WO2006018973A1 - オキシムエステル化合物及び該化合物を含有する光重合開始剤 - Google Patents
オキシムエステル化合物及び該化合物を含有する光重合開始剤 Download PDFInfo
- Publication number
- WO2006018973A1 WO2006018973A1 PCT/JP2005/014190 JP2005014190W WO2006018973A1 WO 2006018973 A1 WO2006018973 A1 WO 2006018973A1 JP 2005014190 W JP2005014190 W JP 2005014190W WO 2006018973 A1 WO2006018973 A1 WO 2006018973A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alkyl group
- group
- compound
- photosensitive composition
- oxime ester
- Prior art date
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- -1 Oxime ester compound Chemical class 0.000 title claims abstract description 116
- 239000003999 initiator Substances 0.000 title claims abstract description 35
- 150000001875 compounds Chemical class 0.000 title claims description 76
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 48
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 36
- 125000005843 halogen group Chemical group 0.000 claims abstract description 24
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 17
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 13
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 8
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 7
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 7
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 100
- 239000000126 substance Substances 0.000 claims description 35
- 238000004040 coloring Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 239000004480 active ingredient Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 238000006116 polymerization reaction Methods 0.000 abstract 2
- 239000000470 constituent Substances 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 48
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 43
- 238000004519 manufacturing process Methods 0.000 description 31
- 239000004593 Epoxy Substances 0.000 description 23
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 229920006243 acrylic copolymer Polymers 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 18
- 229920001577 copolymer Polymers 0.000 description 18
- 239000003921 oil Substances 0.000 description 16
- 235000019198 oils Nutrition 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 13
- 239000000049 pigment Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 11
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 10
- 150000003855 acyl compounds Chemical class 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 238000000354 decomposition reaction Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 8
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 8
- 230000035945 sensitivity Effects 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 7
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 238000009529 body temperature measurement Methods 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- 125000006091 1,3-dioxolane group Chemical group 0.000 description 4
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 4
- GGBJHURWWWLEQH-UHFFFAOYSA-N butylcyclohexane Chemical compound CCCCC1CCCCC1 GGBJHURWWWLEQH-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 229940125904 compound 1 Drugs 0.000 description 4
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 238000004128 high performance liquid chromatography Methods 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- KZUXJRQQHJREGH-UHFFFAOYSA-N 4-fluoro-2-methylbenzoyl chloride Chemical compound CC1=CC(F)=CC=C1C(Cl)=O KZUXJRQQHJREGH-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229920000620 organic polymer Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 3
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 3
- 238000002211 ultraviolet spectrum Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- XMGQYMWWDOXHJM-JTQLQIEISA-N (+)-α-limonene Chemical compound CC(=C)[C@@H]1CCC(C)=CC1 XMGQYMWWDOXHJM-JTQLQIEISA-N 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- GRFNBEZIAWKNCO-UHFFFAOYSA-N 3-pyridinol Chemical compound OC1=CC=CN=C1 GRFNBEZIAWKNCO-UHFFFAOYSA-N 0.000 description 2
- 125000003341 7 membered heterocyclic group Chemical group 0.000 description 2
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 239000004386 Erythritol Substances 0.000 description 2
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
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- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 244000309464 bull Species 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229940125898 compound 5 Drugs 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
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- RTOLVRQCDHIQQA-UHFFFAOYSA-N hexane;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCC RTOLVRQCDHIQQA-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002469 indenes Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- PIJPYDMVFNTHIP-UHFFFAOYSA-L lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229960003151 mercaptamine Drugs 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 1
- HTEAGOMAXMOFFS-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C HTEAGOMAXMOFFS-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical class NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- YLNSNVGRSIOCEU-UHFFFAOYSA-N oxiran-2-ylmethyl butanoate Chemical compound CCCC(=O)OCC1CO1 YLNSNVGRSIOCEU-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- XCRBXWCUXJNEFX-UHFFFAOYSA-N peroxybenzoic acid Chemical compound OOC(=O)C1=CC=CC=C1 XCRBXWCUXJNEFX-UHFFFAOYSA-N 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 239000012453 solvate Substances 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- PBPCCBLJHAAYFD-UHFFFAOYSA-N tetraphen-1-ol Chemical compound C1=CC=CC2=CC3=C4C(O)=CC=CC4=CC=C3C=C21 PBPCCBLJHAAYFD-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BZVJOYBTLHNRDW-UHFFFAOYSA-N triphenylmethanamine Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(N)C1=CC=CC=C1 BZVJOYBTLHNRDW-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229940075420 xanthine Drugs 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
- XKMZOFXGLBYJLS-UHFFFAOYSA-L zinc;prop-2-enoate Chemical compound [Zn+2].[O-]C(=O)C=C.[O-]C(=O)C=C XKMZOFXGLBYJLS-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D421/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms
- C07D421/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms containing two hetero rings
- C07D421/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
Definitions
- the present invention relates to a novel oxime ester compound useful as a photopolymerization initiator for use in a photosensitive composition, a photopolymerization initiator containing the compound as an active ingredient, and a polymerizable compound having an ethylenically unsaturated bond
- the present invention relates to a photosensitive composition comprising the above photopolymerization initiator.
- a photosensitive composition is a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator, and is polymerized by irradiating the photosensitive composition with light of 405 nm or 365 nm. Because it can be cured, it can be used for photocurable inks, photosensitive printing plates, and various photoregisters. Since a photosensitive composition sensitive to a short wavelength light source can be finely printed, a photopolymerization initiator having excellent sensitivity particularly to a 365 nm light source is desired.
- Patent Document 1 As a photopolymerization initiator used in the photosensitive composition, Patent Document 1 below proposes to use an oxime ester derivative. Patent Documents 2 to 4 listed below also describe oxime ester compounds. However, when these known oxime ester compounds are used as a photopolymerization initiator, decomposition products generated by light during exposure adhere to the mask, resulting in poor pattern shape during printing. Resulting in a decrease in yield. In addition, since these oxime ester compounds have a decomposition temperature of 240 ° C or lower, the photopolymerization initiator is decomposed in the thermosetting step usually performed at 130 to 240 ° C after the development processing.
- Patent Document 7 listed below describes an O-acyloxime compound having a carbazolyl structure, which was not satisfactory in terms of sensitivity, resolution, and alkali resistance.
- Patent Document 1 US Patent No. 3558309
- Patent Document 2 U.S. Pat.
- Patent Document 3 US Patent No. 4590145 Specification
- Patent Document 4 US Patent No. 4202697
- Patent Document 5 Japanese Unexamined Patent Publication No. 2000-80068
- Patent Document 6 Japanese Patent Application Laid-Open No. 2001-233842
- Patent Document 7 International Publication No. 02Z100903 Pamphlet
- Patent Document 8 International Publication No. 2004Z050653 Pamphlet
- the problem to be solved is that, as described above, a photopolymerization initiator that does not color the obtained polymer or contaminate the polymer or an apparatus and has excellent sensitivity has been hitherto. That is.
- an object of the present invention is to provide a photopolymerization initiator that has high sensitivity and does not cause the possibility of coloring the polymer or contaminating the polymer and equipment.
- the present invention achieves the above object by providing an oxime ester compound represented by the following general formula (I) and a photopolymerization initiator containing the compound as an active ingredient.
- X represents a halogen atom or an alkyl group
- RR 2 and R 3 each independently represent RORCOR, SRCONRR 'or CN
- R and R' represent an alkyl group, an aryl group, an aralkyl group or Represents a heterocyclic group, which may be substituted with a halogen atom and / or a heterocyclic group, and among these, the alkylene part of the alkyl group and the aralkyl group is an unsaturated bond, an ether bond, a thioether bond, or an ester bond.
- R and R ′ may be taken together to form a ring Y 1 represents an oxygen atom, a sulfur atom or a selenium atom, A represents a heterocyclic group, m represents an integer of 0 4; p represents an integer of 0 5; q represents 0 or 1)
- the present invention provides a photosensitive composition comprising a polymerizable compound having an ethylenically unsaturated bond and the photopolymerization initiator, and a coloring material further added to the photosensitive composition.
- the present invention provides a colored photosensitive composition to be contained.
- examples of the alkyl group represented by R and R ′ include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, amyl, Isoamyl, tertamyl, hexyl, heptyl, octyl, isooctyl, 2-ethyl hexyl, tertoctyl, nonyl, isonoel, decyl, isodecyl, vinyl, arryl, butenole, ethininore, propyninore, methoxyethinole, ethoxyethenore, Propyloxetinole, methoxyethoxyethyl, ethoxyethoxyethyl, propyloxyethoxyethyl, methoxypropyl, monofluoromethyl, difluoromethyl, difluor
- alkyl group having 1 to 8 carbon atoms is also preferred.
- aryl groups represented by R and R ′ include, for example, phenol, tolyl, xylyl, ethylphenol, black mouth Ruaryl, naphthyl, anthryl, phenanthrenyl and the like. Among them, an aryl group having 6 to 12 carbon atoms is preferable.
- the aralkyl group represented by R and R ′ include carbon atoms such as benzinole, black-end venzinore, ⁇ -methinoleveninore, ⁇ , ⁇ -dimethenoleveninore, phenol-noethyl, and phenethenyl.
- heterocyclic group represented by R and R include 5- to 7-membered heterocyclic groups such as pyridyl, pyrimidyl, furyl, and thiophenyl.
- preferred examples of the ring that R and R ′ can form together include a 5- to 7-membered ring such as a piperidine ring and a morpholine ring.
- examples of the halogen atom that may substitute R and R include fluorine, as is clear from the above examples of alkyl groups, and also include chlorine, bromine, and iodine.
- examples of the heterocyclic group which may substitute R and R ′ include pyridyl, pyrimidyl, furyl, benzoxazol-2-yl, tetrahydrobiranyl, pyrrolidyl, imidazolidyl, virazolidinole, thiazolidyl, isothiazolidyl And 5- to 7-membered heterocyclic groups such as oxazolidyl, isoxazolidyl, piperidyl, piperazyl and morpholinyl.
- halogen atom represented by X examples include fluorine, chlorine, bromine and iodine.
- the alkyl group represented by X is an alkylene group which may be substituted with a halogen atom or ⁇ or a heterocyclic group, an unsaturated bond, an ether bond, It may be interrupted by a thioether bond or an ester bond.
- alkyl group represented by X examples include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, amyl, isoamyl, tert-amyl, hexyl, heptyl, octyl, isooctyl.
- an alkyl group having 1 to 8 carbon atoms is preferred.
- heterocyclic group represented by ⁇ examples include 1,3-dioxolane group, 2-tetrahydrofuran group. Group, 3-tetrahydrofuryl group, 2-tetrahydrochelyl group, 2-oxysilyl group, 2-benzylidyl group, 2 furyl group, 3 furyl group, 2 chael group, 2 pyridyl group, 2-biaryl group 2-thiazolyl group, 2-imidazolyl group, 2-virazolyl group, 2-oxazolyl group, 2-pyrazuryl group, 2-pyrimidyl group, 2-quinolyl group, 2-force rubazolyl group, etc.
- the heterocyclic group substituted with a halogen atom or an alkyl group which may be substituted with a halogen atom or an alkyl group includes, for example, 2, 2-dimethyl-1,1,3 dioxolane group, 2 1-Methyl 1,3 dioxolane group.
- the heterocyclic group represented by A is preferably a 1,3 dioxolane group, a 2-tetrahydrofuryl group or a 2 furyl group which may be substituted with a halogen atom or an alkyl group.
- a 2,2 dimethyl-1,3 dioxolane group or an unsubstituted 2-tetrahydrofuryl group or 2-furyl group is preferred because of its excellent cost and wavelength.
- Preferable examples of the oxime ester compound of the present invention include those represented by any one of the following general formulas (II) to (IV).
- Heterocyclic ring represented by A in the above general formula (I) Basic force
- it is a 1,3-dioxolane group which may be substituted with a halogen atom or an alkyl group.
- it may be substituted with a halogen atom or an alkyl group, or may be substituted with a 2-furyl group. is there.
- R 4, R 5, R s and R 7 are each independently hydrogen HaraRyo Represents a halogen atom or an alkyl group, and Y 2 and Y 3 each independently represents an oxygen atom, a sulfur atom or a selenium atom.
- R 1 , R 2 , R 3 , X, Y 1 , m, p and q are the same as in the general formula (I), X ′ represents a halogen atom or an alkyl group, and r is 0 Represents an integer of ⁇ 4)
- halogen atom represented by X and X ′′ include fluorine, chlorine, bromine and iodine.
- R 4 , R 5 The alkyl group represented by X and X ′′ may be substituted with a halogen atom and Z or a heterocyclic group in the same manner as R and R, and the alkylene part of the alkyl group may be an unsaturated bond, an ether Specific examples and preferred examples that may be interrupted by a bond, a thioether bond, or an ester bond include those similar to those exemplified for R and R ′.
- R 1 is preferably an alkyl group, particularly a methyl group
- R 2 is preferably an alkyl group, particularly a methyl group
- R 3 is an alkyl group; Particularly preferred is an ethyl group
- X is preferably an alkyl group, especially a methyl group
- Y 1 is preferably an oxygen atom
- p is preferably 1 or 2
- q is preferably 1;
- oxime ester compound of the present invention represented by the above general formula (I) include the following compounds No. 1 to No. 20.
- the present invention is not limited by the following compounds.
- the method for synthesizing the oxime ester compound of the present invention represented by the general formula (I) is not particularly limited.
- Y 1 is an oxygen atom and q is 1
- the reaction formula of the following [Chemical Formula 25] it can be produced by the following method.
- a strong rubazole compound 1 and a carboxylic acid chloride 3 in which one of carboxylic acid chlorides 2 and X is a halogen atom are reacted simultaneously or sequentially in the presence of zinc chloride to obtain an acyl compound 4.
- the acyl compound 4 and the alcohol compound 5 are reacted in the presence of tetrabutyl ammonium hydrogen sulfate to obtain the acyl compound 6.
- Alcohol compound 5 may be attached to carboxylic acid chloride 3 before carrying out the acylation reaction.
- the acyl compound 6 is reacted with hydroxylamine hydrochloride to obtain the oxime compound 7.
- the oxime compound 7 and the acid anhydride 8 or the acid chloride 8 ′ are reacted to obtain the oxime ester compound of the present invention represented by the above general formula (I).
- those in which Y 1 is a sulfur atom or selenium atom and those in which q is 0 can be produced according to the above-described method.
- the oxime ester compound of the present invention is useful as a photopolymerization initiator for a polymerizable compound having an ethylenically unsaturated bond.
- the photosensitive composition of the present invention comprises a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator containing the above-described oxime ester compound of the present invention as an active ingredient.
- the polymerizable compound having an ethylenically unsaturated bond examples include unsaturated monocarboxylic acids such as (meth) acrylic acid, crotonic acid, ⁇ -chloroataryl acid, cinnamic acid and sorbic acid; Acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid, and other unsaturated dicarboxylic acids or anhydrides thereof; trimellitic acid, pyromellitic acid, 2, 2'— Trivalent or higher unsaturated polycarboxylic acids such as 3, 3, monobenzophenone tetra force norlevonic acid, 3, 3, -4, 4 'monobenzophenone tetra force norevon acid or anhydrides thereof; Succinic
- polymerizable compounds can be used alone or in admixture of two or more, and may be (co) polymerized in advance and used as a (co) polymer.
- styrene, methyl (meth) acrylate, n-butyl (meth) acrylate, hydroxyethyl (meth) acrylate, and photopolymerization starting with the oxime ester compound of the present invention as an active ingredient Agents are preferred.
- the amount of photopolymerization initiator added is not particularly limited, but the amount of addition of the oxime ester compound of the present invention is ethylenically unsaturated.
- the amount is preferably 1 to 50 parts by mass, more preferably 5 to 30 parts by mass with respect to 100 parts by mass of the polymerizable compound having a bond.
- the photosensitive composition of the present invention may further contain a coloring material to form a colored photosensitive composition.
- a coloring material include dyes, pigments, and natural pigments. These coloring materials can be used alone or in admixture of two or more.
- Examples of the pigment include Pigment Red 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49, 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, 22 0, 223, 224, 226, 227 228, 240, 254; Pigment Orange 13, 31, 34, 36, 3 8, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; Pigment Yellow — 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, 110, 113, 114, 117, 120, 125, 126, 127, 129, 137, 138, 1 39, 147, 148, 150, 151,
- the amount of the coloring material added is preferably 0.1 to 50 parts by mass, more preferably 100 parts by mass with respect to 100 parts by mass of the polymerizable compound having an ethylenically unsaturated bond.
- the amount is preferably 0.5 to 20 parts by mass.
- a monofunctional or polyfunctional epoxy compound can be used in order to improve the developability of the photosensitive composition of the present invention by adjusting the acid value.
- the amount of the monofunctional or polyfunctional epoxy compound that preferably has a solid acid value in the range of 60 to 120 mgKOH / g should satisfy the above acid value. It is preferable to select it.
- Examples of the monofunctional epoxy compound include glycidyl metatalylate, methyl daricidyl ether, ethyl daricidyl ether, propyl glycidyl ether, isopropyl glycidyl ether, butyl daricidyl ether, isobutyl daricidyl ether, tert-butyl glycidyl ether, pentyl glycidyl ether, hexyl glycidyl ether, heptyl daricidyl ether, octyl daricidyl ether, nonyl daricidyl ether, decyl glycidyl ether, undecyl glycidyl ether, dodecyl glycidyl ether, Tridecyl glycidyl ether, tetradecyl glycidyl ether, pentadecyl glylate
- the polyfunctional epoxy compound a bisphenol type epoxy compound and a group power of glycidyl ethers are used. When one or more selected are used, an alkali-developable resin composition having better characteristics. Alternatively, it is preferable because a colored alkali development type resin composition can be obtained.
- the bisphenol type epoxy compound include alkylidene bisphenol polyglycidyl ether type epoxy resin such as bisphenol A glycidyl ether, bisphenol F glycidyl ether, bisphenol Z glycidyl ether, and hydrogenated bisphenol type epoxy compound. Bisphenol type epoxy compounds can be used.
- the glycidyl ethers include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4 butanediol diglycidyl ether, 1,6 hexanediol diglycidyl ether, 1,8 octanediol diglycidyl ether, 1, 10 —Decanediol diglycidyl ether, 2, 2-dimethyl Thiru 1, 3 propanediol diglycidyl ether, diethylene glycol diglycidyl ether, triethylene glycol diglycidyl ether, tetraethylene glycol diglycidyl ether, hexaethylene glycol diglycidyl ether, 1,4 cyclohexane dimethanol diglycidyl ether, 1, 1,1-tri (glycidyloxymethyl) propane, 1,1,1-tri (glycidyloxymethyl) ethane, 1,1,1-tri (glycidyloxymethyl
- novolac type epoxy compounds such as phenol novolac type epoxy compounds, biphenol novolac type epoxy compounds, cresol novolac type epoxy compounds, bisphenol A novolac type epoxy compounds, dicyclopentagen novolac type epoxy compounds; 3 , 4-Epoxy 6-Methylcyclohexylmethyl- 3, 4-Epoxy 6- Methylcyclohexanecarboxylate, 3, 4 Epoxycyclohexylmethyl- 3, 4 Epoxycyclohexane power noroxylate, 1 Epoxy ethynole 3, 4 Epoxy cyclohex Cycloaliphatic epoxy compounds such as xanthine; glycidyl esters such as diglycidyl phthalate, diglycidyl tetraphthalate, and glycidyl dimer; tetraglycidyl diaminodiphenyl ester , Glycidylamines such as triglycidyl P aminophenol, N, N-diglycidyl dilin; 1,
- the properties of the cured product can be improved by using another organic polymer together with the polymerizable compound having an ethylenically unsaturated bond.
- the organic polymer include polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, poly (meth) acrylic acid, styrene (meth) acrylic acid copolymer, and (meth) acrylic acid.
- Methyl metatalylate copolymer ethylene monochloride-bule copolymer, ethylene-bule copolymer, polychlorinated bur resin, ABS resin, nylon 6, nylon 66, nylon 12, urethane resin, Polycarbonate polyvinyl butyral, cellulose ester, Polyacrylamide, saturated polyester, phenol resin, phenoxy resin, polyamide imide resin, polyamic acid resin, epoxy resin, and the like. Among these, polystyrene, (meth) acrylic acid-methyl methacrylate. Copolymers and epoxy resins are preferred. When another organic polymer is used, the amount used is preferably 10 to 500 parts by mass with respect to 100 parts by mass of the polymerizable compound having an ethylenically unsaturated bond.
- the photosensitive composition of the present invention may further contain a monomer having an unsaturated bond, a chain transfer agent, a surfactant and the like.
- Examples of the monomer having an unsaturated bond include 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, isobutyl acrylate, N-octyl acrylate, isooctyl acrylate, isononyl acrylate, and acrylic.
- Examples of the chain transfer agent include thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N- (2-mercaptopropiool) glycine, 2 Mercaptonicotinic acid, 3- [N- (2 mercaptoethyl) power ruberamoyl] propionic acid, 3- [N- (2 mercaptoethyl) amino] propionic acid, N- (3 mercaptopropiool) alanine, 2 Mercaptoethanesulfonic acid, 3-Mercaptopropanesulfonic acid, 4 Mercaptobutanesulfonic acid, Dodecyl (4 methylthio) phenyl ether, 2 Mercaptoethanol, 3 Mercapto 1,2 Peptane diol, 1 Mercapto 2 Propanol, 3 Mercapto 2 Butanol , Mercaptobut
- the surfactant examples include fluorine surfactants such as perfluoroalkyl phosphates and perfluoroalkylcarboxylates, and key-on compounds such as higher fatty acid alkali salts, alkyl sulfonates, and alkyl sulfates.
- Nonionic surfactants such as surfactants, cationic surfactants such as higher amine halogenates and quaternary ammonium salts, polyethylene glycol alkyl ethers, polyethylene glycol fatty acid esters, sorbitan fatty acid esters, fatty acid monoglycerides
- Surfactants such as surfactants, amphoteric surfactants, and silicone surfactants can be used, and these may be used in combination.
- the photopolymerization initiator in addition to the oxime ester compound of the present invention, another photopolymerization initiator can be used in combination, if necessary. In some cases, other photopolymerization initiators may be used in combination to produce a remarkable synergistic effect.
- photopolymerization initiator that can be used in combination with the oxime ester compound of the present invention
- conventionally known compounds can be used.
- photopolymerization initiators can be used alone or in combination of two or more.
- the amount used is preferably the same or less than the amount used of the oxime ester compound of the present invention.
- R 3 , X and m are the same as in the above general formula (I), and R 2 ′, R 3 ′ and X ′ are R 2 in the above general formula U), R 3 and X are the same, R 8 represents a diol residue or a dithiol residue, and Z represents an oxygen atom or a sulfur atom.
- a thermal polymerization inhibitor such as p-sol, hydroquinone, pyrocatechol, tert-butylcatechol, and phenothiazine
- Agent Adhesion promoter; Filler; Antifoaming agent; Repelling agent; Surface conditioner; Antioxidant; Ultraviolet absorber; Dispersion aid; Aggregation inhibitor; Catalyst; Effect promoter; Sensitizer; It is possible to avoid the conventional additives.
- optional components other than the polymerizable compound having an ethylenically unsaturated bond and the oxime ester compound of the present invention are suitably selected according to the purpose of use and is not particularly limited, but is preferably 100 parts by mass of the polymerizable compound having an ethylenically unsaturated bond. The total amount is 50 parts by mass or less.
- the above-described components (such as the oxime ester compound of the present invention and a polymerizable compound having an ethylenically unsaturated bond) can be dissolved or dispersed as required.
- Solvents such as ketones such as methyl ethyl ketone, methyl amyl ketone, jetyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone; ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1, 2 — Ether solvents such as diethoxyethane and dipropylene glycol dimethyl ether; ester solvents such as methyl acetate, ethyl acetate, acetic acid-n-propyl, isopropyl acetate, n-butyl acetate; ethylene glycol monomethyl ether (methyl solvate), Ethylene glycol Cellosolve solvents such as -tenole (ethinoreserosonoleb) and propyleneglycolenomethyl ether acetate; alcohol solvents such as methanol, ethanol
- Hydrocarbon solvents black-opened halogenated aromatic hydrocarbon solvents such as benzene; carbitol Solvents, aline, tritylamine, pyridine, acetic acid, acetonitrile, carbon disulfide, tetrahydrofuran, N, N-dimethylformamide, N-methylpyrrolidone, etc., among which ketones or cellosolve solvents are preferred.
- These solvents can be used as one or a mixture of two or more. Can be used.
- the photosensitive composition of the present invention is prepared by known means such as a spin coater, a roll coater, a bar coater, a die coater, a curtain coater, various printing, dipping, etc., soda glass, stone glass, semiconductor substrate. It can be applied to a supporting substrate such as metal, paper and plastic. Further, after being applied on a supporting substrate such as a film, it can be transferred onto another supporting substrate, and the application method is not limited.
- the photosensitive composition of the present invention comprises a photocurable paint, a photocurable ink, a photocurable adhesive, a printing plate, a photoresist for a printed wiring board, a printed circuit board, a color television, a PC monitor, a mobile phone. It can be used for various applications such as color display liquid crystal display elements such as information terminals and digital cameras, and there are no particular restrictions on the applications.
- a light source emitting light having a wavelength of 300 to 450 nm should be used.
- a light source emitting light having a wavelength of 300 to 450 nm should be used.
- the oil layer was separated and washed with 40% 5% HC1 aqueous solution, 40 g water, and 40 g 2% NaOH aqueous solution in this order.
- Dichloromethane was distilled off and recrystallization was performed from 74.6 g of n-propyl acetate. Filtration and washing with a mixed solvent of n-propyl acetate / n-heptane gave 22.4 g (yield 60%, HPLC purity 98%) of a pale yellow solid.
- the obtained pale yellow crystal had a melting point of 175 ° C, and the results of the chemical shift and IR measurement of the third NMR were as follows, confirming that it was the target acyl compound.
- the oil layer was separated by adding 1.45 kg of butyl acetate and 1.45 kg of water, and then 1.45 g of 5% saline was added to wash the oil layer.
- the oil layer was separated, refluxed and dehydrated at 80 to 90 ° C for 4 hours, and then 787 g of butyl acetate and 178 g (l.74 mol) of acetic anhydride were added and stirred at 83 to 85 ° C for 2 hours.
- the mixture was cooled to room temperature, 1.39 kg of 5% sodium hydroxide aqueous solution was added to separate the oil layer, and then 1.57 kg of water was added in two portions to wash the oil layer.
- the acrylic copolymer is composed of 20 parts by mass of methacrylic acid, 15 parts by mass of hydroxyethyl methacrylate, 10 parts by mass of methyl methacrylate and 55 parts by mass of butyl methacrylate. It was obtained by adding 0.75 parts by mass of azobisisobutylnitrile under a nitrogen atmosphere and reacting at 70 ° C. for 5 hours.
- Example 4 The same acrylic copolymer used in Example 4 was added to 4.3 g of trimethylolpropane triattalylate 4.3 g, 2.0 g of Compound No. 1 obtained in Example 1, and 87 g of ethyl acetate solve. In addition, the mixture was well stirred to obtain photosensitive composition No. 2.
- the above styrene-acrylic photosensitive copolymer was composed of 26.3 parts by mass of styrene, 43.8 parts by mass of 2 hydroxymethacrylate, 35 parts by mass of methacrylic acid and 70 parts by mass of ethyl methacrylate. Dissolve in parts by weight, add 0.775 parts by weight of azobisisobutyl nitrile under nitrogen atmosphere, react at 90 ° C for 5 hours, then 23.5 parts by weight of isocyanatoethyl methacrylate, tin octylate 0 It was obtained by adding 11 parts by mass dissolved in 20 parts by mass of ethyl acetate sorb over about 10 minutes and reacting for 2 hours after the addition.
- a photosensitive composition No. 5 was obtained by stirring 4.6 g of fat and 65 g of ethyl acetate sorb and stirring well.
- Example 11 Production of photosensitive composition No. 8 14 g of the same styrene-acrylic photosensitive copolymer used in Example 6 was added to dipentaerythritol hexatalylate 6. Og, 1.3 g of Compound No. 11 obtained in Example 2, 2 , 2-bis (2-cylinder), 4, 5, 4 ', 5'-tetraphenyl, 1- 2'-bimidazole, 1. 3g and ethilce mouth sorb, 83g Photosensitive composition No. 8 was obtained.
- Photosensitive composition No. 13 was obtained under the same conditions as in Comparative Example 1 except that the same styrene acrylic photosensitive copolymer as used in Example 6 was used instead of the acrylic copolymer. .
- Photosensitive composition No. 15 was obtained under the same conditions as in Comparative Example 3 except that the same styrene acrylic photosensitive copolymer as used in Example 6 was used instead of the acrylic copolymer. .
- Example 4 6.9 g of the same acrylic copolymer used in Example 4 was added to 4.3 g of trimethylolpropane triacrylate, 2. Og of Compound No. 1 obtained in Example 1, and Pigment Red 254. 1. Og and 87 g of ethyl acetate sorb were added and stirred well to obtain a colored photosensitive composition No. 2.
- Example 21 Production of colored photosensitive composition No. 7 The same styrene acrylic photosensitive copolymer used in Example 6, 12 g, dipentaerythritol hexaatalylate 4. Og, 1.3 g of compound No. 1 1 obtained in Example 2, 2, 2 Bis (2 black-mouthed) 1 4, 5, 4 ', 5'—Tetrafehr 1— 2' Biimidazole 1. 3g, Pigment Red 254 0.7g, Pigment Yellow 138 0 3 g and 83 g of ethyl cellosolve were added and stirred well to give a colored photosensitive composition No. 7.
- Example 6 The same styrene acrylic photosensitive copolymer as used in Example 6 was used instead of the acrylic copolymer, except that 3.2 g of carbon black was used instead of 1.Og of pigment blue 15.
- a colored photosensitive composition No. 10 was obtained under the same conditions as in Comparative Example 5.
- the line width is less than 10 m, the pattern can be satisfactorily A. If the line width is 10-30 ⁇ m, the pattern can be satisfactorily. The power that was not able to form a good pattern was evaluated as C.
- a cross-cut is made in the shape of a substrate on a coating film that has been exposed to development and heated at 200 ° C for 30 minutes. evaluated. The case where no peeling was observed was marked as ⁇ , and the case where peeling was observed was marked as X.
- photosensitive compositions No. 12 to No. 15 of Comparative Examples 1 to 4 and colored photosensitive compositions No. 9 to No. 10 of Comparative Examples 5 to 6 have a low sensitivity and thus have a large exposure amount. Inevitably, the resolution was lowered, and the resulting coating film was also strongly resistant to alkali resistance with the substrate. Furthermore, the oxime ester compound of the present invention has a decomposition temperature of around 300 ° C, is superior in heat resistance to 40 to L00 ° C higher than that of known oxime ester compounds, and has a heat effect treatment temperature. However, it was sufficiently stable, and the resulting polymer was not colored or contaminated with the polymer and the apparatus.
- the oxime ester compound of the present invention is excellent in photosensitivity, has no deposition on the surface of the photosensitive layer over time, and therefore has excellent stability over time, and further has no mask deposit due to decomposition products, and has a pattern during printing. Since it does not cause shape defects, it is useful as a photopolymerization initiator.
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Description
Claims
Priority Applications (5)
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JP2006531510A JP3992725B2 (ja) | 2004-08-20 | 2005-08-03 | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
DE602005019888T DE602005019888D1 (de) | 2004-08-20 | 2005-08-03 | Oximesterverbindung und photopolymerisationsinitiator, der eine solche verbindung enthält |
US11/659,979 US7696257B2 (en) | 2004-08-20 | 2005-08-03 | Oxime ester compound and photopolymerization initiator containing such compound |
EP05768407A EP1780209B1 (en) | 2004-08-20 | 2005-08-03 | Oxime ester compound and photopolymerization initiator containing such compound |
CN2005800005625A CN1805955B (zh) | 2004-08-20 | 2005-08-03 | 肟酯化合物和含有该化合物的光聚合引发剂 |
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KR (1) | KR100799043B1 (ja) |
CN (1) | CN1805955B (ja) |
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Also Published As
Publication number | Publication date |
---|---|
EP1780209A4 (en) | 2009-06-03 |
TW200621755A (en) | 2006-07-01 |
CN1805955A (zh) | 2006-07-19 |
JPWO2006018973A1 (ja) | 2008-05-08 |
KR100799043B1 (ko) | 2008-01-28 |
DE602005019888D1 (de) | 2010-04-22 |
US7696257B2 (en) | 2010-04-13 |
KR20070044753A (ko) | 2007-04-30 |
CN1805955B (zh) | 2011-08-31 |
TWI350835B (ja) | 2011-10-21 |
EP1780209A1 (en) | 2007-05-02 |
US20070270522A1 (en) | 2007-11-22 |
EP1780209B1 (en) | 2010-03-10 |
JP3992725B2 (ja) | 2007-10-17 |
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