US20060238852A1 - A non-contacting electrostatically-driven mems device - Google Patents
A non-contacting electrostatically-driven mems device Download PDFInfo
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- US20060238852A1 US20060238852A1 US10/907,992 US90799205A US2006238852A1 US 20060238852 A1 US20060238852 A1 US 20060238852A1 US 90799205 A US90799205 A US 90799205A US 2006238852 A1 US2006238852 A1 US 2006238852A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Definitions
- Microelectromechanical systems (MEMS) devices are small structures typically fabricated on a semiconductor wafer using techniques such as optical lithography, doping, metal sputtering, oxide deposition, and plasma etching, which have been developed for the fabrication of integrated circuits.
- Digital micromirror devices (DMDs) sometimes referred to as deformable micromirror devices, are a type of MEMS device used in projection displays by controlling light through reflection.
- Other types of MEMS devices include accelerometers, pressure and flow sensors, and gears and motors.
- a conventional DMD 100 is illustrated in FIG. 1 .
- the DMD 100 is constructed of three metal layers: a top layer 102 , a middle layer 104 , and a bottom layer 106 .
- the three metal layers are situated over an integrated circuit (not shown), which provides electrical commands and signals.
- the top layer 102 includes a pixel mirror 108 that resides over the middle layer 104 supported via a mirror support post 110 .
- the middle layer 104 resides over the bottom layer 106 supported by four hinge support posts 112 .
- the mirror support post 110 of the top layer 102 is attached to a yoke 114 .
- As the yoke 114 rotates on its torsion hinges 118 , it drives the mirror support post 110 to rotate and tilt accordingly. Consequently, as the mirror support post 110 rotates and tilts, it dictates the angle, direction, and magnitude that the pixel mirror 108 will rotate and tilt.
- the yoke 114 controls the pixel mirror 108 by this relay effect.
- One problem associated with a conventional MEMS device, such as the DMD 100 is “stiction”, which occurs when the yoke 114 rotates on the torsion hinges 118 and the yoke landing tips 116 come in physical contact with landing sites 120 located within the underlying bottom layer 106 .
- the yoke landing tips 116 may stick to the landing sites 120 in the underlying bottom layer 106 , and thereby adversely affect the response time of the pixel mirror 108 and the overall device performance.
- the landing tips 116 may adhere to the landing sites 120 and remain stuck if an applied mechanical restoring force is not strong enough to overcome the existing surface adhesion forces.
- the pixel mirror 108 will then be considered permanently defective because it will remain fixated at only one angle.
- the present disclosure relates to a microelectromechanical system (MEMS) device, and more particularly, to an electrostatically-driven digital micromirror device (DMD) that prevents or at least reduces stiction.
- MEMS microelectromechanical system
- DMD digital micromirror device
- a central electrode includes interspersed extensions initially formed on a substrate. Two outer electrodes with interspersed extensions are subsequently formed on the substrate such that the two outer electrodes flank the central electrode. The extensions of the central and outer electrodes are interdigitated whereby a low bias voltage applied to the outer electrodes generates an electrostatic force upon the central electrode enabling a pixel mirror that is formed on top of the central electrode to freely move, rotate, and tilt.
- FIG. 1 is an exploded view of a prior-art digital micromirror device (DMD).
- FIG. 2 is an exploded view of a DMD according to the present disclosure.
- the pixel mirror 108 tilts and rotates according to the tilt and rotation of the yoke.
- the pixel mirror 108 also rotates and tilts due to the electrostatic forces generated by the electric fields between the pixel mirror 108 and the mirror address electrodes 113 , as well as the fields generated between the yoke 114 and the yoke address electrodes 121 .
- Electrical signals are fed and carried through metal contact holes from the underlying integrated circuit (not shown).
- FIG. 2 illustrates a digital micromirror device (DMD) 200 according to the present disclosure.
- the DMD 200 includes a top layer 202 , a middle layer 204 , and a bottom layer 206 .
- the top layer 202 includes a pixel mirror 208 connected to a downwardly extending mirror support post 210 .
- the mirror support post 210 is adapted for engagement with a corresponding post-receiving hole 211 formed in the middle layer 204 as will be further described.
- the pixel mirror 208 has a thickness of about 2,000 to 5,000 ⁇ and is constructed of aluminum using known methods and techniques.
- the thickness of the pixel mirror 208 of the presently disclosed embodiment has a thickness of about 3,300 ⁇ .
- other materials such as silicon oxide, silicon nitride, polysilicon, and phosphosilicate glass (PSG) may also be used in constructing the pixel mirror 208 .
- the mirror support post 210 has a thickness of about 500 to 1,000 ⁇ and is constructed of an aluminum alloy using known methods and techniques.
- the mirror support post 210 may also be formed of aluminum, titanium, and silicon metal alloys.
- the thickness of the mirror support post 210 of the presently disclosed embodiment has a thickness of about 700 ⁇ .
- the middle layer 204 disposed beneath the top layer 202 , includes a yoke 212 supported by a plurality of yoke support posts 214 .
- the yoke support posts 214 may be formed according to the same or similar materials and methods as the mirror support posts 210 . Furthermore, the yoke support posts 214 may also have the same or similar thickness as that of the mirror support post 210 .
- the middle layer 204 also includes a post-receiving hole 211 , which may be formed using known materials and methods.
- the bottom layer 206 situated below the middle layer 204 , includes a yoke address electrode 216 and mirror address electrodes 220 .
- the bottom layer 206 further includes contact pads 224 , which are provided for receiving the yoke support posts 214 .
- the bottom layer 206 includes a pair of metal contact openings 217 separated by the yoke address electrode 216 .
- additional metal contact openings and alternatively configured metal contact openings are contemplated, such as additional metal contact openings and alternatively configured metal contact openings. Electrical signals and connections from an integrated circuit (not shown) positioned beneath the bottom layer 206 may be sent through the pair of metal contact openings 217 into either the yoke address electrode 216 or the mirror address electrodes 220 .
- the integrated circuit may be a static random access memory (SRAM) cell or an integrated complementary metal oxide semiconductor (CMOS) device.
- the integrated circuit may be a multi-chip module (MCM) where many devices are assembled together by stacking one on top of another into a single module for faster electronic devices with added functionalities.
- MCM multi-chip module
- the yoke address electrode 216 generally resides in a middle portion of the bottom layer 206 and is flanked by two outer mirror address electrodes 220 .
- the yoke address electrode 216 includes a plurality of interspersed extensions 218 , thereby defining a plurality of interspersed grooves 221 .
- the pluralities of interspersed extensions 218 are situated at opposing lateral sides of the yoke address electrode 216 .
- Disposed within the plurality of grooves 221 are a plurality of corresponding interspersed extensions 222 of the laterally disposed mirror address electrodes 220 . Accordingly, the extensions 218 , 222 are substantially interdigitated to form a comb-like structure.
- the yoke address electrode 216 and the two mirror address electrodes 220 have a thickness of about 500 to about 3,000 ⁇ .
- the thickness of the yoke address electrode 216 and the two mirror address electrodes 220 within the presently disclosed embodiment is about 1,500 ⁇ .
- the interspersed extensions 218 , 222 may have a corresponding width and length of about 20 ⁇ m and a thickness of about 500 to about 3,000 ⁇ .
- the thickness of the interspersed extensions 218 , 222 within the presently disclosed embodiment is about 1,500 ⁇ .
- the spacing between the interspersed extensions 218 , 222 can vary from about 5 to 10 ⁇ m.
- the spacing between the interspersed extensions 218 , 222 within the presently disclosed embodiment is about 7.5 ⁇ m.
- interspersed extensions 218 , 222 are depicted as being square in shape, they can take on a variety of polygonal shapes and sizes.
- the interspersed extensions 218 , 222 may be in the shape of a rectangle, a triangle, a parallelogram, a diamond, a trapezoid or any other suitable shape.
- the interspersed extensions 218 , 222 may also take on plane-curve shapes such as circles, semi-circles, ellipses, semi-ellipses, lines, parabolas, or hyperbolas.
- the interspersed extensions 218 , 222 may be uniformly spaced or non-uniformly spaced and uniform in shape and size or non-uniform in shape and size. Uniform and non-uniform combinations of shapes and sizes are also contemplated.
- the DMD 200 has a larger surface area when compared with conventional DMDs, such as DMD 100 of FIG. 1 . More specifically, the interspersed extensions 218 , 222 increase the surface area of the electrodes of the DMD 200 , thereby facilitating the generation of a greater electrostatic force than that of a conventional DMD 100 .
- an electrostatic field is generated by pulsing the mirror address electrodes 220 .
- the generated electric field in turn generates an electrostatic force that causes the pixel mirror 208 to tilt or rotate.
- the DMD 200 can generate much greater electrostatic forces thereby eliminating or at least reducing the chance that the pixel mirror 208 will stick to underlying layers of the DMD 200 .
- the increased electrostatic force eliminates the need for reset electronics.
- the DMD 200 may be manufactured by surface micromachining, where the structures are built up in layers of thin film on the surface of a silicon wafer or any other suitable substrate. Another technique of manufacturing a DMD is bulk micromachining.
- the presently disclosed embodiments may also be applied to MEMS devices for useful applications in the study and understanding of biological proteins and gene functions. The presently disclosed embodiments are therefore considered in all respects to be illustrative and not restrictive. The scope of the invention is indicated by the appended claims rather than the foregoing description, and all changes that come within the meaning and ranges of equivalents thereof are intended to be embraced therein.
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Abstract
An improved microelectromechanical systems (MEMS) device, which eliminates, or at least reduces, “stiction” is described. The MEMS device includes a central electrode and a pair of outer electrodes formed on a substrate. The central electrode includes a plurality of extensions defining a plurality of grooves interspersed with the extensions. The outer electrodes include a plurality of extensions disposed within the grooves of the central electrode.
Description
- Microelectromechanical systems (MEMS) devices are small structures typically fabricated on a semiconductor wafer using techniques such as optical lithography, doping, metal sputtering, oxide deposition, and plasma etching, which have been developed for the fabrication of integrated circuits. Digital micromirror devices (DMDs), sometimes referred to as deformable micromirror devices, are a type of MEMS device used in projection displays by controlling light through reflection. Other types of MEMS devices include accelerometers, pressure and flow sensors, and gears and motors.
- A
conventional DMD 100 is illustrated inFIG. 1 . As shown, theDMD 100 is constructed of three metal layers: atop layer 102, amiddle layer 104, and abottom layer 106. The three metal layers are situated over an integrated circuit (not shown), which provides electrical commands and signals. Thetop layer 102 includes apixel mirror 108 that resides over themiddle layer 104 supported via amirror support post 110. Themiddle layer 104, in turn, resides over thebottom layer 106 supported by fourhinge support posts 112. Themirror support post 110 of thetop layer 102 is attached to ayoke 114. As theyoke 114 rotates on itstorsion hinges 118, it drives themirror support post 110 to rotate and tilt accordingly. Consequently, as the mirror support post 110 rotates and tilts, it dictates the angle, direction, and magnitude that thepixel mirror 108 will rotate and tilt. Theyoke 114, in essence, controls thepixel mirror 108 by this relay effect. - One problem associated with a conventional MEMS device, such as the
DMD 100, is “stiction”, which occurs when theyoke 114 rotates on thetorsion hinges 118 and theyoke landing tips 116 come in physical contact withlanding sites 120 located within theunderlying bottom layer 106. In some cases, when surface adhesion forces are high enough, theyoke landing tips 116 may stick to thelanding sites 120 in theunderlying bottom layer 106, and thereby adversely affect the response time of thepixel mirror 108 and the overall device performance. In other cases, thelanding tips 116 may adhere to thelanding sites 120 and remain stuck if an applied mechanical restoring force is not strong enough to overcome the existing surface adhesion forces. Thepixel mirror 108 will then be considered permanently defective because it will remain fixated at only one angle. - Stiction has heretofore been addressed by applying lubrication or passivation layers to the
yoke landing tips 116 and thelanding sites 120 in the hopes of making these metal surfaces slippery enough to minimize sticking. In addition,reset electronics 122 have been employed to pump additional electrical energy into theyoke 114 in order to help it break free from the constraining surface adhesion forces between theyoke landing tips 116 and thelanding sites 120. These techniques require extra fabrication processes and additional cost. - The present disclosure relates to a microelectromechanical system (MEMS) device, and more particularly, to an electrostatically-driven digital micromirror device (DMD) that prevents or at least reduces stiction. A central electrode includes interspersed extensions initially formed on a substrate. Two outer electrodes with interspersed extensions are subsequently formed on the substrate such that the two outer electrodes flank the central electrode. The extensions of the central and outer electrodes are interdigitated whereby a low bias voltage applied to the outer electrodes generates an electrostatic force upon the central electrode enabling a pixel mirror that is formed on top of the central electrode to freely move, rotate, and tilt.
-
FIG. 1 is an exploded view of a prior-art digital micromirror device (DMD); and -
FIG. 2 is an exploded view of a DMD according to the present disclosure. - Referring to the conventional digital micromirror device (DMD) of
FIG. 1 , thepixel mirror 108 tilts and rotates according to the tilt and rotation of the yoke. In practice, thepixel mirror 108 also rotates and tilts due to the electrostatic forces generated by the electric fields between thepixel mirror 108 and themirror address electrodes 113, as well as the fields generated between theyoke 114 and theyoke address electrodes 121. Electrical signals are fed and carried through metal contact holes from the underlying integrated circuit (not shown). - Reference is now made to
FIG. 2 , which illustrates a digital micromirror device (DMD) 200 according to the present disclosure. The DMD 200 includes atop layer 202, amiddle layer 204, and abottom layer 206. As illustrated in the figure, thetop layer 202 includes apixel mirror 208 connected to a downwardly extendingmirror support post 210. Themirror support post 210 is adapted for engagement with a correspondingpost-receiving hole 211 formed in themiddle layer 204 as will be further described. In some embodiments, thepixel mirror 208 has a thickness of about 2,000 to 5,000 Å and is constructed of aluminum using known methods and techniques. Preferably, the thickness of thepixel mirror 208 of the presently disclosed embodiment has a thickness of about 3,300 Å. In addition to aluminum, other materials such as silicon oxide, silicon nitride, polysilicon, and phosphosilicate glass (PSG) may also be used in constructing thepixel mirror 208. In some embodiments, themirror support post 210 has a thickness of about 500 to 1,000 Å and is constructed of an aluminum alloy using known methods and techniques. Themirror support post 210 may also be formed of aluminum, titanium, and silicon metal alloys. Preferably, the thickness of themirror support post 210 of the presently disclosed embodiment has a thickness of about 700 Å. - The
middle layer 204, disposed beneath thetop layer 202, includes ayoke 212 supported by a plurality ofyoke support posts 214. Theyoke support posts 214 may be formed according to the same or similar materials and methods as themirror support posts 210. Furthermore, theyoke support posts 214 may also have the same or similar thickness as that of themirror support post 210. Themiddle layer 204 also includes apost-receiving hole 211, which may be formed using known materials and methods. - The
bottom layer 206, situated below themiddle layer 204, includes ayoke address electrode 216 andmirror address electrodes 220. Thebottom layer 206 further includescontact pads 224, which are provided for receiving theyoke support posts 214. Still further, thebottom layer 206 includes a pair ofmetal contact openings 217 separated by theyoke address electrode 216. Of course, other metal contact opening arrangements are contemplated, such as additional metal contact openings and alternatively configured metal contact openings. Electrical signals and connections from an integrated circuit (not shown) positioned beneath thebottom layer 206 may be sent through the pair ofmetal contact openings 217 into either theyoke address electrode 216 or themirror address electrodes 220. The integrated circuit may be a static random access memory (SRAM) cell or an integrated complementary metal oxide semiconductor (CMOS) device. In other embodiments, the integrated circuit may be a multi-chip module (MCM) where many devices are assembled together by stacking one on top of another into a single module for faster electronic devices with added functionalities. - The
yoke address electrode 216 generally resides in a middle portion of thebottom layer 206 and is flanked by two outermirror address electrodes 220. Theyoke address electrode 216 includes a plurality ofinterspersed extensions 218, thereby defining a plurality ofinterspersed grooves 221. In one embodiment, the pluralities ofinterspersed extensions 218 are situated at opposing lateral sides of theyoke address electrode 216. Disposed within the plurality ofgrooves 221 are a plurality of correspondinginterspersed extensions 222 of the laterally disposedmirror address electrodes 220. Accordingly, theextensions yoke address electrode 216 and the twomirror address electrodes 220 have a thickness of about 500 to about 3,000 Å. Preferably, the thickness of theyoke address electrode 216 and the twomirror address electrodes 220 within the presently disclosed embodiment is about 1,500 Å. Additionally, theinterspersed extensions interspersed extensions interspersed extensions interspersed extensions - Although the
interspersed extensions extensions extensions extensions - One benefit of the
DMD 200 is realized through the amount of electrostatic force that can be generated between theextensions DMD 200 has a larger surface area when compared with conventional DMDs, such asDMD 100 ofFIG. 1 . More specifically, the interspersedextensions DMD 200, thereby facilitating the generation of a greater electrostatic force than that of aconventional DMD 100. - In practice, an electrostatic field is generated by pulsing the
mirror address electrodes 220. The generated electric field in turn generates an electrostatic force that causes thepixel mirror 208 to tilt or rotate. Unlike aconventional DMD 100, wherein thepixel mirror 108 can experience stiction during tilting or rotation, theDMD 200 can generate much greater electrostatic forces thereby eliminating or at least reducing the chance that thepixel mirror 208 will stick to underlying layers of theDMD 200. In addition, the increased electrostatic force eliminates the need for reset electronics. - It will be appreciated by those of ordinary skill in the art that the invention can be embodied in other specific forms without departing from the spirit or essential character thereof. For example, the
DMD 200 may be manufactured by surface micromachining, where the structures are built up in layers of thin film on the surface of a silicon wafer or any other suitable substrate. Another technique of manufacturing a DMD is bulk micromachining. In addition, the presently disclosed embodiments may also be applied to MEMS devices for useful applications in the study and understanding of biological proteins and gene functions. The presently disclosed embodiments are therefore considered in all respects to be illustrative and not restrictive. The scope of the invention is indicated by the appended claims rather than the foregoing description, and all changes that come within the meaning and ranges of equivalents thereof are intended to be embraced therein. - Additionally, the section headings herein are provided for consistency with the suggestions under 37 C.F.R. § 1.77 or otherwise to provide organizational cues. These headings shall not limit or characterize the invention(s) set out in any claims that may issue from this disclosure. A description of a technology in the “Background” is not to be construed as an admission that technology is prior art to any embodiment(s) in this disclosure. Neither is the “Summary” to be considered as a characterization of the embodiment(s) set forth in the claims found herein. Furthermore, any reference in this disclosure to “embodiment” in the singular should not be used to argue that there is only a single point of novelty claimed in this disclosure. Multiple embodiments may be set forth according to the limitations of the multiple claims associated with this disclosure, and the claims accordingly define the embodiment(s), and their equivalents, that are protected thereby. In all instances, the scope of the claims shall be considered on their own merits in light of the specification, but should not be constrained by the headings set forth herein.
Claims (20)
1. A microelectromechanical device, comprising:
a substrate;
a first electrode formed on the substrate, the first electrode having at least one extension extending from a first portion of the first electrode and at least one extension extending from a second portion of the first electrode, the second portion being substantially opposed to the first portion;
a second electrode formed on the substrate substantially adjacent to the first portion of the first electrode, the second electrode having at least one extension extending towards the first electrode; and
a third electrode formed on the substrate substantially adjacent to the second portion of the first electrode, the third electrode having at least one extension extending towards the first electrode;
wherein the at least one extension of the first portion of the first electrode substantially overlaps the at least one extension of the second electrode and the at least one extension of the second portion of the first electrode substantially overlaps the at least one extension of the third electrode.
2. A device according to claim 1 , wherein the at least one extension extending from a first portion of the first electrode is a plurality of extensions spaced from one another to define a plurality of grooves interspersed with the plurality of extensions.
3. A device according to claim 2 , wherein the at least one extension extending from a second portion of the first electrode is a plurality of extensions spaced from one another to define a plurality of grooves interspersed with the plurality of extensions.
4. A device according to claim 3 , wherein the at least one extension of the second electrode is a plurality of extensions disposed within a plurality of grooves corresponding to the first portion of the first electrode.
5. A device according to claim 4 , wherein the at least one extension of the third electrode is a plurality of extensions disposed within a plurality of grooves corresponding to the second portion of the first electrode.
6. A device according to claim 3 , wherein at least one of the plurality of extensions extending from each of the first and second portions of the first electrode has a polygonal geometric shape.
7. A device according to claim 6 , wherein the polygonal geometric shape is selected from the group consisting of a triangle, a square, a rectangle, a parallelogram, a diamond, and a trapezoid.
8. A device according to claim 3 , wherein at least one of the plurality of extensions extending from each of the first and second portions of the first electrode has a plane curve geometric shape.
9. A device according to claim 8 , wherein the plane curve geometric shape is selected from the group consisting of a circle, a semi-circle, an ellipse, a semi-ellipse, a line, a parabola, and a hyperbola.
10. A device according to claim 3 , wherein at least one of the plurality of extensions extending from each of the second and third electrodes has a polygonal geometric shape.
11. A device according to claim 10 , wherein the polygonal geometric shape is selected from the group consisting of a triangle, a square, a rectangle, a parallelogram, a diamond, and a trapezoid.
12. A device according to claim 3 , wherein at least one of the plurality of extensions extending from each of the second and third electrodes has a plane curve geometric shape.
13. A device according to claim 12 , wherein the plane curve geometric shape is selected from the group consisting of a circle, a semi-circle, an ellipse, a semi-ellipse, a line, a parabola, and a hyperbola.
14. A device according to claim 1 , further comprising a yoke operatively secured to the substrate, the yoke having a groove formed therein.
15. A device according to claim 14 , further comprising a pixel mirror operatively secured to the yoke, the pixel mirror having a downwardly extending post for engagement with the groove formed in the yoke.
16. A device according to claim 1 , wherein the first electrode comprises a plurality of electrodes.
17. A microelectromechanical device, comprising:
a substrate;
a first electrode formed on the substrate, the first electrode having a plurality of spaced apart extensions extending from opposing sides of the first electrode, the spaced apart extensions defining a plurality of grooves interspersed with the extensions;
a pair of additional electrodes formed on the substrate adjacent to the opposing sides of the first electrode, the additional electrodes having a plurality of spaced apart extensions disposed within the grooves defined at opposing sides of the first electrode;
wherein the at least one extension of the first portion of the first electrode substantially overlaps the at least one extension of the second electrode and the at least one extension of the second portion of the first electrode substantially overlaps the at least one extension of the third electrode.
18. A device according to claim 17 , further comprising a yoke operatively secured to the substrate.
19. A device according to claim 18 , further comprising a pixel mirror operatively secured to the yoke.
20. A method for reducing stiction associated with operation of microelectromechanical devices, comprising:
forming a microelectromechanical device to include a first electrode and a pair of electrodes flanking the first electrode, the first electrode interfacing with the pair of electrodes via a plurality extensions disposed within a plurality of grooves defined in the pair of electrodes, wherein the at least one extension of the first portion of the first electrode substantially overlaps the at least one extension of the second electrode and the at least one extension of the second portion of the first electrode substantially overlaps the at least one extension of the third electrode;
whereby the surface area defined at the interface between the first electrode and the pair of electrodes generates an electrostatic force large enough to overcome surface adhesion forces associated with operation of the microelectromechanical device.
Priority Applications (6)
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US10/907,992 US20060238852A1 (en) | 2005-04-22 | 2005-04-22 | A non-contacting electrostatically-driven mems device |
JP2008507981A JP2008538328A (en) | 2005-04-22 | 2006-04-24 | Non-contact MEMS device driven electrostatically |
CNA2006800134160A CN101164005A (en) | 2005-04-22 | 2006-04-24 | Non-contacting electrostatically driven mems device |
PCT/US2006/015430 WO2006116282A1 (en) | 2005-04-22 | 2006-04-24 | Non-contacting electrostatically-driven mems device |
EP06751214A EP1875296A4 (en) | 2005-04-22 | 2006-04-24 | Non-contacting electrostatically-driven mems device |
US11/925,577 US7630120B2 (en) | 2005-04-22 | 2007-10-26 | Non-contacting electrostatically driven MEMS device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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US10/907,992 US20060238852A1 (en) | 2005-04-22 | 2005-04-22 | A non-contacting electrostatically-driven mems device |
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US11/925,577 Continuation-In-Part US7630120B2 (en) | 2005-04-22 | 2007-10-26 | Non-contacting electrostatically driven MEMS device |
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US11/925,577 Active US7630120B2 (en) | 2005-04-22 | 2007-10-26 | Non-contacting electrostatically driven MEMS device |
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EP (1) | EP1875296A4 (en) |
JP (1) | JP2008538328A (en) |
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US20080198436A1 (en) * | 2007-02-21 | 2008-08-21 | Blakley Daniel R | Optical device |
US20080239442A1 (en) * | 2007-03-29 | 2008-10-02 | Stereo Display, Inc. | Array of micromirrors with non-fixed underlying structures |
US20160033760A1 (en) * | 2014-08-01 | 2016-02-04 | Seiko Epson Corporation | Electro-Optical Device, Manufacturing Method for Electro-Optical Device, and Electronic Apparatus |
CN105565259A (en) * | 2014-11-03 | 2016-05-11 | 德州仪器公司 | Operation/margin enhancement feature for surface-MEMS structure, and sculpting raised address electrode |
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JP6064839B2 (en) * | 2013-08-26 | 2017-01-25 | 株式会社豊田中央研究所 | MEMS equipment |
JP6519284B2 (en) * | 2015-04-01 | 2019-05-29 | セイコーエプソン株式会社 | Electro-optical device, method of manufacturing electro-optical device, and electronic apparatus |
US10589980B2 (en) * | 2017-04-07 | 2020-03-17 | Texas Instruments Incorporated | Isolated protrusion/recession features in a micro electro mechanical system |
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2005
- 2005-04-22 US US10/907,992 patent/US20060238852A1/en not_active Abandoned
-
2006
- 2006-04-24 JP JP2008507981A patent/JP2008538328A/en not_active Abandoned
- 2006-04-24 WO PCT/US2006/015430 patent/WO2006116282A1/en active Application Filing
- 2006-04-24 EP EP06751214A patent/EP1875296A4/en not_active Withdrawn
- 2006-04-24 CN CNA2006800134160A patent/CN101164005A/en active Pending
-
2007
- 2007-10-26 US US11/925,577 patent/US7630120B2/en active Active
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US7605964B2 (en) * | 2007-03-29 | 2009-10-20 | Angstrom, Inc. | Array of micromirrors with non-fixed underlying structures |
US20160033760A1 (en) * | 2014-08-01 | 2016-02-04 | Seiko Epson Corporation | Electro-Optical Device, Manufacturing Method for Electro-Optical Device, and Electronic Apparatus |
US10444493B2 (en) * | 2014-08-01 | 2019-10-15 | Seiko Epson Corporation | Electro-optical device, manufacturing method for electro-optical device, and electronic apparatus |
CN105565259A (en) * | 2014-11-03 | 2016-05-11 | 德州仪器公司 | Operation/margin enhancement feature for surface-MEMS structure, and sculpting raised address electrode |
Also Published As
Publication number | Publication date |
---|---|
JP2008538328A (en) | 2008-10-23 |
US7630120B2 (en) | 2009-12-08 |
US20080130079A1 (en) | 2008-06-05 |
EP1875296A1 (en) | 2008-01-09 |
WO2006116282A1 (en) | 2006-11-02 |
CN101164005A (en) | 2008-04-16 |
EP1875296A4 (en) | 2012-04-11 |
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Legal Events
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Owner name: TEXAS INSTRUMENTS INCORPORATED, TEXAS Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:STRUMPELL, MARK H;REEL/FRAME:015936/0942 Effective date: 20050420 |
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STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO PAY ISSUE FEE |