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US3856694A - Process for stripping nickel from articles and composition utilized therein - Google Patents

Process for stripping nickel from articles and composition utilized therein Download PDF

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Publication number
US3856694A
US3856694A US00370889A US37088973A US3856694A US 3856694 A US3856694 A US 3856694A US 00370889 A US00370889 A US 00370889A US 37088973 A US37088973 A US 37088973A US 3856694 A US3856694 A US 3856694A
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Prior art keywords
chloride
tellurium
ions
stripping
selenium
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US00370889A
Inventor
D Becking
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OMI International Corp
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Oxy Metal Industries Corp
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Filing date
Publication date
Application filed by Oxy Metal Industries Corp filed Critical Oxy Metal Industries Corp
Priority to ES427394A priority Critical patent/ES427394A1/en
Priority to US00370889A priority patent/US3856694A/en
Priority to ZA00743138A priority patent/ZA743138B/en
Priority to AU69051/74A priority patent/AU485233B2/en
Priority to CA201,047A priority patent/CA1040987A/en
Priority to NL7407382A priority patent/NL7407382A/xx
Priority to DE2428380A priority patent/DE2428380C3/en
Priority to IT51539/74A priority patent/IT1013479B/en
Priority to JP6864374A priority patent/JPS5647263B2/ja
Priority to GB2674074A priority patent/GB1475327A/en
Priority to BR4948/74A priority patent/BR7404948D0/en
Priority to FR7421109A priority patent/FR2233418A1/fr
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Publication of US3856694A publication Critical patent/US3856694A/en
Assigned to OXY METAL INDUSTRIES CORPORATION reassignment OXY METAL INDUSTRIES CORPORATION CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). 4-09-74 Assignors: OXY METAL FINISHING CORPORATION
Assigned to HOOKER CHEMICALS & PLASTICS CORP. reassignment HOOKER CHEMICALS & PLASTICS CORP. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: OXY METAL INDUSTRIES CORPORATION
Assigned to OCCIDENTAL CHEMICAL CORPORATION reassignment OCCIDENTAL CHEMICAL CORPORATION CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE MARCH 30, 1982. Assignors: HOOKER CHEMICAS & PLASTICS CORP.
Assigned to OMI INTERNATIONAL CORPORATION reassignment OMI INTERNATIONAL CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: OCCIDENTAL CHEMICAL CORPORATION
Assigned to MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF reassignment MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: INTERNATIONAL CORPORATION, A CORP OF DE
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Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/44Compositions for etching metallic material from a metallic material substrate of different composition

Definitions

  • the instant invention is particularly directed to a novel composition for removing nickel and generally similar unwanted deposits from plating racks and like articles and to a process for utilizing said composition.
  • the formulation conceived by applicant comprising about 4.5 to 14.5 moles/liter of 4 .Z Be r1 it r i g a gi d a chloride ion in the an idu nt of 0.0] to 0.5 moles/liter, a copper ion in the amount of about 0.01 to 0.l moles/- liter, and a source of tellurium or selenium ions in the amount of approximately 0.005 to 0.2 moles/liter.
  • the molar ratio of tellurium or selenium ions to chloride ions is in the general range of about one to three.
  • the stripping solution employed in the practice of this invention may be prepared by either one of two procedures. First, there can be initially formed a sodium or potassium salt of tellurium dioxide (tellurous acid anhydride) or selenium dioxide (selenous acid anhydride) by mixing approximately l5 grams of Te 0 or Se 0 with about 10 to 12 ml. of NaOH or KOH, diluting the solution obtained to about 150 ml., and thereafter filtering out the precipitate. A preferred concentration for the hydroxide used is about 50%. The sodium or potassium tellurite or selenite obtained is then combined with measured quantities of nitric acid, cupric sulfate and sodium chloride to provide the novel stripping solution of this invention.
  • a second procedure for formulating the stripping solution is to directly admix predetermined amounts of Te 0 or 5e0 HNO CuSO, 5H O, and NaCl.
  • This procedure T is somewhat less expensive than going through the first approach, however, at times it may be found that combining the TeO or SeO directly with HNO produces a somewhat violent reaction.
  • the first mentioned procedure is accordingly preferred at the present time.
  • EXAMPLE I A solution was made up of 500 mil. HNO 5.7 g. Cu- SO .5H O, 3.3 g. NaCl and 3.0 g. FeCl which were diluted to l liter. A stainless steel part having a nickel deposit thereon of about 1 mil in thickness was immersed therein. and it took about 87 seconds before the deposit was removed.
  • EXAMPLE II There was formulated a solution containing 500 ml. HNO 5.7 g. CuSO .5H O, 3.3 g. NaCl, 2.0 g. ofa commercially available strip aid (composition unknown), and this mixture diluted to 1 liter. It took about 141 seconds to remove a 1 mil thick nickel deposit from a stainless steel part.
  • EXAMPLE III A solution was made up of 500 ml. HNO 5.7 g. Cu- SO .5H O, 3.3 g. NaCl and 1.5 g. Na TeO which were diluted to 1 liter. It only took 38 seconds to strip a l mil nickel deposit from a stainless steel part.
  • Example III The procedure of Example III was again followed, except that 1.5 g. NaF was used in place of the Na TeO A nickel deposit of the same thickness took l 10 sec onds to be removed from a stainless steel part.
  • EXAMPLE VI There was formulated a stripping solution containing 500 ml. HNO 5.7 g. CuSO .5H O, 3.3 g. NaCl, 1 g. KBrO and 0.3 g. KIO which was diluted to l liter. A l mil nickel deposit was removed from a stainless steel part in seconds.
  • EXAMPLE Vll A solution was made up of 500 ml. HNO 5.7 g Cu- SO .5H O, 3.3 g. NaCl and 1 ml. bromine, the mixture being diluted to 1 liter. A 1 mil nickel deposit was stripped from a stainless steel part in 94 seconds.
  • EXAMPLE Vlll There was formulated a stripping solution containing 500 ml. HNO 5.7 g. CuSO .5H O, 3.3 g. NaCl. and ml. Na TeO solution prepared as earlier described, and this mixture was diluted to 1 liter. A nickel deposit of a thickness of 1 mil was stripped in only 58 seconds.
  • EXAMPLE lX A solution was prepared as in Example Vlll, but the amount of NaJeO solution was increased to ml. A deposit of the same thickness was removed in only 33 seconds.
  • EXAMPLE X There was formulated a stripping solution containing 2 g/l TeO 600 g/l HNO 5.7 g/l CuSO .5H O and 3.3 g/l NaCl. An unwanted nickel deposit one mil thick was stripped from a stainless steel part in 27 seconds. which is about 30% faster than commerically available strippers.
  • potassium hydroxide can readily be substituted for sodium hydroxide; potassium, manganese or cupric chloride can be used in place of sodium chloride; and cupric nitrate or chloride are substituents for cupric sulfate. Further, if desired. a portion of the nitric acid may be replaced by an equivalent (i.e., acid equivalent) amount of sulfurric acid, thereby satisfying the hydrogen ion requirement by a less expensive acid.
  • a composition for stripping accumulated nickel deposits from plating apparatus and the like which comprises nitric acid and sources of chloride, copper and tellurium or selenium ions, said chloride ion being present in concentrations of about 0.01 to 0.5 M and said tellurium or selenium ions being present in small but effective amounts sufficient to accelerate the stripping rate without noticeable deleterious effects upon the plating apparatus.
  • composition as defined in claim 1 in which the tellurium or selenium ions are present in concentrations of about 0.005 to 0.2 M.
  • composition as defined in claim 1 in which the copper ion is present in concentrations of about 0.0l to 0.5 M.
  • composition as defined in claim I in which the nitric acid is approximately 42 Be. and is present in an amount of about 4.5 to 14.5 M.
  • An aqueous solution for stripping accumulated nickel deposits from plating apparatus which contains therein about 2 to l0 grams per liter of tellurium or selenium dioxide, 600 to 850 grams per liter of nitric acid, 2 to 20 grams per liter of copper sulfate, and 3.5 to 35.5 grams per liter of a source of chloride ions.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Chemically Coating (AREA)

Abstract

The present invention is directed to the chemical removal of adherent nickel deposits on plating racks and the like employing a composition which contains therein nitric acid and sources of chloride, copper and tellurium or selenium ions and to a process for stripping such unwanted deposits from electroplating apparatus without noticeable damage to the base metal and at speeds not normally obtainable with prior art compositions and methods.

Description

United States Patent 1191 1111 3,856,694 Becking Dec. 24, 1974 PROCESS FOR STRIPPING NICKEL FROM 3,365,461 H1968 Saubestre et a]. 134/3 R ICL AND O I O UTILIZED 3,399,143 8/I968 Slominski l34/4l Foelsch 3,709,824 l/l973 Oda etal. [34/41 [75] Inventor: Donald H. Becking, Birmingham, 3,717,520 2/l973 Brindisi v. 156/18 Mich. [73] Assignee: Oxy Metal Finishing Corporation, gzz g sgl g ggg Lovermg warren Mlch' Attorney, Agent, or Firm-B. F. Claeboe [22] Filed: June 18, 1973 [21] App]. No.: 370,889 ABSTRACT The present invention is directed to the chemical re- [52] US Cl 252/101 134/3 134/41 moval of adherent nickel deposits on plating racks and 3 252/79 2 5 the like employing a composition which contains [51] 1111. c1 c23 1/04, 623 l/O8 therein Pi i i9 and Sources of M Copper and 58 Field of Search 252/792, 101, 142; 134/3, L2HEB%2FT"1PH13QE and a Process f P- 134/41; 156/18 pmg suc unwanted deposits from electroplating apparatus without noticeable damage to the base metal and [56] References Cited at) :nodt 111112121233 obtainable w1th pnor art com- UNITED STATES PATENTS p 3,197,341 7/1965 Wallace 134 3 3 Clam, N0 Drawings PROCESS FOR STRIPPING NICKEL FROM ARTICLES AND COMPOSITION UTILIZED TI-IEREIN BACKGROUND OF THE INVENTION It is known in the art to which this invention pertains that nickel and related metallic coatings on the contact tips of the plating racks of electroplating apparatus can be remove by either mechanical means or chemical techniques. In the mechnical approach it has been conventional to use a hammer or like too] means to shatter the unwanted nickel deposit on the contact tips, and while this treatment is generally effective, it suffers from the disadvantages of being time-consuming and may ultimately result in damage to the metal base. Then too, some plating racks contain several hundred individual tips, so that mechanical removal of the unwanted coatings thereon leads to substantial labor costs.
Chemical methods for dissolution of the nickel deposits on stainless steel racks have generally employed nitr c acTl, and MEETS approach represents an improvement over the hammer method, the use of nitric acid by itself is tedious since nickel is only slowly attacked by this acid. It has accordingly been customary to add a catalyst such as a chloride ion, but this substance in the presence of strong nitric acid forms nitrosyl chloride which is a gas at temperatures above about- 5.5C., and accordingly. its benefit to the stripping solution is soon lost by volatilization. The addition of other ions to the solution has also been proposed, as the i g da t e ion disclosed in Pat. No. 3,399,143; however, following these teachings does not obviate the objection of relatively slow stripping speeds, and may under particular conditions cause damage to the stainless steel contact tips.
SUMMARY OF THE INVENTION The instant invention is particularly directed to a novel composition for removing nickel and generally similar unwanted deposits from plating racks and like articles and to a process for utilizing said composition. the formulation conceived by applicant comprising about 4.5 to 14.5 moles/liter of 4 .Z Be r1 it r i g a gi d a chloride ion in the an idu nt of 0.0] to 0.5 moles/liter, a copper ion in the amount of about 0.01 to 0.l moles/- liter, and a source of tellurium or selenium ions in the amount of approximately 0.005 to 0.2 moles/liter. Preferably, the molar ratio of tellurium or selenium ions to chloride ions is in the general range of about one to three.
While applicant does not wish to be bound by a particular theory. it would appear from work performed to date that tellurium or selenium when admixed with the other constituents of the solution herein disclosed in the general molar ratios above set forth possesses filmforming capabilities. This is perceptible to the naked eye when an examination is made of a stainless steel substrate, and is the apparent reason why there is no noticeable attack upon the surface being stripped and also why unwanted nigkel deposits can be removed at si kjepr xim lebi lfaste nthan emmefiie l available plating solutions.
DESCRIPTION OF THE PREFERRED EMBODIMENT The stripping solution employed in the practice of this invention may be prepared by either one of two procedures. First, there can be initially formed a sodium or potassium salt of tellurium dioxide (tellurous acid anhydride) or selenium dioxide (selenous acid anhydride) by mixing approximately l5 grams of Te 0 or Se 0 with about 10 to 12 ml. of NaOH or KOH, diluting the solution obtained to about 150 ml., and thereafter filtering out the precipitate. A preferred concentration for the hydroxide used is about 50%. The sodium or potassium tellurite or selenite obtained is then combined with measured quantities of nitric acid, cupric sulfate and sodium chloride to provide the novel stripping solution of this invention.
A second procedure for formulating the stripping solution is to directly admix predetermined amounts of Te 0 or 5e0 HNO CuSO, 5H O, and NaCl. This procedure Ts somewhat less expensive than going through the first approach, however, at times it may be found that combining the TeO or SeO directly with HNO produces a somewhat violent reaction. The first mentioned procedure is accordingly preferred at the present time.
The invention will now be more fully described with reference to the following examples, which were run at a solution temperature of approximately 40C.
EXAMPLE I A solution was made up of 500 mil. HNO 5.7 g. Cu- SO .5H O, 3.3 g. NaCl and 3.0 g. FeCl which were diluted to l liter. A stainless steel part having a nickel deposit thereon of about 1 mil in thickness was immersed therein. and it took about 87 seconds before the deposit was removed.
EXAMPLE II There was formulated a solution containing 500 ml. HNO 5.7 g. CuSO .5H O, 3.3 g. NaCl, 2.0 g. ofa commercially available strip aid (composition unknown), and this mixture diluted to 1 liter. It took about 141 seconds to remove a 1 mil thick nickel deposit from a stainless steel part.
EXAMPLE III A solution was made up of 500 ml. HNO 5.7 g. Cu- SO .5H O, 3.3 g. NaCl and 1.5 g. Na TeO which were diluted to 1 liter. It only took 38 seconds to strip a l mil nickel deposit from a stainless steel part.
EXAMPLE IV The procedure of Example III was followed except that Na SeO was substituted for the Na TeO The same thickness deposit was removed in 35 seconds.
' EXAMPLE V The procedure of Example III was again followed, except that 1.5 g. NaF was used in place of the Na TeO A nickel deposit of the same thickness took l 10 sec onds to be removed from a stainless steel part.
EXAMPLE VI There was formulated a stripping solution containing 500 ml. HNO 5.7 g. CuSO .5H O, 3.3 g. NaCl, 1 g. KBrO and 0.3 g. KIO which was diluted to l liter. A l mil nickel deposit was removed from a stainless steel part in seconds.
EXAMPLE Vll A solution was made up of 500 ml. HNO 5.7 g Cu- SO .5H O, 3.3 g. NaCl and 1 ml. bromine, the mixture being diluted to 1 liter. A 1 mil nickel deposit was stripped from a stainless steel part in 94 seconds.
EXAMPLE Vlll There was formulated a stripping solution containing 500 ml. HNO 5.7 g. CuSO .5H O, 3.3 g. NaCl. and ml. Na TeO solution prepared as earlier described, and this mixture was diluted to 1 liter. A nickel deposit of a thickness of 1 mil was stripped in only 58 seconds.
EXAMPLE lX A solution was prepared as in Example Vlll, but the amount of NaJeO solution was increased to ml. A deposit of the same thickness was removed in only 33 seconds.
EXAMPLE X There was formulated a stripping solution containing 2 g/l TeO 600 g/l HNO 5.7 g/l CuSO .5H O and 3.3 g/l NaCl. An unwanted nickel deposit one mil thick was stripped from a stainless steel part in 27 seconds. which is about 30% faster than commerically available strippers.
In the exemplary formulations set forth above, potassium hydroxide can readily be substituted for sodium hydroxide; potassium, manganese or cupric chloride can be used in place of sodium chloride; and cupric nitrate or chloride are substituents for cupric sulfate. Further, if desired. a portion of the nitric acid may be replaced by an equivalent (i.e., acid equivalent) amount of sulfurric acid, thereby satisfying the hydrogen ion requirement by a less expensive acid.
Various modifications in the compositions of this invention have been pointed out herein. and these and other changes can of course be effected without departing from the spirit of the invention of the scope of the subjoined claims.
I claim:
1. A composition for stripping accumulated nickel deposits from plating apparatus and the like, which comprises nitric acid and sources of chloride, copper and tellurium or selenium ions, said chloride ion being present in concentrations of about 0.01 to 0.5 M and said tellurium or selenium ions being present in small but effective amounts sufficient to accelerate the stripping rate without noticeable deleterious effects upon the plating apparatus.
2. A composition as defined in claim 1, in which the tellurium or selenium ions are present in concentrations of about 0.005 to 0.2 M.
3. A composition as defined in claim 1, in which the copper ion is present in concentrations of about 0.0l to 0.5 M.
4. A composition as defined in claim I, in which the nitric acid is approximately 42 Be. and is present in an amount of about 4.5 to 14.5 M.
5. An aqueous solution for stripping accumulated nickel deposits from plating apparatus, which contains therein about 2 to l0 grams per liter of tellurium or selenium dioxide, 600 to 850 grams per liter of nitric acid, 2 to 20 grams per liter of copper sulfate, and 3.5 to 35.5 grams per liter of a source of chloride ions.
6. An aqueous solution as defined in claim 1, in which the source of chloride ions is selected from the group consisting of sodium chloride, potassium chloride, manganese chloride and cupric chloride.
7. In a method of stripping nickel deposits from articles by immersing them in a concentrated nitric acid solution containing a chloride catalyst. the improvement which comprises adding to said solution a small but effective amount of a selenite or tellurite compound capable of providing selenium or tellurium ions in the solution.
8. A stripping method as defined in claim 7, in which the selenium or tellurium ions are present in concentrations of about 0.005 to 0.2 M.

Claims (8)

1. A COMPOSITION FOR STRIPPING ACCUMULATED NICKEL DEPOSITS FROM PLATING APPARATUS AND THE LIKE, WHICH COMPRISES NITRIC ACID AND SOURCES OF CHLORIDE, COPPER AND TELLURIUM OR SELENIUM IONS, SAID CHLORIDE ON BEING PRESENT IN CONCENTRATIONS OF ABOUT 0.01 TO 0.5 M AND SAID TELLURIUM OR SELENIUM IONS BEING PRESENT IN SMALL BUT EFFECTIVE AMOUNTS SUFFICIENT TO ACCELERATE THE STRIPPING RATE WITHOUT NOTICEABLE DELETERIOUS EFFECTS UPON THE PLATING APPARATUS.
2. A composition as defined in claim 1, in which the tellurium or selenium ions are present in concentrations of about 0.005 to 0.2 M.
3. A composition as defined in claim 1, in which the copper ion is present in concentrations of about 0.01 to 0.5 M.
4. A composition as defined in claim 1, in which the nitric acid is approximately 42 Be. and is present in an amount of about 4.5 to 14.5 M.
5. AN AQUEOUS SOLUTION FOR STRIPPING ACCUMULATED NICKEL DEPOSITS FROM PLATING APPARATUS, WHICH CONTAINS THEREIN ABOUT 2 TO 10 GRAMS PER LITER OF TELLURIUM OR SELENIUM DIOXIDE, 600 TO 850 GRAMS PER LITER OF NITRIC ACID, 2 TO 20 GRAMS PER LITER OF COPPER SULFATE, AND 3.5 TO 35.5 GRAMS PER LITER OF A SOURCE OF CHLORIDE IONS.
6. An aqueous solution as defined in claim 1, in which the source of chloride ions is selected from the group consisting of sodium chloride, potassium chloride, manganese chloride and cupric chloride.
7. IB A METHOD OF STRIPPING NICKEL DEPOSITS FROM ARTICLES BY IMMERSING THEM IN A CONCENTRATED NITRIC ACID SOLUTION CONTAINING A CHLORIDE CATALYST, THE IMPROVEMENT WHICH COMPRISES ADDING TO SAID SOLUTION A SMALL BUT EFFECTIVE AMOUNT OF A SELENITE OR TELLURITE COMPOUND CAPABLE OF PROVIDING SELENIUM OR TELLURIUM IONS IN THE SOLUTION.
8. A stripping method as defined in claim 7, in which the selenium or tellurium ions are present in concentrations of about 0.005 to 0.2 M.
US00370889A 1973-06-18 1973-06-18 Process for stripping nickel from articles and composition utilized therein Expired - Lifetime US3856694A (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
ES427394A ES427394A1 (en) 1973-06-18 1973-06-18 Process for stripping nickel from articles and composition utilized therein
US00370889A US3856694A (en) 1973-06-18 1973-06-18 Process for stripping nickel from articles and composition utilized therein
ZA00743138A ZA743138B (en) 1973-06-18 1974-05-16 Process for stripping nickel from articles and compositions utilized therein
AU69051/74A AU485233B2 (en) 1973-06-18 1974-05-16 Process for stripping nickel from articles and composition utilized therein
CA201,047A CA1040987A (en) 1973-06-18 1974-05-28 Process for stripping nickel from articles and composition utilized therein
NL7407382A NL7407382A (en) 1973-06-18 1974-05-31
DE2428380A DE2428380C3 (en) 1973-06-18 1974-06-12 Aqueous solution for removing nickel deposits
IT51539/74A IT1013479B (en) 1973-06-18 1974-06-14 COMPOSITION AND METHOD FOR REMOVING NICKEL DEPOSITS FROM OBJECTS
JP6864374A JPS5647263B2 (en) 1973-06-18 1974-06-15
GB2674074A GB1475327A (en) 1973-06-18 1974-06-17 Process and composition for stripping metal deposits from substrates
BR4948/74A BR7404948D0 (en) 1973-06-18 1974-06-17 COMPOSITION FOR REMOVAL OF ACCUMULATED NICKEL DEPOSITS IN A COATING AND SIMILAR EQUIPMENT AND IMPROVEMENT IN A PROCESS FOR REMOVAL OF ITEM NICKEL DEPOSITS
FR7421109A FR2233418A1 (en) 1973-06-18 1974-06-18

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JP (1) JPS5647263B2 (en)
BR (1) BR7404948D0 (en)
CA (1) CA1040987A (en)
DE (1) DE2428380C3 (en)
ES (1) ES427394A1 (en)
FR (1) FR2233418A1 (en)
GB (1) GB1475327A (en)
IT (1) IT1013479B (en)
NL (1) NL7407382A (en)
ZA (1) ZA743138B (en)

Cited By (11)

* Cited by examiner, † Cited by third party
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US4025358A (en) * 1974-10-11 1977-05-24 Audi Nsu Auto Union Aktiengesellschaft Process for currentless separation of a nickel layer from objects of light metal
US4042451A (en) * 1975-08-05 1977-08-16 M&T Chemicals Inc. Selected stripping of nickel-iron alloys from ferrous substrates
US4244833A (en) * 1979-11-15 1981-01-13 Oxy Metal Industries Corporation Composition and process for chemically stripping metallic deposits
US4274908A (en) * 1978-08-15 1981-06-23 United Technologies Corporation Cyanide free solution and process for removing gold-nickel braze
US4339282A (en) * 1981-06-03 1982-07-13 United Technologies Corporation Method and composition for removing aluminide coatings from nickel superalloys
US4554049A (en) * 1984-06-07 1985-11-19 Enthone, Incorporated Selective nickel stripping compositions and method of stripping
US4608091A (en) * 1982-01-11 1986-08-26 Enthone, Incorporated Peroxide selective stripping compositions and method
US4746369A (en) * 1982-01-11 1988-05-24 Enthone, Incorporated Peroxide selective stripping compositions and method
US6642199B2 (en) 2001-04-19 2003-11-04 Hubbard-Hall, Inc. Composition for stripping nickel from substrates and process
WO2014134708A1 (en) * 2013-03-05 2014-09-12 Sherritt International Corporation Method of recovering nickel or cobalt while mitigating corrosion
US11460778B2 (en) * 2018-04-12 2022-10-04 Versum Materials Us, Llc Photoresist stripper

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US4353780A (en) * 1980-10-01 1982-10-12 United Technologies Corporation Chemical milling of high tungsten content superalloys
DK395481A (en) * 1980-10-01 1982-04-02 United Technologies Corp METHOD AND METHOD FOR PROCESSING SUBSTANCES OF A NICKEL-ALUMINUM ALLOY
CA1209886A (en) * 1982-01-11 1986-08-19 Thomas W. Bleeks Peroxide selective stripping compositions and method
CH674851A5 (en) * 1987-12-01 1990-07-31 Bbc Brown Boveri & Cie
DE69314070T2 (en) * 1992-03-04 1998-02-26 Macdermid Inc Process for removing tin or tin-lead alloys from copper surfaces

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US3197341A (en) * 1961-06-19 1965-07-27 Rohr Corp Method and composition for descaling stainless steels and related alloys
US3365401A (en) * 1967-03-14 1968-01-23 Enthone Immersion type nickel stripper
US3399143A (en) * 1967-08-02 1968-08-27 Macdermid Inc Method of stripping nickel from articles and the composition used therein
US3553016A (en) * 1967-06-02 1971-01-05 Lithcote Corp Method and composition for treating stainless steel
US3709824A (en) * 1971-01-07 1973-01-09 Nippon Soda Co Method and composition for chemical polishing of stainless steel surfaces
US3717520A (en) * 1971-02-09 1973-02-20 Enthone Composition and method for selectively stripping nickel and/or copper

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3197341A (en) * 1961-06-19 1965-07-27 Rohr Corp Method and composition for descaling stainless steels and related alloys
US3365401A (en) * 1967-03-14 1968-01-23 Enthone Immersion type nickel stripper
US3553016A (en) * 1967-06-02 1971-01-05 Lithcote Corp Method and composition for treating stainless steel
US3399143A (en) * 1967-08-02 1968-08-27 Macdermid Inc Method of stripping nickel from articles and the composition used therein
US3709824A (en) * 1971-01-07 1973-01-09 Nippon Soda Co Method and composition for chemical polishing of stainless steel surfaces
US3717520A (en) * 1971-02-09 1973-02-20 Enthone Composition and method for selectively stripping nickel and/or copper

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4025358A (en) * 1974-10-11 1977-05-24 Audi Nsu Auto Union Aktiengesellschaft Process for currentless separation of a nickel layer from objects of light metal
US4042451A (en) * 1975-08-05 1977-08-16 M&T Chemicals Inc. Selected stripping of nickel-iron alloys from ferrous substrates
US4274908A (en) * 1978-08-15 1981-06-23 United Technologies Corporation Cyanide free solution and process for removing gold-nickel braze
US4244833A (en) * 1979-11-15 1981-01-13 Oxy Metal Industries Corporation Composition and process for chemically stripping metallic deposits
US4339282A (en) * 1981-06-03 1982-07-13 United Technologies Corporation Method and composition for removing aluminide coatings from nickel superalloys
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Also Published As

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DE2428380C3 (en) 1979-06-07
AU6905174A (en) 1975-11-20
JPS5036321A (en) 1975-04-05
GB1475327A (en) 1977-06-01
NL7407382A (en) 1974-12-20
JPS5647263B2 (en) 1981-11-09
BR7404948D0 (en) 1975-01-07
FR2233418A1 (en) 1975-01-10
DE2428380A1 (en) 1975-01-09
CA1040987A (en) 1978-10-24
ES427394A1 (en) 1977-02-01
ZA743138B (en) 1975-06-25
IT1013479B (en) 1977-03-30
DE2428380B2 (en) 1978-10-19

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