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WO2011092764A1 - Flat plate surface roughening device and pertinent method - Google Patents

Flat plate surface roughening device and pertinent method Download PDF

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Publication number
WO2011092764A1
WO2011092764A1 PCT/JP2010/006164 JP2010006164W WO2011092764A1 WO 2011092764 A1 WO2011092764 A1 WO 2011092764A1 JP 2010006164 W JP2010006164 W JP 2010006164W WO 2011092764 A1 WO2011092764 A1 WO 2011092764A1
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WIPO (PCT)
Prior art keywords
flat plate
roughening
glass substrate
liquid
flat
Prior art date
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PCT/JP2010/006164
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French (fr)
Japanese (ja)
Inventor
緒方正一
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シャープ株式会社
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Publication of WO2011092764A1 publication Critical patent/WO2011092764A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/015—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor of television picture tube viewing panels, headlight reflectors or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/005—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents using brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
    • B24B7/245—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass discontinuous
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/08—Glass having a rough surface

Definitions

  • the present invention relates to a flat plate roughening apparatus and method for adjusting the surface roughness of a flat plate such as a glass substrate.
  • a transparent electrode, a semiconductor element, and the like are formed on the surface of a glass substrate used for a liquid crystal display or the like. Since it is necessary to keep a cell gap on the order of microns when the array substrate provided with such an electrode and the color filter substrate are overlapped, the surface of the glass substrate is kept as flat as possible.
  • Patent Document 1 a method of manufacturing a glass substrate for display is known in which a slurry containing liquid and abrasive grains is sprayed from a nozzle onto one surface of a glass substrate together with compressed air. ing.
  • the slurry scatters when spraying the slurry together with the compressed air, so that the slurry adheres to the opposite surface that does not need to be roughened, and the quality deteriorates. May be incurred.
  • the present invention has been made in view of the above points, and the object of the present invention is to perform a roughening process on only one surface of the flat plate with a simple configuration and damage the flat plate from the mounting surface. Or to prevent electrostatic breakdown.
  • the roughening liquid is applied to only one surface of the flat plate to perform the roughening treatment.
  • the flat surface roughening apparatus is A transport roller for transporting the flat plate; A processing roller that contacts only one surface of the flat plate; The processing roller includes a spray nozzle that sprays a roughening liquid that roughens the surface of the flat plate.
  • the processing roller since the processing roller is brought into contact with only one surface while the flat plate is being conveyed and the roughening liquid sprayed from the spray nozzle is applied, the roughening liquid is directly applied to the flat plate.
  • the surface roughening liquid does not wrap around to the opposite surface as in the case of spraying on, and the quality of the flat plate is not deteriorated.
  • the processing roller continuously extends perpendicular to the traveling direction of the flat plate.
  • the processing rollers are provided side by side in the direction perpendicular to the traveling direction of the flat plate.
  • the surface not used as a substrate is roughened to peel off the flat plate, and the flat plate cut out in the lower process is kept flat, so it is handled while maintaining quality. Becomes easy. For this reason, a flat plate is effectively used.
  • the interval between the processing rollers is variable.
  • the roughening liquid is an etching solution that dissolves the flat plate.
  • the processing roller is configured to rotate in a direction opposite to the conveying roller.
  • the roughening liquid is rubbed into one surface of the flat plate by rotating the processing roller in the direction opposite to the conveying direction of the flat plate. For this reason, the roughening process is reliably performed.
  • the roughening treatment method for the flat plate is as follows: While transporting the flat plate with transport rollers, The processing roller is brought into contact with only one surface of the flat plate, Spraying the roughening liquid to roughen the surface of the flat plate on the processing roller; Roughen one side of the flat plate, The roughened flat plate is washed and dried.
  • the processing roller since the processing roller is brought into contact with only one surface while the flat plate is being conveyed and the roughening liquid sprayed from the spray nozzle is applied, the roughening liquid is directly applied to the flat plate.
  • the surface roughening liquid does not wrap around to the opposite surface as in the case of spraying on, and the quality of the flat plate is not deteriorated. Since the flat plate after the roughening treatment is washed and dried, the progress of the roughening is appropriately stopped and does not adversely affect the subsequent steps.
  • the processing roller is brought into contact with only one surface of the flat plate, and the surface of the flat plate is roughened by the processing roller.
  • the liquid By spraying the liquid to roughen only one side of the flat plate, damage is caused when the flat plate is removed from the mounting surface by performing roughening treatment on only one side of the flat plate with a simple configuration. Or electrostatic breakdown can be reliably prevented.
  • FIG. 1 shows an outline of a roughening treatment apparatus 1 for a glass substrate according to an embodiment of the present invention, and the roughening treatment apparatus 1 is provided in a roughening treatment chamber 2.
  • the roughening treatment apparatus 1 includes a plurality of transport rollers 3 that transport a glass substrate 50 as a flat plate carried in from the inlet 2 a of the roughening treatment chamber 2 to the outlet 2 b of the roughening treatment chamber 2.
  • the glass substrate 50 is a mother glass substrate made of, for example, aluminosilicate glass used for a liquid crystal display.
  • the transport roller 3 has a rotating shaft 3 a perpendicular to the traveling direction of the glass substrate 50, and a pair of upper and lower ones are arranged at intervals in the traveling direction of the plurality of glass substrates 50.
  • the shape, material, rotational speed and the like of the transport roller 3 are not particularly limited and may be set arbitrarily.
  • the upper and lower transport rollers 3 are configured to smoothly transport the glass substrate 50 by rotating in opposite directions.
  • An air knife 2c is provided in the vicinity of the outlet 2b of the roughening treatment chamber 2, and compressed air is jetted from the air knife 2c.
  • the surface roughening apparatus 1 further includes a processing roller 4 that contacts only one surface of the glass substrate 50 (that is, the back surface on which no electrode or the like is provided).
  • the processing roller 4 has a rotating shaft 4a perpendicular to the traveling direction of the glass substrate 50, and almost the entire area of the rotating shaft 4a that contacts the glass substrate 50 is covered with the brush 4b.
  • the outer periphery may be covered with a member that appropriately absorbs liquid, such as sponge or cloth, instead of the brush 4b.
  • the processing roller 4 is configured to rotate in a direction opposite to the conveying roller 3 provided side by side with the processing roller 4.
  • the roughening treatment apparatus 1 includes a spray nozzle 7 that sprays a roughening liquid 6 that roughens the surface of the glass substrate 50 onto the processing roller 4.
  • the spray nozzle 7 includes an opening formed in the roughened liquid supply pipe 8 extending perpendicularly to the traveling direction of the glass substrate 50, for example.
  • a roughening liquid 6 is appropriately supplied to the roughening liquid supply pipe 8 from a tank or the like (not shown). The distance between the spray nozzle 7 and the brush 4b is set so that the roughened liquid 6 does not scatter other than the brush 4b.
  • the roughening liquid 6 is a general-purpose etching solution that dissolves the glass substrate 50 and includes hydrofluoric acid, nitric acid, perchloric acid, and the like. In other words, the etching solution used in other processes can be diverted, so that an increase in cost is suppressed.
  • the carried-in mother glass substrate is subjected to a cleaning process using a cleaning liquid such as fresh water to remove foreign substances attached to the surface, and the cleaned glass substrate 50 is carried in from the inlet 2a of the roughening treatment chamber 2. .
  • the glass substrate 50 is transported by the transport roller 3.
  • the processing roller 4 comes into contact with the back surface of the glass substrate 50.
  • the roughening liquid 6 supplied to the roughening liquid supply pipe 8 is ejected from the ejection nozzle 7, and the roughening liquid 6 is sufficiently contained in the brush 4 b. Since the processing roller 4 rotates in the direction opposite to the conveying direction of the glass substrate 50, the roughening liquid 6 is reliably applied so as to be rubbed into the back surface of the glass substrate 50. And the back surface of the glass substrate 50 with which the roughening liquid 6 was apply
  • the roughened liquid 6 and the like are blown off from the glass substrate 50 further transported by the transport roller 3 by the compressed air sprayed from the air knife 2c before the outlet 2b.
  • the roughened liquid 6 is completely removed from the glass substrate 50 carried into the cleaning chamber (not shown) by the cleaning liquid in the cleaning chamber. For this reason, the progress of the roughening is appropriately stopped and does not adversely affect the post-process.
  • the glass substrate 50 carried into a drying chamber (not shown) is dried in the drying chamber.
  • the processing roller 4 extending perpendicularly to the traveling direction of the glass substrate 50 is brought into contact with only the back surface, and the roughened liquid 6 ejected from the spray nozzle 7 is almost disposed on the back surface side. Since the coating is applied to the entire surface, the roughening liquid 6 does not wrap around the surface on which the electrode or the like is provided in the subsequent process, and the quality of the glass substrate 50 is not deteriorated. Further, by performing such a process at an early stage when the glass substrate 50 is carried in, the back surface thereof is appropriately roughened. For this reason, in the subsequent lower processes, when the glass substrate 50 is moved to another position after being placed on the flat surface, the glass substrate 50 can be easily peeled off from the flat surface.
  • the glass substrate roughening apparatus According to the glass substrate roughening apparatus according to the present embodiment, damage is caused when the glass substrate 50 is peeled off from the mounting surface by performing the roughening process on only one surface of the glass substrate 50 with a simple configuration. Or electrostatic breakdown can be reliably prevented.
  • FIG. 3 shows a modification of the embodiment of the present invention, which differs from the above embodiment in that the configuration of the processing roller 104 is different.
  • the brush 4 b of the processing roller 4 extends to a length equivalent to the width of the glass substrate 50 in the direction perpendicular to the traveling direction of the glass substrate 50, and the entire back surface of the glass substrate 50 is roughened.
  • the brushes 104b of the processing roller 104 are provided side by side with a space perpendicular to the traveling direction of the glass substrate 50.
  • the processing roller 104 having the brush 104b is arranged at a predetermined interval in the axial direction of the rotating shaft 104a.
  • the interval at which the processing rollers 104 are arranged in the traveling direction of the glass substrate 50 and the width of the brush 104 b are determined by the screen size chamfered from the glass substrate 50.
  • the distance between the spray nozzle 7 and the brush 104b is set so that the roughened liquid 6 does not scatter other than the brush 104b.
  • the surface that is not used as a screen is roughened, so that the surface roughness can be sufficiently roughened with an emphasis on peelability.
  • the flat plate cut out in the lower process is kept flat while the surface not used as a substrate is roughened to peel off the flat plate, so that it is easy to handle while maintaining quality. Become.
  • the same roughening treatment apparatus 1 can be used because the configuration of the brush 104b only needs to be changed accordingly.
  • the present invention may be configured as follows with respect to the above embodiment.
  • the flat plate is a mother glass substrate used for a liquid crystal display, but is not limited thereto, and may be a glass substrate used for a plasma display or the like.
  • the present invention can be applied to any flat plate whose surface roughness is small and damage or electrostatic breakdown becomes a problem at the time of peeling from the mounting surface.
  • the present invention is useful for an apparatus and a method for roughening a flat plate such as a glass substrate used for a liquid crystal display or the like.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
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  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Cleaning In General (AREA)

Abstract

Processing rollers (4) are made to abut only one surface of a glass substrate (50) while the glass substrate (50) is conveyed by conveying rollers (3). Surface roughening liquid (6) which roughens the surface of the glass substrate (50) is injected to these processing rollers (4), leading to one surface of the glass substrate (50) being roughened, with the result that the surface roughness is adjusted. Due to the above, under a simple configuration, surface roughening treatment is performed only on said one surface of the glass substrate, with the result that when the glass substrate is to be peeled off the surface on which the same is placed, the same is reliably prevented from being damaged or undergoing electrostatic breakdown.

Description

平板の粗面化処理装置及びその方法Flat plate roughening apparatus and method
　本発明は、ガラス基板等の平板の表面粗さを調整する平板の粗面化処理装置及びその方法に関するものである。 The present invention relates to a flat plate roughening apparatus and method for adjusting the surface roughness of a flat plate such as a glass substrate.
　従来より、液晶ディスプレイ等に使用されるガラス基板の表面には、透明電極や半導体素子等が形成されている。このような電極等を設けられたアレイ基板とカラーフィルタ基板とを重ねるときにミクロンオーダーのセルギャップに保つ必要があるため、ガラス基板の表面は、できる限り平坦な状態に保たれている。 Conventionally, a transparent electrode, a semiconductor element, and the like are formed on the surface of a glass substrate used for a liquid crystal display or the like. Since it is necessary to keep a cell gap on the order of microns when the array substrate provided with such an electrode and the color filter substrate are overlapped, the surface of the glass substrate is kept as flat as possible.
　このため、電極等を設ける際に真空吸着されていたガラス基板を、吸着を解除して載置面から剥がす際に、ガラス基板の吸着面の表面粗さが小さすぎてガラス基板が剥がれにくくなる場合がある。このような状態では、載置面から剥がす際にガラス基板を損傷したり、帯電して半導体素子を静電破壊させたりする問題がある。 For this reason, when the glass substrate that has been vacuum-adsorbed when the electrodes are provided is released from the mounting surface after releasing the adsorption, the surface roughness of the adsorption surface of the glass substrate is too small to make the glass substrate difficult to peel off. There is a case. In such a state, there is a problem that the glass substrate is damaged when it is peeled off from the mounting surface, or the semiconductor element is electrostatically broken by charging.
　そこで、例えば、特許文献１のように、圧縮空気とともに、液体及び研磨砥粒を含むスラリーをノズルからガラス基板の一方の面に吹き付けて粗面化処理するディスプレイ用ガラス基板の製造方法が知られている。 Therefore, for example, as in Patent Document 1, a method of manufacturing a glass substrate for display is known in which a slurry containing liquid and abrasive grains is sprayed from a nozzle onto one surface of a glass substrate together with compressed air. ing.
特開２００８－１２０６３８号公報JP 2008-120638 A
　しかしながら、従来のガラス基板の粗面化処理方法では、圧縮空気とともにスラリーを吹き付ける際にスラリーが飛び散るので、粗面化する必要のない反対側の面にもスラリーが付着してしまって品質の悪化を招くおそれがある。 However, in the conventional method for roughening a glass substrate, the slurry scatters when spraying the slurry together with the compressed air, so that the slurry adheres to the opposite surface that does not need to be roughened, and the quality deteriorates. May be incurred.
　本発明は、かかる点に鑑みてなされたものであり、その目的とするところは、簡単な構成で平板の一方の面のみに粗面化処理を行って平板を載置面から剥がす際に損傷したり、静電破壊したりするのを確実に防ぐことにある。 The present invention has been made in view of the above points, and the object of the present invention is to perform a roughening process on only one surface of the flat plate with a simple configuration and damage the flat plate from the mounting surface. Or to prevent electrostatic breakdown.
　上記の目的を達成するために、この発明では、平板の一方の面のみに粗面化液体を塗り込んで粗面化処理するようにした。 In order to achieve the above object, in the present invention, the roughening liquid is applied to only one surface of the flat plate to perform the roughening treatment.
　具体的には、第１の発明では、平板の表面粗さを調整する平板の粗面化処理装置を前提とし、
　上記平板の粗面化処理装置は、
　上記平板を搬送する搬送ローラと、
　上記平板の一方の表面にのみ当接する処理ローラと、
　上記処理ローラに上記平板の表面を粗面化させる粗面化液体を噴射する噴射ノズルとを備えている。 Specifically, in the first invention, on the premise of a flat plate roughening apparatus for adjusting the surface roughness of the flat plate,
The flat surface roughening apparatus is
A transport roller for transporting the flat plate;
A processing roller that contacts only one surface of the flat plate;
The processing roller includes a spray nozzle that sprays a roughening liquid that roughens the surface of the flat plate.
　上記の構成によると、平板を搬送しながら、一方の表面にのみ処理ローラを当接させ、噴射ノズルから噴射された粗面化液体を塗布するようにしているので、粗面化液体を直接平板に噴射する場合のように粗面化液体が反対側の面に回り込むことはなく、平板の品質を悪化させることはない。 According to the above configuration, since the processing roller is brought into contact with only one surface while the flat plate is being conveyed and the roughening liquid sprayed from the spray nozzle is applied, the roughening liquid is directly applied to the flat plate. The surface roughening liquid does not wrap around to the opposite surface as in the case of spraying on, and the quality of the flat plate is not deteriorated.
　第２の発明では、第１の発明において、
　上記処理ローラは、上記平板の進行方向に垂直に連続して延びている。 In the second invention, in the first invention,
The processing roller continuously extends perpendicular to the traveling direction of the flat plate.
　上記の構成によると、簡単な構成で平板の一方の面のみが確実に粗面化される。 According to the above configuration, only one surface of the flat plate is reliably roughened with a simple configuration.
　第３の発明では、第１の発明において、
　上記処理ローラは、上記平板の進行方向に垂直な方向に間隔をあけて並んで設けられている。 In the third invention, in the first invention,
The processing rollers are provided side by side in the direction perpendicular to the traveling direction of the flat plate.
　上記の構成によると、基板等として使用しない部分を粗面化処理して平板を剥がし安くしながらも、下工程で切り出された平板は、平坦さが保たれるので、品質を保ちながら、取り扱いが容易となる。このため、平板が有効利用される。 According to the above configuration, the surface not used as a substrate is roughened to peel off the flat plate, and the flat plate cut out in the lower process is kept flat, so it is handled while maintaining quality. Becomes easy. For this reason, a flat plate is effectively used.
　第４の発明では、第３の発明において、
　上記処理ローラの間隔を可変に構成されている。 In the fourth invention, in the third invention,
The interval between the processing rollers is variable.
　上記の構成によると、切り出す平板の大きさに合わせて処理ローラの位置を変えることができるので、平板の仕様が変わるような場合にも、同じ粗面化処理装置の使用が可能となる。 According to the above configuration, since the position of the processing roller can be changed in accordance with the size of the flat plate to be cut out, the same roughening treatment apparatus can be used even when the specification of the flat plate is changed.
　第５の発明では、第１乃至第４のいずれか１つの発明において、
　上記粗面化液体は、上記平板を溶かすエッチング液である。 In a fifth invention, in any one of the first to fourth inventions,
The roughening liquid is an etching solution that dissolves the flat plate.
　上記の構成によると、他のエッチング工程で使用するエッチング液の流用も可能となるので、コストの上昇が抑えられる。 According to the above configuration, it is possible to divert the etching solution used in other etching processes, so that an increase in cost can be suppressed.
　第６の発明では、第１乃至第５のいずれか１つの発明において、
　上記処理ローラは、上記搬送ローラと反対方向に回転するように構成されている。 In a sixth invention, in any one of the first to fifth inventions,
The processing roller is configured to rotate in a direction opposite to the conveying roller.
　上記の構成によると、平板の搬送方向と逆方向に処理ローラを回転させることで、粗面化液体が平板の一方の面にすり込まれる。このため、確実に粗面化処理が行われる。 According to the above configuration, the roughening liquid is rubbed into one surface of the flat plate by rotating the processing roller in the direction opposite to the conveying direction of the flat plate. For this reason, the roughening process is reliably performed.
　第７の発明では、平板の表面粗さを調整する平板の粗面化処理方法を前提とし、
　上記平板の粗面化処理方法は、
　上記平板を搬送ローラで搬送しながら、
　上記平板の一方の面にのみ処理ローラを当接させ、
　上記処理ローラに上記平板の表面を粗面化させる粗面化液体を噴射させ、
　上記平板の一方の面を粗面化させ、
　上記粗面化された平板を洗浄し、乾燥させる構成とする。 In the seventh invention, on the premise of a roughening treatment method of a flat plate for adjusting the surface roughness of the flat plate,
The roughening treatment method for the flat plate is as follows:
While transporting the flat plate with transport rollers,
The processing roller is brought into contact with only one surface of the flat plate,
Spraying the roughening liquid to roughen the surface of the flat plate on the processing roller;
Roughen one side of the flat plate,
The roughened flat plate is washed and dried.
　上記の構成によると、平板を搬送しながら、一方の表面にのみ処理ローラを当接させ、噴射ノズルから噴射された粗面化液体を塗布するようにしているので、粗面化液体を直接平板に噴射する場合のように粗面化液体が反対側の面に回り込むことはなく、平板の品質を悪化させることはない。粗面化処理後の平板は、洗浄された後乾燥されるので、粗面化の進行は適度に停止され、後工程に悪影響を与えることはない。 According to the above configuration, since the processing roller is brought into contact with only one surface while the flat plate is being conveyed and the roughening liquid sprayed from the spray nozzle is applied, the roughening liquid is directly applied to the flat plate. The surface roughening liquid does not wrap around to the opposite surface as in the case of spraying on, and the quality of the flat plate is not deteriorated. Since the flat plate after the roughening treatment is washed and dried, the progress of the roughening is appropriately stopped and does not adversely affect the subsequent steps.
　以上説明したように、本発明によれば、平板を搬送ローラで搬送しながら、この平板の一方の面にのみ処理ローラを当接させ、処理ローラに平板の表面を粗面化させる粗面化液体を噴射させて平板の一方の面のみを粗面化させるようにしたことにより、簡単な構成で平板の一方の面のみに粗面化処理を行って平板を載置面から剥がす際に損傷したり、静電破壊したりするのを確実に防ぐことができる。 As described above, according to the present invention, while the flat plate is conveyed by the conveying roller, the processing roller is brought into contact with only one surface of the flat plate, and the surface of the flat plate is roughened by the processing roller. By spraying the liquid to roughen only one side of the flat plate, damage is caused when the flat plate is removed from the mounting surface by performing roughening treatment on only one side of the flat plate with a simple configuration. Or electrostatic breakdown can be reliably prevented.
ガラス基板の粗面化処理装置の概略を示す側面図である。It is a side view which shows the outline of the roughening processing apparatus of a glass substrate. 処理ローラ及び噴射ノズルを拡大して示す斜視図である。It is a perspective view which expands and shows a processing roller and a jet nozzle. その他の実施形態にかかる処理ローラ及び噴射ノズルを示す正面図である。It is a front view which shows the process roller and spray nozzle concerning other embodiment.
　以下、本発明の実施形態を図面に基づいて説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
　図１は本発明の実施形態のガラス基板の粗面化処理装置１の概略を示し、この粗面化処理装置１は、粗面化処理室２に設けられている。粗面化処理装置１は、粗面化処理室２の入口２ａから搬入された平板としてのガラス基板５０を粗面化処理室２の出口２ｂまで搬送する複数の搬送ローラ３を備えている。ガラス基板５０は、例えば液晶ディスプレイに使用するアルミノケイ酸ガラス等よりなるマザーガラス基板である。搬送ローラ３は、ガラス基板５０の進行方向に垂直な回転軸３ａを有し、上下一対のものが複数対ガラス基板５０の進行方向に間隔をあけて配置されている。搬送ローラ３の形状、材質、回転速度等は特に限定されず、任意に設定すればよい。上下の搬送ローラ３は、互いに反対方向に回転されることで、ガラス基板５０をスムーズに搬送するように構成されている。なお、粗面化処理室２の出口２ｂ付近には、エアーナイフ２ｃが設けられており、このエアーナイフ２ｃから圧縮エアーが噴射されるようになっている。 FIG. 1 shows an outline of a roughening treatment apparatus 1 for a glass substrate according to an embodiment of the present invention, and the roughening treatment apparatus 1 is provided in a roughening treatment chamber 2. The roughening treatment apparatus 1 includes a plurality of transport rollers 3 that transport a glass substrate 50 as a flat plate carried in from the inlet 2 a of the roughening treatment chamber 2 to the outlet 2 b of the roughening treatment chamber 2. The glass substrate 50 is a mother glass substrate made of, for example, aluminosilicate glass used for a liquid crystal display. The transport roller 3 has a rotating shaft 3 a perpendicular to the traveling direction of the glass substrate 50, and a pair of upper and lower ones are arranged at intervals in the traveling direction of the plurality of glass substrates 50. The shape, material, rotational speed and the like of the transport roller 3 are not particularly limited and may be set arbitrarily. The upper and lower transport rollers 3 are configured to smoothly transport the glass substrate 50 by rotating in opposite directions. An air knife 2c is provided in the vicinity of the outlet 2b of the roughening treatment chamber 2, and compressed air is jetted from the air knife 2c.
　図２に示すように、粗面化処理装置１は、さらに、ガラス基板５０の一方の表面（すなわち、電極等が設けられない裏面）にのみ当接する処理ローラ４を備えている。処理ローラ４は、ガラス基板５０の進行方向に垂直な回転軸４ａを有し、この回転軸４ａの外周におけるガラス基板５０に当接する範囲のほぼ全体がブラシ４ｂで覆われている。なお、外周をブラシ４ｂではなく、スポンジ、布等の液体を適度に吸収する部材で覆ってもよい。処理ローラ４は、この処理ローラ４に並んで設けられた搬送ローラ３と反対方向に回転するように構成されている。 As shown in FIG. 2, the surface roughening apparatus 1 further includes a processing roller 4 that contacts only one surface of the glass substrate 50 (that is, the back surface on which no electrode or the like is provided). The processing roller 4 has a rotating shaft 4a perpendicular to the traveling direction of the glass substrate 50, and almost the entire area of the rotating shaft 4a that contacts the glass substrate 50 is covered with the brush 4b. The outer periphery may be covered with a member that appropriately absorbs liquid, such as sponge or cloth, instead of the brush 4b. The processing roller 4 is configured to rotate in a direction opposite to the conveying roller 3 provided side by side with the processing roller 4.
　さらに、粗面化処理装置１は、処理ローラ４にガラス基板５０の表面を粗面化させる粗面化液体６を噴射する噴射ノズル７を備えている。噴射ノズル７は、例えば、ガラス基板５０の進行方向に垂直に延びる粗面化液体供給管８に形成された開口よりなる。粗面化液体供給管８には、図示しないタンク等から粗面化液体６が適宜供給されるようになっている。噴射ノズル７とブラシ４ｂとの距離は、粗面化液体６がブラシ４ｂ以外に飛び散らないように設定されている。 Furthermore, the roughening treatment apparatus 1 includes a spray nozzle 7 that sprays a roughening liquid 6 that roughens the surface of the glass substrate 50 onto the processing roller 4. The spray nozzle 7 includes an opening formed in the roughened liquid supply pipe 8 extending perpendicularly to the traveling direction of the glass substrate 50, for example. A roughening liquid 6 is appropriately supplied to the roughening liquid supply pipe 8 from a tank or the like (not shown). The distance between the spray nozzle 7 and the brush 4b is set so that the roughened liquid 6 does not scatter other than the brush 4b.
　粗面化液体６は、ガラス基板５０を溶かす汎用のエッチング液であり、フッ酸、硝酸、過塩素酸等を含んだものよりなる。つまり、他の工程で使用するエッチング液の流用も可能となるので、コストの上昇が抑えられている。 The roughening liquid 6 is a general-purpose etching solution that dissolves the glass substrate 50 and includes hydrofluoric acid, nitric acid, perchloric acid, and the like. In other words, the etching solution used in other processes can be diverted, so that an increase in cost is suppressed.
　　－ガラス基板の粗面化処理方法－
　次に、本実施形態にかかるガラス基板の粗面化処理方法について説明する。 -Glass substrate roughening method-
Next, the roughening processing method of the glass substrate concerning this embodiment is demonstrated.
　まず、搬入されたマザーガラス基板は、清水等の洗浄液による洗浄工程により、表面に付着された異物が除去され、その洗浄されたガラス基板５０が粗面化処理室２の入口２ａから搬入される。 First, the carried-in mother glass substrate is subjected to a cleaning process using a cleaning liquid such as fresh water to remove foreign substances attached to the surface, and the cleaned glass substrate 50 is carried in from the inlet 2a of the roughening treatment chamber 2. .
　次いで、ガラス基板５０は、搬送ローラ３によって搬送される。 Next, the glass substrate 50 is transported by the transport roller 3.
　すると、ガラス基板５０の裏面に処理ローラ４が当接する。この処理ローラ４には、粗面化液体供給管８に供給された粗面化液体６が噴射ノズル７から噴射されて、そのブラシ４ｂに粗面化液体６がたっぷりと含まれている。処理ローラ４は、ガラス基板５０の搬送方向と逆方向に回転しているので、粗面化液体６がガラス基板５０の裏面にすり込まれるように確実に塗布される。そして、粗面化液体６が塗布されたガラス基板５０の裏面は、化学反応により粗面化される。このように粗面化液体６を処理ローラ４を介してガラス基板５０の裏面に塗布しているので、直接ガラス基板５０に噴射する場合のように粗面化液体６が表面に回り込むことはない。 Then, the processing roller 4 comes into contact with the back surface of the glass substrate 50. In the processing roller 4, the roughening liquid 6 supplied to the roughening liquid supply pipe 8 is ejected from the ejection nozzle 7, and the roughening liquid 6 is sufficiently contained in the brush 4 b. Since the processing roller 4 rotates in the direction opposite to the conveying direction of the glass substrate 50, the roughening liquid 6 is reliably applied so as to be rubbed into the back surface of the glass substrate 50. And the back surface of the glass substrate 50 with which the roughening liquid 6 was apply | coated is roughened by a chemical reaction. As described above, since the roughening liquid 6 is applied to the back surface of the glass substrate 50 via the processing roller 4, the roughening liquid 6 does not wrap around the surface unlike when sprayed directly onto the glass substrate 50. .
　次いで、搬送ローラ３によってさらに搬送されたガラス基板５０は、出口２ｂの手前でエアーナイフ２ｃから噴射された圧縮エアーにより、粗面化液体６等が吹き飛ばされる。 Next, the roughened liquid 6 and the like are blown off from the glass substrate 50 further transported by the transport roller 3 by the compressed air sprayed from the air knife 2c before the outlet 2b.
　次いで、図示しない洗浄室に搬入されたガラス基板５０は、この洗浄室内で洗浄液によって粗面化液体６が完全に除去される。このため、粗面化の進行は適度に停止され、後工程に悪影響を与えることはない。 Next, the roughened liquid 6 is completely removed from the glass substrate 50 carried into the cleaning chamber (not shown) by the cleaning liquid in the cleaning chamber. For this reason, the progress of the roughening is appropriately stopped and does not adversely affect the post-process.
　次いで、図示しない乾燥室に搬入されたガラス基板５０は、乾燥室内で乾燥される。 Next, the glass substrate 50 carried into a drying chamber (not shown) is dried in the drying chamber.
　このように、ガラス基板５０を搬送しながら、ガラス基板５０の進行方向に垂直に延びる処理ローラ４を裏面にのみ当接させ、噴射ノズル７から噴射された粗面化液体６を裏面側のほぼ全体に塗布するようにしているので、粗面化液体６がその後の工程で電極等が設けられる表面に回り込むことはなく、ガラス基板５０の品質を悪化させることはない。また、このような工程をガラス基板５０を搬入されてきたときの早い段階で行うことにより、その裏面が適度に粗面化される。このため、それ以降のすべての下工程において、ガラス基板５０を平坦な面に載置した後に別の位置に移動させるような場合、ガラス基板５０を平坦な面から容易に引き剥がすことができる。 As described above, while the glass substrate 50 is being conveyed, the processing roller 4 extending perpendicularly to the traveling direction of the glass substrate 50 is brought into contact with only the back surface, and the roughened liquid 6 ejected from the spray nozzle 7 is almost disposed on the back surface side. Since the coating is applied to the entire surface, the roughening liquid 6 does not wrap around the surface on which the electrode or the like is provided in the subsequent process, and the quality of the glass substrate 50 is not deteriorated. Further, by performing such a process at an early stage when the glass substrate 50 is carried in, the back surface thereof is appropriately roughened. For this reason, in the subsequent lower processes, when the glass substrate 50 is moved to another position after being placed on the flat surface, the glass substrate 50 can be easily peeled off from the flat surface.
　したがって、本実施形態にかかるガラス基板の粗面化処理装置によると、簡単な構成でガラス基板５０の一方の面のみに粗面化処理を行ってガラス基板５０を載置面から剥がす際に損傷したり、静電破壊したりするのを確実に防ぐことができる。 Therefore, according to the glass substrate roughening apparatus according to the present embodiment, damage is caused when the glass substrate 50 is peeled off from the mounting surface by performing the roughening process on only one surface of the glass substrate 50 with a simple configuration. Or electrostatic breakdown can be reliably prevented.
　　－実施形態の変形例－
　図３は本発明の実施形態の変形例を示し、処理ローラ１０４の構成が異なる点で上記実施形態と異なる。 -Modification of the embodiment-
FIG. 3 shows a modification of the embodiment of the present invention, which differs from the above embodiment in that the configuration of the processing roller 104 is different.
　すなわち、上記実施形態では、処理ローラ４のブラシ４ｂは、ガラス基板５０の進行方向に垂直な方向にガラス基板５０の幅と同等の長さに延び、ガラス基板５０の裏面の全体に粗面化液体６を塗布するようにしているが、本変形例では、処理ローラ１０４のブラシ１０４ｂは、ガラス基板５０の進行方向に垂直に間隔をあけて並んで設けられている。 That is, in the above-described embodiment, the brush 4 b of the processing roller 4 extends to a length equivalent to the width of the glass substrate 50 in the direction perpendicular to the traveling direction of the glass substrate 50, and the entire back surface of the glass substrate 50 is roughened. Although the liquid 6 is applied, in this modified example, the brushes 104b of the processing roller 104 are provided side by side with a space perpendicular to the traveling direction of the glass substrate 50.
　具体的には、本変形例では、回転軸１０４ａの軸方向に所定間隔をあけてブラシ１０４ｂを有する処理ローラ１０４が配置されている。この処理ローラ１０４がガラス基板５０の進行方向に並べられる間隔と、ブラシ１０４ｂの幅とは、ガラス基板５０から面取りされる画面サイズによって決定されている。また、噴射ノズル７とブラシ１０４ｂとの距離は、粗面化液体６がブラシ１０４ｂ以外に飛び散らないように設定されている。 Specifically, in this modification, the processing roller 104 having the brush 104b is arranged at a predetermined interval in the axial direction of the rotating shaft 104a. The interval at which the processing rollers 104 are arranged in the traveling direction of the glass substrate 50 and the width of the brush 104 b are determined by the screen size chamfered from the glass substrate 50. The distance between the spray nozzle 7 and the brush 104b is set so that the roughened liquid 6 does not scatter other than the brush 104b.
　処理ローラ１０４で粗面化処理する領域を限定することで、画面として使用しない部分を粗面化処理するので、引き剥がし性を重視して面粗度を十分に粗くすることができる。 By limiting the area to be roughened by the processing roller 104, the surface that is not used as a screen is roughened, so that the surface roughness can be sufficiently roughened with an emphasis on peelability.
　このように、基板等として使用しない部分を粗面化処理して平板を剥がし安くしながらも、下工程で切り出された平板は平坦さが保たれるので、品質を保ちながら、取り扱いが容易となる。 In this way, the flat plate cut out in the lower process is kept flat while the surface not used as a substrate is roughened to peel off the flat plate, so that it is easy to handle while maintaining quality. Become.
　また、ガラス基板の仕様が変わるような場合にも、ブラシ１０４ｂの構成をそれに合わせて変更すればよいので、同じ粗面化処理装置１を使用することができる。 Moreover, even when the specification of the glass substrate changes, the same roughening treatment apparatus 1 can be used because the configuration of the brush 104b only needs to be changed accordingly.
　（その他の実施形態）
　本発明は、上記実施形態について、以下のような構成としてもよい。 (Other embodiments)
The present invention may be configured as follows with respect to the above embodiment.
　すなわち、上記実施形態では、平板は、液晶ディスプレイに使用するマザーガラス基板としたが、これに限定されず、プラズマディスプレイ等に使用されるガラス基板等でもよい。要は、面粗度が小さくて載置面からの引き剥がし時に損傷や静電破壊が問題となる平板であれば、本発明を適用することができる。 That is, in the above embodiment, the flat plate is a mother glass substrate used for a liquid crystal display, but is not limited thereto, and may be a glass substrate used for a plasma display or the like. In short, the present invention can be applied to any flat plate whose surface roughness is small and damage or electrostatic breakdown becomes a problem at the time of peeling from the mounting surface.
　なお、以上の実施形態は、本質的に好ましい例示であって、本発明、その適用物や用途の範囲を制限することを意図するものではない。 In addition, the above embodiment is an essentially preferable example, and is not intended to limit the scope of the present invention, its application, and use.
　以上説明したように、本発明は、液晶ディスプレイ等に使用するガラス基板などの平板の粗面化処理装置及びその方法について有用である。 As described above, the present invention is useful for an apparatus and a method for roughening a flat plate such as a glass substrate used for a liquid crystal display or the like.
　　１　　　粗面化処理装置
　　３　　　搬送ローラ
　　４　　　処理ローラ
　　６　　　粗面化液体
　　７　　　噴射ノズル
　５０　　　ガラス基板（平板）
１０４　　　処理ローラ DESCRIPTION OF SYMBOLS 1 Roughening processing apparatus 3 Conveyance roller 4 Processing roller 6 Roughening liquid 7 Injection nozzle 50 Glass substrate (flat plate)
104 Processing roller

Claims (7)

  1. 　平板の表面粗さを調整する平板の粗面化処理装置において、
    　上記平板を搬送する搬送ローラと、
    　上記平板の一方の表面にのみ当接する処理ローラと、
    　上記処理ローラに上記平板の表面を粗面化させる粗面化液体を噴射する噴射ノズルとを備えている
    ことを特徴とする平板の粗面化処理装置。     In the flat plate roughening apparatus for adjusting the surface roughness of the flat plate,
    A transport roller for transporting the flat plate;
    A processing roller that contacts only one surface of the flat plate;
    An apparatus for roughening a flat plate, comprising: a jetting nozzle for spraying a roughening liquid for roughening the surface of the flat plate on the processing roller.
  2. 　請求項１に記載の平板の粗面化処理装置において、
    　上記処理ローラは、上記平板の進行方向に垂直に連続して延びている
    ことを特徴とする平板の粗面化処理装置。     In the flat surface roughening apparatus according to claim 1,
    The flat plate roughening treatment apparatus, wherein the processing roller continuously extends perpendicular to the traveling direction of the flat plate.
  3. 　請求項１に記載の平板の粗面化処理装置において、
    　上記処理ローラは、上記平板の進行方向に垂直な方向に間隔をあけて並んで設けられている
    ことを特徴とする平板の粗面化処理装置。     In the flat surface roughening apparatus according to claim 1,
    The flat plate roughening treatment apparatus, wherein the processing rollers are arranged side by side in a direction perpendicular to the traveling direction of the flat plate.
  4. 　請求項３に記載の平板の粗面化処理装置において、
    　上記処理ローラの間隔を可変に構成されている
    ことを特徴とする平板の粗面化処理装置。     In the flat surface roughening apparatus according to claim 3,
    An apparatus for roughening a flat plate, wherein the interval between the processing rollers is variable.
  5. 　請求項１乃至４のいずれか１つに記載の平板の粗面化処理装置において、
    　上記粗面化液体は、上記平板を溶かすエッチング液である
    ことを特徴とする平板の粗面化処理装置。     In the flat surface roughening apparatus according to any one of claims 1 to 4,
    The flat surface roughening treatment apparatus, wherein the roughening liquid is an etching solution for dissolving the flat plate.
  6. 　請求項１乃至５のいずれか１つに記載の平板の粗面化処理装置において、
    　上記処理ローラは、上記搬送ローラと反対方向に回転するように構成されている
    ことを特徴とする平板の粗面化処理装置。     In the flat surface roughening apparatus according to any one of claims 1 to 5,
    The flat plate roughening treatment apparatus, wherein the processing roller is configured to rotate in a direction opposite to the conveying roller.
  7. 　平板の表面粗さを調整する平板の粗面化処理方法において、
    　上記平板を搬送ローラで搬送しながら、
    　上記平板の一方の面にのみ処理ローラを当接させ、
    　上記処理ローラに上記平板の表面を粗面化させる粗面化液体を噴射させ、
    　上記平板の一方の面を粗面化させ、
    　上記粗面化された平板を洗浄し、乾燥させる
    ことを特徴とする平板の粗面化処理方法。     In the roughening treatment method of the flat plate for adjusting the surface roughness of the flat plate,
    While transporting the flat plate with transport rollers,
    The processing roller is brought into contact with only one surface of the flat plate,
    Spraying the roughening liquid to roughen the surface of the flat plate on the processing roller;
    Roughen one side of the flat plate,
    A roughening treatment method for a flat plate, wherein the roughened flat plate is washed and dried.
PCT/JP2010/006164 2010-01-26 2010-10-18 Flat plate surface roughening device and pertinent method WO2011092764A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015012307A1 (en) * 2013-07-24 2015-01-29 ＡｖａｎＳｔｒａｔｅ株式会社 Method for producing glass substrate, glass substrate, and display panel

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03239465A (en) * 1989-12-15 1991-10-25 Hitachi Ltd Small burr removing method and device thereof
JP2002103222A (en) * 2000-09-25 2002-04-09 Fuji Photo Film Co Ltd Device and method for roughening metal plate for lithographic printing plate
JP2005342866A (en) * 2004-06-07 2005-12-15 Shinko Electric Ind Co Ltd Polishing device for substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03239465A (en) * 1989-12-15 1991-10-25 Hitachi Ltd Small burr removing method and device thereof
JP2002103222A (en) * 2000-09-25 2002-04-09 Fuji Photo Film Co Ltd Device and method for roughening metal plate for lithographic printing plate
JP2005342866A (en) * 2004-06-07 2005-12-15 Shinko Electric Ind Co Ltd Polishing device for substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015012307A1 (en) * 2013-07-24 2015-01-29 ＡｖａｎＳｔｒａｔｅ株式会社 Method for producing glass substrate, glass substrate, and display panel
JPWO2015012307A1 (en) * 2013-07-24 2017-03-02 ＡｖａｎＳｔｒａｔｅ株式会社 Glass substrate manufacturing method, glass substrate, and display panel
US10261371B2 (en) 2013-07-24 2019-04-16 Avanstrate Inc. Method for manufacturing glass substrate, glass substrate, and panel for display

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