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WO2015056303A1 - Semiconductor-element manufacturing method and wafer mounting device - Google Patents

Semiconductor-element manufacturing method and wafer mounting device Download PDF

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Publication number
WO2015056303A1
WO2015056303A1 PCT/JP2013/077989 JP2013077989W WO2015056303A1 WO 2015056303 A1 WO2015056303 A1 WO 2015056303A1 JP 2013077989 W JP2013077989 W JP 2013077989W WO 2015056303 A1 WO2015056303 A1 WO 2015056303A1
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WO
WIPO (PCT)
Prior art keywords
wafer
dicing tape
flat
ring portion
dicing
Prior art date
Application number
PCT/JP2013/077989
Other languages
French (fr)
Japanese (ja)
Inventor
民雄 松村
Original Assignee
三菱電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三菱電機株式会社 filed Critical 三菱電機株式会社
Priority to DE112013007505.9T priority Critical patent/DE112013007505B4/en
Priority to US14/906,286 priority patent/US9659808B2/en
Priority to JP2015542431A priority patent/JP6156509B2/en
Priority to PCT/JP2013/077989 priority patent/WO2015056303A1/en
Priority to KR1020167009742A priority patent/KR101787926B1/en
Priority to CN201380080265.0A priority patent/CN105637618B/en
Priority to TW102142595A priority patent/TWI609418B/en
Publication of WO2015056303A1 publication Critical patent/WO2015056303A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing

Definitions

  • the present invention relates to a method for manufacturing a semiconductor element such as an IGBT (Insulated Gate Bipolar Transistor), and a wafer mount apparatus used in the manufacturing method.
  • a semiconductor element such as an IGBT (Insulated Gate Bipolar Transistor)
  • IGBT Insulated Gate Bipolar Transistor
  • Patent Document 1 discloses that after a surface structure such as a transistor is formed on the surface of an FZ wafer, the back surface of the wafer is ground. By this grinding, the center part of the back surface of the wafer is made thinner than the outer peripheral end part. Thereby, a rib part is formed in the outer peripheral edge part of the back surface of a wafer.
  • the ground wafer is subjected to processing such as ion implantation and formation of a metal electrode film.
  • the wafer warps from several mm to several tens of mm due to stress of the electrode film. A warped wafer cannot be transferred. Therefore, by leaving an area of several mm on the outer periphery of the wafer without grinding, a ring portion thicker than the central portion of the wafer may be provided to suppress warpage of the wafer.
  • a dicing tape is attached to the wafer.
  • a gap is generated between the wafer and the dicing tape, resulting in a problem that the number of effective chips (number of effective semiconductor elements) decreases.
  • the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a method for manufacturing a semiconductor element and a wafer mount apparatus capable of dicing a wafer without adverse effects such as a decrease in the number of effective chips.
  • a ring portion thicker than a central portion is formed on the outer periphery, and the first surface of a wafer having a first surface and a second surface opposite to the first surface. While the surface is adsorbed to the adsorption stage, the ring portion is separated from the wafer with a laser beam to form a flat wafer, and the flat surface while adsorbing the second surface of the flat wafer to the adsorption hand
  • the method includes an attaching step of separating the wafer from the suction stage and attaching the first surface to a dicing tape, and a dicing step of dicing the flat wafer attached to the dicing tape.
  • a ring portion thicker than the central portion is formed on the outer periphery, and the first surface of the wafer having a first surface and a second surface opposite to the first surface is provided.
  • a suction hand that moves the flat wafer from the suction stage and sticks it to the dicing tape while vacuum-sucking two surfaces.
  • the ring portion is removed from the wafer by the laser beam to form a flat wafer, and then the flat wafer is attached to the dicing tape, so that the wafer can be diced without any harmful effects.
  • FIG. 1 It is a figure explaining a comparative example. It is a figure explaining a comparative example. It is a figure explaining the affixing of the dicing tape with respect to the wafer in a comparative example. It is a figure explaining the dicing in a comparative example. It is a figure which shows the clearance gap of a comparative example. It is a figure which shows the expand stage etc. in a comparative example. It is a figure explaining the fracture
  • FIG. It is a figure which shows the cut part of the wafer mount apparatus which concerns on Embodiment 4.
  • FIG. It is a figure which shows the cut part of the wafer mount apparatus which concerns on Embodiment 5.
  • FIG. It is a figure which shows the cut part which concerns on a modification. It is a figure which shows the cut part which concerns on a modification.
  • FIG. 1 is a cross-sectional view of a wafer having a first surface 10a and a second surface 10b opposite to the first surface 10a.
  • the wafer 10 has a central portion 10A and a ring portion 10B.
  • the central portion 10A has a thickness of, for example, 100 ⁇ m or less by grinding the first surface 10a side.
  • an element such as a transistor is formed as a surface structure of the device.
  • the ring part 10B is a thicker part than the central part 10A located on the outer periphery of the central part 10A.
  • the ring portion 10B is formed to increase the strength of the wafer 10 and prevent the wafer 10 from warping.
  • a wafer having a thick portion on the outer periphery is referred to as a TAIKO (registered trademark) wafer.
  • FIG. 2 is a cross-sectional view showing that the wafer 10 is placed on the suction stage.
  • the suction hand 12 is attracted to the second surface 10 b of the wafer 10 to move the wafer 10, and the wafer 10 is placed on the suction stage 14.
  • the first surface 10 a of the wafer 10 comes into contact with the suction stage 14.
  • FIG. 3 is a cross-sectional view showing that the ring portion 10B is removed.
  • the ring portion 10B is separated from the wafer 10 with the laser beam 16a while the first surface 10a of the wafer 10 is adsorbed to the adsorption stage 14.
  • the laser beam 16a is applied to the boundary between the central portion 10A and the ring portion 10B.
  • Laser light 16 a is emitted from the laser oscillator 16.
  • a YAG laser it is not particularly limited to this.
  • FIG. 4 is a cross-sectional view showing the wafer after the cutting process.
  • the ring portion 10B is cut from the wafer 10, and only the central portion 10A remains.
  • a wafer having a constant thickness formed only by the central portion 10 ⁇ / b> A is referred to as a flat wafer 11.
  • the flat wafer 11 is separated from the suction stage 14. Specifically, the flat wafer 11 is separated from the suction stage 14 while the second surface 10 b of the flat wafer 11 is sucked by the suction hand 12.
  • the suction hand 12 can be prevented from warping by the suction hand 12 by setting the suction hand 12 to a size that can contact most of the second surface 10 b of the flat wafer 11.
  • the flat wafer 11 is attached to the dicing tape 20.
  • the dicing tape 20 has a structure in which the paste material 20A and the base material 20B are in close contact with each other.
  • the outer periphery of the dicing tape 20 is attached to an annular mount frame 22.
  • the first surface 10 a of the flat wafer 11 is attached to the glue material 20 ⁇ / b> A of the dicing tape 20.
  • the step of attaching the first surface 10a to the dicing tape 20 while separating the flat wafer 11 from the suction stage 14 while the second surface 10b of the flat wafer 11 is sucked by the suction hand 12 is referred to as a pasting step. .
  • the suction hand is retracted from the flat wafer 11.
  • the flat wafer 11 is not warped because it is attached to the dicing tape 20.
  • a structure in which the mount frame 22, the dicing tape 20, and the flat wafer 11 shown in FIG. 7 are integrated is referred to as a dicing structure.
  • the flat wafer 11 attached to the dicing tape 20 is diced.
  • This process is called a dicing process.
  • the dicing process first, the structure to be diced is placed on the adsorption stage 40 of the dicer. Then, the flat wafer 11 is diced by the dicing blade 42 in a state where the dicing tape 20 is adsorbed on the adsorption stage 40 of the dicer. Thereby, the flat wafer 11 is divided into individual semiconductor elements 11A (chips). Then, a groove 44 is formed in the dicing tape 20 by the dicing blade 42.
  • FIG. 9 is a plan view of the wafer and the like after the dicing process.
  • the flat wafer 11 is divided into individual semiconductor elements 11A by the vertical grooves 44A and the horizontal grooves 44B.
  • the method for manufacturing a semiconductor element according to the first embodiment of the present invention includes the above-described steps.
  • FIG. 10 is a plan view of the wafer mount apparatus 50.
  • the wafer mount apparatus 50 is an apparatus that mainly performs a cutting process and an attaching process.
  • the wafer mount apparatus 50 includes a stage 52.
  • a mount frame cassette 54 that houses the mount frame 22 is provided on the stage 52.
  • the mount frame 22 in the mount frame cassette 54 is conveyed to the dicing tape attaching unit 60.
  • the transport direction is indicated by an arrow 56.
  • the dicing tape attaching part 60 is a place where the mount frame 22 is attached to the dicing tape 20. After the mount frame 22 is attached to the dicing tape 20, the outer peripheral portion of the dicing tape 20 is cut. The mount frame 22 to which the dicing tape 20 is attached is conveyed to the attaching unit 70. The conveyance direction is indicated by an arrow 62.
  • the wafer mount apparatus 50 includes a stage 80.
  • a wafer cassette 82 that accommodates the wafer 10 is provided on the stage 80.
  • the wafer 10 in the wafer cassette 82 is transferred to the cutting unit 90 using the suction hand 12.
  • the conveyance direction is indicated by an arrow 84.
  • the cut unit 90 includes an adsorption stage 14 and a laser oscillator 16.
  • the cut part 90 cuts the ring part 10B as described with reference to FIGS. 2-4. Since the flat wafer 11 having a constant thickness formed by cutting the ring portion 10B is held by the suction stage 14, it does not warp.
  • the flat wafer 11 is transferred in the transfer direction indicated by the arrow 92. Specifically, the suction wafer 12 moves the flat wafer 11 from the suction stage 14 to the attaching unit 70 while vacuum-sucking the second surface 10 b of the flat wafer 11. Then, the mounting frame 22 on which the dicing tape 20 is affixed stands by in the affixing unit 70, and the flat wafer 11 is affixed to the dicing tape 20 as described with reference to FIG. At this time, it is preferable that the flat wafer 11 and the dicing tape 20 are brought into close contact with each other by applying a roller pressure in a direction toward the dicing tape 20 or a vacuum-atmospheric pressure to the flat wafer 11.
  • a structure to be diced in which the mount frame 22, the dicing tape 20, and the flat wafer 11 are integrated in the pasting portion 70 is completed.
  • the structure to be diced is transferred to the stage 100.
  • the transport direction is indicated by an arrow 94.
  • a cassette 102 for accommodating the structure to be diced is provided on the stage 100.
  • the structure to be diced is accommodated in the cassette 102, and the processing by the wafer mount apparatus 50 is completed.
  • the mount frame 22 with the dicing tape 20 attached and the wafer 10 are transferred into the chamber 200.
  • the chamber 200 is evacuated. The evacuation is performed by exhausting the air in the chamber 200 from the pipe 202 communicating with the chamber 200.
  • the ring portion 10B of the wafer 10 and the dicing tape 20 are brought into close contact with each other as shown in FIG.
  • the inside of the chamber 200 is returned to atmospheric pressure.
  • the atmospheric pressure 204 causes the dicing tape 20 to adhere to the first surface 10a of the wafer 10 as shown in FIG.
  • a gap 206 is formed between the stepped portion of the wafer 10 and the dicing tape 20.
  • the structure to be diced in the comparative example includes the wafer 10 in which the ring portion 10B is not cut.
  • the ring portion 10B is cut. Specifically, as shown in FIG. 14, the structure to be diced is placed on the suction stage 210, and the wafer 10 is cut into a circumferential shape by a dicing blade 212.
  • the rotating direction of the dicing blade 212 is indicated by a direction 214, and the moving direction is indicated by a direction 216 (a direction along the outer periphery of the wafer 10).
  • the suction stage 210 must be immediately below the dicing blade 212. If there is no suction stage 210 immediately below the dicing blade 212, the dicing blade 212 bends and breaks the wafer 10. Therefore, in consideration of variations in the width of the ring portion 10B, the thickness of the dicing tape 20, the center shift between the suction stage 210 and the wafer 10, the inside of the ring portion 10B must be cut by about a distance X1 (about 1.5 mm). Don't be.
  • the first problem can be solved. That is, in the first embodiment, since the laser beam is used, the ring portion 10B can be removed by cutting the boundary between the ring portion 10B and the central portion 10A. Therefore, since the ring portion 10B can be cut without substantially cutting the center portion 10A, the number of effective chips is not reduced. Such an effect can be obtained by providing the laser oscillator 16 in the cut portion 90 of the wafer mount apparatus 50 shown in FIG.
  • FIG. 15 is a view showing that a gap 206 between the wafer 10 and the dicing tape 20 is formed large.
  • a cross-sectional view is shown on the upper side of FIG. 15, and a plan view is shown on the lower side of FIG.
  • the semiconductor device manufacturing method according to the first embodiment of the present invention can solve the second problem. That is, in the first embodiment, since the flat wafer 11 is attached to the dicing tape 20, there is no gap between the flat wafer 11 and the dicing tape 20. Therefore, the semiconductor device manufacturing method according to the first embodiment does not cause the second problem.
  • FIG. 16 is a cross-sectional view showing expanding a dicing tape.
  • the separated semiconductor element 10 ⁇ / b> C is bonded to the dicing tape 20.
  • the dicing tape 20 is formed with an annular groove 302 formed when the ring portion is cut and a groove 304 generated when the wafer 10 is divided into individual semiconductor elements 10C.
  • FIG. 17 is a cross-sectional view showing that the dicing tape 20 is cut along the groove 302.
  • the dicing tape 20 is cut along the groove 302.
  • the third problem can be solved. That is, in the first embodiment, the ring portion 10B is cut before the wafer 10 is attached to the dicing tape 20, so that the annular groove due to the ring portion cut is not formed in the dicing tape 20. Therefore, the third problem does not occur in the method of manufacturing the semiconductor element of the first embodiment.
  • the manufacturing method of the semiconductor element according to the first embodiment of the present invention increases the number of effective chips compared to the method of the comparative example, the wafer does not fly during dicing, and the dicing tape 20 of the expanding state is expanded. Breakage can be avoided.
  • the flat wafer 11 may be warped.
  • the flat surface 11 is warped because the ring portion 10B is separated from the wafer 10 with the laser beam while the first surface 10a of the wafer 10 is adsorbed to the adsorption stage 14. There is no.
  • the second surface 10b of the flat wafer 11 is adsorbed by the adsorption hand 12, while the flat wafer 11 is separated from the adsorption stage 14, and the first surface 10a is adhered to the dicing tape 20, so that the flat wafer 11 is adhered. Will not warp.
  • the flat wafer 11 can always be kept flat from the time when the ring portion 10B is cut until the flat wafer 11 is attached to the dicing tape 20.
  • the laser oscillator 16 it is preferable to use a YAG laser that is easy to handle with a solid-state laser and has high efficiency and a long lifetime.
  • other laser elements may be used as the laser oscillator 16.
  • the polished surface of the wafer 10 is the first surface 10a
  • the opposite surface is the second surface 10b.
  • the effect of the present invention can be obtained even if the above-described treatment is performed by defining the second surface as the polished surface and defining the opposite surface as the first surface.
  • the semiconductor element manufacturing method and the wafer mount apparatus according to the following embodiment have many points that are the same as those of the first embodiment, and therefore, differences from the first embodiment will be mainly described.
  • FIG. FIG. 18 is a diagram showing a cut portion of the wafer mount apparatus according to the second embodiment of the present invention.
  • a water-soluble protective film 400 is formed on the second surface 10b.
  • the ring portion 10B is separated from the wafer 10 with the laser beam 16a.
  • the protective film 400 can prevent the laser cut waste 402 from adhering to the wafer 10.
  • FIG. FIG. 19 is a diagram showing a cut portion of the wafer mount apparatus according to the third embodiment of the present invention.
  • the central portion of the second surface 10 b is covered with the rubber ring 410 and the dust cover 412.
  • the ring portion 10B is separated from the wafer 10 with the laser beam 16a.
  • the rubber ring 410 and the dust cover 412 can prevent the laser cut waste 402 from adhering to the wafer 10. This method can be realized with fewer steps than forming a water-soluble protective film on the second surface 10b.
  • FIG. 20 is a diagram showing a cut portion of the wafer mount apparatus according to the fourth embodiment of the present invention.
  • the airflow generation device 420 is set so as to cover the rubber ring 410 and the dustproof cover 412.
  • the airflow generation device 420 there is a cavity 420a through which an airflow in the arrow direction flows.
  • the airflow generation device 420 generates an airflow 422 from the center portion of the second surface 10b toward the outer peripheral portion via the cavity 420a.
  • the ring portion 10B is separated from the wafer 10 with the laser beam 16a while the air flow 422 is generated. According to this method, the laser cut waste 402 can be prevented from adhering to the edge of the wafer 10.
  • FIG. FIG. 21 is a diagram showing a cut portion of the wafer mount apparatus according to the fifth embodiment of the present invention.
  • the cut portion includes a high water pressure pump 450.
  • a pipe 452 is connected to the high water pressure pump 450.
  • a nozzle 454 is connected to the pipe 452.
  • the cut portion is configured such that water discharged from the high water pressure pump 450 is sprayed onto the wafer 10 via the pipe 452 and the nozzle 454.
  • the diameter of the water column 458 ejected from the nozzle 454 is, for example, several tens of ⁇ m.
  • Laser light 16a emitted from the laser oscillator 16 is introduced into the water column 458 through the optical fiber 456 and the nozzle 454, and is irradiated to the boundary between the central portion 10A and the ring portion 10B.
  • water water column 458 is sprayed onto the irradiated portion of the laser light, so that an increase in temperature of the irradiated portion can be suppressed.
  • the laser cut waste 402 can be discharged to the outside by this water.
  • a rubber ring 410 and a dustproof cover 412 may be added to the configuration of the fifth embodiment.
  • a rubber ring 410, a dustproof cover 412, and an airflow generation device 420 may be added to the configuration of the fifth embodiment.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

This semiconductor-element manufacturing method is characterized by having the following steps: a cutting step in which, with the first surface of a wafer attached to a vacuum stage via a pressure differential, said wafer also having a second surface on the opposite side from said first surface and a ring section that is provided at the edge of the wafer and is thicker than the middle of the wafer, laser light is used to cut the ring section away from the rest of the wafer so as to form a flat wafer; an adhering step in which, with the second surface of the flat wafer attached to a vacuum end-effector via a pressure differential, the flat wafer is detached from the vacuum stage and the first surface of the flat wafer is adhered to a dicing tape; and a dicing step in which the flat wafer adhered to the dicing tape is diced.

Description

半導体素子の製造方法、ウエハマウント装置Semiconductor device manufacturing method and wafer mount apparatus
　この発明は、例えばＩＧＢＴ(Insulated Gate Bipolar Transistor)などの半導体素子の製造方法、及びその製造方法で用いるウエハマウント装置に関する。 The present invention relates to a method for manufacturing a semiconductor element such as an IGBT (Insulated Gate Bipolar Transistor), and a wafer mount apparatus used in the manufacturing method.
　特許文献１には、ＦＺウエハの表面にトランジスタなどの表面構造を形成した後に、当該ウエハの裏面を研削することが開示されている。この研削により、ウエハの裏面の中央部を外周端部よりも薄くする。これによりウエハの裏面の外周端部にリブ部が形成される。研削後のウエハにはイオン注入及び金属電極膜の形成等の処理が施される。 Patent Document 1 discloses that after a surface structure such as a transistor is formed on the surface of an FZ wafer, the back surface of the wafer is ground. By this grinding, the center part of the back surface of the wafer is made thinner than the outer peripheral end part. Thereby, a rib part is formed in the outer peripheral edge part of the back surface of a wafer. The ground wafer is subjected to processing such as ion implantation and formation of a metal electrode film.
日本特開２００９－２８３６３６号公報Japanese Unexamined Patent Publication No. 2009-283636 日本特表平１０－５００９０３号公報Japanese National Table 10-500903
　例えばウエハを１００μｍ以下の厚さになるまで研削すると、電極膜の応力等によりウエハが数ｍｍから数十ｍｍ反ってしまう。反ったウエハは搬送できない。そこで、ウエハの外周の数ｍｍの領域を研削せずに残しておくことでウエハの中央部よりも厚いリング部を設けウエハの反りを抑制することがある。 For example, if the wafer is ground to a thickness of 100 μm or less, the wafer warps from several mm to several tens of mm due to stress of the electrode film. A warped wafer cannot be transferred. Therefore, by leaving an area of several mm on the outer periphery of the wafer without grinding, a ring portion thicker than the central portion of the wafer may be provided to suppress warpage of the wafer.
　ダイシングブレードを用いてウエハをダイシングする場合、ウエハにダイシングテープを貼り付ける。しかしながら、リング部を有するウエハをダイシングテープに貼り付けようとするとウエハとダイシングテープの間に隙間が生じ、有効チップ数（有効半導体素子数）が低下するなどの弊害があった。 When dicing a wafer using a dicing blade, a dicing tape is attached to the wafer. However, when a wafer having a ring portion is to be attached to the dicing tape, a gap is generated between the wafer and the dicing tape, resulting in a problem that the number of effective chips (number of effective semiconductor elements) decreases.
　本発明は上述の課題を解決するためになされたものであり、有効チップ数が低下するなどの弊害なくウエハをダイシングできる半導体素子の製造方法、及びウエハマウント装置を提供することを目的とする。 The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a method for manufacturing a semiconductor element and a wafer mount apparatus capable of dicing a wafer without adverse effects such as a decrease in the number of effective chips.
　本願の発明にかかる半導体素子の製造方法は、外周に中央部より厚いリング部が形成され、第１面と、該第１面と反対の面である第２面とを有するウエハの該第１面を吸着ステージに吸着させつつ、レーザ光で該ウエハから該リング部を切り離すことで、平坦ウエハを形成するカット工程と、該平坦ウエハの該第２面を吸着ハンドに吸着させつつ、該平坦ウエハを該吸着ステージから離し、該第１面をダイシングテープに貼り付ける貼り付け工程と、該ダイシングテープに貼り付けられた該平坦ウエハをダイシングするダイシング工程と、を備えたことを特徴とする。 In the method for manufacturing a semiconductor device according to the present invention, a ring portion thicker than a central portion is formed on the outer periphery, and the first surface of a wafer having a first surface and a second surface opposite to the first surface. While the surface is adsorbed to the adsorption stage, the ring portion is separated from the wafer with a laser beam to form a flat wafer, and the flat surface while adsorbing the second surface of the flat wafer to the adsorption hand The method includes an attaching step of separating the wafer from the suction stage and attaching the first surface to a dicing tape, and a dicing step of dicing the flat wafer attached to the dicing tape.
　本願の発明に係るウエハマウント装置は、外周に中央部より厚いリング部が形成され、第１面と、該第１面と反対の面である第２面とを有するウエハの該第１面を吸着する吸着ステージと、レーザ光で該ウエハから該リング部を切り離すレーザ発振器とを有し、平坦ウエハを形成するカット部と、ダイシングテープが設けられた貼り付け部と、該平坦ウエハの該第２面を真空吸着しつつ、該平坦ウエハを該吸着ステージから移動させ該ダイシングテープに貼り付ける吸着ハンドと、を備えたことを特徴とする。 In the wafer mount device according to the present invention, a ring portion thicker than the central portion is formed on the outer periphery, and the first surface of the wafer having a first surface and a second surface opposite to the first surface is provided. A suction stage for suction; a laser oscillator for separating the ring portion from the wafer by laser light; a cut portion for forming a flat wafer; an attaching portion provided with a dicing tape; and a first portion of the flat wafer. And a suction hand that moves the flat wafer from the suction stage and sticks it to the dicing tape while vacuum-sucking two surfaces.
　本発明のその他の特徴は以下に明らかにする。 Other features of the present invention will be clarified below.
　この発明によれば、レーザ光によりウエハからリング部を除去して平坦ウエハを形成してから、平坦ウエハをダイシングテープに付着させるので、弊害なくウエハをダイシングできる。 According to the present invention, the ring portion is removed from the wafer by the laser beam to form a flat wafer, and then the flat wafer is attached to the dicing tape, so that the wafer can be diced without any harmful effects.
ウエハの断面図である。It is sectional drawing of a wafer. ウエハと吸着ステージの断面図である。It is sectional drawing of a wafer and an adsorption | suction stage. レーザ発振器等を示す図である。It is a figure which shows a laser oscillator etc. カット工程後のウエハを示す断面図である。It is sectional drawing which shows the wafer after a cutting process. 平坦ウエハを吸着ステージから離すことを示す図である。It is a figure which shows separating a flat wafer from an adsorption | suction stage. 平坦ウエハをダイシングテープに貼り付けることを示す断面図である。It is sectional drawing which shows affixing a flat wafer on a dicing tape. 被ダイシング構造を示す断面図である。It is sectional drawing which shows a to-be-diced structure. 平坦ウエハをダイシングすることを示す断面図である。It is sectional drawing which shows dicing a flat wafer. ダイシング工程後の平坦ウエハ等の平面図である。It is a top view of the flat wafer etc. after a dicing process. 実施の形態１に係るウエハマウント装置の平面図である。1 is a plan view of a wafer mount device according to a first embodiment. 比較例を説明する図である。It is a figure explaining a comparative example. 比較例を説明する図である。It is a figure explaining a comparative example. 比較例におけるウエハに対するダイシングテープの貼り付けを説明する図である。It is a figure explaining the affixing of the dicing tape with respect to the wafer in a comparative example. 比較例におけるダイシングを説明する図である。It is a figure explaining the dicing in a comparative example. 比較例の隙間を示す図である。It is a figure which shows the clearance gap of a comparative example. 比較例におけるエキスパンドステージ等を示す図である。It is a figure which shows the expand stage etc. in a comparative example. 比較例におけるダイシングテープの破断を説明する図である。It is a figure explaining the fracture | rupture of the dicing tape in a comparative example. 実施の形態２に係るウエハマウント装置のカット部を示す図である。It is a figure which shows the cut part of the wafer mount apparatus which concerns on Embodiment 2. FIG. 実施の形態３に係るウエハマウント装置のカット部を示す図である。It is a figure which shows the cut part of the wafer mount apparatus which concerns on Embodiment 3. FIG. 実施の形態４に係るウエハマウント装置のカット部を示す図である。It is a figure which shows the cut part of the wafer mount apparatus which concerns on Embodiment 4. FIG. 実施の形態５に係るウエハマウント装置のカット部を示す図である。It is a figure which shows the cut part of the wafer mount apparatus which concerns on Embodiment 5. FIG. 変形例に係るカット部を示す図である。It is a figure which shows the cut part which concerns on a modification. 変形例に係るカット部を示す図である。It is a figure which shows the cut part which concerns on a modification.
　本発明の実施の形態に係る半導体素子の製造方法とウエハマウント装置について図面を参照して説明する。同じ又は対応する構成要素には同じ符号を付し、説明の繰り返しを省略する場合がある。 A method for manufacturing a semiconductor device and a wafer mount apparatus according to an embodiment of the present invention will be described with reference to the drawings. The same or corresponding components are denoted by the same reference numerals, and repeated description may be omitted.
実施の形態１．
　本発明の実施の形態１に係る半導体素子の製造方法について説明する。図１は、第１面１０ａと、第１面１０ａと反対の面である第２面１０ｂとを有するウエハの断面図である。ウエハ１０は、中央部１０Ａとリング部１０Ｂを有している。中央部１０Ａは第１面１０ａ側が研削されて例えば１００μｍ以下の厚さとなっている。中央部１０Ａの第２面１０ｂ側にはデバイスの表面構造として例えばトランジスタなどの素子が形成されている。 Embodiment 1 FIG.
A method for manufacturing a semiconductor device according to the first embodiment of the present invention will be described. FIG. 1 is a cross-sectional view of a wafer having a first surface 10a and a second surface 10b opposite to the first surface 10a. The wafer 10 has a central portion 10A and a ring portion 10B. The central portion 10A has a thickness of, for example, 100 μm or less by grinding the first surface 10a side. On the second surface 10b side of the central portion 10A, an element such as a transistor is formed as a surface structure of the device.
　リング部１０Ｂは、中央部１０Ａの外周に位置する中央部１０Ａより厚い部分である。リング部１０Ｂは、ウエハ１０の強度を高め、ウエハ１０の反りを防止するために形成されている。なお、外周に厚い部分を有するウエハは、ＴＡＩＫＯ（登録商標）ウエハと称されている。 The ring part 10B is a thicker part than the central part 10A located on the outer periphery of the central part 10A. The ring portion 10B is formed to increase the strength of the wafer 10 and prevent the wafer 10 from warping. Note that a wafer having a thick portion on the outer periphery is referred to as a TAIKO (registered trademark) wafer.
　図２は、ウエハ１０を吸着ステージにのせることを示す断面図である。ウエハ１０の第２面１０ｂに吸着ハンド１２を吸着させてウエハ１０を移動させ、ウエハ１０を吸着ステージ１４にのせる。これにより、ウエハ１０の第１面１０ａが吸着ステージ１４に接触する。 FIG. 2 is a cross-sectional view showing that the wafer 10 is placed on the suction stage. The suction hand 12 is attracted to the second surface 10 b of the wafer 10 to move the wafer 10, and the wafer 10 is placed on the suction stage 14. As a result, the first surface 10 a of the wafer 10 comes into contact with the suction stage 14.
　次いで、リング部１０Ｂを除去する。図３は、リング部１０Ｂを除去することを示す断面図である。この工程では、ウエハ１０の第１面１０ａを吸着ステージ１４に吸着させつつ、レーザ光１６ａでウエハ１０からリング部１０Ｂを切り離す。このとき、レーザ光１６ａは、中央部１０Ａとリング部１０Ｂの境界に照射する。レーザ光１６ａはレーザ発振器１６から放出する。レーザ発振器１６としてＹＡＧレーザを用いることが好ましいが、特にこれに限定されない。 Next, the ring part 10B is removed. FIG. 3 is a cross-sectional view showing that the ring portion 10B is removed. In this step, the ring portion 10B is separated from the wafer 10 with the laser beam 16a while the first surface 10a of the wafer 10 is adsorbed to the adsorption stage 14. At this time, the laser beam 16a is applied to the boundary between the central portion 10A and the ring portion 10B. Laser light 16 a is emitted from the laser oscillator 16. Although it is preferable to use a YAG laser as the laser oscillator 16, it is not particularly limited to this.
　このように、ウエハ１０からリング部１０Ｂを切り離す工程をカット工程と称する。図４はカット工程後のウエハを示す断面図である。カット工程により、ウエハ１０からリング部１０Ｂがカットされ、中央部１０Ａだけが残る。中央部１０Ａだけで形成された厚みが一定のウエハを平坦ウエハ１１と称する。 Thus, the process of separating the ring portion 10B from the wafer 10 is referred to as a cutting process. FIG. 4 is a cross-sectional view showing the wafer after the cutting process. By the cutting process, the ring portion 10B is cut from the wafer 10, and only the central portion 10A remains. A wafer having a constant thickness formed only by the central portion 10 </ b> A is referred to as a flat wafer 11.
　次いで、図５に示すように、平坦ウエハ１１を吸着ステージ１４から離す。具体的には、平坦ウエハ１１の第２面１０ｂを吸着ハンド１２に吸着させつつ、平坦ウエハ１１を吸着ステージ１４から離す。ここで、吸着ハンド１２を平坦ウエハ１１の第２面１０ｂの殆どの部分と接触できる大きさとしておくことで、平坦ウエハ１１の反りを吸着ハンド１２で防止できる。 Next, as shown in FIG. 5, the flat wafer 11 is separated from the suction stage 14. Specifically, the flat wafer 11 is separated from the suction stage 14 while the second surface 10 b of the flat wafer 11 is sucked by the suction hand 12. Here, the suction hand 12 can be prevented from warping by the suction hand 12 by setting the suction hand 12 to a size that can contact most of the second surface 10 b of the flat wafer 11.
　次いで、図６に示すように、平坦ウエハ１１をダイシングテープ２０に貼り付ける。ダイシングテープ２０は糊材２０Ａと基材２０Ｂが密着した構造を有している。ダイシングテープ２０の外周は環状のマウントフレーム２２に付着している。この工程では、平坦ウエハ１１の第１面１０ａをダイシングテープ２０の糊材２０Ａに貼り付ける。このように、平坦ウエハ１１の第２面１０ｂを吸着ハンド１２に吸着させつつ、平坦ウエハ１１を吸着ステージ１４から離し、第１面１０ａをダイシングテープ２０に貼り付ける工程を、貼り付け工程と称する。 Next, as shown in FIG. 6, the flat wafer 11 is attached to the dicing tape 20. The dicing tape 20 has a structure in which the paste material 20A and the base material 20B are in close contact with each other. The outer periphery of the dicing tape 20 is attached to an annular mount frame 22. In this step, the first surface 10 a of the flat wafer 11 is attached to the glue material 20 </ b> A of the dicing tape 20. As described above, the step of attaching the first surface 10a to the dicing tape 20 while separating the flat wafer 11 from the suction stage 14 while the second surface 10b of the flat wafer 11 is sucked by the suction hand 12 is referred to as a pasting step. .
　次いで、図７に示すように、吸着ハンドを平坦ウエハ１１から退避させる。この状態では、平坦ウエハ１１はダイシングテープ２０に貼り付けられているので反らない。図７に示すマウントフレーム２２、ダイシングテープ２０、及び平坦ウエハ１１が一体となった構造を被ダイシング構造と称する。 Next, as shown in FIG. 7, the suction hand is retracted from the flat wafer 11. In this state, the flat wafer 11 is not warped because it is attached to the dicing tape 20. A structure in which the mount frame 22, the dicing tape 20, and the flat wafer 11 shown in FIG. 7 are integrated is referred to as a dicing structure.
　次いで、図８に示すように、ダイシングテープ２０に貼り付けられた平坦ウエハ１１をダイシングする。この工程をダイシング工程と称する。ダイシング工程では、まず、被ダイシング構造をダイサーの吸着ステージ４０の上に置く。そして、ダイシングテープ２０をダイサーの吸着ステージ４０に吸着させた状態で、ダイシングブレード４２により平坦ウエハ１１をダイシングする。これにより、平坦ウエハ１１は個々の半導体素子１１Ａ（チップ）に分割される。そして、ダイシングブレード４２によりダイシングテープ２０に溝４４が形成される。 Next, as shown in FIG. 8, the flat wafer 11 attached to the dicing tape 20 is diced. This process is called a dicing process. In the dicing process, first, the structure to be diced is placed on the adsorption stage 40 of the dicer. Then, the flat wafer 11 is diced by the dicing blade 42 in a state where the dicing tape 20 is adsorbed on the adsorption stage 40 of the dicer. Thereby, the flat wafer 11 is divided into individual semiconductor elements 11A (chips). Then, a groove 44 is formed in the dicing tape 20 by the dicing blade 42.
　図９は、ダイシング工程後のウエハ等の平面図である。縦方向の溝４４Ａと横方向の溝４４Ｂによって、平坦ウエハ１１が個々の半導体素子１１Ａに分割されている。本発明の実施の形態１に係る半導体素子の製造方法は、上述の工程を備える。 FIG. 9 is a plan view of the wafer and the like after the dicing process. The flat wafer 11 is divided into individual semiconductor elements 11A by the vertical grooves 44A and the horizontal grooves 44B. The method for manufacturing a semiconductor element according to the first embodiment of the present invention includes the above-described steps.
　続いて、被ダイシング構造を形成するための装置であるウエハマウント装置について説明する。図１０は、ウエハマウント装置５０の平面図である。ウエハマウント装置５０は、主としてカット工程と貼り付け工程を実施する装置である。ウエハマウント装置５０はステージ５２を備えている。ステージ５２の上にはマウントフレーム２２を収容するマウントフレームカセット５４が設けられている。マウントフレームカセット５４内のマウントフレーム２２は、ダイシングテープ貼り付け部６０へ搬送される。搬送方向は矢印５６で示されている。 Subsequently, a wafer mount apparatus that is an apparatus for forming a structure to be diced will be described. FIG. 10 is a plan view of the wafer mount apparatus 50. The wafer mount apparatus 50 is an apparatus that mainly performs a cutting process and an attaching process. The wafer mount apparatus 50 includes a stage 52. A mount frame cassette 54 that houses the mount frame 22 is provided on the stage 52. The mount frame 22 in the mount frame cassette 54 is conveyed to the dicing tape attaching unit 60. The transport direction is indicated by an arrow 56.
　ダイシングテープ貼り付け部６０は、マウントフレーム２２をダイシングテープ２０に貼り付ける場所である。マウントフレーム２２をダイシングテープ２０に貼り付けた後にダイシングテープ２０の外周部をカットする。ダイシングテープ２０が貼り付けられたマウントフレーム２２は、貼り付け部７０へ搬送される。搬送方向は矢印６２で示されている。 The dicing tape attaching part 60 is a place where the mount frame 22 is attached to the dicing tape 20. After the mount frame 22 is attached to the dicing tape 20, the outer peripheral portion of the dicing tape 20 is cut. The mount frame 22 to which the dicing tape 20 is attached is conveyed to the attaching unit 70. The conveyance direction is indicated by an arrow 62.
　貼り付け部７０の説明の前にウエハの処理について説明する。ウエハマウント装置５０は、ステージ８０を備えている。ステージ８０の上には、ウエハ１０を収容するウエハカセット８２が設けられている。ウエハカセット８２のウエハ１０は吸着ハンド１２を用いてカット部９０へ搬送される。搬送方向は矢印８４で示されている。 Prior to the description of the pasting unit 70, processing of the wafer will be described. The wafer mount apparatus 50 includes a stage 80. A wafer cassette 82 that accommodates the wafer 10 is provided on the stage 80. The wafer 10 in the wafer cassette 82 is transferred to the cutting unit 90 using the suction hand 12. The conveyance direction is indicated by an arrow 84.
　カット部９０は、吸着ステージ１４とレーザ発振器１６を備えている。カット部９０で、図２－４を参照しつつ説明したとおり、リング部１０Ｂをカットする。リング部１０Ｂをカットすることで形成された厚みが一定の平坦ウエハ１１は、吸着ステージ１４に保持されているので反ることはない。 The cut unit 90 includes an adsorption stage 14 and a laser oscillator 16. The cut part 90 cuts the ring part 10B as described with reference to FIGS. 2-4. Since the flat wafer 11 having a constant thickness formed by cutting the ring portion 10B is held by the suction stage 14, it does not warp.
　平坦ウエハ１１は、矢印９２で示す搬送方向へ搬送する。具体的には、吸着ハンド１２で、平坦ウエハ１１の第２面１０ｂを真空吸着しつつ、平坦ウエハ１１を吸着ステージ１４から貼り付け部７０へ移動させる。そして、貼り付け部７０ではダイシングテープ２０が貼り付けられたマウントフレーム２２が待機しており、図６を参照しつつ説明したとおり、平坦ウエハ１１をダイシングテープ２０に貼り付ける。この時、平坦ウエハ１１に対しダイシングテープ２０に向かう方向のローラー加圧、又は真空-大気加圧等を印加して、平坦ウエハ１１とダイシングテープ２０を密着させることが好ましい。 The flat wafer 11 is transferred in the transfer direction indicated by the arrow 92. Specifically, the suction wafer 12 moves the flat wafer 11 from the suction stage 14 to the attaching unit 70 while vacuum-sucking the second surface 10 b of the flat wafer 11. Then, the mounting frame 22 on which the dicing tape 20 is affixed stands by in the affixing unit 70, and the flat wafer 11 is affixed to the dicing tape 20 as described with reference to FIG. At this time, it is preferable that the flat wafer 11 and the dicing tape 20 are brought into close contact with each other by applying a roller pressure in a direction toward the dicing tape 20 or a vacuum-atmospheric pressure to the flat wafer 11.
　こうして、貼り付け部７０において、マウントフレーム２２、ダイシングテープ２０、及び平坦ウエハ１１が一体となった被ダイシング構造が完成する。被ダイシング構造は、ステージ１００へ搬送される。搬送方向は矢印９４で示されている。ステージ１００の上には、被ダイシング構造を収容するカセット１０２が設けられている。被ダイシング構造がカセット１０２に収容されて、ウエハマウント装置５０による処理が終了する。 Thus, a structure to be diced in which the mount frame 22, the dicing tape 20, and the flat wafer 11 are integrated in the pasting portion 70 is completed. The structure to be diced is transferred to the stage 100. The transport direction is indicated by an arrow 94. On the stage 100, a cassette 102 for accommodating the structure to be diced is provided. The structure to be diced is accommodated in the cassette 102, and the processing by the wafer mount apparatus 50 is completed.
　次に、本発明の意義の理解を容易にするために、比較例について説明する。比較例の半導体素子の製造方法ではまず、図１１に示すようにダイシングテープ２０が貼り付けられたマウントフレーム２２、及びウエハ１０をチャンバー２００内に搬送する。次いで、チャンバー２００内を真空引きする。真空引きは、チャンバー２００に通じる配管２０２からチャンバー２００内の空気を排気して行う。真空になったら、図１２に示すように、ウエハ１０のリング部１０Ｂとダイシングテープ２０を密着させる。 Next, comparative examples will be described in order to facilitate understanding of the significance of the present invention. In the semiconductor device manufacturing method of the comparative example, first, as shown in FIG. 11, the mount frame 22 with the dicing tape 20 attached and the wafer 10 are transferred into the chamber 200. Next, the chamber 200 is evacuated. The evacuation is performed by exhausting the air in the chamber 200 from the pipe 202 communicating with the chamber 200. When the vacuum is reached, the ring portion 10B of the wafer 10 and the dicing tape 20 are brought into close contact with each other as shown in FIG.
　次いで、チャンバー２００内を大気圧に戻す。そうすると、図１３に示すように大気圧２０４がウエハ１０の第１面１０ａにダイシングテープ２０を付着させる。このとき、ウエハ１０の段差部とダイシングテープ２０の間に隙間２０６が生じる。こうして比較例の被ダイシング構造が完成する。比較例の被ダイシング構造は、リング部１０Ｂをカットしていないウエハ１０を有する。 Next, the inside of the chamber 200 is returned to atmospheric pressure. Then, the atmospheric pressure 204 causes the dicing tape 20 to adhere to the first surface 10a of the wafer 10 as shown in FIG. At this time, a gap 206 is formed between the stepped portion of the wafer 10 and the dicing tape 20. Thus, the structure to be diced of the comparative example is completed. The structure to be diced in the comparative example includes the wafer 10 in which the ring portion 10B is not cut.
　次いで、リング部１０Ｂをカットする。具体的には、図１４に示すように、被ダイシング構造を吸着ステージ２１０にのせ、ダイシングブレード２１２でウエハ１０を周状にカットする。ダイシングブレード２１２の回転方向は方向２１４で示され、移動方向は方向２１６（ウエハ１０の外周に沿った方向）で示されている。 Next, the ring portion 10B is cut. Specifically, as shown in FIG. 14, the structure to be diced is placed on the suction stage 210, and the wafer 10 is cut into a circumferential shape by a dicing blade 212. The rotating direction of the dicing blade 212 is indicated by a direction 214, and the moving direction is indicated by a direction 216 (a direction along the outer periphery of the wafer 10).
　この時、ダイシングブレード２１２の直下には吸着ステージ２１０がなければならない。もし、ダイシングブレード２１２の直下に吸着ステージ２１０がなければ、ダイシングブレード２１２がウエハ１０を曲げ押して割ってしまう。そのため、リング部１０Ｂの幅のばらつき、ダイシングテープ２０の厚み、吸着ステージ２１０とウエハ１０の中心ズレ等を考慮すると、リング部１０Ｂよりも距離Ｘ１（１．５ｍｍ程度）程度内側をカットしなければならない。 At this time, the suction stage 210 must be immediately below the dicing blade 212. If there is no suction stage 210 immediately below the dicing blade 212, the dicing blade 212 bends and breaks the wafer 10. Therefore, in consideration of variations in the width of the ring portion 10B, the thickness of the dicing tape 20, the center shift between the suction stage 210 and the wafer 10, the inside of the ring portion 10B must be cut by about a distance X1 (about 1.5 mm). Don't be.
　このように、比較例では、リング部１０Ｂをカットする際に、中央部１０Ａの一部もカットしなければならないので、その分有効チップ数が減る。この問題を第１の問題と称する。 Thus, in the comparative example, when the ring portion 10B is cut, a part of the central portion 10A must also be cut, so that the number of effective chips is reduced accordingly. This problem is referred to as the first problem.
　本発明の実施の形態１に係る半導体素子の製造方法によれば、第１の問題を解消できる。つまり、実施の形態１では、レーザ光を用いるので、リング部１０Ｂと中央部１０Ａの境界をカットしてリング部１０Ｂを除去することができる。よって、実質的に中央部１０Ａをカットすることなく、リング部１０Ｂをカットできるので、有効チップ数が減ることは無い。このような効果は、図１０に示すウエハマウント装置５０のカット部９０にレーザ発振器１６を設けたことで得られる。 According to the method for manufacturing a semiconductor element according to the first embodiment of the present invention, the first problem can be solved. That is, in the first embodiment, since the laser beam is used, the ring portion 10B can be removed by cutting the boundary between the ring portion 10B and the central portion 10A. Therefore, since the ring portion 10B can be cut without substantially cutting the center portion 10A, the number of effective chips is not reduced. Such an effect can be obtained by providing the laser oscillator 16 in the cut portion 90 of the wafer mount apparatus 50 shown in FIG.
　ところで、比較例において、ウエハ１０とダイシングテープ２０の密着性が悪い場合は、これらの間の隙間が大きくなる。図１５は、ウエハ１０とダイシングテープ２０の隙間２０６が大きく形成されたことを示す図である。図１５の上側には断面図が示され、図１５の下側には平面図が示されている。隙間２０６が大きいと、リング部１０Ｂからカットを行う場所までの距離Ｘ１を大きくしなければならないので、有効チップ数が減ってしまう。具体的には、円２２０で囲まれた部分のみがダイシング工程に進むので、無駄になるチップ（半導体素子）が多い。しかも、ウエハ１０とダイシングテープ２０の接着面積が小さくなるので、ダイシング中にウエハ１０が飛びやすい。隙間２０６が大きくなることで生じるこれらの問題を第２の問題という。 By the way, in the comparative example, when the adhesion between the wafer 10 and the dicing tape 20 is poor, the gap between them becomes large. FIG. 15 is a view showing that a gap 206 between the wafer 10 and the dicing tape 20 is formed large. A cross-sectional view is shown on the upper side of FIG. 15, and a plan view is shown on the lower side of FIG. If the gap 206 is large, the distance X1 from the ring portion 10B to the place where the cutting is performed must be increased, and the number of effective chips is reduced. Specifically, since only the portion surrounded by the circle 220 proceeds to the dicing process, many chips (semiconductor elements) are wasted. Moreover, since the bonding area between the wafer 10 and the dicing tape 20 is reduced, the wafer 10 is likely to fly during dicing. These problems caused by the increase in the gap 206 are referred to as a second problem.
　本発明の実施の形態１に係る半導体素子の製造方法によれば、第２の問題を解消できる。つまり、実施の形態１では、平坦ウエハ１１をダイシングテープ２０に貼り付けるので、平坦ウエハ１１とダイシングテープ２０の間に隙間ができることはない。従って、実施の形態１に係る半導体素子の製造方法では、第２の問題は生じない。 The semiconductor device manufacturing method according to the first embodiment of the present invention can solve the second problem. That is, in the first embodiment, since the flat wafer 11 is attached to the dicing tape 20, there is no gap between the flat wafer 11 and the dicing tape 20. Therefore, the semiconductor device manufacturing method according to the first embodiment does not cause the second problem.
　ウエハをダイシングして個々の半導体素子に分割した後に、半導体素子をピックアップし易くするために、ダイシングテープをエキスパンド（伸ばす）することが一般的である。図１６はダイシングテープをエキスパンドすることを示す断面図である。個片化された半導体素子１０Ｃがダイシングテープ２０に接着している。ダイシングテープ２０には、リング部カット時に形成された環状の溝３０２、及びウエハ１０を個々の半導体素子１０Ｃに分割したときに生じた溝３０４が形成されている。エキスパンドステージ３００を上昇させてダイシングテープ２０を伸ばすことで、ダイシングライン（溝３０４）の幅が拡張されて半導体素子１０Ｃをピックアップし易くなる。 In general, after dicing and dividing the wafer into individual semiconductor elements, the dicing tape is generally expanded (stretched) so that the semiconductor elements can be easily picked up. FIG. 16 is a cross-sectional view showing expanding a dicing tape. The separated semiconductor element 10 </ b> C is bonded to the dicing tape 20. The dicing tape 20 is formed with an annular groove 302 formed when the ring portion is cut and a groove 304 generated when the wafer 10 is divided into individual semiconductor elements 10C. By raising the expanding stage 300 and extending the dicing tape 20, the width of the dicing line (groove 304) is expanded and the semiconductor element 10C can be easily picked up.
　ここで、溝３０２は環状に形成され、平面視したエキスパンドステージ３００も円形であるので、エキスパンド時にダイシングテープ２０の溝３０２の周辺に力が集中し、溝３０２に沿ってダイシングテープ２０が切れることがある。図１７は溝３０２に沿ってダイシングテープ２０が切れたことを示す断面図である。当然ながら、ダイシングテープ２０が切れると半導体素子１０Ｃをピックアップしづらくなる。これを第３の問題という。 Here, since the groove 302 is formed in an annular shape and the expanded stage 300 in plan view is also circular, the force concentrates around the groove 302 of the dicing tape 20 during expansion, and the dicing tape 20 is cut along the groove 302. There is. FIG. 17 is a cross-sectional view showing that the dicing tape 20 is cut along the groove 302. Naturally, when the dicing tape 20 is cut, it becomes difficult to pick up the semiconductor element 10C. This is called the third problem.
　本発明の実施の形態１に係る半導体素子の製造方法によれば、第３の問題を解消できる。つまり、実施の形態１では、ウエハ１０をダイシングテープ２０に貼り付ける前にリング部１０Ｂをカットするので、ダイシングテープ２０にリング部カットに起因する環状の溝は形成されない。従って、実施の形態１の半導体素子の製造方法では、第３の問題は生じない。 According to the method for manufacturing a semiconductor element according to the first embodiment of the present invention, the third problem can be solved. That is, in the first embodiment, the ring portion 10B is cut before the wafer 10 is attached to the dicing tape 20, so that the annular groove due to the ring portion cut is not formed in the dicing tape 20. Therefore, the third problem does not occur in the method of manufacturing the semiconductor element of the first embodiment.
　上記のとおり、本発明の実施の形態１に係る半導体素子の製造方法は、比較例の方法と比べて有効チップ数が増え、ダイシング中にウエハが飛ぶことがなく、エキスパンド時におけるダイシングテープ２０の破断を回避できるものである。 As described above, the manufacturing method of the semiconductor element according to the first embodiment of the present invention increases the number of effective chips compared to the method of the comparative example, the wafer does not fly during dicing, and the dicing tape 20 of the expanding state is expanded. Breakage can be avoided.
　ところで、ウエハ１０をダイシングテープ２０に貼り付ける前にリング部１０Ｂをカットすると、平坦ウエハ１１の反りが懸念される。しかしながら、本発明の実施の形態１のカット工程では、ウエハ１０の第１面１０ａを吸着ステージ１４に吸着させつつ、レーザ光でウエハ１０からリング部１０Ｂを切り離すので、平坦ウエハ１１が反ることはない。さらに、貼り付け工程では、平坦ウエハ１１の第２面１０ｂを吸着ハンド１２に吸着させつつ、平坦ウエハ１１を吸着ステージ１４から離し、第１面１０ａをダイシングテープ２０に貼り付けるので、平坦ウエハ１１が反ることはない。このように、リング部１０Ｂをカットする時から、平坦ウエハ１１をダイシングテープ２０に貼り付けるまで、常に、平坦ウエハ１１を平坦に保つことができる。 Incidentally, if the ring portion 10B is cut before the wafer 10 is attached to the dicing tape 20, the flat wafer 11 may be warped. However, in the cutting process according to the first embodiment of the present invention, the flat surface 11 is warped because the ring portion 10B is separated from the wafer 10 with the laser beam while the first surface 10a of the wafer 10 is adsorbed to the adsorption stage 14. There is no. Further, in the attaching process, the second surface 10b of the flat wafer 11 is adsorbed by the adsorption hand 12, while the flat wafer 11 is separated from the adsorption stage 14, and the first surface 10a is adhered to the dicing tape 20, so that the flat wafer 11 is adhered. Will not warp. As described above, the flat wafer 11 can always be kept flat from the time when the ring portion 10B is cut until the flat wafer 11 is attached to the dicing tape 20.
　レーザ発振器１６としては、固体レーザで扱いやすい上に高効率で寿命が長いＹＡＧレーザを用いることが好ましい。しかし、レーザ発振器１６として他のレーザ素子を用いても良い。また、本発明の実施の形態１では、ウエハ１０のうち研磨されて表れた面を第１面１０ａとし、その反対の面を第２面１０ｂとした。しかし、研磨されて表れた面を第２面とし、その反対の面を第１面と定義して、上記の処理を実施しても本発明の効果を得ることができる。なお、これらの変形は以下の実施の形態に係る半導体素子の製造方法及びウエハマウント装置にも応用できる。 As the laser oscillator 16, it is preferable to use a YAG laser that is easy to handle with a solid-state laser and has high efficiency and a long lifetime. However, other laser elements may be used as the laser oscillator 16. In the first embodiment of the present invention, the polished surface of the wafer 10 is the first surface 10a, and the opposite surface is the second surface 10b. However, the effect of the present invention can be obtained even if the above-described treatment is performed by defining the second surface as the polished surface and defining the opposite surface as the first surface. These modifications can also be applied to semiconductor device manufacturing methods and wafer mount apparatuses according to the following embodiments.
　以下の実施の形態に係る半導体素子の製造方法とウエハマウント装置については、実施の形態１と一致する点が多いので、実施の形態１との相違点を中心に説明する。 The semiconductor element manufacturing method and the wafer mount apparatus according to the following embodiment have many points that are the same as those of the first embodiment, and therefore, differences from the first embodiment will be mainly described.
実施の形態２．
　図１８は、本発明の実施の形態２に係るウエハマウント装置のカット部を示す図である。カット部を用いたカット工程では、まず、第２面１０ｂに水溶性の保護膜４００を形成する。その後、レーザ光１６ａでウエハ１０からリング部１０Ｂを切り離す。保護膜４００により、レーザカット屑４０２がウエハ１０に付着することを防止できる。 Embodiment 2. FIG.
FIG. 18 is a diagram showing a cut portion of the wafer mount apparatus according to the second embodiment of the present invention. In the cutting process using the cut portion, first, a water-soluble protective film 400 is formed on the second surface 10b. Thereafter, the ring portion 10B is separated from the wafer 10 with the laser beam 16a. The protective film 400 can prevent the laser cut waste 402 from adhering to the wafer 10.
実施の形態３．
　図１９は、本発明の実施の形態３に係るウエハマウント装置のカット部を示す図である。カット部を用いたカット工程では、まず、ゴムリング４１０と防塵カバー４１２で第２面１０ｂの中央部を覆う。その後、レーザ光１６ａでウエハ１０からリング部１０Ｂを切り離す。ゴムリング４１０と防塵カバー４１２によりレーザカット屑４０２がウエハ１０に付着することを防止できる。この方法は、第２面１０ｂに水溶性の保護膜を形成するよりは少ない工程で実現できる。 Embodiment 3 FIG.
FIG. 19 is a diagram showing a cut portion of the wafer mount apparatus according to the third embodiment of the present invention. In the cutting process using the cut portion, first, the central portion of the second surface 10 b is covered with the rubber ring 410 and the dust cover 412. Thereafter, the ring portion 10B is separated from the wafer 10 with the laser beam 16a. The rubber ring 410 and the dust cover 412 can prevent the laser cut waste 402 from adhering to the wafer 10. This method can be realized with fewer steps than forming a water-soluble protective film on the second surface 10b.
実施の形態４．
　図２０は、本発明の実施の形態４に係るウエハマウント装置のカット部を示す図である。カット部を用いたカット工程では、まず、ゴムリング４１０と防塵カバー４１２で第２面１０ｂの中央部を覆う。その後、ゴムリング４１０と防塵カバー４１２を覆うように気流生成装置４２０をセットする。気流生成装置４２０の中には、矢印方向の気流が流れる空洞４２０ａがある。気流生成装置４２０は、空洞４２０ａを経由して第２面１０ｂの中央部から外周部へ向かう気流４２２を生じさせるものである。そして、気流４２２を生じさせつつ、レーザ光１６ａでウエハ１０からリング部１０Ｂを切り離す。この方法によれば、レーザカット屑４０２がウエハ１０のエッジに付着することを防止できる。 Embodiment 4 FIG.
FIG. 20 is a diagram showing a cut portion of the wafer mount apparatus according to the fourth embodiment of the present invention. In the cutting process using the cut portion, first, the central portion of the second surface 10 b is covered with the rubber ring 410 and the dust cover 412. Thereafter, the airflow generation device 420 is set so as to cover the rubber ring 410 and the dustproof cover 412. In the airflow generation device 420, there is a cavity 420a through which an airflow in the arrow direction flows. The airflow generation device 420 generates an airflow 422 from the center portion of the second surface 10b toward the outer peripheral portion via the cavity 420a. Then, the ring portion 10B is separated from the wafer 10 with the laser beam 16a while the air flow 422 is generated. According to this method, the laser cut waste 402 can be prevented from adhering to the edge of the wafer 10.
実施の形態５．
　図２１は、本発明の実施の形態５に係るウエハマウント装置のカット部を示す図である。カット部は高水圧ポンプ４５０を備えている。高水圧ポンプ４５０には配管４５２が接続されている。配管４５２にはノズル４５４が接続されている。このカット部は、高水圧ポンプ４５０から放出された水が、配管４５２及びノズル４５４を経由して、ウエハ１０に噴きつけられるように構成されている。ノズル４５４から噴出する水柱４５８の直径は例えば数１０μｍである。 Embodiment 5 FIG.
FIG. 21 is a diagram showing a cut portion of the wafer mount apparatus according to the fifth embodiment of the present invention. The cut portion includes a high water pressure pump 450. A pipe 452 is connected to the high water pressure pump 450. A nozzle 454 is connected to the pipe 452. The cut portion is configured such that water discharged from the high water pressure pump 450 is sprayed onto the wafer 10 via the pipe 452 and the nozzle 454. The diameter of the water column 458 ejected from the nozzle 454 is, for example, several tens of μm.
　レーザ発振器１６から放出されるレーザ光１６ａは、光ファイバー４５６とノズル４５４を通って水柱４５８内に導入され、中央部１０Ａとリング部１０Ｂの境界に照射される。このように、カット工程において、レーザ光の照射部分に水（水柱４５８）を噴きつけることで、当該照射部分の温度上昇を抑えることができる。また、この水によりレーザカット屑４０２を外部へ排出することができる。 Laser light 16a emitted from the laser oscillator 16 is introduced into the water column 458 through the optical fiber 456 and the nozzle 454, and is irradiated to the boundary between the central portion 10A and the ring portion 10B. As described above, in the cutting step, water (water column 458) is sprayed onto the irradiated portion of the laser light, so that an increase in temperature of the irradiated portion can be suppressed. Moreover, the laser cut waste 402 can be discharged to the outside by this water.
　なお、上記の各実施の形態に係る半導体素子の製造方法とウエハマウント装置の特徴を適宜に組み合わせて、本発明の効果を高めても良い。例えば、図２２に示すように、実施の形態５の構成に、ゴムリング４１０と防塵カバー４１２を付加してもよい。また、図２３に示すように、実施の形態５の構成にゴムリング４１０、防塵カバー４１２、及び気流生成装置４２０を付加してもよい。 It should be noted that the effects of the present invention may be enhanced by appropriately combining the semiconductor element manufacturing method and the wafer mount apparatus according to each of the above embodiments. For example, as shown in FIG. 22, a rubber ring 410 and a dustproof cover 412 may be added to the configuration of the fifth embodiment. Further, as shown in FIG. 23, a rubber ring 410, a dustproof cover 412, and an airflow generation device 420 may be added to the configuration of the fifth embodiment.
　１０　ウエハ、　１０Ａ　中央部、　１０Ｂ　リング部、　１０Ｃ　半導体素子、　１０ａ　第１面、　１０ｂ　第２面、　１１　平坦ウエハ、　１１Ａ　半導体素子、　１２　吸着ハンド、　１４　吸着ステージ、　１６　レーザ発振器、　２０　ダイシングテープ、　２０Ａ　糊材、　２０Ｂ　基材、　２２　マウントフレーム、　４０　ダイサーの吸着ステージ、　４２　ダイシングブレード、　４４　溝、　５０　ウエハマウント装置、　５２　ステージ、　５４　マウントフレームカセット、　６０　ダイシングテープ貼り付け部、　７０　貼り付け部、　８０　ステージ、　８２　ウエハカセット、　９０　カット部、　１００　ステージ、　１０２　カセット、　２００　チャンバー、　２０２　配管、　２０６　隙間、　３００　エキスパンドステージ、　３０２,３０４　溝、　４００　保護膜、　４０２　レーザカット屑、　４１０　ゴムリング、　４１２　防塵カバー、　４２０　気流生成装置、　４２２　気流、　４５０　高水圧ポンプ、　４５２　配管、　４５４　ノズル、　４５６　光ファイバー 10 wafer, 10A central part, 10B ring part, 10C semiconductor element, 10a first side, 10b second side, 11 flat wafer, 11A semiconductor element, 12 suction hand, 14 suction stage, 16 laser oscillator, 20 dicing tape, 20A Adhesive, 20B base material, 22 mount frame, 40 dicer suction stage, 42 dicing blade, 44 groove, 50 wafer mount device, 52 stage, 54 mount frame cassette, 60 dicing tape affixing part, 70 affixing part, 80 Stage, 82 wafer cassette, 90 cut section, 100 stage, 102 cassette, 200 chamber, 202 piping, 206 gap, 00 expanding stage, 302, 304 groove, 400 a protective film, 402 a laser-cut chips, 410 rubber ring 412 dust cover, 420 air flow generating device, 422 a stream 450 high pressure pump, 452 pipe, 454 nozzles, 456 optical fiber

Claims (8)

  1. 　外周に中央部より厚いリング部が形成され、第１面と、前記第１面と反対の面である第２面とを有するウエハの前記第１面を吸着ステージに吸着させつつ、レーザ光で前記ウエハから前記リング部を切り離すことで、平坦ウエハを形成するカット工程と、
    　前記平坦ウエハの前記第２面を吸着ハンドに吸着させつつ、前記平坦ウエハを前記吸着ステージから離し、前記第１面をダイシングテープに貼り付ける貼り付け工程と、
    　前記ダイシングテープに貼り付けられた前記平坦ウエハをダイシングするダイシング工程と、を備えたことを特徴とする半導体素子の製造方法。     A ring portion thicker than the central portion is formed on the outer periphery, and the first surface of the wafer having the first surface and the second surface opposite to the first surface is adsorbed to the adsorption stage, and the laser beam is used. A cutting step of forming a flat wafer by separating the ring portion from the wafer;
    An adhering step of adhering the first surface to a dicing tape while separating the flat wafer from the adsorption stage while adsorbing the second surface of the flat wafer to an adsorption hand;
    And a dicing step of dicing the flat wafer attached to the dicing tape.
  2. 　前記カット工程では、ＹＡＧレーザを用いることを特徴とする請求項１に記載の半導体素子の製造方法。 The method for manufacturing a semiconductor device according to claim 1, wherein a YAG laser is used in the cutting step.
  3. 　前記カット工程では、前記第２面に水溶性の保護膜を形成した後に、前記ウエハから前記リング部を切り離すことを特徴とする請求項１又は２に記載の半導体素子の製造方法。 3. The method of manufacturing a semiconductor element according to claim 1, wherein, in the cutting step, the ring portion is separated from the wafer after a water-soluble protective film is formed on the second surface.
  4. 　前記カット工程では、ゴムリングと防塵カバーで前記第２面の中央部を覆った後に、前記ウエハから前記リング部を切り離すことを特徴とする請求項１又は２に記載の半導体素子の製造方法。 3. The method of manufacturing a semiconductor device according to claim 1, wherein, in the cutting step, the ring portion is separated from the wafer after the central portion of the second surface is covered with a rubber ring and a dust-proof cover.
  5. 　前記カット工程では、前記第２面の中央部から外周部に向かう気流を生じさせつつ、前記ウエハから前記リング部を切り離すことを特徴とする請求項１～４のいずれか１項に記載の半導体素子の製造方法。 The semiconductor according to any one of claims 1 to 4, wherein, in the cutting step, the ring portion is separated from the wafer while generating an air flow from a central portion of the second surface toward an outer peripheral portion. Device manufacturing method.
  6. 　前記カット工程では、前記レーザ光の照射部分に水を噴きつけることを特徴とする請求項１～５のいずれか１項に記載の半導体素子の製造方法。 6. The method of manufacturing a semiconductor element according to claim 1, wherein, in the cutting step, water is sprayed onto a portion irradiated with the laser light.
  7. 　前記カット工程では、前記中央部と前記リング部の境界に前記レーザ光を照射することを特徴とする請求項１～６のいずれか１項に記載の半導体素子の製造方法。 7. The method of manufacturing a semiconductor element according to claim 1, wherein, in the cutting step, the laser beam is irradiated to a boundary between the central portion and the ring portion.
  8. 　外周に中央部より厚いリング部が形成され、第１面と、前記第１面と反対の面である第２面とを有するウエハの前記第１面を吸着する吸着ステージと、レーザ光で前記ウエハから前記リング部を切り離すレーザ発振器とを有し、平坦ウエハを形成するカット部と、
    　ダイシングテープが設けられた貼り付け部と、
    　前記平坦ウエハの前記第２面を真空吸着しつつ、前記平坦ウエハを前記吸着ステージから移動させ前記ダイシングテープに貼り付ける吸着ハンドと、を備えたことを特徴とするウエハマウント装置。     An adsorption stage that adsorbs the first surface of a wafer having a first surface and a second surface opposite to the first surface, wherein a ring portion thicker than the center portion is formed on the outer periphery; A laser oscillator that separates the ring portion from the wafer, and a cut portion that forms a flat wafer;
    An affixing part provided with a dicing tape;
    A wafer mounting apparatus comprising: a suction hand that moves the flat wafer from the suction stage and sticks the second surface of the flat wafer to the dicing tape while vacuum suctioning the second surface of the flat wafer.
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