[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

WO1996036868A1 - Electron beam treatment system with adjustable flow - Google Patents

Electron beam treatment system with adjustable flow Download PDF

Info

Publication number
WO1996036868A1
WO1996036868A1 PCT/US1996/006921 US9606921W WO9636868A1 WO 1996036868 A1 WO1996036868 A1 WO 1996036868A1 US 9606921 W US9606921 W US 9606921W WO 9636868 A1 WO9636868 A1 WO 9636868A1
Authority
WO
WIPO (PCT)
Prior art keywords
water
top wall
free end
bottom wall
passageway
Prior art date
Application number
PCT/US1996/006921
Other languages
French (fr)
Inventor
Charles N. Kurucz
Thomas D. Waite
Original Assignee
Kurucz Charles N
Waite Thomas D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurucz Charles N, Waite Thomas D filed Critical Kurucz Charles N
Publication of WO1996036868A1 publication Critical patent/WO1996036868A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/20Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/40Liquid flow rate

Definitions

  • Electron Beam Treatment System With Adjustable Flow
  • the present invention relates generally to the field of treatment systems for purification of contaminated water. More specifically, the present invention relates to a synergistic system for full and simultaneous treatment of contaminated air and water which are often extracted together at a treatment site, such as from a vapor extraction well, and to treatment of either one separately.
  • the system includes a flow metering assembly into which stream of contaminated water is pumped for shaping the water stream into a broad layer of metered depth, for electron beam and air stripping treatment.
  • the flow metering assembly includes a flow shaping passageway which spreads the water into the broad layer.
  • the height of the passageway is adjusted to create a water layer having a maximum depth for which satisfactory purification is achieved with given treatment means for a given level of contamination, so that the flow rate and resisting speed of treatment are always maximized.
  • the passageway includes a water layer supporting bottom wall having a water entry end and a water exit end, and a cantilevered top wall having a top wall free end extending over the water entry end of the passageway.
  • a deflection mechanism deflects the top wall free end upwardly or downwardly, as needed, to alter the height of the passageway and the depth of the water layer, and thus the flow rate.
  • Re-circulated air in the loop cools a titanium foil window separating the beam generator from the air stream. Condensed moisture from the air stream is delivered into the flow metering assembly.
  • the loop not only destroys air contaminants gathered during stripping, but also cleans contaminated air extracted together with the contaminated water from a water source, pumped into the closed air circulation loop assembly for purification.
  • Bosshard U.S. Patent Number 4,048,504, issued on September 13, 1977, teaches a method and apparatus for treating flowable materials.
  • Bosshard includes a hopper for retaining flowable materials to be treated.
  • a wall of the hopper is formed of two or more parallel and laterally spaced apart cylinders mounted to rotate on their axes. The cylinders are spun to accelerate a layer of flowable material between them and outward, either downward or along a lateral projectile path toward a receiving vessel.
  • Electron generators bombard the accelerated layer with electron beams to purify the flowable
  • Bosshard A problem with Bosshard is that the flowable material cannot be treated by air stripping without the stream of air deflecting and distorting the unsupported layer. Another problem with Bosshard is that the cylinders and cylinder spinning mechanism make the treatment apparatus costly. The rate of energy consumption needed to maintain high speed cylinder rotation makes Bosshard costly to operate as well. Accelerating the layer with spinning cylinders is thus inefficient.
  • Bosshard U.S. Patent Number 4,074,138, issued on February 14, 1978, reveals an apparatus for treating liquid sludge material.
  • This Bosshard design is similar to the earlier one described above, except that the depth of the flowable material layer is metered by a plate or by a secondary acceleration cylinder adjustably spaced apart from a primary acceleration cylinder. Unlike in the earlier version, the primary acceleration cylinder supports the portion of the layer being bombarded by the electron beam. Then the layer is peeled off the cylinder by what is termed a stripper blade and flows into a receiving vessel.
  • Problems with this version of Bosshard are, once again, that the cylinders and cylinder spinning mechanism make the treatment apparatus costly, and accelerating the layer with spinning cylinders is inefficient. Another problem is that no provision is made for increasing treatment effectiveness with air stripping. Still another problem is that no provision is made for purifying contaminated air which may accompany the flowable material.
  • Trebler U.S. Patent Number 2,001,555, issued on May 14, 1935, teaches a device for the irradiation of milk with ultraviolet rays.
  • Trebler includes an elongate trough for receiving milk to be treated, including two trough lateral wall portions and a bottom wall portion.
  • a trough cover is provided having a top wall and a flange extending downwardly into the trough adjacent to and spaced apart from a trough lateral wall. Milk exits the trough between the flange and the adjacent lateral
  • SUBSTf iTE ShEET R ⁇ lE 26 wall as a milk layer which runs down a face of an upright sheet member below the trough, where the layer is exposed to ultraviolet rays.
  • a problem with Trebler is that the layer is of fixed depth so that the flow rate must be fixed as well. According to Trebler, it is "advantageous that ... the thickness of the film and the rate of flow be maintained as nearly constant as possible.”
  • Another problem is that no provision is made for stripping with an air stream.
  • Water is fed to an electrochemical cell where oxygen and ozone are liberated in the anode space and hydrogen is liberated in the cathode space. Excess oxygen and ozone are vented through a valve. Then the water is fed into a residence time container where the ozone breaks down organic contaminants.
  • the residence time container discharges the water into a first reaction vessel for ultraviolet irradiation and then into a second reaction vessel where excess oxygen and ozone are broken down by added hydrogen. The remainder of the reaction products are trapped in a filter.
  • Baumann, et al. Some of the treated water is tapped into a receiving vessel and the rest is recirculated through the system with added waste water.
  • a problem with Baumann, et al. is that no provision is made for treating contaminated air.
  • Another problem with Baumann, et al. is that no provision is made for altering the water flow rate for varying levels of contamination.
  • Still another problem is that Baumann, et al., is complex and costly to build and operate.
  • suesi ⁇ i ⁇ iSH- ⁇ pitf It is thus an object of the present invention to provide a treatment system which is capable of simultaneously purifying contaminated water and contaminated air, which may be extracted together at a treatment site.
  • the present invention accomplishes the above-stated objectives, as well as others, as may be determined by a fair reading and interpretation of the entire specification.
  • a water flow metering apparatus for shaping the cross-section of flowing water into a layer of variable depth, including a water receiving chamber for receiving and discharging water to be treated, a water releasing chamber for
  • SUBSTHUTE SHEET (RBt£ 26) receiving and discharging water which has been treated, a shaping passageway extending between the water receiving chamber and the water releasing chamber, including a passageway bottom wall having bottom wall water entry end and a bottom wall water exit end and having a passageway top wall spaced apart a certain distance defining an internal passageway height for forming a water layer having a depth corresponding to the passageway height, and a water exposure window opening through the top wall, a treatment mechanism for treating the water layer as the layer is exposed at the water exposure window, and a mechanism for altering the certain distance to alter the layer depth to create a desired water flow rate.
  • the bottom wall preferably has a water entry end and a water exit end and a certain length
  • the top wall is preferably a cantilevered panel extending over the bottom wall water entry end and terminating in a top wall free end over the bottom wall between the water entry end and the water exit end so that a portion of the bottom wall extends beyond the top wall free end.
  • the mechanism for altering the certain distance preferably includes a deflection mechanism for deflecting the top wall free end upwardly to increase the passageway height and the water layer depth, and downwardly to decrease the passageway height and the water layer depth.
  • the deflection mechanism may include an adjustment bolt having bolt threads engagingly and rotatably extending into a threaded bore in a bolt anchor member, the bolt engaging the top wall, so that rotating the bolt in a first direction causes a portion of the bolt to bear against and deflect the top wall free end upwardly with respect to the bottom wall, and so that rotating the bolt in a second direction causes a portion of the bolt to bear against and deflect the top wall free end downwardly with respect to the bottom wall.
  • the deflection mechanism includes an adjustment cam with a cam surface, a cam
  • SUBSTITUTE SHEET (RBIE 26) element mounting structure for rotatably mounting the cam so that the cam surface slidably bears against and rotates relative to the top wall free end to deflect the top wall free end relative to the bottom wall and to thereby alter the passageway height and water layer depth.
  • the deflection mechanism includes a pivot plate bent to form two substantially perpendicular plate sections, an elongate mounting member secured to the chamber walls on and about which the pivot plate pivots, a threaded shaft which engagingly fits through a threaded port in the chamber side wall, where the pivot plate re-directs a substantially horizontal force imparted by rotation of the threaded shaft against the pivot plate as a vertical force transmitted through a link to bear against the top wall free end to deflect the top wall free end relative to the bottom wall and to thereby alter the passageway height and water layer depth.
  • the water exposure window preferably includes the horizontal area between the top wall free end and the bottom wall water exit end.
  • the treatment mechanism preferably includes an electron beam generator for directing a beam of electrons into the water layer through the exposure window.
  • the treatment mechanism preferably additionally includes a stripping air delivery loop assembly, the loop assembly including a conduit structure formed into a loop for circulating a stream of air across the layer of water and through the beam of electrons, and a blower for pumping the stream of air through the loop assembly.
  • the loop assembly preferably additionally includes a heat exchanger for cooling the stream of air, which also cools the titanium foil window.
  • the loop assembly preferably additionally includes a condensing element for condensing moisture in the stream of air into liquid condensate, and a condensate delivery structure for delivering the liquid condensate into the water receiving chamber.
  • FIGURE 1 is a perspective view of the inventive flow metering assembly.
  • FIGURE 3 is a cross-sectional side view of the flow metering assembly, illustrating the second preferred version of the deflecting mechanism.
  • FIGURE 3a is a close-up, partial front view of the deflection mechanism.
  • FIGURE 3b is a cross- sectional side view of the cam, cam flanges and engaging track members protruding from the chamber top wall.
  • FIGURE 4 is a cross-sectional side view of the flow metering assembly, illustrating the third preferred version of the deflecting mechanism.
  • FIGURE 4a is a close-up of the threaded shaft and of the pivot plate riding on the elongate mounting member.
  • FIGURE 5 is a schematic view of the inventive air loop assembly.
  • FIGURE 6 is a cross-sectional side view of the effluent water processor.
  • a water treatment system 10 for providing full treatment of contaminated water 12 and contaminated air 14, either simultaneously or separately.
  • System 10 includes a flow metering assembly 20 which exposes the water 12 to a combination of air stripping and electron beam irradiation at a selected water 12 flow rate. Less contaminated water 12 requires less intense air stripping and
  • Flow metering assembly 20 includes a water receiving chamber 22 and a water releasing chamber 24 having chamber outer side walls 18. See FIGURES 1-4.
  • a substantially vertical partition member 26 separates receiving chamber 22 from releasing chamber 24.
  • a vertically narrow, laterally elongate passageway 30 is provided at the top of member 26 for shaping water 12 into a broad layer 28.
  • Passageway 30 includes a substantially horizontal passageway bottom wall 32 extending laterally from partition member 26 into releasing chamber 24. Bottom wall 32 has a water entry end 36 and a water exit end 42.
  • a substantially horizontal passageway top wall 34 is vertically spaced apart from bottom wall 32 and extends over bottom wall 32.
  • Top wall 34 preferably terminates in a free end 46 located above bottom wall 32 between water entry end 36 and water exit end 42, so that a portion of bottom wall 32 and thus a segment 48 of the surface of water layer 28 is exposed to stripping air 14 and to an electron beam 44.
  • the surface region of water layer 28 exposed for treatment is termed in the claims the "water exposure window".
  • the height of passageway 30, and thus the depth of water layer 28, may be adjusted by altering the elevation of either passageway top wall 34 or passageway bottom wall 32, or of both. It is preferred that top wall 34 be a cantilever panel extending from receiving chamber 22 outer wall 18 across chamber 22 and across bottom wall water entry end 36. For this embodiment, the height of passageway 30 is adjusted by deflecting top wall free end 46 upwardly or downwardly relative to bottom wall 32 with a deflecting mechanism 50. See FIGURES 2-4. Although deflecting mechanism 50 may take many forms, three inventive variations are specifically contemplated.
  • a first variation of deflecting mechanism 50 includes a threaded bolt 52 extending through a port 54 in top wall 34 near free end 46. See FIGURE 2.
  • a bolt head 56 wider than port 54 extends radially from bolt 52 over the upper surface of top wall 34, and a bolt flange 62 also wider than port 54 extends radially under the lower surface of top wall 34.
  • Bolt 52 engagingly fits into a threaded bore 64 in an anchor block 66 secured to the bottom of receiving chamber 22.
  • Rotating bolt head 56 causes the bolt threads 72 to either axially elevate or axially lower bolt 52 within anchor block bore 64.
  • Bolt head 56, or alternatively a flange 56 bears against passageway top wall 34 to deflect top wall free end 46 either upwardly or downwardly, as needed, relative to bottom wall 32 to appropriately alter the height of passageway 30 and the depth of water layer 28.
  • a second variation of deflecting mechanism 50 includes an elliptical cam 80 rotatably mounted immediately beneath top wall 34. See FIGURES 3, 3a and 3b.
  • Cam 80 is mounted on a cam axle 82 which is in turn rotatably mounted between mounting flanges 84 projecting from a chamber 22 side wall 16.
  • a radial link 86 is pinned to and extends laterally from axle 82.
  • Link 86 is pivotably connected to a joining link 88 into which an end of a threaded shaft 92 is rotatably retainied.
  • Shaft 92 is engagingly fitted through a threaded port 94 in chamber 22 side wall 16.
  • Rotating a knob 96 on the exposed end of shaft 92 drives shaft 92 to push or pull radial link 86 and thereby rotate cam 80.
  • the rotation of cam 80 in one direction drives the cam 80 cam surface 98 against top wall 34 to deflect top wall free end 46 upwardly to increase the height of passageway 30.
  • Two opposing lateral flanges 102 on cam 80 engage track members 104 protruding from top wall 34, so that rotating cam 80 in the other direction causes lateral
  • SUESlTIM EET flanges 102 to pull against track members 104 and thus to pull top wall free end 46 downwardly to decrease the height of passageway 30.
  • a third variation of deflecting mechanism 50 includes a pivot plate 106 which is bent to form two perpendicular plate sections and which pivots on an elongate mounting member 108 secured to chamber walls. See FIGURES 4 and 4a.
  • a threaded shaft 92 is again provided which engagingly fits through a threaded port 94 in chamber 22 side wall 16.
  • Plate 106 re ⁇ directs a horizontal force imparted by rotating shaft 92 against plate 106 as a vertical force transmitted through a link 110 to bear against top wall 34. See FIGURE 4.
  • Similar deflecting or elevation adjusting mechanisms may alternatively be employed to deflect a free end of bottom wall 32.
  • Loop assembly 136 includes electron beam generator 130 formed of an electron accelerator 132 and a scan beam diffusion chamber 128. See FIGURE 5. Loop assembly 136 also includes a water layer 28 exposure and treatment unit 140, an air turbo blower 150, an air cooler 160 in the form of a heat exchanger, and a condenser and liquid injection pump 170 which delivers condensate from air 14 through a cross conduit 172 into receiving conduit 174. Purified air 14 is released through a vapor phase treatment exhaust fan 180.
  • Water layer 28 exposure and treatment unit 140 includes an elongate tunnel 142 having an air entry end 144 and an air exit end 146. See FIGURE 2. A longitudinal divider wall 148 extends through tunnel 142 and has an open water 12 exposure window 190.
  • Tunnel 142 has a tunnel outer wall 192 with an electron beam window 194 covered by a layer of titanium foil 196. Electron beam 44 passes through foil 196 into water layer 28. Foil 196 prevents air 14 from entering scan beam diffusion chamber 134. The stream of air 14 is deflected toward foil 196 by angled divider wall portion 198 to cool foil 196, and limits turbulence of air near the thin water layer 28. The distance from the surface of the water to the titanium foil 196 is variable by design for different treatment situations. Loop assembly 136 is preferably formed of stainless steel.
  • ozone created in loop through beam enhances water 12 and air 14 purification. Efficiency is further enhanced because when electrons hit metal they produce X-rays, which enhance purification and are safely contained within the metering assembly with suitable shielding.
  • Contaminated water 12 is delivered into receiving chamber 22 through a water entrance conduit 112 by a pump.
  • Water 12 accumulates and rises in chamber 22 until it reaches the level of passageway 30, and then flows from chamber 22 into chamber 24 through passageway 30.
  • Passageway 30 shapes the flowing water 12 into a wide, shallow layer 28.
  • a stream of stripping air 14 passes over segment 48 of water layer 28.
  • beam 44 of electrons is directed downwardly into segment 48 by an electron beam generator 120 for destroying organic matter in water 12. The electron beam 44 not only substantially enhances purification of water 12 but also purifies the stream of stripping air 14.
  • Stream of air 14 is delivered over segment 48 by a closed air conduit loop assembly 136 which circulates and recirculates air 14, so that air 14 can be completely purified before air 14 discharge.
  • This process eliminates the need for an air filter, and so eliminates the resistance to air flow caused by filters and the need for disposal of filters once they are contaminated.
  • Loop assembly 136 is kept closed for water cleaning only, but for air or air and water cleaning, a portion of the air is discharged through an exhaust fan.

Landscapes

  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physical Water Treatments (AREA)

Abstract

A water flow metering apparatus (20) for shaping a cross section of flowing water into a layer of variable depth includes a water receiving chamber (22) for receiving and discharging water to be treated, a water releasing chamber (24) for receiving and discharging water which has been treated, a shaping passageway (30) extending between the water receiving chamber (22) and the water releasing chamber (24), including a passageway bottom wall (32) having entry, end (36) exit end (42) and top wall (34) defining an internal passageway height for forming a water layer (28) that forms a water exposure window opening through the top wall (34), where the water layer is exposed to an electron beam (44) at the exposure window, and a deflecting mechanism (50) for altering the layer depth to create a desired water flow rate.

Description

Electron Beam Treatment System With Adjustable Flow
Field of the Invention: The present invention relates generally to the field of treatment systems for purification of contaminated water. More specifically, the present invention relates to a synergistic system for full and simultaneous treatment of contaminated air and water which are often extracted together at a treatment site, such as from a vapor extraction well, and to treatment of either one separately. The system includes a flow metering assembly into which stream of contaminated water is pumped for shaping the water stream into a broad layer of metered depth, for electron beam and air stripping treatment.
The flow metering assembly includes a flow shaping passageway which spreads the water into the broad layer. The height of the passageway is adjusted to create a water layer having a maximum depth for which satisfactory purification is achieved with given treatment means for a given level of contamination, so that the flow rate and resisting speed of treatment are always maximized. The passageway includes a water layer supporting bottom wall having a water entry end and a water exit end, and a cantilevered top wall having a top wall free end extending over the water entry end of the passageway. A deflection mechanism deflects the top wall free end upwardly or downwardly, as needed, to alter the height of the passageway and the depth of the water layer, and thus the flow rate.
A segment of the water layer flows along the bottom wall beyond the top wall free end so that the surface of this water layer segment is open and exposed. An electron beam generator directs a beam of electrons downwardly into the exposed water layer segment, and an air circulating loop assembly delivers a stream of stripping air across the surface of the water layer segment. The loop assembly circulates and re-circulates the air through the beam of electrons, thus completely cleaning the air. The loop is kept closed for water cleaning only, but for air or air and water cleaning, a portion of the air is discharged through an exhaust fan. As a result, there is no need of an air filter, so that air flow is not impeded by a filter and disposal of contaminated air filters is not required. The loop assembly also includes air cooling and moisture condensing elements. Re-circulated air in the loop cools a titanium foil window separating the beam generator from the air stream. Condensed moisture from the air stream is delivered into the flow metering assembly. The loop not only destroys air contaminants gathered during stripping, but also cleans contaminated air extracted together with the contaminated water from a water source, pumped into the closed air circulation loop assembly for purification.
Summary of the Prior Art: There have long been treatment systems for purifying various liquid and granular materials. These systems have generally been complex, expensive, incapable of altering the material flow rate for different levels of contamination and have required air filters which become hazardous waste when discarded. Therefore, even slightly contaminated material requiring minimal treatment is processed no faster and with no less energy than heavily contaminated materials, so that much efficiency is lost.
Bosshard, U.S. Patent Number 4,048,504, issued on September 13, 1977, teaches a method and apparatus for treating flowable materials. Bosshard includes a hopper for retaining flowable materials to be treated. A wall of the hopper is formed of two or more parallel and laterally spaced apart cylinders mounted to rotate on their axes. The cylinders are spun to accelerate a layer of flowable material between them and outward, either downward or along a lateral projectile path toward a receiving vessel. Electron generators bombard the accelerated layer with electron beams to purify the flowable
SUβ ϊESfcEET RmE26 material. A problem with Bosshard is that the flowable material cannot be treated by air stripping without the stream of air deflecting and distorting the unsupported layer. Another problem with Bosshard is that the cylinders and cylinder spinning mechanism make the treatment apparatus costly. The rate of energy consumption needed to maintain high speed cylinder rotation makes Bosshard costly to operate as well. Accelerating the layer with spinning cylinders is thus inefficient.
Bosshard, U.S. Patent Number 4,074,138, issued on February 14, 1978, reveals an apparatus for treating liquid sludge material. This Bosshard design is similar to the earlier one described above, except that the depth of the flowable material layer is metered by a plate or by a secondary acceleration cylinder adjustably spaced apart from a primary acceleration cylinder. Unlike in the earlier version, the primary acceleration cylinder supports the portion of the layer being bombarded by the electron beam. Then the layer is peeled off the cylinder by what is termed a stripper blade and flows into a receiving vessel. Problems with this version of Bosshard are, once again, that the cylinders and cylinder spinning mechanism make the treatment apparatus costly, and accelerating the layer with spinning cylinders is inefficient. Another problem is that no provision is made for increasing treatment effectiveness with air stripping. Still another problem is that no provision is made for purifying contaminated air which may accompany the flowable material.
Trebler, U.S. Patent Number 2,001,555, issued on May 14, 1935, teaches a device for the irradiation of milk with ultraviolet rays. Trebler includes an elongate trough for receiving milk to be treated, including two trough lateral wall portions and a bottom wall portion. A trough cover is provided having a top wall and a flange extending downwardly into the trough adjacent to and spaced apart from a trough lateral wall. Milk exits the trough between the flange and the adjacent lateral
SUBSTf iTE ShEET RϋlE 26 wall as a milk layer which runs down a face of an upright sheet member below the trough, where the layer is exposed to ultraviolet rays. A problem with Trebler is that the layer is of fixed depth so that the flow rate must be fixed as well. According to Trebler, it is "advantageous that ... the thickness of the film and the rate of flow be maintained as nearly constant as possible." Trebler, column 1, lines 11-16. Therefore the flow must be fixed at the slowest rate for the most contaminated flowable material and cannot be accelerated for less contaminated material, so that efficiency is lost. Another problem is that no provision is made for stripping with an air stream.
Baumann, et al., U.S. Patent Number 4,836,929, issued on June 6, 1989, discloses a process for breaking down organic substances and microbes in pre-treated feed water for high- purity water recirculation systems. Water is fed to an electrochemical cell where oxygen and ozone are liberated in the anode space and hydrogen is liberated in the cathode space. Excess oxygen and ozone are vented through a valve. Then the water is fed into a residence time container where the ozone breaks down organic contaminants. The residence time container discharges the water into a first reaction vessel for ultraviolet irradiation and then into a second reaction vessel where excess oxygen and ozone are broken down by added hydrogen. The remainder of the reaction products are trapped in a filter. Some of the treated water is tapped into a receiving vessel and the rest is recirculated through the system with added waste water. A problem with Baumann, et al., is that no provision is made for treating contaminated air. Another problem with Baumann, et al., is that no provision is made for altering the water flow rate for varying levels of contamination. Still another problem is that Baumann, et al., is complex and costly to build and operate.
suesiπiπiSH-πpitf) It is thus an object of the present invention to provide a treatment system which is capable of simultaneously purifying contaminated water and contaminated air, which may be extracted together at a treatment site.
It is another object of the present invention to provide such a treatment system which receives the water as a moving stream and which shapes the water stream into a layer for simultaneous exposure to stripping air and electron radiation and which can vary the flow rate by varying the depth of a water layer to efficiently purify water of various levels of contamination.
It is still another object of the present invention to provide such a treatment system which destroys contaminants so that air filters are not needed and so that the hazardous and expense step of disposing of contaminated filters is eliminated.
It is still another object of the present invention to provide such a treatment system which requires no foil window to contain the exposed segment of the water stream, so that electrons bombarding the stream retain more of their velocity.
It is finally an object of the present invention to provide such a treatment system which is economical to construct and safe operate.
■.■■tnma-rγ of the Invention: The present invention accomplishes the above-stated objectives, as well as others, as may be determined by a fair reading and interpretation of the entire specification.
A water flow metering apparatus is provided for shaping the cross-section of flowing water into a layer of variable depth, including a water receiving chamber for receiving and discharging water to be treated, a water releasing chamber for
SUBSTHUTE SHEET (RBt£ 26) receiving and discharging water which has been treated, a shaping passageway extending between the water receiving chamber and the water releasing chamber, including a passageway bottom wall having bottom wall water entry end and a bottom wall water exit end and having a passageway top wall spaced apart a certain distance defining an internal passageway height for forming a water layer having a depth corresponding to the passageway height, and a water exposure window opening through the top wall, a treatment mechanism for treating the water layer as the layer is exposed at the water exposure window, and a mechanism for altering the certain distance to alter the layer depth to create a desired water flow rate.
The bottom wall preferably has a water entry end and a water exit end and a certain length, and the top wall is preferably a cantilevered panel extending over the bottom wall water entry end and terminating in a top wall free end over the bottom wall between the water entry end and the water exit end so that a portion of the bottom wall extends beyond the top wall free end.
The mechanism for altering the certain distance preferably includes a deflection mechanism for deflecting the top wall free end upwardly to increase the passageway height and the water layer depth, and downwardly to decrease the passageway height and the water layer depth. The deflection mechanism may include an adjustment bolt having bolt threads engagingly and rotatably extending into a threaded bore in a bolt anchor member, the bolt engaging the top wall, so that rotating the bolt in a first direction causes a portion of the bolt to bear against and deflect the top wall free end upwardly with respect to the bottom wall, and so that rotating the bolt in a second direction causes a portion of the bolt to bear against and deflect the top wall free end downwardly with respect to the bottom wall. Alternatively, the deflection mechanism includes an adjustment cam with a cam surface, a cam
SUBSTITUTE SHEET (RBIE 26) element mounting structure for rotatably mounting the cam so that the cam surface slidably bears against and rotates relative to the top wall free end to deflect the top wall free end relative to the bottom wall and to thereby alter the passageway height and water layer depth. Still alternatively, the deflection mechanism includes a pivot plate bent to form two substantially perpendicular plate sections, an elongate mounting member secured to the chamber walls on and about which the pivot plate pivots, a threaded shaft which engagingly fits through a threaded port in the chamber side wall, where the pivot plate re-directs a substantially horizontal force imparted by rotation of the threaded shaft against the pivot plate as a vertical force transmitted through a link to bear against the top wall free end to deflect the top wall free end relative to the bottom wall and to thereby alter the passageway height and water layer depth.
The water exposure window preferably includes the horizontal area between the top wall free end and the bottom wall water exit end. The treatment mechanism preferably includes an electron beam generator for directing a beam of electrons into the water layer through the exposure window. The treatment mechanism preferably additionally includes a stripping air delivery loop assembly, the loop assembly including a conduit structure formed into a loop for circulating a stream of air across the layer of water and through the beam of electrons, and a blower for pumping the stream of air through the loop assembly. The loop assembly preferably additionally includes a heat exchanger for cooling the stream of air, which also cools the titanium foil window. The loop assembly preferably additionally includes a condensing element for condensing moisture in the stream of air into liquid condensate, and a condensate delivery structure for delivering the liquid condensate into the water receiving chamber.
Brief Description of the Drawings: Various other objects, advantages, and features of the invention will become apparent to those skilled in the art from the following discussion taken in conjunction with the following drawings, in which:
FIGURE 1 is a perspective view of the inventive flow metering assembly.
FIGURE 2 is a cross-sectional side view of the flow metering assembly, illustrating the first preferred version of the deflecting mechanism.
FIGURE 3 is a cross-sectional side view of the flow metering assembly, illustrating the second preferred version of the deflecting mechanism. FIGURE 3a is a close-up, partial front view of the deflection mechanism. FIGURE 3b is a cross- sectional side view of the cam, cam flanges and engaging track members protruding from the chamber top wall.
FIGURE 4 is a cross-sectional side view of the flow metering assembly, illustrating the third preferred version of the deflecting mechanism. FIGURE 4a is a close-up of the threaded shaft and of the pivot plate riding on the elongate mounting member.
FIGURE 5 is a schematic view of the inventive air loop assembly.
FIGURE 6 is a cross-sectional side view of the effluent water processor.
Detailed Description of the Preferred Bmhrnϊime tB: Referring to FIGURES 1-6, a water treatment system 10 is disclosed for providing full treatment of contaminated water 12 and contaminated air 14, either simultaneously or separately. System 10 includes a flow metering assembly 20 which exposes the water 12 to a combination of air stripping and electron beam irradiation at a selected water 12 flow rate. Less contaminated water 12 requires less intense air stripping and
26 irradiation treatment than does more contaminated water 12, and maximum efficiency is achieved by adjusting the flow rate accordingly. Since electron beam generators typically deliver an electron beam of a substantially fixed intensity, the flow rate of water 12 is altered in assembly 20 to provide the minimum water 12 exposure necessary to destroy a given concentration of contaminants.
Flow metering assembly 20 includes a water receiving chamber 22 and a water releasing chamber 24 having chamber outer side walls 18. See FIGURES 1-4. A substantially vertical partition member 26 separates receiving chamber 22 from releasing chamber 24. A vertically narrow, laterally elongate passageway 30 is provided at the top of member 26 for shaping water 12 into a broad layer 28. Passageway 30 includes a substantially horizontal passageway bottom wall 32 extending laterally from partition member 26 into releasing chamber 24. Bottom wall 32 has a water entry end 36 and a water exit end 42. A substantially horizontal passageway top wall 34 is vertically spaced apart from bottom wall 32 and extends over bottom wall 32. Top wall 34 preferably terminates in a free end 46 located above bottom wall 32 between water entry end 36 and water exit end 42, so that a portion of bottom wall 32 and thus a segment 48 of the surface of water layer 28 is exposed to stripping air 14 and to an electron beam 44. The surface region of water layer 28 exposed for treatment is termed in the claims the "water exposure window".
The height of passageway 30, and thus the depth of water layer 28, may be adjusted by altering the elevation of either passageway top wall 34 or passageway bottom wall 32, or of both. It is preferred that top wall 34 be a cantilever panel extending from receiving chamber 22 outer wall 18 across chamber 22 and across bottom wall water entry end 36. For this embodiment, the height of passageway 30 is adjusted by deflecting top wall free end 46 upwardly or downwardly relative to bottom wall 32 with a deflecting mechanism 50. See FIGURES 2-4. Although deflecting mechanism 50 may take many forms, three inventive variations are specifically contemplated.
A first variation of deflecting mechanism 50 includes a threaded bolt 52 extending through a port 54 in top wall 34 near free end 46. See FIGURE 2. A bolt head 56 wider than port 54 extends radially from bolt 52 over the upper surface of top wall 34, and a bolt flange 62 also wider than port 54 extends radially under the lower surface of top wall 34. Bolt 52 engagingly fits into a threaded bore 64 in an anchor block 66 secured to the bottom of receiving chamber 22. Rotating bolt head 56 causes the bolt threads 72 to either axially elevate or axially lower bolt 52 within anchor block bore 64. Bolt head 56, or alternatively a flange 56, bears against passageway top wall 34 to deflect top wall free end 46 either upwardly or downwardly, as needed, relative to bottom wall 32 to appropriately alter the height of passageway 30 and the depth of water layer 28.
A second variation of deflecting mechanism 50 includes an elliptical cam 80 rotatably mounted immediately beneath top wall 34. See FIGURES 3, 3a and 3b. Cam 80 is mounted on a cam axle 82 which is in turn rotatably mounted between mounting flanges 84 projecting from a chamber 22 side wall 16. A radial link 86 is pinned to and extends laterally from axle 82. Link 86 is pivotably connected to a joining link 88 into which an end of a threaded shaft 92 is rotatably retainied. Shaft 92 is engagingly fitted through a threaded port 94 in chamber 22 side wall 16. Rotating a knob 96 on the exposed end of shaft 92 drives shaft 92 to push or pull radial link 86 and thereby rotate cam 80. The rotation of cam 80 in one direction drives the cam 80 cam surface 98 against top wall 34 to deflect top wall free end 46 upwardly to increase the height of passageway 30. Two opposing lateral flanges 102 on cam 80 engage track members 104 protruding from top wall 34, so that rotating cam 80 in the other direction causes lateral
SUESlTIM EET flanges 102 to pull against track members 104 and thus to pull top wall free end 46 downwardly to decrease the height of passageway 30.
A third variation of deflecting mechanism 50 includes a pivot plate 106 which is bent to form two perpendicular plate sections and which pivots on an elongate mounting member 108 secured to chamber walls. See FIGURES 4 and 4a. A threaded shaft 92 is again provided which engagingly fits through a threaded port 94 in chamber 22 side wall 16. Plate 106 re¬ directs a horizontal force imparted by rotating shaft 92 against plate 106 as a vertical force transmitted through a link 110 to bear against top wall 34. See FIGURE 4. Similar deflecting or elevation adjusting mechanisms (not shown) may alternatively be employed to deflect a free end of bottom wall 32.
Water enters apparatus 10 through a water entrance conduit 112 and passes through an influent water processor 100 which includes such devices as filters, screens, a pump, a tank, flow meters, and an additive port (not shown) . See FIGURE 6. Water passes through metering assembly 20 and exits apparatus 10 through a water exit conduit 114. Water in exit conduit 114 passes through an effluent water processor 116 which may include such devices as effluent equalization tanks 118, a pump 120, an effluent pipe 122, and a float switch 124 to keep water from falling below the level of the effluent pipe 122. Finally, effluent water processor 116 includes an air/gas/vapor bag 126 to permit water to be pumped up and down in a tank 118 without releasing air in tank 118 into the atmosphere. In this way the cooling/process air loop assembly 136 is entirely closed unless opened by the influent and effluent vapor valves. See FIGURE 5.
Loop assembly 136 includes electron beam generator 130 formed of an electron accelerator 132 and a scan beam diffusion chamber 128. See FIGURE 5. Loop assembly 136 also includes a water layer 28 exposure and treatment unit 140, an air turbo blower 150, an air cooler 160 in the form of a heat exchanger, and a condenser and liquid injection pump 170 which delivers condensate from air 14 through a cross conduit 172 into receiving conduit 174. Purified air 14 is released through a vapor phase treatment exhaust fan 180. Water layer 28 exposure and treatment unit 140 includes an elongate tunnel 142 having an air entry end 144 and an air exit end 146. See FIGURE 2. A longitudinal divider wall 148 extends through tunnel 142 and has an open water 12 exposure window 190. Tunnel 142 has a tunnel outer wall 192 with an electron beam window 194 covered by a layer of titanium foil 196. Electron beam 44 passes through foil 196 into water layer 28. Foil 196 prevents air 14 from entering scan beam diffusion chamber 134. The stream of air 14 is deflected toward foil 196 by angled divider wall portion 198 to cool foil 196, and limits turbulence of air near the thin water layer 28. The distance from the surface of the water to the titanium foil 196 is variable by design for different treatment situations. Loop assembly 136 is preferably formed of stainless steel.
It is further noted that ozone created in loop through beam enhances water 12 and air 14 purification. Efficiency is further enhanced because when electrons hit metal they produce X-rays, which enhance purification and are safely contained within the metering assembly with suitable shielding.
In practicing the invention, the following method may be used. Contaminated water 12 is delivered into receiving chamber 22 through a water entrance conduit 112 by a pump. Water 12 accumulates and rises in chamber 22 until it reaches the level of passageway 30, and then flows from chamber 22 into chamber 24 through passageway 30. Passageway 30 shapes the flowing water 12 into a wide, shallow layer 28. A stream of stripping air 14 passes over segment 48 of water layer 28. At the same time beam 44 of electrons is directed downwardly into segment 48 by an electron beam generator 120 for destroying organic matter in water 12. The electron beam 44 not only substantially enhances purification of water 12 but also purifies the stream of stripping air 14.
Stream of air 14 is delivered over segment 48 by a closed air conduit loop assembly 136 which circulates and recirculates air 14, so that air 14 can be completely purified before air 14 discharge. This process eliminates the need for an air filter, and so eliminates the resistance to air flow caused by filters and the need for disposal of filters once they are contaminated. Loop assembly 136 is kept closed for water cleaning only, but for air or air and water cleaning, a portion of the air is discharged through an exhaust fan.
While the invention has been described, disclosed, illustrated and shown in various terms or certain embodiments or modifications which it has assumed in practice, the scope of the invention is not intended to be, nor should it be deemed to be, limited thereby and such other modifications or embodiments as may be suggested by the teachings herein are particularly reserved especially as they fall within the breadth and scope of the claims here appended.

Claims

I CLAIM:
1. A water flow metering apparatus for shaping the cross-section of flowing water into a layer of variable depth, comprising:
(a) a water receiving chamber for receiving and discharging water to be treated,
(b) a water releasing chamber for receiving and discharging water which has been treated, (c) a shaping passageway extending between said water receiving chamber and said water releasing chamber, comprising a passageway bottom wall having a bottom wall water entry end and a bottom wall water exit end and having a certain length,
(d) and comprising a passageway top wall spaced a certain distance defining an internal passageway height for forming a water layer having a depth corresponding to said passageway height, said top wall being a cantilevered panel extending over at least a portion of said bottom wall and terminating in a top wall free end over said bottom wall between said water entry end and said water exit end and a water exposure window opening through said top wall,
(e) treatment means for treating said water layer as said layer is exposed at said water exposure window,
(f) and means for altering said certain distance to alter said layer depth to create a desired water flow rate comprising deflection means for deflecting said top wall free end to alter said said passageway height and said water layer depth.
2. The apparatus of claim 1, wherein a portion of said bottom wall extends beyond said top wall free end.
3. The apparatus of claim 2, wherein said deflection means alters said certain distance by deflecting said top wall free end upwardly to increase said passageway height and said water layer depth, and downwardly to decrease said passageway height and said water layer depth.
4. The apparatus of claim 1, wherein said deflection means comprises an adjustment bolt having bolt threads engagingly and rotatably extending into a threaded bore in a bolt anchor member, said bolt engaging said top wall, such that rotating said bolt in a first direction causes a portion of said bolt to bear against and deflect said top wall free end upwardly with respect to said bottom wall, and such that rotating said bolt in a second direction causes a portion of said bolt to bear against and deflect said top wall free end downwardly with respect to said bottom wall.
5. The apparatus of claim 1, wherein said deflection means comprises an adjustment cam with a cam surface, cam element mounting means for rotatably mounting said cam such that said cam surface slidably bears against and rotates relative to said top wall free end to deflect said top wall free end relative to said bottom wall and to thereby alter said passageway height and water layer depth.
6. The apparatus of claim 1, wherein said deflection means comprises:
(a) a pivot plate bent to form two substantially perpendicular plate sections, (b) an elongate mounting member secured to said chamber walls on and about which said pivot plate pivots,
(c) a threaded shaft which engagingly fits through a threaded port in said chamber side wall, wherein said pivot plate re-directs a substantially horizontal force imparted by rotation of said threaded shaft against said pivot plate as a vertical force transmitted through link means to bear against said top wall free end to
E26 deflect said top wall free end relative to said bottom wall and to thereby alter said passageway height and water layer depth.
7. The apparatus of claim 1, wherein said water exposure window comprises the horizontal area between said top wall free end and said bottom wall water exit end.
8. The apparatus of claim 7, wherein said treatment means comprises an electron beam generator for directing a beam of electrons into said water layer through said exposure window.
9. The apparatus of claim 8, wherein said treatment means additionally comprises a stripping air delivery loop assembly, said loop assembly comprising:
(a) conduit means formed into a loop for circulating a stream of air across said layer of water and through said beam of electrons, (b) and blower means for pumping said stream of air through said loop assembly.
10. The apparatus of claim 9, wherein said loop assembly additionally comprises: heat exchanger means for cooling said stream of air.
11. The apparatus of claim 9, wherein said loop assembly additionally comprises:
(a) condensing means for condensing moisture in said stream of air into liquid condensate,
(b) and condensate delivery means for delivering said liquid condensate into said water receiving chamber.
F
PCT/US1996/006921 1995-05-15 1996-05-15 Electron beam treatment system with adjustable flow WO1996036868A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US44145095A 1995-05-15 1995-05-15
US08/441,450 1995-05-15
US59541596A 1996-02-05 1996-02-05
US08/595,415 1996-02-05

Publications (1)

Publication Number Publication Date
WO1996036868A1 true WO1996036868A1 (en) 1996-11-21

Family

ID=27032820

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/006921 WO1996036868A1 (en) 1995-05-15 1996-05-15 Electron beam treatment system with adjustable flow

Country Status (1)

Country Link
WO (1) WO1996036868A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002002466A1 (en) * 2000-07-03 2002-01-10 High Voltage Environmental Applications Deutschland Gmbh Method and device for treating pumpable media contaminated with harmful substances
WO2006086427A2 (en) * 2005-02-10 2006-08-17 Wyeth Apparatus and method for radiation processing of fluent food products
CN114988356A (en) * 2022-05-31 2022-09-02 西安交通大学 Device and method for preparing hydrogen and oxygen by irradiating liquid water with electrons

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3901807A (en) * 1973-06-27 1975-08-26 High Voltage Engineering Corp High energy electron treatment of water
US4074138A (en) * 1974-12-23 1978-02-14 Sulzer Brothers Limited Apparatus for treating liquid sludge material
US4173719A (en) * 1977-10-19 1979-11-06 Licentia Patent-Verwaltungs-G.M.B.H. Apparatus for irradiating flowing materials
US4230947A (en) * 1979-07-02 1980-10-28 High Voltage Engineering Corporation Apparatus for treating flowable material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3901807A (en) * 1973-06-27 1975-08-26 High Voltage Engineering Corp High energy electron treatment of water
US4074138A (en) * 1974-12-23 1978-02-14 Sulzer Brothers Limited Apparatus for treating liquid sludge material
US4173719A (en) * 1977-10-19 1979-11-06 Licentia Patent-Verwaltungs-G.M.B.H. Apparatus for irradiating flowing materials
US4230947A (en) * 1979-07-02 1980-10-28 High Voltage Engineering Corporation Apparatus for treating flowable material

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002002466A1 (en) * 2000-07-03 2002-01-10 High Voltage Environmental Applications Deutschland Gmbh Method and device for treating pumpable media contaminated with harmful substances
WO2006086427A2 (en) * 2005-02-10 2006-08-17 Wyeth Apparatus and method for radiation processing of fluent food products
WO2006086427A3 (en) * 2005-02-10 2007-06-21 Wyeth Corp Apparatus and method for radiation processing of fluent food products
US8802018B2 (en) 2005-02-10 2014-08-12 Nestec S.A. Apparatus and method for radiation processing of fluent food products
CN114988356A (en) * 2022-05-31 2022-09-02 西安交通大学 Device and method for preparing hydrogen and oxygen by irradiating liquid water with electrons
CN114988356B (en) * 2022-05-31 2023-09-19 西安交通大学 Device and method for preparing hydrogen and oxygen by electron irradiation of liquid water

Similar Documents

Publication Publication Date Title
US5352359A (en) Ultraviolet reactor with mixing baffle plates
US3772188A (en) Sewage treatment apparatus and method
CN108257705A (en) A kind of irradiation industrial wastewater control process system
EP0629142A4 (en) Apparatus and method for treatment of waste water sludge.
WO1996036868A1 (en) Electron beam treatment system with adjustable flow
US4882071A (en) Method and apparatus for the in situ decontamination of underground water with the aid of solar energy
US5861123A (en) Ultraviolet light irradiated ebullating mass transfer system
US5190670A (en) Process and system for separating and condensing contaminants from a liquid
US5240599A (en) Apparatus for treatment of waste water sludge
US5120972A (en) Method of and apparatus for improved nitrogen inerting of surfaces to be electron beam irradiated
WO2004035171A1 (en) Process for removing an undesirable dissolved gas from a liquid
US3756932A (en) Electrolytic cyanide destruction
CN208061677U (en) Irradiate industrial wastewater control process system
DE19621042A1 (en) Sea- or lake water desalinator constructed as floating unit, e.g. as a boat
US4308111A (en) Distillation process
US6926863B1 (en) Method and device for treating contaminated materials
US6576189B1 (en) Device and method for exposing liquids, including pretreated wastewater, to x-rays
CH616394A5 (en) Continuous process and apparatus for destroying pathogens in effluent sewage sludge
US3280887A (en) Process and apparatus for the concentration of radioactive solutions or liquids
US5807491A (en) Electron beam process and apparatus for the treatment of an organically contaminated inorganic liquid or gas
JP3671001B2 (en) Ammonia treatment method and apparatus
JPS6023040Y2 (en) Photo ozone oxidation treatment equipment
EP0543920A4 (en) Particle accelerator transmission window configurations, cooling and materials processing
JP3819794B2 (en) Water treatment system
KR200179932Y1 (en) High speed sweage redisposal apparatus using the osone

Legal Events

Date Code Title Description
AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase