WO2014155939A1 - Mask frame unit, mask apparatus, and processing method - Google Patents
Mask frame unit, mask apparatus, and processing method Download PDFInfo
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- WO2014155939A1 WO2014155939A1 PCT/JP2014/000713 JP2014000713W WO2014155939A1 WO 2014155939 A1 WO2014155939 A1 WO 2014155939A1 JP 2014000713 W JP2014000713 W JP 2014000713W WO 2014155939 A1 WO2014155939 A1 WO 2014155939A1
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- Prior art keywords
- mask
- side portion
- frame body
- frame unit
- frame
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- 238000003672 processing method Methods 0.000 title claims description 9
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
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- 229910000990 Ni alloy Inorganic materials 0.000 description 1
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/143—Masks therefor
Definitions
- the present disclosure relates to a mask frame unit that mainly forms a frame of a mask used for vapor deposition and the like, a mask apparatus equipped with the mask frame unit, and a processing method using the mask apparatus.
- a material film pattern for pixels of red, green, and blue (R, G, and B) has been formed on a substrate by vacuum vapor deposition using a vapor deposition mask.
- a mask unit disclosed in Patent Literature 1 includes a frame, a metal mask attached with tension to the front surface of the frame by spot welding, and a metal tape attached with tension to the rear surface of the frame by spot welding.
- the use of the metal tape with tension allows warpage occurring in the frame to be corrected and the positional accuracy of the aperture portion of the mask to be maintained (see, for example, Patent Literature 1, paragraphs [0015], [0027], and the like in the specification).
- a mask frame unit including a frame body.
- the frame body includes a plurality of side portions and an area including a plurality of grooves.
- the plurality of side portions support a mask main body.
- the plurality of grooves are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
- the plurality of grooves are provided on an opposite surface in the at least one side portion, and thus an area between the plurality of grooves functions as a rib. This can increase the rigidity of the frame body. With such a configuration, the mask frame unit with high rigidity can be achieved without a complicated structure.
- the frame body may include an attaching surface and its opposite surface.
- the attaching surface and the opposite surface may be provided to each of the plurality of side portions, and the mask main body may be attached to the attaching surface and the opposite surface.
- the area including the plurality of grooves is provided to the opposite surface of the frame body, and thus the rigidity of the frame body can be increased more.
- the area including the plurality of grooves may be arranged on an outer side of the frame body with respect to a connection portion located between the mask main body and the attaching surface in the at least one side portion.
- the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other.
- the mask frame unit may further include a concave portion provided in a third side portion along a length direction of the third side portion, the third side portion being one side portion that is different from the first side portion and the second side portion in the plurality of side portions.
- the area including the plurality of grooves may be at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other.
- the frame body may include an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface.
- the frame body may include a first concave portion and a second concave portion.
- the first concave portion may be provided in a first area of the opposite surface in a third side portion that is one side portion different from the first side portion and the second side portion in the plurality of side portions.
- the second concave portion may be provided in a second area of the attaching surface in the third side portion, the second area being provided on an outer side of the frame body with respect to the first area.
- a support apparatus can support an area on the opposite surface of the frame body, the area corresponding to an area where the second area is provided on the other surface, thus supporting the mask frame unit.
- the mask frame unit may further include a tension mechanism that includes a rod-like member provided in at least one groove of the plurality of grooves and is capable of adjusting a tension applied to the frame body by using the rod-like member.
- the tension mechanism can apply a tension to the frame body and adjust the tension.
- the rod-like member of the tension mechanism may include a turnbuckle.
- the frame body may include end forming portions that form both ends of the at least one groove
- the tension mechanism may include bolts that are connected to both ends of the rod-like member via the end forming portions.
- the plurality of grooves may each have a depth that is 45 to 95% of a thickness of the frame body.
- a mask frame unit including a frame body.
- the frame body includes a plurality of side portions, a groove, and end forming portions.
- the plurality of side portions support a mask main body.
- the groove is provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
- the end forming portions form both ends of the groove.
- the groove is provided to the frame body in such a manner, and thus the weight reduction can be achieved.
- the mask frame unit may further include a tension mechanism that includes a rod-like member provided between the end forming portions at the both ends of the groove and is capable of adjusting a tension applied to the frame body by using the rod-like member.
- a mask apparatus including a mask main body and the mask frame unit described above.
- a processing method including: arranging the mask apparatus described above at a predetermined position; and attaching a material to a substrate via the mask apparatus.
- the reduction in weight of the mask frame unit and the mask apparatus can be achieved.
- Fig. 1 is a perspective view showing a mask apparatus including a mask frame unit according to a first embodiment of the present disclosure.
- Fig. 2 is a perspective view seen from the rear surface side of the mask apparatus.
- Fig. 3 is a plan view seen from the rear surface side of the mask apparatus.
- Fig. 4 is a cross sectional view taken along the line A-A of Fig. 3.
- Fig. 5 is a cross sectional view showing, as a comparative example (reference example) with the mask frame unit according to the first embodiment, a form in which a plurality of grooves are provided on an attaching surface for a mask.
- Figs. 6A and 6B are diagrams each showing, in the form shown in Figs.
- FIG. 7A is a diagram showing a process of applying a tension to a mask foil in an assembly process of the mask apparatus
- Fig. 7B is a diagram showing a process of releasing the tension applied to the mask foil in the assembly process.
- Figs. 8A and 8B are diagrams each showing, in the tension release process, analysis results on the deformation of a frame according to the comparative example (see Figs. 5 and 6B) used in the above simulation.
- Figs. 9A and 9B are diagrams each showing the deformation of the mask frame unit at the time of a vapor deposition process.
- Fig. 10 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a second embodiment of the present disclosure.
- Fig. 11 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a third embodiment of the present disclosure.
- Fig. 12 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a fourth embodiment of the present disclosure.
- Fig. 13 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a fifth embodiment of the present disclosure.
- Fig. 14 is a diagram showing a state of the mask frame unit shown in Fig. 13 being transferred by a conveyer having rollers at the time of a vapor deposition process.
- Fig. 15 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask supported on the plane (before and after the release of tension) by using the frame according to the comparative example and the mask frame unit shown in Fig. 13.
- Fig. 16 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in a process of changing a support condition by using the frame according to the comparative example and the mask frame unit shown in Fig. 13.
- Fig. 17 is a perspective view showing a front surface (attaching surface) side of a mask frame unit according to a sixth embodiment of the present disclosure.
- Fig. 18 is a cross sectional view taken along the line B-B of Fig. 17.
- Fig. 18 is a cross sectional view taken along the line B-B of Fig. 17.
- FIG. 19 is a diagram showing a configuration of a turnbuckle shown in Fig. 17.
- Fig. 20 is a diagram showing a configuration of a turnbuckle according to another embodiment.
- Figs. 21A and 21B are diagrams schematically showing a cross section taken along a groove of the mask frame unit shown in Fig. 17, in a support process by the conveyer at the time of a vapor deposition process.
- Fig. 22 is a diagram showing a state where the deformation of the frame body is measured using a camera or a dial gauge.
- Fig. 23 is a cross sectional view schematically showing a mask frame unit according to a seventh embodiment of the present disclosure.
- Fig. 24 is a diagram showing a main part of a tension mechanism of the mask frame unit shown in Fig. 23.
- Fig. 25 is a cross sectional view schematically showing a mask frame unit according to an eighth embodiment of the present disclosure.
- Fig. 26 is a diagram showing a state of the frame body being
- FIG. 1 is a perspective view showing a mask apparatus 100 including a mask frame unit according to a first embodiment of the present disclosure.
- Fig. 2 is a perspective view seen from the rear surface side of the mask apparatus 100.
- Fig. 3 is a plan view seen from the rear surface side of the mask apparatus 100.
- the mask apparatus 100 includes a mask main body 10 formed as a mask foil, and a mask frame unit 50 including a frame body 55 that supports the mask main body 10.
- the mask apparatus 100 can be typically used as a vapor deposition mask in the process of manufacture of a display device using an organic EL (Electro-Luminescence) device.
- the mask main body 10 be formed of a material having a linear thermal expansion coefficient equivalent to that of a substrate (for example, glass substrate) (not shown) that is subjected to vapor deposition. This is because the mask main body 10 and the substrate are expanded and contracted in synchronization with each other and are given with the same change amount in size due to the expansion and contraction along with a temperature change at the time of the vapor deposition process.
- a substrate for example, glass substrate
- metal materials such as nickel (Ni), invar (Fe/Ni alloy), and copper (Cu) are mainly used.
- the thickness of the mask main body 10 is typically about 10 to 50 micro m.
- the mask main body 10 has two pattern areas 10a that are formed so as to form two display surfaces.
- the same mask pattern is formed in each of the pattern areas 10a.
- the mask pattern examples include a plurality of through-holes (not shown) arranged in a matrix or zigzag, in which one through-hole serves as an element for forming one pixel area of the display device.
- the through-hole has a shape of a slit, a slot, a round, or the like.
- a low-molecular organic EL material as a vapor deposition material is vapor-deposited on a substrate (not shown) via the through-holes.
- three mask apparatuses 100 are used in accordance with the number of colors.
- Some mask apparatuses 100 have not only a pattern representing a pixel area but also a pattern representing an electrical circuit or the like.
- the vapor deposition material include, but not limited to the low-molecular organic EL material, an electrode material, a dielectric material, and an insulator material.
- the mask frame unit 50 includes the rectangular frame body 55 having an aperture 55a.
- the frame body 55 includes two side portions, i.e., a first side portion 51 and a second side portion 52, which are arranged along an x-axis direction and face each other, and the other two side portions, i.e., a third side portion 53 and a fourth side portion 54, which are arranged along a y-axis direction orthogonal to the x-axis direction and face each other.
- the length of the outer edge of each side portion is substantially the same.
- the first side portion 51 and the second side portion 52 may be different from the third side portion 53 and the fourth side portion 54 in length of each outer edge.
- the frame body 55 be also formed of a material having a linear thermal expansion coefficient equivalent to that of a substrate (not shown), as in the mask main body 10.
- the material include metal materials such as invar and SUS (steel use stainless). It is desirable that the frame body 55 have sufficient thickness and high rigidity to reduce its deformation amount as much as possible and also have a practical weight in consideration of transfer and handling.
- the frame body 55 includes an attaching surface 55b to which the mask main body 10 is attached, and an opposite surface 55c that is the opposite surface of the attaching surface 55b.
- the mask main body 10 is fixed to and supported by the attaching surface 55b of the frame body 55 by spot welding (by, for example, electrical resistance or laser) in the state where a certain level of tension is applied to the mask main body 10.
- Fig. 4 is a cross sectional view taken along the line A-A of Fig. 3.
- the first side portion 51 and the second side portion 52 are each provided with an area including a plurality of grooves (trenches) 56.
- groove group areas those areas are referred to as "groove group areas”.
- a groove group area 57 provided in each of the first side portion 51 and the second side portion 52 has substantially the same form, size, and the like, and thus the groove group area 57 provided in the first side portion 51 is basically described hereinafter.
- the plurality of grooves provided in the groove group area 57 for example, two grooves 56 are formed along the length direction (x-axis direction) of the first side portion 51 and arranged in the y-axis direction. Those two grooves 56 have substantially the same length and have, for example, approximately the same length as that of the mask main body 10 in the x-axis direction (but may have the length of the mask main body 10 or longer or shorter). As shown in Fig. 4, the cross section of the groove 56 is formed such that the width of the groove 56 becomes wider as the depth of the groove 56 from the opposite surface 55c is shallower. Typically, the cross section of the groove 56 is a trapezoid. However, the cross section of the groove 56 is not limited to the trapezoid, and may be a square, a rectangle, a triangle, and a polygon with five or more sides, or may be any form containing curves.
- the plurality of grooves 56 are provided on the opposite surface 55c of the frame body 55, so that areas 58 between the plurality of grooves 56 each function as a rib provided along the x-axis direction.
- the mask frame unit 50 with high rigidity can be achieved without using a complex structure while achieving the reduction in weight of the frame body 55.
- the groove group area 57 is provided on the opposite surface 55c as described above and arranged on the outer side of the frame body 55 with respect to a connection portion 11 between the mask main body 10 and each of the side portions 51 to 54.
- the groove group area 57 is insusceptible to the influence of the tension of the mask main body 10, and thus the deformation of the frame body 55 can be suppressed.
- Fig. 5 is a cross sectional view showing, as a comparative example (reference example) with the mask frame unit 50 according to this embodiment, a form in which the plurality of grooves 56 are provided on the attaching surface 55b for a mask.
- Figs. 6A and 6B are diagrams each showing, in the form shown in Figs. 4 and 5, simulation results on the rigidity at a side portion of the frame body when a tension is applied to the mask main body.
- Figs. 6A and 6B each show an example in which the cross section of the side portion is seen from the outside of the frame body 55 in an oblique direction and the frame body 55 (in Fig. 6B, frame body 15) is placed on a flat plate 60 (see Fig. 26). It should be noted that the applicant of the subject application can disclose this simulation in the figures with color, but the simulation is disclosed using a line drawing here.
- Specs of the mask main body used in the simulation are as follows.
- Material of mask main body Ni-Co alloy Size of mask main body: 900 mm in vertical length, 900 mm in horizontal length, and 12 micro m in thickness Stretch rate: 0.08% in x direction and 0.08% in y direction
- the rigidity of the frame body 55 can be sufficiently maintained if the bottom portion of the groove 56, which is the thinnest portion of the groove group area 57 of the frame body 55, is formed to have the thickness of 1 mm.
- a stretch amount of the bottom portion of the groove 56 due to the tension of the mask main body 10 is 1 micro m or less.
- the depth of the groove 56 is set to be 95% of the thickness of that frame body 55 (length from the attaching surface 55b to the opposite surface 55c). Consequently, the frame body 55 with high rigidity can be achieved while forming the grooves 56 as deep as possible to achieve the reduction in weight.
- the weight of the frame body 55 provided with the grooves 56 with the depth of 95% is 30 kg, thus achieving the reduction in weight of 30% or more.
- the rigidity of the frame body 55 can be increased more, but the weight of the frame body 55 is increased.
- the weight of the frame body 55 is reduced to 80% or less of the weight of the frame according to the second comparative example, that is, reduced to 36 kg from 45 kg.
- the depth of the grooves 56 can be reduced to 45% of the thickness of the frame body 55.
- the depth of the grooves 56 is desirable to set within the range of 45 to 95% of the thickness of the frame body 55.
- the depth is not limited to this range and may fall within the range of 10 to 95%, 20 to 95%, 30 to 95%, 40 to 95%, 20 to 80%, 30 to 70%, or the like.
- the width of the grooves 56 of the frame body 55 according to this embodiment is, for example, 1 to 100 mm, and more desirably, 10 to 20 mm.
- the mask apparatus 100 is manufactured as follows. First, a mask foil is manufactured by providing a number of fine aperture patterns on foil by electroforming, photoetching, and the like. Subsequently, with a tension being applied to the mask foil, the mask foil is fixed to the frame body by welding and the like. So, when the tension applied to the mask foil is released after the mask foil is fixed to the frame body, the tension of the mask foil deforms the frame. This deformation causes the aperture positions of the mask foil to be displaced and thus to be displaced from a position aimed at a set target value.
- This displacement amount of the frame itself has individual differences and has different stress distributions due to the variations of the displacement, the presence of sparse and dense aperture patterns formed on the mask foil, or non-uniform distribution of thickness that is caused in electroforming or rolling. Those factors cause problems that the aperture position of the mask foil is varied and the accuracy is deteriorated. To reduce such variations of the aperture position, it is necessary to enhance the rigidity of the frame and reduce the displacement amount.
- the thickness of the frame is increased in order to increase the rigidity of the frame and reduce the displacement of the aperture position.
- the weight becomes larger, and this causes the difficulty in handling or the weight goes above the weight limit of the mask apparatus in a vapor deposition apparatus.
- the use of a material having a small density such as aluminum
- a material having a small density such as aluminum
- the following problems occur: even when the tension is applied to the mask foil and the mask foil is fixed to the frame, a distortion and slack of the mask foil and the frame are caused due to a subsequent temperature change, and the accuracy of the aperture position is deteriorated. Further, Young's modulus of the aluminum is relatively low, that is, its rigidity is low.
- Japanese Patent Application Laid-open No. 2006-322015 discloses a frame that is obtained by laminating, bonding, and integrating a plurality of thin plates having a large number of holes for the purpose of weight reduction.
- the mask frame unit 50 includes the plurality of grooves 56, both of the weight reduction and the high rigidity can be achieved as described above.
- the frame body 55 can be manufactured by cutting work or shape forming. So, in this embodiment, the manufacturing process disclosed in Japanese Patent Application Laid-open No. 2006-322015 is not used. This allows an increase in productivity of the mask apparatus 100 and a reduction in production costs of the mask apparatus 100 and a product such as a display device that is manufactured by using the mask apparatus 100.
- the assembly process of the mask apparatus 100 refers to a process other than the manufacturing process of the mask foil and is a process including an attachment process of the mask main body 10 and the mask frame unit 50.
- the assembly process mainly includes the following processes: (a) a process of applying a tension to the mask foil; (b) a process of attaching (bonding) the mask foil to the mask frame unit; and (c) a process of releasing the tension applied to the mask foil
- the mask foil 10' With the tension being applied to the mask foil 10' in such a manner, in the process (b), the mask foil 10' is bonded and fixed to a mask frame unit 50' by spot welding and the like. Subsequently, as shown in Fig. 7B, in the process (c), the tension applied to the mask foil 10' is released.
- Figs. 8A and 8B are diagrams each showing, in the process (c), analysis results on the deformation of the frame according to the comparative example (see Figs. 5 and 6B) used in the above simulation and having a plurality of grooves 16 on the attaching surface 15b. It should be noted that the applicant of the subject application can disclose this simulation in the figures with color, but the simulation is disclosed using a line drawing and a gray scale here.
- the inward displacement in the x- and y-axis directions increases.
- a tension to a mask foil at a stretch rate of about 0.05% the mask foil being made of nickel and having an outer size of 700 mm x 700 mm x 10 micro m in thickness
- a force of about 200 to 300 N per side portion of the mask foil is used. In the process (c), the force is applied as it is to the frame.
- the eventual accuracy of the aperture position of the mask apparatus is determined based on an accumulation of the variations in the manufacturing process (electroforming, etching, etc.) of the mask foil and the assembly process.
- the manufacturing process and assembly process described above have to be performed as highly accurate as possible.
- the accuracy is liable to be deteriorated particularly in the process (c).
- the process (c) includes a process (c') of releasing the tension applied to the mask foil with the mask apparatus being supported on the "plane".
- the processes (a) and (b) described above are also performed.
- the state where the mask apparatus is supported on the "plane” is, specifically, the state where the mask frame unit 50 is placed on and supported by the flat plate 60 as shown in Fig. 26.
- FIGs. 9A and 9B Displacement of Frame in Vapor Deposition Process
- a mask apparatus 100' is often subjected to vapor deposition while being transported by a conveyer and the like for the purpose of the improvement in productivity, and a deflection occurs in the gravity direction of the frame 50'.
- the mask foil is not illustrated.
- the two rear surfaces of two opposed side portions 53' and 54' arranged along the y-axis direction of the frame 50' are supported and transported by a plurality of rollers 17 arranged along the y-axis direction, for example, eight rollers 17 on both sides.
- a vapor deposition source (not shown) is arranged below a mask apparatus 100', and a substrate (not shown) is arranged on the side of the frame 50' on which the mask foil is attached. For example, when the mask apparatus 100' is arranged at a predetermined position, a material evaporates from the vapor deposition source and adheres to the substrate via the mask apparatus 100'.
- the deflection amount in the gravity direction on the conveyer falls within the range of 100 to 300 micro m.
- adhesion between the substrate to be processed and the mask foil becomes poor, and the accuracy of the aperture position in the vapor deposition is also lowered.
- Patent Literature 1 (D) Conclusion With the mask unit disclosed in Patent Literature 1 described above, the deformation such as warpage of the frame can be suppressed by using the metal tape. However, as described above, Patent Literature 1 does not disclose the suppression of deformation in the assembly process of the mask unit and the process of changing the support condition after the assembly.
- the plurality of grooves 56 are provided on the opposite surface 55c side of the frame body 55, and thus the areas 58 between the grooves 56 each function as a rib as described above, achieving the weight reduction and high rigidity. Consequently, also in the manufacturing process including the assembly process of the mask apparatus 100 and in the process of changing the support condition in the subsequent vapor deposition process, while the weight reduction of the frame body 55 is achieved, desired rigidity can be ensured and the deformation of the frame body 55 can be suppressed.
- the accuracy of the aperture position of the mask apparatus 100 can be increased.
- the accuracy of the vapor deposition using the mask apparatus 100 is also increased, thus improving the yields of the products.
- Fig. 10 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a second embodiment of the present disclosure.
- the same members, functions, and the like as those included in the mask apparatus 100 according to the embodiment shown in Fig. 1 and the like are simply described or not described, and only differences will mainly be described.
- groove group areas 57 each including a plurality of grooves 56 are provided to not only a first side portion 151 and a second side portion152 but also a third side portion153 and a fourth side portion 154 along the y-axis direction. This allows the third side portion153 and the fourth side portion 154 to be provided with high rigidity by the effects of the ribs and allows the achievement of the weight reduction.
- Fig. 11 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a third embodiment of the present disclosure.
- a third side portion 203 and a fourth side portion 204 are each provided with a concave portion (or groove) 31 having the width larger than that of each groove 56 of groove group areas 57.
- Fig. 12 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a fourth embodiment of the present disclosure.
- a plurality of circular concave portions 32 are provided in a third side portion 253 and a fourth side portion 254.
- the shape of the concave portion 32 may be a long groove, an ellipse, a triangle, a polygon with four or more sides, and the like, in addition to the circular shape.
- Fig. 13 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a fifth embodiment of the present disclosure.
- a groove 33 as a concave portion is provided to a first area 311 that is an inner area of the frame body 305 in each of a third side portion 303 and a fourth side portion 304.
- a concave portion (second concave portion) 34 is provided to a second area 312 that is an outer area of an attaching surface 305b for a mask main body with respect to the first area 311.
- the width of the concave portion 34 is larger than that of the groove 33.
- the outer portion of the groove 33 provided to the opposite surface 305c can be supported by the rollers 17 of the conveyer in the vapor deposition process, so that the mask apparatus can be transported, as shown in Fig. 14 (Figs. 9A and 9B).
- the second areas 312 of the opposite surface 305c are restricted to be areas where grooves are not formed.
- a mask frame unit according to each of the embodiments shown in Figs. 10 to 12 can be used.
- the inventors of the present disclosure compared the mask frame unit 300 according to the fifth embodiment and the frame provided with the plurality of grooves 16 in the first side portion and the second side portion of the attaching surface 15b as described above according to the comparative example (see Fig. 5 and Fig. 6B) through a simulation.
- the displacement of about 10 micro m at a maximum in the comparative example could be reduced to about 60% of the displacement of the frame body 305 (that is, reduced by about 40%) according to the mask frame unit 300.
- the left part of Fig. 15 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (c') (before and after the release of the tension) in the case of using the frame according to the comparative example.
- the right part of Fig. 15 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (c') in the case of using the mask frame unit 300 according to the fifth embodiment.
- the left part of Fig. 15 shows an average displacement derived from five times of measurement, and the right part of Fig. 15 shows an average displacement derived from two times of measurement.
- one grid of the matrix depicted on the background represents 1 micro m.
- the deformation of the frame body 305 along both of the x and y axes is reduced.
- the displacement amount in the y-axis direction is reduced by about 50%, as compared to the comparative example. This displacement amount falls with the allowable range.
- the left part of Fig. 16 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (d) in the case of using the frame according to the comparative example.
- the right part of Fig. 16 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (d) in the case of using the mask frame unit 300 according to the fifth embodiment.
- Fig. 16 shows the displacement amount from the reference, with the supported state on the plane in the process (c') being a reference. Further, in the process (d), eight-point support in the first side portion 301 and the second side portion 302 is performed.
- the displacement amount in the x-axis direction is reduced by about 85% in one of the first side portion 301 and the second side portion 302, as compared to the comparative example. Further, the displacement amount in the x-axis direction is reduced by about 50% in the other one of the first side portion 301 and the second side portion 302, as compared to the comparative example. This displacement amount falls with the allowable range.
- a mask frame unit 350 according to a sixth embodiment shown in Fig. 17 can suppress the deformation of a frame body 355 more, particularly in the process of changing the support condition.
- Fig. 18 is a cross sectional view taken along the line B-B of Fig. 17.
- a groove 356 along the x-axis direction is provided in each of a first side portion 351 and a second side portion 352.
- a turnbuckle 40 functioning as a tension adjustment mechanism (tension mechanism) is arranged in each of those grooves 356.
- the turnbuckle 40 functions as a rod-like member of the tension mechanism.
- a groove 359 along the x axis is provided in an outer area with respect to the groove 356 on an opposite surface 355c that is opposite to the attaching surface 355b.
- the groove 359 is provided in both of the first side portion 351 and the second side portion 352, but may be provided to any one of the first side portion 351 and the second side portion 352. Further, although the groove 359 is not indispensable, the presence of the groove 359 can lead to the achievement of the weight reduction of the frame body 355.
- Fig. 19 is a diagram showing a configuration of the turnbuckle 40.
- the turnbuckle 40 includes an operation portion 42 and screw portions 46.
- the operation portion 42 is provided at the center of the turnbuckle 40.
- the screw portions 46 are connected to both ends of the operation portion 42. Both of the screw portions 46 are left-hand threads.
- the screw portions 46 are moved in the opposite directions of their length direction.
- both ends of the turnbuckle 40 are pressed against end forming portions 357 forming both ends of the groove 356, to be fixed.
- the rotation of the operation portion 42 causes the entire length of the turnbuckle 40 to be changed, with the result that the tension of the frame body 355 in the x-axis direction can be adjusted.
- the length of the turnbuckle 40, the diameter of the screws, and the like are desirably set in consideration of the support position where the frame body 355 is supported by the above-mentioned conveyer or flat plate.
- a force for moving the frame body 355 and a force applied to the turnbuckle 40 are desirably set based on the calculation on whether the turnbuckle 40 does not cause buckling.
- FIGs. 21A and 21B are diagrams schematically showing a cross section taken along the groove 356 of the mask frame unit 350 in the process (d), the mask frame unit 350 being supported by the conveyer in the vapor deposition process, for example.
- the illustration of the mask main body is omitted.
- Fig. 21A with a third side portion 353 and a fourth side portion 354 being supported, the deflection of the frame body 355 under its own weight is caused.
- the operator can create the state of the frame body 355 in which the deflection is substantially cancelled as shown in Fig. 21B. It should be noted that the operator can rotate the operation portion 42 of the turnbuckle 40 with tools such as a ratchet and a drift pin.
- the inventors of the present disclosure performed the following simulation on the deformation of the frame, which is caused in the process (c') of the assembly process described above.
- the frame body 355 of the mask frame unit 350 according to this embodiment is made of invar, and the outer size thereof is set to 900 mm x 900 mm x 20 mm.
- the turnbuckle 40 including the screw portions 46 each having a screw diameter of M8, being made of a SUS material, and having the length of 700 mm was used to apply a force of 1200 N from the inner side of the frame body 355 to one direction of the x-axis direction.
- the displacement in the above-mentioned connection portion (welding portion) 11 between the frame body 355 and the mask main body 10 to the tension direction could be reduced to 1 micro m or less.
- the mask foil normally has different stress distributions due to the presence of sparse and dense aperture patterns formed on the mask foil or non-uniform distribution of the thickness that is caused in electroforming or rolling.
- the tension applied to the mask foil is largely varied.
- a frictional force between the frame and a support unit that supports the frame largely varies depending on the state of the support surface of the support unit. So, it is very advantageous to be able to adjust a pressing force by the turnbuckle 40.
- the finer screw pattern of the screw portions 46 of the turnbuckle 40 allows a finer adjustment of the pressing force.
- the turnbuckle 40 is provided on the attaching surface 355b side of the frame body 355, the operator can operate the turnbuckle 40 from the attaching surface 355b side to adjust the tension.
- the operator can access the mask frame unit 350, which is at the same posture as that when the vapor deposition process is performed, from the attaching surface 355b side to easily perform operations.
- the operator has to access the mask unit from the rear surface side of the frame, which makes it difficult to operate.
- the mask frame unit 350 including the turnbuckle 40 can achieve downsizing by a simple configuration and is easy to handle, as compared to, for example, the frame including the metal tape disclosed in Patent Literature 1.
- the displacement of the frame body 355 can be adjusted after the process (c) of the assembly process, after the vapor deposition process, or after the subsequent cleaning process.
- a controller (computer) 70 measures an aperture position with a camera 71 and the like and calculates, based on the measurement results, a displacement amount between a measured value and a target value in the x-, y-, and z-axis directions. Subsequently, the controller 70 determines an operation amount of the turnbuckle 40 so as to correct the displacement amount and sends a control signal containing the operation amount to a drive unit (not shown).
- the drive unit (not shown) operates the operation portion 42 of the turnbuckle 40 based on the control signal.
- a measured value of the dial gauge 72 may be used.
- At least one processing may be performed by not a computer but a human.
- a turnbuckle 41 having a pipe-shaped operation part 43 as shown in Fig. 20 may be used instead of the turnbuckle 40 shown in Fig. 19, a turnbuckle 41 having a pipe-shaped operation part 43 as shown in Fig. 20 may be used.
- the operator can rotate the pipe-shaped operation part 43 by engaging a wrench in the center part of the operation part 43.
- the operation part 43 has a pipe shape and a size smaller than the operation portion 42 of the turnbuckle 40 described above.
- the turnbuckle 41 can be arranged easily in the groove 356.
- FIG. 23 is a cross sectional view schematically showing a mask frame unit according to a seventh embodiment of the present disclosure.
- a mask frame unit 400 in this embodiment includes an attaching surface 405b for a mask main body 10, an opposite surface 405c that is opposite to the attaching surface 405b, a groove 416 provided in at least one side portion along the x-axis direction on the opposite surface 405c of a frame body 405, and a tension mechanism 75.
- the tension mechanism 75 includes a rod-like member 76 and bolts 77.
- the rod-like member 76 is arranged in the groove 416.
- the bolts 77 are connected to both ends of the rod-like member 76 via end forming portions (protrusion portions) 405d that form both ends of the groove 416.
- the end forming portion 405d is provided with a through-hole 405e, and the bolt 77 is inserted into the through-hole 405e.
- Screw holes 76a are provided to the both ends of the rod-like member 76, and the bolts 77 are screwed into the screw holes 76a.
- the deformation of the rod-like member 76 and the frame body 405 (the deflection in the gravity direction in the figure) can be corrected by fastening of the bolts 77.
- FIG. 25 is a cross sectional view schematically showing a mask frame unit according to an eighth embodiment of the present disclosure.
- a mask frame unit 450 in this embodiment includes an attaching surface 455b for a mask main body, an opposite surface 455c that is opposite to the attaching surface 455b, a groove 456 provided in at least one side portion along the x-axis direction on the attaching surface 455b of a frame body 455, and a tension mechanism 85.
- the tension mechanism 85 includes a rib 86 and bolts 87.
- the rib 86 functions as a rod-like member that is arranged in the groove 456 and formed along the x-axis direction.
- the bolts 87 are able to press both ends of the rib 86 via end forming portions 455d that form both ends of the groove 456. Screw holes are provided to the end forming portions 455d, and the bolts 87 are screwed into the screw holes.
- the leading ends of the bolts 87 are able to be in contact with the both ends of the rib 86. With such a configuration, by fastening of the bolts 87, the both ends of the rib 86 can be pressed and the deformation of the frame body 455 (the deflection in the gravity direction in the figure) can be corrected.
- the rod-like member may be arranged in the groove 456 and the bolts 87 may be screwed into both ends of the rod-like member via the end forming portions 455d.
- the mask apparatus according to each of the embodiments can be applied to a mask foil for printing that is used for screen printing and the like, in addition to the mask foil for vapor deposition.
- the mask frame unit according to the comparative example shown in Fig. 5 is also an apparatus that falls within the range of the present disclosure.
- desired rigidity of the frame body 15 can be achieved by an appropriate adjustment of the depth and width of the grooves, for example, by an adjustment to make the grooves to be shallower than the grooves 56 of the frame body 55 shown in Fig. 4.
- Both ends of each of the plurality of grooves 56 and the like provided to the frame body according to each of the embodiments are provided with the end forming portions, so that the grooves are closed.
- the following groove may be provided instead.
- the groove does not include end forming portions to form both ends of the groove and passes completely through the frame body from one edge to the other edge in one side portion of the frame body.
- the number of grooves 56 provided to the groove group area 57 in the mask frame unit according to each of the embodiments is two, but three or more grooves may be provided.
- the groove formed along at least one side portion of the frame body of each of the embodiments may be divided into a plurality of portions arranged along the one side portion.
- partitioning portions or protrusion portions that partition one long groove formed along the one side portion only need to be formed on the frame body.
- At least one of the grooves 56 may be different from the other grooves 56 in shape and size.
- each of the first side portion 351 and the second side portion 352 is provided with the turnbuckle 40.
- only one of the side portions may be provided with the turnbuckle 40.
- the mask frame unit 350 shown in Fig. 22 may not include the turnbuckle 40.
- a mask frame unit provided with a single groove 356 (including the end forming portions 357), which is arranged in at least one side portion of at least one of the attaching surface 355b and the opposite surface 355c along a length direction of the one side portion, is also an apparatus that falls within the range of the present disclosure.
- the shape of the mask frame unit according to each of the embodiments is a rectangle with four sides, but may be hexagonal, octagon, and the like.
- a mask frame unit including a frame body including a plurality of side portions that support a mask main body, and an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
- the frame body includes an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface, and the area including the plurality of grooves is provided to the opposite surface.
- the mask frame unit according to (2) in which the area including the plurality of grooves is arranged on an outer side of the frame body with respect to a connection portion located between the mask main body and the attaching surface in the at least one side portion.
- the mask frame unit according to any one of (1) to (3) in which the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other.
- the mask frame unit according to (4) further including a concave portion provided in a third side portion along a length direction of the third side portion, the third side portion being one side portion that is different from the first side portion and the second side portion in the plurality of side portions.
- the mask frame unit according to (1) in which the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other, and the frame body includes an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface, a first concave portion provided in a first area of the opposite surface in a third side portion that is one side portion different from the first side portion and the second side portion in the plurality of side portions, and a second concave portion provided in a second area of the attaching surface in the third side portion, the second area being provided on an outer side of the frame body with respect to the first area.
- a tension mechanism that includes a rod-like member provided in at least one groove of the plurality of grooves and is capable of adjusting a tension applied to the frame body by using the rod-like member.
- the rod-like member of the tension mechanism includes a turnbuckle.
- a mask frame unit including a frame body including a plurality of side portions that support a mask main body, a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and end forming portions that form both ends of the groove.
- a tension mechanism that includes a rod-like member provided between the end forming portions at the both ends of the groove and is capable of adjusting a tension applied to the frame body by using the rod-like member.
- a mask apparatus including: a mask main body; and a frame body including a plurality of side portions that support the mask main body, and an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
- a processing method including: arranging a mask apparatus at a predetermined position; and attaching a material to a substrate via the mask apparatus, the mask apparatus including a mask main body, and a frame body including a plurality of side portions that support the mask main body, and an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
- a mask apparatus including: a mask main body; and a frame body including a plurality of side portions that support the mask main body, a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and end forming portions that form both ends of the groove.
- a processing method including: arranging a mask apparatus at a predetermined position; and attaching a material to a substrate via the mask apparatus, the mask apparatus including a mask main body, and a frame body including a plurality of side portions that support the mask main body, a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and end forming portions that form both ends of the groove.
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Abstract
There is provided a mask frame unit including a frame body. The frame body includes a plurality of side portions and an area including a plurality of grooves. The plurality of side portions support a mask main body. The area including the plurality of grooves are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
Description
The present disclosure relates to a mask frame unit that mainly forms a frame of a mask used for vapor deposition and the like, a mask apparatus equipped with the mask frame unit, and a processing method using the mask apparatus.
CROSS REFERENCE TO RELATED APPLICATIONS
This application claims the benefit of Japanese Priority Patent Application JP 2013-071425 filed March 29, 2013, the entire contents of which are incorporated herein by reference.
This application claims the benefit of Japanese Priority Patent Application JP 2013-071425 filed March 29, 2013, the entire contents of which are incorporated herein by reference.
In the manufacturing process of a display device using, for example, an organic EL (Electro-Luminescence) device, a material film pattern for pixels of red, green, and blue (R, G, and B) has been formed on a substrate by vacuum vapor deposition using a vapor deposition mask.
In general, a trade-off relationship is established between the aperture ratio of an aperture pattern and the definition of the display device. However, an increase in positional accuracy of an aperture pattern of a mask allows boost-up of the limits of the display device and allows an achievement of a display panel with high definition and a high aperture ratio.
For example, a mask unit disclosed in Patent Literature 1 includes a frame, a metal mask attached with tension to the front surface of the frame by spot welding, and a metal tape attached with tension to the rear surface of the frame by spot welding. In such a manner, the use of the metal tape with tension allows warpage occurring in the frame to be corrected and the positional accuracy of the aperture portion of the mask to be maintained (see, for example, Patent Literature 1, paragraphs [0015], [0027], and the like in the specification).
As described above, a mask frame capable of suppressing generation of warpage as much as possible is expected. To achieve such a mask frame, however, it is necessary to prepare a complicated structure such as a metal tape and a jig for adjusting a tension of the metal tape, as described in Patent Literature 1.
In view of the above necessity, it is desirable to provide a mask frame unit and a mask apparatus that are capable of maintaining a desired rigidity without using a complicated structure. Further, it is also desirable to provide a processing method using the mask apparatus.
According to an embodiment of the present disclosure, there is provided a mask frame unit including a frame body. The frame body includes a plurality of side portions and an area including a plurality of grooves.
The plurality of side portions support a mask main body.
The plurality of grooves are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
The plurality of side portions support a mask main body.
The plurality of grooves are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
The plurality of grooves are provided on an opposite surface in the at least one side portion, and thus an area between the plurality of grooves functions as a rib. This can increase the rigidity of the frame body. With such a configuration, the mask frame unit with high rigidity can be achieved without a complicated structure.
The frame body may include an attaching surface and its opposite surface. The attaching surface and the opposite surface may be provided to each of the plurality of side portions, and the mask main body may be attached to the attaching surface and the opposite surface. The area including the plurality of grooves is provided to the opposite surface of the frame body, and thus the rigidity of the frame body can be increased more.
The area including the plurality of grooves may be arranged on an outer side of the frame body with respect to a connection portion located between the mask main body and the attaching surface in the at least one side portion. With such a configuration, the area including the plurality of grooves is insusceptible to the influence of the tension of the mask main body, thus the rigidity of the frame body can be increased.
The area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other. With such a configuration, the weight reduction of the frame body can be achieved.
The mask frame unit may further include a concave portion provided in a third side portion along a length direction of the third side portion, the third side portion being one side portion that is different from the first side portion and the second side portion in the plurality of side portions. With such a configuration, the weight reduction of the frame body can be achieved.
The area including the plurality of grooves may be at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other. In this case, the frame body may include an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface. Further, the frame body may include a first concave portion and a second concave portion. The first concave portion may be provided in a first area of the opposite surface in a third side portion that is one side portion different from the first side portion and the second side portion in the plurality of side portions. The second concave portion may be provided in a second area of the attaching surface in the third side portion, the second area being provided on an outer side of the frame body with respect to the first area. With such a configuration, a support apparatus can support an area on the opposite surface of the frame body, the area corresponding to an area where the second area is provided on the other surface, thus supporting the mask frame unit.
The mask frame unit may further include a tension mechanism that includes a rod-like member provided in at least one groove of the plurality of grooves and is capable of adjusting a tension applied to the frame body by using the rod-like member. The tension mechanism can apply a tension to the frame body and adjust the tension.
The rod-like member of the tension mechanism may include a turnbuckle. With such a configuration, the tension can be easily applied to the frame body and thus the tension can be finely adjusted.
Alternatively, the frame body may include end forming portions that form both ends of the at least one groove, and the tension mechanism may include bolts that are connected to both ends of the rod-like member via the end forming portions.
The plurality of grooves may each have a depth that is 45 to 95% of a thickness of the frame body.
According to another embodiment of the present disclosure, there is provided a mask frame unit including a frame body. The frame body includes a plurality of side portions, a groove, and end forming portions.
The plurality of side portions support a mask main body.
The groove is provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
The end forming portions form both ends of the groove.
The plurality of side portions support a mask main body.
The groove is provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
The end forming portions form both ends of the groove.
The groove is provided to the frame body in such a manner, and thus the weight reduction can be achieved.
The mask frame unit may further include a tension mechanism that includes a rod-like member provided between the end forming portions at the both ends of the groove and is capable of adjusting a tension applied to the frame body by using the rod-like member.
According to another embodiment of the present disclosure, there is provided a mask apparatus including a mask main body and the mask frame unit described above.
According to another embodiment of the present disclosure, there is provided a processing method including: arranging the mask apparatus described above at a predetermined position; and attaching a material to a substrate via the mask apparatus.
As described above, according to the present disclosure, the reduction in weight of the mask frame unit and the mask apparatus can be achieved.
Hereinafter, embodiments of the present disclosure will be described with reference to the drawings.
1. First Embodiment
(1) Configuration of Mask Frame Unit and Mask Apparatus
Fig. 1 is a perspective view showing amask apparatus 100 including a mask frame unit according to a first embodiment of the present disclosure. Fig. 2 is a perspective view seen from the rear surface side of the mask apparatus 100. Fig. 3 is a plan view seen from the rear surface side of the mask apparatus 100.
Fig. 1 is a perspective view showing a
The mask apparatus 100 includes a mask main body 10 formed as a mask foil, and a mask frame unit 50 including a frame body 55 that supports the mask main body 10. The mask apparatus 100 can be typically used as a vapor deposition mask in the process of manufacture of a display device using an organic EL (Electro-Luminescence) device.
It is desirable that the mask main body 10 be formed of a material having a linear thermal expansion coefficient equivalent to that of a substrate (for example, glass substrate) (not shown) that is subjected to vapor deposition. This is because the mask main body 10 and the substrate are expanded and contracted in synchronization with each other and are given with the same change amount in size due to the expansion and contraction along with a temperature change at the time of the vapor deposition process. As the material of the mask main body 10, metal materials such as nickel (Ni), invar (Fe/Ni alloy), and copper (Cu) are mainly used.
The thickness of the mask main body 10 is typically about 10 to 50 micro m. For example, the mask main body 10 has two pattern areas 10a that are formed so as to form two display surfaces. For example, the same mask pattern is formed in each of the pattern areas 10a.
Examples of the mask pattern include a plurality of through-holes (not shown) arranged in a matrix or zigzag, in which one through-hole serves as an element for forming one pixel area of the display device. For example, the through-hole has a shape of a slit, a slot, a round, or the like. For example, a low-molecular organic EL material as a vapor deposition material is vapor-deposited on a substrate (not shown) via the through-holes. In the case of using three colors of red, green and blue (R, G, and B), three mask apparatuses 100 are used in accordance with the number of colors. Some mask apparatuses 100 have not only a pattern representing a pixel area but also a pattern representing an electrical circuit or the like. Examples of the vapor deposition material include, but not limited to the low-molecular organic EL material, an electrode material, a dielectric material, and an insulator material.
The mask frame unit 50 includes the rectangular frame body 55 having an aperture 55a. In the figures, the frame body 55 includes two side portions, i.e., a first side portion 51 and a second side portion 52, which are arranged along an x-axis direction and face each other, and the other two side portions, i.e., a third side portion 53 and a fourth side portion 54, which are arranged along a y-axis direction orthogonal to the x-axis direction and face each other. The length of the outer edge of each side portion is substantially the same. However, the first side portion 51 and the second side portion 52 may be different from the third side portion 53 and the fourth side portion 54 in length of each outer edge.
It is desirable that the frame body 55 be also formed of a material having a linear thermal expansion coefficient equivalent to that of a substrate (not shown), as in the mask main body 10. Examples of the material include metal materials such as invar and SUS (steel use stainless). It is desirable that the frame body 55 have sufficient thickness and high rigidity to reduce its deformation amount as much as possible and also have a practical weight in consideration of transfer and handling.
The frame body 55 includes an attaching surface 55b to which the mask main body 10 is attached, and an opposite surface 55c that is the opposite surface of the attaching surface 55b. As will be described later, the mask main body 10 is fixed to and supported by the attaching surface 55b of the frame body 55 by spot welding (by, for example, electrical resistance or laser) in the state where a certain level of tension is applied to the mask main body 10.
Fig. 4 is a cross sectional view taken along the line A-A of Fig. 3. On the opposite surface 55c of the frame body 55, the first side portion 51 and the second side portion 52 are each provided with an area including a plurality of grooves (trenches) 56. Hereinafter, for the sake of convenience, those areas are referred to as "groove group areas". A groove group area 57 provided in each of the first side portion 51 and the second side portion 52 has substantially the same form, size, and the like, and thus the groove group area 57 provided in the first side portion 51 is basically described hereinafter.
The plurality of grooves provided in the groove group area 57, for example, two grooves 56 are formed along the length direction (x-axis direction) of the first side portion 51 and arranged in the y-axis direction. Those two grooves 56 have substantially the same length and have, for example, approximately the same length as that of the mask main body 10 in the x-axis direction (but may have the length of the mask main body 10 or longer or shorter). As shown in Fig. 4, the cross section of the groove 56 is formed such that the width of the groove 56 becomes wider as the depth of the groove 56 from the opposite surface 55c is shallower. Typically, the cross section of the groove 56 is a trapezoid. However, the cross section of the groove 56 is not limited to the trapezoid, and may be a square, a rectangle, a triangle, and a polygon with five or more sides, or may be any form containing curves.
In such a manner, the plurality of grooves 56 are provided on the opposite surface 55c of the frame body 55, so that areas 58 between the plurality of grooves 56 each function as a rib provided along the x-axis direction. Thus, the mask frame unit 50 with high rigidity can be achieved without using a complex structure while achieving the reduction in weight of the frame body 55.
In this embodiment, as shown in Fig. 4, the groove group area 57 is provided on the opposite surface 55c as described above and arranged on the outer side of the frame body 55 with respect to a connection portion 11 between the mask main body 10 and each of the side portions 51 to 54. With such a configuration, the groove group area 57 is insusceptible to the influence of the tension of the mask main body 10, and thus the deformation of the frame body 55 can be suppressed.
Fig. 5 is a cross sectional view showing, as a comparative example (reference example) with the mask frame unit 50 according to this embodiment, a form in which the plurality of grooves 56 are provided on the attaching surface 55b for a mask. Figs. 6A and 6B are diagrams each showing, in the form shown in Figs. 4 and 5, simulation results on the rigidity at a side portion of the frame body when a tension is applied to the mask main body. Figs. 6A and 6B each show an example in which the cross section of the side portion is seen from the outside of the frame body 55 in an oblique direction and the frame body 55 (in Fig. 6B, frame body 15) is placed on a flat plate 60 (see Fig. 26). It should be noted that the applicant of the subject application can disclose this simulation in the figures with color, but the simulation is disclosed using a line drawing here.
Specs of the mask main body used in the simulation are as follows.
Material of mask main body: Ni-Co alloy
Size of mask main body: 900 mm in vertical length, 900 mm in horizontal length, and 12 micro m in thickness
Stretch rate: 0.08% in x direction and 0.08% in y direction
Size of mask main body: 900 mm in vertical length, 900 mm in horizontal length, and 12 micro m in thickness
Stretch rate: 0.08% in x direction and 0.08% in y direction
As shown in Fig. 6B, in the form where the grooves are provided on an attaching surface 15b of the frame body 15, the width of those grooves 16 (width in the horizontal direction) may be widened and warpage may occur due to the tension of the mask main body. In contrast, as shown in Fig. 6A, in the form where the grooves 56 are provided on the opposite surface 55c, it is found that almost no warpage is generated.
(2) Depth and Width of Groove
Subsequently, the depth of thosegrooves 56 will be described. As shown in Fig. 4, in the form where the grooves 56 are provided on the opposite surface 55c of the frame body 55, the tension of the mask main body 10 is applied to the bottom portion of each groove 56 that is the thinnest portion in the frame body 55, and the stretch rate of the bottom portion tends to increase more than the stretch rate of the other portions. To suppress the generation of warpage, the rigidity has to be considered with the thickness of the bottom portion being particularly taken into consideration.
Subsequently, the depth of those
Based on the above simulation, it has been found that, in the case where the frame body 55 is a material made of invar, the rigidity of the frame body 55 can be sufficiently maintained if the bottom portion of the groove 56, which is the thinnest portion of the groove group area 57 of the frame body 55, is formed to have the thickness of 1 mm. In this case, a stretch amount of the bottom portion of the groove 56 due to the tension of the mask main body 10 is 1 micro m or less.
Based on such results, in the case where the frame body 55 has the thickness of, for example, 20 mm, the depth of the groove 56 is set to be 95% of the thickness of that frame body 55 (length from the attaching surface 55b to the opposite surface 55c). Consequently, the frame body 55 with high rigidity can be achieved while forming the grooves 56 as deep as possible to achieve the reduction in weight. As different simulation results, assuming that a frame with no grooves according to a second comparative example has a weight of 45 kg, the weight of the frame body 55 provided with the grooves 56 with the depth of 95% is 30 kg, thus achieving the reduction in weight of 30% or more.
In contrast, when the depth of the grooves 56 is reduced to be as shallow as possible, the rigidity of the frame body 55 can be increased more, but the weight of the frame body 55 is increased. For example, it is assumed that the weight of the frame body 55 is reduced to 80% or less of the weight of the frame according to the second comparative example, that is, reduced to 36 kg from 45 kg. In this case, when the weight of 30 kg of the frame body 55 provided with the grooves 56 having the depth of 95% is permitted up to 36 kg, the depth of the grooves 56 can be reduced to 45% of the thickness of the frame body 55.
As described above, it is desirable to set the depth of the grooves 56 to fall within the range of 45 to 95% of the thickness of the frame body 55. However, the depth is not limited to this range and may fall within the range of 10 to 95%, 20 to 95%, 30 to 95%, 40 to 95%, 20 to 80%, 30 to 70%, or the like.
The width of the grooves 56 of the frame body 55 according to this embodiment (the width in the y-axis direction) is, for example, 1 to 100 mm, and more desirably, 10 to 20 mm.
(3) Superiority of Present Disclosure in Manufacturing Process of Mask Apparatus
(A) Accuracy of Aperture Position at Manufacture of Mask Foil (Corresponding to Mask Body of This Embodiment)
Here, themask apparatus 100 is manufactured as follows. First, a mask foil is manufactured by providing a number of fine aperture patterns on foil by electroforming, photoetching, and the like. Subsequently, with a tension being applied to the mask foil, the mask foil is fixed to the frame body by welding and the like. So, when the tension applied to the mask foil is released after the mask foil is fixed to the frame body, the tension of the mask foil deforms the frame. This deformation causes the aperture positions of the mask foil to be displaced and thus to be displaced from a position aimed at a set target value.
(A) Accuracy of Aperture Position at Manufacture of Mask Foil (Corresponding to Mask Body of This Embodiment)
Here, the
This displacement amount of the frame itself has individual differences and has different stress distributions due to the variations of the displacement, the presence of sparse and dense aperture patterns formed on the mask foil, or non-uniform distribution of thickness that is caused in electroforming or rolling. Those factors cause problems that the aperture position of the mask foil is varied and the accuracy is deteriorated. To reduce such variations of the aperture position, it is necessary to enhance the rigidity of the frame and reduce the displacement amount.
From above, it is conceived that the thickness of the frame is increased in order to increase the rigidity of the frame and reduce the displacement of the aperture position. However, as the size of the mask foil becomes larger, the weight becomes larger, and this causes the difficulty in handling or the weight goes above the weight limit of the mask apparatus in a vapor deposition apparatus.
As a method of reducing the weight of the frame, the use of a material having a small density, such as aluminum, may be conceived. However, since aluminum has a large linear expansion coefficient and is largely susceptible to the influence of a temperature change, the following problems occur: even when the tension is applied to the mask foil and the mask foil is fixed to the frame, a distortion and slack of the mask foil and the frame are caused due to a subsequent temperature change, and the accuracy of the aperture position is deteriorated. Further, Young's modulus of the aluminum is relatively low, that is, its rigidity is low.
For example, Japanese Patent Application Laid-open No. 2006-322015 discloses a frame that is obtained by laminating, bonding, and integrating a plurality of thin plates having a large number of holes for the purpose of weight reduction. However, in the method of manufacturing this frame, it is necessary to perform an etching process of etching the thin plates to form the plurality of holes and a pressurization process of laminating the plurality of thin plates having the holes formed thereon and integrating those thin plates by thermal diffusion bonding.
Since the mask frame unit 50 according to this embodiment includes the plurality of grooves 56, both of the weight reduction and the high rigidity can be achieved as described above.
In this embodiment, the frame body 55 can be manufactured by cutting work or shape forming. So, in this embodiment, the manufacturing process disclosed in Japanese Patent Application Laid-open No. 2006-322015 is not used. This allows an increase in productivity of the mask apparatus 100 and a reduction in production costs of the mask apparatus 100 and a product such as a display device that is manufactured by using the mask apparatus 100.
(B) Displacement of Frame in Assembly Process of Mask Apparatus
Subsequently, in the manufacturing process of themask apparatus 100, the superiority of the present disclosure in the assembly process of the mask apparatus 100 will be particularly described below. The assembly process of the mask apparatus 100 refers to a process other than the manufacturing process of the mask foil and is a process including an attachment process of the mask main body 10 and the mask frame unit 50.
Subsequently, in the manufacturing process of the
The assembly process mainly includes the following processes:
(a) a process of applying a tension to the mask foil;
(b) a process of attaching (bonding) the mask foil to the mask frame unit; and
(c) a process of releasing the tension applied to the mask foil
(a) a process of applying a tension to the mask foil;
(b) a process of attaching (bonding) the mask foil to the mask frame unit; and
(c) a process of releasing the tension applied to the mask foil
In the above process (a), in order to suppress the deflection or waviness of the mask foil and two-dimensionally align the aperture position of the mask foil to a desired position, as shown in Fig. 7A, the outer edge portions of a mask foil 10' are clamped with clampers 12 and a tension is applied to the mask foil 10' in the outward direction.
With the tension being applied to the mask foil 10' in such a manner, in the process (b), the mask foil 10' is bonded and fixed to a mask frame unit 50' by spot welding and the like. Subsequently, as shown in Fig. 7B, in the process (c), the tension applied to the mask foil 10' is released.
Figs. 8A and 8B are diagrams each showing, in the process (c), analysis results on the deformation of the frame according to the comparative example (see Figs. 5 and 6B) used in the above simulation and having a plurality of grooves 16 on the attaching surface 15b. It should be noted that the applicant of the subject application can disclose this simulation in the figures with color, but the simulation is disclosed using a line drawing and a gray scale here.
At the center of each side portion of the frame, the inward displacement in the x- and y-axis directions increases. To apply a tension to a mask foil at a stretch rate of about 0.05%, the mask foil being made of nickel and having an outer size of 700 mm x 700 mm x 10 micro m in thickness, a force of about 200 to 300 N per side portion of the mask foil is used. In the process (c), the force is applied as it is to the frame. In the case of using a frame being made of an invar material and having an outer size of about 900 mm x 900 mm x 20 mm and no grooves, under the condition of the above-mentioned tension of about 200 to 300 N, the displacement of about 10 micro m at a maximum in the horizontal directions (x- and y-axis directions) is caused.
The eventual accuracy of the aperture position of the mask apparatus is determined based on an accumulation of the variations in the manufacturing process (electroforming, etching, etc.) of the mask foil and the assembly process. Hence, to achieve a highly accurate mask apparatus, the manufacturing process and assembly process described above have to be performed as highly accurate as possible. In the above assembly process, the accuracy is liable to be deteriorated particularly in the process (c).
Further, specifically, the process (c) includes a process (c') of releasing the tension applied to the mask foil with the mask apparatus being supported on the "plane". Actually, with the mask frame unit being supported on the plane, the processes (a) and (b) described above are also performed. The state where the mask apparatus is supported on the "plane" is, specifically, the state where the mask frame unit 50 is placed on and supported by the flat plate 60 as shown in Fig. 26.
After the process (c'), that is, in the vapor deposition process that will be described below, the following process (d) is included:
(d) a process of changing the support condition of the mask apparatus in the process (c) to another support condition.
(d) a process of changing the support condition of the mask apparatus in the process (c) to another support condition.
(C) Displacement of Frame in Vapor Deposition Process
In the vapor deposition process including the process (d), as shown in Figs. 9A and 9B, a mask apparatus 100' is often subjected to vapor deposition while being transported by a conveyer and the like for the purpose of the improvement in productivity, and a deflection occurs in the gravity direction of the frame 50'. In Figs. 9A and 9B, the mask foil is not illustrated. In the example shown in Figs. 9A and 9B, the two rear surfaces of two opposed side portions 53' and 54' arranged along the y-axis direction of the frame 50' are supported and transported by a plurality ofrollers 17 arranged along the y-axis direction, for example, eight rollers 17 on both sides. A vapor deposition source (not shown) is arranged below a mask apparatus 100', and a substrate (not shown) is arranged on the side of the frame 50' on which the mask foil is attached. For example, when the mask apparatus 100' is arranged at a predetermined position, a material evaporates from the vapor deposition source and adheres to the substrate via the mask apparatus 100'.
In the vapor deposition process including the process (d), as shown in Figs. 9A and 9B, a mask apparatus 100' is often subjected to vapor deposition while being transported by a conveyer and the like for the purpose of the improvement in productivity, and a deflection occurs in the gravity direction of the frame 50'. In Figs. 9A and 9B, the mask foil is not illustrated. In the example shown in Figs. 9A and 9B, the two rear surfaces of two opposed side portions 53' and 54' arranged along the y-axis direction of the frame 50' are supported and transported by a plurality of
In such a manner, the two side portions 53' and 54' arranged along the y-axis direction of the frame 50' are supported, and two side portions 51' and 52' arranged along the x-axis are not supported. Consequently, the frame 50' is deflected by the gravity with its center portion being the lowest.
For example, in the case of using the frame body 15 being made of an invar material and having an outer size of about 900 mm x 900 mm x 20 mm according to the comparative example, the deflection amount in the gravity direction on the conveyer falls within the range of 100 to 300 micro m. When the vapor deposition process is performed using a mask foil with such a deflection, adhesion between the substrate to be processed and the mask foil becomes poor, and the accuracy of the aperture position in the vapor deposition is also lowered.
(D) Conclusion
With the mask unit disclosed in Patent Literature 1 described above, the deformation such as warpage of the frame can be suppressed by using the metal tape. However, as described above, Patent Literature 1 does not disclose the suppression of deformation in the assembly process of the mask unit and the process of changing the support condition after the assembly.
With the mask unit disclosed in Patent Literature 1 described above, the deformation such as warpage of the frame can be suppressed by using the metal tape. However, as described above, Patent Literature 1 does not disclose the suppression of deformation in the assembly process of the mask unit and the process of changing the support condition after the assembly.
In contrast to this, in the mask frame unit 50 according to this embodiment, the plurality of grooves 56 are provided on the opposite surface 55c side of the frame body 55, and thus the areas 58 between the grooves 56 each function as a rib as described above, achieving the weight reduction and high rigidity. Consequently, also in the manufacturing process including the assembly process of the mask apparatus 100 and in the process of changing the support condition in the subsequent vapor deposition process, while the weight reduction of the frame body 55 is achieved, desired rigidity can be ensured and the deformation of the frame body 55 can be suppressed.
Further, since the deformation of the frame body 55 can be suppressed, the accuracy of the aperture position of the mask apparatus 100 can be increased. Thus, the accuracy of the vapor deposition using the mask apparatus 100 is also increased, thus improving the yields of the products.
2. Second Embodiment
Fig. 10 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a second embodiment of the present disclosure. In the following description, the same members, functions, and the like as those included in the mask apparatus 100 according to the embodiment shown in Fig. 1 and the like are simply described or not described, and only differences will mainly be described.
On an opposite surface 155c of a frame body 155 of a mask frame unit 150, groove group areas 57 each including a plurality of grooves 56 are provided to not only a first side portion 151 and a second side portion152 but also a third side portion153 and a fourth side portion 154 along the y-axis direction. This allows the third side portion153 and the fourth side portion 154 to be provided with high rigidity by the effects of the ribs and allows the achievement of the weight reduction.
3. Third Embodiment
Fig. 11 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a third embodiment of the present disclosure. On an opposite surface 205c of a frame body 205 of a mask frame unit 200, a third side portion 203 and a fourth side portion 204 are each provided with a concave portion (or groove) 31 having the width larger than that of each groove 56 of groove group areas 57. With such a mask frame unit 200 as well, the weight reduction and the high rigidity can be achieved.
4. Fourth Embodiment
Fig. 12 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a fourth embodiment of the present disclosure. On an opposite surface 255c of a frame body 255 of a mask frame unit 250, a plurality of circular concave portions 32 are provided in a third side portion 253 and a fourth side portion 254. With such a mask frame unit 250 as well, the weight reduction and the high rigidity can be achieved. The shape of the concave portion 32 may be a long groove, an ellipse, a triangle, a polygon with four or more sides, and the like, in addition to the circular shape.
5. Fifth Embodiment
Fig. 13 is a perspective view showing a rear surface (opposite surface) side of a mask frame unit according to a fifth embodiment of the present disclosure. On an opposite surface 305c of a frame body 305 of a mask frame unit 300, a groove 33 as a concave portion (first concave portion) is provided to a first area 311 that is an inner area of the frame body 305 in each of a third side portion 303 and a fourth side portion 304. Further, a concave portion (second concave portion) 34 is provided to a second area 312 that is an outer area of an attaching surface 305b for a mask main body with respect to the first area 311. The width of the concave portion 34 is larger than that of the groove 33.
According to such a configuration, the outer portion of the groove 33 provided to the opposite surface 305c can be supported by the rollers 17 of the conveyer in the vapor deposition process, so that the mask apparatus can be transported, as shown in Fig. 14 (Figs. 9A and 9B). In such a manner, in the case where the conveyer shown in Figs. 9A and 9B is used, the second areas 312 of the opposite surface 305c are restricted to be areas where grooves are not formed. However, in the case where the conveyer shown in Figs. 9A and 9B is not used and another support mechanism is used, a mask frame unit according to each of the embodiments shown in Figs. 10 to 12 can be used.
The inventors of the present disclosure compared the mask frame unit 300 according to the fifth embodiment and the frame provided with the plurality of grooves 16 in the first side portion and the second side portion of the attaching surface 15b as described above according to the comparative example (see Fig. 5 and Fig. 6B) through a simulation. As a result, the displacement of about 10 micro m at a maximum in the comparative example could be reduced to about 60% of the displacement of the frame body 305 (that is, reduced by about 40%) according to the mask frame unit 300.
The left part of Fig. 15 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (c') (before and after the release of the tension) in the case of using the frame according to the comparative example. The right part of Fig. 15 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (c') in the case of using the mask frame unit 300 according to the fifth embodiment. The left part of Fig. 15 shows an average displacement derived from five times of measurement, and the right part of Fig. 15 shows an average displacement derived from two times of measurement.
In Fig. 15, one grid of the matrix depicted on the background represents 1 micro m. As apparent from those experimental results, in the mask frame unit 300 according to the fifth embodiment, the deformation of the frame body 305 along both of the x and y axes is reduced. In particular, the displacement amount in the y-axis direction is reduced by about 50%, as compared to the comparative example. This displacement amount falls with the allowable range.
The left part of Fig. 16 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (d) in the case of using the frame according to the comparative example. The right part of Fig. 16 is a diagram showing results of actual measurement on displacement of a predetermined aperture position of the mask in the process (d) in the case of using the mask frame unit 300 according to the fifth embodiment. Fig. 16 shows the displacement amount from the reference, with the supported state on the plane in the process (c') being a reference. Further, in the process (d), eight-point support in the first side portion 301 and the second side portion 302 is performed.
As apparent from Fig. 16, in the mask frame unit 300 according to the fifth embodiment, the displacement amount in the x-axis direction is reduced by about 85% in one of the first side portion 301 and the second side portion 302, as compared to the comparative example. Further, the displacement amount in the x-axis direction is reduced by about 50% in the other one of the first side portion 301 and the second side portion 302, as compared to the comparative example. This displacement amount falls with the allowable range.
6. Sixth Embodiment
(1) Configuration of Mask Frame Unit
In the mask frame unit according to each embodiment described above, in the assembly process and the process of changing the support condition in the subsequent vapor deposition process, the deformation of the frame body can be accommodated within the allowable range. However, amask frame unit 350 according to a sixth embodiment shown in Fig. 17 can suppress the deformation of a frame body 355 more, particularly in the process of changing the support condition. Fig. 18 is a cross sectional view taken along the line B-B of Fig. 17.
In the mask frame unit according to each embodiment described above, in the assembly process and the process of changing the support condition in the subsequent vapor deposition process, the deformation of the frame body can be accommodated within the allowable range. However, a
On an attaching surface 355b for the mask main body of the mask frame unit 350, a groove 356 along the x-axis direction is provided in each of a first side portion 351 and a second side portion 352. Additionally, a turnbuckle 40 functioning as a tension adjustment mechanism (tension mechanism) is arranged in each of those grooves 356. In this case, the turnbuckle 40 functions as a rod-like member of the tension mechanism.
As shown in Fig. 18, a groove 359 along the x axis is provided in an outer area with respect to the groove 356 on an opposite surface 355c that is opposite to the attaching surface 355b. The groove 359 is provided in both of the first side portion 351 and the second side portion 352, but may be provided to any one of the first side portion 351 and the second side portion 352. Further, although the groove 359 is not indispensable, the presence of the groove 359 can lead to the achievement of the weight reduction of the frame body 355.
Fig. 19 is a diagram showing a configuration of the turnbuckle 40. The turnbuckle 40 includes an operation portion 42 and screw portions 46. The operation portion 42 is provided at the center of the turnbuckle 40. The screw portions 46 are connected to both ends of the operation portion 42. Both of the screw portions 46 are left-hand threads. By the rotation of the operation portion 42, the screw portions 46 are moved in the opposite directions of their length direction. As shown in Fig. 17, both ends of the turnbuckle 40 are pressed against end forming portions 357 forming both ends of the groove 356, to be fixed. With such a configuration, the rotation of the operation portion 42 causes the entire length of the turnbuckle 40 to be changed, with the result that the tension of the frame body 355 in the x-axis direction can be adjusted.
Further, if any level of tension is applied to the mask foil in the assembly process and the process of changing the support condition, when the rotation amount of the operation portion 42 of the turnbuckle 40 is finely adjusted, an optimum amount of force can be applied to the frame body 355 and the deformation in the x-axis direction can be reduced as close to zero as possible.
The length of the turnbuckle 40, the diameter of the screws, and the like are desirably set in consideration of the support position where the frame body 355 is supported by the above-mentioned conveyer or flat plate. By a structural analysis and the like, a force for moving the frame body 355 and a force applied to the turnbuckle 40 are desirably set based on the calculation on whether the turnbuckle 40 does not cause buckling.
(2) Operation of Mask Frame Unit
Figs. 21A and 21B are diagrams schematically showing a cross section taken along thegroove 356 of the mask frame unit 350 in the process (d), the mask frame unit 350 being supported by the conveyer in the vapor deposition process, for example. Here, the illustration of the mask main body is omitted. As shown in Fig. 21A, with a third side portion 353 and a fourth side portion 354 being supported, the deflection of the frame body 355 under its own weight is caused. However, for example, when an operator rotates the operation portion 42 of the turnbuckle 40 and adjusts the tension applied to the frame body 355 in the x-axis direction, the operator can create the state of the frame body 355 in which the deflection is substantially cancelled as shown in Fig. 21B. It should be noted that the operator can rotate the operation portion 42 of the turnbuckle 40 with tools such as a ratchet and a drift pin.
Figs. 21A and 21B are diagrams schematically showing a cross section taken along the
(3) Simulation
(a) Deformation of Frame Caused in Process (c') of Assembly Process
The inventors of the present disclosure performed the following simulation on the deformation of the frame, which is caused in the process (c') of the assembly process described above. Theframe body 355 of the mask frame unit 350 according to this embodiment is made of invar, and the outer size thereof is set to 900 mm x 900 mm x 20 mm. The turnbuckle 40 including the screw portions 46 each having a screw diameter of M8, being made of a SUS material, and having the length of 700 mm was used to apply a force of 1200 N from the inner side of the frame body 355 to one direction of the x-axis direction. As a result, the displacement in the above-mentioned connection portion (welding portion) 11 between the frame body 355 and the mask main body 10 to the tension direction could be reduced to 1 micro m or less.
(a) Deformation of Frame Caused in Process (c') of Assembly Process
The inventors of the present disclosure performed the following simulation on the deformation of the frame, which is caused in the process (c') of the assembly process described above. The
(b) Deformation of Frame Caused in Process (d) of Changing Support Condition in Vapor Deposition Process
Further, the inventors of the present disclosure performed the following simulation also on the deformation of the frame, which is caused in the process (d) of changing the support condition. With thesame frame body 355 and turnbuckle 40 used in the simulation of the above process (a), a force of 1200 N was applied from the inner side of the frame body 355 to one direction of the x-axis direction. In the case of using a frame having the same structure as the mask frame unit 350 according to the sixth embodiment and including no turnbuckle 40, the deflection in the z-axis direction was 200 micro m, but it could be reduced to 70 micro m or less. This allows the adhesion between the substrate and the mask main body 10 to be ensured and allows the positional accuracy of the pattern in the vapor deposition to be enhanced.
Further, the inventors of the present disclosure performed the following simulation also on the deformation of the frame, which is caused in the process (d) of changing the support condition. With the
(4) Effects by Mask Frame Unit
For example, the mask foil normally has different stress distributions due to the presence of sparse and dense aperture patterns formed on the mask foil or non-uniform distribution of the thickness that is caused in electroforming or rolling. Thus, the tension applied to the mask foil is largely varied. Further, a frictional force between the frame and a support unit that supports the frame largely varies depending on the state of the support surface of the support unit. So, it is very advantageous to be able to adjust a pressing force by theturnbuckle 40. The finer screw pattern of the screw portions 46 of the turnbuckle 40 allows a finer adjustment of the pressing force.
For example, the mask foil normally has different stress distributions due to the presence of sparse and dense aperture patterns formed on the mask foil or non-uniform distribution of the thickness that is caused in electroforming or rolling. Thus, the tension applied to the mask foil is largely varied. Further, a frictional force between the frame and a support unit that supports the frame largely varies depending on the state of the support surface of the support unit. So, it is very advantageous to be able to adjust a pressing force by the
In addition, since the turnbuckle 40 is provided on the attaching surface 355b side of the frame body 355, the operator can operate the turnbuckle 40 from the attaching surface 355b side to adjust the tension. In other words, the operator can access the mask frame unit 350, which is at the same posture as that when the vapor deposition process is performed, from the attaching surface 355b side to easily perform operations. In contrast to this, in the case of the mask unit disclosed in Patent Literature 1, the operator has to access the mask unit from the rear surface side of the frame, which makes it difficult to operate.
Further, in the mask unit disclosed in Patent Literature 1, after the metal tape is fixed by welding, it is difficult to adjust the tension by the metal tape again. In contrast to this, in this embodiment, it is possible to readjust the tension by the operation of the turnbuckle 40 as many times as one like.
Furthermore, the mask frame unit 350 including the turnbuckle 40 can achieve downsizing by a simple configuration and is easy to handle, as compared to, for example, the frame including the metal tape disclosed in Patent Literature 1.
By using the mask frame unit 350 including the turnbuckle 40, the displacement of the frame body 355 can be adjusted after the process (c) of the assembly process, after the vapor deposition process, or after the subsequent cleaning process. For example, as shown in Fig. 22, a controller (computer) 70 measures an aperture position with a camera 71 and the like and calculates, based on the measurement results, a displacement amount between a measured value and a target value in the x-, y-, and z-axis directions. Subsequently, the controller 70 determines an operation amount of the turnbuckle 40 so as to correct the displacement amount and sends a control signal containing the operation amount to a drive unit (not shown). The drive unit (not shown) operates the operation portion 42 of the turnbuckle 40 based on the control signal. For the correction of the displacement amount, a measured value of the dial gauge 72 may be used.
In the above-mentioned calculation of the displacement amount, calculation of the operation amount of the turnbuckle 40, and operation of the operation portion 42 of the turnbuckle 40, at least one processing may be performed by not a computer but a human.
Instead of the turnbuckle 40 shown in Fig. 19, a turnbuckle 41 having a pipe-shaped operation part 43 as shown in Fig. 20 may be used. In this case, the operator can rotate the pipe-shaped operation part 43 by engaging a wrench in the center part of the operation part 43. The operation part 43 has a pipe shape and a size smaller than the operation portion 42 of the turnbuckle 40 described above. Thus, the turnbuckle 41 can be arranged easily in the groove 356.
7. Seventh Embodiment
Fig. 23 is a cross sectional view schematically showing a mask frame unit according to a seventh embodiment of the present disclosure. A mask frame unit 400 in this embodiment includes an attaching surface 405b for a mask main body 10, an opposite surface 405c that is opposite to the attaching surface 405b, a groove 416 provided in at least one side portion along the x-axis direction on the opposite surface 405c of a frame body 405, and a tension mechanism 75.
The tension mechanism 75 includes a rod-like member 76 and bolts 77. The rod-like member 76 is arranged in the groove 416. The bolts 77 are connected to both ends of the rod-like member 76 via end forming portions (protrusion portions) 405d that form both ends of the groove 416. As shown in Fig. 24, the end forming portion 405d is provided with a through-hole 405e, and the bolt 77 is inserted into the through-hole 405e. Screw holes 76a are provided to the both ends of the rod-like member 76, and the bolts 77 are screwed into the screw holes 76a.
With such a configuration, the deformation of the rod-like member 76 and the frame body 405 (the deflection in the gravity direction in the figure) can be corrected by fastening of the bolts 77.
8. Eighth Embodiment
Fig. 25 is a cross sectional view schematically showing a mask frame unit according to an eighth embodiment of the present disclosure. A mask frame unit 450 in this embodiment includes an attaching surface 455b for a mask main body, an opposite surface 455c that is opposite to the attaching surface 455b, a groove 456 provided in at least one side portion along the x-axis direction on the attaching surface 455b of a frame body 455, and a tension mechanism 85.
The tension mechanism 85 includes a rib 86 and bolts 87. The rib 86 functions as a rod-like member that is arranged in the groove 456 and formed along the x-axis direction. The bolts 87 are able to press both ends of the rib 86 via end forming portions 455d that form both ends of the groove 456. Screw holes are provided to the end forming portions 455d, and the bolts 87 are screwed into the screw holes. The leading ends of the bolts 87 are able to be in contact with the both ends of the rib 86. With such a configuration, by fastening of the bolts 87, the both ends of the rib 86 can be pressed and the deformation of the frame body 455 (the deflection in the gravity direction in the figure) can be corrected.
Instead of the rib 86, as shown in Fig. 23, the rod-like member may be arranged in the groove 456 and the bolts 87 may be screwed into both ends of the rod-like member via the end forming portions 455d.
9. Other Embodiments
The present disclosure is not limited to the embodiments described above and can achieve other various embodiments.
The mask apparatus according to each of the embodiments can be applied to a mask foil for printing that is used for screen printing and the like, in addition to the mask foil for vapor deposition.
The mask frame unit according to the comparative example shown in Fig. 5 is also an apparatus that falls within the range of the present disclosure. In the case where the grooves 16 are provided to the attaching surface 15b of the frame body 15, desired rigidity of the frame body 15 can be achieved by an appropriate adjustment of the depth and width of the grooves, for example, by an adjustment to make the grooves to be shallower than the grooves 56 of the frame body 55 shown in Fig. 4.
Both ends of each of the plurality of grooves 56 and the like provided to the frame body according to each of the embodiments are provided with the end forming portions, so that the grooves are closed. However, the following groove may be provided instead. The groove does not include end forming portions to form both ends of the groove and passes completely through the frame body from one edge to the other edge in one side portion of the frame body.
The number of grooves 56 provided to the groove group area 57 in the mask frame unit according to each of the embodiments is two, but three or more grooves may be provided.
The groove formed along at least one side portion of the frame body of each of the embodiments may be divided into a plurality of portions arranged along the one side portion. In this case, for example, partitioning portions or protrusion portions that partition one long groove formed along the one side portion only need to be formed on the frame body.
Regarding the shape and the size of the plurality of grooves 56 formed on the groove group area 57, at least one of the grooves 56 may be different from the other grooves 56 in shape and size.
In the mask frame unit 350 shown in Fig. 17, each of the first side portion 351 and the second side portion 352 is provided with the turnbuckle 40. In contrast, only one of the side portions may be provided with the turnbuckle 40.
The mask frame unit 350 shown in Fig. 22 may not include the turnbuckle 40. In other words, a mask frame unit provided with a single groove 356 (including the end forming portions 357), which is arranged in at least one side portion of at least one of the attaching surface 355b and the opposite surface 355c along a length direction of the one side portion, is also an apparatus that falls within the range of the present disclosure.
The shape of the mask frame unit according to each of the embodiments is a rectangle with four sides, but may be hexagonal, octagon, and the like.
In the feature portions of the embodiments described above, at least two of the feature portions can be combined.
The present disclosure can have the following configurations.
(1) A mask frame unit, including
a frame body including
a plurality of side portions that support a mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
(2) The mask frame unit according to (1), in which
the frame body includes an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface, and
the area including the plurality of grooves is provided to the opposite surface.
(3) The mask frame unit according to (2), in which
the area including the plurality of grooves is arranged on an outer side of the frame body with respect to a connection portion located between the mask main body and the attaching surface in the at least one side portion.
(4) The mask frame unit according to any one of (1) to (3), in which
the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other.
(5) The mask frame unit according to (4), further including
a concave portion provided in a third side portion along a length direction of the third side portion, the third side portion being one side portion that is different from the first side portion and the second side portion in the plurality of side portions.
(6) The mask frame unit according to (1), in which
the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other, and
the frame body includes
an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface,
a first concave portion provided in a first area of the opposite surface in a third side portion that is one side portion different from the first side portion and the second side portion in the plurality of side portions, and
a second concave portion provided in a second area of the attaching surface in the third side portion, the second area being provided on an outer side of the frame body with respect to the first area.
(7) The mask frame unit according to any one of (1) to (6), further including
a tension mechanism that includes a rod-like member provided in at least one groove of the plurality of grooves and is capable of adjusting a tension applied to the frame body by using the rod-like member.
(8) The mask frame unit according to (7), in which
the rod-like member of the tension mechanism includes a turnbuckle.
(9) The mask frame unit according to (7), in which
the frame body includes end forming portions that form both ends of the at least one groove, and
the tension mechanism includes bolts that are connected to both ends of the rod-like member via the end forming portions.
(10) The mask frame unit according to any one of (1) to (9), in which
the plurality of grooves each have a depth that is 45 to 95% of a thickness of the frame body.
(11) A mask frame unit, including
a frame body including
a plurality of side portions that support a mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
(12) The mask frame unit according to (11), further including
a tension mechanism that includes a rod-like member provided between the end forming portions at the both ends of the groove and is capable of adjusting a tension applied to the frame body by using the rod-like member.
(13) A mask apparatus, including:
a mask main body; and
a frame body including
a plurality of side portions that support the mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
(14) A processing method, including:
arranging a mask apparatus at a predetermined position; and
attaching a material to a substrate via the mask apparatus, the mask apparatus including
a mask main body, and
a frame body including
a plurality of side portions that support the mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
(15) A mask apparatus, including:
a mask main body; and
a frame body including
a plurality of side portions that support the mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
(16) A processing method, including:
arranging a mask apparatus at a predetermined position; and
attaching a material to a substrate via the mask apparatus, the mask apparatus including
a mask main body, and
a frame body including
a plurality of side portions that support the mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
(1) A mask frame unit, including
a frame body including
a plurality of side portions that support a mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
(2) The mask frame unit according to (1), in which
the frame body includes an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface, and
the area including the plurality of grooves is provided to the opposite surface.
(3) The mask frame unit according to (2), in which
the area including the plurality of grooves is arranged on an outer side of the frame body with respect to a connection portion located between the mask main body and the attaching surface in the at least one side portion.
(4) The mask frame unit according to any one of (1) to (3), in which
the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other.
(5) The mask frame unit according to (4), further including
a concave portion provided in a third side portion along a length direction of the third side portion, the third side portion being one side portion that is different from the first side portion and the second side portion in the plurality of side portions.
(6) The mask frame unit according to (1), in which
the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other, and
the frame body includes
an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface,
a first concave portion provided in a first area of the opposite surface in a third side portion that is one side portion different from the first side portion and the second side portion in the plurality of side portions, and
a second concave portion provided in a second area of the attaching surface in the third side portion, the second area being provided on an outer side of the frame body with respect to the first area.
(7) The mask frame unit according to any one of (1) to (6), further including
a tension mechanism that includes a rod-like member provided in at least one groove of the plurality of grooves and is capable of adjusting a tension applied to the frame body by using the rod-like member.
(8) The mask frame unit according to (7), in which
the rod-like member of the tension mechanism includes a turnbuckle.
(9) The mask frame unit according to (7), in which
the frame body includes end forming portions that form both ends of the at least one groove, and
the tension mechanism includes bolts that are connected to both ends of the rod-like member via the end forming portions.
(10) The mask frame unit according to any one of (1) to (9), in which
the plurality of grooves each have a depth that is 45 to 95% of a thickness of the frame body.
(11) A mask frame unit, including
a frame body including
a plurality of side portions that support a mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
(12) The mask frame unit according to (11), further including
a tension mechanism that includes a rod-like member provided between the end forming portions at the both ends of the groove and is capable of adjusting a tension applied to the frame body by using the rod-like member.
(13) A mask apparatus, including:
a mask main body; and
a frame body including
a plurality of side portions that support the mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
(14) A processing method, including:
arranging a mask apparatus at a predetermined position; and
attaching a material to a substrate via the mask apparatus, the mask apparatus including
a mask main body, and
a frame body including
a plurality of side portions that support the mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion.
(15) A mask apparatus, including:
a mask main body; and
a frame body including
a plurality of side portions that support the mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
(16) A processing method, including:
arranging a mask apparatus at a predetermined position; and
attaching a material to a substrate via the mask apparatus, the mask apparatus including
a mask main body, and
a frame body including
a plurality of side portions that support the mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and alterations may occur depending on design requirements and other factors insofar as they are within the scope of the appended claims or the equivalents thereof.
10
11 connection portion
32, 34 concave portion
33, 56, 356, 456, 359, 416, 456 groove
40, 41 turnbuckle
51, 151, 301, 351 first side portion
52, 152, 302, 352 second side portion
53, 153, 203, 253, 303, 353 third side portion
54, 154, 204, 254, 304, 354 fourth side portion
15, 55, 155, 205, 255, 305, 355, 405, 455 frame body
55b, 155b, 305b, 355b, 405b, 455b attaching surface
55c, 155c, 205c, 255c, 305c, 355c, 405c, 455c opposite surface
57 groove group area
58 area between grooves
75, 85 tension mechanism
76, 86 rod-like member
77, 87 bolt
100 mask apparatus
150, 200, 250, 300, 350, 400, 450 mask frame unit
311 first area
312 second area
357, 405d, 455d end forming portion
11 connection portion
32, 34 concave portion
33, 56, 356, 456, 359, 416, 456 groove
40, 41 turnbuckle
51, 151, 301, 351 first side portion
52, 152, 302, 352 second side portion
53, 153, 203, 253, 303, 353 third side portion
54, 154, 204, 254, 304, 354 fourth side portion
15, 55, 155, 205, 255, 305, 355, 405, 455 frame body
55b, 155b, 305b, 355b, 405b, 455b attaching surface
55c, 155c, 205c, 255c, 305c, 355c, 405c, 455c opposite surface
57 groove group area
58 area between grooves
75, 85 tension mechanism
76, 86 rod-like member
77, 87 bolt
100 mask apparatus
150, 200, 250, 300, 350, 400, 450 mask frame unit
311 first area
312 second area
357, 405d, 455d end forming portion
Claims (16)
- A mask frame unit, comprising
a frame body including
a plurality of side portions that support a mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion. - The mask frame unit according to Claim 1, wherein
the frame body includes an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface, and
the area including the plurality of grooves is provided to the opposite surface. - The mask frame unit according to Claim 2, wherein
the area including the plurality of grooves is arranged on an outer side of the frame body with respect to a connection portion located between the mask main body and the attaching surface in the at least one side portion. - The mask frame unit according to Claim 1, wherein
the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other. - The mask frame unit according to Claim 4, further comprising
a concave portion provided in a third side portion along a length direction of the third side portion, the third side portion being one side portion that is different from the first side portion and the second side portion in the plurality of side portions. - The mask frame unit according to Claim 1, wherein
the area including the plurality of grooves is at least provided in each of a first side portion and a second side portion of the plurality of side portions, the first side portion and the second side portion facing each other, and
the frame body includes
an attaching surface and its opposite surface that are provided to each of the plurality of side portions, the mask main body being attached to the attaching surface and the opposite surface,
a first concave portion provided in a first area of the opposite surface in a third side portion that is one side portion different from the first side portion and the second side portion in the plurality of side portions, and
a second concave portion provided in a second area of the attaching surface in the third side portion, the second area being provided on an outer side of the frame body with respect to the first area. - The mask frame unit according to Claim 1, further comprising
a tension mechanism that includes a rod-like member provided in at least one groove of the plurality of grooves and is capable of adjusting a tension applied to the frame body by using the rod-like member. - The mask frame unit according to Claim 7, wherein
the rod-like member of the tension mechanism includes a turnbuckle. - The mask frame unit according to Claim 7, wherein
the frame body includes end forming portions that form both ends of the at least one groove, and
the tension mechanism includes bolts that are connected to both ends of the rod-like member via the end forming portions. - The mask frame unit according to Claim 1, wherein
the plurality of grooves each have a depth that is 45 to 95% of a thickness of the frame body. - A mask frame unit, comprising
a frame body including
a plurality of side portions that support a mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove. - The mask frame unit according to Claim 11, further comprising
a tension mechanism that includes a rod-like member provided between the end forming portions at the both ends of the groove and is capable of adjusting a tension applied to the frame body by using the rod-like member. - A mask apparatus, comprising:
a mask main body; and
a frame body including
a plurality of side portions that support the mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion. - A processing method, comprising:
arranging a mask apparatus at a predetermined position; and
attaching a material to a substrate via the mask apparatus, the mask apparatus including
a mask main body, and
a frame body including
a plurality of side portions that support the mask main body, and
an area including a plurality of grooves that are provided in at least one of the plurality of side portions along a length direction of the at least one side portion. - A mask apparatus, comprising:
a mask main body; and
a frame body including
a plurality of side portions that support the mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove. - A processing method, comprising:
arranging a mask apparatus at a predetermined position; and
attaching a material to a substrate via the mask apparatus, the mask apparatus including
a mask main body, and
a frame body including
a plurality of side portions that support the mask main body,
a groove provided in at least one of the plurality of side portions along a length direction of the at least one side portion, and
end forming portions that form both ends of the groove.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013071425A JP2014194062A (en) | 2013-03-29 | 2013-03-29 | Mask frame unit, mask apparatus, and processing method |
JP2013-071425 | 2013-03-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014155939A1 true WO2014155939A1 (en) | 2014-10-02 |
Family
ID=50189747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2014/000713 WO2014155939A1 (en) | 2013-03-29 | 2014-02-12 | Mask frame unit, mask apparatus, and processing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2014194062A (en) |
TW (1) | TW201438515A (en) |
WO (1) | WO2014155939A1 (en) |
Cited By (3)
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WO2016086536A1 (en) * | 2014-12-04 | 2016-06-09 | 深圳市华星光电技术有限公司 | Oled material vacuum thermal evaporation deposition mask plate |
CN108193168A (en) * | 2018-01-19 | 2018-06-22 | 昆山国显光电有限公司 | Mask plate and preparation method thereof |
US10876199B2 (en) | 2017-12-25 | 2020-12-29 | Sakai Display Products Corporation | Vapor deposition mask, vapor deposition method, and production method for organic EL display device |
Families Citing this family (11)
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JP6465075B2 (en) * | 2016-05-26 | 2019-02-06 | 大日本印刷株式会社 | Vapor deposition mask, vapor deposition mask with frame, method for producing organic semiconductor element, and method for producing organic EL display |
WO2018003766A1 (en) * | 2016-06-28 | 2018-01-04 | 大日本印刷株式会社 | Vapor deposition mask, method for manufacturing organic semiconductor element, and method for manufacturing organic el display |
JP7017032B2 (en) | 2016-06-28 | 2022-02-08 | 大日本印刷株式会社 | A vapor deposition mask, a method for manufacturing an organic semiconductor device, and a method for manufacturing an organic EL display. |
CN107099769B (en) * | 2017-05-26 | 2019-08-02 | 京东方科技集团股份有限公司 | The frame of adjustable flatness |
CN108149192B (en) * | 2018-02-08 | 2020-01-03 | 京东方科技集团股份有限公司 | Metal mask and manufacturing method thereof |
WO2020008553A1 (en) * | 2018-07-04 | 2020-01-09 | シャープ株式会社 | Vapor deposition mask, vapor deposition mask production device and vapor deposition mask production method |
JP7133383B2 (en) * | 2018-07-31 | 2022-09-08 | マクセル株式会社 | Evaporation mask |
JP6791226B2 (en) * | 2018-10-18 | 2020-11-25 | 大日本印刷株式会社 | Vapor deposition mask, vapor deposition mask with frame, manufacturing method of organic semiconductor element, and manufacturing method of organic EL display |
CN109207920B (en) * | 2018-11-12 | 2021-02-09 | 京东方科技集团股份有限公司 | Mask plate |
KR102688602B1 (en) * | 2019-02-01 | 2024-07-25 | 삼성디스플레이 주식회사 | Mask assembly, apparatus and method having the same for manufacturing a display apparatus |
CN110257776B (en) * | 2019-06-21 | 2020-08-04 | 昆山国显光电有限公司 | Mask frame |
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WO2016086536A1 (en) * | 2014-12-04 | 2016-06-09 | 深圳市华星光电技术有限公司 | Oled material vacuum thermal evaporation deposition mask plate |
US10876199B2 (en) | 2017-12-25 | 2020-12-29 | Sakai Display Products Corporation | Vapor deposition mask, vapor deposition method, and production method for organic EL display device |
CN108193168A (en) * | 2018-01-19 | 2018-06-22 | 昆山国显光电有限公司 | Mask plate and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2014194062A (en) | 2014-10-09 |
TW201438515A (en) | 2014-10-01 |
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