TWM647640U - In-chamber dust collection device - Google Patents

Abstract

A dust collection device in a cavity includes a blocking member, a first guide plate and a second guide plate. The blocker includes a first side wall, a second side wall and a bottom; wherein, the first side wall extends toward the top of the accommodation space and is used to connect to the reaction chamber; the second side wall is parallel to the first side wall and faces above the accommodation space. Extend, and an opening is formed on the inside of the second side wall for the carrying tray to enter; the bottom is connected to the first side wall and the second side wall to form an annular groove area, and at least one guide hole is opened at the bottom. The first guide plate is fixed to the first side wall and extends obliquely toward the bottom; wherein, the first guide plate is located above at least one guide hole. The second deflector is fixed to the second side wall, is located above the first deflector, and extends obliquely toward the bottom.

Description

Dust collection device in the cavity

The present invention relates to coating equipment and coating methods, in particular to one kind.

As shown in Figure 1, in the coating equipment 1 that performs sputtering of thin films, the particles constituting the thin film material are provided by the target 2. The target 2 generates atomic beams through high-energy gas ion impact or other means to sputter the wafer below. substrate. However, although the atoms of these target materials 2, such as the carbon atoms used to form a carbon film, can adhere well to the wafer substrate and grow into a carbon film, the carbon atoms that contact the shielding ring 3, the shielding member 4, and the shielding wall 5 The formed target particles cannot adhere well and form target particles floating in the air. Or, after the carbon atoms are deposited on the shielding ring 3, the shielding member 4, and the shielding wall 5 to form a carbon layer, they eventually fall off due to poor adhesion. Therefore, when subsequently maintaining the coating equipment 1, it is necessary to spend time cleaning up the carbon atoms that fall off in the reaction chamber. The carbon layer in body 6. Target particles floating in the air will also settle on the surface of the wafer substrate, affecting the growth of the film on the wafer substrate and affecting the quality of the film.

Traditionally, to reduce target particle deposition, an exhaust port 7 is provided at the lower part of the reaction chamber 6 and connected to a vacuum pump 8 for continuous air extraction. The working gas such as inert gas is continuously introduced into the reaction zone 6a in the upper part of the reaction chamber 6, then passes through the baffle 4 surrounding the bearing plate 9 to the lower part of the reaction chamber 110, and is finally extracted from the exhaust port 7. The working gas is continuously sucked by the vacuum pump 8, and the floating carbon particles are driven out of the reaction chamber 6 by the air flow.

However, the existing air flow path formed between the covering ring 3 and the stopper 4 is bent, which easily forms a backflow phenomenon in the reaction chamber 6, causing the floating target particles to flow back to the top of the wafer substrate and finally adhere to the film. This affects the quality of the film, or contaminates the reaction chamber 6 and increases the time required to clean the reaction chamber 6 .

In view of the above technical problems, the present invention proposes a dust collection device in the cavity to remove floating target particles and prevent target particles from contaminating the cavity and coating.

The new model proposes a dust collection device in a cavity, which includes a baffle, a first guide plate and a second guide plate. The blocker includes a first side wall, a second side wall and a bottom; wherein, the first side wall extends toward the top of the accommodation space and is used to connect to the reaction chamber; the second side wall is parallel to the first side wall and faces above the accommodation space. Extend, and an opening is formed on the inside of the second side wall for the carrying tray to enter; the bottom is connected to the first side wall and the second side wall to form an annular groove area, and at least one guide hole is opened at the bottom. The first guide plate is fixed to the first side wall and extends obliquely toward the bottom; wherein, the first guide plate is located above at least one guide hole. The second deflector is fixed to the second side wall, is located above the first deflector, and extends obliquely toward the bottom.

In at least one embodiment, the first side wall and the second side wall are respectively annular side walls.

In at least one embodiment, the dust collecting device in the cavity further includes a covering ring, which is disposed on the blocking member.

In at least one embodiment, the cover ring has a horizontal extension and a vertical extension. The horizontal extension part is arranged around a window, and the horizontal extension part is arranged on the top edge of the second side wall. The vertical extension extends vertically from the edge of the horizontal extension and is located between the first side wall and the second side wall.

In at least one embodiment, the vertical extension extends toward the bottom without contacting the bottom.

In at least one embodiment, the horizontal extension partially obscures the annular groove area from above.

In at least one embodiment, the dust collection device in the cavity further includes a first connection part and a second connection part; the first connection part is fixed on the first side wall, and the first baffle extends from the first connection part, and indirectly The second connecting part is fixed on the second side wall, and the second baffle extends on the second connecting part and is indirectly fixed on the second side wall.

In at least one embodiment, the first guide plate partially covers at least one guide hole in a radial direction.

In at least one embodiment, the second deflector partially blocks the first deflector from above.

Through the above technical means, this new model can fully remove target particles floating in the reaction chamber, preventing target particles from affecting the film growth quality, while reducing the deposition of target materials in the equipment, and extending the maintenance cycle of the equipment. , and also shorten the time required to maintain equipment.

Please refer to FIGS. 2 and 3 , which disclose a dust collecting device 140 in a cavity and a coating equipment 100 having the dust collecting device 140 in a cavity according to an embodiment of the present invention, which are used to perform a particle removal method in a cavity.

As shown in FIG. 2 , the coating equipment 100 has a reaction chamber 110 , a target 120 , a bearing tray 130 and a dust collection device 140 in the chamber.

As shown in FIG. 2 , the reaction chamber 110 has an accommodating space 110 a for accommodating the carrier plate 130 and the target material 120 . The carrying tray 130 is used to carry at least one substrate, and the target 120 is disposed above the accommodation space 110a and faces the carrying tray 130 and the substrate carried by the carrying tray 130 . An opening 111 is opened above the reaction chamber 110. The opening 111 is connected to the outside of the reaction chamber 110, and the target 120 is fixed in the opening 111, so that the target 120 and the reaction chamber 110 form a closed accommodation space. 110a.

As shown in FIG. 2 , the bearing plate 130 is connected to a linear actuator 150 . The linear actuator 150 is used to drive the bearing plate 130 so that the bearing plate 130 can be displaced relative to the target material 120 to change the relationship between the bearing plate 130 and the target material. The distance between 120. The linear actuator 150 may be, but is not limited to, a hydraulic actuator, a pneumatic actuator, a linear lead screw actuator, etc. The substrate can be moved to the carrier tray 130 through a robot arm or a picking device. Through the driving of the linear actuator 150, the carrier tray 130 can drive the substrates it carries closer to the direction of the target 120, so as to reduce the number of substrates carried by the carrier tray 130. distance from the target 120, and perform thin film deposition on the substrate.

As shown in Figure 1, the new coating equipment 100 of the present invention can be a sputtering equipment. When sputtering a thin film on a substrate, an electric field is applied to the accommodating space 110a, so that the inert gas atoms in the accommodating space 110a are impacted by electrons to form charged atoms. gas ions. A bias voltage is applied to the target 120 and the carrier plate 130 so that the gas ions collide with the target 120 and generate atoms formed by the target 120 . The target atoms generated by the impact will be attracted by the bias on the carrier disc 130 to form an atomic beam and deposited on the surface of the substrate to form a thin film on the surface of the substrate. However, atoms that have not landed, such as atoms that landed on the inner wall of the reaction chamber 110, will not be able to effectively attach and form floating target particles, or form an unstable film and fall off. Therefore, the floating target particles must be quickly collected and discharged out of the accommodation space 110a. The ideal way is to allow the floating target particles to be expelled along with the inert gas flowing into the accommodation space 110a, so as to avoid the target particles falling on the substrate surface and affecting the film quality, or forming contaminants due to other undeposited particles in the coating equipment 100. , thereby shortening the period during which the coating equipment 100 must be cleaned, and extending the time required to clean the coating equipment 100 . .

As shown in Figures 2 and 3, the dust collecting device 140 in the cavity includes a blocking member 143, a covering ring 144 and a flow guide assembly 140a.

As shown in FIGS. 2 , 3 and 4 , the stopper 143 is an annular structure, including a first side wall 1431 , a second side wall 1432 and a bottom 1433 . The material of the stopper 143 can be metal or ceramic material, but the use of other materials is not excluded. The first side wall 1431 is an annular side wall that extends upward toward the accommodation space 110 a and is used to connect to the reaction chamber 110 . The second side wall 1432 is also an annular side wall, parallel to the first side wall 1431, and extending toward the top of the accommodation space 110a. An opening 143a is formed on the inner side of the second side wall 1432 . The carrier plate 130 can approach the target 120 and contact the stopper 143 or enter the opening 143a of the stopper 143, so that the reaction chamber 110, the carrier plate 130, the target 120 and the stopper 143 will be in the accommodation space 110a. A reaction space 110b is separated, and a thin film is deposited on the substrate on the carrier tray 130 in the reaction space 110b.

As shown in FIGS. 2 , 3 and 4 , the bottom 1433 is connected to the first side wall 1431 and the second side wall 1432 , and an annular groove area is defined between the first side wall 1431 , the bottom 1433 and the second side wall 1432 . The bottom 1433 is provided with one or more arc-shaped, circular, oval or square guide holes 143b to connect both sides of the bottom 1433.

As shown in FIGS. 2 and 3 , the covering ring 144 is disposed on the stopper 143 , and the covering ring 144 has a horizontal extending portion 1441 and a vertical extending portion 1442 . The horizontal extending portion 1441 is disposed around a window 144a, and the horizontal extending portion 1441 is disposed on the top edge of the second side wall 1432, so that the covering ring 144 is disposed above the stopper 143. The horizontal extending portion 1441 and the second side wall 1432 are arranged perpendicularly to each other. When the bearing tray 130 contacts the stopper 143 or enters the opening 143a of the stopper 143, the bearing tray 130 will also be located in the window 144a. At the same time, the horizontal extension portion 1441 also extends toward the opening 143a, so that the gap between the horizontal extension portion 1441 and the edge of the bearing tray 130 is shortened as much as possible to provide a shielding effect on the side walls of the bearing tray 130.

As shown in FIGS. 2 and 3 , the vertical extension portion 1442 extends vertically from the outer edge of the horizontal extension portion 1441 and is located between the first side wall 1431 and the second side wall 1432 . The vertical extension 1442 extends toward the bottom 1433 but does not contact the bottom 1433 .

As shown in FIGS. 2 and 3 , the horizontal extension 1441 covers the second side wall 1432 and part of the annular groove area from above. Furthermore, when viewed from a cross-sectional view, the annular groove area is divided into an inner part and an outer part by the vertical extension 1442 .

As shown in FIGS. 2 , 3 , 5 and 6 , the air guide assembly 140 a includes a first air guide 141 and a second air guide 142 . The flow guide component 140a may be made of metal, ceramic material or polymer material, but other materials are not excluded. The first flow guide 141 and the second flow guide 142 may be independent components, or may be connected to form a single component.

As shown in FIG. 3 , FIG. 5 and FIG. 6 , the first flow guide 141 may be an annular structure and includes a first connecting part 1411 and a first guide plate 1412 . The first connecting part 1411 is fixed to the first side wall 1431. The first guide plate 1412 has an annular structure and extends from the first connecting portion 1411 so that the first guide plate 1412 is indirectly fixed to the first side wall 1431 through the first connecting portion 1411 . In different embodiments, the first baffle 1412 may also be directly fixed to the first side wall 1431. The first baffle 1412 has an annular structure and extends obliquely toward the bottom 1433 but does not contact the bottom 1433 and the second side wall 1432 . In particular, the front edge of the first baffle 1412 extends below the horizontal extending portion 1441 and is partially located in the inner portion of the annular groove area.

As shown in FIGS. 3 , 5 and 6 , the first guide plate 1412 is located above the guide hole 143 b and partially blocks the guide hole 143 b in the radial direction, so that the airflow can pass through the first guide plate 1412 The upper surface is guided through the guide hole 143b, and the floating target particles are brought under the stopper 143, and then discharged from an exhaust port 112 of the reaction chamber 110.

As shown in FIG. 3 , FIG. 5 and FIG. 6 , the second flow guide 142 may be an annular structure and includes a second connecting part 1421 and a second flow guide 1422 . The second connecting part 1421 is fixed to the second side wall 1432. The second guide plate 1422 has an annular structure and extends from the second connecting portion 1421 , so that the second guide plate 1422 is indirectly fixed to the second side wall 1432 through the second connecting portion 1421 . In different embodiments, the second baffle 1422 may also be directly fixed to the second side wall 1432. The second guide plate 1422 is an annular structure, is located above the first guide plate 1412, and extends obliquely toward the bottom 1433, but the second guide plate 1422 does not contact the bottom 1433 and the first side wall 1431. In particular, the front edge of the second deflector 1422 is generally located above the vertical extension 1442 and slightly blocks the first deflector 1412 from above. A semi-enclosed area is formed between the second guide plate 1422, the vertical extending portion 1442 and the second side wall 1432. The downward inclination of the second guide plate 1422 can prevent the airflow toward the guide hole 143b from flowing back to this semi-enclosed area. , allowing the airflow to flow more smoothly.

As shown in FIGS. 2 , 3 and 6 , after the inert gas or other working gas used for sputtering is injected into the reaction space 110 b of the reaction chamber 110 through an air inlet 113 of the reaction chamber 110 , it can be directed toward the stopper 143 The flow in the annular groove area is guided by the first guide plate 1412 and passes through the guide hole 143b, and then is discharged from the exhaust port 112. The continuous injection and discharge of gas flow can collect target particles floating in the reaction chamber 110 . Since the airflow flows more smoothly, at the same time, the inclined configuration of the first guide plate 1412 and the second guide plate 1422 also avoids the backflow phenomenon of the airflow, thereby reducing the floating target particles from contaminating the substrate surface and affecting the film. Growth quality.

Please refer to FIG. 7 , a method for removing particles in a cavity is used to remove particles in a reaction chamber 110 .

As shown in Figures 2, 3 and 7, based on the method, a stopper 143 is first provided, as shown in step S110. As shown in FIGS. 2 and 3 , the stopper 143 includes a first side wall 1431 , a second side wall 1432 and a bottom 1433 . The second side wall 1432 is parallel to the first side wall 1431 , and the first side wall 1431 and the second side wall 1432 are respectively It is an annular side wall. The bottom 1433 is connected to the first side wall 1431 and the second side wall 1432 to form an annular groove area. The bottom 1433 is provided with at least one guide hole 143b, and an opening 143a is formed on the inside of the second side wall 1432 for the loading tray 130 to enter.

As shown in FIGS. 2 , 3 and 7 , then, the first side wall 1431 is extended toward the upper part of the accommodating space 110 a and connected to the reaction chamber 110 , and the stopper 143 is fixed in the reaction chamber 110 , as in step S120 Show.

As shown in Figures 2, 3 and 7, a first guide plate 1412 is fixed to the first side wall 1431, and the first guide plate 1412 extends obliquely toward the bottom 1433, so that the first guide plate 1412 is located on at least one guide plate. Above the flow hole 143b, as shown in step S130. As shown in FIGS. 2 and 3 , the first guide plate 1412 partially covers at least one guide hole 143b. As shown in Figures 2 and 3, a first connection portion 1411 is provided to fix the first deflector 1412. The first connection portion 1411 is fixed to the first side wall 1431, and the first deflector 1412 extends from the first connection portion 1411, and indirectly fixes the first deflector 1412 to the first side wall 1431.

As shown in Figure 2, Figure 3 and Figure 7, a second guide plate 1422 is fixed to the second side wall 1432, so that the second guide plate 1422 is located above the first guide plate 1412, and the second guide plate 1422 faces The bottom 1433 extends obliquely without contacting the bottom 1433 and the first side wall 1431, as shown in step S140. As shown in FIGS. 2 and 3 , the second guide plate 1422 can be further extended to partially block the first guide plate 1412 from above. As shown in Figures 2 and 3, a second connection portion 1421 is provided to fix the second deflector 1422. The second connection portion 1421 is fixed to the second side wall 1432, and the second deflector 1422 extends from the second connection portion. portion 1421 to indirectly fix the second deflector 1422 to the second side wall 1432 .

As shown in FIG. 2 , FIG. 3 and FIG. 7 , after step S140 , a step may be further included to dispose a covering ring 144 on the stopper 143 , as shown in step S150 . The aforementioned covering ring 144 has a horizontal extension part 1441 and a vertical extension part 1442. The horizontal extension part 1441 is arranged around a window. The horizontal extension part 1441 is arranged on the top edge of the second side wall 1432, and the horizontal extension part 1441 shields part of the annular groove area from above. The vertical extending portion 1442 extends vertically from the edge of the horizontal extending portion 1441. The vertical extending portion 1442 is located between the first side wall 1431 and the second side wall 1432. The vertical extending portion 1442 extends toward the bottom 1433 without contacting the bottom 1433. The execution order of step S150 is not limited to after step S140, but may also be after step S110.

Through the above technical means, the present invention can fully remove the target particles floating in the reaction chamber 110, preventing the target particles from affecting the film growth quality, while reducing the deposition of the target 120 material in the equipment, and extending the service life of the equipment. The maintenance cycle also shortens the time required to maintain equipment.

1: Coating equipment 2:Target 3: Blocking ring 4:Block 5:Blocking wall 6: Reaction chamber 7:Exhaust port 8: Vacuum pump 100:Coating equipment 110:Reaction chamber 110a: Accommodation space 110b: reaction space 111: Set opening 112:Exhaust port 113:Air inlet 120:Target 130: Carrying tray 140: Dust collection device in the cavity 140a: Diversion component 141: First guide piece 1411: First connection part 1412:First deflector 142:Second guide piece 1421: Second connection part 1422: Second deflector 143:Block 143a:Open your mouth 143b: Diversion hole 1431: First side wall 1432:Second side wall 1433:bottom 144: Covering ring 1441: Horizontal extension 1442:Vertical extension 150: Linear actuator

Figure 1 is a schematic cross-sectional view of coating equipment in the prior art.

Figure 2 is a schematic cross-sectional view of the coating equipment in the embodiment of the present invention.

Figure 3 is an enlarged schematic diagram of a partial area in Figure 2.

Figure 4 is a top view of the stopper in the embodiment of the present invention.

Figure 5 is a top view of the first flow guide member and the blocking member in the embodiment of the present invention.

Figure 6 is a partial perspective cross-sectional view of the dust collecting device in the cavity in the embodiment of the present invention.

Figure 7 is a flow chart of a method for removing particles in a cavity in an embodiment of the present invention.

141: First guide piece

1411: First connection part

1412:First deflector

142:Second guide piece

1421: Second connection part

1422: Second deflector

1441: Horizontal extension

1442:Vertical extension

Claims (9)

A dust collecting device in a cavity is provided in a reaction chamber, and a bearing tray is provided in a receiving space of the reaction chamber; the cavity dust collecting device includes: A blocker includes a first side wall, a second side wall and a bottom; wherein, the first side wall extends toward the top of the accommodation space and is used to connect to the reaction chamber; the second side wall is parallel to the first The side wall extends toward the top of the accommodation space, and an opening is formed on the inside of the second side wall for the tray to enter; the bottom is connected to the first side wall and the second side wall to form an annular groove. area, and the bottom is provided with at least one guide hole; A first guide plate is fixed to the first side wall and extends obliquely toward the bottom; wherein the first guide plate is located above the at least one guide hole; and A second guide plate is fixed to the second side wall, is located above the first guide plate, and extends obliquely toward the bottom. The dust collecting device in the cavity according to claim 1, wherein the first side wall and the second side wall are respectively annular side walls. The dust collecting device in the cavity according to claim 1 further includes a covering ring disposed on the blocking member. The dust collecting device in the cavity according to claim 3, wherein the covering ring has: A horizontal extension is provided around a window, and the horizontal extension is provided on the top edge of the second side wall; and A vertical extension extends vertically from the edge of the horizontal extension and is located between the first side wall and the second side wall. The dust collection device in the cavity of claim 4, wherein the vertical extension extends toward the bottom without contacting the bottom. The dust collection device in the cavity according to claim 4, wherein the horizontal extension partially shields the annular groove area from above. The dust collection device in the cavity according to claim 1, further comprising a first connection part and a second connection part; the first connection part is fixed on the first side wall, and the first guide plate extends on the first The connecting part is indirectly fixed to the first side wall; the second connecting part is fixed to the second side wall; the second baffle extends from the second connecting part and is indirectly fixed to the second side wall. The dust collection device in the cavity according to claim 1, wherein the first guide plate partially covers the at least one guide hole in a radial direction. The dust collection device in the cavity according to claim 1, wherein the second guide plate partially blocks the first guide plate from above.

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