panel are fundamentally avoided, and the yield of the liquid crystal panel is improved.
  • the water sprayer Since the width of the water sprayer covers the width of the substrate, the water sprayer can form a uniform water film on the substrate, that is, uniformly dilute the chemical liquid remaining on the substrate, which also ensures the substrate The overall etching degree is the same, and finally the yield of the liquid crystal panel is improved.
  • Fig. 1 schematically shows a side view of a substrate cleaning apparatus according to the present invention.
  • Fig. 2 is a view taken along the line A in Fig. 1;
  • Fig. 3 schematically shows a state in which the substrate cleaning apparatus according to the present invention is in use.
  • Fig. 1 schematically shows a side view of a substrate cleaning apparatus 10 (hereinafter referred to as apparatus 10) according to the present invention.
  • the apparatus 10 includes a shroud 11 and a sprinkler 12 disposed within the shroud 11.
  • the shroud 11 includes a top plate 13 and side walls 14 extending downward from the top plate 13.
  • the device 10 can also include a bracket 15 (as in Figure 3) as desired.
  • the width of the shroud 11 and the sprinkler 12 covers the width of the substrate, And the side wall 14 extends to the vicinity of the surface of the substrate.
  • the shield 11 integrally covers the substrate 31, so that the water droplets in the external environment can only fall to the shield at most before the substrate 31 encounters the water sprayer 12. 11 on.
  • the width of the water sprinkler 12 covers the width of the substrate 31, the water sprinkler 12 can form a uniform water film on the substrate 31, that is, uniformly dilute the chemical liquid remaining on the substrate 31.
  • the overall etching degree of the substrate 31 is the same, which fundamentally avoids irreparable spots on the liquid crystal panel and improves the yield of the liquid crystal panel.
  • the water nozzle 22 of the water sprayer 12 can be disposed obliquely forward.
  • the sprinkler 12 can be a water jet.
  • the water jet can eject a very thin water curtain, which is very advantageous for controlling the amount of water sprayed onto the substrate 31, thereby not only effectively cleaning the substrate 31 but also greatly saving water.
  • the water nozzle 22 of the sprinkler 12 can also be configured to be adjustable. Thus, the direction of the water nozzle 22 can be adjusted according to actual conditions, for example, the relative heights of the substrate 31 and the shroud 11, to ensure the cleaning effect of the substrate 31, which also expands the range of use of the device 10.
  • a blower 16 is also provided within the shroud 11, and a blower 16 is disposed behind the sprinkler 12.
  • the blower 16 is for forming a directional airflow on the surface of the substrate 31.
  • the air nozzle 23 of the blower 16 is disposed such that the intersection of the straight line and the substrate 31 is located behind the intersection of the line where the water nozzle 22 is located and the substrate 31, and as much as possible adjacent.
  • the wind generated by the blower 16 will blow the water sprayer 12 to the water on the substrate 31 to prevent the water from diffusing backward.
  • the liquid chemical on the area of the substrate 31 behind the water sprinkler 12 is not diluted by the water gradually diffused from the front, and in particular, is not diluted to a different level as the water diffuses.
  • the problem that the chemical liquid remaining on the substrate 31 is unevenly diluted to cause the etching degree of the substrate 31 to be different is prevented, thereby preventing the liquid crystal panel to be formed from irreparable spots.
  • the airflow generated by the blower 16 can also blow away the liquid medicine on the substrate 31, thereby improving the cleaning efficiency of the substrate 31.
  • the blower 16 is a wind knife. The airflow generated by the air knife is very directional, which helps to control the direction of the airflow on the surface of the substrate 31.
  • the blower 16 is also set to a height that is lower than the height of the sprinkler 12.
  • the airflow from the blower 16 does not receive any blocking upon reaching the substrate 31, that is, the airflow is completely blown onto the substrate 31, so that the water sprayed onto the substrate 31 by the water sprayer 12 can be prevented from being diffused rearward.
  • the apparatus 10 further includes a pumping assembly 21 (shown in FIG. 1) on the top plate 13 of the shroud 11.
  • An exhaust port 17 is provided (as shown in FIG. 2).
  • Two exhaust ports 17 are shown schematically in Figure 2, and in practice a plurality of exhaust ports can be provided as desired.
  • the suction assembly 21 is capable of pumping away moisture in the shield 11.
  • the moisture in the shield 11 is no longer condensed into water droplets but is drawn outside the shield 11, so that no water drops drip onto the substrate, causing uneven dilution of the medicine remaining on the substrate 31. liquid. This ensures that the etching degree of the substrate 31 is the same, thereby avoiding irreparable spots on the liquid crystal panel.
  • the substrate 31 is passed through the device 10 in a rear-to-front direction (as indicated by an arrow 30 in FIG. 3), and the water nozzle 22 of the sprinkler 12 is adjusted to be obliquely forward toward the front. Water is sprayed on the substrate 31 to clean the substrate 31.
  • the pumping assembly of the apparatus 10 is activated to draw moisture out of the shield 11. More preferably, the hair dryer 16 mounted within the shield 11 is activated. Since the blower 16 is disposed at the rear of the sprinkler 12, the blower 16 can form a forward directional airflow on the surface of the substrate 31 to blow the water on the substrate 31 forward.
  • the cleaning method of the present invention it is possible to prevent the chemical liquid remaining on the substrate 31 from being partially diluted, thereby ensuring that the etching degree of the substrate 31 is the same, thereby preventing the liquid crystal panel from being spotted.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

基板清洗装置和使用其清洗基板的方法，该基板清洗装置包括护罩，其包括顶板和从顶板向下延伸的侧壁，设置在护罩内的喷水器。护罩和喷水器的宽度覆盖了基板的宽度，并且侧壁延伸到基板表面附近。在使用该基板清洗装置清洗基板时，外界环境中的水滴不会滴落到基板上，从而避免了基板出现蚀刻程度不同的状况，并且由此避免了液晶面板出现不可修复的斑点的问题。

Description

基板清洗装置和使用其清洗基板的方法
相关申请的交叉引用
本申请要求享有于2014年12月2日提交的名称为“基板清洗装置和使用其清洗基板的方法”的中国专利申请CN201410719858.3的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本发明涉及液晶显示器制造领域，特别涉及一种基板清洗装置。本发明还涉及使用这种基板清洗装置来清洗基板的方法。
背景技术
在液晶面板快速发展的今天，产品的成品率提升日显重要。产品成品率决定产品的市场竞争力和工厂的生命力。
液晶面板的成品率受很多因素的影响，例如在场效应晶体管(即，TFT)的制程工艺中产生的斑点(即，Mura)会对面板产生重大影响，从而极大的影响液晶面板的成品率。
TFT制程工艺中的湿制程通常包括强酸或强碱(即，药剂)制程和之后的水洗制程，其中强酸或强碱制程用以进行蚀刻，水洗制程用以冲洗掉这些蚀刻药剂。水洗制程通常通过以下方式来实现：使用水刀在基板上均匀地涂布一层水膜以快速洗掉基板上残留的药液。但是，由于外界环境中的水滴会在基板接触到水刀之前滴落到基板上，并最终导致所制备的液晶面板出现不可修复的斑点，从而严重影响液晶面板的成品率。
发明内容
针对上述问题，本发明提出了一种基板清洗装置。在使用根据本发明的基板清洗装置清洗基板时，外界环境中的水滴不会滴落到基板上，从而避免了基板出现蚀刻程度不同的状况，并由此避免了液晶面板出现不可修复的斑点的问题。
根据本发明的第一方面的基板清洗装置，包括：护罩，该护罩包括顶板和从顶板向下延伸的侧壁，设置在护罩内的喷水器，护罩和喷水器的宽度覆盖了基板的宽度，并且侧壁延伸到基板表面附近。
在使用根据本发明的基板清洗装置来清洗基板时，护罩遮盖了基板。这样，在基板遇到喷水器之前，外界环境中的水滴最多只能落到护罩上而不是基板上。由此，残留在基板上的药剂液膜也就不会被局部地稀释，从而基板的整体蚀刻程度会为相同。这样，就从根本上避免了液晶面板出现不可修复的斑点，提高了液晶面板的成品率。此外，由于喷水器的宽度覆盖了基板的宽度，因此喷水器能在基板上形成一层均匀的水膜，即对残留在基板上的药液进行均匀地稀释，这也保证了基板的整体蚀刻程度均相同，并且最终提高了液晶面板的成品率。
在一个实施例中，喷水器包括方向能调整的水喷嘴。这样，能够根据实际情况随时调整喷水器的喷水方向，从而保证能在基板上形成一层均匀的水膜。在一个实施例中，水喷嘴斜朝向前方。这样，喷水器喷出的水能够更有效地冲刷基板的表面，提高了基板的清洗效果。在一个实施例中，喷水器为水刀。水刀能够喷出厚度非常薄的水幕，非常有利于控制喷到基板上的水量，以不但实现清洗基板而且能够大幅度节省用水。
在一个实施例中，在护罩内，在喷水器的后方还设置有用于在基板表面上形成定向气流的吹风器。在一个优选的实施例中，吹风器为风刀。
在一个实施例中，吹风器包括气喷嘴，该气喷嘴所处的直线与基板的交点相邻地处于水喷嘴所处的直线与基板的交点的后方。这样，吹风器产生的风会向前吹动喷水器喷到基板上水，防止水向后扩散。由此，能够防止基板上残留的药液被不均匀地稀释而造成基板的蚀刻程度不同，从而避免了所制备的液晶面板出现不可修复的斑点。
在一个实施例中，吹风器的高度低于喷水器的高度。这样，来自吹风器的气流不会受到任何阻挡，而是直接吹在基板上，从而能进一步防止喷水器喷到基板上的水向后扩散。
在一个实施例中，该装置还包括抽气组件，在护罩的顶板上设置有排气口。抽气组件能够将护罩内的水汽抽走，从而避免了护罩内的水汽凝结成滴落到基板上的水滴，也就避免了基板上残留的药液的不均匀稀释造成基板蚀刻程度不同，进而避免了液晶面板出现不可修复的斑点。
根据本发明的第二方面，提出了一种使用上文所述的装置来清洗基板的方法，包括：将基板沿从后到前的方向穿过护罩，将喷水器的水喷嘴调整为斜朝向前方，以向基板上喷水而实现清洗。
在一个实施例中，装置内还包括抽气组件，以将护罩内水汽抽走。
在一个实施例中，在护罩内，在喷水器的后方还设置有吹风器，吹风器在基板表面上形成向前的定向气流以向前吹动基板上的水。
在本申请中，方位用语“前方”是指基板运动的方向。方位用语“后方”是指与“前方”相反的方向。
与现有技术相比，本发明的优点在于：(1)根据本发明的基板清洗装置包括护罩，在基板遇到喷水器之前，外界环境中的水滴最多只能落到护罩上而不是基板上。由此，残留在基板上的药剂液膜的就不会被局部地稀释，从而基板的整体蚀刻程度为相同。这样，就从根本上避免了液晶面板出现不可修复的斑点，提高了液晶面板的成品率。(2)由于喷水器的宽度覆盖了基板的宽度，因此喷水器能在基板上形成一层均匀的水膜，即对残留在基板上的药液进行均匀地稀释，这也保证了基板的整体蚀刻程度均相同，并且最终提高了液晶面板的成品率。
附图说明
在下文中将基于实施例并参考附图来对本发明进行更详细的描述。其中：
图1示意性地显示了根据本发明的基板清洗装置的侧视图。
图2是图1的A向视图。
图3示意性地显示了根据本发明的基板清洗装置在使用中的状态。
在附图中，相同的部件使用相同的附图标记。附图并未按照实际的比例。
具体实施方式
下面将结合附图对本发明作进一步说明。
图1示意性地显示了根据本发明的基板清洗装置10(以下称之为装置10)的侧视图。如图1所示，装置10包括护罩11和设置在护罩11内的喷水器12。护罩11包括顶板13和从顶板13向下延伸的侧壁14。应理解地是，装置10还可以根据需要而包括支架15(如图3)。
对于特定尺寸的基板而言，护罩11和喷水器12的宽度覆盖了基板的宽度， 并且侧壁14延伸到基板表面附近。这样，在使用装置10清洗基板31时(见图3)，护罩11整体地遮盖了基板31，从而在基板31遇到喷水器12之前，外界环境中的水滴最多只能落到护罩11上。由于喷水器12的宽度覆盖了基板31的宽度，因此喷水器12能在基板31上形成一层均匀地水膜，即对残留在基板31上的药液进行均匀地稀释。基于以上原因，基板31的整体蚀刻程度均相同，这就从根本上避免了液晶面板出现不可修复的斑点，提高了液晶面板的成品率。
为了使喷水器12喷出的水能够更有效地冲刷基板31的表面，可将喷水器12的水喷嘴22设置为斜朝向前方。优选地，喷水器12可以为水刀。水刀能够喷出厚度非常薄的水幕，非常有利于控制喷射到基板31上的水量，由此不但有效地清洗基板31而且能够大幅度的节省用水。此外，还可以将喷水器12的水喷嘴22构造为可以调整。这样可以根据实际情况，例如基板31与护罩11的相对高度来调整水喷嘴22的方向，以保证基板31的清洗效果，这也扩大了装置10的使用范围。
还如图1、2或3所示，在护罩11内还设置有吹风器16，并且吹风器16设置在喷水器12的后方。吹风器16用于在基板31的表面形成定向气流。在图3所示的实施例中，吹风器16的气喷嘴23设置为其所处的直线与基板31的交点处于水喷嘴22所处的直线与基板31的交点的后方，并且尽可能地相邻。这样，吹风器16产生的风会向前吹动喷水器12喷到基板31上水，防止水向后扩散。基板31的处于喷水器12后方的区域上的药液也就不会被由前方逐渐扩散来的水稀释，特别是不会随着水的扩散而被稀释为不同的水平。这样，防止了基板31上残留的药液被不均匀地稀释而造成基板31的蚀刻程度不同的问题，从而避免了所制备的液晶面板出现不可修复的斑点。此外，吹风器16产生的气流还可以将基板31上的药液吹走，从而提高基板31的清洗效率。在一个优选的实施例中，吹风器16为风刀。风刀产生的气流的方向性很好，有助于控制基板31表面的气流方向。
优选地，如图1和3所示，还将吹风器16设置为其高度低于喷水器12的高度。这样，来自吹风器16的气流在到达基板31不会受到任何阻挡，也就是说气流完全吹在基板31上，从而能非常有效地防止喷水器12喷到基板31上的水向后扩散。
此外，装置10还包括抽气组件21(如图1所示)，在护罩11的顶板13上 设置有排气口17(如图2所示)。在图2中示意性地显示了两个排气口17，实际上可以根据需要设置多个排气口。在清洗基板31的过程中，抽气组件21能够将护罩11内的水汽抽走。这样，护罩11内的水汽就不会再凝结成水滴而是被抽到护罩11之外，从而也就不再有水滴滴落到基板上，造成不均匀地稀释基板31上残留的药液。由此保证了基板31的蚀刻程度为相同，进而避免了液晶面板出现不可修复的斑点。
下面来描述使用根据本发明的装置10来清洗基板31的方法。
如图3所示，将基板31沿从后到前的方向(如图3中的箭头30所示)穿过装置10，并且将喷水器12的水喷嘴22调整为斜朝向前方，以向基板31上喷水而实现清洗基板31。优选地，在开始清洗的同时，启动装置10的抽气组件，以将护罩11内水汽抽走。更优选地，启动安装在护罩11内的吹风器16。由于吹风器16设置在喷水器12的后方，因此吹风器16能在基板31的表面形成向前的定向气流以向前吹动基板31上的水。
通过本发明的清洗方法，能够避免基板31上残留的药液被局部地稀释，从而此保证了基板31的蚀刻程度为相同，进而避免了液晶面板出现斑点。
虽然已经参考优选实施例对本发明进行了描述，但在不脱离本发明的范围的情况下，可以对其进行各种改进并且可以用等效物替换其中的部件。尤其是，只要不存在结构冲突，各个实施例中所提到的各项技术特征均可以任意方式组合起来。本发明并不局限于文中公开的特定实施例，而是包括落入权利要求的范围内的所有技术方案。

Claims (13)

  1. 一种基板清洗装置，包括：
    护罩，所述护罩包括顶板和从所述顶板向下延伸的侧壁，
    设置在所述护罩内的喷水器，
    其中，所述护罩和所述喷水器的宽度覆盖了所述基板的宽度，并且所述侧壁延伸到所述基板表面附近。
  2. 根据权利要求1所述的装置，其中，所述喷水器包括方向能调整的水喷嘴。
  3. 根据权利要求2所述的装置，其中，所述水喷嘴斜朝向前方。
  4. 根据权利要求1所述的装置，其中，在所述护罩内，在所述喷水器的后方还设置有用于在所述基板表面上形成定向气流的吹风器。
  5. 根据权利要求4所述的装置，其中，所述吹风器包括气喷嘴，所述气喷嘴所处的直线与所述基板的交点相邻地处于水喷嘴所处的直线与基板的交点的后方。
  6. 根据权利要求5所述的装置，其中，所述吹风器的高度低于所述喷水器的高度。
  7. 根据权利要求2所述的装置，其中，还包括抽气组件，在所述护罩的顶板上设置有排气口。
  8. 根据权利要求4所述的装置，其中，还包括抽气组件，在所述护罩的顶板上设置有排气口。
  9. 根据权利要求5所述的装置，其中，还包括抽气组件，在所述护罩的顶板上设置有排气口。
  10. 一种清洗基板的方法，其使用了基板清洗装置，所述基板清洗装置包括：护罩，所述护罩包括顶板和从所述顶板向下延伸的侧壁，设置在所述护罩内的喷水器，其中，所述护罩和所述喷水器的宽度覆盖了所述基板的宽度，并且所述侧壁延伸到所述基板表面附近，所述喷水器包括方向能调整的水喷嘴，
    所述方法包括：
    将基板沿从后到前的方向穿过所述护罩，
    将所述喷水器的水喷嘴调整为斜朝向前方，以向基板上喷水而实现清洗。
  11. 根据权利要求10所述的方法，其中，所述装置内还包括抽气组件，以将所述护罩内水汽抽走。
  12. 根据权利要求10所述的方法，其中，在所述护罩内，在所述喷水器的后方还设置有吹风器，所述吹风器在所述基板表面上形成向前的定向气流以向前吹动所述基板上的水。
  13. 根据权利要求11所述的方法，其中，在所述护罩内，在所述喷水器的后方还设置有吹风器，所述吹风器在所述基板表面上形成向前的定向气流以向前吹动所述基板上的水。
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107254796A (zh) * 2017-08-09 2017-10-17 玖龙纸业（太仓）有限公司 一种干网清洗装置
CN113926807A (zh) * 2021-11-20 2022-01-14 湖南特种金属材料有限责任公司 一种四氧化三锰排氢管道自动清洗装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104941869B (zh) * 2015-07-03 2018-03-02 深圳市华星光电技术有限公司 涂布装置
CN106733858A (zh) * 2017-02-07 2017-05-31 赵恒祥 一种蓄电池清洗机及清洗工艺
CN107597672A (zh) * 2017-09-19 2018-01-19 合肥惠科金扬科技有限公司 一种基板清洗设备的清洗组件的制造方法
CN109530296B (zh) * 2018-09-10 2022-03-22 惠科股份有限公司 一种清洗方法和清洗装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1512247A (zh) * 2002-12-30 2004-07-14 友达光电股份有限公司 玻璃基板在涂布光阻前的清洗方法及装置
CN1714952A (zh) * 2004-06-14 2006-01-04 大日本网目版制造株式会社 基板处理装置和基板处理方法
JP2011211094A (ja) * 2010-03-30 2011-10-20 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
CN202316390U (zh) * 2011-11-22 2012-07-11 京东方科技集团股份有限公司 清洗结构及清洗设备
EP2595178A2 (en) * 2010-07-14 2013-05-22 LG Chem, Ltd. Air knife chamber having shield member

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201086071Y (zh) * 2007-08-23 2008-07-16 潍坊潍柴零部件机械有限公司 通过式清洗机
JP2009178672A (ja) * 2008-01-31 2009-08-13 Dainippon Screen Mfg Co Ltd 基板処理装置及び基板処理方法
JP2011198892A (ja) * 2010-03-18 2011-10-06 Dainippon Screen Mfg Co Ltd 基板洗浄処理装置
JP2013045877A (ja) * 2011-08-24 2013-03-04 Tokyo Electron Ltd 基板処理装置
CN102626695B (zh) * 2011-09-28 2015-04-08 北京京东方光电科技有限公司 基板清洗系统
CN202506626U (zh) * 2012-04-18 2012-10-31 北京京东方光电科技有限公司 一种水洗装置及刻蚀设备

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1512247A (zh) * 2002-12-30 2004-07-14 友达光电股份有限公司 玻璃基板在涂布光阻前的清洗方法及装置
CN1714952A (zh) * 2004-06-14 2006-01-04 大日本网目版制造株式会社 基板处理装置和基板处理方法
JP2011211094A (ja) * 2010-03-30 2011-10-20 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
EP2595178A2 (en) * 2010-07-14 2013-05-22 LG Chem, Ltd. Air knife chamber having shield member
CN202316390U (zh) * 2011-11-22 2012-07-11 京东方科技集团股份有限公司 清洗结构及清洗设备

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107254796A (zh) * 2017-08-09 2017-10-17 玖龙纸业（太仓）有限公司 一种干网清洗装置
CN107254796B (zh) * 2017-08-09 2024-02-02 玖龙纸业（太仓）有限公司 一种干网清洗装置
CN113926807A (zh) * 2021-11-20 2022-01-14 湖南特种金属材料有限责任公司 一种四氧化三锰排氢管道自动清洗装置

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