WO2015100730A1

WO2015100730A1 - Write-through vacuum evaporation system and a method therefor

Info

Publication number: WO2015100730A1
Application number: PCT/CN2014/070083
Authority: WO
Inventors: 闫鹏; 张立源; 张震; 郭雷
Original assignee: 北京航空航天大学
Priority date: 2014-01-03
Filing date: 2014-01-03
Publication date: 2015-07-09
Also published as: CN103946416B; CN103946416A

Abstract

Provided are a write-through vacuum evaporation system and a method therefor, belonging to the field of film-plating processing. The apparatus comprises an electron beam generating device, a vacuum evaporation chamber, a vacuum system, a sample chamber, a driver, a multi-channel signal acquiring and conditioning module, a main control computer, a quantum detection platform, a control cabinet, and a display and detection module. The method comprises: step 1, preparation; step 2: vacuum pumping; step 3, positioning; step 4, target material evaporation; step 5, film-plating by the deposition of a target material beam; step 6, movement of the sample stage in a specific track; step 7, judgement; step 8, quantum effect detection; and step 9, whether there is a quantum effect or not. The write-through vacuum evaporation system overcomes the film-plating mechanism of sample fixing in an existing vacuum evaporation system, and controls the evaporating material for plating a film, in a write-through form, onto a surface of a substrate in an ultra-precise movement, such that the processing requirements of graphic patterns, dot matrix and multilayer structures in preparation of quantum functional devices are achieved and the precision, efficiency and functions of the vacuum evaporation film-plating are effectively improved.

Description

Direct write vacuum evaporation system and method thereof

Technical field

The invention relates to a vacuum evaporation system applied to coating processing, in particular to a direct writing vacuum evaporation system based on a nano control system, which can realize direct evaporation processing of single layer patterns, arrays and multilayer composite structures. Background technique

With the deep understanding of the microcosm, the quantum excitation, relaxation, and transport of the device unit approaching the quantum feature scale are gradually revealed and studied, and quantum control can be realized by changing various controllable conditions. The preparation of quantum functional devices is an important foundation for quantum control research. The advanced preparation and processing technology for high-precision, high-quality quantum functional devices is the basis for the success of research and application in this field. At present, the mainstream practice is to use mature microelectronic devices and integrated chip processing technologies, such as lithography technology, electron beam pattern writing technology, coating deposition technology, etc., and integrate these processing technologies. The advantage is the degree of integration. High, high precision and good repeatability, but there are also problems of expensive acquisition of professional instrument systems, complicated preparation processes and impurity contamination.

As a mature material processing and preparation method, vacuum evaporation technology has been effectively applied to the fabrication of artificial quantum functional devices and materials. The traditional vacuum evaporation system, including the electron beam generating device, vacuum evaporation chamber, vacuum system and sample chamber, is based on the principle that the solid material is heated in a high vacuum environment, sublimated or evaporated and deposited on the sample stage. On the surface of the substrate, a coating is formed. Although the conventional vacuum evaporation technique can realize a simple preparation for a quantum functional device, since it can only coat the surface of the substrate substrate, preparation such as a single layer pattern, a nano array, and a multilayer composite structure cannot be directly realized. The "grafting" traditional microelectronic etching process, the steps are complicated, the equipment is expensive, and the process of removing the glue is incomplete, which causes the quantum functional device to be contaminated by "process impurities" during the processing, which seriously affects the accuracy of quantum control research. Sex, it is difficult to meet the research needs of modern quantum science.

Chinese patent CN102011096A proposes a vacuum evaporation system which can control the distribution and composition of the evaporating gas flow. The invention can not only realize the evaporation uniformity of a large area by the design of the shape of the nozzle taper and the guide plug of the evaporating gun, but also adjust the guide plug by adjusting the guide plug. With the relative position of the nozzle, a fixed-area, multi-component evaporation coating can be realized. However, since the substrate is fixed during the vaporization process, only a certain thickness of the surface plating layer can be formed, and the coating of a specific geometry cannot be directly realized.

Chinese patent CN101985736A proposes a multi-station gradient film coating device, which has a set of substrate transposition mechanism, the substrate to be plated can be automatically replaced in a vacuum chamber, and a non-uniform film can be realized by a specific mask mechanism. Plating. However, a masking mechanism in the device can only be coated with one type of variable density sheet. Different types of variable density sheets need to be replaced with different masking mechanisms, which are complicated to operate and cannot be directly completed for various single layers and multiple Quantum work in the form of layers and arrays Capable device structure requirements.

Therefore, in view of the shortcomings of the above vacuum evaporation device, it is very necessary to develop a nano device coating processing device specially prepared for artificial quantum functional devices and information functional materials, and break through the application bottleneck of the existing vacuum evaporation devices in these research fields. Avoid over-reliance on "grafting" complex processes in the field of microelectronics processing to improve the effectiveness, accuracy and efficiency of quantum and material research experiments. Invented content

The object of the present invention is to provide a new vacuum evaporation coating system for solving the single coating structure existing in the prior art, and it is impossible to separately complete the complicated structural requirements of high precision and good quality, and after "grafting" in the field of microelectronic processing. Chemical processes, impurities, process cross-contamination and damage caused by complex processes.

The technical solution adopted by the present invention to solve the technical problem is:

A direct write vacuum evaporation system, comprising an electron beam generating device, a vacuum evaporation chamber, a vacuum system, a sample chamber, a driver, a multi-channel signal collection and conditioning module, a main control computer, a quantum detection station, a control cabinet, a display and detection module .

The sample chamber introduces a nano-migration positioning sample stage and a masking mechanism on the basis of maintaining the structure of the sample chamber of the existing vacuum evaporation device, and the masking mechanism is located below the nano-positioning positioning sample stage. The mask mechanism converts the high purity gaseous target beam evaporated in the vacuum evaporation chamber into a gas target beam having a nanometer size and is deposited directly on the substrate substrate.

The nano-shift positioning sample stage is mainly composed of a base, a flexible mechanism, a nano-grating sensor, a sample stage, a piezoelectric ceramic actuator, a pre-tightening screw and a sample holder;

The sample stage is located at the center of the base, and the sample stage is connected to the base by a flexible mechanism; the sample base is used to fix the substrate substrate; the flexible mechanism is composed of a flexible rod hinged by a flexible hinge; the flexible hinge is pressed Elastic deformation occurs under the action of the electric ceramic actuator thrust, and the movement of the piezoelectric ceramic actuator is transmitted to the sample stage through the flexible rod; in addition, the signal line of the piezoelectric ceramic actuator is connected to the driver.

A through hole is formed in the middle of the adjacent sides of the base, and a piezoelectric ceramic actuator is mounted inside. One end of the piezoelectric ceramic actuator is connected with the pre-tightening screw, and the pre-tightening screw is threaded on the base, and the pressure is applied. The other end of the electric ceramic actuator is in contact with the flexible mechanism; the pre-tightening force of the piezoelectric ceramic actuator is adjusted by adjusting the pre-tightening screw. After the piezoelectric ceramic actuator is energized, one end is extended in contact with the flexible mechanism, and the sample stage is pushed by the flexible mechanism;

A nano-grating sensor is installed at an intermediate position of the other two adjacent sides of the pedestal, and the nano-grating signal is collected and then transmitted to the multi-channel signal modulating and conditioning module;

The main control computer comprises a trajectory generation module, a tracking control module, a positioning control module and a quantum detection station positioning control module. The input end of the main control computer is connected with the multi-channel signal concentrating and modulating module, and the output end is connected to the driver and the control cabinet. . The quantum detection station positioning control module of the main control computer is connected to the quantum detection station. The multi-channel signal collection and processing module transmits a coating rate feedback signal, a nano-grating signal and a laser position signal respectively corresponding to the trajectory generation mode of the main control computer. Block, tracking control module and positioning control module.

The trajectory generation module is mainly composed of a film thickness meter, a trajectory generation module high-speed signal collection and conditioning interface module, a coating rate control algorithm module, and a reference trajectory generation algorithm module.

The film thickness meter detects the coating rate signal of the substrate substrate in real time and transmits it to the multi-channel signal collection and conditioning module. After conditioning, it is converted into a digital signal and transmitted to the trajectory generation module for high-speed signal collection and conditioning. After the interface module is converted into the coating rate information, it is transmitted to the coating rate control algorithm module to obtain the coating processing time and the moving rate and direction of the nano-shift positioning sample stage, and then transmitted to the reference trajectory generation algorithm module to generate a reference for the nano-shift positioning sample stage. The motion trajectory is transmitted to the tracking control module and the control cabinet, and the control cabinet transmits the reference motion trajectory to the display and detection module and displays it.

The tracking control module is composed of a tracking control module high-speed signal collection and conditioning interface module, a nano tracking controller module and a tracking control signal amplification driving module;

The multi-channel signal collection and conditioning module collects the nano-grating signal for conditioning, and then converts it into a digital signal, which is transmitted to the tracking control module in the tracking control module for high-speed signal collection and conditioning interface module, and is transformed into the position information of the nano-shift positioning sample station. And passed to the nano tracking controller module, the nano tracking controller module transmits the actual movement track of the nanometer positioning sample table and the substrate substrate to the control cabinet, and simultaneously compares the position information with the reference motion track to obtain tracking control. The command is transmitted to the tracking control signal amplification driving module, amplified, and transmitted to the driver and the control cabinet, and the driver drives the piezoelectric ceramic actuator to move, thereby controlling the nano-positioning positioning sample stage and the substrate substrate fixed thereon The required trajectory movement; the positioning control module is mainly composed of a laser ruler, a positioning control module high-speed signal concentrating and conditioning interface module, a nano positioning controller module and a positioning control signal amplification driving module;

The laser scale measures the position signal of the nanometer-shifted sample stage and the substrate substrate in real time, and transmits it to the multi-channel signal collection and conditioning module, and then passes it to the positioning control module for high-speed signal collection and conditioning interface module to obtain the nano-shift positioning sample stage. And the position signal of the substrate substrate is transmitted to the nano positioning controller module, and the nano positioning controller module feeds back a positioning control command to transmit the actual position of the nanometer positioning sample stage and the substrate substrate to the control cabinet, and The positioning control command is transmitted to the positioning control signal to amplify the driving module to be amplified and transmitted to the driver and the control cabinet; the driver drives the piezoelectric ceramic actuator to move, and the control cabinet according to the transmitted actual position signal, the amplified positioning control command and the combined reference position Information, coordinate the function of each function module, and also display through the display and detection module.

The reference position information is the final arrival position of the nano-positioning positioning sample stage, and is the initial position information initially set by the control cabinet panel.

The quantum detection station positioning control module is composed of a high-speed signal collection and conditioning interface module of a quantum detection station positioning control module, a quantum detection station positioning controller module, and a quantum detection station positioning control signal amplification driving module.

The main function of the quantum detection station positioning control module is to control the quantum detection station to carry the quantum effect detection by carrying the substrate substrate to the set reference position.

Quantum detection station positioning control module high-speed signal collection and conditioning interface module collects quantum detection station position signals and performs Conditioning, turning into a digital signal; and transmitting to the quantum detection station positioning controller module, the quantum detection station positioning controller module generates a positioning control instruction; transmitting to the quantum detection station positioning control signal amplification driving module, performing amplification, and then outputting to the quantum detection The stage controls the quantum detection stage to carry the substrate substrate to a set reference position for quantum effect detection. At the same time, according to the position information of the quantum detection station, the information of the actual position of the quantum detection station is obtained and transmitted to the control cabinet, and displayed through the display and detection module;

The method of a direct write vacuum evaporation system of the present invention is as follows:

Step 1: Prepare, according to the needs of coating processing, place the corresponding target in the vacuum evaporation chamber, and fix the substrate substrate on the nano-positioning positioning sample stage through the sample holder.

Step 2: Vacuuming, vacuuming the evaporation chamber and the sample chamber under vacuum and maintaining the vacuum. Step 3: positioning, using the host computer to move the substrate substrate to a specified reference position;

The specific operation process is:

(1) input the initial reference position information of the nano-shift positioning sample stage on the input panel of the control cabinet, and transmit the information to the positioning control module of the main control computer;

(2) The laser scale measures the position signal of the nanometer-shifted sample stage and the substrate substrate in real time, and transmits the laser position signal to the multi-channel signal collection and conditioning module;

(3) The nano positioning controller module obtains the actual position information of the nanometer positioning sample stage according to the laser position signal, and compares the reference position to be reached, and generates a corresponding positioning control instruction according to the difference of the position;

(4) Positioning control signal The amplification driving module amplifies the positioning control command and transmits it to the driver, and drives the piezoelectric ceramic actuator of the nanometer positioning sample stage through the driver. The specific operation process is: after the piezoelectric ceramic actuator is extended The lower end is fixed with the pre-tightening screw, the upper end pushes the flexible mechanism, the flexible hinge is elastically deformed, and the sample stage is pushed by the flexible rod; the sample stage carries the substrate substrate to the specified reference position to prepare for the later coating.

Step 4: Evaporation of the target: The electron beam generating device emits an electron beam into the vacuum evaporation chamber, controls the direction of the electron beam through the magnetic field, strikes the target and evaporates it into a high-purity gaseous target beam, and enters the sample chamber;

Step 5: Target beam deposition coating: A high-purity gaseous target beam entering the sample chamber. Under the action of the mask mechanism, the gaseous target beam is converted into a precisely controllable collimated target gas, and is nanometer-sized. The beam current is deposited directly on a substrate substrate immobilized on a nano-migration positioning sample stage, the nano-scale size being determined by the corresponding template scale accuracy.

Step 6: Specimen-specific trajectory movement: The substrate computer is controlled by the main control computer to form a geometric pattern conforming to the motion trajectory on the substrate substrate, and the coating process of the quantum functional device of the complex topology is completed;

The specific operation process is:

(1) The film thickness meter in the track generation module is used for real-time detection of the coating rate signal of the substrate substrate, and is transmitted to the multi-channel signal collection and conditioning module;

(2) The trajectory generation module high-speed signal 釆 collecting and conditioning interface module converts the coating rate feedback signal into coating rate information, Passed to the coating rate control algorithm module,

(3) The coating rate control algorithm module uses the coating rate information, combined with the coating processing requirements of the quantum functional device, to obtain the coating processing time and the moving rate and direction of the nano-shift positioning sample stage, and then transmit it to the reference trajectory generation algorithm module.

(4) The reference trajectory generation algorithm module generates a reference motion trajectory of the nano-shift positioning sample stage, and transmits the reference motion trajectory to the tracking control module and the control cabinet, and the control cabinet transmits the reference motion trajectory to the display and detection module and displays it;

(5) The piezoelectric ceramic actuator is elongated after being energized, and the sample stage is driven by the flexible mechanism, and the nano-grating sensor collects the nano-grating signal and then transmits it to the multi-channel signal collection and conditioning module;

(6) The multi-channel signal collection and conditioning module collects the nano-grating signal for conditioning, and then transmits it to the tracking control module for high-speed signal collection and conditioning interface module, and then converts to the position information of the nano-shift positioning sample station, and transmits it to the nano tracking control. Module

(7) The nano tracking controller module transmits the actual motion track of the nanometer positioning sample stage and the substrate substrate to the control cabinet, and compares the actual motion track with the reference motion track, calculates the tracking control command, and transmits the tracking control signal to the amplification. After driving the module, the tracking control command is amplified and transmitted to the driver and the control cabinet;

(8) The driver drives the piezoelectric ceramic actuator to control the substrate substrate to complete the trajectory movement required for the quantum functional device, and complete the geometric coating processing required for the quantum functional device.

Step 7: Determine whether the film thickness meets the processing requirements. If yes, proceed to step 8. If not, return to step 4. The specific judgment method is: using a film thickness meter to detect the coating rate signal of the substrate substrate in real time to detect the lining Film thickness information of the substrate;

Step 8: Quantum effect detection: After the substrate substrate coating process is completed, the substrate substrate is taken out from the sample chamber, and the substrate substrate is fixed on the quantum detection stage, and the quantum detection station positioning control module controls the quantum detection stage. The position of the quantum effect detection of the processed sample on the substrate substrate.

The specific operation process is as follows: the quantum detection station positioning control module high-speed signal collection and conditioning interface module is collected into the quantum detection station position signal, and is processed and converted into a digital signal; passed to the quantum detection station positioning controller module to generate quantum The detection station positioning control command is transmitted to the quantum detection station positioning control signal amplification driving module, amplified, and then output to the quantum detection station, and the quantum detection station controls the substrate substrate to reach the set reference position for quantum effect detection.

Step 9: Detect whether the processed sample on the substrate substrate has a quantum effect, and if so, end, if there is no quantum effect, return to step 1 to restart.

In addition, the control cabinet communicates with the electron beam generating device, the vacuum system, the main control computer and the sample chamber, comprehensively processes the information transmitted by each module, ensures information interaction and cooperative operation between the functional modules, and monitors the coordinated operation of each module function, and The movement track, positioning information and film thickness information of the nano-positioning positioning sample stage and the substrate substrate are transmitted to the display and detection module, and the processing process is displayed online and monitored in real time.

The advantages and positive effects of the present invention are: (1) The present invention provides a direct-write vacuum evaporation system, which radically changes the coating mechanism of the sample in the existing vacuum evaporation system, realizes the nano-precision displacement movement in the multi-dimensionality of the sample processing table, and controls evaporation. The material is applied directly to the moving substrate surface in a straight-through format, effectively meeting the complex fabrication requirements required by the Quantum Functional Materials Institute.

(2) The present invention proposes a direct-write vacuum evaporation system, which retains the components of the electron beam generating device, the evaporation chamber and the vacuum system in the conventional vacuum evaporation system, despite the use of a new direct-write coating processing method. The original design, the newly invented module and the original system part are effectively integrated, which greatly saves the cost.

(3) The present invention proposes a direct write vacuum evaporation system method, which innovatively proposes the requirements for the preparation process of the quantum functional device, in particular, the thickness of the plating layer, the topological shape and the distribution of the three-dimensional coating, and the rate of change of the film thickness. Based on the detection information, the mathematical description is the motion trajectory of the nano-shift positioning platform, and then the ultra-precision servo tracking algorithm is used to realize the tracking of the generated trajectory by the processing platform, and the preparation of the new artificial quantum functional device is completed.

(4) The present invention proposes a direct-write vacuum evaporation system method, and proposes and develops an ultra-precision robust tracking algorithm for nano-shifting systems from the control theory, and designs and models the nano-micro-motion platform. The combination realizes ultra-precise tracking of the nano-shift positioning table, which effectively improves the accuracy, efficiency and function of the direct-write vacuum evaporation coating. Attachment

1 is a schematic view of a device of a conventional vacuum evaporation system;

2 is a simplified diagram of a direct write vacuum evaporation system provided by the present invention;

3 is a schematic diagram of a prototype of a direct write vacuum evaporation system provided by the present invention;

4 is a schematic diagram of a nano-shift positioning sample stage of a direct write vacuum evaporation system provided by the present invention;

5 is a schematic diagram of a main control computer of a direct write vacuum evaporation system provided by the present invention;

6 is a schematic diagram of a trajectory generation module of a direct write vacuum evaporation system provided by the present invention;

7 is a schematic diagram of a tracking control module of a direct write vacuum evaporation system provided by the present invention

8 is a schematic diagram of a positioning control module of a direct write vacuum evaporation system provided by the present invention;

9 is a schematic diagram of a quantum detection station positioning control module of a direct write vacuum evaporation system provided by the present invention;

10 is a flow chart of a working method of a direct write vacuum evaporation system provided by the present invention;

In the figure: 1. Electron beam generating device; 2. Vacuum evaporation chamber; 3. Vacuum system; 4. Sample chamber; 5. Mask mechanism; 6. Nano-shift positioning sample stage; 7. Substrate substrate; Control computer; 9, control cabinet; 10, display and detection module; 11, driver; 12, multi-channel signal collection and conditioning module; 13, trajectory generation module; 14, tracking control module; 15, positioning control module; Station positioning control module; 17 quantum detection station;

Where: 6-1, pedestal; 6-2, flexible hinge; 6-3 flexible rod; 6-4, nano-grating sensor; 6-5, sample stage; 6-6, flexible mechanism; 6-7, piezoelectric Ceramic actuator; 6-8, pre-tightening screw; 6-9, sample holder;

13-1 film thickness meter; 13-2 track generation module high-speed signal collection and conditioning interface module; 13-3 coating rate control algorithm Module; 13-4 reference track generation algorithm module; 14-1 tracking control module high speed signal acquisition and conditioning interface module; 14-2 nano tracking controller module; 14-3 tracking control signal amplification driver module; 15-1 laser ruler 15-2 Positioning Control Module High Speed Signal Acquisition and Conditioning Interface Module; 15-3 Nano Positioning Controller Module; 15-4 Positioning Control Signal Amplification Driver Module; 16-1 Quantum Detection Station Positioning Control Module High Speed Signal Collection and Conditioning Interface module; 16-2 quantum detection station positioning controller module; 16-3 quantum detection station positioning control signal amplification driver module. detailed description

The invention will now be further described in detail with reference to the drawings and embodiments.

The invention aims to break through the limitations of the existing vacuum evaporation technology coating method, and provides a direct writing method with a nano-shift positioning sample processing platform as a core technology for various process and precision requirements in quantum functional devices and material preparation. Vacuum evaporation system.

The direct write vacuum evaporation system of the invention adopts an ultra-precision robust tracking algorithm as a control core, and based on the existing electron beam vacuum evaporation system, a mask mechanism 5, a nano-shift positioning sample stage 6, and a main control computer are introduced. The trajectory generating module 13, the positioning control module 15, the tracking control module 14, and the display and detection module 10 modules of FIG. 8, as shown in FIG. 2 and FIG. 3, can not only realize various complicated processes and processes that cannot be provided by the conventional vacuum evaporation system. It is required to simplify the experimental methods of relevant basic research, and to avoid pollution caused by materials and quantum functional devices for various reasons, and to improve the efficiency and accuracy of the experiment.

As shown in FIG. 1, the mask is introduced by changing the principle, structure and function of the sample chamber 4 while maintaining the structure of the electron beam generating device 1, the vacuum system 3, and the vacuum evaporation chamber 2 in the conventional vacuum evaporation system. The mechanism 5, the substrate substrate 7 and the nano-shift positioning sample stage 6, as shown in FIG. 2, realize precise direct writing by precise motion control of the nano-positioning positioning sample stage 6 and mask control of the evaporation material. Coating, completes the processing requirements for patterns, lattices and multilayer structures in the fabrication of quantum functional devices.

The direct-write vacuum evaporation system is significantly different from the conventional vacuum evaporation system in that it directly "writes" a target to be deposited, such as gold, copper, aluminum, etc., at a specified position, and can flexibly perform various wrap-arounds and Controllable spatial heterostructure. A high-purity gaseous target beam is formed between the mask mechanism 5 close to the substrate substrate 7 to form a highly oriented equivalent deposition rate and a precisely controlled collimated target gas, and deposited directly at a nanometer-sized beam current. On the substrate substrate 7, by controlling the nano-positioning positioning sample stage 6 of the carrier substrate 7 to perform a specific ultra-precision trajectory movement, the coating geometry or the topology of the quantum functional device is realized, and the nano-precision quantum nano-device metallization is achieved. The purpose of preparation for deposition molding. In order to make the objects, technical solutions and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be combined with the drawings of the embodiments of the present invention and taking into consideration factors such as system structure optimization, process and the like. Make a clear, complete description.

The invention adopts a nano servo system as a core technology, as shown in FIG. 3, a direct write vacuum evaporation system, including an electron beam generating device 1, a vacuum evaporation chamber 2, a vacuum system 3, a sample chamber 4, a driver 11, and a multi-channel The signal collection and processing module 12, the main control computer 8, the quantum detection station 17, the control cabinet 9, and the display and detection module 10. The structure of the electron generating device 1, the vacuum evaporation chamber 2 and the vacuum system 3 in the present invention is kept the same as that of the conventional vacuum evaporation device, and the structure, principle and function of the sample chamber 4 are changed, and the mask is introduced on the basis of the structure of the sample chamber of the conventional vacuum evaporation device. The membrane mechanism 5 and the nano-positioning positioning sample stage 6.

As shown in FIG. 4, the nano-positioning positioning sample stage 6 is mainly composed of a base 6-1, a flexible mechanism 6-6, a nano-grating sensor 6-4, a sample stage 6-5, and a piezoelectric ceramic actuator 6- 7. The pre-tightening screws 6-8 and the sample holders 6-9 are composed; the base 6-1, the flexible mechanism 6-6 and the sample stage 6-5 are interconnected and integrated structures, which are cut from the same piece of material. . The sample stage 6-5 is at the center of the base 6-1, and the flexible mechanism 6-6 is composed of four separate bodies hinged by the flexible rod 6-3 through the flexible hinge 6-2, respectively in the sample On the four sides of the table 6-5, the flexible hinge 6-2 can realize the transmission of minute movements by elastic deformation of the material; further, the signal line of the piezoelectric ceramic actuator 6-7 is connected to the driver 11.

Two pre-tightening screws 6-8 and two piezoelectric ceramic actuators 6-7 are vertically installed at a position intermediate between the left side surface and the lower side surface of the base 6-1, and the piezoelectric ceramic actuator 6- 7 is installed in a circular hole on the side of the base 6-1, the pre-tightening screws 6-8 are mounted on the outside of the piezoelectric ceramic actuator 6-7, and the pre-tightening screws 6-8 are threaded on the base 6- 1 , the specific dimensions of the pre-tightening screws 6-8 and the circular holes are determined by the size of the piezoelectric ceramic actuator 6-7, and the lower end of the piezoelectric ceramic actuator 6-7 is placed at the upper end of the pre-tightening screw 6-8, and the pressure is applied. upper piezoelectric ceramic actuator 6-7 on top of the flexible means 6-6, 6-8 by adjusting the preload screw, adjust the preload piezoceramic actuator magnitude ^6-7.

The nano-shift positioning sample stage 6 is a two-degree-of-freedom nano-platform capable of translation in two directions along the X and Y axes in the xy plane, and the nano-grating sensor 6-4 has two, respectively, vertically mounted In the middle position between the upper side and the right side of the base 6-1, corresponding to the mounting positions of the pre-tightening screws 6-8 and the piezoelectric ceramic actuators 6-7, the nano-grating sensor 6-4 is used to detect the sample stage in real time. The displacement information in both the X and Y directions, that is, the nanograting signal.

The specific implementation process of the nano-positioning positioning sample stage 6 is: When the piezoelectric ceramic actuator 6-7 is energized, the piezoelectric ceramic actuator 6-7 is elongated, and the piezoelectric ceramic actuator on the left side is used. After 6-7 extension, since the lower end is held by the pre-tightening screw 6-8, only the flexible mechanism 6-6-thrust can be given forward, and the flexible hinge 6-4 acts on the thrust of the piezoelectric ceramic actuator 6-7. The slight elastic deformation occurs, and the flexible rod 6-3 of the flexible mechanism 6-6 moves forward through the flexible hinge 6-4, and the movement of the piezoelectric ceramic actuator 6-7 is transmitted to the sample stage 6 through the flexible rod 6-3. -5, and then push the intermediate sample stage 6-5 to move in the X direction, the upper nanograting sensor 6-4 will collect the displacement information of the sample stage 6-5 along the X direction, that is, the nano grating signal, and then The nano-grating signal is transmitted to the multi-channel signal modulating and conditioning module 12; when the lower piezoelectric ceramic actuator 6-7 is extended, since the lower end is held by the pre-tightening screw 6-8, the flexible mechanism 6-6 can only be given upward. a thrust, flexible hinge 6-4 produces a micro-elastic under the action of the piezoelectric ceramic actuator 6-7 thrust Deformation, the flexible rod 6-3 of the flexible mechanism 6-6 will move forward through the flexible hinge 6-4, and the movement of the piezoelectric ceramic actuator 6-7 is transmitted to the sample stage 6-5 through the flexible rod 6-3, and then Pushing the middle sample stage 6-5 to move in the Y direction, the right nano-grating sensor 6-4 will collect the displacement information of the sample stage 6-5 in the Y direction, that is, the nano-grating signal, and then the nano-grating signal Passed to the multi-channel signal collection and conditioning module 12;

The sample stage 6-5 is square, and four sample holders 6-9 are fixed at four corner positions for fixing the substrate substrate 7. The substrate substrate 7 is used for depositing a vaporized gaseous target, and the nanometer-positioned sample stage 6 is used to perform a specific ultra-precision trajectory movement to complete the coating of the topography of the geometric figure or the quantum functional device, thereby realizing Precisely write-through coating.

The nano-positioning positioning sample stage 6 is fixed in the sample chamber 4 through a bolt hole on the base 6-1, and the mask mechanism 5 is directly mounted on the inner wall of the sample chamber 4, and the nano-positioning positioning sample stage is Below the 6 is extended from the sample chamber 4 by a rod, connected to the motor, and the position of the mask mechanism 5 is controlled by the motor. The mask mechanism 5 converts the high-purity gaseous target beam evaporated in the vacuum evaporation chamber 2 into a gas target beam having a nanometer size and is directly deposited on the substrate substrate 7. The nano-shift positioning sample stage 6 under the action of the tracking control module 14 and the positioning control module 15 of the main control computer 8 carries the substrate substrate 7 to achieve nano-scale precision motion.

The main control computer 8 includes four modules: a trajectory generation module 13, a tracking control module 14, a positioning control module 15, and a quantum detection station positioning control module 16, and an input terminal of the main control computer 8 and a multi-channel signal modulating module 12 Connected, the output is connected to the driver 11 and the controller 9. The quantum detection station positioning control module 16 of the main control computer 8 is connected to the quantum detection 17, and the multi-channel signal collection and processing module 12 transmits the collected coating rate feedback signal to the trajectory generation module 13 of the main control computer 8, and the nanometers of the collection are collected. The raster signal is passed to the tracking control module 14 of the host computer 8, and the collected laser position signal is transmitted to the positioning control module 15 of the host computer 8.

The master computer 8 controls the nano-shift positioning sample stage 6 through the driver 11 to complete the nano-scale precision motion.

The trajectory generating module 13 is composed of a film thickness meter 13-1, a trajectory generating module high speed signal concentrating and conditioning interface module 13-2, a coating rate control algorithm module 13-3, and a reference trajectory generating algorithm module 13-4. The probe of the film thickness meter 13-1 is placed inside the sample chamber 4 for detecting the coating rate signal of the substrate substrate 7 in real time, and transmitting the coating rate feedback signal to the multi-channel signal collection and conditioning module 12, The signal collection and processing module 12 adjusts the coating rate feedback signal collected by the signal, and then converts it into a digital signal that can be processed by the computer, and then transmits it to the track generation module in the track generation module 13 for the high-speed signal collection and conditioning interface module 13 -2, the trajectory generation module high-speed signal concentrating and conditioning interface module 13-2 converts the coating rate feedback signal into coating rate information, and then transmits it to the coating rate control algorithm module 13-3, and the coating rate control algorithm module 13- 3 Using the coating rate information, combined with the coating processing requirements of the quantum functional device, the time of coating processing and the moving rate and direction of the nanometer positioning sample stage are proposed, and then transmitted to the reference trajectory generation algorithm module 13-4, the reference trajectory generation algorithm module. 13-4 using coating rate information, coating processing time and nano-shift positioning sample table moving rate and direction requirements, knot The processing requirements of the quantum functional device are generated, the reference motion trajectory of the nano-shift positioning sample stage 6 is generated, and the reference motion trajectory is transmitted to the tracking control module 14 and the control cabinet 9, and the control cabinet 9 transmits the reference motion trajectory to the display and detection module 10 And show it.

The tracking control module 14 is composed of a tracking control module high-speed signal collection and conditioning interface module 14-1, a nano tracking controller module 14-2, and a tracking control signal amplification driving module 14-3; The set conditioning module 12 modulates the collected nano-grating signals and converts them into digital signals that can be processed by the computer, and transmits them to the tracking control module in the tracking control module 14 for high-speed signal collection and conditioning interface module 14-1, tracking control. The module high speed signal acquisition and conditioning interface module 14-1 converts the nano-grating signal into position information of the nano-positioning positioning sample stage 6 and transmits the position information to The nano tracking controller module 14-2, the nano tracking controller module 14-2, obtains the actual motion track of the nanometer positioning sample stage 6 and the substrate substrate 7 according to the transmitted position information, and transmits the actual motion track to the control cabinet 9, On the other hand, the position information is compared with the reference motion trajectory transmitted by the reference trajectory generation algorithm module 13-4, and the tracking control command is calculated according to the error, and the tracking control command is transmitted to the tracking control signal amplification driving module 14-3. Tracking control signal amplification driver module

14-3 amplifies the tracking control command, and transmits the amplified tracking control command to the driver 11 and the control cabinet 9, and the driver 11 drives the piezoelectric ceramic actuator 6-7 to move, thereby controlling the nano-positioning positioning sample stage 6 and fixing it The substrate substrate 7 thereon completes the desired trajectory movement. The control cabinet 9 coordinates the functional movements of the functional modules according to the actual motion trajectory transmitted, the amplified tracking control command, and the reference motion trajectory information transmitted by the reference trajectory generation algorithm module 13-4, and is also provided by the display and detection module 10 display.

The positioning control module 15 is mainly composed of a laser scale 15-1, a positioning control module, a high-speed signal collection and conditioning interface module.

15-2, nano positioning controller module 15-3 and positioning control signal amplification driver module 15-4;

The positioning control module 15 utilizes the multi-channel signal to collect the laser position signal transmitted by the conditioning module 12, and feedback generates a control command for the nano-shift positioning sample stage 6, thereby realizing the system nano-positioning requirement and suppressing various external interferences and vibrations. influences.

The probe of the laser scale 15-1 is fixed on the outer wall of the sample chamber 4, and the emitted laser light is applied to the nanometer positioning sample stage 6 through the glass on the outer wall of the sample chamber 4, and the laser scale 15-1 measures the nanometer displacement in real time. The position signal of the sample stage 6 and the substrate substrate 7 fixed thereon is transmitted to the multiplexed signal conditioning module 12 by the measured laser position signal.

The positioning control module high-speed signal collection and conditioning interface module 15-2 is configured to receive the laser position signals collected by the multi-channel signal collection and processing module 12, and obtain the positions of the nano-positioning sample 6 and the substrate substrate 7. The signal is transmitted to the nano-positioning controller module 15-3, and the nano-positioning controller module 15-3 utilizes the laser position signal and generates feedback for nano-shift positioning by suppressing the influence of various external disturbances and vibrations. The positioning control command of the sample stage 6 obtains the actual position of the nanometer positioning sample stage 6 and the substrate substrate 7 based on the transmitted laser position signal, and transmits it to the control cabinet 9, and transmits the positioning control command to the other hand. The positioning control signal amplifying driving module 15-4, the positioning control signal amplifying driving module 15-4 amplifies the positioning control command and transmits the amplified positioning control command to the driver 11 and the control cabinet 9; the driver 11 drives the piezoelectric The ceramic actuator 6-7 moves to control the nano-positioning positioning sample stage 6 and the substrate substrate 7 fixed thereon to realize the system nanometer level Precision positioning requirements; cabinet 9 according to the actual position signal being transmitted over the amplified positioning control instruction position information and incorporated herein by reference, coordinate the function module harmonization also be displayed on the display 10 and the detection module. The reference position information is the position where the nanometer positioning sample stage 6 finally arrives, and is the initial position information originally set by the panel of the control cabinet 9. The nano positioning controller module 15-3 of the positioning control module 15 is positioned according to the nanometer shift. The actual position information of the sample stage 6 is compared with the reference position to be finally arrived, and according to the difference of the positions, a corresponding control command is obtained, and the nano-positioning positioning sample stage 6 is controlled to reach the set reference position.

The quantum detection station positioning control module 16 is configured by a quantum detection station positioning control module for high-speed signal collection and conditioning The port module 16-1, the quantum detecting station positioning controller module 16-2, and the quantum detecting station positioning control signal amplifying driving module 16-3 are configured. The main function of the quantum detecting station positioning control module 16 is to control the quantum detecting station 17 to carry the substrate. The substrate reaches the set reference position for quantum effect detection.

The quantum detection station positioning control module high-speed signal acquisition and conditioning interface module 16-1 is used to collect and adjust the quantum detection station position signal of the built-in sensor set of the quantum detection station 17, and convert it into a digital signal that the computer can process; The quantum detection stage position signal is transmitted to the quantum detection stage positioning controller module 16-2, and the quantum detection stage positioning controller module 16-2 is compared with the final reference position according to the quantum detection stage position signal, according to the position The difference is generated by a quantum detection station positioning control instruction for quantum detection; and the quantum detection stage positioning control instruction is transmitted to the quantum detection station positioning control signal amplification driving module 16-3, and the quantum detection station positioning control signal amplification driving module 16- 3 amplifying the quantum detection stage positioning control command, and outputting the amplified quantum detection stage positioning control command to the quantum detecting station 17, and controlling the quantum detecting station 17 to carry the substrate substrate 7 to the set reference position for quantum Effect detection. The quantum detection station positioning controller module 16-2 obtains the information of the actual position of the quantum detection station according to the position information of the quantum detection station, and transmits the information to the control cabinet 9 according to the actual position of the quantum detection station transmitted by the control cabinet 9. The information and the reference position information coordinate the operation of each functional module, and are also displayed by the display and detection module 10. The reference position information is a position where the quantum detecting station 17 finally reaches the substrate substrate, and is manually set by the input panel of the control cabinet 9.

The control cabinet 9 communicates with the electron beam generating device 1, the vacuum system 3, the main control computer 8 and the sample chamber 4, comprehensively processes the information transmitted by each module, ensures information interaction and coordinated operation between the functional modules, and monitors each The module functions coordinately run.

The display and detection module 10 is controlled by the control cabinet 9, synthesizes the substrate motion state and film thickness information, displays the processing process online, and monitors in real time.

As shown in FIG. 10, the method of a direct write vacuum evaporation system of the present invention is as follows:

Step 1: Preparation, according to the coating processing requirements, the corresponding target gold is placed in the vacuum evaporation chamber 2, and the substrate substrate 7 is fixed on the nano-positioning positioning sample stage 6 through the sample holder 6-9.

Step 2: Vacuuming, under vacuum system 3, evacuate vacuum chamber 2 and sample chamber 4 to a vacuum and maintain a vacuum.

Step 3: positioning, using the host computer to move the substrate substrate to a specified reference position;

The specific operation process is:

(1) The reference position information of the nano-positioning positioning sample stage 6 is input to the input panel of the control cabinet 9, and the control cabinet 9 transmits the initial position information to the positioning control module 15 of the main control computer 8.

(2) Laser scale 15-1 measures the position signal of the nano-positioning positioning sample stage 6 and the substrate substrate 7 fixed thereon in real time, and transmits the measured laser position signal to the multi-channel signal collection and conditioning module 12.

(3) The nano positioning controller module 15-3 in the positioning control module 15 is transmitted according to the multi-channel signal conditioning module 12 The laser position signal is obtained to obtain the actual position information of the nanometer positioning sample stage 6, and compared with the reference position to be reached, corresponding positioning control commands are generated according to the difference of the positions,

(4) The positioning control command is amplified by the positioning control signal amplification driving module 15-4 and transmitted to the driver 11, and the piezoelectric ceramic actuator 6-7 of the nano-positioning positioning sample stage 6 is driven by the driver 11 to be specific. The operation process is:

When the piezoelectric ceramic actuator 6-7 on the left side is stretched, since the lower end is held by the pre-tightening screw 6-8, only the flexible mechanism 6-6 can be pushed forward, and the flexible hinge of the flexible mechanism 6-6 6-2 produces a slight elastic deformation, the flexible rod 6-3 will move forward through the flexible hinge 6-2, and then push the intermediate sample stage 6-5 to move in the X direction; when the lower side piezoelectric ceramic actuator 6-7 After the extension, since the lower end is held by the pre-tightening screw 6-8, only the flexible mechanism 6-6-thrust can be given upward, and the flexible hinge 6-2 of the flexible mechanism 6-6 produces a slight elastic deformation, and the flexible rod 6- 3, the flexible hinge 6-2 will move upward, and then push the middle sample stage 6-5 to move in the Y direction, and the flexible hinge 6-2 transmits the motion of the piezoelectric ceramic actuator 6-7 through the slight elastic deformation of the self material. To the sample stage 6-5, the sample stage 6-5 carries the substrate substrate 7 to a designated reference position for preparation of the later coating.

Step 4: Evaporation of the target: The electron beam generating device 1 emits an electron beam into the vacuum evaporation chamber 2, controls the direction of the electron beam by the magnetic field, strikes the target gold placed in the vacuum evaporation chamber 2, and evaporates it into a high-purity gas target. The material bundle enters the sample chamber 4.

Step 5: Target beam deposition coating: a high-purity gaseous target beam entering the sample chamber 4, under the action of the mask mechanism 5, the gaseous target beam is converted into a precisely controllable collimated target gas, and at a nanometer scale A beam of the size is deposited directly onto the substrate substrate 7 immobilized on the nanopositioning positioning sample stage 6, the nanoscale size being determined by the corresponding template scale accuracy.

Step 6: Sample stage specific trajectory movement: The main table computer 6 controls the movement of the sample stage 6-5 and the substrate substrate 7 to form a geometric pattern conforming to the motion trajectory on the substrate substrate 7 to complete a specific super Precision trajectory movement, specific geometry, coating processing of quantum functional devices with complex topologies;

The specific operation process is:

(1) The film thickness meter 13-1 in the trajectory generating module 13 of the main control computer 8 is used to detect the coating rate signal of the substrate substrate 7 in real time, and transmits the coating rate feedback signal to the multiplex signal modulating and conditioning module 12 ,

(2) The multi-channel signal collection and processing module 12 modulates the coating rate feedback signal collected by the ,, and then converts it into a digital signal that can be processed by the computer, and then transmits it to the trajectory generation module in the trajectory generation module 13 for high-speed signal collection and The modulating interface module 13-2, the trajectory generating module high-speed signal concentrating and conditioning interface module 13-2 converts the coating rate feedback signal into coating rate information, and transmits it to the coating rate control algorithm module 13-3.

(3) The coating rate control algorithm module 13-3 uses the coating rate information, combined with the coating processing requirements of the quantum functional device, proposes the processing time of the coating and the moving rate and direction of the nano-positioning positioning sample stage 6, and then transmits it to the reference trajectory generation algorithm. Module 13-4,

(4) The reference trajectory generation algorithm module 13-4 uses the coating rate information, the coating processing time, and the movement rate and direction requirements of the nano-shift positioning sample stage 6, and combines the processing requirements of the quantum functional device to generate the nano-shift positioning sample stage 6. Referring to the motion trajectory, and transmitting the reference motion trajectory to the tracking control module 14 and the control cabinet 9, the control cabinet 9 transmits the reference motion trajectory Display and display module 10 and display it;

(5) The piezoelectric ceramic actuator 6-7 is extended after being energized, and the sample stage 6-5 is driven by the flexible mechanism 6-6, and the nano-grating sensor 6-4 collects the nano-grating signal, and then transmits it to the multi-channel signal set. Conditioning module 12;

The nano-grating sensor 6-4 is used to detect the displacement information of the sample stage 6-5 in both directions of the X and Y axes in real time, that is, the nano-grating signal, when the piezoelectric ceramic actuator 6-7 on the left side moves, The flexible mechanism 6-6 moves, which in turn pushes the sample stage 6-5 to move in the X direction, and the upper nano-grating sensor 6-4 collects the nano-grating signal in the X direction of the sample stage, and then transmits it to the multi-channel signal. The conditioning module 12 is arranged; when the piezoelectric ceramic actuator 6-7 on the lower side moves, the flexible mechanism 6-6 is driven to move, and then the sample stage 6-5 is moved in the Y direction, and the nano grating sensor 6-4 on the right side is The nano-grating signals collected in the Y direction from the sample stage 6-5 are then transmitted to the multi-channel signal collection and conditioning module 12 _;

(6) The multi-channel signal collection and processing module 12 modulates the collected nano-grating signals into a digital signal that can be processed by the computer, and transmits the digital signal to the tracking control module in the tracking control module 14 for high-speed signal collection and conditioning interface. Module 14-1, tracking control module high speed signal acquisition and conditioning interface module 14-1 converts the nano-grating signal into position information of the nano-shift positioning sample stage 6, and transmits the position information to the nano-tracking controller module 14-2 ;

(7) The nano tracking controller module 14-2 compares the position information with the reference motion trajectory transmitted by the reference trajectory generation algorithm module 13-4, and calculates a tracking control command according to the error, and transmits the tracking control command to the tracking control signal to amplify The drive module 14-3, the tracking control signal amplification drive module 14-3 amplifies the tracking control command, and transmits the amplified tracking control command to the driver 11 and the control cabinet 9;

(8) The driver 11 drives the piezoelectric ceramic actuator 6-7 to move, and the flexible hinge 6-2 transmits the movement of the piezoelectric ceramic actuator 6-7 to the sample stage 6-5 by the slight elastic deformation of the self material, the sample stage 6-5 carries the substrate substrate 7 to complete the trajectory movement required by the quantum functional device, thereby completing the geometric pattern coating process required for the quantum functional device.

Step 7: Determine whether the film thickness meets the processing requirements, and if yes, proceed to step 8. If not, return to step 4; the specific determination method is: using the film thickness meter 13-1 to detect the coating rate signal of the substrate substrate 7 in real time. , detecting the film thickness information of the substrate substrate 7;

Step 8: Quantum effect detection: After the substrate substrate 7 is coated, the substrate substrate 7 is taken out from the sample chamber 4, and the substrate substrate 7 is fixed on the quantum detecting station 17, by the host computer 8. The quantum detection stage positioning controller module 16-2 controls the position of the quantum detection stage 17 to accurately perform quantum effect detection on the processed samples on the substrate substrate.

The specific operation process is as follows: The built-in sensor of the quantum detection station 17 is collected into the quantum detection station position signal, and transmitted to the quantum detection station positioning control module high-speed signal collection and conditioning interface module 16-1, after conditioning, turning into a computer can After processing the digital signal; passing to the quantum detection station positioning controller module 16-2, the quantum detection station positioning controller module 16-2 obtains the actual position information of the quantum detection station 17 according to the quantum detection station position signal, and finally Comparing the reference position of arrival, according to the difference of position, generating a quantum detection station positioning control instruction for quantum detection; and transmitting to the quantum detection station positioning control signal amplification driving module 16-3, amplifying the positioning control instruction, and outputting to the quantum detection Station 17, control The quantum detection stage 17 carries the substrate substrate 7 to a set reference position for quantum effect detection.

Step 9: It is judged whether or not the processed sample on the substrate substrate 7 has a quantum effect, and if so, it ends, and if it does not have a quantum effect, it returns to step 1 to restart.

In addition, the control cabinet 9 communicates with the electron beam generating device 1, the vacuum system 3, the main control computer 8 and the sample chamber 4, comprehensively processes the information transmitted by each module, ensures information interaction and cooperative operation between the functional modules, and monitors each module. The function is coordinated, and the movement track, positioning information and film thickness information of the nano-positioning positioning sample stage 6 and the substrate substrate 7 are transmitted to the display and detection module 10, and the processing process is displayed online and monitored in real time.

While the embodiments of the present invention have been shown and described, it is understood that the embodiments of the present invention Any modifications and variations of the present invention are intended to be included within the scope of the present invention. Variations, modifications, alterations and variations of the above-described embodiments may be made by those skilled in the art without departing from the scope of the invention.

Claims

claims

1. A direct writing vacuum evaporation system, characterized by: including an electron beam generating device, a vacuum evaporation chamber, a vacuum system, a sample chamber, a driver, a multi-channel signal collection and conditioning module, a main control computer, a quantum detection platform, and a control unit. Cabinet, display and detection module;

The sample chamber has a nano-displacement sample stage and a mask mechanism inside; the nano-displacement sample stage consists of a base, a flexible mechanism, a nano grating sensor, a sample stage, a piezoelectric ceramic actuator, a preload screw and a Composed of a sample fixture; the sample stage is located in the center of the base; the surroundings of the sample stage are connected to the base through a flexible mechanism; the substrate substrate is fixed on the sample stage with a sample fixture;

There is a through hole in the middle of the adjacent two sides of the base, and a piezoelectric ceramic actuator is installed inside. One end of the piezoelectric ceramic actuator is fixed to the base through a preload screw, and the other end is in contact with the flexible mechanism; Piezoelectric ceramic actuator After the device is powered on, the end in contact with the flexible mechanism extends, and the flexible mechanism promotes the movement of the sample stage;

A nano-grating sensor is installed in the middle of the other two adjacent sides of the base, which collects nano-grating signals and then transmits them to the multi-channel signal collection and conditioning module;

The mask mechanism converts the high-purity gaseous target beam evaporated in the vacuum evaporation chamber into a gaseous target beam with a nanoscale size; it is directly deposited on the substrate substrate on the nano-shift sample stage;

The main control computer includes a trajectory generation module, a tracking control module, a positioning control module and a quantum detection platform positioning control module. The input end of the main control computer is connected to the multi-channel signal collection and conditioning module, and the output end is connected to the driver and the control cabinet; The computer-controlled quantum detection platform positioning control module is connected to the quantum detection platform;

The trajectory generation module is composed of a film thickness meter, a trajectory generation module, a high-speed signal collection and conditioning interface module, a coating rate control algorithm module, and a reference trajectory generation algorithm module;

The film thickness meter detects the coating rate signal of the substrate, passes it to the multi-channel signal collection and conditioning module for conditioning, converts it into a digital signal and passes it to the trajectory generation module high-speed signal collection and conditioning interface module, converts it into coating rate information, and then Passed to the coating rate control algorithm module, the coating processing time and the movement rate and direction of the nano-displacement sample stage are obtained from the coating rate control algorithm module, and then passed to the reference trajectory generation algorithm module, which generates the nano-displacement sample stage The reference movement trajectory is passed to the tracking control module and the control cabinet, and is displayed through the display and detection module; the tracking control module is composed of a tracking control module high-speed signal collection and conditioning interface module, a nano tracking controller module and a tracking control module. Composed of signal amplification driver module;

The multi-channel signal collection and conditioning module collects the nano-grating signal for conditioning, and then converts it into a digital signal and transmits it to the tracking control module. The high-speed signal collection and conditioning interface module converts it into the position information of the nano-shift positioning sample stage and transmits it to the nano-tracking control. The nano-tracking controller module transmits the actual movement trajectory of the nano-positioning sample stage and the substrate to the control cabinet. At the same time, it compares the actual movement trajectory with the reference movement trajectory to obtain tracking control instructions and transmits them to the tracking control signal. After amplifying the drive module, the tracking control instructions are amplified and transmitted to the driver and control cabinet, and the piezoelectric ceramic actuator is driven by the driver;

The positioning control module is composed of a laser ruler, a positioning control module high-speed signal collection and conditioning interface module, a nano-positioning controller module and a positioning control signal amplification drive module;

The laser ruler measures the position signals of the nano-displacement sample stage and the substrate substrate in real time, passes them to the multi-channel signal collection and conditioning module for conditioning, and then converts them into digital signals through the high-speed signal collection and conditioning interface module of the positioning control module and transmits them to the nanometer Positioning controller module, the nano positioning controller module generates positioning control instructions, feeds back the actual position signal to the control cabinet, and at the same time transmits the positioning control instructions to the positioning control signal amplification drive module, which is amplified and then transmitted to the driver and control cabinet; driver Drive piezoelectric ceramic actuator movement;

The described quantum detection platform positioning control module is composed of a quantum detection platform positioning control module high-speed signal collection and conditioning interface module, a quantum detection platform positioning controller module, and a quantum detection platform positioning control signal amplification drive module;

The high-speed signal collection and conditioning interface module of the quantum detection platform positioning control module collects the quantum detection platform position signals and converts them into digital signals after conditioning; passes them to the quantum detection platform positioning controller module to generate positioning control instructions; passes them to the quantum detection platform positioning The control signal is amplified by the drive module and then amplified and output to the quantum detection platform; at the same time, the quantum detection platform positioning controller module transmits the actual position information of the quantum detection platform to the control cabinet for display through the display and detection module;

2. The method of applying the direct writing vacuum evaporation system of claim 1, characterized in that: It includes the following steps: Step 1: Preparation, according to the needs of coating processing, place the corresponding target material in the vacuum evaporation chamber, and place the lining The base substrate is fixed on the nanodisplacement sample stage through the sample clamp;

Step 2: Vacuuming, under the action of the vacuum system, evacuate the vacuum evaporation chamber and sample chamber and maintain the vacuum state; Step 3: Positioning, use the main control computer to move the substrate to the designated reference position;

Step 4: Target evaporation: The electron beam generating device emits an electron beam into the vacuum evaporation chamber, and controls the direction of the electron beam through a magnetic field, hitting the target and causing it to sublime and evaporate into a high-purity gaseous target beam, which then enters the sample chamber;

Step 5: Target beam deposition coating: The high-purity gaseous target beam entering the sample chamber is transformed into a collimated target gas that can be precisely controlled under the action of the mask mechanism, and is formed into nanometer-sized particles. The beam is directly deposited on the substrate substrate; Step 6: Specific trajectory movement of the sample stage: Use the main control computer to control the movement of the substrate substrate, thereby forming a geometric pattern consistent with the movement trajectory on the substrate substrate;

Step 7: Determine whether the film thickness meets the processing requirements. If so, proceed to step 8. If not, return to step 4; the specific judgment method is: use a film thickness meter to detect the coating rate signal of the substrate in real time to detect the substrate. Film thickness information of the base substrate;

Step 8: Quantum effect detection: After the substrate coating process is completed, take the substrate out of the sample chamber and fix it on the quantum detection stage. The quantum detection stage positioning control module controls the position of the quantum detection stage and aligns the substrate. The processed samples on the base substrate are tested for quantum effects; Step 9: Determine whether the processed sample on the substrate has a quantum effect. If it has a quantum effect, it ends. If it does not have a quantum effect, return to step 1 and start again.

3. The method of direct writing vacuum evaporation system according to claim 2, characterized in that: the specific operation process of positioning described in step 3 is:

(1) Enter the initial reference position information of the nano-shift positioning sample stage on the input panel of the control cabinet, and transmit it to the positioning control module of the main control computer;

(2) The laser ruler measures the position signals of the nano-displacement sample stage and the substrate substrate in real time, and transmits the laser position signals to the multi-channel signal collection and conditioning module;

(3) The nano-positioning controller module obtains the actual position information of the nano-positioning sample stage based on the laser position signal, compares it with the reference position to be reached, and generates corresponding positioning control instructions based on the difference in position;

(4) The positioning control signal amplification drive module amplifies the positioning control command and transmits it to the driver, which drives the piezoelectric ceramic actuator of the nano-displacement sample stage to move. The specific operation process is: after the piezoelectric ceramic actuator is extended , the lower end is fixed with the pre-tightened screw, and the upper end pushes the flexible mechanism, the flexible hinge produces elastic deformation, and the sample stage is pushed through the flexible rod; the sample stage carries the substrate and moves to the designated reference position to prepare for later coating.

4. The method of direct writing vacuum evaporation system according to claim 2, characterized in that: the specific operation process of the specific trajectory movement of the sample stage described in step 6 is:

(1) The film thickness meter in the trajectory generation module is used to detect the coating rate signal of the substrate in real time and transmit it to the multi-channel signal collection and conditioning module;

(2) The high-speed signal collection and conditioning interface module of the trajectory generation module converts the coating rate feedback signal into coating rate information and then passes it to the coating rate control algorithm module;

(3) The coating rate control algorithm module uses the coating rate information, combined with the coating processing requirements of quantum functional devices, to obtain the coating processing time and the movement rate and direction of the nano-displacement sample stage, and then passes it to the reference trajectory generation algorithm module;

(4) The reference trajectory generation algorithm module generates the reference motion trajectory of the nano-displacement sample stage, and transmits the reference motion trajectory to the tracking control module and control cabinet. The control cabinet transmits the reference motion trajectory to the display and detection module and displays it;

(5) The piezoelectric ceramic actuator stretches after being energized, and pushes the sample stage to move through the flexible mechanism. The nanograting sensor collects the nanograting signal, and then transmits it to the multi-channel signal collection and conditioning module;

(6) The multi-channel signal collection and conditioning module collects the nano-grating signals for conditioning, and then passes them to the tracking control module, the high-speed signal collection and conditioning interface module, and then converts them into the position information of the nano-shift positioning sample stage, and passes it to the nano-tracking control device module;

(7) The nano-tracking controller module transmits the actual movement trajectory of the nano-displacement sample stage and substrate to the control cabinet. At the same time, it compares the actual movement trajectory with the reference movement trajectory, calculates the tracking control instruction, and transmits it to the tracking control signal amplification After driving the module, the tracking control instructions are amplified and transmitted to the driver and control cabinet; (8) The driver drives the movement of the piezoelectric ceramic actuator and controls the substrate substrate to complete the trajectory movement required by the quantum functional device, thereby completing the geometric pattern coating processing required by the quantum functional device.

5. The method of direct writing vacuum evaporation system according to claim 2, characterized in that: the specific process of the quantum detection platform positioning control module controlling the position of the quantum detection platform described in step 8 is:

The high-speed signal collection and conditioning interface module of the quantum detection platform positioning control module collects the quantum detection platform position signal, conditions it, and converts it into a digital signal; then passes it to the quantum detection platform positioning controller module to generate a quantum detection platform positioning control instruction; The signal is passed to the quantum detection stage positioning control signal amplification drive module, amplified, and then output to the quantum detection stage, which controls the quantum detection stage to carry the substrate substrate to the set reference position for quantum effect detection.