WO2012133586A1 - Composition for forming low refractive index film, low refractive index film, plastic substrate, and display device - Google Patents
Composition for forming low refractive index film, low refractive index film, plastic substrate, and display device Download PDFInfo
- Publication number
- WO2012133586A1 WO2012133586A1 PCT/JP2012/058245 JP2012058245W WO2012133586A1 WO 2012133586 A1 WO2012133586 A1 WO 2012133586A1 JP 2012058245 W JP2012058245 W JP 2012058245W WO 2012133586 A1 WO2012133586 A1 WO 2012133586A1
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- WO
- WIPO (PCT)
- Prior art keywords
- refractive index
- film
- low refractive
- composition
- forming
- Prior art date
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- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
- B32B2264/102—Oxide or hydroxide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
Definitions
- the present invention relates to a composition for forming a low refractive index film, a low refractive film, a plastic substrate provided with the film, and a display device.
- a transparent screen protection plate made of thin glass or plastic is used on the front surface of display devices such as portable terminals, digital cameras, and personal computers.
- Plastic screen protection plates are one of the most frequently used materials because they are lighter and cheaper than glass screen protection plates and are easy to handle. On the other hand, plastic is more easily damaged than glass. For this reason, a screen protection plate in which a hard coat for preventing scratches is formed on a hard plastic substrate such as an acrylic sheet having a relatively high hardness is often used.
- the above-described conventional composition for forming a low refractive film has a problem that the film strength such as scratch resistance is weak although the anti-fingerprint property is obtained by the effect of the perfluoro group.
- the present invention has been made in view of the above circumstances, and forms a low refractive index film having anti-fingerprint properties, anti-reflection properties that do not cause problems in use, and excellent film strength.
- One of the objects is to provide a composition that can be used.
- the composition for forming a low refractive index film of the present invention includes a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in a monomer, a compound having a perfluoro group and not having a photoreactive functional group, and It contains low refractive index inorganic particles having a refractive index of 1.17 or more and 1.40 or less.
- the surface of the inorganic particles contained is preferably modified with an organic group containing at least one of an acryloyloxy group and a methacryloyloxy group.
- the monomer since the monomer has a crosslinkable compound having one or more methacryloyl groups or acryloyl groups, the mechanical strength of the film obtained when cured is increased, It is possible to prevent the film from being damaged.
- it since it has a compound having a perfluoro group, it can repel dirt such as fingerprints to reduce the amount of adhesion, and further improve the wipeability of dirt such as attached fingerprints.
- this compound does not have a photoreactive functional group, it does not inhibit the polymerization of the crosslinkable compound and does not reduce the film strength.
- the refractive index of a coating film can be made low. That is, a film having fingerprint resistance, a low refractive index, and excellent film strength such as scratch resistance can be formed.
- the present invention relates to a composition for forming a low refractive index film, a low refractive index film, and a plastic substrate, and in particular, a reflection having fingerprint resistance suitable for use in a portable terminal, a digital camera, a personal computer or the like.
- the present invention relates to a prevention film, a plastic substrate including the film, and a display device. Implementation of the composition for forming a low refractive index film of the present invention, a low refractive index film obtained from the composition, a plastic substrate provided with the film, and a display device having the low refractive index film or the plastic substrate The form for doing will be described below.
- composition for forming a low refractive index film is (a) a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in the monomer, (B) a compound having a perfluoro group and not having a photoreactive functional group, and (c) low refractive index inorganic particles (inorganic particles).
- Crosslinkable compounds The crosslinkable compound of this embodiment will not be specifically limited if it is a crosslinkable compound which has a 1 or more methacryloyl group or acryloyl group in a monomer. Although it may have one or two, it preferably has 3 or more and 15 or less methacryloyl groups or acryloyl groups. More preferably, it has 4 or more and 10 or less, more preferably 5 or more and 8 or less, methacryloyl group or acryloyl group. An increase in the number of these functional groups in the monomer is preferable because the reactivity is high and the crosslinking density is increased, and the film strength and weather resistance are improved.
- the amount of the crosslinkable compound can be arbitrarily selected, but it is preferably 0.1 to 55% by mass and more preferably 0.5 to 10% by mass in the composition. Preferably, it is more preferably 0.8% by mass or more and 2% by mass or less.
- the crosslinkable compound can be arbitrarily selected. Specific examples thereof include (meth) trimethylolpropane triacrylate, (meth) ditrimethylolpropane tetraacrylate, (meth) pentaerythritol triacrylate, (meth) pentaerythritol tetraacrylate, Examples include polyol polyacrylates such as (meth) dipentaerythritol hexaacrylate, epoxy (meth) acrylates, polyester (meth) acrylates, urethane acrylates, and polysiloxane acrylates. These may be used alone or in combination of two or more.
- the crosslinkable compound of the present invention is a monomer having one or more methacryloyl groups or acryloyl groups, and an oligomer or polymer having one or more methacryloyl groups or acryloyl groups obtained from these monomers.
- a photopolymerization initiator may be used.
- the kind and amount may be appropriately selected according to the crosslinkable compound used.
- a known photopolymerization initiator such as benzophenone, diketone, acetophenone, benzoin, thioxanthone, quinone, benzyldimethyl ketal, alkylphenone, acylphosphine oxide, phenylphosphine oxide, etc. is used. be able to.
- Compounds with perfluoro groups and no photoreactive functional groups The compound having a perfluoro group and not having a photoreactive functional group is not particularly limited as long as the compound has one or more perfluoro groups and no photoreactive functional group.
- Examples thereof include fluorinated alkyl esters having a perfluoro group and a hydrophilic group in the side chain, and fluorinated aliphatic polymer esters having a perfluoro group and a lipophilic group in the side chain.
- the compound having a perfluoro group and not having a photoreactive functional group is preferably contained in the composition in an amount of 0.1% by mass to 5.0% by mass. More preferably, the content is 0.1% by mass or more and 2% by mass or less, and more preferably 0.1% by mass or more and 1% by mass or less. When the amount is less than 0.1% by mass, sufficient anti-fingerprint characteristics may not be obtained. When the amount exceeds 5.0% by mass, sufficient film strength cannot be obtained, which is not preferable.
- Perfluoro groups generally known as perfluoro groups can be used in the present application. Examples thereof include a perfluoroalkyl group, a perfluoroalkylene group, and a perfluoroalkylidene group.
- the number of carbon atoms contained in the perfluoroalkyl group and the like can be arbitrarily selected, and examples thereof include 1 to 20 carbon atoms.
- Examples of the photoreactive functional group include a functional group whose reaction proceeds by irradiation with light energy such as ultraviolet rays. Examples of such a reaction include a photo radical polymerization reaction by a functional group having an ethylenically unsaturated bond. Specific examples of the photoreactive functional group include methacryloyl group, acryloyl group, vinyl group, allyl group, and styryl group.
- the contact angle with respect to hexadecane when the film of the present invention is formed is
- the amount of the compound having a perfluoro group and not having a photoreactive functional group may be appropriately adjusted so that the lipophilicity is 40 ° or less, preferably 35 ° or less.
- the inorganic particles used in the present embodiment are not particularly limited as long as the refractive index is 1.17 or more and 1.40 or less.
- examples of such inorganic particles include silica, and mesoporous silica having many voids is preferable in that a lower refractive index can be obtained.
- the type of mesoporous silica can be arbitrarily selected, and examples thereof include silica having uniform and regular pores having a diameter of about 2 to 10 nm.
- a method for producing mesoporous silica is described in, for example, Japanese Patent Application Laid-Open Nos. 2001-233611 and 2002-79616.
- the refractive index of the low refractive index inorganic particles is 1.17 or more and 1.40 or less, preferably 1.17 or more and 1.35 or less, more preferably 1.17 or more and 1.30 or less.
- Inorganic particles having a refractive index of less than 1.17 are difficult to produce. For example, even if they can be produced by greatly increasing the porosity, the strength of the particles themselves is weakened, and the scratch resistance of the formed low refractive index film, etc. Is not preferable because it may become weak. On the other hand, if the refractive index exceeds 1.40, the refractive index of the film may be too high when the film is formed, which is not preferable because the antireflection performance deteriorates.
- the refractive index of the inorganic particle in this specification means the refractive index as the whole particle.
- the refractive index of the inorganic particle in this specification means the refractive index as the whole particle.
- it means not only the refractive index of silica in the portion where mesoporous silica is formed but also the refractive index in which the void portion of mesoporous silica is also integrated.
- the porosity represented by the volume occupied by the voids of the particles relative to the total volume of the particles is preferably 10% or more and 60% or less, and 20% or more and 60% or less. Is more preferable, and 30% or more and 60% or less are more preferable.
- the refractive index can be lowered while ensuring the strength of the particles.
- the porosity is less than 1.17. It is not preferable to use particles.
- the average primary particle diameter of the inorganic particles having a low refractive index used in the present embodiment is preferably 3 nm or more and 100 nm or less. That is, it is preferable to use inorganic fine particles having an average primary particle diameter of 3 nm or more and 100 nm or less. Particles of less than 3 nm are not preferred because they may be difficult to produce and may not be easy to handle. On the other hand, particles larger than 100 nm are not preferable because, when formed into a film, loss of transmitted light due to Rayleigh scattering increases, which may reduce the transparency of the film.
- the inorganic particles having a low refractive index are contained in the composition in an amount of 10% by mass to 90% by mass, preferably 20% by mass to 80% by mass, more preferably 40% by mass to 60% by mass. Is preferred. If it is less than 10% by mass, the refractive index may not be sufficiently low, such being undesirable. On the other hand, if it exceeds 90% by mass, the ratio of the crosslinkable compound in the whole composition is decreased, so that it may be difficult to obtain sufficient film strength.
- the inorganic particles having low refraction may be modified with a surface treatment agent having an organic group on the surface of the particles in order to improve the affinity with the crosslinkable compound.
- a surface treatment agent an organosilicon compound can be used, and examples thereof include a silicon-based coupling agent and silicone oil.
- silicon coupling agent examples include methyltrimethoxysilane, methyltriethoxysilane, phenyltriethoxysilane, methylmethoxysilane, n-propyltrimethoxysilane, n-butyltriethoxysilane, n-hexyltrimethoxysilane, Silane coupling agents such as n-hexyltriethoxysilane, n-octyltriethoxysilane, n-decyltrimethoxysilane, phenyltrimethoxysilane and diphenyldimethoxysilane, vinylsilane couplings such as vinyltrimethoxysilane and vinyltriethoxysilane Agents, aminosilane coupling agents such as 3-aminopropyltrimethoxysilane, N-2 (aminoethyl) 3-aminopropylmethyldimethoxysilane, 3-acryloxypropyl
- silicone oil examples include dimethyl silicone oil, methyl hydrogen silicone oil, epoxy-modified silicone oil, carboxyl-modified silicone oil, polyether-modified silicone oil, and amino-modified silicone oil. These silicone coupling agents and silicone oils may be used alone or in combination of two or more.
- acryloyloxysilane coupling agents such as 3-acryloxypropyltrimethoxysilane, methacryloyloxysilane coupling agents such as 3-methacryloxypropyltrimethoxysilane, and mercaptosilane cups such as 3-mercaptopropyltrimethoxysilane
- the affinity with the resin is significantly improved, and the adhesion between the particles and the resin is improved.
- a high film strength can be obtained.
- at least one of an acryloyloxysilane coupling agent and a methacryloyloxysilane coupling agent is used.
- the viscosity of the composition is preferably 0.2 mPa ⁇ s or more and 500 mPa ⁇ s or less, and more preferably 0.5 mPa ⁇ s or more and 200 mPa ⁇ s or less.
- the viscosity of the composition is less than 0.2 mPa ⁇ s, it is not preferable because the film thickness when formed into a film becomes too thin and it is difficult to control the film thickness.
- the viscosity exceeds 500 mPa ⁇ s, the viscosity is too high and it becomes difficult to handle the composition at the time of coating.
- an organic solvent may be used as a diluent.
- the solvent is not particularly limited as long as it has good compatibility with the components of the composition.
- aromatic solvents such as toluene and xylene, aliphatic solvents such as hexane and heptane, ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone, ether solvents, ester solvents, amide solvents, cellosolve solvents, ethers
- ester solvents and alcohol solvents examples include ester solvents and alcohol solvents. These solvents may be used alone or in combination of two or more.
- alcohols are preferred because they do not dissolve the surface of the plastic substrate and do not erode the surface, and therefore do not reduce the transparency of the plastic substrate.
- the amount of the organic solvent is arbitrarily selected, for example, it is preferably 10% by mass or more and 99% by mass or less, and more preferably 50% by mass or more and 99% by mass or less in the composition.
- an antifoaming agent a leveling agent, a water repellent, an oil repellent, a lipophilic agent, a lubricant, an antioxidant, an ultraviolet absorber, a light stabilizer, a polymerization inhibitor and the like are generally used.
- Additives may be added as appropriate.
- Method for producing composition for forming low refractive index film is to uniformly distribute the crosslinkable compound, the compound having a perfluoro group and not having a photoreactive functional group, low refractive index inorganic particles, and the like. If it can be made to mix, it will not specifically limit, A well-known stirring method can be used.
- the surface modifier is modified on the surface of the low refractive index inorganic particles, the surface-modified inorganic particles may be mixed with the composition after surface modification in advance.
- the low refractive index film of the present embodiment is formed by the low refractive index film forming composition of the present embodiment.
- the low refractive index of the film means that the refractive index is 1.49 or less.
- the refractive index of the low refractive index film is preferably from 1.26 to 1.49, more preferably from 1.28 to 1.47.
- the visible light reflectance (the value obtained by multiplying the 10 ° specular reflectance of the film with a spectrophotometer multiplied by the relative visibility value) is 3.0 or less. It means that there is.
- the visible light reflectance is preferably 2.2 or less, and more preferably 1.5 or less.
- the lower limit of the visible light reflectance is 0, but is preferably 0.05 or more.
- the low refractive index film of this embodiment is a water repellent film having a contact angle with water of 85 ° to 100 °. Since it is water repellent, it is possible to prevent adhesion of dirt such as fingerprints. Further, when another layer or film is laminated on the low refractive index film of this embodiment, it is preferably a water-repellent and lipophilic film having a contact angle with respect to hexadecane of less than 40 °. Since it is lipophilic, another layer or film can be laminated on the low refractive index film of this embodiment by screen printing or the like.
- the film thickness of the low refractive index film of the present embodiment can be arbitrarily selected, it is generally 10 nm or more and 1 mm or less, and preferably 50 nm or more and 200 nm or less. By setting the film thickness within the above range, reflected light in the visible light wavelength region can be reduced. For example, when used in a display device, the visibility of the display screen can be improved, which is preferable.
- the surface resistance of the low refractive index film can be arbitrarily selected, but 1 ⁇ 10 8 ⁇ / ⁇ or more and 1 ⁇ 10 13 ⁇ / ⁇ or less can be given as an example, and 1 ⁇ 10 9 ⁇ / ⁇ or more.
- One preferred example is 1 ⁇ 10 12 ⁇ / ⁇ or less.
- the method for producing a low refractive index film of the present embodiment includes a step of forming a coating film by coating the low refractive index film forming composition on a substrate that is arbitrarily selected, and curing the coating film. And a step of causing.
- the coating method in the step of forming a coating film include a spin coating method, a dip coating method, a gravure coating method, a spray method, a roller method, and a brush coating method.
- the curing method in the step of curing the coating film can be arbitrarily selected, a method of photocuring by irradiating the coating film with energy rays is preferable.
- the energy rays used for photocuring are not particularly limited as long as the coating is cured, and for example, energy rays such as ultraviolet rays, far infrared rays, near ultraviolet rays, infrared rays, X rays, ⁇ rays, electron beams, proton rays, neutron rays are used. be able to.
- energy rays such as ultraviolet rays, far infrared rays, near ultraviolet rays, infrared rays, X rays, ⁇ rays, electron beams, proton rays, neutron rays are used. be able to.
- curing by ultraviolet irradiation which has a high curing rate and is easily available, is preferable.
- the crosslinkable compound is polymerized and
- UV curing a method of irradiating at an energy of 100 to 3,000 mJ / cm 2 using a high pressure mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp or the like that emits light in a wavelength band of 200 nm to 500 nm Etc.
- a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in the monomer is different from the crosslinkable compound.
- a compound having a perfluoro group as a component and not having a photoreactive functional group the polymerization reaction of the crosslinkable compound is inhibited by the perfluoro group in the process of forming a film. Can be suppressed. Accordingly, the degree of polymerization of the crosslinkable compound can be increased, the mechanical strength of the film formed using the composition can be increased, and a film that is hardly damaged can be formed.
- a film having a low refractive index can be formed by including inorganic particles having a refractive index of 1.17 or more and 1.40 or less.
- the composition of the present embodiment it is possible to form a film having anti-fingerprint properties, excellent antireflection properties due to low refractive index, and excellent film strength such as scratch resistance.
- whether or not it has fingerprint resistance may be determined in a general sense, but can be evaluated by the following method, for example. That is, one drop of trioleic acid is dropped on the film, and the haze of the film is measured before dropping trioleic acid and after wiping 10 times with a clean wiper, and the difference in haze values is less than 1.0 Can be determined to have fingerprint resistance.
- the low refractive inorganic particles are surface-modified with at least one selected from an acryloyloxysilane coupling agent, a methacryloyloxysilane coupling agent, and a mercaptosilane coupling agent.
- the low refractive index film of the present embodiment since it is a film formed by the composition for forming a low refractive index film of the present embodiment, it has anti-fingerprint properties and excellent antireflection performance due to its low refractive index, A film excellent in film strength can be obtained.
- the plastic substrate provided with the low refractive index film of the present embodiment is characterized by having the low refractive index film of the present embodiment on at least one surface of the plastic substrate.
- FIG. 1 is a cross-sectional view showing an example of a plastic substrate provided with the low refractive index film of the present embodiment.
- the plastic substrate 10 provided with this low refractive index film has a low refractive index film 12 on at least one surface of the plastic substrate 11.
- FIG. 2 is a cross-sectional view showing another example of the plastic substrate provided with the low refractive index film of the present embodiment.
- the plastic substrate 20 provided with the low refractive index film is one of the plastic substrates 11.
- a hard coat film 13 is provided on the surface, and a low refractive index film 12 is provided on the surface of the hard coat film 13.
- FIG. 3 is a cross-sectional view showing still another example of the plastic base material provided with the low refractive index film of the present embodiment.
- the plastic base material 30 provided with the low refractive index film is one of the plastic base materials 11.
- the plastic substrate 11 used in the present embodiment is not particularly limited as long as it is a plastic substrate.
- protective plates used for display screen protection include acrylic sheets, acrylic sheets containing highly elastic acrylic rubber, acrylic-styrene copolymer sheets, polystyrene sheets, polyethylene, polypropylene, polycarbonate, PET films, and A TAC film etc. can be mentioned.
- a plastic base material you may use what laminated
- Low refractive index film Since the low refractive index film 12 may be the same as that described in the item “Low refractive index film”, the description thereof is omitted.
- Hard coat film The configuration of the hard coat film 13 is not particularly limited as long as it has a hard coat property that can protect the plastic substrate from scratches and the like. That is, when steel wool (# 0000) is reciprocated 10 times (1 reciprocation: 200 mm) under a load of 250 g / cm 2 on the hard coat film, there are 0 to 10 scratches visually. Any coating film may be used. From the viewpoints of reactivity, transparency, weather resistance, and hardness, those formed using a crosslinkable compound having at least one methacryloyl group or acryloyl group in the monomer are preferred. Further, the crosslinkable compound preferably has three or more methacryloyl groups or acryloyl groups.
- the crosslinkable compound include (meth) trimethylolpropane triacrylate, (meth) ditrimethylolpropane tetraacrylate, (meth) pentaerythritol triacrylate, (meth) pentaerythritol tetraacrylate, (meth) dipentaerythritol hexa
- polyol polyacrylates such as acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, urethane acrylate, polysiloxane acrylate and the like can be used. Moreover, you may use these oligomers and polymers suitably.
- the hard coat film 13 may have conductive fine particles in order to impart antistatic performance.
- the conductive fine particle is not particularly limited as long as it is a fine particle that can impart conductivity to the film.
- metal fine particles such as gold, platinum, ruthenium, and iron, tin, antimony, indium, zinc, gallium, and aluminum
- metal oxide fine particles containing one or more elements selected from the group metal oxide fine particles, metal oxide fine particles having a semiconductor property with a band gap of 3.0 eV or more are preferable because they have both the property of transmitting visible light and electrical conductivity.
- the metal oxide fine particles having such semiconductor properties include metal oxide fine particles containing one or more elements selected from the group consisting of tin, antimony, indium, and zinc.
- the metal oxide fine particles for example, antimony-containing tin oxide (ATO) fine particles, tin oxide (SnO 2 ) fine particles, tin-containing indium oxide (ITO) fine particles, or the like can be used.
- the hard coat film 13 containing these metal oxide fine particles has a high refractive index of these metal oxide particles, so that the refractive index of the hard coat film 13 is increased. Therefore, the antireflective performance can be further improved by forming the low refractive index film 12 on the surface of the hard coat film 13.
- the average primary particle diameter of the conductive fine particles is preferably 3 nm or more and 50 nm or less, more preferably 3 nm or more and 20 nm or less.
- the film thickness of the hard coat film 13 is preferably 0.1 ⁇ m or more and 20 ⁇ m or less, and more preferably 0.5 ⁇ m or more and 10 ⁇ m or less. By setting the film thickness of the hard coat film 13 in the above range, a film having high film strength and good transparency can be obtained.
- the hard coat film 13 is a composition obtained by appropriately mixing the crosslinkable compound, the photopolymerization initiator, the conductive fine particles, and a solvent by a known method such as a dip coating method, like the low refractive index film 12. It is obtained by coating and then photocuring.
- the high refractive index film 14 is a film having a higher refractive index than that of the low refractive index film 12, and the antireflection function can be further improved by providing it between the hard coat film 13 and the low refractive index film 12.
- a high refractive index film 14 is obtained by a film containing titanium oxide, zirconium oxide or the like having an average primary particle diameter of 3 nm or more and 50 nm or less.
- the film having a high refractive index means a film having a refractive index of 1.5 or more, for example.
- the refractive index of the high refractive index film 14 is preferably 1.55 or more, more preferably 1.65 or more.
- the upper limit of the refractive index is 2.2 or less, preferably 1.7 or less.
- an intermediate refractive index film having a refractive index lower than that of the high refractive index film 14 and higher than that of the low refractive index film 12 may be provided between the high refractive index film 14 and the low refractive index film 12.
- a conductive film may be provided between the hard coat film 13 and the low refractive index film 12.
- the high refractive index film 14 are prepared by mixing an inorganic fine particle having these properties with the above-mentioned crosslinkable compound, photopolymerization initiator, solvent, etc., as in the case of the low refractive index film 12. It can be obtained by coating by a known method such as photo-curing.
- the plastic substrate provided with the low refractive index film of the present embodiment since the low refractive index film of the present embodiment is provided, the anti-fingerprint property, the antireflection property and the film strength are excellent. Furthermore, when it has a hard coat film
- the display device is a display device including a plastic substrate including the low refractive index film according to the present embodiment or the low refractive index film according to the present embodiment.
- the display device is not particularly limited, and examples thereof include a display device on which a touch panel display, a liquid crystal display, a light emitting diode display, an electroluminescence display, a fluorescent display, a plasma display panel, and the like are mounted. Examples of such display devices include ATMs such as mobile terminals, smartphones, digital cameras, personal computers, and financial institutions, automatic ticket vending machines, vending machines, car navigation devices, portable game machines, and copy machines.
- FIG. 4 is a perspective view illustrating an example of a kind of smartphone of the display device according to the present embodiment.
- a display unit 102 including a touch panel display provided with a low refractive index film according to the present embodiment as a display surface is disposed on the front surface of a housing 101.
- the method for forming the low refractive film of the present embodiment on the display surface of the display device is the same as the method for forming the low refractive index film described above, and it may be appropriately applied to each display (display surface). . Moreover, you may apply
- the plastic substrate provided with at least one of the low refractive index film and the antireflection film of this embodiment since the plastic substrate provided with at least one of the low refractive index film and the antireflection film of this embodiment is provided, it has fingerprint resistance and visibility (antireflection property). ), A display device having excellent film strength can be obtained.
- the refractive index of the obtained composition was measured using a prism coupler (manufactured by Metricon) with the composition as a cured product.
- the obtained composition was applied to a PET film with a wire bar so that the dry film thickness was 1 ⁇ m. Subsequently, it dried at 60 degreeC for 5 minute (s), and it exposed so that it might become 300 mJ / cm ⁇ 2 > of ultraviolet rays with a high pressure mercury lamp (120 W / cm), and hardened
- solvent [Production Example 2] A solvent in which methanol, 1-butanol and butyl cellosolve were mixed at a mass ratio of 1: 1: 1 was obtained.
- composition for forming hard coat film [Production Example 4] In addition to the solvent of Production Example 2 so that the DPHA was 30% by mass, 3% by mass of Irgacure 184 was added to and mixed with the mass of DPHA to obtain a composition for forming a hard coat film. When the refractive index of the hardened
- composition for forming conductive hard coat film [Production Example 5] DPHA is added to the solvent of Production Example 2 so that 28.5% by mass and ATO dispersion is 1.5% by mass in terms of ATO (refractive index 2.0), and Irgacure 184 is added to the total mass of DPHA and ATO. 3% by mass was added and mixed to obtain a composition for forming a hard coat film.
- cured material of this composition for hard-coat film formation was measured with the prism coupler (made by Metricon), it was 1.53.
- composition for forming high refractive index film [Production Example 6] Add DPHA to 1.5% by mass and the zirconia dispersion (Sumitomo Osaka Cement Co., Ltd. MZ-230X, zirconia refractive index: 2.2) to 3.5% by mass in terms of zirconia to the solvent of Production Example 2. Irgacure 127 was added in an amount of 3% by mass with respect to the total mass of DPHA and zirconia and mixed to obtain a composition for forming a high refractive index film. The refractive index of the cured product of this high refractive index film-forming composition was 1.65 as measured by a prism coupler (manufactured by Metricon).
- Example 1 "Surface modification of low refractive index inorganic fine particles" 100 g of the mesoporous silica dispersion of Production Example 1, 3 g of KBM-5103 having an acryloyloxy group as a surface treating agent, 2 g of pure water for a hydrolysis reaction, and 0.1 g of 1N nitric acid as a reaction catalyst were mixed, and then 60 ° C. And stirred for 3 hours to obtain a surface-modified mesoporous silica dispersion.
- composition for forming low refractive index film The obtained surface-modified mesoporous silica dispersion was added to the solvent of Production Example 3 so that the amount of SiO 2 was 0.8% by mass and EXP-07 was 1.2% by mass, and Irgacure 127 was further added to SiO 2. 3% by mass with respect to the total mass of EXP-07 and mixed, to obtain a composition for forming a low refractive index film.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
- EXP-07 includes a crosslinkable compound having one or more methacryloyl groups or acryloyl groups.
- Example 2 An acrylic sheet provided with a low refractive index film having fingerprint resistance was prepared in the same manner as in Example 1 except that one side of Delaglass A in Example 1 was masked with a masking film. Next, the masked film was removed, and the film was left only on the acrylic sheet surface on one side, whereby an acrylic sheet provided with a low refractive index film having anti-fingerprint properties on only one side was obtained.
- Example 3 The composition for forming a hard coat film of Production Example 4 was coated on both sides of Delaglass A by dip coating so that the dry film thickness was 3 ⁇ m, and dried by heating at 60 ° C. for 5 minutes. Next, ultraviolet rays were exposed from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm) to cure the coating film, thereby obtaining an acrylic sheet with a hard coat film.
- a high-pressure mercury lamp 120 W / cm
- Example 2 the composition for forming a low refractive index film prepared in Example 1 is applied to the obtained acrylic sheet with a hard coat film by the same method as in Example 1 and cured, thereby improving fingerprint resistance.
- An acrylic sheet with a hard coat film provided with a low refractive index film was obtained.
- composition for forming low refractive index film A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that 1.2% by mass of FH-700 was added instead of EXP-07.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
- FH-700 includes a crosslinkable compound having one or more methacryloyl or acryloyl groups.
- Example 3 In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the composition for forming a low refractive index film obtained in Example 4 was used in the same manner. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
- Example 5 "Preparation of a composition for forming a low refractive index film"
- a composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that DPHA was used at 1.1 mass% and F-444 was used at 0.1 mass% instead of EXP-07. It was.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
- DPHA includes a crosslinkable compound having one or more methacryloyl or acryloyl groups.
- Example 3 In the formation procedure of Example 3, instead of the composition for forming a low refractive index film prepared in Example 1, the same procedure was used except that the composition for forming a low refractive index film obtained in Example 5 was used. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
- Example 6 "Surface modification of low refractive index inorganic fine particles" A surface-modified mesoporous silica dispersion was obtained in the same manner as in the production procedure of Example 1, except that KBM-503 having a methacryloyloxy group was used as a surface treatment agent instead of KBM-5103.
- Example 3 In the formation procedure of Example 3, in place of the composition for forming a low refractive index film prepared in Example 1, except that the composition for forming a low refractive index film obtained in Example 6 was used, An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
- Example 7 In the production procedure of Example 3, in the same manner as in Example 4 except that the composition for forming a conductive hard coat film obtained in Production Example 5 was used instead of the composition for forming a hard coat film of Production Example 4, anti-fingerprinting An acrylic sheet with a conductive hard coat film provided with a low refractive index film having the property was obtained. That is, a low refractive index film having fingerprint resistance is provided in the same manner as in Example 1 except that an acrylic sheet with a conductive hard coat film using the conductive hard coat film forming composition of Production Example 5 is used. An acrylic sheet with a conductive hard coat film was obtained.
- Example 8 The composition for forming a hard coat film of Production Example 4 was coated on both sides of Delaglass A by dip coating so that the dry film thickness was 3 ⁇ m, and dried by heating at 60 ° C. for 5 minutes. Next, ultraviolet rays were exposed from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm) to cure the coating film, thereby obtaining an acrylic sheet with a hard coat film. Next, on the obtained acrylic sheet with a hard coat film, the high refractive index paint obtained in Production Example 6 was coated on both sides by dip coating so that the dry film thickness was 100 nm, and heated at 60 ° C. for 5 minutes. Dried.
- Example 1 the low refractive index film-forming composition of Example 1 was applied and cured in the same manner as in Example 1 to provide a low refractive index film and a high refractive index film having anti-fingerprint properties.
- An acrylic sheet with a hard coat film was obtained.
- Example 9 Composition for forming low refractive index film
- the low refractive index film formation was performed in the same manner as in the production procedure of Example 1, except that the mesoporous silica dispersion obtained in Production Example 1 was used instead of the surface-modified mesoporous silica dispersion obtained in Example 1.
- a composition was obtained.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
- Example 3 In the formation procedure of Example 3, instead of the composition for forming a low refractive index film prepared in Example 1, except that the composition for forming a low refractive index film obtained in Example 9 was used, An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
- Example 10 Composition for forming low refractive index film
- a low refractive index was similarly obtained except that colloidal silica (IPA-st manufactured by Nissan Chemical Industries, Ltd.) was used in place of the surface-modified mesoporous silica dispersion obtained in Example 1 in the production procedure of Example 1.
- a film forming composition was obtained.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.46.
- Example 3 In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the same procedure was used except that the composition for forming a low refractive index film obtained in Example 10 was used. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
- composition for forming low refractive index film A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that DPHA was used instead of EXP-07.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
- This composition does not contain a compound having a perfluoro group and having no photoreactive functional group.
- Example 3 In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the composition for forming a low refractive index film obtained in Comparative Example 1 was used in the same manner. An acrylic sheet with a hard coat film provided with a low refractive index film was obtained.
- composition for forming low refractive index film instead of using 0.8% by mass of the surface-modified mesoporous silica dispersion in terms of SiO 2 and 1.2% by mass of EXP-07 in the production procedure of Example 1, 2.
- a composition for forming a low refractive index film containing no inorganic fine particles was obtained in the same manner except that 0% by mass was used.
- the refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon), and was 1.50.
- Example 3 In the formation procedure of Example 3, a film having fingerprint resistance was similarly obtained except that the composition obtained in Comparative Example 2 was used instead of the composition for forming a low refractive index film prepared in Example 1. An acrylic sheet provided with a hard coat film was obtained.
- the haze (%) is a value measured through Delaglass A, which is an acrylic sheet having a thickness of 1 mm used as a base material for film formation. The smaller the ⁇ haze value, the better.
- ⁇ haze value is 5.0 or more
- the total light transmittance (T (%)) of the film was measured using a haze meter TC-1800MK / II (manufactured by Nippon Denshoku). At that time, the difference ⁇ T value of the total light transmittance measured by interposing the untreated Delaglass A without the film and Delaglass A used as the base material in each film (total light transmittance of the film + the base material ⁇ The total light transmittance of the substrate was calculated. According to the obtained ⁇ T value, transparency was evaluated according to the following criteria. A larger ⁇ T value is preferable. A: ⁇ T value is +3.0 or more B: ⁇ T value is 0.0 or more and less than +3.0 C: ⁇ T value is ⁇ 0.6 or more and less than 0.0 D: ⁇ T value is less than ⁇ 0.6
- the surface resistance of the film was measured using a resistivity meter Loresta AP (manufactured by Mitsubishi Chemical Corporation). According to the obtained surface resistance value, the conductivity was evaluated according to the following criteria. A: Less than 1 ⁇ 10 9 ⁇ / ⁇ B: 1 ⁇ 10 9 ⁇ / ⁇ or more and less than 1 ⁇ 10 11 ⁇ / ⁇ C: 1 ⁇ 10 11 ⁇ / ⁇ or more and less than 1 ⁇ 10 13 ⁇ / ⁇ D: 1 ⁇ 10 13 ⁇ / ⁇ or more
- the contact angle of hexadecane was measured using a contact angle meter CA-X (manufactured by Kyowa Interface Chemical Co., Ltd.) and evaluated according to the following criteria. When it is less than 40 °, it can be preferably used as a water-repellent and lipophilic film. ⁇ : Less than 30 degrees ⁇ : 30 degrees or more and less than 40 degrees ⁇ : 40 degrees or more
- composition for forming a low refractive index film having fingerprint resistance, excellent antireflection properties, and excellent film strength such as scratch resistance.
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Abstract
A composition for forming a low refractive index film, the composition being characterized in containing a cross-linking compound having at least one methacryloyl group or acryloyl group in a monomer, a compound having a perfluro group and having no photoreactive functional group, and inorganic particles having a refractive index of 1.17-1.40.
Description
本発明は、低屈折率膜形成用組成物、低屈折膜及びその膜を備えたプラスチック基材並びに表示装置に関する。
本願は、2011年3月30日に、日本に出願された特願2011-076067号に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to a composition for forming a low refractive index film, a low refractive film, a plastic substrate provided with the film, and a display device.
This application claims priority on March 30, 2011 based on Japanese Patent Application No. 2011-076067 filed in Japan, the contents of which are incorporated herein by reference.
本願は、2011年3月30日に、日本に出願された特願2011-076067号に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to a composition for forming a low refractive index film, a low refractive film, a plastic substrate provided with the film, and a display device.
This application claims priority on March 30, 2011 based on Japanese Patent Application No. 2011-076067 filed in Japan, the contents of which are incorporated herein by reference.
携帯端末、デジタルカメラ、及びパーソナルコンピュータ等の表示装置の前面に、薄いガラス製やプラスチック製の透明な画面保護板が使用されることは一般的である。プラスチック製の画面保護板はガラス製の画面保護板と比較して軽量で安価な上、取扱も容易な為、最も使用頻度の高い材質の一つである。一方でプラスチックはガラスに比べて傷つき易い。この為、比較的硬度の高いアクリルシート等の硬いプラスチック基材上に、傷つき防止用のハードコートを形成した画面保護板が使用されることが多い。
It is common that a transparent screen protection plate made of thin glass or plastic is used on the front surface of display devices such as portable terminals, digital cameras, and personal computers. Plastic screen protection plates are one of the most frequently used materials because they are lighter and cheaper than glass screen protection plates and are easy to handle. On the other hand, plastic is more easily damaged than glass. For this reason, a screen protection plate in which a hard coat for preventing scratches is formed on a hard plastic substrate such as an acrylic sheet having a relatively high hardness is often used.
しかし、近年の携帯端末等の表示装置は、タッチパネル方式等の、人が表示装置の画面に直接指で頻繁に触れる方式であるため、その画面に指紋等の汚れが付着する事が多い。通常のハードコートを備えた画面保護板では、指紋等の汚れが保護板に付着するとこれらの汚れを簡単な方法では除去しきれず、残った指紋等の汚れが目立ってしまうという問題があった。また、屋外で使用することも多いこれらの表示装置は、太陽の強い光の下で使用者が画面を見る機会が多い。そのため太陽光の反射により周囲や自分の顔等が画面保護板に映り込んでしまい、表示画面の視認性が低下するという問題があった。
However, in recent years, display devices such as mobile terminals are often touched with a finger directly on the screen of the display device, such as a touch panel method, so that fingerprints and the like often adhere to the screen. In the screen protection plate provided with a normal hard coat, when dirt such as fingerprints adheres to the protection board, there is a problem that these dirt cannot be removed by a simple method, and the remaining fingerprints become noticeable. In addition, these display devices that are often used outdoors often have a user's chance to view the screen under strong sunlight. For this reason, the surroundings and his / her face are reflected on the screen protection plate due to the reflection of sunlight, and the visibility of the display screen is lowered.
表示装置における表示画面の汚れや視認性の低下は、近年の表示デバイス高精細化のための技術向上を無にしかねない深刻な問題である。そのため、防指紋性を有し、反射防止性能を有するほど低屈折率であり、かつ耐擦傷性等の膜強度に優れた、透明なプラスチック製の画面保護板が強く求められている。
Dirty display screens and reduced visibility in display devices are serious problems that may necessitate improvements in technology for high-definition display devices in recent years. Therefore, there is a strong demand for a transparent plastic screen protection plate that has anti-fingerprint properties, has a low refractive index as it has anti-reflection performance, and has excellent film strength such as scratch resistance.
そこで、上記問題点を解決するために、パーフルオロ基含有(メタ)アクリル酸エステル樹脂と、特定のシランカップリング剤で処理された中空シリカ系微粒子とからなる、低屈折率膜形成用組成物が提案されている(特許文献1参照)。
In order to solve the above problems, a composition for forming a low refractive index film comprising a perfluoro group-containing (meth) acrylic ester resin and hollow silica-based fine particles treated with a specific silane coupling agent Has been proposed (see Patent Document 1).
しかしながら、上述した従来の低屈折膜形成用組成物では、パーフルオロ基の効果により防指紋性は得られるものの、耐擦傷性等の膜強度が弱いという問題があった。
However, the above-described conventional composition for forming a low refractive film has a problem that the film strength such as scratch resistance is weak although the anti-fingerprint property is obtained by the effect of the perfluoro group.
本発明は、上記事情に鑑みてなされたものであって、防指紋性を有し、使用に問題のない反射防止性を有し、かつ膜強度に優れた、低屈折率膜を形成することができる組成物を提供することを目的の一つとする。
The present invention has been made in view of the above circumstances, and forms a low refractive index film having anti-fingerprint properties, anti-reflection properties that do not cause problems in use, and excellent film strength. One of the objects is to provide a composition that can be used.
本発明の低屈折率膜形成用組成物は、モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物、パーフルオロ基を有しかつ光反応性官能基を有さない化合物、及び屈折率が1.17以上かつ1.40以下の低屈折率無機粒子を含有することを特徴とする。
本発明の低屈折率膜形成用組成物では、含まれる前記無機粒子の粒子表面が、アクリロイルオキシ基及びメタクリロイルオキシ基の少なくとも一方を含む、有機基で修飾されていることが好ましい。 The composition for forming a low refractive index film of the present invention includes a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in a monomer, a compound having a perfluoro group and not having a photoreactive functional group, and It contains low refractive index inorganic particles having a refractive index of 1.17 or more and 1.40 or less.
In the composition for forming a low refractive index film of the present invention, the surface of the inorganic particles contained is preferably modified with an organic group containing at least one of an acryloyloxy group and a methacryloyloxy group.
本発明の低屈折率膜形成用組成物では、含まれる前記無機粒子の粒子表面が、アクリロイルオキシ基及びメタクリロイルオキシ基の少なくとも一方を含む、有機基で修飾されていることが好ましい。 The composition for forming a low refractive index film of the present invention includes a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in a monomer, a compound having a perfluoro group and not having a photoreactive functional group, and It contains low refractive index inorganic particles having a refractive index of 1.17 or more and 1.40 or less.
In the composition for forming a low refractive index film of the present invention, the surface of the inorganic particles contained is preferably modified with an organic group containing at least one of an acryloyloxy group and a methacryloyloxy group.
本発明の低屈折率膜形成用組成物によれば、モノマー中に一個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を有するので、硬化させた際に得られる膜の機械的強度を高め、膜に傷が付くのを防止することができる。また、パーフルオロ基を有する化合物を有するので、指紋等の汚れをはじいて付着量を減らし、さらに付着した指紋等の汚れの拭き取り性を向上させることができる。そしてこの化合物は光反応性官能基を有さないので、上記架橋性化合物の重合を阻害せず、膜強度を低下させない。また、屈折率が1.17以上かつ1.40以下の無機粒子を有するので、塗膜の屈折率を低くすることができる。すなわち、防指紋性を有し、低屈折率で耐擦傷性等の膜強度にも優れた膜を形成することができる。
According to the composition for forming a low refractive index film of the present invention, since the monomer has a crosslinkable compound having one or more methacryloyl groups or acryloyl groups, the mechanical strength of the film obtained when cured is increased, It is possible to prevent the film from being damaged. In addition, since it has a compound having a perfluoro group, it can repel dirt such as fingerprints to reduce the amount of adhesion, and further improve the wipeability of dirt such as attached fingerprints. And since this compound does not have a photoreactive functional group, it does not inhibit the polymerization of the crosslinkable compound and does not reduce the film strength. Moreover, since it has an inorganic particle whose refractive index is 1.17 or more and 1.40 or less, the refractive index of a coating film can be made low. That is, a film having fingerprint resistance, a low refractive index, and excellent film strength such as scratch resistance can be formed.
本発明は低屈折率膜形成用組成物、低屈折率膜、及びプラスチック基材に関するものであり、特に詳しくは、携帯端末、デジタルカメラ、パーソナルコンピュータ等に用いて好適な防指紋性を有する反射防止膜及びその膜を備えたプラスチック基材並びに表示装置に関するものである。
本発明の低屈折率膜形成用組成物、前記組成物から得られる低屈折率膜、及びその膜を備えたプラスチック基材、並びに前記低屈折率膜又は前記プラスチック基材を有する表示装置を実施するための形態について以下に説明する。
なお、この形態は発明の趣旨をより良く理解させるために本発明の例を具体的に説明するものであり、特に指定のない限り本発明を限定するものではない。本発明は趣旨を逸脱しない範囲において、付加、省略、置換、およびその他の変更が可能である。 The present invention relates to a composition for forming a low refractive index film, a low refractive index film, and a plastic substrate, and in particular, a reflection having fingerprint resistance suitable for use in a portable terminal, a digital camera, a personal computer or the like. The present invention relates to a prevention film, a plastic substrate including the film, and a display device.
Implementation of the composition for forming a low refractive index film of the present invention, a low refractive index film obtained from the composition, a plastic substrate provided with the film, and a display device having the low refractive index film or the plastic substrate The form for doing will be described below.
In addition, this form demonstrates the example of this invention concretely, in order to make the meaning of an invention understand better, and unless otherwise specified, this invention is not limited. Additions, omissions, substitutions, and other modifications can be made without departing from the scope of the present invention.
本発明の低屈折率膜形成用組成物、前記組成物から得られる低屈折率膜、及びその膜を備えたプラスチック基材、並びに前記低屈折率膜又は前記プラスチック基材を有する表示装置を実施するための形態について以下に説明する。
なお、この形態は発明の趣旨をより良く理解させるために本発明の例を具体的に説明するものであり、特に指定のない限り本発明を限定するものではない。本発明は趣旨を逸脱しない範囲において、付加、省略、置換、およびその他の変更が可能である。 The present invention relates to a composition for forming a low refractive index film, a low refractive index film, and a plastic substrate, and in particular, a reflection having fingerprint resistance suitable for use in a portable terminal, a digital camera, a personal computer or the like. The present invention relates to a prevention film, a plastic substrate including the film, and a display device.
Implementation of the composition for forming a low refractive index film of the present invention, a low refractive index film obtained from the composition, a plastic substrate provided with the film, and a display device having the low refractive index film or the plastic substrate The form for doing will be described below.
In addition, this form demonstrates the example of this invention concretely, in order to make the meaning of an invention understand better, and unless otherwise specified, this invention is not limited. Additions, omissions, substitutions, and other modifications can be made without departing from the scope of the present invention.
[低屈折率膜形成用組成物]
本実施形態の低屈折率膜形成用組成物(以下、単に「組成物」と省略する場合もある)は、(a)モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物、(b)パーフルオロ基を有しかつ光反応性官能基を有さない化合物、及び(c)低屈折率無機粒子(無機粒子)を含有している。 [Composition for forming low refractive index film]
The composition for forming a low refractive index film of the present embodiment (hereinafter sometimes simply referred to as “composition”) is (a) a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in the monomer, (B) a compound having a perfluoro group and not having a photoreactive functional group, and (c) low refractive index inorganic particles (inorganic particles).
本実施形態の低屈折率膜形成用組成物(以下、単に「組成物」と省略する場合もある)は、(a)モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物、(b)パーフルオロ基を有しかつ光反応性官能基を有さない化合物、及び(c)低屈折率無機粒子(無機粒子)を含有している。 [Composition for forming low refractive index film]
The composition for forming a low refractive index film of the present embodiment (hereinafter sometimes simply referred to as “composition”) is (a) a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in the monomer, (B) a compound having a perfluoro group and not having a photoreactive functional group, and (c) low refractive index inorganic particles (inorganic particles).
「架橋性化合物」
本実施形態の架橋性化合物は、モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物であれば特に限定されない。1個又は2個有していても良いが、3個以上かつ15個以下のメタクリロイル基又はアクリロイル基を有していることが好ましい。より好ましくは4個以上かつ10個以下の、さらに好ましくは5個以上かつ8個以下の、メタクリロイル基又はアクリロイル基を有していることが好ましい。
モノマー中におけるこれらの官能基数が多くなると、反応性が高く架橋密度が上がり、膜強度や耐候性が向上するため好ましい。
架橋性化合物の量は任意で選択できるが、上記組成物中に0.1質量%以上かつ55質量%以下含有させるのが好ましく、0.5質量%以上かつ10質量%以下含有させることがより好ましく、0.8質量%以上かつ2質量%以下含有させることがさらに好ましい。 "Crosslinkable compounds"
The crosslinkable compound of this embodiment will not be specifically limited if it is a crosslinkable compound which has a 1 or more methacryloyl group or acryloyl group in a monomer. Although it may have one or two, it preferably has 3 or more and 15 or less methacryloyl groups or acryloyl groups. More preferably, it has 4 or more and 10 or less, more preferably 5 or more and 8 or less, methacryloyl group or acryloyl group.
An increase in the number of these functional groups in the monomer is preferable because the reactivity is high and the crosslinking density is increased, and the film strength and weather resistance are improved.
The amount of the crosslinkable compound can be arbitrarily selected, but it is preferably 0.1 to 55% by mass and more preferably 0.5 to 10% by mass in the composition. Preferably, it is more preferably 0.8% by mass or more and 2% by mass or less.
本実施形態の架橋性化合物は、モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物であれば特に限定されない。1個又は2個有していても良いが、3個以上かつ15個以下のメタクリロイル基又はアクリロイル基を有していることが好ましい。より好ましくは4個以上かつ10個以下の、さらに好ましくは5個以上かつ8個以下の、メタクリロイル基又はアクリロイル基を有していることが好ましい。
モノマー中におけるこれらの官能基数が多くなると、反応性が高く架橋密度が上がり、膜強度や耐候性が向上するため好ましい。
架橋性化合物の量は任意で選択できるが、上記組成物中に0.1質量%以上かつ55質量%以下含有させるのが好ましく、0.5質量%以上かつ10質量%以下含有させることがより好ましく、0.8質量%以上かつ2質量%以下含有させることがさらに好ましい。 "Crosslinkable compounds"
The crosslinkable compound of this embodiment will not be specifically limited if it is a crosslinkable compound which has a 1 or more methacryloyl group or acryloyl group in a monomer. Although it may have one or two, it preferably has 3 or more and 15 or less methacryloyl groups or acryloyl groups. More preferably, it has 4 or more and 10 or less, more preferably 5 or more and 8 or less, methacryloyl group or acryloyl group.
An increase in the number of these functional groups in the monomer is preferable because the reactivity is high and the crosslinking density is increased, and the film strength and weather resistance are improved.
The amount of the crosslinkable compound can be arbitrarily selected, but it is preferably 0.1 to 55% by mass and more preferably 0.5 to 10% by mass in the composition. Preferably, it is more preferably 0.8% by mass or more and 2% by mass or less.
架橋性化合物は任意で選択できるが、その具体例としては、(メタ)トリメチロールプロパントリアクリレート、(メタ)ジトリメチロールプロパンテトラアクリレート、(メタ)ペンタエリスリトールトリアクリレート、(メタ)ペンタエリスリトールテトラアクリレート、(メタ)ジペンタエリスリトールヘキサアクリレート等のポリオールポリアクリレート、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、ウレタンアクリレート、ポリシロキサンアクリレート等が挙げられる。これらは単独で用いてもよく、2種以上を混在させて用いてもよい。また、これらのオリゴマーやポリマーを本発明の架橋性化合物として適宜用いてもよい。すなわち本発明の架橋性化合物とは、1個以上のメタクリロイル基又はアクリロイル基を有するモノマー、及び、これらモノマーから得られる、1個以上のメタクリロイル基又はアクリロイル基を有するオリゴマー又はポリマーである。
The crosslinkable compound can be arbitrarily selected. Specific examples thereof include (meth) trimethylolpropane triacrylate, (meth) ditrimethylolpropane tetraacrylate, (meth) pentaerythritol triacrylate, (meth) pentaerythritol tetraacrylate, Examples include polyol polyacrylates such as (meth) dipentaerythritol hexaacrylate, epoxy (meth) acrylates, polyester (meth) acrylates, urethane acrylates, and polysiloxane acrylates. These may be used alone or in combination of two or more. Moreover, you may use suitably these oligomers and polymers as a crosslinkable compound of this invention. That is, the crosslinkable compound of the present invention is a monomer having one or more methacryloyl groups or acryloyl groups, and an oligomer or polymer having one or more methacryloyl groups or acryloyl groups obtained from these monomers.
光重合開始剤を使用しても良い。使用する場合、その種類や量は使用する架橋性化合物に応じて適宜選択すればよい。例えば、ベンゾフェノン系、ジケトン系、アセトフェノン系、ベンゾイン系、チオキサントン系、キノン系、ベンジルジメチルケタール系、アルキルフェノン系、アシルフォスフィンオキサイド系、フェニルフォスフィンオキサイド系等の公知の光重合開始剤を用いることができる。
A photopolymerization initiator may be used. When using, the kind and amount may be appropriately selected according to the crosslinkable compound used. For example, a known photopolymerization initiator such as benzophenone, diketone, acetophenone, benzoin, thioxanthone, quinone, benzyldimethyl ketal, alkylphenone, acylphosphine oxide, phenylphosphine oxide, etc. is used. be able to.
「パーフルオロ基を有しかつ光反応性官能基を有さない化合物」
パーフルオロ基を有しかつ光反応性官能基を有さない化合物は、その化合物中に1個以上のパーフルオロ基を有しかつ光反応性官能基を有していなければ特に限定されない。例えば、パーフルオロ基と親水基を側鎖に持つフッ素化アルキルエステル、及び、パーフルオロ基と親油基とを側鎖に持つフッ素化脂肪族高分子エステルなどが挙げられる。 "Compounds with perfluoro groups and no photoreactive functional groups"
The compound having a perfluoro group and not having a photoreactive functional group is not particularly limited as long as the compound has one or more perfluoro groups and no photoreactive functional group. Examples thereof include fluorinated alkyl esters having a perfluoro group and a hydrophilic group in the side chain, and fluorinated aliphatic polymer esters having a perfluoro group and a lipophilic group in the side chain.
パーフルオロ基を有しかつ光反応性官能基を有さない化合物は、その化合物中に1個以上のパーフルオロ基を有しかつ光反応性官能基を有していなければ特に限定されない。例えば、パーフルオロ基と親水基を側鎖に持つフッ素化アルキルエステル、及び、パーフルオロ基と親油基とを側鎖に持つフッ素化脂肪族高分子エステルなどが挙げられる。 "Compounds with perfluoro groups and no photoreactive functional groups"
The compound having a perfluoro group and not having a photoreactive functional group is not particularly limited as long as the compound has one or more perfluoro groups and no photoreactive functional group. Examples thereof include fluorinated alkyl esters having a perfluoro group and a hydrophilic group in the side chain, and fluorinated aliphatic polymer esters having a perfluoro group and a lipophilic group in the side chain.
パーフルオロ基を有しかつ光反応性官能基を有さない化合物は、上記組成物中に0.1質量%以上かつ5.0質量%以下含有させるのが好ましい。0.1質量%以上かつ2質量%以下含有させるのがより好ましく、0.1質量%以上かつ1質量%以下含有させるのがさらに好ましい。0.1質量%未満の場合は十分な防指紋特性が得られない場合があり、5.0質量%を超えると十分な膜強度が得られないため好ましくない。
The compound having a perfluoro group and not having a photoreactive functional group is preferably contained in the composition in an amount of 0.1% by mass to 5.0% by mass. More preferably, the content is 0.1% by mass or more and 2% by mass or less, and more preferably 0.1% by mass or more and 1% by mass or less. When the amount is less than 0.1% by mass, sufficient anti-fingerprint characteristics may not be obtained. When the amount exceeds 5.0% by mass, sufficient film strength cannot be obtained, which is not preferable.
パーフルオロ基は一般的にパーフルオロ基として知られているものが本願でも使用できる。例えばパーフルオロアルキル基、パーフルオロアルキレン基、パーフルオロアルキリデン基等が挙げられる。パーフルオロアルキル基等に含まれる炭素原子の数は任意で選択できるが、例えば炭素数1個~20個が挙げられる。
Perfluoro groups generally known as perfluoro groups can be used in the present application. Examples thereof include a perfluoroalkyl group, a perfluoroalkylene group, and a perfluoroalkylidene group. The number of carbon atoms contained in the perfluoroalkyl group and the like can be arbitrarily selected, and examples thereof include 1 to 20 carbon atoms.
光反応性官能基は、紫外線等の光エネルギーの照射によって反応が進行する官能基が挙げられる。このような反応としては例えば、エチレン性不飽和結合を有する官能基による光ラジカル重合反応等が挙げられる。光反応性官能基の具体例を挙げれば、メタクリロイル基、アクリロイル基、ビニル基、アリル基、スチリル基等が挙げられる。
Examples of the photoreactive functional group include a functional group whose reaction proceeds by irradiation with light energy such as ultraviolet rays. Examples of such a reaction include a photo radical polymerization reaction by a functional group having an ethylenically unsaturated bond. Specific examples of the photoreactive functional group include methacryloyl group, acryloyl group, vinyl group, allyl group, and styryl group.
本実施形態の組成物により形成される膜の上に更に別の層や膜を設ける場合(例えば文字や画像を印刷する場合)には、本発明の膜を形成したときのヘキサデカンに対する接触角が40°以下、好ましくは35°以下の親油性になるように、パーフルオロ基を有しかつ光反応性官能基を有さない化合物の量を適宜調整するとよい。
When another layer or film is provided on the film formed by the composition of the present embodiment (for example, when printing characters or images), the contact angle with respect to hexadecane when the film of the present invention is formed is The amount of the compound having a perfluoro group and not having a photoreactive functional group may be appropriately adjusted so that the lipophilicity is 40 ° or less, preferably 35 ° or less.
「無機粒子」
本実施形態に使用される無機粒子、すなわち低屈折率を有する無機粒子は、屈折率が1.17以上かつ1.40以下の無機粒子であれば特に限定されない。このような無機粒子の例としてはシリカが挙げられ、より低い屈折率が得られる点で、多くの空隙を有するメソポーラスシリカが好ましい。メソポーラスシリカの種類は任意で選択できるが、例えば直径が2~10nm程度の均一で規則的な細孔を有するシリカ等が挙げられる。
メソポーラスシリカの製造方法は、例えば特開2001-233611号公報や特開2002-79616号公報に記載されている。 "Inorganic particles"
The inorganic particles used in the present embodiment, that is, the inorganic particles having a low refractive index are not particularly limited as long as the refractive index is 1.17 or more and 1.40 or less. Examples of such inorganic particles include silica, and mesoporous silica having many voids is preferable in that a lower refractive index can be obtained. The type of mesoporous silica can be arbitrarily selected, and examples thereof include silica having uniform and regular pores having a diameter of about 2 to 10 nm.
A method for producing mesoporous silica is described in, for example, Japanese Patent Application Laid-Open Nos. 2001-233611 and 2002-79616.
本実施形態に使用される無機粒子、すなわち低屈折率を有する無機粒子は、屈折率が1.17以上かつ1.40以下の無機粒子であれば特に限定されない。このような無機粒子の例としてはシリカが挙げられ、より低い屈折率が得られる点で、多くの空隙を有するメソポーラスシリカが好ましい。メソポーラスシリカの種類は任意で選択できるが、例えば直径が2~10nm程度の均一で規則的な細孔を有するシリカ等が挙げられる。
メソポーラスシリカの製造方法は、例えば特開2001-233611号公報や特開2002-79616号公報に記載されている。 "Inorganic particles"
The inorganic particles used in the present embodiment, that is, the inorganic particles having a low refractive index are not particularly limited as long as the refractive index is 1.17 or more and 1.40 or less. Examples of such inorganic particles include silica, and mesoporous silica having many voids is preferable in that a lower refractive index can be obtained. The type of mesoporous silica can be arbitrarily selected, and examples thereof include silica having uniform and regular pores having a diameter of about 2 to 10 nm.
A method for producing mesoporous silica is described in, for example, Japanese Patent Application Laid-Open Nos. 2001-233611 and 2002-79616.
低屈折率無機粒子の屈折率は1.17以上かつ1.40以下であり、好ましくは1.17以上かつ1.35以下であり、より好ましくは1.17以上かつ1.30以下である。屈折率が1.17未満の無機粒子は製造が困難であり、例えば空隙率を非常に高めることで製造できたとしても粒子自体の強度が弱くなり、形成した低屈折率膜の耐擦傷性等が弱くなる可能性があるため好ましくない。一方、屈折率が1.40を超えると、膜を形成したときの膜の屈折率が高すぎる可能性があり、反射防止性能が悪くなるため好ましくない。
The refractive index of the low refractive index inorganic particles is 1.17 or more and 1.40 or less, preferably 1.17 or more and 1.35 or less, more preferably 1.17 or more and 1.30 or less. Inorganic particles having a refractive index of less than 1.17 are difficult to produce. For example, even if they can be produced by greatly increasing the porosity, the strength of the particles themselves is weakened, and the scratch resistance of the formed low refractive index film, etc. Is not preferable because it may become weak. On the other hand, if the refractive index exceeds 1.40, the refractive index of the film may be too high when the film is formed, which is not preferable because the antireflection performance deteriorates.
なお、本明細書中における無機粒子の屈折率とは、粒子全体としての屈折率を意味する。例えばメソポーラスシリカのように粒子に空隙を有する粒子の場合は、メソポーラスシリカを形成している部分のシリカのみの屈折率ではなく、メソポーラスシリカの空隙部分も一体とした屈折率を意味する。
In addition, the refractive index of the inorganic particle in this specification means the refractive index as the whole particle. For example, in the case of particles having voids in the particles, such as mesoporous silica, it means not only the refractive index of silica in the portion where mesoporous silica is formed but also the refractive index in which the void portion of mesoporous silica is also integrated.
低屈折率無機粒子としてメソポーラスシリカを用いる場合には、粒子全体の体積に対する粒子の空隙が占める体積で表される空隙率が、10%以上かつ60%以下が好ましく、20%以上かつ60%以下がより好ましく、30%以上かつ60%以下がさらに好ましい。空隙率を上記範囲にすることで、粒子の強度を確保しつつ屈折率を低くすることができる。メソポーラスシリカをより低屈折率にするために、空隙率をより大きくしようとすると、粒子形状が疎になり粒子の強度が弱くなるため、耐擦傷性の観点より1.17未満の低屈折率の粒子を用いるのは好ましくない。
When mesoporous silica is used as the low refractive index inorganic particles, the porosity represented by the volume occupied by the voids of the particles relative to the total volume of the particles is preferably 10% or more and 60% or less, and 20% or more and 60% or less. Is more preferable, and 30% or more and 60% or less are more preferable. By setting the porosity to the above range, the refractive index can be lowered while ensuring the strength of the particles. In order to make the mesoporous silica have a lower refractive index, if the porosity is increased, the particle shape becomes sparse and the strength of the particle becomes weak. From the viewpoint of scratch resistance, the low refractive index is less than 1.17. It is not preferable to use particles.
本実施形態に用いる低屈折率を有する無機粒子の平均一次粒子径は、3nm以上かつ100nm以下であることが好ましい。すなわち、平均一次粒子径が3nm以上かつ100nm以下の無機微粒子を用いることが好ましい。3nm未満の粒子は製造が困難な場合があり、取り扱いも容易でない可能性があるため好ましくない。一方で100nmを超える粒子は、膜にした時に、レイリ―散乱による透過光の損失が大きくなり、膜の透明性を低下させる可能性があるため好ましくない。
The average primary particle diameter of the inorganic particles having a low refractive index used in the present embodiment is preferably 3 nm or more and 100 nm or less. That is, it is preferable to use inorganic fine particles having an average primary particle diameter of 3 nm or more and 100 nm or less. Particles of less than 3 nm are not preferred because they may be difficult to produce and may not be easy to handle. On the other hand, particles larger than 100 nm are not preferable because, when formed into a film, loss of transmitted light due to Rayleigh scattering increases, which may reduce the transparency of the film.
低屈折率を有する無機粒子は、上記組成物中に10質量%以上かつ90質量%以下、好ましくは20質量%以上かつ80質量%以下、より好ましくは40質量%以上かつ60質量%以下含有させるのが好ましい。10質量%未満の場合は屈折率が十分に低くならないおそれがあるため好ましくない。一方で90質量%を超えると組成物全体における架橋性化合物比が少なくなるために十分な膜強度が得られにくくなる可能性があるため好ましくない。
The inorganic particles having a low refractive index are contained in the composition in an amount of 10% by mass to 90% by mass, preferably 20% by mass to 80% by mass, more preferably 40% by mass to 60% by mass. Is preferred. If it is less than 10% by mass, the refractive index may not be sufficiently low, such being undesirable. On the other hand, if it exceeds 90% by mass, the ratio of the crosslinkable compound in the whole composition is decreased, so that it may be difficult to obtain sufficient film strength.
上記低屈折を有する無機粒子は、架橋性化合物との親和性を向上させるために、粒子の表面が有機基を有する表面処理剤で修飾されていてもよい。このような表面処理剤としては有機ケイ素化合物を用いることができ、例えば、シリコン系カップリング剤、及びシリコーンオイル等が挙げられる。
The inorganic particles having low refraction may be modified with a surface treatment agent having an organic group on the surface of the particles in order to improve the affinity with the crosslinkable compound. As such a surface treatment agent, an organosilicon compound can be used, and examples thereof include a silicon-based coupling agent and silicone oil.
シリコン系カップリング剤としては、例えば、メチルトリメトキシシラン、メチルトリエトキシシラン、フェニルトリエトキシシラン、メチルメトキシシラン、n-プロピルトリメトキシシラン、n-ブチルトリエトキシシラン、n-ヘキシルトリメトキシシラン、n-ヘキシルトリエトキシシラン、n-オクチルトリエトキシシラン、n-デシルトリメトキシシラン、フェニルトリメトキシシラン、ジフェニルジメトキシシラン等のシランカップリング剤、ビニルトリメトキシシラン、ビニルトリエトキシシラン等のビニルシランカップリング剤、3-アミノプロピルトリメトキシシラン、N-2(アミノエチル)3-アミノプロピルメチルジメトキシシラン等のアミノシランカップリング剤、3-アクリロキシプロピルトリメトキシシラン等のアクリロイルオキシシランカップリング剤、3-メタクリロキシプロピルトリメトキシシラン等のメタクリロイルオキシシランカップリング剤、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシラン等のメルカプトシランカップリング剤等が挙げられる。
Examples of the silicon coupling agent include methyltrimethoxysilane, methyltriethoxysilane, phenyltriethoxysilane, methylmethoxysilane, n-propyltrimethoxysilane, n-butyltriethoxysilane, n-hexyltrimethoxysilane, Silane coupling agents such as n-hexyltriethoxysilane, n-octyltriethoxysilane, n-decyltrimethoxysilane, phenyltrimethoxysilane and diphenyldimethoxysilane, vinylsilane couplings such as vinyltrimethoxysilane and vinyltriethoxysilane Agents, aminosilane coupling agents such as 3-aminopropyltrimethoxysilane, N-2 (aminoethyl) 3-aminopropylmethyldimethoxysilane, 3-acryloxypropyltrimethoxysilane Acryloyloxysilane coupling agents such as methacryloyl, methacryloyloxysilane coupling agents such as 3-methacryloxypropyltrimethoxysilane, mercaptosilane coupling agents such as 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, etc. Is mentioned.
シリコーンオイルとしては、ジメチルシリコーンオイル、メチルハイドロジェンシリコーンオイル、エポキシ変性シリコーンオイル、カルボキシル変性シリコーンオイル、ポリエーテル変性シリコーンオイル、アミノ変性シリコーンオイルが挙げられる。
これらのシリコン系カップリング剤やシリコーンオイルは、1種のみを用いてもよく、2種以上を併用して用いてもよい。 Examples of the silicone oil include dimethyl silicone oil, methyl hydrogen silicone oil, epoxy-modified silicone oil, carboxyl-modified silicone oil, polyether-modified silicone oil, and amino-modified silicone oil.
These silicone coupling agents and silicone oils may be used alone or in combination of two or more.
これらのシリコン系カップリング剤やシリコーンオイルは、1種のみを用いてもよく、2種以上を併用して用いてもよい。 Examples of the silicone oil include dimethyl silicone oil, methyl hydrogen silicone oil, epoxy-modified silicone oil, carboxyl-modified silicone oil, polyether-modified silicone oil, and amino-modified silicone oil.
These silicone coupling agents and silicone oils may be used alone or in combination of two or more.
これらの中でも、3-アクリロキシプロピルトリメトキシシラン等のアクリロイルオキシシランカップリング剤、3-メタクリロキシプロピルトリメトキシシラン等のメタクリロイルオキシシランカップリング剤、3-メルカプトプロピルトリメトキシシラン等のメルカプトシランカップリング剤の群から選択される1種または2種以上を、低屈折率を有する無機粒子の表面処理剤として用いることにより、樹脂との親和性が著しく向上し、粒子と樹脂との密着性が向上することで高い膜強度を得ることができる。より好ましくは、アクリロイルオキシシランカップリング剤及びメタクリロイルオキシシランカップリング剤の少なくとも1種を用いることが好ましい。
Among these, acryloyloxysilane coupling agents such as 3-acryloxypropyltrimethoxysilane, methacryloyloxysilane coupling agents such as 3-methacryloxypropyltrimethoxysilane, and mercaptosilane cups such as 3-mercaptopropyltrimethoxysilane By using one or more selected from the group of ring agents as a surface treatment agent for inorganic particles having a low refractive index, the affinity with the resin is significantly improved, and the adhesion between the particles and the resin is improved. By improving, a high film strength can be obtained. More preferably, at least one of an acryloyloxysilane coupling agent and a methacryloyloxysilane coupling agent is used.
上記組成物の粘度は、0.2mPa・s以上かつ500mPa・s以下であることが好ましく、0.5mPa・s以上かつ200mPa・s以下がより好ましい。組成物の粘度が0.2mPa・s未満の場合は、膜にした時の膜厚が薄くなりすぎて膜厚の制御が困難であるため好ましくない。一方で、粘度が500mPa・sを超えると、粘度が高すぎて塗工時における組成物の取扱いが難しくなるため好ましくない。
The viscosity of the composition is preferably 0.2 mPa · s or more and 500 mPa · s or less, and more preferably 0.5 mPa · s or more and 200 mPa · s or less. When the viscosity of the composition is less than 0.2 mPa · s, it is not preferable because the film thickness when formed into a film becomes too thin and it is difficult to control the film thickness. On the other hand, when the viscosity exceeds 500 mPa · s, the viscosity is too high and it becomes difficult to handle the composition at the time of coating.
上記の粘度範囲に調整するために、希釈剤として有機溶媒を用いても良い。溶媒としては組成物の成分との相溶性がよいものであれば特に限定されない。例えば、トルエン、キシレン等の芳香族系溶媒、ヘキサン、ヘプタン等の脂肪族系溶媒、メチルエチルケトン、メチルイソブチルケトンなどのケトン系溶媒、エーテル系溶媒、エステル系溶媒、アミド系溶媒、セロソルブ系溶媒、エーテルエステル系溶媒、及びアルコール系溶媒等が挙げられる。これらの溶媒は単独で用いてもよく、2種以上を用いてもよい。これらの中でも、アルコール類は、プラスチック基材の表面を溶かしてその表面を侵食することはないため、プラスチック基材の透明性を低下させることがないため好ましい。有機溶媒の量は任意に選択されるが、例えば、上記組成物中に10質量%以上かつ99質量%以下が好ましく、50質量%以上かつ99質量%以下がより好ましい。
In order to adjust to the above viscosity range, an organic solvent may be used as a diluent. The solvent is not particularly limited as long as it has good compatibility with the components of the composition. For example, aromatic solvents such as toluene and xylene, aliphatic solvents such as hexane and heptane, ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone, ether solvents, ester solvents, amide solvents, cellosolve solvents, ethers Examples include ester solvents and alcohol solvents. These solvents may be used alone or in combination of two or more. Among these, alcohols are preferred because they do not dissolve the surface of the plastic substrate and do not erode the surface, and therefore do not reduce the transparency of the plastic substrate. Although the amount of the organic solvent is arbitrarily selected, for example, it is preferably 10% by mass or more and 99% by mass or less, and more preferably 50% by mass or more and 99% by mass or less in the composition.
本実施形態の組成物には、消泡剤、レベリング剤、撥水剤、撥油剤、親油剤、滑剤、酸化防止剤、紫外線吸収剤、光安定剤、重合禁止剤等の一般的に用いられる添加剤を適宜添加しても良い。
In the composition of this embodiment, an antifoaming agent, a leveling agent, a water repellent, an oil repellent, a lipophilic agent, a lubricant, an antioxidant, an ultraviolet absorber, a light stabilizer, a polymerization inhibitor and the like are generally used. Additives may be added as appropriate.
「低屈折率膜形成用組成物の製造方法」
本実施形態の低屈折率膜形成用組成物の製造方法は、上記の架橋性化合物、パーフルオロ基を有しかつ光反応性官能基を有さない化合物、低屈折率無機粒子等を均一に混合させることができれば特に限定されず、公知の撹拌方法を用いることができる。
なお、低屈折率無機粒子の表面に、上記表面修飾剤を修飾させる場合には、あらかじめ表面修飾をしてから、その表面修飾された無機粒子を組成物に混合すればよい。 "Method for producing composition for forming low refractive index film"
The method for producing the composition for forming a low refractive index film of the present embodiment is to uniformly distribute the crosslinkable compound, the compound having a perfluoro group and not having a photoreactive functional group, low refractive index inorganic particles, and the like. If it can be made to mix, it will not specifically limit, A well-known stirring method can be used.
In addition, when the surface modifier is modified on the surface of the low refractive index inorganic particles, the surface-modified inorganic particles may be mixed with the composition after surface modification in advance.
本実施形態の低屈折率膜形成用組成物の製造方法は、上記の架橋性化合物、パーフルオロ基を有しかつ光反応性官能基を有さない化合物、低屈折率無機粒子等を均一に混合させることができれば特に限定されず、公知の撹拌方法を用いることができる。
なお、低屈折率無機粒子の表面に、上記表面修飾剤を修飾させる場合には、あらかじめ表面修飾をしてから、その表面修飾された無機粒子を組成物に混合すればよい。 "Method for producing composition for forming low refractive index film"
The method for producing the composition for forming a low refractive index film of the present embodiment is to uniformly distribute the crosslinkable compound, the compound having a perfluoro group and not having a photoreactive functional group, low refractive index inorganic particles, and the like. If it can be made to mix, it will not specifically limit, A well-known stirring method can be used.
In addition, when the surface modifier is modified on the surface of the low refractive index inorganic particles, the surface-modified inorganic particles may be mixed with the composition after surface modification in advance.
「低屈折率膜」
本実施形態の低屈折率膜は、本実施形態の低屈折率膜形成用組成物により形成されることを特徴とする。
本実施形態において膜の屈折率が低いとは、屈折率が1.49以下であることを意味する。本実施形態において、低屈折率膜の屈折率は1.26以上かつ1.49以下が好ましく、1.28以上かつ1.47以下がより好ましい。膜の屈折率を上記範囲にすることにより、低屈折率膜が反射防止膜としての機能を有し、表示画面の視認性を良好なものとすることができる。
なお、反射防止膜としての機能を有するとは、可視光反射率(膜の10°正反射率を分光光度計で測定した測定値に比視感度値を乗じた値)が3.0以下であることを意味する。可視光反射率は2.2以下が好ましく、1.5以下がより好ましい。可視光反射率の下限値は0であるが、0.05以上であることが好ましい。 "Low refractive index film"
The low refractive index film of the present embodiment is formed by the low refractive index film forming composition of the present embodiment.
In this embodiment, the low refractive index of the film means that the refractive index is 1.49 or less. In the present embodiment, the refractive index of the low refractive index film is preferably from 1.26 to 1.49, more preferably from 1.28 to 1.47. By setting the refractive index of the film in the above range, the low refractive index film has a function as an antireflection film, and the visibility of the display screen can be improved.
Note that having a function as an antireflection film means that the visible light reflectance (the value obtained by multiplying the 10 ° specular reflectance of the film with a spectrophotometer multiplied by the relative visibility value) is 3.0 or less. It means that there is. The visible light reflectance is preferably 2.2 or less, and more preferably 1.5 or less. The lower limit of the visible light reflectance is 0, but is preferably 0.05 or more.
本実施形態の低屈折率膜は、本実施形態の低屈折率膜形成用組成物により形成されることを特徴とする。
本実施形態において膜の屈折率が低いとは、屈折率が1.49以下であることを意味する。本実施形態において、低屈折率膜の屈折率は1.26以上かつ1.49以下が好ましく、1.28以上かつ1.47以下がより好ましい。膜の屈折率を上記範囲にすることにより、低屈折率膜が反射防止膜としての機能を有し、表示画面の視認性を良好なものとすることができる。
なお、反射防止膜としての機能を有するとは、可視光反射率(膜の10°正反射率を分光光度計で測定した測定値に比視感度値を乗じた値)が3.0以下であることを意味する。可視光反射率は2.2以下が好ましく、1.5以下がより好ましい。可視光反射率の下限値は0であるが、0.05以上であることが好ましい。 "Low refractive index film"
The low refractive index film of the present embodiment is formed by the low refractive index film forming composition of the present embodiment.
In this embodiment, the low refractive index of the film means that the refractive index is 1.49 or less. In the present embodiment, the refractive index of the low refractive index film is preferably from 1.26 to 1.49, more preferably from 1.28 to 1.47. By setting the refractive index of the film in the above range, the low refractive index film has a function as an antireflection film, and the visibility of the display screen can be improved.
Note that having a function as an antireflection film means that the visible light reflectance (the value obtained by multiplying the 10 ° specular reflectance of the film with a spectrophotometer multiplied by the relative visibility value) is 3.0 or less. It means that there is. The visible light reflectance is preferably 2.2 or less, and more preferably 1.5 or less. The lower limit of the visible light reflectance is 0, but is preferably 0.05 or more.
また、本実施形態の低屈折率膜は、水に対する接触角が85°~100°の撥水膜である。撥水性であるために、指紋等の汚れの付着を防ぐことができる。
また、本実施形態の低屈折率膜の上に別の層や膜を積層させる場合には、さらにヘキサデカンに対する接触角が40°より小さい撥水かつ親油性の膜であるのが好ましい。親油性であるために、本実施形態の低屈折率膜の上にスクリーン印刷等により、別の層や膜を積層させることができる。 In addition, the low refractive index film of this embodiment is a water repellent film having a contact angle with water of 85 ° to 100 °. Since it is water repellent, it is possible to prevent adhesion of dirt such as fingerprints.
Further, when another layer or film is laminated on the low refractive index film of this embodiment, it is preferably a water-repellent and lipophilic film having a contact angle with respect to hexadecane of less than 40 °. Since it is lipophilic, another layer or film can be laminated on the low refractive index film of this embodiment by screen printing or the like.
また、本実施形態の低屈折率膜の上に別の層や膜を積層させる場合には、さらにヘキサデカンに対する接触角が40°より小さい撥水かつ親油性の膜であるのが好ましい。親油性であるために、本実施形態の低屈折率膜の上にスクリーン印刷等により、別の層や膜を積層させることができる。 In addition, the low refractive index film of this embodiment is a water repellent film having a contact angle with water of 85 ° to 100 °. Since it is water repellent, it is possible to prevent adhesion of dirt such as fingerprints.
Further, when another layer or film is laminated on the low refractive index film of this embodiment, it is preferably a water-repellent and lipophilic film having a contact angle with respect to hexadecane of less than 40 °. Since it is lipophilic, another layer or film can be laminated on the low refractive index film of this embodiment by screen printing or the like.
本実施形態の低屈折率膜の膜厚は任意で選択できるが、一般的には10nm以上かつ1mm以下であり、50nm以上かつ200nm以下であることが好ましい。膜厚を上記範囲とすることにより、可視光波長域の反射光を低減させることができ、例えば表示装置に用いた場合には、表示画面の視認性を向上させることができるため好ましい。
Although the film thickness of the low refractive index film of the present embodiment can be arbitrarily selected, it is generally 10 nm or more and 1 mm or less, and preferably 50 nm or more and 200 nm or less. By setting the film thickness within the above range, reflected light in the visible light wavelength region can be reduced. For example, when used in a display device, the visibility of the display screen can be improved, which is preferable.
低屈折率膜の表面抵抗は任意で選択できるが、1×108Ω/□以上かつ1×1013Ω/□以下を例の一つとしてあげることができ、1×109Ω/□以上かつ1×1012Ω/□以下を好ましい例の一つとしてあげることができる。
The surface resistance of the low refractive index film can be arbitrarily selected, but 1 × 10 8 Ω / □ or more and 1 × 10 13 Ω / □ or less can be given as an example, and 1 × 10 9 Ω / □ or more. One preferred example is 1 × 10 12 Ω / □ or less.
本実施形態の低屈折率膜の製造方法は、上記低屈折率膜形成用組成物を任意で選択される基材などに塗工することで塗膜を形成する工程と、上記塗膜を硬化させる工程とを含む。
塗膜を形成する工程における塗工方法としては例えば、スピンコート法、ディップコート法、グラビアコート法、スプレー法、ローラー法、はけ塗り法等が挙げられる。 The method for producing a low refractive index film of the present embodiment includes a step of forming a coating film by coating the low refractive index film forming composition on a substrate that is arbitrarily selected, and curing the coating film. And a step of causing.
Examples of the coating method in the step of forming a coating film include a spin coating method, a dip coating method, a gravure coating method, a spray method, a roller method, and a brush coating method.
塗膜を形成する工程における塗工方法としては例えば、スピンコート法、ディップコート法、グラビアコート法、スプレー法、ローラー法、はけ塗り法等が挙げられる。 The method for producing a low refractive index film of the present embodiment includes a step of forming a coating film by coating the low refractive index film forming composition on a substrate that is arbitrarily selected, and curing the coating film. And a step of causing.
Examples of the coating method in the step of forming a coating film include a spin coating method, a dip coating method, a gravure coating method, a spray method, a roller method, and a brush coating method.
塗膜を硬化させる工程における硬化方法は任意で選択できるが、塗膜にエネルギー線を照射して光硬化させる方法が好ましい。光硬化に用いるエネルギー線は塗膜が硬化すれば特に限定されず、例えば、紫外線、遠赤外線、近紫外線、赤外線、X線、γ線、電子線、プロトン線、中性子線等のエネルギー線を用いることができる。これらのエネルギー線の中でも、硬化速度が速く、装置の入手が容易である紫外線照射による硬化が好ましい。
塗膜を光硬化させることで、架橋性化合物が重合して、耐擦傷性等の強度に優れた膜を得ることができる。 Although the curing method in the step of curing the coating film can be arbitrarily selected, a method of photocuring by irradiating the coating film with energy rays is preferable. The energy rays used for photocuring are not particularly limited as long as the coating is cured, and for example, energy rays such as ultraviolet rays, far infrared rays, near ultraviolet rays, infrared rays, X rays, γ rays, electron beams, proton rays, neutron rays are used. be able to. Among these energy rays, curing by ultraviolet irradiation, which has a high curing rate and is easily available, is preferable.
By photocuring the coating film, the crosslinkable compound is polymerized and a film having excellent strength such as scratch resistance can be obtained.
塗膜を光硬化させることで、架橋性化合物が重合して、耐擦傷性等の強度に優れた膜を得ることができる。 Although the curing method in the step of curing the coating film can be arbitrarily selected, a method of photocuring by irradiating the coating film with energy rays is preferable. The energy rays used for photocuring are not particularly limited as long as the coating is cured, and for example, energy rays such as ultraviolet rays, far infrared rays, near ultraviolet rays, infrared rays, X rays, γ rays, electron beams, proton rays, neutron rays are used. be able to. Among these energy rays, curing by ultraviolet irradiation, which has a high curing rate and is easily available, is preferable.
By photocuring the coating film, the crosslinkable compound is polymerized and a film having excellent strength such as scratch resistance can be obtained.
紫外線硬化させる場合の例には、200nm~500nm波長帯域の光を発する高圧水銀ランプ、メタルハライドランプ、キセノンランプ、ケミカルランプ等を用いて、100~3,000mJ/cm2のエネルギーにて照射する方法等が挙げられる。
In the case of UV curing, a method of irradiating at an energy of 100 to 3,000 mJ / cm 2 using a high pressure mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp or the like that emits light in a wavelength band of 200 nm to 500 nm Etc.
以上、詳細に説明したように、本実施形態の低屈折膜形成用組成物によれば、モノマー中に一個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物と、かかる架橋性化合物とは別の成分としてのパーフルオロ基を有しかつ光反応性官能基を有さない化合物と、を有する構成としたことで、膜を形成する過程でパーフルオロ基によって架橋性化合物の重合反応が阻害されるのを抑制することができる。これにより、架橋性化合物の重合度を高め、当該組成物を用いて形成した膜の機械的強度を高めることができ、傷が付きにくい膜を形成することができる。
As described above in detail, according to the composition for forming a low refractive film of the present embodiment, a crosslinkable compound having one or more methacryloyl groups or acryloyl groups in the monomer is different from the crosslinkable compound. And a compound having a perfluoro group as a component and not having a photoreactive functional group, the polymerization reaction of the crosslinkable compound is inhibited by the perfluoro group in the process of forming a film. Can be suppressed. Accordingly, the degree of polymerization of the crosslinkable compound can be increased, the mechanical strength of the film formed using the composition can be increased, and a film that is hardly damaged can be formed.
また、パーフルオロ基を有する化合物を含んでいることにより、形成した膜の表面において指紋等の汚れをはじいて付着量を減らすことができ、しかも付着した指紋等の汚れの拭き取り性を向上させることができる。
また、屈折率が1.17以上かつ1.40以下の無機粒子を含むことにより、屈折率の低い膜を形成することができる。 In addition, by including a compound having a perfluoro group, the amount of adhesion can be reduced by removing dirt such as fingerprints on the surface of the formed film, and the wiping property of dirt such as attached fingerprints can be improved. Can do.
In addition, a film having a low refractive index can be formed by including inorganic particles having a refractive index of 1.17 or more and 1.40 or less.
また、屈折率が1.17以上かつ1.40以下の無機粒子を含むことにより、屈折率の低い膜を形成することができる。 In addition, by including a compound having a perfluoro group, the amount of adhesion can be reduced by removing dirt such as fingerprints on the surface of the formed film, and the wiping property of dirt such as attached fingerprints can be improved. Can do.
In addition, a film having a low refractive index can be formed by including inorganic particles having a refractive index of 1.17 or more and 1.40 or less.
以上から、本実施形態の組成物によれば、防指紋性を有し、低屈折率のため反射防止性に優れ、耐擦傷性等の膜強度にも優れた膜を形成することができる。
なお本実施形態において防指紋性を有するかどうかは一般的な意味で判断してもよいが、例えば、次の方法により評価することができる。すなわち、膜上にトリオレイン酸を1滴滴下し、トリオレイン酸の滴下前及びクリーンワイパーによる10往復回数拭き取り後のそれぞれにおける膜のヘイズを測定し、ヘイズ値の差が1.0未満のものを防指紋性を有すると判断する事ができる。 From the above, according to the composition of the present embodiment, it is possible to form a film having anti-fingerprint properties, excellent antireflection properties due to low refractive index, and excellent film strength such as scratch resistance.
In the present embodiment, whether or not it has fingerprint resistance may be determined in a general sense, but can be evaluated by the following method, for example. That is, one drop of trioleic acid is dropped on the film, and the haze of the film is measured before dropping trioleic acid and after wiping 10 times with a clean wiper, and the difference in haze values is less than 1.0 Can be determined to have fingerprint resistance.
なお本実施形態において防指紋性を有するかどうかは一般的な意味で判断してもよいが、例えば、次の方法により評価することができる。すなわち、膜上にトリオレイン酸を1滴滴下し、トリオレイン酸の滴下前及びクリーンワイパーによる10往復回数拭き取り後のそれぞれにおける膜のヘイズを測定し、ヘイズ値の差が1.0未満のものを防指紋性を有すると判断する事ができる。 From the above, according to the composition of the present embodiment, it is possible to form a film having anti-fingerprint properties, excellent antireflection properties due to low refractive index, and excellent film strength such as scratch resistance.
In the present embodiment, whether or not it has fingerprint resistance may be determined in a general sense, but can be evaluated by the following method, for example. That is, one drop of trioleic acid is dropped on the film, and the haze of the film is measured before dropping trioleic acid and after wiping 10 times with a clean wiper, and the difference in haze values is less than 1.0 Can be determined to have fingerprint resistance.
本実施形態における効果について述べると、低屈折無機粒子を、アクリロイルオキシシランカップリング剤、メタクリロイルオキシシランカップリング剤、及びメルカプトシランカップリング剤の中から選ばれる少なくとも1種により表面修飾した場合には、架橋性化合物と表面修飾剤が結合することにより、膜強度が高い膜を得ることができる。
When the effect in this embodiment is described, when the low refractive inorganic particles are surface-modified with at least one selected from an acryloyloxysilane coupling agent, a methacryloyloxysilane coupling agent, and a mercaptosilane coupling agent. By combining the crosslinkable compound and the surface modifier, a film having high film strength can be obtained.
低屈折率無機粒子の平均一次粒子径が3nm以上かつ100nm以下の微粒子を用いた場合には、透明性に優れた低屈折率膜を得ることができる。
また、低屈折率無機微粒子としてメソポーラスシリカを用いた場合には、粒子が空隙を有するため粒子の屈折率が低くなるため、より屈折率の低い膜を得ることができる。 When fine particles having an average primary particle size of 3 nm or more and 100 nm or less of the low refractive index inorganic particles are used, a low refractive index film excellent in transparency can be obtained.
In addition, when mesoporous silica is used as the low refractive index inorganic fine particles, the particles have voids and the refractive index of the particles becomes low, so that a film having a lower refractive index can be obtained.
また、低屈折率無機微粒子としてメソポーラスシリカを用いた場合には、粒子が空隙を有するため粒子の屈折率が低くなるため、より屈折率の低い膜を得ることができる。 When fine particles having an average primary particle size of 3 nm or more and 100 nm or less of the low refractive index inorganic particles are used, a low refractive index film excellent in transparency can be obtained.
In addition, when mesoporous silica is used as the low refractive index inorganic fine particles, the particles have voids and the refractive index of the particles becomes low, so that a film having a lower refractive index can be obtained.
本実施形態の低屈折率膜によれば、本実施形態の低屈折率膜形成用組成物により形成された膜であるので、防指紋性を有し低屈折率のため反射防止性能に優れ、膜強度に優れた膜を得ることができる。
According to the low refractive index film of the present embodiment, since it is a film formed by the composition for forming a low refractive index film of the present embodiment, it has anti-fingerprint properties and excellent antireflection performance due to its low refractive index, A film excellent in film strength can be obtained.
[低屈折率膜を備えたプラスチック基材]
本実施形態の低屈折率膜を備えたプラスチック基材は、プラスチック基材の少なくとも一方の面上に、本実施形態の低屈折率膜を有することを特徴とする。 [Plastic substrate with low refractive index film]
The plastic substrate provided with the low refractive index film of the present embodiment is characterized by having the low refractive index film of the present embodiment on at least one surface of the plastic substrate.
本実施形態の低屈折率膜を備えたプラスチック基材は、プラスチック基材の少なくとも一方の面上に、本実施形態の低屈折率膜を有することを特徴とする。 [Plastic substrate with low refractive index film]
The plastic substrate provided with the low refractive index film of the present embodiment is characterized by having the low refractive index film of the present embodiment on at least one surface of the plastic substrate.
本実施形態の低屈折率膜を備えたプラスチック基材について、図1~3を参照しつつ説明する。図1は、本実施形態の低屈折率膜を備えたプラスチック基材の一例を示す断面図である。この低屈折率膜を備えたプラスチック基材10は、プラスチック基材11の少なくとも一方の面上に、低屈折率膜12を有する。
The plastic substrate provided with the low refractive index film of the present embodiment will be described with reference to FIGS. FIG. 1 is a cross-sectional view showing an example of a plastic substrate provided with the low refractive index film of the present embodiment. The plastic substrate 10 provided with this low refractive index film has a low refractive index film 12 on at least one surface of the plastic substrate 11.
図2は、本実施形態の低屈折率膜を備えたプラスチック基材の他の一例を示す断面図であり、この低屈折率膜を備えたプラスチック基材20は、プラスチック基材11の一方の面上にハードコート膜13を有し、さらにこのハードコート膜13の面上に低屈折率膜12を有している。
FIG. 2 is a cross-sectional view showing another example of the plastic substrate provided with the low refractive index film of the present embodiment. The plastic substrate 20 provided with the low refractive index film is one of the plastic substrates 11. A hard coat film 13 is provided on the surface, and a low refractive index film 12 is provided on the surface of the hard coat film 13.
図3は、本実施形態の低屈折率膜を備えたプラスチック基材のさらに他の一例を示す断面図であり、この低屈折率膜を備えたプラスチック基材30は、プラスチック基材11の一方の面上にハードコート膜13を有し、さらにこのハードコート膜13の面上に高屈折率膜14を有し、さらにこの高屈折率膜14の面上に低屈折率膜12を有している。
FIG. 3 is a cross-sectional view showing still another example of the plastic base material provided with the low refractive index film of the present embodiment. The plastic base material 30 provided with the low refractive index film is one of the plastic base materials 11. A hard coat film 13 on the surface, a high refractive index film 14 on the surface of the hard coat film 13, and a low refractive index film 12 on the surface of the high refractive index film 14. ing.
「プラスチック基材」
本実施形態に使用されるプラスチック基材11は、プラスチック製の基材であれば特に限定されない。表示画面の保護に使用されている保護板としては、例えば、アクリルシート、高弾性のアクリルゴムを含有したアクリルシート、アクリル-スチレン共重合シート、ポリスチレンシート、ポリエチレン、ポリプロピレン、ポリカーボネート、PETフィルム、及びTACフィルム等を挙げることができる。またプラスチック基材としては、上記の基材のうちの1種又は2種以上を積層したものを用いてもよい。 "Plastic substrate"
Theplastic substrate 11 used in the present embodiment is not particularly limited as long as it is a plastic substrate. Examples of protective plates used for display screen protection include acrylic sheets, acrylic sheets containing highly elastic acrylic rubber, acrylic-styrene copolymer sheets, polystyrene sheets, polyethylene, polypropylene, polycarbonate, PET films, and A TAC film etc. can be mentioned. Moreover, as a plastic base material, you may use what laminated | stacked the 1 type (s) or 2 or more types of said base materials.
本実施形態に使用されるプラスチック基材11は、プラスチック製の基材であれば特に限定されない。表示画面の保護に使用されている保護板としては、例えば、アクリルシート、高弾性のアクリルゴムを含有したアクリルシート、アクリル-スチレン共重合シート、ポリスチレンシート、ポリエチレン、ポリプロピレン、ポリカーボネート、PETフィルム、及びTACフィルム等を挙げることができる。またプラスチック基材としては、上記の基材のうちの1種又は2種以上を積層したものを用いてもよい。 "Plastic substrate"
The
「低屈折率膜」
低屈折率膜12は、上記「低屈折率膜」の項目で述べたものと全く同様のものを用いることができるので、説明を省略する。 "Low refractive index film"
Since the lowrefractive index film 12 may be the same as that described in the item “Low refractive index film”, the description thereof is omitted.
低屈折率膜12は、上記「低屈折率膜」の項目で述べたものと全く同様のものを用いることができるので、説明を省略する。 "Low refractive index film"
Since the low
「ハードコート膜」
ハードコート膜13の構成は、プラスチック基材を傷等から保護できる程度のハードコート性を有すれば、特に限定されない。すなわち、ハードコート膜上でスチールウール(#0000)を250g/cm2の荷重下にて、10往復(1往復:200mm)させた場合に、目視で傷が0本以上10本以下であるハードコート膜であればよい。反応性、透明性、耐候性、及び硬度の観点から、モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を用いて形成したものが好ましい。さらに架橋性化合物が3個以上のメタクリロイル基又はアクリロイル基を有していることが好ましい。モノマー中におけるこれらの官能基数が多くなると、反応性が高く架橋密度が上がり、膜強度や耐候性が向上するため好ましい。
架橋性化合物の具体例としては、(メタ)トリメチロールプロパントリアクリレート、(メタ)ジトリメチロールプロパンテトラアクリレート、(メタ)ペンタエリスリトールトリアクリレート、(メタ)ペンタエリスリトールテトラアクリレート、(メタ)ジペンタエリスリトールヘキサアクリレート等のポリオールポリアクリレート、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、ウレタンアクリレート、ポリシロキサンアクリレート等を1種又は2種以上用いることができる。また、これらのオリゴマーやポリマーを適宜用いてもよい。 "Hard coat film"
The configuration of thehard coat film 13 is not particularly limited as long as it has a hard coat property that can protect the plastic substrate from scratches and the like. That is, when steel wool (# 0000) is reciprocated 10 times (1 reciprocation: 200 mm) under a load of 250 g / cm 2 on the hard coat film, there are 0 to 10 scratches visually. Any coating film may be used. From the viewpoints of reactivity, transparency, weather resistance, and hardness, those formed using a crosslinkable compound having at least one methacryloyl group or acryloyl group in the monomer are preferred. Further, the crosslinkable compound preferably has three or more methacryloyl groups or acryloyl groups. An increase in the number of these functional groups in the monomer is preferable because the reactivity is high and the crosslinking density is increased, and the film strength and weather resistance are improved.
Specific examples of the crosslinkable compound include (meth) trimethylolpropane triacrylate, (meth) ditrimethylolpropane tetraacrylate, (meth) pentaerythritol triacrylate, (meth) pentaerythritol tetraacrylate, (meth) dipentaerythritol hexa One or more kinds of polyol polyacrylates such as acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, urethane acrylate, polysiloxane acrylate and the like can be used. Moreover, you may use these oligomers and polymers suitably.
ハードコート膜13の構成は、プラスチック基材を傷等から保護できる程度のハードコート性を有すれば、特に限定されない。すなわち、ハードコート膜上でスチールウール(#0000)を250g/cm2の荷重下にて、10往復(1往復:200mm)させた場合に、目視で傷が0本以上10本以下であるハードコート膜であればよい。反応性、透明性、耐候性、及び硬度の観点から、モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を用いて形成したものが好ましい。さらに架橋性化合物が3個以上のメタクリロイル基又はアクリロイル基を有していることが好ましい。モノマー中におけるこれらの官能基数が多くなると、反応性が高く架橋密度が上がり、膜強度や耐候性が向上するため好ましい。
架橋性化合物の具体例としては、(メタ)トリメチロールプロパントリアクリレート、(メタ)ジトリメチロールプロパンテトラアクリレート、(メタ)ペンタエリスリトールトリアクリレート、(メタ)ペンタエリスリトールテトラアクリレート、(メタ)ジペンタエリスリトールヘキサアクリレート等のポリオールポリアクリレート、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、ウレタンアクリレート、ポリシロキサンアクリレート等を1種又は2種以上用いることができる。また、これらのオリゴマーやポリマーを適宜用いてもよい。 "Hard coat film"
The configuration of the
Specific examples of the crosslinkable compound include (meth) trimethylolpropane triacrylate, (meth) ditrimethylolpropane tetraacrylate, (meth) pentaerythritol triacrylate, (meth) pentaerythritol tetraacrylate, (meth) dipentaerythritol hexa One or more kinds of polyol polyacrylates such as acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, urethane acrylate, polysiloxane acrylate and the like can be used. Moreover, you may use these oligomers and polymers suitably.
また、ハードコート膜13は、帯電防止性能を付与するために、導電性微粒子を有していてもよい。導電性微粒子は、膜に導電性を付与することができる微粒子であれば特に限定されず、例えば、金、白金、ルテニウム、鉄等の金属微粒子、スズ,アンチモン,インジウム、亜鉛、ガリウム,及びアルミニウムの群から選択される1種または2種以上の元素を含む金属酸化物微粒子が挙げられる。
これらの金属酸化物微粒子の中でも、バンドギャップが3.0eV以上の半導体の性質を備えた金属酸化物微粒子は、可視光線を透過する性質と電気導電性を併せ持つので好ましい。 Further, thehard coat film 13 may have conductive fine particles in order to impart antistatic performance. The conductive fine particle is not particularly limited as long as it is a fine particle that can impart conductivity to the film. For example, metal fine particles such as gold, platinum, ruthenium, and iron, tin, antimony, indium, zinc, gallium, and aluminum And metal oxide fine particles containing one or more elements selected from the group.
Among these metal oxide fine particles, metal oxide fine particles having a semiconductor property with a band gap of 3.0 eV or more are preferable because they have both the property of transmitting visible light and electrical conductivity.
これらの金属酸化物微粒子の中でも、バンドギャップが3.0eV以上の半導体の性質を備えた金属酸化物微粒子は、可視光線を透過する性質と電気導電性を併せ持つので好ましい。 Further, the
Among these metal oxide fine particles, metal oxide fine particles having a semiconductor property with a band gap of 3.0 eV or more are preferable because they have both the property of transmitting visible light and electrical conductivity.
このような半導体の性質を備えた金属酸化物微粒子としては、スズ、アンチモン、インジウム、及び亜鉛の群から選択される1種または2種以上の元素を含む金属酸化物微粒子が挙げられる。この金属酸化物微粒子としては、例えば、アンチモン含有酸化スズ(ATO:Antimony Tin Oxide)微粒子、酸化スズ(SnO2)微粒子、スズ含有酸化インジウム(ITO:Indium Tin Oxide)微粒子等を用いることができる。
また、これらの金属酸化物微粒子が含有されたハードコート膜13は、これらの金属酸化物粒子の屈折率が高いため、ハードコート膜13の屈折率が大きくなる。そのため、このハードコート膜13の面上に低屈折率膜12が形成されることにより、反射防止性能をより向上させることもできる。 Examples of the metal oxide fine particles having such semiconductor properties include metal oxide fine particles containing one or more elements selected from the group consisting of tin, antimony, indium, and zinc. As the metal oxide fine particles, for example, antimony-containing tin oxide (ATO) fine particles, tin oxide (SnO 2 ) fine particles, tin-containing indium oxide (ITO) fine particles, or the like can be used.
Further, thehard coat film 13 containing these metal oxide fine particles has a high refractive index of these metal oxide particles, so that the refractive index of the hard coat film 13 is increased. Therefore, the antireflective performance can be further improved by forming the low refractive index film 12 on the surface of the hard coat film 13.
また、これらの金属酸化物微粒子が含有されたハードコート膜13は、これらの金属酸化物粒子の屈折率が高いため、ハードコート膜13の屈折率が大きくなる。そのため、このハードコート膜13の面上に低屈折率膜12が形成されることにより、反射防止性能をより向上させることもできる。 Examples of the metal oxide fine particles having such semiconductor properties include metal oxide fine particles containing one or more elements selected from the group consisting of tin, antimony, indium, and zinc. As the metal oxide fine particles, for example, antimony-containing tin oxide (ATO) fine particles, tin oxide (SnO 2 ) fine particles, tin-containing indium oxide (ITO) fine particles, or the like can be used.
Further, the
導電性微粒子の平均一次粒子径は、3nm以上かつ50nm以下が好ましく、より好ましくは3nm以上かつ20nm以下である。この導電性微粒子の平均一次粒子径を上記範囲とすることにより、良好な透明性及び導電性が得られる。
The average primary particle diameter of the conductive fine particles is preferably 3 nm or more and 50 nm or less, more preferably 3 nm or more and 20 nm or less. By setting the average primary particle diameter of the conductive fine particles within the above range, good transparency and conductivity can be obtained.
ハードコート膜13の膜厚は0.1μm以上かつ20μm以下が好ましく、0.5μm以上かつ10μm以下がより好ましい。ハードコート膜13の膜厚を上記範囲とすることで、膜強度が強く、透明性が良好な膜が得られる。
The film thickness of the hard coat film 13 is preferably 0.1 μm or more and 20 μm or less, and more preferably 0.5 μm or more and 10 μm or less. By setting the film thickness of the hard coat film 13 in the above range, a film having high film strength and good transparency can be obtained.
ハードコート膜13は、上記架橋性化合物、光重合開始剤、導電性微粒子、及び溶剤を適宜混合させることで得た組成物を、低屈折率膜12同様、ディップコート法等の公知の方法で塗工し、その後に光硬化させることにより得られる。
The hard coat film 13 is a composition obtained by appropriately mixing the crosslinkable compound, the photopolymerization initiator, the conductive fine particles, and a solvent by a known method such as a dip coating method, like the low refractive index film 12. It is obtained by coating and then photocuring.
「高屈折率膜」
高屈折率膜14は、低屈折率膜12よりも屈折率が高い膜であり、ハードコート膜13と低屈折率膜12の間に設けることで、より反射防止機能をあげることができる。このような高屈折率膜14としては、平均一次粒子径が3nm以上かつ50nm以下の酸化チタンや酸化ジルコニウム等を含有する膜により得られる。本実施形態において高屈折率を有する膜とは、例えば1.5以上の屈折率を有する膜であることを意味する。高屈折率膜14の屈折率は、好ましくは1.55以上、より好ましくは1.65以上である。屈折率の上限値は2.2以下であり、好ましくは1.7以下である。 "High refractive index film"
The highrefractive index film 14 is a film having a higher refractive index than that of the low refractive index film 12, and the antireflection function can be further improved by providing it between the hard coat film 13 and the low refractive index film 12. Such a high refractive index film 14 is obtained by a film containing titanium oxide, zirconium oxide or the like having an average primary particle diameter of 3 nm or more and 50 nm or less. In this embodiment, the film having a high refractive index means a film having a refractive index of 1.5 or more, for example. The refractive index of the high refractive index film 14 is preferably 1.55 or more, more preferably 1.65 or more. The upper limit of the refractive index is 2.2 or less, preferably 1.7 or less.
高屈折率膜14は、低屈折率膜12よりも屈折率が高い膜であり、ハードコート膜13と低屈折率膜12の間に設けることで、より反射防止機能をあげることができる。このような高屈折率膜14としては、平均一次粒子径が3nm以上かつ50nm以下の酸化チタンや酸化ジルコニウム等を含有する膜により得られる。本実施形態において高屈折率を有する膜とは、例えば1.5以上の屈折率を有する膜であることを意味する。高屈折率膜14の屈折率は、好ましくは1.55以上、より好ましくは1.65以上である。屈折率の上限値は2.2以下であり、好ましくは1.7以下である。 "High refractive index film"
The high
さらに、高屈折率膜14と低屈折率膜12の間に、高屈折率膜14よりも屈折率が低く、低屈折率膜12よりも屈折率が高い中屈折率膜を設けてもよい。
また、ハードコート膜13と低屈折率膜12の間に導電性を有する膜を設けてもよい。 Further, an intermediate refractive index film having a refractive index lower than that of the highrefractive index film 14 and higher than that of the low refractive index film 12 may be provided between the high refractive index film 14 and the low refractive index film 12.
Further, a conductive film may be provided between thehard coat film 13 and the low refractive index film 12.
また、ハードコート膜13と低屈折率膜12の間に導電性を有する膜を設けてもよい。 Further, an intermediate refractive index film having a refractive index lower than that of the high
Further, a conductive film may be provided between the
高屈折率膜14や導電膜等は、それらの性能を有する無機微粒子を、上記架橋性化合物、光重合開始剤、溶剤等と適宜混合した組成物を、低屈折率膜12同様、ディップコート法等の公知の方法で塗工し、光硬化させることにより得られる。
As with the low refractive index film 12, the high refractive index film 14, the conductive film, and the like are prepared by mixing an inorganic fine particle having these properties with the above-mentioned crosslinkable compound, photopolymerization initiator, solvent, etc., as in the case of the low refractive index film 12. It can be obtained by coating by a known method such as photo-curing.
本実施形態の低屈折率膜を備えたプラスチック基材によれば、本実施形態の低屈折率膜を備えているので、防指紋性、反射防止性、膜強度に優れる。さらにハードコート膜を有する場合は、より膜強度に優れたプラスチック基材が得られる。
According to the plastic substrate provided with the low refractive index film of the present embodiment, since the low refractive index film of the present embodiment is provided, the anti-fingerprint property, the antireflection property and the film strength are excellent. Furthermore, when it has a hard coat film | membrane, the plastic base material which was excellent in film | membrane intensity | strength is obtained.
「表示装置」
本実施形態の表示装置は、本実施形態の低屈折率膜又は本実施形態の低屈折率膜を備えたプラスチック基材を備えた表示装置である。
表示装置としては、特に限定されず、例えば、タッチパネルディスプレイ、液晶表示ディスプレイ、発光ダイオードディスプレイ、エレクトロルミネセンスディスプレイ、蛍光ディスプレイ、プラズマディスプレイパネル等を実装した表示装置が挙げられる。このような表示装置としては例えば、携帯端末、スマートフォン、デジタルカメラ、パーソナルコンピュータ、金融機関等のATM、自動券売機、自動販売機、カーナビゲーション機器、携帯ゲーム機、コピー機等が挙げられる。 "Display device"
The display device according to the present embodiment is a display device including a plastic substrate including the low refractive index film according to the present embodiment or the low refractive index film according to the present embodiment.
The display device is not particularly limited, and examples thereof include a display device on which a touch panel display, a liquid crystal display, a light emitting diode display, an electroluminescence display, a fluorescent display, a plasma display panel, and the like are mounted. Examples of such display devices include ATMs such as mobile terminals, smartphones, digital cameras, personal computers, and financial institutions, automatic ticket vending machines, vending machines, car navigation devices, portable game machines, and copy machines.
本実施形態の表示装置は、本実施形態の低屈折率膜又は本実施形態の低屈折率膜を備えたプラスチック基材を備えた表示装置である。
表示装置としては、特に限定されず、例えば、タッチパネルディスプレイ、液晶表示ディスプレイ、発光ダイオードディスプレイ、エレクトロルミネセンスディスプレイ、蛍光ディスプレイ、プラズマディスプレイパネル等を実装した表示装置が挙げられる。このような表示装置としては例えば、携帯端末、スマートフォン、デジタルカメラ、パーソナルコンピュータ、金融機関等のATM、自動券売機、自動販売機、カーナビゲーション機器、携帯ゲーム機、コピー機等が挙げられる。 "Display device"
The display device according to the present embodiment is a display device including a plastic substrate including the low refractive index film according to the present embodiment or the low refractive index film according to the present embodiment.
The display device is not particularly limited, and examples thereof include a display device on which a touch panel display, a liquid crystal display, a light emitting diode display, an electroluminescence display, a fluorescent display, a plasma display panel, and the like are mounted. Examples of such display devices include ATMs such as mobile terminals, smartphones, digital cameras, personal computers, and financial institutions, automatic ticket vending machines, vending machines, car navigation devices, portable game machines, and copy machines.
ここで、表示装置としてスマートフォンを例にとり、本実施形態の表示装置について説明する。図4は、本実施形態の表示装置の一種のスマートフォンの一例を示す斜視図である。このスマートフォン100は、筐体101の前面に、本実施形態の低屈折率膜が表示面となるように備えられたタッチパネルディスプレイからなる表示部102が配設されている。
Here, the display device of this embodiment will be described by taking a smartphone as an example of the display device. FIG. 4 is a perspective view illustrating an example of a kind of smartphone of the display device according to the present embodiment. In the smartphone 100, a display unit 102 including a touch panel display provided with a low refractive index film according to the present embodiment as a display surface is disposed on the front surface of a housing 101.
本実施形態の低屈折膜を表示装置の表示面に形成する方法は、先に記載した低屈折率膜の形成方法と同様であり、各ディスプレイ(表示面)に対して適宜塗工すればよい。また、必要に応じて、低屈折率膜とディスプレイの間に、上記で説明したハードコート膜、高屈折率膜等を有するように塗工してもよい。すなわち、ディスプレイを上記プラスチック基材の替わりに用いればよい。
また本実施形態の低屈折率膜を備えたプラスチック基材を、表示装置の表示面に設ける方法としては、特に限定されず、公知の方法で表示装置に実装させればよい。 The method for forming the low refractive film of the present embodiment on the display surface of the display device is the same as the method for forming the low refractive index film described above, and it may be appropriately applied to each display (display surface). . Moreover, you may apply | coat so that it may have the hard coat film | membrane, high refractive index film | membrane, etc. which were demonstrated above between the low refractive index film | membrane and a display as needed. That is, a display may be used instead of the plastic substrate.
Further, the method for providing the plastic substrate provided with the low refractive index film of the present embodiment on the display surface of the display device is not particularly limited, and may be mounted on the display device by a known method.
また本実施形態の低屈折率膜を備えたプラスチック基材を、表示装置の表示面に設ける方法としては、特に限定されず、公知の方法で表示装置に実装させればよい。 The method for forming the low refractive film of the present embodiment on the display surface of the display device is the same as the method for forming the low refractive index film described above, and it may be appropriately applied to each display (display surface). . Moreover, you may apply | coat so that it may have the hard coat film | membrane, high refractive index film | membrane, etc. which were demonstrated above between the low refractive index film | membrane and a display as needed. That is, a display may be used instead of the plastic substrate.
Further, the method for providing the plastic substrate provided with the low refractive index film of the present embodiment on the display surface of the display device is not particularly limited, and may be mounted on the display device by a known method.
本実施形態の表示装置によれば、本実施形態の低屈折率膜及び反射防止膜の少なくとも一方を備えたプラスチック基材を設けてなるので、防指紋性を有し、視認性(反射防止性)、膜強度に優れた表示装置を得ることができる。
According to the display device of this embodiment, since the plastic substrate provided with at least one of the low refractive index film and the antireflection film of this embodiment is provided, it has fingerprint resistance and visibility (antireflection property). ), A display device having excellent film strength can be obtained.
以下、実施例及び比較例により本発明を具体的に説明するが、本発明はこれらの実施例によって限定されるものではない。なお、後段の説明における記号は下記内容を示すものである。
Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples. In addition, the symbol in description of a back | latter stage shows the following content.
[屈折率]
得られた組成物の屈折率は、組成物を硬化物にしてプリズムカプラ(Metricon社製)を用いて測定した。
組成物を硬化物にする方法は、まず得られた組成物をPETフィルムに乾燥膜厚が1μmになるようにワイヤーバーで塗工した。次いで、60℃で5分間乾燥し、高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるように露光して、硬化物を得た。 [Refractive index]
The refractive index of the obtained composition was measured using a prism coupler (manufactured by Metricon) with the composition as a cured product.
In the method of converting the composition into a cured product, first, the obtained composition was applied to a PET film with a wire bar so that the dry film thickness was 1 μm. Subsequently, it dried at 60 degreeC for 5 minute (s), and it exposed so that it might become 300 mJ / cm < 2 > of ultraviolet rays with a high pressure mercury lamp (120 W / cm), and hardened | cured material was obtained.
得られた組成物の屈折率は、組成物を硬化物にしてプリズムカプラ(Metricon社製)を用いて測定した。
組成物を硬化物にする方法は、まず得られた組成物をPETフィルムに乾燥膜厚が1μmになるようにワイヤーバーで塗工した。次いで、60℃で5分間乾燥し、高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるように露光して、硬化物を得た。 [Refractive index]
The refractive index of the obtained composition was measured using a prism coupler (manufactured by Metricon) with the composition as a cured product.
In the method of converting the composition into a cured product, first, the obtained composition was applied to a PET film with a wire bar so that the dry film thickness was 1 μm. Subsequently, it dried at 60 degreeC for 5 minute (s), and it exposed so that it might become 300 mJ / cm < 2 > of ultraviolet rays with a high pressure mercury lamp (120 W / cm), and hardened | cured material was obtained.
「低屈折率無機微粒子の分散液」
[製造例1]
メソポーラスシリカ微粒子(住友大阪セメント株式会社製 SI-01 一次粒子径5~15nm、微粒子の屈折率1.26)20g、イソプロパノール80gを混合した。次いで、この混合液及びガラスビーズ(φ=0.1mm)150gをビーズミルに投入し、3000回転で5時間分散処理を行った。次いで、ガラスビーズをフィルタ処理により分離し、メソポーラスシリカ微粒子分散液を得た。 "Dispersion of low refractive index inorganic fine particles"
[Production Example 1]
20 g of mesoporous silica fine particles (SI-01 made by Sumitomo Osaka Cement Co., Ltd., primary particle size 5 to 15 nm, fine particle refractive index 1.26) and 80 g of isopropanol were mixed. Next, 150 g of this mixed solution and glass beads (φ = 0.1 mm) were put into a bead mill and subjected to a dispersion treatment at 3000 rpm for 5 hours. Next, the glass beads were separated by filtering to obtain a mesoporous silica fine particle dispersion.
[製造例1]
メソポーラスシリカ微粒子(住友大阪セメント株式会社製 SI-01 一次粒子径5~15nm、微粒子の屈折率1.26)20g、イソプロパノール80gを混合した。次いで、この混合液及びガラスビーズ(φ=0.1mm)150gをビーズミルに投入し、3000回転で5時間分散処理を行った。次いで、ガラスビーズをフィルタ処理により分離し、メソポーラスシリカ微粒子分散液を得た。 "Dispersion of low refractive index inorganic fine particles"
[Production Example 1]
20 g of mesoporous silica fine particles (SI-01 made by Sumitomo Osaka Cement Co., Ltd., primary particle size 5 to 15 nm, fine particle refractive index 1.26) and 80 g of isopropanol were mixed. Next, 150 g of this mixed solution and glass beads (φ = 0.1 mm) were put into a bead mill and subjected to a dispersion treatment at 3000 rpm for 5 hours. Next, the glass beads were separated by filtering to obtain a mesoporous silica fine particle dispersion.
「溶媒」
[製造例2]
メタノールと1-ブタノールとブチルセロソルブを1:1:1の質量比で混合した溶媒を得た。 "solvent"
[Production Example 2]
A solvent in which methanol, 1-butanol and butyl cellosolve were mixed at a mass ratio of 1: 1: 1 was obtained.
[製造例2]
メタノールと1-ブタノールとブチルセロソルブを1:1:1の質量比で混合した溶媒を得た。 "solvent"
[Production Example 2]
A solvent in which methanol, 1-butanol and butyl cellosolve were mixed at a mass ratio of 1: 1: 1 was obtained.
[製造例3]
1-ブタノールとブチルセロソルブとプロピレングリコールモノメチルエーテルを1:1:1の質量比で混合した溶媒を得た。 [Production Example 3]
A solvent in which 1-butanol, butyl cellosolve and propylene glycol monomethyl ether were mixed at a mass ratio of 1: 1: 1 was obtained.
1-ブタノールとブチルセロソルブとプロピレングリコールモノメチルエーテルを1:1:1の質量比で混合した溶媒を得た。 [Production Example 3]
A solvent in which 1-butanol, butyl cellosolve and propylene glycol monomethyl ether were mixed at a mass ratio of 1: 1: 1 was obtained.
「ハードコート膜形成用組成物」
[製造例4]
DPHAが30質量%になるように製造例2の溶媒に加え、イルガキュア184をDPHAの質量に対して3質量%添加して混合し、ハードコート膜形成用組成物を得た。このハードコート膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.50であった。 "Composition for forming hard coat film"
[Production Example 4]
In addition to the solvent of Production Example 2 so that the DPHA was 30% by mass, 3% by mass of Irgacure 184 was added to and mixed with the mass of DPHA to obtain a composition for forming a hard coat film. When the refractive index of the hardened | cured material of this composition for hard-coat film formation was measured with the prism coupler (made by Metricon), it was 1.50.
[製造例4]
DPHAが30質量%になるように製造例2の溶媒に加え、イルガキュア184をDPHAの質量に対して3質量%添加して混合し、ハードコート膜形成用組成物を得た。このハードコート膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.50であった。 "Composition for forming hard coat film"
[Production Example 4]
In addition to the solvent of Production Example 2 so that the DPHA was 30% by mass, 3% by mass of Irgacure 184 was added to and mixed with the mass of DPHA to obtain a composition for forming a hard coat film. When the refractive index of the hardened | cured material of this composition for hard-coat film formation was measured with the prism coupler (made by Metricon), it was 1.50.
「導電性ハードコート膜形成用組成物」
[製造例5]
DPHAを28.5質量%、ATO分散液をATO(屈折率2.0)換算で1.5質量%になるように製造例2の溶媒に加え、イルガキュア184をDPHAとATOの合計質量に対して3質量%添加して混合し、ハードコート膜形成用組成物を得た。このハードコート膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.53であった。 "Composition for forming conductive hard coat film"
[Production Example 5]
DPHA is added to the solvent of Production Example 2 so that 28.5% by mass and ATO dispersion is 1.5% by mass in terms of ATO (refractive index 2.0), and Irgacure 184 is added to the total mass of DPHA and ATO. 3% by mass was added and mixed to obtain a composition for forming a hard coat film. When the refractive index of the hardened | cured material of this composition for hard-coat film formation was measured with the prism coupler (made by Metricon), it was 1.53.
[製造例5]
DPHAを28.5質量%、ATO分散液をATO(屈折率2.0)換算で1.5質量%になるように製造例2の溶媒に加え、イルガキュア184をDPHAとATOの合計質量に対して3質量%添加して混合し、ハードコート膜形成用組成物を得た。このハードコート膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.53であった。 "Composition for forming conductive hard coat film"
[Production Example 5]
DPHA is added to the solvent of Production Example 2 so that 28.5% by mass and ATO dispersion is 1.5% by mass in terms of ATO (refractive index 2.0), and Irgacure 184 is added to the total mass of DPHA and ATO. 3% by mass was added and mixed to obtain a composition for forming a hard coat film. When the refractive index of the hardened | cured material of this composition for hard-coat film formation was measured with the prism coupler (made by Metricon), it was 1.53.
「高屈折率膜形成用組成物」
[製造例6]
DPHAを1.5質量%と、ジルコニア分散液(住友大阪セメント株式会社製 MZ-230X、ジルコニア屈折率2.2)をジルコニア換算で3.5質量%になるように製造例2の溶媒に加え、イルガキュア127をDPHAとジルコニアの合計質量に対して3質量%添加して混合し、高屈折率膜形成用組成物を得た。この高屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.65であった。 "Composition for forming high refractive index film"
[Production Example 6]
Add DPHA to 1.5% by mass and the zirconia dispersion (Sumitomo Osaka Cement Co., Ltd. MZ-230X, zirconia refractive index: 2.2) to 3.5% by mass in terms of zirconia to the solvent of Production Example 2. Irgacure 127 was added in an amount of 3% by mass with respect to the total mass of DPHA and zirconia and mixed to obtain a composition for forming a high refractive index film. The refractive index of the cured product of this high refractive index film-forming composition was 1.65 as measured by a prism coupler (manufactured by Metricon).
[製造例6]
DPHAを1.5質量%と、ジルコニア分散液(住友大阪セメント株式会社製 MZ-230X、ジルコニア屈折率2.2)をジルコニア換算で3.5質量%になるように製造例2の溶媒に加え、イルガキュア127をDPHAとジルコニアの合計質量に対して3質量%添加して混合し、高屈折率膜形成用組成物を得た。この高屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.65であった。 "Composition for forming high refractive index film"
[Production Example 6]
Add DPHA to 1.5% by mass and the zirconia dispersion (Sumitomo Osaka Cement Co., Ltd. MZ-230X, zirconia refractive index: 2.2) to 3.5% by mass in terms of zirconia to the solvent of Production Example 2. Irgacure 127 was added in an amount of 3% by mass with respect to the total mass of DPHA and zirconia and mixed to obtain a composition for forming a high refractive index film. The refractive index of the cured product of this high refractive index film-forming composition was 1.65 as measured by a prism coupler (manufactured by Metricon).
[実施例1]
「低屈折率無機微粒子の表面修飾」
製造例1のメソポーラスシリカ分散液100g、表面処理剤としてアクリロイルオキシ基を有するKBM-5103を3g、加水分解反応のために純水2g、反応触媒として1N硝酸0.1gを混合した後、60℃に加温して3時間攪拌し、表面修飾メソポーラスシリカ分散液を得た。 [Example 1]
"Surface modification of low refractive index inorganic fine particles"
100 g of the mesoporous silica dispersion of Production Example 1, 3 g of KBM-5103 having an acryloyloxy group as a surface treating agent, 2 g of pure water for a hydrolysis reaction, and 0.1 g of 1N nitric acid as a reaction catalyst were mixed, and then 60 ° C. And stirred for 3 hours to obtain a surface-modified mesoporous silica dispersion.
「低屈折率無機微粒子の表面修飾」
製造例1のメソポーラスシリカ分散液100g、表面処理剤としてアクリロイルオキシ基を有するKBM-5103を3g、加水分解反応のために純水2g、反応触媒として1N硝酸0.1gを混合した後、60℃に加温して3時間攪拌し、表面修飾メソポーラスシリカ分散液を得た。 [Example 1]
"Surface modification of low refractive index inorganic fine particles"
100 g of the mesoporous silica dispersion of Production Example 1, 3 g of KBM-5103 having an acryloyloxy group as a surface treating agent, 2 g of pure water for a hydrolysis reaction, and 0.1 g of 1N nitric acid as a reaction catalyst were mixed, and then 60 ° C. And stirred for 3 hours to obtain a surface-modified mesoporous silica dispersion.
「低屈折率膜形成用組成物」
得られた表面修飾メソポーラスシリカ分散液をSiO2量換算で0.8質量%に、EXP-07を1.2質量%になるように製造例3の溶媒に加え、更にイルガキュア127を、SiO2とEXP-07の合計質量に対して3質量%添加して混合し、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.41であった。なおEXP-07は、1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を含む。 "Composition for forming low refractive index film"
The obtained surface-modified mesoporous silica dispersion was added to the solvent of Production Example 3 so that the amount of SiO 2 was 0.8% by mass and EXP-07 was 1.2% by mass, and Irgacure 127 was further added to SiO 2. 3% by mass with respect to the total mass of EXP-07 and mixed, to obtain a composition for forming a low refractive index film. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. EXP-07 includes a crosslinkable compound having one or more methacryloyl groups or acryloyl groups.
得られた表面修飾メソポーラスシリカ分散液をSiO2量換算で0.8質量%に、EXP-07を1.2質量%になるように製造例3の溶媒に加え、更にイルガキュア127を、SiO2とEXP-07の合計質量に対して3質量%添加して混合し、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.41であった。なおEXP-07は、1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を含む。 "Composition for forming low refractive index film"
The obtained surface-modified mesoporous silica dispersion was added to the solvent of Production Example 3 so that the amount of SiO 2 was 0.8% by mass and EXP-07 was 1.2% by mass, and Irgacure 127 was further added to SiO 2. 3% by mass with respect to the total mass of EXP-07 and mixed, to obtain a composition for forming a low refractive index film. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. EXP-07 includes a crosslinkable compound having one or more methacryloyl groups or acryloyl groups.
「膜形成」
得られた低屈折率膜形成用組成物を、デラグラスA(アクリルシート)に、乾燥膜厚が100nmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるようにデラグラスAの両側から露光して硬化させて膜を形成させることで、防指紋性を有する低屈折率膜を備えたアクリルシート(プラスチック基材)を得た。 "Film formation"
The obtained composition for forming a low refractive index film was coated on both sides of Delaglass A (acrylic sheet) by dip coating so that the dry film thickness was 100 nm, and dried by heating at 60 ° C. for 5 minutes. Next, a low-refractive index film having anti-fingerprint properties is formed by forming a film by exposing and curing ultraviolet rays from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm). An acrylic sheet (plastic substrate) was obtained.
得られた低屈折率膜形成用組成物を、デラグラスA(アクリルシート)に、乾燥膜厚が100nmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるようにデラグラスAの両側から露光して硬化させて膜を形成させることで、防指紋性を有する低屈折率膜を備えたアクリルシート(プラスチック基材)を得た。 "Film formation"
The obtained composition for forming a low refractive index film was coated on both sides of Delaglass A (acrylic sheet) by dip coating so that the dry film thickness was 100 nm, and dried by heating at 60 ° C. for 5 minutes. Next, a low-refractive index film having anti-fingerprint properties is formed by forming a film by exposing and curing ultraviolet rays from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm). An acrylic sheet (plastic substrate) was obtained.
[実施例2]
実施例1におけるデラグラスAの片面を、マスキングフィルムにてマスキングした以外は実施例1と同様にして、防指紋性を有する低屈折率膜を備えたアクリルシートを作製した。次いで、マスキングしたフィルムを除去し、片側のアクリルシート面にのみ膜を残すことで、片面のみ防指紋性を有する低屈折率膜を備えたアクリルシートを得た。 [Example 2]
An acrylic sheet provided with a low refractive index film having fingerprint resistance was prepared in the same manner as in Example 1 except that one side of Delaglass A in Example 1 was masked with a masking film. Next, the masked film was removed, and the film was left only on the acrylic sheet surface on one side, whereby an acrylic sheet provided with a low refractive index film having anti-fingerprint properties on only one side was obtained.
実施例1におけるデラグラスAの片面を、マスキングフィルムにてマスキングした以外は実施例1と同様にして、防指紋性を有する低屈折率膜を備えたアクリルシートを作製した。次いで、マスキングしたフィルムを除去し、片側のアクリルシート面にのみ膜を残すことで、片面のみ防指紋性を有する低屈折率膜を備えたアクリルシートを得た。 [Example 2]
An acrylic sheet provided with a low refractive index film having fingerprint resistance was prepared in the same manner as in Example 1 except that one side of Delaglass A in Example 1 was masked with a masking film. Next, the masked film was removed, and the film was left only on the acrylic sheet surface on one side, whereby an acrylic sheet provided with a low refractive index film having anti-fingerprint properties on only one side was obtained.
[実施例3]
製造例4のハードコート膜形成用組成物を、デラグラスAに、乾燥膜厚が3μmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるようにデラグラスAの両側から露光して塗膜を硬化させることで、ハードコート膜付きアクリルシートを得た。 [Example 3]
The composition for forming a hard coat film of Production Example 4 was coated on both sides of Delaglass A by dip coating so that the dry film thickness was 3 μm, and dried by heating at 60 ° C. for 5 minutes. Next, ultraviolet rays were exposed from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm) to cure the coating film, thereby obtaining an acrylic sheet with a hard coat film.
製造例4のハードコート膜形成用組成物を、デラグラスAに、乾燥膜厚が3μmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるようにデラグラスAの両側から露光して塗膜を硬化させることで、ハードコート膜付きアクリルシートを得た。 [Example 3]
The composition for forming a hard coat film of Production Example 4 was coated on both sides of Delaglass A by dip coating so that the dry film thickness was 3 μm, and dried by heating at 60 ° C. for 5 minutes. Next, ultraviolet rays were exposed from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm) to cure the coating film, thereby obtaining an acrylic sheet with a hard coat film.
次いで、得られたハードコート膜付きアクリルシートに、実施例1で作製した低屈折率膜形成用組成物を、実施例1と同様の方法で塗工して硬化させることで、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。
Next, the composition for forming a low refractive index film prepared in Example 1 is applied to the obtained acrylic sheet with a hard coat film by the same method as in Example 1 and cured, thereby improving fingerprint resistance. An acrylic sheet with a hard coat film provided with a low refractive index film was obtained.
[実施例4]
「低屈折率膜形成用組成物」
実施例1の作製手順において、EXP-07の代わりにFH-700を1.2質量%添加した以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.41であった。FH-700は、1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を含む。 [Example 4]
"Composition for forming low refractive index film"
A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that 1.2% by mass of FH-700 was added instead of EXP-07. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. FH-700 includes a crosslinkable compound having one or more methacryloyl or acryloyl groups.
「低屈折率膜形成用組成物」
実施例1の作製手順において、EXP-07の代わりにFH-700を1.2質量%添加した以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.41であった。FH-700は、1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を含む。 [Example 4]
"Composition for forming low refractive index film"
A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that 1.2% by mass of FH-700 was added instead of EXP-07. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. FH-700 includes a crosslinkable compound having one or more methacryloyl or acryloyl groups.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例4で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the composition for forming a low refractive index film obtained in Example 4 was used in the same manner. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例4で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the composition for forming a low refractive index film obtained in Example 4 was used in the same manner. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
[実施例5]
「低屈折率膜形成用組成物の作製」
実施例1の作製手順において、EXP-07の代わりに、DPHAを1.1質量%、F-444を0.1質量%用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.41であった。DPHAは、1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を含む。 [Example 5]
"Preparation of a composition for forming a low refractive index film"
A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that DPHA was used at 1.1 mass% and F-444 was used at 0.1 mass% instead of EXP-07. It was. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. DPHA includes a crosslinkable compound having one or more methacryloyl or acryloyl groups.
「低屈折率膜形成用組成物の作製」
実施例1の作製手順において、EXP-07の代わりに、DPHAを1.1質量%、F-444を0.1質量%用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.41であった。DPHAは、1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物を含む。 [Example 5]
"Preparation of a composition for forming a low refractive index film"
A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that DPHA was used at 1.1 mass% and F-444 was used at 0.1 mass% instead of EXP-07. It was. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. DPHA includes a crosslinkable compound having one or more methacryloyl or acryloyl groups.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例5で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of the composition for forming a low refractive index film prepared in Example 1, the same procedure was used except that the composition for forming a low refractive index film obtained in Example 5 was used. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例5で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of the composition for forming a low refractive index film prepared in Example 1, the same procedure was used except that the composition for forming a low refractive index film obtained in Example 5 was used. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
[実施例6]
「低屈折率無機微粒子の表面修飾」
実施例1の作製手順において、KBM-5103の代わりに、表面処理剤としてメタクリロイルオキシ基を有するKBM-503を用いた以外は同様にして、表面修飾メソポーラスシリカ分散液を得た。 [Example 6]
"Surface modification of low refractive index inorganic fine particles"
A surface-modified mesoporous silica dispersion was obtained in the same manner as in the production procedure of Example 1, except that KBM-503 having a methacryloyloxy group was used as a surface treatment agent instead of KBM-5103.
「低屈折率無機微粒子の表面修飾」
実施例1の作製手順において、KBM-5103の代わりに、表面処理剤としてメタクリロイルオキシ基を有するKBM-503を用いた以外は同様にして、表面修飾メソポーラスシリカ分散液を得た。 [Example 6]
"Surface modification of low refractive index inorganic fine particles"
A surface-modified mesoporous silica dispersion was obtained in the same manner as in the production procedure of Example 1, except that KBM-503 having a methacryloyloxy group was used as a surface treatment agent instead of KBM-5103.
「低屈折率膜形成用組成物の作製」
実施例1の作製手順において、実施例1の表面修飾メソポーラスシリカ分散液の代わりに、実施例6で得られた上記表面修飾メソポーラスシリカ分散液を用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.41であった。 "Preparation of a composition for forming a low refractive index film"
In the same procedure as in Example 1, except that the surface-modified mesoporous silica dispersion obtained in Example 6 was used in place of the surface-modified mesoporous silica dispersion in Example 1, a low refractive index film was formed. A composition was obtained. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
実施例1の作製手順において、実施例1の表面修飾メソポーラスシリカ分散液の代わりに、実施例6で得られた上記表面修飾メソポーラスシリカ分散液を用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.41であった。 "Preparation of a composition for forming a low refractive index film"
In the same procedure as in Example 1, except that the surface-modified mesoporous silica dispersion obtained in Example 6 was used in place of the surface-modified mesoporous silica dispersion in Example 1, a low refractive index film was formed. A composition was obtained. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例6で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, in place of the composition for forming a low refractive index film prepared in Example 1, except that the composition for forming a low refractive index film obtained in Example 6 was used, An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例6で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, in place of the composition for forming a low refractive index film prepared in Example 1, except that the composition for forming a low refractive index film obtained in Example 6 was used, An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
[実施例7]
実施例3の作製手順において、製造例4のハードコート膜形成用組成物の代わりに、製造例5で得られた導電性ハードコート膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えた導電性ハードコート膜付きアクリルシートを得た。すなわち製造例5の導電性ハードコート膜形成用組成物を使用した導電性ハードコート膜付きアクリルシートを使用した以外は、実施例1と同様の方法で防指紋性を有する低屈折率膜を備えた導電性ハードコート膜付きアクリルシートを得た。 [Example 7]
In the production procedure of Example 3, in the same manner as in Example 4 except that the composition for forming a conductive hard coat film obtained in Production Example 5 was used instead of the composition for forming a hard coat film of Production Example 4, anti-fingerprinting An acrylic sheet with a conductive hard coat film provided with a low refractive index film having the property was obtained. That is, a low refractive index film having fingerprint resistance is provided in the same manner as in Example 1 except that an acrylic sheet with a conductive hard coat film using the conductive hard coat film forming composition of Production Example 5 is used. An acrylic sheet with a conductive hard coat film was obtained.
実施例3の作製手順において、製造例4のハードコート膜形成用組成物の代わりに、製造例5で得られた導電性ハードコート膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えた導電性ハードコート膜付きアクリルシートを得た。すなわち製造例5の導電性ハードコート膜形成用組成物を使用した導電性ハードコート膜付きアクリルシートを使用した以外は、実施例1と同様の方法で防指紋性を有する低屈折率膜を備えた導電性ハードコート膜付きアクリルシートを得た。 [Example 7]
In the production procedure of Example 3, in the same manner as in Example 4 except that the composition for forming a conductive hard coat film obtained in Production Example 5 was used instead of the composition for forming a hard coat film of Production Example 4, anti-fingerprinting An acrylic sheet with a conductive hard coat film provided with a low refractive index film having the property was obtained. That is, a low refractive index film having fingerprint resistance is provided in the same manner as in Example 1 except that an acrylic sheet with a conductive hard coat film using the conductive hard coat film forming composition of Production Example 5 is used. An acrylic sheet with a conductive hard coat film was obtained.
[実施例8]
製造例4のハードコート膜形成用組成物を、デラグラスAに、乾燥膜厚が3μmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるようにデラグラスAの両側から露光して塗膜を硬化させることで、ハードコート膜付きアクリルシートを得た。次いで得られたハードコート膜付きアクリルシートに、製造例6で得られた高屈折率塗料を、乾燥膜厚が100nmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで、実施例1の低屈折率膜形成用組成物を、実施例1と同様の方法で塗工して硬化させることで、防指紋性を有する低屈折率膜と高屈折率膜を備えたハードコート膜付きアクリルシートを得た。 [Example 8]
The composition for forming a hard coat film of Production Example 4 was coated on both sides of Delaglass A by dip coating so that the dry film thickness was 3 μm, and dried by heating at 60 ° C. for 5 minutes. Next, ultraviolet rays were exposed from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm) to cure the coating film, thereby obtaining an acrylic sheet with a hard coat film. Next, on the obtained acrylic sheet with a hard coat film, the high refractive index paint obtained in Production Example 6 was coated on both sides by dip coating so that the dry film thickness was 100 nm, and heated at 60 ° C. for 5 minutes. Dried. Next, the low refractive index film-forming composition of Example 1 was applied and cured in the same manner as in Example 1 to provide a low refractive index film and a high refractive index film having anti-fingerprint properties. An acrylic sheet with a hard coat film was obtained.
製造例4のハードコート膜形成用組成物を、デラグラスAに、乾燥膜厚が3μmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで高圧水銀灯(120W/cm)で紫外線を300mJ/cm2のエネルギーとなるようにデラグラスAの両側から露光して塗膜を硬化させることで、ハードコート膜付きアクリルシートを得た。次いで得られたハードコート膜付きアクリルシートに、製造例6で得られた高屈折率塗料を、乾燥膜厚が100nmとなるようにディップコートで両面塗工し、60℃で5分間加熱して乾燥した。次いで、実施例1の低屈折率膜形成用組成物を、実施例1と同様の方法で塗工して硬化させることで、防指紋性を有する低屈折率膜と高屈折率膜を備えたハードコート膜付きアクリルシートを得た。 [Example 8]
The composition for forming a hard coat film of Production Example 4 was coated on both sides of Delaglass A by dip coating so that the dry film thickness was 3 μm, and dried by heating at 60 ° C. for 5 minutes. Next, ultraviolet rays were exposed from both sides of Delaglass A so as to have an energy of 300 mJ / cm 2 with a high-pressure mercury lamp (120 W / cm) to cure the coating film, thereby obtaining an acrylic sheet with a hard coat film. Next, on the obtained acrylic sheet with a hard coat film, the high refractive index paint obtained in Production Example 6 was coated on both sides by dip coating so that the dry film thickness was 100 nm, and heated at 60 ° C. for 5 minutes. Dried. Next, the low refractive index film-forming composition of Example 1 was applied and cured in the same manner as in Example 1 to provide a low refractive index film and a high refractive index film having anti-fingerprint properties. An acrylic sheet with a hard coat film was obtained.
[実施例9]
「低屈折率膜形成用組成物」
実施例1の作製手順において、実施例1で得られた表面修飾メソポーラスシリカ分散液の代わりに、製造例1で得られたメソポーラスシリカ分散液を用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.41であった。 [Example 9]
"Composition for forming low refractive index film"
The low refractive index film formation was performed in the same manner as in the production procedure of Example 1, except that the mesoporous silica dispersion obtained in Production Example 1 was used instead of the surface-modified mesoporous silica dispersion obtained in Example 1. A composition was obtained. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
「低屈折率膜形成用組成物」
実施例1の作製手順において、実施例1で得られた表面修飾メソポーラスシリカ分散液の代わりに、製造例1で得られたメソポーラスシリカ分散液を用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.41であった。 [Example 9]
"Composition for forming low refractive index film"
The low refractive index film formation was performed in the same manner as in the production procedure of Example 1, except that the mesoporous silica dispersion obtained in Production Example 1 was used instead of the surface-modified mesoporous silica dispersion obtained in Example 1. A composition was obtained. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例9で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Film formation"
In the formation procedure of Example 3, instead of the composition for forming a low refractive index film prepared in Example 1, except that the composition for forming a low refractive index film obtained in Example 9 was used, An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例9で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Film formation"
In the formation procedure of Example 3, instead of the composition for forming a low refractive index film prepared in Example 1, except that the composition for forming a low refractive index film obtained in Example 9 was used, An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
[実施例10]
「低屈折率膜形成用組成物」
実施例1の作製手順において、実施例1で得られた表面修飾メソポーラスシリカ分散液の代わりに、コロイダルシリカ(日産化学工業株式会社製 IPA-st)を用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.46であった。 [Example 10]
"Composition for forming low refractive index film"
A low refractive index was similarly obtained except that colloidal silica (IPA-st manufactured by Nissan Chemical Industries, Ltd.) was used in place of the surface-modified mesoporous silica dispersion obtained in Example 1 in the production procedure of Example 1. A film forming composition was obtained. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.46.
「低屈折率膜形成用組成物」
実施例1の作製手順において、実施例1で得られた表面修飾メソポーラスシリカ分散液の代わりに、コロイダルシリカ(日産化学工業株式会社製 IPA-st)を用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率を、プリズムカプラ(Metricon社製)で測定したところ、1.46であった。 [Example 10]
"Composition for forming low refractive index film"
A low refractive index was similarly obtained except that colloidal silica (IPA-st manufactured by Nissan Chemical Industries, Ltd.) was used in place of the surface-modified mesoporous silica dispersion obtained in Example 1 in the production procedure of Example 1. A film forming composition was obtained. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.46.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例10で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the same procedure was used except that the composition for forming a low refractive index film obtained in Example 10 was used. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、実施例10で得られた低屈折率膜形成用組成物を用いた以外は同様にして、防指紋性を有する低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the same procedure was used except that the composition for forming a low refractive index film obtained in Example 10 was used. An acrylic sheet with a hard coat film provided with a low refractive index film having fingerprint resistance was obtained.
[比較例1]
「低屈折率膜形成用組成物」
実施例1の作製手順において、EXP-07の代わりにDPHAを用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.41であった。この組成物は、パーフルオロ基を有しかつ光反応性官能基を有さない化合物を含まない。 [Comparative Example 1]
"Composition for forming low refractive index film"
A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that DPHA was used instead of EXP-07. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. This composition does not contain a compound having a perfluoro group and having no photoreactive functional group.
「低屈折率膜形成用組成物」
実施例1の作製手順において、EXP-07の代わりにDPHAを用いた以外は同様にして、低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.41であった。この組成物は、パーフルオロ基を有しかつ光反応性官能基を有さない化合物を含まない。 [Comparative Example 1]
"Composition for forming low refractive index film"
A composition for forming a low refractive index film was obtained in the same manner as in the production procedure of Example 1, except that DPHA was used instead of EXP-07. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon) and found to be 1.41. This composition does not contain a compound having a perfluoro group and having no photoreactive functional group.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、比較例1で得られた低屈折率膜形成用組成物を用いた以外は同様にして、低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the composition for forming a low refractive index film obtained in Comparative Example 1 was used in the same manner. An acrylic sheet with a hard coat film provided with a low refractive index film was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、比較例1で得られた低屈折率膜形成用組成物を用いた以外は同様にして、低屈折率膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, instead of using the composition for forming a low refractive index film prepared in Example 1, the composition for forming a low refractive index film obtained in Comparative Example 1 was used in the same manner. An acrylic sheet with a hard coat film provided with a low refractive index film was obtained.
[比較例2]
「低屈折率膜形成用組成物」
実施例1の作製手順において、表面修飾メソポーラスシリカ分散液をSiO2量換算で0.8質量%使用する、及び、EXP-07を1.2質量%使用する代わりに、EXP-07を2.0質量%用いた以外は同様にして、無機微粒子を含まない低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.50であった。 [Comparative Example 2]
"Composition for forming low refractive index film"
Instead of using 0.8% by mass of the surface-modified mesoporous silica dispersion in terms of SiO 2 and 1.2% by mass of EXP-07 in the production procedure of Example 1, 2. A composition for forming a low refractive index film containing no inorganic fine particles was obtained in the same manner except that 0% by mass was used. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon), and was 1.50.
「低屈折率膜形成用組成物」
実施例1の作製手順において、表面修飾メソポーラスシリカ分散液をSiO2量換算で0.8質量%使用する、及び、EXP-07を1.2質量%使用する代わりに、EXP-07を2.0質量%用いた以外は同様にして、無機微粒子を含まない低屈折率膜形成用組成物を得た。この低屈折率膜形成用組成物の硬化物の屈折率をプリズムカプラ(Metricon社製)で測定したところ、1.50であった。 [Comparative Example 2]
"Composition for forming low refractive index film"
Instead of using 0.8% by mass of the surface-modified mesoporous silica dispersion in terms of SiO 2 and 1.2% by mass of EXP-07 in the production procedure of Example 1, 2. A composition for forming a low refractive index film containing no inorganic fine particles was obtained in the same manner except that 0% by mass was used. The refractive index of the cured product of the composition for forming a low refractive index film was measured by a prism coupler (manufactured by Metricon), and was 1.50.
「膜の形成」
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、比較例2で得られた組成物を用いた以外は同様にして、防指紋性を有する膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, a film having fingerprint resistance was similarly obtained except that the composition obtained in Comparative Example 2 was used instead of the composition for forming a low refractive index film prepared in Example 1. An acrylic sheet provided with a hard coat film was obtained.
実施例3の形成手順において、実施例1で作製した低屈折率膜形成用組成物の代わりに、比較例2で得られた組成物を用いた以外は同様にして、防指紋性を有する膜を備えたハードコート膜付きアクリルシートを得た。 "Membrane formation"
In the formation procedure of Example 3, a film having fingerprint resistance was similarly obtained except that the composition obtained in Comparative Example 2 was used instead of the composition for forming a low refractive index film prepared in Example 1. An acrylic sheet provided with a hard coat film was obtained.
実施例1~10及び比較例1、2各々で得られたアクリルシートの防指紋性、透明性、可視光反射率、導電性、及び耐スチールウール性の各特性について、下記の方法により評価した。評価結果を表2に示す。
Each of the acrylic sheet obtained in each of Examples 1 to 10 and Comparative Examples 1 and 2 was evaluated for the anti-fingerprint property, transparency, visible light reflectance, conductivity, and steel wool resistance by the following methods. . The evaluation results are shown in Table 2.
(1)耐指紋性の評価(トリオレイン酸拭き取り評価)
膜上にトリオレイン酸を1滴滴下し、クリーンワイパーを用いて10往復回数拭き取った。トリオレイン酸の滴下前及び10往復回数拭き取り後それぞれにおける膜のヘイズ(%)を、ヘイズメーターTC-1800MK/II(日本電色社製)を用いて測定し、トリオレイン酸の滴下前のヘイズと10往復回数拭き取り後のヘイズとの差(Δヘイズ値)を求めた。なおトリオレイン酸は、指紋の主成分の皮脂の一つであり、付着性が少ないほど耐指紋性が良い。 (1) Evaluation of fingerprint resistance (trioleic acid wiping evaluation)
One drop of trioleic acid was dropped on the film and wiped 10 times with a clean wiper. The haze (%) of the film before the trioleic acid was dropped and after 10 reciprocations were measured using a haze meter TC-1800MK / II (manufactured by Nippon Denshoku), and the haze before the trioleic acid was dropped. And the difference between the haze after wiping 10 times (Δhaze value). Trioleic acid is one of the main components of fingerprints, and the lower the adhesion, the better the fingerprint resistance.
膜上にトリオレイン酸を1滴滴下し、クリーンワイパーを用いて10往復回数拭き取った。トリオレイン酸の滴下前及び10往復回数拭き取り後それぞれにおける膜のヘイズ(%)を、ヘイズメーターTC-1800MK/II(日本電色社製)を用いて測定し、トリオレイン酸の滴下前のヘイズと10往復回数拭き取り後のヘイズとの差(Δヘイズ値)を求めた。なおトリオレイン酸は、指紋の主成分の皮脂の一つであり、付着性が少ないほど耐指紋性が良い。 (1) Evaluation of fingerprint resistance (trioleic acid wiping evaluation)
One drop of trioleic acid was dropped on the film and wiped 10 times with a clean wiper. The haze (%) of the film before the trioleic acid was dropped and after 10 reciprocations were measured using a haze meter TC-1800MK / II (manufactured by Nippon Denshoku), and the haze before the trioleic acid was dropped. And the difference between the haze after wiping 10 times (Δhaze value). Trioleic acid is one of the main components of fingerprints, and the lower the adhesion, the better the fingerprint resistance.
得られたΔヘイズ値に従って、下記基準に基づき防指紋性の評価を行った。なおヘイズ(%)は、いずれも、膜の形成に基材として用いられた厚さ1mmのアクリルシートであるデラグラスAを介在して測定された値である。Δヘイズ値は小さいほど好ましい。
A:Δヘイズ値が0.5未満
B:Δヘイズ値が0.5以上かつ1.0未満
C:Δヘイズ値が1.0以上かつ3.0未満
D:Δヘイズ値が3.0以上かつ5.0未満
E:Δヘイズ値が5.0以上 According to the obtained Δhaze value, the anti-fingerprint property was evaluated based on the following criteria. The haze (%) is a value measured through Delaglass A, which is an acrylic sheet having a thickness of 1 mm used as a base material for film formation. The smaller the Δhaze value, the better.
A: Δhaze value is less than 0.5 B: Δhaze value is 0.5 or more and less than 1.0 C: Δhaze value is 1.0 or more and less than 3.0 D: Δhaze value is 3.0 or more And less than 5.0 E: Δhaze value is 5.0 or more
A:Δヘイズ値が0.5未満
B:Δヘイズ値が0.5以上かつ1.0未満
C:Δヘイズ値が1.0以上かつ3.0未満
D:Δヘイズ値が3.0以上かつ5.0未満
E:Δヘイズ値が5.0以上 According to the obtained Δhaze value, the anti-fingerprint property was evaluated based on the following criteria. The haze (%) is a value measured through Delaglass A, which is an acrylic sheet having a thickness of 1 mm used as a base material for film formation. The smaller the Δhaze value, the better.
A: Δhaze value is less than 0.5 B: Δhaze value is 0.5 or more and less than 1.0 C: Δhaze value is 1.0 or more and less than 3.0 D: Δhaze value is 3.0 or more And less than 5.0 E: Δhaze value is 5.0 or more
(2)透明性の評価
膜の全光線透過率(T(%))を、ヘイズメーターTC-1800MK/II(日本電色社製)を用いて測定した。その際、膜を施さない未処理のデラグラスAと、各膜に基材として用いられたデラグラスAを介在させて測定した全光線透過率の差ΔT値(膜+基材の全光線透過率-基材の全光線透過率)を計算した。得られたΔT値の値に従って、下記基準により透明性の評価を行った。ΔT値は大きい値ほど好ましい。
A:ΔT値が+3.0以上
B:ΔT値が0.0以上かつ+3.0未満
C:ΔT値が-0.6以上かつ0.0未満
D:ΔT値が-0.6未満 (2) Evaluation of transparency The total light transmittance (T (%)) of the film was measured using a haze meter TC-1800MK / II (manufactured by Nippon Denshoku). At that time, the difference ΔT value of the total light transmittance measured by interposing the untreated Delaglass A without the film and Delaglass A used as the base material in each film (total light transmittance of the film + the base material− The total light transmittance of the substrate was calculated. According to the obtained ΔT value, transparency was evaluated according to the following criteria. A larger ΔT value is preferable.
A: ΔT value is +3.0 or more B: ΔT value is 0.0 or more and less than +3.0 C: ΔT value is −0.6 or more and less than 0.0 D: ΔT value is less than −0.6
膜の全光線透過率(T(%))を、ヘイズメーターTC-1800MK/II(日本電色社製)を用いて測定した。その際、膜を施さない未処理のデラグラスAと、各膜に基材として用いられたデラグラスAを介在させて測定した全光線透過率の差ΔT値(膜+基材の全光線透過率-基材の全光線透過率)を計算した。得られたΔT値の値に従って、下記基準により透明性の評価を行った。ΔT値は大きい値ほど好ましい。
A:ΔT値が+3.0以上
B:ΔT値が0.0以上かつ+3.0未満
C:ΔT値が-0.6以上かつ0.0未満
D:ΔT値が-0.6未満 (2) Evaluation of transparency The total light transmittance (T (%)) of the film was measured using a haze meter TC-1800MK / II (manufactured by Nippon Denshoku). At that time, the difference ΔT value of the total light transmittance measured by interposing the untreated Delaglass A without the film and Delaglass A used as the base material in each film (total light transmittance of the film + the base material− The total light transmittance of the substrate was calculated. According to the obtained ΔT value, transparency was evaluated according to the following criteria. A larger ΔT value is preferable.
A: ΔT value is +3.0 or more B: ΔT value is 0.0 or more and less than +3.0 C: ΔT value is −0.6 or more and less than 0.0 D: ΔT value is less than −0.6
(3)可視光反射率の評価
膜の10°正反射率を、分光光度計U-4100(株式会社日立製作所製)を用いて測定した。得られた測定値に比視感度値を乗じて膜の可視光反射率を算出した。可視光反射率は小さいほど好ましい。 (3) Evaluation of visible light reflectance The 10 ° regular reflectance of the film was measured using a spectrophotometer U-4100 (manufactured by Hitachi, Ltd.). The visible light reflectance of the film was calculated by multiplying the obtained measured value by the specific visibility value. The smaller the visible light reflectance, the better.
膜の10°正反射率を、分光光度計U-4100(株式会社日立製作所製)を用いて測定した。得られた測定値に比視感度値を乗じて膜の可視光反射率を算出した。可視光反射率は小さいほど好ましい。 (3) Evaluation of visible light reflectance The 10 ° regular reflectance of the film was measured using a spectrophotometer U-4100 (manufactured by Hitachi, Ltd.). The visible light reflectance of the film was calculated by multiplying the obtained measured value by the specific visibility value. The smaller the visible light reflectance, the better.
(4)導電性の評価
膜の表面抵抗を、抵抗率計ロレスタAP(三菱化学株式会社製)を用いて測定した。得られた表面抵抗の値に従って、下記基準により導電性の評価を行った。
A:1×109Ω/□未満
B:1×109Ω/□以上かつ1×1011Ω/□未満
C:1×1011Ω/□以上かつ1×1013Ω/□未満
D:1×1013Ω/□以上 (4) Evaluation of conductivity The surface resistance of the film was measured using a resistivity meter Loresta AP (manufactured by Mitsubishi Chemical Corporation). According to the obtained surface resistance value, the conductivity was evaluated according to the following criteria.
A: Less than 1 × 10 9 Ω / □ B: 1 × 10 9 Ω / □ or more and less than 1 × 10 11 Ω / □ C: 1 × 10 11 Ω / □ or more and less than 1 × 10 13 Ω / □ D: 1 × 10 13 Ω / □ or more
膜の表面抵抗を、抵抗率計ロレスタAP(三菱化学株式会社製)を用いて測定した。得られた表面抵抗の値に従って、下記基準により導電性の評価を行った。
A:1×109Ω/□未満
B:1×109Ω/□以上かつ1×1011Ω/□未満
C:1×1011Ω/□以上かつ1×1013Ω/□未満
D:1×1013Ω/□以上 (4) Evaluation of conductivity The surface resistance of the film was measured using a resistivity meter Loresta AP (manufactured by Mitsubishi Chemical Corporation). According to the obtained surface resistance value, the conductivity was evaluated according to the following criteria.
A: Less than 1 × 10 9 Ω / □ B: 1 × 10 9 Ω / □ or more and less than 1 × 10 11 Ω / □ C: 1 × 10 11 Ω / □ or more and less than 1 × 10 13 Ω / □ D: 1 × 10 13 Ω / □ or more
(5)耐スチールウール性の評価
膜上にて、スチールウール(#0000)を250g/cm2の荷重下にて、10往復させた(1往復:200mm)。その後、膜の表面を目視にて評価を行った。ここでは、下記基準により耐スチールウール性の評価を行った。キズは少ないほど良い。
A:キズほぼなし(5mm以下のキズが1本以下)
B:キズ2本以下
C:キズ3本以上、10本以下
D:キズ11本以上 (5) Evaluation of steel wool resistance On the membrane, steel wool (# 0000) was reciprocated 10 times under a load of 250 g / cm 2 (1 reciprocation: 200 mm). Thereafter, the surface of the film was visually evaluated. Here, the steel wool resistance was evaluated according to the following criteria. The fewer scratches, the better.
A: Almost no scratches (no more than 5mm scratches)
B: 2 or less scratches C: 3 or more scratches, 10 or less D: 11 or more scratches
膜上にて、スチールウール(#0000)を250g/cm2の荷重下にて、10往復させた(1往復:200mm)。その後、膜の表面を目視にて評価を行った。ここでは、下記基準により耐スチールウール性の評価を行った。キズは少ないほど良い。
A:キズほぼなし(5mm以下のキズが1本以下)
B:キズ2本以下
C:キズ3本以上、10本以下
D:キズ11本以上 (5) Evaluation of steel wool resistance On the membrane, steel wool (# 0000) was reciprocated 10 times under a load of 250 g / cm 2 (1 reciprocation: 200 mm). Thereafter, the surface of the film was visually evaluated. Here, the steel wool resistance was evaluated according to the following criteria. The fewer scratches, the better.
A: Almost no scratches (no more than 5mm scratches)
B: 2 or less scratches C: 3 or more scratches, 10 or less D: 11 or more scratches
(6)撥水性の評価
接触角計CA-X(協和界面化学株式会社製)を用いて水の接触角を測定し、以下の基準にて評価した。水の接触角は大きいほど撥水性が高く汚れの付着を防ぐことができる。
○:90度以上
△:85度以上90度未満
×:85度未満 (6) Evaluation of water repellency The contact angle of water was measured using a contact angle meter CA-X (manufactured by Kyowa Interface Chemical Co., Ltd.) and evaluated according to the following criteria. The larger the contact angle of water, the higher the water repellency and the adhesion of dirt can be prevented.
○: 90 degrees or more Δ: 85 degrees or more and less than 90 degrees ×: less than 85 degrees
接触角計CA-X(協和界面化学株式会社製)を用いて水の接触角を測定し、以下の基準にて評価した。水の接触角は大きいほど撥水性が高く汚れの付着を防ぐことができる。
○:90度以上
△:85度以上90度未満
×:85度未満 (6) Evaluation of water repellency The contact angle of water was measured using a contact angle meter CA-X (manufactured by Kyowa Interface Chemical Co., Ltd.) and evaluated according to the following criteria. The larger the contact angle of water, the higher the water repellency and the adhesion of dirt can be prevented.
○: 90 degrees or more Δ: 85 degrees or more and less than 90 degrees ×: less than 85 degrees
(7)親油性の評価
接触角計CA-X(協和界面化学株式会社製)を用いてヘキサデカンの接触角を測定し、以下の基準にて評価した。40°未満であると撥水かつ親油性の膜として好ましく使用できる。
○:30度未満
△:30度以上40度未満
×:40度以上 (7) Evaluation of lipophilicity The contact angle of hexadecane was measured using a contact angle meter CA-X (manufactured by Kyowa Interface Chemical Co., Ltd.) and evaluated according to the following criteria. When it is less than 40 °, it can be preferably used as a water-repellent and lipophilic film.
○: Less than 30 degrees △: 30 degrees or more and less than 40 degrees ×: 40 degrees or more
接触角計CA-X(協和界面化学株式会社製)を用いてヘキサデカンの接触角を測定し、以下の基準にて評価した。40°未満であると撥水かつ親油性の膜として好ましく使用できる。
○:30度未満
△:30度以上40度未満
×:40度以上 (7) Evaluation of lipophilicity The contact angle of hexadecane was measured using a contact angle meter CA-X (manufactured by Kyowa Interface Chemical Co., Ltd.) and evaluated according to the following criteria. When it is less than 40 °, it can be preferably used as a water-repellent and lipophilic film.
○: Less than 30 degrees △: 30 degrees or more and less than 40 degrees ×: 40 degrees or more
本発明によれば、防指紋性を有し、反射防止性に優れ、かつ耐擦傷性等の膜強度に優れる低屈折率膜形成用組成物を提供できる。
According to the present invention, it is possible to provide a composition for forming a low refractive index film having fingerprint resistance, excellent antireflection properties, and excellent film strength such as scratch resistance.
10 低屈折率膜を備えたプラスチック基材
11 プラスチック基材
12 低屈折率膜
13 ハードコート膜
14 高屈折率膜
100 表示装置
101 筐体
102 表示部 DESCRIPTION OFSYMBOLS 10 Plastic base material provided with low refractive index film | membrane 11 Plastic base material 12 Low refractive index film | membrane 13 Hard coat film | membrane 14 High refractive index film | membrane 100 Display apparatus 101 Case 102 Display part
11 プラスチック基材
12 低屈折率膜
13 ハードコート膜
14 高屈折率膜
100 表示装置
101 筐体
102 表示部 DESCRIPTION OF
Claims (9)
- モノマー中に1個以上のメタクリロイル基又はアクリロイル基を有する架橋性化合物、
パーフルオロ基を有しかつ光反応性官能基を有さない化合物、及び
屈折率が1.17以上かつ1.40以下の無機粒子、
を含有することを特徴とする、低屈折膜形成用組成物。 A crosslinkable compound having at least one methacryloyl group or acryloyl group in the monomer;
A compound having a perfluoro group and having no photoreactive functional group, and inorganic particles having a refractive index of 1.17 or more and 1.40 or less,
A composition for forming a low refractive film, comprising: - 前記無機粒子は、その粒子表面をアクリロイルオキシ基、メタクリロイルオキシ基のうち少なくとも一方を含む有機基で修飾されていることを特徴とする、請求項1記載の低屈折膜形成用組成物。 The composition for forming a low refractive film according to claim 1, wherein the inorganic particles are modified with an organic group containing at least one of an acryloyloxy group and a methacryloyloxy group on the particle surface.
- 前記無機粒子の平均一次粒子径は、3nm以上かつ100nm以下であることを特徴とする、請求項1記載の低屈折膜形成用組成物。 The composition for forming a low refractive film according to claim 1, wherein the average primary particle diameter of the inorganic particles is 3 nm or more and 100 nm or less.
- 前記無機粒子は、メソポーラスシリカ微粒子であることを特徴とする、請求項1記載の低屈折膜形成用組成物。 The composition for forming a low refractive film according to claim 1, wherein the inorganic particles are mesoporous silica fine particles.
- 請求項1記載の低屈折膜形成用組成物により形成されることを特徴とする、低屈折率膜。 A low refractive index film formed by the composition for forming a low refractive film according to claim 1.
- 請求項5記載の低屈折率膜をプラスチック基材上に備えたことを特徴とするプラスチック基材。 A plastic substrate comprising the low refractive index film according to claim 5 on a plastic substrate.
- 表示面に、請求項5記載の低屈折率膜を備えたことを特徴とする表示装置。 A display device comprising the low refractive index film according to claim 5 on a display surface.
- 低屈折率膜がプラスチック基材上に備えられている、請求項7記載の表示装置。 The display device according to claim 7, wherein the low refractive index film is provided on a plastic substrate.
- 請求項1記載の低屈折膜形成用組成物の、低屈折膜の形成への使用。 Use of the composition for forming a low refractive film according to claim 1 for forming a low refractive film.
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