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WO2007141185A3 - Homogenizer with reduced interference - Google Patents

Homogenizer with reduced interference Download PDF

Info

Publication number
WO2007141185A3
WO2007141185A3 PCT/EP2007/055323 EP2007055323W WO2007141185A3 WO 2007141185 A3 WO2007141185 A3 WO 2007141185A3 EP 2007055323 W EP2007055323 W EP 2007055323W WO 2007141185 A3 WO2007141185 A3 WO 2007141185A3
Authority
WO
WIPO (PCT)
Prior art keywords
light beam
input light
propagation direction
input
directing
Prior art date
Application number
PCT/EP2007/055323
Other languages
French (fr)
Other versions
WO2007141185A2 (en
Inventor
Rafael Egger
Holger Muenz
Original Assignee
Zeiss Carl Laser Optics Gmbh
Rafael Egger
Holger Muenz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Laser Optics Gmbh, Rafael Egger, Holger Muenz filed Critical Zeiss Carl Laser Optics Gmbh
Priority to KR1020117007447A priority Critical patent/KR101227803B1/en
Publication of WO2007141185A2 publication Critical patent/WO2007141185A2/en
Publication of WO2007141185A3 publication Critical patent/WO2007141185A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0613—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Mechanical Engineering (AREA)
  • Recrystallisation Techniques (AREA)
  • Lasers (AREA)

Abstract

The invention relates to a method for creating a target intensity distribution (20) in a target field (3) from a first input light beam (4) propagating in a first propagation direction and a second input light beam (5), whereby said first input light beam (4) and said second input light beam (5) entering a light entrance surface (6a, 6b) of a cylindrical lens array (1a) of a homogenizer. According to the invention said second input light beam (5) propagates in a second propagation direction differing from said first propagation direction. The invention further relates to an optical system for creating a target intensity distribution (20) in a target field (3) comprising: a first light source for generating a first input light beam (4) and a second light source for generating a second input light beam (5), or a single light source for generating a light beam and a beam splitter for splitting said light beam into said first input light beam and said second input light beam, a first directing device for directing said first input light beam (4) to propagate in a first propagation direction and a ho mogenizer having a cylindrical lens array (1a) with a light entrance surface (6a, 6b) for being entered by said first input light beam (4) and said second input light beam (5). According to the invention there exists a second directing device for directing said second input light beam (5) propagating in a second propagation direction differing from said first propagation direction when entering said light entrance surface (6a, 6b).
PCT/EP2007/055323 2006-06-09 2007-05-31 Homogenizer with reduced interference WO2007141185A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020117007447A KR101227803B1 (en) 2006-06-09 2007-05-31 Homogenizer with reduced interference

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81222006P 2006-06-09 2006-06-09
US60/812,220 2006-06-09

Publications (2)

Publication Number Publication Date
WO2007141185A2 WO2007141185A2 (en) 2007-12-13
WO2007141185A3 true WO2007141185A3 (en) 2008-02-28

Family

ID=38442049

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/055323 WO2007141185A2 (en) 2006-06-09 2007-05-31 Homogenizer with reduced interference

Country Status (2)

Country Link
KR (2) KR101227803B1 (en)
WO (1) WO2007141185A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2237079B1 (en) * 2009-04-03 2013-05-29 Innovavent GmbH Device for homogenising coherent radiation
DE102009037141B4 (en) 2009-07-31 2013-01-03 Carl Zeiss Laser Optics Gmbh Optical system for generating a light beam for treating a substrate
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9525265B2 (en) 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
US9907636B2 (en) 2015-07-01 2018-03-06 3M Innovative Properties Company Curing lights with homogenous light patch
KR101913654B1 (en) * 2017-05-30 2018-12-28 학교법인 한동대학교 Laser Beam Homogenizer having Zooming Apparatus
CN114072977A (en) 2019-08-07 2022-02-18 极光先进雷射株式会社 Optical pulse stretcher, laser device, and method for manufacturing electronic device
KR20230024468A (en) * 2021-08-11 2023-02-21 삼성전자주식회사 Apparatus for laser annealing and operating method thereof
KR20230064979A (en) 2021-11-04 2023-05-11 한국전기연구원 Composite lighting system for improving visibility

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001035451A1 (en) * 1999-11-09 2001-05-17 Nikon Corporation Illuminator, aligner, and method for fabricating device
US20030202251A1 (en) * 1996-02-06 2003-10-30 Shunpei Yamazaki Apparatus and method for laser radiation
US6693930B1 (en) * 2000-12-12 2004-02-17 Kla-Tencor Technologies Corporation Peak power and speckle contrast reduction for a single laser pulse

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030202251A1 (en) * 1996-02-06 2003-10-30 Shunpei Yamazaki Apparatus and method for laser radiation
WO2001035451A1 (en) * 1999-11-09 2001-05-17 Nikon Corporation Illuminator, aligner, and method for fabricating device
US6693930B1 (en) * 2000-12-12 2004-02-17 Kla-Tencor Technologies Corporation Peak power and speckle contrast reduction for a single laser pulse

Also Published As

Publication number Publication date
KR20110042132A (en) 2011-04-22
KR101227803B1 (en) 2013-01-29
KR20090028625A (en) 2009-03-18
WO2007141185A2 (en) 2007-12-13

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