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WO1997033031A1 - Systeme de nettoyage a base de fluide en surfusion a temperature controlee - Google Patents

Systeme de nettoyage a base de fluide en surfusion a temperature controlee Download PDF

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Publication number
WO1997033031A1
WO1997033031A1 PCT/US1997/003675 US9703675W WO9733031A1 WO 1997033031 A1 WO1997033031 A1 WO 1997033031A1 US 9703675 W US9703675 W US 9703675W WO 9733031 A1 WO9733031 A1 WO 9733031A1
Authority
WO
WIPO (PCT)
Prior art keywords
vessel
liquid gas
gas
cleaning
recited
Prior art date
Application number
PCT/US1997/003675
Other languages
English (en)
Inventor
Todd Taricco
Original Assignee
Todd Taricco
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Todd Taricco filed Critical Todd Taricco
Priority to AU22009/97A priority Critical patent/AU2200997A/en
Publication of WO1997033031A1 publication Critical patent/WO1997033031A1/fr

Links

Classifications

    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
    • D06F43/007—Dry cleaning methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling

Definitions

  • the present invention relates to a system for cleaning with a liquid gas.
  • U.S. Patent Nos. 5,316,591; 5,339,844; 5,467,492 and 5,456,759 issued to Stanford and Chan, and assigned to Hughes Aircraft Company disclose systems for cleaning with liquefied carbon dioxide.
  • the Hughes system includes a cleaning vessel that is filled with liquid C ⁇ 2 • The C ⁇ 2 is then agitated to remove contaminants from an item(s) placed within the vessel. After the item is cleaned, the liquid carbon dioxide is purged from the cleaning vessel.
  • the purged C02 is typically stored within a pressure tank for use in another cleaning cycle. It has been found that the removal of liquid carbon dioxide from the cleaning vessel creates a residual vapor gas within the system. Because C02 is environmentally inert the gas is typically vented to the atmosphere. Venting the gas requires a periodic CO2 recharge of the storage tank. Recharging the storage tank with CO2 increases the cost of operating and maintaining the system. It would therefore be desirable to provide a liquid gas based cleaning system that recycles the cleaning fluid without venting the gas.
  • One way of agitating the cleaning fluid is to circulate the liquid gas through the cleaning vessel with an external pump. Circulating the liquid gas generates energy which increases the temperature of the gas. It has been found that liquid gas such as carbon dioxide has a maximum temperature at which the gas no longer become aggressive. It is therefore critical to maintain the temperature of the liquid CO2 below the critical temperature.
  • Prior art systems utilize a heat exchanger to control the temperature of the liquid gas . Using a separate heat exchanger increases the size and cost of the system. It would therefore be desirable to provide a cleaning system that can control the liquid gas temperature without a large separate heat exchanger.
  • the C02 purged from the cleaning vessel is typically distilled within a distillation vessel.
  • the distilled CO2 is then stored within a separate storage tank. Having two separate components increases the space and cost of providing the system. It would be desirable to provide a single component that both distilled and stored the purged liquid gas from the cleaning vessel.
  • the present invention is a liquid gas based cleaning system.
  • the system includes a cleaning vessel that holds an item to be cleaned and is filled with a volume of liquid gas such as carbon dioxide.
  • the liquid carbon dioxide is circulated through the cleaning vessel to remove contaminants from the item.
  • a secondary supply of super-cooled liquid gas is introduced to the cleaning vessel to maintain the temperature of the liquid gas below a critical value.
  • the liquid gas is pumped to a single storage/still vessel which both distills and stores the gas. Removing the liquid gas from the cleaning vessel creates a residual vapor gas that is sparged in a bath of super-cooled liquid gas. The liquid gas within the cleaning vessel is thus fully received for use in another cleaning cycle.
  • the cleaning vessel may contain a cage that is rotated by the impingement of the circulating liquid gas on a cage blade to induce further agitation within the vessel.
  • the cage may be connected to a quick disconnect base plate that allows various embodiments of cages to be readily attached to the vessel .
  • Figure 1 is a schematic of a cleaning system of the present invention
  • Figure 2 is a schematic of the system showing a cleaning vessel being filled with a liquid gas
  • Figure 3 is a schematic of the system showing the liquid gas being circulated through the cleaning vessel
  • Figure 4 is a schematic of the system showing the liquid gas being pumped out of the cleaning vessel
  • Figure 5 is schematic showing a pump assembly of the present invention
  • FIG. 6 is a side sectional view showing a basket assembly cf the present invention.
  • Figure 1 shows a cleaning system 10 of the present invention.
  • the system 10 is typically utilized to clean an item with a liquefied gas.
  • the gas is carbon dioxide (C02) .
  • C02 carbon dioxide
  • nitrogen, nitrous oxide, sulfur hexafluoride and xenon may be used in the system 10.
  • the system may clean with processes disclosed in U.S. Patent Nos. 5,316,591; 5,339,844; 5,467,492 and 5,456,759, which are hereby incorporated by reference.
  • the system 10 includes a cleaning vessel 12 which has a an inner chamber 14.
  • the inner chamber 14 can be exposed by opening a door 16.
  • Within the vessel 12 are a plurality of headers 18, 20 and 22 that discharge the liquid gas into the inner chamber 14.
  • the inner chamber 14 is typically of sufficient size to contain a number of items such as a pile of clothing. Although clothing is described, it is to be understood that the cleaning system 10 may clean a variety of items.
  • Headers 18 and 22 are connected to a pump 24 by fluid lines 26 and 28, and valves 30.
  • the pump 24 is connected to a storage/still vessel 32 by line 34 and valves 36 and 38.
  • Line 34 is also connected to the inner chamber 14 by line 40 and valve 42.
  • the storage/still 32 stores a volume of liquid gas that can be transferred to the cleaning vessel 12.
  • Liquid carbon dioxide is typically stored in the vessel 32 at a pressure between 600-800 psi and at a temperature in the range of 60 'F.
  • the storage/still 32 is connected to the cleaning vessel 12 by lines 44, 46 and 48, and valves 50 and 52.
  • Line 46 is connected to a heater 54 and the header 20 by valves 56 and 58, respectively.
  • the cleaning vessel 12 is connected to a filter unit 60 by line 62 and valve 64.
  • Line 62 is coupled to line 28 by valve 66.
  • the filter unit 60 typically has a filter membrane that filters out particulates from the liquid gas.
  • the filter 60 is connected to line 34 by line 68 which extends through a heat exchanger 70.
  • the flow of the liquid gas through line 68 is controlled by valve 72.
  • the valves, pump and other components of the system can all be controlled by a controller 74.
  • the inner chamber 14 can be filled by opening valves 36, 38, 42, 50 and 52 and allowing the highly pressurized liquid gas within the storage/still vessel 32 to flow into the cleaning vessel 12.
  • the liquid gas can be circulated through the cleaning vessel 12 by closing valves 42 and 52, opening valves 30, 36, 64 and 72, and activating the pump 24.
  • the liquid gas is discharged from the headers 18 and 22 into the inner chamber 14. From the inner chamber 14 the liquid gas flows through the filter 60, along line 68 and back into the pump 24.
  • the circulation of the liquid gas creates energy that will raise the temperature of the gas. It has been found that the aggressive cleaning characteristics of liquid carbon dioxide reduces when the temperature exceeds a critical temperature.
  • the critical temperature varies depending upon the pressure and composition of the gas. It is therefore desirable to maintain the temperature of the liquid C02 below the critical temperature.
  • the temperature can be controlled by introducing a super-cooled liquid gas into the circulating liquid during the cleaning process.
  • the super-cooled liquid can be stored within a cold storage tank 76.
  • the super-cooled liquid gas is typically stored at a temperature between -20 and -30 'F, and a pressure of approximately 250 psi.
  • the cold storage tank 76 is connected to line 34 by lines 78, 80 and 82, valve 84, and pump 86.
  • the pump 86 raises the pressure of the super-cooled liquid gas to a level which will allow the super-cooled liquid to flow into line 34 and the cleaning vessel 12.
  • the quantity of super ⁇ cooled liquid introduced to line 34 is controlled by valve 84 and the controller 74.
  • the system may have thermocouples (not shown) which provide temperature feedback to the controller 74.
  • the controller 74 will vary the amount of super-cooled liquid gas introduced to line 34 to maintain the temperature of the liquid within the inner chamber 14 below the critical value.
  • the heat exchanger 70 is coupled to the super ⁇ cooled liquid gas by line 88 and valve 90.
  • the temperature of the liquid gas within the cleaning vessel 12 is further controlled by valve 90 and the controller 74.
  • the heat exchanger 70 is connected to a syphon unit 92 by line 94.
  • the syphon unit 92 utilizes a venturi effect to pull super-cooled liquid gas from line 96 and 98 into the return gas flowing through line 94.
  • the flow of liquid gas through line 98 is controlled by valve 100.
  • the syphon unit 92 pre-cools the liquid gas from the heat exchanger 70.
  • the liquid gas is super ⁇ cooled by heat exchanger 102.
  • the heat exchanger 102 is coupled to a refrigeration unit 104 and a valve 106.
  • valves 30, 36 and 84 are closed and valves 42 and 66 are opened.
  • the pump 24 pumps the liquid gas into the storage/still 32.
  • the purging of liquid gas from the inner chamber 14 will create a residual vapor gas in the system.
  • the vapor gas is drawn out of the inner chamber 14 by a compressor 108 that is connected to the cleaning vessel 12 by line 110 and valve 112.
  • the compressor 108 is connected to a water separator 114 by lines 116, 46 and 118, and valve 120.
  • the water separator 114 is also coupled to the cold storage tank 76 by lines 120 and valves 122.
  • the water separator 114 condenses any moisture within the vaporized gas.
  • the separator 114 typically has a trap to remove the condensed moisture.
  • the water separator 114 is connected to line 94 by line 124.
  • the vaporized gas is further cooled by the syphon unit 92 and heat exchanger 102.
  • the gas typically enters the cold tank 76 in a vaporized or two- phase liquid-vapor form.
  • the vaporized gas is fed through a tube 126 which extends into the tank 76.
  • the tube 126 has openings 128 which discharge the vaporized gas into the super-cooled liquid gas.
  • the super-cooled liquid gas condenses the discharged vaporized gas in a process typically referred to as sparging.
  • vapor gas can be directed to line 46 and the heater 56 by opening valve 130.
  • the heater 56 super heats the gas which is then directed into the inner chamber 14 through open valve 58 and header 20.
  • the heated gas raises the temperature of the item, which may be particularly desirable if the item is clothing.
  • the pump 24 and compressor 108 pull the gas out of the cleaning vessel 12 until the inner chamber 14 reaches essentially atmospheric pressure.
  • the compressor 108 and pump 24 are then de-activated and the valves 30, 38, 42, 52, 58 and 66 are closed The door 16 is then opened so that the item can be removed from the cleaning vessel 12.
  • the storage/still vessel 32 both distills and stores the liquid gas for use in another cleaning cycle.
  • the vessel 32 preferably includes a tube 132 located within an inner cavity 134 of an outer tank 136. At the top of the tube 132 is an opening 136 that provides fluid communication between the inner cavity 134 and an inner chamber 138 of the tube 132.
  • the bottom of the tube 132 has a one-way control valve 140 that allows the liquid gas to flow from the inner cavity 134 to the inner chamber 138.
  • the vessel 32 has a heating element 142 which can heat and vaporize the liquid gas within the inner chamber 138 of the tube 132.
  • the vessel 132 also has a discharge tube 144 that is connected to the output of the super-cooled pump 86 by line 146 and valve 148.
  • the tube 144 discharges super-cooled liquid gas which condenses the gas vaporized within the inner chamber 138.
  • the condensed gas falls into the inner cavity 134, which then forms a layer of distilled "clean" liquid, on top of a layer of undistilled “dirty” liquid.
  • the still 32 vaporizes the liquid gas within the tube 132, which causes liquid to flow from the inner cavity 134 to the inner chamber 138.
  • the cycle is continued until the level of dirty liquid falls below the valve 140.
  • the valve 140 is turned off and the remaining liquid within the tube 132 is evaporated.
  • the heating element 142 heats the liquid gas below the boiling point of contaminants such as oil so that the contaminants remain at the bottom of the tube 132 after the distillation cycle.
  • the vessel 32 has a vent trap 150 that allows the contaminants to be removed from the tube 132.
  • the vessel 32 provides a single component which can both distill and store the liquid gas.
  • FIG. 5 shows a preferred embodiment of a pump 24.
  • the pump 24 includes an impeller 160 located within an impeller chamber 162.
  • the chamber 162 has an inlet port 164 and an outlet port 164.
  • the super-cooled liquid gas is typically introduced to the pump inlet 164 to reduce the probability of cavitation within the pump 24.
  • the impeller 160 is driven by a motor 166 that is locaued within a motor chamber 168.
  • the impeller chamber 162 is separated from the motor chamber 168 by a seal 170. Because of the relatively high operating pressures of the system some of the liquid gas will leak into the motor chamber 168. The aggressive cleaning characteristics of the liquid gas have a tendency to remove the lubricants of the motor 166 and reduce the life of the pump assembly.
  • the motor chamber 168 may have a heat exchanger 172 that heats the liquid gas to a temperature above the critical temperature of the gas. The gas will not attack the lubricated components of the motor 166 at the elevated temperature. The gas is preferably heated to a vapor state to create a gas seal within the chamber 168.
  • the heat exchanger 172 can also remove the heat generated by the motor 166 to maintain the motor temperature within an operating range.
  • FIG. 6 shows a preferred embodiment of a basket assembly 180 of the cleaning vessel 12.
  • the assembly includes a basket 182 that is coupled to a base plate 184 by bearings 186.
  • the basket 182 has a blade(s) 188 located adjacent to the output nozzles of the headers. The circulating liquid gas impinges upon the blade 188 and rotates the basket 182 to further agitate the liquid gas and item within the inner chamber 14.
  • the base plate 184 is preferably coupled to the base 190 of the vessel 12 by a plurality of fasteners 192 so that the plate 184 can be readily removed from the cleaning vessel 12.
  • different types of basket assemblies can be incorporated into the cleaning vessel 12.
  • the rotating basket can be replaced with a stationary basket.

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

Système de nettoyage à base de gaz liquide (10) qui inclue une cuve de nettoyage (12) contenant la pièce à nettoyer et remplie d'une quantité de gaz liquide tel que le dioxyde de carbone. Le dioxyde de carbone liquide circule dans la cuve de nettoyage (12) et enlève les contaminants de la pièce à nettoyer. Le gaz liquide en surfusion est également introduit dans la cuve de nettoyage (12) à partir d'une deuxième source afin de maintenir la température du gaz liquide au-dessous d'une valeur critique. Une fois la pièce nettoyée, le gaz liquide est pompé dans une cuve unique de stockage et de distillation (32), qui sert à stocker et à distiller le gaz. L'évacuation du gaz liquide de la cuve de nettoyage (12) crée une vapeur de gaz résiduelle, qui est dispersée dans un bain de gaz liquide en surfusion. Cela permet de récupérer le gaz liquide se trouvant à l'intérieur de la cuve de nettoyage (12) dans son intégralité afin de le réutiliser pour un autre cycle de nettoyage.
PCT/US1997/003675 1996-03-08 1997-03-10 Systeme de nettoyage a base de fluide en surfusion a temperature controlee WO1997033031A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU22009/97A AU2200997A (en) 1996-03-08 1997-03-10 A super-cooled fluid temperature controlled cleaning system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61481196A 1996-03-08 1996-03-08
US08/614,811 1996-03-08

Publications (1)

Publication Number Publication Date
WO1997033031A1 true WO1997033031A1 (fr) 1997-09-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1997/003675 WO1997033031A1 (fr) 1996-03-08 1997-03-10 Systeme de nettoyage a base de fluide en surfusion a temperature controlee

Country Status (2)

Country Link
AU (1) AU2200997A (fr)
WO (1) WO1997033031A1 (fr)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0919659A2 (fr) * 1997-11-26 1999-06-02 MVE, Inc. Nettoyage à sec avec du gaz carbonique
WO1999049122A1 (fr) * 1998-03-24 1999-09-30 Micell Technologies, Inc. Appareil de nettoyage
WO2000001871A1 (fr) * 1998-07-02 2000-01-13 Fedegari Autoclavi S.P.A. Appareil et procede de nettoyage avec un fluide en phase dense
WO2000019000A1 (fr) * 1998-09-28 2000-04-06 Aga Aktiebolag Procede et systeme de nettoyage a base de fluide
US6148645A (en) * 1999-05-14 2000-11-21 Micell Technologies, Inc. Detergent injection systems for carbon dioxide cleaning apparatus
WO2000070140A1 (fr) * 1999-05-12 2000-11-23 Linde Gas Ag Dispositif de nettoyage et procede de nettoyage avec des gaz liquefies ou surcritiques
WO2001023657A1 (fr) * 1999-09-24 2001-04-05 Micell Technologies, Inc. Systeme de commande d'un appareil de nettoyage a dioxyde de carbone
WO2001023658A1 (fr) * 1999-09-24 2001-04-05 Micell Technologies, Inc. Procedes et appareil permettant de conserver la vapeur et de recueillir le dioxyde de carbone liquide en vue d'un nettoyage a sec du dioxyde de carbone
US6216302B1 (en) 1997-11-26 2001-04-17 Mve, Inc. Carbon dioxide dry cleaning system
US6248136B1 (en) 2000-02-03 2001-06-19 Micell Technologies, Inc. Methods for carbon dioxide dry cleaning with integrated distribution
US6351973B1 (en) 1999-02-04 2002-03-05 Micell Technologies, Inc. Internal motor drive liquid carbon dioxide agitation system
WO2002031253A2 (fr) * 2000-10-13 2002-04-18 Micell Technologies, Inc. Receptacle sous pression divise pour systemes a base de dioxyde de carbone et procedes d'utilisation
US6442980B2 (en) * 1997-11-26 2002-09-03 Chart Inc. Carbon dioxide dry cleaning system
US6536059B2 (en) 2001-01-12 2003-03-25 Micell Technologies, Inc. Pumpless carbon dioxide dry cleaning system
US7044143B2 (en) 1999-05-14 2006-05-16 Micell Technologies, Inc. Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems
KR20220107552A (ko) * 2021-01-25 2022-08-02 엘지전자 주식회사 의류처리장치 및 그 제어방법

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US2816426A (en) * 1955-07-01 1957-12-17 Westinghouse Electric Corp Mount construction for butt-sealed lamps
US4895176A (en) * 1989-11-06 1990-01-23 Shigeo Ohtsuka Chloro-fluoro-carbon cleaning apparatus
US5368171A (en) * 1992-07-20 1994-11-29 Jackson; David P. Dense fluid microwave centrifuge
US5467492A (en) * 1994-04-29 1995-11-21 Hughes Aircraft Company Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium
US5482064A (en) * 1991-12-03 1996-01-09 Robowash Pty Ltd. Cleaning apparatus

Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
US2816426A (en) * 1955-07-01 1957-12-17 Westinghouse Electric Corp Mount construction for butt-sealed lamps
US4895176A (en) * 1989-11-06 1990-01-23 Shigeo Ohtsuka Chloro-fluoro-carbon cleaning apparatus
US5482064A (en) * 1991-12-03 1996-01-09 Robowash Pty Ltd. Cleaning apparatus
US5368171A (en) * 1992-07-20 1994-11-29 Jackson; David P. Dense fluid microwave centrifuge
US5467492A (en) * 1994-04-29 1995-11-21 Hughes Aircraft Company Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium

Cited By (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6442980B2 (en) * 1997-11-26 2002-09-03 Chart Inc. Carbon dioxide dry cleaning system
EP0919659A3 (fr) * 1997-11-26 1999-09-08 MVE, Inc. Nettoyage à sec avec du gaz carbonique
EP0919659A2 (fr) * 1997-11-26 1999-06-02 MVE, Inc. Nettoyage à sec avec du gaz carbonique
US6216302B1 (en) 1997-11-26 2001-04-17 Mve, Inc. Carbon dioxide dry cleaning system
US6088863A (en) * 1998-03-24 2000-07-18 Micell Technologies, Inc. Cleaning apparatus
US6049931A (en) * 1998-03-24 2000-04-18 Micell Technologies, Inc. Cleaning apparatus
US6412312B1 (en) 1998-03-24 2002-07-02 Micell Technologies, Inc. Cleaning apparatus
US6098430A (en) * 1998-03-24 2000-08-08 Micell Technologies, Inc. Cleaning apparatus
US6122941A (en) * 1998-03-24 2000-09-26 Micell Technologies, Inc. Cleaning apparatus
EP1357218A3 (fr) * 1998-03-24 2004-08-04 Micell Technologies, Inc. Machine à laver
WO1999049122A1 (fr) * 1998-03-24 1999-09-30 Micell Technologies, Inc. Appareil de nettoyage
EP1357218A2 (fr) * 1998-03-24 2003-10-29 Micell Technologies, Inc. Machine à laver
AU752544B2 (en) * 1998-03-24 2002-09-19 Micell Technologies, Inc. Cleaning apparatus
US6481247B1 (en) 1998-07-02 2002-11-19 Fedegari Autoclavi Spa Cleaning method and apparatus with dense phase fluid
WO2000001871A1 (fr) * 1998-07-02 2000-01-13 Fedegari Autoclavi S.P.A. Appareil et procede de nettoyage avec un fluide en phase dense
US6247340B1 (en) 1998-09-28 2001-06-19 Aga Ab Fluid based cleaning method and system
WO2000019000A1 (fr) * 1998-09-28 2000-04-06 Aga Aktiebolag Procede et systeme de nettoyage a base de fluide
US6351973B1 (en) 1999-02-04 2002-03-05 Micell Technologies, Inc. Internal motor drive liquid carbon dioxide agitation system
WO2000070140A1 (fr) * 1999-05-12 2000-11-23 Linde Gas Ag Dispositif de nettoyage et procede de nettoyage avec des gaz liquefies ou surcritiques
US6821356B1 (en) 1999-05-12 2004-11-23 Linde Aktiengesellschaft Cleaning device and method for cleaning, using liquid and/or supercritical gases
US6499322B1 (en) 1999-05-14 2002-12-31 Micell Technologies, Inc. Detergent injection systems for carbon dioxide cleaning apparatus
US7044143B2 (en) 1999-05-14 2006-05-16 Micell Technologies, Inc. Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems
US6148645A (en) * 1999-05-14 2000-11-21 Micell Technologies, Inc. Detergent injection systems for carbon dioxide cleaning apparatus
US6711773B2 (en) 1999-05-14 2004-03-30 Micell Technologies, Inc. Detergent injection methods for carbon dioxide cleaning apparatus
US6269507B1 (en) 1999-05-14 2001-08-07 Micell Technologies, Inc. Detergent injection systems for carbon dioxide cleaning apparatus
US6921420B2 (en) 1999-09-24 2005-07-26 Micell Technologies Apparatus and methods for conserving vapor in a carbon dioxide dry cleaning system
US6314601B1 (en) 1999-09-24 2001-11-13 Mcclain James B. System for the control of a carbon dioxide cleaning apparatus
US7114508B2 (en) 1999-09-24 2006-10-03 Micell Technologies Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same
US6397421B1 (en) 1999-09-24 2002-06-04 Micell Technologies Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning
US6589592B1 (en) 1999-09-24 2003-07-08 Micell Technologies Methods of coating articles using a densified coating system
WO2001023657A1 (fr) * 1999-09-24 2001-04-05 Micell Technologies, Inc. Systeme de commande d'un appareil de nettoyage a dioxyde de carbone
US6666050B2 (en) 1999-09-24 2003-12-23 Micell Technologies, Inc. Apparatus for conserving vapor in a carbon dioxide dry cleaning system
US6795991B2 (en) 1999-09-24 2004-09-28 Micell Technologies Apparatus for conserving vapor in a carbon dioxide dry cleaning system
WO2001023658A1 (fr) * 1999-09-24 2001-04-05 Micell Technologies, Inc. Procedes et appareil permettant de conserver la vapeur et de recueillir le dioxyde de carbone liquide en vue d'un nettoyage a sec du dioxyde de carbone
US6332342B2 (en) 2000-02-03 2001-12-25 Mcclain James B. Methods for carbon dioxide dry cleaning with integrated distribution
US6248136B1 (en) 2000-02-03 2001-06-19 Micell Technologies, Inc. Methods for carbon dioxide dry cleaning with integrated distribution
US6734112B2 (en) 2000-10-13 2004-05-11 Micell Technologies Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same
WO2002031253A3 (fr) * 2000-10-13 2002-08-01 Micell Technologies Inc Receptacle sous pression divise pour systemes a base de dioxyde de carbone et procedes d'utilisation
US6982007B2 (en) 2000-10-13 2006-01-03 Micell Technologies Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same
WO2002031253A2 (fr) * 2000-10-13 2002-04-18 Micell Technologies, Inc. Receptacle sous pression divise pour systemes a base de dioxyde de carbone et procedes d'utilisation
US6536059B2 (en) 2001-01-12 2003-03-25 Micell Technologies, Inc. Pumpless carbon dioxide dry cleaning system
KR20220107552A (ko) * 2021-01-25 2022-08-02 엘지전자 주식회사 의류처리장치 및 그 제어방법
KR102594903B1 (ko) * 2021-01-25 2023-10-27 엘지전자 주식회사 의류처리장치 및 그 제어방법

Also Published As

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