WO2014000651A1

WO2014000651A1 - Optical assembly, manufacturing method therefor, and photovoltaic device

Info

Publication number: WO2014000651A1
Application number: PCT/CN2013/078043
Authority: WO
Inventors: 王正佳; 古鋆鑫; 陈捷; 林卫标
Original assignee: 法国圣戈班玻璃公司
Priority date: 2012-06-29
Filing date: 2013-06-26
Publication date: 2014-01-03

Abstract

Provide are an optical assembly, a manufacturing method therefor and a photovoltaic device. The manufacturing method for an optical assembly comprises: providing microspheres of a light-permeable material (101); surface treating the microspheres of the light-permeable material (101) to enable the surfaces of the light-permeable material (101) to carry charges of the same polarity; providing a substrate (102); and dispersedly arranging the microspheres of the light-permeable material (101) carrying charges of the same polarity on the substrate (102), to form an anti-reflection film (103). Alternatively, the manufacturing method comprises: providing a substrate (200); forming on the substrate (200) an anti-reflection film comprising at least one anti-reflection layer (201); the step of forming the anti-reflection layer (201) comprising: forming a charged layer (202); and dispersedly arranging on the charged layer (202) microspheres of a light-permeable material (204) which have the electrical property different from that of the charged layer (202). Correspondingly, also provided is an optical assembly formed using the manufacturing method. Correspondingly, also provided is a photovoltaic device comprising the optical assembly and a solar energy battery located at the side of the transparent substrate where no anti-reflection film is provided. The present invention can increase the applicable wavelength range of the anti-reflection film, and improve the anti-reflection effect of the anti-reflection film.

Description

The present invention claims the priority of a Chinese patent application filed on June 29, 2012, the Chinese Patent Application No. 201210226286.6, entitled "Optical Components and Their Manufacturing Methods, Photovoltaic Devices", The entire contents of this application are incorporated herein by reference. This application is submitted to the Chinese Patent Office on June 29, 2012, and the application number is

201210226524.3, the entire disclosure of which is hereby incorporated by reference in its entirety in its entirety in its entirety in the the the the the the the the the The present application claims priority to Chinese Patent Application No. 201210226597.2, entitled "Optical Components and Their Manufacturing Methods, Photovoltaic Devices", filed on June 29, 2012, the entire contents of in. The present application claims priority to Chinese Patent Application No. 201210226783.6, entitled "Superhydrophobic Reducing Substrate and Method of Making the Same", filed on June 29, 2012, the entire contents of which is incorporated herein by reference. in. The present application claims priority to Chinese Patent Application, the entire disclosure of which is hereby incorporated by reference in its entirety in the the the the the the the the the the TECHNICAL FIELD The present invention relates to the field of optical materials, and more particularly to an optical component, a method of manufacturing the same, and a photovoltaic device. BACKGROUND OF THE INVENTION When light is transmitted, a part of the interface of different media usually changes its direction of propagation and returns to the original medium. This is called the reflection of light. In general, the greater the difference in refractive index between different media, the stronger the reflection of light at the interface.

In the field of photovoltaic devices, displays, etc., how to reduce the reflection of light has been a research hotspot. A single-layer porous membrane is disclosed in Chinese Patent Publication No. CN100375908C A structured antireflective film comprising an antireflection film comprising silica microspheres and at least one binder compound, the antireflection film having a silica microsphere content of 30% by weight or more, 2 nm Or smaller arithmetic mean surface roughness and 10% (atomic percent) or higher surface silicon atom content. The anti-reflection film provided by the Chinese patent can improve the mechanical strength and abrasion resistance of the anti-reflection film, but the anti-reflection film has the disadvantages of adapting to a narrow spectral range and a small incident angle.

The compound eye of the moth can be regarded as an array structure in which hexagonal nanostructure protrusions are arranged in an orderly manner. This array is considered to be a homogenous transparent layer on the surface of the cornea, and each nanostructured protrusion is equivalent to an anti-reflection unit. Such a structure makes the compound eye of the moth low in reflection, making it look abnormally black. Therefore, even if the moth is flying at night, it is not easy to be detected. This effect is known as the moth eye effect. Compared with the conventional single-layer porous membrane structure, the anti-reflection film based on the moth-eye effect has a wider spectral range and a larger incident angle, so this technique has become a research hotspot by those skilled in the art.

The principle of anti-reflection of moth-eye structures is described below in combination with different optical models of moth-eye structures.

Referring to Figure 1, an equivalent schematic diagram of a moth-eye structure model is shown. According to the diffraction theory, when the surface of the moth-eye structure 1 has a structural change of micro-protrusions (that is, when the small step height difference in the moth-eye structure 1 is close to or smaller than the wavelength of light), the structural change of the micro-protrusion causes the material to be refracted. The slight change in the rate will increase the tendency of the refractive index nl, n2, η3, η4 from the air to the moth-eye structure 1 to increase sequentially, thereby reducing the reflection of light.

Referring to Figure 2, an equivalent schematic diagram of another moth eye structure model is shown. When the size of the microprotrusions in Fig. 1 is further reduced, the density of the microprojections is further increased, and the structure is generally closer to the continuously varying slope of the moth eye structure 2. This causes the refractive index of the moth-eye structure 2 to continuously change from n1 to η4 in the depth direction, thereby further reducing the reflection phenomenon caused by the sharp change in the refractive index.

Based on the moth-eye effect, various bionic optical materials have been developed in the prior art to reduce the effect of light reflection. Among them, the anti-reflection film formed by the silica microspheres arranged in the moth-eye structure is one of the optical materials simulating the moth-eye structure. Referring to Fig. 3, there is shown a transmittance curve of an antireflection film formed by silica microspheres arranged in a moth eye structure in the prior art. Wherein, the abscissa is the wavelength, the ordinate is the light transmittance, the curve 22 in FIG. 3 is the light transmittance of the glass not coated with the anti-reflection film, and the curve 21 is the light transmission of the glass coated with the anti-reflection film. The anti-reflection film is formed of silica spheroids arranged in a moth-eye structure. When the wavelength is greater than 600 nm, the light transmittance corresponding to the curve 22 is greater than the light transmittance corresponding to the curve 21, but when the wavelength is less than 600 nm, the light transmittance corresponding to the curve 22 is lower than the light corresponding to the curve 21. Transmittance. That is to say, the antireflection film formed by the existing silica microspheres does not exhibit a good antireflection effect at a wavelength of ', at 600 nm.

SUMMARY OF THE INVENTION Accordingly, there is a need for an optical component, a method of fabricating the same, and a photovoltaic device to increase the wavelength range to which the antireflective film is applied.

According to an aspect of the invention, a method of fabricating an optical component, comprising: providing a light-transmitting material microsphere; and surface-treating the light-transmitting material microsphere to carry a isotropic charge on the surface of the light-transmitting material microsphere Providing a substrate; dispersing the isotropically charged light-transmitting material microspheres on the substrate to form an anti-reflection film.

A basic idea is to make the surface of the light-transmitting material microspheres carry the same-sex charge, and the light-transmitting material microspheres maintain a certain distance between them due to homosexual repulsion. In this way, in the anti-reflection film formed lastly, there is a certain gap between the micro-spheres of the light-transmitting material, and no mutual adhesion occurs, so that the reflection of the adhered light-transmitting material microspheres to a specific wavelength can be avoided, thereby enabling the said The anti-reflection film has a good anti-reflection effect over a wide wavelength range.

According to another aspect of the present invention, a method of manufacturing an optical component, further comprising: providing a substrate; forming an anti-reflection film including at least one anti-reflection layer on the substrate; wherein the step of forming an anti-reflection layer The method includes: forming a charged layer; dispersing and dispersing the light-transmitting material microspheres different in electrical properties from the charged layer on the charged layer.

A basic idea is to disperse and distribute light-transmitting material particles different in electrical conductivity from the charged layer on the charged layer, so that the light-transmitting material particles and the charged layer attract each other, and the formed anti-reflective film can be improved. Firmness. According to another aspect of the present invention, after the step of forming the anti-reflective film after the substrate is provided, the method further includes: forming a preliminary layer on the surface of the substrate, the side of the preliminary layer contacting the substrate having a different surface from the substrate An electrical charge, and a side of the preliminary layer in contact with the anti-reflection film has a charge that is electrically different from a contact surface of the anti-reflection film.

A basic idea is that the faces of the preliminary layer and the substrate are respectively charged with different electrical charges; the faces of the preliminary layer and the anti-reflective film are respectively charged with different electrical charges; The principle that the preliminary layer and the substrate, the preliminary layer and the anti-reflection film have a large suction force, thereby improving the bonding force between the substrate and the anti-reflection film, thereby improving the mechanical mechanism of the optical component. strength. According to another aspect of the present invention, after forming the antireflection film, further comprising forming a low surface energy coating on the surface of the antireflection film. A basic idea is to form a low surface energy coating on the surface of the anti-reflective film to achieve super-hydrophobic self-cleaning effect, and the low surface energy coating can further increase the transmittance of the anti-reflective film, and finally improve the anti-reflection effect. According to another aspect of the invention, the material of the low surface energy coating comprises a methoxy silane. A basic idea is that the low surface energy coating is made of nonyloxysilane, which does not include fluorine, so that the low surface energy coating does not corrode the substrate even after prolonged use, and finally the optical component can be ensured. Normal use. In addition, the low surface energy coating is relatively inexpensive, thereby reducing production costs. According to another aspect of the present invention, an optical assembly formed by the method of fabricating the optical component is provided. A basic idea is that the surface of the light-transmitting material microspheres carries the same-spot charge, and the light-transmitting material microspheres maintain a certain spacing due to homosexual repulsion, and there is no mutual adhesion phenomenon, thereby avoiding the adhesion of the light-transmitting material microspheres. The reflection of a specific wavelength, in turn, enables the anti-reflection film to have a good anti-reflection effect over a wide wavelength range. According to another aspect of the present invention, the present invention also provides a photovoltaic device, comprising: the optical component, the substrate in the optical component is a transparent substrate; a solar cell, the transparent substrate is not provided with an anti-reflection film One side. A basic idea is that an anti-reflection film with good anti-reflection effect is provided in the photovoltaic device, which can project more light to the solar cell and improve the light utilization efficiency of the photovoltaic device. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an equivalent schematic view of a moth eye structure model;

Figure 2 is an equivalent schematic diagram of another moth eye structure model;

3 is a light transmittance curve of an antireflection film formed by arranging silica microspheres according to a moth eye structure in the prior art;

Figure 4 is a schematic view of silica microspheres in an antireflection film;

5 is a schematic flow chart of an embodiment of a method for manufacturing an optical component of the present invention; FIG. 6 to FIG. 9 are schematic views showing an embodiment of a method for manufacturing the optical component shown in FIG. 5; Schematic diagram of the flow of the embodiment;

11 to 14 are schematic views of an embodiment of a method of manufacturing the optical component shown in Fig. 10;

15 to 16 are views showing another embodiment of the manufacturing method of the optical component shown in Fig. 10;

Figure 17 is a schematic flow chart showing still another embodiment of the manufacturing method of the optical module of the present invention;

18 to 20 are schematic views of an embodiment of a method of manufacturing the optical component shown in Fig. 17;

Figure 21 is a schematic flow chart showing still another embodiment of the manufacturing method of the optical module of the present invention;

Figure 22 is a flow chart showing the step S35 of Figure 21:

Figure 23 is a schematic view of an embodiment of an optical component of the present invention; Figure 24 is a partial enlarged view of a preliminary layer in the optical assembly shown in Figure 23;

Figure 25 is a schematic view showing another embodiment of the optical component of the present invention;

Figure 26 is a graph showing the relationship between wavelength and transmittance of the optical module of the present invention.

BEST MODE FOR CARRYING OUT THE INVENTION In order to solve the problems of the prior art, the inventors conducted a shape analysis of a prior art anti-reflection film, specifically, an anti-reflection film by a scanning electron microscope (SEM). In the antireflection film shown in FIG. 4, the antireflection film includes a plurality of silica microspheres arranged in a moth eye structure, wherein the silica microspheres 11 located on the substrate 10 are several or even a dozen Stick together. The inventors have found through analysis that these adhered silica microspheres 11 reflect light of a specific wavelength, thereby affecting the antireflection effect of the antireflection film at a specific wavelength. Accordingly, the present invention provides a method of fabricating an optical component. Referring to FIG. 5, a flow diagram of an embodiment of a method of fabricating an optical component of the present invention is shown. The manufacturing method generally includes the following steps: Step S1, providing light transmission a material microsphere; step S2, surface-treating the light-transmitting material microspheres, so that the surface of the light-transmitting material microspheres carries a homogenous charge; step S3, providing a substrate; and step S4, causing the light-transmitting with the same-sense charge The material microspheres are dispersedly arranged on the substrate to form an antireflection film.

The program will be further explained. Referring to Figures 6 through 9, a schematic diagram of an embodiment of the optical component manufacturing method of Figure 5 is shown. As shown in FIG. 6, step SI is performed to provide a light-transmitting material microsphere. In this embodiment, the light-transmitting material microspheres are provided by preparing the light-transmitting material microspheres. In other embodiments, the light-transmitting material microspheres may also be provided by purchasing the light-transmitting material microspheres. In this embodiment, the silica microspheres are taken as an example. In other embodiments, the light transmissive material may be other oxides. The method for preparing silica microspheres in this embodiment generally comprises the following steps: First, the orthosilicate is diluted with ethanol. Thereafter, the diluted tetraethyl orthosilicate was immersed in a mixed solution of ethanol and water. Specifically, a mixed solution of ethanol and water is placed in the container 100, and then the diluted orthosilicate is placed in the mixed solution in the container 100. Wherein the volume ratio of ethanol to water in the mixed solution is in the range of 8.5:1 to 9.5:1, the formed silica microspheres 101 can be made uniform in size and have a good anti-reflection effect. Subsequently, ammonia water is added to the mixed solution, and the ammonia water is used as a catalyst to set the pH of the mixed solution in the range of 7.8 to 8.2 to increase the reaction rate. In addition, the pH of the mixed solution is in the range of 7.8 to 8.2, and the formed silica microspheres 101 can be made uniform in size and have a good anti-reflection effect. Preferably, the pH of the mixed solution is 8. Finally, the mixed solution in the vessel 100 is continuously vigorously stirred to form a precipitate which is the silica microspheres 101. It should be noted that if the stirring time is too short, the solution is not complete enough, and if the stirring time is too long, the time of the whole process is easily increased. Preferably, the time of continuous agitation is in the range of 1.5 to 2.5 hours. After the completion of the stirring, the mixed solution was filtered, and the precipitate in the mixed solution was filtered off, that is, the silica microspheres 101 were filtered off. Further, in order to carry out the subsequent steps, the method further comprises: washing the silica microspheres 101 with water to remove residual solution on the silica microspheres 101. The preparation of the silicon dioxide microspheres 101 is thus completed. It should be noted that the method for preparing the silica microspheres further includes an emulsion method, a chemical vapor deposition method, etc., and the method for preparing the silica microspheres is not limited. As shown in FIG. 7, step S2 is performed to surface-treat the light-transmitting material microspheres so that the surface of the light-transmitting material microspheres carries a homogenous charge; in this embodiment, by including the light-transmitting material micro A charged surfactant is placed in the solution of the ball such that the surface of the light-transmitting material microspheres carries a homogenous charge. Specifically, the light-transmitting material sphere is silica spheroid 101, and the surface of the silica microsphere 101 can carry a negative charge by sodium dodecylsulfate (SDS). Specifically, the silica microspheres 101 are placed in ethanol to form a suspension; sodium dodecylate is added to the suspension, and the suspension is stirred to make a surfactant and two The silica microspheres 101 are thoroughly mixed to form a negative charge on the surface of the silica microspheres 101. In the present embodiment, since the surface of the silica microsphere 101 carries a negative electric charge, the silica microspheres 101 repel each other, so that the probability of adhesion of the silica microspheres 101 to each other can be reduced when the antireflection film is formed. Further, it is possible to avoid reflection of the adhered silica sphere 101 to a specific wavelength to improve the range of application of the antireflection film. As shown in Fig. 7, after the silica microspheres 101 are surface-treated to carry the same-charge, the silica microspheres 101 are maintained at a certain interval therebetween. In the present embodiment, the sodium dodecyl sulfate can cause the silica microspheres 101 to carry a negative charge because sodium lauryl sulfate is a long-chain structure, and one end thereof is easily associated with silica microspheres. The 101 surface is combined and the other end carries a negative charge. After sodium dodecyl sulfate is sufficiently combined with the silica microspheres 101, the negatively charged end of sodium lauryl sulfate causes the silica microspheres 101 to carry a negative charge. It should be noted that if the concentration of sodium lauryl sulfate is too low, the silica crucible 101 may not be negatively charged. If the concentration is too high, the micelles are easily formed in the suspension. Sodium lauryl sulfate is not coated on the surface of the silica microspheres 101, but is freed in the suspension. Therefore, preferably, the concentration of sodium lauryl sulfate is Within the range of 0.5 to 10 moles per liter. It should be noted that, in this embodiment, the surfactant is described by taking sodium lauryl sulfate as an example, but the invention is not limited thereto, and may be other surfaces which can make the silica microspheres carry a negative charge. The active agent, for example: sodium dioctylsuccinate, sodium dodecylbenzenesulfonate or sodium glycocholate, and the like. This embodiment is exemplified by carrying a negative charge on the surface of the silica microsphere 101. However, the present invention is not limited thereto. In other embodiments, the surface of the silica microsphere 101 may also carry a positive charge. As shown in Fig. 8, a surfactant which is easily combined with the surface of the silica microsphere 101 and which carries a positive charge at the other end can form a positively charged, positively charged silica on the surface of the silica microsphere 101. The microspheres 101 maintain a certain spacing due to homosexual repulsion. Specifically, a surfactant capable of imparting a positive charge to the surface of the silica microsphere 101 includes tetradecyl-dimercaptopyridine ammonium bromide, trihexadecyl ammonium chloride or dinonyl diallyl chloride. Ammonium and so on. It should be noted that, in this embodiment, the method of carrying the isotropic charge on the surface of the silica microsphere 101 is exemplified by the method of the surfactant, but the invention is not limited thereto, and in other embodiments, Other means (for example, a surface treatment using an electrolyte) allows the silica microspheres 101 to carry a charge, for example: when the electrolyte polypropylene ammonium chloride is added to the suspension, the surface of the silica microspheres 101 can be positively charged; Alternatively, the surface of the silica microspheres 101 may be negatively charged by adding an electrolyte sodium styrene sulfonate to the suspension. In the present embodiment, after the step of surface-treating the silica microspheres 101 is completed, the silica microspheres 101 are further washed by water to remove substances remaining on the silica microspheres 101. Step S3 is performed to provide a substrate. The substrate can be glass, metal or glass. Preferably, after the substrate is provided, the substrate is further cleaned. Specifically, the substrate may be subjected to ultrasonic shock cleaning by acetone, isopropyl alcohol, and deionized water in this order. Among them, impurities such as grease on the substrate can be removed by acetone or isopropyl alcohol, and acetone and isopropyl alcohol remaining on the substrate are washed by deionized water. Ultrasonic vibration cleaning can achieve good cleaning results. As shown in FIG. 9, step S4 is performed to disperse the isotropic charge-transmitting light-transmitting material microspheres on the substrate 102 to form the anti-reflection film 103. The light-transmitting material microspheres in the anti-reflection film 103 constitute one micro-protrusion on the substrate 102, and the micro-protrusions are equivalent to a moth-eye structure, and the anti-reflection effect of the anti-reflection film 103 can be improved. Further, the light-transmitting material microspheres are dispersedly arranged on the substrate 102 without substantially blocking each other, and do not reflect light of a specific wavelength, thereby increasing the wavelength range to which the anti-reflection film 103 is applied. Specifically, the isotropically charged light-transmitting material microspheres are formed into a coating solution; the coating solution is coated on the substrate 102 to form an anti-reflection film. For example, an anti-reflection film may be formed on the substrate 102 by a process such as spin coating, spray coating, dipping or pulling a coating film or the like. The present invention does not limit the process of forming the anti-reflection film 103. It is to be noted that, in the present embodiment, after the coating film solution is coated on the substrate 102 to form the anti-reflection film 103, the step of heat-treating the anti-reflection film 103 is further included. The stability of the anti-reflection film 103 can be improved by heat treatment. In this embodiment, the light-transmitting material microspheres are silica microspheres 101, and the step of forming the anti-reflection film 103 comprises: first dispersing the isotropically charged silica microspheres 101 in ethanol to form a coating film solution; Thereafter, a film comprising the silica microspheres 101 is coated on the substrate 102 by spin coating; finally, the film is continuously heated to evaporate the ethanol in the film to form a dispersed arrangement of the dioxide on the substrate 102. The silicon microspheres 101, thereby completing the preparation of the anti-reflection film 103. Wherein, in the heating process, if the heating temperature is too low, the film bonding force and strength are not improved, and if the heating temperature is too high, the silica microspheres 101 and the substrate 100 are softened and deformed, so preferably, the heating temperature is 300. ~ 500 °C range. During heating, the higher the heating temperature, the shorter the heating duration, if the heating temperature is lower, The longer the heating lasts, the more the heating temperature is between 300 and 500 ° C, and the heating duration is in the range of 2 to 12 hours. In this embodiment, the surface of the silica microspheres 101 carries a negative charge, and the silica microspheres 101 repel each other to maintain a certain distance. Thus, in the finally formed anti-reflection film 103, there is a certain gap between the silica microspheres 101, and there is no phenomenon in which the silica microspheres 101 adhere to each other, so that the adhered silica microspheres 101 can be avoided. The reflection of a specific wavelength further enables the anti-reflection film 103 to have a good anti-reflection effect over a wide wavelength range, improving the performance of the anti-reflection film 103. It should be noted that if the concentration of the silica microspheres 101 in the coating solution is too low, the spacing of the silica microspheres 101 in the antireflection film 103 is likely to be excessively large, which may affect the antireflection of the antireflection film 103. Effect; if the concentration of the coating solution formed by the silica microspheres 101 is too high, the negative charges on the surface of the silica microspheres 101 in the antireflection film 103 are insufficient to separate them from each other, thereby facilitating the silica The microspheres 101 are closely arranged to affect the wavelength range to which the anti-reflection film 103 is applied. Therefore, preferably, the weight percentage of the silica spheroids 101 in the coating solution is in the range of 0.1 to 5%. It should also be noted that the spin coating process also has an effect on the anti-reflection effect of the reflective film 103: if the rotational speed in the spin coating process is too low, the silica microspheres 101 are easily closely arranged; if the rotational speed in the spin coating process is too high The spacing of the silica microspheres 101 is likely to be too large, thereby affecting the effect of the suppression. Typically, the spin-on process rotates at 500 - 3000 rpm. Preferably, by selecting a suitable coating solution in combination with suitable spin coating process parameters

(For example, considering the concentration of the coating solution and the rotation speed in the spin coating process), the silica microspheres 101 on the substrate 102 can be located in the same layer, that is, the antireflection film 103 is a single layer microsphere structure. The silica microspheres 101 constitute microprojections on the substrate 102, which is equivalent to a moth eye structure, and has a good anti-reflection effect. In the above embodiment, the microspheres of the silica material are taken as an example, but the invention is not limited thereto, and other light-transmitting material microspheres such as titanium dioxide (Ti0 ₂ ) may be used. Oxidation of metals such as alumina (A1 ₂ 0 ₃ ) and zirconia (Zr0 ₂ ) Things. In practical applications, the metal oxide microspheres may be prepared first, similarly to the silica material; the metal may be oxidized by a surfactant such as sodium lauryl sulfate or an electrolyte such as polypropylene ammonium chloride. The surface of the microspheres carries a homogenous charge; the metal oxide microspheres carrying the same charge are then dispersed on the substrate to form an antireflection film. The antireflection film can be applied to a wide wavelength range because it does not have blocking metal oxide microspheres. It should be noted that, in the above embodiment, the light-transmitting material microspheres are in direct contact with the substrate, but the invention is not limited thereto. In other embodiments, the light-transmitting material microspheres may not be combined with the substrate. Direct contact is provided as long as the light-transmitting material microspheres are dispersed in a layer above the substrate. The present invention also provides a method of fabricating another optical component, the manufacturing method comprising: providing a substrate; forming at least one anti-reflective film on the substrate, the anti-reflective film comprising a charged layer and on the charged layer Dispersing the light-transmitting material particles which are different from the charged layer.

Referring to Fig. 10, there is shown a schematic flow chart of another embodiment of the optical component manufacturing method of the present invention, which generally includes the following steps:

Step S11, providing a substrate;

Step S12, forming a charged layer; a light material microsphere;

In step S14, steps S12 to S13 are repeated.

In the embodiment shown in FIG. 10, a layer of charged layer, a layer of light-transmitting material microspheres, another layer of charged material, and another layer of light-transmitting material microspheres are sequentially formed on the substrate. The layer by layer ) forms an anti-reflection film on the substrate for reducing the reflection of light.

In this embodiment, the light-transmitting material microspheres having different electrical properties from the charged layer are dispersedly disposed on the charged layer, so that the light-transmitting material microspheres and the charged layer are attracted to each other for stacking, which can be improved. The firmness of the formed antireflective film. In the process of stacking each layer of the light-transmitting material microspheres, the process parameters such as the particle size of the light-transmitting material microspheres, the distribution of the materials, the distribution of the same layer of particles, and the like, and the total number of layers of the light-transmitting material microspheres can be controlled. In order to make the formed anti-reflection film have a better anti-reflection effect. In the embodiment, the anti-reflection film is formed by a layer by layer, so that the manufacturing process has better controllability, and the structure of the anti-reflection film formed by the embodiment has controllability.

It should be noted that, in other embodiments of the present invention, step S14 may not be performed, so that only one anti-reflection film is formed on the substrate, and the present invention does not limit the number of anti-reflection films in the optical component.

A schematic view of an embodiment of the optical component manufacturing method shown in Fig. 10 is shown with reference to Figs.

As shown in FIG. 11, step S11 is performed to provide the substrate 200. In this embodiment, the material of the substrate 200 is glass, but the invention is not limited thereto. In other embodiments, the material of the substrate 200 may also be plastic. The invention does not limit the material of the substrate 200. .

As shown in FIG. 12, step S12 is performed to form a charging layer 202 on the substrate 200. In this embodiment, the charged layer 202 is formed of an electrolyte or charged particles.

Specifically, the charged layer 202 may be formed on the substrate 200 by an impregnated coating process. For example, the electrolyte solution 203 is provided such that the substrate 200 is vertically immersed into the electrolyte solution 203 and immersed for a while, after which the substrate 200 is taken out from the electrolyte solution 203, and an electrolyte solution 203 is formed on both surfaces of the substrate 200. The charged layer 202 is formed.

In the present embodiment, the charged layer 202 with a positive charge is taken as an example. The electrolyte solution 203 is a polypropylene ammonium chloride which can form a positive charge. The glass was immersed in polypropylene ammonium chloride for 10 to 20 minutes, after which the glass was taken out to form a positively charged charged layer 202 on both surfaces of the glass.

Preferably, before the substrate 200 is immersed in the electrolyte solution 203, the step of adjusting the pH of the electrolyte solution 203 is further included. By adjusting the pH value, the charge amount of the electrolyte solution 203 can be increased to make the subsequently formed charged layer 202 more Goodly absorb light-transmitting materials Microspheres.

In the present embodiment, an acidic solution such as hydrochloric acid or an alkaline solution such as sodium hydroxide is added to the polypropylene ammonium chloride so that the pH of the polyacrylic ammonium chloride is in the range of 7 to 8 to increase the aggregation. The amount of positive charge in propylene chloride.

As shown in FIG. 13, step S13 is performed to disperse the light-transmitting material microspheres 204 electrically different from the charging layer 202 on the charging layer 202.

In this embodiment, the light transmissive material microspheres 204 are negatively charged silica particles. Before the light transmissive material microspheres 204 are disposed on the charged layer 202, the following steps are further included:

Providing a light transmissive material microsphere 204;

The PH value of the light transmissive material microspheres 204 is adjusted by an acidic or alkaline solution to increase the amount of electricity.

In this embodiment, the step of providing the light-transmitting material microspheres may be to prepare silica particles or to purchase silica particles. Among them, the method for preparing the silica particles includes an emulsion method, a chemical vapor deposition method, and the like, and the method for producing the silica particles is not limited in the present invention.

Preferably, the particle diameter of the silica particles is in the range of 5 to 10 nm. The nanometer-sized silica particles make the subsequently formed antireflection film have a porosity of d, and at the same time, the uniformity of the pore distribution can be improved.

Further, before the step of dispersing the light-transmitting material microspheres 204 on the charging layer 202, the method further comprises: washing the silica particles by water to remove a residual solution of the silica particles.

After the light transmissive material microspheres 204 are provided, the step of adjusting the PH value of the light transmissive material microspheres 204 is also included. Adjusting the PH value of the light-transmitting material microspheres 204 can increase the charge amount of the light-transmitting material microspheres 204, so that the light-transmitting material microspheres 204 can better adsorb the subsequently formed charged layer 202, thereby improving the film quality.

Taking the light-transmitting material spheroid 204 as the silica particle as an example, if the silica particles are in an alkaline environment, the negative charge of the surface of the silica particle is larger. Specifically, in After the silica particles are provided, an alkaline solution such as sodium hydroxide or ammonia water may be added to the colloidal solution containing the silica particles so that the pH of the silica particles is in the range of 8.5 to 9.5. To increase the amount of negative charge on the surface of the silica particles.

In this embodiment, the step of dispersing the light-transmitting material microspheres 204 on the charging layer 202 includes dispersing the light-transmitting material microspheres 204 on the charging layer 202 by a dip coating process. The charged layer 202 and the light transmissive material microspheres 204 constitute an antireflection layer 201.

For example, the charged layer 202 is formed of polypropylene ammonium chloride, and the light-transmitting material microspheres 204 are silica particles. Specifically, the specific process steps of forming the anti-reflective layer 201 include: immersing the substrate 200 to a positively charged The polypropylene ammonium chloride solution is continued for 10-20 minutes to form a charged layer 202; and the substrate coated with polypropylene ammonium chloride is immersed in deionized water for 1 to 5 minutes to remove the residual solution after the beaker A colloidal solution containing silica particles is placed therein, and the substrate 200 coated with polypropylene ammonium chloride is vertically immersed in the beaker and immersed for 10-20 minutes, after which the substrate 200 is taken out from the beaker at the substrate. Silica particles are adhered to the charged layer 202 of the two surfaces 200 to form an antireflection layer 201. Wherein, the substrate coated with polypropylene ammonium chloride is immersed in deionized water for a period of 1 to 5 minutes to remove the residual solution on the charged layer 202, thereby allowing the charged layer 202 to better absorb the light-transmitting material microspheres. 204.

In this embodiment, since the polypropylene ammonium chloride has a positive charge and the silica particles have a negative charge, the polypropylene ammonium chloride can adhere to the silica particles relatively tightly, thereby improving The film quality of the antireflective film on the optical component.

It should be noted that, in the process of forming the anti-reflection layer 201 by the dip coating process, if the immersion time is too short, the reaction is not complete enough, and if the immersion time is too long, the material of the light-transmitting material microsphere 204 is accommodated. Choose the right immersion time.

As shown in Fig. 14, step S14 is performed, and steps S12 and S13 are repeated to form a plurality of anti-reflection layers 201 composed of a charged layer 202 and light-transmitting material microspheres 204 on the substrate 200.

Specifically, the previously formed light transmissive material microspheres 204 (eg, negatively charged dioxide) When the silicon layer is coated with a charged layer 202 (for example, a positively charged polypropylene ammonium chloride), the newly coated charged layer 202 can be adsorbed due to the difference in electrical properties of the charged layer 202 and the light transmissive material microspheres 204. On the light transmissive material microspheres 204. In this way, the charged layer 202 and the light-transmitting material microspheres 204 are attracted to each other, and the multilayer anti-reflection layer 201 having good adhesion can be formed, thereby forming an optical component having better mechanical strength.

The multilayer anti-reflective layer 201 constitutes an anti-reflection film 205 on the substrate 200. In the present embodiment, since the substrate 200 is glass, its refractive index is 1.5 and the refractive index of air is 1. Therefore, in order to achieve index matching, the refractive index of the anti-reflection film 205 is preferably in the range of 1.2 to 1.24.

In the embodiment, the refractive index of the silica particles is 1.5, and the refractive index of the voids between the silica particles is 1. By adjusting the porosity of the anti-reflection film 205, the anti-reflection film 205 can be made. The refractive index is in the range of 1.2 to 1.24.

Preferably, after forming the anti-reflection film 205 composed of the multilayer anti-reflection layer 201, the embodiment further includes heat-treating the optical component to increase the robustness of the anti-reflection film 205 on the substrate 200.

Specifically, in the heating process, if the heating temperature is too low, the bonding strength and strength of each anti-reflective layer 201 are not improved, and if the heating temperature is too high, the particles of the transparent material microspheres 204 and the substrate 200 are softened and deformed. Preferably, the heating temperature is in the range of 300 to 500 °C. During heating, the higher the heating temperature, the shorter the heating duration. If the heating temperature is lower, the longer the heating lasts, the heating is continued for 30~130 minutes corresponding to the heating temperature at 300 ~ 500 °C. In the range.

The present embodiment forms the anti-reflection film 205 by means of a layer by layer. In the process of stacking each layer of the light-transmitting material microspheres 204, parameters such as the material of the light-transmitting material microspheres, the particle diameter, the distribution of the same-layer light-transmitting material microspheres, and the like may be controlled so that the refractive index of the anti-reflection film 205 is located. In the range of 1.2 to 1.24, the manufacturing process of the present embodiment has controllability, and the formed anti-reflection film 205 can have a good anti-reflection effect.

It should be noted that, in the above embodiment, the charged layer 202 is formed on the substrate by the dip coating process, and the light transmitting material microspheres 204 are disposed on the charged layer to form the antireflection layer 201. However, the invention is not limited thereto, and in other embodiments, it can also be spin-coated, The anti-reflection layer 201 is formed by a process of spraying, pulling, or the like. Among them, the spraying process can shorten the process time and improve the manufacturing efficiency.

It should be noted that the present invention forms the anti-reflection film 205 by means of a layer by layer, and each layer of the electrification layer 202 or each layer of the light-transmitting material microspheres 204 has a small thickness (substantially equal to that of the light-transmitting material microspheres). diameter). The thickness of the anti-reflection film can be precisely controlled by increasing the number of layers of the light-transmitting material microspheres 204.

It should be noted that, in the above embodiment, the negatively charged silica particles are exemplified, but the material of the light-transmitting material microspheres is not limited in the present invention. In other embodiments, the light transmissive material may be an oxide of titanium dioxide (Ti0 ₂ ), aluminum oxide (Al _{2 2} _{3 3} ), zirconium oxide (ZrO ₂ ), or the like.

It is to be noted that the above embodiment has been described with a positively charged electrolyte and a negatively charged light-transmitting material microsphere, but the invention is not limited thereto. Taking titanium dioxide particles as an example, the titanium dioxide particles are usually positively charged, and a negatively charged electrolyte can be used to form a charged layer to form an antireflection film with the titanium dioxide particles. Alternatively, the titanium oxide particles may be negatively charged by a surface treatment such as pH adjustment or a surfactant, so that the negatively charged titanium oxide particles may also be combined with the positively charged polypropylene ammonium chloride to form an antireflection film. In the present invention, the charged layer and the light-transmitting material microspheres may have different charge electrical properties.

Referring to Figures 15 through 16, a schematic view of another embodiment of the optical component manufacturing method of Figure 10 is shown. The same points of the embodiment as those of the embodiment shown in FIG. 11 to FIG. 14 are not described again, and the difference lies in:

As shown in FIG. 15, step S12 is performed to form a charging layer 302 on the substrate 300. In the embodiment, the charging layer 302 is formed of charged particles.

Specifically, the charged layer 302 is formed of positively charged titanium dioxide particles 303 (the titanium dioxide particles 303 are generally positively charged). The titanium oxide particles 303 may be formed on the substrate 300 by a dip coating process. For example, a colloidal solution bottom 300 containing titanium dioxide particles 303 is placed in a beaker and vertically immersed in the beaker for 15 to 20 minutes, after which the substrate 300 is taken out of the beaker, and titanium dioxide is adhered to both surfaces of the substrate 300. Particle 303. The titanium dioxide particles 303 have a positive charge and are used for adsorption subsequent forms. A negatively charged light-transmitting material microsphere.

As shown in FIG. 16, step S13 and step S14 are performed to disperse the silicon dioxide particles 304 on the substrate on which the charged layer 302 is formed by means of a layer by layer, and then form titanium dioxide on the silicon oxide particles 304. The charged layer 302 formed by the particles 303 is further dispersed on the charged layer 302. The charged layer 302 and the silicon dioxide particles 304 formed by the titanium dioxide particles 303 constitute an anti-reflection film 301, and a plurality of layers. The anti-reflection film 301 constitutes an anti-reflection film 305 on the substrate 300.

This embodiment differs from the embodiment shown in Figs. 11 to 14 in that the positively charged electrolyte is replaced by the positively charged titanium oxide particles 303. Since the refractive index of the titanium dioxide particles 303 is 1.8 and the refractive index of the silica particles 304 is 1.5, the porosity of the titanium dioxide particles 303 and the silicon oxide particles 304 can be adjusted so that the finally formed anti-reflection film 305 satisfies the refractive index matching. condition.

In order to improve the mechanical strength of the anti-reflection film in the optical component, the present invention also provides a method of manufacturing an optical component, which further comprises: forming a preliminary surface on the surface of the substrate before the step of forming the anti-reflection film after providing the substrate a layer having a surface in contact with the substrate with a charge different from the surface of the substrate, and a side of the preliminary layer in contact with the anti-reflection film with the anti-reflection film The contact surface has different electrical charges.

The faces of the preliminary layer contacting the substrate respectively have different electrical charges; the faces of the preliminary layer in contact with the anti-reflection film respectively have different electrical charges; based on the principle of heterogeneous charge attraction, The preliminary layer and the substrate, the preliminary layer and the anti-reflective film have a large suction force, thereby improving the bonding force between the substrate and the anti-reflection film, thereby improving the mechanical strength of the optical component.

Referring to Fig. 17, there is shown a flow chart showing still another embodiment of the manufacturing method of the optical module of the present invention, which generally includes the following steps:

Step S21, providing a substrate;

Step S22, forming a preliminary layer on the surface of the substrate, such that the side of the preliminary layer in contact with the substrate has a charge different from the surface of the substrate; Step S23, forming an anti-reflection film on the surface of the preliminary layer, and a side of the anti-reflection film contacting the preliminary layer has a charge different from that of the surface of the preliminary layer.

18 to 20 are schematic views of an embodiment of a method of manufacturing the optical component shown in Fig. 17.

As shown in FIG. 18, step S21 is performed to provide the substrate 400. The material of the substrate 400 may be glass or plastic. However, the present invention does not limit the material of the substrate 400.

As shown in FIG. 19, step S22 is performed to form a preliminary layer 403 on the substrate 400 such that the side of the preliminary layer 403 in contact with the substrate 400 has a charge different from the surface of the substrate 400.

In a practical application, the preliminary layer 403 may be formed on the substrate 400 by a spin coating, spraying, dipping or pulling coating process.

The preliminary layer 403 can be a single layer of electrical layer. The preliminary layer 403 may also be composed of a plurality of electrical layers. Specifically, a layer is layered on the substrate 400 in layers to form a preliminary layer 403 of the multilayer structure.

Specifically, the step of forming the preliminary layer 403 includes: alternately stacking the first electrical layer 4031 and the second electrical layer 4032 on the substrate 400, and the first electrical layer 4031 and the second electrical layer 4032 are electrically charged. Different sex. Due to the attraction of the opposite sex, the first electrical layer 4031 and the second electrical layer 4032 can be closely attached together, and the wear resistance of the preliminary layer 403 can be improved.

Specifically, the material of the first electrical layer 4031 and the second electrical layer 4032 may be an electrolyte such as a negatively charged sodium polystyrene sulfonate or a positively charged polypropylene ammonium chloride.

In this embodiment, the material of the substrate 400 is glass. Generally, the surface of the glass is negatively charged. The surface of the preliminary layer 403 that is in contact with the glass is positively charged. The first electrical layer 4031 is provided by a strip. A positively charged polypropylene ammonium chloride, the second electrical layer 4032 is composed of a negatively charged sodium polystyrene sulfonate, and the step of forming the preliminary layer 403 comprises: providing a concentration of 0.05 to 0.15 moles per liter, PH a polypropylene ammonium chloride solution having a value of 3 to 5, and a polypropylene chloride having a pH of 3 to 5 having a positive charge; Providing a sodium polystyrene sulfonate solution having a concentration of 0.05 to 0.15 mol/L and a pH of 3 to 5, and a polyphenylene sulfonate having a pH of 3 to 5 has a negative charge;

The positively charged polypropylene ammonium chloride is first coated on the glass by a lift coating process, followed by coating the negatively charged sodium polystyrene sulfonate, and then coating the positively charged polypropylene to chlorinate. Ammonium... The polypropylene ammonium chloride, the sodium polystyrene sulfonate is alternately coated in this manner to form a preliminary layer 403.

Specifically, in this embodiment, a five-layer electrical layer is formed on the substrate 400 by five times of pulling coating process, and the first electrical layer 4031 and polyphenylene are formed of polypropylene ammonium chloride sequentially on the glass. a second electrical layer 4032 composed of sodium sulfosyl sulfate, a first electrical layer 4031 composed of polypropylene ammonium chloride, a second electrical layer 4032 composed of sodium polystyrene sulfonate, and a polyammonium chloride The first electrical layer 4031. Therefore, in this embodiment, the positively charged polypropylene ammonium chloride on the surface of the negatively charged glass can be adsorbed on the glass, and at the same time, the surface of the preliminary layer 403 is formed of polypropylene ammonium chloride. The first electrical layer 4031 is such that the surface of the preliminary layer 403 is positively charged.

As shown in FIG. 20, step S23 is performed to form an anti-reflection film 405 on the preliminary layer 403, and the contact surface of the anti-reflection film 405 and the preliminary layer 403 are electrically charged differently, so the anti-reflection The film 405 can be adsorbed on the substrate 200 by the preliminary layer 403, thereby improving the mechanical strength of the anti-reflection film 405.

This embodiment can form the anti-reflection by a layer layer method according to the steps of forming an anti-reflection film with the embodiment shown in FIG. 11 to FIG. 14 or the embodiment shown in FIG. 15 to FIG. Film 405.

Specifically, the step of forming the anti-reflection film 405 includes: forming a light-transmitting material microsphere 402 on the surface of the preliminary layer 403; thereafter, forming a charging layer 404 on the light-transmitting material microsphere 402; and then, transmitting light on the charging layer 404 The material microspheres 402, and then a layer of charged layer 404 are formed, which are alternately stacked until the thickness of the finally formed anti-reflective film 405 meets the design requirements.

In this embodiment, the light transmissive material microspheres 402 are negatively charged silica microspheres. However, the present invention is not limited thereto. In other embodiments, the light transmissive material microspheres 402 may also be a positive charge. For example, the light transmissive material is a positively charged material. Titanium oxide microspheres.

The charged layer 404 has a charge different from that of the light-transmitting material microspheres 402 for attracting the respective layers of the light-transmitting material microspheres 402 to each other. Specifically, the material of the charging layer 404 is an electrolyte or charged particles. In this embodiment, the material of the charging layer 404 is positively charged polypropylene ammonium chloride. In other embodiments, the charged layer 404 can also be a positively charged titanium dioxide charged particle.

Specifically, negatively charged silica microspheres and positively charged polypropylene ammonium chloride are alternately stacked on the preliminary layer 403 by a lift coating process to form an antireflection film on the preliminary layer 403. 405.

It should be noted that, in other embodiments, the step S23 may be performed by a method similar to the method of forming an anti-reflection film in the embodiment shown in Fig. 5.

Specifically, after the substrate is provided and formed with the preliminary layer, the light-transmitting material microspheres are provided; the light-transmitting material microspheres are surface-treated such that the surface of the light-transmitting material microspheres carries a homogenous charge; Charged light-transmitting material microspheres are dispersedly arranged on the preparation to form an anti-reflection film.

In order to achieve self-cleaning of the anti-reflection film, the present invention also provides a method of manufacturing an optical component. Referring to Figure 21, there is shown a schematic flow chart of still another embodiment of the method of fabricating the optical component of the present invention. Includes:

Step S31, providing a substrate;

Step S32, performing cleaning processing on the substrate;

Step S33, roughening the cleaned substrate;

Step S34, forming an anti-reflection film on the surface of the substrate, the anti-reflection film having a moth-eye structure;

Step S35, forming a low surface energy coating on the surface of the anti-reflection film.

The technical solution of the embodiment shown in Fig. 21 will be described in detail below with reference to specific embodiments.

First, step S31 is performed to provide a substrate.

The substrate may be any transparent substrate, which may be made of glass, metal or ceramic. Or plastic, etc.

This embodiment does not limit the specific shape, size and thickness of the substrate.

Then, step S32 is performed to perform a cleaning process.

In this embodiment, the substrate may be ultrasonically cleaned by a mixed solution of acetone, isopropanone and deionized water. The specific process is well known to those skilled in the art and will not be described herein.

It should be noted that, in other embodiments of the present invention, the substrate may be cleaned by other means, which does not limit the scope of protection of the present invention.

By the cleaning treatment, impurities on the surface of the substrate can be removed, ensuring that a clean substrate is obtained without causing the impurities to affect the subsequent reaction.

Next, in step S33, roughening processing is performed.

This embodiment can be carried out using a solution of hydrofluoric acid (HF) or nitric acid (HNO ₃ ). The hydrofluoric acid or nitric acid solution reacts with the substrate to make the surface of the substrate relatively rough.

The substrate can be directly immersed in a hydrofluoric acid or nitric acid solution in this example. Wherein, the weight percentage of the hydrofluoric acid or nitric acid may range from 5 wt% to 20 wt%; the time of the roughening treatment may range from 30 minutes to 120 minutes; and the temperature range of the roughening treatment may range from 20 ° C to 80 ° C .

By the roughening treatment, the wettability of the substrate can be increased, and the firmness and uniformity of the subsequently formed film layer on the surface of the substrate can be increased.

Further, after the roughening treatment, the substrate may be washed with deionized water to remove the acid remaining on the surface of the substrate.

Next, in step S34, an anti-reflection film of a moth-eye structure is formed.

The material of the anti-reflection film may be zinc oxide, silicon, silicon oxide, titanium oxide, silicon nitride, hafnium oxide, zirconium oxide, aluminum oxide, indium oxide, tin oxide, gallium oxide, tin-doped indium oxide, fluoride blending. Any combination of one or more of tin indium oxide, fluorine-doped indium oxide, fluorine-doped indium oxide, aluminum-doped zinc oxide, gallium-doped zinc oxide, zinc sulfide, zinc stanozide, and magnesium fluoride.

The anti-reflection film may specifically be chemical vapor deposition, spin coating, spraying, wet chemistry Formed by at least one of a method, a sol-gel gel, a chemical liquid deposition, a photolithography, a templating method, a physical vapor deposition, an evaporation or a sputtering method.

Specifically, the optical component manufacturing method shown in FIG. 6 to FIG. 9 may be employed, and the light-transmitting material microspheres are subjected to surface treatment by surface treatment of the light-transmitting material microspheres, and the light-transmitting material microspheres carrying the same-charged charge are then carried. Dispersion is arranged on the substrate to form an antireflection film having a moth eye structure. Alternatively, the anti-reflection film may be formed by a layer by layer according to the embodiment shown in Figs. 11 to 14 or the embodiment shown in Figs. 15 to 16 . For the specific process, refer to the related steps of the foregoing embodiment, and details are not described herein again.

Next, step S35 is performed to form a low surface energy coating on the surface of the anti-reflection film. The material of the low surface energy coating may be a methoxy silane, an alkyl silane, a fluorosilane or a graft siloxane chain compound.

The low surface energy coating may also be formed by chemical vapor deposition, spin coating, spraying, wet chemical method, chemical sol gel, chemical liquid deposition, photolithography, templating, physical vapor deposition, evaporation or sputtering. At least one of the methods is formed.

As a specific example, the low surface energy coating material is HDTMS, and when HDTMS is used to form a low surface energy coating, the following advantages are obtained:

A. HDTMS does not include fluorine. Even if it is in contact with a glass, metal or plastic substrate for a long time, it will not corrode the substrate.

B. HDTMS will produce three reactive groups after hydrolysis, and the reactive group can chemically react with the substrate, so that the adhesion between HDTMS and the substrate is very good, thereby improving the service life;

C, since dual HDTMS along with the water and oil repellent ^ fruit, which can ensure both substrate was produced in the hydrophobic water- and oil-repellent; ³

D, HDTMS is inexpensive, which can reduce the production cost of the substrate. Also, HDTMS is changed from CH ₃ _ 0_ Si before hydrolysis to HO Si after hydrolysis, so that HDTMS can have three silanols;

There are also up to three silyl groups. The silanol reacts as a reactive group with the hydroxyl groups on the substrate, so the binding of HDTMS to the substrate is very ^H3. In addition, when the carbon chain in the low surface energy material is too short, the surface energy is too high, and the hydrophobic effect is not obtained; when the carbon chain is too long, the link is broken and the stability is poor. In this embodiment, HDTMS is selected as the low surface energy material, and the HDTMS has a moderate carbon chain length, thereby achieving a hydrophobic effect and a relatively good stability.

Referring to Fig. 22, a schematic flow chart of the step S35 of Fig. 21 is illustrated. Specifically, the step of forming a low surface energy coating on the surface of the anti-reflective film may include: Step S41, providing cetyltrimethoxysilane;

Step S42, adding ethanol to the cetyltrimethoxysilane to form a solution; in step S43, the solution is acidified;

Step S44, stirring the acidified solution;

Step S45, the solution is formed on the surface of the anti-reflection film by means of wetting, spin coating or spraying.

First, HDTMS having a chemical formula of CH ₃ (CH ₂ ) ₁₅ Si(OCH ₃ ) ₃ is provided. Next, the inventors have found that HDTMS is easily soluble in ethanol, so that ethanol is added to HDTMS, whereby a solution containing HDTMS can be obtained.

In this embodiment, the HDTMS can be placed in an ethanol solution or the ethanol solution can be poured into the HDTMS.

Specifically, the mass percentage of cetyltrimethoxysilane in the solution may range from 3% to 5%.

Next, the solution is subjected to an acidification treatment to hydrolyze HDTMS, and a reactive group hydroxyl group is produced.

Specifically, at least one of acetic acid, hydrochloric acid or nitric acid is added to the solution until the pH of the solution is between 4.5 and 5.5, such as a pH of 4.5, 5.0 or 5.5.

Next, the acidified solution is subjected to agitation treatment to hydrolyze the HDTMS to be uniform and uniform.

Specifically, the acidified solution is placed in a stirring apparatus, and the solution is stirred for 60 minutes or more.

Then, after the solution is prepared, it can be formed on the anti-reflection The surface of the membrane acts as a low surface energy coating.

Specifically, the solution may be formed on the surface of the anti-reflection film by any one of wetting, spin coating or spraying.

When the solution is formed on the surface of the anti-reflection film by means of wetting, the substrate is placed in the solution, and in order to ensure sufficient reaction, the standing time may be 30 minutes to 60 minutes, such as: 30 minutes, 40 minutes, 50 minutes or 60 minutes. This operation can be carried out directly at room temperature, without the need for additional equipment, to operate the cartridge, and to ensure a uniform distribution of the low surface coating on the surface of the antireflective film.

When the solution is formed on the surface of the antireflection film by spin coating or spraying, the time required is relatively short, the efficiency is relatively high, and the uniformity of the distribution of the low surface energy coating on the surface of the antireflection film can be ensured.

Thus, a low surface energy coating is formed on the surface of the antireflection film. The thickness of the low surface energy coating layer is on the order of 10 nm to 500 nm, such as 10 nm, 50 nm, 100 nm, 250 nm or 500 nm.

Further, after forming a low surface energy coating on the surface of the antireflection film, the low surface energy coating may be dried and subjected to a curing treatment.

In this embodiment, after forming the low surface energy coating, it is first dried at room temperature. After the low surface energy coating is dried, the curing treatment can be performed. Specifically, the curing treatment may take a time ranging from 30 minutes to 60 minutes, such as: 30 minutes, 40 minutes, 50 minutes, or 60 minutes; the temperature may range from 100 ° C to 150 ° C, such as: 100 ° C, 110 ° C, 120 ° C, 130 ° C, 140 ° C or 150 ° C.

By the curing treatment, the fixation of the low surface energy coating on the surface of the antireflection film can be increased, and the peeling of the low surface energy coating can be prevented.

It should be noted that, in other embodiments of the present invention, in order to ensure the formation of an anti-reflection film and a low surface energy coating on the surface of the substrate, the cleaning treatment, the roughening treatment or the curing treatment is performed for the tubeizing step. The corresponding steps can be omitted.

By forming an anti-reflection film with a moth-eye structure on the surface of the substrate, the anti-reflection effect of the full spectrum and the large incident angle can be achieved; and a low surface energy coating can be formed on the surface of the anti-reflection film to achieve super The hydrophobic self-cleaning effect, and the low surface energy coating can further increase the transmittance of the anti-reflection film, and finally improve the anti-reflection effect.

In addition, since HDTMS is used as a low surface energy coating, the low surface energy coating does not corrode the substrate even after prolonged use, which ultimately ensures the normal use of the hydrophobic substrate; and because the price of HDTMS is relatively low, thereby reducing Production costs.

Accordingly, the present invention also provides an optical component formed by the manufacturing method. Referring to FIG. 9, an embodiment of the optical component includes: a substrate 102; the substrate is glass, metal or plastic. The anti-reflection film 103 covers the substrate 102, and the light-transmitting material microspheres of the anti-reflection film 103 have a gap therebetween, which can prevent the adhesion of the light-transmitting material microspheres on the plane of the substrate 102. Preferably, the light-transmitting material microspheres in the anti-reflection film 103 are on the same layer on the substrate 102, that is, the anti-reflection film 103 is a single-layer microsphere structure, and the anti-reflection film 103 is wide. Good anti-reflection effect in the spectral range. Referring to FIG. 14 and FIG. 16, the optical component may also be an optical component formed by the manufacturing method of the optical component shown in FIGS. 11 to 14, and the manufacturing method of the optical component shown in FIGS. 15 to 16, respectively. In order to increase the mechanical strength of the optical component, referring to Figures 23 and 24, the present invention also provides a schematic and partial enlarged view of another embodiment of the optical component. It is to be noted that in order to make the drawings clearer and cleaner, only a part of the optical components are illustrated in the drawings to illustrate the positional relationship of the films in the optical components, and the number of films in the drawings should not be construed as limiting the invention.

The optical component includes: a substrate 500, a preliminary layer 503 on the substrate 500 and in contact with the substrate 500, and an anti-reflection film 505 on the preliminary layer 503 and in contact with the preliminary layer 503, wherein

The substrate 500 is for providing a medium in which light is incident. In different optical products, the Substrate 500 can be a different material. For example, in a photovoltaic device, the substrate 500 is made of glass; in the backlight of the liquid crystal display, the material of the substrate 500 may also be plastic. The present invention does not limit the material of the substrate 500. Here, the material of the substrate 500 is exemplified by a glass having a negatively charged surface.

The preliminary layer 503 is located between the substrate 500 and the anti-reflection film 505, and the contact faces of the preliminary layer 503 and the substrate 500 respectively have electrically different charges; the preliminary layer 503 and the anti-reflection film The contact faces of the 505 are respectively charged with different electrical charges, and the bonding force between the substrate 500 and the anti-reflective film 505 is improved based on the principle of heterosexual charge attraction. Here, since the preliminary layer 503 is formed before the anti-reflection film 505 is formed, it is referred to as a "preparation" layer.

The preliminary layer 503 may be a single-layer electrical layer. For example, the surface of the substrate 500 is negatively charged, and the surface of the anti-reflective film 505 in contact with the preliminary layer 503 is negatively charged. Accordingly, the preliminary layer 503 is a single layer of a positively charged film that can attract the substrate 500 and the anti-reflective film 505.

In this embodiment, as shown in FIG. 24, the preliminary layer 503 includes a plurality of electrical layers. Specifically, the preliminary layer 503 is formed by alternately stacking a first electrical layer 5031 and a second electrical layer 5032. The first electrical layer 5031 and the second electrical layer 5032 respectively have different electrical charges, so that the first electrical layer 5031 and the second electrical layer 5032 can be closely combined based on the principle of opposite charge attraction. Together, the firmness and mechanical strength of the preliminary layer 503 are improved.

The first electrical layer 5031 and the second electrical layer 5032 may be composed of an electrolyte. For example: It may be an electrolyte of a negatively charged sodium polystyrene sulfonate or a positively charged polypropylene ammonium chloride.

In a specific application, the electrical properties of the electric charges carried by the first electrical layer 5031 and the second electrical layer 5032 and the number of layers of the electrical layer in the preliminary layer 503 may be set to make the contact layer of the preliminary layer 503 and the substrate. There are different charges, respectively, while the contact faces of the preliminary layer 503 and the anti-reflection film 505 are respectively charged with different charges.

In this embodiment, the substrate 500 is exemplified by a glass, usually the glass has a negative charge, and the first electrical layer 5031 is a positively charged polypropylene ammonium chloride, and the second electrical layer 5032 is a negatively charged sodium polyphthalate. Five layers of electrical layers are sequentially stacked on the substrate 500: positively charged polypropylene ammonium chloride, negatively charged sodium polyphthalate, positively charged polypropylene ammonium chloride, negatively charged polyphenylene Sodium vinyl sulfonate, positively charged polypropylene ammonium chloride. The preliminary layer 503 is in contact with the substrate 500 as a positively charged polypropylene ammonium chloride. Unlike the electrical charge of the substrate 500, the preliminary layer 503 may be adsorbed on the substrate 500. At the same time, the surface of the preliminary layer 503 is a positively charged polypropylene ammonium chloride, and has a different charge on the contact surface with the subsequent anti-reflection film 505 for adsorbing the anti-reflection film 505.

In other embodiments, if the surface of the substrate 500 is positively charged, a negatively charged sodium polyphthalate may be formed on the substrate 500. In addition, if the phase contact surface of the anti-reflection film 505 has a positive charge, an electric layer may be added or reduced such that the surface of the preliminary layer 503 that is in contact with the anti-reflection film 505 is a negatively charged polyphenylene. Sulfonic acid

#1.

It should be noted that the more the number of the electrical layers in the preliminary layer 503, the more the adsorption force of the preliminary layer 503 on the anti-reflection film 505 can be increased, but when the number of the electrical layers in the preliminary layer 503 exceeds 8 layers, This increase in adsorption is not apparent. The excessive number of electrical layers in the preliminary layer 503 increases the material cost and also causes the film thickness to be too large. Therefore, the number of electrical layers in the preparation layer 503 is preferably less than or equal to 8. In order to ensure that the preliminary layer 503 has a sufficiently large adsorption force and at a low cost, preferably, the number of the electrical layers in the preliminary layer 503 is in the range of 3 to 6 layers.

An anti-reflection film 505 on the preliminary layer 503 serves to reduce reflection of light when light is incident on the substrate 500.

The anti-reflection film 505 has a different charge on the surface in contact with the preliminary layer 503. Therefore, the anti-reflection film 505 is firmly fixed to the preliminary layer 503 based on the opposite phase attraction, and is firmly fixed to the anti-reflection film 505. On the substrate 500, the mechanical strength of the optical component is increased.

Specifically, the anti-reflection film 505 is formed by a layer by layer in the embodiment, and includes a multi-layer anti-reflection layer 502. A charged layer 504 electrically different from the anti-reflective layer 502 is further disposed between the anti-reflective layers 502, and the charged layer 504 can tightly bond the anti-reflective layers 502 of each layer. In this embodiment, the anti-reflective layer 502 includes a plurality of silica microspheres dispersedly disposed in the same layer. The refractive index between the silica microspheres is 1 and the refractive index of the silica is 1.5. By setting the void ratio, the refractive index of the anti-reflective layer 502 can satisfy the relationship of refractive index matching, thereby reducing the reaction. . Preferably, the silica microspheres have a particle size in the range of 5 to 10 nm. Nano-sized silica microspheres can improve the uniformity of voids in the anti-reflective film 505.

The surface of the preliminary layer 503 is positively charged, and the silica microspheres are generally negatively charged and can be firmly adsorbed on the preliminary layer 503.

It should be noted that the silica microspheres in this embodiment have a negative charge. In other embodiments, when the surface of the preliminary layer 503 is negatively charged, the silica microspheres may be surface-treated (for example, : Surface conditioning by pH adjustment or by surfactant to render the silica microspheres positively charged.

The charged layer 504 may be composed of an electrolyte or charged particles. In this embodiment, the charged layer 504 is a positively charged polypropylene ammonium chloride. The positively charged polypropylene ammonium chloride can adsorb negatively charged silica microspheres to increase the mechanical strength of the antireflective film 505.

It should be noted that, in other embodiments, the charged layer 504 may also be a positively charged charged particle, for example: the charged layer 504 is a positively charged silicon dioxide charged particle.

In this embodiment, a preliminary layer is provided between the substrate 500 and the anti-reflection film 505.

503, the bonding force between the anti-reflection film 505 and the substrate 500 is improved.

In addition, since the preliminary layer 503 for providing an adsorption force is provided, the anti-reflection film 505 may be provided with an anti-reflection layer 502 having a sufficient number of layers, thereby increasing the thickness of the anti-reflection film 505, so that the anti-reflection film 505 satisfies the thickness matching. Relationship. Taking the anti-reflection film 505 as an example of the formation of the silica microspheres and the polypropylene ammonium chloride stack, after the preliminary layer 503 is disposed, at least 10 layers of silica microspheres may be disposed in the anti-reflection film 505, thereby making the anti-reflection film 505 The reflective film 505 obtains a sufficiently large film thickness.

It should be noted that FIG. 23 and FIG. 24 illustrate an embodiment of the optical component, located in the The anti-reflection film 505 on the preliminary layer 503 is formed by a layer by layer, and includes at least one anti-reflection layer.

However, the present invention is not limited thereto. In other embodiments, the anti-reflection film located on the preliminary layer may also be a surface treatment of the light-transmitting material microspheres so that the light-transmitting material microspheres have the same electric charge and then carry The isotropically charged light-transmitting material microspheres are dispersed in an anti-reflection film formed on the substrate.

Referring to FIG. 25, there is shown a schematic view of still another embodiment of the optical component of the present invention, comprising: a substrate 600;

An anti-reflection film 601 located on a surface of the substrate 600, the anti-reflection film 601 having a moth-eye structure;

A low surface energy coating 602 on the surface of the anti-reflective film 601.

The substrate 600 may be any transparent substrate and may be made of glass, metal, ceramic or plastic.

This embodiment does not limit the specific shape, size and thickness of the substrate 600.

The thickness of the anti-reflection film 601 may range from 100 nm to 2000 nm, such as:

100 nm, 500 nm, 100 nm or 2000 nm.

The anti-reflection film 601 may be made of zinc oxide, silicon, silicon oxide, titanium oxide, silicon nitride, hafnium oxide, zirconium oxide, aluminum oxide, indium oxide, tin oxide, gallium oxide, tin-doped indium oxide, or fluorinated. Any combination of one or more of tin-doped indium oxide, fluorine-doped indium oxide, indium fluoride-doped indium oxide, aluminum-doped zinc oxide, gallium-doped zinc oxide, zinc sulfide, zinc stanozide, and magnesium fluoride.

Alternatively, the anti-reflection film 601 may be an anti-reflection film formed in the above embodiment of the optical module manufacturing method. For example, the surface of the light-transmitting material microsphere is subjected to surface treatment so that the light-transmitting material microspheres are charged with the same polarity, and then the light-transmitting material microspheres carrying the same-charge charge are dispersed and arranged on the substrate, thereby forming an anti-reflection film (as shown in the figure). Antireflective film shown in 9). Or an antireflection film comprising at least one antireflection layer formed by a layer by layer (an antireflection film as shown in Fig. 14 or Fig. 16).

Since the anti-reflection film 601 has a moth-eye structure, it can have a gradient refractive index, thereby avoiding reflection of light, and finally achieving a full spectrum and a large incident angle. The low surface energy coating 602 may have a thickness ranging from 10 nm to 500 nm, such as: 10 nm, 50 nm, 100 nm, 250 nm or 500 nm.

The material of the low surface energy coating 602 may be a methoxy silane, an alkyl silane, a fluorosilane or a graft siloxane chain compound.

Preferably, the low surface energy coating 602 is made of HDTMS, and since the HDTMS has the dual effects of water and oil repellency, the optical components produced can be guaranteed to simultaneously resist water and oil. In addition, HDTMS is inexpensive, which can reduce the production cost of optical components.

In one specific example, the substrate is a glass substrate, the antireflective film is zinc oxide, and the low surface energy coating is HDTMS.

Referring to Figure 26, which shows the relationship between wavelength and transmittance in three different cases, the abscissa is the wavelength in nm; the ordinate is the transmittance in %.

The first case corresponds to a glass substrate, i.e., the solid line curve in Fig. 26 shows the relationship between the wavelength of light absorbed by the glass substrate and the transmittance of light on the surface of the glass substrate.

In the second case, an anti-reflection film of ZnO material is formed on the surface of the glass substrate (hereinafter referred to as an anti-reflection substrate), that is, a deep dotted line curve in FIG. 26 shows the wavelength of light absorbed by the anti-reflection substrate and the light on the substrate. The relationship between the transmittance of the surface.

In the third case, an antireflection film made of ZnO and a low surface energy coating of HDTMS (hereinafter referred to as an optical component) are formed in sequence on the surface of the glass substrate, that is, the relationship between the transmittances in Fig. 26.

By analyzing the above three curves, the total change trend of the three curves is the same, and the transmittance of the optical component> the transmittance corresponding to the anti-reflection substrate> the transmittance corresponding to the glass substrate, which fully proves that the transmittance is low. The surface energy coating can increase the transmittance, that is, enhance the antireflection effect of the antireflection film.

It should be noted that in other embodiments of the present invention, the low surface energy coating contributes to the improvement of the anti-reflection effect without limiting the materials of the substrate, the anti-reflection film and the low surface energy coating. No longer. Correspondingly, the present invention also provides a photovoltaic device for converting light energy into electrical energy, comprising: an optical component formed by the manufacturing method, a substrate in the optical component is a transparent substrate; a solar cell, located in the transparent The side of the substrate away from the light. Wherein, the transparent substrate is plexiglass or plastic (for example, decyl acrylate, PMMA). The optical component is the same as the optical component in the above embodiment, and details are not described herein again. Specifically, the solar cell is an amorphous silicon solar cell or a microcrystalline silicon solar cell. The anti-reflection film with good anti-reflection effect is disposed in the photovoltaic device of the invention, which can project more light to the solar cell and improve the light utilization efficiency of the photovoltaic device. In addition to being used in photovoltaic devices, the optical components can be applied to other products.

(e.g., liquid crystal display), those skilled in the art can make corresponding modifications, variations and substitutions according to the above embodiments. The present invention has been disclosed in the above preferred embodiments, but it is not intended to limit the present invention, and the present invention can be utilized with the above disclosed methods and technical contents without departing from the spirit and scope of the invention. The technical solutions make possible changes and modifications. Therefore, any modification, equivalent change and modification of the above embodiments according to the technical essence of the present invention are all technical solutions of the present invention. The scope of protection.

Claims

Rights request

1. A method of manufacturing an optical component, characterized in that it includes:

Provide light-transmitting material microspheres;

Surface treatment is performed on the light-transmitting material microspheres so that the surface of the light-transmitting material microspheres carries a homogeneous charge;

provide a base;

The light-transmitting material microspheres carrying homogeneous charges are dispersed and arranged on the substrate to form an anti-reflective film.

2. The manufacturing method of claim 1, wherein the light-transmitting material is silicon dioxide, titanium dioxide, alumina or zirconium oxide.

3. The manufacturing method of claim 1, wherein the light-transmitting material is silica, the step of providing light-transmitting material microspheres includes preparing light-transmitting material microspheres, and the preparing light-transmitting material The microsphere steps include:

Dilute ethyl orthosilicate with ethanol;

Immerse the diluted ethyl orthosilicate into a mixed solution of ethanol and water;

Stir the mixed solution to form a precipitate;

Filter out the precipitate;

The precipitate, which is silica spheres, is washed with water.

4. The manufacturing method according to claim 3, characterized in that, in the mixed solution of ethanol and water, the volume ratio of ethanol and water is in the range of 8.5: 1 to 9.5: 1.

5. The manufacturing method of claim 3, wherein the step of stirring the mixed solution includes: the duration of stirring is 1.5 to 2.5 hours.

6. The manufacturing method according to claim 3, characterized in that, after immersing the diluted ethyl orthosilicate into the mixed solution of ethanol and water, and before stirring, it further includes adding ammonia water to the mixed solution, Make the pH value of the mixed solution lie in the range of 7.8~8.2.

7. The manufacturing method according to claim 3, characterized in that: micronizing the light-transmitting material The steps for ball surface treatment include:

Disperse the silica microspheres in ethanol to form a suspension;

Add sodium lauryl acid to the suspension, and stir the suspension to form negative charges on the surface of the silica microspheres.

8. The manufacturing method according to claim 7, wherein the concentration of sodium lauryl sulfate in the suspension is in the range of 0.5~10 mol/L.

9. The manufacturing method of claim 1, wherein the step of surface-treating the light-transmitting material microspheres to make the surface of the light-transmitting material microspheres carry a homogeneous charge includes: A charged surfactant is placed in the solution of the light material microspheres so that the surface of the light-transmitting material microspheres carries a homogeneous charge.

10. The manufacturing method according to claim 9, wherein the surfactant placed in the solution containing the light-transmitting material microspheres is sodium lauryl sulfate or sodium dioctyl succinate sulfonate. , sodium dodecylbenzene sulfonate or sodium glycocholate, so that the surface of the light-transmitting material microspheres carries negative charges.

11. The manufacturing method according to claim 9, wherein the surfactant placed in the solution containing the light-transmitting material microspheres is tetradecyl-dimethylpyridinium bromide, Hexalammonium chloride or dimethyldiallylammonium chloride, so that the surface of the light-transmitting material microspheres carries positive charges.

12. The manufacturing method of claim 1, wherein the step of surface-treating the light-transmitting material microspheres to make the surface of the light-transmitting material microspheres carry a homogeneous charge includes: An electrolyte is placed in the solution of the light-transmitting material microspheres so that the surface of the light-transmitting material microspheres carries a homogeneous charge.

13. The manufacturing method according to claim 12, characterized in that the electrolyte is polypropylene ammonium chloride or sodium styrene sulfonate.

14. The manufacturing method of claim 1, wherein the step of dispersing the light-transmitting material microspheres carrying homogeneous charges on the substrate to form an anti-reflective film includes:

making the light-transmitting material microspheres carrying homogeneous charges form a coating solution; The coating solution is coated on the substrate to form an anti-reflective film.

15. The manufacturing method according to claim 1, characterized in that, after forming the anti-reflective film, it further includes: heating the anti-reflective film.

16. The manufacturing method of claim 1, wherein the light-transmitting material microspheres are silica microspheres, and the step of forming an anti-reflective film includes:

Place the silica microspheres in ethanol to form a coating solution;

A thin film containing silica microspheres is coated on the substrate via a spin coating process.

17. The manufacturing method according to claim 16, characterized in that the weight percentage of silica microspheres in the coating solution is in the range of 0.1~5%.

18. The manufacturing method according to claim 16, characterized in that the rotation speed in the spin coating process is 500 to 3000 revolutions per minute.

19. The manufacturing method of claim 16, wherein the step of forming an anti-reflective film further includes: continuously heating the film at a heating temperature of 300 to 500°C for 2 to 12 hours.

20. The manufacturing method of claim 1, wherein after providing the substrate and before the step of forming an anti-reflective film, it further includes:

A preparation layer is formed on the surface of the substrate, so that the side of the preparation layer in contact with the substrate has a charge of a different electrical nature from that of the substrate surface, and the side of the preparation layer in contact with the anti-reflection film It carries charges with different electrical properties from the contact surface of the anti-reflection film.

21. The manufacturing method of claim 20, wherein the step of forming the preliminary layer includes: alternately stacking first electrical layers and second electrical layers on the substrate, the first electrical layers and the second electrical layers The electrical properties of the charges carried by the electrical layers are different.

22. The manufacturing method of claim 21, wherein the material of the first electrical layer and the second electrical layer is an electrolyte.

23. The manufacturing method according to claim 21, wherein the material of the substrate is negatively charged glass, the first electrical layer is composed of positively charged polypropylene ammonium chloride, and the second electrical layer is made of positively charged polypropylene ammonium chloride. The electrical layer is composed of negatively charged sodium polystyrene sulfonate.

24. The manufacturing method according to claim 23, characterized in that the step of forming a preliminary layer include:

Provide polypropylene ammonium chloride with a concentration of 0.05~0.15 mol/L and a pH value of 3~5; Provide polystyrene sodium sulfonate with a concentration of 0.05~0.15 mol/L and a pH value of 3~5; By dipping The film process alternately coats the polypropylene ammonium chloride and polystyrene sodium sulfonate on the substrate.

25. The manufacturing method according to claim 1, characterized in that, after forming the anti-reflective film, it further includes forming a low surface energy coating on the surface of the anti-reflective film.

26. The manufacturing method of claim 25, wherein the step of forming a low surface energy coating on the surface of the anti-reflective film includes:

Provides cetyltrimethoxysilane;

Add ethanol to cetyltrimethoxysilane to form a solution;

Acidifying the solution;

Stir the acidified solution;

The solution is formed on the surface of the anti-reflective film by wetting, spin coating or spraying.

27. The manufacturing method according to claim 26, wherein acidifying the solution includes: adding at least one of acetic acid, hydrochloric acid or nitric acid to the solution so that the pH value of the solution is between 4.5~5.5 range.

28. The manufacturing method according to claim 26, wherein the stirring time is greater than or equal to 60 minutes.

29. The manufacturing method of claim 26, wherein when the solution is formed on the surface of the substrate by infiltration, the substrate is placed in the solution for 30 minutes to 60 minutes. minute.

30. The manufacturing method of claim 26, wherein the mass percentage of cetyltrimethoxysilane in the solution is 3% - 5%.

31. The manufacturing method according to claim 25, characterized in that, after forming the low surface energy coating, further comprising: drying the low surface energy coating and performing a curing process.

32. The manufacturing method according to claim 31, characterized in that the time range of the curing treatment is 30 minutes to 60 minutes, and the temperature range is 100°C~150°C.

33. The manufacturing method of claim 25, wherein the low surface energy coating is made of methoxysilane, alkylsilane, fluorine-containing silane or grafted siloxane chain compound.

34. A method of manufacturing optical components, characterized by: including:

provide a base;

An anti-reflective film including at least one anti-reflective layer is formed on the substrate; wherein the step of forming the anti-reflective layer includes:

Forming a charged layer; ball.

35. The manufacturing method of claim 34, wherein the charged layer is formed of electrolyte or charged particles.

36. The manufacturing method of claim 34, further comprising: heating the optical component after completing the production of the anti-reflective film on the substrate.

37. The manufacturing method according to claim 36, wherein the heating temperature in the heat treatment step is in the range of 300~500°C, and the heating duration is in the range of 30~130 minutes.

38. The manufacturing method of claim 34, wherein before the step of forming the charged layer, it further includes:

providing a solution containing a charged layer material;

The pH value of the solution is adjusted to increase the charge of the charged layer.

39. The manufacturing method of claim 34, wherein the light-transmitting material microspheres are silica, titanium dioxide, alumina or zirconium oxide particles.

40. The manufacturing method according to claim 34, characterized in that, before the step of dispersing and arranging light-transmitting material microspheres with electrical properties different from those of the charged layer on the charged layer, it further includes: Provide light-transmitting material microspheres;

Adjust the pH value of the light-transmitting material microspheres to increase the charge of the light-transmitting material microspheres.

41. The manufacturing method of claim 34, wherein the light-transmitting material microspheres are negatively charged silica microspheres.

42. The manufacturing method according to claim 41, characterized in that, before the step of dispersing and arranging light-transmitting material microspheres with electrical properties different from those of the charged layer on the charged layer, it further includes: passing sodium hydroxide through the Or an ammonia solution is used to adjust the pH value of the silica microspheres so that the pH value of the silica microspheres is in the range of 8.5 to 9.5.

43. The manufacturing method of claim 41, wherein the particle size of the silica microspheres is in the range of 5 to 10 nm.

44. The manufacturing method of claim 34, wherein the charged layer is positively charged polypropylene ammonium chloride.

45. The manufacturing method according to claim 44, characterized in that, before the step of forming the charged layer, it further includes: adding hydrochloric acid or sodium hydroxide to the polyacrylic ammonium chloride to adjust the pH of the polyacrylic ammonium chloride. The value is in the range of 7~8.

46. The manufacturing method according to claim 34, characterized in that,

The step of forming the charged layer includes: immersing the substrate into a positively charged polypropylene ammonium chloride solution for 10 to 20 minutes;

After that, the substrate coated with polypropylene ammonium chloride is immersed in deionized water for 1 to 5 minutes; the steps of optical material microspheres include: immersing the substrate coated with polypropylene ammonium chloride into negatively charged The silica particles remain in the solution for 10 to 20 minutes.

47. The manufacturing method of claim 34, wherein the charged layer is formed of positively charged titanium dioxide particles.

48. The manufacturing method of claim 34, wherein after providing the substrate and before the step of forming an anti-reflective film, the method further includes: A preparation layer is formed on the surface of the substrate, so that the side of the preparation layer in contact with the substrate has a charge of a different electrical nature from that of the substrate surface, and the side of the preparation layer in contact with the anti-reflection film has a charge The contact surface with the anti-reflective film has different electrical charges.

49. The manufacturing method of claim 48, wherein the step of forming the preliminary layer includes: alternately stacking first electrical layers and second electrical layers on the substrate, the first electrical layers and the second electrical layers The electrical properties of the charges carried by the electrical layers are different.

50. The manufacturing method of claim 49, wherein the material of the first electrical layer and the second electrical layer is an electrolyte.

51. The manufacturing method according to claim 49, wherein the material of the substrate is negatively charged glass, the first electrical layer is composed of positively charged polypropylene ammonium chloride, and the second electrical layer is made of positively charged polypropylene ammonium chloride. The electrical layer is composed of negatively charged sodium polystyrene sulfonate.

52. The manufacturing method of claim 51, wherein the step of forming the preliminary layer includes:

53. The manufacturing method of claim 34, wherein after forming the anti-reflective film, it further includes forming a low surface energy coating on the surface of the anti-reflective film.

54. The manufacturing method of claim 53, wherein the step of forming a low surface energy coating on the surface of the anti-reflective film includes:

Provides cetyltrimethoxysilane;

Add ethanol to cetyltrimethoxysilane to form a solution;

Acidifying the solution;

Stir the acidified solution;

55. The manufacturing method according to claim 54, wherein the solution is subjected to acid treatment. The chemical treatment includes: adding at least one of acetic acid, hydrochloric acid or nitric acid to the solution so that the pH value of the solution is in the range of 4.5 to 5.5.

56. The manufacturing method according to claim 54, characterized in that the stirring time is greater than or equal to 60 minutes.

57. The manufacturing method of claim 54, wherein when the solution is formed on the surface of the substrate by infiltration, the substrate is placed in the solution for 30 minutes to 60 minutes. minute.

58. The manufacturing method of claim 54, wherein the mass percentage of cetyltrimethoxysilane in the solution is 3% to 5%.

59. The manufacturing method according to claim 53, characterized in that, after forming the low surface energy coating, it further includes: drying the low surface energy coating and performing a curing process.

60. The manufacturing method according to claim 59, characterized in that the time range of the curing treatment is 30 minutes to 60 minutes, and the temperature range is 100°C~150°C.

61. The manufacturing method of claim 54, wherein the low surface energy coating is made of methoxysilane, alkylsilane, fluorine-containing silane or grafted siloxane chain compound.

62. An optical component formed by the manufacturing method according to any one of claims 1 to 19.

63. The optical component according to claim 62, wherein the light-transmitting material microspheres are located on the same layer on the substrate.

64. The optical component according to claim 62, characterized in that there are gaps between the light-transmitting material microspheres.

65. The optical component of claim 62, wherein the material of the substrate is glass, metal or plastic.

66. The optical component of claim 62, further comprising a preparation layer located between the substrate and the anti-reflective film and in contact with the substrate and the anti-reflective film, wherein, The contact surface between the preliminary layer and the substrate carries charges of different electrical properties respectively; and the contact surface of the preliminary layer and the anti-reflective film carries charges of different electrical properties respectively.

67. The optical component according to claim 66, wherein the preliminary layer is a single electrical layer.

68. The optical component according to claim 66, wherein the material of the preliminary layer is an electrolyte.

69. The optical component of claim 66, wherein the preparation layer includes multiple electrical layers.

70. The optical component according to claim 69, wherein the multi-layer electrical layer includes a first electrical layer and a second electrical layer with different electrical charges, and the preparation layer is composed of a first electrical layer The electrical layer and the second electrical layer are alternately stacked.

71. The optical component of claim 70, wherein the substrate is glass with a negatively charged surface, the first electrical layer is composed of positively charged polypropylene ammonium chloride, and the second The electrical layer is composed of negatively charged sodium polystyrene sulfonate, and the first electrical layer is in contact with the substrate.

72. The optical component according to claim 69, wherein the number of electrical layers in the preliminary layer is in the range of 3 to 6 layers.

73. The optical component of claim 62, further comprising a low surface energy coating located on the surface of the anti-reflective film.

74. The optical component according to claim 73, wherein the low surface energy coating is made of methoxysilane, alkylsilane, fluorine-containing silane or grafted siloxane chain compound.

75. The optical component according to claim 73, wherein the low surface energy coating is made of cetyltrimethoxysilane.

76. The optical component according to claim 73, wherein the thickness of the low surface energy coating ranges from 10 nm to 500 nm.

77. An optical component formed by the manufacturing method according to any one of claims 34 to 47.

78. The optical component according to claim 77, further comprising a preparation layer located between the substrate and the anti-reflective film and in contact with the substrate and the anti-reflective film, wherein,

The contact surface between the preliminary layer and the substrate carries charges of different electrical properties respectively; and the contact surface of the preliminary layer and the anti-reflective film carries charges of different electrical properties respectively.

79. The optical component according to claim 78, wherein the preliminary layer is a single electrical layer.

80. The optical component according to claim 78, wherein the material of the preliminary layer is an electrolyte.

81. The optical component of claim 78, wherein the preliminary layer includes multiple electrical layers.

82. The optical component according to claim 81, wherein the multi-layer electrical layer includes a first electrical layer and a second electrical layer with different electrical charges, and the preliminary layer is composed of a first electrical layer and a second electrical layer. The electrical layer and the second electrical layer are alternately stacked.

83. The optical component according to claim 82, wherein the substrate is glass with a negatively charged surface, the first electrical layer is composed of positively charged polypropylene ammonium chloride, and the second The electrical layer is composed of negatively charged sodium polystyrene sulfonate, and the first electrical layer is in contact with the substrate.

84. The optical component according to claim 81, wherein the number of electrical layers in the preliminary layer is in the range of 3 to 6 layers.

85. The optical component of claim 77, further comprising a low surface energy coating located on the surface of the anti-reflective film.

86. The optical component according to claim 85, wherein the low surface energy coating is made of methoxysilane, alkylsilane, fluorine-containing silane or grafted siloxane chain compound.

87. The optical component according to claim 85, wherein the low surface energy coating is made of cetyltrimethoxysilane.

88. The optical component of claim 85, wherein the low surface energy coating The thickness range is 10nm~500nm.

89. A photovoltaic device, characterized by: including:

The optical component according to any one of claims 62 to 72, wherein the substrate in the optical component is a transparent substrate;

The solar cell is located on the side of the transparent substrate that is not provided with an anti-reflective film.

90. A photovoltaic device, characterized by: including:

The optical component according to any one of claims 77 to 84, wherein the substrate in the optical component is a transparent substrate;