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WO2000030419A1 - Method of manufacturing wiring boards - Google Patents

Method of manufacturing wiring boards Download PDF

Info

Publication number
WO2000030419A1
WO2000030419A1 PCT/JP1998/005193 JP9805193W WO0030419A1 WO 2000030419 A1 WO2000030419 A1 WO 2000030419A1 JP 9805193 W JP9805193 W JP 9805193W WO 0030419 A1 WO0030419 A1 WO 0030419A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin
hole
sheet
substrate
layer
Prior art date
Application number
PCT/JP1998/005193
Other languages
French (fr)
Japanese (ja)
Inventor
Eiji Yoshimura
Original Assignee
Daiwa Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daiwa Co., Ltd. filed Critical Daiwa Co., Ltd.
Priority to JP52152999A priority Critical patent/JP3325903B2/en
Priority to PCT/JP1998/005193 priority patent/WO2000030419A1/en
Priority to TW087120091A priority patent/TW411748B/en
Priority to TW087120090A priority patent/TW404149B/en
Publication of WO2000030419A1 publication Critical patent/WO2000030419A1/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0094Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/0959Plated through-holes or plated blind vias filled with insulating material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0191Using tape or non-metallic foil in a process, e.g. during filling of a hole with conductive paste
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/025Abrading, e.g. grinding or sand blasting
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0278Flat pressure, e.g. for connecting terminals with anisotropic conductive adhesive
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4602Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated

Definitions

  • the present invention relates to a method for manufacturing a wiring board having via holes or through holes formed for purposes other than conductive connection for conductive connection between wiring layers, and more particularly, to filling a resin into the through holes during a via hole forming process or the like.
  • the present invention relates to a method of manufacturing a wiring board having a resin filling step for performing the above. Background art
  • a method of manufacturing a multilayer wiring board includes a bonding method in which a wiring layer is formed on each of a plurality of base materials, and an insulating sheet is interposed between the base materials to perform bonding and the like, and a method in which a wiring pattern is formed.
  • a build-up method in which an insulating layer is formed on the insulating layer and a wiring pattern is formed on the insulating layer, and then the insulating layer and the wiring pattern are sequentially formed to form a laminated structure.
  • the latter build-up method it is not necessary to join a plurality of base materials and insulating sheets corresponding to each wiring layer as in the former, so that a thin multilayer wiring board can be formed with high density and relatively easily. be able to. For this reason, the latter can mount circuits and electronic components at a higher density than the former.
  • a conventional resin filling method for example, a method by screen printing, a method described in Japanese Patent Application Laid-Open No. 9-83140, and the like can be mentioned.
  • a metal mask such as a stainless steel plate opened corresponding to the through hole is arranged, liquid resin is injected into the through hole, the metal mask is removed, and then the resin liquid is heated or the like. This is a method of curing.
  • an object of the present invention is to provide a method of manufacturing a wiring board having a resin filling step in which a resin is less likely to cause a defect in a filled resin and a resin can be preferably filled in a through-hole by a simple process using an inexpensive material. Is to provide. Disclosure of the invention
  • the method for manufacturing a wiring board according to the present invention is characterized by including a resin filling step including the following steps.
  • the amount of air bubbles is extremely small, and defects are hardly generated in the solidified resin.
  • the resin sheet is softened by heating, the steps corresponding to the conventional liquid resin supply / application step and injection step can be simplified, and the temperature, time, pressure and the like of heating and pressing (hot pressing) can be reduced. By adjusting, the amount of resin to be inserted can be easily controlled. Then, since the resin sheet can be solidified as it is after being embedded, there is no need to provide a step such as a metal mask removal step, and a step corresponding to the hardening step from the conventional injection step can be simplified.
  • the release sheet since the release sheet is used, the solidified resin sheet can be easily peeled, and at that time, the resin embedded and solidified in the through hole remains in the through hole and is filled with the resin. Will be.
  • the release sheet is pressed by the resin sheet when heated and pressed, and adheres closely to the substrate. Therefore, it is not necessary to perform smooth processing with high precision as in a conventional metal mask. Etc. can be used. Therefore, there is no need for reuse, and the use of a transparent material facilitates alignment with the through-hole of the substrate.
  • the through-hole may not be a conductive connection between wiring layers, but is preferably a through-hole for conductively connecting between a plurality of wiring layers.
  • Such a through hole is frequently used in a multilayer wiring board as described above, and it is indispensable to fill the resin without defects in order to improve the high-frequency characteristics of the board and to form an upper layer of the build-up.
  • the resin filling step of the present invention may have an additional step as described below in addition to the above steps a to d, and in particular, after the step d, (e) It is preferable to have a step of flattening a protruding portion of the resin filled in the through hole of the substrate or the base material layer.
  • a subsequent build-up upper layer forming step that is, an insulating layer forming step, can be favorably performed.
  • the resin sheet As the resin sheet, a force s which can use any of various resin sheets containing a thermosetting resin or a thermoplastic resin as described below, the resin sheet is softened by heating. It is preferable that the resin sheet contains a resin material that cures at a high temperature. By using such a resin sheet, the resin can be cured by heating as it is after being embedded, so that a step such as cooling is not required, and the resin can be solidified in an extremely short time. Further, such a thermosetting resin has high heat resistance, so that it exhibits good performance and durability even in a high-temperature process such as a soldering process.
  • the a step may be any method as long as the release sheet is disposed on at least one side surface of the substrate or the base material layer.
  • the a step includes disposing the release sheet on both surfaces of the substrate or the base material layer. It is preferable that This makes it possible to easily remove and remove the extra resin existing on both sides of the substrate or the like using the release sheet.
  • the wiring board of the present invention is a wiring board manufactured by any one of the above manufacturing methods.
  • the filled resin has few defects, the reliability of the board in terms of conductive connectivity, high-frequency characteristics, and the like is enhanced.
  • FIG. 1 is a process chart (1) to (5) showing an example of a method for manufacturing a wiring board of the present invention.
  • FIG. 2 is a process chart (6) to (9) showing an example of a method for manufacturing a wiring board according to the present invention.
  • FIG. 3 is a process chart (10) to (13) showing an example of a method for manufacturing a wiring board of the present invention.
  • FIG. 4 is a partial cross section showing an example of a multilayer wiring board that can be formed according to the present invention.
  • 1 denotes a release sheet
  • la denotes an opening
  • 2 denotes a resin sheet
  • 14 denotes a filled resin
  • 14a denotes a protruding portion
  • BL denotes a base material layer
  • TH denotes a through hole.
  • release sheets are arranged on both surfaces of a base material layer.
  • a through hole 10a is formed in a base material 10.
  • copper plating is applied to the front and back surfaces of 0 and the through hole 10a.
  • the plating layers 11 and 12 are formed on the front and back of the substrate 10, respectively, and these plating layers 11 and 12 are formed on the inner surface of the through hole 10a.
  • Layer 13 is conductively connected. In this way, a base material layer BL on which a through hole TH for filling the resin is formed is prepared.
  • the release sheet 1 having the opening 1a opened corresponding to the through hole TH is aligned with the opening la in the base material layer BL.
  • they are arranged on both sides of the base material layer BL.
  • the release sheet 1 may have a certain degree of heat resistance and strength.
  • various release papers used in the production of a double-sided wiring board by hot pressing and various types of resin such as sapphire resin.
  • a release film made of a heat-resistant resin can be used.
  • the step b in which the alignment is easy by using the highly transparent release sheet 1, is as follows: As shown in Fig. 1 (4), the surface on which the release sheet 1 is placed is softened by heating and cooled or cooled. A resin sheet 2 that is solidified by curing is provided.
  • the resin sheet 2 in the present embodiment is a resin sheet containing a resin material that softens when heated and hardens at a high temperature.
  • a prepreg in which an epoxy resin is impregnated into glass fiber or the like, and a prepreg in which a copper foil layer is formed on one surface of the prepreg are commercially available and can be used in the present invention.
  • the invention is not limited thereto, and any of various resin sheets containing various thermosetting resins, thermoplastic resins having a certain degree of heat resistance, and the like can be used.
  • a thermosetting resin containing an epoxy resin as a main component is used, good filling can be performed since the heat shrinkage is small.
  • step c as shown in FIG. 1 (5), the resin sheet 2 is softened by heating and pressing, a part of the resin sheet 2 is embedded in the through-hole TH, and then solidified by curing.
  • the softening of the resin sheet 2 is performed at 80 to 250 ° C., and is controlled by adjusting the temperature of the press surface of the heat press device.
  • the amount of resin to be embedded can be controlled by the degree of softening, time, pressure and the like.However, since the excess resin 2 & flows out to the back side of the lower layer BL and can be removed in a later step, it is particularly strict. No control is required.
  • the amount of the resin to be embedded is also determined to some extent.
  • the base material layer BL is placed on a press table (not shown).
  • the press table does not prevent the excess resin 2a from flowing out to the lower side of the base material layer BL.
  • the resin can be embedded by flowing the resin into the gap between the release sheet 1 and the sheet.
  • a material that does not prevent the excessive resin 2a from flowing out include a perforated plate having a larger diameter opening, a jig having a concave portion, and an inorganic porous material corresponding to the through hole TH.
  • the embedded resin is usually cured at a higher temperature (for example, 130 to 250 ° C.) than at the time of softening, but in the present embodiment, the softening and the curing are performed in a single heating process.
  • the resin can be embedded and solidified in a very short time at a time. After these steps, the layer BL is removed from the hot press.
  • step d as shown in FIG. 2 (6), the release sheet 1 is peeled from the base material layer BL. Peeling of the peeling sheet 1 can be carried out manually or by mechanical operation by simply peeling both off from the ends. At this time, both the upper release sheet 1 and the resin sheet 2 are separated from the base material layer BL, and at the same time, the resin sheet 2 and the embedded and solidified filling resin 14 are cut off. Further, the lower release sheet 1 is peeled off from the layer BL together with the excess resin 2a, and at the same time, the filling resin 14 and the excess resin 2a are cut off. As a result, the filling resin 14 having a shape as shown in FIG. 2 (7) is filled in the through hole TH.
  • the step e is for flattening the protruding portion 14a of the filling resin 14 filled in the through hole TH which is a through hole.
  • the step e is for flattening, for example, belt the surface of S layer BL It can be performed by lightly polishing with sanding, puff polishing or the like. By this polishing, the surface of the filling resin 14 is formed almost flush with the plating layers 11 and 12 and flattened. Further, by forming a predetermined mask on the printing layers 11 and 12 using photolithography technology and performing an etching process, the wiring layers 15 and 16 having a predetermined pattern can be formed. (See Figure 2 (8)).
  • an insulating resist 17 is applied on the surface, only the region connected to the upper layer is opened using photolithography.
  • an insulating resist 18 is further applied in the same manner, and similarly, only the above-mentioned region is opened using the photolithography technique. This opening region is the filling resin 14 and the wiring portion around the filling resin 14 in the figure.
  • a coating material 19 containing a large number of fillers in a predetermined reactive resin is screen-printed on the insulating resist 18 of the second layer. Is applied so as to avoid the filled resin 14 and its surrounding wiring.
  • the reactive resin of the coating material 19 various thermosetting resins or photocurable resins can be used.
  • the filler contained therein elutable fine particles such as calcium carbonate, for example, particles having a particle size of about several meters are used.
  • the coating material 19 is applied and cured by heating or light irradiation, its surface is lightly polished with a puff (dashed arrow A in the figure) as shown in Fig. 3 (11), and then several tens of By performing sand blasting using abrasive grains having a particle size of about m, a uniform rough surface is formed and the filler embedded near the surface is exposed. By performing soft etching using an acid solution for cleaning in this state, the filler is eluted to form fine irregularities on the surface.
  • a step of forming a through hole 10b in the substrate is provided as necessary.
  • This through hole 10b is formed by drilling or the like, like the through hole 10a shown in FIG. 1 (1).
  • the through-hole 10b is provided at a portion where conductive connection between the wiring layer 16 and the upper wiring layer is required.
  • an electroless plating is performed on the surface of the coating material 19 roughened in this way to form a first plating layer 20 over the entire surface.
  • the second plating layer 21 is formed by plating. In this way, the plating layer is formed into two layers The reason for this is to maintain the smoothness of the surface of the plating layer while increasing the adhesion strength of the plating layer.
  • the conductive connection portion C is formed by these plating layers.
  • the printing layers 20 and 21 are etched by the same photolithography technique as described above to form a wiring layer 22 in a predetermined pattern.
  • the filling resin 23 is filled into the through holes 1 Ob by the resin filling step of the present invention in the same manner as the filling resin 14 described above. be able to.
  • the resin 24 is filled into the concave portion formed above the conductive connection portion C by screen printing or the like.
  • the opening surface of the filling resin 14 is mechanically polished and flattened, the upper surface of the wiring layer can be flattened to form an upper layer structure. Therefore, it is possible to prevent the topographical effect on the upper layer (such as the unevenness of the lower layer affecting the formation of the upper layer and causing the wiring to be lost or disconnected).
  • a multilayer wiring board 30 as shown in FIG. 4, for example, can be manufactured.
  • This multilayer wiring board 30 is a six-layer board having a circuit configuration of six layers of wiring layers 31 to 36 in the board.
  • Blind via hole structures 37, 38a to 38c are formed in the interior, and the blind via hole structures 38a to 38c are filled with resin by the resin filling step of the present invention. It was done.
  • the blind via hole structure 38a connects the first wiring layer and the second wiring layer, and can be formed by the above-described resin filling step.
  • the blind via hole structure 38 b connects the first wiring layer to the third wiring layer.
  • a through hole is formed, and the resin filling step of the present invention is performed there. It can be formed by filling in. The same applies to the blind via hole structure 38c.
  • the multi-layer wiring board 30 is a surface-mount type having a brand 39, and the through-holes 40 are provided for wiring connection.
  • resin filling can be performed according to the present invention.
  • the release sheets 1 are arranged on both sides of the base material layer BL.
  • the release sheet 1 may be arranged on only one side surface (the hot press side) of the layer. Good. In that case, removal of excess resin flowing out to the back side of the hot press poses a problem, but can be suitably removed by the following method.
  • the resin is controlled by the above-described method so that the amount of excess resin flowing out is reduced as much as possible. After solidification is performed as it is, the excess resin can be removed by the flattening step.
  • a mesh sheet or the like is interposed between the press table and the base material layer, and excess resin flowing out to the back side of the base layer is fixed to the mesh sheet or the like, and a mesh sheet or the like is formed. Exfoliation can remove excess resin.
  • a mesh sheet or the like it is not necessary to position the openings as in the case of the peeling sheet, and the operation becomes simpler.
  • the through-hole for conductively connecting the first wiring layer and the second wiring layer is filled with resin, and then the upper layer is further formed.
  • the subsequent step can be performed without filling the resin.
  • the resin filling step of the present invention may be performed using an opening for the peeling sheet that is not provided for some of the through holes.
  • a resin in which some of the through holes are not filled with the resin can be formed.
  • the present invention is useful for a method for manufacturing a wiring board having via holes for conductive connection between wiring layers or through holes formed for purposes other than conductive connection. More specifically, when filling the through-hole with a resin in a via-hole forming process or the like, the filled resin The resin can be suitably filled by a simple process using an inexpensive material with few defects. Therefore, the present invention has high industrial applicability.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

A method of manufacturing a wiring board, characterized by comprising a step of disposing a peelable sheet, which has an opening corresponding to a through hole to be resin packed, on at least one surface of a substrate or substrate layer while aligning the openings with the through hole-carrying substrate or substrate layer; a step of forming a resin sheet, which is softened by heating, or solidified by cooling or curing, on the surface of the substrate which is provided with the peelable sheet; and a resin packing step including a step of burying a part of the resin sheet in the through hole while softening the resin sheet with heat and under pressure, and then solidifying the resin by cooling or curing, and a step of separating the peelable sheet from the substrate or substrate layer; this resin packing step enabling the packed resin to rarely encounter the occurrence of a defect, and the resin to be suitably packed in the through hole by using an inexpensive material and a simple step.

Description

明 細 書 配線基板の製造方法 技術分野  Description Wiring board manufacturing method Technical field
本発明は、 配線層間の導電接続のためバイァホールや導電接続以外の目的で形 成された貫通孔などを有する配線基板の製造方法に関し、 特に、 バイァホール形 成過程等において、 貫通孔に樹脂を充填するための樹脂充填工程を有する配線基 板の製造方法に関する。 背景技術  The present invention relates to a method for manufacturing a wiring board having via holes or through holes formed for purposes other than conductive connection for conductive connection between wiring layers, and more particularly, to filling a resin into the through holes during a via hole forming process or the like. The present invention relates to a method of manufacturing a wiring board having a resin filling step for performing the above. Background art
近年、 電子機器等の小形化や軽量化に伴い、 電子部品の小形化が進められると 共に、 電子部品を実装するための配線基板に対して高密度化の要求が高まってい る。 配線基板を高密度化するには、 配線層自体の配線密度を高くする方法や配線 層を複数積層することで多層構造とする方法などが採られている。  In recent years, as electronic devices and the like have become smaller and lighter, the size of electronic components has been reduced, and the demand for higher density of wiring boards for mounting electronic components has increased. In order to increase the density of the wiring board, a method of increasing the wiring density of the wiring layer itself or a method of forming a multilayer structure by laminating a plurality of wiring layers have been adopted.
多層配線基板を製造する方法には、 複数の基材にそれぞれ配線層を形成した上 で、 基材の間に絶縁シートを介在させて接合等を行う接合方式と、 配線パターン の形成された の上に絶縁層を形成し、 この絶縁層の上に配線パターンを形成 するといつた具合に、 絶縁層と配線ノ ターンの形成を順次繰り返すことにより積 層構造を形成していくビルドアップ方式とが存在する。  A method of manufacturing a multilayer wiring board includes a bonding method in which a wiring layer is formed on each of a plurality of base materials, and an insulating sheet is interposed between the base materials to perform bonding and the like, and a method in which a wiring pattern is formed. A build-up method in which an insulating layer is formed on the insulating layer and a wiring pattern is formed on the insulating layer, and then the insulating layer and the wiring pattern are sequentially formed to form a laminated structure. Exists.
後者のビルドアップ方式によれば、 前者のように、 各配線層に対応した複数の 基材ゃ絶縁シートを接合する必要がないため、 薄い多層配線基板を高密度にかつ 比較的容易に形成することができる。 このため、 後者の方が前者より回路及び電 子部品を高密度に実装することが可能になる。  According to the latter build-up method, it is not necessary to join a plurality of base materials and insulating sheets corresponding to each wiring layer as in the former, so that a thin multilayer wiring board can be formed with high density and relatively easily. be able to. For this reason, the latter can mount circuits and electronic components at a higher density than the former.
一方、 多層配線基板では、 それそれの配線層間で回路設計に応じた導電接続を 行う必要がある。 このため、 基板や基材層等に貫通孔を設けてメツキや導電性べ —ス卜の塗布を施したいわゆるスルーホールや、 ビルドアップ方式において絶縁 層を形成せずに露出した下層の配線層上に上層の配線層となるメッキ層を形成し た構造などが採用されていた。 これらの層間接続構造のうち、 特にスルーホール は、 接合方式で形成した多層配線基板や、 ビルドアップ方式における最下層の基 材の両面配線層の層間接続などに利用されている。 On the other hand, in a multilayer wiring board, it is necessary to make a conductive connection between the respective wiring layers according to the circuit design. For this reason, a so-called through hole in which a through hole is provided in a substrate or a base material layer to apply a plating or a conductive base, or a lower wiring layer exposed without forming an insulating layer in a build-up method. A structure in which a plating layer serving as an upper wiring layer was formed thereon was adopted. Of these interlayer connection structures, in particular, through holes Is used for a multilayer wiring board formed by a bonding method, an interlayer connection between both-sided wiring layers of a lowermost substrate in a build-up method, and the like.
このようなスルーホールは、 最終的に中空状態で製品とされることは稀であり 、 ビルドアップ方式では上層成形のためや高周波特性の改善等のため、 通常、 最 下層の基材層のスルーホールに樹脂の充填が行われる。 また接合方式においても 、 後のソルダマスク印刷工程やソルダリング工程に支障がないように、 樹脂の充 填が行われる。  Such through-holes are rarely finally made into products in a hollow state. In the case of the build-up method, in order to form the upper layer or to improve the high frequency characteristics, the through-hole of the lowermost base layer is usually used. The hole is filled with resin. Also in the joining method, resin is filled so as not to hinder the subsequent solder mask printing step and soldering step.
従来の樹脂の充填方法としては、 例えばスクリーン印刷による方法ゃ特開平 9 - 8 3 1 4 0号公報に記載されている方法等が挙げられる。 後者の充填方法は、 貫通孔に対応して開口したステンレス薄板等のメタルマスクを配置して、 液状の 樹脂を貫通孔内に注入し、 メタルマスクを除去してから、 加熱等により樹脂液を 硬化させる方法である。  As a conventional resin filling method, for example, a method by screen printing, a method described in Japanese Patent Application Laid-Open No. 9-83140, and the like can be mentioned. In the latter filling method, a metal mask such as a stainless steel plate opened corresponding to the through hole is arranged, liquid resin is injected into the through hole, the metal mask is removed, and then the resin liquid is heated or the like. This is a method of curing.
しかし、 上記の方法で用いるインキや液状樹脂は、 調液混合時や注入時等に気 泡が混入し易いため、 硬化後の樹脂に欠陥が生じ易く、 またインキ等を適量注入 する為の制御が難しいという問題があった。 更に、 メタルマスク等は高価であり 、 再利用する必要があるため、 その工程が複雑になると共に、 液状樹脂の注入ェ 程、 メタルマスクの除去工程、 液状樹脂の加熱工程といった一連の工程が、 煩雑 かつ長時間を要し、 実用的な方法とは言えなかった。  However, since the ink and liquid resin used in the above method are liable to contain air bubbles during mixing and pouring of the preparation, defects are likely to occur in the cured resin, and control for injecting an appropriate amount of ink or the like is performed. There was a problem that was difficult. Further, since the metal mask and the like are expensive and must be reused, the process becomes complicated, and a series of steps such as a liquid resin injection step, a metal mask removal step, and a liquid resin heating step are performed. It was complicated and time-consuming, and was not a practical method.
また、 上記のスルーホールに限らず、 導電接続を行わない貫通孔に対しても、 樹脂の充填の必要性が存在する場合もある。  In addition, there is a case where the resin needs to be filled not only in the above-described through hole but also in a through hole that does not perform conductive connection.
そこで、 本発明の目的は、 充填した樹脂に欠陥が生じにくく、 安価な材料で簡 易な工程により、 貫通孔に樹脂を好適に充填することができる樹脂充填工程を有 する配線基板の製造方法を提供することにある。 発明の開示  Therefore, an object of the present invention is to provide a method of manufacturing a wiring board having a resin filling step in which a resin is less likely to cause a defect in a filled resin and a resin can be preferably filled in a through-hole by a simple process using an inexpensive material. Is to provide. Disclosure of the invention
上記目的は、 以下の如き本発明により達成できる。 即ち、 本発明の配線基板の 製造方法は、 下記の工程を含む樹脂充填工程を有することを特徴とする。  The above object can be achieved by the present invention as described below. That is, the method for manufacturing a wiring board according to the present invention is characterized by including a resin filling step including the following steps.
( a) 樹脂を充填する貫通孔を有する基板又は S#層に、 その貫通孔に対応して 開口した開口部を有する剥離用シートを、 その開口部を位置合わせしつつ、 前記 基板又は基材層の少なくとも片側面に配置する工程、 (a) A release sheet having an opening corresponding to the through-hole on a substrate or an S # layer having a through-hole filled with resin, while aligning the opening, Step of arranging at least one side of the substrate or the base material layer,
( b ) 前記剥離用シートを配置した面に、 加熱により軟ィヒし冷却又は硬ィ匕により 固化する樹脂シートを配置する工程、  (b) arranging a resin sheet which is softened by heating and solidified by cooling or hardening on a surface on which the release sheet is arranged,
( c ) その樹脂シートを加熱加圧により軟化させつつ、 その一部を前記貫通孔に 埋入し、 その後、 冷却又は硬化により固化させる工程、 及び  (c) a step of embedding a part of the resin sheet in the through hole while softening the resin sheet by heating and pressing, and then solidifying by cooling or curing; and
( d ) 前記基板又は基材層から前記剥離用シ一トを剥離する工程。  (d) a step of peeling the peeling sheet from the substrate or the base material layer.
本発明によると、 液状樹脂でなく樹脂シートを使用するため、 気泡の混入が極 めて少なく、 固化後の樹脂に欠陥が生じにくい。 また、 樹脂シートが加熱で軟化 するため、 従来の液状樹脂の供給 ·塗布工程と注入工程に相当する工程が簡! ^匕 でき、 また、 加熱加圧 (熱プレス) の温度、 時間、 圧力等の調整により、 容易に 樹脂の埋入量を制御できる。 そして、 樹脂シートを埋入後にそのまま固化できる ため、 メタルマスク除去などの工程を設ける必要がなく、 従来の注入工程から硬 化工程に相当する工程を簡略化できる。 更に、 剥離用シートを用いるため、 固化 後の樹脂シートを容易に剥離することができ、 その際、 貫通孔に埋入され固化し た樹脂は、 貫通孔内に残留し、 樹脂が充填されることになる。 上記において、 剥 離用シートは、 加熱加圧時に樹脂シートに押されて基板に密着するため、 従来の メタルマスクのように高精度に平滑加工等する必要がなく、 このため安価な離型 紙等を用いることができる。 従って、 再利用の必要がなく、 また透明なものを使 用すれば、 基板の貫通孔への位置合わせも容易になる。  According to the present invention, since a resin sheet is used instead of a liquid resin, the amount of air bubbles is extremely small, and defects are hardly generated in the solidified resin. In addition, since the resin sheet is softened by heating, the steps corresponding to the conventional liquid resin supply / application step and injection step can be simplified, and the temperature, time, pressure and the like of heating and pressing (hot pressing) can be reduced. By adjusting, the amount of resin to be inserted can be easily controlled. Then, since the resin sheet can be solidified as it is after being embedded, there is no need to provide a step such as a metal mask removal step, and a step corresponding to the hardening step from the conventional injection step can be simplified. Furthermore, since the release sheet is used, the solidified resin sheet can be easily peeled, and at that time, the resin embedded and solidified in the through hole remains in the through hole and is filled with the resin. Will be. In the above, the release sheet is pressed by the resin sheet when heated and pressed, and adheres closely to the substrate. Therefore, it is not necessary to perform smooth processing with high precision as in a conventional metal mask. Etc. can be used. Therefore, there is no need for reuse, and the use of a transparent material facilitates alignment with the through-hole of the substrate.
その結果、 充填した樹脂に欠陥が生じにくく、 安価な材料で簡易な工程により 、 貫通孔に樹脂を好適に充填することができる樹脂充填工程を有する配線基板の 製造方法を提供することができた。  As a result, it is possible to provide a method of manufacturing a wiring board having a resin filling step in which the filled resin is less likely to cause a defect and the resin can be suitably filled in the through-hole by a simple process using an inexpensive material. .
上記において、 前記貫通孔は、 配線層間の導電接続を行わないものでもよいが 、 前記貫通孔が、 複数の配線層の間を導電接続するためのスルーホールであるこ とが好ましい。 このようなスルーホールは、 前述のように多層配線基板において 高頻度で採用され、 基板の高周波特性の向上やビルドアップの上層形成のために 、 樹脂の欠陥のない充填が不可欠なためである。  In the above, the through-hole may not be a conductive connection between wiring layers, but is preferably a through-hole for conductively connecting between a plurality of wiring layers. Such a through hole is frequently used in a multilayer wiring board as described above, and it is indispensable to fill the resin without defects in order to improve the high-frequency characteristics of the board and to form an upper layer of the build-up.
また、 本発明の樹脂充填工程は、 上記の a〜d工程以外に、 後述の如き付随的 な工程を有していてもよく、 特に前記 d工程の後に、 ( e ) 前記基板又は基材層の貫通孔に充填された樹脂の突出部分を平坦ィヒするェ 程を有することが好ましい。 この工程により、 引き続き行うビルドアップの上層 形成工程、 即ち絶縁層の形成工程などを良好に行うことができる。 In addition, the resin filling step of the present invention may have an additional step as described below in addition to the above steps a to d, and in particular, after the step d, (e) It is preferable to have a step of flattening a protruding portion of the resin filled in the through hole of the substrate or the base material layer. By this step, a subsequent build-up upper layer forming step, that is, an insulating layer forming step, can be favorably performed.
前記樹脂シ一トとしては、 後述のように熱硬化性樹脂又は熱可塑性樹脂等を含 有する種々の樹脂シートをいずれも使用することができる力 s、 前記樹脂シートが 、 加熱により軟ィ匕し、 更に高温で硬化する樹脂材料を含有する樹脂シートである ことが好ましい。 このような樹脂シートを用いることにより、 樹脂の埋入後にそ のまま続けて加熱硬化が可能なため、 冷却等の工程が不要となり、 極めて短時間 で樹脂を固化することができる。 また、 このような熱硬化性樹脂は、 耐熱性が高 いため、 ソルダリング工程等の高温となる工程においても、 良好な性能、 耐久性 を示す。 As the resin sheet, a force s which can use any of various resin sheets containing a thermosetting resin or a thermoplastic resin as described below, the resin sheet is softened by heating. It is preferable that the resin sheet contains a resin material that cures at a high temperature. By using such a resin sheet, the resin can be cured by heating as it is after being embedded, so that a step such as cooling is not required, and the resin can be solidified in an extremely short time. Further, such a thermosetting resin has high heat resistance, so that it exhibits good performance and durability even in a high-temperature process such as a soldering process.
前記 a工程は、 前記剥離用シートを前記基板又は基材層の少なくとも片側面に 配置するものであればよいが、 前記 a工程が、 前記剥離用シートを前記基板又は 基材層の両面に配置するものであることが好ましい。 これにより、 基板等の両側 に存在する余分となる樹脂を、 剥離用シートで容易に剥離 ·除去することができ The a step may be any method as long as the release sheet is disposed on at least one side surface of the substrate or the base material layer. The a step includes disposing the release sheet on both surfaces of the substrate or the base material layer. It is preferable that This makes it possible to easily remove and remove the extra resin existing on both sides of the substrate or the like using the release sheet.
^ &。 ^ &.
一方、 本発明の配線基板は上記の何れかの製造方法により製造される配線基板 である。 このような配線基板は、 充填した樹脂に欠陥が少ないため、 導電接続性 や高周波特性等における基板の信頼性が高 ヽものとなる。 図面の簡単な説明  On the other hand, the wiring board of the present invention is a wiring board manufactured by any one of the above manufacturing methods. In such a wiring board, since the filled resin has few defects, the reliability of the board in terms of conductive connectivity, high-frequency characteristics, and the like is enhanced. BRIEF DESCRIPTION OF THE FIGURES
図 1は、 本発明の配線基板の製造方法の一例を示す工程図 ( 1 ) 〜 (5 ) であ る。 図 2は、 本発明の配線基板の製造方法の一例を示す工程図 (6 ) 〜 (9 ) で ある。 図 3は、 本発明の配線基板の製造方法の一例を示す工程図 ( 1 0 ) 〜 (1 3 ) である。 図 4は、 本発明により形成することのできる多層配線基板の一例を 示す部分断面部である。  FIG. 1 is a process chart (1) to (5) showing an example of a method for manufacturing a wiring board of the present invention. FIG. 2 is a process chart (6) to (9) showing an example of a method for manufacturing a wiring board according to the present invention. FIG. 3 is a process chart (10) to (13) showing an example of a method for manufacturing a wiring board of the present invention. FIG. 4 is a partial cross section showing an example of a multilayer wiring board that can be formed according to the present invention.
各図において、 1は剥離用シート、 l aは開口部、 2は樹脂シート、 1 4は充 填樹脂、 1 4 aは突出部分、 B Lは基材層、 T Hはスルーホールを表す。 発明を実施するための最良の形態 In each of the figures, 1 denotes a release sheet, la denotes an opening, 2 denotes a resin sheet, 14 denotes a filled resin, 14a denotes a protruding portion, BL denotes a base material layer, and TH denotes a through hole. BEST MODE FOR CARRYING OUT THE INVENTION
以下、 本発明をその最良の実施形態に基づき詳細に説明する。 本実施形態では 、 剥離用シートを基材層の両面に配置する例を示す。  Hereinafter, the present invention will be described in detail based on its best embodiment. In the present embodiment, an example is shown in which release sheets are arranged on both surfaces of a base material layer.
先ず、 図 1 ( 1 ) に示すように、 基材 1 0に貫通孔 1 0 aを穿設する。 次に、 図 1 ( 2 ) に示すように 0の表裏面および貫通孔 1 0 aに銅メヅキを施す 。 このとき、 は 1 0の表裏にはメツキ層 1 1, 1 2がそれぞれ形成され、 これ らのメツキ層 1 1とメツキ層 1 2とを、 貫通孔 1 0 aの内面上に形成されたメッ キ層 1 3が導電接続する。 これにより樹脂を充填するためのスルーホール T Hが 形成された基材層 B Lが準備される。  First, as shown in FIG. 1 (1), a through hole 10a is formed in a base material 10. Next, as shown in FIG. 1 (2), copper plating is applied to the front and back surfaces of 0 and the through hole 10a. At this time, the plating layers 11 and 12 are formed on the front and back of the substrate 10, respectively, and these plating layers 11 and 12 are formed on the inner surface of the through hole 10a. Layer 13 is conductively connected. In this way, a base material layer BL on which a through hole TH for filling the resin is formed is prepared.
a工程は、 図 1 ( 3 ) に示すように、 上記基材層 B Lに、 そのスルーホール T Hに対応して開口した開口部 1 aを有する剥離用シート 1を、 開口部 l aを位置 合わせしつつ、 基材層 B Lの両側面に配置するものである。 剥離用シート 1とし ては、 ある程度の耐熱性、 強度を有するものであればよいが、 例えば熱プレスに より両面配線基板を製造する際に用いられる各種離型紙や、 フ、ソ素系樹脂等の耐 熱性樹脂よりなる離型フィルムなどが使用できる。 剥離用シート 1に開口部 l a を正確な位置に形成する方法としては、 1 0に貫通孔 1 0 aを形成する際に 、 同時に剥離用シート 1にも開口部 l aを形成する方法や、 基材 1 0に貫通孔 1 0 aを形成するのと同じ穿孔パターンを利用して形成する方法などが挙げられる 。 なお、 透明度の高い剥離用シート 1を用いることにより位置合わせが容易にな b工程は、 図 1 ( 4 ) に示すように、 剥離用シート 1を配置した面に、 加熱に より軟化し冷却又は硬化により固化する樹脂シート 2を配置するものである。 本 実施形態における樹脂シート 2は、 加熱により軟化し、 更に高温で硬化する樹脂 材料を含有する樹脂シートである。 具体的には、 エポキシ樹脂をガラス繊維等に 含浸したプリプレグや、 更にそのプリプレグの片面に銅箔層が形成されたものな どが市販されており、 本発明において使用可能である。 また、 これらに限らず、 各種の熱硬化性樹脂や、 ある程度の耐熱性を有する熱可塑性樹脂等を含有する種 々の樹脂シートをいずれも使用することができる。 特に、 エポキシ樹脂を主成分 とする熱硬化性樹脂を用いると、 熱収縮性が少ないために良好な充填が行える。 c工程は、 図 1 ( 5 ) に示すように、 樹脂シート 2を加熱加圧により軟化させ つつ、 その一部をスルーホール T Hに埋入し、 その後、 硬化により固化させるも のである。 本実施形態では樹脂シート 2の軟化は 8 0〜2 5 0 °Cで行われ、 熱プ レス装置のプレス面の温度調整により制御される。 また、 樹脂の埋入量は、 軟化 の程度と時間、 圧力等によって制御することができるが、 過剰な樹脂 2 &は¾ 層 B Lの裏側に流出し、 後の工程で除去できるため特に厳密な制御は不要である 。 なお、 上記のプリプレグを用いる場合、 ガラス繊維に含浸されている樹脂の含 有比率が決まっているため、 これにより樹脂の埋入量もある程度決定される。 上 記の熱プレスに際し、 基材層 B Lは図示していないプレス台に載置される。 プレ ス台としては、 基材層 B Lの下側への過剰な樹脂 2 aの流出を妨げないものが好 ましいが、 平滑な表面を有するプレス台を用いても、 プレス台と下側の剥離用シ 一ト 1との間の隙間に樹脂が流れ込むことで、 樹脂の埋入を行うことができる。 過剰な樹脂 2 aの流出を妨げないものとしては、 スルーホール T Hに対応して、 より大径の開口部を有する多孔板や凹部を有するジグ、 無機多孔質材料などが挙 げられる。 In step a, as shown in FIG. 1 (3), the release sheet 1 having the opening 1a opened corresponding to the through hole TH is aligned with the opening la in the base material layer BL. In addition, they are arranged on both sides of the base material layer BL. The release sheet 1 may have a certain degree of heat resistance and strength. For example, various release papers used in the production of a double-sided wiring board by hot pressing, and various types of resin such as sapphire resin. A release film made of a heat-resistant resin can be used. As a method of forming the opening la in the release sheet 1 at an accurate position, a method of forming the opening la in the release sheet 1 at the same time as forming the through hole 10 a in 10, There is a method of forming the through hole 10a in the material 10 using the same perforation pattern as forming the through hole 10a. The step b, in which the alignment is easy by using the highly transparent release sheet 1, is as follows: As shown in Fig. 1 (4), the surface on which the release sheet 1 is placed is softened by heating and cooled or cooled. A resin sheet 2 that is solidified by curing is provided. The resin sheet 2 in the present embodiment is a resin sheet containing a resin material that softens when heated and hardens at a high temperature. Specifically, a prepreg in which an epoxy resin is impregnated into glass fiber or the like, and a prepreg in which a copper foil layer is formed on one surface of the prepreg are commercially available and can be used in the present invention. The invention is not limited thereto, and any of various resin sheets containing various thermosetting resins, thermoplastic resins having a certain degree of heat resistance, and the like can be used. In particular, when a thermosetting resin containing an epoxy resin as a main component is used, good filling can be performed since the heat shrinkage is small. In step c, as shown in FIG. 1 (5), the resin sheet 2 is softened by heating and pressing, a part of the resin sheet 2 is embedded in the through-hole TH, and then solidified by curing. In the present embodiment, the softening of the resin sheet 2 is performed at 80 to 250 ° C., and is controlled by adjusting the temperature of the press surface of the heat press device. In addition, the amount of resin to be embedded can be controlled by the degree of softening, time, pressure and the like.However, since the excess resin 2 & flows out to the back side of the lower layer BL and can be removed in a later step, it is particularly strict. No control is required. When the above prepreg is used, since the content ratio of the resin impregnated in the glass fiber is determined, the amount of the resin to be embedded is also determined to some extent. In the above hot press, the base material layer BL is placed on a press table (not shown). It is preferable that the press table does not prevent the excess resin 2a from flowing out to the lower side of the base material layer BL.However, even if a press table having a smooth surface is used, The resin can be embedded by flowing the resin into the gap between the release sheet 1 and the sheet. Examples of a material that does not prevent the excessive resin 2a from flowing out include a perforated plate having a larger diameter opening, a jig having a concave portion, and an inorganic porous material corresponding to the through hole TH.
埋入した樹脂の硬化は、 通常、 軟化時より高い温度 (例えば 1 3 0〜2 5 0 °C ) で行われるが、 本実施形態では、 軟化と硬化とを一度の昇温過程で行うことが でき、 極めて短時間で樹脂の埋入と固化を一度に行うことができる。 これらのェ 程の終了後、 層 B Lは熱プレス装置から取り出される。  The embedded resin is usually cured at a higher temperature (for example, 130 to 250 ° C.) than at the time of softening, but in the present embodiment, the softening and the curing are performed in a single heating process. The resin can be embedded and solidified in a very short time at a time. After these steps, the layer BL is removed from the hot press.
d工程は、 図 2 ( 6 ) に示すように、 基材層 B Lから剥離用シート 1を剥離す るものである。 剥離用シート 1の剥離は、 端部から両者を引き剥がすだけでよく 、 手作業や機械操作で行うことができる。 その際、 上側の剥離用シート 1と樹脂 シ一ト 2が共に基材層 B Lから剥離され、 同時に樹脂シー卜 2と埋入 ·固化した 充填樹脂 1 4との切断が生じる。 また、 下側の剥離用シート 1は過剰な樹脂 2 a と共に 層 B Lから剥離され、 同時に充填樹脂 1 4と過剰な樹脂 2 aとの切断 が生じる。 その結果、 図 2 ( 7 ) に示すような形状の充填樹脂 1 4が、 スルーホ —ル T H内に充填されることになる。  In step d, as shown in FIG. 2 (6), the release sheet 1 is peeled from the base material layer BL. Peeling of the peeling sheet 1 can be carried out manually or by mechanical operation by simply peeling both off from the ends. At this time, both the upper release sheet 1 and the resin sheet 2 are separated from the base material layer BL, and at the same time, the resin sheet 2 and the embedded and solidified filling resin 14 are cut off. Further, the lower release sheet 1 is peeled off from the layer BL together with the excess resin 2a, and at the same time, the filling resin 14 and the excess resin 2a are cut off. As a result, the filling resin 14 having a shape as shown in FIG. 2 (7) is filled in the through hole TH.
e工程は、 貫通孔であるスルーホール T Hに充填された充填樹脂 1 4の突出部 分 1 4 aを平坦ィ匕するものである。 平坦化は、 例えば S 層 B Lの表面をベルト サンダ、 パフ研磨等により軽く研磨することにより行うことができる。 この研磨 によって、 充填樹脂 1 4の表面はほぼメツキ層 1 1 , 1 2と面一にかつ平坦に形 成される。 さらに、 メヅキ層 1 1 , 1 2の上にフォトリソグラフィ技術を用いて 所定のマスクを形成し、 エッチング処理することによって、 所定のパターンを持 つた配線層 1 5, 1 6を形成することができる (図 2 ( 8 ) 参照) 。 The step e is for flattening the protruding portion 14a of the filling resin 14 filled in the through hole TH which is a through hole. For flattening, for example, belt the surface of S layer BL It can be performed by lightly polishing with sanding, puff polishing or the like. By this polishing, the surface of the filling resin 14 is formed almost flush with the plating layers 11 and 12 and flattened. Further, by forming a predetermined mask on the printing layers 11 and 12 using photolithography technology and performing an etching process, the wiring layers 15 and 16 having a predetermined pattern can be formed. (See Figure 2 (8)).
次に、 図 2 ( 9 ) に示すように、 表面上に絶縁レジスト 1 7を塗布した後、 フ ォトリソグラフィ技術を用いて上層と接続する領域のみを開口させる。 この絶縁 レジストの上には、 さらに絶縁レジスト 1 8を同様に塗布し、 同様にフォトリソ グラフィ技術を用いて上記領域のみを開口させる。 この開口領域は、 図中におい ては充填樹脂 1 4及びその周辺の配線部である。  Next, as shown in FIG. 2 (9), after an insulating resist 17 is applied on the surface, only the region connected to the upper layer is opened using photolithography. On the insulating resist, an insulating resist 18 is further applied in the same manner, and similarly, only the above-mentioned region is opened using the photolithography technique. This opening region is the filling resin 14 and the wiring portion around the filling resin 14 in the figure.
さらに、 図 3 ( 1 0 ) に示すように、 2層目の絶縁レジスト 1 8の上には、 所 定の反応性樹脂中に多数のフィラーを含有させたコーティング材 1 9をスクリー ン印刷等により充填樹脂 1 4及びその周辺の配線部を避けて塗布する。 コーティ ング材 1 9の反応性樹脂としては、 種々の熱硬化性樹脂又は光硬化性樹脂を用い ることができる。 この中に含まれるフイラ一としては、 炭酸カルシウム等の溶出 可能な微小粒子、 例えば数 m程度の粒径の粒子を用いる。  Further, as shown in FIG. 3 (10), a coating material 19 containing a large number of fillers in a predetermined reactive resin is screen-printed on the insulating resist 18 of the second layer. Is applied so as to avoid the filled resin 14 and its surrounding wiring. As the reactive resin of the coating material 19, various thermosetting resins or photocurable resins can be used. As the filler contained therein, elutable fine particles such as calcium carbonate, for example, particles having a particle size of about several meters are used.
コーティング材 1 9を塗布して加熱又は光照射より硬化させた後に、 図 3 ( 1 1 ) に示すように、 その表面をパフにより軽く研磨し (図中破線矢印 A) 、 その 後、 数十 m程度の粒径の砥粒を用いてサンドプラスト処理を行うことにより、 均一な粗面を形成するとともに表面近傍に埋設されたフイラ一を露出させる。 こ の状態で洗浄用の酸溶液等を用いてソフトエツチングを行うことにより、 フイラ 一を溶出させて、 表面に微細な凹凸を形成する。  After the coating material 19 is applied and cured by heating or light irradiation, its surface is lightly polished with a puff (dashed arrow A in the figure) as shown in Fig. 3 (11), and then several tens of By performing sand blasting using abrasive grains having a particle size of about m, a uniform rough surface is formed and the filler embedded near the surface is exposed. By performing soft etching using an acid solution for cleaning in this state, the filler is eluted to form fine irregularities on the surface.
なお、 この後には必要に応じて基板に貫通孔 1 0 bを開ける工程を設ける。 こ の貫通孔 1 0 bは、 図 1 ( 1 ) に示す貫通孔 1 0 aと同様に、 ドリリング等によ つて穿設される。 この貫通孔 1 0 bは、 配線層 1 6と上層の配線層との導電接続 が必要な部分に設けられるものである。  After this, a step of forming a through hole 10b in the substrate is provided as necessary. This through hole 10b is formed by drilling or the like, like the through hole 10a shown in FIG. 1 (1). The through-hole 10b is provided at a portion where conductive connection between the wiring layer 16 and the upper wiring layer is required.
このようにして粗面化されたコーティング材 1 9の表面上に、 図 3 ( 1 2 ) に 示すように、 無電解メツキを施して第 1メツキ層 2 0を全面形成し、 さらに、 電 解メツキを施して第 2メツキ層 2 1を形成する。 このようにメツキ層を 2層に形 成するのは、 メツキ層の被着強度を高めつつ、 メツキ層の表面の平滑性を維持す るためである。 これらのメツキ層により導電接続部 Cが形成される。 As shown in FIG. 3 (12), an electroless plating is performed on the surface of the coating material 19 roughened in this way to form a first plating layer 20 over the entire surface. The second plating layer 21 is formed by plating. In this way, the plating layer is formed into two layers The reason for this is to maintain the smoothness of the surface of the plating layer while increasing the adhesion strength of the plating layer. The conductive connection portion C is formed by these plating layers.
次に、 図 3 ( 1 3 ) に示すように、 上記と同様のフォトリソグラフィ技術によ りメヅキ層 2 0 , 2 1をエッチングし、 所定のパターンにて配線層 2 2を形成す る。 そして、 この配線層の上層にさらに配線層を形成する場合には、 上記の充填 樹脂 1 4と同様にして、 本発明の樹脂充填工程により、 充填樹脂 2 3を貫通孔 1 O bに充填することができる。 また、 導電接続部 Cの上方に形成された凹部に対 しても、 スクリーン印刷等で樹脂 2 4を充填する。  Next, as shown in FIG. 3 (13), the printing layers 20 and 21 are etched by the same photolithography technique as described above to form a wiring layer 22 in a predetermined pattern. When a wiring layer is further formed above this wiring layer, the filling resin 23 is filled into the through holes 1 Ob by the resin filling step of the present invention in the same manner as the filling resin 14 described above. be able to. Also, the resin 24 is filled into the concave portion formed above the conductive connection portion C by screen printing or the like.
以上の工程によると、 充填樹脂 1 4の開口表面は機械的に研磨されて平坦化さ れることから、 当該配線層の上面を平坦化した上で上層の構造を形成してゆくこ とができるので、 上層への形状的影響 (下層の凹凸が上層の層形成に影響し配線 の欠損や断絶をもたらすなど) をも同時に防止することができる。 そして、 更に 上層に配線層を形成することにより、 例えば図 4に示すような多層配線基板 3 0 を製造することができる。  According to the above process, since the opening surface of the filling resin 14 is mechanically polished and flattened, the upper surface of the wiring layer can be flattened to form an upper layer structure. Therefore, it is possible to prevent the topographical effect on the upper layer (such as the unevenness of the lower layer affecting the formation of the upper layer and causing the wiring to be lost or disconnected). Then, by forming a wiring layer further thereon, a multilayer wiring board 30 as shown in FIG. 4, for example, can be manufactured.
この多層配線基板 3 0は、 基板内に配線層 3 1〜 3 6の 6層の回路構成をもつ 6層基板である。 この内部には、 ブラインドバイァホール構造 3 7 , 3 8 a〜3 8 cが形成されており、 ブラインドバイァホール構造 3 8 a〜 3 8 cは、 本発明 の樹脂充填工程により樹脂を充填したものである。 ブラインドバイァホール構造 3 8 aは第 1配線層と第 2配線層とを接続するものであり、 前述の樹脂充填工程 により形成することができる。 ブラインドバイァホール構造 3 8 bは第 1配線層 〜第 3配線層を接続するものであり、 第 3配線層を形成する際に、 スルホールを 形成し、 そこに本発明の樹脂充填工程により樹脂を充填することで形成すること ができる。 また、 ブラインドバイァホール構造 3 8 cも同様である。  This multilayer wiring board 30 is a six-layer board having a circuit configuration of six layers of wiring layers 31 to 36 in the board. Blind via hole structures 37, 38a to 38c are formed in the interior, and the blind via hole structures 38a to 38c are filled with resin by the resin filling step of the present invention. It was done. The blind via hole structure 38a connects the first wiring layer and the second wiring layer, and can be formed by the above-described resin filling step. The blind via hole structure 38 b connects the first wiring layer to the third wiring layer. When forming the third wiring layer, a through hole is formed, and the resin filling step of the present invention is performed there. It can be formed by filling in. The same applies to the blind via hole structure 38c.
なお、 この多層配線基板 3 0は、 チヅブランド 3 9を有する表面実装夕ィプで あり、 スルーホール 4 0は配線接続用に設けられたものであるが、 このようなス ル一ホール 4 0に対しても、 本発明により樹脂の充填を行うことができる。 〔別の実施形態〕  The multi-layer wiring board 30 is a surface-mount type having a brand 39, and the through-holes 40 are provided for wiring connection. On the other hand, resin filling can be performed according to the present invention. [Another embodiment]
( 1 ) 前記の実施形態では、 剥離用シ一ト 1を基材層 B Lの両面に配置する例を 示したが、 剥離用シート 1は 層の片側面 (熱プレス側) に配置するだけでも よい。 その場合、 熱プレスの裏側に流出した過剰の樹脂の除去が問題となるが、 次の方法により、 好適に除去することができる。 (1) In the above-described embodiment, an example is shown in which the release sheets 1 are arranged on both sides of the base material layer BL. However, the release sheet 1 may be arranged on only one side surface (the hot press side) of the layer. Good. In that case, removal of excess resin flowing out to the back side of the hot press poses a problem, but can be suitably removed by the following method.
即ち、 過剰な樹脂の流出量ができるだけ少なくなるように前述の方法で制御し 、 そのままで固化させた後、 平坦化工程により過剰な樹脂を除去することができ る。 また、 前記プレス台と基材層との間にメッシュ状シート等を介在させて、 基 材層の裏側に流出する過剰な樹脂を、 メッシュ状シート等に固着させて、 メヅシ ュ状シート等の剥離により、 過剰な樹脂の除去することができる。 メッシュ状シ 一ト等を用いると、 前記剥離用シートのように開口部を位置合わせする必要がな く、 作業がより簡易なものになる。  That is, the resin is controlled by the above-described method so that the amount of excess resin flowing out is reduced as much as possible. After solidification is performed as it is, the excess resin can be removed by the flattening step. In addition, a mesh sheet or the like is interposed between the press table and the base material layer, and excess resin flowing out to the back side of the base layer is fixed to the mesh sheet or the like, and a mesh sheet or the like is formed. Exfoliation can remove excess resin. When a mesh sheet or the like is used, it is not necessary to position the openings as in the case of the peeling sheet, and the operation becomes simpler.
( 2 ) 前記の実施形態では、 樹脂シート 2として熱硬化性樹脂を含有するプリプ レグを用いる例を示したが、 熱可塑性樹脂製の樹脂シートを用いることも可能で ある。 その場合、 ソルダリング工程を考慮すると高融点の樹脂シートを用いる必 要があり、 高温で加熱加圧を行う必要がある。 また、 樹脂の固化は、 熱プレス面 を樹脂シートから離した状態で、 放置冷却又は空冷等することで行うことができ o  (2) In the above embodiment, an example was described in which a prepreg containing a thermosetting resin was used as the resin sheet 2, but a resin sheet made of a thermoplastic resin may be used. In that case, considering the soldering process, it is necessary to use a resin sheet with a high melting point, and it is necessary to heat and press at a high temperature. In addition, the resin can be solidified by leaving the hot pressed surface away from the resin sheet and cooling it by standing or air cooling o
( 3 ) 前記の実施形態では、 貫通孔として配線層間を導電接続するスルーホール を有する基材層を樹脂充填の対象とする例を示したが、 導 St続以外の目的で形 成された貫通孔を有する配線基板を樹脂充填の対象とすることも可能である。 (3) In the above-described embodiment, an example has been described in which the base material layer having a through hole that electrically conductively connects the wiring layers as the through hole is to be filled with the resin. It is also possible to fill a wiring board having holes with a resin.
( 4 ) 前記の実施形態では、 第 1配線層と第 2配線層とを導電接続するスルーホ —ルに樹脂を充填した後、 更に上層を形成する例を示したが、 一部のスルーホ一 ルには樹脂を充填せずに、 引き続く工程を行うこともできる。 その場合、 剥離用 シートの開口部を一部のスルーホールに対して設けていないものを用いて、 本発 明の樹脂充填工程を行えばよい。 これにより、 一部のスルーホールに樹脂が充填 されていないものを形成することができる。 産業上の利用可能性 (4) In the above-described embodiment, an example is shown in which the through-hole for conductively connecting the first wiring layer and the second wiring layer is filled with resin, and then the upper layer is further formed. The subsequent step can be performed without filling the resin. In such a case, the resin filling step of the present invention may be performed using an opening for the peeling sheet that is not provided for some of the through holes. Thus, a resin in which some of the through holes are not filled with the resin can be formed. Industrial applicability
本発明は、 配線層間の導電接続のためバイァホールや導電接続以外の目的で形 成された貫通孔などを有する配線基板の製造方法に有用である。 より具体的には 、 バイァホール形成過程等において、 貫通孔に樹脂を充填する際、 充填した樹脂 に欠陥が生じにくく、 安価な材料で簡易な工程により、 好適に樹脂を充填するこ とができる。 従って、 本発明は産業上の利用可能性が高いものである。 INDUSTRIAL APPLICABILITY The present invention is useful for a method for manufacturing a wiring board having via holes for conductive connection between wiring layers or through holes formed for purposes other than conductive connection. More specifically, when filling the through-hole with a resin in a via-hole forming process or the like, the filled resin The resin can be suitably filled by a simple process using an inexpensive material with few defects. Therefore, the present invention has high industrial applicability.

Claims

請 求 の 範 囲 The scope of the claims
1 . ( a ) 樹脂を充填する貫通孔を有する基板又は基材層に、 その貫通孔に対応 して開口した開口部を有する剥離用シートを、 その開口部を位置合わせしつつ、 前記基板又は基材層の少なくとも片側面に配置する工程、  1. (a) A release sheet having an opening corresponding to the through-hole is placed on a substrate or a base material layer having a through-hole filled with resin, while aligning the opening, the substrate or Arranging at least one side surface of the base material layer,
( b ) 前記剥離用シートを配置した面に、 加熱により軟化し冷却又は硬化により 固化する樹脂シ一トを配置する工程、  (b) arranging a resin sheet which is softened by heating and solidified by cooling or curing on the surface on which the release sheet is arranged,
( c ) その樹脂シートを加熱加圧により軟ィ匕させつつ、 その一部を前記貫通孔に 埋入し、 その後、 冷却又は硬化により固化させる工程、 及び  (c) a step of embedding a part of the resin sheet in the through hole while softening the resin sheet by applying heat and pressure, and then solidifying by cooling or curing; and
( d ) 前記基板又は基材層から前記剥離用シートを剥離する工程  (d) removing the release sheet from the substrate or base material layer
を含む樹脂充填工程を有する配線基板の製造方法。 A method for manufacturing a wiring board having a resin filling step including:
2 . 前記貫通孔が、 複数の配線層の間を導電接続するためのスルーホールである 請求項 1記載の製造方法。  2. The manufacturing method according to claim 1, wherein the through hole is a through hole for conductively connecting a plurality of wiring layers.
3 . 前記 d工程の後に、  3. After step d,
( e ) 前記基板又は基材層の貫通孔に充填された樹脂の突出部分を平坦化するェ 程を有する請求項 1又は 2に記載の製造方法。  3. The manufacturing method according to claim 1, further comprising: (e) flattening a protruding portion of the resin filled in the through hole of the substrate or the base material layer.
4 . 前記樹脂シートが、 加熱により軟化し、 更に高温で硬化する樹脂材料を含有 する樹脂シートである請求項 1〜 3いずれかに記載の製造方法。  4. The method according to any one of claims 1 to 3, wherein the resin sheet is a resin sheet containing a resin material which is softened by heating and hardened at a high temperature.
5 . 前記 a工程が、 前記剥離用シートを前記基板又は基材層の両面に配置するも のである請求項 1〜4いずれかに記載の製造方法。  5. The production method according to any one of claims 1 to 4, wherein, in the step (a), the release sheet is disposed on both surfaces of the substrate or the base material layer.
6 . 請求項 1〜 5いずれかに記載の製造方法により製造される配線基板。  6. A wiring board manufactured by the manufacturing method according to any one of claims 1 to 5.
PCT/JP1998/005193 1998-11-18 1998-11-18 Method of manufacturing wiring boards WO2000030419A1 (en)

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JP52152999A JP3325903B2 (en) 1998-11-18 1998-11-18 Manufacturing method of wiring board
PCT/JP1998/005193 WO2000030419A1 (en) 1998-11-18 1998-11-18 Method of manufacturing wiring boards
TW087120091A TW411748B (en) 1998-11-18 1998-12-03 Production method for multi-layer wiring board
TW087120090A TW404149B (en) 1998-11-18 1998-12-03 Production method for wiring board

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1179972A2 (en) * 2000-08-09 2002-02-13 Japan Radio Co., Ltd Hole filling method for a printed wiring board
JP2010268682A (en) * 2010-09-01 2010-11-25 Mitsui High Tec Inc Resin sealing method for laminated iron core of rotor
CN113826453A (en) * 2020-04-13 2021-12-21 野田士克林股份有限公司 Method for manufacturing printed circuit board
US12138943B2 (en) 2020-04-13 2024-11-12 Noda Screen Co., Ltd. Method of producing print board

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5526575B2 (en) * 2009-03-30 2014-06-18 凸版印刷株式会社 Semiconductor element substrate manufacturing method and semiconductor device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58220451A (en) * 1982-06-17 1983-12-22 Kyodo Printing Co Ltd Ic module
JPH05226814A (en) * 1992-02-13 1993-09-03 Tokuyama Soda Co Ltd Manufacture of circuit board
JPH06275959A (en) * 1993-03-22 1994-09-30 Hitachi Ltd Multilayer wiring substrate, manufacture thereof, and manufacture of double side printed wiring board

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58220451A (en) * 1982-06-17 1983-12-22 Kyodo Printing Co Ltd Ic module
JPH05226814A (en) * 1992-02-13 1993-09-03 Tokuyama Soda Co Ltd Manufacture of circuit board
JPH06275959A (en) * 1993-03-22 1994-09-30 Hitachi Ltd Multilayer wiring substrate, manufacture thereof, and manufacture of double side printed wiring board

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1179972A2 (en) * 2000-08-09 2002-02-13 Japan Radio Co., Ltd Hole filling method for a printed wiring board
EP1179972A3 (en) * 2000-08-09 2003-12-03 Japan Radio Co., Ltd Hole filling method for a printed wiring board
JP2010268682A (en) * 2010-09-01 2010-11-25 Mitsui High Tec Inc Resin sealing method for laminated iron core of rotor
CN113826453A (en) * 2020-04-13 2021-12-21 野田士克林股份有限公司 Method for manufacturing printed circuit board
EP3944728A4 (en) * 2020-04-13 2023-10-04 Noda Screen Co., Ltd Method for manufacturing printed board
US12138943B2 (en) 2020-04-13 2024-11-12 Noda Screen Co., Ltd. Method of producing print board

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