WO2010066828A1 - Pyrogene kieselsäure hergestellt in einer produktions-anlage mit kleiner kapazität - Google Patents
Pyrogene kieselsäure hergestellt in einer produktions-anlage mit kleiner kapazität Download PDFInfo
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- WO2010066828A1 WO2010066828A1 PCT/EP2009/066800 EP2009066800W WO2010066828A1 WO 2010066828 A1 WO2010066828 A1 WO 2010066828A1 EP 2009066800 W EP2009066800 W EP 2009066800W WO 2010066828 A1 WO2010066828 A1 WO 2010066828A1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00157—Controlling the temperature by means of a burner
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/18—Details relating to the spatial orientation of the reactor
- B01J2219/185—Details relating to the spatial orientation of the reactor vertical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/19—Details relating to the geometry of the reactor
- B01J2219/194—Details relating to the geometry of the reactor round
- B01J2219/1941—Details relating to the geometry of the reactor round circular or disk-shaped
- B01J2219/1946—Details relating to the geometry of the reactor round circular or disk-shaped conical
Definitions
- the invention relates to a method and an apparatus for producing fumed silica.
- Pyrogenic metal oxides such as fumed silica
- Halogensiliziura für a hydrogen-oxygen flame such as described in Ullmann's Encyclopedia of Industrial Chemistry (Wiley -VCH Verlag GmbH & Co. KGaA, 20Sauerstoff).
- Ullmann's Encyclopedia of Industrial Chemistry Wiley -VCH Verlag GmbH & Co. KGaA, 20Sauerstoff.
- the purity of the silica is of great importance. This applies crosslinking such as in under the influence of moisture at room temperature, especially for the use of the fumed silica in applications in the industry of surface coatings r in applications for sealants
- Silicone sealants and polyurethane sealants are for use as a consumable in the manufacture of electronic semiconductor devices such as processors, memories, controllers and integrated components.
- a known problem is, for example, lack of dispersibility of the fumed silica in silicone compositions, such as silicone sealants and in polyalkylene oxide-containing sealants such as polyurethanes.
- the object of the invention is to avoid the disadvantages of the prior art and in particular to provide a method and an apparatus for producing a fumed silica and a fumed silica, which has a high quality.
- the invention relates to a flame reactor, characterized in that the flame reactor has a reactor chamber with a volume of 1 m 3 to 10 m 3 , a height of 1 m to 10 m and a reactor nozzle for supplying the reactants.
- the device according to the invention for the production of fumed silica comprises a reactor, a feed device for the reaction gases, a mixing device for the reaction gases, a reactor nozzle further feed devices for the supply of air.
- the device according to the invention for the production of fumed silica preferably has the following units: (a) silane preparation, silane evaporator, optionally
- the flame reactor preferably has a height of 1 to 10 m, preferably 3 to 6 m, more preferably 4 to 5 m, and a reaction chamber length of 0.7 to 9 m, preferably 2 to 5 m, particularly preferably 3 , 5 to 4.5 m.
- the flame reactor has a cross-sectional area of 0.1 m ? to 1 r ⁇ ⁇ , more preferably 0.2 m ? to 0.9 r ⁇ *, more preferably 0.35 m. ! to 0.75 m ? ,
- the flame reactor preferably has a volume of from 1 m 3 to 10 m 3 , more preferably from 0.5 m 3 to 7 m 3 , particularly preferably from 1.5 m 3 to 4 m 3 .
- the flame reactor has a volume to height ratio of 0.1 m 2 to 1 m ? , more preferably 0.2 m ? to 0.9 m 2 , more preferably from 0.35 m 2 to 0.75 m 2 .
- the orientation of the flame may be horizontal or vertical or at any angle to the vertical.
- the direction of the flame can be from bottom to top or from top to bottom. The direction from top to bottom is preferred.
- the reactor chamber is open and in open exchange with atmospheric pressure. This may mean that the reactor is outdoors or in a hall open to the atmosphere.
- the reactor chamber at the head has a diameter of 0.1 to 1.0 m, more preferably 0.2 to 0.5 m.
- the reaction nozzle has a circular cross-section.
- the reactor chamber has a circular cross-section.
- the reactor chamber preferably has a diameter which is larger by 1%, particularly preferably by 10%, in particular preferably by 50%, than the diameter of the reactor chamber at the reactor head.
- the reactor nozzle is preferably 0.05 to 0.25 m, particularly preferably 0.05 to 0.15 m, very particularly preferably 0.1 to 0.15 m in diameter.
- the exit area of the reactor nozzle is preferably 0.001 m 2 to 0.1 m 2 , particularly preferably 0.002 m 2 to 0.05 m 2 , very particularly preferably 0.0075 m 2 to 0.015 m 3 .
- Another object of the invention is a process for the preparation of fumed silica, wherein in a reactor silicon-containing reaction gases are reacted in a flame, characterized in that the content of organic non-silicon compounds in the reaction gas is less than 5 mol%.
- the reaction gases are fed, comprising the following composition: vapor or gaseous silicon compounds in an amount of preferably 1000 to 10,000 moles per hour, preferably 2000 to 8000 moles per hour, more preferably 3000 to 6000 moles per hour, or 100 to 2000 kg / h, preferably 20 to 1000 kg / h, particularly preferably 100 to 500 kg / h, wherein the nozzle outlet gas velocity or gas velocity of the gases used, at the reactor nozzle, based on standard volumes, between 10 and 100 m / s is preferred between 200 and 80 m / s, more preferably between 40 and 70 m / s, and the gas velocity over the Dusenquerites radially, preferably homogeneously distributed, and is distributed over the reactor cross-section radially, preferably homogeneously, in a flame for reaction to be brought.
- vapor or gaseous silicon compounds in an amount of preferably 1000 to 10,000 moles per hour, preferably 2000 to 8000 moles per hour, more preferably 3000 to 6000 mo
- the capacity of a production plant according to the inventive method is less than 5000 tons, more preferably less than 4000 tons, most preferably smaller 3000 tonnes, in particular preferably less than 1000 tonnes of fumed silica, relative to one calendar year.
- One calendar year should be based on 7884 hours production time, with 85% time availability.
- the fumed silica is prepared in a single reactor having a capacity of less than 500 kg / h, more preferably less than 400 kg / h, more preferably less than 250 kg / h, most preferably less than 100 kg / h.
- the reaction gases are preferably oxygen, ie, for example air, which may be fresh or dried, to a fuel gas, for example hydrogen, a vaporous hydrocarbon (saturated or unsaturated, ie containing double and / or triple bonds), such as methane, ethane, r iso-propane, n-propane, iso ⁇ butanes, n-butane, ethene, ethyne, propene, iso-butene and n-butene, and other higher iso- or n- or neo- ⁇ lkane, -alkenes and alkynes, lower alcohols such as methanol, ethanol, propanol, with methane being preferred, or mixtures thereof, wherein a fuel gas containing large 90% by volume of hydrogen is preferred, and as a second additional fuel gas containing a large 1% by volume of natural gas containing large 90% by volume of methane, is preferred, and silane containing at least
- a is preferably 1 to 5, more preferably 1.
- reaction gases are preferably premixed before the reaction.
- dabe ⁇ is preferably 1 mole. % to 20 mol%, preferably 1 mol. % to 10 mol%, more preferably 4 mol% to 6 mol%.
- the content of organic Tiniliziumverbmditch m the reaction gas is preferably less than 5 mol%, preferably less than 3 mol%, more preferably less than 2 mol%, most preferably less than 1 mol%.
- the content of inorganic Vietnamese ceremonimditch m the reaction gas is preferably less than 1% by weight, preferably less than 10 ppm, more preferably less than 500 ppb, most preferably less than 5 ppb.
- the content of boron compounds in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, particularly preferably less than 10 ppm, based on boron.
- the content of Germaniurntagenen in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, more preferably less than 10 ppm, based on germanium.
- the content of titanium compounds in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, more preferably less than 10 ppm, based on titanium.
- the content of iron compounds in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, particularly preferably less than 10 ppm, based on iron.
- the content of aluminum compounds in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, particularly preferably less than 10 ppm, based on aluminum.
- the content of tin compounds in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, more preferably less than 10 ppm, based on tin.
- the content of arsenic compounds in the reaction gases is preferably less than 100 ppm, preferably less than 50 ppm, more preferably less than 10 ppm, based on arsenic.
- the content of sulfur compounds in the reaction gases is preferably less than 1 000 ppm, preferably less than 500 ppm, particularly preferably less than 100 ppm, based on sulfur.
- the content of phosphorus compounds in the reaction gases is preferably less than 1000 ppm, preferably less than 500 ppm, more preferably less than 100 ppm, based on phosphor.
- the proportion of oxygen in the reaction gas which is fed to the reaction is preferably 10 mol.% To 50 mol.%, Preferably 15 mol.% To 30 mol.%, Particularly preferably 16 mol. % to 21 mol%.
- the proportion of fuel gas in the reaction gas fed to the reaction is preferably 1 mol% to 25 mol%, preferably 5 mol% to 15 mol%, particularly preferably 4 mol. % to 13 mol%, most preferably 5 mol% to 8 mol%.
- reaction gases containing at least one, preferably gaseous or vapor, silicon compound or a mixture of silicon compounds are introduced into the reaction chamber or flame in an amount of preferably 100 to 5000 NmV, preferably 500 to 4000 NmVh, more preferably 1000-3000 NmVh.
- the reaction gases preferably contain hydrogen as fuel gas, preferably in amounts of 4 to 15 mol%, preferably 4 to 10 mol%.
- the gas outlet velocity at the nozzle is as low as possible.
- the gas velocity in the reactor chamber is as low as possible.
- the addition of the reaction gases takes place as steam or as gas.
- the reaction gases are preferably premixed before entry into the reactor, preferably homogeneously premixed.
- the reaction gases are preferably premixed in the gas stream, which is introduced into the nozzle in the reactor, in particular premixed intensive.
- the hot process gases are quenched in the reactor by adding hot, preferably slightly superheated, steam which is preferably diluted with air, preferably hot air, that is, the reaction is moderated or stopped with water.
- silicon compounds are preferably silicon tetrachloride, hydrogen silicon trichloride, methyl silicon trichloride, and mixtures thereof.
- silicon tetrachloride hydrogen silicon trichloride
- methyl silicon trichloride and mixtures thereof.
- Siiiciumtetrachlo ⁇ d are mixtures containing Siiiciumtetrachlo ⁇ d as the main component.
- the silane is derived from processes which serve to produce amorphous, polycrystalline or monocrystalline silicon metal, such as silicon for the electronics or semiconductor or photovoltaic industries.
- the silane is preferably derived from processes which are the production of
- Methylchlorosilanes for example, as a raw material for the preparation of silicones such as silicone oils such as polydimethylsiloxanes, or silicone rubbers such as crosslinked polydimethylsiloxanes, or Sxliconharzen serve, for example, the construction industry, the coating industry, or the Automobilmdutrie.
- the silicon compounds or their mixtures may contain gaseous, vaporous or vaporizable and volatile impurities, such as methane, ethane, isopropane, n-propane, isobutanes, n-butane, due to their manufacturing process.
- the Siliciuintetrachlorid can be separated by distillation and purified.
- the silicon-containing compound, or mixtures thereof, or the silane has a content of large 10% by volume,% silicon tetrachloride, particularly preferably greater than 90% by volume silicon tetrachloride; more preferably, a large 95% by volume of silicon tetrachloride, most preferably a large 99% by volume of silicon tetrachloride, the remainder m of the mixture being hydrogen silicon trichloride and dihydrogen silicon dichloride.
- Methylsilicon trichloride is preferred, particularly preferably in concentrations of greater than 10 mol%.
- mixtures of silicon tetrachloride and hydrogen silicon trichloride are preferred.
- mixtures of silicon tetrachloride, methylsilicon trichloride and hydrofluoric trichloride are preferred.
- mixtures which are preferably less than or equal to 80 mol.% Hydrogen silicon trichloride, most preferably less than or equal to 20 mol. % Hydrogen silicon trichloride, more preferably less than 10 mol. % Hydrogen silicon trichloride contained used.
- mixtures containing 30 mol.% Hydrogen silicon trichloride used.
- mixtures containing more than 10 mol% of methylsilicon trichloride, more preferably more than 20 mol%, are used.
- Methylsilicon trichloride r particularly preferably more than 50 mol. % Methylsilicon trichloride contained used.
- mixtures which are greater than 40 mol% of methylsilicon trichloride are particularly preferred preferably 45 mol. % Methylsilicon trichloride contained used. These mixtures then preferably contain less than 20 mol%, preferably less than 10 mol%, particularly preferably less than 5 mol% of carbon-containing silicon compounds which are not methyl silicate trichloride and less than 20 mol%, preferably less than 10 mol%, particularly preferably less than 5 mol % Hydrogen f-containing silicon compounds and less than 5 mol% of non-silicon-containing, optionally substituted, hydrocarbons.
- mixtures which contain greater than 40 mol% silicon tetrachloride, very particularly preferably 45 mol% silicon tetrachloride are used. These mixtures preferably contain less than 20 mol%, preferably less than 10 mol%, particularly preferably less than 5 mol% Carbon-containing silicon compounds and less than 20 mol%, preferably less than 10 mol%, more preferably less than 5 mol% Wasserst ⁇ f f-containing silicon compounds and less than 5 mol% not silicon-containing, optionally substituted, hydrocarbons.
- the oxygen for use in the reactor is taken from the air from the surrounding atmosphere. That is, the reactor is preferably supplied with air.
- the oxygen O2 in the air may be enriched to greater than 20% by volume, for example by the addition of pure oxygen O 2 or by the addition of air containing a large 20% by volume of oxygen O 2 .
- the air can be used as such, or can be prepared by condensation and / or absorption of the water at less than O 0 Cj, preferably at temperatures of less than -10 °, particularly preferably at temperatures of less than -2O 0 C, are pre-dried.
- the reactor chamber is open, and is in open exchange with the atmospheric pressure.
- the hydrogen chloride HCl formed in the reaction is recovered by absorption and desorption, purified and dried and reused.
- the dry hydrogen chloride HCl thus obtained is used to prepare chlorosilanes such as, preferably, silicon tetrachloride, hydrogen silicon trichloride, dihydrogen silicium dichloride and trihydrogen silicon chloride, more preferably hydrogen silicon trichloride of silicon metal.
- chlorosilanes such as, preferably, silicon tetrachloride, hydrogen silicon trichloride, dihydrogen silicium dichloride and trihydrogen silicon chloride, more preferably hydrogen silicon trichloride of silicon metal.
- Examples of a preferred use are a reaction and production of methylchlorosilanes according to a generally simplified empirical formula
- side reaction products such as methylsilicon trichloride, CH 3 SiCl 3 , trimethylsilicon chloride, (CH 3 ) 3 SiCl and others may be formed.
- inventive chemical reactions for the inventive production of fumed silica according to the invention are the oxidation of the fuel gas with
- the size of the reaction zone can be changed by changing the amount of fuel gases.
- the reaction mixture from the combustion chamber preferably in the region of the lower end of the combustion chamber executed, preferably aspirated, then the reaction mixture is preferably cooled, more preferably with energy recovery, preferably temperatures of less than 300 0 C, all more preferably less than 200 0 C, then preferably the gas containing the majority of the resulting hydrogen chloride gas, separated from the resulting fumed silica, more preferably separated by the use of fabric filters, and a further parallel process preferably a recovery of dry hydrogen chloride gas one, more preferably carried out multi-stage absorption and - Desorptionslui and environmental reasons in the
- Silica by blowing through gases, preferably in a fluidized bed, preferably at temperatures of 400 to 800 0 C, more preferably carried out from 500 0 C to 700 0 C.
- an afterburning of residual oxygen and chlorine gas is additionally carried out by adding a fuel gas into the flame, at least at a location other than the reactor nozzle, in the reactor chamber.
- a fuel gas such as hydrogen
- this additional hydrogen is used to reduce chlorine formed in the reactor, Cl 2 , to HCl.
- an afterburning of residual oxygen and chlorine gas is additionally performed by adding, at least at a location other than the reactor chamber, fuel gas below a temperature other than the flame temperature.
- this additional hydrogen is used to reduce chlorine formed in the reactor, CIa, to HCl.
- the chlorine loss is preferably below 10% by weight, preferably below 5% by weight, more preferably below 1% by weight.
- this may additionally be added hydrogen
- Nitrogen preferably 0.001 to 90 vol.%, Preferably 30-70 vol.%.
- the hydrogen does not contain nitrogen N 2 .
- the reactor is fed as fuel gas hydrogen.
- only hydrogen and no further fuel gas is used.
- this is hydrogen from the catalytic thermal conversion of e.g. Methanol to carbon dioxide CO2 and hydrogen.
- this is hydrogen from the catalytic thermal conversion of hydrocarbons and water to carbon dioxide CO 2 and hydrogen.
- Carbon dioxide CO 2 can be removed absorptively and adsorptively, the hydrogen can be purified in this way.
- this is hydrogen from the Dxsproportiontechnik and reaction of Wasserstoffsiliciumt ⁇ chlorid at temperatures greater than 500 0 C, preferably large 700 0 C, more preferably large 850 0 C, with formation of preferably silicon tetrachloride, silicon metal and hydrogen.
- the hydrogen may also preferably be purified by cryogenic condensation of other ingredients.
- hydrogen is used, which is formed in the reaction of silicon metal with hydrogen chloride, HCl, to Wasserstoffsiliciumtrichlo ⁇ d.
- the process for preparing fumed silica includes the following, preferably sequential, steps: (1) silane supply, silane evaporator, optionally
- Air treatment (2) reactor (3) Energy jerk and cooling, (4) optionally, pre-separation of the silica S1O2 by preferably one or more cyclones, separation of the silica SiO 2 by preferably filters, preferably fabric filter, particularly preferably upper flat filter (5) Purification of the silica of, preferably last, traces of hydrogen chloride HCl m a dryer, preferably in a rotating Troinmeltrockner, preferably with internals, which preferably achieve a combined radial and vertical movement, or preferably xn a fluidized bed, or a
- Fluidized bed preferably below Zubowung of gases such as air or nitrogen or an inert gas, preferably at temperatures high 100 0 C, particularly preferably larger 300 0 C, most preferably large 400 0 C, with a Leerrohgas founded of 0.1 - 100 cm / s more preferably 1-10 cm / s, preferably the traces of hydrogen chloride HCl, analytically measured by a measurement of the pH, recordably by suspending 4 g of silica in 100 ml of water and (6) preferably homogenization, for example by mixing and fluidization m a silo of a certain defined amount from silicic acid to a homogeneous charge, eg 1-20 tons, preferably 5-15 tons, (7) storage in silos and (8) optionally compression, for example with roller compressors, screw compressors, - piston compressors, preferably roller compressors, (9) filling in Container, for example in 5 - 20 kg bags, consisting of multi-ply paper, optionally coated one or more layers, preferably
- the generation of the gas temperature in a fluidized bed, or a Flie ⁇ bett, for purifying the fumed silica, for example of hydrogen chloride, HCl, preferably with the supply of gases such as air or nitrogen or inert gas, for purifying the silica of HCl can be done by electrical heating of the gas or, for reasons of economy and conservation of energy resources, by burning a fuel gas such as hydrogen, methane, ethane, propane, butane) with air or oxygen-containing gas; Preferably, this hydrogen is used.
- no additional water is added throughout the process, except for the water produced by the reaction of the reaction gases.
- the silica can be compacted by moistening with a liquid and subsequent drying.
- Moistening can be carried out by Exnruhren or Emdispergieren in a liquid.
- the moistening can be carried out by spraying, that is to say the silica is compacted by spraying with liquid and subsequent drying.
- the pyrogenic silica can be used both as hydrophilic and with organosilicon compounds silylated ß silicic acid. Preference is given to using hydrophilic silica.
- the silica has a tap density according to DIN of 20 to 120 g / l, more preferably 25 to 45 g / l prior to compacting.
- the silica has a after compression
- Drying of the silica is preferably carried out by drying techniques as described in DE 4419234, US 5,686,054 or DE 10145162, ⁇ S 6,800,413.
- Preferred liquids for densifying silica are preferably low-viscosity and low-volatile siloxanes, such as hexamethyldisiloxane, low-viscosity and low-volatile hydrocarbons, such as n-hexane or toluene, are low-viscosity and low-volatility alkyl alcohols such as methanal, ethanol or isopropanol, even those denatured by additives are ketones, such as acetone, or ethers, such as tetrahydrofuran, or protic solvents, such as water, and mixtures thereof.
- low-viscosity and low-volatile siloxanes such as hexamethyldisiloxane
- low-viscosity and low-volatile hydrocarbons such as n-hexane or toluene
- low-viscosity and low-volatility alkyl alcohols such as methanal, ethanol or isoprop
- Preferred liquids are those with a high dielectric constant, particularly preferably with a dielectric constant of greater than 20.
- Preferred liquids are those of high density, more preferably having a density of greater than 0.9 g / cm 3 .
- Preferred liquids are those with high surface tension, more preferably with a surface tension greater than 40 mN / m.
- Fumed silica inventively produced preferably 30 to 500 m 2 / q, preferably 70-330 MVG, particularly preferably 80 to 230 MVG, particularly preferably 130 to 170 m ⁇ / g specific surface area, preferably measured by the BET method, and an average ⁇ ggregatspumblegroße, preferably measured as sphere-equivalent hydrodynamic diameter, of preferably 50 to 500 nr, preferably 120 to 350 nrn, particularly preferably 130 to 200 nm and a relative Thickening effect in liquids ⁇ / ⁇ of preferably greater than 2.0, preferably greater than 4.0, particularly preferably greater than 6.0, very particularly preferably greater than 7.5 and a fraction of less than 0.03% by weight, preferably less than 0.015% by weight .%, Particularly preferably less than 0.008 wt.% Coarse particles, preferably 30 to 500 m 2 / q, preferably 70-330 MVG, particularly preferably 80 to 230 MVG, particularly preferably 130 to
- Another object of the invention is a fumed silica, wherein this a Verdickungswrrkung, described as relative thickening ⁇ / ⁇ O in a silicone oil with optimum dispersion, preferably greater than 2.0, a mean spherical equivalent hydrodynamic diameter in water at pH greater than 9 of 150 to 300 nanometers, a content of boron of less than 1 ppm, a content of titanium of less than 1 ppm, an iron content of less than 1 ppm, an aluminum content of less than 10 ppm, a content of nickel smaller 1 ppm, a content of copper of less than 1 ppm, a germanium content of less than 1 ppm.
- the silicic acid which is produced by the process according to the invention is a fumed silica, preferably the 30 to 500 mVg, preferably 70 to 330 m z / g, particularly preferably 80 to 230 m ? / g, more preferably 80 to 170 m ?
- / g specific surface area preferably measured according to BET, and is a fumed silica which has an average aggregate particle size, preferably measured as spherical equivalent hydrodynamic diameter, of 100 to 500 nm, preferably 150 to 350 nm, more preferably from 150 to 250 nm, preferably measured measured as described above and is a fumed silica having a relative thickening effect in liquids ⁇ / ⁇ ö of preferably large 2.0, preferably large 4.0, especially preferably large 6.0 very particularly preferably large 7.5, preferably measured as described above, and is a fumed silica which has a fraction of less than 0.03 wt.%, preferably less than 0.015 wt.%, particularly preferably less than 0.005 wt.% Coarse particles, preferably coarse particles larger than 10 microns
- Diameter particularly preferably greater than 40 ⁇ m, based on the fumed silica, and is a pyrogenic silica which is less than 100% of coarse particles, preferably less than 20,000 coarse particles, more preferably less than 10,000 coarse particles, very particularly preferably less than 5,000 coarse particles, in particular, less than 1,000 coarse particles of greater than 10 ⁇ m, particularly preferably greater than 1.5 ⁇ m, very particularly preferably greater than 1.0 ⁇ m, in particular preferably greater than 0.56 ⁇ m per 1 milliliter (ml or cm 3 ), preferably based on a 1 to 50% by weight, particularly preferably on a 10% strength by weight aqueous dispersion of the silica.
- the fumed silica prepared according to the invention preferably exhibits a proportion of coarse
- An example of a suitable measuring method is a gravimetric determination of the screen pressure level, for example according to Mocker ⁇ oversize> 40 ⁇ m ⁇ .
- the fumed silica produced according to the invention contains less than 0.05% by weight, preferably less than 0.03 Gew%, more preferably less than 0.015 wt.%, Most preferably less than 0.008 wt.% Coarse sintered particles having a density of 200 to 2500 g / l and having a diameter of 0.5 to 500 microns.
- An example of suitable measuring methods is the use of the optical centrifuge, for example the LÜMifuge® device.
- the fumed silica contains agglomerates and flakes with a density of 10 to 200 g / l and with a diameter of 1 to 500 ⁇ r ⁇ ,
- the size of the silica agglomerates can preferably be measured with the Fraunhofer light diffraction on the silica in aqueous dispersion or as a dry aerosol or powder or with sieve methods. Suitable devices are offered, for example, by Malvern®, Sympatec®, Coulter®, Zilas® or Horiba®.
- the fumed silica preferably exhibits low contamination with non-silica portions.
- the fumed silica preferably has a content of a non-silicon element of less than 1% by weight, preferably less than 0.1% by weight, more preferably less than 0.01% by weight, very particularly preferably less than 10 ppm by weight, in particular preferably less than 1 ppm by weight, based on the total silica.
- the silica prepared according to the invention has an aluminum content of less than 10 ppm by weight, preferably less than 1 ppm of aluminum, less than 10 ppm by weight of boron, preferably less than 1 ppm of boron, less than 1 ppm by weight of titanium, preferably less than 200 ppb by titanium. and to iron, cobalt, nickel and copper less than 1 ppm by weight, preferably iron, cobalt, nickel and copper smaller than 200 ppb, based on the total silica.
- the silicic acid produced has a fractal surface dimension of less than 3, preferably from 1.9 to 2.7, more preferably from 2.0 to 2.1.
- the silicic acid produced has a fractal dimension of the mass of less than 3, preferably 1.5 to 2.8, more preferably from 1.8 to 2.3, most preferably from 1.9 to 2.1.
- the silicic acid produced has a content of surface silanol groups SiOH of 1.5 ⁇ 2.0, preferably 1.7-1.9 SiOH per nm ? specific surface area measured according to BET, or measured as acidic SiOH by means of a titration method based on the method of Sears.
- the silica does not contain any chlorinated polyaromatic hydrocarbons, especially those containing oxygen atoms.
- the content of chlorinated aromatic dioxins and furans is less than 1 ppb wt.
- the relative thickening effect ⁇ / ⁇ O of the fumed silica is measured as the quotient of the viscosity ⁇ t of a liquid medium containing fumed silica, measured at a temperature of 25 ° C and from the viscosity ⁇ O of a liquid medium containing no fumed silica, measured at a temperature of 25 ° C.
- liquid medium examples are mixtures of a polyester resin, for example about 65 wt.%, for example, a condensation product of ortho-phthalic anhydride and maleic anhydride on the one hand and a diol, for example 1,2-propanediol, on the other hand, with a solvent, for example about 35% by weight, for example of a reactive monomer, for example monostyrene, or for example silicone, for example preferably polydimethylsiloxane, preferably end-capped with trirethylethylsiloxy groups, preferably those having a viscosity at 25 ° C. of from 0.5 to 5.0 Pa s, preferably 0.9 - 2.1 Pa s, more preferably about 1.0 Pa s.
- the amount of pyrogenic silica in the liquid medium is preferably 1 to 5% by weight, more preferably 1.8 to 3.4% by weight, most preferably 2% by weight.
- the measurements of the viscosity at a temperature of 25 0 C and at the same constant shear rate preferably at a constant shear rate of 0.5 to 200 l / s, more preferably 0.9 to 20 l / s, more preferably at 10 l / s.
- the dispersion of the fumed silica in the liquid medium is preferably carried out with optimal dispersion, for example with a Zahnottindissolver at a
- the average aggregate particle size is preferably measured as the mean sphere-equivalent hydrodynamic diameter, preferably measured by photocorrelation spectroscopy or dynamic light scattering or quasi-elastic light scattering, at an angle of 1 to 179 °, preferably about 90 °, or in another preferred embodiment in backscatter at an angle of 170 ° to 179 °, preferably at an angle of about 173 °, for example with the device Malvern Zetasizer® or Malvern Nanosizer® and, for example, reading the Z-average value according to a cumulative analysis or the standard algorithm, as mean aggregate diameter and preferably after dispersion at 0.001 to 5 wt.%, Preferably about 0.3 wt.% In preferably alkaline water, preferably pH 9, more preferably from about pH 10, preferably adjusted with am
- the proportion of coarse particles is preferably determined gravimetrically.
- a suitable method of measurement here is a gravimetric determination of the screen residue level after screening of the silica scrubbed with water, with screens of less than or equal to 100 ⁇ m mesh sizes, preferably less than or equal to 40 ⁇ m, particularly preferably less than or equal to 10 ⁇ m.
- a particularly preferred example of this is the method of Mocker, for example by means of water jet and weighing the coarse particles on a 40 micron sieve ⁇ after weighing so gravimetrically obtained the Uberkorn> 40 microns).
- the proportion of coarse particles is preferably determined to be coarse sintered particles having a density of 100 to 2500 g / l, preferably 200 to 2500 g / l and a diameter of 0.5 to 500 ⁇ m, preferably 2 ⁇ ra to 100 ⁇ m.
- optical centrifuge for example the LUMifuge® device.
- the proportion of coarse particles in the fumed silica prepared by the process according to the invention on an aqueous dispersion f or chemical formulation based on such a dispersion which has been prepared from the silica by means of optimal dispersion, for example with an ultrasonic tip and a dispersion time of greater 1 minute, preferably 2.5 minutes, and more optimal
- Stabilization for example alkaline stabilization at pH 9 - H r preferably pH 9.2 to 10.2, with commercially available counting methods for the determination of large particles, for example based on light extinction methods or light scattering methods, for example on white light or from laser light, for example with an Accusizer® 680 or 780 device, or a Liquilaz® device from PSM, Oregon, USA, or a device FAS® 815 from Topas, Germany.
- the quality of the product silica is checked at regular intervals by sampling and analysis of these samples with typical silica methods such as the specific surface area, for example measured by BET, or, for example, measured by acid-base titration, as described, for example, by Sears et al.
- typical silica methods such as the specific surface area, for example measured by BET, or, for example, measured by acid-base titration, as described, for example, by Sears et al.
- the particle size for example, the average aggregate diameter, for example, as a hydrodynamic diameter, for example as measured by dynamic light scattering, or in the other methods specified, such as the pH, for example, measured as the pH of a Dispersion of 4% by weight of silicic acid in water, such as the screen residue on coarse components, for example measured by the Mocker method using a water jet and a 40 ⁇ m sieve, or as payment methods for the analysis of coarse particles, for example with white light or laser light extinction - and
- Numbering method as described above such as the thickening effect in liquid media, for example as described above, preferably according to defined protocols.
- the sample is drawn with a specific sampling device.
- the traces of HCl measured analytically by measuring the pH, are obtained by suspending 4 g of silica in 100 ml of water
- the fumed silica preferably exhibits low contamination with non-silica portions.
- Non-silicon elements are preferably qualitatively or semi-quantitatively detected after fuming of the silica with hydrofluoric acid by means of spectral analysis or quantitatively measured by means of inductive-coupled plasma and optical emission analysis or mass spectrometry.
- the fumed silica according to the invention is preferably used as thickener, rheology additive, thixotropic agent, reinforcing agent for elastomers, elastomers and duromers, for example in surface coatings, paints and inks, adhesives, sealants, glass fiber reinforced plastics, composites, rubbers and others Plastics, as abrasive particles in the chemical-mechanical planarization in the Halbleitindust ⁇ e, as a polishing agent, as a thermal insulation material and as a raw material for thermal insulation materials, for the production of print media, as a flow aid, for creating layers and moldings that may be dense or porous, as an additive and Filler for paints, varnishes, inks, adhesives and sealants and rubbers, of silicones or synthetic or natural rubber, eg for tires and soles.
- fumed silica The pyrogenic silica prepared according to the method according to the invention is referred to as fumed silica
- Matting agents used in paints and coatings as well as for adhesive and sealant systems are used in paints and coatings as well as for adhesive and sealant systems.
- the silica is used as rheological.es additive and as a filler in sealants in amounts of 5 to 15%, preferably as a sealant for joints in the sanitary and cake sector, in window and facade construction, in building construction and civil engineering and in machinery and in toolmaking.
- the silica is used in the process of chemical mechanical polishing in optics, in the semiconductor industry, in the electrical and in the electronics industry and in the surface treatment of metals, ceramics and glasses as abrasives or polishing agents.
- Another object is a Formkorper, coating or impregnation containing the novel silica.
- the silica is used in coating materials, surface layers, textiles, polymers adhesives, sealants, rubbers and composite materials, as well as in coating materials, adhesives, sealants, rubbers and composite materials for controlling the rheology or mechanical properties, or for controlling rheology and reinforcement.
- Another object is a powder or toner containing the silicic acid according to the invention.
- the silica is used in powder, in powder, in
- Toners in electrophotography, in fire-extinguishing powder, as well as in powders, in toners in electrophotography, in fire-extinguishing powder for controlling the dry flowability or the electrical charge, or in controlling the dry flowability and the electric charge.
- FIG. 1
- FIG. 1 shows a flame reactor according to the invention with flame orientation from top to bottom, in longitudinal section, where 1 denotes the reactor chambers and 1.1 the diameter at the reactor head and 1.2 the diameter at half the reactor length. 1.3 means the height equal to the length of the reactor chamber, 1.4 being the diameter of the reactor chamber. 2 designates the nozzle and 2.1 the diameter of the nozzle.
- a gas mixture which enters from a nozzle with a gas velocity of 58 m / s at the head of a combustion chamber via a nozzle in a burner chamber, the combustion chamber a length of
- the combustion chamber has a volume of 1.7 m 3 , and a volume to height ratio of 0.38 m ? and a cross-sectional area of 0.38 m ? which is brought into the combustion chamber at 1000 0 C to 2000 0 C to the reaction ..
- Purification of the fumed silica in a fluidized bed by hot gases at 400 to 800 0 C is a pyrogenic silica in an amount of 217 kg / h, corresponding to 1920 tons per year with a yearly bars of 8864 hours, with a BET specific surface area of 150 m 7 / g, with a Tap density after bagging in 10 kg paper bag of 40 g / l, with a pH of 4 wt .-% aqueous dispersion of 4.1, a Siebruckstand Mocker large 40 ⁇ in of 0.005 wt.% 7 a thickening ⁇ / ⁇ in a silicone oil of 6.5, a thickening effect ⁇ / ⁇ in an uncrosslinked unsaturated polyester resin of 4.5, a mean ball-equivalent hydrodynamic particle size of 220 nm after ultrasonic dispersion at 0.3 wt%, a temperature of 25 ° C and at pH 10 and measured obtained with a Malvern Zet
- Paper sack of 40 g / l having a pH of 4% by weight aqueous dispersion of 4.0, a sieve residue of Mocker greater than 40 ⁇ m of 0.005% by weight, a thickening effect ⁇ / ⁇ O in a silicone oil of 7.5, a thickening effect ⁇ / ⁇ O in an uncrosslinked unsaturated polyester resin of 6.7, a average spherical equivalent hydrodynamic particle size of 200 nm after ultrasonic dispersion at 0.3 wt.%, a temperature of 25 ° C and at pH 10 and measured with a Malvern Zetasizer Nano ZS® at a backscatter angle of 173 °.
- Cross-sectional area of 0.71 m 2 is brought to 1000 ° C in the combustion chamber at 1000 0 C to the reaction.
- cooling to less than 200 0 C separating the resulting hydrogen chloride gas from the resulting fumed silica by fabric filters, recovery of dry hydrogen chloride gas in a multi-stage absorption and desorption, reduction of excess chlorine gas, and exhaust gas purification, and purification of the pyrogenic Silicic acid in a fluidized bed by hot gases at 400 to 800 0 C, is a fumed silica in an amount of 321 kg / h, corresponding to 2850 tons per year with a yearly intervals of 8864 hours, with a specific surface area BET of 200 ra z / g, with a tap density after bagging in 10 kg paper bag of 40 g / l, with a pH of 4% by weight aqueous dispersion of 4.0, a Siebruckstand after Mocker large 40 microns of 0.005
- Combustion chamber at 1000 0 C to 2000 0 C reacted. After aspirating from the combustion chamber, cooling to less than 200 0 C, separating the resulting hydrogen chloride gas from the resulting fumed silica by fabric filter, recovery of dry hydrogen chloride gas in one
- Silica according to Example 1 - 11 is incorporated in a built-up on a Acetatvernetzersystem at room temperature crosslinking silicone sealant system with black color.
- Nm 3 / h is the volume of gas or steam delivered per 1 hour.
- Nm 3 The standard cubic meter (abbreviation: m 3 (iN), obsolete abbreviation: Nm 3 or often simplified also Nm3 written) is a unit used in process engineering for the standard volume of a gas.
- the definition of the standard cubic rower is defined in DIN 1343 and ISO 2533.
- a standard cubic meter is that amount which bar one cubic meter of gas at a pressure of 1.01325, a humidity of 0% (dry gas) and a temperature of 0 0 C ⁇ DIN 1343) or 15 ° C (ISO 2533) corresponds.
- Conditions a volume of 1 m3, but in the case of divergent conditions, generally another volume which can be determined by special conversions.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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CN200980149989XA CN102245291A (zh) | 2008-12-12 | 2009-12-10 | 小型生产装置中生产热解硅酸 |
KR1020117016183A KR101329381B1 (ko) | 2008-12-12 | 2009-12-10 | 소규모 제조 플랜트에서 제조되는 발열성 규산 |
EP09796358A EP2361149A1 (de) | 2008-12-12 | 2009-12-10 | Pyrogene kieselsäure hergestellt in einer produktions-anlage mit kleiner kapazität |
US13/139,190 US9139444B2 (en) | 2008-12-12 | 2009-12-10 | Pyrogenic silicic acid manufactured in a small-scale production plant |
JP2011540097A JP2012511416A (ja) | 2008-12-12 | 2009-12-10 | 小規模製造工場で製造される発熱性ケイ酸 |
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DE102008054592.9 | 2008-12-12 | ||
DE200810054592 DE102008054592A1 (de) | 2008-12-12 | 2008-12-12 | Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit kleiner Kapazität |
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US (1) | US9139444B2 (de) |
EP (1) | EP2361149A1 (de) |
JP (1) | JP2012511416A (de) |
KR (1) | KR101329381B1 (de) |
CN (1) | CN102245291A (de) |
DE (1) | DE102008054592A1 (de) |
WO (1) | WO2010066828A1 (de) |
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JP5968137B2 (ja) * | 2012-07-20 | 2016-08-10 | ナミックス株式会社 | 液状封止材、それを用いた電子部品 |
US9593272B2 (en) | 2013-07-24 | 2017-03-14 | Tokuyama Corporation | Silica for CMP, aqueous dispersion, and process for producing silica for CMP |
JP6727803B2 (ja) * | 2015-12-21 | 2020-07-22 | キヤノン株式会社 | トナーおよびトナーの製造方法 |
EP3539149B1 (de) * | 2016-11-11 | 2022-01-05 | MKS Instruments, Inc. | Systeme und verfahren zur erzeugung einer leitenden flüssigkeit mit entionisiertem wasser mit darin gelöstem ammoniakgas |
JP2018180279A (ja) * | 2017-04-13 | 2018-11-15 | コニカミノルタ株式会社 | 静電荷像現像用トナー |
JP7479849B2 (ja) * | 2017-07-13 | 2024-05-09 | ワッカー ケミー アクチエンゲゼルシャフト | 高分散二酸化ケイ素を製造する方法 |
DE102018216453A1 (de) * | 2018-09-26 | 2020-03-26 | Thyssenkrupp Ag | Beschichtung von kornorientiertem Elektroband durch CVD II |
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US4559218A (en) * | 1980-12-12 | 1985-12-17 | Flemmert Goesta | Process and apparatus for preparing finely-divided silicon dioxide having good thixotropic properties |
DE4419234A1 (de) | 1994-06-01 | 1995-12-07 | Wacker Chemie Gmbh | Verfahren zur Silylierung von anorganischen Oxiden |
EP1164115A2 (de) * | 2000-06-15 | 2001-12-19 | Degussa AG | Verfahren zur Herstellung von mit Titandioxid beschichteten Strahlpartikeln |
DE10145162A1 (de) | 2001-09-13 | 2003-04-10 | Wacker Chemie Gmbh | Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen |
WO2006087136A2 (de) * | 2005-02-18 | 2006-08-24 | Wacker Chemie Ag | Partikel mit geringer spezifischer oberfläche und hoher verdickungswirkung |
DE102006054156A1 (de) * | 2006-11-16 | 2008-05-21 | Wacker Chemie Ag | Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit großer Kapazität |
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US4292290A (en) | 1980-04-16 | 1981-09-29 | Cabot Corporation | Process for the production of finely-divided metal and metalloid oxides |
JPH03242342A (ja) * | 1990-02-19 | 1991-10-29 | Furukawa Electric Co Ltd:The | 光ファイバ母材の製造方法 |
DE19526743A1 (de) | 1995-07-21 | 1997-01-23 | Wacker Chemie Gmbh | Verfahren zum Befüllen und Entleeren eines Behälters |
DE19756840A1 (de) * | 1997-01-23 | 1998-07-30 | Degussa | Pyrogene Oxide und Verfahren zu ihrer Herstellung |
-
2008
- 2008-12-12 DE DE200810054592 patent/DE102008054592A1/de not_active Withdrawn
-
2009
- 2009-12-10 CN CN200980149989XA patent/CN102245291A/zh active Pending
- 2009-12-10 KR KR1020117016183A patent/KR101329381B1/ko not_active IP Right Cessation
- 2009-12-10 WO PCT/EP2009/066800 patent/WO2010066828A1/de active Application Filing
- 2009-12-10 JP JP2011540097A patent/JP2012511416A/ja active Pending
- 2009-12-10 EP EP09796358A patent/EP2361149A1/de not_active Withdrawn
- 2009-12-10 US US13/139,190 patent/US9139444B2/en not_active Expired - Fee Related
Patent Citations (8)
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US4559218A (en) * | 1980-12-12 | 1985-12-17 | Flemmert Goesta | Process and apparatus for preparing finely-divided silicon dioxide having good thixotropic properties |
DE4419234A1 (de) | 1994-06-01 | 1995-12-07 | Wacker Chemie Gmbh | Verfahren zur Silylierung von anorganischen Oxiden |
US5686054A (en) | 1994-06-01 | 1997-11-11 | Wacker-Chemie Gmbh | Process for the silylation of inorganic oxides |
EP1164115A2 (de) * | 2000-06-15 | 2001-12-19 | Degussa AG | Verfahren zur Herstellung von mit Titandioxid beschichteten Strahlpartikeln |
DE10145162A1 (de) | 2001-09-13 | 2003-04-10 | Wacker Chemie Gmbh | Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen |
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WO2006087136A2 (de) * | 2005-02-18 | 2006-08-24 | Wacker Chemie Ag | Partikel mit geringer spezifischer oberfläche und hoher verdickungswirkung |
DE102006054156A1 (de) * | 2006-11-16 | 2008-05-21 | Wacker Chemie Ag | Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit großer Kapazität |
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DE102008054592A1 (de) | 2010-06-17 |
EP2361149A1 (de) | 2011-08-31 |
US9139444B2 (en) | 2015-09-22 |
KR20110106364A (ko) | 2011-09-28 |
CN102245291A (zh) | 2011-11-16 |
JP2012511416A (ja) | 2012-05-24 |
KR101329381B1 (ko) | 2013-11-14 |
US20110256030A1 (en) | 2011-10-20 |
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