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WO2009116618A1 - Curable composition, anisotropic conductive material and connection structure - Google Patents

Curable composition, anisotropic conductive material and connection structure Download PDF

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Publication number
WO2009116618A1
WO2009116618A1 PCT/JP2009/055414 JP2009055414W WO2009116618A1 WO 2009116618 A1 WO2009116618 A1 WO 2009116618A1 JP 2009055414 W JP2009055414 W JP 2009055414W WO 2009116618 A1 WO2009116618 A1 WO 2009116618A1
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WO
WIPO (PCT)
Prior art keywords
group
curable composition
epoxy
carbon atoms
component
Prior art date
Application number
PCT/JP2009/055414
Other languages
French (fr)
Japanese (ja)
Inventor
敬士 久保田
Original Assignee
積水化学工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 積水化学工業株式会社 filed Critical 積水化学工業株式会社
Priority to CN200980109199.9A priority Critical patent/CN101970525B/en
Priority to JP2009512760A priority patent/JP4472779B2/en
Publication of WO2009116618A1 publication Critical patent/WO2009116618A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/30Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • C08G59/302Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads

Definitions

  • the present invention relates to a curable composition, and more specifically, a curable composition having a low linear expansion coefficient and capable of obtaining a cured product that is difficult to peel off from a circuit board or an electronic component even when heated, and the cured product.
  • the present invention relates to an anisotropic conductive material using a conductive composition and a connection structure.
  • Anisotropic conductive materials such as anisotropic conductive paste, anisotropic conductive ink, anisotropic conductive adhesive, anisotropic conductive film, or anisotropic conductive sheet are widely known.
  • An anisotropic conductive material is used for connection between an IC chip and a flexible printed circuit board, connection between an IC chip and a circuit board having an ITO electrode, and the like.
  • an anisotropic conductive material is arranged between the electrode of the IC chip and the electrode of the circuit board, these electrodes can be connected by heating and pressurizing.
  • Patent Document 1 includes an anisotropic containing a thermosetting insulating adhesive, conductive particles, an imidazole latent curing agent, and an amine latent curing agent.
  • a conductive conductive adhesive film is disclosed.
  • Patent Document 1 describes that the connection reliability is excellent even when this anisotropic conductive adhesive film is cured at a relatively low temperature. JP-A-9-115335
  • solder balls having a spherical shape are used.
  • the solder balls mounted on the electrodes of the IC chip are melted and solidified, whereby the IC chip is mounted on the flexible printed circuit board.
  • the reflow means “a soldering method in which an electronic component chip is arranged so that the electronic component chip provided with solder contacts the electrode of the substrate, and the solder is melted and solidified by heating”.
  • the heating temperature necessary to start curing is relatively low.
  • the linear expansion coefficient of the cured product of the anisotropic conductive adhesive film is high. For this reason, when the circuit board connected using the said anisotropic conductive adhesive film is heated, the anisotropic conductive adhesive film may peel from a circuit board. Therefore, the connection reliability between the electrodes may be lowered.
  • the heating temperature required to start curing is relatively low.
  • the curing reaction may not sufficiently proceed at low temperatures.
  • An object of the present invention is to provide a curable composition capable of obtaining a cured product having a low coefficient of linear expansion and difficult to peel from a circuit board or an electronic component even when heated, and an anisotropy using the curable composition It is to provide a conductive material and a connection structure.
  • the limited object of the present invention is not only to obtain a cured product having a low coefficient of linear expansion, but also to be able to cure quickly at a low temperature, and when used for connection of a connection object member, It is providing the curable composition which can connect an object member efficiently, and the anisotropic conductive material and connection structure using this curable composition.
  • the component having at least one of an epoxy group and a thiirane group and a curing agent and the component having at least one of the epoxy group and the thiirane group have the following formula (A curable composition comprising a monomer having a structure represented by 1), a multimer in which at least two of the compounds are bonded, or a mixture of the monomer and the multimer is provided. .
  • R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2)
  • R2 represents an alkylene group having 1 to 5 carbon atoms
  • R3 represents carbon
  • X 1 represents an oxygen atom or a sulfur atom
  • X 2 represents an oxygen atom or a sulfur atom.
  • R4 represents an alkylene group having 1 to 5 carbon atoms
  • X3 represents an oxygen atom or a sulfur atom.
  • the amount of the compound having the structure represented by the formula (1) in 100% by weight of the component having at least one of the epoxy group and the thiirane group is in the range of 5 to 100% by weight.
  • the component having at least one of the epoxy group and thiirane group is an epoxy compound monomer having a structure represented by the following formula (11), and the epoxy compound is at least It is preferable to further include a multimer in which two are combined, or a mixture of the monomer and the multimer.
  • the curable composition can be quickly cured at a low temperature.
  • a curable composition is used for the connection between the electrode of a circuit board and the electrode of an electronic component, it can connect efficiently between these electrodes.
  • R11 represents an alkylene group having 1 to 10 carbon atoms
  • R12 represents an alkylene group having 1 to 10 carbon atoms
  • R13 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or the following formula ( 12)
  • R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a structure represented by the following formula (13).
  • R15 represents an alkylene group having 1 to 10 carbon atoms.
  • R16 represents an alkylene group having 1 to 10 carbon atoms.
  • R13 and R14 are hydrogen atoms.
  • an epoxy compound having a structure represented by the formula (11) in 100% by weight of a component having at least one of the epoxy group and the thiirane group in 100% by weight of a component having at least one of the epoxy group and the thiirane group.
  • the content of the monomer, the multimer in which at least two of the epoxy compounds are bonded, or the mixture of the monomer and the multimer is in the range of 1 to 50% by weight.
  • the component having at least one of the epoxy group and the thiirane group further includes an epoxy compound having a heterocyclic ring containing a nitrogen atom.
  • the epoxy compound having a heterocyclic ring containing a nitrogen atom is represented by the epoxy compound represented by the following formula (16) or the following formula (17). Epoxy compound.
  • R21 to R23 each represents an alkylene group having 1 to 5 carbon atoms, and Z represents an epoxy group or a hydroxymethyl group.
  • R24 to R26 each represents an alkylene group having 1 to 5 carbon atoms
  • p, q and r each represents an integer of 1 to 5
  • R27 to R29 each represents an alkylene group having 1 to 5 carbon atoms. Indicates a group.
  • the epoxy compound having a heterocyclic ring containing a nitrogen atom is triglycidyl isocyanurate or trishydroxyethyl isocyanurate triglycidyl ether.
  • the content of the epoxy compound having a heterocyclic ring containing the nitrogen atom in 100% by weight of the component having at least one of the epoxy group and the thiirane group. Is in the range of 0.1 to 10% by weight.
  • the component having at least one of the epoxy group and the thiirane group further includes an epoxy compound having an aromatic ring.
  • the aromatic ring is a benzene ring, a naphthalene ring or an anthracene ring.
  • the anisotropic conductive material according to the present invention contains a curable composition constituted according to the present invention and conductive particles.
  • connection structure which concerns on this invention is the connection part which has electrically connected the 1st electrical connection object member, the 2nd electrical connection object member, and the 1st, 2nd electrical connection object member.
  • the connecting portion is made of an anisotropic conductive material configured according to the present invention.
  • connection structure includes a first connection target member, a second connection target member, and a connection part connecting the first and second connection target members, and the connection part. Is formed by a curable composition constructed according to the present invention.
  • the curable composition according to the present invention includes a monomer having a structure represented by the above formula (1), a multimer in which at least two of the compounds are bonded, or the monomer and the multimer. Therefore, a cured product having a low linear expansion coefficient can be obtained.
  • the cured product of the anisotropic conductive material according to the present invention has a low coefficient of linear expansion, when the anisotropic conductive material of the present invention is used for connection between the electrode of the circuit board and the electrode of the electronic component, The reliability of the general connection can be increased.
  • FIG. 1 is a front cross-sectional view schematically showing a connection structure using an anisotropic conductive material including a curable composition according to an embodiment of the present invention and conductive particles.
  • the curable composition according to the present invention contains a component having at least one of an epoxy group and a thiirane group and a curing agent.
  • the component having at least one of the epoxy group and thiirane group is a monomer of a compound having a structure represented by the following formula (1), a multimer in which at least two of the compounds are bonded, or the monomer And a component that is a mixture of the body and the multimer (hereinafter sometimes abbreviated as component A).
  • Component A includes a monomer of a compound having a structure represented by the following formula (1), a multimer in which at least two of the compounds are bonded, and a mixture of the monomer and the multimer. Either.
  • R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2)
  • R2 represents an alkylene group having 1 to 5 carbon atoms
  • R3 represents carbon
  • X 1 represents an oxygen atom or a sulfur atom
  • X 2 represents an oxygen atom or a sulfur atom.
  • R4 represents an alkylene group having 1 to 5 carbon atoms
  • X3 represents an oxygen atom or a sulfur atom.
  • the curing rate of the curable composition may decrease, or the linear expansion coefficient of the cured product may increase. Moreover, when carbon number of the said alkylene group exceeds 5, the cure rate of a curable composition may fall. When the carbon number of the alkyl group and the alkylene group is small, the curing rate of the curable composition is increased.
  • R1 in the above formula (1) is preferably an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (2), more preferably a structure represented by the above formula (2).
  • the alkyl group may be an alkyl group having a linear structure or an alkyl group having a branched structure.
  • R2 is preferably an alkylene group having 1 to 3 carbon atoms, and more preferably a methylene group.
  • R3 in the above formula (1) is preferably an alkylene group having 1 to 3 carbon atoms, and more preferably a methylene group.
  • the alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. Further, R2 and R3 may be the same or different.
  • R2 and R3 may be bonded to any part of the benzene ring of the fluorene structure.
  • the compound having a structure represented by the above formula (1) is preferably a compound having a structure represented by the following formula (1A).
  • R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2)
  • R2 represents an alkylene group having 1 to 5 carbon atoms
  • R3 represents carbon
  • X 1 represents an oxygen atom or a sulfur atom
  • X 2 represents an oxygen atom or a sulfur atom.
  • X1 in the above formula (1) is an oxygen atom or a sulfur atom.
  • X2 in the above formula (1) is an oxygen atom or a sulfur atom.
  • X1 and X2 in the formula (1) are oxygen atoms, the melting point of the compound having the structure represented by the formula (1) can be lowered, and the storage stability of the curable composition is improved. Can do.
  • X1 and X2 in the above formula (1) are sulfur atoms, the curing rate of the curable composition can be increased, and the linear expansion coefficient of the cured product can be lowered.
  • X1 and X2 may be the same or different.
  • R4 is preferably an alkylene group having 1 to 3 carbon atoms, and more preferably a methylene group.
  • the alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. When carbon number of the said alkylene group is small, the cure rate of a curable composition will become high.
  • R4 may be bonded to any part of the benzene ring.
  • the structure represented by the above formula (2) is preferably a structure represented by the following formula (2A).
  • R4 represents an alkylene group having 1 to 5 carbon atoms
  • X3 represents an oxygen atom or a sulfur atom.
  • X3 in the above formula (2) is an oxygen atom or a sulfur atom.
  • X3 in the formula (2) is an oxygen atom
  • the melting point of the compound having the structure represented by the formula (1) can be lowered, and the storage stability of the curable composition can be improved.
  • X3 in the above formula (2) is a sulfur atom
  • the curing rate of the curable composition can be increased, and the linear expansion coefficient of the cured product can be lowered.
  • X3 may be the same as or different from X1 and X2.
  • the compound having the structure represented by the above formula (1) has a fluorene structure, and the total of the epoxy group and the thiirane group may be two or more.
  • examples of the compound having a structure represented by the above formula (1) include a compound represented by the following formula (1B).
  • R2 in the above formula (1A) is a methylene group
  • R3 is a methylene group
  • X1 is an oxygen atom
  • X2 is an oxygen atom
  • R1 is represented by the above formula (2A).
  • R4 is a methylene group
  • X3 is an oxygen atom. Since X1, X2, and X3 in the above formulas (1) and (2) are oxygen atoms, the compound represented by the following formula (1B) is an epoxy compound.
  • examples of the compound having a structure represented by the above formula (1) include a compound represented by the following formula (1C).
  • R2 in the above formula (1A) is a methylene group
  • R3 is a methylene group
  • X1 is a sulfur atom
  • X2 is a sulfur atom
  • R1 is represented by the above formula (2A).
  • R4 is a methylene group
  • X3 is a sulfur atom. Since X1, X2 and X3 in the above formulas (1) and (2) are sulfur atoms, the compound represented by the following formula (1C) is a thiirane group-containing compound having a three-membered ring structure.
  • the compound having the structure represented by the above formula (1) is a monomer.
  • at least 2 compounds having the structure represented by the above formula (1) are used instead of the monomer of the compound having the structure represented by the above formula (1) or together with the monomer of the compound.
  • Individually linked multimers may be used.
  • the component A is a monomer of a compound having a structure represented by the above formula (1), a multimer in which 2 to 10 of the compounds are bonded, or a combination of the monomer and the multimer. It is preferably a mixture, more preferably a monomer of the above compound, a multimer in which 2 to 3 of the compound are bonded, or a mixture of the monomer and the multimer.
  • the viscosity of the curable composition may be too high.
  • the monomer of the compound having the structure represented by the formula (1) is synthesized, as a by-product, a multimer in which two or three of the monomers are combined is included, or storage conditions Depending on the case, two or more monomers may be bonded.
  • the epoxy compound corresponding to the compound having the structure represented by the above formula (1) can be synthesized, for example, as follows.
  • a raw material compound, a fluorene compound having a hydroxyl group, epichlorohydrin, sodium hydroxide, and methanol are mixed, cooled, and reacted. Thereafter, an aqueous sodium hydroxide solution is dropped. After dripping, it is further reacted to obtain a reaction solution. Next, water and toluene are added to the reaction solution, and the toluene layer is taken out. The toluene layer is washed with water and then dried to remove water and the solvent. In this way, an epoxy compound corresponding to the compound having the structure represented by the above formula (1) can be easily obtained.
  • the fluorene compound which has a hydroxyl group which is a raw material compound is marketed, for example from JFE Chemical Company etc., for example.
  • the thiirane group-containing compound corresponding to the compound having the structure represented by the above formula (1) is obtained by converting the epoxy group of the epoxy compound corresponding to the compound having the structure represented by the above formula (1) to a thiirane group. It can be synthesized by conversion. For example, after adding an epoxy compound that is a raw material compound or a solution containing the epoxy compound to a solution containing thiocyanate, an epoxy group is easily converted into a thiirane group by further adding a solution containing thiocyanate. it can.
  • the component A is preferably contained in the range of 5 to 60% by weight, more preferably in the range of 10 to 50% by weight. preferable.
  • cured material with a sufficiently low linear expansion coefficient may not be obtained.
  • curing agent will become relatively small, and the said component A etc. may not fully be hardened.
  • the content of the component A in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 5 to 100% by weight.
  • the content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiirane group is It is preferably in the range of 5 to 90% by weight.
  • the more preferable lower limit of the content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 10% by weight, the still more preferable lower limit is 15% by weight, and the more preferable upper limit is 80% by weight, more preferably 60% by weight, more preferably 30% by weight, and still more preferably 20% by weight.
  • the component having at least one of the epoxy group and the thiirane group includes, as an epoxy component other than the component A, a monomer of an epoxy compound having a structure represented by the following formula (11), It is preferable to further include an epoxy component (hereinafter sometimes abbreviated as epoxy component B) which is a multimer in which at least two are bonded, or a mixture of the monomer and the multimer.
  • the epoxy component B includes a monomer of an epoxy compound having a structure represented by the following formula (11), a multimer in which at least two epoxy compounds are bonded, and a mixture of the monomer and the multimer. Is one of the following.
  • R11 represents an alkylene group having 1 to 10 carbon atoms
  • R12 represents an alkylene group having 1 to 10 carbon atoms
  • R13 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or the following formula ( 12)
  • R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a structure represented by the following formula (13).
  • R15 represents an alkylene group having 1 to 10 carbon atoms.
  • R16 represents an alkylene group having 1 to 10 carbon atoms.
  • the curing rate of the curable composition may decrease. Moreover, when carbon number of the said alkyl group in the said Formula (11) exceeds 10, the cure rate of a curable composition may fall. When the carbon number of the alkylene group and the alkyl group in the above formulas (11) to (13) is small, the curing rate of the curable composition is increased.
  • R11 in the formula (11) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable.
  • R12 in the above formula (11) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable.
  • the alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. Further, R11 and R12 may be the same or different.
  • R13 in the above formula (11) is preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a structure represented by the above formula (12), and a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or It is preferably a structure represented by the above formula (12), more preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a structure represented by the above formula (12), a hydrogen atom, a methyl group , An ethyl group or a structure represented by the above formula (12) is more preferable, and a hydrogen atom, a methyl group or a structure represented by the above formula (12) is more preferable.
  • R14 in the above formula (11) is preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a structure represented by the above formula (13), and a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or A structure represented by the above formula (13) is more preferable, and a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (13) is more preferable.
  • a group, an ethyl group, or a structure represented by the above formula (13) is more preferable, and a hydrogen atom, a methyl group, or a structure represented by the above formula (13) is more preferable.
  • the alkyl group may be an alkyl group having a linear structure or an alkyl group having a branched structure. Also, R13 and R14 may be the same or different.
  • R15 in the above formula (12) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable.
  • R16 in the above formula (13) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable.
  • the alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure.
  • the epoxy compound having the structure represented by the above formula (11) has an unsaturated double bond and at least two epoxy groups.
  • the curable composition can be quickly cured at a low temperature. Furthermore, when the epoxy component B and conductive particles are added to the curable composition, and the composition containing the epoxy component B and the conductive particles is used for connection between electrodes of a circuit board or an electronic component, The electrodes can be connected efficiently.
  • Examples of the epoxy compound having the structure represented by the above formula (11) include an epoxy in which, in the above formula (11), R11 is a methylene group, R12 is a methylene group, R13 is a hydrogen atom, and R14 is a hydrogen atom.
  • R11 is a methylene group
  • R12 is a methylene group
  • R13 is a structure represented by the following formula (14)
  • R14 is a hydrogen atom
  • R11 is a methylene group
  • R12 is a methylene group
  • R13 is a structure represented by the following formula (14)
  • R14 is a hydrogen atom
  • R11 is a methylene group
  • R12 is a methylene group
  • R13 and R14 are epoxy compounds having a structure represented by the following formula (14), respectively.
  • R13 and R14 in the above formula (11) are preferably hydrogen atoms. That is, the epoxy compound having a structure represented by the above formula (11) is preferably an epoxy compound having a structure represented by the following formula (11A).
  • R11 represents an alkylene group having 1 to 10 carbon atoms
  • R12 represents an alkylene group having 1 to 10 carbon atoms.
  • R11 is a methylene group
  • R12 is a methylene group
  • R13 is a hydrogen atom
  • R14 is a hydrogen atom.
  • An epoxy compound represented by the following formula (11B) is more preferable.
  • the epoxy compound having a structure represented by the above formula (11) is a monomer.
  • the epoxy compound having the structure represented by the above formula (11) instead of the monomer of the epoxy compound having the structure represented by the above formula (11) or together with the monomer of the epoxy compound.
  • a multimer in which at least two are bonded may be used.
  • the epoxy component B includes an epoxy compound monomer having a structure represented by the above formula (11), a multimer in which 2 to 10 epoxy compounds are bonded, or the monomer and the large amount.
  • the viscosity of the curable composition may be too high.
  • the monomer of the epoxy compound having the structure represented by the above formula (11) is used, a multimer in which two or three of the monomers are combined is included as a by-product. Depending on storage conditions, two or more of the above monomers may be bonded.
  • the epoxy component B is preferably contained in the range of 10 to 50% by weight in 100% by weight of the curable composition of the present invention.
  • the cure rate in low temperature may not fully be raised.
  • curing agent will become relatively small, and the component A, the epoxy component B, etc. cannot fully be hardened
  • the content of the epoxy component B in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 1 to 50% by weight.
  • a curable composition can be hardened more rapidly at low temperature.
  • the more preferable lower limit of the content of the epoxy component B in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 3% by weight, and the more preferable lower limit is 5% by weight. Is 40% by weight, and a more preferred upper limit is 30% by weight.
  • the curable composition of the present invention may contain an epoxy component other than the component A and the epoxy component B (hereinafter also referred to as an epoxy component C).
  • the component having at least one of the epoxy group and the thiirane group preferably contains, as the epoxy component C, an epoxy compound C3 having a heterocyclic ring containing a nitrogen atom.
  • the epoxy compound C3 By using the epoxy compound C3, the heat resistance of the cured product of the curable composition can be further increased.
  • the heterocyclic ring containing a nitrogen atom is a triazine skeleton.
  • the component having at least one of the epoxy group and thiirane group may contain an epoxy resin C1 other than the epoxy compound C3 as the epoxy component C.
  • the component having at least one of the epoxy group and the thiirane group may contain an epoxy compound C2 other than the epoxy compound C3 and the epoxy resin C1.
  • the curable composition of the present invention preferably includes the epoxy compound C2 or the epoxy compound C3, more preferably includes the epoxy compound C2, and further includes the epoxy compound C2 and the epoxy compound C3. More preferred.
  • the viscosity of the composition containing the epoxy component B is relatively low.
  • the viscosity of the curable composition can be increased.
  • the cure rate of a curable composition can be made still faster, or the heat resistance of the hardened
  • the combined use of the epoxy component B, the epoxy compound C2, and the epoxy compound C3 increases the curing rate of the curable composition, increases the heat resistance of the cured product of the curable composition, and further improves the curable composition. It can make it easier to apply objects.
  • epoxy resin generally means a low molecular weight polymer or prepolymer having two or more epoxy groups in one molecule and having a molecular weight of 10,000 or less, or an epoxy of the polymer or prepolymer. It is a curable resin produced by a ring-opening reaction of a group.
  • the curable resin may be a thermosetting resin or a photocurable resin.
  • the epoxy resin C1 include a bisphenol type epoxy resin, an epoxy novolac resin, or an epoxy resin having a naphthalene structure.
  • Examples of the commercially available epoxy compound C2 include Adeka Resin EP-3300S and Adeka Resin EP-3300E (all of which are manufactured by ADEKA).
  • the curable composition preferably contains at least one of Adeka Resin EP-3300S and Adeka Resin EP-3300E, and more preferably contains Adeka Resin EP-3300S. By using these preferable commercial products, the viscosity of the curable composition can be effectively increased.
  • the epoxy compound C2 is preferably an epoxy compound having an aromatic ring.
  • the component having at least one of the epoxy group and thiirane group preferably contains an epoxy compound having an aromatic ring.
  • the aromatic ring is preferably a benzene ring, a naphthalene ring or an anthracene ring, and more preferably a benzene ring or a naphthalene ring.
  • the curable composition can be further easily applied.
  • Examples of the epoxy compound having an aromatic ring include resorcinol diglycidyl ether and 1,6-naphthalenediglycidyl ether, and resorcinol diglycidyl ether is particularly preferable.
  • resorcinol diglycidyl ether By using resorcinol diglycidyl ether, the curing rate of the curable composition can be increased, and the curable composition can be easily applied.
  • the epoxy compound C3 having the triazine skeleton preferably has at least two epoxy groups, and more preferably has three epoxy groups.
  • the epoxy compound C3 is preferably an epoxy compound represented by the following formula (16) or the following formula (17).
  • the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be further enhanced.
  • R21 to R23 each represents an alkylene group having 1 to 5 carbon atoms, and Z represents an epoxy group or a hydroxymethyl group. R21 to R23 may be the same or different.
  • R24 to R26 each represents an alkylene group having 1 to 5 carbon atoms
  • p, q and r each represents an integer of 1 to 5
  • R27 to R29 each represents an alkylene group having 1 to 5 carbon atoms. Indicates a group.
  • R24 to R26 may be the same or different.
  • p, q and r may be the same or different.
  • R27 to R29 may be the same or different.
  • R21 to R23 in the above formula (16) are each preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group or an ethylene group, and even more preferably a methylene group.
  • Z is preferably an epoxy group.
  • the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be further enhanced.
  • R24 to R26 in the above formula (17) are each preferably an alkylene group having 2 to 4 carbon atoms, more preferably an alkylene group having 2 or 3 carbon atoms, and further more preferably an ethylene group. preferable.
  • p, q and r in the above formula (17) exceed 5, the curing rate of the curable composition may be lowered.
  • the curing rate of the curable composition is increased.
  • p, q and r are each preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.
  • R27 to R29 in the above formula (17) are each preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group or an ethylene group, and even more preferably a methylene group.
  • the epoxy compound C3 is more preferably an epoxy compound represented by the above formula (16).
  • the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be further enhanced.
  • the epoxy compound C3 is preferably trishydroxyethyl isocyanurate triglycidyl ether or triglycidyl isocyanurate, and more preferably triglycidyl isocyanurate. That is, the epoxy compound C3 is preferably an epoxy compound represented by the following formula (16A) or the following formula (17A), and more preferably an epoxy compound represented by the following formula (16A). By using these preferable epoxy compounds, the curing rate of the curable composition can be further increased.
  • the epoxy component C is preferably contained within a range of 0.1 to 45% by weight in 100% by weight of the curable composition.
  • the epoxy compound C2 is preferably contained within a range of 20 to 40% by weight in 100% by weight of the curable composition. When the content of the epoxy compound C2 is within this preferable range, the viscosity of the curable composition can be more effectively increased.
  • the content of the epoxy compound C2 in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 5 to 95% by weight.
  • the epoxy compound C2 is an epoxy compound having an aromatic ring, and the content of the compound having an aromatic ring in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 5 to It is preferably in the range of 95% by weight.
  • the viscosity of the curable composition can be further effectively increased.
  • the more preferable lower limit of the content of the epoxy compound C2 or the epoxy compound having an aromatic ring in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 15% by weight, and the more preferable lower limit is 35
  • the upper limit is 75% by weight, and the more preferable upper limit is 60% by weight.
  • the epoxy compound C3 is preferably contained within a range of 0.1 to 5% by weight in 100% by weight of the curable composition. When the content of the epoxy compound C3 is within this preferable range, the curing rate of the curable composition can be further increased.
  • the content of the epoxy compound C3 in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 0.1 to 10% by weight.
  • the epoxy compound C3 is an epoxy compound having a heterocyclic ring containing a nitrogen atom, and the epoxy compound having a heterocyclic ring containing a nitrogen atom in 100% by weight of the component having at least one of the epoxy group and the thiirane group.
  • the content of is preferably in the range of 0.1 to 10% by weight.
  • the curing rate of the curable composition is increased, and the heat resistance of the cured product of the curable composition is increased. It can be further increased.
  • the viscosity (25 ° C.) of the curable composition is preferably in the range of 20,000 to 100,000 mPa ⁇ s.
  • the chlorine ion concentration of the curable composition is preferably 500 ppm or less. If the chlorine ion concentration is too high, the curing rate of the curable composition may be slow.
  • the chlorine ion concentration can be measured by, for example, ICP emission analysis.
  • the curing agent is not particularly limited.
  • the curing agent include an imidazole curing agent, an amine curing agent, a phenol curing agent, a polythiol curing agent, and an acid anhydride.
  • curing agent is preferable.
  • a storage stability can be improved when the said hardener is mixed with the component which has at least 1 type of the said epoxy group and thiirane group, a latent hardener is preferable.
  • the latent curing agent is preferably a latent imidazole curing agent, a latent polythiol curing agent or a latent amine curing agent. Only 1 type may be used for these hardening
  • the imidazole curing agent is not particularly limited, but 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2, 4-Diamino-6- [2'-methylimidazolyl- (1 ')]-ethyl-s-triazine or 2,4-diamino-6- [2'-methylimidazolyl- (1')]-ethyl-s- Examples include triazine isocyanuric acid adducts.
  • the polythiol curing agent is not particularly limited, and examples include trimethylolpropane tris-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol hexa-3-mercaptopropionate, and the like. .
  • the amine curing agent is not particularly limited, but is hexamethylenediamine, octamethylenediamine, decamethylenediamine, 3,9-bis (3-aminopropyl) 2,4,8,10-tetraspiro [5.5] undecane. Bis (4-aminocyclohexyl) methane, metaphenylenediamine, diaminodiphenylsulfone and the like.
  • the content of the curing agent is not particularly limited.
  • the curing agent is preferably contained in the range of 1 to 40 parts by weight with respect to a total of 100 parts by weight of the component having at least one of the epoxy group and thiirane group.
  • the content of the curing agent is less than 1 part by weight, the curable composition may not be sufficiently cured.
  • curing agent exceeds 40 weight part, the heat resistance of the hardened
  • “a total of 100 parts by weight of components having at least one of an epoxy group and a thiirane group” means 100 parts by weight of the component A when no other epoxy component other than the component A is included. When other epoxy components other than the component A are included, it means a total of 100 parts by weight of the component A and the other epoxy components.
  • curing agent is 1 with respect to a total of 100 weight part of the component which has at least 1 type of the said epoxy group and thiirane group. It is preferably contained in the range of ⁇ 15 parts by weight.
  • the curing agent is an amine curing agent, a polythiol curing agent or an acid anhydride, the amine curing agent and the polythiol curing are used with respect to a total of 100 parts by weight of the component having at least one of the epoxy group and the thiirane group.
  • the agent or acid anhydride is preferably contained in the range of 15 to 40 parts by weight.
  • the curable composition of the present invention may further contain a solvent.
  • a solvent for example, when the component A is solid, when the solvent is added to the solid component A, the component A is dissolved in the solvent, so that the dispersibility of the component A in the curable composition can be improved.
  • the solvent include ethyl acetate, methyl cellosolve, toluene, acetone, methyl ethyl ketone, cyclohexane, n-hexane, tetrahydrofuran or diethyl ether.
  • the curable composition of the present invention may further contain a polymerizable compound.
  • the polymerizable compound is not particularly limited.
  • a crosslinkable compound or a non-crosslinkable compound is mentioned, for example.
  • the said polymeric compound only 1 type may be used and 2 or more types may be used together.
  • the crosslinkable compound is not particularly limited. Specific examples of the crosslinkable compound include 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, (poly ) Ethylene glycol di (meth) acrylate, (poly) propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, glycerol methacrylate acrylate, pentaerythritol tri (meth) acrylate, tri Examples include methylolpropane trimethacrylate, allyl (meth) acrylate, vinyl (meth) acrylate, divinylbenzene, polyester (meth) acrylate, and urethane (meth) acrylate.
  • non-crosslinkable compound is not particularly limited.
  • specific examples of the non-crosslinkable compound include ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) ) Acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, nonyl (meth) acrylate, decyl Examples include (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, tridecyl (meth) acryl
  • the content of the polymerizable compound is not particularly limited.
  • the polymerizable compound is preferably contained in the range of 10 to 60 parts by weight with respect to 100 parts by weight of the total of the components having at least one of the epoxy group and thiirane group.
  • content of the said polymeric compound is less than 10 weight part, the heat resistance of the hardened
  • content of the said polymeric compound exceeds 60 weight part, the viscosity of a curable composition may become high too much.
  • the curable composition of the present invention preferably contains an adhesive strength modifier.
  • the adhesive strength adjusting agent is preferably a silane coupling agent.
  • the silane coupling agent is not particularly limited.
  • Examples of the silane coupling agent include N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, and N- (2-amino).
  • the content of the silane coupling agent is not particularly limited.
  • the silane coupling agent is preferably contained in the range of 4 to 20 parts by weight with respect to 100 parts by weight of the total of the components having at least one of the epoxy group and thiirane group.
  • the content of the silane coupling agent is less than 4 parts by weight, the adhesive strength of the cured product of the curable composition to the adherend may be reduced.
  • content of the said silane coupling agent exceeds 20 weight part, a curable composition may become difficult to harden
  • the curable composition of the present invention preferably contains inorganic particles.
  • the inorganic particles are not particularly limited. Examples of the inorganic particles include silica, aluminum nitride, and alumina. As for the said inorganic particle, only 1 type may be used and 2 or more types may be used together.
  • the content of the inorganic particles is not particularly limited.
  • the inorganic particles are preferably contained within a range of 3 to 900 parts by weight with respect to a total of 100 parts by weight of the component having at least one of the epoxy group and thiirane group.
  • content of the inorganic particles is less than 3 parts by weight, the latent heat expansion of the cured product of the curable composition may not be suppressed.
  • content of the said inorganic particle exceeds 900 weight part, an inorganic particle may not fully disperse
  • the curable composition of the present invention may contain a polymerization initiator that generates reactive species by light irradiation or heating. By using the polymerization initiator, the curing rate of the curable composition can be further increased.
  • the polymerization initiator is not particularly limited.
  • examples of the polymerization initiator include acetophenone polymerization initiators, ketal polymerization initiators, halogenated ketones, acyl phosphinoxides, and acyl phosphonates.
  • the acetophenone polymerization initiator is not particularly limited. Specific examples of the acetophenone polymerization initiator include 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, methoxyacetophenone 2,2-dimethoxy-1,2-diphenylethane-1-one, 2-hydroxy-2-cyclohexylacetophenone, and the like.
  • the ketal polymerization initiator is not particularly limited. Specific examples of the ketal polymerization initiator include benzyl dimethyl ketal. As for the said polymerization initiator, only 1 type may be used and 2 or more types may be used together.
  • the content of the polymerization initiator is not particularly limited.
  • the polymerization initiator is preferably contained in the range of 2 to 10 parts by weight with respect to 100 parts by weight as a total of the components having at least one of the epoxy group and thiirane group. If the content of the polymerization initiator is less than 2 parts by weight, the effect of adding the polymerization initiator may not be sufficiently obtained. When content of the said polymerization initiator exceeds 10 weight part, the adhesive force of the hardened
  • the method for producing the curable composition of the present invention is not particularly limited.
  • a component having at least one of the epoxy group and the thiirane group, the curing agent, and other components added as necessary are blended, The manufacturing method which mixes sufficiently using a formula stirrer etc. is mentioned.
  • the curable composition of the present invention can be used as a one-component adhesive for bonding a liquid crystal panel or a semiconductor chip.
  • the curable composition of the present invention may be a paste-like adhesive or a film-like adhesive.
  • the method for processing the curable composition of the present invention into a film adhesive is not particularly limited.
  • a method of applying the curable composition of the present invention to a substrate such as a release paper and processing it into a film-like adhesive, or adding a solvent to the curable composition of the present invention to form a substrate such as a release paper And a method of evaporating the solvent at a temperature lower than the activation temperature of the curing agent and processing it into a film-like adhesive is not particularly limited.
  • a method of applying the curable composition of the present invention to a substrate such as a release paper and processing it into a film-like adhesive or adding a solvent to the curable composition of the present invention to form a substrate such as a release paper
  • a method of evaporating the solvent at a temperature lower than the activation temperature of the curing agent and processing it into a film-like adhesive is not particularly limited.
  • a method of curing the curable composition of the present invention a method of heating the curable composition, a method of irradiating the curable composition with light, and then heating the curable composition, a light of the curable composition And a method of heating the curable composition at the same time.
  • the heating temperature for curing the curable composition of the present invention is preferably in the range of 160 to 250 ° C, and more preferably in the range of 160 to 200 ° C. Since the curable composition of the present invention can be cured at a low temperature, the amount of energy required for heating can be reduced.
  • the curing time becomes long. For example, when the heating temperature is 200 ° C., the curing time exceeds 10 seconds.
  • the curable composition of the present invention can be cured in a short time even when the heating temperature is 200 ° C. or less. For example, if the heating temperature is 200 ° C., the curing time is 10 seconds at the longest. Can be less than.
  • low temperature means a temperature of 200 ° C. or lower.
  • the curable composition of the present invention according to the method of irradiating the curable composition with light and then heating the curable composition, the curable composition is more than the method of heating alone. Can be cured in a short time.
  • the light source used when irradiating light to the curable composition of the present invention is not particularly limited.
  • the light source include a light source having a sufficient light emission distribution at a wavelength of 420 nm or less.
  • Specific examples of the light source include a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a chemical lamp, a black light lamp, a microwave excitation mercury lamp, or a metal halide lamp.
  • a chemical lamp is preferable.
  • the chemical lamp efficiently emits light in the active wavelength region of the polymerization initiator and emits less light in the light absorption wavelength region of components other than the polymerization initiator in the composition. Furthermore, by using a chemical lamp, light can efficiently reach the polymerization initiator present in the composition.
  • the light irradiation intensity in the wavelength region of 365 nm to 420 nm is preferably 0.1 to 100 mW / cm 2 .
  • Anisotropic conductive material By containing conductive particles in the curable composition of the present invention, an anisotropic conductive material can be obtained.
  • the conductive particles electrically connect the opposing electrical connection portions, for example, between the electrodes of the circuit board and the electrodes of the electronic component.
  • the conductive particles are not particularly limited as long as at least the outer surface has conductivity.
  • Examples of the conductive particles include organic particles, inorganic particles, organic-inorganic hybrid particles, or conductive particles whose surfaces are covered with a metal layer, or metal particles that are substantially composed only of metal. Can be mentioned.
  • the metal layer is not particularly limited. Examples of the metal layer include a gold layer, a silver layer, a copper layer, a nickel layer, a palladium layer, or a metal layer containing tin.
  • the content of the conductive particles is not particularly limited.
  • the conductive particles are preferably contained within a range of 0.5 to 5 parts by weight with respect to 100 parts by weight as a total of the components having at least one of the epoxy group and thiirane group. If the content of the conductive particles is less than 0.5 parts by weight, the electrodes may not be reliably conducted. When content of electroconductive particle exceeds 5 weight part, a short circuit may arise between the adjacent electrodes which should not be conduct
  • the viscosity (25 ° C.) of the anisotropic conductive material is preferably in the range of 20,000 to 100,000 mPa ⁇ s. If the viscosity is too low, the conductive particles may settle in the anisotropic conductive material. When the viscosity is too high, the conductive particles may not be sufficiently dispersed in the anisotropic conductive material.
  • the chlorine ion concentration of the anisotropic conductive material is preferably 500 ppm or less. If the chlorine ion concentration is too high, the curing rate of the curable composition contained in the anisotropic conductive material may be slow.
  • the anisotropic conductive material of the present invention can be used as an anisotropic conductive paste, anisotropic conductive ink, anisotropic conductive adhesive, anisotropic conductive film, anisotropic conductive sheet or the like.
  • anisotropic conductive material containing the conductive particles of the present invention is used as a film-like adhesive such as an anisotropic conductive film or an anisotropic conductive sheet, the film-like shape containing the conductive particles is used.
  • a film-like adhesive that does not contain conductive particles may be laminated on the adhesive.
  • connection structure can be obtained by connecting a connection object member using the curable composition of the present invention or the anisotropic conductive material of the present invention.
  • the connection target member is preferably at least one of an electronic component and a circuit board.
  • connection structure includes a first connection target member, a second connection target member, and a connection portion connecting the first and second connection target members, the connection portion of the present invention. It is preferably formed of an anisotropic conductive material or the curable composition of the present invention.
  • a connection part is the hardened
  • connection structure includes a first connection target member, a second connection target member, and a connection portion that electrically connects the first and second connection target members.
  • This connecting portion is formed of the anisotropic conductive material of the present invention.
  • this connection part is a hardened
  • the first and second connection target members may be first and second electrical connection target members that are electrically connected.
  • 1st, 2nd electrical connection object member the various electrical connection object member which should be electrically connected mutually is mentioned.
  • one of the first and second electrical connection target members may be an electrode of a circuit board, and the other may be an electrode of an electronic component chip such as an IC chip.
  • the first and second electrical connection target members are not necessarily both electrodes.
  • FIG. 1 is a front sectional view schematically showing a connection structure using an anisotropic conductive material including a curable composition according to an embodiment of the present invention and conductive particles.
  • connection structure 1 shown in FIG. 1 is a connection that electrically connects a first connection target member 2, a second connection target member 3, and first and second connection target members 2 and 3.
  • Part 4 The connection portion 4 is a cured product layer and is formed using an anisotropic conductive paste as an anisotropic conductive material including a plurality of conductive particles 5.
  • a plurality of electrodes 2 b are provided on the upper surface 2 a of the first connection target member 2.
  • a plurality of electrodes 3 b are provided on the lower surface 3 a of the second connection target member 3.
  • the second connection target member 3 is laminated on the upper surface 2 a of the first connection target member 2 via a cured product layer 4 formed of an anisotropic conductive paste containing the conductive particles 1.
  • the electrode 2 b and the electrode 3 b are electrically connected by the conductive particles 5.
  • connection structure an electronic component chip such as a semiconductor chip, a capacitor chip, or a diode chip is mounted on a circuit board, and is electrically connected to an electrode on the circuit board.
  • connection structures include various printed circuit boards such as a flexible printed circuit board, and various circuit boards such as a glass substrate or a substrate on which a metal foil is laminated.
  • connection structure of the present invention is not particularly limited.
  • the anisotropic conductive material is provided between a first connection target member such as an electronic component or a circuit board and a second connection target member such as an electronic component or a circuit board.
  • Examples of the production method include arranging and obtaining a laminate, and then heating and pressurizing the laminate.
  • Component A As the component A, various compounds in which R1, R2, R3, X1 and X2 are groups shown in the following Tables 1 to 15 were prepared. In Tables 1 to 15, when R1 has a structure represented by the formula (2A), “Formula (2A)” is described in the R1 column, and R4 and X3 in the formula (2A) are further represented. Indicated. In addition, the said component A was the mixture of the monomer and multimer of the said compound in the case of a mixing
  • Epoxy component B As the epoxy component B, various compounds in which R11, R12, R13 and R14 are groups shown in the following Tables 1 to 15 were prepared. In addition, the said epoxy component B was the mixture of the monomer and multimer of the said compound in the case of a mixing
  • Epoxy component C Epoxy resin C1: Bisphenol A type epoxy resin
  • Epoxy compound C2-1 Adeka Resin EP-3300S (manufactured by ADEKA)
  • Epoxy compound C2-2 Resorcinol diglycidyl ether
  • Epoxy compound C3-1 Triglycidyl isocyanurate (epoxy compound represented by the above formula (16A)
  • Epoxy compound C3-2 trishydroxyethyl isocyanurate triglycidyl ether (the above formula ( Epoxy compounds represented by 17A)
  • Curing agent 1,2-dimethylimidazole Imidazole curing agent (amine adduct type curing agent, “Amicure PN-23J” manufactured by Ajinomoto Fine Techno Co., Ltd.) Amine curing agent (ethylenediamine) Polythiol curing agent (“TMMP: Trimethylolpropane tris-3-mercaptopropionate” manufactured by SC Organic Chemical Co., Ltd.) Phenol hardener ("Sumilite-PR-HF-3" manufactured by Sumitomo Bakelite) Acid anhydride (“YH-307" manufactured by Japan Epoxy Resin)
  • Example 1 As the component A, an epoxy compound represented by the above formula (1B) was prepared.
  • R2 in the formula (1A) is a methylene group
  • R3 is a methylene group
  • X1 is an oxygen atom
  • X2 is an oxygen atom
  • R1 is represented by the formula (2A).
  • R4 is a methylene group and X3 is an oxygen atom.
  • the conductive particles used are conductive particles having a metal layer in which a nickel plating layer is formed on the surface of divinylbenzene resin particles and a gold plating layer is formed on the surface of the nickel plating layer. is there.
  • composition obtained at 2000 rpm was stirred for 8 minutes using a planetary stirrer, and filtered using a nylon filter paper (pore size: 10 ⁇ m) to prepare an anisotropic conductive paste as an anisotropic conductive material.
  • Example 2 In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 50 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A; An anisotropic conductive paste was obtained in the same manner as in Example 1 except that 50 parts by weight of the epoxy compound represented by the formula (11B) was used as the epoxy component B.
  • Example 3 In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 30 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A; Except for using 40 parts by weight of the epoxy compound represented by the above formula (11B) as the epoxy component B and 30 parts by weight of Adeka Resin EP-3300S (manufactured by ADEKA) as the epoxy compound C2-1. In the same manner as in Example 1, an anisotropic conductive paste was obtained.
  • Example 4 In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 30 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A; 40 parts by weight of the epoxy compound represented by the formula (11B) as the epoxy component B, 25 parts by weight of Adeka Resin EP-3300S (manufactured by ADEKA) as the epoxy compound C2-1, and the epoxy compound C3-1 An anisotropic conductive paste was obtained in the same manner as in Example 1 except that 5 parts by weight of the epoxy compound represented by the above formula (16A) was used.
  • the conductive particles used are conductive particles having a metal layer in which a nickel plating layer is formed on the surface of divinylbenzene resin particles and a gold plating layer is formed on the surface of the nickel plating layer. is there.
  • the curable composition obtained at 2000 rpm was stirred for 8 minutes and filtered through a nylon filter paper (pore diameter 10 ⁇ m) to prepare an anisotropic conductive paste.
  • Examples 5 to 84 and Comparative Examples 2 to 6 An anisotropic conductive paste was obtained in the same manner as in Example 1 except that the types and amounts of the ingredients were changed as shown in Tables 2 to 15 below. When ethyl acetate was used, ethyl acetate was used to dissolve component A when component A was added.
  • a metal mold in which a rectangular parallelepiped recess having a size of 0.3 cm in length, 1 cm in width, and 7 cm in depth was prepared.
  • the obtained anisotropic conductive paste was filled in the recesses of the metal mold.
  • the anisotropic conductive paste filled in the recess of the metal mold was heated at 100 ° C. for 10 minutes and then heated at 150 ° C. for 30 minutes to prepare a cured product of the anisotropic conductive paste.
  • the linear expansion coefficient of the obtained cured product was measured using a thermomechanical analyzer (manufactured by TA Instruments, model “TMA2940”). In addition, it heated to 210 degreeC with the temperature increase rate of 5 degree-C / min, and measured the linear expansion coefficient. In the said evaluation, the anisotropic electrically conductive paste whose coefficient of linear expansion is 65 ppm / degrees C or less was set as the pass.
  • the anisotropic conductive pastes of Examples 1 to 4 have a lower coefficient of linear expansion of the cured product than the anisotropic conductive paste of Comparative Example 1, and thus are difficult to peel off from the circuit board or electronic component even when heated. . Furthermore, since the anisotropic conductive pastes of Examples 2 to 4 have lower peak temperatures and higher calorific values than the anisotropic conductive pastes of Example 1 and Comparative Example 1, they can be cured quickly. I understand.
  • anisotropic conductive pastes of Examples 5 to 84 have a low coefficient of linear expansion of the cured product, and thus are difficult to peel off from the circuit board or the electronic component even when heated.

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Abstract

Disclosed is a curable composition which enables formation of a cured product that has low linear expansion coefficient and is hardly separated from a circuit board, an electronic component or the like even when heated. The curable composition contains a component including at least one of an epoxy group and a thiirane group, and a curing agent. The component including at least one of an epoxy group and a thiirane group contains a monomer of a compound represented by formula (1), a multimer wherein at least two of the compounds are bonded together, or a mixture of the monomer and the multimer. In formula (1), R1 represents a hydrogen atom, an alkyl group having 1-5 carbon atoms or a structure represented by formula (2); R2 and R3 each represents an alkylene group having 1-5 carbon atoms; and X1 and X2 each represents an oxygen atom or a sulfur atom. In formula (2), R4 represents an alkylene group having 1-5 carbon atoms; and X3 represents an oxygen atom or a sulfur atom.

Description

硬化性組成物、異方性導電材料及び接続構造体Curable composition, anisotropic conductive material, and connection structure
 本発明は、硬化性組成物に関し、より詳細には、線膨張率が低く、加熱されても回路基板又は電子部品等から剥離しにくい硬化物を得ることができる硬化性組成物、並びに該硬化性組成物を用いた異方性導電材料及び接続構造体に関する。 The present invention relates to a curable composition, and more specifically, a curable composition having a low linear expansion coefficient and capable of obtaining a cured product that is difficult to peel off from a circuit board or an electronic component even when heated, and the cured product. The present invention relates to an anisotropic conductive material using a conductive composition and a connection structure.
 異方性導電ペースト、異方性導電インク、異方性導電粘接着剤、異方性導電フィルム、又は異方性導電シート等の異方性導電材料が広く知られている。 Anisotropic conductive materials such as anisotropic conductive paste, anisotropic conductive ink, anisotropic conductive adhesive, anisotropic conductive film, or anisotropic conductive sheet are widely known.
 異方性導電材料は、ICチップとフレキシブルプリント回路基板との接続、及びICチップとITO電極を有する回路基板との接続等に使用されている。例えば、ICチップの電極と回路基板の電極との間に異方性導電材料を配置した後、加熱及び加圧することにより、これらの電極同士を接続できる。 An anisotropic conductive material is used for connection between an IC chip and a flexible printed circuit board, connection between an IC chip and a circuit board having an ITO electrode, and the like. For example, after an anisotropic conductive material is arranged between the electrode of the IC chip and the electrode of the circuit board, these electrodes can be connected by heating and pressurizing.
 上記異方性導電材料の一例として、下記の特許文献1には、熱硬化性絶縁性接着剤と、導電性粒子と、イミダゾール潜在性硬化剤と、アミン潜在性硬化剤とを含有する異方性導電接着フィルムが開示されている。特許文献1には、この異方性導電接着フィルムを比較的低温で硬化させた場合であっても、接続信頼性が優れていることが記載されている。
特開平9-115335号公報
As an example of the anisotropic conductive material, the following Patent Document 1 includes an anisotropic containing a thermosetting insulating adhesive, conductive particles, an imidazole latent curing agent, and an amine latent curing agent. A conductive conductive adhesive film is disclosed. Patent Document 1 describes that the connection reliability is excellent even when this anisotropic conductive adhesive film is cured at a relatively low temperature.
JP-A-9-115335
 近年、リフローによりICチップをフレキシブルプリント回路基板に実装するために、ハンダを球状にしたハンダボールが使用されている。リフローにより、ICチップの電極に実装されたハンダボールが溶融し、固化することにより、ICチップがフレキシブルプリント回路基板に実装される。なお、リフローとは、「基板の電極に、はんだを設けた電子部品チップが接触するように電子部品チップを配置し、加熱により該はんだを溶融し、固化するはんだ付け法」を意味する。 Recently, in order to mount an IC chip on a flexible printed circuit board by reflow, solder balls having a spherical shape are used. By reflow, the solder balls mounted on the electrodes of the IC chip are melted and solidified, whereby the IC chip is mounted on the flexible printed circuit board. The reflow means “a soldering method in which an electronic component chip is arranged so that the electronic component chip provided with solder contacts the electrode of the substrate, and the solder is melted and solidified by heating”.
 リフローでは、ICチップ又はフレキシブルプリント回路基板だけでなく、電極間の接続に用いた異方性導電材料も加熱される。特に、異方性導電材料の硬化物が加熱されると、異方性導電材料の硬化物が、ICチップ又はフレキシブルプリント回路基板から剥離することがあった。従って、加熱された場合でも、ICチップ又はフレキシブルプリント回路基板から剥離しにくい異方性導電材料が強く求められている。 In reflow, not only the IC chip or the flexible printed circuit board but also the anisotropic conductive material used for the connection between the electrodes is heated. In particular, when a cured product of the anisotropic conductive material is heated, the cured product of the anisotropic conductive material may be peeled off from the IC chip or the flexible printed circuit board. Therefore, there is a strong demand for an anisotropic conductive material that does not easily peel off from an IC chip or a flexible printed circuit board even when heated.
 特許文献1に記載の異方性導電接着フィルムでは、硬化を開始させるのに必要な加熱温度が比較的低い。しかしながら、この異方性導電接着フィルムの硬化物の線膨張率が高いという問題があった。このため、上記異方性導電接着フィルムを用いて接続された回路基板を加熱すると、異方性導電接着フィルムが回路基板から剥離することがあった。従って、電極間の接続信頼性が低下することがあった。 In the anisotropic conductive adhesive film described in Patent Document 1, the heating temperature necessary to start curing is relatively low. However, there is a problem that the linear expansion coefficient of the cured product of the anisotropic conductive adhesive film is high. For this reason, when the circuit board connected using the said anisotropic conductive adhesive film is heated, the anisotropic conductive adhesive film may peel from a circuit board. Therefore, the connection reliability between the electrodes may be lowered.
 また、近年、回路基板又は電子部品の電極間を効率的に接続するために、接続に要する加熱温度を低くし、かつ加圧時間を短くすることが求められている。さらに、回路基板又は電子部品は加熱により劣化しやすいため、加熱温度を低くすることが強く求められている。 In recent years, in order to efficiently connect the electrodes of the circuit board or the electronic component, it is required to lower the heating temperature required for the connection and to shorten the pressurizing time. Furthermore, since circuit boards or electronic components are easily deteriorated by heating, there is a strong demand for lowering the heating temperature.
 特許文献1に記載の異方性導電接着フィルムでは、硬化を開始させるのに必要な加熱温度は比較的低い。しかしながら、この異方性導電接着フィルムは、低温では硬化反応が充分に進行しないことがあった。異方性導電接着フィルムを用いて、回路基板又は電子部品の電極間を確実に接続するために、加熱温度を高くしたり、長時間加熱したりしなければならないことがあった。従って、電極間を効率的に接続できないことがあった。 In the anisotropic conductive adhesive film described in Patent Document 1, the heating temperature required to start curing is relatively low. However, in this anisotropic conductive adhesive film, the curing reaction may not sufficiently proceed at low temperatures. In order to securely connect the electrodes of the circuit board or the electronic component by using the anisotropic conductive adhesive film, it may be necessary to increase the heating temperature or to heat for a long time. Therefore, the electrodes may not be efficiently connected.
 本発明の目的は、線膨張率が低く、加熱されても回路基板又は電子部品等から剥離しにくい硬化物を得ることができる硬化性組成物、並びに該硬化性組成物を用いた異方性導電材料及び接続構造体を提供することにある。 An object of the present invention is to provide a curable composition capable of obtaining a cured product having a low coefficient of linear expansion and difficult to peel from a circuit board or an electronic component even when heated, and an anisotropy using the curable composition It is to provide a conductive material and a connection structure.
 また、本発明の限定的な目的は、線膨張率が低い硬化物を得ることができるだけでなく、低温で速やかに硬化させることができ、かつ接続対象部材の接続に用いられた場合に、接続対象部材を効率的に接続できる硬化性組成物、並びに該硬化性組成物を用いた異方性導電材料及び接続構造体を提供することにある。 Further, the limited object of the present invention is not only to obtain a cured product having a low coefficient of linear expansion, but also to be able to cure quickly at a low temperature, and when used for connection of a connection object member, It is providing the curable composition which can connect an object member efficiently, and the anisotropic conductive material and connection structure using this curable composition.
 本発明の広い局面によれば、エポキシ基及びチイラン基の内の少なくとも一種を有する成分と、硬化剤とを含有し、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分が、下記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物を含む、硬化性組成物が提供される。 According to a wide aspect of the present invention, the component having at least one of an epoxy group and a thiirane group and a curing agent, and the component having at least one of the epoxy group and the thiirane group have the following formula ( A curable composition comprising a monomer having a structure represented by 1), a multimer in which at least two of the compounds are bonded, or a mixture of the monomer and the multimer is provided. .
Figure JPOXMLDOC01-appb-C000008
 上記式(1)中、R1は水素原子、炭素数1~5のアルキル基又は下記式(2)で表される構造を表し、R2は炭素数1~5のアルキレン基を表し、R3は炭素数1~5のアルキレン基を表し、X1は酸素原子又は硫黄原子を表し、X2は酸素原子又は硫黄原子を表す。
Figure JPOXMLDOC01-appb-C000008
In the above formula (1), R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having 1 to 5 carbon atoms, and R3 represents carbon X 1 represents an oxygen atom or a sulfur atom, and X 2 represents an oxygen atom or a sulfur atom.
Figure JPOXMLDOC01-appb-C000009
 上記式(2)中、R4は炭素数1~5のアルキレン基を表し、X3は酸素原子又は硫黄原子を表す。
Figure JPOXMLDOC01-appb-C000009
In the above formula (2), R4 represents an alkylene group having 1 to 5 carbon atoms, and X3 represents an oxygen atom or a sulfur atom.
 本発明に係る硬化性組成物のある特定の局面では、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中、前記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物の含有量は、5~100重量%の範囲内である。 In a specific aspect of the curable composition according to the present invention, the amount of the compound having the structure represented by the formula (1) in 100% by weight of the component having at least one of the epoxy group and the thiirane group. The content of the polymer, the multimer in which at least two of the compounds are bound, or the mixture of the monomer and the multimer is in the range of 5 to 100% by weight.
 本発明に係る硬化性組成物では、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分が、下記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物をさらに含むことが好ましい。この場合には、硬化性組成物を低温で速やかに硬化させることができる。また、硬化性組成物を回路基板の電極と電子部品の電極との間の接続に用いると、該電極間を効率的に接続できる。 In the curable composition according to the present invention, the component having at least one of the epoxy group and thiirane group is an epoxy compound monomer having a structure represented by the following formula (11), and the epoxy compound is at least It is preferable to further include a multimer in which two are combined, or a mixture of the monomer and the multimer. In this case, the curable composition can be quickly cured at a low temperature. Moreover, when a curable composition is used for the connection between the electrode of a circuit board and the electrode of an electronic component, it can connect efficiently between these electrodes.
Figure JPOXMLDOC01-appb-C000010
 上記式(11)中、R11は炭素数1~10のアルキレン基を表し、R12は炭素数1~10のアルキレン基を表し、R13は水素原子、炭素数1~10のアルキル基又は下記式(12)で表される構造を表し、R14は水素原子、炭素数1~10のアルキル基又は下記式(13)で表される構造を表す。
Figure JPOXMLDOC01-appb-C000010
In the above formula (11), R11 represents an alkylene group having 1 to 10 carbon atoms, R12 represents an alkylene group having 1 to 10 carbon atoms, R13 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or the following formula ( 12), R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a structure represented by the following formula (13).
Figure JPOXMLDOC01-appb-C000011
 上記式(12)中、R15は炭素数1~10のアルキレン基を表す。
Figure JPOXMLDOC01-appb-C000011
In the above formula (12), R15 represents an alkylene group having 1 to 10 carbon atoms.
Figure JPOXMLDOC01-appb-C000012
 上記式(13)中、R16は炭素数1~10のアルキレン基を表す。
Figure JPOXMLDOC01-appb-C000012
In the above formula (13), R16 represents an alkylene group having 1 to 10 carbon atoms.
 本発明に係る硬化性組成物の他の特定の局面では、前記式(11)中、R13及びR14は水素原子である。 In another specific aspect of the curable composition according to the present invention, in the formula (11), R13 and R14 are hydrogen atoms.
 本発明に係る硬化性組成物のさらに他の特定の局面では、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中、前記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物の含有量は、1~50重量%の範囲内である。 In still another specific aspect of the curable composition according to the present invention, an epoxy compound having a structure represented by the formula (11) in 100% by weight of a component having at least one of the epoxy group and the thiirane group. The content of the monomer, the multimer in which at least two of the epoxy compounds are bonded, or the mixture of the monomer and the multimer is in the range of 1 to 50% by weight.
 本発明に係る硬化性組成物の別の特定の局面では、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、窒素原子を含む複素環を有するエポキシ化合物をさらに含む。 In another specific aspect of the curable composition according to the present invention, the component having at least one of the epoxy group and the thiirane group further includes an epoxy compound having a heterocyclic ring containing a nitrogen atom.
 本発明に係る硬化性組成物のさらに別の特定の局面では、前記窒素原子を含む複素環を有するエポキシ化合物は、下記式(16)で表されるエポキシ化合物、又は下記式(17)で表されるエポキシ化合物である。 In still another specific aspect of the curable composition according to the present invention, the epoxy compound having a heterocyclic ring containing a nitrogen atom is represented by the epoxy compound represented by the following formula (16) or the following formula (17). Epoxy compound.
Figure JPOXMLDOC01-appb-C000013
 上記式(16)中、R21~R23はそれぞれ炭素数1~5のアルキレン基を表し、Zはエポキシ基又はヒドロキシメチル基を表す。
Figure JPOXMLDOC01-appb-C000013
In the above formula (16), R21 to R23 each represents an alkylene group having 1 to 5 carbon atoms, and Z represents an epoxy group or a hydroxymethyl group.
Figure JPOXMLDOC01-appb-C000014
 上記式(17)中、R24~R26はそれぞれ炭素数1~5のアルキレン基を示し、p、q及びrはそれぞれ1~5の整数を示し、R27~R29はそれぞれ炭素数1~5のアルキレン基を示す。
Figure JPOXMLDOC01-appb-C000014
In the above formula (17), R24 to R26 each represents an alkylene group having 1 to 5 carbon atoms, p, q and r each represents an integer of 1 to 5, and R27 to R29 each represents an alkylene group having 1 to 5 carbon atoms. Indicates a group.
 本発明に係る硬化性組成物の別の特定の局面では、前記窒素原子を含む複素環を有するエポキシ化合物は、トリグリシジルイソシアヌレート、又はトリスヒドロキシエチルイソシアヌレートトリグリシジルエーテルである。 In another specific aspect of the curable composition according to the present invention, the epoxy compound having a heterocyclic ring containing a nitrogen atom is triglycidyl isocyanurate or trishydroxyethyl isocyanurate triglycidyl ether.
 本発明に係る硬化性組成物のさらに別の特定の局面では、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中、前記窒素原子を含む複素環を有するエポキシ化合物の含有量は、0.1~10重量%の範囲内である。 In still another specific aspect of the curable composition according to the present invention, the content of the epoxy compound having a heterocyclic ring containing the nitrogen atom in 100% by weight of the component having at least one of the epoxy group and the thiirane group. Is in the range of 0.1 to 10% by weight.
 本発明に係る硬化性組成物の他の特定の局面では、前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、芳香族環を有するエポキシ化合物をさらに含む。 In another specific aspect of the curable composition according to the present invention, the component having at least one of the epoxy group and the thiirane group further includes an epoxy compound having an aromatic ring.
 本発明に係る硬化性組成物のさらに他の特定の局面では、前記芳香族環は、ベンゼン環、ナフタレン環又はアントラセン環である。 In yet another specific aspect of the curable composition according to the present invention, the aromatic ring is a benzene ring, a naphthalene ring or an anthracene ring.
 本発明に係る異方性導電材料は、本発明に従って構成された硬化性組成物と、導電性粒子とを含有する。 The anisotropic conductive material according to the present invention contains a curable composition constituted according to the present invention and conductive particles.
 本発明に係る接続構造体は、第1の電気的接続対象部材と、第2の電気的接続対象部材と、第1,第2の電気的接続対象部材を電気的に接続している接続部とを備え、前記接続部が、本発明に従って構成された異方性導電材料により形成されている。 The connection structure which concerns on this invention is the connection part which has electrically connected the 1st electrical connection object member, the 2nd electrical connection object member, and the 1st, 2nd electrical connection object member. The connecting portion is made of an anisotropic conductive material configured according to the present invention.
 また、本発明に係る接続構造体は、第1の接続対象部材と、第2の接続対象部材と、第1,第2の接続対象部材を接続している接続部とを備え、前記接続部が、本発明に従って構成された硬化性組成物により形成されている。 The connection structure according to the present invention includes a first connection target member, a second connection target member, and a connection part connecting the first and second connection target members, and the connection part. Is formed by a curable composition constructed according to the present invention.
(発明の効果)
 本発明に係る硬化性組成物は、上記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物と、硬化剤とを含むため、線膨張率が低い硬化物を得ることができる。
(The invention's effect)
The curable composition according to the present invention includes a monomer having a structure represented by the above formula (1), a multimer in which at least two of the compounds are bonded, or the monomer and the multimer. Therefore, a cured product having a low linear expansion coefficient can be obtained.
 また、本発明に係る異方性導電材料の硬化物は線膨張率が低いので、本発明の異方性導電材料を回路基板の電極と電子部品の電極との間の接続に用いると、電気的接続の信頼性を高めることができる。 Further, since the cured product of the anisotropic conductive material according to the present invention has a low coefficient of linear expansion, when the anisotropic conductive material of the present invention is used for connection between the electrode of the circuit board and the electrode of the electronic component, The reliability of the general connection can be increased.
図1は、本発明の一実施形態に係る硬化性組成物と、導電性粒子とを含む異方性導電材料を用いた接続構造体を模式的に示す正面断面図である。FIG. 1 is a front cross-sectional view schematically showing a connection structure using an anisotropic conductive material including a curable composition according to an embodiment of the present invention and conductive particles.
符号の説明Explanation of symbols
 1…接続構造体
 2…第1の接続対象部材
 2a…上面
 2b…電極
 3…第2の接続対象部材
 3a…下面
 3b…電極
 4…接続部
 5…導電性粒子
DESCRIPTION OF SYMBOLS 1 ... Connection structure 2 ... 1st connection object member 2a ... Upper surface 2b ... Electrode 3 ... 2nd connection object member 3a ... Lower surface 3b ... Electrode 4 ... Connection part 5 ... Conductive particle
 以下、本発明を詳述する。 Hereinafter, the present invention will be described in detail.
 (硬化性組成物)
 本発明に係る硬化性組成物は、エポキシ基及びチイラン基の内の少なくとも一種を有する成分と、硬化剤とを含有する。このエポキシ基及びチイラン基の内の少なくとも一種を有する成分は、下記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物である成分(以下、成分Aと略記することがある)を含む。
(Curable composition)
The curable composition according to the present invention contains a component having at least one of an epoxy group and a thiirane group and a curing agent. The component having at least one of the epoxy group and thiirane group is a monomer of a compound having a structure represented by the following formula (1), a multimer in which at least two of the compounds are bonded, or the monomer And a component that is a mixture of the body and the multimer (hereinafter sometimes abbreviated as component A).
 上記成分Aは、下記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、及び該単量体と該多量体との混合物の内のいずれかである。 Component A includes a monomer of a compound having a structure represented by the following formula (1), a multimer in which at least two of the compounds are bonded, and a mixture of the monomer and the multimer. Either.
Figure JPOXMLDOC01-appb-C000015
 上記式(1)中、R1は水素原子もしくは炭素数1~5のアルキル基又は下記式(2)で表される構造を表し、R2は炭素数1~5のアルキレン基を表し、R3は炭素数1~5のアルキレン基を表し、X1は酸素原子又は硫黄原子を表し、X2は酸素原子又は硫黄原子を表す。
Figure JPOXMLDOC01-appb-C000015
In the above formula (1), R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having 1 to 5 carbon atoms, and R3 represents carbon X 1 represents an oxygen atom or a sulfur atom, and X 2 represents an oxygen atom or a sulfur atom.
Figure JPOXMLDOC01-appb-C000016
 上記式(2)中、R4は炭素数1~5のアルキレン基を表し、X3は酸素原子又は硫黄原子を表す。
Figure JPOXMLDOC01-appb-C000016
In the above formula (2), R4 represents an alkylene group having 1 to 5 carbon atoms, and X3 represents an oxygen atom or a sulfur atom.
 上記アルキル基の炭素数が5を超えると、硬化性組成物の硬化速度が低下したり、硬化物の線膨張率が高くなったりすることがある。また、上記アルキレン基の炭素数が5を超えると、硬化性組成物の硬化速度が低下することがある。上記アルキル基及び上記アルキレン基の炭素数が小さいと、硬化性組成物の硬化速度が高くなる。 When the number of carbon atoms of the alkyl group exceeds 5, the curing rate of the curable composition may decrease, or the linear expansion coefficient of the cured product may increase. Moreover, when carbon number of the said alkylene group exceeds 5, the cure rate of a curable composition may fall. When the carbon number of the alkyl group and the alkylene group is small, the curing rate of the curable composition is increased.
 上記式(1)中のR1は、炭素数1~3のアルキル基又は上記式(2)で表される構造であることが好ましく、上記式(2)で表される構造であることがより好ましい。なお、上記アルキル基は直鎖構造を有するアルキル基であってもよく、分岐構造を有するアルキル基であってもよい。 R1 in the above formula (1) is preferably an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (2), more preferably a structure represented by the above formula (2). preferable. The alkyl group may be an alkyl group having a linear structure or an alkyl group having a branched structure.
 上記式(1)中のR2は、炭素数1~3のアルキレン基であることが好ましく、メチレン基であることがより好ましい。上記式(1)中のR3は、炭素数1~3のアルキレン基であることが好ましく、メチレン基であることがより好ましい。なお、上記アルキレン基は直鎖構造を有するアルキレン基であってもよく、分岐構造を有するアルキレン基であってもよい。また、上記R2と上記R3とは、同一であってもよく、異なっていてもよい。 In the above formula (1), R2 is preferably an alkylene group having 1 to 3 carbon atoms, and more preferably a methylene group. R3 in the above formula (1) is preferably an alkylene group having 1 to 3 carbon atoms, and more preferably a methylene group. The alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. Further, R2 and R3 may be the same or different.
 上記式(1)で表される構造では、フルオレン構造のベンゼン環のいずれの部位に、R2及びR3が結合されていてもよい。上記式(1)で表される構造を有する化合物は、下記式(1A)で表される構造を有する化合物であることが好ましい。 In the structure represented by the above formula (1), R2 and R3 may be bonded to any part of the benzene ring of the fluorene structure. The compound having a structure represented by the above formula (1) is preferably a compound having a structure represented by the following formula (1A).
Figure JPOXMLDOC01-appb-C000017
 上記式(1A)中、R1は水素原子、炭素数1~5のアルキル基又は下記式(2)で表される構造を表し、R2は炭素数1~5のアルキレン基を表し、R3は炭素数1~5のアルキレン基を表し、X1は酸素原子又は硫黄原子を表し、X2は酸素原子又は硫黄原子を表す。
Figure JPOXMLDOC01-appb-C000017
In the above formula (1A), R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having 1 to 5 carbon atoms, and R3 represents carbon X 1 represents an oxygen atom or a sulfur atom, and X 2 represents an oxygen atom or a sulfur atom.
 上記式(1)中のX1は、酸素原子又は硫黄原子である。上記式(1)中のX2は、酸素原子又は硫黄原子である。上記式(1)中のX1及びX2が酸素原子であると、上記式(1)で表される構造を有する化合物の融点を低くすることができ、硬化性組成物の貯蔵安定性を高めることができる。上記式(1)中のX1及びX2が硫黄原子であると、硬化性組成物の硬化速度を速くすることができ、かつ硬化物の線膨張率を低くすることができる。上記X1と上記X2とは同一であってもよく、異なっていてもよい。 X1 in the above formula (1) is an oxygen atom or a sulfur atom. X2 in the above formula (1) is an oxygen atom or a sulfur atom. When X1 and X2 in the formula (1) are oxygen atoms, the melting point of the compound having the structure represented by the formula (1) can be lowered, and the storage stability of the curable composition is improved. Can do. When X1 and X2 in the above formula (1) are sulfur atoms, the curing rate of the curable composition can be increased, and the linear expansion coefficient of the cured product can be lowered. X1 and X2 may be the same or different.
 上記式(2)中のR4は、炭素数1~3のアルキレン基であることが好ましく、メチレン基であることがより好ましい。なお、上記アルキレン基は直鎖構造を有するアルキレン基であってもよく、分岐構造を有するアルキレン基であってもよい。上記アルキレン基の炭素数が小さいと、硬化性組成物の硬化速度が高くなる。 In the above formula (2), R4 is preferably an alkylene group having 1 to 3 carbon atoms, and more preferably a methylene group. The alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. When carbon number of the said alkylene group is small, the cure rate of a curable composition will become high.
 上記式(2)で表される構造では、ベンゼン環のいずれの部位に、R4が結合されていてもよい。上記式(2)で表される構造は、下記式(2A)で表される構造であることが好ましい。 In the structure represented by the above formula (2), R4 may be bonded to any part of the benzene ring. The structure represented by the above formula (2) is preferably a structure represented by the following formula (2A).
Figure JPOXMLDOC01-appb-C000018
 上記式(2A)中、R4は炭素数1~5のアルキレン基を表し、X3は酸素原子又は硫黄原子を表す。
Figure JPOXMLDOC01-appb-C000018
In the above formula (2A), R4 represents an alkylene group having 1 to 5 carbon atoms, and X3 represents an oxygen atom or a sulfur atom.
 上記式(2)中のX3は、酸素原子又は硫黄原子である。上記式(2)中のX3が酸素原子であると、上記式(1)で表される構造を有する化合物の融点を低くすることができ、硬化性組成物の貯蔵安定性を高めることができる。上記式(2)中のX3が硫黄原子であると、硬化性組成物の硬化速度を速くすることができ、かつ硬化物の線膨張率を低くすることができる。上記X3は、上記X1及び上記X2と同一であってもよく、異なっていてもよい。 X3 in the above formula (2) is an oxygen atom or a sulfur atom. When X3 in the formula (2) is an oxygen atom, the melting point of the compound having the structure represented by the formula (1) can be lowered, and the storage stability of the curable composition can be improved. . When X3 in the above formula (2) is a sulfur atom, the curing rate of the curable composition can be increased, and the linear expansion coefficient of the cured product can be lowered. X3 may be the same as or different from X1 and X2.
 上記式(1)で表される構造を有する化合物は、フルオレン構造を有し、エポキシ基及びチイラン基の合計が2個以上であればよく、フルオレン構造と、少なくとも2個のエポキシ基及び少なくとも2個のチイラン基の内の少なくとも一種とを有することが好ましい。本発明の硬化性組成物は、上記成分Aを含むため、線膨張率が低い硬化物を得ることができる。 The compound having the structure represented by the above formula (1) has a fluorene structure, and the total of the epoxy group and the thiirane group may be two or more. The fluorene structure, at least two epoxy groups, and at least 2 It is preferable to have at least one of thiirane groups. Since the curable composition of this invention contains the said component A, the hardened | cured material with a low linear expansion coefficient can be obtained.
 さらに、本発明の硬化性組成物に導電性粒子を添加し、該導電性粒子を含む組成物を回路基板の電極と電子部品の電極との間の電極間の接続に用いると、該電極間の接続信頼性を高めることができる。 Furthermore, when conductive particles are added to the curable composition of the present invention, and the composition containing the conductive particles is used for connection between electrodes of a circuit board and an electrode of an electronic component, Connection reliability can be improved.
 上記式(1)で表される構造を有する化合物としては、より具体的には、下記式(1B)で表される化合物が挙げられる。下記式(1B)で表される化合物は、上記式(1A)におけるR2がメチレン基、R3がメチレン基、X1が酸素原子、X2が酸素原子であり、かつR1が上記式(2A)で表される構造を有し、上記式(2A)におけるR4がメチレン基、X3が酸素原子である化合物である。上記式(1)及び(2)中のX1、X2及びX3が酸素原子であるため、下記式(1B)で表される化合物は、エポキシ化合物である。 More specifically, examples of the compound having a structure represented by the above formula (1) include a compound represented by the following formula (1B). In the compound represented by the following formula (1B), R2 in the above formula (1A) is a methylene group, R3 is a methylene group, X1 is an oxygen atom, X2 is an oxygen atom, and R1 is represented by the above formula (2A). In the formula (2A), R4 is a methylene group and X3 is an oxygen atom. Since X1, X2, and X3 in the above formulas (1) and (2) are oxygen atoms, the compound represented by the following formula (1B) is an epoxy compound.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 また、上記式(1)で表される構造を有する化合物としては、より具体的には、下記式(1C)で表される化合物が挙げられる。下記式(1C)で表される化合物は、上記式(1A)におけるR2がメチレン基、R3がメチレン基、X1が硫黄原子、X2が硫黄原子であり、かつR1が上記式(2A)で表される構造を有し、上記式(2A)におけるR4がメチレン基、X3が硫黄原子である化合物である。上記式(1)及び(2)中のX1、X2及びX3が硫黄原子であるため、下記式(1C)で表される化合物は、三員環構造を有するチイラン基含有化合物である。 More specifically, examples of the compound having a structure represented by the above formula (1) include a compound represented by the following formula (1C). In the compound represented by the following formula (1C), R2 in the above formula (1A) is a methylene group, R3 is a methylene group, X1 is a sulfur atom, X2 is a sulfur atom, and R1 is represented by the above formula (2A). In the formula (2A), R4 is a methylene group and X3 is a sulfur atom. Since X1, X2 and X3 in the above formulas (1) and (2) are sulfur atoms, the compound represented by the following formula (1C) is a thiirane group-containing compound having a three-membered ring structure.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 上記式(1)で表される構造を有する化合物は、単量体である。本発明では、上記式(1)で表される構造を有する化合物の単量体にかえて、又は該化合物の単量体とともに、上記式(1)で表される構造を有する化合物が少なくとも2個結合された多量体を用いてもよい。なかでも、上記成分Aは、上記式(1)で表される構造を有する化合物の単量体、該化合物が2~10個結合された多量体、又は該単量体と該多量体との混合物であることが好ましく、上記化合物の単量体、該化合物が2~3個結合された多量体、又は該単量体と該多量体との混合物であることがより好ましく、さらに該単量体と該多量体との混合物であることがより好ましい。上記式(1)で表される構造を有する化合物が10個を超えて結合された多量体を用いると、硬化性組成物の粘度が高くなりすぎることがある。なお、上記式(1)で表される構造を有する化合物の単量体を合成すると、副生成物として、上記単量体が2個又は3個結合された多量体が含まれたり、保管条件によって、上記単量体が2個以上結合したりすることがある。 The compound having the structure represented by the above formula (1) is a monomer. In the present invention, at least 2 compounds having the structure represented by the above formula (1) are used instead of the monomer of the compound having the structure represented by the above formula (1) or together with the monomer of the compound. Individually linked multimers may be used. Among them, the component A is a monomer of a compound having a structure represented by the above formula (1), a multimer in which 2 to 10 of the compounds are bonded, or a combination of the monomer and the multimer. It is preferably a mixture, more preferably a monomer of the above compound, a multimer in which 2 to 3 of the compound are bonded, or a mixture of the monomer and the multimer. More preferably, it is a mixture of the body and the multimer. When a multimer in which more than 10 compounds having the structure represented by the above formula (1) are combined is used, the viscosity of the curable composition may be too high. In addition, when the monomer of the compound having the structure represented by the formula (1) is synthesized, as a by-product, a multimer in which two or three of the monomers are combined is included, or storage conditions Depending on the case, two or more monomers may be bonded.
 上記式(1)で表される構造を有する化合物に相当するエポキシ化合物は、例えば、以下のようにして合成できる。 The epoxy compound corresponding to the compound having the structure represented by the above formula (1) can be synthesized, for example, as follows.
 原料化合物である、水酸基を有するフルオレン化合物と、エピクロルヒドリンと、水酸化ナトリウムと、メタノールとを混合し、冷却し、反応させる。その後、水酸化ナトリウム水溶液を滴下する。滴下の後、さらに反応させ、反応液を得る。次に、反応液に水とトルエンとを加え、トルエン層を取り出す。トルエン層を水で洗浄した後、乾燥し、水と溶媒とを除去する。このようにして、上記式(1)で表される構造を有する化合物に相当するエポキシ化合物を容易に得ることができる。なお、原料化合物である、水酸基を有するフルオレン化合物は、例えばJFEケミカル社等から市販されている。 A raw material compound, a fluorene compound having a hydroxyl group, epichlorohydrin, sodium hydroxide, and methanol are mixed, cooled, and reacted. Thereafter, an aqueous sodium hydroxide solution is dropped. After dripping, it is further reacted to obtain a reaction solution. Next, water and toluene are added to the reaction solution, and the toluene layer is taken out. The toluene layer is washed with water and then dried to remove water and the solvent. In this way, an epoxy compound corresponding to the compound having the structure represented by the above formula (1) can be easily obtained. In addition, the fluorene compound which has a hydroxyl group which is a raw material compound is marketed, for example from JFE Chemical Company etc., for example.
 また、上記式(1)で表される構造を有する化合物に相当するチイラン基含有化合物は、上記式(1)で表される構造を有する化合物に相当するエポキシ化合物のエポキシ基を、チイラン基に変換することにより合成できる。例えば、チオシアン酸塩を含む溶液に、原料化合物であるエポキシ化合物又は該エポキシ化合物を含む溶液を添加した後、チオシアン酸塩を含む溶液をさらに添加することにより、エポキシ基をチイラン基に容易に変換できる。 Further, the thiirane group-containing compound corresponding to the compound having the structure represented by the above formula (1) is obtained by converting the epoxy group of the epoxy compound corresponding to the compound having the structure represented by the above formula (1) to a thiirane group. It can be synthesized by conversion. For example, after adding an epoxy compound that is a raw material compound or a solution containing the epoxy compound to a solution containing thiocyanate, an epoxy group is easily converted into a thiirane group by further adding a solution containing thiocyanate. it can.
 本発明の硬化性組成物100重量%中に、上記成分Aは5~60重量%の範囲内で含有されていることが好ましく、10~50重量%の範囲内で含有されていることがより好ましい。上記成分Aの含有量が少なすぎると、線膨張率が充分に低い硬化物が得られないことがある。上記成分Aの含有量が多すぎると、硬化剤の含有量が相対的に少なくなり、上記成分A等を充分に硬化させることができないことがある。 In 100% by weight of the curable composition of the present invention, the component A is preferably contained in the range of 5 to 60% by weight, more preferably in the range of 10 to 50% by weight. preferable. When there is too little content of the said component A, the hardened | cured material with a sufficiently low linear expansion coefficient may not be obtained. When there is too much content of the said component A, content of a hardening | curing agent will become relatively small, and the said component A etc. may not fully be hardened.
 上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記成分Aの含有量は、5~100重量%の範囲内であることが好ましい。また、上記成分Aと該成分A以外の他のエポキシ成分とが併用される場合には、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記成分Aの含有量は、5~90重量%の範囲内にあることが好ましい。上記成分Aの含有量が上記好ましい範囲内にある場合には、線膨張率がより一層低い硬化物を得ることができる。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記成分Aの含有量のより好ましい下限は10重量%であり、さらに好ましい下限は15重量%であり、より好ましい上限は80重量%であり、より好ましい上限は60重量%であり、より好ましい上限は30重量%であり、さらに好ましい上限は20重量%である。 The content of the component A in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 5 to 100% by weight. When the component A and an epoxy component other than the component A are used in combination, the content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiirane group is It is preferably in the range of 5 to 90% by weight. When content of the said component A exists in the said preferable range, hardened | cured material with a much lower linear expansion coefficient can be obtained. The more preferable lower limit of the content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 10% by weight, the still more preferable lower limit is 15% by weight, and the more preferable upper limit is 80% by weight, more preferably 60% by weight, more preferably 30% by weight, and still more preferably 20% by weight.
 上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、上記成分A以外の他のエポキシ成分として、下記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物であるエポキシ成分(以下、エポキシ成分Bと略記することがある)をさらに含むことが好ましい。上記エポキシ成分Bは、下記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が少なくとも2個結合された多量体、及び該単量体と該多量体との混合物の内のいずれかである。 The component having at least one of the epoxy group and the thiirane group includes, as an epoxy component other than the component A, a monomer of an epoxy compound having a structure represented by the following formula (11), It is preferable to further include an epoxy component (hereinafter sometimes abbreviated as epoxy component B) which is a multimer in which at least two are bonded, or a mixture of the monomer and the multimer. The epoxy component B includes a monomer of an epoxy compound having a structure represented by the following formula (11), a multimer in which at least two epoxy compounds are bonded, and a mixture of the monomer and the multimer. Is one of the following.
Figure JPOXMLDOC01-appb-C000021
 上記式(11)中、R11は炭素数1~10のアルキレン基を表し、R12は炭素数1~10のアルキレン基を表し、R13は水素原子、炭素数1~10のアルキル基又は下記式(12)で表される構造を表し、R14は水素原子、炭素数1~10のアルキル基又は下記式(13)で表される構造を表す。
Figure JPOXMLDOC01-appb-C000021
In the above formula (11), R11 represents an alkylene group having 1 to 10 carbon atoms, R12 represents an alkylene group having 1 to 10 carbon atoms, R13 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or the following formula ( 12), R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a structure represented by the following formula (13).
Figure JPOXMLDOC01-appb-C000022
 上記式(12)中、R15は炭素数1~10のアルキレン基を表す。
Figure JPOXMLDOC01-appb-C000022
In the above formula (12), R15 represents an alkylene group having 1 to 10 carbon atoms.
Figure JPOXMLDOC01-appb-C000023
 上記式(13)中、R16は炭素数1~10のアルキレン基を表す。
Figure JPOXMLDOC01-appb-C000023
In the above formula (13), R16 represents an alkylene group having 1 to 10 carbon atoms.
 上記式(11)~(13)における上記アルキレン基の炭素数が10を超えると、硬化性組成物の硬化速度が低下することがある。また、上記式(11)における上記アルキル基の炭素数が10を超えると、硬化性組成物の硬化速度が低下することがある。上記式(11)~(13)におけるアルキレン基及び上記アルキル基の炭素数が小さいと、硬化性組成物の硬化速度が高くなる。 When the number of carbon atoms of the alkylene group in the above formulas (11) to (13) exceeds 10, the curing rate of the curable composition may decrease. Moreover, when carbon number of the said alkyl group in the said Formula (11) exceeds 10, the cure rate of a curable composition may fall. When the carbon number of the alkylene group and the alkyl group in the above formulas (11) to (13) is small, the curing rate of the curable composition is increased.
 上記式(11)中のR11は、炭素数1~6のアルキレン基であることが好ましく、炭素数1~5のアルキレン基であることがより好ましく、炭素数1~3のアルキレン基であることがより好ましく、メチレン基又はエチレン基であることがより好ましく、さらにメチレン基であることがより好ましい。上記式(11)中のR12は、炭素数1~6のアルキレン基であることが好ましく、炭素数1~5のアルキレン基であることがより好ましく、炭素数1~3のアルキレン基であることがより好ましく、メチレン基又はエチレン基であることがより好ましく、さらにメチレン基であることがより好ましい。なお、上記アルキレン基は直鎖構造を有するアルキレン基であってもよく、分岐構造を有するアルキレン基であってもよい。また、上記R11と上記R12とは、同一であってもよく、異なっていてもよい。 R11 in the formula (11) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable. R12 in the above formula (11) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable. The alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. Further, R11 and R12 may be the same or different.
 上記式(11)中のR13は、水素原子、炭素数1~6のアルキル基又は上記式(12)で表される構造であることが好ましく、水素原子、炭素数1~5のアルキル基又は上記式(12)で表される構造であることが好ましく、水素原子、炭素数1~3のアルキル基又は上記式(12)で表される構造であることがより好ましく、水素原子、メチル基、エチル基又は上記式(12)で表される構造であることがより好ましく、さらに水素原子、メチル基又は上記式(12)で表される構造であることがより好ましい。上記式(11)中のR14は、水素原子、炭素数1~6のアルキル基又は上記式(13)で表される構造であることが好ましく、水素原子、炭素数1~5のアルキル基又は上記式(13)で表される構造であることがより好ましく、水素原子、炭素数1~3のアルキル基又は上記式(13)で表される構造であることがより好ましく、水素原子、メチル基、エチル基又は上記式(13)で表される構造であることがより好ましく、さらに水素原子、メチル基又は上記式(13)で表される構造であることがより好ましい。なお、上記アルキル基は直鎖構造を有するアルキル基であってもよく、分岐構造を有するアルキル基であってもよい。また、上記R13と上記R14とは、同一であってもよく、異なっていてもよい。 R13 in the above formula (11) is preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a structure represented by the above formula (12), and a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or It is preferably a structure represented by the above formula (12), more preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a structure represented by the above formula (12), a hydrogen atom, a methyl group , An ethyl group or a structure represented by the above formula (12) is more preferable, and a hydrogen atom, a methyl group or a structure represented by the above formula (12) is more preferable. R14 in the above formula (11) is preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a structure represented by the above formula (13), and a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or A structure represented by the above formula (13) is more preferable, and a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (13) is more preferable. A group, an ethyl group, or a structure represented by the above formula (13) is more preferable, and a hydrogen atom, a methyl group, or a structure represented by the above formula (13) is more preferable. The alkyl group may be an alkyl group having a linear structure or an alkyl group having a branched structure. Also, R13 and R14 may be the same or different.
 上記式(12)中のR15は、炭素数1~6のアルキレン基であることが好ましく、炭素数1~5のアルキレン基であることがより好ましく、炭素数1~3のアルキレン基であることがより好ましく、メチレン基又はエチレン基であることがより好ましく、さらにメチレン基であることがより好ましい。上記式(13)中のR16は、炭素数1~6のアルキレン基であることが好ましく、炭素数1~5のアルキレン基であることがより好ましく、炭素数1~3のアルキレン基であることがより好ましく、メチレン基又はエチレン基であることがより好ましく、さらにメチレン基であることがより好ましい。なお、上記アルキレン基は直鎖構造を有するアルキレン基であってもよく、分岐構造を有するアルキレン基であってもよい。 R15 in the above formula (12) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable. R16 in the above formula (13) is preferably an alkylene group having 1 to 6 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms, and an alkylene group having 1 to 3 carbon atoms. Is more preferable, a methylene group or an ethylene group is more preferable, and a methylene group is more preferable. The alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure.
 上記式(11)で表される構造を有するエポキシ化合物は、不飽和二重結合と、少なくとも2個のエポキシ基とを有することを特徴とする。上記エポキシ成分Bの使用により、硬化性組成物を低温で速やかに硬化させることができる。さらに、硬化性組成物に上記エポキシ成分Bと導電性粒子とを添加し、該エポキシ成分Bと導電性粒子とを含む組成物を回路基板又は電子部品等の電極間の接続に用いると、該電極間を効率的に接続できる。 The epoxy compound having the structure represented by the above formula (11) has an unsaturated double bond and at least two epoxy groups. By using the epoxy component B, the curable composition can be quickly cured at a low temperature. Furthermore, when the epoxy component B and conductive particles are added to the curable composition, and the composition containing the epoxy component B and the conductive particles is used for connection between electrodes of a circuit board or an electronic component, The electrodes can be connected efficiently.
 上記式(11)で表される構造を有するエポキシ化合物としては、例えば、上記式(11)中、R11がメチレン基、R12がメチレン基、R13が水素原子、及び、R14が水素原子であるエポキシ化合物、上記式(11)中、R11がメチレン基、R12がメチレン基、R13が下記式(14)で表される構造、及び、R14が水素原子であるエポキシ化合物、並びに上記式(11)中、R11がメチレン基、R12がメチレン基、及び、R13及びR14がそれぞれ下記式(14)で表される構造であるエポキシ化合物等が挙げられる。 Examples of the epoxy compound having the structure represented by the above formula (11) include an epoxy in which, in the above formula (11), R11 is a methylene group, R12 is a methylene group, R13 is a hydrogen atom, and R14 is a hydrogen atom. In the above formula (11), R11 is a methylene group, R12 is a methylene group, R13 is a structure represented by the following formula (14), and R14 is a hydrogen atom, and in the above formula (11) R11 is a methylene group, R12 is a methylene group, and R13 and R14 are epoxy compounds having a structure represented by the following formula (14), respectively.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
 硬化性組成物を低温でより一層速やかに硬化させることができるので、上記式(11)中のR13及びR14は水素原子であることが好ましい。すなわち、上記式(11)で表される構造を有するエポキシ化合物は、下記式(11A)で表される構造を有するエポキシ化合物であることが好ましい。 Since the curable composition can be cured more rapidly at a low temperature, R13 and R14 in the above formula (11) are preferably hydrogen atoms. That is, the epoxy compound having a structure represented by the above formula (11) is preferably an epoxy compound having a structure represented by the following formula (11A).
Figure JPOXMLDOC01-appb-C000025
 上記式(11A)中、R11は炭素数1~10のアルキレン基を表し、R12は炭素数1~10のアルキレン基を表す。
Figure JPOXMLDOC01-appb-C000025
In the above formula (11A), R11 represents an alkylene group having 1 to 10 carbon atoms, and R12 represents an alkylene group having 1 to 10 carbon atoms.
 また、硬化性組成物を低温でさらに一層速やかに硬化させることができるので、上記式(11)中、R11がメチレン基、R12がメチレン基、R13が水素原子、及び、R14が水素原子である、下記式(11B)で表されるエポキシ化合物がより好ましい。 In addition, since the curable composition can be cured more rapidly at a low temperature, in the above formula (11), R11 is a methylene group, R12 is a methylene group, R13 is a hydrogen atom, and R14 is a hydrogen atom. An epoxy compound represented by the following formula (11B) is more preferable.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 上記式(11)で表される構造を有するエポキシ化合物は、単量体である。本発明では、上記式(11)で表される構造を有するエポキシ化合物の単量体にかえて、又は該エポキシ化合物の単量体とともに、上記式(11)で表される構造を有するエポキシ化合物が少なくとも2個結合された多量体を用いてもよい。なかでも、上記エポキシ成分Bは、上記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が2~10個結合された多量体、又は該単量体と該多量体との混合物であることが好ましく、上記エポキシ化合物の単量体、該エポキシ化合物が2個又は3個結合された多量体、又は該単量体と該多量体との混合物であることがより好ましく、さらに該単量体と該多量体との混合物であることがより好ましい。上記式(11)で表される構造を有するエポキシ化合物が10個を超えて結合された多量体を用いると、硬化性組成物の粘度が高くなりすぎることがある。なお、上記式(11)で表される構造を有するエポキシ化合物の単量体を用いた場合には、副生成物として、上記単量体が2個又は3個結合された多量体が含まれたり、保管条件によって、上記単量体が2個以上結合したりすることがある。 The epoxy compound having a structure represented by the above formula (11) is a monomer. In the present invention, the epoxy compound having the structure represented by the above formula (11) instead of the monomer of the epoxy compound having the structure represented by the above formula (11) or together with the monomer of the epoxy compound. A multimer in which at least two are bonded may be used. Among them, the epoxy component B includes an epoxy compound monomer having a structure represented by the above formula (11), a multimer in which 2 to 10 epoxy compounds are bonded, or the monomer and the large amount. A mixture of the monomer and the multimer, or a mixture of two or three of the epoxy compounds, or a mixture of the monomer and the multimer. More preferably, it is a mixture of the monomer and the multimer. When a multimer in which more than 10 epoxy compounds having a structure represented by the above formula (11) are combined is used, the viscosity of the curable composition may be too high. In addition, when the monomer of the epoxy compound having the structure represented by the above formula (11) is used, a multimer in which two or three of the monomers are combined is included as a by-product. Depending on storage conditions, two or more of the above monomers may be bonded.
 本発明の硬化性組成物100重量%中に、上記エポキシ成分Bは10~50重量%の範囲内で含有されることが好ましい。上記エポキシ成分Bの含有量が少なすぎると、低温での硬化速度を充分に高めることができないことがある。上記エポキシ成分Bの含有量が多すぎると、硬化剤の含有量が相対的に少なくなり、成分A及びエポキシ成分B等を充分に硬化させることができないことがある。 The epoxy component B is preferably contained in the range of 10 to 50% by weight in 100% by weight of the curable composition of the present invention. When there is too little content of the said epoxy component B, the cure rate in low temperature may not fully be raised. When there is too much content of the said epoxy component B, content of a hardening | curing agent will become relatively small, and the component A, the epoxy component B, etc. cannot fully be hardened | cured.
 上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記エポキシ成分Bの含有量は、1~50重量%の範囲内であることが好ましい。上記エポキシ成分Bの含有量がこの好ましい範囲内にある場合には、硬化性組成物を低温でより一層速やかに硬化させることができる。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記エポキシ成分Bの含有量のより好ましい下限は3重量%であり、さらに好ましい下限は5重量%であり、より好ましい上限は40重量%であり、さらに好ましい上限は30重量%である。 The content of the epoxy component B in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 1 to 50% by weight. When content of the said epoxy component B exists in this preferable range, a curable composition can be hardened more rapidly at low temperature. The more preferable lower limit of the content of the epoxy component B in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 3% by weight, and the more preferable lower limit is 5% by weight. Is 40% by weight, and a more preferred upper limit is 30% by weight.
 本発明の硬化性組成物は、上記成分A及び上記エポキシ成分B以外の他のエポキシ成分(以下、エポキシ成分Cともいう)を含んでいてもよい。 The curable composition of the present invention may contain an epoxy component other than the component A and the epoxy component B (hereinafter also referred to as an epoxy component C).
 上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、上記エポキシ成分Cとして、窒素原子を含む複素環を有するエポキシ化合物C3を含むことが好ましい。エポキシ化合物C3の使用により、硬化性組成物の硬化物の耐熱性をより一層高くすることができる。また、硬化物の耐熱性をより一層高くすることができるので、窒素原子を含む複素環はトリアジン骨格であることが好ましい。 The component having at least one of the epoxy group and the thiirane group preferably contains, as the epoxy component C, an epoxy compound C3 having a heterocyclic ring containing a nitrogen atom. By using the epoxy compound C3, the heat resistance of the cured product of the curable composition can be further increased. Moreover, since the heat resistance of hardened | cured material can be made still higher, it is preferable that the heterocyclic ring containing a nitrogen atom is a triazine skeleton.
 また、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、上記エポキシ成分Cとして、上記エポキシ化合物C3以外のエポキシ樹脂C1を含んでいてもよい。また、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、上記エポキシ化合物C3及びエポキシ樹脂C1以外のエポキシ化合物C2を含んでいてもよい。 In addition, the component having at least one of the epoxy group and thiirane group may contain an epoxy resin C1 other than the epoxy compound C3 as the epoxy component C. In addition, the component having at least one of the epoxy group and the thiirane group may contain an epoxy compound C2 other than the epoxy compound C3 and the epoxy resin C1.
 本発明の硬化性組成物は、上記エポキシ化合物C2又は上記エポキシ化合物C3を含むことが好ましく、上記エポキシ化合物C2を含むことがより好ましく、さらに上記エポキシ化合物C2と上記エポキシ化合物C3とを含むことがより好ましい。 The curable composition of the present invention preferably includes the epoxy compound C2 or the epoxy compound C3, more preferably includes the epoxy compound C2, and further includes the epoxy compound C2 and the epoxy compound C3. More preferred.
 上記エポキシ成分Bを含む組成物の粘度は比較的低い。上記エポキシ成分Bと、上記エポキシ化合物C2との併用により、硬化性組成物の粘度を高めることができる。また、上記エポキシ成分Bと上記エポキシ化合物C3との併用により、硬化性組成物の硬化速度をより一層速くしたり、硬化性組成物の硬化物の耐熱性を高めたりすることができる。特に上記エポキシ成分Bと上記エポキシ化合物C2と上記エポキシ化合物C3との併用により、硬化性組成物の硬化速度を速くし、硬化性組成物の硬化物の耐熱性を高くし、さらに、硬化性組成物を塗工しやすくすることができる。 The viscosity of the composition containing the epoxy component B is relatively low. By the combined use of the epoxy component B and the epoxy compound C2, the viscosity of the curable composition can be increased. Moreover, by using together the said epoxy component B and the said epoxy compound C3, the cure rate of a curable composition can be made still faster, or the heat resistance of the hardened | cured material of a curable composition can be improved. In particular, the combined use of the epoxy component B, the epoxy compound C2, and the epoxy compound C3 increases the curing rate of the curable composition, increases the heat resistance of the cured product of the curable composition, and further improves the curable composition. It can make it easier to apply objects.
 なお、「エポキシ樹脂」とは、一般的には、1分子中にエポキシ基を2個以上有し、かつ分子量10,000以下の低分子量のポリマーもしくはプレポリマー、又は該ポリマーもしくはプレポリマーのエポキシ基の開環反応によって生じた硬化性樹脂である。硬化性樹脂は、熱硬化性樹脂であってもよく、光硬化性樹脂であってもよい。 The “epoxy resin” generally means a low molecular weight polymer or prepolymer having two or more epoxy groups in one molecule and having a molecular weight of 10,000 or less, or an epoxy of the polymer or prepolymer. It is a curable resin produced by a ring-opening reaction of a group. The curable resin may be a thermosetting resin or a photocurable resin.
 上記エポキシ樹脂C1の具体例としては、ビスフェノール型エポキシ樹脂、エポキシノボラック樹脂、又はナフタレン構造を有するエポキシ樹脂等が挙げられる。 Specific examples of the epoxy resin C1 include a bisphenol type epoxy resin, an epoxy novolac resin, or an epoxy resin having a naphthalene structure.
 上記エポキシ化合物C2の市販品としては、例えば、アデカレジンEP-3300S及びアデカレジンEP-3300E(以上、いずれもADEKA社製)が挙げられる。硬化性組成物は、アデカレジンEP-3300S及びアデカレジンEP-3300Eの内の少なくとも一方を含むことが好ましく、アデカレジンEP-3300Sを含むことがより好ましい。これらの好ましい市販品の使用により、硬化性組成物の粘度を効果的に高めることができる。 Examples of the commercially available epoxy compound C2 include Adeka Resin EP-3300S and Adeka Resin EP-3300E (all of which are manufactured by ADEKA). The curable composition preferably contains at least one of Adeka Resin EP-3300S and Adeka Resin EP-3300E, and more preferably contains Adeka Resin EP-3300S. By using these preferable commercial products, the viscosity of the curable composition can be effectively increased.
 また、上記エポキシ化合物C2は、芳香族環を有するエポキシ化合物であることが好ましい。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分は、芳香族環を有するエポキシ化合物を含むことが好ましい。芳香族環を有するエポキシ化合物の使用により、硬化性組成物の硬化速度を速くし、硬化性組成物を塗工しやすくすることができる。 The epoxy compound C2 is preferably an epoxy compound having an aromatic ring. The component having at least one of the epoxy group and thiirane group preferably contains an epoxy compound having an aromatic ring. By using an epoxy compound having an aromatic ring, the curing rate of the curable composition can be increased and the curable composition can be easily applied.
 上記芳香族環は、ベンゼン環、ナフタレン環又はアントラセン環であることが好ましく、ベンゼン環又はナフタレン環であることがより好ましい。この場合には、硬化性組成物をさらに一層塗工しやすくすることができる。 The aromatic ring is preferably a benzene ring, a naphthalene ring or an anthracene ring, and more preferably a benzene ring or a naphthalene ring. In this case, the curable composition can be further easily applied.
 上記芳香族環を有するエポキシ化合物としては、レゾルシノールジグリシジルエーテル又は1,6-ナフタレンジグリシジルエーテルが挙げられ、レゾルシノールジグリシジルエーテルが特に好ましい。レゾルシノールジグリシジルエーテルの使用により、硬化性組成物の硬化速度を速くし、硬化性組成物を塗工しやすくすることができる。 Examples of the epoxy compound having an aromatic ring include resorcinol diglycidyl ether and 1,6-naphthalenediglycidyl ether, and resorcinol diglycidyl ether is particularly preferable. By using resorcinol diglycidyl ether, the curing rate of the curable composition can be increased, and the curable composition can be easily applied.
 硬化性組成物の硬化速度をより一層速くすることができるので、上記トリアジン骨格を有するエポキシ化合物C3は、少なくとも2つのエポキシ基を有することが好ましく、3つのエポキシ基を有することがより好ましい。 Since the curing rate of the curable composition can be further increased, the epoxy compound C3 having the triazine skeleton preferably has at least two epoxy groups, and more preferably has three epoxy groups.
 上記エポキシ化合物C3は、下記式(16)又は下記式(17)で表されるエポキシ化合物であることが好ましい。これらの好ましいエポキシ化合物の使用により、硬化性組成物の硬化速度を速くし、硬化性組成物の硬化物の耐熱性をより一層高めることができる。 The epoxy compound C3 is preferably an epoxy compound represented by the following formula (16) or the following formula (17). By using these preferable epoxy compounds, the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be further enhanced.
Figure JPOXMLDOC01-appb-C000027
 上記式(16)中、R21~R23はそれぞれ炭素数1~5のアルキレン基を表し、Zはエポキシ基又はヒドロキシメチル基を表す。R21~R23は同一であってもよく、異なっていてもよい。
Figure JPOXMLDOC01-appb-C000027
In the above formula (16), R21 to R23 each represents an alkylene group having 1 to 5 carbon atoms, and Z represents an epoxy group or a hydroxymethyl group. R21 to R23 may be the same or different.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 上記式(17)中、R24~R26はそれぞれ炭素数1~5のアルキレン基を示し、p、q及びrはそれぞれ1~5の整数を示し、R27~R29はそれぞれ炭素数1~5のアルキレン基を示す。R24~R26は同一であってもよく、異なっていてもよい。p、q及びrは同一であってもよく、異なっていてもよい。R27~R29は同一であってもよく、異なっていてもよい。 In the above formula (17), R24 to R26 each represents an alkylene group having 1 to 5 carbon atoms, p, q and r each represents an integer of 1 to 5, and R27 to R29 each represents an alkylene group having 1 to 5 carbon atoms. Indicates a group. R24 to R26 may be the same or different. p, q and r may be the same or different. R27 to R29 may be the same or different.
 上記式(16)中のR21~R23の炭素数が5を超えると、硬化性組成物の硬化速度が低くなることがある。R21~R23の炭素数が小さいと、硬化性組成物の硬化速度が高くなる。上記式(16)中のR21~R23はそれぞれ、炭素数1~3のアルキレン基であることが好ましく、メチレン基又はエチレン基であることがより好ましく、さらにメチレン基であることがより好ましい。 When the carbon number of R21 to R23 in the above formula (16) exceeds 5, the curing rate of the curable composition may be lowered. When the carbon number of R21 to R23 is small, the curing rate of the curable composition is increased. R21 to R23 in the above formula (16) are each preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group or an ethylene group, and even more preferably a methylene group.
 上記式(16)中のZはエポキシ基であることが好ましい。この場合には、硬化性組成物の硬化速度を速くし、硬化性組成物の硬化物の耐熱性をより一層高めることができる。 In the above formula (16), Z is preferably an epoxy group. In this case, the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be further enhanced.
 上記式(17)中のR24~R26の炭素数が5を超えると、硬化性組成物の硬化速度が低くなることがある。R24~R26の炭素数が小さいと、硬化性組成物の硬化速度が高くなる。上記式(17)中のR24~R26はそれぞれ、炭素数2~4のアルキレン基であることが好ましく、炭素数2又は3のアルキレン基であることがより好ましく、さらにエチレン基であることがより好ましい。 When the carbon number of R24 to R26 in the above formula (17) exceeds 5, the curing rate of the curable composition may be lowered. When the carbon number of R24 to R26 is small, the curing rate of the curable composition is increased. R24 to R26 in the above formula (17) are each preferably an alkylene group having 2 to 4 carbon atoms, more preferably an alkylene group having 2 or 3 carbon atoms, and further more preferably an ethylene group. preferable.
 また、上記式(17)中のp、q及びrが5を超えると、硬化性組成物の硬化速度が低くなることがある。p、q及びrが小さいと、硬化性組成物の硬化速度が高くなる。上記式(17)中のp、q及びrはそれぞれ、1~3の整数であることが好ましく、1又は2であることがより好ましく、さらに1であることがより好ましい。 Further, when p, q and r in the above formula (17) exceed 5, the curing rate of the curable composition may be lowered. When p, q, and r are small, the curing rate of the curable composition is increased. In the above formula (17), p, q and r are each preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.
 上記式(17)中のR27~R29の炭素数が5を超えると、硬化性組成物の硬化速度が低くなることがある。R27~R29の炭素数が小さいと、硬化性組成物の硬化速度が高くなる。上記式(17)中のR27~R29はそれぞれ、炭素数1~3のアルキレン基であることが好ましく、メチレン基又はエチレン基であることがより好ましく、さらにメチレン基であることがより好ましい。 When the carbon number of R27 to R29 in the above formula (17) exceeds 5, the curing rate of the curable composition may be lowered. When the carbon number of R27 to R29 is small, the curing rate of the curable composition is increased. R27 to R29 in the above formula (17) are each preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group or an ethylene group, and even more preferably a methylene group.
 上記エポキシ化合物C3は、上記式(16)で表されるエポキシ化合物であることがより好ましい。上記式(16)で表されるエポキシ化合物の使用により、硬化性組成物の硬化速度を速くし、硬化性組成物の硬化物の耐熱性をさらに一層高めることができる。 The epoxy compound C3 is more preferably an epoxy compound represented by the above formula (16). By using the epoxy compound represented by the above formula (16), the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be further enhanced.
 上記エポキシ化合物C3は、トリスヒドロキシエチルイソシアヌレートトリグリシジルエーテル又はトリグリシジルイソシアヌレートであることが好ましく、トリグリシジルイソシアヌレートであることがより好ましい。すなわち、上記エポキシ化合物C3は、下記式(16A)又は下記式(17A)で表されるエポキシ化合物であることが好ましく、下記式(16A)で表されるエポキシ化合物であることがより好ましい。これらの好ましいエポキシ化合物の使用により、硬化性組成物の硬化速度をさらに一層高めることができる。 The epoxy compound C3 is preferably trishydroxyethyl isocyanurate triglycidyl ether or triglycidyl isocyanurate, and more preferably triglycidyl isocyanurate. That is, the epoxy compound C3 is preferably an epoxy compound represented by the following formula (16A) or the following formula (17A), and more preferably an epoxy compound represented by the following formula (16A). By using these preferable epoxy compounds, the curing rate of the curable composition can be further increased.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 硬化性組成物100重量%中に、上記エポキシ成分Cは0.1~45重量%の範囲内で含有されることが好ましい。 The epoxy component C is preferably contained within a range of 0.1 to 45% by weight in 100% by weight of the curable composition.
 硬化性組成物100重量%中に、上記エポキシ化合物C2は20~40重量%の範囲内で含有されることが好ましい。上記エポキシ化合物C2の含有量がこの好ましい範囲内にあることにより、硬化性組成物の粘度をより一層効果的に高めることができる。 The epoxy compound C2 is preferably contained within a range of 20 to 40% by weight in 100% by weight of the curable composition. When the content of the epoxy compound C2 is within this preferable range, the viscosity of the curable composition can be more effectively increased.
 上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記エポキシ化合物C2の含有量は、5~95重量%の範囲内であることが好ましい。また、上記エポキシ化合物C2が芳香族環を有するエポキシ化合物であって、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の芳香族環を有する化合物の含有量が、5~95重量%の範囲内であることが好ましい。上記エポキシ化合物C2又は芳香族環を有するエポキシ化合物の含有量がこの好ましい範囲内にあることにより、硬化性組成物の粘度をより一層効果的に高めることができる。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記エポキシ化合物C2又は芳香族環を有するエポキシ化合物の含有量のより好ましい下限は15重量%であり、さらに好ましい下限は35重量%であり、より好ましい上限は75重量%であり、さらに好ましい上限は60重量%である。 The content of the epoxy compound C2 in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 5 to 95% by weight. The epoxy compound C2 is an epoxy compound having an aromatic ring, and the content of the compound having an aromatic ring in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 5 to It is preferably in the range of 95% by weight. When the content of the epoxy compound C2 or the epoxy compound having an aromatic ring is within this preferable range, the viscosity of the curable composition can be further effectively increased. The more preferable lower limit of the content of the epoxy compound C2 or the epoxy compound having an aromatic ring in 100% by weight of the component having at least one of the epoxy group and the thiirane group is 15% by weight, and the more preferable lower limit is 35 The upper limit is 75% by weight, and the more preferable upper limit is 60% by weight.
 硬化性組成物100重量%中に、上記エポキシ化合物C3は0.1~5重量%の範囲内で含有されることが好ましい。上記エポキシ化合物C3の含有量がこの好ましい範囲内にあることにより、硬化性組成物の硬化速度をより一層速くすることができる。 The epoxy compound C3 is preferably contained within a range of 0.1 to 5% by weight in 100% by weight of the curable composition. When the content of the epoxy compound C3 is within this preferable range, the curing rate of the curable composition can be further increased.
 また、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の上記エポキシ化合物C3の含有量は0.1~10重量%の範囲内であることが好ましい。また、上記エポキシ化合物C3が窒素原子を含む複素環を有するエポキシ化合物であって、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中の窒素原子を含む複素環を有するエポキシ化合物の含有量が、0.1~10重量%の範囲内であることが好ましい。上記エポキシ化合物C3又は窒素原子を含む複素環を有するエポキシ化合物の含有量がこの好ましい範囲内にあることにより、硬化性組成物の硬化速度を速くし、硬化性組成物の硬化物の耐熱性をより一層高めることができる。 The content of the epoxy compound C3 in 100% by weight of the component having at least one of the epoxy group and thiirane group is preferably in the range of 0.1 to 10% by weight. The epoxy compound C3 is an epoxy compound having a heterocyclic ring containing a nitrogen atom, and the epoxy compound having a heterocyclic ring containing a nitrogen atom in 100% by weight of the component having at least one of the epoxy group and the thiirane group. The content of is preferably in the range of 0.1 to 10% by weight. When the content of the epoxy compound C3 or the epoxy compound having a heterocyclic ring containing a nitrogen atom is within this preferable range, the curing rate of the curable composition is increased, and the heat resistance of the cured product of the curable composition is increased. It can be further increased.
 硬化性組成物の粘度(25℃)は、20,000~100,000mPa・sの範囲内にあることが好ましい。 The viscosity (25 ° C.) of the curable composition is preferably in the range of 20,000 to 100,000 mPa · s.
 また、硬化性組成物の塩素イオン濃度は、500ppm以下であることが好ましい。上記塩素イオン濃度が高すぎると、硬化性組成物の硬化速度が遅くなることがある。なお、上記塩素イオン濃度は、例えば、ICP発光分析により測定できる。 Further, the chlorine ion concentration of the curable composition is preferably 500 ppm or less. If the chlorine ion concentration is too high, the curing rate of the curable composition may be slow. The chlorine ion concentration can be measured by, for example, ICP emission analysis.
 上記硬化剤は特に限定されない。上記硬化剤としては、イミダゾール硬化剤、アミン硬化剤、フェノール硬化剤、ポリチオール硬化剤又は酸無水物等が挙げられる。なかでも、硬化性組成物を低温でより一層速やかに硬化させることができるので、イミダゾール硬化剤、ポリチオール硬化剤又はアミン硬化剤が好ましい。また、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分と上記硬化剤とを混合したときに保存安定性を高めることができるので、潜在性の硬化剤が好ましい。潜在性の硬化剤は、潜在性イミダゾール硬化剤、潜在性ポリチオール硬化剤又は潜在性アミン硬化剤であることが好ましい。これらの硬化剤は1種のみが用いられてもよく、2種以上が併用されてもよい。なお、上記硬化剤は、ポリウレタン樹脂又はポリエステル樹脂等の高分子物質で被覆されていてもよい。 The curing agent is not particularly limited. Examples of the curing agent include an imidazole curing agent, an amine curing agent, a phenol curing agent, a polythiol curing agent, and an acid anhydride. Especially, since a curable composition can be hardened more rapidly at low temperature, an imidazole hardening | curing agent, a polythiol hardening | curing agent, or an amine hardening | curing agent is preferable. Moreover, since a storage stability can be improved when the said hardener is mixed with the component which has at least 1 type of the said epoxy group and thiirane group, a latent hardener is preferable. The latent curing agent is preferably a latent imidazole curing agent, a latent polythiol curing agent or a latent amine curing agent. Only 1 type may be used for these hardening | curing agents, and 2 or more types may be used together. In addition, the said hardening | curing agent may be coat | covered with polymeric substances, such as a polyurethane resin or a polyester resin.
 上記イミダゾール硬化剤としては、特に限定されないが、2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、1-シアノエチル-2-フェニルイミダゾール、1-シアノエチル-2-フェニルイミダゾリウムトリメリテート、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジン又は2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジンイソシアヌル酸付加物等が挙げられる。 The imidazole curing agent is not particularly limited, but 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2, 4-Diamino-6- [2'-methylimidazolyl- (1 ')]-ethyl-s-triazine or 2,4-diamino-6- [2'-methylimidazolyl- (1')]-ethyl-s- Examples include triazine isocyanuric acid adducts.
 上記ポリチオール硬化剤としては、特に限定されないが、トリメチロールプロパン トリス-3-メルカプトプロピオネート、ペンタエリスリトール テトラキス-3-メルカプトプロピオネート又はジペンタエリスリトール ヘキサ-3-メルカプトプロピオネート等が挙げられる。 The polythiol curing agent is not particularly limited, and examples include trimethylolpropane tris-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol hexa-3-mercaptopropionate, and the like. .
 上記アミン硬化剤としては、特に限定されないが、ヘキサメチレンジアミン、オクタメチレンジアミン、デカメチレンジアミン、3,9-ビス(3-アミノプロピル)2,4,8,10-テトラスピロ[5.5]ウンデカン、ビス(4-アミノシクロヘキシル)メタン、メタフェニレンジアミン又はジアミノジフェニルスルホン等が挙げられる。 The amine curing agent is not particularly limited, but is hexamethylenediamine, octamethylenediamine, decamethylenediamine, 3,9-bis (3-aminopropyl) 2,4,8,10-tetraspiro [5.5] undecane. Bis (4-aminocyclohexyl) methane, metaphenylenediamine, diaminodiphenylsulfone and the like.
 上記硬化剤の含有量は特に限定されない。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、上記硬化剤は1~40重量部の範囲内で含有されることが好ましい。上記硬化剤の含有量が1重量部未満であると、硬化性組成物が充分に硬化しないことがある。上記硬化剤の含有量が40重量部を超えると、硬化性組成物の硬化物の耐熱性が低下することがある。なお、「エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部」とは、上記成分A以外の他のエポキシ成分が含まれない場合には、上記成分A100重量部を意味し、上記成分A以外の他のエポキシ成分が含まれる場合には、上記成分Aと他のエポキシ成分との合計100重量部を意味する。 The content of the curing agent is not particularly limited. The curing agent is preferably contained in the range of 1 to 40 parts by weight with respect to a total of 100 parts by weight of the component having at least one of the epoxy group and thiirane group. When the content of the curing agent is less than 1 part by weight, the curable composition may not be sufficiently cured. When content of the said hardening | curing agent exceeds 40 weight part, the heat resistance of the hardened | cured material of a curable composition may fall. In addition, “a total of 100 parts by weight of components having at least one of an epoxy group and a thiirane group” means 100 parts by weight of the component A when no other epoxy component other than the component A is included. When other epoxy components other than the component A are included, it means a total of 100 parts by weight of the component A and the other epoxy components.
 なお、上記硬化剤がイミダゾール硬化剤又はフェノール硬化剤である場合、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、イミダゾール硬化剤又はフェノール硬化剤は、1~15重量部の範囲内で含有されることが好ましい。また、上記硬化剤がアミン硬化剤、ポリチオール硬化剤又は酸無水物である場合、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、アミン硬化剤、ポリチオール硬化剤又は酸無水物は15~40重量部の範囲内で含有されることが好ましい。 In addition, when the said hardening | curing agent is an imidazole hardening | curing agent or a phenol hardening | curing agent, an imidazole hardening | curing agent or a phenol hardening | curing agent is 1 with respect to a total of 100 weight part of the component which has at least 1 type of the said epoxy group and thiirane group. It is preferably contained in the range of ˜15 parts by weight. Further, when the curing agent is an amine curing agent, a polythiol curing agent or an acid anhydride, the amine curing agent and the polythiol curing are used with respect to a total of 100 parts by weight of the component having at least one of the epoxy group and the thiirane group. The agent or acid anhydride is preferably contained in the range of 15 to 40 parts by weight.
 本発明の硬化性組成物は、溶剤をさらに含有していてもよい。例えば、上記成分Aが固形である場合に、固形の上記成分Aに溶剤を添加すると、上記成分Aは溶剤に溶解するため、硬化性組成物中における上記成分Aの分散性を高めることができる。上記溶剤としては、例えば、酢酸エチル、メチルセロソルブ、トルエン、アセトン、メチルエチルケトン、シクロヘキサン、n-ヘキサン、テトラヒドロフラン又はジエチルエーテル等が挙げられる。 The curable composition of the present invention may further contain a solvent. For example, when the component A is solid, when the solvent is added to the solid component A, the component A is dissolved in the solvent, so that the dispersibility of the component A in the curable composition can be improved. . Examples of the solvent include ethyl acetate, methyl cellosolve, toluene, acetone, methyl ethyl ketone, cyclohexane, n-hexane, tetrahydrofuran or diethyl ether.
 組成物の粘度を調整するために、あるいは塗布した組成物が濡れ広がらないようにするために、本発明の硬化性組成物は、重合性化合物をさらに含有していてもよい。上記重合性化合物は特に限定されない。上記重合性化合物としては、例えば、架橋性化合物又は非架橋性化合物が挙げられる。上記重合性化合物は、1種のみが用いられてもよく、2種以上が併用されてもよい。 In order to adjust the viscosity of the composition or to prevent the applied composition from getting wet and spreading, the curable composition of the present invention may further contain a polymerizable compound. The polymerizable compound is not particularly limited. As said polymeric compound, a crosslinkable compound or a non-crosslinkable compound is mentioned, for example. As for the said polymeric compound, only 1 type may be used and 2 or more types may be used together.
 上記架橋性化合物は特に限定されない。上記架橋性化合物の具体例としては、例えば、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、1,9-ノナンジオールジ(メタ)アクリレート、(ポリ)エチレングリコールジ(メタ)アクリレート、(ポリ)プロピレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレート、グリセリンメタクリレートアクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリメチロールプロパントリメタクリレート、(メタ)アクリル酸アリル、(メタ)アクリル酸ビニル、ジビニルベンゼン、ポリエステル(メタ)アクリレート、又はウレタン(メタ)アクリレート等が挙げられる。 The crosslinkable compound is not particularly limited. Specific examples of the crosslinkable compound include 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, (poly ) Ethylene glycol di (meth) acrylate, (poly) propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, glycerol methacrylate acrylate, pentaerythritol tri (meth) acrylate, tri Examples include methylolpropane trimethacrylate, allyl (meth) acrylate, vinyl (meth) acrylate, divinylbenzene, polyester (meth) acrylate, and urethane (meth) acrylate.
 上記非架橋性化合物は特に限定されない。上記非架橋性化合物の具体例としては、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、ヘプチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、n-オクチル(メタ)アクリレート、イソオクチル(メタ)アクリレート、ノニル(メタ)アクリレート、デシル(メタ)アクリレート、ウンデシル(メタ)アクリレート、ドデシル(メタ)アクリレート、トリデシル(メタ)アクリレート、又はテトラデシル(メタ)アクリレート等が挙げられる。 The above non-crosslinkable compound is not particularly limited. Specific examples of the non-crosslinkable compound include ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) ) Acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, nonyl (meth) acrylate, decyl Examples include (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, tridecyl (meth) acrylate, and tetradecyl (meth) acrylate.
 上記重合性化合物の含有量は特に限定されない。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、上記重合性化合物は10~60重量部の範囲内で含有されることが好ましい。上記重合性化合物の含有量が10重量部未満であると、硬化性組成物の硬化物の耐熱性が低下することがある。上記重合性化合物の含有量が60重量部を超えると、硬化性組成物の粘度が高くなりすぎることがある。 The content of the polymerizable compound is not particularly limited. The polymerizable compound is preferably contained in the range of 10 to 60 parts by weight with respect to 100 parts by weight of the total of the components having at least one of the epoxy group and thiirane group. When content of the said polymeric compound is less than 10 weight part, the heat resistance of the hardened | cured material of a curable composition may fall. When content of the said polymeric compound exceeds 60 weight part, the viscosity of a curable composition may become high too much.
 被着体に対する、硬化性組成物の硬化物の接着力を高めることができるので、本発明の硬化性組成物は、接着力調整剤を含有することが好ましい。上記接着力調整剤は、シランカップリング剤であることが好ましい。 Since the adhesive strength of the cured product of the curable composition to the adherend can be increased, the curable composition of the present invention preferably contains an adhesive strength modifier. The adhesive strength adjusting agent is preferably a silane coupling agent.
 上記シランカップリング剤は特に限定されない。上記シランカップリング剤としては、例えば、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリエトキシシラン、3-アミノプロピルジメチルエトキシシラン、3-アミノプロピルメチルジエトキシシラン、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、ビニルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリアセトキシシラン、ビニルトリクロロシラン、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルメチルジメトキシシラン、3-クロロプロピルトリメトキシシラン、3-クロロプロピルトリエトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルトリエトキシシラン、エチルトリメトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、ドデシルトリエトキシシラン、ヘキシルトリメトキシシラン、t-ブチルイソブチルジエトキシシラン、メチルフェニルジエトキシシラン、3-グリシドキシプロピルトリエトキシシラン又はメチルフェニルジメトキシシラン等が挙げられる。上記シランカップリング剤は、1種のみが用いられてもよく、2種以上が併用されてもよい。 The silane coupling agent is not particularly limited. Examples of the silane coupling agent include N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, and N- (2-amino). Ethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyltriethoxysilane, 3-aminopropyldimethylethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyltri Methoxysilane, 3-aminopropyltriethoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane, vinyltriacetoxysilane, vinyltrichlorosilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-chloropropyl Pyrtrimethoxysilane, 3-chloropropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, ethyltrimethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, dodecyltriethoxysilane Hexyltrimethoxysilane, t-butylisobutyldiethoxysilane, methylphenyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, methylphenyldimethoxysilane, and the like. As for the said silane coupling agent, only 1 type may be used and 2 or more types may be used together.
 上記シランカップリング剤の含有量は特に限定されない。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、上記シランカップリング剤は4~20重量部の範囲内で含有されることが好ましい。上記シランカップリング剤の含有量が4重量部未満であると、被着体に対する、硬化性組成物の硬化物の接着力が低下することがある。上記シランカップリング剤の含有量が20重量部を超えると、硬化性組成物が硬化しにくくなることがある。 The content of the silane coupling agent is not particularly limited. The silane coupling agent is preferably contained in the range of 4 to 20 parts by weight with respect to 100 parts by weight of the total of the components having at least one of the epoxy group and thiirane group. When the content of the silane coupling agent is less than 4 parts by weight, the adhesive strength of the cured product of the curable composition to the adherend may be reduced. When content of the said silane coupling agent exceeds 20 weight part, a curable composition may become difficult to harden | cure.
 本発明の硬化性組成物は、無機粒子を含有することが好ましい。上記無機粒子の使用により、硬化性組成物の硬化物の潜熱膨張を抑制できる。上記無機粒子は特に限定されない。上記無機粒子としては、シリカ、窒化アルミニウム、又はアルミナ等が挙げられる。上記無機粒子は1種のみが用いられてもよく、2種以上が併用されてもよい。 The curable composition of the present invention preferably contains inorganic particles. By using the inorganic particles, latent heat expansion of the cured product of the curable composition can be suppressed. The inorganic particles are not particularly limited. Examples of the inorganic particles include silica, aluminum nitride, and alumina. As for the said inorganic particle, only 1 type may be used and 2 or more types may be used together.
 上記無機粒子の含有量は特に限定されない。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、上記無機粒子は3~900重量部の範囲内で含有されることが好ましい。上記無機粒子の含有量が3重量部未満であると、硬化性組成物の硬化物の潜熱膨張を抑制できないことがある。上記無機粒子の含有量が900重量部を超えると、硬化性組成物中に無機粒子が充分に分散しないことがある。 The content of the inorganic particles is not particularly limited. The inorganic particles are preferably contained within a range of 3 to 900 parts by weight with respect to a total of 100 parts by weight of the component having at least one of the epoxy group and thiirane group. When the content of the inorganic particles is less than 3 parts by weight, the latent heat expansion of the cured product of the curable composition may not be suppressed. When content of the said inorganic particle exceeds 900 weight part, an inorganic particle may not fully disperse | distribute in a curable composition.
 本発明の硬化性組成物は、光照射または加熱により反応活性種を生じさせる重合開始剤を含有していてもよい。上記重合開始剤の使用により、硬化性組成物の硬化速度をより一層高めることができる。 The curable composition of the present invention may contain a polymerization initiator that generates reactive species by light irradiation or heating. By using the polymerization initiator, the curing rate of the curable composition can be further increased.
 上記重合開始剤は特に限定されない。上記重合開始剤としては、例えば、アセトフェノン重合開始剤、ケタール重合開始剤、ハロゲン化ケトン、アシルホスフィノキシド、又はアシルホスフォナート等が挙げられる。上記アセトフェノン重合開始剤は特に限定されない。上記アセトフェノン重合開始剤の具体例としては、4-(2-ヒドロキシエトキシ)フェニル(2-ヒドロキシ-2-プロピル)ケトン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、メトキシアセトフェノン、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、2-ヒドロキシ-2-シクロヘキシルアセトフェノン等が挙げられる。また、上記ケタール重合開始剤は特に限定されない。上記ケタール重合開始剤の具体例としては、ベンジルジメチルケタール等が挙げられる。上記重合開始剤は1種のみが用いられてもよく、2種以上が併用されてもよい。 The polymerization initiator is not particularly limited. Examples of the polymerization initiator include acetophenone polymerization initiators, ketal polymerization initiators, halogenated ketones, acyl phosphinoxides, and acyl phosphonates. The acetophenone polymerization initiator is not particularly limited. Specific examples of the acetophenone polymerization initiator include 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, methoxyacetophenone 2,2-dimethoxy-1,2-diphenylethane-1-one, 2-hydroxy-2-cyclohexylacetophenone, and the like. The ketal polymerization initiator is not particularly limited. Specific examples of the ketal polymerization initiator include benzyl dimethyl ketal. As for the said polymerization initiator, only 1 type may be used and 2 or more types may be used together.
 上記重合開始剤の含有量は特に限定されない。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、上記重合開始剤は2~10重量部の範囲内で含有されることが好ましい。上記重合開始剤の含有量が2重量部未満であると、重合開始剤を添加した効果が充分に得られないことがある。上記重合開始剤の含有量が10重量部を超えると、被着体に対する、硬化性組成物の硬化物の接着力が低下することがある。 The content of the polymerization initiator is not particularly limited. The polymerization initiator is preferably contained in the range of 2 to 10 parts by weight with respect to 100 parts by weight as a total of the components having at least one of the epoxy group and thiirane group. If the content of the polymerization initiator is less than 2 parts by weight, the effect of adding the polymerization initiator may not be sufficiently obtained. When content of the said polymerization initiator exceeds 10 weight part, the adhesive force of the hardened | cured material of a curable composition with respect to a to-be-adhered body may fall.
 本発明の硬化性組成物の製造方法は特に限定されない。硬化性組成物の製造方法の具体例としては、上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分と、上記硬化剤と、必要に応じて添加される他の成分とを配合し、遊星式攪拌機等を用いて充分に混合する製造方法が挙げられる。 The method for producing the curable composition of the present invention is not particularly limited. As a specific example of the method for producing a curable composition, a component having at least one of the epoxy group and the thiirane group, the curing agent, and other components added as necessary are blended, The manufacturing method which mixes sufficiently using a formula stirrer etc. is mentioned.
 本発明の硬化性組成物は、一液型接着剤として、液晶パネル又は半導体チップ等の接着に用いることができる。本発明の硬化性組成物は、ペースト状の接着剤であってもよく、フィルム状の接着剤であってもよい。 The curable composition of the present invention can be used as a one-component adhesive for bonding a liquid crystal panel or a semiconductor chip. The curable composition of the present invention may be a paste-like adhesive or a film-like adhesive.
 本発明の硬化性組成物をフィルム状の接着剤に加工する方法は特に限定されない。例えば、本発明の硬化性組成物を離型紙等の基材に塗布し、フィルム状の接着剤に加工する方法、又は本発明の硬化性組成物に溶剤を加えて、離型紙等の基材に塗布した後、上記硬化剤の活性温度よりも低い温度で溶剤を揮発させ、フィルム状の接着剤に加工する方法等が挙げられる。 The method for processing the curable composition of the present invention into a film adhesive is not particularly limited. For example, a method of applying the curable composition of the present invention to a substrate such as a release paper and processing it into a film-like adhesive, or adding a solvent to the curable composition of the present invention to form a substrate such as a release paper And a method of evaporating the solvent at a temperature lower than the activation temperature of the curing agent and processing it into a film-like adhesive.
 本発明の硬化性組成物を硬化させる方法としては、硬化性組成物を加熱する方法、硬化性組成物に光を照射し、次いで、硬化性組成物を加熱する方法、硬化性組成物に光を照射すると同時に、硬化性組成物を加熱する方法等が挙げられる。 As a method of curing the curable composition of the present invention, a method of heating the curable composition, a method of irradiating the curable composition with light, and then heating the curable composition, a light of the curable composition And a method of heating the curable composition at the same time.
 本発明の硬化性組成物を硬化させる際の加熱温度は、160~250℃の範囲内にあることが好ましく、160~200℃の範囲内にあることがより好ましい。本発明の硬化性組成物は低温で硬化させることができるので、加熱に要するエネルギー量を低減できる。 The heating temperature for curing the curable composition of the present invention is preferably in the range of 160 to 250 ° C, and more preferably in the range of 160 to 200 ° C. Since the curable composition of the present invention can be cured at a low temperature, the amount of energy required for heating can be reduced.
 従来の硬化性組成物では、上記加熱温度が200℃以下であると、硬化時間が長くなり、例えば加熱温度が200℃であれば硬化時間が10秒を超えてしまう。これに対し、本発明の硬化性組成物では、上記加熱温度が200℃以下であっても、短時間で硬化させることができ、例えば加熱温度が200℃であれば硬化時間は長くとも10秒未満にすることができる。なお、本明細書において、低温とは200℃以下の温度を意味する。 In the conventional curable composition, when the heating temperature is 200 ° C. or less, the curing time becomes long. For example, when the heating temperature is 200 ° C., the curing time exceeds 10 seconds. In contrast, the curable composition of the present invention can be cured in a short time even when the heating temperature is 200 ° C. or less. For example, if the heating temperature is 200 ° C., the curing time is 10 seconds at the longest. Can be less than. In this specification, low temperature means a temperature of 200 ° C. or lower.
 なお、本発明の硬化性組成物を硬化させる方法として、硬化性組成物に光を照射し、次いで、硬化性組成物を加熱する方法によれば、加熱のみする方法よりも、硬化性組成物を短時間で硬化させることができる。 In addition, as a method of curing the curable composition of the present invention, according to the method of irradiating the curable composition with light and then heating the curable composition, the curable composition is more than the method of heating alone. Can be cured in a short time.
 本発明の硬化性組成物に光を照射する際に用いる光源は特に限定されない。該光源としては、例えば、波長420nm以下に充分な発光分布を有する光源等が挙げられる。また、光源の具体例としては、例えば、低圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水銀灯、ケミカルランプ、ブラックライトランプ、マイクロウェーブ励起水銀灯、又はメタルハライドランプ等が挙げられる。なかでも、ケミカルランプが好ましい。ケミカルランプは、重合開始剤の活性波長領域の光を効率よく発光するとともに、組成物中の重合開始剤以外の他の成分の光吸収波長領域における発光量が少ない。さらに、ケミカルランプの使用により、組成物の内部に存在する重合開始剤まで効率よく光を到達させることができる。 The light source used when irradiating light to the curable composition of the present invention is not particularly limited. Examples of the light source include a light source having a sufficient light emission distribution at a wavelength of 420 nm or less. Specific examples of the light source include a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a chemical lamp, a black light lamp, a microwave excitation mercury lamp, or a metal halide lamp. Of these, a chemical lamp is preferable. The chemical lamp efficiently emits light in the active wavelength region of the polymerization initiator and emits less light in the light absorption wavelength region of components other than the polymerization initiator in the composition. Furthermore, by using a chemical lamp, light can efficiently reach the polymerization initiator present in the composition.
 例えば、アセトフェノン基を有する開裂型の重合開始剤が含有されている場合には、365nm~420nmの波長領域での光照射強度は、0.1~100mW/cmであることが好ましい。 For example, when a cleavage type polymerization initiator having an acetophenone group is contained, the light irradiation intensity in the wavelength region of 365 nm to 420 nm is preferably 0.1 to 100 mW / cm 2 .
 (異方性導電材料)
 本発明の硬化性組成物に導電性粒子を含有させることにより、異方性導電材料を得ることができる。
(Anisotropic conductive material)
By containing conductive particles in the curable composition of the present invention, an anisotropic conductive material can be obtained.
 上記導電性粒子は、対向する電気的接続部分間、例えば回路基板の電極と電子部品の電極との間等を電気的に接続する。上記導電性粒子は、少なくとも外表面が導電性を有する粒子であれば特に限定されない。上記導電性粒子としては、例えば、有機粒子、無機粒子、有機無機ハイブリッド粒子、もしくは金属粒子等の表面を金属層で被覆した導電性粒子、又は実質的に金属のみで構成される金属粒子等が挙げられる。上記金属層は特に限定されない。上記金属層としては、金層、銀層、銅層、ニッケル層、パラジウム層、又は錫を含有する金属層等が挙げられる。 The conductive particles electrically connect the opposing electrical connection portions, for example, between the electrodes of the circuit board and the electrodes of the electronic component. The conductive particles are not particularly limited as long as at least the outer surface has conductivity. Examples of the conductive particles include organic particles, inorganic particles, organic-inorganic hybrid particles, or conductive particles whose surfaces are covered with a metal layer, or metal particles that are substantially composed only of metal. Can be mentioned. The metal layer is not particularly limited. Examples of the metal layer include a gold layer, a silver layer, a copper layer, a nickel layer, a palladium layer, or a metal layer containing tin.
 上記導電性粒子の含有量は特に限定されない。上記エポキシ基及びチイラン基の内の少なくとも一種を有する成分の合計100重量部に対して、上記導電性粒子は0.5~5重量部の範囲内で含有されることが好ましい。上記導電性粒子の含有量が0.5重量部未満であると、電極同士を確実に導通させることができないことがある。導電性粒子の含有量が5重量部を超えると、導通されてはならない隣接する電極間で短絡が生じることがある。 The content of the conductive particles is not particularly limited. The conductive particles are preferably contained within a range of 0.5 to 5 parts by weight with respect to 100 parts by weight as a total of the components having at least one of the epoxy group and thiirane group. If the content of the conductive particles is less than 0.5 parts by weight, the electrodes may not be reliably conducted. When content of electroconductive particle exceeds 5 weight part, a short circuit may arise between the adjacent electrodes which should not be conduct | electrically_connected.
 異方性導電材料が液状又はペースト状である場合に、異方性導電材料の粘度(25℃)は、20,000~100,000mPa・sの範囲内にあることが好ましい。上記粘度が低すぎると、導電性粒子が、異方性導電材料中において沈降してしまうことがある。上記粘度が高すぎると、導電性粒子が、異方性導電材料中に充分に分散しないことがある。 When the anisotropic conductive material is liquid or pasty, the viscosity (25 ° C.) of the anisotropic conductive material is preferably in the range of 20,000 to 100,000 mPa · s. If the viscosity is too low, the conductive particles may settle in the anisotropic conductive material. When the viscosity is too high, the conductive particles may not be sufficiently dispersed in the anisotropic conductive material.
 また、異方性導電材料の塩素イオン濃度は、500ppm以下であることが好ましい。上記塩素イオン濃度が高すぎると、異方性導電材料に含まれている硬化性組成物の硬化速度が遅くなることがある。 Further, the chlorine ion concentration of the anisotropic conductive material is preferably 500 ppm or less. If the chlorine ion concentration is too high, the curing rate of the curable composition contained in the anisotropic conductive material may be slow.
 本発明の異方性導電材料は、異方性導電ペースト、異方性導電インク、異方性導電粘接着剤、異方性導電フィルム、又は異方性導電シート等として使用され得る。本発明の導電性粒子を含む異方性導電材料が、異方性導電フィルム又は異方性導電シート等のフィルム状の接着剤として使用される場合には、該導電性粒子を含むフィルム状の接着剤に、導電性粒子を含まないフィルム状の接着剤が積層されていてもよい。 The anisotropic conductive material of the present invention can be used as an anisotropic conductive paste, anisotropic conductive ink, anisotropic conductive adhesive, anisotropic conductive film, anisotropic conductive sheet or the like. When the anisotropic conductive material containing the conductive particles of the present invention is used as a film-like adhesive such as an anisotropic conductive film or an anisotropic conductive sheet, the film-like shape containing the conductive particles is used. A film-like adhesive that does not contain conductive particles may be laminated on the adhesive.
 (接続構造体)
 本発明の硬化性組成物又は本発明の異方性導電材料を用いて、接続対象部材を接続することにより、接続構造体を得ることができる。接続対象部材は、電子部品及び回路基板の内の少なくとも一方であることが好ましい。
(Connection structure)
A connection structure can be obtained by connecting a connection object member using the curable composition of the present invention or the anisotropic conductive material of the present invention. The connection target member is preferably at least one of an electronic component and a circuit board.
 上記接続構造体は、第1の接続対象部材と、第2の接続対象部材と、第1,第2の接続対象部材を接続している接続部とを備え、該接続部が、本発明の異方性導電材料又は本発明の硬化性組成物により形成されていることが好ましい。接続部は、本発明の異方性導電材料又は本発明の硬化性組成物を硬化させることにより形成された硬化物層である。 The connection structure includes a first connection target member, a second connection target member, and a connection portion connecting the first and second connection target members, the connection portion of the present invention. It is preferably formed of an anisotropic conductive material or the curable composition of the present invention. A connection part is the hardened | cured material layer formed by hardening the anisotropic conductive material of this invention, or the curable composition of this invention.
 上記接続構造体は、第1の接続対象部材と、第2の接続対象部材と、第1,第2の接続対象部材を電気的に接続している接続部とを備えることが好ましい。この接続部は、本発明の異方性導電材料により形成されている。また、この接続部は硬化物層であり、本発明の異方性導電材料を硬化させることにより形成されている。 It is preferable that the connection structure includes a first connection target member, a second connection target member, and a connection portion that electrically connects the first and second connection target members. This connecting portion is formed of the anisotropic conductive material of the present invention. Moreover, this connection part is a hardened | cured material layer, and is formed by hardening the anisotropic conductive material of this invention.
 上記第1,第2の接続対象部材は、電気的に接続される第1,第2の電気的接続対象部材であってもよい。上記第1,第2の電気的接続対象部材としては、互いに電気的に接続されるべき、様々な電気的接続対象部材が挙げられる。例えば、第1,第2の電気的接続対象部材は、一方が回路基板の電極、他方がICチップ等の電子部品チップの電極であってもよい。また、第1,第2の電気的接続対象部材は、双方が電極である必要は必ずしもない。 The first and second connection target members may be first and second electrical connection target members that are electrically connected. As said 1st, 2nd electrical connection object member, the various electrical connection object member which should be electrically connected mutually is mentioned. For example, one of the first and second electrical connection target members may be an electrode of a circuit board, and the other may be an electrode of an electronic component chip such as an IC chip. Further, the first and second electrical connection target members are not necessarily both electrodes.
 図1は、本発明の一実施形態に係る硬化性組成物と、導電性粒子とを含む異方性導電材料を用いた接続構造体を模式的に示す正面断面図である。 FIG. 1 is a front sectional view schematically showing a connection structure using an anisotropic conductive material including a curable composition according to an embodiment of the present invention and conductive particles.
 図1に示す接続構造体1は、第1の接続対象部材2と、第2の接続対象部材3と、第1,第2の接続対象部材2,3とを電気的に接続している接続部4とを備える。接続部4は、硬化物層であり、複数の導電性粒子5を含む異方性導電材料としての異方性導電ペーストを用いて形成されている。 A connection structure 1 shown in FIG. 1 is a connection that electrically connects a first connection target member 2, a second connection target member 3, and first and second connection target members 2 and 3. Part 4. The connection portion 4 is a cured product layer and is formed using an anisotropic conductive paste as an anisotropic conductive material including a plurality of conductive particles 5.
 第1の接続対象部材2の上面2aに、複数の電極2bが設けられている。第2の接続対象部材3の下面3aに、複数の電極3bが設けられている。第1の接続対象部材2の上面2aに、導電性粒子1を含有する異方性導電ペーストにより形成された硬化物層4を介して、第2の接続対象部材3が積層されている。電極2bと電極3bとが、導電性粒子5により電気的に接続されている。 A plurality of electrodes 2 b are provided on the upper surface 2 a of the first connection target member 2. A plurality of electrodes 3 b are provided on the lower surface 3 a of the second connection target member 3. The second connection target member 3 is laminated on the upper surface 2 a of the first connection target member 2 via a cured product layer 4 formed of an anisotropic conductive paste containing the conductive particles 1. The electrode 2 b and the electrode 3 b are electrically connected by the conductive particles 5.
 上記接続構造体としては、具体的には、回路基板上に、半導体チップ、コンデンサチップ、ダイオードチップ等の電子部品チップが搭載されており、かつ回路基板上の電極と電気的に接続されている接続構造体を挙げることができる。回路基板としては、フレキシブルプリント基板等の様々なプリント基板、並びにガラス基板又は金属箔が積層された基板等の様々な回路基板を挙げることができる。 Specifically, as the connection structure, an electronic component chip such as a semiconductor chip, a capacitor chip, or a diode chip is mounted on a circuit board, and is electrically connected to an electrode on the circuit board. Mention may be made of connection structures. Examples of the circuit board include various printed circuit boards such as a flexible printed circuit board, and various circuit boards such as a glass substrate or a substrate on which a metal foil is laminated.
 本発明の接続構造体の製造方法は特に限定されない。接続構造体の製造方法としては、例えば、電子部品又は回路基板等の第1の接続対象部材と、電子部品又は回路基板等の第2の接続対象部材との間に上記異方性導電材料を配置して、積層体を得た後、該積層体を加熱し、加圧する製造方法等が挙げられる。 The manufacturing method of the connection structure of the present invention is not particularly limited. As a manufacturing method of a connection structure, for example, the anisotropic conductive material is provided between a first connection target member such as an electronic component or a circuit board and a second connection target member such as an electronic component or a circuit board. Examples of the production method include arranging and obtaining a laminate, and then heating and pressurizing the laminate.
 以下、本発明について、実施例および比較例を挙げて具体的に説明する。本発明は、以下の実施例のみに限定されない。 Hereinafter, the present invention will be specifically described with reference to examples and comparative examples. The present invention is not limited only to the following examples.
 異方性導電ペーストを得るために、下記の材料を用意した。 In order to obtain an anisotropic conductive paste, the following materials were prepared.
 (1)成分A
 上記成分Aとして、R1、R2、R3、X1及びX2が、下記の表1~15に示す基である各種の化合物を用意した。なお、表1~15では、R1が式(2A)で表される構造を有する場合には、R1欄に「式(2A)」と記載し、更に、式(2A)中のR4及びX3を示した。なお、配合の際に上記成分Aは、上記化合物の単量体と多量体との混合物であった。
(1) Component A
As the component A, various compounds in which R1, R2, R3, X1 and X2 are groups shown in the following Tables 1 to 15 were prepared. In Tables 1 to 15, when R1 has a structure represented by the formula (2A), “Formula (2A)” is described in the R1 column, and R4 and X3 in the formula (2A) are further represented. Indicated. In addition, the said component A was the mixture of the monomer and multimer of the said compound in the case of a mixing | blending.
 (2)エポキシ成分B
 上記エポキシ成分Bとして、R11、R12、R13及びR14が、下記の表1~15に示す基である各種の化合物を用意した。なお、配合の際に上記エポキシ成分Bは、上記化合物の単量体と多量体との混合物であった。
(2) Epoxy component B
As the epoxy component B, various compounds in which R11, R12, R13 and R14 are groups shown in the following Tables 1 to 15 were prepared. In addition, the said epoxy component B was the mixture of the monomer and multimer of the said compound in the case of a mixing | blending.
 (3)エポキシ成分C
 エポキシ樹脂C1:ビスフェノールA型エポキシ樹脂
 エポキシ化合物C2-1:アデカレジンEP-3300S(ADEKA社製)
 エポキシ化合物C2-2:レゾルシノールジグリシジルエーテル
 エポキシ化合物C3-1:トリグリシジルイソシアヌレート(上記式(16A)で表されるエポキシ化合物
 エポキシ化合物C3-2:トリスヒドロキシエチルイソシアヌレートトリグリシジルエーテル(上記式(17A)で表されるエポキシ化合物)
(3) Epoxy component C
Epoxy resin C1: Bisphenol A type epoxy resin Epoxy compound C2-1: Adeka Resin EP-3300S (manufactured by ADEKA)
Epoxy compound C2-2: Resorcinol diglycidyl ether Epoxy compound C3-1: Triglycidyl isocyanurate (epoxy compound represented by the above formula (16A) Epoxy compound C3-2: trishydroxyethyl isocyanurate triglycidyl ether (the above formula ( Epoxy compounds represented by 17A)
 (4)溶剤
 酢酸エチル
(4) Solvent ethyl acetate
 (5)硬化剤
 1,2-ジメチルイミダゾール
 イミダゾール硬化剤(アミンアダクト型硬化剤、味の素ファインテクノ社製「アミキュアPN-23J」)
 アミン硬化剤(エチレンジアミン)
 ポリチオール硬化剤(SC有機化学社製「TMMP:トリメチロールプロパントリス-3-メルカプトプロピオネート」)
 フェノール硬化剤(住友ベークライト社製「スミライト-PR-HF-3」)
 酸無水物(ジャパンエポキシレジン社製「YH-307」)
(5) Curing agent 1,2-dimethylimidazole Imidazole curing agent (amine adduct type curing agent, “Amicure PN-23J” manufactured by Ajinomoto Fine Techno Co., Ltd.)
Amine curing agent (ethylenediamine)
Polythiol curing agent (“TMMP: Trimethylolpropane tris-3-mercaptopropionate” manufactured by SC Organic Chemical Co., Ltd.)
Phenol hardener ("Sumilite-PR-HF-3" manufactured by Sumitomo Bakelite)
Acid anhydride ("YH-307" manufactured by Japan Epoxy Resin)
 (実施例1)
 上記成分Aとして、上記式(1B)で表されるエポキシ化合物を用意した。上記式(1B)で表される化合物は、上記式(1A)におけるR2がメチレン基、R3がメチレン基、X1が酸素原子、X2が酸素原子であり、かつR1が上記式(2A)で表される構造を有し、上記式(2A)におけるR4がメチレン基、X3が酸素原子である化合物である。
Example 1
As the component A, an epoxy compound represented by the above formula (1B) was prepared. In the compound represented by the formula (1B), R2 in the formula (1A) is a methylene group, R3 is a methylene group, X1 is an oxygen atom, X2 is an oxygen atom, and R1 is represented by the formula (2A). In the formula (2A), R4 is a methylene group and X3 is an oxygen atom.
 上記成分Aとして上記式(1B)で表されるエポキシ化合物100重量部及び酢酸エチル20重量部を含有する混合物120重量部と、平均粒子径0.02μmのシリカ粒子7重量部と、硬化剤としてイミダゾール硬化剤(アミンアダクト型硬化剤、味の素ファインテクノ社製「アミキュアPN-23J」)40重量部と、シランカップリング剤として3-グリシドキシプロピルトリエトキシシラン4.5重量部と、平均粒子径3μmの導電性粒子2重量部とを配合し、組成物を得た。なお、用いた上記導電性粒子は、ジビニルベンゼン樹脂粒子の表面にニッケルめっき層が形成されており、かつ該ニッケルめっき層の表面に金めっき層が形成されている金属層を有する導電性粒子である。 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the formula (1B) and 20 parts by weight of ethyl acetate as the component A, 7 parts by weight of silica particles having an average particle diameter of 0.02 μm, and a curing agent 40 parts by weight of an imidazole curing agent (amine adduct type curing agent, “Amure PN-23J” manufactured by Ajinomoto Fine Techno Co.), 4.5 parts by weight of 3-glycidoxypropyltriethoxysilane as a silane coupling agent, and average particles 2 parts by weight of conductive particles having a diameter of 3 μm were blended to obtain a composition. The conductive particles used are conductive particles having a metal layer in which a nickel plating layer is formed on the surface of divinylbenzene resin particles and a gold plating layer is formed on the surface of the nickel plating layer. is there.
 遊星式攪拌機を用いて、2000rpmで得られた組成物を8分間攪拌し、ナイロン製ろ紙(孔径10μm)を用いてろ過し、異方性導電材料として異方性導電ペーストを作製した。 The composition obtained at 2000 rpm was stirred for 8 minutes using a planetary stirrer, and filtered using a nylon filter paper (pore size: 10 μm) to prepare an anisotropic conductive paste as an anisotropic conductive material.
 (実施例2)
 上記式(1B)で表されるエポキシ化合物100重量部及び酢酸エチル20重量部を含有する混合物120重量部にかえて、上記成分Aとして上記式(1B)で表されるエポキシ化合物50重量部と、上記エポキシ成分Bとして上記式(11B)で表されるエポキシ化合物50重量部とを用いたこと以外は実施例1と同様にして、異方性導電ペーストを得た。
(Example 2)
In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 50 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A; An anisotropic conductive paste was obtained in the same manner as in Example 1 except that 50 parts by weight of the epoxy compound represented by the formula (11B) was used as the epoxy component B.
 (実施例3)
 上記式(1B)で表されるエポキシ化合物100重量部及び酢酸エチル20重量部を含有する混合物120重量部にかえて、上記成分Aとして上記式(1B)で表されるエポキシ化合物30重量部と、上記エポキシ成分Bとして上記式(11B)で表されるエポキシ化合物40重量部と、上記エポキシ化合物C2-1としてアデカレジンEP-3300S(ADEKA社製)30重量部とを用いたこと以外は実施例1と同様にして、異方性導電ペーストを得た。
(Example 3)
In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 30 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A; Except for using 40 parts by weight of the epoxy compound represented by the above formula (11B) as the epoxy component B and 30 parts by weight of Adeka Resin EP-3300S (manufactured by ADEKA) as the epoxy compound C2-1. In the same manner as in Example 1, an anisotropic conductive paste was obtained.
 (実施例4)
 上記式(1B)で表されるエポキシ化合物100重量部及び酢酸エチル20重量部を含有する混合物120重量部にかえて、上記成分Aとして上記式(1B)で表されるエポキシ化合物30重量部と、上記エポキシ成分Bとして上記式(11B)で表されるエポキシ化合物40重量部と、上記エポキシ化合物C2-1としてのアデカレジンEP-3300S(ADEKA社製)25重量部と、上記エポキシ化合物C3-1としての上記式(16A)で表されるエポキシ化合物5重量部とを用いたこと以外は実施例1と同様にして、異方性導電ペーストを得た。
Example 4
In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 30 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A; 40 parts by weight of the epoxy compound represented by the formula (11B) as the epoxy component B, 25 parts by weight of Adeka Resin EP-3300S (manufactured by ADEKA) as the epoxy compound C2-1, and the epoxy compound C3-1 An anisotropic conductive paste was obtained in the same manner as in Example 1 except that 5 parts by weight of the epoxy compound represented by the above formula (16A) was used.
 (比較例1)
 上記エポキシ樹脂C1としてビスフェノールA型エポキシ樹脂100重量部と、硬化剤として1,2-ジメチルイミダゾール5重量部とを配合し、遊星式攪拌機を用いて、2000rpmで5分間攪拌し、混合物を得た。
(Comparative Example 1)
100 parts by weight of a bisphenol A type epoxy resin as the epoxy resin C1 and 5 parts by weight of 1,2-dimethylimidazole as a curing agent were blended and stirred for 5 minutes at 2000 rpm using a planetary stirrer to obtain a mixture. .
 得られた混合物に、平均粒子径0.02μmのシリカ粒子7重量部と、平均粒子径3μmの導電性粒子2重量部とを添加し、組成物を得た。なお、用いた上記導電性粒子は、ジビニルベンゼン樹脂粒子の表面にニッケルめっき層が形成されており、かつ該ニッケルめっき層の表面に金めっき層が形成されている金属層を有する導電性粒子である。 To the obtained mixture, 7 parts by weight of silica particles having an average particle size of 0.02 μm and 2 parts by weight of conductive particles having an average particle size of 3 μm were added to obtain a composition. The conductive particles used are conductive particles having a metal layer in which a nickel plating layer is formed on the surface of divinylbenzene resin particles and a gold plating layer is formed on the surface of the nickel plating layer. is there.
 遊星式攪拌機を用いて、2000rpmで得られた硬化性組成物を8分間攪拌し、ナイロン製ろ紙(孔径10μm)でろ過し、異方性導電ペーストを作製した。 Using a planetary stirrer, the curable composition obtained at 2000 rpm was stirred for 8 minutes and filtered through a nylon filter paper (pore diameter 10 μm) to prepare an anisotropic conductive paste.
 (実施例5~84及び比較例2~6)
 配合成分の種類及び配合量(配合単位は重量部)を下記の表2~15に示すように変更したこと以外は実施例1と同様にして、異方性導電ペーストを得た。なお、酢酸エチルが用いられている場合には、上記成分Aの添加の際に、成分Aを溶解させるために酢酸エチルを用いた。
(Examples 5 to 84 and Comparative Examples 2 to 6)
An anisotropic conductive paste was obtained in the same manner as in Example 1 except that the types and amounts of the ingredients were changed as shown in Tables 2 to 15 below. When ethyl acetate was used, ethyl acetate was used to dissolve component A when component A was added.
 (評価)
 縦0.3cm×横1cm×深さ7cmの大きさの直方体状の凹みが形成された金属金型を用意した。得られた異方性導電ペーストを、上記金属金型の凹みに充填した。金属金型の凹みに充填された異方性導電ペーストを、100℃で10分間加熱し、次いで、150℃で30分間加熱し、異方性導電ペーストの硬化物を作製した。
(Evaluation)
A metal mold in which a rectangular parallelepiped recess having a size of 0.3 cm in length, 1 cm in width, and 7 cm in depth was prepared. The obtained anisotropic conductive paste was filled in the recesses of the metal mold. The anisotropic conductive paste filled in the recess of the metal mold was heated at 100 ° C. for 10 minutes and then heated at 150 ° C. for 30 minutes to prepare a cured product of the anisotropic conductive paste.
 熱機械分析装置(ティーエーインスツルメンツ社製、型式「TMA2940」)を用いて、得られた硬化物の線膨張率を測定した。なお、昇温速度5℃/分で210℃まで加熱し、線膨張率を測定した。上記評価において、線膨張率が65ppm/℃以下の異方性導電ペーストを合格とした。 The linear expansion coefficient of the obtained cured product was measured using a thermomechanical analyzer (manufactured by TA Instruments, model “TMA2940”). In addition, it heated to 210 degreeC with the temperature increase rate of 5 degree-C / min, and measured the linear expansion coefficient. In the said evaluation, the anisotropic electrically conductive paste whose coefficient of linear expansion is 65 ppm / degrees C or less was set as the pass.
 また、示差走査熱量計(ティーエーインスツルメンツ社製、型式「DSC2920」)を用いて、昇温速度10℃/分の条件で、実施例及び比較例で得られた異方性導電ペーストのピーク温度と発熱量とを測定した。なお、実施例5~84及び比較例2~6の評価結果を示す表2~15では、ピーク温度が125℃以下の場合を「◎」、ピーク温度が125℃を超え135℃以下の場合を「○」、ピーク温度が135℃を超える場合を「△」として、結果を示した。 Further, using a differential scanning calorimeter (manufactured by TI Instruments, model “DSC2920”), the peak temperature of the anisotropic conductive paste obtained in the examples and comparative examples under the condition of a temperature rising rate of 10 ° C./min. And calorific value were measured. In Tables 2 to 15 showing the evaluation results of Examples 5 to 84 and Comparative Examples 2 to 6, “◎” indicates that the peak temperature is 125 ° C. or lower, and “peak” indicates that the peak temperature is higher than 125 ° C. and lower than 135 ° C. The results are shown as “◯” and “Δ” when the peak temperature exceeds 135 ° C.
 実施例1~4及び比較例1の評価結果を、下記の表1に示す。 The evaluation results of Examples 1 to 4 and Comparative Example 1 are shown in Table 1 below.
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
 実施例1~4の異方性導電ペーストは、比較例1の異方性導電ペーストよりも硬化物の線膨張率が低いため、加熱されても回路基板又は電子部品から剥離しにくいことがわかる。さらに、実施例2~4の異方性導電ペーストでは、実施例1及び比較例1の異方性導電ペーストよりも、ピーク温度が低く、かつ発熱量が高いため、速やかに硬化させることができることがわかる。 It can be seen that the anisotropic conductive pastes of Examples 1 to 4 have a lower coefficient of linear expansion of the cured product than the anisotropic conductive paste of Comparative Example 1, and thus are difficult to peel off from the circuit board or electronic component even when heated. . Furthermore, since the anisotropic conductive pastes of Examples 2 to 4 have lower peak temperatures and higher calorific values than the anisotropic conductive pastes of Example 1 and Comparative Example 1, they can be cured quickly. I understand.
 実施例5~84及び比較例2~6の評価結果を、下記の表2~15に示す。 The evaluation results of Examples 5 to 84 and Comparative Examples 2 to 6 are shown in Tables 2 to 15 below.
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000045
 実施例5~84の異方性導電ペーストは、硬化物の線膨張率が低いため、加熱されても回路基板又は電子部品から剥離しにくいことがわかる。 It can be seen that the anisotropic conductive pastes of Examples 5 to 84 have a low coefficient of linear expansion of the cured product, and thus are difficult to peel off from the circuit board or the electronic component even when heated.

Claims (14)

  1.  エポキシ基及びチイラン基の内の少なくとも一種を有する成分と、硬化剤とを含有し、
     前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分が、下記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物を含む、硬化性組成物。
    Figure JPOXMLDOC01-appb-C000001
     上記式(1)中、R1は水素原子、炭素数1~5のアルキル基又は下記式(2)で表される構造を表し、R2は炭素数1~5のアルキレン基を表し、R3は炭素数1~5のアルキレン基を表し、X1は酸素原子又は硫黄原子を表し、X2は酸素原子又は硫黄原子を表す。
    Figure JPOXMLDOC01-appb-C000002
     上記式(2)中、R4は炭素数1~5のアルキレン基を表し、X3は酸素原子又は硫黄原子を表す。
    Containing a component having at least one of an epoxy group and a thiirane group, and a curing agent;
    The component having at least one of the epoxy group and thiirane group is a monomer of a compound having a structure represented by the following formula (1), a multimer in which at least two of the compounds are bonded, or the monomer A curable composition comprising a mixture of a body and the multimer.
    Figure JPOXMLDOC01-appb-C000001
    In the above formula (1), R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having 1 to 5 carbon atoms, and R3 represents carbon X 1 represents an oxygen atom or a sulfur atom, and X 2 represents an oxygen atom or a sulfur atom.
    Figure JPOXMLDOC01-appb-C000002
    In the above formula (2), R4 represents an alkylene group having 1 to 5 carbon atoms, and X3 represents an oxygen atom or a sulfur atom.
  2.  前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中、前記式(1)で表される構造を有する化合物の単量体、該化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物の含有量が、5~100重量%の範囲内である、請求項1に記載の硬化性組成物。 In 100% by weight of the component having at least one of the epoxy group and thiirane group, a monomer of a compound having a structure represented by the formula (1), a multimer in which at least two of the compounds are bonded, or The curable composition according to claim 1, wherein the content of the mixture of the monomer and the multimer is in the range of 5 to 100% by weight.
  3.  前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分が、下記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物をさらに含む、請求項1に記載の硬化性組成物。
    Figure JPOXMLDOC01-appb-C000003
     上記式(11)中、R11は炭素数1~10のアルキレン基を表し、R12は炭素数1~10のアルキレン基を表し、R13は水素原子、炭素数1~10のアルキル基又は下記式(12)で表される構造を表し、R14は水素原子、炭素数1~10のアルキル基又は下記式(13)で表される構造を表す。
    Figure JPOXMLDOC01-appb-C000004
     上記式(12)中、R15は炭素数1~10のアルキレン基を表す。
    Figure JPOXMLDOC01-appb-C000005
     上記式(13)中、R16は炭素数1~10のアルキレン基を表す。
    The component having at least one of the epoxy group and thiirane group is a monomer of an epoxy compound having a structure represented by the following formula (11), a multimer in which at least two epoxy compounds are bonded, or the The curable composition according to claim 1, further comprising a mixture of a monomer and the multimer.
    Figure JPOXMLDOC01-appb-C000003
    In the above formula (11), R11 represents an alkylene group having 1 to 10 carbon atoms, R12 represents an alkylene group having 1 to 10 carbon atoms, R13 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or the following formula ( 12), R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a structure represented by the following formula (13).
    Figure JPOXMLDOC01-appb-C000004
    In the above formula (12), R15 represents an alkylene group having 1 to 10 carbon atoms.
    Figure JPOXMLDOC01-appb-C000005
    In the above formula (13), R16 represents an alkylene group having 1 to 10 carbon atoms.
  4.  前記式(11)中、R13及びR14が水素原子である、請求項3に記載の硬化性組成物。 The curable composition according to claim 3, wherein R13 and R14 in the formula (11) are hydrogen atoms.
  5.  前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中、前記式(11)で表される構造を有するエポキシ化合物の単量体、該エポキシ化合物が少なくとも2個結合された多量体、又は該単量体と該多量体との混合物の含有量が、1~50重量%の範囲内である、請求項3に記載の硬化性組成物。 A monomer of an epoxy compound having a structure represented by the formula (11) in 100% by weight of a component having at least one of the epoxy group and thiirane group, and a multimer in which at least two of the epoxy compounds are bonded. The curable composition according to claim 3, wherein the content of the monomer and the mixture of the multimer is in the range of 1 to 50% by weight.
  6.  前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分が、窒素原子を含む複素環を有するエポキシ化合物をさらに含む、請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein the component having at least one of the epoxy group and the thiirane group further includes an epoxy compound having a heterocyclic ring containing a nitrogen atom.
  7.  前記窒素原子を含む複素環を有するエポキシ化合物は、下記式(16)で表されるエポキシ化合物、又は下記式(17)で表されるエポキシ化合物である、請求項6に記載の硬化性組成物。
    Figure JPOXMLDOC01-appb-C000006
     上記式(16)中、R21~R23はそれぞれ炭素数1~5のアルキレン基を表し、Zはエポキシ基又はヒドロキシメチル基を表す。
    Figure JPOXMLDOC01-appb-C000007
     上記式(17)中、R24~R26はそれぞれ炭素数1~5のアルキレン基を示し、p、q及びrはそれぞれ1~5の整数を示し、R27~R29はそれぞれ炭素数1~5のアルキレン基を示す。
    The curable composition according to claim 6, wherein the epoxy compound having a heterocyclic ring containing a nitrogen atom is an epoxy compound represented by the following formula (16) or an epoxy compound represented by the following formula (17). .
    Figure JPOXMLDOC01-appb-C000006
    In the above formula (16), R21 to R23 each represents an alkylene group having 1 to 5 carbon atoms, and Z represents an epoxy group or a hydroxymethyl group.
    Figure JPOXMLDOC01-appb-C000007
    In the above formula (17), R24 to R26 each represents an alkylene group having 1 to 5 carbon atoms, p, q and r each represents an integer of 1 to 5, and R27 to R29 each represents an alkylene group having 1 to 5 carbon atoms. Indicates a group.
  8.  前記窒素原子を含む複素環を有するエポキシ化合物は、トリグリシジルイソシアヌレート、又はトリスヒドロキシエチルイソシアヌレートトリグリシジルエーテルである、請求項7に記載の硬化性組成物。 The curable composition according to claim 7, wherein the epoxy compound having a heterocyclic ring containing a nitrogen atom is triglycidyl isocyanurate or trishydroxyethyl isocyanurate triglycidyl ether.
  9.  前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分100重量%中、前記窒素原子を含む複素環を有するエポキシ化合物の含有量が、0.1~10重量%の範囲内である、請求項6に記載の硬化性組成物。 The content of the epoxy compound having a heterocyclic ring containing a nitrogen atom in 100% by weight of the component having at least one of the epoxy group and thiirane group is in the range of 0.1 to 10% by weight. 6. The curable composition according to 6.
  10.  前記エポキシ基及びチイラン基の内の少なくとも一種を有する成分が、芳香族環を有するエポキシ化合物をさらに含む、請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein the component having at least one of the epoxy group and the thiirane group further contains an epoxy compound having an aromatic ring.
  11.  前記芳香族環が、ベンゼン環、ナフタレン環又はアントラセン環である、請求項10に記載の硬化性組成物。 The curable composition according to claim 10, wherein the aromatic ring is a benzene ring, a naphthalene ring or an anthracene ring.
  12.  請求項1に記載の硬化性組成物と、導電性粒子とを含有する異方性導電材料。 An anisotropic conductive material containing the curable composition according to claim 1 and conductive particles.
  13.  第1の電気的接続対象部材と、第2の電気的接続対象部材と、第1,第2の電気的接続対象部材とを電気的に接続している接続部とを備え、
     前記接続部が、請求項12に記載の異方性導電材料により形成されている、接続構造体。
    A first electrical connection target member; a second electrical connection target member; and a connection part that electrically connects the first and second electrical connection target members.
    A connection structure in which the connection portion is formed of the anisotropic conductive material according to claim 12.
  14.  第1の接続対象部材と、第2の接続対象部材と、第1,第2の接続対象部材を接続している接続部とを備え、
     前記接続部が、請求項1に記載の硬化性組成物により形成されている、接続構造体。
    A first connection target member, a second connection target member, and a connection portion connecting the first and second connection target members;
    The connection structure in which the said connection part is formed with the curable composition of Claim 1.
PCT/JP2009/055414 2008-03-21 2009-03-19 Curable composition, anisotropic conductive material and connection structure WO2009116618A1 (en)

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