WO2003021665A1 - Contenant destine a un substrat de precision - Google Patents
Contenant destine a un substrat de precision Download PDFInfo
- Publication number
- WO2003021665A1 WO2003021665A1 PCT/JP2002/008652 JP0208652W WO03021665A1 WO 2003021665 A1 WO2003021665 A1 WO 2003021665A1 JP 0208652 W JP0208652 W JP 0208652W WO 03021665 A1 WO03021665 A1 WO 03021665A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- container
- precision substrate
- component
- ppb
- argon gas
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 4
- 229910052786 argon Inorganic materials 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 1
- 239000011368 organic material Substances 0.000 abstract 1
- 238000010186 staining Methods 0.000 abstract 1
- 229920005992 thermoplastic resin Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
- H01L21/67306—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by a material, a roughness, a coating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
- H01L21/67316—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements characterized by a material, a roughness, a coating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
- H01L21/67323—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
- H01L21/6733—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67353—Closed carriers specially adapted for a single substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67386—Closed carriers characterised by the construction of the closed carrier
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/1303—Paper containing [e.g., paperboard, cardboard, fiberboard, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
- Y10T428/1355—Elemental metal containing [e.g., substrate, foil, film, coating, etc.]
- Y10T428/1359—Three or more layers [continuous layer]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
- Y10T428/1386—Natural or synthetic rubber or rubber-like compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
- Y10T428/139—Open-ended, self-supporting conduit, cylinder, or tube-type article
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02760759A EP1429380A4 (en) | 2001-08-28 | 2002-08-28 | CONTAINER FOR PRECISION SUBSTRATE |
JP2003525903A JP4470017B2 (ja) | 2001-08-28 | 2002-08-28 | 精密基板用容器 |
US10/487,840 US7781035B2 (en) | 2001-08-28 | 2002-08-28 | Container for precision substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001257460 | 2001-08-28 | ||
JP2001-257460 | 2001-08-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003021665A1 true WO2003021665A1 (fr) | 2003-03-13 |
Family
ID=19085116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/008652 WO2003021665A1 (fr) | 2001-08-28 | 2002-08-28 | Contenant destine a un substrat de precision |
Country Status (4)
Country | Link |
---|---|
US (1) | US7781035B2 (ja) |
EP (1) | EP1429380A4 (ja) |
JP (1) | JP4470017B2 (ja) |
WO (1) | WO2003021665A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005173556A (ja) * | 2003-11-18 | 2005-06-30 | Net Plastic:Kk | 大型精密シート状(半)製品用密封容器 |
WO2008026733A1 (fr) | 2006-08-31 | 2008-03-06 | Zeon Corporation | Polymères de polymérisation par ouverture de cycle à base de norbornène hydrogéné, composition de résine et objets moulés |
WO2008062564A1 (fr) * | 2006-11-24 | 2008-05-29 | Sumitomo Electric Industries, Ltd. | Organe disposé dans un contenant de stockage de tranches et procédé de fabrication d'un tel organe |
JP2008141131A (ja) * | 2006-12-05 | 2008-06-19 | Shin Etsu Polymer Co Ltd | ウェーハ輸送ケース |
JP2011018771A (ja) * | 2009-07-09 | 2011-01-27 | Shin Etsu Polymer Co Ltd | 基板収納容器 |
WO2018207575A1 (ja) * | 2017-05-12 | 2018-11-15 | 株式会社ダイセル | 接着剤層形成装置、半導体チップ製造ライン、及び積層体の製造方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2007363011B2 (en) * | 2007-12-20 | 2012-08-09 | Hosokawa Yoko Co., Ltd. | Multilayered body for medical containers and medical container |
US10655219B1 (en) * | 2009-04-14 | 2020-05-19 | Goodrich Corporation | Containment structure for creating composite structures |
US10689753B1 (en) * | 2009-04-21 | 2020-06-23 | Goodrich Corporation | System having a cooling element for densifying a substrate |
CN105518529A (zh) * | 2013-09-11 | 2016-04-20 | 信越聚合物株式会社 | 光罩基底衬底收纳容器 |
US9470394B2 (en) * | 2014-11-24 | 2016-10-18 | Cree, Inc. | LED light fixture including optical member with in-situ-formed gasket and method of manufacture |
JP6339490B2 (ja) * | 2014-12-17 | 2018-06-06 | 信越化学工業株式会社 | Czシリコン単結晶の製造方法 |
KR102673842B1 (ko) * | 2021-10-27 | 2024-06-10 | (주)코스탯아이앤씨 | 전자파 차폐 반도체 수납용 트레이 및 그의 제조 방법 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0436372A2 (en) * | 1989-12-26 | 1991-07-10 | Nippon Zeon Co., Ltd. | Thermoplastic materials and article made therefrom |
JPH08288377A (ja) * | 1995-04-18 | 1996-11-01 | Sony Corp | ウェーハ収納体 |
JPH1174337A (ja) * | 1997-08-28 | 1999-03-16 | Nippon Zeon Co Ltd | 熱可塑性樹脂製容器 |
JPH11163115A (ja) * | 1997-11-28 | 1999-06-18 | Shin Etsu Polymer Co Ltd | ウェーハ押さえ部材、これを組み込んだウェーハ収納用容器 |
JPH11307622A (ja) * | 1998-04-17 | 1999-11-05 | Komatsu Ltd | 半導体ウェハ包装容器 |
JP2000007085A (ja) * | 1998-06-15 | 2000-01-11 | Sumika Chemical Analysis Service Ltd | 保管運搬用の容器 |
JP2000063505A (ja) * | 1998-08-26 | 2000-02-29 | Teijin Chem Ltd | 薄板収納搬送容器用ポリカーボネート樹脂 |
JP2000143833A (ja) * | 1998-11-11 | 2000-05-26 | Chisso Corp | オレフィン系樹脂組成物よりなる成形体 |
JP2001192458A (ja) * | 2000-01-06 | 2001-07-17 | Nippon Zeon Co Ltd | 脂環構造含有重合体樹脂の保存方法 |
JP2001200143A (ja) * | 2000-01-20 | 2001-07-24 | Nippon Zeon Co Ltd | 光反射体及び樹脂組成物 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2816864B2 (ja) | 1989-07-07 | 1998-10-27 | 大塚化学株式会社 | 搬送用ウエーハバスケット及び収納ケース |
TW318861B (ja) * | 1994-08-16 | 1997-11-01 | Mitsui Toatsu Chemicals | |
JP4174968B2 (ja) * | 1997-08-19 | 2008-11-05 | 日本ゼオン株式会社 | ノルボルネン系重合体及びその製造方法 |
JP3282584B2 (ja) | 1998-06-02 | 2002-05-13 | 信越ポリマー株式会社 | 精密部材用収納容器 |
-
2002
- 2002-08-28 JP JP2003525903A patent/JP4470017B2/ja not_active Expired - Lifetime
- 2002-08-28 WO PCT/JP2002/008652 patent/WO2003021665A1/ja active Application Filing
- 2002-08-28 EP EP02760759A patent/EP1429380A4/en not_active Withdrawn
- 2002-08-28 US US10/487,840 patent/US7781035B2/en not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0436372A2 (en) * | 1989-12-26 | 1991-07-10 | Nippon Zeon Co., Ltd. | Thermoplastic materials and article made therefrom |
JPH08288377A (ja) * | 1995-04-18 | 1996-11-01 | Sony Corp | ウェーハ収納体 |
JPH1174337A (ja) * | 1997-08-28 | 1999-03-16 | Nippon Zeon Co Ltd | 熱可塑性樹脂製容器 |
JPH11163115A (ja) * | 1997-11-28 | 1999-06-18 | Shin Etsu Polymer Co Ltd | ウェーハ押さえ部材、これを組み込んだウェーハ収納用容器 |
JPH11307622A (ja) * | 1998-04-17 | 1999-11-05 | Komatsu Ltd | 半導体ウェハ包装容器 |
JP2000007085A (ja) * | 1998-06-15 | 2000-01-11 | Sumika Chemical Analysis Service Ltd | 保管運搬用の容器 |
JP2000063505A (ja) * | 1998-08-26 | 2000-02-29 | Teijin Chem Ltd | 薄板収納搬送容器用ポリカーボネート樹脂 |
JP2000143833A (ja) * | 1998-11-11 | 2000-05-26 | Chisso Corp | オレフィン系樹脂組成物よりなる成形体 |
JP2001192458A (ja) * | 2000-01-06 | 2001-07-17 | Nippon Zeon Co Ltd | 脂環構造含有重合体樹脂の保存方法 |
JP2001200143A (ja) * | 2000-01-20 | 2001-07-24 | Nippon Zeon Co Ltd | 光反射体及び樹脂組成物 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1429380A4 * |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4675601B2 (ja) * | 2003-11-18 | 2011-04-27 | 株式会社 ネットプラスチック | 大型精密シート状製品および半製品用密封容器 |
JP2005173556A (ja) * | 2003-11-18 | 2005-06-30 | Net Plastic:Kk | 大型精密シート状(半)製品用密封容器 |
JP5613981B2 (ja) * | 2006-08-31 | 2014-10-29 | 日本ゼオン株式会社 | ノルボルネン系開環重合体水素化物、樹脂組成物および成形体 |
US8586160B2 (en) | 2006-08-31 | 2013-11-19 | Zeon Corporation | Hydrogenated norbornene-based ring-opening polymerization polymer, resin composition, and molded object |
WO2008026733A1 (fr) | 2006-08-31 | 2008-03-06 | Zeon Corporation | Polymères de polymérisation par ouverture de cycle à base de norbornène hydrogéné, composition de résine et objets moulés |
US8685510B2 (en) | 2006-08-31 | 2014-04-01 | Zeon Corporation | Hydrogenated norbornene-based ring-opening polymerization polymer, resin composition, and molded object |
EP2305729A1 (en) | 2006-08-31 | 2011-04-06 | Zeon Corporation | Hydrogenated norbornene-based ring-opening polymerization polymer, resin composition, and molded object |
US8647730B2 (en) | 2006-08-31 | 2014-02-11 | Zeon Corporation | Hydrogenated norbornene-based ring-opening polymerization polymer, resin composition, and molded object |
US8481166B2 (en) | 2006-08-31 | 2013-07-09 | Zeon Corporation | Hydrogenated norbornene-based ring-opening polymerization polymer, resin composition, and molded object |
JP2008130982A (ja) * | 2006-11-24 | 2008-06-05 | Sumitomo Electric Ind Ltd | ウエハ収納容器内に設ける部材およびその製造方法 |
WO2008062564A1 (fr) * | 2006-11-24 | 2008-05-29 | Sumitomo Electric Industries, Ltd. | Organe disposé dans un contenant de stockage de tranches et procédé de fabrication d'un tel organe |
JP2008141131A (ja) * | 2006-12-05 | 2008-06-19 | Shin Etsu Polymer Co Ltd | ウェーハ輸送ケース |
JP2011018771A (ja) * | 2009-07-09 | 2011-01-27 | Shin Etsu Polymer Co Ltd | 基板収納容器 |
WO2018207575A1 (ja) * | 2017-05-12 | 2018-11-15 | 株式会社ダイセル | 接着剤層形成装置、半導体チップ製造ライン、及び積層体の製造方法 |
CN110651355A (zh) * | 2017-05-12 | 2020-01-03 | 株式会社大赛璐 | 粘接剂层形成装置、半导体芯片生产线、及层叠体的制造方法 |
CN110651355B (zh) * | 2017-05-12 | 2024-01-12 | 株式会社大赛璐 | 粘接剂层形成装置、半导体芯片生产线、及层叠体的制造方法 |
Also Published As
Publication number | Publication date |
---|---|
US7781035B2 (en) | 2010-08-24 |
JPWO2003021665A1 (ja) | 2004-12-24 |
EP1429380A4 (en) | 2009-07-15 |
EP1429380A1 (en) | 2004-06-16 |
JP4470017B2 (ja) | 2010-06-02 |
US20040224110A1 (en) | 2004-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003021665A1 (fr) | Contenant destine a un substrat de precision | |
EP1097948A4 (en) | METHOD FOR REDUCING THE METAL CONTENT OF A FLUOROELASTOMER | |
WO2003046845A3 (en) | Method for depositing items of value | |
EP0879772A3 (en) | Container for moisture-sensitive material | |
WO2002009166A1 (fr) | Procede de fabrication de dispositif semi-conducteur, raffineur de substrat, et systeme de traitement du substrat | |
WO2002079757A3 (en) | Method and device for measuring a permeation rate | |
EP1067154A3 (en) | Thermoplastic resin composition and multilayered container using the same | |
EP1978081A3 (en) | Stabilized liquid compositions | |
WO2006036562A3 (en) | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor | |
EP0826822A3 (en) | Inorganic porous crystals-hydrophilic macromolecular substrate composite | |
AU2002314790A1 (en) | Method for immobilizing a biologic in a polyurethane-hydrogel composition, a composition prepared from the method, and biomedical applications | |
WO2003077962A3 (en) | Methods, devices, and articles for controlling the release of volatile materials | |
WO2002074856A3 (de) | Wässrige kunststoff-dispersionen, verfahren zu deren herstellung sowie deren verwendung | |
WO2003072425A3 (en) | Skateboards | |
WO2003033361A3 (en) | Container for a flowable product, process of manufacture and the use thereof | |
WO2005097324A3 (en) | Microfluidic device including displaceable material trap, and system | |
EP1657002A3 (en) | Method of cleaning fluorine-containing rubber molded article for semiconductor production apparatuses and cleaned molded article | |
WO2002046719A3 (de) | Verfahren und vorrichtung zur kryospeicherung | |
EP1205438A4 (en) | WATER REPELLENT, POROUS SILICA, PROCESS FOR PRODUCTION AND USE | |
WO2006052465A3 (en) | Polymeric substrate having a desiccant layer | |
WO2002101363A3 (de) | Vorrichtung und verfahren zur stabilitätsbestimmung von substanzen und formulierungen | |
WO2003051707A3 (en) | Disk-brake lock for a motorcycle | |
WO2002090896A3 (fr) | Dispositif doseur de poudres | |
WO2007026010A3 (en) | Semiconductor device including a coupled dielectric layer and metal layer, method of fabrication thereof, and material for coupling a dielectric layer and a metal layer in a semiconductor device | |
EP0820735A3 (en) | Buccal tube |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): JP US Kind code of ref document: A1 Designated state(s): JP |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FR GB GR IE IT LU MC NL PT SE SK TR Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LU MC NL PT SE SK TR |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003525903 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10487840 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2002760759 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2002760759 Country of ref document: EP |