WO2011081288A3 - 멤스 마이크로폰 및 그 제조방법 - Google Patents
멤스 마이크로폰 및 그 제조방법 Download PDFInfo
- Publication number
- WO2011081288A3 WO2011081288A3 PCT/KR2010/007535 KR2010007535W WO2011081288A3 WO 2011081288 A3 WO2011081288 A3 WO 2011081288A3 KR 2010007535 W KR2010007535 W KR 2010007535W WO 2011081288 A3 WO2011081288 A3 WO 2011081288A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mems microphone
- silicon substrate
- membrane
- deposited
- manufacturing same
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/04—Microphones
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/005—Electrostatic transducers using semiconductor materials
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/02—Diaphragms for electromechanical transducers; Cones characterised by the construction
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R2201/00—Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
- H04R2201/003—Mems transducers or their use
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Manufacturing & Machinery (AREA)
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
- Pressure Sensors (AREA)
- Multimedia (AREA)
- Micromachines (AREA)
Abstract
본 발명은 실리콘 기판과 멤브레인의 접촉 부위에서 잔류 응력를 감소시킬 수 있는 멤스(MEMS) 마이크로폰 및 그 제조방법에 관한 것이다. 본 발명에 의하면, 백 챔버가 형성되는 실리콘 기판; 상기 실리콘 기판에 증착되고, 다수의 음공이 형성된 백 플레이트; 상기 백 플레이트와 이격되어 에어갭이 형성되도록 상기 실리콘 기판에 증착되는 멤브레인; 및 상기 멤브레인과 실리콘 기판의 접촉 부위에 증착되는 응력 완충부;를 포함하는 멤스 마이크로폰 및 그 제조방법을 제공한다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090132682A KR101109095B1 (ko) | 2009-12-29 | 2009-12-29 | 멤스 마이크로폰 및 그 제조방법 |
KR10-2009-0132682 | 2009-12-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011081288A2 WO2011081288A2 (ko) | 2011-07-07 |
WO2011081288A3 true WO2011081288A3 (ko) | 2011-11-03 |
Family
ID=44175704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/007535 WO2011081288A2 (ko) | 2009-12-29 | 2010-10-29 | 멤스 마이크로폰 및 그 제조방법 |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR101109095B1 (ko) |
CN (2) | CN201937821U (ko) |
TW (1) | TWI505723B (ko) |
WO (1) | WO2011081288A2 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101355434B1 (ko) * | 2012-06-12 | 2014-01-28 | 한국생산기술연구원 | 미세 홀이 배열된 폴리머 멤브레인을 포함하는 플라스틱 챔버 플레이트의 제작 방법 |
KR20140040997A (ko) | 2012-09-27 | 2014-04-04 | 한국전자통신연구원 | 멤스 마이크로폰 및 그 제조방법 |
CN106604195A (zh) * | 2015-10-14 | 2017-04-26 | 天津修瑕科技有限公司 | 一种基于电子信息系统钥匙的安全方法 |
CN107465983B (zh) * | 2016-06-03 | 2021-06-04 | 无锡华润上华科技有限公司 | Mems麦克风及其制备方法 |
CN108609573A (zh) * | 2016-12-12 | 2018-10-02 | 中芯国际集成电路制造(上海)有限公司 | 一种mems器件及其制备方法、电子装置 |
KR102091854B1 (ko) * | 2018-11-30 | 2020-03-20 | (주)다빛센스 | 콘덴서 마이크로폰 및 그 제조방법 |
CN111131986A (zh) * | 2019-12-31 | 2020-05-08 | 歌尔股份有限公司 | 防尘结构、麦克风封装结构以及电子设备 |
WO2024034931A1 (ko) * | 2022-08-08 | 2024-02-15 | 삼성전자주식회사 | 음향 입력 장치를 포함하는 전자 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006068843A (ja) * | 2004-08-31 | 2006-03-16 | Sony Corp | 微小電気機械素子、光学微小電気機械素子、光変調素子、並びにレーザディスプレイ |
KR20060099627A (ko) * | 2005-03-14 | 2006-09-20 | 주식회사 케이이씨 | Mems 공정을 이용한 마이크로폰 및 그 제조 방법 |
KR100893558B1 (ko) * | 2005-08-10 | 2009-04-17 | 세이코 엡슨 가부시키가이샤 | 반도체 장치, 반도체 장치의 제조 방법 및 전자 부품 |
JP2009148880A (ja) * | 2007-12-14 | 2009-07-09 | Ind Technol Res Inst | センシング膜及びそれを用いるマイクロエレクトロメカニカルシステムデバイス |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6566251B2 (en) * | 2001-03-29 | 2003-05-20 | Georgia Tech Research Corporation | Method for selective deposition of materials in micromachined molds |
EP1246502A1 (en) * | 2001-03-30 | 2002-10-02 | Phone-Or Ltd | Microphone |
US7045868B2 (en) * | 2003-07-31 | 2006-05-16 | Motorola, Inc. | Wafer-level sealed microdevice having trench isolation and methods for making the same |
US20060291674A1 (en) * | 2005-06-14 | 2006-12-28 | Merry Electronics Co. Ltd. | Method of making silicon-based miniaturized microphones |
TWI285509B (en) * | 2006-02-10 | 2007-08-11 | Univ Nat Chunghsing | Sawing-free process for manufacturing wafer of capacitor-type silicon microphone |
KR101398667B1 (ko) * | 2006-03-30 | 2014-05-27 | 에프코스 피티이 엘티디 | 단일 다이 mems 음향 전환기 및 그 제조 방법 |
JP2008092561A (ja) * | 2006-09-04 | 2008-04-17 | Yamaha Corp | 半導体マイクユニット、その製造方法、及び、半導体マイクユニットの搭載方法 |
EP1931173B1 (en) * | 2006-12-06 | 2011-07-20 | Electronics and Telecommunications Research Institute | Condenser microphone having flexure hinge diaphragm and method of manufacturing the same |
US8258591B2 (en) * | 2008-01-16 | 2012-09-04 | Solid State System Co., Ltd. | Micro-electro-mechanical systems (MEMS) device |
WO2009146494A1 (en) * | 2008-06-04 | 2009-12-10 | Cochlear Limited | Implantable microphone diaphragm stress decoupling system |
-
2009
- 2009-12-29 KR KR1020090132682A patent/KR101109095B1/ko not_active IP Right Cessation
-
2010
- 2010-10-29 WO PCT/KR2010/007535 patent/WO2011081288A2/ko active Application Filing
- 2010-12-03 CN CN2010206481591U patent/CN201937821U/zh not_active Expired - Lifetime
- 2010-12-03 TW TW099142137A patent/TWI505723B/zh not_active IP Right Cessation
- 2010-12-03 CN CN201010579578.9A patent/CN102111705B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006068843A (ja) * | 2004-08-31 | 2006-03-16 | Sony Corp | 微小電気機械素子、光学微小電気機械素子、光変調素子、並びにレーザディスプレイ |
KR20060099627A (ko) * | 2005-03-14 | 2006-09-20 | 주식회사 케이이씨 | Mems 공정을 이용한 마이크로폰 및 그 제조 방법 |
KR100893558B1 (ko) * | 2005-08-10 | 2009-04-17 | 세이코 엡슨 가부시키가이샤 | 반도체 장치, 반도체 장치의 제조 방법 및 전자 부품 |
JP2009148880A (ja) * | 2007-12-14 | 2009-07-09 | Ind Technol Res Inst | センシング膜及びそれを用いるマイクロエレクトロメカニカルシステムデバイス |
Also Published As
Publication number | Publication date |
---|---|
TW201127088A (en) | 2011-08-01 |
CN201937821U (zh) | 2011-08-17 |
KR20110076074A (ko) | 2011-07-06 |
CN102111705B (zh) | 2015-12-09 |
CN102111705A (zh) | 2011-06-29 |
KR101109095B1 (ko) | 2012-01-31 |
WO2011081288A2 (ko) | 2011-07-07 |
TWI505723B (zh) | 2015-10-21 |
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