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WO2006075561A1 - Glass for coating electrode, front substrate of plasma display panel and back substrate of plasma display panel - Google Patents

Glass for coating electrode, front substrate of plasma display panel and back substrate of plasma display panel Download PDF

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Publication number
WO2006075561A1
WO2006075561A1 PCT/JP2006/300104 JP2006300104W WO2006075561A1 WO 2006075561 A1 WO2006075561 A1 WO 2006075561A1 JP 2006300104 W JP2006300104 W JP 2006300104W WO 2006075561 A1 WO2006075561 A1 WO 2006075561A1
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WO
WIPO (PCT)
Prior art keywords
glass
electrode
substrate
display panel
layer
Prior art date
Application number
PCT/JP2006/300104
Other languages
French (fr)
Japanese (ja)
Inventor
Satoshi Fujimine
Hiroyuki Yamamoto
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Publication of WO2006075561A1 publication Critical patent/WO2006075561A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/068Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10Frit compositions, i.e. in a powdered or comminuted form containing lead
    • C03C8/12Frit compositions, i.e. in a powdered or comminuted form containing lead containing titanium or zirconium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/10AC-PDPs with at least one main electrode being out of contact with the plasma
    • H01J11/12AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/22Electrodes, e.g. special shape, material or configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/34Vessels, containers or parts thereof, e.g. substrates
    • H01J11/38Dielectric or insulating layers

Definitions

  • Electrode coating glass, plasma display panel front substrate and plasma display panel rear substrate are Electrode coating glass, plasma display panel front substrate and plasma display panel rear substrate
  • the present invention relates to a front substrate and a rear substrate of a plasma display panel (hereinafter referred to as PDP), and an electrode coating glass suitable for electrode coating of these substrates.
  • PDP plasma display panel
  • an electrode is formed in each pixel in order to control the display state in the pixel forming the image.
  • a transparent electrode such as a thin film of ITO or tin oxide formed on a glass substrate is used in order to prevent deterioration in image quality.
  • a transparent electrode formed on the surface of a glass substrate used as a display surface of the display device is processed into a thin line shape in order to realize a fine image. And, in order to control each pixel independently, it is necessary to ensure the insulation between such finely covered transparent electrodes.
  • a slight current may flow through the surface of the glass substrate. In order to prevent such a current, it is effective to form an insulating layer between the transparent electrodes.
  • the insulating layer is preferably transparent in order to prevent deterioration in image quality due to the insulating layer formed between the transparent electrodes.
  • a transparent electrode is formed on the surface of the glass substrate of the front substrate, and in order to protect the transparent electrode from plasma, the transparent electrode is covered with glass having excellent plasma durability. It is essential to overturn.
  • an address electrode is formed on the surface of the glass substrate of the rear substrate, and this address electrode is also covered with glass.
  • the glass used for such electrode coating is usually used as a glass powder.
  • a filler or the like for example, it is mixed with a resin, a solvent or the like to form a glass paste, which is applied to a glass substrate on which an electrode such as a transparent electrode is formed.
  • a post-firing, slurry obtained by mixing the glass powder with a resin and, if necessary, a filler is formed into a green sheet, and this is laminated on a glass substrate on which an electrode is formed, and then fired.
  • the electrode is covered with glass by a method such as that described above.
  • the glass used for covering the transparent electrode of the PDP front substrate has, for example, a softening point (Ts) of 450 to 650 ° C in addition to the electrical insulation as described above.
  • Ts softening point
  • the average coefficient of linear expansion ( ⁇ ) at 350 ° C is 60 X 10 _7 to 90 X 10 _7 Z ° C, and the electrode-coated glass layer obtained by firing is highly transparent.
  • Various glasses have been proposed in the past.
  • a color filter layer is formed on an electrode-coated glass layer on the electrode-coated glass substrate for the purpose of improving contrast, but recently, as an electrode-coated glass layer, the formation of this color filter layer is unnecessary. It has been proposed to use colored glass to improve the contrast of the screen (see Table 1 of JP-A-2000-226229).
  • the cause is not necessarily clear, but the electrode coating glass disclosed in JP-A-2000-226229 contains only CoO and NiO as coloring components, which may be the cause. is there.
  • An object of the present invention is to provide a glass for electrode coating that can eliminate such possibility, and a PDP front substrate and a PDP rear substrate using such glass for electrode coating. To do.
  • the present invention contains Cu and Co, the electrode covering is 05-2 mol 0/0 0.
  • CuO converted content is terms of CoO content of 0.05 to 2 mol% and Co in Cu
  • a glass first glass of the present invention
  • a glass substrate on which an electrode is formed is covered with a glass layer, and a partition wall is formed on the glass layer, wherein the glass of the glass layer is the first or second glass of the present invention.
  • a glass PDP back substrate is provided.
  • the electrode coating glass of the present invention (hereinafter simply referred to as the glass of the present invention) is used as the electrode coating glass layer of the PDP front substrate.
  • the present invention is not limited to this case.
  • the glass of the present invention is usually used as a glass powder.
  • the glass powder of the present invention is made into a glass paste using an organic vehicle or the like for imparting printability, and the glass paste is applied onto an electrode formed on a glass substrate and baked to coat the electrode.
  • the organic vehicle referred to here is obtained by dissolving a binder such as ethyl cellulose in an organic solvent such as ⁇ -tervineol.
  • a slurry obtained by mixing the glass powder of the present invention with a resin and, if necessary, a filler is formed into a green sheet, which is laminated on a glass substrate on which electrodes are formed. After firing, the electrode is coated.
  • the Ts of the glass of the present invention is preferably 450 to 650 ° C. If Ts exceeds 650 ° C, the glass substrate (glass transition point: 550 to 620 ° C) that is normally used may be deformed during firing.
  • the Ts is preferably 630 ° C or less, more preferably 550 to 600 ° C.
  • Ts when used for an electrode-coated glass layer having a single layer structure, Ts is preferably 520 ° C or higher, more preferably 550 ° C or higher, and a glass transition point of 610 to 630 ° C. When using a substrate, the Ts is particularly preferably 580 ° C or higher.
  • a of the glass of the present invention is preferably 60 X 10 _7 to 90 X 10 "V ° C, More preferably 70 X 10_7 to 85 X 10_7 Z. C.
  • the glass of the present invention preferably has a Ts force of 50 to 650 ° C and an a force of 1 ⁇ 2 0 X 10 _7 to 90 X 10 _7 / ° C.
  • the relative dielectric constant of the glass of the present invention at 1 MHz is typically 8 to 13.
  • the wavelength of the glass substrate on which the glass layer is formed is 450 nm. , 550 nm, each light transmittance of 630 nm (unit: 0/0), respectively T
  • Both 550 and 550 are preferably 65% or more.
  • the periphery of the silver electrode It is preferable that the yellowing phenomenon of the portion hardly occurs or does not occur.
  • This yellowing phenomenon is a phenomenon in which the glass is colored brown or yellow and the image quality of the PDP is lowered. It is considered that the silver of the electrode diffuses into the glass layer covering the silver electrode.
  • Cu is treated as a component in the form of V and CuO in the glass
  • CuO is treated as a component !
  • CuO equivalent content is abbreviated as Cu O
  • the content of each component is excluding that for Ni Expressed in mole percentage.
  • CuO is used to realize the preferred relationship shown above for T, T and ⁇
  • CuO is a component, or a component that makes the yellowing phenomenon difficult or does not occur, and is essential. If CuO is less than 0.05%, it is difficult to realize the preferable relationship or the yellowing phenomenon is likely to occur, and is preferably 0.1% or more. If CuO exceeds 2%, the transmittance of the glass is lowered, particularly T is lowered, preferably 0.9% or less.
  • CoO is a component for realizing the preferable relationship and is essential. If the CoO is less than 0.05%, the above-mentioned preferable relationship is difficult to be realized, preferably 0.1% or more, and if it exceeds 2%, the transmittance of the glass is lowered, particularly T is lowered, preferably less than 1%. It is.
  • CeO is not essential, but in the case of adjusting the color of the glass in the yellow direction, etc., 2%
  • it is 1% or less.
  • it contains CeO its content is 0.1% or more
  • MnO is not essential, but in the case of adjusting the color of the glass in the red direction, etc., 2
  • T It may be contained up to%. If the MnO force is exceeded, the transmittance of the glass will decrease, and in particular, T will be low.
  • the glass of the present invention typically does not contain NiO, or when NiO is contained, its content is less than 0.005% in terms of mass percentage.
  • the first glass of the present invention is typically a B 2 O 3 —SiO glass.
  • BO is a glass network structure forming component and is essential. Glass with BO less than 20%
  • Ts becomes unstable, preferably 26% or more, and if it exceeds 60%, Ts becomes too high, preferably 55% or less, typically 50% or less.
  • SiO is a glass network structure forming component and is essential. Less than SiO power%
  • the Ts becomes too high, preferably below 35%, typically below 26%.
  • PbO and ZnO are components having an effect of lowering Ts and must contain at least one of them. If the total content of PbO and ZnO is less than 10%, the above effect is small, typically 18% or more.If it exceeds 40%, ⁇ may be too large, or the glass tends to crystallize. , Preferably 35% or less, typically 30% or less.
  • PbO When PbO is contained, its content is preferably 10 to 35%, typically 21 to 29%. If PbO exceeds 35% (X may become too large.
  • ZnO When ZnO is contained, its content is preferably 10-30%, typically 15-25%. If ZnO exceeds 30%, the glass tends to crystallize.
  • Al O is not indispensable, but up to 15% is included for more stable glass.
  • AlO exceeds 15%, the glass tends to crystallize, preferably 10% or less
  • Al O is contained, its content is preferably 1% or more
  • SrO and BaO are !, and the deviation is not essential, but if a is increased, etc., it may be contained in a total range of up to 20%. If the total exceeds 20%, a may be too large, preferably 16% or less.
  • the total content of SrO and BaO is preferably 5% or more, and typically 8% or more. In that case, BaO is preferably contained.
  • SrO When SrO is contained, its content is typically 10% or less.
  • TiO is not essential, but if you want to increase the relative dielectric constant, etc., up to 10% is included.
  • TiO exceeds 10%, the glass tends to crystallize, typically 7% or less. .
  • its content is preferably 1% or more, typically 3% or more.
  • Bi O is not essential, but you want to lower Ts or increase the relative permittivity.
  • the type is 4% or less. If it contains BiO, its content is preferably 1% or more.
  • the total content of these three components is preferably 2% or more, and typically 3% or more. In that case, it typically contains Li 2 O.
  • the total is typically less than 10%.
  • the second glass of the present invention has essentially the above component force.
  • V may contain other components in the range! / ,. In that case, the total content of such components is preferably 10% or less.
  • ZnO is 0 to 10%
  • SrO is 0 to 15%.
  • Examples include 0% and no PbO.
  • a layer containing the glass powder of the present invention is formed so as to cover the transparent electrode and the bus electrode formed on the glass substrate.
  • the transparent electrode has, for example, a strip shape with a width of 0.5 mm, and is formed so that the strip electrodes are parallel to each other.
  • the distance between each strip electrode center line is, for example, 0.83 ⁇ : L Omm.
  • the ratio of the transparent electrode to the glass substrate surface is 50 ⁇ 60%.
  • the bus electrode is formed to correspond to the transparent electrode and is generally made of silver or Cr—Cu—Cr.
  • the layer containing the glass powder of the present invention is formed by adding a filler or the like to the glass powder of the present invention, if necessary, and then adding a resin, a solvent, etc.
  • a resin is added to the glass powder and, if necessary, a filler, etc.
  • the slurry obtained by mixing these is formed into a green sheet and laminated on a glass substrate on which an electrode is formed.
  • the glass substrate on which the layer containing the glass powder of the present invention is formed is heated, and the layer is baked to become an electrode-coated glass layer, and then as a protective film on the electrode-coated glass layer.
  • a layer of magnesium oxide is formed and used as the PDP front substrate.
  • the configuration shown in the above description is an example, and the PDP front substrate of the present invention is not limited to this.
  • the PDP rear substrate of the present invention is manufactured according to the method for manufacturing the PDP front substrate of the present invention. That is, the layer containing the glass powder of the present invention that covers the address electrodes on the glass substrate is formed in the same manner as in the method for producing the PDP front substrate of the present invention.
  • the address electrode is generally made of silver or Cr—Al.
  • a filler (including a pigment) is added to the layer containing the glass powder of the present invention. It may be preferable to include it.
  • the pigment generally contains one or more elements selected from the group force consisting of Al, Si, Ti, Cr, Mn, Co, and Cu.
  • the glass powder-containing layer contains a pigment as a filler
  • the glass powder of the present invention is preferably 100 parts by mass and the pigment is preferably contained in a proportion of 0.5 to 40 parts by mass.
  • the raw materials are selected so that the composition is expressed in terms of mole percentage in the columns from BO to MnO. They were mixed and mixed, melted in a 1100-1350 ° C electric furnace using a platinum crucible for 1 hour, formed into a sheet glass, and then pulverized with a ball mill to obtain a glass powder.
  • Examples 1 to 17 are working examples, and Example 18 is a comparative example.
  • the softening point Ts (unit: C)
  • the average linear expansion coefficient ⁇ (unit: 10 _7 Z ° C) at 50 to 350 ° C
  • the relative dielectric constant ⁇ at 1 MHz are as follows: Measurements were made as described. The results are shown in the table.
  • Ts Measured with a differential thermal analyzer in the range up to 800 ° C.
  • the fired body obtained by firing for 10 minutes at a temperature 30 ° C higher than Ts is processed into a cylindrical shape with a diameter of 5mm and a length of 2cm. The average coefficient of linear expansion was measured.
  • Glass powder was re-melted and formed into a plate shape, then calendered to obtain a measurement sample of 50 mm X 50 mm and thickness 3 mm.
  • Aluminum electrodes were fabricated on both sides of the measurement sample by vapor deposition, and the relative dielectric constant at a frequency of 1 MHz was measured using an LCR meter.
  • the glass powder lOOg was kneaded with 25 g of an organic vehicle to prepare a glass paste.
  • the organic vehicle was prepared by dissolving 12% by mass percentage of ethyl cellulose in a tervineol.
  • the glass substrate has a mass percentage display composition 1S SiO 58%, AlO 7%, NaO 4%, KO 6.5%, MgO 2%, CaO 5%
  • the glass power is also 3 X 10 "V ° C.
  • a glass substrate on which a silver layer is thus formed and a glass substrate on which no silver layer is formed are prepared, and the glass paste is uniformly screen-printed on each 50 mm x 50 mm portion, and then 120 ° Dry at C for 10 minutes. These glass substrates were heated at a temperature increase rate of 10 ° CZ until the temperature reached Ts, and the temperature was maintained at Ts for 30 minutes for firing. The thickness of the glass layer thus formed on the glass substrate was 30 to 35 ⁇ m.
  • a silver layer is formed!
  • Te Wavelength 450nm, 550nm, 630nm light transmittance T (unit: 0 /.), T (unit: 0 /.), ⁇
  • ⁇ , ⁇ , ⁇ Using an integrating sphere self-recording spectrophotometer U-3500 manufactured by Hitachi, Ltd.
  • the transmittance of light having wavelengths of 450 nm, 550 nm, and 630 nm was measured (the state without the sample was taken as 100%).
  • the glass of the present invention can be used for electrode coating on the front or back substrate of a PDP.
  • the PDP front substrate and the PDP rear substrate of the present invention can be used for manufacturing PDP.
  • the entire contents of the specification, patent claims, drawings and abstract of Japanese Patent Application No. 2005-7898 filed on January 14, 2005 are incorporated herein by reference. And that is what we take in.

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
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  • Gas-Filled Discharge Tubes (AREA)

Abstract

A glass for coating an electrode which contains Cu in an amount of 0.05 to 2 mole % in terms of CuO and Co in an amount of 0.05 to 2 mole % in terms of CoO; and a glass for coating an electrode which consists essentially of, in mole % and in terms of the oxides described bellow, 20 to 60 % of B2O3, 5 to 50 % of SiO2, 10 to 40 % of PbO + ZnO, 0 to 15 % of Al2O3, 0 to 20 % of SrO + BaO, 0 to 10 % of TiO2, 0 to 9 % of Bi2O3, 0 to 16 % of Li2O + Na2O + K2O, 0.05 to 2 % of CuO, 0.05 to 2 % of CoO, 0 to 2 % of CeO2, and 0 to 2 % of MnO2.

Description

明 細 書  Specification
電極被覆用ガラス、プラズマディスプレイパネル前面基板およびプラズマ ディスプレイパネル背面基板  Electrode coating glass, plasma display panel front substrate and plasma display panel rear substrate
技術分野  Technical field
[0001] 本発明はプラズマディスプレイパネル(以下、 PDPという。)の前面基板および背面 基板、およびそれら基板の電極被覆に好適な電極被覆用ガラスに関する。  The present invention relates to a front substrate and a rear substrate of a plasma display panel (hereinafter referred to as PDP), and an electrode coating glass suitable for electrode coating of these substrates.
背景技術  Background art
[0002] 近年、薄型の平板型カラー表示装置が注目を集めて!/ヽる。このような表示装置では 画像を形成する画素における表示状態を制御するために各画素に電極が形成され る。このような電極としては、画像の質の低下を防ぐために、ガラス基板上に形成され た ITOまたは酸化スズの薄膜等の透明電極が用いられて 、る。  In recent years, thin flat panel color display devices have attracted attention! In such a display device, an electrode is formed in each pixel in order to control the display state in the pixel forming the image. As such an electrode, a transparent electrode such as a thin film of ITO or tin oxide formed on a glass substrate is used in order to prevent deterioration in image quality.
[0003] 前記表示装置の表示面として使用されるガラス基板の表面に形成される透明電極 は、精細な画像を実現するために細い線状に加工される。そして各画素を独自に制 御するためには、このような微細にカ卩ェされた透明電極相互の絶縁性を確保する必 要がある。ところが、ガラス基板の表面に水分が存在する場合やガラス基板中にアル カリ成分が存在する場合、このガラス基板の表面を介して若干の電流が流れることが ある。このような電流を防止するには、透明電極間に絶縁層を形成することが有効で ある。また、透明電極間に形成される絶縁層による画像の質の低下を防ぐべくこの絶 縁層は透明であることが好ましい。  [0003] A transparent electrode formed on the surface of a glass substrate used as a display surface of the display device is processed into a thin line shape in order to realize a fine image. And, in order to control each pixel independently, it is necessary to ensure the insulation between such finely covered transparent electrodes. However, when moisture is present on the surface of the glass substrate or when an alkali component is present in the glass substrate, a slight current may flow through the surface of the glass substrate. In order to prevent such a current, it is effective to form an insulating layer between the transparent electrodes. In addition, the insulating layer is preferably transparent in order to prevent deterioration in image quality due to the insulating layer formed between the transparent electrodes.
このような絶縁層を形成する絶縁材料としては種々のものが知られている力 なか でも、透明であり信頼性の高 、絶縁材料であるガラス材料が広く用いられて 、る。  Among various known insulating materials for forming such an insulating layer, a transparent and highly reliable glass material which is an insulating material is widely used.
[0004] 最近大型平面カラーディスプレイ装置として期待されて!ヽる PDPにお ヽては、表示 面として使用される前面基板と、隔壁が形成されている背面基板とが貼り合わされて おり、その内部には隔壁によりセルが区画形成されている。そして、そのセル中でプ ラズマ放電を発生させることにより画像が形成される。  [0004] Recently, as a large flat color display device is expected! In a PDP, a front substrate used as a display surface and a rear substrate on which partition walls are formed are bonded together. A cell is defined by partition walls. Then, an image is formed by generating plasma discharge in the cell.
前面基板のガラス基板の表面には透明電極が形成されており、この透明電極をプ ラズマカゝら保護するために、プラズマ耐久性に優れたガラスにより前記透明電極を被 覆することが必須である。 A transparent electrode is formed on the surface of the glass substrate of the front substrate, and in order to protect the transparent electrode from plasma, the transparent electrode is covered with glass having excellent plasma durability. It is essential to overturn.
また、背面基板のガラス基板の表面にはアドレス電極が形成されており、このアドレ ス電極もガラスにより被覆される。  Further, an address electrode is formed on the surface of the glass substrate of the rear substrate, and this address electrode is also covered with glass.
[0005] このような電極被覆に用いられるガラスは、通常はガラス粉末にして使用される。た とえば、前記ガラス粉末に必要に応じてフイラ一等を添加した上で榭脂、溶剤等と混 合してガラスペーストとしこれを透明電極等の電極が形成されているガラス基板に塗 布後焼成する、前記ガラス粉末に榭脂、さらに必要に応じてフイラ一等を混合して得 られたスラリーをグリーンシートに成形しこれを電極が形成されているガラス基板上に ラミネート後焼成する、等の方法によって電極をガラスにより被覆する。  [0005] The glass used for such electrode coating is usually used as a glass powder. For example, after adding a filler or the like to the glass powder as necessary, it is mixed with a resin, a solvent or the like to form a glass paste, which is applied to a glass substrate on which an electrode such as a transparent electrode is formed. A post-firing, slurry obtained by mixing the glass powder with a resin and, if necessary, a filler is formed into a green sheet, and this is laminated on a glass substrate on which an electrode is formed, and then fired. The electrode is covered with glass by a method such as that described above.
[0006] PDP前面基板の透明電極被覆に用いられるガラスには、先に述べたような電気絶 縁性の他に、たとえば、軟化点(Ts)が 450〜650°Cであること、 50〜350°Cにおけ る平均線膨張係数( α )が 60 X 10_7〜90 X 10_7Z°Cであること、焼成して得られる 電極被覆ガラス層の透明性が高いこと、等が求められており、種々のガラスが従来提 案されている。 [0006] The glass used for covering the transparent electrode of the PDP front substrate has, for example, a softening point (Ts) of 450 to 650 ° C in addition to the electrical insulation as described above. The average coefficient of linear expansion (α) at 350 ° C is 60 X 10 _7 to 90 X 10 _7 Z ° C, and the electrode-coated glass layer obtained by firing is highly transparent. Various glasses have been proposed in the past.
[0007] PDP前面基板では通常、電極被覆ガラス層の上にコントラスト向上等を目的として カラーフィルタ層が形成されるが、最近はこのカラーフィルタ層の形成を不要とするベ く電極被覆ガラス層として着色ガラスを用いこれにより画面のコントラストを向上させる ことが提案されて 、る(特開 2000— 226229号公報の表 1を参照)。  [0007] Normally, a color filter layer is formed on an electrode-coated glass layer on the electrode-coated glass substrate for the purpose of improving contrast, but recently, as an electrode-coated glass layer, the formation of this color filter layer is unnecessary. It has been proposed to use colored glass to improve the contrast of the screen (see Table 1 of JP-A-2000-226229).
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0008] 先に述べたようにカラーフィルタ層の形成を不要とするべく電極被覆ガラス層として 着色ガラスを用いることが従来提案されて ヽるが、未だ広く用いられるに至って!/ヽな い。 [0008] As described above, it has been proposed to use colored glass as the electrode-coated glass layer so as to eliminate the need for forming a color filter layer, but it has not been widely used yet.
その原因は必ずしも明らかではないが、特開 2000— 226229号公報で開示されて いる電極被覆用ガラスは着色成分として CoOおよび NiOのみを含有するものであり、 そのことが前記原因である可能性がある。  The cause is not necessarily clear, but the electrode coating glass disclosed in JP-A-2000-226229 contains only CoO and NiO as coloring components, which may be the cause. is there.
本発明はこのような可能性の排除を可能にする電極被覆用ガラス、ならびにそのよ うなガラスを電極被覆に用いた PDP前面基板および PDP背面基板の提供を目的と する。 An object of the present invention is to provide a glass for electrode coating that can eliminate such possibility, and a PDP front substrate and a PDP rear substrate using such glass for electrode coating. To do.
課題を解決するための手段  Means for solving the problem
[0009] 本発明は、 Cuおよび Coを含有し、 Cuの CuO換算含有量が 0. 05〜2モル%かつ Coの CoO換算含有量が 0. 05〜2モル0 /0である電極被覆用ガラス (本発明の第 1の ガラス)を提供する。 [0009] The present invention contains Cu and Co, the electrode covering is 05-2 mol 0/0 0. CuO converted content is terms of CoO content of 0.05 to 2 mol% and Co in Cu A glass (first glass of the present invention) is provided.
また、下記酸化物基準のモル百分率表示で、 B O 20〜60%、 SiO 5〜50%  In addition, B O 20-60%, SiO 5-50%
2 3 2  2 3 2
、PbO+ZnO 10〜40%、Α1 Ο 0〜15%、 SrO + BaO 0〜20%、 TiO 0〜1  , PbO + ZnO 10-40%, Α1 Ο 0-15%, SrO + BaO 0-20%, TiO 0-1
2 3 2 2 3 2
0%、 Bi O 0〜9%、 Li O+Na O+K Ο 0〜16%、 CuO 0. 05〜2%、 CoO0%, BiO 0-9%, Li O + Na O + K Ο 0-16%, CuO 0.05--2%, CoO
2 3 2 2 2 2 3 2 2 2
0. 05〜2%、 CeO 0〜2%、 ΜηΟ 0〜2%、力 本質的になる電極被覆用ガラ  0.05-2%, CeO 0-2%, ΜηΟ 0-2%, force
2 2  twenty two
ス (本発明の第 2のガラス)を提供する。  (Second glass of the present invention) is provided.
[0010] また、透明電極が形成されて!ヽるガラス基板がガラス層によって被覆されて ヽる PD Ρ前面基板であって、ガラス層のガラスが本発明の第 1または第 2のガラスである PD Ρ前面基板を提供する。 [0010] In addition, a transparent electrode is formed! A PD front substrate in which the glass substrate is covered with a glass layer, and the glass in the glass layer is the first or second glass of the present invention.
また、電極が形成されているガラス基板がガラス層によって被覆され、そのガラス層 の上に隔壁が形成されている PDP背面基板であって、ガラス層のガラスが本発明の 第 1または第 2のガラスである PDP背面基板を提供する。  A glass substrate on which an electrode is formed is covered with a glass layer, and a partition wall is formed on the glass layer, wherein the glass of the glass layer is the first or second glass of the present invention. A glass PDP back substrate is provided.
発明の効果  The invention's effect
[0011] カラーフィルタ層が形成されていない PDP前面基板であってその電極被覆ガラス 層が着色成分として CoOおよび NiOのみを含有するものではないものが得られる。 また、バス電極等として銀電極が用いられて 、る PDP前面基板であってその電極 被覆ガラス層の銀電極周辺部分の黄変現象を抑制することが可能になる。  [0011] A PDP front substrate on which no color filter layer is formed, in which the electrode-coated glass layer does not contain only CoO and NiO as coloring components, is obtained. Further, a silver electrode is used as a bus electrode or the like, and it is possible to suppress the yellowing phenomenon in the peripheral portion of the silver electrode of the electrode-covered glass layer of the PDP front substrate.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0012] 本発明の電極被覆用ガラス (以下、単に本発明のガラスという。)を PDP前面基板 の電極被覆ガラス層として用いる場合を中心に以下では説明する。なお、本発明は この場合に限定されない。 The following description will focus on the case where the electrode coating glass of the present invention (hereinafter simply referred to as the glass of the present invention) is used as the electrode coating glass layer of the PDP front substrate. The present invention is not limited to this case.
[0013] 本発明のガラスは通常はガラス粉末にして使用される。たとえば、本発明のガラス の粉末は印刷性を付与するための有機ビヒクル等を用いてガラスペーストとされ、ガ ラス基板上に形成された電極上に前記ガラスペーストを塗布、焼成して電極を被覆 する。ここでいう有機ビヒクルは、ェチルセルロース等のバインダを α—テルビネオ一 ル等の有機溶剤に溶解したものである。あるいは、本発明のガラスの粉末に榭脂、さ らに必要に応じてフイラ一等を混合して得られたスラリーをグリーンシートに成形しこ れを電極が形成されているガラス基板上にラミネート後焼成して電極を被覆する。 [0013] The glass of the present invention is usually used as a glass powder. For example, the glass powder of the present invention is made into a glass paste using an organic vehicle or the like for imparting printability, and the glass paste is applied onto an electrode formed on a glass substrate and baked to coat the electrode. To do. The organic vehicle referred to here is obtained by dissolving a binder such as ethyl cellulose in an organic solvent such as α-tervineol. Alternatively, a slurry obtained by mixing the glass powder of the present invention with a resin and, if necessary, a filler is formed into a green sheet, which is laminated on a glass substrate on which electrodes are formed. After firing, the electrode is coated.
[0014] 本発明のガラスの Tsは 450〜650°Cであることが好ましい。 Tsが 650°C超では、通 常使用されて 、るガラス基板 (ガラス転移点: 550〜620°C)が焼成時に変形するお それがある。 [0014] The Ts of the glass of the present invention is preferably 450 to 650 ° C. If Ts exceeds 650 ° C, the glass substrate (glass transition point: 550 to 620 ° C) that is normally used may be deformed during firing.
ガラス転移点が 610〜630°Cであるようなガラス基板を用いる等の場合には前記 Ts は、好ましく 630°C以下、より好ましくは 550〜600°Cである。  When a glass substrate having a glass transition point of 610 to 630 ° C is used, the Ts is preferably 630 ° C or less, more preferably 550 to 600 ° C.
また、単層構造の電極被覆ガラス層に用いる場合等には前記 Tsは好ましくは 520 °C以上、より好ましくは 550°C以上であり、ガラス転移点が 610〜630°Cであるような ガラス基板を用いる等の場合には前記 Tsは 580°C以上であることが特に好ましい。  In addition, when used for an electrode-coated glass layer having a single layer structure, Ts is preferably 520 ° C or higher, more preferably 550 ° C or higher, and a glass transition point of 610 to 630 ° C. When using a substrate, the Ts is particularly preferably 580 ° C or higher.
[0015] 前記ガラス基板としては通常、 αが 80 X 10一7〜 90 X 10_7Z°Cのものが用いられ る。したがってこのようなガラス基板と膨張特性をマッチングさせ、ガラス基板のそりや 強度の低下を防止するためには、本発明のガラスの aは好ましくは 60 X 10_7〜90 X 10"V°C,より好ましくは 70 X 10_7〜85 X 10_7Z。Cである。 As the glass substrate, those having α of 80 × 10 7 to 90 × 10 _7 Z ° C are usually used. Therefore, in order to match the expansion characteristics with such a glass substrate and prevent warpage of the glass substrate and a decrease in strength, a of the glass of the present invention is preferably 60 X 10 _7 to 90 X 10 "V ° C, More preferably 70 X 10_7 to 85 X 10_7 Z. C.
本発明のガラスは、 Ts力 50〜650°C、 a力 ½0 X 10_7〜90 X 10_7/°Cであるも のであることが好ましい。 The glass of the present invention preferably has a Ts force of 50 to 650 ° C and an a force of ½ 0 X 10 _7 to 90 X 10 _7 / ° C.
[0016] 本発明のガラスの 1MHzにおける比誘電率は典型的には 8〜13である。 [0016] The relative dielectric constant of the glass of the present invention at 1 MHz is typically 8 to 13.
[0017] 本発明のガラスは、 PDPのガラス基板として用いられるガラス基板の上に厚みが 30 〜35 μ mであるガラス層として形成されたとき、そのガラス層が形成されたガラス基板 に対する波長 450nm、 550nm、 630nmの各光の透過率(単位:0 /0)をそれぞれ T When the glass of the present invention is formed as a glass layer having a thickness of 30 to 35 μm on a glass substrate used as a PDP glass substrate, the wavelength of the glass substrate on which the glass layer is formed is 450 nm. , 550 nm, each light transmittance of 630 nm (unit: 0/0), respectively T
45 45
、Τ 、Τ として、 Τ >Τ >Τ または一 2%く(Τ — Τ ) < 0%であること, Τ, Τ, Τ> Τ> Τ or 1% (Τ — Τ) <0%
Ο 550 630 450 550 630 450 550 Ο 550 630 450 550 630 450 550
が好ましい。  Is preferred.
また、 Τ  Also Τ
450、Τ  450 、 Τ
550、Τ はいずれも 65%以上であることが好ましい。  Both 550 and 550 are preferably 65% or more.
630  630
なお、前記ガラス基板としては厚みが 2. 8mmである旭硝子社製 PD200ガラス基 板 (T = 89%、 T = 90%、 T = 88%。)が例示される。  An example of the glass substrate is PD200 glass substrate (T = 89%, T = 90%, T = 88%) manufactured by Asahi Glass Co., Ltd. having a thickness of 2.8 mm.
450 550 630  450 550 630
[0018] 本発明のガラスは、それを銀電極を被覆するガラス層に用いた場合に銀電極周辺 部分の黄変現象が起こりにくいまたは起こらないものであることが好ましい。なお、こ の黄変現象はガラスが茶色または黄色に着色し PDPの画質が低下する現象であり、 銀電極を被覆するガラス層に当該電極の銀が拡散して起こる現象と考えられている。 [0018] When the glass of the present invention is used in a glass layer covering the silver electrode, the periphery of the silver electrode It is preferable that the yellowing phenomenon of the portion hardly occurs or does not occur. This yellowing phenomenon is a phenomenon in which the glass is colored brown or yellow and the image quality of the PDP is lowered. It is considered that the silver of the electrode diffuses into the glass layer covering the silver electrode.
[0019] 次に、本発明のガラスの成分について説明する。なお、たとえば Cuはガラス中にお V、て CuOの形で存在するものとして CuOを成分として扱!、、 CuO換算含有量は Cu Oと略記し、各成分の含有量は Niに対するものを除きモル百分率表示で表す。  Next, the components of the glass of the present invention will be described. For example, Cu is treated as a component in the form of V and CuO in the glass, CuO is treated as a component !, CuO equivalent content is abbreviated as Cu O, and the content of each component is excluding that for Ni Expressed in mole percentage.
[0020] CuOは、 T 、T および Τ について先に示した好ましい関係を実現するための  [0020] CuO is used to realize the preferred relationship shown above for T, T and Τ
450 550 630  450 550 630
成分であり、または、前記黄変現象を起こりにくくするまたは起こらないようにする成 分であり、必須である。 CuOが 0. 05%未満では前記好ましい関係を実現しにくくな り、または前記黄変現象が起こりやすくなり、好ましくは 0. 1%以上である。 CuOが 2 %超ではガラスの透過率が低下し、特に T が低下し、好ましくは 0. 9%以下であり  It is a component, or a component that makes the yellowing phenomenon difficult or does not occur, and is essential. If CuO is less than 0.05%, it is difficult to realize the preferable relationship or the yellowing phenomenon is likely to occur, and is preferably 0.1% or more. If CuO exceeds 2%, the transmittance of the glass is lowered, particularly T is lowered, preferably 0.9% or less.
550  550
、 PbOを 24%以上含有する場合には典型的には 0. 4%以下である。  When the content of PbO is 24% or more, it is typically 0.4% or less.
[0021] CoOは前記好ましい関係を実現するための成分であり、必須である。 CoOが 0. 05 %未満では前記好ましい関係を実現しにくくなり、好ましくは 0. 1%以上であり、 2% 超ではガラスの透過率が低下し、特に T が低下し、好ましくは 1%未満である。 [0021] CoO is a component for realizing the preferable relationship and is essential. If the CoO is less than 0.05%, the above-mentioned preferable relationship is difficult to be realized, preferably 0.1% or more, and if it exceeds 2%, the transmittance of the glass is lowered, particularly T is lowered, preferably less than 1%. It is.
630  630
[0022] CeOは必須ではな 、が、ガラスの色調を黄色方向に調整した 、等の場合には 2%  [0022] CeO is not essential, but in the case of adjusting the color of the glass in the yellow direction, etc., 2%
2  2
まで含有してもよい。 CeO力 2%超ではガラスの透過率が低下し、特に T が低下し  May be contained. If the CeO force exceeds 2%, the transmittance of the glass decreases, and in particular, T decreases.
2 450 2 450
、好ましくは 1%以下である。 CeOを含有する場合その含有量は 0. 1%以上である Preferably, it is 1% or less. When it contains CeO, its content is 0.1% or more
2  2
ことが好ましい。  It is preferable.
[0023] MnOは必須ではな 、が、ガラスの色調を赤色方向に調整した 、等の場合には 2  [0023] MnO is not essential, but in the case of adjusting the color of the glass in the red direction, etc., 2
2  2
%まで含有してもよい。 MnO力 超ではガラスの透過率が低下し、特に T が低  It may be contained up to%. If the MnO force is exceeded, the transmittance of the glass will decrease, and in particular, T will be low.
2 550 下し、好ましくは 1%以下である。 MnOを含有する場合その含有量は 0. 1%以上で  2 550, preferably 1% or less. If it contains MnO, its content should be 0.1% or more.
2  2
あることが好ましぐ典型的には 0. 2%以上である。  It is typically more than 0.2%.
[0024] 本発明のガラスは典型的には、 NiOを含有しな 、、または NiOを含有する場合その 含有量は質量百分率表示で 0. 005%未満である。 [0024] The glass of the present invention typically does not contain NiO, or when NiO is contained, its content is less than 0.005% in terms of mass percentage.
[0025] 本発明の第 1のガラスは、典型的には B O -SiO系ガラスである。 [0025] The first glass of the present invention is typically a B 2 O 3 —SiO glass.
2 3 2  2 3 2
[0026] 次に、本発明の第 2のガラスの成分について説明する。なお、 CuO、 CoO、 CeO  Next, components of the second glass of the present invention will be described. CuO, CoO, CeO
2 および MnOにつ 、ては上記説明と重複するので説明を省略する。 B Oはガラス網目構造形成成分であり、必須である。 B Oが 20%未満ではガラスSince 2 and MnO overlap with the above description, the description is omitted. BO is a glass network structure forming component and is essential. Glass with BO less than 20%
2 3 2 3 2 3 2 3
が不安定になり、好ましくは 26%以上であり、 60%超では Tsが高くなりすぎ、好まし くは 55%以下、典型的には 50%以下である。  Becomes unstable, preferably 26% or more, and if it exceeds 60%, Ts becomes too high, preferably 55% or less, typically 50% or less.
SiOはガラス網目構造形成成分であり、必須である。 SiO力 %未満ではガラスが SiO is a glass network structure forming component and is essential. Less than SiO power%
2 2 twenty two
不安定になり、典型的には 7%以上であり、 50%超では Tsが高くなりすぎ、好ましく は 35%以下、典型的には 26%以下である。  It becomes unstable, typically above 7%, above 50%, the Ts becomes too high, preferably below 35%, typically below 26%.
[0027] PbOおよび ZnOは Tsを低下させる効果を有する成分であり、少なくともいずれか一 方を含有しなければならな 、。 PbOおよび ZnOの含有量の合計が 10%未満では前 記効果が小さぐ典型的には 18%以上であり、 40%超では αが大きくなりすぎるお それがあり、またはガラスが結晶化しやすくなり、好ましくは 35%以下、典型的には 3 0%以下である。 [0027] PbO and ZnO are components having an effect of lowering Ts and must contain at least one of them. If the total content of PbO and ZnO is less than 10%, the above effect is small, typically 18% or more.If it exceeds 40%, α may be too large, or the glass tends to crystallize. , Preferably 35% or less, typically 30% or less.
PbOを含有する場合、その含有量は好ましくは 10〜35%、典型的には 21〜29% である。 PbOが 35%超では (Xが大きくなりすぎるおそれがある。  When PbO is contained, its content is preferably 10 to 35%, typically 21 to 29%. If PbO exceeds 35% (X may become too large.
ZnOを含有する場合、その含有量は好ましくは 10〜30%、典型的には 15〜25% である。 ZnOが 30%超ではガラスが結晶化しやすくなる。  When ZnO is contained, its content is preferably 10-30%, typically 15-25%. If ZnO exceeds 30%, the glass tends to crystallize.
[0028] Al Oは必須ではないが、ガラスをより安定ィ匕させたい等の場合には 15%まで含有 [0028] Al O is not indispensable, but up to 15% is included for more stable glass.
2 3  twenty three
してもよい。 Al Oが 15%超ではガラスが結晶化しやすくなり、好ましくは 10%以下、  May be. If AlO exceeds 15%, the glass tends to crystallize, preferably 10% or less,
2 3  twenty three
典型的には 8%以下である。 Al Oを含有する場合その含有量は好ましくは 1%以上  Typically less than 8%. When Al O is contained, its content is preferably 1% or more
2 3  twenty three
、典型的には 3%以上である。  Typically 3% or more.
[0029] SrOおよび BaOは!、ずれも必須ではな 、が、 aを大きくした 、等の場合には合計 で 20%までの範囲で含有してもよい。前記合計が 20%超では aが大きくなりすぎる おそれがあり、好ましくは 16%以下である。 SrOおよび BaOの少なくともいずれか一 方を含有する場合、 SrOおよび BaOの含有量の合計は 5%以上であることが好ましく 、典型的には 8%以上である。また、その場合には BaOを含有することが好ましい。 [0029] SrO and BaO are !, and the deviation is not essential, but if a is increased, etc., it may be contained in a total range of up to 20%. If the total exceeds 20%, a may be too large, preferably 16% or less. When at least one of SrO and BaO is contained, the total content of SrO and BaO is preferably 5% or more, and typically 8% or more. In that case, BaO is preferably contained.
BaOを含有する場合、その含有量は典型的には 8〜16%である。  When BaO is contained, its content is typically 8 to 16%.
SrOを含有する場合、その含有量は典型的には 10%以下である。  When SrO is contained, its content is typically 10% or less.
[0030] TiOは必須ではないが、比誘電率を大きくしたい等の場合には 10%まで含有して [0030] TiO is not essential, but if you want to increase the relative dielectric constant, etc., up to 10% is included.
2  2
もよい。 TiOが 10%超ではガラスが結晶化しやすくなり、典型的には 7%以下である 。 TiOを含有する場合その含有量は好ましくは 1%以上、典型的には 3%以上であAlso good. If TiO exceeds 10%, the glass tends to crystallize, typically 7% or less. . When TiO is contained, its content is preferably 1% or more, typically 3% or more.
2 2
る。  The
Bi Oは必須ではないが、 Tsを低下させたい、比誘電率を大きくしたい等の場合に Bi O is not essential, but you want to lower Ts or increase the relative permittivity.
2 3 twenty three
は 9%まで含有してもよい。 Bi O力 S9%超ではひが大きくなりすぎるおそれがあり、典  May contain up to 9%. If the Bi O force exceeds S9%, there is a risk that the strain will be too large.
2 3  twenty three
型的には 4%以下である。 Bi Oを含有する場合その含有量は好ましくは 1%以上で  The type is 4% or less. If it contains BiO, its content is preferably 1% or more.
2 3  twenty three
ある。  is there.
[0031] Li 0、 Na Oおよび Κ Οはいずれも必須ではないが、 Tsを低下させたい等の場合  [0031] Li 0, Na O and Κ い ず れ are not essential, but you want to lower Ts
2 2 2  2 2 2
には合計で 16%までの範囲で含有してもよい。前記合計が 16%超では αが大きく なりすぎるおそれがあり、好ましくは 9%以下である。 Li 0、 Na Oおよび Κ Οのいず  May contain up to 16% in total. If the total exceeds 16%, α may be too large, preferably 9% or less. Li 0, Na O and Κ Izu no Izu
2 2 2 れか一種以上を含有する場合、これら 3成分の含有量の合計は好ましくは 2%以上、 典型的には 3%以上である。また、その場合、典型的には Li Oを含有する。  In the case of containing one or more of 2 2 2, the total content of these three components is preferably 2% or more, and typically 3% or more. In that case, it typically contains Li 2 O.
2  2
Li Oを含有する場合その含有量は典型的には 2〜9%である。  When Li 2 O is contained, its content is typically 2-9%.
2  2
Na Oおよび K Oの少なくともいずれか一方を含有する場合それらの含有量の合 When containing at least one of Na 2 O and K 2 O
2 2 twenty two
計は典型的には 10%以下である。  The total is typically less than 10%.
[0032] 本発明の第 2のガラスは本質的に上記成分力もなる力 本発明の目的を損なわな[0032] The second glass of the present invention has essentially the above component force.
V、範囲でその他の成分を含有してもよ!/、。その場合そのような成分の含有量の合計 は 10%以下であることが好ましい。 V, may contain other components in the range! / ,. In that case, the total content of such components is preferably 10% or less.
[0033] 本発明の第 2のガラスの好ましい態様として、 B O力 0〜55%、 PbOが 10〜35 [0033] As a preferred embodiment of the second glass of the present invention, B 2 O force 0-55%, PbO 10-35
2 3  twenty three
%、 ZnOが 0〜10%、 SrOが 0〜15%であるものが挙げられる。  %, ZnO is 0 to 10%, and SrO is 0 to 15%.
また、別の好ましい態様として、 B O力 20〜50%、 SiO力 〜 35%、 ZnOが 10〜  Further, as another preferred embodiment, B 2 O force 20 to 50%, SiO force ~ 35%, ZnO 10 ~
2 3 2  2 3 2
30%、 Al O力^〜 10%、 SrO力^)〜 10%、 BaOが 0〜16%、 Na O+K Oが 0〜1  30%, Al O force ^ ~ 10%, SrO force ^) ~ 10%, BaO 0 ~ 16%, Na O + K O 0 ~ 1
2 3 2 2  2 3 2 2
0%であり、 PbOを含有しないものが挙げられる。  Examples include 0% and no PbO.
[0034] 次に、本発明の PDP前面基板の製造方法について説明する。 Next, a method for manufacturing the PDP front substrate of the present invention will be described.
ガラス基板上に形成された透明電極とバス電極を被覆するように本発明のガラスの 粉末を含有する層を形成する。  A layer containing the glass powder of the present invention is formed so as to cover the transparent electrode and the bus electrode formed on the glass substrate.
前記透明電極は、たとえば幅 0. 5mmの帯状であり、それぞれの帯状電極が互い に平行となるように形成される。各帯状電極中心線間の距離は、たとえば 0. 83〜: L Ommであり、この場合、透明電極がガラス基板表面を占める割合は 50〜60%であ る。 The transparent electrode has, for example, a strip shape with a width of 0.5 mm, and is formed so that the strip electrodes are parallel to each other. The distance between each strip electrode center line is, for example, 0.83 ~: L Omm. In this case, the ratio of the transparent electrode to the glass substrate surface is 50 ~ 60%. The
また、バス電極は透明電極に対応するように形成され、銀または Cr— Cu— Crから なることが一般的である。  The bus electrode is formed to correspond to the transparent electrode and is generally made of silver or Cr—Cu—Cr.
[0035] 前記本発明のガラスの粉末を含有する層の形成は、印刷法を用いる場合には本発 明のガラスの粉末に必要であればフイラ一等を添加した上で榭脂、溶剤等と混合し てガラスペーストとしこれを透明電極が形成されて 、るガラス基板に塗布して行 、、グ リーンシート法を用いる場合には前記ガラスの粉末に樹脂、さらに必要に応じてフイラ 一等を混合して得られたスラリーをグリーンシートに成形しこれを電極が形成されてい るガラス基板上にラミネートして行う。  [0035] When the printing method is used, the layer containing the glass powder of the present invention is formed by adding a filler or the like to the glass powder of the present invention, if necessary, and then adding a resin, a solvent, etc. When a green sheet method is used, a resin is added to the glass powder and, if necessary, a filler, etc. The slurry obtained by mixing these is formed into a green sheet and laminated on a glass substrate on which an electrode is formed.
[0036] 前記本発明のガラスの粉末を含有する層が形成されたガラス基板は加熱され、当 該層は焼成されて電極被覆ガラス層となり、その後この電極被覆ガラス層の上に保 護膜として酸ィ匕マグネシウムの層が形成され、 PDP前面基板とされる。  [0036] The glass substrate on which the layer containing the glass powder of the present invention is formed is heated, and the layer is baked to become an electrode-coated glass layer, and then as a protective film on the electrode-coated glass layer. A layer of magnesium oxide is formed and used as the PDP front substrate.
なお、以上の説明において示した構成等は例であり、本発明の PDP前面基板はこ れに限定されない。  The configuration shown in the above description is an example, and the PDP front substrate of the present invention is not limited to this.
[0037] 本発明の PDP背面基板は、本発明の PDP前面基板の製造方法に準じて製造され る。すなわち、ガラス基板上のアドレス電極を被覆する本発明のガラスの粉末を含有 する層は、本発明の PDP前面基板の製造方法におけると同様にして形成される。 アドレス電極は銀または Cr—Alからなることが一般的である。  [0037] The PDP rear substrate of the present invention is manufactured according to the method for manufacturing the PDP front substrate of the present invention. That is, the layer containing the glass powder of the present invention that covers the address electrodes on the glass substrate is formed in the same manner as in the method for producing the PDP front substrate of the present invention. The address electrode is generally made of silver or Cr—Al.
[0038] 本発明の PDP背面基板の電極被覆ガラス層に光反射性、遮光性等を付与した 、 場合には、前記本発明のガラスの粉末を含有する層にフィラー (顔料を含む。)を含 有することが好ましい場合がある。なお、顔料としては、 Al、 Si、 Ti、 Cr、 Mn、 Coおよ び Cuからなる群力も選ばれる 1以上の元素を含有するものであることが一般的である 前記好ましい場合において本発明のガラスの粉末を含有する層がフイラ一として顔 料を含む場合、本発明のガラスの粉末を 100質量部として顔料を 0. 5〜40質量部 の割合で含むものであることが好まし 、。  [0038] In the case where the electrode-coated glass layer of the PDP back substrate of the present invention is provided with light reflectivity, light shielding property, etc., a filler (including a pigment) is added to the layer containing the glass powder of the present invention. It may be preferable to include it. The pigment generally contains one or more elements selected from the group force consisting of Al, Si, Ti, Cr, Mn, Co, and Cu. When the glass powder-containing layer contains a pigment as a filler, the glass powder of the present invention is preferably 100 parts by mass and the pigment is preferably contained in a proportion of 0.5 to 40 parts by mass.
実施例  Example
[0039] 表の B Oから MnOまでの欄にモル百分率表示で示す組成となるように、原料を 調合して混合し、 1100〜 1350°Cの電気炉中で白金ルツボを用いて 1時間溶融し、 薄板状ガラスに成形した後、ボールミルで粉砕し、ガラス粉末を得た。例 1〜17は実 施例、例 18は比較例である。 [0039] In the table, the raw materials are selected so that the composition is expressed in terms of mole percentage in the columns from BO to MnO. They were mixed and mixed, melted in a 1100-1350 ° C electric furnace using a platinum crucible for 1 hour, formed into a sheet glass, and then pulverized with a ball mill to obtain a glass powder. Examples 1 to 17 are working examples, and Example 18 is a comparative example.
[0040] これらガラス粉末について、軟化点 Ts (単位:。 C)、 50〜350°Cにおける平均線膨 張係数 α (単位: 10_7Z°C)、 1MHzでの比誘電率 εを以下に述べるようにして測定 した。結果を表に示す。 [0040] For these glass powders, the softening point Ts (unit: C), the average linear expansion coefficient α (unit: 10 _7 Z ° C) at 50 to 350 ° C, and the relative dielectric constant ε at 1 MHz are as follows: Measurements were made as described. The results are shown in the table.
Ts: 800°Cまでの範囲で示差熱分析計を用いて測定した。  Ts: Measured with a differential thermal analyzer in the range up to 800 ° C.
a:ガラス粉末を加圧成形後、 Tsより 30°C高い温度で 10分間焼成して得た焼成体 を直径 5mm、長さ 2cmの円柱状に加工し、熱膨張計で 50〜350°Cにおける平均線 膨張係数を測定した。  a: After pressing the glass powder, the fired body obtained by firing for 10 minutes at a temperature 30 ° C higher than Ts is processed into a cylindrical shape with a diameter of 5mm and a length of 2cm. The average coefficient of linear expansion was measured.
ε:ガラス粉末を再溶融し板状に成形後、カロ工して 50mm X 50mm、厚み 3mmの 測定試料とした。測定試料の両面にアルミニウム電極を蒸着により作製し、 LCRメー タを用いて周波数 1MHzでの比誘電率を測定した。  ε: Glass powder was re-melted and formed into a plate shape, then calendered to obtain a measurement sample of 50 mm X 50 mm and thickness 3 mm. Aluminum electrodes were fabricated on both sides of the measurement sample by vapor deposition, and the relative dielectric constant at a frequency of 1 MHz was measured using an LCR meter.
[0041] また、前記ガラス粉末 lOOgを有機ビヒクル 25gと混練してガラスペーストを作製した 。なお、有機ビヒクルは、 a テルビネオールにェチルセルロースを質量百分率表示 で 12%溶解して作製した。 [0041] Further, the glass powder lOOg was kneaded with 25 g of an organic vehicle to prepare a glass paste. The organic vehicle was prepared by dissolving 12% by mass percentage of ethyl cellulose in a tervineol.
次に、大きさ 50mmX 75mm、厚み 2. 8mmのガラス基板(旭硝子社製 PD200)を 用意し、このガラス基板の表面 48mm X 73mmの部分にスクリーン印刷用銀ペースト を印刷し焼成して銀層を形成した。なお、前記ガラス基板は、質量百分率表示組成 1S SiO 58%、 Al O 7%、 Na O 4%、 K O 6. 5%、 MgO 2%、 CaO 5% Next, prepare a glass substrate (PD200 manufactured by Asahi Glass Co., Ltd.) with a size of 50mm x 75mm and a thickness of 2.8mm. Print a silver paste for screen printing on the 48mm x 73mm part of the surface of this glass substrate and burn it to form a silver layer. Formed. The glass substrate has a mass percentage display composition 1S SiO 58%, AlO 7%, NaO 4%, KO 6.5%, MgO 2%, CaO 5%
2 2 3 2 2 2 2 3 2 2
、 SrO 7%、 BaO 7. 5%、 ZrO 3%、であり、またガラス転移点が 626°C、 aが 8  SrO 7%, BaO 7.5%, ZrO 3%, glass transition point 626 ° C, a 8
2  2
3 X 10"V°C,であるガラス力もなる。  The glass power is also 3 X 10 "V ° C.
[0042] このように銀層が形成されたガラス基板と、銀層が形成されていないガラス基板とを 用意し、それぞれの 50mm X 50mmの部分に前記ガラスペーストを均一にスクリーン 印刷後、 120°Cで 10分間乾燥した。これらガラス基板を昇温速度 10°CZ分で温度 が Tsに達するまで加熱し、さらにその温度を Tsに 30分間保持して焼成した。このよう にしてガラス基板上に形成されたガラス層の厚みは 30〜35 μ mであった。  [0042] A glass substrate on which a silver layer is thus formed and a glass substrate on which no silver layer is formed are prepared, and the glass paste is uniformly screen-printed on each 50 mm x 50 mm portion, and then 120 ° Dry at C for 10 minutes. These glass substrates were heated at a temperature increase rate of 10 ° CZ until the temperature reached Ts, and the temperature was maintained at Ts for 30 minutes for firing. The thickness of the glass layer thus formed on the glass substrate was 30 to 35 μm.
[0043] 銀層が形成されて!、な 、ガラス基板上に前記ガラス層が形成された試料につ!、て 、波長 450nm、 550nm、 630nmの光の透過率 T (単位:0 /。)、 T (単位:0 /。)、 Τ [0043] A silver layer is formed! For a sample in which the glass layer is formed on a glass substrate! Te , Wavelength 450nm, 550nm, 630nm light transmittance T (unit: 0 /.), T (unit: 0 /.), Τ
450 550  450 550
(単位:%)を以下に述べるようにして測定した。  (Unit:%) was measured as described below.
630  630
Τ 、Τ 、Τ :日立製作所社製の積分球型自記分光光度計 U— 3500を用いて Τ, Τ, Τ: Using an integrating sphere self-recording spectrophotometer U-3500 manufactured by Hitachi, Ltd.
450 550 630 450 550 630
波長 450nm、 550nm、 630nmの光の透過率を測定した(試料のない状態を 100% とした。)。  The transmittance of light having wavelengths of 450 nm, 550 nm, and 630 nm was measured (the state without the sample was taken as 100%).
[0044] また、銀層が形成されたガラス基板上に前記ガラス層が形成された試料について 黄変現象の有無を調べた。その結果、例 1〜 18のいずれのガラス層の色も無色、青 色または青緑色であり、ガラス層の色が茶色または黄色となる黄変現象は認められな かった。  [0044] Further, the presence or absence of the yellowing phenomenon was examined for the sample in which the glass layer was formed on the glass substrate on which the silver layer was formed. As a result, the color of any glass layer in Examples 1 to 18 was colorless, blue or turquoise, and no yellowing phenomenon was observed in which the color of the glass layer was brown or yellow.
[0045] [表 1]  [0045] [Table 1]
Figure imgf000011_0001
Figure imgf000011_0001
[0046] [表 2]
Figure imgf000012_0001
産業上の利用可能性
[0046] [Table 2]
Figure imgf000012_0001
Industrial applicability
本発明のガラスは PDPの前面または背面基板の電極被覆に利用できる。  The glass of the present invention can be used for electrode coating on the front or back substrate of a PDP.
また、本発明の PDP前面基板および PDP背面基板は PDPの製造に利用できる。 なお、 2005年 1月 14日に出願された日本特許出願 2005— 7898号の明細書、特 許請求の範囲、図面及び要約書の全内容をここに引用し、本発明の明細書の開示と して、取り入れるものである。  Further, the PDP front substrate and the PDP rear substrate of the present invention can be used for manufacturing PDP. The entire contents of the specification, patent claims, drawings and abstract of Japanese Patent Application No. 2005-7898 filed on January 14, 2005 are incorporated herein by reference. And that is what we take in.

Claims

請求の範囲 The scope of the claims
[1] Cuおよび Coを含有し、 Cuの CuO換算含有量が 0. 05〜2モル0 /0かつ Coの CoO 換算含有量が 0. 05〜2モル%である電極被覆用ガラス。 [1] contains Cu and Co, is from 0.05 to 2 moles calculated as CuO content of Cu 0/0 and glass for covering electrodes terms of CoO content of Co is 05 to 2 mol% 0.1.
[2] Ceを含有し、その CeO換算含有量が 2モル%以下である請求項 1に記載の電極 [2] The electrode according to claim 1, which contains Ce and has a CeO equivalent content of 2 mol% or less.
2  2
被覆用ガラス。  Glass for coating.
[3] Mnを含有し、その MnO換算含有量が 2モル%以下である請求項 1または 2に記  [3] The composition according to claim 1 or 2, wherein Mn is contained and the MnO equivalent content is 2 mol% or less.
2  2
載の電極被覆用ガラス。  The electrode coating glass.
[4] B O— SiO系ガラスである請求項 1、 2または 3に記載の電極被覆用ガラス。 [4] The electrode coating glass according to claim 1, 2 or 3, wherein the glass is a B 2 O—SiO-based glass.
2 3 2  2 3 2
[5] 下記酸化物基準のモル百分率表示で、 B O 20〜60%、 SiO 5〜50%、 PbO  [5] In terms of mole percentages based on the following oxides, B O 20-60%, SiO 5-50%, PbO
2 3 2  2 3 2
+ΖηΟ 10〜40%、Α1 Ο 0〜15%、 SrO + BaO 0〜20%、 TiO 0〜10%、  + ΖηΟ 10-40%, Α1 Ο 0-15%, SrO + BaO 0-20%, TiO 0-10%,
2 3 2  2 3 2
Bi O 0〜9%、Li O+Na O+K O 0〜16%、 CuO 0. 05〜2%、 CoO 0. 0 Bi O 0-9%, Li O + Na O + K O 0-16%, CuO 0.05--2%, CoO 0.0
2 3 2 2 2 2 3 2 2 2
5〜2%、 CeO 0〜2%、 MnO 0〜2%、力 本質的になる電極被覆用ガラス。  5 to 2%, CeO 0 to 2%, MnO 0 to 2%, force Essential glass for electrode coating.
2 2  twenty two
[6] B O力 ^20〜55%、 PbO力 0〜35%、 ZnOが 0〜10%、 SrOが 0〜15%である  [6] B O force ^ 20-55%, PbO force 0-35%, ZnO 0-10%, SrO 0-15%
2 3  twenty three
請求項 5に記載の電極被覆用ガラス。  6. The electrode coating glass according to claim 5.
[7] B O力 0〜50%、 SiO力 〜 35%、 ZnOが 10〜30%、 Al O力^〜 10%、 SrO [7] B O force 0 ~ 50%, SiO power ~ 35%, ZnO 10 ~ 30%, Al O power ^ ~ 10%, SrO
2 3 2 2 3  2 3 2 2 3
力 S〇〜10%、 BaOが 0〜16%、 Na O+K Oが 0〜10%であり、 PbOを含有しない  Force S 0-10%, BaO 0-16%, Na O + K O 0-10%, not containing PbO
2 2  twenty two
請求項 5に記載の電極被覆用ガラス。  6. The electrode coating glass according to claim 5.
[8] Niを含有しない、または Niを含有しその NiO換算含有量が質量百分率表示で 0. [8] Does not contain Ni or contains Ni and its NiO equivalent content is 0.
005%未満である請求項 1〜7のいずれかに記載の電極被覆用ガラス。  The electrode coating glass according to any one of claims 1 to 7, which is less than 005%.
[9] 透明電極が形成されて 、るガラス基板がガラス層によって被覆されて 、るプラズマ ディスプレイパネル前面基板であって、ガラス層のガラスが請求項 1〜8の!、ずれか に記載の電極被覆用ガラスであるプラズマディスプレイパネル前面基板。 [9] The transparent electrode is formed, the glass substrate is covered with a glass layer, and is a plasma display panel front substrate, wherein the glass layer glass is the electrode according to any one of claims 1 to 8! Plasma display panel front substrate, which is glass for coating.
[10] 電極が形成されて ヽるガラス基板がガラス層によって被覆され、そのガラス層の上 に隔壁が形成されて 、るプラズマディスプレイパネル背面基板であって、ガラス層の ガラスが請求項 1〜8のいずれか〖こ記載の電極被覆用ガラスであるプラズマディスプ レイパネル背面基板。 [10] A plasma display panel rear substrate in which a glass substrate on which an electrode is formed is covered with a glass layer, and a partition is formed on the glass layer, wherein the glass of the glass layer is a glass substrate. 8. A plasma display panel rear substrate, which is the electrode coating glass according to any one of 8 above.
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JP2002362941A (en) * 2001-06-07 2002-12-18 Asahi Glass Co Ltd Glass frit and method of coating aluminum electrode
JP2003267751A (en) * 2002-01-10 2003-09-25 Matsushita Electric Ind Co Ltd Glass composition for coating electrode, paint for forming glass to coat electrode, plasma display panel using it and its manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000331616A (en) * 1999-05-20 2000-11-30 Fujitsu Ltd Gas discharge indicating panel and manufacture of indicating panel
JP2002362941A (en) * 2001-06-07 2002-12-18 Asahi Glass Co Ltd Glass frit and method of coating aluminum electrode
JP2003267751A (en) * 2002-01-10 2003-09-25 Matsushita Electric Ind Co Ltd Glass composition for coating electrode, paint for forming glass to coat electrode, plasma display panel using it and its manufacturing method

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