WO2006010451A3 - Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung - Google Patents
Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung Download PDFInfo
- Publication number
- WO2006010451A3 WO2006010451A3 PCT/EP2005/007418 EP2005007418W WO2006010451A3 WO 2006010451 A3 WO2006010451 A3 WO 2006010451A3 EP 2005007418 W EP2005007418 W EP 2005007418W WO 2006010451 A3 WO2006010451 A3 WO 2006010451A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- vacuum
- vacuum chamber
- installation
- coating installation
- Prior art date
Links
- 238000009434 installation Methods 0.000 title abstract 3
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/572,255 US20080210550A1 (en) | 2004-07-26 | 2005-07-08 | Vacuum Coating System and Method for Vacuum Coating |
EP05773105A EP1771600A2 (de) | 2004-07-26 | 2005-07-08 | Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung |
JP2007522952A JP5224810B2 (ja) | 2004-07-26 | 2005-07-08 | 真空コーティング設備及び方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004036170A DE102004036170B4 (de) | 2004-07-26 | 2004-07-26 | Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung |
DE102004036170.3 | 2004-07-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006010451A2 WO2006010451A2 (de) | 2006-02-02 |
WO2006010451A3 true WO2006010451A3 (de) | 2006-04-20 |
Family
ID=35148995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2005/007418 WO2006010451A2 (de) | 2004-07-26 | 2005-07-08 | Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080210550A1 (de) |
EP (1) | EP1771600A2 (de) |
JP (1) | JP5224810B2 (de) |
DE (1) | DE102004036170B4 (de) |
WO (1) | WO2006010451A2 (de) |
Families Citing this family (40)
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JP4642891B2 (ja) | 2008-09-25 | 2011-03-02 | 株式会社シンクロン | 光学フィルターの製造方法 |
US20100101937A1 (en) * | 2008-10-29 | 2010-04-29 | Applied Vacuum Coating Technologies Co., Ltd. | Method of fabricating transparent conductive film |
US8043981B2 (en) * | 2009-04-21 | 2011-10-25 | Applied Materials, Inc. | Dual frequency low temperature oxidation of a semiconductor device |
US9545360B2 (en) | 2009-05-13 | 2017-01-17 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
PL2251454T3 (pl) | 2009-05-13 | 2014-12-31 | Sio2 Medical Products Inc | Powlekanie i kontrola pojemnika |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
TW201137143A (en) * | 2010-04-28 | 2011-11-01 | Hon Hai Prec Ind Co Ltd | Sputtering system |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
TWI595258B (zh) * | 2011-09-28 | 2017-08-11 | 萊寶光電有限公司 | 用於製造基板上之反射抑制層之方法與裝置 |
AU2012318242A1 (en) | 2011-11-11 | 2013-05-30 | Sio2 Medical Products, Inc. | Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
EP2914762B1 (de) | 2012-11-01 | 2020-05-13 | SiO2 Medical Products, Inc. | Verfahren zur inspektion einer beschichtung |
US9903782B2 (en) | 2012-11-16 | 2018-02-27 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
US10201660B2 (en) | 2012-11-30 | 2019-02-12 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like |
WO2014134577A1 (en) | 2013-03-01 | 2014-09-04 | Sio2 Medical Products, Inc. | Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
JP6453841B2 (ja) | 2013-03-11 | 2019-01-16 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 被覆包装 |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
EP3122917B1 (de) | 2014-03-28 | 2020-05-06 | SiO2 Medical Products, Inc. | Antistatische beschichtungen für kunststoffbehälter |
KR20170057350A (ko) | 2014-09-19 | 2017-05-24 | 도판 인사츠 가부시키가이샤 | 성막 장치 및 성막 방법 |
JP6672595B2 (ja) | 2015-03-17 | 2020-03-25 | 凸版印刷株式会社 | 成膜装置 |
JP2018523538A (ja) | 2015-08-18 | 2018-08-23 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 低酸素透過速度を有する薬剤包装及び他の包装 |
US11383213B2 (en) | 2016-03-15 | 2022-07-12 | Honda Motor Co., Ltd. | System and method of producing a composite product |
US11171324B2 (en) | 2016-03-15 | 2021-11-09 | Honda Motor Co., Ltd. | System and method of producing a composite product |
KR102284028B1 (ko) * | 2016-09-13 | 2021-07-29 | 어플라이드 머티어리얼스, 인코포레이티드 | 단일 산화물 금속 증착 챔버 |
US11081684B2 (en) | 2017-05-24 | 2021-08-03 | Honda Motor Co., Ltd. | Production of carbon nanotube modified battery electrode powders via single step dispersion |
US20190036102A1 (en) | 2017-07-31 | 2019-01-31 | Honda Motor Co., Ltd. | Continuous production of binder and collector-less self-standing electrodes for li-ion batteries by using carbon nanotubes as an additive |
US10658651B2 (en) | 2017-07-31 | 2020-05-19 | Honda Motor Co., Ltd. | Self standing electrodes and methods for making thereof |
US11201318B2 (en) | 2017-09-15 | 2021-12-14 | Honda Motor Co., Ltd. | Method for battery tab attachment to a self-standing electrode |
US11121358B2 (en) | 2017-09-15 | 2021-09-14 | Honda Motor Co., Ltd. | Method for embedding a battery tab attachment in a self-standing electrode without current collector or binder |
DE102018101090A1 (de) * | 2018-01-18 | 2019-07-18 | Osram Opto Semiconductors Gmbh | Anzeigeelement, Anzeigevorrichtung und Verfahren zur Herstellung einer Kontaktstruktur bei einer Vielzahl von Anzeigeelementen |
DE102019132526A1 (de) | 2019-01-15 | 2020-07-16 | Fhr Anlagenbau Gmbh | Beschichtungsmaschine |
US11535517B2 (en) | 2019-01-24 | 2022-12-27 | Honda Motor Co., Ltd. | Method of making self-standing electrodes supported by carbon nanostructured filaments |
US11325833B2 (en) | 2019-03-04 | 2022-05-10 | Honda Motor Co., Ltd. | Composite yarn and method of making a carbon nanotube composite yarn |
US11352258B2 (en) | 2019-03-04 | 2022-06-07 | Honda Motor Co., Ltd. | Multifunctional conductive wire and method of making |
US11539042B2 (en) | 2019-07-19 | 2022-12-27 | Honda Motor Co., Ltd. | Flexible packaging with embedded electrode and method of making |
CN111370265B (zh) * | 2020-04-10 | 2022-02-01 | 常州天利智能控制股份有限公司 | 一种接触器结构 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0533044A1 (de) * | 1991-09-20 | 1993-03-24 | Balzers Aktiengesellschaft | Verfahren zur Schutzbeschichtung von Substraten sowie Beschichtungsanlage |
DE4335224A1 (de) * | 1993-10-15 | 1995-04-20 | Leybold Ag | Vorrichtung für die Herstellung optischer Schichten |
US6186090B1 (en) * | 1999-03-04 | 2001-02-13 | Energy Conversion Devices, Inc. | Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
EP1245298A1 (de) * | 2001-03-29 | 2002-10-02 | Schott Glas | Verfahren zum Herstellen eines beschichteten Kunststoffkörpers |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4763601A (en) * | 1987-09-02 | 1988-08-16 | Nippon Steel Corporation | Continuous composite coating apparatus for coating strip |
US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
US4992153A (en) * | 1989-04-26 | 1991-02-12 | Balzers Aktiengesellschaft | Sputter-CVD process for at least partially coating a workpiece |
DE4407909C3 (de) * | 1994-03-09 | 2003-05-15 | Unaxis Deutschland Holding | Verfahren und Vorrichtung zum kontinuierlichen oder quasi-kontinuierlichen Beschichten von Brillengläsern |
US5849162A (en) * | 1995-04-25 | 1998-12-15 | Deposition Sciences, Inc. | Sputtering device and method for reactive for reactive sputtering |
US6103069A (en) * | 1997-03-31 | 2000-08-15 | Applied Materials, Inc. | Chamber design with isolation valve to preserve vacuum during maintenance |
AU734809B2 (en) * | 1997-06-16 | 2001-06-21 | Robert Bosch Gmbh | Method and device for vacuum-coating a substrate |
DE19824364A1 (de) * | 1998-05-30 | 1999-12-02 | Bosch Gmbh Robert | Verfahren zum Aufbringen eines Verschleißschutz-Schichtsystems mit optischen Eigenschaften auf Oberflächen |
JP2000017457A (ja) * | 1998-07-03 | 2000-01-18 | Shincron:Kk | 薄膜形成装置および薄膜形成方法 |
EP1127381B1 (de) * | 1998-11-02 | 2015-09-23 | 3M Innovative Properties Company | Transparente leitfähige oxide für kunststoff-flachbildschirme |
JP2001133613A (ja) * | 1999-11-05 | 2001-05-18 | Ichikoh Ind Ltd | 反射基板 |
US20040101636A1 (en) * | 2001-03-29 | 2004-05-27 | Markus Kuhr | Method for producing a coated synthetic body |
JP2003098306A (ja) * | 2001-09-19 | 2003-04-03 | Sumitomo Metal Mining Co Ltd | 反射防止フィルム |
JP2003321773A (ja) * | 2002-04-26 | 2003-11-14 | Shimadzu Corp | Ecrスパッタリング装置 |
JP3824993B2 (ja) * | 2002-12-25 | 2006-09-20 | 株式会社シンクロン | 薄膜の製造方法およびスパッタリング装置 |
AU2003300037A1 (en) * | 2002-12-31 | 2004-07-29 | Cardinal Cg Company | Coater having substrate cleaning device and coating deposition methods employing such coater |
EP1786947B1 (de) * | 2004-09-03 | 2012-12-19 | Cardinal CG Company | Auftragvorrichtung und -verfahren zum auftragen eines films auf ein substrat |
-
2004
- 2004-07-26 DE DE102004036170A patent/DE102004036170B4/de not_active Expired - Fee Related
-
2005
- 2005-07-08 WO PCT/EP2005/007418 patent/WO2006010451A2/de active Application Filing
- 2005-07-08 US US11/572,255 patent/US20080210550A1/en not_active Abandoned
- 2005-07-08 EP EP05773105A patent/EP1771600A2/de not_active Withdrawn
- 2005-07-08 JP JP2007522952A patent/JP5224810B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0533044A1 (de) * | 1991-09-20 | 1993-03-24 | Balzers Aktiengesellschaft | Verfahren zur Schutzbeschichtung von Substraten sowie Beschichtungsanlage |
DE4335224A1 (de) * | 1993-10-15 | 1995-04-20 | Leybold Ag | Vorrichtung für die Herstellung optischer Schichten |
US6186090B1 (en) * | 1999-03-04 | 2001-02-13 | Energy Conversion Devices, Inc. | Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
EP1245298A1 (de) * | 2001-03-29 | 2002-10-02 | Schott Glas | Verfahren zum Herstellen eines beschichteten Kunststoffkörpers |
Non-Patent Citations (1)
Title |
---|
MILDE F ET AL: "Large-area production of solar absorbent multilayers by MF-pulsed plasma technology", VACUUM ELSEVIER UK, vol. 59, no. 2-3, November 2000 (2000-11-01), pages 825 - 835, XP002367414, ISSN: 0042-207X * |
Also Published As
Publication number | Publication date |
---|---|
EP1771600A2 (de) | 2007-04-11 |
JP2008507629A (ja) | 2008-03-13 |
JP5224810B2 (ja) | 2013-07-03 |
DE102004036170A1 (de) | 2006-03-23 |
DE102004036170B4 (de) | 2007-10-11 |
WO2006010451A2 (de) | 2006-02-02 |
US20080210550A1 (en) | 2008-09-04 |
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