WO2014060468A1 - Multiple coating device for strip substrates and strip substrate vacuum coating apparatus - Google Patents
Multiple coating device for strip substrates and strip substrate vacuum coating apparatus Download PDFInfo
- Publication number
- WO2014060468A1 WO2014060468A1 PCT/EP2013/071613 EP2013071613W WO2014060468A1 WO 2014060468 A1 WO2014060468 A1 WO 2014060468A1 EP 2013071613 W EP2013071613 W EP 2013071613W WO 2014060468 A1 WO2014060468 A1 WO 2014060468A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sub
- coating device
- compartments
- assemblies
- multiple coating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Definitions
- the invention relates to a multiple coating device, in particular a multi-magnetron sputter coating device, for surface coating of a
- Known vacuum coating systems for coating strip-shaped material in process chambers comprise in a first evacuatable coiler chamber an unwinding device with an inserted unwinder of the strip material to be coated, which is arranged in a first roll mill, and in a second evacuatable
- Reel chambers a winding device with a
- At least one magnetron sputtering source is located.
- Coiler chambers are vacuum-separated from each other by band valves to deal with different gases and with
- Unwind and take-up are located in reel chambers.
- the material to be coated is unrolled in the first reel chamber from the unwind, fed to the coating process and then wound up in the second coiler chamber.
- Magnetron sputtering sources but also other coating sources, such as, for example, thermal, can be used for coating the strip-shaped material
- Evaporator can be used with steam distribution pipes or ion sources, which are arranged to be adjustable relative to the respective cooling roller, that their central longitudinal line to the central axis of their associated cooling roller is axially parallel adjustable. Depending on the used
- Coating source can be provided that one or more coating sources are arranged in each case a compartment, which for the gas separation of the respective
- Coating source is suitable with respect to the process chamber.
- the other group of process technology can be arranged in the process chamber only after or with the closure of the chamber wall by these
- Process technology can be brought into the process chamber through an opening in the chamber wall, this process technology being held on one side in the manner of a cantilever (cantilever) on the chamber wall itself.
- a vacuum coating system of the type mentioned is known in which the roller mill for the unwinding at a first attachment point in the first coiler chamber, the process roll mill on a second and a third attachment point in the
- Multiple coating devices are used with a chill roll and an array of coating sources and compartments along the periphery of the chill roll that seek to circumvent this problem.
- these arrangements are divided into several, usually three sub-assemblies of compartments, each comprising a partial circumference of the cooling roller of not more than 180 ° and each other pivotally connected.
- treatment means such as
- Compartments limiting the treatment facilities are arranged at the positions 2 o'clock, 4 o'clock, 6 o'clock, 8 o'clock and 10 o'clock, whereby the 6 o'clock position corresponds to the lowest point of the periphery of the cooling roller analogously to a dial.
- Millimeters for example 2 to 3 mm because of the necessary pressure separation.
- the multiple coating device e.g., to change the sputtering environment, the targets, etc.
- Process chamber stored treatment facilities such. Coating sources, regardless of the sub-assemblies of the compartments, are removed from the process chamber.
- An object of the invention is therefore, the Maintenance procedure of Mehrfachbe Anlagenungseinrich- ments of the type mentioned and the structural design of tape substrate vacuum coating equipment to simplify.
- Vacuum coating system with the features of claim 11.
- Advantageous embodiments and further developments are described in the dependent claims. Therefore, a multiple coating device for surface coating of a tape substrate is proposed, comprising a cooling roll with a cylindrical
- Compartments having at least one treatment device arranged therein, wherein the array of compartments is divided into two sub-arrangements of compartments separated by a dividing plane, the compartments each
- Partial arrangement are arranged stationary relative to each other and each sub-assembly encloses a partial circumference of the lateral surface of the cooling roller of not more than 180 °, wherein both sub-assemblies in a direction perpendicular to the parting plane of the cooling roller are displaced away.
- Treatment facilities as defined above Multiple coating equipment can be used both as pre-treatment equipment, such as
- Evaporator may be formed with steam distribution pipes, ion sources or others.
- Pre-treatment devices and coating devices in one and the same process chamber can here
- Compartments be distributed over the circumference of the chill roll, but the 6 o'clock position remains free. At this
- Sub-assemblies whereby it is possible to separate the arrangement of compartments at the 6 o'clock position into two sub-assemblies, which are each horizontally displaceable.
- the central axis of the cooling roller is arranged in the parting plane (center plane).
- the maintenance procedure is now possible in a few steps.
- the treatment facilities are first removed axially parallel to the central axis of the cooling roller from the process chamber and then the sub-assemblies of compartments each of the
- Cooling roller for example, on each side by 20 mm, moved away. It is expedient that the treatment facilities are arranged stationary in the radial direction of the cooling roller. In this case, to optimize the coating process, a change in the distance of the treatment facilities for Chill roll out, ie a relative displacement of the treatment facilities to their respective compartment, be possible within limits.
- the treatment facilities are independent of the sub-assemblies of the compartments movable and out of the process chamber
- Treatment devices which are cantilevered (cantilever) on a chamber wall of the process chamber.
- treatment devices to be arranged stationary relative to a section of the compartment surrounding these treatment devices, that is to say that the treatment devices are each arranged so as to be movable with the respective subassembly of compartments.
- the maintenance procedure is now possible in a few steps. After ventilation of the
- the sub-assemblies of compartments are moved together with the respective treatment facilities each of the cooling roller, for example, on each side by 20 mm away.
- Subassemblies of Kompartments in the axial direction of the cooling roller are displaceable. This makes it possible that the sub-assemblies of compartments in a cooling roller with horizontally aligned axis through an opening of the
- Process chamber which is closed by a trained as a chamber lid chamber wall, are moved out of the process chamber, so that the compartments and
- Subassemblies of compartments at a constant height i. without a lift table or the like, done horizontally outwards.
- the sub-assemblies of compartments can be removed from the process chamber individually and independently of each other for maintenance.
- This design has the advantage that the respective subassembly of compartments outside the process chamber, for example for changing targets, shields, etc., is completely accessible.
- Subassemblies of compartments are synchronously displaceable.
- the sub-assemblies may be coupled to each other, for example, by a lever mechanism or the like so that both sub-assemblies of compartments are shifted by one and the same drive means, such as an electric motor or the like by the same amount.
- Preference is given to a pneumatic
- Driving means This is gentler and stops when an obstacle is in the way.
- Chill roller is arranged. It is advantageous if the 6 o'clock position is occupied by a treatment device is, so it is provided that at least one treatment device is arranged in the region of the parting plane. The at least one treatment device is arranged in a compartment. This arranged in the parting plane treatment device is in this case either independently of the compartments from the process chamber removed or arranged on one of the sub-assemblies of compartments, so that it can be moved together with this sub-assembly of compartments and removed from the process chamber. To achieve high gas separation values, like them
- Treatment device in the region of the parting plane surrounding compartment is formed separable.
- the compartment located in the 6 o'clock position is therefore designed to be at least two parts, it being possible to provide that in each case a part of this compartment is arranged on one of the two partial arrangements of compartments.
- both parts of this compartment can also be arranged against a part of the process chamber which is stationary with respect to the process chamber
- the located in the 6 o'clock position compartment is formed as a unit and is arranged on only one of the two sub-assemblies.
- the two sub-assemblies of compartments are arranged on a common supporting and guiding device, which
- Guide means may for example be designed so that it allows a shift of both partial arrangements of compartments in a plane, similar to an x-y table.
- Chamber walls formed process chamber and in the
- At least one chamber wall in the region of the subassemblies of compartments has a vacuum-tight closable opening, through which the subassemblies can be moved out of the process chamber or into the process chamber.
- the opening may be closable by a door or a lid, the door or the lid having one or both
- Subassemblies may be connected, so that opening the door or removing the lid causes a movement of the door
- Chamber wall causes, whereby the sub-assemblies are moved out of the process chamber.
- Dividing plane are displaced. This makes it possible to keep the opening or openings in the chamber wall small.
- the sub-assemblies of compartments are arranged on one or on a common support and guide device.
- Subassemblies are moved only a few centimeters away from the chill roll and then moved out of the process chamber in the axial direction of the chill roll. Only then are the sub-assemblies of compartments again shifted perpendicular to the parting plane, so that their distance from one another increases to make them more accessible for maintenance purposes.
- the invention is based on
- Fig. 1 is a side view of a
- FIG. 2 shows the multiple coating device from FIG. 1 in the opened state
- Fig. 3 is a perspective view of the Mehrfachbe- layering device of Figs. 1 and 2 and
- Fig. 4 is a side view of a
- a plastic film comprises a cooling roller 1 with a rotation axis 11 and a cylindrical
- Mantle surface 12 for cooling the tape substrate by a more than 180 ° comprehensive part of the circumferential surface 12 around For this purpose, the tape substrate in the process chamber of a tape substrate vacuum coating system from the top left Coming introduced into the gap 13 between the cooling roll 1 and the arrangement of treatment facilities 4. The tape substrate is passed through the gap 13 and thus over the periphery of the cooling roll 1. Over a more than 180 ° comprehensive extent of the tape substrate in the process chamber of a tape substrate vacuum coating system from the top left Coming introduced into the gap 13 between the cooling roll 1 and the arrangement of treatment facilities 4. The tape substrate is passed through the gap 13 and thus over the periphery of the cooling roll 1. Over a more than 180 ° comprehensive extent of the tape substrate in the process chamber of a tape substrate vacuum coating system from the top left Coming introduced into the gap 13 between the cooling roll 1 and the arrangement of treatment facilities 4. The tape substrate is passed through the gap 13 and thus over the periphery of the cooling roll 1. Over a more than 180 ° comprehensive extent of the tape substrate in the process chamber of a tape substrate
- the lateral surface 12 of the cooling roller 1 around is an arrangement of four each designed as a sputtering magnetron treatment facilities 4, each with one on the
- Jacket surface 12 directed coating direction distributed.
- the treatment devices 4 are each in one
- Compartment 21 is arranged, wherein the
- FIG. 1 shown chamber wall of a process chamber are supported.
- the treatment devices 4 are arranged stationary relative to one another.
- the compartments 21 are movable relative to the treatment devices 4.
- the tape substrate is simultaneously cooled by the contact with the cooling roller 1. Finally, the coated tape substrate leaves the gap 13 at the top right between the chill roll 1 and the assembly of
- compartments 21 is in two separated by a dividing plane 3 sub-assemblies 2 of two
- Chill roll 1 for example, a distance of 3 mm.
- the required distance may be different, for example 2 mm to 4 mm.
- each sub-assembly 2 The compartments 21 of each sub-assembly 2 are arranged stationary relative to each other by each with a
- Stand 22 are connected, the spatial structure of stringers 23, i. rod-shaped structural elements which run parallel to the axis of rotation 11 of the cooling roll 1, and ribs 24, i. planar structural elements which extend perpendicular to the axis of rotation 11 of the cooling roller 1, and also each having two base support 25 which extend parallel to the axis of rotation 11 of the cooling roller 1 as the stringers 23, wherein the base support 25 of both sub-assemblies 2 lie in the same horizontal plane.
- stringers 23 i. rod-shaped structural elements which run parallel to the axis of rotation 11 of the cooling roll 1, and ribs 24, i. planar structural elements which extend perpendicular to the axis of rotation 11 of the cooling roller 1, and also each having two base support 25 which extend parallel to the axis of rotation 11 of the cooling roller 1 as the stringers 23, wherein the base support 25 of both sub-assemblies 2 lie in the same horizontal plane.
- Each of the two sub-assemblies 2 encloses a
- Partial circumference of the lateral surface 12 of the cooling roll 1 of not more than 180 °. This is the condition for that
- Subassemblies 2 in each case in a direction perpendicular to the parting plane 3 of the cooling roller 1 to move away to increase their distance from the cooling roller 1 and the distance that the sub-assemblies 2 have to each other.
- Guide device can be arranged in the interior of a process chamber of a tape substrate vacuum coating system, which displacements of the sub-assemblies. 2
- Multiple coating device for surface coating of a tape substrate 5, for example a plastic film comprises a cooling roller 1 having a rotation axis 11 and a cylindrical surface 12 for cooling the tape substrate 5 by more than 180 °
- the tape substrate 5 is inserted through the gap 13 between the
- Mantle surface 12 of the cooling roller 1 around is an arrangement of a total of five treatment devices 4, each with a directed onto the lateral surface 12 coating direction distributed.
- the treatment devices 4 in the 2 o'clock, 4 o'clock, 8 o'clock and the 10 o'clock position are designed as tube magnetrons.
- coating source 4 could also be designed as tube magnetron or other treatment device.
- Planar magnetrons are each in a compartment 21 arranged, wherein the treatment means 4 are held on one side to a chamber wall, not shown, of a process chamber.
- the treatment devices 4 are arranged stationary relative to one another.
- the compartments 21 are movable relative to the cooling roll 1 and to the treatment devices 4.
- the treatment devices 4 coat the belt substrate 5 passing through the gap 13 with coating material
- the belt substrate 5 is simultaneously cooled by the contact with the cooling roller 1.
- the coated tape substrate 5 leaves the gap 13 at the top right between the cooling roll 1 and the arrangement of
- compartments 21 is in two separated by a dividing plane 3 sub-assemblies 2 of one each
- Embodiment is provided for this purpose that both parts of this compartment 21 are movable against a support which is provided for holding the Planarmagnetrons. According to the invention also seals are provided which have only a sealing surface, i. that the two parts form a common sealing surface, the
- Chill roll 1 for example, a distance of 3 mm.
- the required distance may be different, for example 2 mm to 4 mm amount.
- Each of the two sub-assemblies 2 encloses a
- Partial circumference of the lateral surface 12 of the cooling roll 1 of not more than 180 °. This is the condition for that
- Subassemblies 2 in each case in a direction perpendicular to the parting plane 3 of the cooling roller 1 to move away to increase their distance from the cooling roller 1 and the distance that the sub-assemblies 2 have to each other.
- This direction perpendicular to the parting plane 3 is shown in Fig. 4 by a double arrow for each of
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014558166A JP5768194B2 (en) | 2012-10-16 | 2013-10-16 | Multiple coating apparatus for band-like base layer and band-like base layer vacuum coating apparatus |
DE112013000168.3T DE112013000168A5 (en) | 2012-10-16 | 2013-10-16 | Multi-coating device for tape substrates and tape substrate vacuum coating equipment |
KR1020147011666A KR101500926B1 (en) | 2012-10-16 | 2013-10-16 | Multiple coating device for strip substrates and strip substrate vacuum coating apparatus |
CN201380004387.1A CN103998647B (en) | 2012-10-16 | 2013-10-16 | For laminated coating device and the band-shaped substrate Vacuum coating device of band-shaped substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012109836.0 | 2012-10-16 | ||
DE102012109836 | 2012-10-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014060468A1 true WO2014060468A1 (en) | 2014-04-24 |
Family
ID=49486461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2013/071613 WO2014060468A1 (en) | 2012-10-16 | 2013-10-16 | Multiple coating device for strip substrates and strip substrate vacuum coating apparatus |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5768194B2 (en) |
KR (1) | KR101500926B1 (en) |
CN (1) | CN103998647B (en) |
DE (1) | DE112013000168A5 (en) |
WO (1) | WO2014060468A1 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014112536A1 (en) | 2014-09-01 | 2016-03-03 | Von Ardenne Gmbh | Substrate treatment plant and heating device |
GB2536572A (en) * | 2015-03-18 | 2016-09-21 | Ardenne Gmbh Von | Tape-substrate coating line having a magnetron arrangement |
DE102016107985A1 (en) * | 2016-04-29 | 2017-11-02 | Von Ardenne Gmbh | Vacuum process chamber and method of manufacturing a chamber wall of a vacuum process chamber |
DE102016114640A1 (en) * | 2016-08-08 | 2018-02-08 | Von Ardenne Gmbh | VACUUM CASE ASSEMBLY, CHAMBER BODY AND CHAMBER COVER |
DE102013209033B4 (en) | 2013-05-15 | 2021-11-11 | VON ARDENNE Asset GmbH & Co. KG | Process stabilization method and strip substrate treatment system |
DE112019001383B4 (en) | 2018-04-28 | 2024-08-22 | Northeastern University | Roll coating system for producing multilayer films on flexible substrates |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013107690B4 (en) | 2013-06-21 | 2017-12-28 | Von Ardenne Gmbh | Tape substrate treatment plant |
TWI613314B (en) * | 2015-03-31 | 2018-02-01 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Film forming device and partition wall structure of film forming device |
Citations (2)
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DE10147708C1 (en) * | 2001-09-27 | 2002-11-14 | Ardenne Anlagentech Gmbh | Vacuum deposition device used for coating strip-like material comprises magnetron chambers delimited by cooling rollers on one side and by magnetron chamber walls on the other side |
KR100855068B1 (en) * | 2008-02-28 | 2008-08-29 | 주식회사 와이투스틸 | Apparatus for forming multilayer film |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3858437B2 (en) * | 1998-04-13 | 2006-12-13 | ソニー株式会社 | Vacuum thin film forming equipment |
JPH11350136A (en) * | 1998-06-11 | 1999-12-21 | Sony Corp | Vacuum film forming device |
DE10352144B8 (en) * | 2003-11-04 | 2008-11-13 | Von Ardenne Anlagentechnik Gmbh | Vacuum coating system for coating longitudinal substrates |
WO2007059749A1 (en) * | 2005-11-21 | 2007-05-31 | Von Ardenne Anlagentechnik Gmbh | Separating device for process chambers of vacuum coating installations and vacuum coating installation |
EP2132354B1 (en) * | 2007-02-28 | 2013-04-10 | VON ARDENNE Anlagentechnik GmbH | Method and apparatus for the treatment of strip-shaped substrate in a vacuum coating system |
JP5542488B2 (en) * | 2010-03-18 | 2014-07-09 | 富士フイルム株式会社 | Deposition equipment |
JP2012136724A (en) * | 2010-12-24 | 2012-07-19 | Kobe Steel Ltd | Take-up type continuous film-forming apparatus |
-
2013
- 2013-10-16 WO PCT/EP2013/071613 patent/WO2014060468A1/en active Application Filing
- 2013-10-16 DE DE112013000168.3T patent/DE112013000168A5/en not_active Withdrawn
- 2013-10-16 JP JP2014558166A patent/JP5768194B2/en not_active Expired - Fee Related
- 2013-10-16 KR KR1020147011666A patent/KR101500926B1/en not_active IP Right Cessation
- 2013-10-16 CN CN201380004387.1A patent/CN103998647B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10147708C1 (en) * | 2001-09-27 | 2002-11-14 | Ardenne Anlagentech Gmbh | Vacuum deposition device used for coating strip-like material comprises magnetron chambers delimited by cooling rollers on one side and by magnetron chamber walls on the other side |
KR100855068B1 (en) * | 2008-02-28 | 2008-08-29 | 주식회사 와이투스틸 | Apparatus for forming multilayer film |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013209033B4 (en) | 2013-05-15 | 2021-11-11 | VON ARDENNE Asset GmbH & Co. KG | Process stabilization method and strip substrate treatment system |
DE102014112536A1 (en) | 2014-09-01 | 2016-03-03 | Von Ardenne Gmbh | Substrate treatment plant and heating device |
GB2536572A (en) * | 2015-03-18 | 2016-09-21 | Ardenne Gmbh Von | Tape-substrate coating line having a magnetron arrangement |
DE102015104039A1 (en) | 2015-03-18 | 2016-09-22 | Von Ardenne Gmbh | Tape substrate coater with a magnetron assembly |
DE102016107985A1 (en) * | 2016-04-29 | 2017-11-02 | Von Ardenne Gmbh | Vacuum process chamber and method of manufacturing a chamber wall of a vacuum process chamber |
DE102016114640A1 (en) * | 2016-08-08 | 2018-02-08 | Von Ardenne Gmbh | VACUUM CASE ASSEMBLY, CHAMBER BODY AND CHAMBER COVER |
DE102016114640B4 (en) | 2016-08-08 | 2021-09-23 | VON ARDENNE Asset GmbH & Co. KG | Vacuum housing assembly, chamber body and chamber lid |
DE112019001383B4 (en) | 2018-04-28 | 2024-08-22 | Northeastern University | Roll coating system for producing multilayer films on flexible substrates |
Also Published As
Publication number | Publication date |
---|---|
KR20140120298A (en) | 2014-10-13 |
DE112013000168A5 (en) | 2014-08-07 |
JP5768194B2 (en) | 2015-08-26 |
CN103998647A (en) | 2014-08-20 |
JP2015508127A (en) | 2015-03-16 |
KR101500926B1 (en) | 2015-03-10 |
CN103998647B (en) | 2016-01-13 |
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