TWI829777B - Structure, solid imaging element and image display device - Google Patents

Abstract

In a structure having two pixels two-dimensionally arranged in contact with each other, each of the two pixels contains a pigment, and the maximum value of the Mohr absorption coefficient in the wavelength range of 400 to 700 nm is 3000L‧mol ^-1 ‧cm -Pigment derivatives and resins below ¹ . Furthermore, the present invention relates to a solid-state imaging device and an image display device having the above-mentioned structure.

Description

Structure, solid imaging element and image display device

The present invention relates to a structure having a plurality of pixels, a solid-state imaging element, and an image display device.

Conventionally, color filters have been used to color images in solid-state imaging devices such as charge-coupled device (CCD) image sensors and image display devices such as liquid crystal display devices.

化合物和顏料分散於有機溶劑中而成之各種顏色的著色感光性組成物形成濾色器的技術。 Generally, color filters are formed by forming a film of a photosensitive composition containing a pigment or dye for each pixel corresponding to each color, and then hardening the film by exposing, developing, heating, etc. Patterned. For example, Patent Document 1 describes the use of three specific

A technology that forms color filters using colored photosensitive compositions of various colors in which compounds and pigments are dispersed in organic solvents.

[Prior technical literature] [Patent Document]

[Patent Document 1] Japanese Patent Application Publication No. 2003-081972

In recent years, studies have been conducted on the use of infrared filters (IR filters) such as near-infrared ray transmission filters and near-infrared ray cutoff filters, and the use of IR filters in addition to the above-mentioned color filters. For example, near-infrared pass filters are used for infrared sensing or generating infrared images, and near-infrared cutoff filters are used for cutting heat rays.

This time, the following problem was discovered: In a structure including a color filter and an IR filter as described above (hereinafter, these are collectively referred to as "filters"), in the deep part of the pixel and the two images Gaps may form over time where the elements are in contact with each other. If such a gap exists, the optical characteristics of the filter may be deteriorated. Therefore, it is desired to improve the stability of the deep portion of the pixel to an extent that voids are not formed over time.

The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a structure having excellent stability in deep portions of pixels.

Furthermore, an object of the present invention is to provide a solid-state imaging device and an image display device having the above-mentioned structure.

The above problems can be solved by using transparent pigment derivatives. Specifically, the above problems are solved by the following methods <1>, preferably <2>~<11>.

<1>

A structure having two pixels two-dimensionally arranged in contact with each other. Each of the two pixels contains a pigment and the maximum value of the Mohr absorption coefficient in the wavelength range of 400 to 700 nm is 3000L‧mol ^-1 ‧cm ^- Pigment derivatives and resins below ¹ .

<2>

The structure as described in <1>, wherein the width of at least one of the above two pixels is 0.3~5.0 μm.

<3>

The structure as described in <1> or <2>, wherein the thickness of at least one of the two pixels is 0.1~2.0 μm.

<4>

A structure as described in any one of <1> to <3>, where The total content of pigments and pigment derivatives contained in at least one of the two pixels is 25 to 65 mass %.

<5>

The structure as described in any one of <1> to <4>, wherein the mass ratio of the content of the pigment derivative contained in at least one of the two pixels to the content of the pigment contained in the same pixel It is 3:97~20:80.

<6>

The structure according to any one of <1> to <5>, wherein at least one of the pigment derivatives contains an aromatic ring.

<7>

The structure according to <6>, wherein at least one of the pigment derivatives contains a group represented by the following formula (A1),

In the formula, * represents a bond, Ya ¹ and Ya ² independently represent -N(Ra ¹ )- or -O-, Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and B ¹ and B ² each independently represent a hydrogen atom or a substituent.

<8>

A structure as described in any one of <1> to <7>, wherein The above two pixels are pixels containing different pigments. The above two pixels are each selected from the group consisting of red pixels, green pixels, blue pixels, yellow pixels, cyan pixels, magenta pixels, black pixels, white pixels, and near-infrared cutoff. One pixel among the filter pixels and the near-infrared ray transmitting filter pixel.

<9>

The structure according to any one of <1> to <8>, further having a partition wall between the two pixels that is lower than the thickness of the two pixels.

<10>

A solid-state imaging element having the structure according to any one of <1> to <9> on a semiconductor substrate.

<11>

An image display device having the structure according to any one of <1> to <9> on a glass substrate.

According to the present invention, a structure excellent in stability in the deep portion of the pixel can be obtained. Furthermore, according to the structure of the present invention, it is possible to provide the solid-state imaging device and the image display device of the present invention.

1:Support

2: partition wall

P1~P4: pixels

R: Areas prone to voids

S1~S3: structure

SIR: Near infrared cut filter

a) to c) in Figure 1 are schematic diagrams showing a structure including a two-color color filter.

Figure 2 a) to c) are schematic diagrams showing a structure including a three-color color filter.

a) to e) in Figure 3 are schematic diagrams showing a structure including a three-color color filter and an IR filter.

Hereinafter, main embodiments of the present invention will be described. However, the present invention is not limited to the illustrated embodiments.

In this specification, the numerical range represented by the "~" symbol refers to the range including the numerical values before and after the "~" as the lower limit and the upper limit respectively.

In this specification, the term "process" not only includes independent processes, but also includes processes that cannot be clearly distinguished from other processes as long as the expected effects of the process can be achieved.

Regarding the labels for groups (atomic groups) in this specification, labels that do not describe substituted or unsubstituted means that they include groups that do not have a substituent and also include groups that have a substituent. For example, when only "alkyl" is described, this means that both an alkyl group having no substituent (unsubstituted alkyl group) and an alkyl group having a substituent (substituted alkyl group) are included. .

"Exposure" in this specification includes not only drawing using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. In addition, energy rays used for exposure generally include the bright line spectrum of a mercury lamp, actinic rays such as far ultraviolet rays, extreme ultraviolet rays (EUV light), and X-rays represented by excimer lasers, as well as electron beams and ion rays. particle beam.

In this specification, "(meth)acrylate" means both or either "acrylate" and "methacrylate", and "(meth)acrylic acid" means "acrylic acid" and "methacrylate". "Acrylic acid" means both or any one of them, and "(meth)acrylyl group" means both or any one of "acrylyl group" and "methacrylyl group".

In this specification, the concentration of the solid component in the composition is expressed by the mass percentage of other components except the solvent relative to the total mass of the composition.

In this specification, unless otherwise stated, the air pressure when measuring the boiling point is set to 101325 Pa (1 atmosphere). In addition, unless otherwise stated, the temperature is set to 23°C.

In this specification, unless otherwise stated, the weight average molecular weight (Mw) and the number average molecular weight (Mn) are expressed as polystyrene conversion values based on gel permeation chromatography (GPC measurement). For example, HLC-8220 (manufactured by TOSOH Corporation) can be used as the weight average molecular weight (Mw) and number average molecular weight (Mn), and as the column, guard column HZ-L, TSKgel Super HZM-M, TSKgel Super HZ4000, and TSKgel Super can be used. HZ3000 and TSKgel Super HZ2000 (manufactured by TOSOH Corporation). In addition, unless otherwise stated, THF (tetrahydrofuran) was used as an eluent for measurement. In addition, unless otherwise stated, a detector with a wavelength of 254 nm of UV rays (ultraviolet) is used for detection in GPC measurement.

In this specification, when the positional relationship between the layers constituting the laminated body is described as "upper" or "lower", it suffices that there is another layer above or below the reference layer among the plurality of layers in question. . That is, a third layer or element may be further interposed between the base layer and the above-mentioned other layers, and the base layer does not need to be in contact with the above-mentioned other layers. In addition, unless otherwise stated, the direction in which the layers are stacked on the substrate is referred to as "up", or when there is a photosensitive layer, the direction from the substrate toward the photosensitive layer is referred to as "up", and the opposite direction is referred to as "up". for "down". In addition, the setting of the up-down direction in this specification is for convenience. In actual aspects, the "up" direction in this specification can also be different from the vertical upward direction.

In this specification, "near infrared" refers to light (electromagnetic waves) near the wavelength range of 700 to 2500 nm.

<structure>

The structure of the present invention has two pixels two-dimensionally arranged in contact with each other. Each of the two pixels contains a pigment, and the maximum value of the Mohr absorption coefficient in the wavelength range of 400 to 700 nm is 3000L‧mol ^-1 ‧cm ^- Pigment derivatives and resins below ¹ .

According to the present invention, in a structure including two pixels two-dimensionally arranged in contact with each other, the stability of the deep portion of the pixel is improved. Think as follows.

Generally, in order to improve the dispersibility of the pigment in the photosensitive composition, a pigment derivative having a structure that provides a polar group to the pigment is added together with the pigment.

However, it is found that since conventional pigment derivatives are colored compounds and absorb light during exposure, they block portions deeper than 1/2 of the pixel surface in the depth direction, in particular, deeper than 1/2 of the distance from the pixel surface. Hardening of the 2/3 deeper portion of the pixel surface in the depth direction (hereinafter, these are collectively referred to as "pixel deep portions"). It is considered that the gap generated in the deep part between the pixels is affected by deterioration over time in the direction in which the two pixels shrink in the insufficiently hardened portion.

Therefore, in the present invention, by using a transparent pigment derivative such that the maximum value of the Mohr absorption coefficient in the wavelength range of 400 to 700 nm is 3000L‧mol ^-1 ‧cm ^-1 or less, it is possible to suppress Pigment derivatives cause light consumption and can promote the hardening of deep pixels more than ever before. It is considered that by promoting hardening in the deep layer in this way, the film quality of the pixel becomes dense or the adhesion of the pixel to the support is improved, thereby improving the stability of the pixel. Furthermore, it is considered that the pigment derivative becomes transparent, that is, is less susceptible to the influence of irradiation light (ultraviolet, etc.) during exposure, thereby suppressing the deterioration and destruction of the pigment derivative and improving the stability of the pigment derivative itself during exposure. Contributes to effective hardening of deep layers.

Hereinafter, each structure of the structure of the present invention will be described in detail.

<<Composition of pixels>>

The structure of the present invention functions as a color filter, a near-infrared cut filter, a near-infrared transmitting filter, or a combination of these filters. This type of structure can be incorporated into various photo sensors such as solid-state imaging elements, and image display devices (for example, liquid crystal display devices or organic electroluminescence (organic EL) display devices, etc.) for use. For example, a light sensor incorporating the structure of the present invention can be preferably used for surveillance, security, mobility, automotive, agricultural, medical, distance measurement, gesture recognition, life recognition, etc. use.

Examples of the color filter include a filter having colored pixels that transmit light of a specific wavelength, and having at least one colored pixel selected from the group consisting of red pixels, blue pixels, green pixels, yellow pixels, blue pixels, and magenta pixels. The filter is better. The color filter can be formed using a photosensitive composition containing a color pigment.

Examples of near-infrared cutoff filters include filters with maximum absorption wavelength in the wavelength range of 700 to 1800 nm. The near-infrared cutoff filter is preferably a filter with a maximum absorption wavelength in the wavelength range of 700~1300nm, and a filter with a maximum absorption wavelength in the wavelength range of 700~1000nm is even better. In addition, the transmittance of the near-infrared cut filter in the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and further preferably 90% or more. In addition, the transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter and the absorbance A550 at the wavelength of 550 nm, that is, absorbance Amax/absorbance A550, is preferably 20 to 500, more preferably 50 to 500, and 70 to 450. Even better, 100~400 is particularly good. The near-infrared cut filter can be formed using a photosensitive composition containing a near-infrared absorbing pigment.

The near-infrared transmission filter is a filter that transmits at least part of the near-infrared rays. The near-infrared transmission filter may be a filter (transparent film) that transmits both visible light and near-infrared rays, or it may be a filter that blocks at least part of the visible light and transmits at least part of the near-infrared rays. Preferable examples of the near-infrared transmission filter include those whose maximum value of transmittance is 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and the wavelength is 1100 to 1300 nm. Filters with spectral characteristics whose minimum transmittance is 70% or more (preferably 75% or more, more preferably 80% or more). The near-infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (4).

(1): The maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 800 to 1300 nm is 70 % or above (preferably above 75%, more preferably above 80%).

(2): The maximum value of the transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 900 to 1300 nm is 70 % or above (preferably above 75%, more preferably above 80%).

(3): The maximum value of the transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1000 to 1300 nm is 70 % or above (preferably above 75%, more preferably above 80%).

(4): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the minimum value of the transmittance in the wavelength range of 1100 to 1300 nm is 70 % or above (preferably above 75%, more preferably above 80%).

In the structure of the present invention, the two pixels are two-dimensionally arranged in contact with each other. “In a state of being in contact with each other” means that two predetermined pixels in a two-dimensional arrangement are in contact with at least part of the opposite sides. If two predetermined pixels are partially in contact with each other, a partition wall smaller than the thickness of the two pixels may be present between the two pixels. The height of the low partition wall can be, for example, 10 to 90% of the thickness of the pixel, or 30 to 70%. Furthermore, when two pixels are in contact with each other at a portion between the pixels, a partition wall thicker than the thickness of the pixels may exist at other locations between the pixels. In addition, the partition wall is preferably made of a material with a lower refractive index than the refractive index of the near-infrared ray transmitting filter pixel. According to this aspect, the sensitivity of near-infrared rays can be further improved by further improving the light-condensing property of near-infrared rays.

In the structure of the present invention, the two pixels are pixels containing different pigments, and the two pixels can be each selected from a red pixel, a green pixel, a blue pixel, a yellow pixel, a cyan pixel, and a magenta pixel. One pixel among a pixel, a black pixel, a white pixel, a pixel for a near-infrared cut filter, and a pixel for a near-infrared transmission filter. Which pixel the structure of the present invention contains is designed according to the desired function of the structure. For example, the structure of the present invention can be used as a two-color color filter including two-color pixels (for example, red pixels and green pixels), as an RGB-type color filter including red pixels, green pixels, and blue pixels, or as a A CMY-type color filter containing cyan, magenta, and yellow pixels functions. Furthermore, for example, the structure of the present invention can be used as an optical filter in which a near-infrared ray cutoff filter (black pixel) is added to an RGB-type color filter, or as an optical filter in which a near-infrared ray-transmitting filter is added to an RGB-type color filter. Or it can function as a filter that adds white pixels to an RGB type color filter. Specifically, it is as follows.

The structure of the present invention can be a structure including a two-color color filter, for example. Figure 1 a) to c) are schematic diagrams showing the structure S1 including a two-color color filter. Figure 1 a) is a top view of the structure S1. Figure 1 b) and Figure 1 c) are A cross-sectional view of the structure S1 in a plane including the pixel P1 and the pixel P2. Here, for example, the pixel P1 is a green pixel, and the pixel P2 is a red pixel. In the structure of a) to c) in FIG. 1 , pixels P1 and pixels P2 are alternately arranged on the support 1 . The pixels P1 and pixels P2 are in contact with each other on all sides when viewed from above. On the other hand, b) in Figure 1 is a cross-sectional view when there is no partition wall between pixels P1 and P2, and c) in Figure 1 is a cross-sectional view when there is a partition wall 2 between pixels P1 and P2. . In b) of Figure 1, since there is no partition wall between the pixels, it can be said that the two adjacent pixels P1‧P2 are in contact with each other on the entire opposite side. In c) of Figure 1, since there is no partition between the pixels, There is a partition wall 2 between them, so it can be said that the two adjacent pixels P1 and P2 are in contact with each other at part of the opposite side surfaces.

In this type of optical filter, as described above, gaps are likely to occur in the deep portion of the pixel and in the vicinity R of the portion where two pixels are in contact with each other. Specifically, for example, in the case of b) of FIG. 1 , the region R is near the area where the contact surface of the two pixels P1 and P2 intersects with the surface of the support 1 . In the case of c) of FIG. 1 , This region R is in the vicinity of the region where the contact surface of the two pixels P1 and P2 intersects the top surface of the partition wall 2 . In the present invention, as described above, the stability can be improved by further improving the hardening of the deep portion of the pixel including the region R compared to the conventional art.

Furthermore, the structure of the present invention can be a structure including a three-color color filter, for example. a) to c) in Figure 2 are schematic diagrams showing the structure S2 including a three-color color filter, a) in Figure 2 is a top view of the structure S2, and b) in Figure 2 includes a pixel P1 and a pixel P2 The cross-sectional view of the structure S2 in the plane, c) in Figure 2 is the structure S2 in the plane including the pixel P1 and the pixel P3 Sectional view. Here, for example, the pixel P1 is a green pixel, the pixel P2 is a red pixel, and the pixel P3 is a blue pixel. In the structure S2 of a) to c) in Figure 2, pixels P1, pixels P2 and pixels P3 are alternately arranged on the support 1 in a ratio of 2:1:1. The pixels P1, pixels P2 and Each of the pixels P3 is in contact with adjacent pixels on all sides when viewed from above. On the other hand, as shown in FIG. 2 b) and FIG. 2 c), in structure S2, since there is a partition wall 2 between pixels, it can be said that two adjacent pixels are on opposite sides. The state of partial contact. In the structure S2, similarly to the structure S1 in b) of Fig. 1 , there may be no partition wall. The area where voids are likely to occur is also the same as that of structure S1.

In addition, the structure of the present invention can be a structure including a three-color color filter and an IR filter, for example. a) to e) in Figure 3 are schematic diagrams showing the structure S3 including a three-color color filter and an IR filter, a) in Figure 3 is a top view of the structure S3, and b) in Figure 3 includes pixels A cross-sectional view of the structure S3 in the plane of P1 and pixel P2. c) in Figure 3 is a cross-sectional view of the structure S3 in the plane including pixel P1 and pixel P3. d) in Figure 3 is a cross-sectional view of the structure S3 in the plane including pixel P4 and pixel P2. Cross-sectional view of structure S3 in the plane. Here, for example, the pixel P1 is a green pixel, the pixel P2 is a red pixel, the pixel P3 is a blue pixel, and the pixel P4 is a near-infrared ray transmitting filter pixel. In structure S3 of a) to e) in Figure 3 , pixels P1 to P4 are alternately arranged on the support 1 in a ratio of 1:1:1:1, and each of the pixels P1 to P4 is viewed from above. When it is in contact with adjacent pixels on all sides. On the other hand, as shown in b) to d) of Figure 3, in structure S3, since there is a partition wall 2 between pixels, it can be said that two adjacent pixels are in contact with each other at part of the opposite side surface. condition. In the structure S3, similarly to the structure S1 in b) of Fig. 1 , there may be no partition wall. The area where voids are likely to occur is also the same as that of structure S1. In addition, as shown in e) of FIG. 3 , the structure S3 may also be provided between the color filter pixels P1 to P3, for example. Set the near infrared cut filter SIR below. In addition, the near-infrared cutoff filter SIR can also be similarly provided in each structure shown in a) to c) of FIG. 1 and a) to c) of FIG. 2 .

In addition, the structure of the present invention can be, for example, a structure including a three-color color filter and a white pixel, or a structure in which a CMY-type color filter is used as the three-color color filter in the above-mentioned structure. In addition, in the structure of the present invention, an antireflection film, a planarizing film, a lens, etc. can be provided on the optical filter. Infrared light-absorbing color materials may be added to the lens material used to form the lens. The lens material preferably has a refractive index of 1.5 to 1.8 with respect to light with a wavelength of 550 nm. The upper limit of this numerical range is more preferably 1.75 or less, and still more preferably 1.70 or less. Moreover, it is more preferable that the lower limit of this numerical range is 1.55 or more, and it is further more preferable that it is 1.58 or more. When forming a lens material film with a film thickness of 0.35 μm, the minimum transmittance of the lens material with respect to light with a wavelength of 400 to 700 nm is preferably 90% or more, and more preferably 95% or more. The upper limit of the transmittance is preferably 100%, but is actually about 98%. Moreover, when forming a lens material film with a film thickness of 0.35 μm, the transmittance of the lens material with respect to light with a wavelength of 820 nm is preferably 70% or less, more preferably 60% or less, and further preferably 50% or less. The lower limit of the transmittance is preferably 0%, but is actually about 50%.

In the structure of the present invention, it is preferable that the width of at least one of the two pixels is 0.3 to 5.0 μm. In particular, for applications such as single-lens reflex cameras that use large-sized pixels, the upper limit of the width of each pixel is more preferably 4.0 μm or less, more preferably 3.5 μm or less, and particularly preferably 3.0 μm or less. In addition, the lower limit of the width of each pixel in this application is more preferably 1.7 μm or more, more preferably 2.0 μm or more, and particularly preferably 2.5 μm or more. On the other hand, in applications such as mobile devices that use smaller-sized pixels, the upper limit of the width of each pixel is more preferably 1.7 μm or less, more preferably 1.5 μm or less, and particularly preferably 1.2 μm or less. In addition, the lower limit of the width of each pixel in this application is more preferably 0.5 μm or more, and 0.6 μm or more is preferably More preferably, 0.7 μm or more is particularly preferred. The thickness of at least one of the two pixels is preferably 0.1 to 2.0 μm. In particular, for large-size applications as described above, the upper limit of the thickness of each pixel is more preferably 1.8 μm or less, further preferably 1.6 μm or less, and particularly preferably 1.4 μm or less. In addition, the lower limit of the thickness of each pixel in this application is more preferably 0.8 μm or more, more preferably 0.9 μm or more, and particularly preferably 1.0 μm or more. On the other hand, in the small-size application as described above, the upper limit of the thickness of each pixel is more preferably 0.8 μm or less, further preferably 0.7 μm or less, and particularly preferably 0.6 μm or less. In addition, the lower limit of the width of each pixel in this application is more preferably 0.2 μm or more, more preferably 0.3 μm or more, and particularly preferably 0.4 μm or more. As described above, the smaller the width and thickness of each pixel, the greater the influence of the voids generated in the deep portion of the pixel, and the greater the usefulness of the present invention.

<<Composition used to form pixels>>

In the structure of the present invention, each pixel contains a pigment, a pigment derivative, and a resin according to the desired function. As will be described in detail later, such a pixel is formed by forming a film of a photosensitive composition (hereinafter, also simply referred to as "composition") containing a pigment, a pigment derivative, and a resin, and subjecting the film to exposure and development. Wait for processing to form. Furthermore, the structure of the present invention is obtained by repeating the pixel formation process until all necessary pixels are formed. Hereinafter, the contents of the composition used to form the pixels in the present invention will be described.

<<<Pigment>>>

In the present invention, the photosensitive composition contains a pigment. Examples of pigments include white pigments, black pigments, color pigments, near-infrared absorbing pigments, and the like. In the present invention, white pigments include not only pure white, but also bright gray (for example, off-white, light gray, etc.) pigments close to white, and the like. In addition, the pigment may be either an inorganic pigment or an organic pigment, since it is easier to improve the dispersion stability. For this reason, organic pigments are preferred. In addition, the pigment has a maximum absorption wavelength in the wavelength range of 400 to 2000 nm, and a pigment having a maximum absorption wavelength in the wavelength range of 400 to 700 nm is more preferable. Furthermore, the pigment may be used alone or in combination with a dye. Moreover, as a pigment, the thing obtained by replacing a part of an inorganic pigment or an organic-inorganic pigment with an organic chromophore can also be used. Hue can be easily designed by replacing inorganic pigments or organic-inorganic pigments with organic chromophores.

When forming pixels for a color filter, for example, a predetermined pigment appropriately selected from color pigments is used as the pigment. In addition, when forming a pixel for a near-infrared cut filter, a near-infrared-absorbing pigment is used as the pigment. Furthermore, when forming a pixel for a near-infrared ray transmitting filter, a pigment that is black by a combination of two or more color pigments or a black pigment is used.

The average primary particle size of the pigment is preferably 1 to 200 nm. It is more preferable that the lower limit is 5 nm or more, and it is further more preferable that it is 10 nm or more. The upper limit is more preferably 180 nm or less, further preferably 150 nm or less, and particularly preferably 100 nm or less. If the average primary particle size of the pigment is in the above range, the dispersion stability of the pigment in the photosensitive composition will be good. In addition, in the present invention, the primary particle size of the pigment can be determined from the photograph obtained by observing the primary particles of the pigment using a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the corresponding equivalent circle diameter is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

The pigment content in one pixel is preferably 25 to 65% by mass. It is more preferable that the upper limit is 60 mass % or less, and it is further more preferable that it is 55 mass % or less. It is more preferable that the lower limit is 25 mass % or more, further preferably 30 mass % or more, and particularly preferably 35 mass % or more. Examples of pigments include those shown below.

(color pigment)

The color pigment is not particularly limited, and known color pigments can be used. Examples of color pigments include pigments that have a maximum absorption wavelength in the wavelength range of 400 to 700 nm. For example, a yellow pigment, an orange pigment, a red pigment, a green pigment, a purple pigment, a blue pigment, etc. are mentioned. Specific examples include the following.

Colorimetric Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine series), 233 (quinoline series), 234 (amino ketone series), 235 (amino ketone series), 236 (amino ketone series), etc. (the above are yellow pigments. Hereinafter, they are also referred to as "PY1", etc.).

C.I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 etc. (The above is orange pigment. Hereinafter, it is also referred to as "PO2", etc.).

系、Organo Ultramarine、Bluish Red)，295(單偶氮系)，296(重氮系)，297(胺基酮系)等(以上為紅色顏料。以下，亦簡稱為“PR1”等。)。 CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 , 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184 ,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291 ,294(

series, Organo Ultramarine, Bluish Red), 295 (monoazo series), 296 (diazo series), 297 (aminoketone series), etc. (the above are red pigments. Hereinafter, also referred to as "PR1", etc.).

C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine series), 65 (phthalocyanine series), 66 (phthalocyanine series), etc. (the above are green pigments. Hereinafter, they are also referred to as for "PG7" etc.).

系)等(以上為紫色顏料。以下，亦簡稱為“PV1”等。)。 CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (

system), etc. (The above are purple pigments. Hereinafter, they are also referred to as "PV1", etc.).

C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo series), 88 (methine series), etc. (the above are blue pigments. Hereinafter, they are also referred to as "PB1", etc.).

Furthermore, as the green pigment, a halide zinc phthalocyanine pigment having an average number of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can be used. Specific examples include compounds described in International Publication No. 2015/118720. In addition, as the green pigment, the compound described in Chinese Patent Application Publication No. 106909027, the phthalocyanine compound having the phosphate ester as a ligand described in International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019 can also be used. -Phthalocyanine compounds described in Japanese Patent Application Publication No. 008014, phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, compounds described in Japanese Patent Application Publication No. 2019-038958, etc.

Furthermore, as the blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Laid-Open No. 2012-247591 and paragraph 0047 of Japanese Patent Application Laid-Open No. 2011-157478.

In addition, as the yellow pigment, the compounds described in Japanese Patent Application Laid-Open No. 2017-201003, the compounds described in Japanese Patent Application Laid-Open No. 2017-197719, and paragraphs 0011 to 0062 of Japanese Patent Application Laid-Open No. 2017-171912 can also be used. , compounds described in 0137 to 0276, compounds described in paragraphs 0010 to 0062 and 0138 to 0295 of Japanese Patent Application Laid-Open No. 2017-171913, paragraphs 0011 to 0062 and 0139 to 0190 of Japanese Patent Application Laid-Open No. 2017-171914. Compounds described in paragraphs, compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of Japanese Patent Application Laid-Open No. 2017-171915, quinolines described in paragraphs 0011 to 0034 of Japanese Patent Application Laid-Open No. 2013-054339 Yellow compounds, quinoline yellow compounds described in paragraphs 0013 to 0058 of Japanese Patent Application Laid-Open No. 2014-026228, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, Japanese Patent Application Laid-Open No. 2018-203798 Quinophthalone compounds described in the publication, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-062578, quinophthaline compounds described in Japanese Patent Publication No. 6432076, Japanese Patent Application Laid-Open No. 2018-155881 Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-111757, Quinophthalene compounds described in Japanese Patent Application Laid-Open No. 2018-040835, Japanese Patent Application Laid-Open No. 2017-197640 Quinophthalone compounds described in the publication, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2016-145282, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2014-085565, Japanese Patent Application Laid-Open No. 2014-021139 Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-209614, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2013-209435, Japanese Patent Application Laid-Open No. 2013- Quinoline yellow compounds described in the Gazette No. 181015, Japanese Patent Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-061622, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-032486, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2012-226110, Japan The quinophthalone compound described in Japanese Patent Application Laid-Open No. 2008-074987, the quinophthalone compound described in Japanese Patent Application Laid-Open No. 2008-081565, the quinophthaline compound described in Japanese Patent Application Laid-Open No. 2008-074986, Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-074985, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-050420, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-031281 , the quinophthalone compound described in Japanese Patent Publication No. 48-032765, the quinophthalone compound described in Japanese Patent Application Publication No. 2019-008014, the compound represented by the following formula (QP1), the compound represented by the following formula The compound represented by (QP2).

In the formula (QP1), X ¹ to X ¹⁶ each independently represent a hydrogen atom or a halogen atom, and Z ¹ represents an alkylene group having 1 to 3 carbon atoms. Specific examples of the compound represented by formula (QP1) include the compounds described in paragraph 0016 of Japanese Patent No. 6443711.

In formula (QP2), Y ¹ to Y ³ each independently represent a halogen atom. n and m represent integers from 0 to 6, and p represents integers from 0 to 5. (n+m) is 1 or more. Specific examples of the compound represented by formula (QP2) include compounds described in paragraphs 0047 to 0048 of Japanese Patent No. 6432077.

As the red pigment, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in Japanese Patent Application Laid-Open No. 2017-201384 and two described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 can also be used. Ketopyrrolopyrrole compound, diketopyrrolopyrrole compound described in International Publication No. 2012/102399, diketopyrrolopyrrole compound described in International Publication No. 2012/117965, Japanese Patent Application Laid-Open No. 2012-229344 The naphthol azo compound described in, the red color material described in Japanese Patent No. 6516119, the red color material described in Japanese Patent No. 6525101, etc. Also, it can A compound having a structure in which an aromatic ring group is bonded to a dioxopyrrolopyrrole skeleton, and a group having an oxygen atom, a sulfur atom or a nitrogen atom bonded to the aromatic ring is introduced into the aromatic ring group can be used.

In the present invention, two or more kinds of color pigments can be used in combination. Moreover, when two or more kinds of color pigments are used in combination, black can be formed by the combination of two or more kinds of color pigments. Examples of such combinations include the following aspects (1) to (7). When the composition contains two or more kinds of color pigments and the combination of the two or more kinds of color pigments renders black, the composition can be preferably used as a near-infrared transmission filter.

(1)Contains red pigment and blue pigment.

(2)Contains red pigment, blue pigment and yellow pigment.

(3) Contains red pigment, blue pigment, yellow pigment and purple pigment.

(4) Containing red pigment, blue pigment, yellow pigment, purple pigment and green pigment.

(5) Containing red pigment, blue pigment, yellow pigment and green pigment.

(6) Containing red pigment, blue pigment and green pigment.

(7) Contains yellow pigment and purple pigment.

(white pigment)

Examples of the white pigment include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silicon dioxide, talc, mica, aluminum hydroxide, calcium silicate, and silicic acid. Aluminum, hollow resin particles, zinc sulfide, etc. White pigments are preferably particles containing titanium atoms, and titanium oxide is even more preferred. Moreover, it is preferable that the white pigment is a particle having a refractive index of 2.10 or more with respect to light with a wavelength of 589 nm. The aforementioned refractive index is more preferably 2.10 to 3.00, and further preferably 2.50 to 2.75.

In addition, titanium oxide described in "Titanium Oxide: Physical Properties and Application Technology, Kiyono Gakusho, pp. 13~45, issued on June 25, 1991, Gihodo Publishing" can also be used as the white pigment.

The white pigment can be used not only as a single inorganic substance but also as particles compounded with other materials. For example, particles with pores or other materials inside, particles with a large number of inorganic particles attached to the core particles, and core-shell composite particles composed of core particles including polymer particles and shell layers including inorganic nanoparticles are used. Better. As the above-mentioned core-shell composite particles composed of core particles including polymer particles and shell layers including inorganic nanoparticles, for example, the description in paragraphs 0012 to 0042 of Japanese Patent Application Laid-Open No. 2015-047520 can be referred to, and this content is incorporated. in this manual.

White pigments can also use hollow inorganic particles. Hollow inorganic particles are inorganic particles with a hollow structure inside. They refer to inorganic particles with a hollow structure surrounded by an outer shell. Examples of the hollow inorganic particles include those described in Japanese Patent Application Laid-Open No. 2011-075786, International Publication No. 2013/061621, Japanese Patent Application Publication No. 2015-164881, etc., the contents of which are incorporated into this specification. .

(black pigment)

The black pigment is not particularly limited, and known ones can be used. Examples include carbon black, titanium black, graphite, etc. Carbon black and titanium black are preferred, and titanium black is more preferred. Titanium black is black particles containing titanium atoms, preferably low-order titanium oxide or titanium oxynitride. Titanium black can modify the surface as needed for the purpose of improving dispersion and inhibiting aggregation. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide or zirconium oxide. In addition, treatment using a water-repellent substance as shown in Japanese Patent Application Laid-Open No. 2007-302836 can also be performed. Examples of the black pigment include colorimetric index (C.I.) pigment black 1, 7, and the like. The primary particle size and average primary particle size of each particle of titanium black Whichever one is smaller is better. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silicon dioxide particles and in which the content ratio of Si atoms to Ti atoms in the dispersion is adjusted to a range of 0.20 to 0.50. Regarding the above-mentioned dispersion, please refer to the description in paragraphs 0020 to 0105 of Japanese Patent Application Laid-Open No. 2012-169556, and this content is incorporated into this specification. Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (trade name: Mitsubishi Materials Corporation), Tilack D (trade name: Ako Kasei Co., Ltd.) etc. In addition, perylene black (Lumogen Black FK4280, etc.) described in paragraphs 0016 to 0020 of Japanese Patent Application Publication No. 2017-226821 can be used.

Furthermore, in the present invention, an organic black colorant can also be used. The organic black colorant can be a pigment or a dye, with pigments being preferred. Examples of the organic black colorant include dibenzofuranone compounds, methimine compounds, perylene compounds, azo compounds, and the like, with dibenzofuranone compounds and perylene compounds being preferred. Examples of the dibenzofuranone compound include compounds described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, Japanese Patent Application Publication No. 2012-515234, etc., for example, it can be used as a compound manufactured by BASF Corporation "Irgaphor Black". Examples of the perylene compound include C.I. Pigment Black 31, 32, and the like. Examples of the methimine compound include those described in Japanese Patent Application Laid-Open No. 01-170601, Japanese Patent Application Laid-Open No. 02-034664, etc., for example, "CHROMO" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd. FINE BLACK A1103".

(Near infrared absorbing pigment)

Near-infrared absorbing pigments are preferably organic pigments. In addition, it is preferable that the near-infrared absorbing pigment has a maximum absorption wavelength in a range between a wavelength exceeding 700 nm and a wavelength of 1400 nm or less. In addition, the maximum absorption wavelength of the near-infrared absorbing pigment is more preferably 1,200 nm or less, further preferably 1,000 nm or less, and particularly preferably 950 nm or less. In the near-infrared absorbing pigment, the ratio of the absorbance A ₅₅₀ at a wavelength of 550 nm to the absorbance A _max at the maximum absorption wavelength, that is, A ₅₅₀ /A _max , is preferably 0.1 or less, more preferably 0.05 or less, and furthermore 0.03 or less. Better, and below 0.02 is particularly good. The lower limit is not particularly limited, and may be, for example, 0.0001 or more, or 0.0005 or more. If the above-mentioned absorbance ratio is within the above range, the near-infrared absorbing pigment can be excellent in visible light transparency and near-infrared shielding properties. In the present invention, the maximum absorption wavelength of the near-infrared absorbing pigment and the absorbance value at each wavelength are values determined from the absorption spectrum of a film formed using a photosensitive composition containing a near-infrared absorbing pigment.

The near-infrared absorbing pigment is not particularly limited, and examples thereof include pyrrolopyrrole compounds, fluorine compounds, oxocyanine compounds, squaraine compounds, cyanine compounds, ketonium compounds, phthalocyanine compounds, naphthalocyanine compounds, and pyrans The onium compound, the azulenium compound, the indigo compound and the pyrrolemethane compound are preferably at least one selected from the group consisting of pyrrolopyrrole compounds, squaryl cyanine compounds, cyanine compounds, phthalocyanine compounds and naphthalocyanine compounds, and the pyrrolopyrrole compound A squaraine compound is further preferred, and a pyrrolopyrrole compound is particularly preferred.

化合物、吡咯并吡唑次甲基偶氮化合物、

化合物、酞青化合物、苯并哌喃化合物、靛藍化合物、吡咯甲川化合物。又，亦能夠使用日本特開2012-158649號公 報中所記載之噻唑化合物、日本特開2011-184493號公報中所記載之偶氮化合物、日本特開2011-145540號公報中所記載之偶氮化合物。又，作為黃色染料，亦能夠使用日本特開2013-054339號公報的0011~0034段中所記載之喹啉黃(quinophthalone)化合物、日本特開2014-026228號公報的0013~0058段中所記載之喹啉黃化合物等。又，從提高耐熱性的觀點考慮，作為黃色染料，亦能夠較佳地使用日本特開2019-073695號公報、日本特開2019-073696號公報、日本特開2019-073697號公報、日本特開2019-073698號公報中所記載之次甲基化合物。作為近紅外線吸收染料，可列舉吡咯并吡咯化合物、芮化合物、氧雜菁化合物、方酸菁化合物、花青化合物、克酮鎓化合物、酞青化合物、萘酞青化合物、吡喃鎓化合物、薁鎓化合物、靛藍化合物及吡咯甲川化合物。又，亦能夠使用日本特開2017-197437號公報中所記載之方酸菁化合物、國際公開第2017/213047號的0090~0107段中所記載之方酸菁化合物、日本特開2018-054760號公報的0019~0075段中所記載之含有吡咯環之化合物、日本特開2018-040955號公報的0078~0082段中所記載之含有吡咯環之化合物、日本特開2018-002773號公報的0043~0069段中所記載之含有吡咯環之化合物、日本特開2018-041047號公報的0024~0086段中所記載之在醯胺基α位具有芳香環之方酸菁化合物、日本特開2017-179131號公報中所記載之醯胺基連結型方酸菁化合物、日本特開2017-141215號公報中所記載之具有吡咯雙型方酸菁骨架或克酮鎓骨架之化合物、日本特開2017-082029號公報中所記載之二氫咔唑雙型的方酸菁化合物、日本特開2017-068120號公報的0027~0114段中所記載之非對稱型 的化合物、日本特開2017-067963號公報中所記載之含有吡咯環之化合物(咔唑型)、日本專利第6251530號公報中所記載之酞青化合物等。 In the present invention, the photosensitive composition can contain a dye. The dye is not particularly limited, and known dyes can be used. The dye may be a colored dye or a near-infrared absorbing dye. Examples of the color dye include pyrazole azo compounds, anilinoazo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxocyanine compounds, and pyrazotriazole azo compounds. Compounds, pyridone azo compounds, cyanine compounds, thiophene

Compounds, pyrrolopyrazole methine azo compounds,

Compounds, phthalocyanine compounds, benzopyran compounds, indigo compounds, pyrromethene compounds. Furthermore, the thiazole compound described in Japanese Patent Application Laid-Open No. 2012-158649, the azo compound described in Japanese Patent Application Laid-Open No. 2011-184493, and the azo compound described in Japanese Patent Application Laid-Open No. 2011-145540 can also be used. compound. In addition, as the yellow dye, the quinophthalone compound described in paragraphs 0011 to 0034 of Japanese Patent Application Laid-Open No. 2013-054339, and the quinophthalone compound described in paragraphs 0013 to 0058 of Japanese Patent Application Laid-Open No. 2014-026228 can also be used. Quinoline yellow compounds, etc. In addition, from the viewpoint of improving heat resistance, as the yellow dye, Japanese Patent Application Laid-Open Nos. 2019-073695, Japanese Patent Application Laid-Open Nos. 2019-073696, Japanese Patent Application Laid-Open Nos. 2019-073697, and Japanese Patent Application Laid-Open Nos. The methine compound described in Publication No. 2019-073698. Examples of near-infrared absorbing dyes include pyrrolopyrrole compounds, fluorine compounds, oxocyanine compounds, squaraine compounds, cyanine compounds, ketonium compounds, phthalocyanine compounds, naphthalocyanine compounds, pyranium compounds, and azulene compounds Onium compounds, indigo compounds and pyrromethene compounds. In addition, the squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-197437, the squarylium compounds described in paragraphs 0090 to 0107 of International Publication No. 2017/213047, and Japanese Patent Application Laid-Open No. 2018-054760 can also be used. Compounds containing a pyrrole ring described in paragraphs 0019 to 0075 of the publication, compounds containing a pyrrole ring described in paragraphs 0078 to 0082 of Japanese Patent Application Laid-Open No. 2018-040955, compounds 0043 to 0043 of Japanese Patent Application Laid-Open No. 2018-002773 Compounds containing a pyrrole ring described in paragraph 0069, squarylium compounds having an aromatic ring at the α position of the amide group described in paragraphs 0024 to 0086 of Japanese Patent Application Laid-Open No. 2018-041047, Japanese Patent Application Laid-Open No. 2017-179131 The amide group-linked squarylium compound described in Japanese Patent Application Publication No. 2017-141215, the compound having a pyrrole bisquarylium skeleton or a squarium skeleton described in Japanese Patent Application Publication No. 2017-141215, Japanese Patent Application Publication No. 2017-082029 The dihydrocarbazole double-type squarylyanine compound described in Japanese Patent Application Publication No. 2017-068120, the asymmetric type compound described in paragraphs 0027 to 0114 of Japanese Patent Application Publication No. 2017-067963 Compounds containing a pyrrole ring (carbazole type) described, phthalocyanine compounds described in Japanese Patent No. 6251530, etc.

The content of the dye in the total solid content of the photosensitive composition is preferably 1% by mass or more, more preferably 5% by mass or more, and particularly preferably 10% by mass or more. The upper limit is not particularly limited, but it is preferably 70 mass% or less, more preferably 65 mass% or less, and still more preferably 60 mass% or less.

In addition, the content of the dye is preferably 5 to 50 parts by mass based on 100 parts by mass of the pigment. The upper limit is more preferably 45 parts by mass or less, and still more preferably 40 parts by mass or less. It is more preferable that the lower limit is 10 parts by mass or more, and it is further more preferable that it is 15 parts by mass or more.

Furthermore, in the present invention, the photosensitive composition may not actually contain a dye. In the present invention, when the photosensitive composition does not substantially contain a dye, in the present invention, the content of the dye in the total solid content of the photosensitive composition is preferably 0.1% by mass or less, more preferably 0.05% by mass or less, and not more. It is especially good if it contains.

<<<Pigment Derivatives>>>

In the present invention, the photosensitive composition contains a pigment derivative whose maximum molar absorption coefficient (εmax) in the wavelength range of 400 to 700 nm is 3000 L‧mol ^-1 ‧cm ^-1 or less. The composition contains a pigment derivative, so that the dispersibility of the pigment in the composition is improved. In addition, the pigment derivative has light-absorbing properties that satisfy the above requirements, thereby promoting the hardening of the composition in the deep portion of the pixel more than conventionally.

In the present invention, the εmax of the pigment derivative is more preferably 1000 L·mol ^-1 ·cm ^-1 or less, and further preferably 100 L·mol ^-1 ·cm ^-1 or less. This aspect makes it easy to further improve the adhesiveness with the support of the obtained film. The lower limit of εmax is, for example, 1L·mol ^-1 ·cm ^-1 or more, and may be 10L·mol ^-1 ·cm ^-1 or more. When there are two or more types of pigment derivatives, it is preferable that the εmax of at least one of them is 1000L‧mol ^-1 ‧cm ^-1 or less, and the εmax of all types is preferably 1000L‧mol ^-1 ‧cm ^-1 or less. In the present invention, the value of the molar absorption coefficient of the pigment derivative is a value measured by the method described in the Examples described below.

In the present invention, it is also preferred that the pigment derivative satisfies any of the following spectral characteristics (a) to (d).

(a) The maximum value of the molar absorption coefficient in the range of wavelengths exceeding 700nm to 750nm or less is preferably 3000L‧mol ^-1 ‧cm ^-1 or less, more preferably 1000L‧mol ^-1 ‧cm ^-1 or less, and 100L ‧mol ^-1 ‧cm ^-1 or less is more preferred.

(b) The maximum value of the molar absorption coefficient in the range of wavelengths exceeding 750nm to 800nm or less is preferably 3000L‧mol ^-1 ‧cm ^-1 or less, more preferably 1000L‧mol ^-1 ‧cm ^-1 or less, and 100L ‧mol ^-1 ‧cm ^-1 or less is more preferred.

(c) The maximum value of the molar absorption coefficient in the range of wavelengths exceeding 800nm to 850nm or less is preferably 3000L‧mol ^-1 ‧cm ^-1 or less, more preferably 1000L‧mol ^-1 ‧cm ^-1 or less, and 100L ‧mol ^-1 ‧cm ^-1 or less is more preferred.

(d) The maximum value of the molar absorption coefficient in the range of wavelengths exceeding 850nm to 900nm or less is preferably 3000L‧mol ^-1 ‧cm ^-1 or less, more preferably 1000L‧mol ^-1 ‧cm ^-1 or less, and 100L ‧mol ^-1 ‧cm ^-1 or less is more preferred.

環、 嘧啶環、噠

環、喹啉環、異喹啉環、喹噁啉環、喹唑啉環、苯并咪唑環、苯并吡唑環、苯并噁唑環、苯并噻唑環、苯并三唑環、吲哚環、異吲哚環、三

環、吡咯環、咔唑環、苯并咪唑啉酮環、鄰苯二甲醯亞胺環、酞青環、蒽醌環、二氧代吡咯并吡咯環、異吲哚啉酮環、異吲哚啉環及喹吖酮環中之芳香族環或包含該等芳香族環之稠環等為較佳。上述稠環整體可以為芳香族環，亦可以為非芳香族環，芳香族環為較佳。 In the present invention, it is preferred that the pigment derivative contains an aromatic ring. The aromatic ring may be an aromatic hydrocarbon ring or an aromatic heterocyclic ring. In addition, the aromatic ring may be a single ring or a condensed ring. Specifically, the aromatic ring is selected from the group consisting of benzene ring, naphthalene ring, fluorine ring, perylene ring, imidazole ring, pyrazole ring, oxazole ring, thiazole ring, imidazoline ring, pyridine ring, triazole ring, and imidazoline ring , pipe

ring, pyrimidine ring, da

Ring, quinoline ring, isoquinoline ring, quinoxaline ring, quinazoline ring, benzimidazole ring, benzopyrazole ring, benzoxazole ring, benzothiazole ring, benzotriazole ring, indole Indole ring, isoindole ring, three

Ring, pyrrole ring, carbazole ring, benzimidazolinone ring, phthaloimine ring, phthalocyanine ring, anthraquinone ring, dioxopyrrolopyrrole ring, isoindolinone ring, isoindoline Aromatic rings in the indoline ring and quinacridone ring or fused rings containing these aromatic rings are preferred. The entire fused ring may be an aromatic ring or a non-aromatic ring, with an aromatic ring being preferred.

In addition, the pigment derivative may have only one aromatic ring or condensed ring as described above, but the reason why the pigment adsorption property is improved through ππ interaction due to the more aromatic rings, thereby making it easier to improve the storage stability of the composition, Having 2 or more of these rings is preferred.

The aromatic ring or condensed ring may further have a substituent. Examples of the substituent include the substituent T described below.

環為進一步較佳。 The pigment derivative preferably has a structure that easily interacts with the pigment contained in the photosensitive composition or a structure similar to the pigment. With this aspect, the dispersibility of the pigment in the photosensitive composition can be improved, and the storage stability of the photosensitive composition can be further improved. In addition, since the effect of the present invention can be more easily obtained, the pigment derivative preferably has an aromatic heterocyclic ring, more preferably contains a nitrogen-containing aromatic heterocyclic ring, and more preferably contains a tricyclic aromatic heterocyclic ring.

Ring is further preferred.

環作為芳香族環之由下述式(A1)表示之基團為特佳。 Furthermore, in the present invention, the pigment derivative has three

The aromatic ring is particularly preferably a group represented by the following formula (A1).

In the formula, * represents a bond, Ya ¹ and Ya ² independently represent -N(Ra ¹ )- or -O-, Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and B ¹ and B ² each independently represent a hydrogen atom or a substituent.

In the formula (A1), Ya ¹ and Ya ² each independently represent -N(Ra ¹ )- or -O-. Since the effect of the present invention can be more easily obtained, -N(Ra ¹ )- is relatively good.

Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

The carbon number of the alkyl group represented by Ra ¹ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described below.

The carbon number of the alkenyl group represented by Ra ¹ is preferably 2 to 20, more preferably 2 to 12, and particularly preferably 2 to 8. The alkenyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkenyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described below.

The carbon number of the alkynyl group represented by Ra ¹ is preferably 2 to 40, more preferably 2 to 30, and particularly preferably 2 to 25. The alkynyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkynyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described below.

The carbon number of the aryl group represented by Ra ¹ is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described below.

In formula (A1), B ¹ and B ² each independently represent a hydrogen atom or a substituent. Examples of the substituent include the substituent T described below. An alkyl group, an aryl group, and a heterocyclic group are preferred, and an aryl group and a heterocyclic group are more preferred. This is because the storage stability of the composition can be easily improved by improving pigment adsorption. It is considered that an aryl group is further preferred. In addition, it is also preferred that at least one of B ¹ and B ² be a heterocyclic group since color unevenness can be more easily suppressed. As the heterocyclic group, a nitrogen-containing heterocyclic group is preferred, and a benzimidazolone group is more preferred.

The alkyl group, aryl group and heterocyclic group represented by B ¹ and B ² may further have a substituent. Further substituents include an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), a fluoroalkyl group (preferably a fluoroalkyl group having 1 to 30 carbon atoms), and an alkenyl group (preferably an alkyl group having 1 to 30 carbon atoms). Alkenyl group with 2 to 30 carbon atoms), alkynyl group (preferably an alkynyl group with 2 to 30 carbon atoms), aryl group (preferably an aryl group with 6 to 30 carbon atoms), amine group (preferably an alkynyl group with 0 to 30 carbon atoms) 30 amino group), alkoxy group (preferably an alkoxy group with 1 to 30 carbon atoms), aryloxy group (preferably an aryloxy group with 6 to 30 carbon atoms), heteroaryloxy group, acyl group ( Preferably it is a acyl group having 1 to 30 carbon atoms), an alkoxycarbonyl group (preferably it is an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably it is an aryloxycarbonyl group having 7 to 30 carbon atoms) , acyloxy group (preferably a acyloxy group with 2 to 30 carbon atoms), amide group (preferably a amide group with 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably a amide group with 2 carbon atoms) ~30 alkoxycarbonylamino group), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group with 7~30 carbon atoms), amine sulfonyl group (preferably an amine with 0~30 carbon atoms) sulfonyl group), aminoformyl group (preferably an aminoformyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an alkylthio group having 1 to 30 carbon atoms) Arylthio group with 6 to 30 carbon atoms), heteroarylthio group (preferably heteroarylthio group with 1 to 30 carbon atoms), alkylsulfonyl group (preferably alkylsulfonyl group with 1 to 30 carbon atoms) group), arylsulfonyl group (preferably an arylsulfonyl group with 6 to 30 carbon atoms), heteroarylsulfonyl group (preferably a heteroarylsulfonyl group with 1 to 30 carbon atoms), alkyl Alkyl sulfinyl group (preferably alkyl sulfinyl group having 1 to 30 carbon atoms), aryl sulfinyl group (preferably aryl sulfinyl group having 6 to 30 carbon atoms), heteroaryl group Sulfinyl group (preferably heteroarylsulfenyl group having 1 to 30 carbon atoms), ureido group (preferably ureido group having 1 to 30 carbon atoms), phosphate amide group (preferably having 1 carbon number) ~30 phosphate amide group), hydroxyl group, carboxyl group, sulfonic acid group, phosphate group, mercapto group, halogen atom, cyano group, alkyl sulfinyl group, aryl sulfinyl group, hydrazine group, imine group, etc., alkyl group , fluoroalkyl group, alkoxy group, amine group, halogen atom, alkenyl group, hydroxyl group, alkoxycarbonyl group, acyloxy group, amide group and nitro group are preferred.

It is also preferred that the alkyl group, aryl group and heterocyclic group represented by B ¹ and B ² do not have the above-mentioned further substituents.

(Substituent T)

Examples of the substituent T include a halogen atom, a cyano group, a nitro group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, -ORt ¹ , -CORt ¹ , -COORt ¹ , -OCORt ¹ , -NRt ¹ Rt ² , -NHCORt ¹ , -CONRt ¹ Rt ² , -NHCONRt ¹ Rt ² , -NHCOORt ¹ , -SRt ¹ , -SO ₂ Rt ¹ , -SO ₂ ORt ¹ , -NHSO ₂ Rt ¹ or -SO ₂ NRt ^{1Rt2 .} Rt ¹ and Rt ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. Rt ¹ and Rt ² may bond to form a ring.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

The carbon number of the alkyl group is preferably 1 to 30, more preferably 1 to 15, and still more preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred.

The carbon number of the alkenyl group is preferably 2 to 30, more preferably 2 to 12, and particularly preferably 2 to 8. The alkenyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred.

The carbon number of the alkynyl group is preferably 2 to 30, and more preferably 2 to 25. The alkynyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred.

The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12.

The heterocyclyl group may be a single ring or a condensed ring. The heterocyclyl group is preferably a single ring or a fused ring with a fusion number of 2 to 4. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclyl group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of carbon atoms in the ring constituting the heterocyclyl group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12.

The alkyl group, alkenyl group, alkynyl group, aryl group and heterocyclic group may have a substituent or may be unsubstituted. Examples of the substituent include the substituents described for the substituent T mentioned above.

Examples of the pigment derivative of the present invention include aromatic rings, and specific examples of the group represented by the above formula (A1) include groups with the following structures. In the following structural formula, Me represents a methyl group.

[Chemical formula 5]

[Chemical formula 6]

[Chemical Formula 7]

[Chemical formula 8]

In the present invention, the pigment derivative preferably contains at least one group selected from acidic groups and basic groups.

It is preferable that the acid group is at least one selected from the group consisting of carboxyl group, sulfo group, phosphoric acid group and their salts, and more preferably at least one selected from the group consisting of carboxyl group, sulfo group and their salts. Examples of atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, and pyridinium ions. , phosphonium ions, etc.

The basic group is preferably at least one selected from the group consisting of an amine group, a pyridyl group and its salts, an ammonium group salt, and a phthaloimide methyl group, and is preferably selected from the group consisting of an amine group, a salt of an amine group, and a salt of an ammonium group. At least one of them is more preferred, and an amine group or a salt of an amine group is more preferred. Examples of the amino group include -NH ₂ , dialkylamino group, alkylarylamine group, diarylamine group, cyclic amino group, and the like. The dialkylamino group, alkylarylamine group, diarylamine group, and cyclic amino group may further have a substituent. Examples of the substituent include the substituent T described below. Examples of atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, phenoxide ions, and the like.

In the present invention, the pigment derivative having an aromatic ring is preferably a compound represented by the following formula (1) (hereinafter, also referred to as compound (1)).

A ¹ -L ¹ -Z ¹ ......(1)

In formula (1), A ¹ represents a group containing an aromatic ring, L ¹ represents a single bond or a divalent connecting group, and Z ¹ represents an acidic group or a basic group.

In addition, since it is easier to further suppress color unevenness, Z ¹ is preferably a basic group, and more preferably a group represented by the following formula (Z1).

In the formula, * represents a bond, Yz ¹ represents -N(Ry ¹ )- or -O-, Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and Lz ¹ represents a divalent linking group. , Rz ¹ and Rz ² independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, Rz ¹ and Rz ² can be bonded through a divalent group to form a ring, m represents an integer from 1 to 5 .

In the formula (1), the aromatic ring included in A ¹ is preferably the same as the aromatic ring mentioned above if it is included in the pigment derivative. A ¹ is preferably a group represented by the above formula (A1). Specific examples of A ¹ include specific examples of the group represented by the above formula (A1).

In formula (1), L ¹ represents a single bond or a divalent linking group, and a divalent linking group is preferred. Examples of the divalent linking group represented by L ¹ include an alkylene group, an aryl group, a heterocyclic group, -O-, -N(R ^L1 )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and combinations thereof. The carbon number of the alkylene group is preferably 1 to 30, more preferably 1 to 15, further preferably 1 to 8, and particularly preferably 1 to 5. The alkylene group may be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is particularly preferred. The carbon number of the aryl group is preferably 6 to 30, and more preferably 6 to 15. An aryl group is preferably a phenylene group. R ^L1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ^L1 are the same as those described as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

As the divalent linking group represented by L ¹ , a group represented by the following formula (L1) is preferred.

-L ^1A -L ^1B -L ^1C -......(L1)

In the formula, L ^1A and L ^1C independently represent -O-, -N(R ^L1 )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH- or -SO ₂ -, L ^1B represents a single bond or a divalent linking group.

Examples of the divalent connecting group represented by L ^1B include an alkylene group and an aryl group. The alkylene group and the aryl group are connected via a single bond or -O-, -N(R ^L1 )-, -NHCO- , -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and groups composed of these combinations are bonded together, and alkylene groups are bonded to each other or The aryl groups are connected to each other via -O-, -N(R ^L1 )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and this Groups composed of groups bonded together, etc.

Specific examples of L ¹ include groups having the following structures.

In the case where Z ¹ in formula (1) is an acid group, the acid group is preferably at least one selected from the group consisting of carboxyl group, sulfo group, phosphate group and their salts, and is preferably selected from the group consisting of carboxyl group, sulfo group and their salts. At least one is better. Examples of atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, and pyridinium ions. , phosphonium ions, etc.

When Z ¹ in formula (1) is a basic group, as described above, Z ¹ is preferably a group represented by the following formula (Z1).

[Chemical formula 11]

In the formula, * represents a bond, Yz ¹ represents -N(Ry ¹ )- or -O-, Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and Lz ¹ represents a divalent linking group. , Rz ¹ and Rz ² independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, Rz ¹ and Rz ² can be bonded through a divalent group to form a ring, m represents an integer from 1 to 5 .

In the formula (Z1), Yz ¹ represents -N(Ry ¹ )- or -O-, and since durability is easily improved, -N(Ry ¹ )- is preferred.

Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ry ¹ are the same as those described as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

In the formula (Z1), examples of the divalent linking group represented by Lz ¹ include an alkylene group, an aryl group, a heterocyclic group, -O-, -N(R ^L1 )-, -NHCO-, and -CONH. -, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and combinations thereof, with alkylene groups being preferred. The carbon number of the alkylene group is preferably 1 to 30, more preferably 1 to 15, further preferably 1 to 8, and particularly preferably 1 to 5. The alkylene group may be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is particularly preferred.

In the formula (Z1), Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group. An alkyl group or an aryl group is preferred, and an alkyl group is more preferred. The carbon number of the alkyl group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and 1 or 2 is particularly preferred. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The carbon number of the alkenyl group is preferably 2 to 10, more preferably 2 to 8, and particularly preferably 2 to 5. The alkenyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The carbon number of the alkynyl group is preferably 2 to 10, more preferably 2 to 8, and particularly preferably 2 to 5. The alkynyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12.

In formula (Z1), Rz ¹ and Rz ² may be bonded via a divalent group to form a ring. Examples of the divalent group include -CH ₂ -, -O-, and -SO ₂ -. Specific examples of the ring formed by Rz ¹ and Rz ² via a divalent group include the following.

In formula (Z1), m represents an integer of 1 to 5, 1 to 4 is preferred, 1 to 3 is more preferred, 2 to 3 is further preferred, and 2 is particularly preferred.

In formula (1), Z ¹ is preferably a group represented by the following formula (Z2).

In the formula, * represents a bond, Yz ² and Yz ³ independently represent -N(Ry ² )- or -O-, Ry ² represents a hydrogen atom, alkyl group, alkenyl group, alkynyl group or aryl group, Lz ² and Lz ³ each independently represent a divalent linking group, Rz ³ ~ Rz ⁶ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, Rz ³ and Rz ⁴ and Rz ⁵ and Rz ⁶ can respectively They are bonded via a divalent group to form a ring.

The meanings of Yz ² and Yz ³ in the formula (Z2) are the same as the meaning of Yz ¹ in the formula (Z1), and the preferred ranges are also the same. Ry ² represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ry ² are the same as those explained as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra1.

The meanings of Lz ² and Lz ³ in the formula (Z2) are the same as the meaning of Lz ¹ in the formula (Z1), and the preferred ranges are also the same. The meanings of Rz ³ to Rz ⁶ in the formula (Z2) are the same as those of Rz ¹ and Rz ² in the formula (Z1), and the preferred ranges are also the same.

Specific examples of Z ¹ include groups having the following structures. In the following structural formula, Ph represents a phenyl group.

[Chemical formula 14]

In the present invention, the compound (1) used in the photosensitive composition is preferably a compound represented by the following formula (2). By using such a compound, the effects of the present invention can be further significantly obtained.

A ¹ -X ¹ -L ² -X ² -Z ¹ ......(2)

In formula (2), A ¹ represents a group containing an aromatic ring, and X ¹ and X ² each independently represent a single bond -O-, -N(R ¹ )-, -NHCO-, -CONH-, -OCO. -, -COO-, -CO-, -SO ₂ NH- or -SO ₂ -, R ¹ represents a hydrogen atom, alkyl group, alkenyl group, alkynyl group or aryl group, L ² represents a single bond or a divalent connecting group , Z ¹ represents a group represented by the above formula (Z1).

A ¹ and Z ¹ in formula (2) have the same meaning as A ¹ and Z ¹ in formula (1), and the preferred ranges are also the same.

X ¹ and X ² in the formula (2) independently represent a single bond, -O-, -N(R ¹ )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, - SO ₂ NH- or -SO ₂ -, -O-, -N(R ¹ )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH- or -SO ₂ - is better. R ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ¹ are the same as those described as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

L ² in the formula (2) represents a single bond or a divalent linking group. Examples of the divalent connecting group represented by L ² include an alkylene group and an aryl group. The alkylene group and the aryl group are connected via a single bond or -O-, -N(R ² )-, -NHCO- , -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and groups composed of these combinations are bonded together, and alkylene groups are bonded to each other or The aryl groups are connected to each other via -O-, -N(R ² )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and this Groups composed of groups bonded together, etc. R ² represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ² are the same as those explained as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

Specific examples of compound (1) are listed below. In the following table, the symbols described in the columns of the structure of A ¹ , the structure of L ¹ , and the structure of Z ¹ respectively represent specific examples of A ¹ (that is, specific examples of the group represented by the above formula (A1)). ), specific examples of L ¹ , and specific examples of Z ¹ .

The content of the pigment derivative in the total solid content of the photosensitive composition is preferably 0.3 to 20% by mass. A lower limit of 0.6 mass or more is more preferable, and a lower limit of 0.9 mass or more is still more preferable. It is more preferable that the upper limit is 15 mass % or less, further preferably 12.5 mass % or less, and particularly preferably 10 mass % or less.

In addition, the mass ratio of the content of the pigment derivative in the total solid content of the composition to the content of the pigment in the total solid content of the same composition is preferably 3:97 to 20:80. The upper limit of the mass ratio is more preferably 15:85 or less, and still more preferably 13:87 or less. The lower limit of the mass ratio is more preferably 5:95 or more, and more preferably 8:92 or more. In other words, the content of the pigment derivative is preferably 3 to 25 parts by mass relative to 100 parts by mass of the pigment. The upper limit is more preferably 17.6 parts by mass or less, and still more preferably 14.9 mass % or less. The lower limit is 5.3 quality or more, which is better, and 8.7 quality or more, which is still more preferable.

In addition, the total content of the pigment and the pigment derivative (pigment concentration) in the total solid content of the composition is preferably 25 to 65% by mass. It is more preferable that the lower limit is 30 mass % or more, further preferably 35 mass % or more, and particularly preferably 40 mass % or more. It is more preferable that the upper limit is 63 mass % or less, and it is further more preferable that it is 60 mass % or less.

In addition, the content of a certain solid component in the total solid content of the composition is substantially equal to the content of the solid component in the pixel formed by hardening the composition.

Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used in combination, the total amount is preferably within the above range.

In the present invention, the photosensitive composition may use together a pigment derivative with a maximum molar absorption coefficient (εmax) of 3000 L‧mol ^-1 ‧cm ^-1 or less in the wavelength range of 400 to 700 nm and an εmax of more than 3000L‧mol. ^-1 ‧cm ^-1 pigment derivatives are used. When these are used together, the content of the pigment derivative with εmax of 3000L‧mol ^-1 ‧cm ^-1 or less relative to all pigment derivatives is preferably 40 mass% or more, more preferably 60 mass% or more, and 80 mass% The above is further preferred.

<<Polymerizable compound>>

The pixels in the structure of the present invention preferably contain a polymerizable compound. As the polymerizable compound, a known compound capable of crosslinking by radicals, acid, or heat can be used. In the present invention, the polymerizable compound is preferably a compound having an ethylenically unsaturated bond group, for example. Examples of the ethylenically unsaturated bond group include a vinyl group, a (meth)allyl group, a (meth)acrylyl group, and the like. The polymerizable compound used in the present invention is preferably a radical polymerizable compound.

The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but a monomer is preferred. The molecular weight of the polymerizable compound is preferably 100 to 3,000. It is more preferable that the upper limit is 2,000 or less, and it is still more preferable that it is 1,500 or less. It is more preferable that the lower limit is 150 or more, and it is further more preferable that it is 250 or more.

The polymerizable compound is preferably a compound containing 3 or more ethylenically unsaturated bond groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond groups, and a compound containing 3 to 6 ethylenically unsaturated bond groups. compounds are further preferred. Furthermore, the polymerizable compound is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples of the polymerizable compound include paragraphs 0095 to 0108 of Japanese Patent Application Laid-Open No. 2009-288705, paragraph 0227 of Japanese Patent Application Laid-Open No. 2013-029760, paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970, and Paragraphs 0034 to 0038 of Japanese Patent Publication No. 2013-253224, Paragraph 0477 of Japanese Patent Publication No. 2012-208494, Japanese Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, and Japanese Patent No. 6031807 The compounds described are incorporated into this specification.

The polymerizable compound is dipenterythritol triacrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol tetraacrylate (commercially available as KAYARAD D- 320; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol Hexa(meth)acrylate (commercially available products are KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; manufactured by Shin Nakamura Chemical Co., Ltd.), and these (A Compounds having a structure in which the acrylyl group is bonded via ethylene glycol and/or propylene glycol residues (for example, SR454 and SR499 commercially available from SARTOMER Company, Inc.) are preferred. In addition, as the polymerizable compound, diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available product M-460; manufactured by Toagosei Co., Ltd.) and pentaerythritol tetraacrylate can also be used. (manufactured by Shin Nakamura Chemical Co., Ltd., NK ESTER A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (Nippon Kayaku Co. , Ltd.), ARONIX TO-2349 (Toagosei Co., Ltd.), NK OLIGO UA-7200 (Shin Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (Taisei Fine Chemical Co. , Ltd.), LIGHT ACRYLATE POB-A0 (KYOEISHA CHEMICAL Co., Ltd.), etc.

Furthermore, as the polymerizable compound, trimethylolpropane tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, and trimethylolpropane ethylene oxide-modified were used. Trifunctional (meth)acrylate compounds such as tri(meth)acrylate, ethylene oxide isocyanurate modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate are also preferred. Commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, and M-306. ,M-305,M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM -N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.), etc. .

For example, in the present invention, a compound having the following structure can be used as the polymerizable compound.

Moreover, in the present invention, as the polymerizable compound, a mixture of two compounds each having the following structure (the molar ratio of the left side and the right side is 7:3) can also be used.

As the polymerizable compound, a compound having an acid group can also be used. By using a polymerizable compound having an acid group, the polymerizable compound in the unexposed portion can be easily removed during development and can suppress Generation of development residue. Examples of the acidic group include a carboxyl group, a sulfonic acid group, a phosphate group, and the like, with a carboxyl group being preferred. Commercially available products of the polymerizable compound having an acid group include ARONIX M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like. The preferred acid value of the polymerizable compound having an acid group is 0.1 to 40 mgKOH/g, and more preferably 5 to 30 mgKOH/g. If the acid value of the polymerizable compound is 0.1 mgKOH/g or more, the solubility in the developer is good, and if it is 40 mgKOH/g or less, it is advantageous in terms of production or handling.

It is also preferred that the polymerizable compound is a compound having a caprolactone structure. Polymerizable compounds having a caprolactone structure are marketed as the KAYARAD DPCA series by NIPPON KAYAKU CO., Ltd., for example, and include DPCA-20, DPCA-30, DPCA-60, DPCA-120, and the like.

As the polymerizable compound, a polymerizable compound having an alkyloxy group can also be used. The polymerizable compound having an alkyloxy group is preferably a polymerizable compound having an ethyloxy group and/or a propyleneoxy group, and a polymerizable compound having an ethyloxy group is more preferred, and has 4 to 20 A 3- to 6-functional (meth)acrylate compound having an ethyloxy group is further preferred. Examples of commercially available polymerizable compounds having an alkyleneoxy group include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups, manufactured by Sartomer Company, Inc. KAYARAD TPA-330, isobutoxy trifunctional (meth)acrylate, etc.

As the polymerizable compound, a polymerizable compound having a fluorine skeleton can also be used. Examples of commercially available polymerizable compounds having a fluorine skeleton include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomer having a fluorine skeleton).

As the polymerizable compound, it is also preferred to use a compound that does not substantially contain environmental regulations substances such as toluene. Commercially available products of this type of compound include KAYARAD DPHA LT, KAYARAD DPEA-12LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.

Examples of polymerizable compounds include urethane acids described in Japanese Patent Publication No. 48-041708, Japanese Patent Publication No. 51-037193, Japanese Patent Publication No. 02-032293, and Japanese Patent Publication No. 02-016765. Ester acrylates or ethylene oxide-based compounds described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418 Backbone urethane compounds are also preferred. In addition, polymerizable compounds having an amino group structure or a thioether structure in the molecule described in Japanese Patent Application Laid-Open Nos. 63-277653, 63-260909, and 01-105238 are used. Also better. In addition, as the polymerizable compound, UA-7200 (manufactured by Shin Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, and UA-306I can also be used. , AH-600, T-600, AI-600, LINC-202UA (KYOEISHA CHEMICAL Co., Ltd.) and other commercially available products.

The content of the polymerizable compound in the total solid content of the photosensitive composition is preferably 0.1 to 50% by mass. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. It is more preferable that the upper limit is 45 mass % or less, and it is further more preferable that it is 40 mass % or less. The polymerizable compound may be used alone or in combination of two or more types. When two or more types are used in combination, it is preferable that the total of them is within the above range.

<<Oxime photopolymerization initiator>>

In the present invention, the photosensitive composition can contain an oxime-based photopolymerization initiator as a photopolymerization initiator. Examples of the oxime-based photopolymerization initiator include compounds having an oxime moiety in the molecule (oxime compound).

The oxime-based photopolymerization initiator used in the present invention is preferably a photoradical polymerization initiator. In addition, the oxime-based photopolymerization initiator is preferably a compound that is photosensitive to light from the ultraviolet region to the visible region. The oxime-based photopolymerization initiator is preferably a compound with a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and a compound with a maximum absorption wavelength in the wavelength range of 360 to 480 nm is more preferred. In addition, from the viewpoint of sensitivity, it is preferable that the Mohr absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is high, 1,000 to 300,000 is more preferable, 2,000 to 300,000 is further preferable, and 5,000 to 200,000 is particularly preferable. The molar absorption coefficient of an oxime compound can be measured using a known method. For example, it is preferable to measure with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.

Examples of the oxime-based photopolymerization initiator include compounds described in Japanese Patent Application Laid-Open No. 2001-233842, compounds described in Japanese Patent Application Laid-Open No. 2000-080068, and compounds described in Japanese Patent Application Laid-Open No. 2006-342166. Compounds described in J.C.S. Perkin II (1979, pp. 1653-1660), Compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995) , pp. 202-232), compounds described in Japanese Patent Application Publication No. 2000-066385, compounds described in Japanese Patent Application Publication No. 2000-080068, Japanese Patent Application Publication No. 2004-534797 Compounds described, compounds described in Japanese Patent Application Laid-Open No. 2006-342166, compounds described in Japanese Patent Application Publication No. 2017-019766, Japanese Patent No. 6065596 Compounds described in the publication, compounds described in International Publication No. 2015/152153, compounds described in International Publication No. 2017/051680, compounds described in Japanese Patent Application Publication No. 2017-198865, International Publication No. The compounds described in paragraphs 0025~0038 of No. 2017/164127, etc. Specific examples of the oxime-based photopolymerization initiator include 3-benzyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, and 3-propanol. Acetyloxyiminobutan-2-one, 2-acetyloxyiminopentan-3-one, 2-acetyloxyiminobutan-1-one, 2 -Benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxy Imino-1-phenylpropan-1-one, etc. Examples of commercially available products include IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, IRGACURE-OXE04 (the above, manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Tronly New Electronic Materials CO., LTD.), and Adeka Optomer N-1919 (photopolymerization initiator 2, manufactured by ADEKA Corporation and described in Japanese Patent Application Publication No. 2012-014052).

In addition, as the oxime-based photopolymerization initiator, it is also preferable to use an oxime compound that has no coloring properties or an oxime compound that is highly transparent and difficult to change color. Examples of commercially available products include ADEKAARKLS NCI-730, NCI-831, NCI-930 (above, manufactured by ADEKA Corporation), and the like.

In the present invention, as the oxime-based photopolymerization initiator, an oxime compound having a fluorine ring can also be used. Specific examples of the oxime compound having a fluorine ring include compounds described in Japanese Patent Application Laid-Open No. 2014-137466. Incorporate this information into this manual.

In the present invention, as the oxime-based photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include compounds described in Japanese Patent Application Publication No. 2010-262028 and Japanese Patent Application Publication No. 2014-500852. Compounds 24, 36 to 40, compound (C-3) described in Japanese Patent Application Laid-Open No. 2013-164471, etc. Incorporate this information into this manual.

In the present invention, as the oxime-based photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferred that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249 and paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466. , the compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA Corporation).

In the present invention, as the oxime-based photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

In the present invention, as the oxime-based photopolymerization initiator, a bifunctional or trifunctional or higher-functional oxime-based photopolymerization initiator can also be used. By using this oxime-based photopolymerization initiator, two or more radicals are generated from one molecule of the oxime-based photopolymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used as an oxime-based photopolymerization initiator, the crystallinity is reduced and the solubility in solvents and the like is improved, making it difficult to precipitate over time, thereby improving the stability of the photosensitive composition over time. Specific examples of the bifunctional or trifunctional or higher oxime-based photopolymerization initiator include Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No. 2015/004565, and Japanese Patent Publication No. The dimer of the oxime compound described in paragraphs 0407 to 0412 of Publication No. 2016-532675, the dimer of the oxime compound described in paragraphs 0039 to 0055 of International Publication No. 2017/033680, and the compound (E) described in Japanese Patent Publication No. 2013-522445 and compound (G), Cmpd1~7 described in International Publication No. 2016/034963, Japanese Patent Publication No. 2017-523465 The oxime-based photopolymerization initiator described in paragraph 0007, the oxime-based photopolymerization initiator described in paragraphs 0020 to 0033 of Japanese Patent Application Laid-Open No. 2017-167399, and the 0017 to Japanese Patent Application Laid-Open No. 2017-151342 The photopolymerization initiator (A) described in paragraph 0026, etc.

Specific examples of oxime-based photopolymerization initiators preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical formula 19]

The content of the oxime-based photopolymerization initiator in the total solid content of the photosensitive composition is preferably 0.1 to 30% by mass. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. It is more preferable that the upper limit is 20 mass % or less, and it is further more preferable that it is 15 mass % or less. In the present invention, only one type of oxime-based photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

<<Other photopolymerization initiators>>

骨架之化合物、具有噁二唑骨架 之化合物等)、醯基膦化合物、六芳基聯咪唑、有機過氧化物、硫代化合物、酮化合物、芳香族鎓鹽、α-羥基酮化合物、α-胺基酮化合物等。從曝光靈敏度的觀點而言，其他光自由基聚合起始劑係三鹵甲基三

(trihalo methyl triazine)化合物、苄基二甲基縮酮化合物、α-羥基酮化合物、α-胺基酮化合物、醯基膦化合物、氧化膦化合物、茂金屬化合物、三芳基咪唑二聚物、鎓化合物、苯并噻唑化合物、二苯甲酮化合物、苯乙酮化合物、環戊二烯-苯-鐵錯合物、鹵甲基

二唑化合物及3-芳基取代香豆素化合物為較佳，選自α-羥基酮化合物、α-胺基酮化合物及醯基膦化合物中之化合物為更佳。 In the present invention, the photosensitive composition can contain a photopolymerization initiator (other photopolymerization initiator) other than an oxime-based photopolymerization initiator as a photopolymerization initiator. As other photopolymerization initiators, halogenated hydrocarbon derivatives (for example, having three

skeleton compounds, compounds with oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α- Amino ketone compounds, etc. From the perspective of exposure sensitivity, other photoradical polymerization initiators are trihalomethyl tri

(trihalo methyl triazine) compound, benzyldimethyl ketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, triarylimidazole dimer, onium Compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complex, halomethyl

Oxidazole compounds and 3-aryl-substituted coumarin compounds are preferred, and compounds selected from α-hydroxyketone compounds, α-aminoketone compounds and acylphosphine compounds are more preferred.

Examples of commercially available α-hydroxyketone compounds include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (the above are manufactured by BASF Corporation). Examples of commercially available α-aminoketone compounds include IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (the above are publicly known products made by BASF). Examples of commercially available acylphosphine compounds include IRGACURE-819, DAROCUR-TPO (the above are publicly available products from BASF), and the like.

In the present invention, when the photosensitive composition contains other photopolymerization initiators, the content of the other photopolymerization initiators in the total solid content of the composition is preferably 0.1 to 30% by mass. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. It is more preferable that the upper limit is 20 mass % or less, and it is further more preferable that it is 15 mass % or less.

In addition, the content of other photopolymerization initiators is preferably 1 to 100 parts by mass relative to 100 parts by mass of the oxime-based photopolymerization initiator. The upper limit is more preferably 90 parts by mass or less, and still more preferably 80 parts by mass or less. It is more preferable that the lower limit is 5 parts by mass or more, and it is further more preferable that it is 10 parts by mass or more.

Furthermore, in the present invention, the total content of the oxime-based initiator and other photopolymerization initiators in the total solid content of the photosensitive composition is preferably 0.1 to 30% by mass. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. It is more preferable that the upper limit is 20 mass % or less, and it is further more preferable that it is 15 mass % or less.

In the present invention, it is also preferred that the photosensitive composition contains substantially no other photopolymerization initiator. This aspect makes it easier to form a film with better adhesion. In the present invention, when the photosensitive composition does not substantially contain other photopolymerization initiators, the content of other photopolymerization initiators in the total solid content of the composition is preferably 0.05 mass % or less, and 0.01 mass % or less. It is better, and it is especially better if it does not contain.

<<Resin>>

In the present invention, the photosensitive composition contains resin. The resin is blended, for example, for the purpose of dispersing particles such as pigments in a photosensitive composition or as a binder. In addition, resins mainly used to disperse particles such as pigments are also called dispersants. However, these uses of the resin are examples, and the resin can be used for purposes other than these uses.

The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. It is more preferable that the upper limit is 1,000,000 or less, and it is further more preferable that it is 500,000 or less. It is more preferable that the lower limit is 4,000 or more, and it is further more preferable that it is 5,000 or more.

Examples of the resin include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polystyrene resin, polyetherstyrene resin, polyphenylene resin, and polyarylene ether. Phosphine oxide resin, polyimide resin, polyamide imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, etc. One type of these resins may be used alone, or two or more types may be mixed and used. In addition, 0041~ of Japanese Patent Application Laid-Open No. 2017-206689 can also be used. The resin described in paragraph 0060, and the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Laid-Open No. 2018-010856.

In the present invention, it is preferable to use a resin having an acid group as the resin. With this aspect, the developability of the photosensitive composition can be improved, and pixels excellent in rectangularity can be easily formed. Examples of the acidic group include a carboxyl group, a phosphate group, a sulfo group, a phenolic hydroxyl group, and the like, with a carboxyl group being preferred. A resin having an acid group can be used as an alkali-soluble resin, for example.

It is preferred that the resin having an acidic group contains repeating units having an acidic group on the side chain, and it is more preferred that the resin contains 5 to 70 mol% of repeating units having an acidic group on the side chain among all the repeating units of the resin. The upper limit of the content of the repeating unit having an acid group on the side chain is more preferably 50 mol% or less, and particularly preferably 30 mol% or less. The lower limit of the content of the repeating unit having an acid group in the side chain is more preferably 10 mol% or more, and particularly preferably 20 mol% or more.

As the resin having an acid group, for example, the ether dimer described in Japanese Patent Application Laid-Open No. 2013-029760 and the like can also be used. Incorporate this information into this manual.

The resin used in the present invention preferably contains a repeating unit derived from a compound represented by the following formula (X).

In the formula (X), R ₁ represents a hydrogen atom or a methyl group, R ₂ represents an alkylene group having 2 to 10 carbon atoms, and R ₃ represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms that may contain a benzene ring. n represents an integer from 1 to 15.

Regarding the resin having an acid group, please refer to paragraphs 0558 to 0571 of Japanese Patent Application Publication No. 2012-208494 (corresponding to paragraph 0685 of US Patent Application Publication No. 2012/0235099). to paragraphs 0700) and paragraphs 0076 to 0099 of Japanese Patent Application Laid-Open No. 2012-198408, these contents are incorporated into this specification. In addition, commercially available resins having acidic groups can also be used.

The acid value of the resin with acid groups is preferably 30~500mgKOH/g. It is more preferable that the lower limit is 50 mgKOH/g or more, and it is further more preferable that it is 70 mgKOH/g or more. The upper limit is more preferably 400 mgKOH/g or less, further preferably 300 mgKOH/g or less, and particularly preferably 200 mgKOH/g or less. The weight average molecular weight (Mw) of the resin having acidic groups is preferably 5,000 to 100,000. In addition, the number average molecular weight (Mn) of the resin having an acidic group is preferably 1,000 to 20,000.

Examples of the resin having an acid group include resins having the following structures.

[Chemical formula 22]

In the present invention, the photosensitive composition can further contain a resin as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin in which the amount of acidic groups is greater than the amount of basic groups. Acidic dispersants (acidic resins), when the total amount of acidic groups and alkaline groups is 100 mol%, a resin containing 70 mol% or more of acidic groups is preferred, and it essentially contains only Acid-based resins are better. It is preferable that the acidic group of the acidic dispersant (acidic resin) is a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 40 to 105 mgKOH/g, more preferably 50 to 105 mgKOH/g, and further preferably 60 to 105 mgKOH/g. In addition, the basic dispersant (basic resin) means a resin in which the amount of basic groups is greater than the amount of acid groups. For an alkaline dispersant (alkaline resin), when the total amount of acidic groups and basic groups is 100 mol%, a resin containing more than 50 mol% of basic groups is preferred. The basic group of the alkaline dispersant is preferably an amine group.

The resin used as a dispersant preferably contains repeating units having acid groups. The resin used as a dispersant contains a repeating unit having an acid group, thereby further suppressing the generation of development residue when forming patterns by photolithography.

It is also preferred that the resin used as the dispersant is a graft resin. For details on the graft resin, please refer to paragraphs 0025 to 0094 of Japanese Patent Application Laid-Open No. 2012-255128, which is incorporated by reference. into this manual. Moreover, it is also preferable that the resin used as a dispersing agent contains a hindered amine quaternary salt. For details of this type of resin, refer to the description of Japanese Patent Application Laid-Open No. 2019-095548, for example, and this content is incorporated into this specification.

It is also preferable that the resin used as the dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of its main chain and side chain. The polyimine-based dispersant is preferably a resin having a main chain and a side chain, and a basic nitrogen atom in at least one of the main chain and side chain. The main chain includes a portion with a functional group of pKa14 or less. Structure, the number of atoms in the side chain is 40~10000. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. Regarding the polyimine-based dispersant, please refer to the descriptions in paragraphs 0102 to 0166 of Japanese Patent Application Laid-Open No. 2012-255128, and this content is incorporated into this specification.

It is also preferred that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core. Examples of such resins include dendritic polymers (including star polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Laid-Open No. 2013-043962.

Moreover, the above-mentioned resin having an acid group (alkali-soluble resin) can also be used as a dispersant.

In addition, the resin used as the dispersant is preferably a resin containing a repeating unit having an ethylenically unsaturated bond group in the side chain. The content of repeating units with ethylenically unsaturated bond groups on the side chains is preferably 10 mol% or more of all repeating units of the resin, more preferably 10 to 80 mol%, and further preferably 20 to 70 mol%. good.

Dispersants are also available as commercial products, and specific examples thereof include the DISPERBYK series (for example, DISPERBYK-111, 161, etc.) manufactured by BYK Chemie GmbH, and the SOLSPERSE series (for example, SOLSPERSE 76500) manufactured by Lubrizol Japan Limited. etc. In addition, the pigment dispersant described in paragraphs 0041 to 0130 of Japanese Patent Application Laid-Open No. 2014-130338 can also be used, and this content is incorporated into this specification. In addition, the resin described as the said dispersing agent can also be used for purposes other than a dispersing agent. For example, it can also be used as an adhesive.

In the present invention, when the photosensitive composition contains a resin, the content of the resin in the total solid content of the photosensitive composition is preferably 5 to 50% by mass. It is more preferable that the lower limit is 10 mass % or more, and it is further more preferable that it is 15 mass % or more. It is more preferable that the upper limit is 40 mass % or less, further preferably 35 mass % or less, and particularly preferably 30 mass % or less. In addition, the content of the resin having an acid group in the total solid content of the photosensitive composition is preferably 5 to 50% by mass. It is more preferable that the lower limit is 10 mass % or more, and it is further more preferable that it is 15 mass % or more. It is more preferable that the upper limit is 40 mass % or less, further preferably 35 mass % or less, and particularly preferably 30 mass % or less. In addition, in order to easily obtain excellent developability, the content of the resin having an acid group in the total resin is preferably 30 mass% or more, more preferably 50 mass% or more, and further preferably 70 mass% or more. , more than 80% by mass is particularly good. The upper limit can be set to 100 mass%, 95 mass%, or 90 mass% or less.

In addition, from the viewpoint of curability, developability, and film formation, the total content of the polymerizable compound and resin in the total solid content of the photosensitive composition is preferably 10 to 65 mass %. The lower limit is more preferably 15% by mass or more, more preferably 20% by mass or more, and particularly preferably 30% by mass or more. It is more preferable that the upper limit is 60 mass % or less, further preferably 50 mass % or less, and particularly preferably 40 mass % or less. Moreover, it is preferable to contain 30-300 mass parts of resin with respect to 100 mass parts of polymerizable compounds. The lower limit is preferably 50 parts by mass or more, and 80 parts by mass or more is the lower limit. Better still. The upper limit is more preferably 250 parts by mass or less, and still more preferably 200 parts by mass or less.

<<Compounds with cyclic ether groups>>

In the present invention, the photosensitive composition can contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group, an oxetanyl group, and the like. The compound having a cyclic ether group is preferably a compound having an epoxy group. Examples of the compound having an epoxy group include compounds having one or more epoxy groups per molecule, and compounds having two or more epoxy groups are preferred. It is preferable to have 1 to 100 epoxy groups in one molecule. The upper limit of the epoxy group can be, for example, 10 or less, or 5 or less. The lower limit of epoxy groups is more preferably 2 or more. As the compound having an epoxy group, paragraphs 0034 to 0036 of Japanese Patent Application Laid-Open No. 2013-011869, paragraphs 0147 to 0156 of Japanese Patent Application Laid-Open No. 2014-043556, and paragraphs 0085 to Japanese Patent Application Laid-Open No. 2014-089408 can also be used. The compound described in paragraph 0092 and the compound described in Japanese Patent Application Laid-Open No. 2017-179172. Incorporate these contents into this manual.

The compound having an epoxy group may be a low molecular compound (for example, a molecular weight of less than 2000, and further a molecular weight of less than 1000), or a macromolecule compound (for example, in the case of a polymer with a molecular weight of 1000 or more, the weight average molecular weight is 1000 and above) any one. The weight average molecular weight of the compound having an epoxy group is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the weight average molecular weight is more preferably 10,000 or less, particularly preferably 5,000 or less, and still more preferably 3,000 or less.

As the compound having an epoxy group, an epoxy resin can be preferably used. Examples of the epoxy resin include epoxy resins that are glycidyl etherates of phenol compounds, epoxy resins that are glycidyl etherates of various novolak resins, alicyclic epoxy resins, and aliphatic epoxy resins. Resins, heterocyclic epoxy resins, glycidyl ester epoxy resins, glycidyl amine epoxy resins, epoxy resins obtained by glycidylizing halogenated phenols, silicon compounds having epoxy groups, and others Condensates of silicon compounds, copolymers of polymerizable unsaturated compounds with epoxy groups and other polymerizable unsaturated compounds, etc. The epoxy equivalent weight of the epoxy resin is preferably 310~3300g/eq, more preferably 310~1700g/eq, and further preferably 310~1000g/eq.

Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (the above, manufactured by NOF Corporation, epoxy group-containing polymer), etc.

In the present invention, when the photosensitive composition contains a compound having a cyclic ether group, the content of the compound having a cyclic ether group in the total solid content of the photosensitive composition is preferably 0.1 to 20% by mass. The lower limit is, for example, more preferably 0.5% by mass or more, and still more preferably 1% by mass or more. The upper limit is, for example, more preferably 15% by mass or less, and still more preferably 10% by mass or less. The number of compounds having a cyclic ether group may be only one type, or two or more types. When there are two or more types, the total amount is preferably within the above range.

<<Silane coupling agent>>

In the present invention, the photosensitive composition can contain a silane coupling agent. With this aspect, the adhesiveness with the support of the obtained film can be further improved. In the present invention, the silane coupling agent refers to a silane compound having a hydrolyzable group and functional groups other than the hydrolyzable group. In addition, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by any one of a hydrolysis reaction and a fusion reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, a hydroxyl group, and the like, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include vinyl, (meth)allyl, (meth)acrylyl, mercapto, epoxy, oxetanyl, amino, and urea. group, thioether group, isocyanate group, phenyl group, etc., and amino group, (meth)acrylyl group and epoxy group are preferred. Specific examples of the silane coupling agent include compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Laid-Open No. 2009-288703, and compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Laid-Open No. 2009-242604. The contents are incorporated into this manual.

Examples of the silane coupling agent include compounds having the following structures.

The content of the silane coupling agent in the total solid content of the photosensitive composition is preferably 0.1 to 5% by mass. The upper limit is more preferably 3% by mass or less, and still more preferably 2% by mass or less. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. There may be only one type of silane coupling agent, or two or more types of silane coupling agents. When there are two or more types, the total amount is preferably within the above range.

<<Surfactant>>

In the present invention, the photosensitive composition can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants can be used. Regarding surfactants, You can refer to paragraphs 0238~0245 of International Publication No. 2015/166779, which content is incorporated into this specification.

In the present invention, the surfactant is preferably a fluorine-based surfactant. By containing a fluorine-based surfactant in the photosensitive composition, liquid characteristics (especially fluidity) can be further improved, and liquid-saving properties can be further improved. In addition, a film with less uneven thickness can be formed.

The fluorine content in the fluorine-based surfactant is preferably 3 to 40 mass%, more preferably 5 to 30 mass%, and particularly preferably 7 to 25 mass%. A fluorine-based surfactant with a fluorine content within this range is effective in terms of uniformity of thickness of the coating film and liquid saving, and also has good solubility in the photosensitive composition.

Examples of the fluorine-based surfactant include surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), Japanese Patent Application Publication No. 2014/017669, etc. The surfactants described in paragraphs 0117 to 0132 of the publication No. 2011-132503 are incorporated into this specification. Examples of commercially available fluorine-based surfactants include MAGAFACE F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, and MFS. -330 (above, manufactured by DIC Corporation), Fluorad FC430, FC431, FC171 (above, manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (above, manufactured by AGC SEIMI CHEMICAL CO., LTD.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (above, manufactured by OMNOVA Solutions Inc.), etc.

In addition, it is also preferable to use a fluorine-based surfactant having a molecular structure having a functional group containing a fluorine atom, and a part of the functional group containing a fluorine atom is cleaved during heating and the fluorine is lost. Acrylic compounds that evaporate. Examples of such fluorine-based surfactants include MAGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily, February 22, 2016) (Nikkei Sangyo Shimbun, February 23, 2016), such as MAGAFACE DS-21.

Furthermore, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-based surfactant. This kind of fluorine-based surfactant can be found in Japanese Patent Application Laid-Open No. 2016-216602, and the content is incorporated into this specification.

As the fluorine-based surfactant, a block polymer can also be used. Examples thereof include compounds described in Japanese Patent Application Laid-Open No. 2011-089090. The fluorine-based surfactant can also preferably use a fluorine-containing polymer compound that contains: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; and a fluorine-containing polymer compound derived from a (meth)acrylate compound having 2 or more ( The repeating unit of a (meth)acrylate compound is preferably an alkyleneoxy group (preferably 5 or more) (preferably an ethyleneoxy group or a propyleneoxy group). Examples of the fluorine-based surfactant used in the present invention include the following compounds.

The weight average molecular weight of the above-mentioned compound is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage expressed as the proportion of repeating units is molar %.

In addition, a fluorine-containing polymer having an ethylenically unsaturated bond group in the side chain can also be used as the fluorine-based surfactant. As a specific example, Japanese Patent Application Laid-Open No. 2010-164965 No. 0050~ The compounds described in paragraphs 0090 and 0289 to 0295 include, for example, MEGAFACE RS-101, RS-102, RS-718K, RS-72-K manufactured by DIC Corporation, and the like. As the fluorine-based surfactant, compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can also be used.

The surfactant content in the total solid content of the photosensitive composition is preferably 0.001 mass% to 5.0 mass%, and more preferably 0.005 to 3.0 mass%. The number of surfactants may be only one type or two or more types. When there are two or more types, the total amount is preferably within the above range.

<<UV absorber>>

化合物、吲哚化合物、三

化合物等。關於該等的詳細內容，能夠參閱日本特開2012-208374號公報的0052~0072段、日本特開2013-068814號公報的0317~0334段、日本特開2016-162946號公報的0061~0080段中的記載，該等內容被併入本說明書中。作為紫外線吸收劑的具體例子，可列舉下述結構的化合物等。作為紫外線吸收劑的市售品，例如可列舉UV-503(DAITO CHEMICAL CO.,LTD.製)等。又，作為苯并三唑化合物，可列舉MIYOSHI OIL & FAT CO.,LTD.製的MYUA系列(化學工業日報、2016年2月1日)。 In the present invention, the photosensitive composition can contain an ultraviolet absorber. As the ultraviolet absorber, conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, and hydroxyphenyl triazole compounds can be used.

Compounds, Indole Compounds, Three

Compounds etc. For details, please refer to paragraphs 0052 to 0072 of Japanese Patent Application Publication No. 2012-208374, paragraphs 0317 to 0334 of Japanese Patent Application Publication No. 2013-068814, and paragraphs 0061 to 0080 of Japanese Patent Application Publication No. 2016-162946. are incorporated into this manual. Specific examples of ultraviolet absorbers include compounds having the following structures. Examples of commercially available ultraviolet absorbers include UV-503 (manufactured by DAITO CHEMICAL CO., LTD.). Examples of the benzotriazole compound include the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016).

The content of the ultraviolet absorber in the total solid content of the photosensitive composition is preferably 0.01 to 10 mass %, and more preferably 0.01 to 5 mass %. In the present invention, only one type of ultraviolet absorber may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

<<Solvent>>

In the present invention, the photosensitive composition can contain a solvent. Examples of solvents that can be used include organic solvents. The solvent is basically not particularly limited as long as it satisfies the solubility of each component and the coating properties of the photosensitive composition. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents, and the like. For details, please refer to paragraph 0223 of International Publication No. 2015/166779, which content is incorporated into this specification. Furthermore, ester-based solvents substituted with cyclic alkyl groups and ketone-based solvents substituted with cyclic alkyl groups can also be suitably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethyl cellosolve acetate. , Ethyl lactate, diglyme, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol ethyl Acid ester, butyl carbitol acetate, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), 3-methoxy-N,N-dimethylpropylamide, 3- Butoxy-N,N-dimethylpropylamine, etc. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as solvents may sometimes be reduced due to environmental reasons (for example, they can be set to 50 ppm by mass relative to the total amount of organic solvents). The square fraction (parts per million) or less can also be set to 10 mass ppm or less, or can be set to 1 mass ppm or less).

The content of the solvent in the photosensitive composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and further preferably 30 to 90% by mass.

<<Other ingredients>>

In the present invention, the photosensitive composition may also contain polymerization inhibitors, sensitizers, hardening accelerators, fillers, thermal hardening accelerators, plasticizers and other auxiliaries (for example, conductive particles, fillers , defoaming agents, flame retardants, leveling agents, peeling accelerators, spices, surface tension adjusters, chain transfer agents, etc.). By appropriately containing these components, film physical properties and other properties can be adjusted. For example, these ingredients can be found in paragraphs 0183 and later of Japanese Patent Application Laid-Open No. 2012-003225 (corresponding to paragraph 0237 of US Patent Application Publication No. 2013/0034812), and paragraphs 0101 to 2008 of Japanese Patent Application Publication No. 2008-250074. The records in paragraphs 0104, 0107~0109, etc. are incorporated into this manual. Furthermore, in the present invention, the photosensitive composition may contain a latent antioxidant as necessary. Examples of latent antioxidants include compounds in which the site functioning as an antioxidant is protected by a protecting group, and the protecting group is heated at 100 to 250°C or heated at 80 to 200°C in the presence of an acid/alkali catalyst. A compound that is released by heating and functions as an antioxidant. Examples of latent antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Publication No. 2017-008219. Examples of commercially available products include ADEKAARKLS GPA-5001 (manufactured by ADEKA Corporation) and the like.

In the present invention, the photosensitive composition may contain a metal oxide in order to adjust the refractive index of the film obtained. Examples of metal oxides include TiO ₂ , ZrO ₂ , Al ₂ O ₃ , SiO ₂ and the like. The primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, and most preferably 5 to 50 nm. The metal oxide may have a core-shell structure, and in this case, the core may be hollow.

In the present invention, in the photosensitive composition, the content of free metals that are not bonded or coordinated with pigments or the like is preferably 100 ppm or less, more preferably 50 ppm or less, further preferably 10 ppm or less, and it is substantially free of metal. Very good. This aspect enables stabilization of pigment dispersion. (suppression of aggregation), improvement of spectral characteristics due to improvement in dispersibility, stabilization of curable components, suppression of conductivity changes due to elution of metal atoms and metal ions, improvement of display characteristics, etc. In addition, Japanese Patent Application Publication No. 2012-153796, Japanese Patent Application Publication No. 2000-345085, Japanese Patent Application Publication No. 2005-200560, Japanese Patent Application Publication No. 08-043620, Japanese Patent Application Publication No. 2004-145078, Japanese Patent Application Publication No. 2014-119487, Japanese Patent Application Publication No. 2010-083997, Japanese Patent Application Publication No. 2017-090930, Japanese Patent Application Publication No. 2018-025612, Japanese Patent Application Publication No. 2018-025797, Japanese Patent Application Publication No. 2017- Effects described in Publication No. 155228, Japanese Patent Application Laid-Open No. 2018-036521, etc. Examples of the free metal types include Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, Cs, Ni, Cd, Pb, Bi, etc. In addition, the content of free halogens that are not bonded or coordinated with pigments or the like in the composition is preferably 100 ppm or less, more preferably 50 ppm or less, further preferably 10 ppm or less, and it is particularly preferred that it contains substantially no halogen. Examples of methods for reducing free metals or halogens in the composition include cleaning with ion-exchange water, filtration, ultrafiltration, and purification with ion-exchange resin.

Moreover, it is preferable that the photosensitive composition does not contain terephthalate ester substantially.

<<Containment Container>>

The container for storing the photosensitive composition is not particularly limited, and a known container can be used. In addition, as a storage container, in order to prevent impurities from being mixed into raw materials or photosensitive compositions, it is also preferable to use a multi-layer bottle with an inner wall composed of 6 types of 6-layer resins or a bottle with a 7-layer structure using 6 types of resins. . Examples of this type of container include the container described in Japanese Patent Application Laid-Open No. 2015-123351. In addition, for the purpose of preventing metal from eluting from the inner wall of the container, improving the storage stability of the composition, and suppressing deterioration of components, it is preferable that the inner wall of the storage container be made of glass, stainless steel, or the like.

<How to form pixels>

The pixels in the structure of the present invention can be formed by photolithography using a photosensitive composition containing the above-mentioned pixel components. Pattern formation based on photolithography includes the process of forming a photosensitive composition layer on a support using a photosensitive composition, the process of exposing the photosensitive composition layer into a pattern, and the process of exposing the unexposed portions of the photosensitive composition layer. A process of developing and removing to form patterns (pixels) is preferred. According to needs, a process for baking the photosensitive composition layer (pre-baking process) and a process for baking the developed pattern (post-baking process) can be set.

Furthermore, from the viewpoint of flatness of the base of the photosensitive composition layer, etc., it is also preferable to form a primer layer on the support before forming the photosensitive composition layer. Details of the undercoat layer are described in International Publication No. 2018/062130, and this content is incorporated into this specification.

<<Preparation method of composition>>

The photosensitive composition for forming pixels in the structure of the present invention can be prepared by mixing the aforementioned components. When preparing a photosensitive composition, all the components can be dissolved and/or dispersed in a solvent at the same time to prepare the photosensitive composition. Alternatively, each component can be appropriately prepared as two or more solutions or dispersions as needed, and then These are mixed at the time of use (coating) to prepare a photosensitive composition.

Moreover, when preparing a photosensitive composition, it is preferable to include the process of dispersing a pigment. In the step of dispersing the pigment, examples of the mechanical force used to disperse the pigment include compression, squeezing, impact, shearing, cavitation, and the like. Specific examples of these steps include bead mills, sand mills, roller mills, ball mills, paint shakers, microfluidizers, high-speed impellers, and sand mills. Flowjet mixer, high-pressure wet micronization, ultrasonic dispersion, etc. In addition, in the grinding of pigments in a sand mixer (bead mill), it is preferable to perform the process under conditions that improve the grinding efficiency by using beads with small diameters, increasing the filling rate of beads, etc. In addition, after the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, etc. In addition, the process of dispersing pigments and the dispersing machine can preferably use "Encyclopedia of Dispersion Technology, published by JOHOKIKO CO., LTD., July 15, 2005" or "Centering on Suspension (Solid/Liquid Dispersion System)" The procedures and dispersing machines described in Paragraph 0022 of Japanese Patent Application Laid-Open No. 2015-157893, "Practical Comprehensive Data Collection of Dispersion Technology and Industrial Applications, published by the Publishing Department of the Business Development Center, October 10, 1978". In addition, in the step of dispersing the pigment, the particles may be refined by a salt milling step. For materials, machines, processing conditions, etc. used in the salt grinding step, please refer to the descriptions of Japanese Patent Application Laid-Open No. 2015-194521 and Japanese Patent Application Laid-Open No. 2012-046629, for example.

When preparing a photosensitive composition, it is preferable to use a filter to filter the photosensitive composition for the purpose of removing foreign matter and reducing defects. The filter can be used without particular limitation as long as it is used for filtration purposes. Examples include those using fluororesins such as polytetrafluoroethylene (PTFE), polyamide-based resins such as nylon (such as nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP). Filters made from raw materials such as high-density, ultra-high molecular weight polyolefin resin). Among these raw materials, polypropylene (including high-density polypropylene) and nylon are preferred.

The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be reliably removed. For the pore size of the filter, refer to the filter manufacturer's nominal value. Various filters provided by NIHON PALL LTD. (DFA4201NIEY, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, etc. can be used.

In addition, it is also preferable to use a fibrous filter material as the filter. Examples of fibrous filter materials include polypropylene fibers, nylon fibers, glass fibers, and the like. As a commercial product, it can be listed as Examples include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI GROUP CO., Ltd.

When using filters, you can also combine different filters (for example, the first filter and the second filter, etc.). At this time, filtration in each filter may be performed only once, or may be performed two or more times. Furthermore, filters with different pore sizes can be combined within the above range. In addition, the filtration by the first filter is performed only on the dispersion liquid, and the filtration by the second filter may be performed after mixing other components.

<<Process for forming photosensitive composition layer>>

In the process of forming the photosensitive composition layer, the photosensitive composition is used to form the photosensitive composition layer on the support. The support is not particularly limited and can be appropriately selected depending on the use. Examples include glass substrates, silicon substrates, etc., and silicon substrates are preferred. In addition, charge coupled devices (CCD), complementary metal oxide film semiconductors (CMOS), transparent conductive films, etc. can be formed on the silicon substrate. In addition, sometimes a black matrix is formed on the silicon substrate to isolate each pixel. In addition, a primer layer is provided on the silicon substrate in order to improve adhesion with the upper layer, prevent diffusion of substances, and flatten the surface of the substrate.

As a coating method of the photosensitive composition, a known method can be used. Examples include dropping method (drop casting); slit coating method; spray method; roller coating method; spin coating method (spin coating); cast coating method; slit and spin coating method; prewet method (such as , the method described in Japanese Patent Application Publication No. 2009-145395); inkjet method (such as drop-on-demand spraying method, piezoelectric method, thermal method), nozzle spraying and other discharge system printing, flexographic printing, screen printing, gravure Printing, reverse offset printing, metal mask printing and other printing methods; transfer printing method using molds, etc.; nanoimprinting method, etc. The application method based on inkjet is not particularly limited, but examples include “Diffusion, Usable Inkjet - Infinite Possibilities Seen in the Patent, February 2005, S.B. Techno-Research Co., Ltd. "The method shown in (especially, pages 115 to 133) or Japanese Patent Application Laid-Open No. 2003-262716, Methods described in Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, Japanese Patent Application Publication No. 2006-169325, etc. In addition, regarding the coating method of the photosensitive composition, you can refer to the descriptions of International Publication No. 2017/030174 and International Publication No. 2017/018419, and these contents are incorporated into this specification.

The photosensitive composition layer formed on the support may be dried (prebaked). When the film is manufactured by a low-temperature process, prebaking does not need to be performed. When performing pre-baking, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and further preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The pre-baking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and further preferably 80 to 220 seconds. Prebaking can be performed by a heating plate, oven, etc.

<<Exposure Process>>

Next, the photosensitive composition layer is exposed into a pattern (exposure process). For example, the photosensitive composition layer can be exposed in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like through a mask having a predetermined mask pattern. Thereby, the exposed part can be hardened.

Examples of radiation (light) that can be used during exposure include g-rays, i-rays, and the like. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, a long-wavelength light source of 300 nm or more can also be used.

Moreover, during exposure, light may be continuously irradiated and exposed, or light may be irradiated and exposed (pulse exposure). In addition, pulse exposure refers to an exposure method in which light irradiation and pause are repeatedly performed in a short-time (for example, millisecond or less) cycle to perform exposure. During pulse exposure, the pulse width is preferably 100 nanoseconds (ns) or less, more preferably 50 nanoseconds or less, and further preferably 30 nanoseconds or less. The lower limit of the pulse width is not particularly limited, and may be set to 1 femtosecond (fs) or more, or may be set to 10 femtoseconds or more. The frequency is preferably 1 kHz or more, more preferably 2 kHz or more, and still more preferably 4 kHz or more. The upper limit of the frequency is preferably 50 kHz or less, more preferably 20 kHz or less, and further preferably 10 kHz or less. The maximum instantaneous illumination is preferably 50000000W/m ² or more, more preferably 100000000W/m ² or more, and further preferably 200000000W/m ² or more. In addition, the upper limit of the maximum instantaneous illuminance is preferably 1000000000W/m ² or less, more preferably 800000000W/m ² or less, and still more preferably 500000000W/m ² or less. In addition, the pulse width refers to the time during which light is irradiated in the pulse cycle. In addition, frequency refers to the number of pulse cycles per second. In addition, the maximum instantaneous illuminance refers to the average illuminance during the time when light is irradiated in the pulse cycle. In addition, the pulse period refers to a period in which the irradiation and pause of light in pulse exposure constitute one cycle.

For example, the irradiation amount (exposure amount) is preferably 0.03~2.5J/ ^cm2 , and more preferably 0.05~1.0J/ ^cm2 . The oxygen concentration during exposure can be appropriately selected. In addition to performing it in the atmosphere, it can also be performed in a low-oxygen environment with an oxygen concentration of 19 volume % or less (for example, 15 volume %, 5 volume %, or substantially no oxygen). ) or in a high-oxygen environment with an oxygen concentration greater than 21 volume % (such as 22 volume %, 30 volume %, or 50 volume %). In addition, the exposure illuminance can be appropriately set, and can usually be selected from the range of 1000W/m ² to 100000W/m ² (for example, 5000W/m ² , 15000W/m ² or 35000W/m ² ). The oxygen concentration and exposure illuminance can also be combined with appropriate conditions. For example, the illuminance can be set to 10000W/m ² at an oxygen concentration of 10 volume %, and the illuminance can be set to 20000 W/m ² at an oxygen concentration of 35 volume %.

<<Development process>>

Next, the unexposed portion of the photosensitive composition layer is developed and removed to form a pattern (pixel). The unexposed portion of the photosensitive composition layer can be removed by development using a developer. Thereby, the photosensitive composition layer in the unexposed portion in the exposure step is dissolved in the developer, and only the photohardened portion remains. As a developer, an organic alkaline developer that does not cause damage to the components or circuits of the substrate is preferred. The temperature of the developer is preferably 20 to 30°C, for example. The optimal development time is 20 to 180 seconds. In addition, in order to improve the residue removability, the following steps can be repeated several times: shaking off the developer every 60 seconds and further supplying the developer again.

The developer is preferably an alkaline aqueous solution (alkaline developer) obtained by diluting an alkali agent with pure water. Examples of the alkaline agent include amine, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, Tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, Pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene and other organic basic compounds or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, Inorganic alkaline compounds such as sodium metasilicate. Regarding alkaline agents, compounds with large molecular weights are preferable in terms of environment and safety. The concentration of the alkali agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. Examples of the surfactant include the above-mentioned surfactants, and nonionic surfactants are preferred. From the viewpoint of transportation and storage convenience, the developer is temporarily made into a concentrated solution, which can also be diluted to the concentration required for use. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. In addition, it is also preferable to use pure water for cleaning (rinsing) after development. Furthermore, rinsing is preferably performed by supplying a rinsing liquid to the developed photosensitive composition layer while rotating the support on which the developed photosensitive composition layer is formed. Also, by causing the nozzle that spits out the flushing liquid from the center of the support body, It is also preferable to move the core part toward the peripheral edge part of the support body. At this time, when moving from the center part of the support body of the nozzle to the peripheral edge part, the moving speed of the nozzle may be gradually reduced while moving it. By performing flushing in this manner, in-plane deviation of flushing can be suppressed. In addition, the same effect can be obtained by gradually reducing the rotation speed of the support body while moving the nozzle from the center part of the support body to the peripheral part.

After development, it is preferable to perform additional exposure processing or heat processing (post-baking) after drying. The additional exposure treatment or post-baking is a heat treatment after development for complete hardening. The heating temperature is preferably 100 to 240°C, and more preferably 200 to 240°C. Post-baking can be performed continuously or intermittently on the developed film using a heating mechanism such as a heating plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the conditions described above are met.

When additional exposure processing is performed, the light used for exposure is preferably light with a wavelength of 400 nm or less. In addition, the additional exposure process can be performed by the method described in Korean Patent Publication No. 1020170122130.

One pixel is formed through the above process. When forming the next pixel, the above-mentioned coating, exposure and development are repeated.

[Example]

The present invention will be described in more detail below with reference to examples. Materials, usage amounts, proportions, processing contents, processing procedures, etc. shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Unless otherwise stated, "parts" and "%" are based on mass. The weight average molecular weight and the number average molecular weight are polyethylene conversion values measured by the GPC method as described above.

<Preparation of composition for base coat>

The following raw materials were mixed to prepare a composition for forming an undercoat layer.

Details of the raw materials are as follows.

‧PGMEA 98.5 parts by mass

‧Resin A: CYCLOMER P(ACA)230AA (manufactured by Daicel Corporation, acid value=30mgKOH/g, Mw=15000)

‧Surface active agent A: the following mixture (Mw=14000, indicating the proportion of repeating units as mass %.)

<Preparation of photosensitive composition>

Using the following raw materials, various compositions shown in Tables 2 to 10 were produced through the steps and combinations described below.

<<Raw materials>>

<<<Color materials: pigments, dyes>>>

‧PR122: C.I. Pigment Red 122

‧PR177: C.I. Pigment Red 177

‧PR254: C.I. Pigment Red 254

‧PR272: C.I. Pigment Red 272

‧PG7: C.I. Pigment Green 7

‧PG36: C.I. Pigment Green 36

‧PG58: C.I. Pigment Green 58

‧PB15:6: C.I. Pigment Blue 15:6

‧PO71: C.I. Pigment Orange 71

‧PV23: C.I. Pigment Violet 23

‧PY139: C.I. Pigment Yellow 139

‧PY150: C.I. Pigment Yellow 150

‧PY185: C.I. Pigment Yellow 185

‧TiO ₂ : TTO-51(C) (manufactured by Ishihara Sangyo Kaisha, Ltd.)

‧Al phthalocyanine: a compound with the following structure

：具有下述結構之化合物 ‧

: Compounds with the following structure

[Chemical formula 28]

‧IR Pigment 1: chemical compound with the following structure

‧IR Pigment 2: Compound with the following structure

‧IR Pigment 3: Compound with the following structure

[Chemical formula 31]

‧Perylene black: a compound with the following structure

‧Dibenzofuran: a compound with the following structure

<<<Pigment Derivatives of Examples>>>

For each of the following pigment derivatives, the maximum value (εmax) of the Mohr absorption coefficient in the wavelength range of 400 to 700 nm was measured as follows. 20 mg of each compound was dissolved in 200 mL of methanol, and methanol was added to 2 mL of this solution to make it 50 mL. The absorbance of this solution was measured using a Cary5000 UV-Vis-NIR spectrophotometer (manufactured by Agilent Technologies, Inc.) in the wavelength range of 200 to 800 nm, and the maximum value of the measured value was normalized to the molar concentration and calculated. Out εmax.

‧Pigment derivative 1: Compound C-1 in the above Table 1 (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 2: Compound C-20 in the above Table 1 (εmax: greater than 1000L‧mol ^-1 ‧cm ^-1 and less than 3000L‧mol ^-1 ‧cm ^-1 , basic)

‧Pigment Derivative 3: Compound C-36 in Table 1 above (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 4: Compound C-51 in Table 1 above (εmax: greater than 100L‧mol ^-1 ‧cm ^-1 and less than 1000L‧mol ^-1 ‧cm ^-1 , basic)

‧Pigment Derivative 5: Compound C-87 in Table 1 above (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 6: Compounds with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, acidic)

‧Pigment Derivative 7: Compounds with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, acidic)

‧Pigment Derivative 8: Compounds with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, acidic)

‧Pigment Derivative 9: Compounds with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, acidic)

‧Pigment Derivative 10: Compounds with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, acidic)

‧Pigment Derivative A: Compound with the following structure (yellow, basic)

[Chemical formula 34]

<<<Pigment derivatives of comparative examples>>>

For each of the pigment derivatives described below, εmax was measured in the same manner as the pigment derivatives of the above examples. Any pigment derivative is colored with εmax greater than 3000L‧mol ^-1 ‧cm ^-1 .

‧Comparative derivative 1: compound with the following structure (yellow, basic)

‧Comparative derivative 2: compound with the following structure (red, basic)

‧Comparative derivative 3: compound with the following structure (yellow, basic)

‧Comparative derivative 4: compound with the following structure (blue, basic)

‧Comparative derivative 5: compound with the following structure (purple, basic)

[Chemical formula 35]

<<<Dispersant>>>

‧Dispersant 1: Compound with the following structure (acidic). The numerical value attached to the main chain is the molar ratio of the repeating unit, and the numerical value attached to the side chain is the number of repeating units.

[Chemical formula 36]

‧Dispersant 2: A compound with the following structure (the value in the main chain is the molar ratio of the repeating unit, and the value in the side chain is the number of repeating units. Mw: 20000, C=C value: 0.4 mmol/g, acid value: 70mgKOH/g)

‧Dispersant 3: a compound with the following structure (k: l: m: n = 25: 40: 5: 30 (overlapping molar ratio), p = 60, q = 60, weight average molecular weight 10,000, basic)

<<<Resin>>>

‧Resin 1: A compound with the following structure. The numerical value appended to the main chain represents the molar ratio of the repeating units.

[Chemical formula 39]

‧Resin 2: A compound with the following structure. The numerical value appended to the main chain represents the molar ratio of the repeating units.

<<<Polymerizable monomer>>>

‧Polymerizable monomer 1: Compounds with the following structure

‧Polymerizable monomer 2: compound with the following structure

‧Polymerizable monomer 3: a mixture of two compounds each having the following structure (the molar ratio between the left and right sides is 7:3)

<<<Photopolymerization initiator>>>

‧Photopolymerization initiator 1: compound with the following structure

‧Photopolymerization initiator 2: a compound with the following structure

‧Photopolymerization initiator 3: a compound with the following structure

<<<Surface active agent>>>

‧Surface active agent 1: a mixture of two compounds each having the following structure (Mw=14000, recorded in mass %)

<<<UV absorber>>>

‧UV absorber 1: compound with the following structure

<<<Epoxy resin>>>

‧Epoxy resin 1: EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4-(2-oxiranyl)cyclohexane of 2,2'-bis(hydroxymethyl)-1-butanol adduct)

<<<Silane coupling agent>>>

‧Silane coupling agent 1: a compound with the following structure (Mw=14000, recorded in mass %)

<<<Solvent>>>

‧PGMEA: Propylene glycol monomethyl ether acetate

‧EEP: Ethyl 3-ethoxypropionate

<<Green composition G1>>

(Preparation of Pigment Dispersion G1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion G1.

Raw materials for dispersion:

(Preparation of green composition G1)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining green composition G1.

Raw materials of the composition:

<<Green composition G4>>

(Preparation of Pigment Dispersion G4)

Except that the type of green pigment was changed to PG36, the same components and blended raw materials as those of the pigment dispersion G1 were used. Furthermore, the pigment dispersion liquid G4 was obtained by the same procedure as the preparation method of the pigment dispersion liquid G1.

(Preparation of green composition G4)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining green composition G4.

‧PGMEA 37.7質量份 Raw materials of the composition:

‧PGMEA 37.7 parts by mass

<<Green composition G5>>

(Preparation of Pigment Dispersion G5)

The same raw material as that of the pigment dispersion G4 was used, and the pigment dispersion G5 was obtained by the same procedure as the preparation method of the pigment dispersion G4.

(Preparation of green composition G5)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain green composition G5.

Raw materials of the composition:

<<Green composition G20>>

(Preparation of Pigment Dispersion G20)

The pigment dispersion liquid G20 was obtained by the same procedure as the preparation method of the pigment dispersion liquid G1, except that the raw material of the dispersion liquid was changed to the following raw materials.

Raw materials for dispersion:

(Preparation of green composition G20)

The green composition G20 was obtained by the same procedure as the preparation method of the green composition G1, except that the pigment dispersion liquid G1 was changed into the pigment dispersion liquid G20.

<<Green composition G21>>

(Preparation of Pigment Dispersion G21)

The pigment dispersion liquid G21 was obtained by the same procedure as the preparation method of the pigment dispersion liquid G1, except that the raw material of the dispersion liquid was changed to the following raw materials.

Raw materials for dispersion:

(Preparation of green composition G21)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining green composition G21.

Raw materials of the composition:

<<Green composition G22>>

(Preparation of Pigment Dispersion G22)

The pigment dispersion liquid G22 was obtained by the same procedure as the preparation method of the pigment dispersion liquid G21, except that the raw material of the dispersion liquid was changed to the following raw materials.

Raw materials for dispersion:

(Preparation of green composition G22)

Green composition G22 was obtained by the same procedure as the production method of green composition G21, except that the pigment dispersion liquid G21 was changed into the pigment dispersion liquid G22.

<<Green composition G23>>

(Preparation of Pigment Dispersion G23)

Pigment dispersion G23 was obtained by the same procedure as the preparation method of pigment dispersion G22, except that the blending of the pigment derivative accounting for 1.6 parts by mass of the pigment dispersion was changed as follows.

(Preparation of green composition G23)

The green composition G23 was obtained by the same procedure as the preparation method of the green composition G21, except that the pigment dispersion liquid G21 was changed into the pigment dispersion liquid G23.

<<Green composition G24>>

(Preparation of Pigment Dispersion G24)

The pigment dispersion liquid G24 was obtained by the same procedure as the preparation method of the pigment dispersion liquid G21, except that the raw material of the dispersion liquid was changed to the following raw materials.

Raw materials for dispersion:

(Preparation of green composition G24)

Green composition G24 was obtained by the same procedure as the production method of green composition G21, except that the pigment dispersion liquid G21 was changed into the pigment dispersion liquid G24.

<<Compositions of green compositions G2~G3, G6~G19 and comparative examples>>

As shown in Table 2, except for changing the types of components of the dispersion liquid and the composition, green compositions G2 to G3, G6 to G19 and Green compositions of comparative examples (comparative compositions G1 to G3, G6 to G14). In addition, regarding the color material, the corresponding components have been changed for each column of "Color Material 1", "Color Material 2" and "Color Material 3" in the table. The same applies to other components.

Furthermore, as shown in Table 2, comparative composition G4 was obtained by using the same components, mixtures, and steps as in the case of green composition G4, except for changing the type of the pigment derivative. Furthermore, as shown in Table 2, comparative composition G5 was obtained by using the same components, blending, and steps as in the case of green composition G5, except for changing the type of the pigment derivative.

Table 2 shows the characteristic components of each of the above-mentioned green compositions. In addition, in Table 2, descriptions of surfactant, ultraviolet absorber, epoxy resin, and PGMEA are omitted because they are common components in all compositions. In addition, this table also shows the total content of pigments and pigment derivatives (pigment concentration) relative to the total solid content for each composition. Each numerical value in parentheses in the item of the pigment derivative represents the ratio (parts by mass) of the pigment derivative 1 or the pigment derivative A in the dispersion liquid.

<<Red composition R1>>

(Preparation of Pigment Dispersion R1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid R1.

Raw materials for dispersion:

(Preparation of red composition R1)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining a red composition R1.

Raw materials of the composition:

<<Red composition R2>>

(Preparation of Pigment Dispersion R2)

For the pigment, half of PR254 was changed to PO71, but the same ingredients and blended raw materials as those of the pigment dispersion R1 were used. Moreover, the pigment dispersion liquid R2 was obtained by the same procedure as the preparation method of the pigment dispersion liquid R1.

(Preparation of red composition R2)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining a red composition R2.

Raw materials of the composition:

<<Red composition R4>>

(Preparation of Pigment Dispersion R4)

The same raw material as the raw material of the pigment dispersion R1 was used, and the pigment dispersion R4 was obtained by the same procedure as the manufacturing method of the pigment dispersion R1.

(Preparation of red composition R4)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain red composition R4.

Raw materials of the composition:

<<Red composition R5>>

(Preparation of Pigment Dispersion R5)

The same raw material as the raw material of the pigment dispersion R1 was used, and the pigment dispersion R5 was obtained by the same procedure as the preparation method of the pigment dispersion R1.

(Preparation of red composition R5)

Next, a mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain a red composition R5.

Raw materials of the composition:

<<Compositions of red compositions R3, R6~R19 and comparative examples>>

As shown in Table 3, red compositions R3, R6 to R19 and comparative examples were obtained using the same components, mixtures and steps as in the case of red composition R1, except for changing the types of components of the dispersion and composition respectively. The red composition (compare compositions R1~R3, R6~R14).

In addition, as shown in Table 3, comparative composition R4 was obtained by using the same components, blending, and steps as in the case of red composition R4, except for changing the type of the pigment derivative. Furthermore, as shown in Table 3, comparative composition R5 was obtained by using the same components, blending, and steps as in the case of red composition R5, except for changing the type of the pigment derivative.

Table 3 shows the characteristic components of each of the above red compositions. In addition, in Table 3, descriptions of surfactant, ultraviolet absorber, epoxy resin, and PGMEA are omitted because they are common components in all compositions. In addition, this table also shows the pigment concentration for each composition.

<<Blue composition B1>>

(Preparation of Pigment Dispersion B1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion B1.

Raw materials for dispersion:

(Preparation of blue composition B1)

Next, a mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining blue composition B1.

Raw materials of the composition:

<<Blue composition B3>>

(Preparation of Pigment Dispersion B3)

The same raw material as that of the pigment dispersion B1 was used, and the pigment dispersion B3 was obtained by the same procedure as the preparation method of the pigment dispersion B1.

(Preparation of blue composition B3)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining blue composition B3.

Raw materials of the composition:

<<Blue composition B4>>

(Preparation of Pigment Dispersion B4)

The same raw material as that of the pigment dispersion B1 was used, and the pigment dispersion B4 was obtained by the same procedure as the preparation method of the pigment dispersion B1.

(Preparation of blue composition B4)

Next, a mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining blue composition B4.

Raw materials of the composition:

<<Compositions of blue compositions B2, B5~B18 and comparative examples>>

As shown in Table 4, except for changing the types of components of the dispersion liquid and the composition, blue compositions B2, B5 to B18 and Blue compositions of comparative examples (comparative compositions B1 to B2, B5 to B13).

Furthermore, as shown in Table 4, comparative composition B3 was obtained by using the same components, mixtures, and steps as in the case of blue composition B3, except for changing the type of the pigment derivative. Furthermore, as shown in Table 4, comparative composition B4 was obtained by using the same components, mixtures, and steps as in the case of blue composition B4, except for changing the type of the pigment derivative.

Table 4 shows the characteristic components of each of the above-mentioned blue compositions. In addition, in Table 4, descriptions of the surfactant, ultraviolet absorber, epoxy resin, and PGMEA are omitted because they are common components in all compositions. In addition, this table also shows the pigment concentration for each composition.

<<Yellow composition Y1>>

(Preparation of Pigment Dispersion Y1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid Y1.

Raw materials for dispersion:

(Preparation of yellow composition Y1)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining a yellow composition Y1.

Raw materials of the composition:

<<Yellow composition Y2 and compositions of comparative examples>>

As shown in Table 5, yellow composition Y2 and the yellow composition of the comparative example were obtained by using the same ingredients, mixing, and steps as in the case of yellow composition Y1, except for changing the types of components of the dispersion liquid and the composition respectively. (Compare compositions Y1~Y2).

Table 5 shows the characteristic components of each of the above yellow compositions. Additionally, in Table 5, Descriptions of the surfactant, ultraviolet absorber, and PGMEA are omitted because they are common components in all compositions. In addition, this table also shows the pigment concentration for each composition.

<<Magenta composition M1>>

(Preparation of Pigment Dispersion M1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid M1.

Raw materials for dispersion:

(Preparation of magenta composition M1)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain a magenta composition M1.

Raw materials of the composition:

<<Magenta composition M2 and compositions of comparative examples>>

As shown in Table 6, except for changing the types of components of the dispersion liquid and the composition, the magenta composition M2 and the comparative example were obtained by using the same components, mixing and steps as in the case of the magenta composition M1. Red composition (compare compositions M1~M2).

Table 6 shows the characteristic components of each of the above-mentioned magenta compositions. In addition, in Table 6, descriptions of the surfactant, ultraviolet absorber, silane coupling agent, and PGMEA are common components in all compositions and are therefore omitted. In addition, this table also shows the pigment concentration for each composition.

<<Cyan composition C1>>

(Preparation of Pigment Dispersion C1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid C1.

Raw materials for dispersion:

(Preparation of cyan composition C1)

Next, a mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain cyan composition C1.

Raw materials of the composition:

<<Cyan compositions C2~C3 and compositions of comparative examples>>

As shown in Table 7, except for changing the types of components of the dispersion liquid and the composition, the cyan compositions C2 to C3 and the cyan color of the comparative example were obtained by using the same components, mixing and steps as in the case of the cyan composition C1. Composition (compare compositions C1~C3). The color material of composition C2 and comparative composition C2 is a mixed pigment obtained by changing 1/3 of the color material content of composition C1 from PG7 to PG36.

<<Cyan composition C4>>

(Preparation of Pigment Dispersion C4)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid C4.

Raw materials for dispersion:

(Preparation of cyan composition C4)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain cyan composition C4.

Raw materials of the composition:

<<Cyan composition C5 and compositions of comparative examples>>

As shown in Table 7, cyan composition C5 and the cyan composition of the comparative example were obtained by using the same components, blending, and steps as in the case of cyan composition C4, except that the types of components of the dispersion liquid and the composition were changed respectively. (Compare compositions C4~C5).

Table 7 shows the characteristic components of each of the cyan compositions. In addition, in Table 7, descriptions of surfactant, ultraviolet absorber, PGMEA, and EEP are omitted because they are common components in all compositions. In addition, this table also shows the pigment concentration for each composition.

<<Composition for near infrared cut filter SIR1>>

(Preparation of Pigment Dispersion SIR1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid SIR1.

Raw materials for dispersion:

(Production of near-infrared cut filter composition SIR1)

Next, after stirring the mixture obtained by mixing the following raw materials, use a pore diameter of 0.45 μm. It was filtered with a nylon filter (manufactured by Nihon Pall Ltd.) to obtain a near-infrared cut filter composition SIR1.

Raw materials of the composition:

<<Compositions SIR2~SIR3 for near-infrared cut filters and compositions of comparative examples>>

As shown in Table 8, except for changing the types of components of the dispersion liquid and the composition, a composition for a near-infrared cutoff filter was obtained using the same components, blending, and steps as in the case of the composition for a near-infrared cutoff filter SIR1. Compositions for near-infrared cut filters of SIR2 to SIR3 and comparative examples (comparative compositions SIR1 to SIR3).

Table 8 shows the characteristic components of each of the above-mentioned near-infrared cut filter compositions. In addition, in Table 8, descriptions of surfactant, ultraviolet absorber and PGMEA are omitted because they are common components in all compositions. In addition, this table also shows the pigment concentration for each composition.

<<Composition for near-infrared transmission filter IRP1>>

(Preparation of pigment dispersion IRP1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid IRP1.

Raw materials for dispersion:

(Preparation of composition IRP1 for near-infrared transmission filter)

After stirring the mixture obtained by mixing the following raw materials, use nylon with a pore diameter of 0.45 μm. Filtered with a manufactured filter (manufactured by Nihon Pall Ltd.), a composition IRP1 for a near-infrared ray transmitting filter was obtained.

Raw materials of the composition:

<<Composition for near infrared transmission filter IRP2>>

(Preparation of pigment dispersion IRP2)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid IRP2.

Raw materials for dispersion:

(Preparation of composition IRP2 for near-infrared transmission filter)

The mixture obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain a near-infrared ray transmitting filter composition IRP2.

Raw materials of the composition:

<<Composition IRP3 for near infrared transmission filter>>

(Preparation of pigment dispersion IRP3)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid IRP3.

Raw materials for dispersion:

(Preparation of composition IRP3 for near-infrared transmission filter)

The mixture obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain a composition IRP3 for a near-infrared transmission filter.

Raw materials of the composition:

<<Composition for near-infrared transmission filter of comparative example>>

As shown in Table 9, in addition to changing the types of components of the dispersion liquid and the composition, by Compositions for near-infrared rays transmitting filters (comparative compositions IRP1 to IRP3) of comparative examples were obtained using the same ingredients, ingredients, and procedures as in the case of the composition for near-infrared rays transmitting filters IRP1.

Table 9 shows the characteristic components of each of the above-mentioned near-infrared ray transmitting filter compositions. In addition, in Table 9, descriptions of surfactant, silane coupling agent and PGMEA are omitted because they are common components in all compositions. In addition, this table also shows the pigment concentration for each composition.

<<White composition W>>

(Preparation of Pigment Dispersion W)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid W.

Raw materials for dispersion:

(Preparation of white composition W)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining a white composition W.

Raw materials of the composition:

<<White composition of comparative example>>

As shown in Table 10, except for changing the types of components of the dispersion liquid and the composition, the white composition of the comparative example (Comparative Composition W) was obtained using the same components, blending, and steps as in the case of the white composition W. ).

Table 10 shows the characteristic components of each of the above-mentioned white compositions. In addition, in Table 10, descriptions of the surfactant, ultraviolet absorber, PGMEA, and cyclohexanone are common components in all the compositions, and therefore are omitted. In addition, this table also shows the pigment concentration for each composition.

<Creation of structure>

<<Example 1>>

First, an 8-inch (1 inch = approximately 25.4mm) silicon wafer was prepared. Then, the composition for the undercoat layer is coated on the silicon wafer by spin coating, and heated at 100°C for 2 minutes using a hot plate, and then heated at 230°C for 2 minutes to form a layer on the wafer. A base coating with a film thickness of 10nm is applied. Next, the above-mentioned green composition G1 was applied on the undercoat layer by spin coating, and heated at 100° C. for 2 minutes using a hot plate, thereby forming a green composition layer with a film thickness of 0.5 μm on the undercoat layer. . Next, using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.), the green composition was exposed at an exposure dose of 150 mJ/cm ² through a mask having a 1.0 μm square Bayer pattern. Next, spin immersion development was performed on the green composition layer at 23° C. for 60 seconds using a 0.3 mass% aqueous solution of tetramethylammonium hydroxide (TMAH). Then, the wafer was rinsed by rotating spray and washed with pure water, and then the wafer was heated at 220°C for 5 minutes using a hot plate to form green pixels with a thickness of 0.5 μm and a square shape of 1.0 μm.

Furthermore, the above red composition R1 was used to perform the same process on the silicon wafer on which the green pixels were formed, and red pixels with a thickness of 0.5 μm and a square shape of 1.0 μm were formed adjacent to the green pixels on the silicon wafer. . Thereby, a structure is formed in which green pixels and red pixels are adjacent to each other on opposite sides. Specifically, a structure having a pixel arrangement as shown in a) to c) of Figure 1 is formed (structure type I). Here, for example, the green pixel is the first pixel P1 and the red pixel is the second pixel P2.

<<Examples 2~9, 20~25 and Comparative Examples 1~9, 20~27, 29~30>>

As the combination of components used to form the structure of structure type I, the combinations shown in Table 11 and Table 12 are respectively used, and the same processing as in Embodiment 1 is performed to sequentially form the first pixel and the second pixel. This creates a structure of structure type I respectively.

<<Example 10>>

First, green pixels with a thickness of 0.5 μm and a square shape of 1.0 μm were formed on a silicon wafer using the above-mentioned green composition G1 by the same method as Example 1. Next, the above-mentioned red composition R1 was used to perform the same process on the silicon wafer on which the green pixels were formed, and a red layer with a thickness of 0.5 μm and a square shape of 1.0 μm was formed on the silicon wafer adjacent to the green pixel. pixels. Finally, the above-mentioned blue composition B1 is used to perform the same process on the silicon wafer with green pixels and red pixels formed, and a thickness of 0.5 μm and a square shape of 10 μm is formed on the silicon wafer adjacent to the green pixel. blue pixels. In addition, when forming red pixels and blue pixels, a mask having an island pattern of 1.0 μm square was used during exposure.

Thereby, a structure is formed in which the green pixel and the red pixel are adjacent to each other on one side and the green pixel and the blue pixel are adjacent to each other on the opposite side. Specifically, a structure is formed as shown in a) of Figure 2 The pixel configuration structure (structure type IIa). Here, for example, the green pixel is the first pixel P1, the red pixel is the second pixel P2, and the blue pixel is the third pixel P3.

<<Examples 11~13 and Comparative Examples 10~13, 28>>

As a combination of compositions for forming a structure type IIa, the combinations shown in Table 11 and Table 12 are respectively used, and the same processing as in Embodiment 10 is performed to sequentially form the first pixel, the second pixel and the second pixel. 3 pixels, thereby creating structures of type IIa respectively.

<<Example 14>>

The composition for the undercoat layer was coated on the same silicon wafer as in Example 1 by spin coating, and heated at 100°C for 2 minutes using a hot plate, and then heated at 230°C for 2 minutes, thereby forming a wafer on the wafer. An undercoat layer with a film thickness of 10 nm was formed on the circle. Next, the above-mentioned green composition G1 was applied on the undercoat layer by spin coating, and heated at 100° C. for 2 minutes using a hot plate, thereby forming a green composition layer with a film thickness of 0.5 μm on the undercoat layer. . Next, using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.), the green composition was exposed at an exposure dose of 150 mJ/cm ² through a mask having an island pattern of 1.0 μm square. Next, spin immersion development was performed on the green composition layer at 23° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, the wafer was rinsed by rotating spray and washed with pure water, and then the wafer was heated at 220°C for 5 minutes using a hot plate to form green pixels with a thickness of 0.5 μm and a square shape of 1.0 μm.

Next, the above-mentioned red composition R1 was used to perform the same process on the silicon wafer on which the green pixels were formed, and a 0.5 μm-thick layer was formed on the silicon wafer adjacent to the green pixels. and 1.0μm square red pixels. Next, using the above-mentioned blue composition B1, the same process is performed on the silicon wafer on which the green pixel and the red pixel are formed, and 0.5 μm and 1.0 μm thick pixels are formed on the silicon wafer adjacent to the green pixel. μm square blue pixels. Finally, using the above-mentioned near-infrared transmission filter composition IRP1, the same process is performed on the silicon wafer on which green pixels, red pixels, and blue pixels are formed, and the green pixels and vertices on the silicon wafer are opposite to each other. Near-infrared ray transmitting pixels with a thickness of 0.5 μm and a square shape of 1.0 μm were formed in these positions.

Thereby, the green pixel and the red pixel are adjacent to each other on the opposite side, the green pixel and the blue pixel are adjacent to each other on the opposite side, and the near-infrared ray transmitting pixel is adjacent to both the red pixel and the blue pixel. Specifically, a structure having a pixel configuration as shown in a) of FIG. 3 is formed (structure type III). Here, for example, the green pixel is the first pixel P1, the red pixel is the second pixel P2, the blue pixel is the third pixel P3, and the near-infrared ray transmitting pixel is the fourth pixel P4.

<<Examples 15~19 and Comparative Examples 14~19>>

As a combination of compositions for forming the structure of structure type III, the combinations shown in Table 11 and Table 12 are respectively used, and the same process as in Example 14 is performed to form the first pixel, the second pixel, and the second pixel in order. The 3rd pixel and the 4th pixel were used to create structures of structure type III respectively.

<<Example 26>>

A silicon oxide layer was formed on an 8-inch silicon wafer by plasma CVD. Next, the silicon oxide layer was patterned by dry etching under the conditions described in paragraphs 0128 to 0133 of Japanese Patent Application Laid-Open No. 2016-014856, and formed into a grid pattern at intervals of 1.0 μm. Silicon oxide forms a partition wall (width 0.1 μm, thickness 0.25 μm). Regarding the opening size of the partition wall on the silicon wafer (the area divided by the partition wall on the silicon wafer), the length is 1.0 μm and the width is 1.0 μm.

Next, using the above-mentioned green composition G1 and using the same method as Example 1, green pixels with a thickness of 0.5 μm and a square shape of 1.0 μm were formed on the silicon wafer with partition walls. At this time, the mask position during exposure is adjusted so that one pixel corresponds to one area separated by the partition wall. Next, the above-mentioned red composition R1 was used to perform the same process on the silicon wafer on which the green pixels were formed, and red pixels with a thickness of 0.5 μm and a square shape of 1.0 μm were formed on the silicon wafer adjacent to the green pixels. . Finally, the above-mentioned blue composition B1 was used to perform the same process on the silicon wafer on which the green pixel and the red pixel were formed, and 0.5 μm and 1.0 μm thickness were formed on the silicon wafer adjacent to the green pixel. Square blue pixels. In addition, when forming red pixels and blue pixels, a mask having an island pattern of 1.0 μm square was used during exposure.

Thereby, a structure is formed in which the green pixel and the red pixel are adjacent to each other on one side and the green pixel and the blue pixel are adjacent to each other on the opposite side. Specifically, a structure is formed as shown in a) of Figure 2 A structure in which pixels are arranged and have partition walls at the boundaries between pixels as shown in FIGS. 2 b) and 2 c) (structural type IIb). Here, for example, the green pixel is the first pixel P1, the red pixel is the second pixel P2, and the blue pixel is the third pixel P3.

<<Example 27-32>>

As a combination of the components used to form the structure of structure type IIb, the combinations shown in Table 11 are respectively used, and the same processing as in Embodiment 26 is performed to form the first pixel, the second pixel and the third pixel in sequence. In this way, structures of structural type IIb were produced respectively.

<Preparation of photosensitive composition>

In addition, in addition to the above-mentioned photosensitive composition, various compositions shown in Tables 13 to 23 were produced by using the above-mentioned raw materials and the following new raw materials through the steps and blending described below.

<<Raw materials>>

<<<Color materials: pigments, dyes>>>

‧PR202: C.I. Pigment Red 202

‧PR264: C.I. Pigment Red 264

‧PR269: C.I. Pigment Red 269

‧PR291: C.I. Pigment Red 291

‧PR296: C.I. Pigment Red 296

‧PR297: C.I. Pigment Red 297

‧PG59: C.I. Pigment Green 59

‧PG63: C.I. Pigment Green 63

‧PB15:3: C.I. Pigment Blue 15:3

‧PB15:4: C.I. Pigment Blue 15:4

‧PB16: C.I. Pigment Blue 16

‧PY215: C.I. Pigment Yellow 215

‧PY228: C.I. Pigment Yellow 228

‧PY231: C.I. Pigment Yellow 231

‧PY233: C.I. Pigment Yellow 233

‧PV2: C.I. Pigment Violet 2

‧PV19: C.I. Pigment Violet 19

‧PV37: C.I. Pigment Violet 37

<<<Pigment Derivatives of Examples>>>

‧Pigment Derivative 101: Compound C-60 in Table 1 above (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 102: Compound with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 103: Compound with the following structure (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 104: Compound C-93 in Table 1 above (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

‧Pigment Derivative 105: Compound C-95 in Table 1 above (εmax: 100L‧mol ^-1 ‧cm ^-1 or less, basic)

<<<Dispersant>>>

‧Dispersant 4: compound with the following structure (Mw: 30000). The numerical value appended to the main chain represents the molar ratio of the repeating units.

‧Dispersant 5: Solsperse 20000 (manufactured by The Lubrizol Corporation).

<<<Resin>>>

‧Resin 3: CYCLOMER P(ACA)230AA (Mw: 14000, manufactured by DAICEL-ALLNEX LTD.).

‧Resin 4: compound with the following structure (Mw: 14000). The numerical value appended to the main chain represents the molar ratio of the repeating units.

<<<Photopolymerization initiator>>>

‧Photopolymerization initiator 4: a compound with the following structure.

‧Photopolymerization initiator 5: a compound with the following structure.

<<<Surface active agent>>>

‧Surfactant 2: Nonionic surfactant (Pionin D 6112W, manufactured by TAKEMOTO OIL & FAT CO., LTD).

<<<Epoxy resin>>>

‧Epoxy resin 2: Epicron N-695 (manufactured by DIC Corporation).

<<Polymerization inhibitor>>

‧Superposition inhibitor 1: A compound with the following structure.

<<<Solvent>>>

‧PGME: propylene glycol monomethyl ether

<<Green composition G101~G135>>

As shown in Table 13, except for changing the types of components of the dispersion liquid and the composition, green compositions G101 to G112, G115 to G123, and G128~G135. Furthermore, as shown in Table 13, except for changing the types of components of the dispersion liquid, green compositions G113, G124, and G126 were obtained using the same components, mixtures, and steps as in the case of green composition G20. Moreover, as shown in Table 13, except for changing the types of components of the dispersion liquid, green compositions G114, G125, and G127 were obtained by using the same components, blending, and steps as in the case of green composition G21.

<<Red composition R101, R103~R118>>

As shown in Table 14, red compositions R101, R103 to R118 were obtained using the same components, blending, and steps as in the case of red composition R1, except that the types of components of the dispersion liquid and the composition were changed respectively.

<<Red composition R102>>

(Preparation of Pigment Dispersion R102)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid R1.

Raw materials for dispersion:

(Preparation of red composition R102)

Next, the mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining red composition R102.

Raw materials of the composition:

<<Red composition R119~R126>>

As shown in Table 14, red compositions R119 to R126 were obtained using the same components, blending, and steps as in the case of red composition R102, except for changing the types of components of the dispersion liquid and composition.

<<Blue composition B101~B114>>

As shown in Table 15, blue compositions B101 to B114 were obtained using the same components, blending, and steps as in the case of blue composition B1, except that the types of components of the dispersion liquid and the composition were changed respectively.

<<Yellow composition Y101~Y112>>

As shown in Table 16, yellow compositions Y101 to Y112 were obtained using the same components, blending, and steps as in the case of yellow composition Y1, except that the types of components of the dispersion liquid and composition were changed respectively.

<<Magenta composition M101~M110>>

As shown in Table 17, magenta compositions M101 to M110 were obtained using the same components, mixtures, and steps as in the case of magenta composition M1, except that the types of components of the dispersion liquid and composition were changed respectively.

<<Blue composition C101~C116>>

As shown in Table 18, cyan compositions C101 to C104 and C109 to C112 were obtained using the same components, mixtures, and steps as in the case of cyan composition C1, except that the types of components of the dispersion liquid and composition were changed respectively. In addition, the color materials in compositions C102, C103, C110, and C111 are mixed pigments obtained by changing 1/3 of the color material content of PG7 in the cyan composition C1 to color material 2 in the table. Furthermore, as shown in Table 18, cyan compositions C105 to C108 and C103 were obtained using the same components, blends and steps as in the case of cyan composition C4, except that the types of components of the dispersion liquid and composition were changed respectively. C116.

<<Compositions for near infrared cut filters SIR101~SIR106>>

As shown in Table 19, in addition to changing the types of components of the dispersion liquid and the composition, the composition SIR101 for an infrared cut filter was obtained using the same ingredients, mixing and procedures as those of the composition SIR1 for a near infrared cut filter. ~SIR106.

<<Compositions for near infrared transmission filters IRP101~IRP118>>

As shown in Table 20, except for changing the types of components of the dispersion liquid and the composition, a composition for a near-infrared ray transmission filter was obtained using the same components, blending, and procedures as in the case of the composition for a near-infrared ray transmission filter IRP1. IRP101, IRP104, IRP107, IRP110, IRP113, IRP116. Furthermore, as shown in Table 20, in addition to changing the types of components of the dispersion liquid and the composition, a composition for a near-infrared ray transmission filter was obtained using the same components, blending, and procedures as in the case of the composition IRP2 for a near-infrared ray transmission filter. Compositions IRP102, IRP105, IRP108, IRP111, IRP114, IRP117. Furthermore, as shown in Table 20, in addition to changing the types of the components of the dispersion liquid and the composition, a composition for a near-infrared ray transmission filter was obtained using the same components, blending, and procedures as in the case of the composition IRP3 for a near-infrared ray transmission filter. Compositions IRP103, IRP106, IRP109, IRP112, IRP115, IRP118.

<<White composition W101, 102>>

As shown in Table 21, white compositions W101 and W102 were obtained by using the same components, blending, and steps as in the case of white composition W1, except that the types of components of the dispersion liquid and the composition were changed respectively.

<<Green composition G201>>

(Preparation of Pigment Dispersion G201)

A mixture of the raw materials shown in Table 22(a) below was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid G201.

(Preparation of green composition G201)

Next, the mixed solution obtained by mixing the raw materials shown in Table 22(b) below was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain green composition G201.

<<Green composition G202>>

(Preparation of Pigment Dispersion G202)

A mixture of the raw materials shown in Table 23(a) below was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid G202.

(Preparation of green composition G202)

Next, the mixed solution obtained by mixing the raw materials shown in Table 23(b) below was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to obtain green composition G202.

<Creation of structure>

<<Examples 101~109>>

As a combination of components for forming the structure of structure type I, the combination shown in Table 24 was used for each embodiment, and the same process as in Example 1 was performed to form the first pixel and the second pixel in order. .

<<Examples 110~113>>

As a combination of components for forming the structure type IIa, the combinations shown in Table 24 were used for each embodiment, and the same process as in Example 10 was performed to form the first pixel and the second pixel in order. and the 3rd pixel.

<<Examples 114~121>>

As a combination of components for forming the structure type III structure, the combination shown in Table 24 was used for each embodiment, and the same process as in Example 14 was performed to form the first pixel, the second pixel, and the second pixel in order. The 3rd pixel and the 4th pixel.

<<Examples 122~125>>

As a combination of compositions for forming a structure of type IIb, for each embodiment The combinations shown in Table 24 were used, and the same processing as in Embodiment 26 was performed to form the first pixel, the second pixel, and the third pixel in order.

<<Examples 201, 202>>

As the combination of components used to form the structure of structure type I, the combination shown in Table 25 was used for each embodiment, and the same process as in Example 1 was performed to form the first pixel and the second pixel in order. .

<<Examples 203, 204>>

As a combination of components for forming the structure type IIa, the combinations shown in Table 25 were used for each embodiment, and the same process as in Example 10 was performed to form the first pixel and the second pixel in order. and the 3rd pixel.

<<Examples 205, 206>>

As a combination of components for forming the structure type III structure, the combination shown in Table 25 was used for each embodiment, and the same process as in Example 14 was performed to sequentially form the first pixel, the second pixel, The 3rd pixel and the 4th pixel.

<<Examples 207, 208>>

As a combination of components for forming the structure type IIb, the combination shown in Table 25 was used for each embodiment, and the same process as in Example 26 was performed to form the first pixel and the second pixel in order. and the 3rd pixel.

<Evaluation of stability>

For each structure of the Example and Comparative Example, a constant temperature and humidity test was performed for 2000 hours in a constant temperature and humidity chamber with a temperature of 50°C and a humidity of 85%. After the constant temperature and humidity test, a transmission electron microscope was used to observe the cross-section of the above-mentioned structure at a 4x magnification, and the occurrence rate of voids between pixels was examined. Furthermore, the stability was evaluated based on the void generation rate as an index. An evaluation level of 3 or higher is a level that can be said to have excellent stability in the deep part of the pixel.

Rating rating and its content:

5: The generation rate of voids=0

0.1 4:0< void generation rate

0.1

0.2 3: 0.1< void generation rate

0.2

0.5 2: 0.2< void generation rate

0.5

1.0 1:0.5< void generation rate

1.0

For the combination of pixels in contact with each other, the void generation rate was calculated by the following equation.

The generation rate of gaps = [the number of gaps among the observed boundaries]/[the number of observed boundaries]

Furthermore, in this example, 20 cross-sections were randomly selected from the structure, and a total of 200 boundaries were observed by observing the presence or absence of gaps in 10 consecutively arranged boundary groups on each cross-section.

The results are shown in Table 11, Table 12, Table 24 and Table 25. In the table, in the item "stability", "a" represents the evaluation result in the cross section of the first pixel and the second pixel, "b" represents the evaluation result in the cross section of the first pixel and the third pixel, and "c" "" represents the evaluation result in the cross section of the second pixel and the fourth pixel, and "d" represents the evaluation result in the cross section of the third pixel and the fourth pixel.

As shown in each table, it can be seen that by using a transparent pigment derivative for adjacent pixels, a structure excellent in stability in the deep portion of the pixel can be obtained. In particular, through the comparison between Example 2 and Comparative Example 23, the comparison between Example 6 and Comparative Example 24, and the comparison between Example 12 and Comparative Example 25, even if only one of the adjacent pixels uses a transparent pigment derivative , transparent pigment derivatives are not very helpful in improving stability.

Furthermore, when the pigment concentration is 25% by mass, the transparent pigment derivative is used to stabilize the The qualitative judgment value improved from 2 to 5 (Comparison of Examples 23 to 25 and Comparative Examples 23 to 25). On the other hand, when the pigment concentration is 60 mass% and the pigment concentration is 40 mass%, by using the transparent pigment derivative, the stability judgment value is improved from 1 to 5 (Examples 1 to 3 and 5, respectively). Comparison of Comparative Examples 1 to 3 and Comparison of Examples 20 to 22 and Comparative Examples 20 to 22). That is, when the pigment concentration in the pixel is as high as about 40% by mass or more, the deep portion of the pixel tends to be difficult to harden and the stability over time tends to decrease. Therefore, it can be said that the usefulness of the present invention is great in this case.

Moreover, in the above-mentioned Examples and Comparative Examples, even if the green compositions G2 to G3 and G6 to G24 are used instead of the green composition G1 to form green pixels, the same results can be obtained. In the above embodiments and comparative examples, the same results can be obtained even if the red compositions R2 to R3 and R6 to R19 are used instead of the red composition R1 to form red pixels. In the above Examples and Comparative Examples, even if blue compositions B2, B5 to B18 are used instead of blue composition B1 to form blue pixels, the same results can be obtained. In the above-described embodiments and comparative examples, the same results can be obtained even if the yellow composition Y2 is used instead of the yellow composition Y1 to form yellow pixels. In the above embodiments and comparative examples, even if the magenta composition M2 is used instead of the magenta composition M1 to form a magenta pixel, the same result can be obtained. In the above embodiment, even if cyan compositions C2 to C5 are used instead of cyan composition C1 to form cyan pixels, the same result can be obtained. In the above comparative example, the same result can be obtained even if the cyan compositions C2 to C5 are used instead of the cyan composition C1 to form cyan pixels. In the above Examples and Comparative Examples, the same results can be obtained even if the near infrared cut filter compositions SIR2 to SIR3 are used instead of the near infrared cut filter composition SIR1 to form near infrared cut filter pixels. In the above-mentioned Examples and Comparative Examples, even if the near-infrared ray-transmitting filter compositions IRP2 to IRP3 are used instead of the near-infrared ray-transmitting filter composition IRP1 to form pixels for a near-infrared ray-transmitting filter, it is possible to obtain Same result. Even if pixels are formed using the compositions of other comparative examples, the same boundary can be obtained.

In addition, even when an oxime compound other than the oxime compound used in the examples is used as a initiator in the composition, when two kinds of oxime compounds are used in combination, and when an oxime compound and a initiator other than the oxime compound are used. Even when two kinds of initiators other than the oxime compound were used in combination, a structure excellent in stability was obtained as in the Examples of the present invention. In addition, even if solid components in the composition such as two types of resins, polymerizable monomers, and solvents are used together, a structure excellent in stability is obtained as in the Examples of the present invention.

Each structure of the Example was assembled on a solid-state imaging device according to a known method and the image quality was evaluated. As a result, good performance was obtained.

<Application of structure>

In addition, three structures similar to those of the above-described Example 1 were produced, and the following lens material compositions L1 to L3 for IR lenses were used on the optical filter composed of all pixels in each structure, as follows: The microlenses are respectively formed by the above method, thereby producing a structure with lenses. Furthermore, the same stability evaluation as above was performed. As a result, each structure was stable as in Example 1. Regarding the structure of the above-mentioned Example 10, three structures with lenses were also produced through the same steps, and the same stability evaluation was performed. This lens-attached structure is as stable as Example 10. Regarding the structure of the above-mentioned Example 18, three structures with lenses were also produced through the same steps, and the same stability evaluation was performed. This lens-attached structure is as stable as Example 18. Regarding the structure of the above Example 26, three structures with lenses were also produced through the same steps, and the same stability evaluation was performed. This lens-attached structure is as stable as Example 26.

<<Lens material composition L1>>

(Preparation of Pigment Dispersion L1)

A mixture of the following raw materials was mixed and dispersed using a bead mill (zirconia beads with a diameter of 0.1 mm) for 3 hours to prepare a pigment dispersion. Then, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing under the conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated 10 times to obtain a pigment dispersion liquid L1.

Raw materials for dispersion:

(Preparation of lens material composition L1)

Next, a mixed solution obtained by mixing the following raw materials was stirred and then filtered using a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby obtaining a lens material composition L1.

Raw materials of the composition:

<<Lens material composition L2, L3>>

As shown in Table 26, except for changing the types of components of the dispersion liquid and the composition, lens material compositions L2 and L3 were obtained using the same components, mixtures, and steps as in the case of lens material composition L1.

In this table, since they are common components in all compositions, descriptions of Adeka Stab AO-80 and surfactant as additives and PGMEA as solvent are omitted. Regarding the ingredients, the corresponding ingredients were changed for each column of "ingredient 1", "ingredient 2" and "ingredient 3" in the table. In addition, Ogsol PG-100 and Ogsol CG-500 (manufactured by Osaka Gas Chemicals Co., Ltd.) are epoxy resins having a fluorine skeleton, and CR-1030 (manufactured by Osaka Gas Chemicals Co., Ltd.) is an acid-modified fluorine. type polyester resin.

The refractive index of each of the lens material components L1 to L3 with respect to light with a wavelength of 550 nm, the minimum transmittance with respect to light with a wavelength of 400 to 700 nm (film thickness 0.35 μm), and the transmittance with respect to light with a wavelength of 820 nm (film thickness 0.35μm) as shown in Table 27. The film (film thickness 0.35 μm) used to measure the refractive index was produced by applying each lens material composition on a silicon wafer by spin coating, and heating the wafer at 100°C using a heating plate. 2 minutes, and then use a heating plate to heat the wafer at 220°C for 5 minutes. On the other hand, the film (film thickness 0.35 μm) used for spectroscopic measurement was produced by applying each lens material composition on a glass wafer by spin coating, and using a hot plate at 100° C. The wafer was heated for 2 minutes, and then the wafer was heated at 220° C. for 5 minutes using a heating plate.

<<Formation method of microlens>>

After fabricating the optical filter on the silicon wafer, each lens material composition is coated by spin coating, and heated at 100°C for 2 minutes using a hot plate, and then heated at 220°C for 5 minutes using a hot plate. A lens material composition layer with a film thickness of 1.2 μm was formed. Then, a microlens was formed by processing the lens material composition layer so that the height from the top of the lens to the bottom of the lens became 400 nm using a transfer method based on an etchback which is a known technology.

1:Support

2: partition wall

P1~P4: pixels

S3: Structure

SIR: Near infrared cut filter

Claims (11)

A structure having two pixels two-dimensionally arranged in contact with each other. Each of the two pixels contains a pigment and the maximum value of the Mohr absorption coefficient in the wavelength range of 400 to 700 nm is 3000L‧mol ^-1 ‧cm ^-1 or less pigment derivatives and resins, at least one of the pigment derivatives is a compound represented by the following formula (1), A ¹ -L ¹ -Z ¹ ...(1) Formula (1) ), A ¹ represents a group containing an aromatic ring, L ¹ represents a single bond or a divalent linking group, and Z ¹ represents a group represented by formula (Z1),

In the formula (Z1), * represents a bond, Yz ¹ represents -N(Ry ¹ )- or -O-, Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and Lz ¹ represents a divalent group. The connecting group, Rz ¹ and Rz ² independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, Rz ¹ and Rz ² can be bonded through a divalent group to form a ring, m represents 1~ an integer of 5. The structure as described in claim 1, wherein the width of at least one of the two pixels is 0.3~5.0 μm. The structure as described in claim 1 or 2, wherein the thickness of at least one of the two pixels is 0.1~2.0 μm. The structure according to claim 1 or 2, wherein the total content of the pigment and the pigment derivative contained in at least one of the two pixels is 25 to 65 mass%. The structure as described in request item 1 or 2, where The mass ratio of the content of the pigment derivative contained in at least one of the two pixels to the content of the pigment contained in the same pixel is 3:97~20:80. The structure as claimed in claim 1 or 2, wherein A ¹ of the formula (1) is a group represented by the following formula (A1),

In the formula, * represents a bond, Ya ¹ and Ya ² independently represent -N(Ra ¹ )- or -O-, Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, and B ¹ and B ² each independently represent a hydrogen atom or a substituent. The structure of claim 1 or 2, wherein the two pixels are pixels containing different pigments, and the two pixels are each selected from the group consisting of red pixels, green pixels, blue pixels, yellow pixels, cyan pixels, One pixel among a magenta pixel, a black pixel, a white pixel, a pixel for a near-infrared cut filter, and a pixel for a near-infrared transmission filter. The structure according to claim 1 or 2, wherein there is a partition wall between the two pixels that is lower than the thickness of the two pixels. The structure according to claim 1 or 2, wherein the width of each of the two pixels is 0.5 μm or more and 1.7 μm or less, and the thickness is 0.2 μm or more and 0.8 μm or less, The total content of the pigment and the pigment derivative contained in at least one of the two pixels is 40 to 65% by mass, and the content of the pigment derivative is equal to the mass of the pigment contained in the same pixel. The ratio is 3:97~20:80. A solid-state imaging element having the structure according to any one of claims 1 to 9 on a semiconductor substrate. An image display device having the structure described in any one of claims 1 to 9 on a glass substrate.

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