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TWI839510B - Dehydrogenation system and catalyst holding device - Google Patents

Dehydrogenation system and catalyst holding device Download PDF

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Publication number
TWI839510B
TWI839510B TW109114431A TW109114431A TWI839510B TW I839510 B TWI839510 B TW I839510B TW 109114431 A TW109114431 A TW 109114431A TW 109114431 A TW109114431 A TW 109114431A TW I839510 B TWI839510 B TW I839510B
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catalyst
hydrogen
reaction container
storage device
raw material
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TW109114431A
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TW202106610A (en
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近藤豊嗣
濱野伸秀
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日商辰巳菱機股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/42Platinum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J33/00Protection of catalysts, e.g. by coating
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/02Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
    • C01B3/22Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds
    • C01B3/24Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds of hydrocarbons
    • C01B3/26Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds of hydrocarbons using catalysts
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/56Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C11/00Use of gas-solvents or gas-sorbents in vessels
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/32Hydrogen storage

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  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
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  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Hydrogen, Water And Hydrids (AREA)
  • Fuel Cell (AREA)

Abstract

An object of the invention is to provide a dehydrogenation system and the like which simplify the maintenance of components such as the catalyst and heater. The dehydrogenation system comprises a reaction vessel, and a catalyst holding device 20 having a resistance wire 21 which generates heat when supplied with power, a cylinder 27 which covers the side of the resistance wire 21, a catalyst cover section 33 which covers at least a portion of the side of the cylinder 27, and a catalyst 31 which is provided between the cylinder section 27 and the catalyst cover section 33 and activates the dehydrogenation reaction. An organic hydride is supplied from above the catalyst holding device 20. The catalyst cover section 33 has a hole through which the aromatic compounds and hydrogen generated by the dehydrogenation reaction can pass without allowing passage of the catalyst 31. The catalyst cover section 33 is positioned inside the reaction vessel, and the reaction vessel holds the catalyst holding device 20 in a state where the terminal 23 of the resistance wire 21 is partially exposed outside the reaction vessel.

Description

脫氫系統、觸媒保存裝置Dehydrogenation system, catalyst storage device

本發明係關於脫氫系統等。The present invention relates to a dehydrogenation system, etc.

以往,如專利文獻1,提出了包含脫氫系統之裝置。 [先前技術文獻] [專利文獻]In the past, as in Patent Document 1, a device including a dehydrogenation system has been proposed. [Prior Art Document] [Patent Document]

專利文獻1:日本專利公開公報2002-184436號Patent document 1: Japanese Patent Publication No. 2002-184436

[發明欲解決之問題][Problem to be solved]

然而,關於使脫氫反應活化之觸媒及將觸媒加溫之加熱器的維修,並未特別考慮。However, no special consideration has been given to the maintenance of the catalyst that activates the dehydrogenation reaction and the heater that heats the catalyst.

因而,本發明之目的係提供使觸媒及/或加熱器之維修容易的脫氫系統等。 [解決問題之手段]Therefore, the object of the present invention is to provide a dehydrogenation system that facilitates the maintenance of the catalyst and/or heater. [Means for solving the problem]

本發明之脫氫系統包含反應容器、及觸媒保存裝置;該觸媒保存裝置具有藉電力供給而發熱之電阻線、包覆電阻線之側部的筒部、包覆筒部之側部的至少一部分之觸媒被覆部、設於筒部與觸媒被覆部之間而使脫氫反應活化的觸媒。從在反應容器之觸媒保存裝置的上方供給原料。觸媒被覆部具有不使觸媒通過而使原料、由脫氫反應而產生之氫、及氫從原料脫離後之物質通過的孔。在觸媒被覆部位於反應容器之內側,電阻線之端子的一部分露出至反應容器之外側的狀態下,反應容器保持觸媒保存裝置。The dehydrogenation system of the present invention includes a reaction container and a catalyst storage device; the catalyst storage device has a resistance wire that generates heat by supplying electric power, a barrel covering the side of the resistance wire, a catalyst coating covering at least a portion of the side of the barrel, and a catalyst disposed between the barrel and the catalyst coating to activate the dehydrogenation reaction. The raw material is supplied from above the catalyst storage device of the reaction container. The catalyst coating has holes that allow the raw material, hydrogen generated by the dehydrogenation reaction, and substances after hydrogen is separated from the raw material to pass through without allowing the catalyst to pass through. The reaction container holds the catalyst storage device in a state where the catalyst coating is located on the inner side of the reaction container and a portion of the terminal of the resistance wire is exposed to the outside of the reaction container.

在此脫氫系統,可易於從反應容器卸除觸媒保存裝置,而可使觸媒保存裝置之觸媒及/或加熱器(電阻線等)之維修容易。 又,由於電流流過之電阻線及端子設於不與氫從有機氫化物等原料、芳香族化合物等原料脫離後之物質、及氫接觸之區域,故可使電阻線及/或端子不易惡化。In this dehydrogenation system, the catalyst storage device can be easily removed from the reaction container, and the catalyst and/or heater (resistance wire, etc.) of the catalyst storage device can be easily repaired. In addition, since the resistance wire and the terminal through which the current flows are arranged in an area that does not contact the substances separated from the raw materials such as organic hydrides and aromatic compounds, and hydrogen, the resistance wire and/or the terminal are not easily deteriorated.

較佳的情況為於筒部設散熱用散熱片。散熱片被觸媒被覆部包覆。Preferably, a heat sink is provided on the cylinder portion for heat dissipation, and the heat sink is covered by the catalyst coating portion.

更佳的情況為觸媒被覆部以可卸除之狀態安裝於筒部。A more preferred situation is that the catalyst covering part is installed on the cylinder part in a removable state.

當觸媒被覆部以可卸除之狀態安裝於筒部時,亦可易從筒部卸除觸媒被覆部,補充或替換觸媒,抑或更換觸媒被覆部。When the catalyst-coated portion is installed on the barrel portion in a removable state, the catalyst-coated portion can be easily removed from the barrel portion to replenish or replace the catalyst, or to replace the catalyst-coated portion.

更佳的情況為脫氫系統更包含收納於反應容器,將原料噴灑成霧狀之噴霧部。More preferably, the dehydrogenation system further includes a spraying unit housed in the reaction container for spraying the raw material in a mist form.

藉由使原料噴霧,可易通過觸媒被覆部之孔,而可大範圍地供給原料,並且易調整供至反應容器之內部的原料之量。By spraying the raw material, it can easily pass through the holes of the catalyst coating, so that the raw material can be supplied over a wide range, and the amount of the raw material supplied to the interior of the reaction container can be easily adjusted.

更佳的情況為噴霧部將原料朝上方或斜上方噴霧。A more preferred situation is that the spraying unit sprays the raw material upward or obliquely upward.

當為將原料朝上方或斜上方噴霧之形態時,比起往下方將原料噴霧之形態,可緩緩地且在反應容器之內部的大範圍將原料噴灑一次朝上方噴霧之量。When the raw material is sprayed upward or obliquely upward, the raw material can be sprayed slowly and in a wide range inside the reaction container at one time in the form of spraying the raw material upward, compared with the form of spraying the raw material downward.

更佳的情況為脫氫系統更包含用以將在反應容器產生之氫與其他物質分離的氫抽出部。氫抽出部具有氫分離膜。In a more preferred embodiment, the dehydrogenation system further comprises a hydrogen extraction section for separating hydrogen generated in the reaction container from other substances. The hydrogen extraction section has a hydrogen separation membrane.

更佳的情況為氫抽出部具有將從反應容器排出之氣體冷卻後,分離成氣體與液體之氣液分離器。氫分離膜相對於氣液分離器配置於氣體流之下游,而對從氣液分離器排出之氣體,將氫與其他物質分離。In a more preferred embodiment, the hydrogen extraction unit has a gas-liquid separator for separating the gas discharged from the reaction vessel into gas and liquid after cooling. The hydrogen separation membrane is arranged downstream of the gas-liquid separator in the gas flow, and separates hydrogen from other substances in the gas discharged from the gas-liquid separator.

藉以氣液分離器與氫分離膜所行之二階段氫抽出處理,比起僅使用氣液分離器與氫分離膜其中一者之形態,可抽出雜質少且純度高之氫。The two-stage hydrogen extraction process using a gas-liquid separator and a hydrogen separation membrane can extract hydrogen with less impurities and higher purity than a method using only one of the gas-liquid separator and the hydrogen separation membrane.

更佳的情況為脫氫系統更包含抽吸反應容器之氣體,將之引導至氫抽出部的抽吸泵。In a more preferred embodiment, the dehydrogenation system further comprises a suction pump for sucking gas from the reaction container and guiding the gas to the hydrogen extraction part.

更佳的情況為脫氫系統更包含將反應容器與氫抽出部連通之氣體排出管。氣體排出管具有從反應容器之氣體排出口朝斜方向延伸之斜坡部。In a more preferred embodiment, the dehydrogenation system further comprises a gas exhaust pipe connecting the reaction container with the hydrogen extraction part. The gas exhaust pipe has a slope extending from the gas exhaust port of the reaction container in an oblique direction.

更佳的情況為筒部呈圓筒狀。筒部以可旋轉之狀態安裝於構成反應容器之壁。More preferably, the barrel is cylindrical and is rotatably mounted on the wall of the reaction container.

可使觸媒保存裝置旋轉,而攪拌填充於筒部與觸媒被覆部之間的觸媒,或調整噴霧之原料侵入的部位。The catalyst storage device can be rotated to stir the catalyst filled between the cylinder and the catalyst covering part, or to adjust the position where the sprayed raw material penetrates.

更佳的情況為脫氫系統更包含第2反應容器。從在第2反應容器之觸媒保存裝置的上方,供給從反應容器排出之原料及氫從原料脫離後之物質。In a more preferred embodiment, the dehydrogenation system further comprises a second reaction vessel. The raw material discharged from the reaction vessel and the substance after hydrogen is removed from the raw material are supplied from above the catalyst storage device of the second reaction vessel.

更佳的情況為構成反應容器之壁具有用以於安裝觸媒保存裝置之際,使觸媒保存裝置通過之開口孔。More preferably, the wall constituting the reaction container has an opening hole for allowing the catalyst retaining device to pass through when the catalyst retaining device is installed.

本發明之觸媒保存裝置包含藉電力供給而發熱之電阻線、包覆電阻線之側部的筒部、包覆筒部之側部的至少一部分之觸媒被覆部、設於筒部與觸媒被覆部之間的觸媒。從在反應容器之觸媒保存裝置的上方供給原料。觸媒被覆部具有不使觸媒通過而使原料、由脫氫反應而產生之氫及氫已從該原料脫離後之物質通過的孔。在電阻線之端子的一部分露出至反應容器之外側的狀態下,觸媒保存裝置保持於反應容器。 [發明效果]The catalyst storage device of the present invention comprises a resistance wire that generates heat by supplying electric power, a barrel covering the side of the resistance wire, a catalyst coating covering at least a portion of the side of the barrel, and a catalyst disposed between the barrel and the catalyst coating. The raw material is supplied from above the catalyst storage device in the reaction container. The catalyst coating has holes that allow the raw material, hydrogen generated by the dehydrogenation reaction, and substances after hydrogen has been separated from the raw material to pass through without allowing the catalyst to pass through. The catalyst storage device is held in the reaction container in a state where a portion of the terminal of the resistance wire is exposed to the outside of the reaction container. [Effect of the invention]

如以上,根據本發明,可提供使觸媒及/或加熱器之維修容易的脫氫系統等。As described above, according to the present invention, a dehydrogenation system and the like that facilitates the maintenance of a catalyst and/or a heater can be provided.

[用以實施發明之形態][Form used to implement the invention]

以下,就第1實施形態,使用圖式來說明。 此外,實施形態並不限以下之實施形態。又,記載於一個實施形態之內容原則上亦同樣地適用於其他實施形態。再者,各實施形態及各變形例可適宜組合。The following is a diagram for explaining the first embodiment. In addition, the embodiments are not limited to the following embodiments. In principle, the contents described in one embodiment are also applicable to other embodiments. Furthermore, each embodiment and each variant can be combined as appropriate.

本實施形態之脫氫系統1係從甲基環己烷等有機氫化物(飽和縮合環烴)取出氫,並將該氫供至外部之電力產生裝置(圖中未示)等的裝置。 脫氫系統1包含原料(有機氫化物)槽5、脫氫反應器10、氣體排出管50、液體排出管52、抽吸泵60、氫抽出部70、氫槽81、分離液槽82、探測部91、控制部93(參照圖1)。The dehydrogenation system 1 of this embodiment is a device that extracts hydrogen from organic hydrides (saturated condensed cyclopentane) such as methylcyclohexane and supplies the hydrogen to an external power generation device (not shown in the figure). The dehydrogenation system 1 includes a raw material (organic hydride) tank 5, a dehydrogenation reactor 10, a gas discharge pipe 50, a liquid discharge pipe 52, a suction pump 60, a hydrogen extraction unit 70, a hydrogen tank 81, a separation liquid tank 82, a detection unit 91, and a control unit 93 (refer to Figure 1).

(原料槽5) 原料槽5係儲存有機氫化物之槽,將儲存於原料槽5之有機氫化物藉由原料泵(圖中未示),供至脫氫反應器10之噴霧部43,以脫氫反應器10之脫氫反應分離成甲苯等芳香族化合物與氫。(Raw material tank 5) Raw material tank 5 is a tank for storing organic hydrogen compounds. The organic hydrogen compounds stored in raw material tank 5 are supplied to spray section 43 of dehydrogenation reactor 10 through a raw material pump (not shown in the figure) to be separated into aromatic compounds such as toluene and hydrogen through dehydrogenation reaction in dehydrogenation reactor 10.

(脫氫反應器10) 脫氫反應器10具有觸媒保存裝置20、反應容器41、噴霧部43。(Dehydrogenation reactor 10) The dehydrogenation reactor 10 has a catalyst storage device 20, a reaction container 41, and a spraying unit 43.

(觸媒保存裝置20) 觸媒保存裝置20以保持於反應容器41之狀態設複數個。 觸媒保存裝置20係保存觸媒31,並且以電加熱將觸媒31加溫的裝置,保持於反應容器41。 觸媒保存裝置20具有電阻線21、填隙物22、端子(捲線軸)23、絕緣粉末24、絕緣構件25、螺帽26、筒部(加熱管)27、散熱片29、電阻器固定構件30、觸媒31、觸媒被覆部33、被覆部固定構件35(參照圖2)。(Catalyst storage device 20) A plurality of catalyst storage devices 20 are provided to maintain the state of being in the reaction container 41. The catalyst storage device 20 is a device for storing the catalyst 31 and heating the catalyst 31 by electric heating, and is maintained in the reaction container 41. The catalyst storage device 20 has a resistor wire 21, a filler 22, a terminal (winding bobbin) 23, an insulating powder 24, an insulating member 25, a nut 26, a barrel (heating tube) 27, a heat sink 29, a resistor fixing member 30, a catalyst 31, a catalyst coating 33, and a coating fixing member 35 (see FIG. 2).

電阻線21為鎳鉻合金線等呈線圈狀,藉電力供給而發熱。The resistance wire 21 is a nickel-chromium alloy wire or the like in a coil shape, and generates heat when electric power is supplied.

端子23與電阻線21電性連接,設於電阻線21之兩端。 端子23具有第1端部23a、第2端部23b、中間部23c,第1端部23a、中間部23c、第2端部23b構成一體。 第1端部23a為了與螺帽26螺合而呈陽螺紋形狀,一部分從筒部27露出。 第2端部23b呈大約圓柱形狀。 電阻線21之一部分捲繞於第2端部23b,以點焊等固定。 中間部23c被第1端部23a與第2端部23b夾住。The terminal 23 is electrically connected to the resistor line 21 and is provided at both ends of the resistor line 21. The terminal 23 has a first end 23a, a second end 23b, and a middle portion 23c, and the first end 23a, the middle portion 23c, and the second end 23b form an integral body. The first end 23a is in a male thread shape in order to be screwed with the nut 26, and a portion is exposed from the barrel 27. The second end 23b is approximately cylindrical. A portion of the resistor line 21 is wound around the second end 23b and fixed by spot welding or the like. The middle portion 23c is clamped by the first end 23a and the second end 23b.

端子23從筒部27露出之部分從構成反應容器41之壁露出至外側。 端子23從筒部27露出之部分與來自商用電源之電力供給線(纜線等)連接。 電阻線21與端子23從該商用電源等接受電力供給。 惟,電力供給源不限於商用電源,亦可為發電裝置或蓄電裝置。The portion of the terminal 23 exposed from the barrel 27 is exposed to the outside from the wall constituting the reaction container 41. The portion of the terminal 23 exposed from the barrel 27 is connected to a power supply line (cable, etc.) from a commercial power source. The resistance line 21 and the terminal 23 receive power supply from the commercial power source, etc. However, the power supply source is not limited to the commercial power source, and may also be a power generation device or a power storage device.

筒部27藉由絕緣構件25保持端子23。 又,筒部27包覆端子23之一部分與電阻線21之側面。 被筒部27包覆之端子23的一部分係未從構成反應容器41之壁露出至外側的部分。The barrel 27 holds the terminal 23 via the insulating member 25. Furthermore, the barrel 27 covers a portion of the terminal 23 and the side surface of the resistor line 21. The portion of the terminal 23 covered by the barrel 27 is the portion that is not exposed to the outside from the wall constituting the reaction container 41.

此外,圖2及圖3之截面結構圖顯示電阻線21、端子23及螺帽26以外之部分的截面,並顯示電阻線21、端子23及螺帽26之側面。2 and 3 show the cross-section of the portion other than the resistor line 21, the terminal 23 and the nut 26, and show the side surfaces of the resistor line 21, the terminal 23 and the nut 26.

於筒部27之側面設散熱用散熱片29。 散熱片29以用可裝卸之狀態安裝於筒部27之側面為理想。 散熱片29放射在電阻線21產生之熱,將靠近之觸媒31加溫,而使脫氫反應活化。A heat sink 29 is provided on the side of the cylinder 27 for heat dissipation. The heat sink 29 is preferably installed on the side of the cylinder 27 in a removable state. The heat sink 29 radiates the heat generated by the resistor wire 21, heats the catalyst 31 close to it, and activates the dehydrogenation reaction.

筒部27之內部填充氧化鎂等絕緣粉末24,以壓縮及熱予以固化。 絕緣粉末24填充成包覆第1端部23a之一部分、第2端部23b全部及中間部23c全部。 絕緣粉末24之與絕緣構件25對向的部分、即絕緣粉末24與絕緣構件25之交界部分、及第1端部23a之陽螺紋形狀部的一部分以矽等施加填隙物22。 藉由填隙物22,形成為第1端部23a之陽螺紋形狀部分的一部分與絕緣粉末24固定之狀態。The interior of the cylinder 27 is filled with an insulating powder 24 such as magnesium oxide, which is cured by compression and heat. The insulating powder 24 is filled to cover a portion of the first end 23a, the entire second end 23b, and the entire middle portion 23c. The portion of the insulating powder 24 facing the insulating member 25, that is, the boundary portion between the insulating powder 24 and the insulating member 25, and a portion of the male threaded portion of the first end 23a are filled with a filler 22 made of silicon or the like. The filler 22 forms a state in which a portion of the male threaded portion of the first end 23a is fixed to the insulating powder 24.

螺帽26以將絕緣構件25與筒部27夾在中間之狀態,螺合於第1端部23a。The nut 26 is screwed onto the first end portion 23a in a state where the insulating member 25 and the cylindrical portion 27 are sandwiched therebetween.

觸媒保存裝置20不與端子23導通之處藉由電阻器固定構件30,保持於構成反應容器41之壁。 觸媒保存裝置20不與端子23導通之處視為藉由絕緣構件25,保持端子23之筒部27的兩端附近等。 電阻器固定構件30至少與筒部27接觸之區域以絕緣構件構成,將筒部27之筒以挾持之方式保持。 電阻器固定構件30藉由螺絲等於構成反應容器41之壁固定成封住該壁之第1開口孔41a及第2開口孔41b,而密閉反應容器41與觸媒保存裝置20之間。The portion of the catalyst storage device 20 that is not in electrical communication with the terminal 23 is held on the wall of the reaction container 41 by the resistor fixing member 30. The portion of the catalyst storage device 20 that is not in electrical communication with the terminal 23 is considered to be the vicinity of both ends of the barrel portion 27 of the terminal 23 held by the insulating member 25. The resistor fixing member 30 is formed of an insulating member at least in the area in contact with the barrel portion 27, and the barrel of the barrel portion 27 is held in a clamping manner. The resistor fixing member 30 is fixed to the wall of the reaction container 41 by screws or the like to seal the first opening hole 41a and the second opening hole 41b of the wall, thereby sealing the reaction container 41 and the catalyst storage device 20.

為於鬆開以電阻器固定構件30所行之端子23對反應容器41之固定時,可使端子23繞電阻線21延伸之軸旋轉,以筒部27呈圓筒形狀,觸媒保存裝置20以可旋轉之狀態保持於反應容器41為理想。 此時,可使觸媒保存裝置20旋轉,而使填充於筒部27與觸媒被覆部33之間的觸媒31攪拌,或調整噴霧之有機氫化物侵入的部位。In order to release the fixing of the terminal 23 to the reaction container 41 by the resistor fixing member 30, the terminal 23 can be rotated around the axis extending from the resistor wire 21, and the cylinder 27 is cylindrical, and the catalyst storage device 20 is preferably held in the reaction container 41 in a rotatable state. At this time, the catalyst storage device 20 can be rotated to stir the catalyst 31 filled between the cylinder 27 and the catalyst coating 33, or adjust the position where the sprayed organic hydride enters.

(觸媒31、觸媒被覆部33、被覆部固定構件35) 觸媒31以促進脫氫反應之鉑或鉑鹽等構成。 以圖2與圖3之標有×記號的區域為填充了觸媒31之區域來說明。(Catalyst 31, catalyst coating 33, coating fixing member 35) The catalyst 31 is composed of platinum or platinum salt that promotes dehydrogenation reaction. The area marked with × in Figures 2 and 3 is the area filled with the catalyst 31.

觸媒被覆部33在筒部27之保持於反應容器41的兩端之間,配置於筒部27之周圍,而使觸媒被覆部33位於反應容器之內側。 觸媒被覆部33包覆筒部27之一部分、安裝於筒部27之散熱片29、觸媒31。 觸媒31保存於筒部27之外壁與觸媒被覆部33的內壁之間。 觸媒被覆部33具有不使觸媒31(之顆粒)通過,而使有機氫化物、芳香族化合物及氫通過之孔。 觸媒被覆部33以例如片狀多孔質膜構成。The catalyst covering portion 33 is disposed around the cylinder 27 between the two ends of the cylinder 27 held in the reaction container 41, so that the catalyst covering portion 33 is located inside the reaction container. The catalyst covering portion 33 covers a portion of the cylinder 27, the heat sink 29 mounted on the cylinder 27, and the catalyst 31. The catalyst 31 is stored between the outer wall of the cylinder 27 and the inner wall of the catalyst covering portion 33. The catalyst covering portion 33 has holes that do not allow the catalyst 31 (particles) to pass through, but allow the organic hydride, aromatic compound and hydrogen to pass through. The catalyst covering portion 33 is composed of, for example, a sheet-like porous membrane.

觸媒被覆部33以藉被覆部固定構件35以可卸除之狀態安裝於筒部27為理想。 以被覆部固定構件35所行之觸媒被覆部33對筒部27之安裝可考慮採用以綁帶所行之緊固、或焊接等熔接的方式。It is ideal that the catalyst coating 33 is removably mounted on the cylinder 27 by means of the coating fixing member 35. The mounting of the catalyst coating 33 to the cylinder 27 by means of the coating fixing member 35 may be performed by fastening with a band or welding or other welding methods.

因此,藉解除以被覆部固定構件35所行之觸媒被覆部33對筒部27的安裝,可使觸媒保存裝置20之觸媒31、觸媒被覆部33、及被覆部固定構件35以外的部分維持原狀,而將觸媒31、觸媒被覆部33、被覆部固定構件35至少一者更換成新的。Therefore, by releasing the installation of the catalyst covering portion 33 on the cylinder portion 27 by the covering portion fixing member 35, the catalyst 31, the catalyst covering portion 33, and the portion other than the covering portion fixing member 35 of the catalyst storage device 20 can be maintained in their original state, and at least one of the catalyst 31, the catalyst covering portion 33, and the covering portion fixing member 35 can be replaced with a new one.

觸媒保存裝置20係觸媒31與觸媒被覆部33藉由被覆部固定構件35安裝於包含電阻線21之電阻器的結構。The catalyst storage device 20 is a structure in which a catalyst 31 and a catalyst coating 33 are mounted on a resistor including a resistor line 21 via a coating fixing member 35 .

(觸媒31之填充程序) 觸媒31對觸媒被覆部33與筒部27之間的填充用以下之程序等進行。 使用被覆部固定構件35將觸媒被覆部33之其中一端部安裝於筒部27之其中一端部(散熱片29與絕緣構件25之間的其中之一端部)(參照圖3)。 此時,在筒部27之另一端部(散熱片29與絕緣構件25的壁之間的另一端部),不進行使用被覆部固定構件35之安裝,而形成為在觸媒被覆部33與筒部27之間形成觸媒投入用開口OP之狀態。 在觸媒被覆部33及/或筒部27保持成該觸媒投入用開口OP朝向大約上方之狀態下,經由該觸媒投入用開口OP,將觸媒31投入至觸媒被覆部33與筒部27之間。 以使筒部27及觸媒被覆部33振動或旋轉而將觸媒31均一地配置於筒部27與觸媒被覆部33之間為理想。 於觸媒31之投入完畢後,將被覆部固定構件35之另一端部安裝於筒部27之另一端部(散熱片29與絕緣構件25之間的另一端部)。 藉此,觸媒31以可與散熱片29接觸之狀態保存於筒部27與觸媒被覆部33之間。(Catalyst 31 filling procedure) The catalyst 31 is filled between the catalyst coating 33 and the cylinder 27 by the following procedure. One end of the catalyst coating 33 is mounted on one end of the cylinder 27 (one end between the heat sink 29 and the insulating member 25) using the coating fixing member 35 (refer to FIG. 3). At this time, the other end of the cylinder 27 (the other end between the heat sink 29 and the wall of the insulating member 25) is not mounted using the coating fixing member 35, and a catalyst insertion opening OP is formed between the catalyst coating 33 and the cylinder 27. The catalyst 31 is introduced between the catalyst covering part 33 and the cylinder 27 through the catalyst introducing opening OP while the catalyst covering part 33 and/or the cylinder 27 are kept in a state in which the catalyst introducing opening OP is facing approximately upward. It is ideal to uniformly arrange the catalyst 31 between the cylinder 27 and the catalyst covering part 33 by vibrating or rotating the cylinder 27 and the catalyst covering part 33. After the catalyst 31 is introduced, the other end of the covering part fixing member 35 is mounted on the other end of the cylinder 27 (the other end between the heat sink 29 and the insulating member 25). Thereby, the catalyst 31 is stored between the cylinder 27 and the catalyst covering part 33 in a state in which it can contact the heat sink 29.

(反應容器41) 反應容器41係促進對從噴霧部43噴霧之原料(有機氫化物),藉由觸媒保存裝置20分離成氫與芳香族化合物之脫氫反應的容器(參照圖1)。 構成反應容器41之壁保持複數的觸媒保存裝置20。 構成反應容器41之壁具有第1開口孔41a、第2開口孔41b。 為了於將觸媒保存裝置20安裝於該壁之際,使觸媒保存裝置20通過,第1開口孔41a呈大於觸媒保存裝置20之最大徑部分的孔形狀。在本實施形態中,第1開口孔41a呈相當於該最大徑部分之觸媒被覆部33可通過的孔形狀。 第2開口孔41b為了保持筒部27,而呈與筒部27之外形大約相同的形狀。(Reaction container 41) The reaction container 41 is a container for promoting the dehydrogenation reaction of the raw material (organic hydrogen compound) sprayed from the spraying section 43 into hydrogen and aromatic compounds by the catalyst storage device 20 (see FIG. 1). The wall constituting the reaction container 41 holds a plurality of catalyst storage devices 20. The wall constituting the reaction container 41 has a first opening hole 41a and a second opening hole 41b. In order to allow the catalyst storage device 20 to pass through when the catalyst storage device 20 is installed on the wall, the first opening hole 41a is a hole shape larger than the maximum diameter portion of the catalyst storage device 20. In this embodiment, the first opening hole 41a is in the shape of a hole through which the catalyst coating portion 33 of the maximum diameter portion can pass. The second opening hole 41b is in the shape of approximately the same as the outer shape of the cylinder 27 in order to hold the cylinder 27.

又,噴霧部43保持於反應容器41之內側。 又,於構成反應容器41之壁的側邊設用以排出以脫氫反應所得之氣體的開口(氣體排出口45)。 再者,於構成反應容器之壁的下方設用以排出液體之開口(液體排出口47)。 此外,氣體排出口45亦可設於構成反應容器41之壁的上面。Furthermore, the spraying part 43 is maintained inside the reaction container 41. In addition, an opening (gas outlet 45) for discharging the gas obtained by the dehydrogenation reaction is provided on the side of the wall constituting the reaction container 41. Furthermore, an opening (liquid outlet 47) for discharging the liquid is provided below the wall constituting the reaction container. In addition, the gas outlet 45 may also be provided on the top of the wall constituting the reaction container 41.

(噴霧部43) 噴霧部43設於反應容器41之內部,使從原料槽5供給之原料(有機氫化物)以霧狀噴射。 噴霧部43亦可為將原料往下方噴霧之形態,亦可如圖4所示,為將原料朝上方或斜上方噴霧之形態。 為將原料朝上方或斜上方噴霧之形態時,比起將原料往下方噴霧之形態,可緩緩地且在反應容器41之內部的大範圍將原料噴灑一次朝上方噴霧之量。 於噴霧部43之下方配置複數的觸媒保存裝置20。(Spraying section 43) The spraying section 43 is provided inside the reaction container 41, and sprays the raw material (organic hydride) supplied from the raw material tank 5 in the form of mist. The spraying section 43 may be in a form of spraying the raw material downward, or may be in a form of spraying the raw material upward or obliquely upward as shown in FIG. 4. When the raw material is sprayed upward or obliquely upward, the raw material can be sprayed slowly and in a wide range inside the reaction container 41 at one time, compared with the form of spraying the raw material downward. A plurality of catalyst storage devices 20 are arranged below the spraying section 43.

藉使有機氫化物噴霧,可易通過觸媒被覆部33之孔,而可大範圍地供給有機氫化物,並且易調整供至反應容器41之內部的有機氫化物之量。 惟,從觸媒保存裝置20之上方的有機氫化物之供給不限於使用噴霧部43之噴霧,亦可為使有機氫化物從觸媒保存裝置20之上方流入的形態。By spraying the organic hydride, the organic hydride can be easily supplied through the holes of the catalyst coating portion 33, and the amount of the organic hydride supplied to the inside of the reaction container 41 can be easily adjusted. However, the supply of the organic hydride from the top of the catalyst storage device 20 is not limited to the spraying using the spraying portion 43, and the organic hydride can also be made to flow into the catalyst storage device 20 from the top.

(氣體排出管50) 氣體排出管50之其中一端部與氣體排出口45連通。 氣體排出管50之另一端部與氫抽出部70連通。 於氣體排出管50設用以從反應容器41抽吸氣體,將之引導至氫抽出部70之抽吸泵60。 氣體排出管50之其中一端部為使以抽吸泵60抽吸之氫等氣體易流動,以設斜向之斜坡部50a為理想。 圖1顯示設有從氣體排出口45往斜下方之斜坡部50a的氣體排出管50之例。 圖4顯示設有從氣體排出口45往斜上方之斜坡部50a的氣體排出管50之例。 在反應容器41產生之氣體藉抽吸泵60之抽吸,通過氣體排出管50,供至氫抽出部70。 在反應容器41產生之氣體含有氫、氣化之有機氫化物、及氣化之芳香族化合物等。(Gas exhaust pipe 50) One end of the gas exhaust pipe 50 is connected to the gas exhaust port 45. The other end of the gas exhaust pipe 50 is connected to the hydrogen extraction part 70. The gas exhaust pipe 50 is provided with a suction pump 60 for sucking gas from the reaction container 41 and guiding it to the hydrogen extraction part 70. It is ideal to provide an oblique slope 50a at one end of the gas exhaust pipe 50 so that the gas such as hydrogen sucked by the suction pump 60 can flow easily. Figure 1 shows an example of a gas exhaust pipe 50 having an oblique slope 50a extending obliquely downward from the gas exhaust port 45. Figure 4 shows an example of a gas exhaust pipe 50 having an oblique slope 50a extending obliquely upward from the gas exhaust port 45. The gas generated in the reaction container 41 is sucked by the suction pump 60 and supplied to the hydrogen extraction part 70 through the gas exhaust pipe 50. The gas generated in the reaction container 41 contains hydrogen, vaporized organic hydrides, vaporized aromatic compounds, etc.

如圖1及圖4所示,抽吸泵60可為設於反應容器41與第1分離部71之間的形態,亦可為設於第1分離部71與第2分離部72之間、或第2分離部72與氫槽81之間的形態。又,抽吸泵60亦可為設於反應容器41與第1分離部71之間、第1分離部71與第2分離部72之間、第2分離部72與氫槽81之間二處以上的形態。As shown in Fig. 1 and Fig. 4, the suction pump 60 may be provided between the reaction vessel 41 and the first separation portion 71, between the first separation portion 71 and the second separation portion 72, or between the second separation portion 72 and the hydrogen tank 81. Furthermore, the suction pump 60 may be provided at two or more locations, namely, between the reaction vessel 41 and the first separation portion 71, between the first separation portion 71 and the second separation portion 72, or between the second separation portion 72 and the hydrogen tank 81.

(液體排出管52) 液體排出管52之其中一端部與液體排出口47連通。 液體排出管52之另一端部與分離液槽82連通。 在反應容器41,流至觸媒保存裝置20之下方的液體通過液體排出管52,供至分離液槽82。(Liquid discharge pipe 52) One end of the liquid discharge pipe 52 is connected to the liquid discharge port 47. The other end of the liquid discharge pipe 52 is connected to the separation liquid tank 82. In the reaction container 41, the liquid flowing to the bottom of the catalyst storage device 20 passes through the liquid discharge pipe 52 and is supplied to the separation liquid tank 82.

(氫抽出部70) 氫抽出部70具有第1分離部71、第2分離部72。(Hydrogen extraction section 70) The hydrogen extraction section 70 has a first separation section 71 and a second separation section 72.

第1分離部71包含冷卻裝置、氣液分離器。 第1分離部71之冷卻裝置以冷卻器等構成,冷卻來自反應容器41之氣體。 第1分離部71之氣液分離器將以第1分離部71之冷卻裝置所冷卻的物質分離成液體與氣體。 以第1分離部71分離之液體(液化之有機氫化物、及液化之芳香族化合物)供至分離液槽82。 以第1分離部71分離之氣體(氫、未液化之有機氫化物、未液化之芳香族化合物、及雜質)供至第2分離部72。The first separation section 71 includes a cooling device and a gas-liquid separator. The cooling device of the first separation section 71 is composed of a cooling device and the like, and cools the gas from the reaction vessel 41. The gas-liquid separator of the first separation section 71 separates the substance cooled by the cooling device of the first separation section 71 into liquid and gas. The liquid (liquefied organic hydrogen and liquefied aromatic compound) separated by the first separation section 71 is supplied to the separation liquid tank 82. The gas (hydrogen, unliquefied organic hydrogen, unliquefied aromatic compound, and impurities) separated by the first separation section 71 is supplied to the second separation section 72.

第2分離部72具有用以將氫與氫以外之其他物質分離的氫分離膜。 為了對從第1分離部71之氣液分離器排出的氣體將氫與其他物質分離,第2分離部72之氫分離膜相對於第1分離部71之氣液分離器配置於氣體流之下游。 以第2分離部72分離之氫、即通過氫分離膜之氫供至氫槽81。 以第2分離部72分離之氫以外的物質、即未通過氫分離膜之物質供至分離液槽82或其他槽(圖中未示)。The second separation section 72 has a hydrogen separation membrane for separating hydrogen from other substances other than hydrogen. In order to separate hydrogen from other substances in the gas discharged from the gas-liquid separator of the first separation section 71, the hydrogen separation membrane of the second separation section 72 is arranged downstream of the gas flow relative to the gas-liquid separator of the first separation section 71. The hydrogen separated by the second separation section 72, that is, the hydrogen passing through the hydrogen separation membrane, is supplied to the hydrogen tank 81. Substances other than hydrogen separated by the second separation section 72, that is, substances that do not pass through the hydrogen separation membrane, are supplied to the separation liquid tank 82 or other tanks (not shown in the figure).

藉以第1分離部71之氣液分離器與第2分離部72之氫分離膜所行的二階段氫抽出處理,比起僅使用氣液分離器與氫分離膜其中一者之形態,可抽出雜質少且純度高之氫。The two-stage hydrogen extraction process using the gas-liquid separator of the first separation section 71 and the hydrogen separation membrane of the second separation section 72 can extract hydrogen with less impurities and higher purity, compared to a method using only one of the gas-liquid separator and the hydrogen separation membrane.

(氫槽81) 氫槽81儲存在反應容器41生成並以氫抽出部70抽出之氫。 氫槽81亦可以可供給氫之狀態與電力產生裝置(圖中未示)連通。 該電力產生裝置依據從氫槽81供給之氫,使電力產生,而將電力供至蓄電裝置(圖中未示)及/或電氣設備(圖中未示)。 又,亦可為不設氫槽81而將以氫抽出部70抽出之氫直接供至電力產生裝置之形態。(Hydrogen tank 81) The hydrogen tank 81 stores hydrogen generated in the reaction vessel 41 and extracted by the hydrogen extraction unit 70. The hydrogen tank 81 can also be connected to the power generation device (not shown in the figure) in a state where hydrogen can be supplied. The power generation device generates electricity based on the hydrogen supplied from the hydrogen tank 81, and supplies the electricity to the power storage device (not shown in the figure) and/or the electrical equipment (not shown in the figure). In addition, it is also possible to provide a form in which the hydrogen extracted by the hydrogen extraction unit 70 is directly supplied to the power generation device without providing the hydrogen tank 81.

(分離液槽82) 分離液槽82儲存從反應容器41排出之氫以外的物質(有機氫化物、芳香族化合物等)。(Separation liquid tank 82) The separation liquid tank 82 stores substances other than hydrogen (organic hydrides, aromatic compounds, etc.) discharged from the reaction vessel 41.

(探測部91、控制部93) 探測部91係溫度感測器等,設於反應容器41之內部且為觸媒保存裝置20之附近,以取得有關於觸媒保存裝置20之附近的溫度之資訊。 控制部93控制觸媒保存裝置20、噴霧部43、抽吸泵60等構成脫氫系統1之電氣設備。 特別是控制部93依據有關於以探測部91取得之觸媒保存裝置20附近的溫度之資訊,調整對觸媒保存裝置20之電力供給。 藉對觸媒保存裝置20之電力供給的調整,調整電阻線21之發熱量。 藉此,可在脫氫反應活化之狀態下,調整從噴霧部43噴灑之原料(有機氫化物)的量及/或時間點、以抽吸泵60抽吸氣體之量及/或時間點。(Detector 91, control unit 93) The detector 91 is a temperature sensor or the like, which is disposed inside the reaction vessel 41 and near the catalyst storage device 20 to obtain information about the temperature near the catalyst storage device 20. The control unit 93 controls the electrical equipment constituting the dehydrogenation system 1, such as the catalyst storage device 20, the spray unit 43, and the suction pump 60. In particular, the control unit 93 adjusts the power supply to the catalyst storage device 20 based on the information about the temperature near the catalyst storage device 20 obtained by the detector 91. The heat generation of the resistance wire 21 is adjusted by adjusting the power supply to the catalyst storage device 20. Thereby, the amount and/or timing of the raw material (organic hydride) sprayed from the spraying section 43 and the amount and/or timing of the gas sucked by the suction pump 60 can be adjusted while the dehydrogenation reaction is activated.

(氫抽出程序) 接著,說明使用本實施形態之脫氫系統1的氫抽出程序。 預先於反應容器41安裝有觸媒保存裝置20及噴霧部43。 原料槽5與噴霧部43連通。 於反應容器41之氣體排出口45安裝有氣體排出管50,於反應容器41之液體排出口47安裝有液體排出管52。 於氣體排出管50安裝有抽吸泵60、氫抽出部70、氫槽81。 於液體排出管52安裝有分離液槽82。(Hydrogen extraction procedure) Next, the hydrogen extraction procedure using the dehydrogenation system 1 of the present embodiment will be described. The catalyst storage device 20 and the spray section 43 are installed in advance in the reaction container 41. The raw material tank 5 is connected to the spray section 43. The gas discharge port 45 of the reaction container 41 is installed with a gas discharge pipe 50, and the liquid discharge pipe 52 is installed with a liquid discharge port 47 of the reaction container 41. The gas discharge pipe 50 is installed with a suction pump 60, a hydrogen extraction section 70, and a hydrogen tank 81. The liquid discharge pipe 52 is installed with a separation liquid tank 82.

控制部93使商用電源等進行將電力供至觸媒保存裝置20。 藉此,電阻線21發熱,經由絕緣粉末24與筒部27,將電阻線21之熱傳至散熱片29。 觸媒31以來自筒部27及散熱片29之熱加溫。 當觸媒31達預定溫度(例如350℃)時,形成為脫氫反應可活化之狀態。 控制部93從來自探測部91之資訊、或開始對觸媒保存裝置20之電力供給後的經過時間等,判斷觸媒31達該預定溫度時,控制部93開始以噴霧部43所行之有機氫化物的噴霧。 開始以噴霧部43所行之有機氫化物的噴霧後,經過預定時間之後,控制部93使抽吸泵60之運作開始。 從噴霧部43噴霧之有機氫化物的一部分通過觸媒保存裝置20之觸媒被覆部33的孔,與觸媒31接觸。 此時,藉脫氫反應,有機氫化物分離成氫與芳香族化合物。 從觸媒保存裝置20的筒部27與觸媒被覆部33之間,通過觸媒被覆部33之孔,排出有機氫化物、芳香族化合物及氫。 從觸媒被覆部33排出之物質等中反應容器41內之氣體藉以抽吸泵60所行之抽吸經由氣體排出管50送至氫抽出部70。 從觸媒被覆部33排出之物質等中反應容器內之液體經由液體排出管52送至分離液槽82。The control unit 93 supplies power to the catalyst storage device 20 using a commercial power source. As a result, the resistance wire 21 generates heat, and the heat of the resistance wire 21 is transferred to the heat sink 29 via the insulating powder 24 and the barrel 27. The catalyst 31 is heated by the heat from the barrel 27 and the heat sink 29. When the catalyst 31 reaches a predetermined temperature (e.g., 350°C), it is in a state where the dehydrogenation reaction can be activated. When the control unit 93 determines that the catalyst 31 has reached the predetermined temperature based on information from the detection unit 91 or the time elapsed after the start of power supply to the catalyst storage device 20, the control unit 93 starts spraying the organic hydride by the spray unit 43. After the spraying of the organic hydride by the spraying section 43 begins, the control section 93 starts the operation of the suction pump 60 after a predetermined time has passed. A portion of the organic hydride sprayed from the spraying section 43 passes through the holes of the catalyst coating section 33 of the catalyst storage device 20 and contacts the catalyst 31. At this time, the organic hydride is separated into hydrogen and aromatic compounds by dehydrogenation reaction. The organic hydride, aromatic compounds and hydrogen are discharged from between the cylinder 27 of the catalyst storage device 20 and the catalyst coating section 33 through the holes of the catalyst coating section 33. The gas in the reaction container 41 among the substances discharged from the catalyst coating part 33 is pumped by the suction pump 60 and sent to the hydrogen extraction part 70 through the gas discharge pipe 50. The liquid in the reaction container among the substances discharged from the catalyst coating part 33 is sent to the separation liquid tank 82 through the liquid discharge pipe 52.

在氫抽出部70之第1分離部71,氣體冷卻後,分離成氣體(主要為氫)與液體(主要為有機氫化物與芳香族化合物)。 以第1分離部71分離之氣體送至第2分離部72。 以第1分離部71分離之液體送至分離液槽82。In the first separation section 71 of the hydrogen extraction section 70, the gas is cooled and separated into gas (mainly hydrogen) and liquid (mainly organic hydride and aromatic compound). The gas separated by the first separation section 71 is sent to the second separation section 72. The liquid separated by the first separation section 71 is sent to the separation liquid tank 82.

在氫抽出部70之第2分離部72,分離成通過氫分離膜之氫與未通過氫分離膜之其他物質。 以第2分離部72分離之氫送至氫槽81。 以第2分離部72分離之氫以外的物質送至分離液槽82(或其他槽)。In the second separation section 72 of the hydrogen extraction section 70, hydrogen is separated into hydrogen that passes through the hydrogen separation membrane and other substances that do not pass through the hydrogen separation membrane. The hydrogen separated by the second separation section 72 is sent to the hydrogen tank 81. Substances other than hydrogen separated by the second separation section 72 are sent to the separation liquid tank 82 (or other tanks).

於氫槽81儲存在反應容器41產生之氫。 於分離液槽82儲存有機氫化物及芳香族化合物。The hydrogen produced in the reaction vessel 41 is stored in the hydrogen tank 81. The organic hydrogen compound and the aromatic compound are stored in the separation liquid tank 82.

(效果) 在觸媒31保存於筒部27與觸媒被覆部33之間,端子23之一部分(第1端部23a之一部分)從反應容器41露出之狀態下,觸媒保存裝置20保持於反應容器41。 因此,在脫氫系統1,可易從反應容器41卸除觸媒保存裝置20,而可易進行觸媒保存裝置20之觸媒及/或加熱器(電阻線21等)的維修。 又,由於電流流過之電阻線21與端子23設於不與有機氫化物、芳香族化合物、及氫接觸之區域,故可不易使電阻線21及/或端子23惡化。 又,設有散熱片29時,於筒部27、散熱片29與觸媒被覆部33之間配置觸媒31,比起不設散熱片29之形態,可易使觸媒31配置於筒部27與觸媒被覆部33之間的區域四處,且可易使熱傳達至觸媒31四處。 觸媒被覆部33以可卸除之狀態安裝於筒部27時,亦可易將觸媒被覆部33從筒部27卸除,補充或替換觸媒31,抑或更換觸媒被覆部33。(Effect) The catalyst storage device 20 is held in the reaction container 41 while the catalyst 31 is stored between the cylinder 27 and the catalyst covering portion 33 and a portion of the terminal 23 (a portion of the first end portion 23a) is exposed from the reaction container 41. Therefore, in the dehydrogenation system 1, the catalyst storage device 20 can be easily removed from the reaction container 41, and the catalyst and/or heater (resistance wire 21, etc.) of the catalyst storage device 20 can be easily repaired. In addition, since the resistance wire 21 and the terminal 23 through which the current flows are arranged in an area that does not contact the organic hydride, aromatic compound, and hydrogen, it is not easy to deteriorate the resistance wire 21 and/or the terminal 23. Furthermore, when the heat sink 29 is provided, the catalyst 31 is arranged between the cylinder 27, the heat sink 29 and the catalyst covering portion 33. Compared with the configuration without the heat sink 29, the catalyst 31 can be easily arranged at four places in the region between the cylinder 27 and the catalyst covering portion 33, and the heat can be easily transferred to four places of the catalyst 31. When the catalyst covering portion 33 is installed in the cylinder 27 in a removable state, the catalyst covering portion 33 can also be easily removed from the cylinder 27 to replenish or replace the catalyst 31, or to replace the catalyst covering portion 33.

此外,在本實施形態,說明了僅設一個反應容器41之形態,亦可為設二個以上之形態(參照圖5)。 具體而言,於分離液槽82之後段設反應容器(第2反應容器)41等,將貯存於分離液槽82之物質(有機氫化物與芳香族化合物)為原料,進行脫氫反應。即,從在第2反應容器之觸媒保存裝置20的上方,供給從前段之反應容器41排出的原料與氫從原料脫離後之物質。此外,在圖5,省略設於第2反應容器41之後段的氫槽81及分離液槽82之圖示。 再者,亦可設使進行了第2次脫氫反應後之貯存於分離液槽82的物質(有機氫化物與芳香族化合物)進行第3次脫氫反應之反應容器(第3反應容器)41。 藉分成複數次,進行脫氫反應,可抑制各反應容器41之內部的氫產生量,而易從氣體排出管50排出含有氫之氣體。In addition, in the present embodiment, a form in which only one reaction container 41 is provided is described, but a form in which two or more reaction containers are provided may also be provided (see FIG. 5 ). Specifically, a reaction container (second reaction container) 41 is provided at the rear section of the separation liquid tank 82, and the substances (organic hydrogen compounds and aromatic compounds) stored in the separation liquid tank 82 are used as raw materials to carry out a dehydrogenation reaction. That is, the raw materials discharged from the reaction container 41 at the front section and the substances after hydrogen is separated from the raw materials are supplied from above the catalyst storage device 20 of the second reaction container. In addition, in FIG. 5 , the illustration of the hydrogen tank 81 and the separation liquid tank 82 provided at the rear section of the second reaction container 41 is omitted. Furthermore, a reaction vessel (third reaction vessel) 41 may be provided in which the substances (organic hydride and aromatic compound) stored in the separation liquid tank 82 after the second dehydrogenation reaction are subjected to a third dehydrogenation reaction. By conducting the dehydrogenation reaction in multiple steps, the amount of hydrogen generated inside each reaction vessel 41 can be suppressed, and the hydrogen-containing gas can be easily discharged from the gas discharge pipe 50.

又,在本實施形態中,以脫氫系統1之原料為環烴,氫脫離後之物質為芳香族化合物作了說明,亦可使用利用觸媒31使氫脫離之其他物質(含氫之化合物)作為原料。 舉例而言,可使用乙醇、甲醇、鏈狀烴等作為脫氫系統1之原料,亦可使用氨作為脫氫系統1之原料。In addition, in the present embodiment, the raw material of the dehydrogenation system 1 is a cyclic hydrocarbon, and the substance after dehydrogenation is an aromatic compound. However, other substances (hydrogen-containing compounds) that are dehydrogenated using a catalyst 31 may be used as raw materials. For example, ethanol, methanol, and chain hydrocarbons may be used as raw materials for the dehydrogenation system 1, and ammonia may also be used as raw materials for the dehydrogenation system 1.

說明了本發明之數個實施形態,該等實施形態係提示作為例子,並非意在限定發明之範圍。該等實施形態可以其他各種形態實施,可在不脫離發明之要旨的範圍下,進行各種省略、置換、變更。該等實施形態及其變形包含在發明之範圍及要旨,同樣地包含在記載於申請專利範圍之發明及其均等之範圍。Several embodiments of the present invention are described, and these embodiments are provided as examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. These embodiments and their variations are included in the scope and gist of the invention, and are also included in the invention described in the scope of the patent application and its equivalent.

1:脫氫系統 5:原料(有機氫化物)槽 10:脫氫反應器 20:觸媒保存裝置 21:電阻線 22:填隙物 23:端子(捲線軸) 23a:第1端部 23b:第2端部 23c:中間部 24:絕緣粉末 25:絕緣構件 26:螺帽 27:筒部 29:散熱片 30:電阻器固定構件 31:觸媒 33:觸媒被覆部 35:被覆部固定構件 41:反應容器 41a:第1開口孔 41b:第2開口孔 43:噴霧部 45:氣體排出口 47:液體排出管 50:氣體排出管 50a:斜坡部 52:液體排出管 60:抽吸泵 70:氫抽出部 71:第1分離部 72:第2分離部 81:氫槽 82:分離液槽 91:探測部 93:控制部 OP:觸媒投入用開口1: Dehydrogenation system 5: Raw material (organic hydride) tank 10: Dehydrogenation reactor 20: Catalyst storage device 21: Resistor wire 22: Filler 23: Terminal (winding shaft) 23a: First end 23b: Second end 23c: Middle part 24: Insulating powder 25: Insulating member 26: Nut 27: Cylinder 29: Heat sink 30: Resistor fixing member 31: Catalyst 33: Catalyst coating part 35: Coating Part fixing member 41: reaction container 41a: first opening hole 41b: second opening hole 43: spray part 45: gas outlet 47: liquid outlet pipe 50: gas outlet pipe 50a: slope part 52: liquid outlet pipe 60: suction pump 70: hydrogen extraction part 71: first separation part 72: second separation part 81: hydrogen tank 82: separation liquid tank 91: detection part 93: control part OP: opening for catalyst input

圖1係本實施形態之脫氫系統的結構圖。 圖2係觸媒保存裝置之截面結構圖。 圖3係經由開口填充觸媒之際的觸媒保存裝置之截面結構圖。 圖4係本實施形態之變形例,包含朝上方噴霧之噴霧部、從反應容器往斜上方延伸之斜坡部的脫氫系統之結構圖。 圖5係更設有第2反應容器之脫氫系統的結構圖。FIG. 1 is a structural diagram of a dehydrogenation system of the present embodiment. FIG. 2 is a cross-sectional structural diagram of a catalyst storage device. FIG. 3 is a cross-sectional structural diagram of a catalyst storage device when the catalyst is filled through an opening. FIG. 4 is a structural diagram of a dehydrogenation system including a spraying portion for spraying upward and a slope portion extending obliquely upward from a reaction container, which is a variation of the present embodiment. FIG. 5 is a structural diagram of a dehydrogenation system further provided with a second reaction container.

20:觸媒保存裝置 20: Catalytic storage device

21:電阻線 21:Resistor wire

22:填隙物 22: Filler

23:端子(捲線軸) 23: Terminal (coil)

23a:第1端部 23a: 1st end

23b:第2端部 23b: Second end

23c:中間部 23c: Middle part

24:絕緣粉末 24: Insulation powder

25:絕緣構件 25: Insulation components

26:螺帽 26: Nut

27:筒部 27: Cylinder

29:散熱片 29: Heat sink

30:電阻器固定構件 30: Resistor fixing component

31:觸媒 31: Catalyst

33:觸媒被覆部 33: Catalyst coating part

35:被覆部固定構件 35: Covering part fixing member

41:反應容器 41:Reaction container

41a:第1開口孔 41a: 1st opening hole

41b:第2開口孔 41b: Second opening hole

Claims (13)

一種脫氫系統,包含:反應容器;及觸媒保存裝置,其具有:電阻線,藉電力供給而發熱;筒部,包覆該電阻線之側部;觸媒被覆部,包覆該筒部之側部的至少一部分;和觸媒,設於該筒部與該觸媒被覆部之間,用以使脫氫反應活化;從該反應容器中之該觸媒保存裝置的上方供給原料,該觸媒被覆部具有不使觸媒通過而使該原料、由脫氫反應而產生之氫、及氫已從該原料脫離後之物質通過的孔,在該觸媒被覆部位於該反應容器之內側,而該電阻線之端子的一部分露出至該反應容器之外側的狀態下,該反應容器保持著該觸媒保存裝置。 A dehydrogenation system comprises: a reaction container; and a catalyst storage device, which has: a resistance wire, which generates heat by supplying power; a barrel, which covers the side of the resistance wire; a catalyst coating, which covers at least a part of the side of the barrel; and a catalyst, which is arranged between the barrel and the catalyst coating, and is used to activate the dehydrogenation reaction; The raw material is supplied from the top, and the catalyst-coated portion has holes that allow the raw material, hydrogen generated by the dehydrogenation reaction, and substances after hydrogen has been separated from the raw material to pass through without allowing the catalyst to pass through. The catalyst-coated portion is located inside the reaction container, and a portion of the terminal of the resistance line is exposed to the outside of the reaction container. The reaction container holds the catalyst storage device. 如請求項1之脫氫系統,其中,於該筒部設散熱用散熱片,該散熱片被該觸媒被覆部所包覆。 As in claim 1, the dehydrogenation system, wherein a heat sink is provided on the cylinder portion for heat dissipation, and the heat sink is covered by the catalyst coating portion. 如請求項1或2之脫氫系統,其中,該觸媒被覆部以可卸除之狀態安裝於該筒部。 A dehydrogenation system as claimed in claim 1 or 2, wherein the catalyst coating is mounted on the cylinder in a removable state. 如請求項1或2之脫氫系統,更包含:噴霧部,收納於該反應容器中,將該原料噴灑成霧狀。 The dehydrogenation system of claim 1 or 2 further comprises: a spraying section housed in the reaction container for spraying the raw material into a mist form. 如請求項4之脫氫系統,其中, 該噴霧部將該原料朝上方或斜上方噴霧。 A dehydrogenation system as claimed in claim 4, wherein, the spraying section sprays the raw material upward or obliquely upward. 如請求項1或2之脫氫系統,更包含:氫抽出部,用以將在該反應容器產生之氫與其他物質分離;該氫抽出部具有氫分離膜。 The dehydrogenation system of claim 1 or 2 further comprises: a hydrogen extraction section for separating hydrogen generated in the reaction vessel from other substances; the hydrogen extraction section has a hydrogen separation membrane. 如請求項6之脫氫系統,其中,該氫抽出部具有氣液分離器,用以將從該反應容器排出之氣體在冷卻後分離成氣體與液體;該氫分離膜相對於該氣液分離器配置於氣體流之下游,俾針對從該氣液分離器排出之氣體,將氫與其他物質分離。 As in claim 6, the dehydrogenation system, wherein the hydrogen extraction section has a gas-liquid separator for separating the gas discharged from the reaction vessel into gas and liquid after cooling; the hydrogen separation membrane is arranged downstream of the gas flow relative to the gas-liquid separator to separate hydrogen from other substances in the gas discharged from the gas-liquid separator. 如請求項6之脫氫系統,更包含:抽吸泵,其抽吸該反應容器之氣體,將之引導至該氫抽出部。 The dehydrogenation system of claim 6 further comprises: a suction pump that sucks the gas from the reaction container and guides it to the hydrogen extraction part. 如請求項8之脫氫系統,更包含:氣體排出管,其將該反應容器與該氫抽出部連通;該氣體排出管具有從該反應容器之氣體排出口朝斜方向延伸之斜坡部。 The dehydrogenation system of claim 8 further comprises: a gas exhaust pipe connecting the reaction container with the hydrogen extraction part; the gas exhaust pipe has a slope extending from the gas exhaust port of the reaction container in an oblique direction. 如請求項1或2之脫氫系統,其中,該筒部呈圓筒狀,該筒部以可旋轉之狀態安裝於構成該反應容器之壁。 A dehydrogenation system as claimed in claim 1 or 2, wherein the barrel is cylindrical and is rotatably mounted on the wall constituting the reaction vessel. 如請求項1或2之脫氫系統,更包含: 第2反應容器;從該第2反應容器中之該觸媒保存裝置的上方,供給從該反應容器排出之該原料及氫已從該原料脫離後之物質。 The dehydrogenation system of claim 1 or 2 further comprises: A second reaction container; the raw material discharged from the reaction container and the substance after hydrogen has been separated from the raw material are supplied from above the catalyst storage device in the second reaction container. 如請求項1或2之脫氫系統,其中,構成該反應容器之壁具有開口孔,該開口孔用以於安裝該觸媒保存裝置之際,使該觸媒保存裝置通過。 A dehydrogenation system as claimed in claim 1 or 2, wherein the wall constituting the reaction container has an opening hole, and the opening hole is used to allow the catalyst storage device to pass through when the catalyst storage device is installed. 一種觸媒保存裝置,包含:電阻線,藉電力供給而發熱;筒部,包覆該電阻線之側部;觸媒被覆部,包覆該筒部之側部的至少一部分;及觸媒,設於該筒部與該觸媒被覆部之間;從反應容器中之該觸媒保存裝置的上方供給原料,該觸媒被覆部具有不使觸媒通過而使該原料、由脫氫反應而產生之氫及氫已從該原料脫離後之物質通過的孔,在該電阻線之端子的一部分露出至該反應容器之外側的狀態下,該觸媒保存裝置保持於該反應容器。 A catalyst storage device comprises: a resistance wire that generates heat by supplying electric power; a barrel that covers the side of the resistance wire; a catalyst covering portion that covers at least a portion of the side of the barrel; and a catalyst that is disposed between the barrel and the catalyst covering portion; a raw material is supplied from above the catalyst storage device in a reaction container, the catalyst covering portion has holes that allow the raw material, hydrogen generated by a dehydrogenation reaction, and a substance after hydrogen has been separated from the raw material to pass through without allowing the catalyst to pass through, and the catalyst storage device is maintained in the reaction container in a state where a portion of the terminal of the resistance wire is exposed to the outside of the reaction container.
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