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US20060093013A1 - Laser beam projecting device - Google Patents

Laser beam projecting device Download PDF

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Publication number
US20060093013A1
US20060093013A1 US11/244,848 US24484805A US2006093013A1 US 20060093013 A1 US20060093013 A1 US 20060093013A1 US 24484805 A US24484805 A US 24484805A US 2006093013 A1 US2006093013 A1 US 2006093013A1
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US
United States
Prior art keywords
laser beam
wavelength selecting
selecting film
projecting device
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/244,848
Other languages
English (en)
Inventor
Michiyo Saito
Kunihiro Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Topcon Corp
Original Assignee
Topcon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Topcon Corp filed Critical Topcon Corp
Assigned to KABUSHIKI KAISHA TOPCON reassignment KABUSHIKI KAISHA TOPCON ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HAYASHI, KUNIHIRO, SAITO, MICHIYO
Publication of US20060093013A1 publication Critical patent/US20060093013A1/en
Priority to US12/157,773 priority Critical patent/US7554650B2/en
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0972—Prisms
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C15/00—Surveying instruments or accessories not provided for in groups G01C1/00 - G01C13/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481—Constructional features, e.g. arrangements of optical elements
    • G01S7/4811—Constructional features, e.g. arrangements of optical elements common to transmitter and receiver
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/108—Scanning systems having one or more prisms as scanning elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • H01S5/0071—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for beam steering, e.g. using a mirror outside the cavity to change the beam direction

Definitions

  • the present invention relates to a laser beam projecting device comprising structure for shutting off a return beam of a laser beam emitted from a laser light source.
  • FIG. 7 shows general features of an optical system of a conventional type laser beam projecting device, which has an operation to shut off the return beam.
  • reference numeral 1 denotes a semiconductor laser
  • reference numeral 2 denotes a condenser lens
  • Reference numeral 3 denotes an anamorphic prism, which comprises two wedge-like prisms 4 a and 4 b having different collection angles in two directions of cross-section of luminous flux.
  • a laser beam 5 is projected on a projection optical axis 6 .
  • On the projection optical axis 6 there are arranged a polarizing plate 7 for transmittig P-polarized light and a 1 ⁇ 4 ⁇ plate (birefringent optical component) 8 .
  • Reference numeral 9 denotes an optical component for reflecting the laser beam 5 .
  • the optical component is a reflecting mirror, for instance.
  • the laser beam 5 emitted from the semiconductor laser 1 is, for instance, a linearly P-polarized light, and cross-section of luminous flux of the laser beam 5 is in elliptical shape.
  • the cross-section of the luminous flux of the laser beam 5 is expanded in a short axis direction by the two wedge-like prisms 4 a and 4 b of the anamorphic prism 3 , and the laser beam 5 is shaped so that the cross-section of the luminous flux has circular shape.
  • the laser beam 5 with the luminous flux turned to circular shape passes through the polarizing plate 7 .
  • the laser beam 5 is then converted to a circularly polarized light by the 1 ⁇ 4 ⁇ plate 8 and is projected.
  • the circularly polarized reflected laser beam 5 ′ Being reflected by the optical component 9 , the circularly polarized reflected laser beam 5 ′ is converted to a linearly polarized light as the reflected laser beam 5 ′ passes through the 1 ⁇ 4 ⁇ plate 8 . Further, the linearly polarized reflected laser beam 5 ′ thus converted has a direction of polarization different by 90° with respect to the projected laser beam 5 , and the reflected laser beam 5 ′ becomes S-polarized light.
  • the polarizing plate 7 is arranged so as to allow the P-polarized light to pass. Accordingly, the S-polarized reflected laser beam 5 ′ is shut off by the polarizing plate 7 and does not reach the semiconductor laser 1 .
  • the returning of the reflected laser beam 5 ′ is shut off by a combination of the polarizing plate 7 and the 1 ⁇ 4 ⁇ plate 8 arranged on the projection optical axis 6 , and the polarizing plate 7 is required to be arranged on the projection optical axis 6 .
  • reflection occurs on both surfaces of the polarizing plate 7 and this causes loss of the laser beam.
  • the present invention provides a laser beam projecting device, which comprises a laser light source for emitting a laser beam, a wavelength selecting film for allowing the laser beam from the laser light source to pass, and a birefringent optical member arranged on an optical axis closer to an exit side than the wavelength selecting film, wherein the wavelength selecting film is tilted so that an incident angle of the laser beam is in a range of 45° to 80°.
  • the present invention provides the laser beam projecting device as described above, wherein the laser beam projecting device has an anamorphic prism, and the wavelength selecting film is formed on one surface of wedge-like prisms, which constitute the anamorphic prism.
  • the present invention provides the laser beam projecting device as describe above, wherein the wavelength selecting film is formed on an incident surface, which is tilted at a range of 45° to 80° with respect to the laser beam entering to the anamorphic prism. Also, the present invention provides the laser beam projecting device as described above, wherein the wavelength selecting film is tilted in such manner that the incident angle of the laser beam is in a range of 60° to 70°. Further, the present invention provides the laser beam projecting device as described above, wherein the wavelength selecting film is determined depending on a wavelength and an incident angle of the laser beam. Also, the present invention provides the laser beam projecting device as described above, wherein the wavelength selecting film is a long-pass filter or a short-pass filter.
  • a laser light source for emitting a laser beam
  • a wavelength selecting film for allowing the laser beam from the laser light source to pass
  • a birefringent optical member arranged on an optical axis closer to an exit side than the wavelength selecting film, and the wavelength selecting film is tilted so that an incident angle of the laser beam is in a range of 45° to 80°.
  • the wavelength selecting film has difference in transmission characteristics between the P-polarizing component and the S-polarizing component, and the wavelength selecting film fulfills a function as a polarizing plate.
  • the laser beam projecting device has an anamorphic prism, and the wavelength selecting film is formed on one surface of wedge-like prisms, which constitute the anamorphic prism.
  • the return beam can be shut off without providing a polarizing plate separately, and this leads to the simplified structure of the optical system.
  • FIG. 1 is a schematical drawing to show an arrangement of an embodiment of the present invention
  • FIG. 2 (A), FIG. 2 (B) and FIG. 2 (C) each represents a drawing to explain relation of a wavelength selecting film formed on a transparent plate with an incident angle of a laser beam.
  • FIG. 2 (A) shows a case where the incident angle is 0°
  • FIG. 2 (B) shows a case where the incident angle is 45°
  • FIG. 2 (C) a case where the incident angle is 60°.
  • FIG. 3 (A), FIG. 3 (B) and FIG. 3 (C) each represents a drawing to explain relation of an incident angle of the laser beam with respect to the wavelength selecting film with transmittance.
  • FIG. 3 (A) shows a case where the incident angle is 0°
  • FIG. 3 (B) shows a case where the incident angle is 45°
  • FIG. 3 (C) a case where the incident angle is 60°.
  • FIG. 4 is a schematical drawing of a laser rotary irradiating system according to the present invention.
  • FIG. 5 is a schematical drawing to show an essential portion of an optical system of the laser rotary irradiating system
  • FIG. 6 is a block diagram of an LD driving unit of the laser rotary irradiating system.
  • FIG. 7 is a schematical drawing to show an arrangement of a conventional type laser beam projecting device.
  • FIG. 1 description will be given on a basic arrangement of an optical system of a laser beam projecting device.
  • FIG. 1 the same component as shown in FIG. 7 is referred by the same symbol.
  • a laser beam 5 from a semiconductor laser 1 is shaped by the anamorphic prism 3 and the laser beam 5 is projected.
  • a 1 ⁇ 4 ⁇ plate 8 is provided on a projection optical axis 6 of the laser beam 5 .
  • a wavelength selecting film 11 is formed on at least one surface of wedge-like prisms 4 a and 4 b , which constitute the anamorphic prism 3 , e.g. on a surface facing to the semiconductor laser 1 of the wedge-like prism 4 a .
  • the wavelength selecting film 11 fulfills the function as a beam splitter.
  • FIG. 2 (A), FIG. 2 (B) and FIG. 2 (C) each represents a case where the wavelength selecting film 11 (long-pass filter or short-pass filter) is formed on a transparent plate 12 , the laser beam 5 enters to the transparent plate 12 , and an incident angle is changed to 0°, 45° and 60° respectively.
  • FIG. 3 (A), FIG. 3 (B) and FIG. 3 (C) each represents changes of transmittance of a P-polarizing component and a S-polarizing component in each case.
  • a symbol P represents a transmittance curve of the P-polarizing component
  • a symbol S represents a transmittance curve of the S-polarizing component.
  • the state of transmittance with respect to a wavelength of the laser beam 5 is the same for both the P-polarizing component and the S-polarizing component.
  • the transmittance exceeds about 90%.
  • the wavelength selecting film 11 is a mere wavelength selecting film.
  • the wavelength selecting film 11 fulfills the equivalent function to a polarizing plate with respect to the wavelength, which is included in the area 13 .
  • the transmission wavelength of the laser beam 5 is shifted further toward the short wavelength side for both the P-polarizing component and the S-polarizing component as shown in FIG. 3 (C), and the transmittance exceeds about 90% at the wavelength of ⁇ C for the P-polarizing component and at ⁇ C′ for the S-polarizing component.
  • the difference of the transition amount between the P-polarizing component and the S-polarizing component increases further.
  • the area 13 shown by diagonal lines in FIG. 3 (C)), in which the P-polarising component passes through while the S-polarizing component is shut off, becomes larger than the case where the incident angle is 45°.
  • the wavelength selecting film 11 fulfills the equivalent function to that of the polarizing plate with respect to the wavelength, which is included in the area 13 .
  • the wavelength selecting film 11 in case the wavelength selecting film 11 is tilted at an angle of 60° with respect to the incident angle and the laser beam 5 with the wavelength included in the area 13 is used, the wavelength selecting film 11 can be used as a polarizing plate which transmits the P-polarizing component but shuts off the S-polarizing component.
  • the wavelength selecting film 11 is formed on at least one surface of the wedge-like prisms 4 a and 4 b , and the wavelength selecting film 11 is tilted at an angle as required, e.g. at 60° with respect to the laser beam 5 .
  • the P-polarized laser beam 5 emitted from the semiconductor laser 1 has a wavelength included in the area 13 .
  • the laser beam 5 is turned to parallel luminous flux by the condenser lens 2 .
  • the P-polarized laser beam 5 passes through the wavelength selecting film 11 , and cross-section of the luminous flux is shaped in circular shape by the wedge-like prisms 4 a and 4 b of the anamorphic prism 3 .
  • the laser beam 5 After passing trough the anamorphic prism 3 , the laser beam 5 is converted to a circularly polarized light by the 1 ⁇ 4 ⁇ plate 8 and is projected to the optical component 9 .
  • the laser beam 5 As the reflected laser beam 5 ′ reflected by the optical component 9 passes through the 1 ⁇ 4 ⁇ plate 8 again, the laser beam 5 is converted to an S-polarized light.
  • the S-polarized reflected laser beam 5 ′ is shut off by the wavelength selecting film 11 and does not reach the semiconductor laser 1 .
  • the tilt angle of the wavelength selecting film 11 is determined so that there is a difference in the transmitting characteristics of P-polarizing component and S-polarizing component, and so that the area 13 can be obtained.
  • the return beam can be shut off without providing a polarizing plate separately.
  • FIG. 4 to FIG. 6 description will be given below on an example of a surveying system comprising the laser beam projecting device according to the present invention.
  • the same component as shown in FIG. 1 is referred by the same symbol.
  • the surveying system is a laser rotary irradiating system for forming a horizontal reference plane by irradiating a laser beam in a horizontal direction by rotary irradiation.
  • the laser rotary irradiating system primarily comprises a laser beam projecting device 15 , a tilt correcting system 16 , a projection optical system 17 , a rotary irradiating unit 18 , and a photodetection system 19 .
  • a laser beam 5 emitted from the semiconductor laser 1 tilting of an optical axis is corrected at the tilt correcting system 16 . Then, the laser beam 5 is projected along a vertical optical axis by the projection optical system 17 .
  • the rotary irradiating unit 18 deflects the laser beam 5 in a horizontal direction and projects the laser beam 5 by rotary irradiation.
  • the laser beam 5 thus irradiated forms a horizontal reference plane.
  • a reflected laser beam 5 ′ passes through the rotary irradiating unit 18 and is received and detected by the photodetection system 19 . At the photodetection system 19 , a position, a direction, etc. of the reflecting object 20 are detected.
  • Light emission from the semiconductor laser 1 is driven and controlled by an LD driving unit 21 as shown in FIG. 6 .
  • a part of the laser beam 5 emitted from the semiconductor laser 1 is split, and is then detected by a photodetection element 22 such as a photodiode, etc.
  • a result of photodetection is fed back to an output current control circuit 23 .
  • the output current control circuit 23 Based on a photodetection signal, issues a control signal to control light intensity of the laser beam 5 to a certain fixed level and sends the control signal to a semiconductor laser driving circuit 24 .
  • the semiconductor laser driving circuit 24 drives the semiconductor laser 1 .
  • the tilt correcting system 16 has a free liquid surface 25 .
  • the laser beam 5 emitted from the semiconductor laser 1 is reflected by the free liquid surface 25 .
  • the projection optical axis of the projection optical system 17 is corrected to a vertical direction and the tilting can be corrected.
  • the anamorphic prism 3 On the projection optical axis 6 from the tilt correcting system 16 to the projection optical system 17 , the anamorphic prism 3 is provided, and one of the surfaces of the wedge-like prisms 4 a and 4 b constituting the anamorphic prism 3 is tilted at an angle as required with respect to the projection optical axis 6 .
  • the incident surface of the wedge-like prism 4 a is tilted at an angle of 60° with respect to the projection optical axis 6 as shown in FIG. 1 , and the wavelength selecting film 11 is formed on the incident surface of the wedge-like prism 4 a.
  • the projection optical system 17 comprises a reflecting mirror 26 for deflecting the laser beam 5 in a vertical direction after the laser beam 5 has passed through the anamorphic prism 3 , a beam expander 27 for expanding a diameter of the luminous flux of the laser beam 5 on a reflection light optical axis of the reflecting mirror 26 , an aperture reflecting mirror 28 , and the 1 ⁇ 4 ⁇ plate 8 which is a component element of the laser beam projecting device 15 .
  • the rotary irradiating unit 18 comprises a pentagonal prism 31 , which deflects the laser beam 5 in a horizintal direction after the laser beam 5 has passed through an aperture 29 of the aperture reflecting mirror 18 and the 1 ⁇ 4 ⁇ plate 8 .
  • the pentagonal prism 31 is arranged on a rotary holder 32 with a hollow portion inside. When the rotary holder 32 is rotated by a rotating motor 33 , the laser beam 5 projected from the rotary holder 32 is projected by rotary irradiation.
  • the reflected laser beam 5 ′ Being reflected by the reflecting object 20 , the reflected laser beam 5 ′ enters through the rotary irradiating unit 18 and is deflected by the aperture reflecting mirror 28 toward the photodetection system 19 .
  • the photodetection system 19 comprises a condenser lens 34 , a polarizing plate 35 , a pinhole plate 36 , and a photodetection element 37 , and the photodetection system 19 can receive and detect the reflected laser beam 5 ′ from the reflecting object 20 .
  • the polarizing plate 35 is arranged to allow the S-polarizing component to pass.
  • a photodetection signal from the photodetection element 37 is sent to a control unit 38 .
  • the control unit 38 controls rotation of the rotating motor 33 in such manner that, for instance, reciprocal scanning is performed at an angle as required around the reflecting object 20 .
  • the P-polarized linear laser beam 5 is emitted and has a wavelength included in the area 13 .
  • the laser beam 5 passes through the wavelength selecting film 11 .
  • the form of the laser beam is shaped by the anamorphic prism 3 , and the laser beam 5 is deflected in a vertical direction by the reflecting mirror 26 , and the beam diameter is expanded as required.
  • the laser beam 5 is converted to a circularly polarized light.
  • the laser beam 5 is deflected in a horizontal direction and is projected by rotary irradiation.
  • the reflected laser beam 5 ′ After being reflected by the reflecting object 20 , the reflected laser beam 5 ′ enters through the rotary irradiating unit 18 . Then, the reflected laser beam 5 ′ passes through the 1 ⁇ 4 ⁇ plate 8 again, and the reflected laser beam 5 ′ is converted to an S-polarized linearly polarized light.
  • the reflected laser beam 5 ′ is reflected by the aperture 29 toward the photodetection system 19 and is converged to a photodetection surface of the photodetection element 37 by the condenser lens 34 .
  • the polarizing plate 35 allows only the S-polarizing component to pass and shuts off the other disturbance light.
  • the pinhole plate 36 allows a luminous flux of a limited portion on the optical axis to pass and shuts off the other disturbance light so that only the reflected laser beam 5 ′ from the reflecting object 20 is received by the photodetection element 37 .
  • the reflected laser beam 5 ′ After passing through the 1 ⁇ 4 ⁇ plate 8 , a part of the reflected laser beam 5 ′ passes through the aperture 29 and enters the laser beam projecting device 15 as a return beam. Because the wavelength selecting film 11 is tilted so that the P-polarized light is allowed to pass, the reflected laser beam 5 ′, i.e. S-polarized light, is shut off by the wavelength selecting film 11 and does not enter the semiconductor laser 1 . Therefore, decrease of output of the semiconductor laser 1 is prevented, and the laser beam 5 in stable condition is emitted from the semiconductor laser 1 .
  • a reflected light from the surfaces of optical components such as the pentagonal prism 31 , etc. is included in the reflected laser beam 5 ′ as shown in FIG. 5 .
  • These reflected light components are converted to S-polarized lights when the light components pass through the 1 ⁇ 4 ⁇ plate 8 in an outgoing course and in a return course, and these reflected light components are shut off by the wavelength selecting film 11 .
  • the 1 ⁇ 4 ⁇ plate may be provided separately on each of the laser beam projecting device 15 and the photodetection system 19 respectively.
  • 1 ⁇ 4 ⁇ plates may be provided between the anamorphic prism 3 and the reflecting mirror 26 and may be provided between the aperture reflecting mirror 28 and the condenser lens 34 respectively.
  • the present invention is provided on a laser rotary irradiating system, while the present invention may be provided on an electro-optical (light wave) distance measuring system, etc.
  • the present invention can be introduced in the same manner to an optical system, for which it is necessary to eliminate influence of the return beam.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Polarising Elements (AREA)
US11/244,848 2004-11-04 2005-10-06 Laser beam projecting device Abandoned US20060093013A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/157,773 US7554650B2 (en) 2004-11-04 2008-06-13 Laser beam projecting device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004-320692 2004-11-04
JP2004320692A JP4614737B2 (ja) 2004-11-04 2004-11-04 レーザ光線射出装置

Related Child Applications (1)

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US12/157,773 Active US7554650B2 (en) 2004-11-04 2008-06-13 Laser beam projecting device

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US20100033564A1 (en) * 2008-08-08 2010-02-11 Hon Hai Precision Industry Co., Ltd. Vehicle monitoring system
US20150381845A1 (en) * 2014-06-25 2015-12-31 Electronics And Telecommunications Research Institute Apparatus and method of obtaining image

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US7646546B1 (en) * 2005-06-10 2010-01-12 Cvi Laser, Llc Anamorphic optical system providing a highly polarized laser output
EP2789973B1 (de) * 2013-04-12 2017-11-22 Hexagon Technology Center GmbH Rotationslaser mit durch Aktuatoren gezielt verformbarer Linse
US10481101B2 (en) * 2017-01-23 2019-11-19 Applied Materials Israel Ltd. Asymmetrical magnification inspection system and illumination module
CN108309559A (zh) * 2018-02-05 2018-07-24 苏州宣嘉光电科技有限公司 诱导视网膜产生和释放多巴胺并激活多巴胺受体d1的方法及眼科治疗仪器
CN109974677A (zh) * 2019-04-19 2019-07-05 常州华达科捷光电仪器有限公司 一种光路结构和使用该光路结构的激光投线仪
WO2022100278A1 (zh) * 2020-11-11 2022-05-19 青岛海信宽带多媒体技术有限公司 一种光模块
CN118549940B (zh) * 2024-06-12 2024-10-22 山东省核工业二四八地质大队 一种地质调查仪器

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US20100033564A1 (en) * 2008-08-08 2010-02-11 Hon Hai Precision Industry Co., Ltd. Vehicle monitoring system
US20150381845A1 (en) * 2014-06-25 2015-12-31 Electronics And Telecommunications Research Institute Apparatus and method of obtaining image

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JP2006133020A (ja) 2006-05-25
CN1769840A (zh) 2006-05-10
US7554650B2 (en) 2009-06-30
JP4614737B2 (ja) 2011-01-19
US20080252875A1 (en) 2008-10-16
CN1769840B (zh) 2010-06-09

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