WO2008050704A1 - Polyimide film and method for production thereof - Google Patents
Polyimide film and method for production thereof Download PDFInfo
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- WO2008050704A1 WO2008050704A1 PCT/JP2007/070521 JP2007070521W WO2008050704A1 WO 2008050704 A1 WO2008050704 A1 WO 2008050704A1 JP 2007070521 W JP2007070521 W JP 2007070521W WO 2008050704 A1 WO2008050704 A1 WO 2008050704A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/16—Solid spheres
- C08K7/18—Solid spheres inorganic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0263—Details about a collection of particles
- H05K2201/0266—Size distribution
Definitions
- the present invention relates to a polyimide film and a method for producing the same. More specifically, the added inorganic particles are not exposed, and surface protrusions can be generated in a state of being uniformly dispersed in the film, so that the surface state can be well controlled, and the running property, adhesiveness and dimensional stability of the film are improved.
- the present invention relates to a polyimide film that can be applied to an AOI and a manufacturing method thereof.
- Polyimide films are known to have excellent characteristics in heat resistance, cold resistance, chemical resistance, electrical insulation and mechanical strength. Electrical insulation materials for wires, heat insulating materials, flexible printed wiring It is widely used for base films for substrates (FPC), carrier tape films for IC automated tape bonding (TAB), and IC lead frame fixing tapes. Of these, polyimide film and copper foil are usually bonded to each other through various adhesives, especially in applications such as FPC, TAB carrier tape and lead fixing tape.
- inert inorganic compounds for example, orthophosphoric acid of alkaline earth metal, dicalcium phosphate dibasic, calcium pyrophosphate, silica, talc
- a method of adding for example, see Patent Document 1
- a method of performing plasma treatment after forming fine protrusions on the film surface with fine particles for example, see Patent Document 2
- the inorganic particles shown in these figures have a large particle size, they are not suitable for automatic optical inspection systems! / And! //.
- inorganic particles having an average particle diameter of 0.01 to 100 m are held in the polyimide surface layer by embedding a part of each particle! / From the partially exposed inorganic particles
- a method is known in which 1 ⁇ 10 to 5 ⁇ 10 8 pieces / mm 2 are present on the surface layer of the film (for example, see Patent Document 3). This method actively exposes inorganic particles on the surface and reduces the coefficient of friction on the film surface to effectively obtain a slippery effect. As a result, there was a problem in that the surface of the film on the other side of the contact surface was scratched, resulting in poor appearance.
- Patent Document 1 Japanese Patent Laid-Open No. 62-68852
- Patent Document 2 JP 2000-191810 A
- Patent Document 3 Japanese Patent Laid-Open No. 5-25295
- the object of the present invention is excellent in the runnability, adhesiveness and dimensional stability of the film.
- the object is to provide a polyimide film applicable to an optical inspection system (AOI) and a method for manufacturing the polyimide film.
- AOI optical inspection system
- Inorganic particle force A polyimide film is provided which is dispersed in a film at a ratio of 0.;! To 0.9% by weight per film resin weight.
- Ratio power S of each component in the polyimide film 4 Parafue two Renjiamin and 50-90 mole 0/0 10-50 mode Honoré percent Jiamin component, 4 'over-diamino diphenyl ether, acid dianhydride component pyromellitic dianhydride as 50-99 mole 0/0, and 3, 3 ', 4, 4
- the inorganic particles are contained at a ratio of 0.3 to 0.8% by weight per film resin weight;
- the average particle size of the inorganic particles is 0.;!-0.6 m;
- the average particle size of the inorganic particles is 0.3 to 0.5 m
- Protrusions caused by the inorganic particles are present on the film surface, and the number of the protrusions having a height of 2 ⁇ m or more is 5 pieces / 40 cm square or less, and
- the film thickness is 5 to 75 am
- the method for producing the polyimide film of the present invention includes a diamine component comprising paraphenylene diamine and 4,4'-diaminodiphenyl ether, pyromellitic dianhydride, and 3, 3 ', 4,
- the polycarboxylic acid dianhydride component consisting of 4'-biphenyltetracarboxylic dianhydride is reacted in a polar organic solvent to produce polyamic acid, which is imidized. Then, when forming into a film, the particle diameter is within the range of 0 ⁇ 01-1.5 m, the force and the average particle diameter is 0.05-0.7 mm, and the particle diameter is 0.
- a slurry in which inorganic particles having a particle size distribution in which 15-60.111 inorganic particles occupy 80% by volume or more of all particles is dispersed in the same polar organic solvent as the polar organic solvent is produced by polyimide. It is characterized in that the inorganic particles are added to the polyamic acid solution in the process at a ratio of 0.;! To 0.9% by weight per resin weight.
- the added inorganic particles are not exposed, and surface protrusions can be generated in a state of being uniformly dispersed in the film, so that the surface state can be controlled well.
- FPC flexible optical printed circuit boards
- COF chip-on-film
- AOI automatic optical inspection systems
- an aromatic tetracarboxylic dianhydride component and an aromatic diamine component or a chemical substance mainly composed of these components are subjected to addition polymerization in an organic solvent.
- a varnish-like polyamic acid is obtained.
- Paraphenylenediamine and 4,4′-diaminodiphenyl ether are used as aromatic diamine components
- pyromellitic dianhydride and 3 are used as aromatic tetracarboxylic dianhydride components.
- 3 ', 4, 4'-biphenyltetracarboxylic acid dihydrate are used as main components.
- four kinds of essential components are paraphenylenediamine, 4,4'-diaminodiphenyl ether, pyromellitic dianhydride, and 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride. These four types can be obtained by adding only a small amount of other ingredients in addition to these four types.
- Kunar more preferably preferably 50 to 99 mol% instrument 6 0-90 Monore 0/0, more preferably (or 65 85 Monore 0/0. 3, 3 ,, 4, 4, Bifue two Norete us soft power becomes base when dianhydride is too large, since the hard and too small, 1-50 molar percent preferably fixture further preferably 10 to 40 mole 0/0, more preferably 15 to 35 mole 0/0
- a small amount of other diamines may be added in addition to 4,2'-diaminodiphenyl ether.
- a small amount of other acid dianhydride may be added!
- Specific other diamines and dianhydrides include, but are not limited to, force S, including:
- organic solvent used in the present invention for forming a polyamic acid solution examples include sulfoxide solvents such as dimethyl sulfoxide and jetyl sulfoxide, N, N Formamide solvents such as dimethylformamide and N, N jetylformamide, N, N dimethylacetamide, and acetateamide solvents such as N, N jetylacetamide, N-methyl 2-pyrrolidone, N-but-2-pyrrolidone Pyrrolidone solvents such as phenolone, phenol, o-, m-, or p Cresol mononole, xylenol, halogenated phenol, catechol, and other phenolic solvents, or hexamethylphosphoramide, ⁇ petit-mouthed ratatones, etc.
- Protic polar solvents can be mentioned, and these are preferably used alone or as a mixture.
- Aromatic hydrocarbons such as silene and toluene can also be used.
- the polymerization method may be any known method, for example, the following method.
- the aromatic tetracarboxylic acid compound was mixed at a ratio of 95 to 105 mol% with respect to the reaction components for the time required for the reaction. Thereafter, another aromatic diamine compound is added, and then the aromatic tetracarboxylic acid compound is added and polymerized so that the total aromatic diamine component and the total aromatic tetracarboxylic acid component are approximately equal.
- a polyamic acid solution (A) is prepared by reacting one aromatic diamine component and aromatic tetracarboxylic acid in a solvent so that either one becomes excessive, and the other in another solvent.
- the polyamic acid solution (B) is prepared by reacting the aromatic diamine component and the aromatic tetracarboxylic acid in an excess amount. A method in which the polyamic acid solutions (A) and (B) thus obtained are mixed to complete the polymerization. At this time, when adjusting the polyamic acid solution (A), if the aromatic diamine component is excessive, in the polyamic acid solution (B), the aromatic tetracarboxylic acid component is excessive, and in the polyamic acid solution (A), the aromatic tetraamine component is excessive.
- the polyamidic acid solution (B) makes the aromatic diamine component excess, and the polyamic acid solutions (A) and (B) are mixed together with the wholly aromatic diamine component used in these reactions. Adjust so that the aromatic tetracarboxylic acid components are approximately equal.
- the polymerization method is not limited to these, and other known methods may be used.
- the polyamic acid solution thus obtained contains 5 to 40% by weight, preferably 10 to 30% by weight of solid content, and its viscosity is 10 to 2000 Pa ′ as measured by a Brookfield viscometer. s, preferably from 100; lOOOPa 's strength is preferably used for stable liquid delivery.
- the polyamic acid in the organic solvent solution may be partially imidized.
- the inorganic particles added to the resin in order to form protrusions on the film surface of the present invention must be insoluble in all chemical substances that come into contact in the polyimide film manufacturing process.
- Inorganic particles that can be used in the present invention include SiO (silica), TiO 2, CaHPO 2, C 3
- Preferable examples include 2 2 4 a PO. Above all, it was manufactured by the wet grinding method of sol 'gel method
- Silica is preferably used because it is stable and physically stable in the varnish-like polyamic acid solution and does not affect the properties of the polyimide.
- the fine silica powder should be used as a silica slurry uniformly dispersed in a polar solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, dimethylsulfoxide, n-methylpyrrolidone. Therefore, it is preferable because aggregation can be prevented. Since this slurry has a very small particle size, the sedimentation rate is slow and stable. Also, even if it sinks It can be easily redispersed by re-stirring.
- a polar solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, dimethylsulfoxide, n-methylpyrrolidone. Therefore, it is preferable because aggregation can be prevented. Since this slurry has a very small particle size, the sedimentation rate is slow and stable. Also, even if it sinks It can be easily redispersed by re-stirring.
- the inorganic particles added to form protrusions on the surface of the polyimide film have a particle size in the range of 0.01 to 1.5 m and an average particle size of 0.00. 05 ⁇ ⁇ - ⁇ . 7 ⁇ m, more preferably 0.1—0.6 ⁇ m, even more preferably 0.3 to 0.5 m.
- the average particle size is below these ranges, sufficient slipperiness to the film cannot be obtained, and if it exceeds the average particle size, the automatic inspection system will judge the inorganic particles as foreign matter and cause trouble. Therefore, it is not preferable.
- the normal film thickness is 5 Hm to 75 [Im], inorganic particles in this particle diameter range are not exposed on the surface of the polyamide film.
- the addition amount of the inorganic particles is preferably from 0.3 to 0.8% by weight, more preferably from 0.3 to 0.8% by weight per film resin weight. 0.
- the content is 1% by weight or less, the film surface is insufficient in number of protrusions, so that sufficient slipperiness to the film cannot be obtained, the transportability is deteriorated, and the film winding shape when wound on a roll is also deteriorated. Therefore, it is not preferable.
- it is 0.9% by weight or more the slipperiness of the film is improved, but coarse protrusions due to abnormal aggregation of inorganic particles increase, and this is judged as foreign matter by the automatic inspection system as a result. It is not preferable because it causes trouble.
- the particle size distribution of the inorganic particles it is preferable that the particle size distribution is narrow, that is, the proportion of particles of similar size in the total particle is higher. Specifically, the particle size is 0.15 to 0.60. It is preferable that 111 particles occupy 80% by volume or more of all particles. If the proportion of particles below this range and 0.15 m or less increases, the slipperiness of the film decreases, which is not preferable.
- the force S that can remove coarse particles with a 5 m cut filter or 10 m cut filter, and the proportion of particles over 0.60 m increases, Not only is clogging frequently caused and process stability is deteriorated, but also coarse aggregation of particles tends to occur, which is not preferable.
- the number of protrusions having a height of 2 m or more is 5 pieces / 40 cm square or less, more preferably 3 pieces / 40 cm square or less, and even more preferably 1 piece / It is desirable that it is 40 cm square or less. If the amount is larger than this, it is not preferable because the inorganic particles are judged as foreign matter by the automatic inspection system and cause trouble.
- a slurry in which such inorganic particles are dispersed in the same polar solvent as the organic solvent used in the production of the polyimide film is added to the polyamic acid solution in the polyimide production process, and then removed. It is preferable to obtain a polyimide film by cyclization and desolvation. However, after adding the inorganic particle slurry to the organic solvent before polyamic acid polymerization, the polyimide film is subjected to polyamic acid polymerization and decyclization desolvation. It is possible to add the inorganic particle slurry in any step before the decyclization and desolvation, such as obtaining.
- a polyamic acid solution is cast into a film and thermally decyclized and desolvated to obtain a polyimide film, and a cyclization catalyst and dehydration are added to the polyamic acid solution.
- Force that includes a method of obtaining a polyimide film by mixing a chemical agent and chemically decyclizing it, and then heating and desolvating the gel film The latter method Keeping the thermal expansion coefficient of the polyimide film low Is preferable.
- the polyamic acid solution is prepared.
- the polyamic acid solution can contain a cyclization catalyst (imidization catalyst), a dehydrating agent, a gelation retarder, and the like.
- cyclization catalyst used in the present invention include aliphatic tertiary amines such as trimethylamine and triethylenediamine, aromatic tertiary amines such as dimethylaniline, isoquinoline and pyridine.
- aliphatic tertiary amines such as trimethylamine and triethylenediamine
- aromatic tertiary amines such as dimethylaniline
- isoquinoline and pyridine are examples of the cyclization catalyst used in the present invention.
- the powers such as heterocyclic tertiary amines such as / 3-picoline, it is preferable to use at least one amine selected from heterocyclic tertiary amines.
- dehydrating agent used in the present invention include aliphatic carboxylic acid anhydrides such as acetic anhydride, propionic anhydride and butyric anhydride, and aromatic carboxylic acid anhydrides such as benzoic anhydride. Of these, acetic anhydride and / or benzoic anhydride are preferred.
- a method for producing a polyimide film from a polyamic acid solution a polyamic acid solution containing a cyclization catalyst and a dehydrating agent is cast on a support from a die with a slit, and is then formed into a film. The imidization is partially advanced to obtain a gel film having self-supporting property, and then peeled off from the support, heat-dried / imidized, and subjected to heat treatment.
- the polyamic acid solution is formed into a film shape through a slit-shaped base, cast onto a heated support, undergoes a thermal ring-closing reaction on the support, and has a self-supporting gel film. And peeled off from the support.
- the support is a metal rotating drum or an endless belt, and its temperature is controlled by radiant heat from a liquid or gas heat medium and / or an electric heater.
- the gel film is heated to 30 to 200 ° C, preferably 40 to 150 ° C by heat reception from the support and / or heat from a heat source such as hot air or an electric heater, and undergoes a ring-closing reaction.
- the volatile matter such as the liberated organic solvent is dried to become self-supporting and peeled off from the support.
- the gel film peeled from the support is usually stretched in the running direction while regulating the running speed with a rotating roll. Stretching is carried out at a temperature of 140 ° C or lower at a magnification of 1.05 ⁇ ; 1. 9 times, preferably 1.;! ⁇ 1.6 times, more preferably 1.;! ⁇ 1.5 times.
- the gel film stretched in the running direction is introduced into the tenter device, and both ends in the width direction are held by the tenter clip, and stretched in the width method while running with the tenter clip.
- the film dried in the drying zone is heated for 15 seconds to 10 minutes with hot air, an infrared heater or the like.
- heat treatment is performed at a temperature of 250 to 500 for 15 seconds to 20 minutes using hot air and / or an electric heater. It is preferable to adjust the film thickness of the resulting polyimide film to 5 to 75,1 m while adjusting the draw ratio in the running direction and the draw ratio in the width direction. If it is thicker or thinner than this range, the film forming property is remarkably deteriorated, which is not preferable.
- the adhesion evaluation method is based on the method of IPC-FC-241. Bond polyimide film and copper foil with commercially available thermoplastic polyimide adhesive, fix the film on the hard board, and measure. was determined by
- the base film was inspected using SK-75 manufactured by Onorepo Tech.
- the case where foreign matter and fine particles can be distinguished is evaluated as ⁇ A '', while the size of foreign matter and fine particles is similar and the two cannot be distinguished! /,
- the case is evaluated as ⁇ C '', and the middle is ⁇ B '' It was evaluated.
- the number of protrusions with a height of 2 m or more was counted per 40 cm square area of the film.
- For height measurement use a scanning laser microscope “1LM15W” manufactured by Lasertec Co., Ltd., using a Nikon 100x lens (CF Plan ⁇ ⁇ / ⁇ . 95 ⁇ / 0 EPI) in “SURFACE1” mode. This was confirmed by photographing and analyzing the surface.
- TMA-50 manufactured by Shimadzu Corporation was used, and measurement was performed under the conditions of a measurement temperature range: 50 to 200 ° C. and a heating rate: 10 ° C./min.
- the total particle size is 0. Ol rn or more and 1.5 m or less, and particles with an average particle size of 0.3 2 ⁇ 111 and a particle size of 0.15—0.60 m are contained in all particles.
- volume 0/0 of the silica in N, N-dimethyl ⁇ Seto amide slurry, the polyamic acid solution obtained in synthesis example 1 were added the resin weight per 0.3 wt%, sufficiently stirred and dispersed.
- a conversion agent composed of acetic anhydride (molecular weight 102.09) and isoquinoline was mixed and stirred at a ratio of 50% by weight with respect to the polyamic acid solution.
- acetic anhydride and isoquinoline might be 2.0 and 0.4 molar equivalent with respect to the amic acid group of a polyamic acid, respectively.
- the obtained mixture was cast on a 90 ° C stainless steel drum rotated by a T-shaped slit die to obtain a gel film having a self-supporting property of 55% by weight of residual volatile components and a thickness of about 0.05 mm. .
- the gel film is peeled off from the drum, and both ends thereof are gripped, and processed at 200 ° CX for 30 seconds, 350 ° CX for 30 seconds, and 550 ° CX for 30 seconds in a Karo heat furnace to obtain a polyimide film with a thickness of 38 ⁇ m. It was.
- the properties of the obtained polyimide film are shown in Table 1.
- the particle size of all particles is within the range of 0.01 to 1.5 m, and particles with an average particle size of 0.3 to 7 mm and a particle size of 0.15 to 0.60 m are included in all particles.
- volume 0/0 of the silica in N, N-dimethyl ⁇ Seto amide slurry, the polyamic acid solution obtained in synthesis example 1 were added the resin weight per 0.35 wt%, sufficiently stirred and dispersed.
- Acetic anhydride molecule The conversion agent consisting of 102.09
- isoquinoline was mixed and stirred at a ratio of 50% by weight to the polyamic acid solution.
- acetic anhydride and isoquinoline might be 2.0 and 0.4 molar equivalent with respect to the amic acid group of a polyamic acid, respectively.
- the obtained mixture was cast on a 90 ° C stainless steel drum rotated by a T-shaped slit die to obtain a self-supporting gel film having a residual volatile component of 55 wt. 0 / o and a thickness of about 0.05 mm. It was.
- the gel film was peeled off from the drum, and both ends were gripped and treated in a heating furnace at 200 ° CX for 30 seconds, 350 ° CX for 30 seconds, and 550 ° CX for 30 seconds to obtain a polyimide film with a thickness of 25 ⁇ m. .
- the properties of the resulting polyimide film are shown in Table 2.
- the rotation speed of the drum was the same as in Example 8, except that the gel film transport speed (film formation speed) after peeling from the drum was twice as fast as in Example 8 to obtain a 12.5 in thick film.
- the characteristics of the polyimide films obtained in the same manner as in Example 8 were evaluated and are shown in Table 2.
- the rotation speed of the drum is the same as in Example 8, except that the gel film transport speed (film formation speed) after peeling from the drum is 4 times faster than in Example 8 to obtain a film with a thickness of 7.5 ⁇ 111
- the characteristics of the polyimide films obtained in the same manner as in Example 8 were evaluated and are shown in Table 2.
- the rotation speed of the drum is the same as in Example 8, except that the gel film transport speed (film formation speed) after peeling from the drum is half that of Example 8 and a film with a thickness of 50 am is obtained.
- Table 2 shows the characteristics of the polyimide films obtained in the same manner as in Example 8.
- the rotating speed of the drum is the same as in Example 8, except that the gel film transport speed (film forming speed) after peeling from the drum is 1/3 of that in Example 8, and a film with a thickness of 7511 m is obtained.
- Table 2 shows the characteristics of the polyimide films obtained in the same manner as in Example 8. [0073] [Comparative Example 1]
- a 38-m thick polyimide film was obtained in the same manner as in Example 1 except that silica was not added.
- the properties of the obtained polyimide film were evaluated and are shown in Table 3.
- a film with a high coefficient of static friction and poor slip was obtained. Also, the adhesive strength was low.
- the particle size of all particles is 0.1 l rn or more and 4.5 m or less, and particles with an average particle size of 1. ,, ⁇ m and a particle size of 0.15—0.60 m are included in all particles.
- a volume% calcium hydrogen phosphate N, N-dimethylacetamide slurry was added to the polyamic acid solution obtained in Synthesis Example 6 in an amount of 0.2% by weight per resin weight, and the mixture was sufficiently stirred and dispersed.
- an acetic anhydride molecular weight 102.09
- isoquinoline conversion agent were mixed and stirred at a ratio of 50% by weight to the polyamic acid solution.
- Table 3 shows the characteristics of a 38-m thick polyimide film obtained in the same manner as in Comparative Example 2 except that 31.4% by volume of silica was used. A film with a high coefficient of static friction and slightly poor sliding properties was obtained. Also, the dimensional change was significant due to the high linear expansion coefficient.
- Particle size range is 0.01 — 1. ⁇ ⁇ ⁇ average particle size 0.4 ⁇ 111, added amount 0.35 wt%, particle size 0.15-0.
- a polyimide film having a thickness of 38 111 was obtained in the same manner as in Comparative Example 2 except that the polyamic acid solution obtained in Synthesis Example 1 was used.
- the properties of the obtained polyimide film were evaluated and are shown in Table 3. In the AOI inspection, there were many abnormal protrusions that could not distinguish between foreign particles and fine particles.
- a manufactured polyimide film mainly composed of inorganic particles having a particle size in the range of 0.01-1.5 mm and an average particle size of 0.05-0.7 m.
- the polyimide film of the present invention uniformly distributed in the film at a ratio of 0.;! To 0.9% by weight per film resin weight maintains excellent slipperiness, dimensional stability, and adhesiveness.
- applications such as flexible printed circuit boards (FPC) and chip-on-film (COF) that form fine wiring It is suitable for.
- the polyimide film of the present invention can be applied to an academic inspection system (AOI) that has excellent film runnability, adhesiveness, and dimensional stability. It is suitable for applications such as flexible printed wiring boards (FPC) and chip-on-film (COF) that form fine wiring.
- AOI academic inspection system
- FPC flexible printed wiring boards
- COF chip-on-film
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Abstract
A polyimide film produced mainly by the imidization of para-phenylenediamine and 4,4'-diaminodiphenyl ether as diamine components and pyromellitic acid dianhydride and 3,3'-4,4'-biphenyltetracarboxylic acid dianhydride as acid dianhydride components, wherein an inorganic particle having a particle diameter of 0.01 to 1.5 μm, an average particle diameter of 0.05 to 0.7 μm, and such a particle size distribution that inorganic particles having a particle diameter of 0.15 to 0.60 μm account for 80 vol% or more of the total particle volume is dispersed in the film at a ratio of 0.1 to 0.9 wt% relative to the weight of the film resin.
Description
明 細 書 Specification
ポリイミドフィルムおよびその製造方法 Polyimide film and method for producing the same
技術分野 Technical field
[0001] 本発明はポリイミドフィルムおよびその製造方法に関する。さらに詳しくは、添加した 無機粒子が露出せず、フィルム中に均一に分散した状態で表面突起を発生させて 表面状態を良好に制御可能であり、フィルムの走行性、接着性及び寸法安定性が優 動光学検査システム (AOI)に適応可能なポリイミドフィルムおよびその製造方法に関 する。 [0001] The present invention relates to a polyimide film and a method for producing the same. More specifically, the added inorganic particles are not exposed, and surface protrusions can be generated in a state of being uniformly dispersed in the film, so that the surface state can be well controlled, and the running property, adhesiveness and dimensional stability of the film are improved. The present invention relates to a polyimide film that can be applied to an AOI and a manufacturing method thereof.
背景技術 Background art
[0002] ポリイミドフィルムは、耐熱性、耐寒性、耐薬品性、電気絶縁性および機械強度など において優れた特性を有することが知られており、電線の電気絶縁材料、断熱材、フ レキシブルプリント配線基板(FPC)のベースフィルム、 ICのテープオートメイティッド ボンディング (TAB)用のキャリアテープフィルム、および ICのリードフレーム固定用 テープなどに広く利用されている。これらのうち、特に FPC、 TAB用キャリアテープお よびリード固定用テープなどの用途においては、通常、種々の接着剤を介してポリイ ミドフィルムと銅箔とが接着されて用いられてレ、る。 [0002] Polyimide films are known to have excellent characteristics in heat resistance, cold resistance, chemical resistance, electrical insulation and mechanical strength. Electrical insulation materials for wires, heat insulating materials, flexible printed wiring It is widely used for base films for substrates (FPC), carrier tape films for IC automated tape bonding (TAB), and IC lead frame fixing tapes. Of these, polyimide film and copper foil are usually bonded to each other through various adhesives, especially in applications such as FPC, TAB carrier tape and lead fixing tape.
[0003] ポリイミドフィルムがこれらの用途に用いられる際に重要な実用特性は、フィルムの 滑り性(易滑性)である。様々なフィルム加工工程において、フィルム支持体(たとえ ばロール)とフィルムとの易滑性、またフィルム同志の易滑性が確保されることにより、 各工程における操作性、取り扱い性を向上させ、更にはフィルム上にシヮ等の不良 個所の発生が回避できるからである。 [0003] An important practical property when a polyimide film is used in these applications is the slipperiness (slidability) of the film. In various film processing processes, the slidability between the film support (for example, roll) and the film and the slidability between the films are ensured to improve the operability and handling in each process. This is because it is possible to avoid the occurrence of defects such as scratches on the film.
[0004] また一方、ポリイミドフィルムの主用途であるフレキシブルプリント配線板用途にぉレヽ ては、通常、種々の接着剤を介して銅箔と接着されている力 ポリイミドフィルムは、そ の化学構造及び耐薬品(溶剤)安定性により銅箔との接着性が不十分な場合が多い ため、現状ではポリイミドフィルムにアルカリ処理、コロナ処理、プラズマ処理、サンド ブラスト処理などの表面処理を施してから、銅箔と接着されて!/、る。
[0005] また、最近の電子部品のファインピッチ化、特に FPCの検査においては、従来は目 視による線幅、異物などの検査が主流であつたが、自動光学検査システム (AOI)が 導入されるようになってからは、無機粉体を混入する従来処方で製造された耐熱性フ イノレムでは、走行性に関して十分満足したものが得られていたものの、 AOIにおいて は、無機粉体が大き過ぎるために、最近の FPCなどの狭ピッチ化に伴い、無機粒子 が異物と判断されることがあり、これが自動検査システムの大きな障害になっている。 [0004] On the other hand, for flexible printed wiring board applications, which are the main uses of polyimide films, the force polyimide film bonded to copper foil via various adhesives usually has its chemical structure and Due to chemical resistance (solvent) stability, adhesion to the copper foil is often insufficient. Currently, polyimide films are subjected to surface treatment such as alkali treatment, corona treatment, plasma treatment, and sand blast treatment, and then copper Glued with foil! [0005] In addition, in recent finer pitches of electronic components, especially FPC inspections, inspection of line widths and foreign matters has been the mainstream in the past, but an automatic optical inspection system (AOI) was introduced. After that, the heat-resistant finalem manufactured with the conventional formulation mixed with inorganic powder was sufficiently satisfactory in terms of runnability, but the inorganic powder was too large for AOI. For this reason, with the recent narrowing of pitches such as FPC, inorganic particles may be judged as foreign matter, which has become a major obstacle to automatic inspection systems.
[0006] 従来、ポリイミドフィルムの易滑化技術としては、不活性無機化合物(例えばアル力 リ土類金属のオルトリン酸塩、第 2リン酸カルシウム無水物、ピロリン酸カルシウム、シ リカ、タルク)をポリアミック酸に添加する方法 (例えば、特許文献 1参照)、更には微 細粒子によってフィルム表面に微細な突起を形成後、プラズマ処理を施す方法 (例 えば、特許文献 2参照)が知られている。しかし、これらに示される無機粒子は粒子径 が大きレ、ために、自動光学検査システムには適応しな!/、と!/、う問題があった。 [0006] Conventionally, as an easy-sliding technology for polyimide films, inert inorganic compounds (for example, orthophosphoric acid of alkaline earth metal, dicalcium phosphate dibasic, calcium pyrophosphate, silica, talc) are used as polyamic acid. A method of adding (for example, see Patent Document 1), and a method of performing plasma treatment after forming fine protrusions on the film surface with fine particles (for example, see Patent Document 2) are known. However, since the inorganic particles shown in these figures have a large particle size, they are not suitable for automatic optical inspection systems! / And! //.
[0007] また、ポリイミド表層に平均粒子径が 0. 01〜; 100 mである無機質粒子が各粒子 の一部をそれぞれ埋設させて保持されて!/、て、一部露出した前記無機質粒子からな る多数の突起をフィルムの表面層に 1 X 10〜5 X 108個/ mm2存在させる方法(例 えば、特許文献 3参照)が知られている。この方法は、積極的に表面に無機粒子を露 出させ、フィルム表面の摩擦係数を低減させることにより、易滑性効果を効果的に得 ることを特徴としている力 無機質粒子が一部露出しているため、接面する他のフィ ルム表面にすり傷が発生し外観不良をきたすといった問題を抱えていた。 [0007] In addition, inorganic particles having an average particle diameter of 0.01 to 100 m are held in the polyimide surface layer by embedding a part of each particle! / From the partially exposed inorganic particles A method is known in which 1 × 10 to 5 × 10 8 pieces / mm 2 are present on the surface layer of the film (for example, see Patent Document 3). This method actively exposes inorganic particles on the surface and reduces the coefficient of friction on the film surface to effectively obtain a slippery effect. As a result, there was a problem in that the surface of the film on the other side of the contact surface was scratched, resulting in poor appearance.
特許文献 1 :特開昭 62— 68852号公報 Patent Document 1: Japanese Patent Laid-Open No. 62-68852
特許文献 2:特開 2000— 191810号公報 Patent Document 2: JP 2000-191810 A
特許文献 3:特開平 5— 25295号公報 Patent Document 3: Japanese Patent Laid-Open No. 5-25295
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0008] 本発明は、上述した従来技術における問題点の解決を課題として検討した結果達 成されたものである。 [0008] The present invention has been achieved as a result of studying the solution of the problems in the above-described prior art as an object.
[0009] したがって、本発明の目的は、フィルムの走行性、接着性及び寸法安定性が優れ
光学検査システム (AOI)に適応可能なポリイミドフィルムおよびその製造方法を提供 することにある。 [0009] Therefore, the object of the present invention is excellent in the runnability, adhesiveness and dimensional stability of the film. The object is to provide a polyimide film applicable to an optical inspection system (AOI) and a method for manufacturing the polyimide film.
課題を解決するための手段 Means for solving the problem
[0010] 上記の目標を達成するために本発明によれば、ジァミン成分としてパラフエ二レン ジァミン及び 4, 4 'ージアミノジフエニルエーテル、酸二無水物成分としてピロメリット 酸二無水物及び 3, 3 ' , 4, 4 '—ビフエニルテトラカルボン酸二無水物を構成成分と し、主としてイミド化によって製造されるポリイミドフィルムであって、粒子径が 0. 0;!〜 1. 5 mの範囲内にあり、かつ平均粒子径が 0. 05—0. 7 mであり、さらに粒子径 0. 15-0. 60 111の粒子が全粒子中 80体積%以上の割合を占める粒度分布を有 する無機粒子力 フィルム樹脂重量当たり 0.;!〜 0. 9重量%の割合でフィルム中に 分散されていることを特徴とするポリイミドフィルムが提供される。 [0010] In order to achieve the above goal, according to the present invention, paradiamine diamine and 4,4'-diaminodiphenyl ether as diamine components, pyromellitic acid dianhydride and 3,4'-diaminodiphenyl ether as acid dianhydride components, and 3 ', 4, 4'—Biphenyltetracarboxylic dianhydride as a constituent component, a polyimide film produced mainly by imidization, having a particle size of 0.0;! To 1.5 m And an average particle size of 0.05-0.7 m, and particles having a particle size of 0.15-0.60 111 have a particle size distribution occupying 80% by volume or more of all particles. Inorganic particle force A polyimide film is provided which is dispersed in a film at a ratio of 0.;! To 0.9% by weight per film resin weight.
[0011] なお、本発明ポリイミドフィルムにおいては、 [0011] In the polyimide film of the present invention,
前記ポリイミドフィルムにおける各構成成分の割合力 S、ジァミン成分として 10〜50モ ノレ%のパラフエ二レンジァミン及び 50〜90モル0 /0の 4, 4 'ージアミノジフエニルエー テル、酸二無水物成分としてピロメリット酸二無水物 50〜99モル0 /0及び 3, 3 ' , 4, 4Ratio power S of each component in the polyimide film, 4 Parafue two Renjiamin and 50-90 mole 0/0 10-50 mode Honoré percent Jiamin component, 4 'over-diamino diphenyl ether, acid dianhydride component pyromellitic dianhydride as 50-99 mole 0/0, and 3, 3 ', 4, 4
'ービフエニルテトラカルボン酸二無水物 1〜50モル%とからなること、 '-Biphenyltetracarboxylic dianhydride 1-50 mol%,
前記無機粒子がフィルム樹脂重量当たり 0. 3〜0. 8重量%の割合で含まれているこ と、 The inorganic particles are contained at a ratio of 0.3 to 0.8% by weight per film resin weight;
前記無機粒子の平均粒子径が 0.;!〜 0. 6 mであること、 The average particle size of the inorganic particles is 0.;!-0.6 m;
前記無機粒子の平均粒子径が 0. 3〜0. 5 mであること、 The average particle size of the inorganic particles is 0.3 to 0.5 m,
前記無機粒子に起因する突起がフィルム表面に存在し、その突起の高さが 2 μ m以 上のものの数が 5個 /40cm角以下であること、および Protrusions caused by the inorganic particles are present on the film surface, and the number of the protrusions having a height of 2 μm or more is 5 pieces / 40 cm square or less, and
フィルム厚みが 5〜75 a mであること The film thickness is 5 to 75 am
、いずれも好ましい条件として挙げられる。 , Both are mentioned as preferable conditions.
[0012] また、上記本発明のポリイミドフィルムの製造方法は、パラフエ二レンジァミン及び 4 , 4 'ージアミノジフエニルエーテルとからなるジァミン成分と、ピロメリット酸二無水物 及び 3, 3 ' , 4, 4 '—ビフエニルテトラカルボン酸二無水物とからなるテトラカルボン酸 二無水物成分を、極性有機溶媒中で反応させてポリアミド酸を製造し、これをイミド化
した後、フィルムに成形するに際し、粒子径が 0· 01-1. 5 mの範囲内にあり、力、 つ平均粒子径カ 0. 05—0. 7〃mであり、さらに粒子径 0. 15—0. 60〃111の無機粒 子が全粒子中 80体積%以上の割合を占める粒度分布を有する無機粒子を、前記極 性有機溶媒と同じ極性有機溶媒に分散させたスラリーを、ポリイミド製造工程中のポリ アミド酸溶液に、前記無機粒子が樹脂重量当たり 0.;!〜 0. 9重量%の割合となるよう に添加することを特徴とする。 [0012] The method for producing the polyimide film of the present invention includes a diamine component comprising paraphenylene diamine and 4,4'-diaminodiphenyl ether, pyromellitic dianhydride, and 3, 3 ', 4, The polycarboxylic acid dianhydride component consisting of 4'-biphenyltetracarboxylic dianhydride is reacted in a polar organic solvent to produce polyamic acid, which is imidized. Then, when forming into a film, the particle diameter is within the range of 0 · 01-1.5 m, the force and the average particle diameter is 0.05-0.7 mm, and the particle diameter is 0. A slurry in which inorganic particles having a particle size distribution in which 15-60.111 inorganic particles occupy 80% by volume or more of all particles is dispersed in the same polar organic solvent as the polar organic solvent is produced by polyimide. It is characterized in that the inorganic particles are added to the polyamic acid solution in the process at a ratio of 0.;! To 0.9% by weight per resin weight.
発明の効果 The invention's effect
[0013] 本発明によれば、以下に説明するとおり、添加した無機粒子が露出せず、フィルム 中に均一に分散した状態で表面突起を発生させて表面状態を良好に制御可能であ り、フィルムの走行性、接着性及び寸法安定性が優れると共に、フレキシブルプリント 配線基板 (FPC)やチップオンフィルム(COF)の自動光学検査システム (AOI)に適 応可能なポリイミドフィルムを得ることができる。 [0013] According to the present invention, as described below, the added inorganic particles are not exposed, and surface protrusions can be generated in a state of being uniformly dispersed in the film, so that the surface state can be controlled well. In addition to excellent film runnability, adhesion, and dimensional stability, it is possible to obtain a polyimide film that can be applied to flexible optical printed circuit boards (FPC) and chip-on-film (COF) automatic optical inspection systems (AOI).
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0014] 以下、本発明について詳細に説明する。 [0014] Hereinafter, the present invention will be described in detail.
[0015] まず、本発明のポリイミドフィルムを得るに際しての前駆体であるポリアミド酸につい て説明する。 [0015] First, the polyamic acid that is a precursor for obtaining the polyimide film of the present invention will be described.
[0016] 本発明におレ、ては、芳香族テトラカルボン酸二無水物成分と芳香族ジァミン成分ま たは、この両者を主成分とする化学物質を有機溶媒中で付加重合させることによって 、ワニス状ポリアミド酸を得るものであり、芳香族ジァミン成分としてパラフエ二レンジァ ミン及び 4, 4'ージアミノジフエニルエーテルを、芳香族テトラカルボン酸二無水物成 分としてピロメリット酸二無水物及び 3, 3' , 4、 4'ービフエニルテトラカルボン酸二無 水物を、それぞれ主たる構成成分に使用する。すなわち、パラフエ二レンジァミン、 4 、 4'ージアミノジフエニルエーテル、ピロメリット酸二無水物、及び 3, 3' , 4、 4'ービフ ェニルテトラカルボン酸二無水物の 4種類を必須の構成成分とし、これら 4種類のみ、 あるいはこれら 4種類に加えて少量の別成分を加えることにより得られる。好ましくは、 ジァミン成分として 10〜50モル%のパラフエ二レンジァミン及び 50〜90モル%の 4, 4'ージアミノジフエニルエーテルを用い、酸二無水物成分として 50〜99モル0 /0のピ ロメリット酸二無水物及び;!〜 50モル%の 3, 3' , 4、 4'ービフエニルテトラカルボン酸
二無水物を用いて得られる。ノ ラフエ二レンジァミンが多すぎると硬くなり、少なすぎる と柔らかすぎるので、 1〜70モノレ%力 S好ましく、更に好ましくは 5〜60モル0 /0、より好 ましくは 10〜50モル0 /0である。 4, 4 '—ジアミノジフエニルエーテルが多すぎると柔ら 力、くなり、少なすぎると硬くなるので、 20〜99モノレ%力《好ましく、更に好ましくは 40〜 95モノレ%、より好ましくは 50〜90モノレ%である。ピロメリット酸二無水物が多すぎると 硬くなり、少なすぎると柔ら力、くなるので、 50〜99モル%が好ましぐ更に好ましくは 6 0〜90モノレ0 /0、より好ましく (ま 65〜85モノレ0 /0である。 3, 3,, 4、 4,ービフエ二ノレテ卜ラ カルボン酸二無水物が多すぎると柔ら力べなり、少なすぎると硬くなるので、 1〜50モ ル%が好ましぐ更に好ましくは 10〜40モル0 /0、より好ましくは 15〜35モル0 /0である[0016] In the present invention, an aromatic tetracarboxylic dianhydride component and an aromatic diamine component or a chemical substance mainly composed of these components are subjected to addition polymerization in an organic solvent. A varnish-like polyamic acid is obtained. Paraphenylenediamine and 4,4′-diaminodiphenyl ether are used as aromatic diamine components, and pyromellitic dianhydride and 3 are used as aromatic tetracarboxylic dianhydride components. , 3 ', 4, 4'-biphenyltetracarboxylic acid dihydrate are used as main components. That is, four kinds of essential components are paraphenylenediamine, 4,4'-diaminodiphenyl ether, pyromellitic dianhydride, and 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride. These four types can be obtained by adding only a small amount of other ingredients in addition to these four types. Preferably, using 4, 4 'over diamino diphenyl ether 10-50 mole% of Parafue two Renjiamin and 50 to 90 mol% Jiamin component, 50 to 99 mole 0/0 pins Romeritto as an acid dianhydride component Dianhydride and;! ~ 50 mol% 3,3 ', 4,4'-biphenyltetracarboxylic acid Obtained using dianhydride. Roh Rafue two Renjiamin becomes hard and is too large, since too soft too small, 1-70 Monore% strength S Preferably, still more preferably 5 to 60 mol 0/0, the more favorable Mashiku 10-50 mole 0/0 It is. When 4,4'-diaminodiphenyl ether is too much, it becomes soft and soft, and when it is too little, it becomes hard, so 20-99 mono %% << preferably, more preferably 40-95 monole%, more preferably 50-90 Monore%. Becomes hard and pyromellitic dianhydride is too large, too small straw force, so Kunar, more preferably preferably 50 to 99 mol% instrument 6 0-90 Monore 0/0, more preferably (or 65 85 Monore 0/0. 3, 3 ,, 4, 4, Bifue two Norete us soft power becomes base when dianhydride is too large, since the hard and too small, 1-50 molar percent preferably fixture further preferably 10 to 40 mole 0/0, more preferably 15 to 35 mole 0/0
〇 Yes
[0017] 本発明においては、上述の通り、ノ ラフエ二レンジアミンゃ 4, 4 'ージアミノジフエ二 ルエーテル以外に少量の他のジァミンを添加してもよい。また、ピロメリット酸二無水 物や 3, 3 ' , 4、 4 'ービフエニルテトラカルボン酸二無水物以外に少量の他の酸二無 水物を添加してもよ!/、。具体的な他のジァミン及び酸二無水物としては以下のものが 挙げられる力 S、これらに限定されない。 In the present invention, as described above, a small amount of other diamines may be added in addition to 4,2'-diaminodiphenyl ether. In addition to pyromellitic dianhydride and 3, 3 ', 4, 4'-biphenyltetracarboxylic dianhydride, a small amount of other acid dianhydride may be added! Specific other diamines and dianhydrides include, but are not limited to, force S, including:
[0018] ( 1 )酸二無水物 [0018] (1) Acid dianhydride
3, 3' , 4, 4'—ビフエニノレテトラ力ノレボン酸二無水物、 2, 3' , 3, 4'—ビフエニノレテト ラカルボン酸二無水物、 3, 3' , 4, 4' べンゾフエノンテトラカルボン酸二無水物、 2, 3, 6 , 7 ナフタレンジカルボン酸二無水物、 2, 2 ビス(3, 4 ジカルボキシフエ二 ル)エーテル、ピリジン 2, 3, 5, 6 テトラカルボン酸二無水物、 1 , 2, 4, 5 ナフ タレンテトラカルボン酸二無水物、 1 , 4, 5, 8—ナフタレンテトラカルボン酸二無水物 、 1 , 4, 5, 8—デカヒドロナフタレンテトラカルボン酸二無水物、 4, 8—ジメチルー 1 , 2, 5, 6 へキサヒドロナフタレンテトラカルボン酸二無水物、 2, 6 ジクロロー 1 , 4, 5, 8 ナフタレンテトラカルボン酸二無水物、 2, 7 ジクロロー 1 , 4, 5, 8 ナフタレ ンテトラカルボン酸二無水物、 2, 3, 6 , 7 テトラクロロー 1 , 4, 5, 8 ナフタレンテト ラカルボン酸二無水物、 1 , 8 , 9 , 10 フエナントレンテトラカルボン酸二無水物、 2, 2 ビス(2, 3 ジカルボキシフエ二ノレ)プロパン二無水物、 1 , 1 ビス(3, 4 ジカ ノレボキシフエニル)エタンニ無水物、 1 , 1 ビス(2, 3—ジカルボキシフエニル)エタ
ンニ無水物、ビス(2, 3 ジカルボキシフエニル)メタン二無水物、ビス(3, 4 ジカル ボキシフエニル)メタン二無水物、ビス(3, 4—ジカルボキシフエニル)スルホン二無水 物、ベンゼン 1 , 2, 3, 4 テトラカルボン酸二無水物、 3, 4, 3', 4' べンゾフエノ ンテトラカルボン酸二無水物等。 3, 3 ', 4, 4'—Bipheninotetratetranorebonic dianhydride, 2, 3', 3, 4'—Bifeniole tetracarboxylic dianhydride, 3, 3 ', 4, 4' Benzov Enone tetracarboxylic dianhydride, 2, 3, 6, 7 Naphthalene dicarboxylic dianhydride, 2, 2 bis (3,4 dicarboxyphenyl) ether, pyridine 2, 3, 5, 6 tetracarboxylic dianhydride Anhydride, 1, 2, 4, 5 Naphthalenetetracarboxylic dianhydride, 1, 4, 5, 8-Naphthalenetetracarboxylic dianhydride, 1, 4, 5, 8-Decahydronaphthalenetetracarboxylic dianhydride Anhydride, 4,8-dimethyl-1,2,5,6 Hexahydronaphthalenetetracarboxylic dianhydride, 2,6 dichloro-1,4,5,8 Naphthalenetetracarboxylic dianhydride, 2,7 dichloro-1 , 4, 5, 8 Naphthalene tetracarboxylic dianhydride, 2, 3, 6, 7 Tetrachloro-1, 4, 5, 8 Naphthalene tetra Rubonic dianhydride, 1,8,9,10 phenanthrenetetracarboxylic dianhydride, 2,2 bis (2,3 dicarboxyphenenole) propane dianhydride, 1,1 bis (3,4 Dicanoloxyphenyl) ethane anhydride, 1,1 bis (2,3-dicarboxyphenyl) ethane Dianhydride, bis (2,3 dicarboxyphenyl) methane dianhydride, bis (3,4 dicarboxyphenyl) methane dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride, benzene 1 2, 3, 4 Tetracarboxylic dianhydride, 3, 4, 3 ', 4' Benzophenone tetracarboxylic dianhydride.
(2)ジァミン (2) Jimin
3, 4'—ジアミノジフエニルエーテル、 3, 3'—ジアミノジフエニルエーテル、メタフエ 二レンジァミン、 4, 4'ージアミノジフエニルプロパン、 3, 4'—ジアミノジフエニルプロ パン、 3, 3'—ジアミノジフエニルプロパン、 4, 4'ージアミノジフエニルメタン、 3, 4'— ジアミノジフエニルメタン、 3, 3'—ジアミノジフエニルメタン、ベンチジン、 4, 4'ージァ ミノジフエ二ルサルファイド、 3, 4'—ジアミノジフエ二ルサルファイド、 3, 3'—ジァミノ ジフエ二ルサルファイド、 4, 4'ージアミノジフエニルスルホン、 3, 4'—ジアミノジフエ二 ノレスルホン、 3, 3'—ジァミノジフエニルスルホン、 2, 6 ジァミノピリジン、ビス一(4— ァミノフエニル)ジェチルシラン、 3, 3'—ジクロ口ベンチジン、ビス一(4ーァミノフエ二 ル)ェチルホスフイノキサイド、ビス一(4ーァミノフエニル)フエニルホスフイノキサイド、 ビス一(4—ァミノフエニル) N フエニルァミン、ビス一(4—ァミノフエニル) N— メチノレアミン、 1 , 5—ジァミノナフタレン、 3, 3'—ジメチノレー 4, 4'ージアミノビフエ二 ノレ、 3, 4' ジメチルー 3', 4 ジアミノビフエニル 3, 3' ジメトキシベンチジン、 2, 4 —ビス(p— β—ァミノ一 t ブチルフエニル)エーテル、ビス(p— β—ァミノ一 t ブ チルフエ二ノレ)エーテル、 p ビス(2 メチル 4 ァミノペンチノレ)ベンゼン、 p ビ スー(1 , 1 ジメチルー 5—ァミノペンチノレ)ベンゼン、 m キシリレンジァミン、 p キ マンタン、 3, 3'—ジアミノメチノレ 1 , 1'ージァダマンタン、ビス(p アミノシクロへキシ ノレ)メタン、へキサメチレンジァミン、ヘプタメチレンジァミン、オタタメチレンジァミン、 ノナメチレンジァミン、デカメチレンジァミン、 3—メチルヘプタメチレンジァミン、 4, 4' ージメチルヘプタメチレンジァミン、 2, 11—ジアミノドデカン、 1 , 2 ビス(3 ァミノ プロポキシ)ェタン、 2, 2 ジメチルプロピレンジァミン、 3 メトキシへキサエチレンジ ァミン、 2, 5 ジメチルへキサメチレンジァミン、 2, 5 ジメチルヘプタメチレンジアミ ン、 5—メチルノナメチレンジァミン、 1 , 4ージアミノシクロへキサン、 1 , 12—ジァミノ
ォクタデカン、 2, 5 ジァミノ一 1 , 3, 4 ォキサジァゾール、 2, 2 ビス(4 アミノフ ェニノレ)へキサフルォロプロパン、 N— (3—ァミノフエニル)ー4ーァミノべンズアミド、 4 -ァミノフエ二ルー 3 -ァミノべンゾエート等。 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, metaphenydidiamine, 4,4'-diaminodiphenylpropane, 3,4'-diaminodiphenylpropan, 3, 3'- Diaminodiphenylpropane, 4,4'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 3,3'-diaminodiphenylmethane, benzidine, 4,4'-diaminodiphenylsulfide, 3, 4 '—Diaminodiphenylsulfide, 3, 3'-Diaminodiphenylsulfide, 4, 4'-Diaminodiphenylsulfone, 3, 4'-Diaminodiphenylsulfone, 3, 3'-Diaminodiphenylsulfone, 2 , 6 Diaminopyridine, bis (4-aminophenyl) jetylsilane, 3,3'-dichlorobenzidine, bis (4-aminophenol) ethylphosphine oxide Bis-1- (4-aminophenyl) phenylphosphinoxide, Bis-1- (4-aminophenyl) N Phenylamine, Bis-1- (4-aminophenyl) N-Methylenoleamine, 1,5-Diaminonaphthalene, 3,3'-Dimethylolene 4, 4'-diaminobiphenyl, 3, 4 'dimethyl-3', 4 diaminobiphenyl 3, 3 'dimethoxybenzidine, 2, 4-bis (p-β-amino-tert-butylphenyl) ether, bis (p-β-amino) 1 t-butylphenol) ether, p-bis (2-methyl-4-aminopentinole) benzene, p-bis (1,1-dimethyl-5-aminopentinole) benzene, m-xylylenediamine, p-chimantane, 3, 3'-diaminomethinole 1 , 1'-diadamantane, bis (p-aminocyclohexylene) methane, hexamethylenediamine, heptamethylenediamine, ota Methylene diamine, nonamethylene diamine, decamethylene diamine, 3-methylheptamethylene diamine, 4, 4'-dimethylheptamethylene diamine, 2, 11-diaminododecane, 1, 2 bis (3 amino propoxy) ) Ethane, 2,2 dimethylpropylenediamine, 3 methoxyhexaethylenediamine, 2,5 dimethylhexamethylenediamine, 2,5 dimethylheptamethylenediamine, 5-methylnonamethylenediamine, 1, 4-diaminocyclohexane, 1,12-diamino Octadecane, 2, 5 Diamino 1, 3, 4, Oxadiazole, 2, 2 Bis (4-aminophenole) hexafluoropropane, N— (3-Aminophenyl) -4-aminoaminobenzamide, 4-Aminophenol 3- Amino Benzoate etc.
[0020] また、本発明にお!/、て、ポリアミド酸溶液の形成に使用される有機溶媒の具体例と しては、例えば、ジメチルスルホキシド、ジェチルスルホキシドなどのスルホキシド系 溶媒、 N, N ジメチルホルムアミド、 N, N ジェチルホルムアミドなどのホルムアミド 系溶媒、 N, N ジメチルァセトアミド、 N, N ジェチルァセトアミドなどのァセトアミド 系溶媒、 N メチル 2—ピロリドン、 N—ビュル一 2—ピロリドンなどのピロリドン系溶 媒、フエノーノレ、 o— , m— ,または p クレゾ一ノレ、キシレノール、ハロゲン化フエノー ル、カテコールなどのフエノール系溶媒、あるいはへキサメチルホスホルアミド、 γ プチ口ラタトンなどの非プロトン性極性溶媒を挙げることができ、これらを単独又は混 合物として用いるのが望ましいが、さらにはキシレン、トルエンのような芳香族炭化水 素の使用も可能である。 [0020] Further, specific examples of the organic solvent used in the present invention for forming a polyamic acid solution include sulfoxide solvents such as dimethyl sulfoxide and jetyl sulfoxide, N, N Formamide solvents such as dimethylformamide and N, N jetylformamide, N, N dimethylacetamide, and acetateamide solvents such as N, N jetylacetamide, N-methyl 2-pyrrolidone, N-but-2-pyrrolidone Pyrrolidone solvents such as phenolone, phenol, o-, m-, or p Cresol mononole, xylenol, halogenated phenol, catechol, and other phenolic solvents, or hexamethylphosphoramide, γ petit-mouthed ratatones, etc. Protic polar solvents can be mentioned, and these are preferably used alone or as a mixture. Aromatic hydrocarbons such as silene and toluene can also be used.
[0021] 重合方法は公知のいずれの方法で行ってもよぐ例えば次の方法がある。 [0021] The polymerization method may be any known method, for example, the following method.
[0022] (1)先に芳香族ジァミン成分全量を溶媒中に入れ、その後芳香族テトラカルボン酸 類成分を芳香族ジァミン成分全量と当量になるよう加えて重合する方法。 [0022] (1) A method in which the total amount of the aromatic diamine component is first put in a solvent, and then the aromatic tetracarboxylic acid component is added so as to be equivalent to the total amount of the aromatic diamine component.
[0023] (2)先に芳香族テトラカルボン酸類成分全量を溶媒中に入れ、その後芳香族ジアミ ン成分を芳香族テトラカルボン酸類成分と等量になるよう加えて重合する方法。 [0023] (2) A method in which the entire amount of the aromatic tetracarboxylic acid component is first put in a solvent, and then the aromatic diamine component is added in an amount equal to the amount of the aromatic tetracarboxylic acid component for polymerization.
[0024] (3)—方の芳香族ジァミン化合物を溶媒中に入れた後、反応成分に対して芳香族 テトラカルボン酸類化合物が 95〜105モル%となる比率で反応に必要な時間混合し た後、もう一方の芳香族ジァミン化合物を添加し、続いて芳香族テトラカルボン酸類 化合物を全芳香族ジァミン成分と全芳香族テトラカルボン酸類成分とがほぼ等量に なるよう添加して重合する方法。 [0024] (3) After putting the aromatic diamine compound in the solvent, the aromatic tetracarboxylic acid compound was mixed at a ratio of 95 to 105 mol% with respect to the reaction components for the time required for the reaction. Thereafter, another aromatic diamine compound is added, and then the aromatic tetracarboxylic acid compound is added and polymerized so that the total aromatic diamine component and the total aromatic tetracarboxylic acid component are approximately equal.
[0025] (4)芳香族テトラカルボン酸類化合物を溶媒中に入れた後、反応成分に対して一 方の芳香族ジァミン化合物が 95〜105モル%となる比率で反応に必要な時間混合 した後、芳香族テトラカルボン酸類化合物を添加し、続いてもう一方の芳香族ジアミ ン化合物を全芳香族ジァミン成分と全芳香族テトラカルボン酸類成分とがほぼ等量 になるよう添加して重合する方法。
[0026] (5)溶媒中で一方の芳香族ジァミン成分と芳香族テトラカルボン酸類をどちらかが 過剰になるよう反応させてポリアミド酸溶液 (A)を調整し、別の溶媒中でもう一方の芳 香族ジァミン成分と芳香族テトラカルボン酸類をどちらかが過剰になるよう反応させポ リアミド酸溶液 (B)を調整する。こうして得られた各ポリアミド酸溶液 (A)と (B)を混合 し、重合を完結する方法。この時ポリアミド酸溶液 (A)を調整するに際し芳香族ジアミ ン成分が過剰の場合、ポリアミド酸溶液 (B)では芳香族テトラカルボン酸成分を過剰 に、またポリアミド酸溶液 (A)で芳香族テトラカルボン酸成分が過剰の場合、ポリアミ ド酸溶液 (B)では芳香族ジァミン成分を過剰にし、ポリアミド酸溶液 (A)と(B)を混ぜ 合わせこれら反応に使用される全芳香族ジァミン成分と全芳香族テトラカルボン酸類 成分とがほぼ等量になるよう調整する。 [4] (4) After the aromatic tetracarboxylic acid compound is placed in the solvent, the aromatic diamine compound is mixed at a ratio of 95 to 105 mol% with respect to the reaction components for the time required for the reaction. A method in which an aromatic tetracarboxylic acid compound is added, and then the other aromatic diamine compound is added and polymerized so that the total aromatic diamine component and the total aromatic tetracarboxylic acid component are approximately equal. [0026] (5) A polyamic acid solution (A) is prepared by reacting one aromatic diamine component and aromatic tetracarboxylic acid in a solvent so that either one becomes excessive, and the other in another solvent. The polyamic acid solution (B) is prepared by reacting the aromatic diamine component and the aromatic tetracarboxylic acid in an excess amount. A method in which the polyamic acid solutions (A) and (B) thus obtained are mixed to complete the polymerization. At this time, when adjusting the polyamic acid solution (A), if the aromatic diamine component is excessive, in the polyamic acid solution (B), the aromatic tetracarboxylic acid component is excessive, and in the polyamic acid solution (A), the aromatic tetraamine component is excessive. When the carboxylic acid component is in excess, the polyamidic acid solution (B) makes the aromatic diamine component excess, and the polyamic acid solutions (A) and (B) are mixed together with the wholly aromatic diamine component used in these reactions. Adjust so that the aromatic tetracarboxylic acid components are approximately equal.
[0027] なお、重合方法はこれらに限定されることはなぐその他公知の方法を用いてもよい [0027] The polymerization method is not limited to these, and other known methods may be used.
〇 Yes
[0028] こうして得られるポリアミド酸溶液は、固形分を 5〜40重量%、好ましくは 10〜30重 量%を含有しており、またその粘度はブルックフィールド粘度計による測定値で 10〜 2000Pa' s、好ましくは、 100〜; lOOOPa' sのもの力 安定した送液のために好ましく 使用される。また、有機溶媒溶液中のポリアミド酸は部分的にイミド化されていてもよ い。 [0028] The polyamic acid solution thus obtained contains 5 to 40% by weight, preferably 10 to 30% by weight of solid content, and its viscosity is 10 to 2000 Pa ′ as measured by a Brookfield viscometer. s, preferably from 100; lOOOPa 's strength is preferably used for stable liquid delivery. The polyamic acid in the organic solvent solution may be partially imidized.
[0029] 本発明のフィルム表面上に突起を形成させるために樹脂に添加される無機粒子は 、前記のポリイミドフィルム製造工程で接触する全ての化学物質に対して不溶である ことが必要である。 [0029] The inorganic particles added to the resin in order to form protrusions on the film surface of the present invention must be insoluble in all chemical substances that come into contact in the polyimide film manufacturing process.
[0030] 本発明において使用可能な無機粒子としては、 SiO (シリカ)、 TiO 、 CaHPO 、 C [0030] Inorganic particles that can be used in the present invention include SiO (silica), TiO 2, CaHPO 2, C 3
2 2 4 a P O等を好適に挙げることができる。中でもゾル 'ゲル法の湿式粉砕法で製造した Preferable examples include 2 2 4 a PO. Above all, it was manufactured by the wet grinding method of sol 'gel method
2 2 7 2 2 7
シリカが、ワニス状ポリアミド酸溶液中で安定かつ物理的に安定し、ポリイミドの諸物 性に影響を与えないことから好ましく使用される。 Silica is preferably used because it is stable and physically stable in the varnish-like polyamic acid solution and does not affect the properties of the polyimide.
[0031] さらに、微細シリカ粉は、 N, N—ジメチルホルムアミド、 N, N—ジメチルァセトアミド 、ジメチルスルホオキサイド、 n—メチルピロリドン等の極性溶媒に均一に分散させた シリカスラリーとして使用することで、凝集を防止できるため好ましい。このスラリーは、 粒子径が非常に小さいため、沈降速度が遅く安定している。また、たとえ沈降しても
再攪拌する事で容易に再分散可能である。 [0031] Further, the fine silica powder should be used as a silica slurry uniformly dispersed in a polar solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, dimethylsulfoxide, n-methylpyrrolidone. Therefore, it is preferable because aggregation can be prevented. Since this slurry has a very small particle size, the sedimentation rate is slow and stable. Also, even if it sinks It can be easily redispersed by re-stirring.
[0032] 本発明において、ポリイミドフィルムの表面に突起を形成させる為に添加される無機 粒子は、その粒子径が 0. 01 - 1 . 5 mの範囲内にあり、かつ平均粒子径が 0. 05 μ ΐΐΐ-Ο . 7〃 mの範囲、より好ましくは 0. 1—0. 6〃 mの範囲、さらにより好ましくは 0 . 3〜0. 5 mの範囲にある場合に、ポリイミドフィルムを自動光学検査システムへ検 查上での問題を生じることなく適応可能とするばかりか、フィルムの機械物性等の低 下を発生させずに使用可能とする。逆にこれらの範囲より平均粒子径が下回ると、フ イルムへの充分な易滑性が得られず、逆に上回ると、自動検査システムで無機粒子 が異物と判断され障害を来すことになるため好ましくない。また、通常のフィルムの厚 さは 5 H m〜75 [I mであるため、この粒子径範囲での無機粒子がポリアミドフィルム の表面に露出することはない。 In the present invention, the inorganic particles added to form protrusions on the surface of the polyimide film have a particle size in the range of 0.01 to 1.5 m and an average particle size of 0.00. 05 μ ΐΐΐ-Ο. 7 〃 m, more preferably 0.1—0.6 〃 m, even more preferably 0.3 to 0.5 m. Not only can it be applied to optical inspection systems without causing any problems in inspection, but it can also be used without causing any deterioration in the mechanical properties of the film. On the other hand, if the average particle size is below these ranges, sufficient slipperiness to the film cannot be obtained, and if it exceeds the average particle size, the automatic inspection system will judge the inorganic particles as foreign matter and cause trouble. Therefore, it is not preferable. Further, since the normal film thickness is 5 Hm to 75 [Im], inorganic particles in this particle diameter range are not exposed on the surface of the polyamide film.
[0033] 無機粒子の添加量は、フィルム樹脂重量当たり 0. ;!〜 0. 9重量%が好ましぐ 0. 3 〜0. 8重量%の割合で含まれていることがより好ましい。 0. 1重量%以下であるとフ イルム表面の突起数も不足することによってフィルムへの充分な易滑性が得られず、 搬送性が悪化し、ロールに巻いた時のフィルム巻姿も悪化するため好ましくない。ま た、逆に 0. 9重量%以上であると、フィルムの易滑性は良化するものの、無機粒子の 異常凝集による粗大突起が増加し、これが結果的に自動検査システムで異物と判断 され障害を来すことになるため好ましくない。 [0033] The addition amount of the inorganic particles is preferably from 0.3 to 0.8% by weight, more preferably from 0.3 to 0.8% by weight per film resin weight. 0. When the content is 1% by weight or less, the film surface is insufficient in number of protrusions, so that sufficient slipperiness to the film cannot be obtained, the transportability is deteriorated, and the film winding shape when wound on a roll is also deteriorated. Therefore, it is not preferable. On the other hand, if it is 0.9% by weight or more, the slipperiness of the film is improved, but coarse protrusions due to abnormal aggregation of inorganic particles increase, and this is judged as foreign matter by the automatic inspection system as a result. It is not preferable because it causes trouble.
[0034] 無機粒子による表面突起の形成により、フィルム表面積も拡大し、十分に粗面化さ れアンカー効果が見られ接着性を損なうこともなくなるのである。 [0034] By forming surface protrusions with inorganic particles, the surface area of the film is also increased, and the film is sufficiently roughened to exhibit an anchor effect without impairing the adhesiveness.
[0035] 無機粒子の粒度分布については、狭い分布であること、つまり類似の大きさの粒子 が全粒子に占める割合が高い方が良ぐ具体的には粒子径 0. 1 5〜0. 60 111の粒 子が全粒子中 80体積%以上の割合を占めることが好ましい。この範囲を下回り 0. 1 5 m以下の粒子の占める割合が高くなると、フィルムの易滑性が低下するため好ま しくない。また、無機粒子送液の際には 5 mカットフィルターや 10 mカットフィルタ 一により粗粒を除去することが可能である力 S、 0. 60 m以上の粒子の占める割合が 高くなると、フィルターの目詰まりを頻発させてしまい工程安定性を損ねるばかりか、 粒子の粗大凝集が生じやすくなるため好ましくない。
[0036] 無機粒子に起因したフィルム表面突起においては、高さ 2 m以上の突起数が 5個 /40cm角以下であること、より好ましくは 3個 /40cm角以下、さらにより好ましくは 1 個 /40cm角以下であることが望ましい。これよりも多いと自動検査システムで無機粒 子が異物と判断され障害を来すことになるため好ましくない。 [0035] Regarding the particle size distribution of the inorganic particles, it is preferable that the particle size distribution is narrow, that is, the proportion of particles of similar size in the total particle is higher. Specifically, the particle size is 0.15 to 0.60. It is preferable that 111 particles occupy 80% by volume or more of all particles. If the proportion of particles below this range and 0.15 m or less increases, the slipperiness of the film decreases, which is not preferable. In addition, when sending inorganic particles, the force S that can remove coarse particles with a 5 m cut filter or 10 m cut filter, and the proportion of particles over 0.60 m increases, Not only is clogging frequently caused and process stability is deteriorated, but also coarse aggregation of particles tends to occur, which is not preferable. [0036] In the film surface protrusions caused by inorganic particles, the number of protrusions having a height of 2 m or more is 5 pieces / 40 cm square or less, more preferably 3 pieces / 40 cm square or less, and even more preferably 1 piece / It is desirable that it is 40 cm square or less. If the amount is larger than this, it is not preferable because the inorganic particles are judged as foreign matter by the automatic inspection system and cause trouble.
[0037] 本発明においては、このような無機粒子を、ポリイミドフィルムの製造に使用される 有機溶媒と同じ極性溶媒に分散させたスラリーを、ポリイミド製造工程中のポリアミド 酸溶液に添加した後、脱環化脱溶媒させてポリイミドフィルムを得ることが好ましレ、が 、ポリアミド酸重合前の有機溶媒中に無機粒子スラリーを添加した後、ポリアミド酸重 合、脱環化脱溶媒を経てポリイミドフィルムを得ることなど、脱環化脱溶媒前の工程で あればいかなる工程において無機粒子スラリーを添加することが可能である。 In the present invention, a slurry in which such inorganic particles are dispersed in the same polar solvent as the organic solvent used in the production of the polyimide film is added to the polyamic acid solution in the polyimide production process, and then removed. It is preferable to obtain a polyimide film by cyclization and desolvation. However, after adding the inorganic particle slurry to the organic solvent before polyamic acid polymerization, the polyimide film is subjected to polyamic acid polymerization and decyclization desolvation. It is possible to add the inorganic particle slurry in any step before the decyclization and desolvation, such as obtaining.
[0038] 次に、本発明のポリイミドフィルムの製造方法について説明する。 [0038] Next, a method for producing the polyimide film of the present invention will be described.
[0039] ポリイミドフィルムを製膜する方法としては、ポリアミック酸溶液をフィルム状にキャス トし熱的に脱環化脱溶媒させてポリイミドフィルムを得る方法、およびポリアミック酸溶 液に環化触媒及び脱水剤を混合し化学的に脱環化させてゲルフィルムを作成しこれ を加熱脱溶媒することによりポリイミドフィルムを得る方法が挙げられる力 後者の方 が得られるポリイミドフィルムの熱膨張係数を低く抑えることができることから好ましい。 [0039] As a method of forming a polyimide film, a polyamic acid solution is cast into a film and thermally decyclized and desolvated to obtain a polyimide film, and a cyclization catalyst and dehydration are added to the polyamic acid solution. Force that includes a method of obtaining a polyimide film by mixing a chemical agent and chemically decyclizing it, and then heating and desolvating the gel film The latter method Keeping the thermal expansion coefficient of the polyimide film low Is preferable.
[0040] 化学的に脱環化させる方法においては、まず上記ポリアミック酸溶液を調製する。 [0040] In the chemical decyclization method, first, the polyamic acid solution is prepared.
[0041] 上記ポリアミック酸溶液は、環化触媒 (イミド化触媒)、脱水剤およびゲル化遅延剤 などを含有すること力できる。 [0041] The polyamic acid solution can contain a cyclization catalyst (imidization catalyst), a dehydrating agent, a gelation retarder, and the like.
[0042] 本発明で使用される環化触媒の具体例としては、トリメチルァミン、トリエチレンジァ ミンなどの脂肪族第 3級ァミン、ジメチルァニリンなどの芳香族第 3級ァミン、およびィ ソキノリン、ピリジン、 /3—ピコリンなどの複素環第 3級ァミンなどが挙げられる力 なか でも複素環式第 3級ァミンから選ばれる少なくとも一種類のアミンを使用するのが好ま しい。 [0042] Specific examples of the cyclization catalyst used in the present invention include aliphatic tertiary amines such as trimethylamine and triethylenediamine, aromatic tertiary amines such as dimethylaniline, isoquinoline and pyridine. Among the powers such as heterocyclic tertiary amines such as / 3-picoline, it is preferable to use at least one amine selected from heterocyclic tertiary amines.
[0043] 本発明で使用される脱水剤の具体例としては、無水酢酸、無水プロピオン酸、無水 酪酸などの脂肪族カルボン酸無水物、および無水安息香酸などの芳香族カルボン 酸無水物などが挙げられるが、なかでも無水酢酸および/または無水安息香酸が好 ましい。
[0044] ポリアミック酸溶液からポリイミドフィルムを製造する方法としては、環化触媒および 脱水剤を含有せしめたポリアミック酸溶液をスリット付き口金から支持体上に流延して フィルム状に成形し、支持体上でイミド化を一部進行させて自己支持性を有するゲル フィルムとした後、支持体より剥離し、加熱乾燥/イミド化し、熱処理を行う。 [0043] Specific examples of the dehydrating agent used in the present invention include aliphatic carboxylic acid anhydrides such as acetic anhydride, propionic anhydride and butyric anhydride, and aromatic carboxylic acid anhydrides such as benzoic anhydride. Of these, acetic anhydride and / or benzoic anhydride are preferred. [0044] As a method for producing a polyimide film from a polyamic acid solution, a polyamic acid solution containing a cyclization catalyst and a dehydrating agent is cast on a support from a die with a slit, and is then formed into a film. The imidization is partially advanced to obtain a gel film having self-supporting property, and then peeled off from the support, heat-dried / imidized, and subjected to heat treatment.
[0045] 上記ポリアミック酸溶液は、スリット状口金を通ってフィルム状に成型され、加熱され た支持体上に流延され、支持体上で熱閉環反応をし、自己支持性を有するゲルフィ ルムとなって支持体から剥離される。 [0045] The polyamic acid solution is formed into a film shape through a slit-shaped base, cast onto a heated support, undergoes a thermal ring-closing reaction on the support, and has a self-supporting gel film. And peeled off from the support.
[0046] 上記支持体とは、金属製の回転ドラムやエンドレスベルトであり、その温度は液体ま たは気体の熱媒、および/または電気ヒーターなどの輻射熱により制御される。 [0046] The support is a metal rotating drum or an endless belt, and its temperature is controlled by radiant heat from a liquid or gas heat medium and / or an electric heater.
[0047] 上記ゲルフィルムは、支持体からの受熱および/または熱風や電気ヒータなどの熱 源からの受熱により、 30〜200°C、好ましくは 40〜; 150°Cに加熱されて閉環反応し、 遊離した有機溶媒などの揮発分を乾燥させることにより自己支持性を有するようにな り、支持体から剥離される。 [0047] The gel film is heated to 30 to 200 ° C, preferably 40 to 150 ° C by heat reception from the support and / or heat from a heat source such as hot air or an electric heater, and undergoes a ring-closing reaction. The volatile matter such as the liberated organic solvent is dried to become self-supporting and peeled off from the support.
[0048] 上記支持体から剥離されたゲルフィルムは、通常回転ロールにより走行速度を規制 しながら走行方向に延伸される。延伸は、 140°C以下の温度で 1. 05〜; 1. 9倍、好ま しくは 1.;!〜 1. 6倍、さらに好ましくは 1.;!〜 1. 5倍の倍率で実施される。走行方向 に延伸されたゲルフィルムは、テンター装置に導入され、テンタークリップに幅方向両 端部を把持されて、テンタークリップと共に走行しながら、幅方法へ延伸される。 [0048] The gel film peeled from the support is usually stretched in the running direction while regulating the running speed with a rotating roll. Stretching is carried out at a temperature of 140 ° C or lower at a magnification of 1.05 ~; 1. 9 times, preferably 1.;! ~ 1.6 times, more preferably 1.;! ~ 1.5 times The The gel film stretched in the running direction is introduced into the tenter device, and both ends in the width direction are held by the tenter clip, and stretched in the width method while running with the tenter clip.
[0049] 上記の乾燥ゾーンで乾燥したフィルムは、熱風、赤外ヒーターなどで 15秒から 10分 加熱される。次いで、熱風および/または電気ヒーターなどにより、 250〜500の温 度で 15秒から 20分熱処理を行う。走行方向への延伸倍率と幅方向への延伸倍率を 調整しながら、得られるポリイミドフィルムのフィルム厚みを 5〜75 ,1 mに調整するの が好ましい。この範囲より厚くても薄くなつても、製膜性が著しく低下することになるた め好ましくない。 [0049] The film dried in the drying zone is heated for 15 seconds to 10 minutes with hot air, an infrared heater or the like. Next, heat treatment is performed at a temperature of 250 to 500 for 15 seconds to 20 minutes using hot air and / or an electric heater. It is preferable to adjust the film thickness of the resulting polyimide film to 5 to 75,1 m while adjusting the draw ratio in the running direction and the draw ratio in the width direction. If it is thicker or thinner than this range, the film forming property is remarkably deteriorated, which is not preferable.
実施例 Example
[0050] 以下、本発明について実施例を用いて説明する。 [0050] The present invention will be described below with reference to examples.
[0051] 本発明における各種物性の測定方法について以下に説明する。 [0051] Methods for measuring various physical properties in the present invention will be described below.
[0052] [摩擦係数 (静摩擦係数) ]
フィルムの処理面同士を重ね合わせ、 JIS K— 7125 (1999)に基づき測定した。 すなわち、スベリ係数測定装置 Slip Tester (株式会社テクノニーズ製)を使用し、フ イルム処理面同士を重ね合わせて、その上に 200gのおもりを載せ、フィルムの一方 を固定、もう一方を 100mm/分で引っ張り、摩擦係数を測定した。 [0052] [Friction coefficient (Static friction coefficient)] The processed surfaces of the film were overlapped and measured according to JIS K-7125 (1999). That is, using a slip coefficient measuring device Slip Tester (manufactured by Technonez Corporation), the film processing surfaces are overlapped, a 200 g weight is placed on top, one side of the film is fixed, and the other side is fixed at 100 mm / min. And the coefficient of friction was measured.
[0053] [接着力] [0053] [Adhesive strength]
接着性評価方法は、具体的には IPC— FC— 241の方法に基づき、ポリイミドフィル ムと銅箔とを市販の熱可塑性ポリイミド接着剤で接着し、硬板上にフィルムを固定し、 測定することによって求めた。 Specifically, the adhesion evaluation method is based on the method of IPC-FC-241. Bond polyimide film and copper foil with commercially available thermoplastic polyimide adhesive, fix the film on the hard board, and measure. Was determined by
[0054] [自動光学検査 (AOI) ] [0054] [Automatic Optical Inspection (AOI)]
オノレポテック社製の SK— 75を使用してベースフィルムを検査した。異物と微粒子 の区別の付く場合を「A」評価、一方異物と微粒子の大きさが類似していて、両者の 区別が付かな!/、場合を「C」評価とし、その中間を「B」評価とした。 The base film was inspected using SK-75 manufactured by Onorepo Tech. The case where foreign matter and fine particles can be distinguished is evaluated as `` A '', while the size of foreign matter and fine particles is similar and the two cannot be distinguished! /, The case is evaluated as `` C '', and the middle is `` B '' It was evaluated.
[0055] [無機粒子の評価] [0055] [Evaluation of inorganic particles]
堀場製作所のレーザー回祈/散乱式粒度分布測定装置 LA— 910を用い、極性 溶媒に分散させた試料を測定、解析した結果力 粒子径範囲、平均粒子径、粒子径 0. 15-0. 60 mの全粒子中に対する占有率を読み取った。 The result of measurement and analysis of a sample dispersed in a polar solvent using the Horiba laser round / scattering particle size distribution analyzer LA-910. Force Particle size range, average particle size, particle size 0.15-0.60 The occupation ratio of m in all particles was read.
[0056] [異常突起数] [0056] [Number of abnormal protrusions]
フィルム 40cm角面積当たりにおいて、高さ 2 m以上の突起数をカウントした。高 さ測定は、レーザーテック (株)製走査型レーザー顕微鏡「1LM15W」にて、ニコン製 100倍レンズ(CF Plan ΙΟΟ Χ /Ο. 95 ∞/0 EPI)を用いて、「SURFACE1」 モードにてフィルム表面を撮影'解析することにより確認した。 The number of protrusions with a height of 2 m or more was counted per 40 cm square area of the film. For height measurement, use a scanning laser microscope “1LM15W” manufactured by Lasertec Co., Ltd., using a Nikon 100x lens (CF Plan ΙΟΟ Χ / Ο. 95 ∞ / 0 EPI) in “SURFACE1” mode. This was confirmed by photographing and analyzing the surface.
[0057] [フィルム厚み] [0057] [Film thickness]
Mitutoyo製ライトマチック(Series318)を使用して測定した。 Measurement was performed using a Mitutoyo lightmatic (Series 318).
[0058] [線膨張係数] [0058] [Linear expansion coefficient]
島津製作所製 TMA— 50を使用し、測定温度範囲: 50〜200°C、昇温速度: 10°C /minの条件で測定した。 TMA-50 manufactured by Shimadzu Corporation was used, and measurement was performed under the conditions of a measurement temperature range: 50 to 200 ° C. and a heating rate: 10 ° C./min.
[0059] 次に、ポリアミド酸溶液の合成例を説明する。 [0059] Next, a synthesis example of a polyamic acid solution will be described.
[0060] [合成例 1]
ピロメリット酸二無水物(分子量 218. 12) /3, 3' , 4、 4'ービフエニルテトラカルボ ン酸ニ無水物(分子量 294· 22) /4, 4'—ジアミノジフエニルエーテル(分子量 200 . 24) /パラフエ二レンジァミン(分子量 108· 14)を、モノレ比で 65/35/80/20の 割合で用意し、 DMAc (N, N—ジメチルァセトアミド)中 18. 5重量%溶液にして重 合し、 3000poiseのポリアミド酸溶液を得た。 [0060] [Synthesis Example 1] Pyromellitic dianhydride (Molecular weight 218.12) / 3, 3 ', 4, 4'-Biphenyltetracarboxylic dianhydride (Molecular weight 294 · 22) / 4, 4'-Diaminodiphenyl ether (Molecular weight 200.24) / paraphenylene diamine (molecular weight 108 · 14) at a monore ratio of 65/35/80/20, 18.5 wt% solution in DMAc (N, N-dimethylacetamide) Thus, a 3000 poise polyamic acid solution was obtained.
[0061] [合成例 2] [0061] [Synthesis Example 2]
ピロメリット酸二無水物(分子量 218. 12) /3, 3' , 4、 4'ービフエニルテトラカルボ ン酸ニ無水物(分子量 294· 22) /4, 4'—ジアミノジフエニルエーテル(分子量 200 . 24) /パラフエ二レンジァミン(分子量 108· 14)を、モル比で 3/1/3/1の割合 で用意し、 DMAc (N, N—ジメチルァセトアミド)中 18. 5重量%溶液にして重合し、 3000poiseのポリアミド酸溶液を得た。 Pyromellitic dianhydride (Molecular weight 218.12) / 3, 3 ', 4, 4'-Biphenyltetracarboxylic dianhydride (Molecular weight 294 · 22) / 4, 4'-Diaminodiphenyl ether (Molecular weight 200.24) / paraphenylene diamine (molecular weight 108 · 14) prepared in a molar ratio of 3/1/3/1, 18.5 wt% solution in DMAc (N, N-dimethylacetamide) In this way, 3000 poise polyamic acid solution was obtained.
[0062] [合成例 3] [0062] [Synthesis Example 3]
ピロメリット酸二無水物(分子量 218. 12) /3, 3' , 4、 4'ービフエニルテトラカルボ ン酸ニ無水物(分子量 294· 22) /4, 4'—ジアミノジフエニルエーテル(分子量 200 . 24) /パラフエ二レンジァミン(分子量 108· 14)をモル比で 9/1/8/2の割合で 用意し、 DMAc (N, N—ジメチルァセトアミド)中 18· 5重量%溶液にして重合し、 30 OOpoiseのポリアミド酸溶液を得た。 Pyromellitic dianhydride (Molecular weight 218.12) / 3, 3 ', 4, 4'-Biphenyltetracarboxylic dianhydride (Molecular weight 294 · 22) / 4, 4'-Diaminodiphenyl ether (Molecular weight 200.24) / paraphenylene diamine (molecular weight 108 · 14) at a molar ratio of 9/1/8/2 and prepared as a 18.5% by weight solution in DMAc (N, N-dimethylacetamide). Polymerization was performed to obtain a 30 OOpoise polyamic acid solution.
[0063] [合成例 4] [0063] [Synthesis Example 4]
ピロメリット酸二無水物(分子量 218. 12) /3, 3' , 4、 4'ービフエニルテトラカルボ ン酸ニ無水物(分子量 294· 22) /4, 4'—ジアミノジフエニルエーテル(分子量 200 . 24) /パラフエ二レンジァミン(分子量 108· 14)をモル比で 4/1/3/2の割合で 用意し、 DMAc (N, N—ジメチルァセトアミド)中 18· 5重量%溶液にして重合し、 30 OOpoiseのポリアミド酸溶液を得た。 Pyromellitic dianhydride (Molecular weight 218.12) / 3, 3 ', 4, 4'-Biphenyltetracarboxylic dianhydride (Molecular weight 294 · 22) / 4, 4'-Diaminodiphenyl ether (Molecular weight 200.24) / paraphenylene diamine (molecular weight 108 · 14) in a molar ratio of 4/1/3/2 and prepared as a 18.5 wt% solution in DMAc (N, N-dimethylacetamide). Polymerization was performed to obtain a 30 OOpoise polyamic acid solution.
[0064] [合成例 5] [0064] [Synthesis Example 5]
ピロメリット酸二無水物(分子量 218. 12) /3, 3' , 4、 4'ービフエニルテトラカルボ ン酸ニ無水物(分子量 294· 22) /4, 4'—ジアミノジフエニルエーテル(分子量 200 . 24) /パラフエ二レンジァミン(分子量 108· 14)をモル比で 95/5/85/15の割 合で用意し、 DMAc (N, N—ジメチルァセトアミド)中 18. 5重量%溶液にして重合し
、 3000poiseのポリアミド酸溶液を得た。 Pyromellitic dianhydride (Molecular weight 218.12) / 3, 3 ', 4, 4'-Biphenyltetracarboxylic dianhydride (Molecular weight 294 · 22) / 4, 4'-Diaminodiphenyl ether (Molecular weight 200.24) / paraphenylene diamine (molecular weight 108 · 14) prepared at a molar ratio of 95/5/85/15, 18.5 wt% solution in DMAc (N, N-dimethylacetamide) Then polymerize 3000 poise polyamic acid solution was obtained.
[0065] [合成例 6] [0065] [Synthesis Example 6]
ピロメリット酸二無水物(分子量 218. 12) /4, 4'ージアミノジフエニルエーテル(分 子量 200. 24)をモル比で 50/50の割合で混合し、 DMAc (N, N ジメチルァセト アミド) 18· 5重量%溶液にして重合し、 3000poiseのポリアミド酸溶液を得た。 Pyromellitic dianhydride (molecular weight: 218.12) / 4,4'-diaminodiphenyl ether (molecular weight: 200.24) was mixed at a molar ratio of 50/50, and DMAc (N, N dimethylacetamide was added. ) Polymerized to 18.5 wt% solution to obtain 3000poise polyamic acid solution.
[0066] [実施例 1] [0066] [Example 1]
全粒子の粒子径が 0. Ol rn以上 1. 5 m以下に収まっており、平均粒子径 0. 3 2〃 111、粒子径 0. 15—0. 60 mの粒子が全粒子中 87. 5体積0 /0のシリカの N, N ジメチルァセトアミドスラリーを、合成例 1で得たポリアミド酸溶液に樹脂重量当たり 0. 3重量%添加し、十分攪拌、分散させた。このポリアミド酸溶液に無水酢酸 (分子 量 102. 09)とイソキノリンからなる転化剤を、ポリアミド酸溶液に対し 50重量%の割 合で混合、攪拌した。この時、ポリアミド酸のアミド酸基に対し、無水酢酸及びイソキノ リンがそれぞれ 2. 0及び 0. 4モル当量になるように調製した。得られた混合物を、 T 型スリットダイより回転する 90°Cのステンレス製ドラム上にキャストし、残揮発成分が 5 5重量%、厚み約 0. 05mmの自己支持性を有するゲルフィルムを得た。このゲルフ イルムをドラムから引き剥がし、その両端を把持し、カロ熱炉にて 200°C X 30秒、 350 °C X 30秒、 550°C X 30秒処理し、厚さ 38 μ mのポリイミドフィルムを得た。得られた ポリイミドフィルムの特性を表 1に示した。 The total particle size is 0. Ol rn or more and 1.5 m or less, and particles with an average particle size of 0.3 2〃111 and a particle size of 0.15—0.60 m are contained in all particles. volume 0/0 of the silica in N, N-dimethyl § Seto amide slurry, the polyamic acid solution obtained in synthesis example 1 were added the resin weight per 0.3 wt%, sufficiently stirred and dispersed. To this polyamic acid solution, a conversion agent composed of acetic anhydride (molecular weight 102.09) and isoquinoline was mixed and stirred at a ratio of 50% by weight with respect to the polyamic acid solution. At this time, it prepared so that acetic anhydride and isoquinoline might be 2.0 and 0.4 molar equivalent with respect to the amic acid group of a polyamic acid, respectively. The obtained mixture was cast on a 90 ° C stainless steel drum rotated by a T-shaped slit die to obtain a gel film having a self-supporting property of 55% by weight of residual volatile components and a thickness of about 0.05 mm. . The gel film is peeled off from the drum, and both ends thereof are gripped, and processed at 200 ° CX for 30 seconds, 350 ° CX for 30 seconds, and 550 ° CX for 30 seconds in a Karo heat furnace to obtain a polyimide film with a thickness of 38 μm. It was. The properties of the obtained polyimide film are shown in Table 1.
[0067] [実施例 2〜7] [0067] [Examples 2 to 7]
使用したポリアミド酸溶液、シリカの平均粒子径、シリカ添加量、粒子径 0. 15〜0. 60 inの粒子の全粒子中に占める割合を、それぞれ表 1のように設定した以外は、 実施例 1と同様にして得られた 38 m厚みのポリイミドフィルムについて、それぞれ 特性を評価し、表 1に示した。 Except that the ratio of the polyamic acid solution used, the average particle size of silica, the amount of silica added, and the particle size of 0.15 to 0.60 in of all particles was set as shown in Table 1, respectively. The characteristics of the 38 m thick polyimide films obtained in the same manner as in 1 were evaluated and are shown in Table 1.
[0068] [実施例 8] [Example 8]
全粒子の粒子径が 0. 01 111以上1. 5 m以下に収まっており、平均粒子径 0. 3 7〃 m、粒子径 0. 15—0. 60 mの粒子が全粒子中 86. 5体積0 /0のシリカの N, N ジメチルァセトアミドスラリーを、合成例 1で得たポリアミド酸溶液に樹脂重量当たり 0. 35重量%添加し、十分攪拌、分散させた。このポリアミド酸溶液に無水酢酸 (分子
量 102. 09)とイソキノリンからなる転化剤をポリアミド酸溶液に対し 50重量%の割合 で混合、攪拌した。この時、ポリアミド酸のアミド酸基に対し、無水酢酸及びイソキノリ ンがそれぞれ 2. 0及び 0. 4モル当量になるように調製した。得られた混合物を、 T型 スリットダイより回転する 90°Cのステンレス製ドラム上にキャストし、残揮発成分が 55 重量0 /o、厚み約 0. 05mmの自己支持性を有するゲルフィルムを得た。このゲルフィ ルムをドラムから引き剥がし、その両端を把持し、加熱炉にて 200°C X 30秒、 350°C X 30秒、 550°C X 30秒処理し、厚さ 25 μ mのポリイミドフィルムを得た。 得られたポ リイミドフィルムの特性を表 2に示した。 The particle size of all particles is within the range of 0.01 to 1.5 m, and particles with an average particle size of 0.3 to 7 mm and a particle size of 0.15 to 0.60 m are included in all particles. volume 0/0 of the silica in N, N-dimethyl § Seto amide slurry, the polyamic acid solution obtained in synthesis example 1 were added the resin weight per 0.35 wt%, sufficiently stirred and dispersed. Acetic anhydride (molecule The conversion agent consisting of 102.09) and isoquinoline was mixed and stirred at a ratio of 50% by weight to the polyamic acid solution. At this time, it prepared so that acetic anhydride and isoquinoline might be 2.0 and 0.4 molar equivalent with respect to the amic acid group of a polyamic acid, respectively. The obtained mixture was cast on a 90 ° C stainless steel drum rotated by a T-shaped slit die to obtain a self-supporting gel film having a residual volatile component of 55 wt. 0 / o and a thickness of about 0.05 mm. It was. The gel film was peeled off from the drum, and both ends were gripped and treated in a heating furnace at 200 ° CX for 30 seconds, 350 ° CX for 30 seconds, and 550 ° CX for 30 seconds to obtain a polyimide film with a thickness of 25 μm. . The properties of the resulting polyimide film are shown in Table 2.
[0069] [実施例 9] [0069] [Example 9]
ドラムの回転速度は実施例 8と同一で、ドラムから引き剥がし後のゲルフィルム搬送 速度 (製膜速度)を実施例 8よりも 2倍に速め、 12. 5 in厚みのフィルムを得た以外 は、実施例 8と同様にして得たポリイミドフィルムについてそれぞれ特性を評価し、表 2に示した。 The rotation speed of the drum was the same as in Example 8, except that the gel film transport speed (film formation speed) after peeling from the drum was twice as fast as in Example 8 to obtain a 12.5 in thick film. The characteristics of the polyimide films obtained in the same manner as in Example 8 were evaluated and are shown in Table 2.
[0070] [実施例 10] [0070] [Example 10]
ドラムの回転速度は実施例 8と同一で、ドラムから引き剥がし後のゲルフィルム搬送 速度 (製膜速度)を実施例 8よりも 4倍に速め、 7. 5 ^ 111厚みのフィルムを得た以外は 、実施例 8と同様にして得たポリイミドフィルムについてそれぞれ特性を評価し、表 2 に示した。 The rotation speed of the drum is the same as in Example 8, except that the gel film transport speed (film formation speed) after peeling from the drum is 4 times faster than in Example 8 to obtain a film with a thickness of 7.5 ^ 111 The characteristics of the polyimide films obtained in the same manner as in Example 8 were evaluated and are shown in Table 2.
[0071] [実施例 11] [0071] [Example 11]
ドラムの回転速度は実施例 8と同一で、ドラムから引き剥がし後のゲルフィルム搬送 速度 (製膜速度)を実施例 8よりも 2分の 1の速度とし、 50 a m厚みのフィルムを得た 以外は、実施例 8と同様にして得たポリイミドフィルムについてそれぞれ特性を評価し 、表 2に示した。 The rotation speed of the drum is the same as in Example 8, except that the gel film transport speed (film formation speed) after peeling from the drum is half that of Example 8 and a film with a thickness of 50 am is obtained. Table 2 shows the characteristics of the polyimide films obtained in the same manner as in Example 8.
[0072] [実施例 12] [Example 12]
ドラムの回転速度は実施例 8と同一で、ドラムから引き剥がし後のゲルフィルム搬送 速度 (製膜速度)を実施例 8よりも 3分の 1の速度とし、 7511 m厚みのフィルムを得た 以外は、実施例 8と同様にして得たポリイミドフィルムについてそれぞれ特性を評価し 、表 2に示した。
[0073] [比較例 1] The rotating speed of the drum is the same as in Example 8, except that the gel film transport speed (film forming speed) after peeling from the drum is 1/3 of that in Example 8, and a film with a thickness of 7511 m is obtained. Table 2 shows the characteristics of the polyimide films obtained in the same manner as in Example 8. [0073] [Comparative Example 1]
シリカを添加しない以外は、実施例 1と同様にして、 38 m厚みのポリイミドフィルム を得た。得られたポリイミドフィルムについて特性を評価し、表 3に示した。静摩擦係 数が高く滑り性の悪いフィルムが得られた。また接着力も低力 た。 A 38-m thick polyimide film was obtained in the same manner as in Example 1 except that silica was not added. The properties of the obtained polyimide film were evaluated and are shown in Table 3. A film with a high coefficient of static friction and poor slip was obtained. Also, the adhesive strength was low.
[0074] [比較例 2] [0074] [Comparative Example 2]
全粒子の粒子径が 0. l rn以上 4. 5 m以下に収まっており、平均粒子径 1. Ι ,ι m、粒子径 0. 15—0. 60 mの粒子が全粒子中 27. 3体積%のリン酸水素カルシゥ ムの N, N—ジメチルァセトアミドスラリーを、合成例 6で得たポリアミド酸溶液に樹脂 重量当たり 0. 2重量%添加し、十分攪拌、分散させた。このポリアミド酸溶液に無水 酢酸(分子量 102. 09)とイソキノリンからなる転化剤をポリアミド酸溶液に対し 50重 量%の割合で混合、攪拌した。この時、ポリアミド酸のアミド酸基に対し、無水酢酸及 びイソキノリンがそれぞれ 2. 0及び 0. 4モル当量になるように調製した。得られた混 合物を、 T型スリットダイより回転する 90°Cのステンレス製ドラム上にキャストし、残揮 発成分が 55重量%、厚み約 0. 05mmの自己支持性を有するゲルフィルムを得た。 このゲルフィルムをドラムから引き剥がし、その両端を把持し、加熱炉にて 200°C X 3 0秒、 350。C X 30秒、 550。C X 30秒処理し、厚さ 38 μ mのポリイミドフィルムを得た。 得られた特性を表 3に示した。 AOI検査では異物と微粒子の区別が付かなぐ異常 突起も多く発生した。また線膨張係数が高いため寸法変化が大き力、つた。 The particle size of all particles is 0.1 l rn or more and 4.5 m or less, and particles with an average particle size of 1. ,, ι m and a particle size of 0.15—0.60 m are included in all particles. A volume% calcium hydrogen phosphate N, N-dimethylacetamide slurry was added to the polyamic acid solution obtained in Synthesis Example 6 in an amount of 0.2% by weight per resin weight, and the mixture was sufficiently stirred and dispersed. To this polyamic acid solution, an acetic anhydride (molecular weight 102.09) and isoquinoline conversion agent were mixed and stirred at a ratio of 50% by weight to the polyamic acid solution. At this time, it was prepared such that acetic anhydride and isoquinoline were 2.0 and 0.4 molar equivalents relative to the amic acid group of the polyamic acid. The obtained mixture was cast on a 90 ° C stainless steel drum rotated by a T-shaped slit die, and a self-supporting gel film having a residual volatilization component of 55% by weight and a thickness of about 0.05 mm was obtained. Obtained. This gel film is peeled off from the drum, and both ends thereof are gripped and heated in a heating furnace at 200 ° C. for 30 seconds, 350. C X 30 seconds, 550. C X was treated for 30 seconds to obtain a 38 μm-thick polyimide film. The properties obtained are shown in Table 3. In the AOI inspection, there were many abnormal projections that could not distinguish between foreign particles and fine particles. Moreover, since the linear expansion coefficient is high, the dimensional change is large.
[0075] [比較例 3] [0075] [Comparative Example 3]
粒子径範囲が 0. 01—0. 3 ^ 111,平均粒子径 0. 08 μ ΐ ^添加量 0. 35重量%、粒 子径 0. 15-0. 60 inの粒子の全粒子中に占める割合 31. 4体積%のシリカを用 いた以外は、比較例 2と同様にして得られた 38 m厚みのポリイミドフィルムについて 特性を評価し、表 3に示した。静摩擦係数が高ぐ滑り性がやや悪いフィルムが得ら れた。また線膨張係数が高いため寸法変化が大き力 た。 Particle size range of 0.01—0.3 ^ 111, average particle size 0.08 μΐ ^ addition amount 0.35% by weight, particle size 0.15-0. 60 in of all particles Table 3 shows the characteristics of a 38-m thick polyimide film obtained in the same manner as in Comparative Example 2 except that 31.4% by volume of silica was used. A film with a high coefficient of static friction and slightly poor sliding properties was obtained. Also, the dimensional change was significant due to the high linear expansion coefficient.
[0076] [比較例 4] [0076] [Comparative Example 4]
粒子径範囲が 0. 01— 1. δ μ ΐ ^平均粒子径 0. 4 ^ 111,添加量 0. 35重量%、粒 子径 0. 15-0. 60 inの粒子の全粒子中に占める割合 72. 6体積%のシリカを用 いた以外は、比較例 2と同様にして得られた 38 m厚みのポリイミドフィルムについて
特性を評価し、表 3に示した。この例では、 0. 9〜; 1. 3 mの粒子径の占有率が全 体の 22. 3体積%を占めていたため、これが原因で異常突起数が多くなつた。また A OI検査では異物と微粒子の区別が付けづらい結果となった。さらには線膨張係数が 高!/、ため寸法変化が大きかった。 Particle size range is 0.01 — 1. δ μΐ ^ average particle size 0.4 ^ 111, added amount 0.35 wt%, particle size 0.15-0. A 38-m thick polyimide film obtained in the same manner as in Comparative Example 2 except that 72.6% by volume of silica was used. The characteristics were evaluated and are shown in Table 3. In this example, the occupancy ratio of 0.9 to 1.3 m particle size accounted for 22.3% by volume of the whole, and this increased the number of abnormal projections. In addition, A OI inspection showed that it was difficult to distinguish between foreign particles and fine particles. Furthermore, the linear expansion coefficient was high! /, So the dimensional change was large.
[0077] [比較例 5] [0077] [Comparative Example 5]
合成例 1で得たポリアミド酸溶液を用いた以外は、比較例 2と同様にして、 38 111厚 みのポリイミドフィルムを得た。得られたポリイミドフィルムについて特性を評価し、表 3 に示した。 AOI検査では異物と微粒子の区別が付かなぐ異常突起も多く発生した。 A polyimide film having a thickness of 38 111 was obtained in the same manner as in Comparative Example 2 except that the polyamic acid solution obtained in Synthesis Example 1 was used. The properties of the obtained polyimide film were evaluated and are shown in Table 3. In the AOI inspection, there were many abnormal protrusions that could not distinguish between foreign particles and fine particles.
[0078] [表 1]
[0078] [Table 1]
〕【 ] [
表 1〜3の結果から明らかな通り、ジァミン成分としてパラフエ二レンジアミン及ひ4' ' -ジァミノジフヱ二ルェ一テル、酸二無水物成分としてピロメリット酸二無水物及び 3' 4 '—ビフエニルテトラカルボン酸二無水物とから主としてイミド化によって As is apparent from the results in Tables 1 to 3, paradiamine diamine and 4 '' -diaminodiphenyl ether as the diamine component, pyromellitic dianhydride and 3 '4'-biphenyl as the acid dianhydride component Mainly by imidization from tetracarboxylic dianhydride
差替え用鉞 («26)
製造されるポリイミドフィルムであって、粒子径が 0. 01-1. 5〃mの範囲内にあり、 かつ平均粒子径が 0. 05-0. 7 mである無機粒子を主体とする粉体がフィルム樹 脂重量当たり 0. ;!〜 0. 9重量%の割合で、フィルム中に均一に分散された本発明の ポリイミドフィルムは、優れた易滑性、寸法安定性、接着性を保持し、粗大粒子による 突起数も少ないことから AOI検査により該粒子が異物と判断されるような障害もなぐ したがって微細な配線を形成するフレキシブルプリント配線基板(FPC)やチップオン フィルム(COF)などの用途に好適である。 Replacement kite («26) A manufactured polyimide film, mainly composed of inorganic particles having a particle size in the range of 0.01-1.5 mm and an average particle size of 0.05-0.7 m. The polyimide film of the present invention uniformly distributed in the film at a ratio of 0.;! To 0.9% by weight per film resin weight maintains excellent slipperiness, dimensional stability, and adhesiveness. In addition, since the number of protrusions due to coarse particles is small, there is no obstacle that the particles are judged as foreign matter by AOI inspection. Therefore, applications such as flexible printed circuit boards (FPC) and chip-on-film (COF) that form fine wiring It is suitable for.
産業上の利用可能性 Industrial applicability
本発明のポリイミドフィルムは、フィルムの走行性、接着性及び寸法安定性が優れる 学検査システム (AOI)に適応可能であることから、 AOI検査により無機粒子が異物と 判断されるような障害もなぐ微細な配線を形成するフレキシブルプリント配線基板 (F PC)やチップオンフィルム(COF)などの用途に好適である。
The polyimide film of the present invention can be applied to an academic inspection system (AOI) that has excellent film runnability, adhesiveness, and dimensional stability. It is suitable for applications such as flexible printed wiring boards (FPC) and chip-on-film (COF) that form fine wiring.
Claims
[1] ジァミン成分としてパラフエ二レンジァミン及び 4, 4,ージアミノジフエニルエーテル、 酸二無水物成分としてピロメリット酸二無水物及び 3, 3 ' , 4, 4 '—ビフヱニルテトラ力 ルボン酸二無水物を主たる構成成分とし、イミド化によって製造されるポリイミドフィル ムであって、粒子径が 0. 01— 1. 5 mの範囲内にあり、かつ平均粒子径が 0. 05〜 0. 7 mであり、さらに粒子径 0. 15—0. 60 mの粒子が全粒子中 80体積%以上 の割合を占める粒度分布を有する無機粒子力 フィルム樹脂重量当たり 0.;!〜 0. 9 重量%の割合でフィルム中に分散されていることを特徴とするポリイミドフィルム。 [1] Paraphenylenediamine and 4,4, -diaminodiphenyl ether as diamine components, pyromellitic dianhydride and 3, 3 ', 4, 4'-biphenyltetra-force rubonic acid dianhydride as acid dianhydride components Is a polyimide film produced by imidization, having a particle size in the range of 0.01 — 1.5 m and an average particle size of 0.05 to 0.7 m. In addition, an inorganic particle force having a particle size distribution in which particles having a particle size of 0.15 to 0.60 m occupy a ratio of 80% by volume or more of all particles is 0.;! To 0.9% by weight A polyimide film characterized by being dispersed in the film.
[2] 前記ポリイミドフィルムにおける各構成成分の割合力 ジァミン成分として 10〜50モ ノレ%のパラフエ二レンジァミン及び 50〜90モル0 /0の 4, 4 'ージアミノジフエニルエー テル、酸二無水物成分としてピロメリット酸二無水物 50〜99モル0 /0及び 3, 3 ' , 4, 4 ,ービフエニルテトラカルボン酸二無水物 1〜 50モル%とからなることを特徴とする請 求項 1に記載のポリイミドフィルム。 [2] 4, 4 'over-diamino diphenyl ether, acid dianhydride of the Parafue two Renjiamin and 50-90 mole 0/0 10-50 mode Norre% as a percentage force Jiamin component of each component in the polyimide film pyromellitic dianhydride as component 50-99 mole 0/0, and 3, 3 ', 4, 4, characterized in that it consists an over Biff enyl dianhydride 1-50 mol%請Motomeko 1. The polyimide film according to 1.
[3] 前記無機粒子がフィルム樹脂重量当たり 0. 3〜0. 8重量%の割合で含まれているこ とを特徴とする請求項 1または 2に記載のポリイミドフィルム。 [3] The polyimide film according to [1] or [2], wherein the inorganic particles are contained at a ratio of 0.3 to 0.8% by weight per film resin weight.
[4] 前記無機粒子の平均粒子径が 0. ;!〜 0. 6 mであることを特徴とする請求項 1〜3 のいずれ力、 1項に記載のポリイミドフィルム。 [4] The polyimide film as set forth in any one of [1] to [3], wherein the inorganic particles have an average particle size of 0 .;! To 0.6 m.
[5] 前記無機粒子の平均粒子径が 0. 3〜0. 5 mであることを特徴とする請求項 1〜4 のいずれ力、 1項に記載のポリイミドフィルム。 [5] The polyimide film according to any one of [1] to [4], wherein an average particle diameter of the inorganic particles is 0.3 to 0.5 m.
[6] 前記無機粒子に起因する突起がフィルム表面に存在し、その突起の高さが 2 μ m以 上のものの数が 5個 /40cm角以下であることを特徴とする請求項 1〜5のいずれ力、 1 項に記載のポリイミドフィルム。 [6] The protrusions attributed to the inorganic particles are present on the film surface, and the number of protrusions having a height of 2 μm or more is 5 pieces / 40 cm square or less. The polyimide film as described in 1 above.
[7] フィルム厚みが 5〜75 mであることを特徴とする請求項 1〜6のいずれ力、 1項に記 載のポリイミド、フィルム。 [7] The polyimide or film according to any one of [1] to [6], wherein the film thickness is 5 to 75 m.
[8] パラフエ二レンジァミン及び 4, 4 'ージアミノジフエニルエーテルとからなるジァミン成 分と、ピロメリット酸二無水物及び 3, 3 ' , 4, 4 '—ビフヱニルテトラカルボン酸二無水 物とからなるテトラカルボン酸二無水物成分を、極性有機溶媒中で反応させてポリア ミド酸を製造し、これをイミド化した後、フィルムに成形するに際し、粒子径が 0· 0;!〜
[8] Diamine component consisting of parafenylenylenediamine and 4,4'-diaminodiphenyl ether, pyromellitic dianhydride and 3, 3 ', 4, 4'-biphenyltetracarboxylic dianhydride A tetracarboxylic dianhydride component consisting of the following is reacted in a polar organic solvent to produce a polyamic acid, which is imidized and then molded into a film with a particle size of 0 · 0;!
1. 5 mの範囲内にあり、かつ平均粒子径が 0· 05—0. 7 mであり、さらに粒子径 0. 15-0. 60 111の粒子が全粒子中 80体積%以上の割合を占める粒度分布を有 する無機粒子を、前記極性有機溶媒と同じ極性有機溶媒に分散させたスラリーを、 ポリイミド製造工程中のポリアミド酸溶液に、前記無機粒子が樹脂重量当たり 0. ;!〜 0 . 9重量%の割合となるように添加することを特徴とする請求項 1〜7のいずれ力、 1項 に記載のポリイミドフィルムの製造方法。
1. Within the range of 5 m, the average particle size is 0 · 05—0.7 m, and particles with a particle size of 0.15-0.60 111 account for 80% by volume or more of all particles. A slurry in which inorganic particles having an occupied particle size distribution are dispersed in the same polar organic solvent as the polar organic solvent is added to the polyamic acid solution in the polyimide production process, and the inorganic particles are added to the resin weight by weight of 0.00; It adds so that it may become a ratio of 9 weight%, The manufacturing method of the polyimide film of any one of Claims 1-7 characterized by the above-mentioned.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2006-290150 | 2006-10-25 | ||
JP2006290150A JP2008106139A (en) | 2006-10-25 | 2006-10-25 | Polyimide film and method for producing the same |
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WO2008050704A1 true WO2008050704A1 (en) | 2008-05-02 |
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Family Applications (1)
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PCT/JP2007/070521 WO2008050704A1 (en) | 2006-10-25 | 2007-10-22 | Polyimide film and method for production thereof |
Country Status (4)
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JP (1) | JP2008106139A (en) |
KR (1) | KR20090073135A (en) |
TW (1) | TW200833785A (en) |
WO (1) | WO2008050704A1 (en) |
Families Citing this family (5)
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JP4947297B2 (en) * | 2007-05-23 | 2012-06-06 | 東レ・デュポン株式会社 | Copper plate |
JP5524475B2 (en) * | 2008-11-28 | 2014-06-18 | 株式会社有沢製作所 | Two-layer double-sided flexible metal laminate and its manufacturing method |
KR101404093B1 (en) * | 2009-01-13 | 2014-06-09 | 에스케이씨코오롱피아이 주식회사 | Polyimide film |
JP5458384B2 (en) * | 2010-02-18 | 2014-04-02 | 東レ・デュポン株式会社 | Polyimide sheet |
KR102093696B1 (en) * | 2016-03-31 | 2020-03-26 | 코오롱인더스트리 주식회사 | Polyimide resin composition having improved frictional property and Film thereof |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6395264A (en) * | 1986-10-09 | 1988-04-26 | Ube Ind Ltd | Aromatic polyamic acid solution composition and production thereof |
JPH03170548A (en) * | 1989-11-30 | 1991-07-24 | Mitsui Toatsu Chem Inc | Polyimide film and its production |
JPH09291158A (en) * | 1996-02-27 | 1997-11-11 | Toray Ind Inc | Aromatic polyamide film and/or aromatic polyimide film and magnetic recording medium using the same |
JP2001031866A (en) * | 1999-07-21 | 2001-02-06 | Mitsubishi Chemicals Corp | Polyimide composition and substrate for solar cell produced by using the composition |
JP2004217907A (en) * | 2002-12-25 | 2004-08-05 | Du Pont Toray Co Ltd | Polyimide film and method for producing the same |
JP2005314669A (en) * | 2004-03-30 | 2005-11-10 | Du Pont Toray Co Ltd | Polyimide film and copper-clad laminate using the same as substrate |
JP2006124685A (en) * | 2004-09-29 | 2006-05-18 | Ube Ind Ltd | Polyimide film for cof (chip-on-film), and laminate |
-
2006
- 2006-10-25 JP JP2006290150A patent/JP2008106139A/en active Pending
-
2007
- 2007-10-22 WO PCT/JP2007/070521 patent/WO2008050704A1/en active Application Filing
- 2007-10-22 KR KR1020097007055A patent/KR20090073135A/en not_active Application Discontinuation
- 2007-10-23 TW TW096139586A patent/TW200833785A/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6395264A (en) * | 1986-10-09 | 1988-04-26 | Ube Ind Ltd | Aromatic polyamic acid solution composition and production thereof |
JPH03170548A (en) * | 1989-11-30 | 1991-07-24 | Mitsui Toatsu Chem Inc | Polyimide film and its production |
JPH09291158A (en) * | 1996-02-27 | 1997-11-11 | Toray Ind Inc | Aromatic polyamide film and/or aromatic polyimide film and magnetic recording medium using the same |
JP2001031866A (en) * | 1999-07-21 | 2001-02-06 | Mitsubishi Chemicals Corp | Polyimide composition and substrate for solar cell produced by using the composition |
JP2004217907A (en) * | 2002-12-25 | 2004-08-05 | Du Pont Toray Co Ltd | Polyimide film and method for producing the same |
JP2005314669A (en) * | 2004-03-30 | 2005-11-10 | Du Pont Toray Co Ltd | Polyimide film and copper-clad laminate using the same as substrate |
JP2006124685A (en) * | 2004-09-29 | 2006-05-18 | Ube Ind Ltd | Polyimide film for cof (chip-on-film), and laminate |
Also Published As
Publication number | Publication date |
---|---|
TW200833785A (en) | 2008-08-16 |
KR20090073135A (en) | 2009-07-02 |
JP2008106139A (en) | 2008-05-08 |
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