[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

WO2008018923A3 - Fabrication of isolated nanostructures and/or arrays of nanostructures - Google Patents

Fabrication of isolated nanostructures and/or arrays of nanostructures Download PDF

Info

Publication number
WO2008018923A3
WO2008018923A3 PCT/US2007/007101 US2007007101W WO2008018923A3 WO 2008018923 A3 WO2008018923 A3 WO 2008018923A3 US 2007007101 W US2007007101 W US 2007007101W WO 2008018923 A3 WO2008018923 A3 WO 2008018923A3
Authority
WO
WIPO (PCT)
Prior art keywords
nanostructures
isolated
encapsulating material
deposited material
variety
Prior art date
Application number
PCT/US2007/007101
Other languages
French (fr)
Other versions
WO2008018923A2 (en
Inventor
Qiaobing Xu
Jiming Bao
Federico Capasso
George M Whitesides
Original Assignee
Harvard College
Qiaobing Xu
Jiming Bao
Federico Capasso
George M Whitesides
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harvard College, Qiaobing Xu, Jiming Bao, Federico Capasso, George M Whitesides filed Critical Harvard College
Publication of WO2008018923A2 publication Critical patent/WO2008018923A2/en
Publication of WO2008018923A3 publication Critical patent/WO2008018923A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B08B17/065—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)

Abstract

Methods for fabricating nanostructures and articles associated therewith are described. In some embodiments, an isolated nanostructure (e.g., a metal nanowire) or an array of nanostructures can be fabricated by depositing a material (e.g., a metal) on a surface having a plurality of protrusions or indentations. At least a portion of the deposited material may be embedded in an encapsulating material, and the encapsulating material can be cut, for instance, to form a thin slice that includes the deposited material at least partially embedded therein. In some instances, the slice can be positioned on a surface in a desired arrangement. The encapsulating material can be removed from the surface to form one or more isolated nanostructures of the deposited material. Advantageously, dimensions of the nanostructures can be controlled to, e.g., 15 run, to form nanostructures having a variety of shapes and geometries (e.g., wires, rings, and cylinders). Nanostructures can also be formed in a variety of materials, including metals, ceramics, and polymers. In addition, nanostructures can also be fabricated over large areas (e.g., greater than 1 mm2). In some cases, these nanostructures are positioned in association with other components, e.g., to form a functional component of a device.
PCT/US2007/007101 2006-03-22 2007-03-22 Fabrication of isolated nanostructures and/or arrays of nanostructures WO2008018923A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78467606P 2006-03-22 2006-03-22
US60/784,676 2006-03-22

Publications (2)

Publication Number Publication Date
WO2008018923A2 WO2008018923A2 (en) 2008-02-14
WO2008018923A3 true WO2008018923A3 (en) 2008-07-10

Family

ID=38984555

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/007101 WO2008018923A2 (en) 2006-03-22 2007-03-22 Fabrication of isolated nanostructures and/or arrays of nanostructures

Country Status (1)

Country Link
WO (1) WO2008018923A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009057518A (en) * 2007-09-03 2009-03-19 Institute Of Physical & Chemical Research Anisotropic film and method for producing anisotropic film
EP2144297A1 (en) * 2008-07-07 2010-01-13 Technische Universiteit Delft Solar device and method of generating electric power
KR101378117B1 (en) 2012-06-26 2014-03-26 인텔렉추얼디스커버리 주식회사 Biosensor using nanoring array based on surface enhanced raman scattering method, and producing the same
US20150185156A1 (en) * 2012-07-31 2015-07-02 Northwestern University Dispersible Surface-Enhanced Raman Scattering Nanosheets
JP2015532725A (en) * 2012-08-13 2015-11-12 プレジデント アンド フェローズ オブ ハーバード カレッジ Optical device, optical filter manufacturing method, image forming apparatus, and manufacturing method thereof
US9631291B2 (en) 2013-01-29 2017-04-25 Hewlett-Packard Development Company, L.P. Controlling dimensions of nanowires
CN105555542B (en) * 2013-05-09 2017-06-09 Idit技术集团 For the nano-structure array diffraction optical element for moving and animation shows
CN105555543B (en) 2013-05-10 2017-09-01 纳米技术安全集团 Nano-structure array diffraction optical element for RGB and CMYK colour displays
DE102013017018A1 (en) * 2013-10-14 2015-04-16 Siegert Thinfilm Technology Gmbh Process for producing a structure and in particular a structure produced by this process
US10725373B1 (en) * 2016-10-21 2020-07-28 Iowa State University Research Foundation, Inc. Nano-patterning methods including: (1) patterning of nanophotonic structures at optical fiber tip for refractive index sensing and (2) plasmonic crystal incorporating graphene oxide gas sensor for detection of volatile organic compounds
CN111948267B (en) * 2020-08-20 2023-07-18 哈尔滨工业大学 A method for preparing electrochemical nanodot array electrodes using ultralong nanowires

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003096123A1 (en) * 2002-05-08 2003-11-20 Agency For Science, Technology And Research Reversal imprint technique
WO2004024836A2 (en) * 2002-09-13 2004-03-25 Jds Uniphase Corporation Alignable diffractive pigment flakes

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003096123A1 (en) * 2002-05-08 2003-11-20 Agency For Science, Technology And Research Reversal imprint technique
WO2004024836A2 (en) * 2002-09-13 2004-03-25 Jds Uniphase Corporation Alignable diffractive pigment flakes

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Q. XU, B. D. GATES, G. M. WHITESIDES: "Fabrication of metal structures with nanometer-scale lateral dimensions by sectioning using a microtome", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 126, 1 August 2004 (2004-08-01), pages 1332 - 1333, XP002468450 *
QIAOBING XU ET AL: "Fabrication of high-aspect-ratio metallic nanostructures using nanoskiving", NANO LETTERS AMERICAN CHEM. SOC USA, vol. 6, no. 9, July 2006 (2006-07-01), pages 2163 - 2165, XP002468449, ISSN: 1530-6984 *

Also Published As

Publication number Publication date
WO2008018923A2 (en) 2008-02-14

Similar Documents

Publication Publication Date Title
WO2008018923A3 (en) Fabrication of isolated nanostructures and/or arrays of nanostructures
WO2008082698A3 (en) Medical devices and methods of making the same
EP2110858A3 (en) Visible-range semiconductor nanowire-based photosensor and method for manufacturing the same
WO2006078342A3 (en) High-resolution rapid manufacturing
WO2005014268A3 (en) Article of footwear having an upper with a polymer layer
WO2007003826A3 (en) Method for making nanostructures
WO2010005983A3 (en) Property modulated materials and methods of making the same
TW200513434A (en) MEMS device and method of forming MEMS device
WO2009071674A3 (en) Manufacturing of low-friction elements
EP1925974A3 (en) Fabrication of a wiring pattern and of an active matrix substrate
EP1806782A3 (en) Method for manufacturing semiconductor device
EP1965416A3 (en) Free-Standing III-N layers or devices obtained by selective masking of III-N layers during III-N layer growth
WO2010117830A3 (en) Method for molding tensile strand elements
WO2007134145A3 (en) Lens arrays and methods of making the same
WO2007105001A3 (en) Method of manufacture of particles with controlled dimensions
WO2007136420A3 (en) Apparatus for fabricating large-surface area polycrystalline silicon sheets for solar cell application
WO2008129480A3 (en) An electronic component, and a method of manufacturing an electronic component
WO2006118906A3 (en) Polymeric film exhibiting improved anti-blocking characteristics and process of making
WO2006020718A3 (en) A method of preparing a shaped catalyst, the catalyst, and use of the catalyst
WO2007131743A3 (en) Wear protection device and method for the production thereof
AU2003228572A1 (en) Lapping carrier for use in fabricating sliders
WO2008047083A3 (en) Method of manufacturing a stepped riser, an element for forming into a stepped riser and a stepped riser and a member for changing the mechanical dynamic performance of a stepped riser
EP1928014A3 (en) Charge trap layer for a charge trap semiconductor memory device and method of manufacturing the same
EP1858084A3 (en) Method of manufacturing quantum dots in a semiconductor device
EP3501645A3 (en) A substrate and a method of manufacturing a substrate

Legal Events

Date Code Title Description
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07835712

Country of ref document: EP

Kind code of ref document: A2