US20170366772A1 - Methods and apparatus for a multiple storage pixel imaging system - Google Patents
Methods and apparatus for a multiple storage pixel imaging system Download PDFInfo
- Publication number
- US20170366772A1 US20170366772A1 US15/185,829 US201615185829A US2017366772A1 US 20170366772 A1 US20170366772 A1 US 20170366772A1 US 201615185829 A US201615185829 A US 201615185829A US 2017366772 A1 US2017366772 A1 US 2017366772A1
- Authority
- US
- United States
- Prior art keywords
- charge
- floating diffusion
- diffusion region
- photosensitive element
- transfer gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003860 storage Methods 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 24
- 238000003384 imaging method Methods 0.000 title claims description 14
- 238000009792 diffusion process Methods 0.000 claims abstract description 59
- 238000007667 floating Methods 0.000 claims abstract description 59
- 230000010354 integration Effects 0.000 claims abstract description 19
- 238000012546 transfer Methods 0.000 claims description 57
- 238000012545 processing Methods 0.000 claims description 18
- 239000003990 capacitor Substances 0.000 claims description 3
- 230000001360 synchronised effect Effects 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 238000005516 engineering process Methods 0.000 abstract description 28
- 238000005070 sampling Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 238000004891 communication Methods 0.000 description 6
- 230000000875 corresponding effect Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000002596 correlated effect Effects 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- 230000003213 activating effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Images
Classifications
-
- H04N5/372—
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/58—Control of the dynamic range involving two or more exposures
- H04N25/587—Control of the dynamic range involving two or more exposures acquired sequentially, e.g. using the combination of odd and even image fields
- H04N25/589—Control of the dynamic range involving two or more exposures acquired sequentially, e.g. using the combination of odd and even image fields with different integration times, e.g. short and long exposures
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/771—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/772—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising A/D, V/T, V/F, I/T or I/F converters
-
- H04N5/3355—
Definitions
- Multi-storage node pixels may be beneficial in high dynamic range (HDR) imaging, which may include overlapped-exposure imaging techniques.
- HDR high dynamic range
- overlapped-exposure HDR imaging multiple images are captured with an image sensor over the same time period but with different exposure periods, and the images are later combined into a high dynamic range image.
- Images captured at different times for the purpose of HDR imaging may result in distorted images for moving objects. Capturing images in an overlapped manner reduces the distortion as multiple image captures receive the same motion at the same time.
- Rolling shutter architectures also result in image distortion for moving objects since images are captured in a sequential row-by-row fashion.
- a global shutter design may be preferred to minimize the motion distortion associated with rolling shutter circuits, since all pixels in a global shutter imager integrate light simultaneously.
- Conventional global shutter pixels capable of correlated doubled sampling have at least one photo sensitive element, a dedicated in-pixel storage region, and a floating diffusion region.
- the pixels operate by transferring charge to the storage region after integration, resetting the floating diffusion region prior to readout, and then reading out the charge from the storage region to the floating diffusion region for sampling.
- the floating diffusion region is utilized only during the readout period.
- FIG. 1 representatively illustrates a multi-storage pixel in accordance with an exemplary embodiment of the present technology
- FIG. 2 representatively illustrates a timing diagram in accordance with an exemplary embodiment of the present technology
- FIG. 3 representatively illustrates an image sensor in accordance with an exemplary embodiment of the present technology
- FIG. 4 representatively illustrates an imaging system in accordance with an exemplary embodiment of the present technology.
- the present technology may be described in terms of functional block components and various processing steps. Such functional blocks may be realized by any number of components configured to perform the specified functions and achieve the various results.
- the present technology may employ various semiconductor devices, such as switches, capacitors, photosensors, and the like, which may carry out a variety of functions.
- the present technology may be practiced in conjunction with any number of imaging systems and the apparatus and method embodiments described are merely exemplary applications for the technology.
- the present technology may employ any number of conventional techniques for capturing image data, sampling image data, readout of image data, and the like.
- Imaging system may operate in conjunction with any suitable imaging system, such as a camera system, video system, machine vision, vehicle navigation, surveillance system, motion detection system, image stabilization system, and the like.
- the imaging system may comprise an electronic device, such as a digital camera 400 .
- the system may comprise a central processing unit (CPU) 405 that communicates with various devices over a bus 410 . Some of the devices connected to the bus 410 may provide communication into and out of the system, for example an input/output (I/O) device 415 .
- CPU central processing unit
- bus 410 Other devices connected to the bus 410 provide memory, for example, a random access memory (RAM) 420 , hard drive, and one or more peripheral memory devices 425 , such as a floppy disk drive, compact disk (CD) drive, USB drives, memory cards, and SD cards. While the bus 410 is illustrated as a single bus, any number of busses may be used to provide communication paths to interconnect the devices.
- RAM random access memory
- CD compact disk
- SD cards Secure Digital cards
- the imaging system may further comprise an imaging sensor for capturing image data.
- an imaging sensor for capturing image data.
- light may enter the camera through a lens 430 and strike the image sensor.
- the image sensor may detect and convey the information that constitutes an image, for example by converting the variable attenuation of waves (as they pass through or reflect off objects) into electronic signals.
- the image sensor may be implemented in conjunction with any appropriate technology, such as using semiconductor charge-coupled devices (CCD), active pixel sensors in complementary metal-oxide-semiconductors (CMOS) or N-type metal-oxide-semiconductors (NMOS), analog sensors, and/or flat panel detectors.
- CCD semiconductor charge-coupled devices
- CMOS complementary metal-oxide-semiconductors
- NMOS N-type metal-oxide-semiconductors
- analog sensors and/or flat panel detectors.
- an exemplary image sensor 300 may comprise a pixel array 305 comprising a plurality of multi-storage pixels 100 ( FIG. 1 ) arranged in rows and columns.
- the pixels 100 may be electrically connected via metal wirings or other suitable connections.
- the image sensor 300 may be formed in silicon using any suitable complementary metal-oxide semiconductor (CMOS) technology and/or fabrication process.
- CMOS complementary metal-oxide semiconductor
- the image sensor 300 may further comprise a processing circuit 310 .
- the processing circuit 310 may be coupled to the pixel array 305 via a communication bus 315 , wherein the communication bus 315 may transmit and receive signals, such as control and data signals, between the pixel array 305 and the processing circuit 310 .
- the processing circuit 310 may comprise a control unit (not shown) for transmitting control signals.
- the processing circuit 310 may also comprise a clocking mechanism to synchronize transmission of control signals.
- the processing circuit 310 may read the pixel signals through control lines accessed in a per-row manner.
- the processing circuit 310 may be formed on the same chip as the pixel array 305 .
- the multi-storage pixel 100 of the image sensor 300 samples a portion of the image and generates a corresponding signal.
- the multi-storage pixel 100 may comprise a photosensitive element 105 , a storage node 110 , and a floating diffusion node 115 .
- the photosensitive element 105 operates by converting light into an electric charge and may comprise a photodiode, a photogate, or other semiconductor device responsive to light.
- the photosensitive element 105 may comprise a pinned photodiode capable of being fully depleted at a depletion voltage.
- the floating diffusion node 115 selectively stores charge.
- the floating diffusion node 115 may act as a sensing node and may be formed with any device or structure suitable for storing electric charge, such as a diode or capacitor.
- the floating diffusion region 115 may be shielded from incoming light.
- the storage node 110 selectively stores charge.
- the storage node 110 may comprise a doped region into which electric charge is transferred and stored.
- the storage node 110 may be formed with any device or structure suitable for storing electric charge, for example, a pinned diode or a storage gate.
- the storage region 110 may be shielded from incoming light.
- the photosensitive element 105 may be selectively coupled to the floating diffusion node 115 via a first transfer gate 120 .
- the first transfer gate 120 may comprise a switch, such as a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal, and the source and drain terminals are used to carry current or transfer charge.
- the gate terminal of the first transfer gate 120 may receive a first control signal TX 1 from the processing circuit 310 ( FIG. 3 ).
- the first transfer gate 120 may comprise any other suitable device for providing current flow or charge transfer.
- the floating diffusion node 115 may also be selectively coupled to a voltage source V AA , for example via a switch, such as a reset gate 135 .
- the reset gate 135 may comprise a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal, and the source and drain terminals carry current when the reset gate 135 is activated.
- the gate terminal of the reset gate 135 may receive a control signal RST from the processing circuit 310 ( FIG. 3 ).
- the photosensitive element 105 may be selectively coupled to the storage node 110 via another switch, such as a second transfer gate 125 .
- the second transfer gate 125 may comprise a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal and the source and drain terminals carry current or transfer charge.
- the gate terminal of the second transfer gate 125 may receive a second control signal TX 2 from the processing circuit 310 ( FIG. 3 ).
- the second transfer gate 125 may comprise any other suitable device for controlling current flow or charge transfer.
- the storage node 110 may be selectively coupled to the floating diffusion node 115 via a switch such as third transfer gate 130 .
- the third transfer gate 130 may comprise a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal and the source and drain terminals carry current or transfer charge.
- the gate terminal of the third transfer gate 130 may receive a third control signal TX 3 from the processing circuit 310 ( FIG. 3 ).
- the third transfer gate 130 may comprise any other suitable device for providing current flow or charge transfer.
- the pixel 100 may further comprise an amplifier 140 and a row select gate 150 .
- the amplifier 140 amplifies the signal generated by the photosensitive element 105 .
- the amplifier 140 may comprise a source follower circuit comprising a transistor having a gate terminal, a drain terminal, and a source terminal.
- the gate terminal may receive signals corresponding to the charge generated by the photosensitive element and provide a corresponding amplified signal.
- the row select gate 150 selectively connects the pixel 100 to the output. Each line in the imager sensor 300 may be selected and then read out, for example using a column select signal.
- the row select gate 150 for each pixel in a row may be activated to make that row active.
- the row select gate may comprise a transistor having a gate terminal, a drain terminal, and a source terminal. The gate terminal may be used as a control terminal and the source and drain terminals carry current.
- the gate terminal of the row select gate 150 may receive a control signal RS from the processing circuit 310 ( FIG. 3 ).
- the source terminal of the amplifier 140 may couple to the drain terminal of the row select gate 150 .
- the image sensor 300 may operate in conjunction with a global reset period 205 , an integration period 210 , and a readout period 215 .
- the image sensor 300 may capture multiple signals with different exposure periods.
- the first, second, and third transfer gates 120 , 125 , 130 , as well as the reset gate 135 are simultaneously active.
- control signals TX 1 , TX 2 , TX 3 , and RST are switched to a high voltage value simultaneously.
- Transmitting a control signal with a high voltage value to the first, second, and third transfer gates 120 , 125 , 130 , and reset gate 135 resets the photosensitive element 105 .
- the first, second, and third transfer gates 120 , 125 , 130 , and reset gate 135 may be deactivated, for example via low voltage control signals.
- all pixels 100 in the pixel array 305 receive the same control signals and are reset simultaneously.
- the global integration period 210 begins.
- the photosensitive element 105 absorbs light and converts the light into an electric charge.
- the electric charge produced in the photosensitive element 105 is transferred to both the storage node 110 and the floating diffusion node 115 .
- Charge transfer between the storage node 110 and the floating diffusion node 115 may be controlled by selectively activating control signals TX 1 and TX 2 by pulsing the signals high at different times, wherein the pulses for control signals TX 1 and TX 2 do not overlap.
- control signals TX 1 and TX 2 do not activate the first and second transfer gates 120 , 125 at the same time. Instead, only one of the first and second transfer gates 120 , 125 is activated at any given time.
- the integration period may comprise one or more exposures.
- the first transfer gate 120 may be activated, for example via a high voltage value control signal TX 1 , allowing the charge accumulated in the photosensitive element 105 to transfer to the floating diffusion node 115 .
- the first transfer gate 120 may be deactivated, such as via a low voltage value control signal TX 1 , to stop charge transfer to the floating diffusion node 115 .
- a high voltage value control signal TX 2 activates the second transfer gate 125 , allowing the charge accumulated in the photosensitive region 105 to transfer to the storage node 110 .
- a low voltage value control signal TX 2 stops charge transfer to the storage node 110 .
- Charge transfer to the floating diffusion node 115 and the storage node 110 may begin in any order. For example, at the start of the integration period 210 , charge may be transferred and stored in either one of the floating diffusion node 115 or the storage node 110 . As such, the second exposure period T 2 may occur earlier in time than the first exposure period T 1 .
- control signals TX 1 and TX 2 may be asserted multiple times such that the charges transferred the floating diffusion node 115 are summed Likewise, the charges transferred to the storage region 110 are summed (binned). Operation of the control signals TX 1 and TX 2 may be controlled by the processing circuit 310 ( FIG. 3 ) and may operate cyclically, such that charge is transferred from the photosensitive element 105 to the floating diffusion node 115 and then, immediately after another exposure period, charge is transferred from the photosensitive element 105 to the storage region 110 . In other embodiments, charge may not be transferred in a cyclical manner, but may be transferred in any suitable pattern. For example, charge may be transferred consecutively to the storage region 110 for any number suitable of times; likewise, charge may be transferred consecutively to the floating diffusion node 115 for any suitable number of times.
- the charge portions transferred to the storage region 110 may accumulate and are summed.
- the charge portions transferred to the floating diffusion node 115 may accumulate and are summed. The transfer of multiple charge portions with corresponding exposure periods T 1 i , T 2 i to each of the storage region 110 and the floating diffusion node 115 may result in the accumulated charges having different total exposure times T 1 total , T 2 total .
- the first exposure period T 1 may be shorter than the second exposure period T 2 .
- a long exposure period may be used to capture low-light portion of a scene, while a short exposure period may be used to capture bright portions of the scene.
- the charge transferred to the floating diffusion node 115 after the first exposure period T 1 captures bright scenes (i.e. high light signals), and the charge transferred to the storage node 110 after the second exposure period T 2 , where T 2 is greater than T 1 , captures low-light scenes (i.e. low light signals).
- the total exposure time for charge accumulated in the storage node 110 may be longer than that of the total exposure time for charge accumulated in the floating diffusion node 115 .
- the total exposure times may be described by the following equations, where n and m are the upper limits of the number of exposures and i is the index number for each exposure.
- n may be equal to m, n may be greater than m, or n may be less than m.
- the upper limits of the number of exposures n, m may be selected to suit a particular application.
- the length of the exposure periods T 1 i , T 2 i may vary during any one integration period 210 , for example, T 1 1 may be 50 ⁇ s (microseconds), while T 1 10 may be 400 ⁇ s.
- Dynamic range of the image sensor may be defined as the ratio of the sum of second exposure periods T 2 to the sum of the first exposure periods T 1 (i.e. T 2 total /T 1 total ).
- the dynamic range may be adjusted during operation by increasing and/or decreasing the length of any of the exposures times T 1 i , T 2 i .
- the total exposure times T total , T 2 total may be tracked in real time such that a running total may be computed during the integration period 210 and transmitted to the control unit, where the control unit may adjust the duration of any subsequent exposure periods T 1 i , T 2 i .
- Pulsing of the control signals TX 1 , TX 2 may be represented as a duty cycle, where the duty cycle is defined as a length of time where the signal is pulsed high T h , to activate the transfer gates 120 , 125 divided by the total amount of time in a cycle T c .
- exposure periods T 1 i , T 2 i may be predetermined, while in other embodiments, the exposure periods T 1 i , T 2 i may be varied, resulting in a varied duty cycle.
- the duty cycle and frequency of a voltage value applied to the control signals TX 1 and TX 2 may be synchronized to a pulsing light source for time of flight applications.
- the duty cycle and frequency of a voltage value applied to the control signals TX 1 and TX 2 may also be used to mitigate amplitude modulated light sources, such as LEDs (light emitting diodes).
- the readout period 215 begins.
- the pixel signals are read out on a row-by-row basis.
- a high voltage value is applied to the row select control signal RS, and in an exemplary embodiment, the row select control signal RS maintains a high voltage value for the duration of the readout period 215 for each row. Applying a high voltage value to the row select control signal RS allows the charge that has accumulated in the floating diffusion node 115 to be read out of the pixel 100 via a communication line 155 as a voltage which is proportional to the amount of accumulated charge.
- the readout process produces a first pixel signal comprising a corresponding voltage.
- the first pixel signal may be unable to undergo correlated double sampling since the floating diffusion reset voltage cannot be measured prior to readout. However, the first pixel signal can be double sampled, once before the reset gate 135 is activated 220 and once using the voltage level post reset 225 .
- the reset control signal RST activates the reset gate 135 and resets the floating diffusion node 115 .
- the floating diffusion reset level can be sampled and used for double sampling of the first pixel signal, and used for correlated double sampling of the second pixel signal.
- the charge that has accumulated in the storage node 110 can be read out.
- activating the third transfer gate 130 via control signal TX 3 allows the charge to transfer from the storage node 110 through the floating diffusion node 115 , and the resulting voltage of pixel 100 is accessible via the communication line 155 .
- the readout produces a second pixel signal comprising a corresponding voltage.
- the second pixel signal read out from the storage node 110 may undergo correlated double sampling to reduce noise since the voltage on the floating diffusion node 115 may be measured twice, once in a reset condition 225 (prior to activating the third transfer gate 130 ), and once after the charge from the storage node 110 has been transferred to the floating diffusion node 115 , 230 .
- the row select control signal applies a low voltage value to end the readout period 215 .
- a new global reset period 205 may begin again.
- the pixel signals may be combined to produce a high dynamic range image utilizing an image signal processor (not shown).
- the image signal processor may also perform color processing and tone mapping operations, such as demosaicing, white-balance, and color correction.
- FIGS. 2 and 3 The embodiments of FIGS. 2 and 3 in which the pixel array 305 is described as operating in global shutter mode is merely illustrative. If desired, the pixel array 305 having the processing circuit 310 for operating in global shutter mode may be operated in rolling shutter mode. The particular mode of operation depends on the timing and operation of the control signals control signals TX 1 , TX 2 , TX 3 , RST, and RS. For example, in rolling shutter mode, the signals controlling the integration 210 readout 215 , and reset 205 of each pixel 100 would be operated sequentially in a row-by-row fashion.
- first and second do not connote a particular order in time, but rather distinguish between distinct elements, events, conditions, and the like.
- the second exposure period T 2 may occur earlier in time than the first exposure period T 1 .
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
Description
- Multi-storage node pixels may be beneficial in high dynamic range (HDR) imaging, which may include overlapped-exposure imaging techniques. In overlapped-exposure HDR imaging, multiple images are captured with an image sensor over the same time period but with different exposure periods, and the images are later combined into a high dynamic range image.
- Images captured at different times for the purpose of HDR imaging may result in distorted images for moving objects. Capturing images in an overlapped manner reduces the distortion as multiple image captures receive the same motion at the same time.
- Rolling shutter architectures also result in image distortion for moving objects since images are captured in a sequential row-by-row fashion. As such, a global shutter design may be preferred to minimize the motion distortion associated with rolling shutter circuits, since all pixels in a global shutter imager integrate light simultaneously.
- Conventional global shutter pixels capable of correlated doubled sampling have at least one photo sensitive element, a dedicated in-pixel storage region, and a floating diffusion region. The pixels operate by transferring charge to the storage region after integration, resetting the floating diffusion region prior to readout, and then reading out the charge from the storage region to the floating diffusion region for sampling. As such, the floating diffusion region is utilized only during the readout period.
- Creating a HDR image utilizing a global shutter design with pixels formed with multiple storage regions results in larger pixels, or for a given pixel size, reduces the area for the photodiode, thus decreasing sensitivity.
- A more complete understanding of the present technology may be derived by referring to the detailed description when considered in connection with the following illustrative figures. In the following figures, like reference numbers refer to similar elements and steps throughout the figures.
-
FIG. 1 representatively illustrates a multi-storage pixel in accordance with an exemplary embodiment of the present technology; -
FIG. 2 representatively illustrates a timing diagram in accordance with an exemplary embodiment of the present technology; -
FIG. 3 representatively illustrates an image sensor in accordance with an exemplary embodiment of the present technology; and -
FIG. 4 representatively illustrates an imaging system in accordance with an exemplary embodiment of the present technology. - The present technology may be described in terms of functional block components and various processing steps. Such functional blocks may be realized by any number of components configured to perform the specified functions and achieve the various results. For example, the present technology may employ various semiconductor devices, such as switches, capacitors, photosensors, and the like, which may carry out a variety of functions. In addition, the present technology may be practiced in conjunction with any number of imaging systems and the apparatus and method embodiments described are merely exemplary applications for the technology. Further, the present technology may employ any number of conventional techniques for capturing image data, sampling image data, readout of image data, and the like.
- Methods and apparatus for a multi-storage node pixel 100 (
FIG. 1 ) imaging system according to various aspects of the present technology may operate in conjunction with any suitable imaging system, such as a camera system, video system, machine vision, vehicle navigation, surveillance system, motion detection system, image stabilization system, and the like. For example, referring toFIG. 4 , the imaging system may comprise an electronic device, such as adigital camera 400. The system may comprise a central processing unit (CPU) 405 that communicates with various devices over abus 410. Some of the devices connected to thebus 410 may provide communication into and out of the system, for example an input/output (I/O)device 415. Other devices connected to thebus 410 provide memory, for example, a random access memory (RAM) 420, hard drive, and one or moreperipheral memory devices 425, such as a floppy disk drive, compact disk (CD) drive, USB drives, memory cards, and SD cards. While thebus 410 is illustrated as a single bus, any number of busses may be used to provide communication paths to interconnect the devices. - The imaging system may further comprise an imaging sensor for capturing image data. For example, light may enter the camera through a
lens 430 and strike the image sensor. The image sensor may detect and convey the information that constitutes an image, for example by converting the variable attenuation of waves (as they pass through or reflect off objects) into electronic signals. The image sensor may be implemented in conjunction with any appropriate technology, such as using semiconductor charge-coupled devices (CCD), active pixel sensors in complementary metal-oxide-semiconductors (CMOS) or N-type metal-oxide-semiconductors (NMOS), analog sensors, and/or flat panel detectors. - Referring to
FIG. 3 , anexemplary image sensor 300 may comprise apixel array 305 comprising a plurality of multi-storage pixels 100 (FIG. 1 ) arranged in rows and columns. Thepixels 100 may be electrically connected via metal wirings or other suitable connections. Theimage sensor 300 may be formed in silicon using any suitable complementary metal-oxide semiconductor (CMOS) technology and/or fabrication process. - In various embodiments, the
image sensor 300 may further comprise aprocessing circuit 310. Theprocessing circuit 310 may be coupled to thepixel array 305 via acommunication bus 315, wherein thecommunication bus 315 may transmit and receive signals, such as control and data signals, between thepixel array 305 and theprocessing circuit 310. Theprocessing circuit 310 may comprise a control unit (not shown) for transmitting control signals. Theprocessing circuit 310 may also comprise a clocking mechanism to synchronize transmission of control signals. Theprocessing circuit 310 may read the pixel signals through control lines accessed in a per-row manner. In various embodiments, theprocessing circuit 310 may be formed on the same chip as thepixel array 305. - Each
multi-storage pixel 100 of theimage sensor 300 samples a portion of the image and generates a corresponding signal. Referring toFIG. 1 , in an exemplary embodiment of the present technology, themulti-storage pixel 100 may comprise aphotosensitive element 105, astorage node 110, and afloating diffusion node 115. In the present embodiment, thephotosensitive element 105 operates by converting light into an electric charge and may comprise a photodiode, a photogate, or other semiconductor device responsive to light. In various embodiments, thephotosensitive element 105 may comprise a pinned photodiode capable of being fully depleted at a depletion voltage. - The floating diffusion node 115 (also referred to as a “floating diffusion region” or “FD node”) selectively stores charge. In the present embodiment, the
floating diffusion node 115 may act as a sensing node and may be formed with any device or structure suitable for storing electric charge, such as a diode or capacitor. In various embodiments, thefloating diffusion region 115 may be shielded from incoming light. - The storage node 110 (also referred to as a “storage region”) selectively stores charge. In the present embodiment, the
storage node 110 may comprise a doped region into which electric charge is transferred and stored. Thestorage node 110 may be formed with any device or structure suitable for storing electric charge, for example, a pinned diode or a storage gate. In various embodiments, thestorage region 110 may be shielded from incoming light. - The
photosensitive element 105 may be selectively coupled to thefloating diffusion node 115 via afirst transfer gate 120. In an exemplary embodiment, thefirst transfer gate 120 may comprise a switch, such as a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal, and the source and drain terminals are used to carry current or transfer charge. For example, the gate terminal of thefirst transfer gate 120 may receive a first control signal TX1 from the processing circuit 310 (FIG. 3 ). In other embodiments, thefirst transfer gate 120 may comprise any other suitable device for providing current flow or charge transfer. - The
floating diffusion node 115 may also be selectively coupled to a voltage source VAA, for example via a switch, such as areset gate 135. In the present embodiment, thereset gate 135 may comprise a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal, and the source and drain terminals carry current when thereset gate 135 is activated. For example, the gate terminal of thereset gate 135 may receive a control signal RST from the processing circuit 310 (FIG. 3 ). - The
photosensitive element 105 may be selectively coupled to thestorage node 110 via another switch, such as asecond transfer gate 125. In the present embodiment, thesecond transfer gate 125 may comprise a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal and the source and drain terminals carry current or transfer charge. For example, the gate terminal of thesecond transfer gate 125 may receive a second control signal TX2 from the processing circuit 310 (FIG. 3 ). In other embodiments, thesecond transfer gate 125 may comprise any other suitable device for controlling current flow or charge transfer. - The
storage node 110 may be selectively coupled to the floatingdiffusion node 115 via a switch such asthird transfer gate 130. In the present embodiment, thethird transfer gate 130 may comprise a transistor having a gate terminal, a drain terminal, and a source terminal, wherein the gate terminal may operate as a control terminal and the source and drain terminals carry current or transfer charge. For example, the gate terminal of thethird transfer gate 130 may receive a third control signal TX3 from the processing circuit 310 (FIG. 3 ). In other embodiments, thethird transfer gate 130 may comprise any other suitable device for providing current flow or charge transfer. - The
pixel 100 may further comprise anamplifier 140 and a rowselect gate 150. Theamplifier 140 amplifies the signal generated by thephotosensitive element 105. For example, in the present embodiment, theamplifier 140 may comprise a source follower circuit comprising a transistor having a gate terminal, a drain terminal, and a source terminal. The gate terminal may receive signals corresponding to the charge generated by the photosensitive element and provide a corresponding amplified signal. - The row
select gate 150 selectively connects thepixel 100 to the output. Each line in theimager sensor 300 may be selected and then read out, for example using a column select signal. The rowselect gate 150 for each pixel in a row may be activated to make that row active. In the present embodiment, the row select gate may comprise a transistor having a gate terminal, a drain terminal, and a source terminal. The gate terminal may be used as a control terminal and the source and drain terminals carry current. The gate terminal of the rowselect gate 150 may receive a control signal RS from the processing circuit 310 (FIG. 3 ). In an exemplary embodiment, the source terminal of theamplifier 140 may couple to the drain terminal of the rowselect gate 150. - Referring now to
FIGS. 1 and 2 , inoperation 200, the image sensor 300 (FIG. 3 ) may operate in conjunction with aglobal reset period 205, anintegration period 210, and areadout period 215. In an exemplary embodiment, theimage sensor 300 may capture multiple signals with different exposure periods. - In an exemplary embodiment, during the
global reset period 205, the first, second, andthird transfer gates reset gate 135, are simultaneously active. For example, control signals TX1, TX2, TX3, and RST are switched to a high voltage value simultaneously. Transmitting a control signal with a high voltage value to the first, second, andthird transfer gates gate 135 resets thephotosensitive element 105. After a predetermined period of time, the first, second, andthird transfer gates gate 135 may be deactivated, for example via low voltage control signals. In an exemplary embodiment, allpixels 100 in the pixel array 305 (FIG. 3 ) receive the same control signals and are reset simultaneously. - After the
reset period 205 has been completed, theglobal integration period 210 begins. During integration, thephotosensitive element 105 absorbs light and converts the light into an electric charge. In an exemplary embodiment, the electric charge produced in thephotosensitive element 105 is transferred to both thestorage node 110 and the floatingdiffusion node 115. Charge transfer between thestorage node 110 and the floatingdiffusion node 115 may be controlled by selectively activating control signals TX1 and TX2 by pulsing the signals high at different times, wherein the pulses for control signals TX1 and TX2 do not overlap. For example, control signals TX1 and TX2 do not activate the first andsecond transfer gates second transfer gates - After a first exposure period T1, typically measured in micro seconds (μs), the
first transfer gate 120 may be activated, for example via a high voltage value control signal TX1, allowing the charge accumulated in thephotosensitive element 105 to transfer to the floatingdiffusion node 115. Thefirst transfer gate 120 may be deactivated, such as via a low voltage value control signal TX1, to stop charge transfer to the floatingdiffusion node 115. After a second exposure period T2, measured in microseconds (μs), a high voltage value control signal TX2 activates thesecond transfer gate 125, allowing the charge accumulated in thephotosensitive region 105 to transfer to thestorage node 110. A low voltage value control signal TX2 stops charge transfer to thestorage node 110. Charge transfer to the floatingdiffusion node 115 and thestorage node 110 may begin in any order. For example, at the start of theintegration period 210, charge may be transferred and stored in either one of the floatingdiffusion node 115 or thestorage node 110. As such, the second exposure period T2 may occur earlier in time than the first exposure period T1. - In an exemplary embodiment, during the
integration period 210, control signals TX1 and TX2 may be asserted multiple times such that the charges transferred the floatingdiffusion node 115 are summed Likewise, the charges transferred to thestorage region 110 are summed (binned). Operation of the control signals TX1 and TX2 may be controlled by the processing circuit 310 (FIG. 3 ) and may operate cyclically, such that charge is transferred from thephotosensitive element 105 to the floatingdiffusion node 115 and then, immediately after another exposure period, charge is transferred from thephotosensitive element 105 to thestorage region 110. In other embodiments, charge may not be transferred in a cyclical manner, but may be transferred in any suitable pattern. For example, charge may be transferred consecutively to thestorage region 110 for any number suitable of times; likewise, charge may be transferred consecutively to the floatingdiffusion node 115 for any suitable number of times. - In an exemplary embodiment, where the integration period comprises multiple exposure periods T1 i, T2 i, the charge portions transferred to the
storage region 110 may accumulate and are summed. Likewise, the charge portions transferred to the floatingdiffusion node 115 may accumulate and are summed. The transfer of multiple charge portions with corresponding exposure periods T1 i, T2 i to each of thestorage region 110 and the floatingdiffusion node 115 may result in the accumulated charges having different total exposure times T1 total, T2 total. - In an exemplary embodiment, the first exposure period T1 may be shorter than the second exposure period T2. A long exposure period may be used to capture low-light portion of a scene, while a short exposure period may be used to capture bright portions of the scene. For example, the charge transferred to the floating
diffusion node 115 after the first exposure period T1 captures bright scenes (i.e. high light signals), and the charge transferred to thestorage node 110 after the second exposure period T2, where T2 is greater than T1, captures low-light scenes (i.e. low light signals). As such, the total exposure time for charge accumulated in thestorage node 110 may be longer than that of the total exposure time for charge accumulated in the floatingdiffusion node 115. The total exposure times may be described by the following equations, where n and m are the upper limits of the number of exposures and i is the index number for each exposure. -
T1 total=Σi=1 nT1 i -
T2 total=Σi=1 mT2 i - In various embodiments, n may be equal to m, n may be greater than m, or n may be less than m. The upper limits of the number of exposures n, m may be selected to suit a particular application. Additionally, the length of the exposure periods T1 i, T2 i may vary during any one
integration period 210, for example, T1 1 may be 50 λs (microseconds), while T1 10 may be 400 μs. - Dynamic range of the image sensor may be defined as the ratio of the sum of second exposure periods T2 to the sum of the first exposure periods T1 (i.e. T2 total/T1 total). The dynamic range may be adjusted during operation by increasing and/or decreasing the length of any of the exposures times T1 i, T2 i. The total exposure times Ttotal, T2 total may be tracked in real time such that a running total may be computed during the
integration period 210 and transmitted to the control unit, where the control unit may adjust the duration of any subsequent exposure periods T1 i, T2 i. - Pulsing of the control signals TX1, TX2 may be represented as a duty cycle, where the duty cycle is defined as a length of time where the signal is pulsed high Th, to activate the
transfer gates - Once the
integration period 210 ends, thereadout period 215 begins. In an exemplary embodiment, the pixel signals are read out on a row-by-row basis. A high voltage value is applied to the row select control signal RS, and in an exemplary embodiment, the row select control signal RS maintains a high voltage value for the duration of thereadout period 215 for each row. Applying a high voltage value to the row select control signal RS allows the charge that has accumulated in the floatingdiffusion node 115 to be read out of thepixel 100 via acommunication line 155 as a voltage which is proportional to the amount of accumulated charge. The readout process produces a first pixel signal comprising a corresponding voltage. The first pixel signal may be unable to undergo correlated double sampling since the floating diffusion reset voltage cannot be measured prior to readout. However, the first pixel signal can be double sampled, once before thereset gate 135 is activated 220 and once using the voltagelevel post reset 225. - While the row select control signal RS maintains a high voltage value, the reset control signal RST activates the
reset gate 135 and resets the floatingdiffusion node 115. At thistime 225, the floating diffusion reset level can be sampled and used for double sampling of the first pixel signal, and used for correlated double sampling of the second pixel signal. - Once the floating
diffusion node 115 has been reset and the reset level sampled, the charge that has accumulated in thestorage node 110 can be read out. For example, activating thethird transfer gate 130 via control signal TX3 allows the charge to transfer from thestorage node 110 through the floatingdiffusion node 115, and the resulting voltage ofpixel 100 is accessible via thecommunication line 155. The readout produces a second pixel signal comprising a corresponding voltage. In various embodiments, as described above, the second pixel signal read out from thestorage node 110 may undergo correlated double sampling to reduce noise since the voltage on the floatingdiffusion node 115 may be measured twice, once in a reset condition 225 (prior to activating the third transfer gate 130), and once after the charge from thestorage node 110 has been transferred to the floatingdiffusion node - After both pixel signals have been read out of the floating
diffusion node 115 and thestorage node 110, the row select control signal applies a low voltage value to end thereadout period 215. A newglobal reset period 205 may begin again. - In an exemplary embodiment, after completion of the
readout period 215, the pixel signals (i.e. one capture using a long exposure and one capture using a short exposure) may be combined to produce a high dynamic range image utilizing an image signal processor (not shown). In various embodiments, the image signal processor may also perform color processing and tone mapping operations, such as demosaicing, white-balance, and color correction. - The embodiments of
FIGS. 2 and 3 in which thepixel array 305 is described as operating in global shutter mode is merely illustrative. If desired, thepixel array 305 having theprocessing circuit 310 for operating in global shutter mode may be operated in rolling shutter mode. The particular mode of operation depends on the timing and operation of the control signals control signals TX1, TX2, TX3, RST, and RS. For example, in rolling shutter mode, the signals controlling theintegration 210readout 215, and reset 205 of eachpixel 100 would be operated sequentially in a row-by-row fashion. - Additionally, the terms “first” and “second” do not connote a particular order in time, but rather distinguish between distinct elements, events, conditions, and the like. For example, the second exposure period T2 may occur earlier in time than the first exposure period T1.
- In the foregoing description, the technology has been described with reference to specific exemplary embodiments. The particular implementations shown and described are illustrative of the technology and its best mode and are not intended to otherwise limit the scope of the present technology in any way. Indeed, for the sake of brevity, conventional manufacturing, connection, preparation, and other functional aspects of the method and system may not be described in detail. Furthermore, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and/or steps between the various elements. Many alternative or additional functional relationships or physical connections may be present in a practical system.
- While the technology has been described with reference to specific exemplary embodiments, various modifications and changes may be made without departing from the scope of the present technology. The description and figures are to be regarded in an illustrative manner, rather than a restrictive one and all such modifications are intended to be included within the scope of the present technology. Accordingly, the scope of the technology should be determined by the generic embodiments described and their legal equivalents rather than by merely the specific examples described above. For example, the steps recited in any method or process embodiment may be executed in any order, unless otherwise expressly specified, and are not limited to the explicit order presented in the specific examples. Additionally, the components and/or elements recited in any apparatus embodiment may be assembled or otherwise operationally configured in a variety of permutations to produce substantially the same result as the present technology and are accordingly not limited to the specific configuration recited in the specific examples.
- Benefits, other advantages and solutions to problems have been described above with regard to particular embodiments. Any benefit, advantage, solution to problems or any element that may cause any particular benefit, advantage or solution to occur or to become more pronounced, however, is not to be construed as a critical, required or essential feature or component.
- The terms “comprises”, “comprising”, or any variation thereof, are intended to reference a non-exclusive inclusion, such that a process, method, article, composition or apparatus that comprises a list of elements does not include only those elements recited, but may also include other elements not expressly listed or inherent to such process, method, article, composition or apparatus. Other combinations and/or modifications of the above-described structures, arrangements, applications, proportions, elements, materials or components used in the practice of the present technology, in addition to those not specifically recited, may be varied or otherwise particularly adapted to specific environments, manufacturing specifications, design parameters or other operating requirements without departing from the general principles of the same.
- The present technology has been described above with reference to an exemplary embodiment. However, changes and modifications may be made to the exemplary embodiment without departing from the scope of the present technology.
- These and other changes or modifications are intended to be included within the scope of the present technology, as expressed in the following claims.
Claims (20)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/185,829 US9848148B1 (en) | 2016-06-17 | 2016-06-17 | Methods and apparatus for a multiple storage pixel imaging system |
CN201720580098.1U CN206759610U (en) | 2016-06-17 | 2017-05-24 | Pixel, imaging sensor and imaging system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/185,829 US9848148B1 (en) | 2016-06-17 | 2016-06-17 | Methods and apparatus for a multiple storage pixel imaging system |
Publications (2)
Publication Number | Publication Date |
---|---|
US9848148B1 US9848148B1 (en) | 2017-12-19 |
US20170366772A1 true US20170366772A1 (en) | 2017-12-21 |
Family
ID=60618634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/185,829 Active 2036-06-30 US9848148B1 (en) | 2016-06-17 | 2016-06-17 | Methods and apparatus for a multiple storage pixel imaging system |
Country Status (2)
Country | Link |
---|---|
US (1) | US9848148B1 (en) |
CN (1) | CN206759610U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210112212A1 (en) * | 2019-10-10 | 2021-04-15 | Semiconductor Components Industries, Llc | Imaging pixels having programmable dynamic range |
US11075234B2 (en) * | 2018-04-02 | 2021-07-27 | Microsoft Technology Licensing, Llc | Multiplexed exposure sensor for HDR imaging |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018152696A (en) * | 2017-03-13 | 2018-09-27 | ソニーセミコンダクタソリューションズ株式会社 | Solid state image sensor, driving method thereof and electronic equipment |
CN112075072B (en) * | 2018-09-14 | 2024-11-01 | 松下知识产权经营株式会社 | Image pickup apparatus |
US11165977B2 (en) * | 2019-07-22 | 2021-11-02 | Semiconductor Components Industries, Llc | Imaging systems and methods for generating high dynamic range images |
US11196937B2 (en) * | 2019-11-25 | 2021-12-07 | Qualcomm Incorporated | High frame rate in high dynamic range processing |
CN114882853A (en) * | 2022-04-18 | 2022-08-09 | 深圳锐视智芯科技有限公司 | Exposure time adjusting method, device, adjusting equipment and storage medium |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060181627A1 (en) * | 2005-01-06 | 2006-08-17 | Recon/Optical, Inc. | Hybrid infrared detector array and CMOS readout integrated circuit with improved dynamic range |
US20090141155A1 (en) * | 2007-11-30 | 2009-06-04 | International Business Machines Corporation | High dynamic range imaging cell with electronic shutter extensions |
US20120241591A1 (en) * | 2011-03-25 | 2012-09-27 | Aptina Imaging Corporation | Pumped pinned photodiode pixel array |
US20120257093A1 (en) * | 2011-04-11 | 2012-10-11 | Lg Innotek Co., Ltd. | Pixel, pixel array, image sensor including the same and method for operating the image sensor |
US20130027596A1 (en) * | 2011-07-27 | 2013-01-31 | Chung Chun Wan | Color imaging using time-multiplexed light sources and monochrome image sensors with multi-storage-node pixels |
US20130135486A1 (en) * | 2011-11-28 | 2013-05-30 | Chung Chun Wan | High dynamic range imaging with multi-storage pixels |
US20140103411A1 (en) * | 2012-10-16 | 2014-04-17 | Omnivision Technologies, Inc. | Stacked chip image sensor with light-sensitive circuit elements on the bottom chip |
US20150123172A1 (en) * | 2013-11-01 | 2015-05-07 | Omnivision Technologies, Inc. | Big-small pixel scheme for image sensors |
US20160037101A1 (en) * | 2014-07-31 | 2016-02-04 | Samsung Electronics Co., Ltd. | Apparatus and Method for Capturing Images |
US9332200B1 (en) * | 2014-12-05 | 2016-05-03 | Qualcomm Incorporated | Pixel readout architecture for full well capacity extension |
US20160225803A1 (en) * | 2015-01-29 | 2016-08-04 | Semiconductor Components Industries, Llc | Global shutter image sensor pixels having centralized charge storage regions |
US9456159B1 (en) * | 2015-09-23 | 2016-09-27 | Semiconductor Components Industries, Llc | Pixels with an active reset circuit in CMOS image sensors |
US20170099422A1 (en) * | 2015-10-01 | 2017-04-06 | Qualcomm Incorporated | High dynamic range solid state image sensor and camera system |
US20170126993A1 (en) * | 2015-11-04 | 2017-05-04 | Semiconductor Components Industries, Llc | Multi-port image pixels |
-
2016
- 2016-06-17 US US15/185,829 patent/US9848148B1/en active Active
-
2017
- 2017-05-24 CN CN201720580098.1U patent/CN206759610U/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060181627A1 (en) * | 2005-01-06 | 2006-08-17 | Recon/Optical, Inc. | Hybrid infrared detector array and CMOS readout integrated circuit with improved dynamic range |
US20090141155A1 (en) * | 2007-11-30 | 2009-06-04 | International Business Machines Corporation | High dynamic range imaging cell with electronic shutter extensions |
US20120241591A1 (en) * | 2011-03-25 | 2012-09-27 | Aptina Imaging Corporation | Pumped pinned photodiode pixel array |
US20120257093A1 (en) * | 2011-04-11 | 2012-10-11 | Lg Innotek Co., Ltd. | Pixel, pixel array, image sensor including the same and method for operating the image sensor |
US20130027596A1 (en) * | 2011-07-27 | 2013-01-31 | Chung Chun Wan | Color imaging using time-multiplexed light sources and monochrome image sensors with multi-storage-node pixels |
US20130135486A1 (en) * | 2011-11-28 | 2013-05-30 | Chung Chun Wan | High dynamic range imaging with multi-storage pixels |
US20140103411A1 (en) * | 2012-10-16 | 2014-04-17 | Omnivision Technologies, Inc. | Stacked chip image sensor with light-sensitive circuit elements on the bottom chip |
US20150123172A1 (en) * | 2013-11-01 | 2015-05-07 | Omnivision Technologies, Inc. | Big-small pixel scheme for image sensors |
US20160037101A1 (en) * | 2014-07-31 | 2016-02-04 | Samsung Electronics Co., Ltd. | Apparatus and Method for Capturing Images |
US9332200B1 (en) * | 2014-12-05 | 2016-05-03 | Qualcomm Incorporated | Pixel readout architecture for full well capacity extension |
US9692997B2 (en) * | 2014-12-05 | 2017-06-27 | Qualcomm Incorporated | Pixel readout architecture for full well capacity extension |
US20160225803A1 (en) * | 2015-01-29 | 2016-08-04 | Semiconductor Components Industries, Llc | Global shutter image sensor pixels having centralized charge storage regions |
US9456159B1 (en) * | 2015-09-23 | 2016-09-27 | Semiconductor Components Industries, Llc | Pixels with an active reset circuit in CMOS image sensors |
US20170099422A1 (en) * | 2015-10-01 | 2017-04-06 | Qualcomm Incorporated | High dynamic range solid state image sensor and camera system |
US20170126993A1 (en) * | 2015-11-04 | 2017-05-04 | Semiconductor Components Industries, Llc | Multi-port image pixels |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11075234B2 (en) * | 2018-04-02 | 2021-07-27 | Microsoft Technology Licensing, Llc | Multiplexed exposure sensor for HDR imaging |
US11563041B2 (en) * | 2018-04-02 | 2023-01-24 | Microsoft Technology Licensing, Llc | Multiplexed exposure sensor for HDR imaging |
US20210112212A1 (en) * | 2019-10-10 | 2021-04-15 | Semiconductor Components Industries, Llc | Imaging pixels having programmable dynamic range |
Also Published As
Publication number | Publication date |
---|---|
CN206759610U (en) | 2017-12-15 |
US9848148B1 (en) | 2017-12-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9848148B1 (en) | Methods and apparatus for a multiple storage pixel imaging system | |
US10271037B2 (en) | Image sensors with hybrid three-dimensional imaging | |
US10218923B2 (en) | Methods and apparatus for pixel binning and readout | |
US10110840B2 (en) | Image sensor pixels with overflow capabilities | |
US9247170B2 (en) | Triple conversion gain image sensor pixels | |
US9277147B2 (en) | Multimode pixel readout for enhanced dynamic range | |
US11272126B2 (en) | Wide dynamic range image sensor with global shutter | |
US20080106625A1 (en) | Multi image storage on sensor | |
EP0757390A2 (en) | Combined photogate and photodiode active pixel image sensor | |
US20130256510A1 (en) | Imaging device with floating diffusion switch | |
US20160198141A1 (en) | Imaging systems with phase detection pixels | |
KR20110012031A (en) | Single gate pixel and operating method for single gate pixel | |
TWI837107B (en) | Pixel structure, image sensor device and system with pixel structure, and method of operating the pixel structure | |
US10075663B2 (en) | Phase detection pixels with high speed readout | |
KR20210024608A (en) | Image sensor including a plurality of super-pixels | |
CN113382183A (en) | Image sensor and method of operating the same | |
US10304888B2 (en) | Imaging apparatus comprising 3D stacked global shutter | |
US11037977B2 (en) | Stacked image sensor capable of simultaneous integration of electrons and holes | |
US9819883B2 (en) | Global shutter correction | |
EP3420592B1 (en) | Improved ultra-high dynamic range pixel architecture | |
US11350049B2 (en) | Dark current calibration method and associated pixel circuitry | |
US10827139B2 (en) | Multiple window, multiple mode image sensor | |
US20200059612A1 (en) | Pixel apparatus and cmos image sensor using the same | |
CN114143483A (en) | Image sensing device | |
US20230007204A1 (en) | Pixel circuit, image sensor, and image pickup device and method for using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC, ARIZONA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:JOHNSON, RICHARD SCOTT;MAURITZSON, RICHARD;REEL/FRAME:038945/0722 Effective date: 20160617 |
|
AS | Assignment |
Owner name: DEUTSCHE BANK AG NEW YORK BRANCH, NEW YORK Free format text: SECURITY INTEREST;ASSIGNOR:SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC;REEL/FRAME:041187/0295 Effective date: 20161221 |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 4 |
|
AS | Assignment |
Owner name: FAIRCHILD SEMICONDUCTOR CORPORATION, ARIZONA Free format text: RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 041187, FRAME 0295;ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:064151/0203 Effective date: 20230622 Owner name: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC, ARIZONA Free format text: RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 041187, FRAME 0295;ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:064151/0203 Effective date: 20230622 |