WO2003100923A2 - Production of integrated optical waveguides with solvent extraction - Google Patents
Production of integrated optical waveguides with solvent extraction Download PDFInfo
- Publication number
- WO2003100923A2 WO2003100923A2 PCT/IE2003/000083 IE0300083W WO03100923A2 WO 2003100923 A2 WO2003100923 A2 WO 2003100923A2 IE 0300083 W IE0300083 W IE 0300083W WO 03100923 A2 WO03100923 A2 WO 03100923A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- modifier
- waveguide
- region
- substrate
- sol
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00663—Production of light guides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0833—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using actinic light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
- B29C2071/0027—Removing undesirable residual components, e.g. solvents, unreacted monomers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
- B29C2071/0054—Supercritical fluid treatment, i.e. using a liquid in which distinct liquid and gas phases do not exist
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
- B29C35/0894—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds provided with masks or diaphragms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
- B29L2011/0075—Light guides, optical cables
Definitions
- the invention relates to planar waveguides.
- Planar waveguides are typically produced by deposition of buffer, guiding, and cladding layers on a substrate.
- the guiding layer is selectively treated to define guiding cores having a greater refractive index than the surrounding buffer and cladding layers.
- the buffer layer is typically deposited on a silicon wafer substrate, and the deposition method is often spin or dip coating and drying.
- the guiding layer is advantageously a sol-gel material which is photo-sensitive due to addition of a photo-initiator species.
- the guiding cores are advantageously defined by photo- induced cross-linking reactions.
- the cladding layer is typically deposited by spin coating, dip coating, or casting.
- US5080962 describes production of an optical device in which a waveguide is formed by partial densification of an SiO 2 gel. This document describes internal waveguides (in Fig. 6), producing using a multi-layered body.
- the invention is therefore directed towards providing a process for producing a planar waveguide in which there is less potential for defects to arise. Another object is to provide a simpler process.
- a method of producing a waveguide comprising the steps of providing a body of material and selectively treating the material to define an internal guiding core and an integral surrounding cladding within the body.
- the method comprises the steps of impregnating the material with a refractive index modifier, and selectively removing modifier from the material to define the core and the integral cladding.
- the core is defined by exposing a discrete region of the material to actinic radiation to densify a region of the material, removing modifier to a greater extent from the non-densified region, and subsequently removing modifier from part of the densified region adjacent an exposed surface of the body.
- the modifier is removed from said part of the region by solvent extraction.
- a supercritical fluid extraction system is used to remove said modifier.
- the body is exposed to radiation in a manner whereby the densified region does not extend to a surface of the material on the opposite side to that exposed to the radiation.
- the invention comprises the further step of performing solvent extraction over a shallow depth below the exposed surface before radiation exposure.
- the invention comprises the further step of baking the body after radiation exposure to ensure desired densification without over-heating during radiation exposure.
- the material is a sol-gel.
- the sol-gel is spun onto a substrate.
- the substrate is a silicon wafer.
- the sol-gel material is a condensation product of 3- glycidoxypropyl-trimethoxysilane, dimethyl-diethoxysilane and diphenyl- dimethoxysilane.
- the photoinitiator is a triarylsulphonium hexafluoroantimonate salt.
- the body is a film and the waveguide is a planar waveguide.
- the film is formed on a sacrificial substrate, and said substrate is subsequently removed.
- the material is a polymer.
- the invention also provides a production system comprising means for producing a waveguide in a method as defined above.
- Figs. 1 to 3 are diagrammatic cross-sectional elevational views of material on a substrate being formed into a planar waveguide;
- Fig. 4 is a set of plot of photoinitiator absorption vs. UV wavelength plots for different photoinitiator concentrations.
- a single homogenous body of material for example, a polymer or a sol-gel
- a single homogenous body of material for example, a polymer or a sol-gel
- the material is a sol-gel material and the process of our
- European Patent Application No. 1209492 is used to define a region having a greater refractive index by UV exposure.
- the contents of this patent specification are incorporated herein by reference.
- the greater refractive index region has an exposed surface.
- the material is subsequently treated to modify the upper part of this region so that it has a refractive index similar to that of the laterally surrounding material.
- This treatment involves a solvent extraction process using a supercritical fluid (SCF) extraction system.
- SCF is a fluid that has been heated and compressed above its critical temperature and pressure. At these conditions SCFs have densities greater than gases but comparable to those of liquids, enabling them to function as highly efficient solvents. As a result, reduced sample preparation time and increased rate of recovery are usually observed as compared to classical solvent extraction.
- the SCF removes the refractive index modifier close to the exposed surface.
- this part of the region is most easily accessible to the solvent.
- the upper part of the region becomes effectively an integral cladding.
- the region does not extend downwardly fully to the substrate. Therefore the final guiding core is physically isolated and embedded within the material, having an integral cladding above and below.
- a film 1 of an epoxy-functionalised silica sol-gel material is deposited by spin coating on a silicon wafer substrate to a depth of 50 microns.
- a refractive index modifier in this embodiment from the silicon alkoxide containing phenyl groups, (diphenyl-dimethoxysilane) is added to the sol-gel before deposition on the substrate.
- the film 1 is then partially gelled (densified) by heating at a temperature of 100°C for 30 minutes.
- the radiation dosage is 15 light units from a DEK 1600 Exposure System (DEK Printing Machines Ltd., Weymouth, Dorset,U.K.). This machine has a broadband UV, non-collimated light source.
- the measured intensities at 365 and 405nm are 7.6 mW/cm 2 and 25.7 mW/cm 2 respectively.
- the light unit detector provides the same dose of radiation over a prolonged period by accounting for the loss of efficiency of the UN lamp. It is believed that 15 light units is equivalent to 25 seconds exposure.
- a solvent extraction process is then used to remove the refractive index modifier species to a greater extent outside of the region 2.
- the solvent is for example iso- propyl-alcohol. This is indicated by the absence of hatching in Fig. 3.
- the refractive index modifier in the upper part of the region 2 is removed using a different solvent extraction system.
- the supercritical fluid (SCF) extraction system is used. Extractions are performed in C0 2 at temperatures from 298.15-318.5K and pressures in the range 75-178 bar.
- the process results in a smaller densified region 4, with a greater concentration of refractive index modifier specifies.
- an extraction step immediately after heating (curing) the sol-gel.
- This extraction step removes the sol material near the surface.
- Such extraction is performed by immersing in iso-propyl-alcohol for 1 minute.
- the waveguide area is then exposed to UN as shown in Fig. 2 with an intensity and duration of 15 light units from a DEK 1600 Exposure System (DEK Printing Machines Ltd., Weymouth, Dorset, U.K.), as detailed above.
- the film is then baked at 90°C for approximately 30 mins. This is to allow the activated photo-initiator produced by the UN radiation the opportunity to react with the epoxy moieties.
- Unstrained epoxy moieties of the kind used in the example formulation are insufficiently reactive to react appreciably at room temperature.
- a second solvent extraction step using SCF as for the first embodiment to ensure that all of the cladding volume has the same refractive index.
- the first extraction step may be performed so that the material above the waveguide has a graded index.
- Fig. 4 a plot of photoinitiator absorption vs. UN wavelength is illustrated for photoinitiator concentrations of 0.025 g/1, 0.05 g/1, and 1.0 g/1. These plots are used to choose an optimum UV source to achieve the desired depth of cross-linking, thereby setting the depth of the cladding space below the waveguide. Looking at the curve in figure 4, we expect the highest absorption of UV radiation to occur at a wavelength around 310nm, depending on photo-initiator concentration.
- UV radiation will not penetrate the entire film depth. This ensures fabrication of a 'bottom' cladding region within the same film.
- a 365nm UV source can be used in conjunction with a photoinitiator that has a maximum absorption at this wavelength.
- a polymer may be used instead. This would be achieved by spin coating, dip- coating or casting a layer of suitable photo-crosslinkable polymer material onto a substrate. This layer would then be dried and processed in the same manner as for a sol-gel.
- the waveguide need not necessarily be on a substrate. This could be achieved by depositing the material onto a sacrificial substrate and subsequently removing the substrate by a dissolution process. This provides a freestanding film which is free from stress induced by differential thermal expansion of the substrate and the material.
- the invention provides an integral planar waveguide, thus avoiding the problems associated with binding of multiple layers. Also, because the process is performed with only one layer, it is simpler and more repeatable.
- the waveguide may not be planar.
- it may alternatively be a fibre.
- the fibre may be dipped for solvent extraction around the periphery.
- the invention is particularly applicable to waveguide materials which do not have good inter-layer bonding properties, such as fluorinated polymers and any silicon-containing polymers.
- the material may be a polymer rather than a sol-gel.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Optical Integrated Circuits (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003273134A AU2003273134A1 (en) | 2002-05-23 | 2003-05-23 | Production of integrated optical waveguides with solvent extraction |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IE20020414 | 2002-05-23 | ||
IE2002/0414 | 2002-05-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003100923A2 true WO2003100923A2 (en) | 2003-12-04 |
WO2003100923A3 WO2003100923A3 (en) | 2004-03-18 |
Family
ID=29560343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IE2003/000083 WO2003100923A2 (en) | 2002-05-23 | 2003-05-23 | Production of integrated optical waveguides with solvent extraction |
Country Status (2)
Country | Link |
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AU (1) | AU2003273134A1 (en) |
WO (1) | WO2003100923A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8649645B2 (en) | 2011-06-10 | 2014-02-11 | Xyratex Technology Limited | Optical waveguide and a method of fabricating an optical waveguide |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5932397A (en) * | 1996-05-28 | 1999-08-03 | Rvm Scientific, Inc. | Multicolor lithography for control of three dimensional refractive index gradient processing |
US6054253A (en) * | 1997-10-10 | 2000-04-25 | Mcgill University-The Royal Institute For The Advancement Of Learning | Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon |
-
2003
- 2003-05-23 AU AU2003273134A patent/AU2003273134A1/en not_active Abandoned
- 2003-05-23 WO PCT/IE2003/000083 patent/WO2003100923A2/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5932397A (en) * | 1996-05-28 | 1999-08-03 | Rvm Scientific, Inc. | Multicolor lithography for control of three dimensional refractive index gradient processing |
US6054253A (en) * | 1997-10-10 | 2000-04-25 | Mcgill University-The Royal Institute For The Advancement Of Learning | Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8649645B2 (en) | 2011-06-10 | 2014-02-11 | Xyratex Technology Limited | Optical waveguide and a method of fabricating an optical waveguide |
Also Published As
Publication number | Publication date |
---|---|
IE20030392A1 (en) | 2003-11-26 |
WO2003100923A3 (en) | 2004-03-18 |
AU2003273134A8 (en) | 2003-12-12 |
AU2003273134A1 (en) | 2003-12-12 |
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