TWI810371B - Curable composition, hardened product, and method of using the curable composition - Google Patents
Curable composition, hardened product, and method of using the curable composition Download PDFInfo
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- TWI810371B TWI810371B TW108135112A TW108135112A TWI810371B TW I810371 B TWI810371 B TW I810371B TW 108135112 A TW108135112 A TW 108135112A TW 108135112 A TW108135112 A TW 108135112A TW I810371 B TWI810371 B TW I810371B
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- curable composition
- curable
- component
- compound
- formula
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- 238000000034 method Methods 0.000 title claims abstract description 32
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- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
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- 229920001519 homopolymer Polymers 0.000 description 1
- 150000005828 hydrofluoroalkanes Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
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- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
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- 150000007522 mineralic acids Chemical class 0.000 description 1
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- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
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- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
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- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
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- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
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- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
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- 239000004417 polycarbonate Substances 0.000 description 1
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- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003870 salicylic acids Chemical class 0.000 description 1
- 238000005464 sample preparation method Methods 0.000 description 1
- 229910000275 saponite Inorganic materials 0.000 description 1
- 229910000276 sauconite Inorganic materials 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- RWRKNKVDHIEKHS-UHFFFAOYSA-N tribromo(propyl)silane Chemical compound CCC[Si](Br)(Br)Br RWRKNKVDHIEKHS-UHFFFAOYSA-N 0.000 description 1
- WAAWAIHPWOJHJJ-UHFFFAOYSA-N tributoxy(propyl)silane Chemical compound CCCCO[Si](CCC)(OCCCC)OCCCC WAAWAIHPWOJHJJ-UHFFFAOYSA-N 0.000 description 1
- GBXOGFTVYQSOID-UHFFFAOYSA-N trichloro(2-methylpropyl)silane Chemical compound CC(C)C[Si](Cl)(Cl)Cl GBXOGFTVYQSOID-UHFFFAOYSA-N 0.000 description 1
- GPHYWIXZJBGHPO-UHFFFAOYSA-N trichloro(6-methylheptyl)silane Chemical compound CC(C)CCCCC[Si](Cl)(Cl)Cl GPHYWIXZJBGHPO-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- KWDQAHIRKOXFAV-UHFFFAOYSA-N trichloro(pentyl)silane Chemical compound CCCCC[Si](Cl)(Cl)Cl KWDQAHIRKOXFAV-UHFFFAOYSA-N 0.000 description 1
- CWQOSHWRUUBECQ-UHFFFAOYSA-N trichloro-[2-(trifluoromethyl)phenyl]silane Chemical compound FC(F)(F)C1=CC=CC=C1[Si](Cl)(Cl)Cl CWQOSHWRUUBECQ-UHFFFAOYSA-N 0.000 description 1
- FXCKOIVYFFHVPJ-UHFFFAOYSA-N trichloro-[4-(trifluoromethyl)phenyl]silane Chemical compound FC(F)(F)C1=CC=C([Si](Cl)(Cl)Cl)C=C1 FXCKOIVYFFHVPJ-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- HXOGQBSDPSMHJK-UHFFFAOYSA-N triethoxy(6-methylheptyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCC(C)C HXOGQBSDPSMHJK-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- PBTDWUVVCOLMFE-UHFFFAOYSA-N triethoxy-[4-(trifluoromethyl)phenyl]silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(C(F)(F)F)C=C1 PBTDWUVVCOLMFE-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- WSXPNWHUVXMIRX-UHFFFAOYSA-N trimethoxy-[4-(trifluoromethyl)phenyl]silane Chemical compound CO[Si](OC)(OC)C1=CC=C(C(F)(F)F)C=C1 WSXPNWHUVXMIRX-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J11/00—Recovery or working-up of waste materials
- C08J11/04—Recovery or working-up of waste materials of polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
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- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/08—Macromolecular additives
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
- C09J183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
- C08K2201/003—Additives being defined by their diameter
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08K2201/00—Specific properties of additives
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- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
本發明提供一種硬化性組合物,其特徵在於,含有:下述(A)成分及(E)成分;將此硬化性組合物進行硬化而成的接著強度高的硬化物;以及將上述硬化性組合物作為光元件固定材用接著劑或光元件固定材用密封材的使用方法。本發明的硬化性組合物為硬化性佳,且折射率低。 (A)成分:為具有下述式(a-1)所示的重複單元的硬化性聚倍半矽氧烷化合物(polysilsesquioxane),滿足關於29 Si-NMR的特定條件,質量平均分子量(Mw)為特定範圍的硬化性聚倍半矽氧烷化合物, [R1 為以組成式:Cm H(2m-n+1) Fn 表示的氟烷基。m表示1~10的整數,n表示2以上,(2m+1)以下的整數。D表示R1 與Si鍵結的連結基(但是,伸烷基除外)或單鍵] (E)成分:為平均一次粒徑超過0.04μm,8μm以下的微粒子。The present invention provides a curable composition characterized by comprising: the following components (A) and (E); a cured product obtained by curing the curable composition; A method of using the composition as an adhesive for an optical element fixing material or a sealing material for an optical element fixing material. The curable composition of the present invention is excellent in curability and has a low refractive index. (A) Component: It is a curable polysilsesquioxane compound (polysilsesquioxane) having a repeating unit represented by the following formula (a-1), which satisfies the specific conditions for 29 Si-NMR, and the mass average molecular weight (Mw) For a specific range of hardening polysilsesquioxane compounds, [R 1 is a fluoroalkyl group represented by the compositional formula: C m H (2m-n+1) F n . m represents an integer of 1 to 10, and n represents an integer of not less than 2 and not more than (2m+1). D represents the linking group (except for the alkylene group) or the single bond that R1 and Si are bonded to] (E) Component: It is a fine particle with an average primary particle diameter of more than 0.04 μm and 8 μm or less.
Description
本發明是關於一種硬化性佳,且折射率低的硬化性組合物,將上述硬化性組合物進行硬化而成的接著強度高的硬化物,以及將上述硬化性組合物作為光元件固定材用接著劑或光元件固定材用密封材的使用方法。The present invention relates to a curable composition with good curability and low refractive index, a cured product obtained by curing the curable composition with high adhesive strength, and the use of the curable composition as an optical element fixing material How to use adhesives or sealing materials for optical element fixing materials.
過往,硬化性組合物對應用途進行各種改良,作為光學組件、成形體的原料、接著劑、塗佈劑等廣泛地利用於產業上。 此外,硬化性組合物亦作為光元件固定材用接著劑、光元件固定材用密封材等的光元件固定材用組合物而受到注目。Conventionally, curable compositions have been improved in various ways according to their applications, and have been widely used industrially as raw materials for optical components and molded articles, adhesives, coating agents, and the like. In addition, curable compositions are also attracting attention as compositions for optical element fixing materials such as adhesives for optical element fixing materials and sealing materials for optical element fixing materials.
光元件為半導體雷射(LD)等的各種雷射、發光二極體(LED)等的發光元件、收光元件、複合光元件、光積體電路等。 在近年,發光的波鋒波長為更短波長的藍光、白光的光元件被開發而廣泛地被使用。此類發光的波鋒波長短的發光元件的高亮度化正突飛猛進,伴隨而來,有光元件的發熱量有進一步變大的傾向。Optical elements are various lasers such as semiconductor lasers (LD), light-emitting elements such as light-emitting diodes (LED), light-receiving elements, composite optical elements, and optical integrated circuits. In recent years, optical devices that emit blue light or white light with shorter wavefront wavelengths have been developed and widely used. Such a light-emitting element with a short wavefront wavelength is rapidly increasing in luminance, and the amount of heat generated by the optical element tends to increase further.
另一方面,在近年,伴隨光元件的高亮度化,光元件固定材用組合物的硬化物長時間的暴露於從更高能量的光、光元件所產生的更高溫的熱當中,而發生接著力低下的問題。On the other hand, in recent years, along with the high brightness of optical elements, the cured product of the optical element fixing material composition is exposed to higher energy light and higher temperature heat generated by optical elements for a long time, resulting in Then the problem of low power.
為了解決此問題,於專利文獻1~3中,提案一種以聚倍半矽氧烷化合物作為主成分的光元件固定材用組合物。 然而,即使是專利文獻1~3中所紀載的組合物的硬化物,仍有難以在保持充分的接著力的同時,並且獲得耐熱性的情況。In order to solve this problem, in Patent Documents 1 to 3, a composition for an optical element fixing material containing a polysilsesquioxane compound as a main component is proposed. However, even in the cured products of the compositions described in Patent Documents 1 to 3, it may be difficult to obtain heat resistance while maintaining sufficient adhesive force.
此外,當使用硬化性組合物固定光元件等時,很多時候形成具有配合目的之折射率的硬化物變得相當重要。特別是,由於很多過往的硬化性組合物、其硬化物為折射率高者,因此尋求折射率更低的硬化性組合物。In addition, when using a curable composition to fix an optical element or the like, it is often important to form a cured product having a refractive index suitable for the purpose. In particular, since many cured products of conventional curable compositions have a high refractive index, curable compositions with lower refractive indices have been demanded.
於專利文獻4中,作為供應折射率低的硬化物的硬化性組合物,記載有一種含有具有氟烷基的硬化性聚倍半矽氧烷化合物的硬化性組合物。 然而,如專利文獻4的實施例所示般,當使用含有具有氟烷基的重複單元的比例高的硬化性聚倍半矽氧烷化合物的硬化性組合物時,難以獲得接著強度高的硬化物。如此一來,專利文獻4中記載的硬化性組合物的硬化物,高接著強度與低折射率之間有難以兼顧的關係。因此,當使用專利文獻4中記載的硬化性組合物時,難以獲得具有高接著強度與低折射率兩者特性的硬化物。Patent Document 4 describes a curable composition containing a curable polysilsesquioxane compound having a fluoroalkyl group as a curable composition for supplying a cured product having a low refractive index. However, as shown in the Examples of Patent Document 4, when a curable composition containing a curable polysilsesquioxane compound having a high ratio of repeating units having a fluoroalkyl group is used, it is difficult to obtain a cured composition with high adhesive strength. thing. Thus, the cured product of the curable composition described in Patent Document 4 has a difficult relationship between high adhesive strength and low refractive index. Therefore, when the curable composition described in Patent Document 4 is used, it is difficult to obtain a cured product having both high adhesive strength and low refractive index.
此外,已知在硬化性組合物中添加填料等,藉此改善操作性等。 然而,一般而言,因為含有填料等的硬化性組合物,其硬化物有折射率變高的傾向,因此渴望即使添加填料等,仍有折射率低的硬化性組合物。 [先前技術文獻] [專利文獻]In addition, it is known to add fillers and the like to curable compositions to improve workability and the like. However, in general, since cured compositions containing fillers and the like tend to have a high refractive index, cured compositions are desired to have a low refractive index even when fillers and the like are added. [Prior Art Literature] [Patent Document]
專利文獻1:日本特開2004-359933號公報 專利文獻2:日本特開2005-263869號公報 專利文獻3:日本特開2006-328231號公報 專利文獻4:WO2017/110948號(US2018/0355111 A1)Patent Document 1: Japanese Patent Laid-Open No. 2004-359933 Patent Document 2: Japanese Patent Laid-Open No. 2005-263869 Patent Document 3: Japanese Patent Laid-Open No. 2006-328231 Patent Document 4: WO2017/110948 (US2018/0355111 A1)
[發明欲解決的問題][Problem to be solved by the invention]
本發明為鑑於上述習知技術的情況而完成者,其目的為提供一種硬化性佳,且,折射率低的硬化性組合物,將此硬化性組合物進行硬化而成的接著強度高的硬化物,以及將上述硬化性組合物,作為光元件固定材用接著劑或光元件固定材用密封材的使用方法。 在本發明中,所謂「硬化性組合物」,是指藉由滿足加熱等的特定條件,而轉變成硬化物的組合物。 [解決問題的手段]The present invention has been accomplished in view of the above-mentioned conventional technology, and its object is to provide a curable composition with good curability and a low refractive index, and a curable composition with high adhesive strength obtained by curing the curable composition. and a method of using the curable composition as an adhesive for an optical element fixing material or a sealing material for an optical element fixing material. In the present invention, the "curable composition" refers to a composition that is transformed into a cured product by satisfying specific conditions such as heating. [means to solve the problem]
本發明者等為了解決上述課題,針對具有氟烷基的硬化性聚倍半矽氧烷化合物進行精心研究。 其結果發現, (1)所謂由於在硬化性聚倍半矽氧烷化合物中導入氟烷基而使硬化物的接著強度低下的問題,可以藉由使用具有特定重複單元,且,同時滿足關於分子構造的條件(下述條件1),及關於分子量的條件(下述條件2)的硬化性聚倍半矽氧烷化合物(以下,有時稱為「硬化性聚倍半矽氧烷化合物(A)」)而解決,以及 (2)由於含有硬化性聚倍半矽氧烷化合物(A)的硬化性組合物,具有硬化性佳的特性,亦具有能夠不過度加熱而進行硬化反應的優點。 再者,藉由使用含有硬化性聚倍半矽氧烷化合物(A)及平均一次粒徑超過0.04μm,8μm以下的微粒子的硬化性組合物,而能夠形成耐剝離性佳的硬化物。 本發明為基於此等知識而完成者。In order to solve the above-mentioned problems, the inventors of the present invention conducted intensive studies on curable polysilsesquioxane compounds having a fluoroalkyl group. As a result, it was found that (1) The so-called problem that the adhesive strength of the cured product is lowered due to the introduction of fluoroalkyl groups into the curable polysilsesquioxane compound can be solved by using a compound that has a specific repeating unit and satisfies the conditions regarding the molecular structure ( The following condition 1), and the curable polysilsesquioxane compound (hereinafter, sometimes referred to as "curable polysilsesquioxane compound (A)") of the molecular weight condition (the following condition 2) solve, and (2) Since the curable composition containing the curable polysilsesquioxane compound (A) has good curability properties, it also has the advantage of being able to undergo a curing reaction without excessive heating. Furthermore, by using a curable composition containing a curable polysilsesquioxane compound (A) and fine particles having an average primary particle diameter exceeding 0.04 μm and 8 μm or less, a cured product having excellent peeling resistance can be formed. The present invention has been accomplished based on such knowledge.
因此根據本發明,提供下述[1]~[8]的硬化性組合物,[9]、[10]的硬化物,以及[11]、[12]的硬化性組合物的使用方法。Therefore, according to the present invention, there are provided curable compositions of the following [1] to [8], cured products of [9] and [10], and methods of using the curable compositions of [11] and [12].
[1]一種硬化性組合物,其特徵在於,含有下述(A)成分及(E)成分, (A)成分:為具有下述式(a-1)所示的重複單元的硬化性聚倍半矽氧烷化合物,為滿足下述條件1及條件2的硬化性聚倍半矽氧烷化合物,[1] A curable composition comprising the following components (A) and (E), Component (A): It is a curable polysilsesquioxane compound having a repeating unit represented by the following formula (a-1), and is a curable polysilsesquioxane compound that satisfies the following conditions 1 and 2 ,
[化1] [chemical 1]
[R1 為以組成式:Cm H(2m-n+1) Fn 表示的氟烷基。m表示1~10的整數,n表示2以上,(2m+1)以下的整數。D表示R1 與Si鍵結的連結基(但是,伸烷基除外)或單鍵] [條件1] 當測定硬化性聚倍半矽氧烷化合物的29 Si-NMR時,在-62ppm以上未滿-52ppm的區域[區域(2)]中,觀測到1或2以上的波峰,在-52ppm以上未滿-45ppm的區域[區城(1)]與-73ppm以上未滿-62ppm的區域[區域(3)]的至少一者的區域中,觀測到1或2以上的波峰,且,以下述式導出的Z2為20~40%。[R 1 is a fluoroalkyl group represented by the compositional formula: C m H (2m-n+1) F n . m represents an integer of 1 to 10, and n represents an integer of not less than 2 and not more than (2m+1). D represents a linking group (except for an alkylene group) or a single bond that R1 and Si are bonded to] [Condition 1] When 29 Si-NMR of a hardening polysilsesquioxane compound is measured, no In the area full of -52ppm [area (2)], 1 or more peaks were observed, in the area above -52ppm and less than -45ppm [district city (1)] and the area of -73ppm and less than -62ppm[ In at least one of the regions (3)], 1 or more peaks were observed, and Z2 derived from the following formula was 20 to 40%.
[數1] [number 1]
P1:在區域(1)中的積分値 P2:在區域(2)中的積分値 P3:在區域(3)中的積分値 [條件2] 硬化性聚倍半矽氧烷化合物的質量平均分子量(Mw)為4,000~11,000, (E)成分:為平均一次粒徑超過0.04μm,8μm以下的微粒子。 [2]如[1]中記載的硬化性組合物,其中,上述硬化性聚倍半矽氧烷化合物為式(a-1)所示的重複單元的比例,相對於全部重複單元,為25mol%以上者。 [3]如[1]或[2]中記載的硬化性組合物,其中,上述硬化性聚倍半矽氧烷化合物為進一步具有下述式(a-2)所示的重複單元者。P1: Integral value in area (1) P2: Integral value in area (2) P3: Integral value in area (3) [Condition 2] The mass average molecular weight (Mw) of hardening polysilsesquioxane compound is 4,000~11,000, Component (E): Fine particles having an average primary particle diameter of more than 0.04 μm and not more than 8 μm. [2] The curable composition as described in [1], wherein the proportion of the repeating unit represented by the formula (a-1) as the above-mentioned curable polysilsesquioxane compound is 25 mol with respect to the total repeating units % or more. [3] The curable composition according to [1] or [2], wherein the curable polysilsesquioxane compound further has a repeating unit represented by the following formula (a-2).
[化2] [Chem 2]
[R2 表示無取代的碳數1~10的烷基,或是,具有取代基或無取代的碳數6~12的芳基] [4]如[3]中記載的硬化性組合物,其中,上述硬化性聚倍半矽氧烷化合物之式(a-2)所示的重複單元的比例,相對於全部重複單元,為超過0mol%,75mol%以下者。 [5]如[1]~[4]的任一項中記載的硬化性組合物,其中,當測定上述硬化性聚倍半矽氧烷化合物的29 Si-NMR時,在區域(3)中,觀測到1或2以上的波峰,且,以下述式導出的Z3為60~80%。[R 2 represents an unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms] [4] The curable composition as described in [3], Here, the ratio of the repeating unit represented by the formula (a-2) of the curable polysilsesquioxane compound is more than 0 mol% and not more than 75 mol% with respect to the total repeating units. [5] The curable composition according to any one of [1] to [4], wherein when the 29 Si-NMR of the curable polysilsesquioxane compound is measured, in the region (3) , 1 or more peaks were observed, and Z3 derived from the following formula was 60 to 80%.
[數2] [number 2]
[6]如[1]~[5]的任一項中記載的硬化性組合物,其中,進一步含有下述(B)成分, (B)成分:分子內具有氮原子的矽烷偶合劑。 [7]如[1]~[6]的任一項中記載的硬化性組合物,其中,進一步含有下述(C)成分, (C)成分:分子內具有酸酐構造的矽烷偶合劑。 [8]如[1]~[7]的任一項中記載的硬化性組合物,其中,進一步含有下述(D)成分, (D)成分:平均一次粒徑為5~40nm的微粒子。 [9]一種硬化物,由將上述[1]~[8]的任一項中記載的硬化性組合物進行硬化而獲得。 [10]如[9]中記載的硬化物,為光元件固定材。 [11]一種硬化性組合物的使用方法,將上述[1]~[8]的任一項中記載的硬化性組合物,作為光元件固定材用接著劑的使用方法。 [12]一種硬化性組合物的使用方法,將上述[1]~[8]的任一項中記載的硬化性組合物,作為光元件固定材用密封材的使用方法。 [發明的效果][6] The curable composition according to any one of [1] to [5], which further contains the following component (B), (B) Component: a silane coupling agent with nitrogen atoms in the molecule. [7] The curable composition according to any one of [1] to [6], which further contains the following component (C), (C) Component: A silane coupling agent with an acid anhydride structure in the molecule. [8] The curable composition according to any one of [1] to [7], which further contains the following component (D), (D) Component: Microparticles with an average primary particle diameter of 5 to 40 nm. [9] A cured product obtained by curing the curable composition described in any one of [1] to [8] above. [10] The cured product described in [9], which is an optical element fixing material. [11] A method of using a curable composition, using the curable composition described in any one of [1] to [8] above as an adhesive for an optical element fixing material. [12] A method of using a curable composition, using the curable composition described in any one of [1] to [8] above as a sealing material for an optical element fixing material. [Effect of the invention]
根據本發明,提供一種硬化性佳,且,折射率低的硬化性組合物,將此硬化性組合物進行硬化而成的接著強度高的硬化物,以及將上述硬化性組合物,作為光元件固定材用接著劑或光元件固定材用密封材的使用方法。According to the present invention, there are provided a curable composition having good curability and a low refractive index, a cured product obtained by curing the curable composition, and a cured product having high adhesive strength, and the curable composition as an optical device. How to use an adhesive for fixing materials or a sealing material for optical element fixing materials.
以下,將本發明分成1)硬化性組合物、2)硬化物,以及3)硬化性組合物的使用方法詳細地說明。Hereinafter, the present invention will be divided into 1) a curable composition, 2) a cured product, and 3) a method of using the curable composition and will be described in detail.
1)硬化性組合物 本發明的硬化性組合物,其特徵在於,含有下述(A)成分及(E)成分, (A)成分:為具有上述式(a-1)所示的重複單元的硬化性聚倍半矽氧烷化合物,為滿足上述條件1及條件2的硬化性聚倍半矽氧烷化合物[硬化性聚倍半矽氧烷化合物(A)], (E)成分:為平均一次粒徑超過0.04μm,8μm以下的微粒子。 且,在本發明中,所謂「硬化性聚倍半矽氧烷化合物」,是指藉由滿足加熱等的特定條件,單獨地轉變成硬化物的聚倍半矽氧烷化合物,或是,在上述硬化性組合物中作為硬化性成分的機能的聚倍半矽氧烷化合物。1) Hardening composition The curable composition of the present invention is characterized in that it contains the following (A) component and (E) component, Component (A): It is a curable polysilsesquioxane compound having a repeating unit represented by the above-mentioned formula (a-1), and is a curable polysilsesquioxane compound satisfying the above-mentioned condition 1 and condition 2 [hardenable polysilsesquioxane compound] Sexual polysilsesquioxane compound (A)], Component (E): Fine particles having an average primary particle diameter of more than 0.04 μm and not more than 8 μm. In addition, in the present invention, the term "curable polysilsesquioxane compound" refers to a polysilsesquioxane compound that is independently converted into a cured product by satisfying specific conditions such as heating, or, in A polysilsesquioxane compound that functions as a curable component in the above curable composition.
[(A)成分] 構成本發明的硬化性組合物的(A)成分,為具有下述式(a-1)所示的重複單元的硬化性聚倍半矽氧烷化合物,為滿足上述條件1及條件2的硬化性聚倍半矽氧烷化合物。[(A) ingredient] Component (A) constituting the curable composition of the present invention is a curable polysilsesquioxane compound having a repeating unit represented by the following formula (a-1), and is a curable polysilsesquioxane compound that satisfies the above-mentioned conditions 1 and 2. Non-toxic polysilsesquioxane compounds.
[化3] [Chem 3]
[R1 為以組成式:Cm H(2m-n+1) Fn 表示的氟烷基。m表示1~10的整數,n表示2以上,(2m+1)以下的整數。D表示R1 與Si鍵結的連結基(但是,伸烷基除外)或單鍵]。[R 1 is a fluoroalkyl group represented by the compositional formula: C m H (2m-n+1) F n . m represents an integer of 1 to 10, and n represents an integer of not less than 2 and not more than (2m+1). D represents a linking group (but excluding an alkylene group) or a single bond] to which R 1 is bonded to Si.
式(a-1)中,R1 為以組成式:Cm H(2m-n+1) Fn 表示的氟烷基。m表示1~10的整數,n表示2以上,(2m+1)以下的整數。m較佳為1~5的整數,更佳為1~3的整數。 藉由使用具有R1 的硬化性聚倍半矽氧烷化合物,可獲得折射率低的硬化性組合物。In the formula (a-1), R 1 is a fluoroalkyl group represented by the composition formula: C m H (2m-n+1) F n . m represents an integer of 1 to 10, and n represents an integer of not less than 2 and not more than (2m+1). m is preferably an integer of 1-5, more preferably an integer of 1-3. By using a curable polysilsesquioxane compound having R 1 , a curable composition with a low refractive index can be obtained.
作為組成式:Cm H(2m-n+1) Fn 表示的氟烷基,可列舉,CF3 、CF3 CF2 、CF3 (CF2 )2 、CF3 (CF2 )3 、CF3 (CF2 )4 、CF3 (CF2 )5 、CF3 (CF2 )6 、CF3 (CF2 )7 、CF3 (CF2 )8 、CF3 (CF2 )9 等的全氟烷基;CF3 CH2 CH2 、CF3 (CF2 )3 CH2 CH2 、CF3 (CF2 )5 CH2 CH2 、CF3 (CF2 )7 CH2 CH2 等的氫氟烷基。Examples of the fluoroalkyl group represented by the composition formula: C m H (2m-n+1) F n include CF 3 , CF 3 CF 2 , CF 3 (CF 2 ) 2 , CF 3 (CF 2 ) 3 , CF 3 (CF 2 ) 4 , CF 3 (CF 2 ) 5 , CF 3 (CF 2 ) 6 , CF 3 (CF 2 ) 7 , CF 3 (CF 2 ) 8 , CF 3 (CF 2 ) 9 etc. Alkyl; CF 3 CH 2 CH 2 , CF 3 (CF 2 ) 3 CH 2 CH 2 , CF 3 (CF 2 ) 5 CH 2 CH 2 , CF 3 (CF 2 ) 7 CH 2 CH 2 and other hydrofluoroalkanes base.
式(a-1)中,D表示R1 與Si鍵結的連結基(但是,伸烷基除外)或單鍵。 作為D的連結基,可列舉,1,4-伸苯基、1,3-伸苯基、1,2-伸苯基、1,5-伸萘基等的碳數為6~20的伸芳基。In the formula (a-1), D represents a linking group (however, excluding an alkylene group) or a single bond to which R 1 is bonded to Si. Examples of the linking group for D include C6-20 arylene groups such as 1,4-phenylene, 1,3-phenylene, 1,2-phenylene, and 1,5-naphthylene. Aryl.
硬化性聚倍半矽氧烷化合物(A)可以是具有1種(R1 -D)者(均聚物),也可以是具有2種以上(R1 -D)者(共聚物)。 硬化性聚倍半矽氧烷化合物(A)為共聚物時,硬化性聚倍半矽氧烷化合物(A)可以是隨機共聚物、嵌段共聚物、接枝共聚物(grafting copolymer)、交互共聚物等的任一者,但從製造容易性等的觀點而言,以隨機共聚物為佳。 此外,硬化性聚倍半矽氧烷化合物(A)的構造,可以是階梯型構造、雙層型構造、籠型構造、部分裂開籠型構造、環狀型構造、隨機型構造中的任一構造。The curable polysilsesquioxane compound (A) may have one type (R 1 -D) (homopolymer), or may have two or more types (R 1 -D) (copolymer). When the hardening polysilsesquioxane compound (A) is a copolymer, the hardening polysilsesquioxane compound (A) may be a random copolymer, a block copolymer, a grafting copolymer (grafting copolymer), an interactive Any of copolymers and the like, but random copolymers are preferable from the viewpoint of easiness of manufacture. In addition, the structure of the curable polysilsesquioxane compound (A) may be any of a stepped structure, a double-layer structure, a cage structure, a partially split cage structure, a ring structure, and a random structure. a structure.
硬化性聚倍半矽氧烷化合物(A)中所含的式(a-1)所示的重複單元的比例,相對於全部重複單元,以25mol%以上為佳,以25~90mol%為更佳,以25~85mol%為進一步更佳。 藉由使用使式(a-1)所示的重複單元的比例,相對於全部重複單元、為25mol%以上的硬化性聚倍半矽氧烷化合物(A),可獲得折射率更低的硬化性組合物。The proportion of the repeating unit represented by the formula (a-1) contained in the curable polysilsesquioxane compound (A) is preferably 25 mol% or more, and more preferably 25 to 90 mol% relative to the total repeating units. Better, 25~85mol% is further better. By using a curable polysilsesquioxane compound (A) such that the ratio of the repeating unit represented by the formula (a-1) is 25 mol% or more relative to the total repeating units, a curable polysilsesquioxane compound with a lower refractive index can be obtained. sex composition.
硬化性聚倍半矽氧烷化合物(A),亦可為進一步具有下述式(a-2)所示的重複單元者(共聚物)。The curable polysilsesquioxane compound (A) may further have a repeating unit (copolymer) represented by the following formula (a-2).
[化4] [chemical 4]
式(a-2)中,R2 表示無取代的碳數1~10的烷基,或是,具有取代基或無取代的碳數6~12的芳基。In the formula (a-2), R 2 represents an unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms.
作為R2 的無取代的碳數1~10的烷基,可列舉,甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、正己基、正辛基、正壬基、正癸基等。The unsubstituted C 1-10 alkyl group of R2 includes methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, secondary butyl, tertiary butyl , n-pentyl, n-hexyl, n-octyl, n-nonyl, n-decyl, etc.
作為R2 的無取代的碳數6~12的芳基,可列舉,苯基、1-萘基、2-萘基等。 作為R2 的具有取代基碳數6~12的芳基的取代基,可列舉,甲基、乙基、正丙基、異丙基、正丁基、二級丁基、異丁基、三級丁基、正戊基、正己基、正庚基、正辛基、異辛基等的烷基;氟原子、氯原子、溴原子等的鹵素原子;甲氧基、乙氧基等的烷氧基。Examples of the unsubstituted aryl group having 6 to 12 carbon atoms for R 2 include phenyl, 1-naphthyl, 2-naphthyl and the like. As the substituent of the aryl group having a substituent carbon number of 6 to 12 as R2 , methyl, ethyl, n-propyl, isopropyl, n-butyl, secondary butyl, isobutyl, tri Alkyl groups such as butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, and isooctyl; halogen atoms such as fluorine atom, chlorine atom, bromine atom, etc.; alkyl groups such as methoxy group and ethoxy group Oxygen.
此等當中,作為R2 ,從易於獲得接著強度更高、耐熱性更佳的硬化物而言,以無取代的碳數1~10的烷基為佳,以無取代的碳數1~6的烷基為更佳,以無取代的碳數1~3的烷基為特別佳。Among these, as R 2 , an unsubstituted alkyl group having 1 to 10 carbon atoms is preferred, and an unsubstituted alkyl group having 1 to 6 carbon atoms is preferable in order to easily obtain a cured product with higher adhesive strength and better heat resistance. An alkyl group is more preferred, and an unsubstituted alkyl group having 1 to 3 carbon atoms is particularly preferred.
硬化性聚倍半矽氧烷化合物(A)為具有式(a-2)所示的重複單元者時,硬化性聚倍半矽氧烷化合物(A)可以是具有1種R2 者,亦可以是具有2種以上R2 者。When the curable polysilsesquioxane compound (A) has a repeating unit represented by formula (a-2), the curable polysilsesquioxane compound (A) may have one R2 , or Those having two or more kinds of R 2 may be used.
當硬化性聚倍半矽氧烷化合物(A)為具有式(a-2)所示的重複單元者時,其比例,相對於全部重複單元,以超過0mol%,75mol%以下為佳,以10~75mol%為更佳,以15~75mol%又更佳。 藉由使用使式(a-2)所示的重複單元的比例為上述範圍內的硬化性聚倍半矽氧烷化合物(A),變得可易於獲得接著強度更高,耐熱性更佳的硬化物。When the curable polysilsesquioxane compound (A) has a repeating unit represented by formula (a-2), its ratio, relative to all repeating units, is preferably more than 0 mol%, and preferably less than 75 mol%. 10~75mol% is more preferable, and 15~75mol% is more preferable. By using the curable polysilsesquioxane compound (A) in which the ratio of the repeating unit represented by the formula (a-2) is within the above range, it becomes easy to obtain a polysilsesquioxane compound with higher adhesive strength and better heat resistance. Hardened.
硬化性聚倍半矽氧烷化合物(A)中的式(a-1)、式(a-2)所示的重複單元的比例,例如,可藉由測定硬化性聚倍半矽氧烷化合物(A)的29 Si-NMR而求得。The proportion of repeating units represented by formula (a-1) and formula (a-2) in the curable polysilsesquioxane compound (A), for example, can be determined by measuring the curable polysilsesquioxane compound (A) obtained from 29 Si-NMR.
由於硬化性聚倍半矽氧烷化合物(A)可溶於丙酮等的酮系溶媒;苯等的芳香族烴系溶媒;二甲基亞碸等的含硫系溶媒;四氫呋喃等的醚系溶媒;乙酸乙酯等的酯系溶媒;氯仿等的含鹵素系溶媒;以及由此等2種以上所構成的混合溶媒等的各種有機溶媒中,使用此等溶媒,可測定在硬化性聚倍半矽氧烷化合物(A)的溶液狀態的29 Si-NMR。The curable polysilsesquioxane compound (A) is soluble in ketone-based solvents such as acetone; aromatic hydrocarbon-based solvents such as benzene; sulfur-containing solvents such as dimethylsulfene; and ether-based solvents such as tetrahydrofuran. ; ester-based solvents such as ethyl acetate; halogen-containing solvents such as chloroform; and various organic solvents such as mixed solvents composed of two or more of these. 29 Si-NMR of the solution state of the siloxane compound (A).
式(a-1)所示的重複單元、式(a-2)所示的重複單元為下述式(a-3)所示者。The repeating unit represented by formula (a-1) and the repeating unit represented by formula (a-2) are those represented by the following formula (a-3).
[化5] [chemical 5]
[G表示(R1 -D)或R2 。R1 、D、R2 分別表示與上述相同意義。O1/2 表示氧原子為與相鄰的重複單元所共有]。[G represents (R 1 -D) or R 2 . R 1 , D, and R 2 represent the same meanings as above, respectively. O 1/2 means that the oxygen atom is shared with adjacent repeating units].
如式(a-3)所示,硬化性聚倍半矽氧烷化合物(A),一般而言總稱為T位置,具有在矽原子有3個氧原子鍵結,有1個其他的基(G表示的基)鍵結所構成的部分構造。 作為硬化性聚倍半矽氧烷化合物(A)中所含的T位置,可列舉如下述式(a-4)~(a-6)所示者。As shown in the formula (a-3), the curable polysilsesquioxane compound (A), generally referred to as the T position, has 3 oxygen atoms bonded to the silicon atom and 1 other group ( The group represented by G) is a partial structure composed of bonds. Examples of the T position contained in the curable polysilsesquioxane compound (A) include those represented by the following formulas (a-4) to (a-6).
[化6] [chemical 6]
式(a-4)、(a-5)及(a-6)中,G表示與上述相同意義。R3 表示氫原子或碳數1~10的烷基。作為R3 的碳數1~10的烷基,可列舉,甲基、乙基、正丙基、異丙基、正丁基、二級丁基、異丁基、三級丁基等。複數個R3 彼此可全部相同也可相異。此外,上述式(a-4)~(a-6)中,*為與矽原子鍵結。In formulas (a-4), (a-5) and (a-6), G represents the same meaning as above. R 3 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. Examples of the alkyl group having 1 to 10 carbon atoms for R include methyl, ethyl, n-propyl, isopropyl, n-butyl, secondary butyl, isobutyl, and tertiary butyl. A plurality of R 3 may all be the same or different from each other. In addition, in the above-mentioned formulas (a-4) to (a-6), * is bonded to a silicon atom.
式(a-4)及式(a-5)所示的T位置含有可供應聚縮合反應的基(R3 -O)。因此,含有較多此種T位置的聚倍半矽氧烷化合物,其反應性佳。此外,含有此類聚倍半矽氧烷化合物的組合物,其硬化性佳。 另一方面,式(a-5)及式(a-6)所示的T位置,與2以上的矽原子(相鄰的T位置中的矽原子)鍵結。因此,含有較多此種T位置的聚倍半矽氧烷化合物,有具有較大分子量的傾向。The T position represented by the formula (a-4) and the formula (a-5) contains a group (R 3 -O) that can provide polycondensation reaction. Therefore, polysilsesquioxane compounds containing more such T positions have better reactivity. In addition, compositions containing such polysilsesquioxane compounds have good curability. On the other hand, the T sites represented by the formulas (a-5) and (a-6) are bonded to two or more silicon atoms (silicon atoms at adjacent T sites). Therefore, a polysilsesquioxane compound containing many such T positions tends to have a larger molecular weight.
因此,含有較多式(a-5)所示的T位置的聚倍半矽氧烷化合物,具有比較大的分子量,且,具有充分的反應性。 如以下所說明,本發明中使用的硬化性聚倍半矽氧烷化合物(A),為具有此等特性者。Therefore, a polysilsesquioxane compound containing many T positions represented by the formula (a-5) has a relatively large molecular weight and has sufficient reactivity. As explained below, the curable polysilsesquioxane compound (A) used in the present invention has these characteristics.
首先,硬化性聚倍半矽氧烷化合物(A)滿足以下的條件1。 [條件1] 當測定硬化性聚倍半矽氧烷化合物的29 Si-NMR時,在-62ppm以上未滿-52ppm的區域[區域(2)]中,觀測到1或2以上的波峰,在-52ppm以上未滿-45ppm的區域[區域(1)]與-73ppm以上未滿-62ppm的區域[區域(3)]的至少一者的區域中,觀測到1或2以上的波峰,且,以下述式導出的Z2為20~40%。 且,所謂「區域(1)中觀測到的波峰」,是指波峰峰頂在區域(1)的範圍。關於「區域(2)中觀測到的波峰」、「區域(3)中觀測到的波峰」亦相同。First, the curable polysilsesquioxane compound (A) satisfies the following condition 1. [Condition 1] When measuring 29 Si-NMR of a curable polysilsesquioxane compound, peaks of 1 or 2 or more are observed in the region of -62ppm or more and less than -52ppm [region (2)]. 1 or 2 or more peaks are observed in at least one of the region of -52ppm to -45ppm [region (1)] and the region of -73ppm to -62ppm [region (3)], and, Z2 derived from the following formula is 20 to 40%. In addition, "the peak observed in the region (1)" refers to the range where the peak of the peak is in the region (1). The same applies to "peaks observed in the region (2)" and "peaks observed in the region (3)".
[數3] [number 3]
P1:在區域(1)中的積分値 P2:在區域(2)中的積分値 P3:在區域(3)中的積分値。P1: Integral value in area (1) P2: Integral value in area (2) P3: Integral value in area (3).
在本說明書中,「在區域(1)中的積分値」、「在區域(2)中的積分値」、「在區域(3)中的積分値」是指分別以-52ppm~-45ppm、-62ppm~-52ppm、-73ppm~-62ppm作為積分範圍進行計算所得的値。In this specification, "integral value in the area (1)", "integral value in the area (2)", and "integral value in the area (3)" refer to -52ppm~-45ppm, -62ppm~-52ppm, -73ppm~-62ppm are calculated as the integral range.
區域(1)、區域(2)、區域(3)中觀測到的波峰分別是來自於式(a-4)、式(a-5)、式(a-6)所示的T位置中的矽原子。The peaks observed in area (1), area (2), and area (3) come from the T positions shown in formula (a-4), formula (a-5), and formula (a-6) respectively silicon atom.
因此,滿足條件1的硬化性聚倍半矽氧烷化合物為含有相對於T位置全體,有20~40%式(a-5)所示的T位置者。 此硬化性聚倍半矽氧烷化合物,如上述,為具有較大的分子量,且,具有充分的反應性者,有利於作為硬化性組合物的硬化性成分。Therefore, the curable polysilsesquioxane compound that satisfies condition 1 contains 20 to 40% of the T site represented by the formula (a-5) with respect to the entire T site. This curable polysilsesquioxane compound has a large molecular weight as described above and has sufficient reactivity, which is advantageous as a curable component of a curable composition.
條件1中,Z2的値,以24~36%為佳,以27~32%為更佳。Z2過小時反應性不足,Z2過大時貯藏穩定性降低。In condition 1, the value of Z2 is preferably 24~36%, more preferably 27~32%. When Z2 is too small, the reactivity is insufficient, and when Z2 is too large, the storage stability decreases.
硬化性聚倍半矽氧烷化合物(A),測定29 Si-NMR時,在區域(3)中觀測到1或2以上的波峰,且,以下述式導出的Z3,以60~80%為佳。For the curable polysilsesquioxane compound (A), when 29 Si-NMR is measured, 1 or more peaks are observed in the region (3), and Z3 derived from the following formula takes 60 to 80% as good.
[數4] [number 4]
Z3為60~80%的硬化性聚倍半矽氧烷化合物(A)為含有相對於T位置全體,有60~80%式(a-6)所示的T位置者。 Z3的値為60~80%範圍內的硬化性聚倍半矽氧烷化合物(A),為分子量與反應性的均衡更佳者。 從易於獲得此效果而言,Z3的値,以64~76%為更佳,以68~73%為進一步更佳。The curable polysilsesquioxane compound (A) in which Z3 is 60 to 80% contains 60 to 80% of the T site represented by the formula (a-6) relative to the entire T site. The value of Z3 is the curable polysilsesquioxane compound (A) in the range of 60-80%, which is a better balance of molecular weight and reactivity. In terms of the ease of obtaining this effect, the value of Z3 is better at 64-76%, and even better at 68-73%.
Z2、Z3的値,例如,可根據實施例中記載的條件測定29 Si-NMR,取得P1~P3,依照上述式計算出。The values of Z2 and Z3 can be calculated according to the above-mentioned formula by measuring 29 Si-NMR under the conditions described in the examples, for example, to obtain P1 to P3.
硬化性聚倍半矽氧烷化合物(A)為滿足上述條件2者。 亦即,硬化性聚倍半矽氧烷化合物(A)的質量平均分子量(Mw)為4,000~11,000,以4,000~8,000為佳,以6,000~7,000為更佳。The curable polysilsesquioxane compound (A) satisfies the above-mentioned requirement 2. That is, the mass average molecular weight (Mw) of the curable polysilsesquioxane compound (A) is 4,000-11,000, preferably 4,000-8,000, more preferably 6,000-7,000.
如上述,滿足條件1的硬化性聚倍半矽氧烷化合物,有具有較大分子量的傾向。條件2為使其分子量的範圍更明確者。 藉由使用質量平均分子量(Mw)為上述範圍內的硬化性聚倍半矽氧烷化合物(A)作為硬化性成分,可獲得賦予接著強度高,耐熱性佳的硬化物的硬化性組合物。As described above, the curable polysilsesquioxane compound satisfying condition 1 tends to have a relatively large molecular weight. Condition 2 is to clarify the range of the molecular weight. By using the curable polysilsesquioxane compound (A) having a mass average molecular weight (Mw) within the above range as a curable component, a curable composition that provides a cured product with high adhesive strength and excellent heat resistance can be obtained.
硬化性聚倍半矽氧烷化合物(A)的分子量分布(Mw/Mn),並無特別限制,但通常為1.0~10.0,以1.1~6.0的範圍為佳。藉由使用分子量分布(Mw/Mn)於上述範圍內的硬化性聚倍半矽氧烷化合物(A)作為硬化性成分,可獲得賦予接著性及耐熱性更佳的硬化物的硬化性組合物。 質量平均分子量(Mw)及數量平均分子量(Mn),例如,依照以四氫呋喃(THF)當作溶媒的凝膠滲透層析法(GPC),作為標準聚苯乙烯換算値而求得。The molecular weight distribution (Mw/Mn) of the curable polysilsesquioxane compound (A) is not particularly limited, but is usually 1.0-10.0, preferably 1.1-6.0. By using a curable polysilsesquioxane compound (A) having a molecular weight distribution (Mw/Mn) within the above range as a curable component, a curable composition that provides a cured product with better adhesiveness and heat resistance can be obtained . The mass average molecular weight (Mw) and the number average molecular weight (Mn) are obtained as standard polystyrene conversion values, for example, according to gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
硬化性聚倍半矽氧烷化合物(A)可藉由,例如,將下述式(a-7)所示的化合物(以下,有時稱為「矽烷化合物(1)」),或是矽烷化合物(1)及下述式(a-8)所示的化合物(以下,有時稱為「矽烷化合物(2)」),在聚縮合觸媒的存在下使其聚縮合而製造。The curable polysilsesquioxane compound (A) can be obtained by, for example, compounding a compound represented by the following formula (a-7) (hereinafter sometimes referred to as "silane compound (1)"), or a silane Compound (1) and a compound represented by the following formula (a-8) (hereinafter, may be referred to as "silane compound (2)") are produced by polycondensation in the presence of a polycondensation catalyst.
[化7] [chemical 7]
式(a-7)、(a-8)中,R1 、R2 、D表示與上述相同意義。R4 、R5 分別獨立地表示碳數1~10的烷基,X1 、X2 分別獨立地表示鹵素原子,p、q分別獨立地表示0~3的整數。複數個R4 、R5 、及複數個X1 、X2 可分別彼此相同,亦可相異。In formulas (a-7) and (a-8), R 1 , R 2 , and D represent the same meanings as above. R 4 and R 5 each independently represent an alkyl group having 1 to 10 carbon atoms, X 1 and X 2 each independently represent a halogen atom, and p and q each independently represent an integer of 0 to 3. A plurality of R 4 , R 5 , and a plurality of X 1 , X 2 may be the same as or different from each other.
作為R4 、R5 的碳數1~10的烷基,可列舉與作為R2 的碳數1~10的烷基所示相同者。 作為X1 、X2 的鹵素原子,可列舉氯原子及溴原子等。Examples of the alkyl group having 1 to 10 carbon atoms for R 4 and R 5 include the same ones as the alkyl group having 1 to 10 carbon atoms for R 2 . Examples of the halogen atoms for X 1 and X 2 include chlorine atoms, bromine atoms, and the like.
作為矽烷化合物(1),可列舉,CF3 Si(OCH3 )3 、CF3 CF2 Si(OCH3 )3 、CF3 CF2 CF2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 Si(OCH3 )3 、CF3 CH2 CH2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 CH2 CH2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH3 )3 、CF3 (C6 H4 )Si(OCH3 )3 (4-(三氟甲基)苯基三甲氧基矽烷)、CF3 Si(OCH2 CH3 )3 、CF3 CF2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 Si(OCH2 CH3 )3 、CF3 CH2 CH2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 CH2 CH2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH2 CH3 )3 、CF3 (C6 H4 )Si(OCH2 CH3 )3 、4-(三氟甲基)苯基三乙氧基矽烷等的氟烷基三烷氧基矽烷化合物類; CF3 SiCl(OCH3 )2 、CF3 CF2 SiCl(OCH3 )2 、CF3 CF2 CF2 SiCl(OCH3 )2 、CF3 SiBr(OCH3 )2 、CF3 CF2 SiBr(OCH3 )2 、CF3 CF2 CF2 SiBr(OCH3 )2 、CF3 CF2 CF2 CF2 SiCl(OCH3 )2 、CF3 CH2 CH2 SiCl(OCH3 )2 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl(OCH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH3 )2 、CF3 (C6 H4 )SiCl(OCH3 )2 、4-(三氟甲基)苯基氯二甲氧基矽烷、CF3 SiCl(OCH2 CH3 )2 、CF3 CF2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 SiCl(OCH2 CH3 )2 、CF3 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 (C6 H4 )SiCl(OCH2 CH3 )2 、4-(三氟甲基)苯基氯二乙氧基矽烷等的氟烷基鹵化二烷氧基矽烷化合物類; CF3 SiCl2 (OCH3 )、CF3 CF2 SiCl2 (OCH3 )、CF3 CF2 CF2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 SiCl2 (OCH3 )、CF3 CH2 CH2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH3 )、CF3 (C6 H4 )SiCl2 (OCH3 )、4-(三氟甲基)苯基二氯甲氧基矽烷、CF3 SiCl2 (OCH2 CH3 )、CF3 CF2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 CF2 SiCl2 (OCH2 CH3 )、CF3 CH2 CH2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH2 CH3 )、CF3 (C6 H4 )SiCl2 (OCH2 CH3 )、4-(三氟甲基)苯基二氯乙氧基矽烷等的氟烷基二鹵化烷氧基矽烷化合物類; CF3 SiCl3 、CF3 CF2 SiCl3 、CF3 SiBr3 、CF3 CF2 SiBr3 、CF3 CF2 CF2 SiCl3 、CF3 CF2 CF2 CF2 SiCl3 、CF3 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 (C6 H4 )SiCl3 、4-三氟甲基苯基三氯矽烷、CF3 SiCl3 、CF3 CF2 SiCl3 、CF3 CF2 CF2 SiCl3 、CF3 CF2 CF2 CF2 SiCl3 、CF3 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 (C6 H4 )SiCl3 、4-(三氟甲基)苯基三氯矽烷等的氟烷基三鹵化矽烷化合物類。 矽烷化合物(1)可單獨1種,或是組合2種以上使用。 此等當中,作為矽烷化合物(1),以氟烷基三烷氧基矽烷化合物類中所包含者為佳。Examples of the silane compound (1) include CF 3 Si(OCH 3 ) 3 , CF 3 CF 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 Si(OCH 3 ) 3 , CF 3 CH 2 CH 2 Si( OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 (C 6 H 4 )Si( OCH 3 ) 3 (4-(trifluoromethyl)phenyltrimethoxysilane), CF 3 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 Si(OCH 2 CH 3 ) 3 , CF 3 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 Si( OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 (C 6 H 4 )Si(OCH 2 CH 3 ) 3 , 4-(trifluoromethyl)phenyltriethoxysilane, etc. Fluoroalkyltrialkoxysilane compounds; CF 3 SiCl(OCH 3 ) 2 , CF 3 CF 2 SiCl(OCH 3 ) 2 , CF 3 CF 2 CF 2 SiCl(OCH 3 ) 2 , CF 3 SiBr(OCH 3 ) 2 , CF 3 SiBr(OCH 3 ) 2 3 ) 2 , CF 3 CF 2 SiBr(OCH 3 ) 2 , CF 3 CF 2 CF 2 SiBr(OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 SiCl(OCH 3 ) 2 , CF 3 CH 2 CH 2 SiCl (OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl (OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 3 ) 2 , CF 3 (C 6 H 4 )SiCl(OCH 3 ) 2 , 4-(trifluoromethyl)phenyl Chlorodimethoxysilane , CF 3 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CH 2 CH 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl (OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 2 CH 3 ) 2 、CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl (OCH 2 CH 3 ) 2 , CF 3 (C 6 H 4 )SiCl(OCH 2 CH 3 ) 2 , 4-(trifluoromethyl)phenylchlorodiethoxysilane and other fluoroalkylhalogenated dialkoxysilane compounds; CF 3 SiCl 2 (OCH 3 ), CF 3 CF 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 SiCl 2 (OCH 3 ), CF 3 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 (C 6 H 4 )SiCl 2 (OCH 3 ), 4-(trifluoro Methyl)phenyldichloromethoxysilane, CF 3 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 SiCl 2 (OCH 2 CH 3 ) , CF 3 CF 2 CF 2 CF 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Fluoroalkyl dihalides such as SiCl 2 (OCH 2 CH 3 ), CF 3 (C 6 H 4 )SiCl 2 (OCH 2 CH 3 ), 4-(trifluoromethyl)phenyldichloroethoxysilane, etc. Oxysilane compounds; CF 3 SiCl 3 , CF 3 CF 2 SiCl 3 , CF 3 SiBr 3 , CF 3 CF 2 SiBr 3 , CF 3 CF 2 CF 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 SiCl 3 , CF 3 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 (C 6 H 4 )SiCl 3 , 4-trifluoromethylphenyltrichlorosilane, CF 3 SiCl 3 , CF 3 CF 2 SiCl 3 , CF 3 CF 2 CF 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 SiCl 3 , CF 3 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 (C 6 H 4 )SiCl 3 , 4- Fluoroalkyl trihalosilane compounds such as (trifluoromethyl)phenyltrichlorosilane. The silane compound (1) may be used alone or in combination of two or more. Among them, as the silane compound (1), those contained in fluoroalkyltrialkoxysilane compounds are preferable.
作為矽烷化合物(2),可列舉,甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三丙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、正丙基三丙氧基矽烷、正丙基三丁氧基矽烷、正丁基三甲氧基矽烷、異丁基三甲氧基矽烷、正戊基三甲氧基矽烷、正己基三甲氧基矽烷、異辛基三乙氧基矽烷等的烷基三烷氧基矽烷化合物類;Examples of the silane compound (2) include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltripropoxysilane, n-propyl N-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltrimethoxysilane, n-propyltributoxysilane, n-butyltrimethoxysilane, isobutyltrimethoxysilane, n- Alkyltrialkoxysilane compounds such as amyltrimethoxysilane, n-hexyltrimethoxysilane, and isooctyltriethoxysilane;
甲基氯二甲氧基矽烷、甲基氯二乙氧基矽烷、甲基二氯甲氧基矽烷、甲基溴二甲氧基矽烷、乙基氯二甲氧基矽烷、乙基氯二乙氧基矽烷、乙基二氯甲氧基矽烷、乙基溴二甲氧基矽烷、正丙基氯二甲氧基矽烷、正丙基二氯甲氧基矽烷、正丁基氯二甲氧基矽烷、正丁基二氯甲氧基矽烷等的烷基鹵化烷氧基矽烷化合物類;甲基三氯矽烷、甲基三溴矽烷、乙基三氯矽烷、乙基三溴矽烷、正丙基三氯矽烷、正丙基三溴矽烷、正丁基三氯矽烷、異丁基三氯矽烷、正戊基三氯矽烷、正己基三氯矽烷、異辛基三氯矽烷等的烷基三鹵化矽烷化合物類。 Methylchlorodimethoxysilane, Methylchlorodiethoxysilane, Methyldichloromethoxysilane, Methylbromodimethoxysilane, Ethylchlorodimethoxysilane, Ethylchlorodiethylsilane Oxysilane, ethyldichloromethoxysilane, ethylbromodimethoxysilane, n-propylchlorodimethoxysilane, n-propyldichloromethoxysilane, n-butylchlorodimethoxysilane Alkylhalogenated alkoxysilane compounds such as silane and n-butyldichloromethoxysilane; methyltrichlorosilane, methyltribromosilane, ethyltrichlorosilane, ethyltribromosilane, n-propyl Alkyl trihalogenation of trichlorosilane, n-propyltribromosilane, n-butyltrichlorosilane, isobutyltrichlorosilane, n-pentyltrichlorosilane, n-hexyltrichlorosilane, isooctyltrichlorosilane, etc. Silane compounds.
矽烷化合物(2)可單獨1種,或是組合2種以上使用。 The silane compound (2) may be used alone or in combination of two or more.
此等當中,作為矽烷化合物(2),以烷基三烷氧基矽烷化合物類中所包含者為佳。 Among them, as the silane compound (2), those contained in alkyltrialkoxysilane compounds are preferable.
使上述矽烷化合物聚縮合的方法並無特別限定,可利用已知的方法。但是,由於在硬化性聚倍半矽氧烷化合物(A)的製造中有以下所示的問題,對於反應條件有必要特別探討。 The method for polycondensing the above-mentioned silane compound is not particularly limited, and a known method can be used. However, since the production of the curable polysilsesquioxane compound (A) has the following problems, it is necessary to examine the reaction conditions in particular.
製造硬化性聚倍半矽氧烷化合物(A)時的問題之一,如上述專利文獻4中所示。亦即,參見上述專利文獻4的表1,可知由於具有氟烷基的矽烷化合物的使用比例增加,所得的聚合物有低分子量化的傾向。 One of the problems in the production of the curable polysilsesquioxane compound (A) is described in Patent Document 4 above. That is, referring to Table 1 of the above-mentioned Patent Document 4, it can be seen that the molecular weight of the obtained polymer tends to decrease due to the increase in the use ratio of the silane compound having a fluoroalkyl group.
如此一來,矽烷化合物(1)的反應性與矽烷化合物(2)的反應性大幅相異,若直接利用過往關於矽烷化合物(2)的聚縮合反應的知識,則難以獲得滿足條件1及條件2的硬化性聚倍半矽氧烷化合物。 As a result, the reactivity of the silane compound (1) and the reactivity of the silane compound (2) are greatly different, and it is difficult to obtain conditions that satisfy the conditions 1 and 2 if the previous knowledge about the polycondensation reaction of the silane compound (2) is used directly. 2 hardening polysilsesquioxane compounds.
在專利文獻4的實施例中,實際上,使用具有氟烷基的矽烷化合物進行聚縮合反應,製造聚合物。然而,如上述,在此文獻中記載的製造方法中,由於反應中使用的矽烷化合物的混合割合大幅影響反應,無法控制聚合物的分子量。 In the examples of Patent Document 4, actually, a polycondensation reaction is carried out using a silane compound having a fluoroalkyl group to produce a polymer. However, as mentioned above, in the production method described in this document, since the mixing and cutting of the silane compound used in the reaction greatly affects the reaction, the molecular weight of the polymer cannot be controlled.
此外,如下述,藉由使用專利文獻4的實施例中記載的反應條件,雖然可以 使用反應性差的矽烷化合物(具有氟烷基的矽烷化合物)作為單體,但即使使用此反應條件,仍難以獲得滿足條件1及條件2的硬化性聚倍半矽氧烷化合物(比較例1~3)。 In addition, as described below, by using the reaction conditions described in the examples of Patent Document 4, although it is possible to Using silane compounds with poor reactivity (silane compounds with fluoroalkyl groups) as monomers, it is still difficult to obtain hardening polysilsesquioxane compounds satisfying conditions 1 and 2 even if this reaction condition is used (Comparative Examples 1 to 2). 3).
本發明者等針對使用矽烷化合物(1)的聚縮合反應進行研究的結果,得知藉由在比較緩和的條件,花費時間進行聚縮合反應,可獲得滿足條件1及條件2的硬化性聚倍半矽氧烷化合物。 As a result of studying the polycondensation reaction using the silane compound (1), the inventors of the present invention found that by carrying out the polycondensation reaction under relatively mild conditions over a period of time, a hardening polymer that satisfies the conditions 1 and 2 can be obtained. semisiloxane compound.
具體而言,在溶媒中,或無溶媒,使用適量的酸觸媒,在預定溫度進行矽烷化合物的聚縮合反應,獲得含有製造中間產物的反應液後,加入鹼將反應液中和,進一步進行聚縮合反應,藉此可製造硬化性聚倍半矽氧烷化合物(A)。 Specifically, in a solvent, or without a solvent, use an appropriate amount of acid catalyst to carry out the polycondensation reaction of the silane compound at a predetermined temperature, and after obtaining a reaction solution containing an intermediate product, add an alkali to neutralize the reaction solution, and further carry out Polycondensation reaction, whereby hardening polysilsesquioxane compound (A) can be produced.
作為溶媒,可列舉,水;苯、甲苯、二甲苯等的芳香族烴類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、丙酸甲酯等的酯類;丙酮、丁酮、甲基異丁酮、環己酮等的酮類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、二級丁醇、三級丁醇等的醇類等。此等溶媒可單獨1種,或是組合2種以上使用。 Examples of the solvent include water; aromatic hydrocarbons such as benzene, toluene, and xylene; esters such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, and methyl propionate; acetone, methyl ethyl ketone, etc. Ketones such as methyl isobutyl ketone and cyclohexanone; alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, secondary butanol, and tertiary butanol. These solvents may be used alone or in combination of two or more.
使用溶媒時,其使用量,以矽烷化合物的總mol量為每1mol通常為0.001~10.000公升,以0.010~0.9公升為佳。 When using a solvent, the amount used is usually 0.001-10.000 liter per mol of the total silane compound, preferably 0.010-0.9 liter.
作為酸觸媒,可列舉,磷酸、鹽酸、硼酸、硫酸、硝酸等的無機酸;檸檬酸、乙酸、甲磺酸、三氟甲磺酸、苯磺酸、對甲苯磺酸等的有機酸等。此等當中,以至少1種選自磷酸、鹽酸、硼酸、硫酸、檸檬酸、乙酸及甲磺酸為佳。 Examples of the acid catalyst include inorganic acids such as phosphoric acid, hydrochloric acid, boric acid, sulfuric acid, and nitric acid; organic acids such as citric acid, acetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, and p-toluenesulfonic acid; . Among these, at least one selected from phosphoric acid, hydrochloric acid, boric acid, sulfuric acid, citric acid, acetic acid and methanesulfonic acid is preferred.
酸觸媒的使用量,相對於矽烷化合物的總mol量,通常為0.01~2.00mol%,以0.05~1.00mol%為佳,以0.10~0.30mol%的範圍為更佳。 The amount of the acid catalyst used is generally 0.01-2.00 mol%, preferably 0.05-1.00 mol%, more preferably 0.10-0.30 mol%, relative to the total mole amount of the silane compound.
在酸觸媒存在下的反應的反應溫度,通常為20~90℃,以25~80℃為佳。 The reaction temperature of the reaction in the presence of an acid catalyst is usually 20-90°C, preferably 25-80°C.
在酸觸媒存在下的反應的反應時間,通常為1~48小時,以3~24小時為佳。 The reaction time of the reaction in the presence of an acid catalyst is usually 1 to 48 hours, preferably 3 to 24 hours.
由在酸觸媒存在下的反應所獲得的製造中間產物的質量平均分子量(Mw),通常為800~5,000,以1,200~4,000為佳。 The mass average molecular weight (Mw) of the intermediate product obtained by the reaction in the presence of an acid catalyst is usually 800-5,000, preferably 1,200-4,000.
作為中和反應液時所使用的鹼,可列舉,氨水;三甲基胺、三乙基胺、吡啶、1,8-二氮雜雙環[5.4.0]-7-十一烯、苯胺、甲吡啶、1,4-二氮雜雙環[2.2.2]辛烷、咪唑等的有機鹼;氫氧化四甲基胺、氫氧化四乙基胺等的有機鹽氫氧化物;甲氧基鈉、乙氧基鈉、三級丁氧基鈉、三級丁氧基鉀等的金屬烷氧化物;氫化鈉、氫化鉀等的金屬氫化物;氫氧化鈉、氫氧化鉀、氫氧化鈣等的金屬氫氧化物;碳酸鈉、碳酸鉀、碳酸鎂等的金屬碳酸鹽;碳酸氫鈉、碳酸氫鉀等的金屬碳酸氫鹽等。 As the base used when neutralizing the reaction solution, ammonia water; trimethylamine, triethylamine, pyridine, 1,8-diazabicyclo[5.4.0]-7-undecene, aniline, Organic bases of picoline, 1,4-diazabicyclo[2.2.2]octane, imidazole, etc.; organic salt hydroxides of tetramethylamine hydroxide, tetraethylamine hydroxide, etc.; sodium methoxide , sodium ethoxide, sodium tertiary butoxide, potassium tertiary butoxide, etc. metal alkoxides; metal hydrides such as sodium hydride, potassium hydride, etc.; sodium hydroxide, potassium hydroxide, calcium hydroxide, etc. Metal hydroxides; metal carbonates of sodium carbonate, potassium carbonate, magnesium carbonate, etc.; metal bicarbonates of sodium bicarbonate, potassium bicarbonate, etc.
反應液的中和時所使用的鹼的量,相對於矽烷化合物的總mol量,通常為0.01~2.00mol%,以0.05~1.00mol%為佳,以0.10~0.70mol%的範圍為更佳。 The amount of alkali used in the neutralization of the reaction solution is usually 0.01~2.00mol%, preferably 0.05~1.00mol%, and more preferably 0.10~0.70mol%, relative to the total molar amount of the silane compound. .
此外,反應液的中和時所使用的鹼的量(mol),以在1步驟前所使用的酸觸媒的量(mol)的0.5~5.0倍為佳,以0.8~3.0倍為更佳,以1.0~2.0倍又更佳。 In addition, the amount (mol) of the base used for the neutralization of the reaction solution is preferably 0.5 to 5.0 times the amount (mol) of the acid catalyst used before the first step, more preferably 0.8 to 3.0 times , 1.0~2.0 times is better.
中和後的反應液的pH,通常為6.0~8.0,以6.2~7.0為佳,以6.4~6.9為更佳。 The pH of the neutralized reaction solution is usually 6.0-8.0, preferably 6.2-7.0, more preferably 6.4-6.9.
中和後的反應的反應溫度,通常為40~90℃,以50~80℃為佳。 The reaction temperature of the reaction after neutralization is usually 40-90°C, preferably 50-80°C.
中和後的反應的反應時間,通常為20~200分鐘,以30~150分鐘為佳。 The reaction time of the reaction after neutralization is usually 20 to 200 minutes, preferably 30 to 150 minutes.
上述的製造方法,在酸觸媒存在下的反應中,以加水分解為主要目的,在中和後的反應中,以脫水縮合為主要目的。 In the above-mentioned production method, hydrolysis is the main purpose in the reaction in the presence of an acid catalyst, and dehydration condensation is the main purpose in the reaction after neutralization.
藉由以這種方式進行矽烷化合物的聚縮合反應,可有效率地製造硬化性聚倍半矽氧烷化合物(A)。 By carrying out the polycondensation reaction of the silane compound in this way, the curable polysilsesquioxane compound (A) can be efficiently produced.
反應結束後,進行習知的純化處理,可將硬化性聚倍半矽氧烷化合物(A)分離。After the reaction, the known purification treatment can be performed to separate the curable polysilsesquioxane compound (A).
在本發明的硬化性組合物中,硬化性聚倍半矽氧烷化合物(A)可單獨1種,或是組合2種以上使用。In the curable composition of the present invention, the curable polysilsesquioxane compound (A) may be used alone or in combination of two or more.
本發明的硬化性組合物中的硬化性聚倍半矽氧烷化合物(A)的含量,以硬化性組合物的固形份全體為基準,通常為40~80質量%,以50~70質量%為佳。The content of the curable polysilsesquioxane compound (A) in the curable composition of the present invention is usually 40 to 80% by mass, or 50 to 70% by mass based on the entire solid content of the curable composition. better.
[(E)成分] 構成本發明的硬化性組合物的(E)成分為平均一次粒徑超過0.04μm,8μm以下的微粒子(以下,有時記載為「微粒子(E)」)。[(E) component] Component (E) constituting the curable composition of the present invention is fine particles having an average primary particle diameter of more than 0.04 μm and not more than 8 μm (hereinafter sometimes referred to as “fine particles (E)”).
藉由使用含有微粒子(E)的硬化性組合物,可形成耐剝離性佳的硬化物。 從易於獲得此效果而言,微粒子(E)的平均一次粒徑,以0.06~7μm為佳,以0.3~6μm為更佳,以0.5~4μm為進一步更佳。By using a curable composition containing fine particles (E), a cured product having excellent peeling resistance can be formed. From the viewpoint of easily obtaining this effect, the average primary particle size of the microparticles (E) is preferably 0.06-7 μm, more preferably 0.3-6 μm, and still more preferably 0.5-4 μm.
微粒子(E)的平均一次粒徑,使用雷射繞射-散射式粒度分佈測定裝置(例如,堀場製作所股份有限公司製,製品名「LA-920」)等,依照雷射散射法進行粒度分佈的測定而求得。The average primary particle diameter of the microparticles (E) is determined by the laser scattering method using a laser diffraction-scattering particle size distribution measuring device (for example, manufactured by Horiba Seisakusho Co., Ltd., product name "LA-920") or the like. obtained from the measurement.
微粒子(E)的形狀可以是球狀、鏈狀、針狀、板状、片狀、棒狀、纖維狀等的任一者,但以球狀為佳。在此,球狀是指除了圓球狀之外,包含橢圓體、蛋形、金平糖狀、蛹狀等可近似球體的多面體形狀的略球狀。The shape of the microparticles (E) may be spherical, chain-like, needle-like, plate-like, flake-like, rod-like, or fibrous, but spherical shape is preferred. Here, the spherical shape refers to a substantially spherical shape including a polyhedral shape that can approximate a sphere, such as an ellipsoid, an egg shape, a gold flat sugar shape, and a pupal shape, in addition to a spherical shape.
作為微粒子(E)的構成成分,並無特別限制,可列舉,金屬;金屬氧化物;礦物;碳酸鈣、碳酸鎂等的金屬碳酸鹽;硫酸鈣、硫酸鋇等的金屬硫酸鹽;氫氧化鋁等的金屬氫氧化物;矽酸鋁、矽酸鈣、矽酸鎂等的金屬矽酸鹽;二氧化矽等的無機成分;聚矽氧;丙烯酸系聚合物等的有機成分等。 此外,使用的微粒子(E)可以是表面經修飾者。The constituents of the microparticles (E) are not particularly limited, and include metals; metal oxides; minerals; metal carbonates such as calcium carbonate and magnesium carbonate; metal sulfates such as calcium sulfate and barium sulfate; Metal hydroxides such as aluminum silicate, calcium silicate, magnesium silicate, etc.; inorganic components such as silicon dioxide; polysiloxane; organic components such as acrylic polymers, etc. In addition, the microparticles (E) used may be surface-modified.
金屬是指在周期表中,隸屬於1族(H除外)、2~11族、12族(Hg除外)、13族(B除外)、14族(C及Si除外)、15族(N、P、As及Sb除外)或16族(O、S、Se、Te及Po除外)的元素。Metal refers to in the periodic table, belonging to group 1 (except H), group 2~11, group 12 (except Hg), group 13 (except B), group 14 (except C and Si), group 15 (N, P, As and Sb excluded) or Group 16 elements (O, S, Se, Te and Po excluded).
作為金屬氧化物,可列舉,例如,氧化鈦、氧化鋁、水鋁石、氧化鉻、氧化鎳、氧化銅、氧化鈦、氧化鋯、氧化銦、氧化鋅、及其複合氧化物等。金屬氧化物的微粒子亦包含由其金屬氧化物所構成的溶膠粒子。Examples of metal oxides include titanium oxide, aluminum oxide, diaspore, chromium oxide, nickel oxide, copper oxide, titanium oxide, zirconium oxide, indium oxide, zinc oxide, and composite oxides thereof. The fine particles of metal oxides also include sol particles composed of the metal oxides.
作為礦物,可列舉,綠土(smectite)、膨潤石等。 作為綠土,可列舉,例如,蒙脫石(montmorillonite)、貝德石(beidellite)、鋰膨潤石(hectorite)、皂石(saponite)、滑鎂皂石(stevensite)、矽鐵石(nontronite)、鋅皂石(sauconite)等。 作為二氧化矽,可列舉,乾式二氧化矽、濕式二氧化矽、表面修飾二氧化矽(表面經修飾的二氧化矽)等。Examples of minerals include smectite, bentonite, and the like. Examples of smectite include montmorillonite, beidellite, hectorite, saponite, stevensite, nontronite, Sauconite, etc. Examples of silica include dry silica, wet silica, surface-modified silica (surface-modified silica), and the like.
微粒子(E)可單獨1種,或是組合2種以上使用。 此等當中,從易於獲得上述效果而言,作為微粒子(E),以至少一種選自由以聚矽氧覆蓋表面的金屬氧化物、二氧化矽及聚矽氧所組成的群組的微粒子為佳,以二氧化矽、聚矽氧為更佳。Fine particles (E) may be used alone or in combination of two or more. Among them, from the viewpoint of easiness to obtain the above-mentioned effect, as the fine particles (E), at least one kind of fine particles selected from the group consisting of metal oxide, silicon dioxide, and polysiloxane whose surface is covered with polysiloxane is preferable. , silicon dioxide and polysiloxane are more preferable.
本發明的硬化性組合物中的微粒子(E)[(E)成分]的含量並無特別限制,但其量以(A)成分與(E)成分的質量比[(A)成分:(E)成分],以成為100:0.1~100:40的量為佳,以100:0.2~100:30為更佳,以100:0.3~100:20為更佳,以100:0.5~100:15為更佳,以100:0.8~100:12為進一步更佳。藉由使用(E)成分在上述範圍,更能顯現添加(E)成分的效果。The content of the microparticles (E) [(E) component] in the curable composition of the present invention is not particularly limited, but the amount is based on the mass ratio of (A) component to (E) component [(A) component: (E) ) composition], preferably 100:0.1~100:40, more preferably 100:0.2~100:30, more preferably 100:0.3~100:20, and 100:0.5~100:15 More preferably, 100:0.8~100:12 is further more preferable. By using (E)component in the said range, the effect of adding (E)component can be expressed more.
本發明的硬化性組合物,亦可含有作為(B)成分的分子內具有氮原子的矽烷偶合劑(以下,有時記載為「矽烷偶合劑(B)」)。The curable composition of the present invention may contain a silane coupling agent (hereinafter, sometimes referred to as "silane coupling agent (B)") having a nitrogen atom in the molecule as the component (B).
含有矽烷偶合劑(B)的硬化性組合物,賦予在塗佈步驟中操作性佳,且,接著性、耐剝離性及耐熱性更佳的硬化物。 在此,所謂在塗佈步驟中操作性佳,是指在塗佈步驟中,硬化性組合物從輸出管輸出,接著上拉輸出管時,不太有牽絲量,或是立刻斷開。藉由使用具有此性質的硬化性組合物,可防止因樹脂飛濺、液滴的擴散引起的周遭的污染。The curable composition containing the silane coupling agent (B) provides a cured product with better workability in the coating step, and better adhesiveness, peel resistance and heat resistance. Here, the term "good operability in the coating step" means that in the coating step, the curable composition is output from the delivery tube, and when the delivery tube is pulled up, there is little amount of threading, or it is broken immediately. By using a curable composition having this property, it is possible to prevent contamination of the surrounding area due to splashing of the resin and diffusion of liquid droplets.
作為矽烷偶合劑(B),只要是分子內具有氮原子的矽烷偶合劑即可並無特別限制。例如,可列舉以下述式(b-1)表示的三烷氧基矽烷化合物、式(b-2)表示的二烷氧基烷基矽烷化合物或二烷氧基芳基矽烷化合物等。The silane coupling agent (B) is not particularly limited as long as it has a nitrogen atom in the molecule. For example, a trialkoxysilane compound represented by following formula (b-1), a dialkoxyalkylsilane compound or a dialkoxyarylsilane compound represented by formula (b-2), etc. are mentioned.
[化8] [chemical 8]
上述式中,Ra 表示甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、三級丁氧基等的碳數1~6的烷氧基。複數個Ra 彼此可相同亦可相異。 Rb 表示甲基、乙基、正丙基、異丙基、正丁基、三級丁基等的碳數1~6的烷基;或是苯基、4-氯苯基、4-甲苯基、1-萘基等的、具有取代基,或不具有取代基的芳基。In the above formula, R a represents an alkoxy group having 1 to 6 carbon atoms such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, and tertiary butoxy. A plurality of R a may be the same as or different from each other. R b represents an alkyl group with 1 to 6 carbons such as methyl, ethyl, n-propyl, isopropyl, n-butyl, tertiary butyl, etc.; or phenyl, 4-chlorophenyl, 4-toluene A substituted or unsubstituted aryl group such as a group, 1-naphthyl group or the like.
Rc 表示具有氮原子的碳數1~10的有機基。此外,Rc 亦可進一步與其他含有矽原子的基鍵結。 作為Rc 的碳數1~10的有機基的具體例,可列舉,N-2-(胺基乙基)-3-胺基丙基、3-胺基丙基、N-(1,3-二甲基-亞丁基)胺基丙基、3-脲基丙基、N-苯基-胺基丙基等。R c represents an organic group having 1 to 10 carbon atoms having a nitrogen atom. In addition, R c may further bond with other groups containing silicon atoms. Specific examples of organic groups having 1 to 10 carbon atoms in R c include N-2-(aminoethyl)-3-aminopropyl, 3-aminopropyl, N-(1,3 -Dimethyl-butylene)aminopropyl, 3-ureidopropyl, N-phenyl-aminopropyl and the like.
上述式(b-1)或(b-2)表示的化合物當中,作為Rc 為與其他含有矽原子的基鍵結的有機基時的化合物,可列舉藉由三聚異氰酸(isocyanurate)骨架與其他矽原子鍵結所構成的三聚異氰酸系矽烷偶合劑者、藉由脲骨架與其他矽原子鍵結所構成的脲系矽烷偶合劑者。Among the compounds represented by the above-mentioned formula (b-1) or (b-2), when R c is an organic group bonded to other silicon atom-containing groups, the compound obtained by isocyanurate (isocyanurate) can be mentioned. Isocyanuric acid-based silane coupling agents composed of skeletons bonded to other silicon atoms, and urea-based silane coupling agents composed of urea skeletons bonded to other silicon atoms.
此等當中,作為矽烷偶合劑(B),從易於獲得接著強度更高的硬化物而言,以三聚異氰酸系矽烷偶合劑及脲系矽烷偶合劑為佳,再者,以分子內具有4個以上鍵結在矽原子的烷氧基者為佳。 具有4個以上鍵結在矽原子的烷氧基,是指鍵結在同一矽原子的烷氧基與鍵結在相異矽原子的烷氧基的總合計數為4以上。Among them, as the silane coupling agent (B), it is preferable to use an isocyanuric acid-based silane coupling agent and a urea-based silane coupling agent in terms of easily obtaining a hardened product with higher adhesive strength. Those having 4 or more alkoxy groups bonded to silicon atoms are preferred. An alkoxy group having 4 or more silicon atoms bonded means that the total number of alkoxy groups bonded to the same silicon atom and alkoxy groups bonded to different silicon atoms is 4 or more.
作為具有4個以上鍵結在矽原子的烷氧基的三聚異氰酸系矽烷偶合劑,可列舉下述式(b-3)表示的化合物,作為具有4個以上鍵結在矽原子的烷氧基的脲系矽烷偶合劑,可列舉下述式(b-4)表示的化合物。As the isocyanuric acid-based silane coupling agent having 4 or more alkoxy groups bonded to silicon atoms, compounds represented by the following formula (b-3) can be cited. Examples of the alkoxy urea-based silane coupling agent include compounds represented by the following formula (b-4).
[化9] [chemical 9]
式中,Ra 表示與上述相同意義。t1~t5分別獨立地表示1~10的整數,以1~6的整數為佳,以3為特別佳。In the formula, R a represents the same meaning as above. t1 to t5 each independently represent an integer of 1 to 10, preferably an integer of 1 to 6, particularly preferably 3.
作為式(b-3)表示的化合物的具體例,可列舉,1,3,5-N-參(3-三甲氧基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-三乙氧基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-三異丙氧基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-三丁氧基矽基丙基)三聚異氰酸等的1,3,5-N-參[(三(碳數1~6)烷氧基)矽基(碳數1~10)烷基]三聚異氰酸; 1,3,5,-N-參(3-二甲氧基甲基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二甲氧基乙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二甲氧基異丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二甲氧基正丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二甲氧基苯基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二乙氧基甲基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二乙氧基乙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二乙氧基異丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二乙氧基正丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二乙氧基苯基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二異丙氧基甲基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二異丙氧基乙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二異丙氧基異丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二異丙氧基正丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二異丙氧基苯基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二丁氧基甲基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二丁氧基乙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二丁氧基異丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二丁氧基正丙基矽基丙基)三聚異氰酸、1,3,5,-N-參(3-二丁氧基苯基矽基丙基)三聚異氰酸等的1,3,5-N-參[(二(碳數1~6)烷氧基)矽基(碳數1~10)烷基]三聚異氰酸等。 Specific examples of the compound represented by the formula (b-3) include 1,3,5-N-para(3-trimethoxysilylpropyl)isocyanuric acid, 1,3,5,- N-ginseng (3-triethoxysilylpropyl) isocyanuric acid, 1,3,5,-N-ginseng (3-triisopropoxysilylpropyl) isocyanuric acid, 1,3,5,-N-paraffin (3-tributoxysilylpropyl) isocyanuric acid and other 1,3,5-N-paraffin [(three (carbon number 1~6) alkoxy base) silicon base (carbon number 1~10) alkyl] trimeric isocyanic acid; 1,3,5,-N-paraffin(3-dimethoxymethylsilylpropyl)isocyanuric acid, 1,3,5,-N-paraffin(3-dimethoxyethylsilyl propyl) isocyanuric acid, 1,3,5,-N-paraffin (3-dimethoxyisopropylsilylpropyl)isocyanuric acid, 1,3,5,-N- ginseng(3-dimethoxyn-propylsilylpropyl)isocyanuric acid, 1,3,5,-N-paraffin(3-dimethoxyphenylsilylpropyl)isocyanuric acid Acid, 1,3,5,-N-paraffin (3-diethoxymethylsilylpropyl)isocyanuric acid, 1,3,5,-N-paraffin (3-diethoxyethyl Silylpropyl) isocyanuric acid, 1,3,5,-N-paraffin (3-diethoxyisopropylsilylpropyl)isocyanuric acid, 1,3,5,- N-paraffin (3-diethoxyn-propylsilylpropyl) isocyanuric acid, 1,3,5,-N-paraffin (3-diethoxyphenylsilylpropyl) trimer Isocyanic acid, 1,3,5,-N-paraffin (3-diisopropoxymethylsilylpropyl) isocyanuric acid, 1,3,5,-N-paraffin (3-diiso Propoxyethylsilylpropyl) isocyanuric acid, 1,3,5,-N-ginseng (3-diisopropoxyisopropylsilylpropyl)isocyanuric acid, 1, 3,5,-N-paraffin (3-diisopropoxy-n-propylsilylpropyl)isocyanuric acid, 1,3,5,-N-paraffin (3-diisopropoxyphenyl Silylpropyl) isocyanuric acid, 1,3,5,-N-paraffin (3-dibutoxymethylsilylpropyl)isocyanuric acid, 1,3,5,-N- ginseng(3-dibutoxyethylsilylpropyl)isocyanuric acid, 1,3,5,-N-ginseng(3-dibutoxyisopropylsilylpropyl)isocyanuric acid Acid, 1,3,5,-N-paraffin (3-dibutoxy-n-propylsilylpropyl)isocyanuric acid, 1,3,5,-N-paraffin (3-dibutoxy 1,3,5-N-para[(di(carbon number 1~6)alkoxy)silyl(carbon number 1~10)alkyl]tri Polyisocyanic acid, etc.
作為式(b-4)表示的化合物的具體例,可列舉,N,N’-雙(3-三甲氧基矽基丙基)脲、N,N’-雙(3-三乙氧基矽基丙基)脲、N,N’-雙(3-三丙氧基矽基丙基)脲、N,N’-雙(3-三丁氧基矽基丙基)脲、N,N’-雙(2-三甲氧基矽基乙基)脲等的N,N’-雙[(三(碳數1~6)烷氧基矽基)(碳數1~10)烷基]脲;N,N’-雙(3-二甲氧基甲基矽基丙基)脲、N,N’-雙(3-二甲氧基乙基矽基丙基)脲、N,N’-雙(3-二乙氧基甲基矽基丙基)脲等的N,N’-雙[(二(碳數1~6)烷氧基(碳數1~6)烷基矽基(碳數1~10)烷基]脲;N,N’-雙(3-二甲氧基苯基矽基丙基)脲、N,N’-雙(3-二乙氧基苯基矽基丙基)脲等的N,N’-雙[(二(碳數1~6)烷氧基(碳數6~20)芳基矽基(碳數1~10)烷基]脲等。 Specific examples of the compound represented by the formula (b-4) include N,N'-bis(3-trimethoxysilylpropyl)urea, N,N'-bis(3-triethoxysilyl) propyl)urea, N,N'-bis(3-tripropoxysilylpropyl)urea, N,N'-bis(3-tributoxysilylpropyl)urea, N,N' - N,N'-bis[(tri(1-6 carbon number)alkoxysilyl)(carbon number 1-10)alkyl]urea such as bis(2-trimethoxysilylethyl)urea; N,N'-bis(3-dimethoxymethylsilylpropyl)urea, N,N'-bis(3-dimethoxyethylsilylpropyl)urea, N,N'-bis (3-diethoxymethylsilylpropyl)urea and other N,N'-bis[(di(carbon number 1~6)alkoxy(carbon number 1~6)alkylsilyl(carbon number 1~10) Alkyl]urea; N,N'-bis(3-dimethoxyphenylsilylpropyl)urea, N,N'-bis(3-diethoxyphenylsilylpropyl) )N,N'-bis[(di(carbon number 1~6)alkoxy(carbon number 6~20)arylsilyl(carbon number 1~10)alkyl]urea, etc.
矽烷偶合劑(B)可單獨1種,或是組合2種以上使用。A silane coupling agent (B) can be used individually by 1 type, or in combination of 2 or more types.
此等當中,作為矽烷偶合劑(B),以使用1,3,5-N-參(3-三甲氧基矽基丙基)三聚異氰酸、1,3,5-N-參(3-三乙氧基矽基丙基)三聚異氰酸(以下,稱為「三聚異氰酸化合物」)、N,N’-雙(3-三甲氧基矽基丙基)脲、N,N’-雙(3-三乙氧基矽基丙基)脲(以下,稱為「脲化合物」)以及上述三聚異氰酸化合物與脲化合物的組合為佳。Among them, as the silane coupling agent (B), 1,3,5-N-paraffin (3-trimethoxysilylpropyl) isocyanuric acid, 1,3,5-N-paraffin ( 3-triethoxysilylpropyl)isocyanuric acid (hereinafter referred to as "isocyanuric acid compound"), N,N'-bis(3-trimethoxysilylpropyl)urea, A combination of N,N'-bis(3-triethoxysilylpropyl)urea (hereinafter referred to as "urea compound") and the above-mentioned isocyanuric acid compound and urea compound is preferable.
使用上述三聚異氰酸化合物與脲化合物的組合時,兩者的使用比例,以(三聚異氰酸化合物)與(脲化合物)的質量比為100:1~100:200為佳,以100:10~100:110為更佳。以此種比例,藉由使用三聚異氰酸化合物與脲化合物的組合,可獲得賦予接著強度更高,耐熱性更佳的硬化物的硬化性組合物。When using the combination of the above-mentioned isocyanuric acid compound and urea compound, the ratio of the two is preferably 100:1 to 100:200 in mass ratio of (isocyanuric acid compound) to (urea compound), and 100: 10~100: 110 is better. By using a combination of an isocyanuric acid compound and a urea compound at such a ratio, it is possible to obtain a curable composition that provides a cured product with higher adhesive strength and better heat resistance.
本發明的硬化性組合物含有矽烷偶合劑(B)[(B)成分]時,(B)成分的含量並無特別限定,但其量以上述(A)成分與(B)成分的質量比[(A)成分:(B)成分],以成為100:0.1~100:90為佳,以100:0.3~100:60為更佳,以100:1~100:50為更佳,以100:3~100:40進一步更佳,以100:5~100:30的量為特別佳。 藉由以此種比例含有(A)成分及(B)成分的硬化性組合物的硬化物,成為接著強度更高,耐熱性更佳者。When the curable composition of the present invention contains a silane coupling agent (B) [(B) component], the content of (B) component is not particularly limited, but the amount is based on the mass ratio of the above-mentioned (A) component to (B) component [(A) component: (B) component], preferably 100:0.1~100:90, more preferably 100:0.3~100:60, more preferably 100:1~100:50, preferably 100 :3~100:40 is further better, and the amount of 100:5~100:30 is particularly preferable. The cured product of the curable composition containing (A) component and (B) component in such a ratio has higher adhesive strength and better heat resistance.
本發明的硬化性組合物,亦可含有作為(C)成分的分子內具有酸酐構造的矽烷偶合劑(以下,有時記載為「矽烷偶合劑(C)」)。 含有矽烷偶合劑(C)的硬化性組合物,賦予在塗佈步驟中的操作性佳,且,接著強度更高,耐剝離性及耐熱性更佳的硬化物。The curable composition of the present invention may contain a silane coupling agent (hereinafter, sometimes referred to as "silane coupling agent (C)") having an acid anhydride structure in the molecule as the component (C). The curable composition containing the silane coupling agent (C) provides a cured product with good handling properties in the coating step, higher adhesive strength, and better peel resistance and heat resistance.
作為矽烷偶合劑(C),可列舉,2-(三甲氧基矽基)乙基琥珀酸酐、2-(三乙氧基矽基)乙基琥珀酸酐、3-(三甲氧基矽基)丙基琥珀酸酐、3-(三乙氧基矽基)丙基琥珀酸酐等的三(碳數1~6)烷氧基矽基(碳數2~8)烷基琥珀酸酐; 2-(二甲氧基甲基矽基)乙基琥珀酸酐等的二(碳數1~6)烷氧基甲基矽基(碳數2~8)烷基琥珀酸酐; 2-(甲氧基二甲基矽基)乙基琥珀酸酐等的(碳數1~6)烷氧基二甲基矽基(碳數2~8)烷基琥珀酸酐;Examples of the silane coupling agent (C) include 2-(trimethoxysilyl)ethylsuccinic anhydride, 2-(triethoxysilyl)ethylsuccinic anhydride, 3-(trimethoxysilyl)propyl tri(carbon number 1~6) alkoxysilyl (carbon number 2~8) alkyl succinic anhydrides such as triethoxysilyl succinic anhydride, 3-(triethoxysilyl)propyl succinic anhydride, etc.; 2-(dimethoxymethylsilyl) ethyl succinic anhydride and other di(carbon number 1~6) alkoxymethylsilyl (carbon number 2~8) alkyl succinic anhydrides; 2-(Methoxydimethylsilyl) ethyl succinic anhydride and other (carbon number 1~6) alkoxydimethylsilyl (carbon number 2~8) alkyl succinic anhydrides;
2-(三氯矽基)乙基琥珀酸酐、2-(三溴矽基)乙基琥珀酸酐等的三鹵化矽基(碳數2~8)烷基琥珀酸酐; 2-(二氯甲基矽基)乙基琥珀酸酐等的二鹵化甲基矽基(碳數2~8)烷基琥珀酸酐; 2-(氯二甲基矽基)乙基琥珀酸酐等的鹵化二甲基矽基(碳數2~8)烷基琥珀酸酐等。 矽烷偶合劑(C)可單獨1種,或是組合2種以上使用。2-(trichlorosilyl)ethylsuccinic anhydride, 2-(tribromosilyl)ethylsuccinic anhydride, silicon trihalide (carbon number 2~8) alkyl succinic anhydride, etc.; 2-(Dichloromethylsilyl) ethyl succinic anhydride and other dihalogenated methylsilyl (carbon number 2~8) alkyl succinic anhydrides; 2-(Chlorodimethylsilyl) ethyl succinic anhydride, etc. Halogenated dimethylsilyl (2-8 carbon atoms) alkyl succinic anhydride, etc. A silane coupling agent (C) can be used individually by 1 type, or in combination of 2 or more types.
此等當中,作為矽烷偶合劑(C),以三(碳數1~6)烷氧基矽基(碳數2~8)烷基琥珀酸酐為佳,以3-(三甲氧基矽基)丙基琥珀酸酐或3-(三乙氧基矽基)丙基琥珀酸酐為特別佳。Among them, as the silane coupling agent (C), tri(carbon number 1~6) alkoxysilyl (carbon number 2~8) alkyl succinic anhydride is preferred, and 3-(trimethoxysilyl) Propylsuccinic anhydride or 3-(triethoxysilyl)propylsuccinic anhydride is particularly preferred.
本發明的硬化性組合物含有矽烷偶合劑(C)[(C)成分]時,(C)成分的含量無特別限定,但其量以上述(A)成分與(C)成分的質量比[(A)成分:(C)成分],以成為100:0.1~100:30的量為佳,以100:0.3~100:20為更佳,以100:0.5~100:15為更佳,以100:1~100:10進一步為更佳。 以此種比例含有(C)成分的硬化性組合物的硬化物,成為接著強度更高者。When the curable composition of the present invention contains a silane coupling agent (C) [(C) component], the content of the (C) component is not particularly limited, but the amount is based on the mass ratio of the above-mentioned (A) component to (C) component [ (A) Component: (C) Component], preferably 100:0.1~100:30, more preferably 100:0.3~100:20, more preferably 100:0.5~100:15, preferably 100:0.5~100:15 100:1~100:10 is more preferable. The cured product of the curable composition containing the component (C) in such a ratio has higher adhesive strength.
本發明的硬化性組合物,亦可含有作為(D)成分的平均一次粒徑為5~40nm的微粒子(以下,有時記載為「微粒子(D)」)。 含有微粒子(D)的硬化性組合物,在塗佈步驟中的操作性佳。 從易於獲得此效果而言,微粒子(D)的平均一次粒徑,以5~30nm為佳,以5~20nm為更佳。The curable composition of the present invention may contain fine particles having an average primary particle diameter of 5 to 40 nm (hereinafter, sometimes referred to as "fine particles (D)") as the component (D). A curable composition containing fine particles (D) has good handleability in the coating step. From the viewpoint of easily obtaining this effect, the average primary particle size of the microparticles (D) is preferably 5-30 nm, more preferably 5-20 nm.
微粒子(D)的平均一次粒徑可以藉由使用穿透式電子顯微鏡觀察微粒子的形狀而求得。The average primary particle diameter of the microparticles (D) can be obtained by observing the shape of the microparticles using a transmission electron microscope.
微粒子(D)的比表面積,以10~500m2 /g為佳,以20~300m2 /g為更佳。藉由比表面積為上述範圍內,變得易於獲得在塗佈步驟中操作性佳的硬化性組合物。 比表面積可藉由BET多點法而求得。The specific surface area of the microparticles (D) is preferably 10 to 500 m 2 /g, more preferably 20 to 300 m 2 /g. When the specific surface area is within the above range, it becomes easy to obtain a curable composition with good handleability in the coating step. The specific surface area can be obtained by the BET multi-point method.
微粒子(D)的形狀可以是球狀、鏈狀、針狀、板狀、片狀、棒狀、纖維狀等的任一者,但以球狀為佳。在此,球狀是指除了圓球狀之外,包含橢圓體、蛋形、金平糖狀、繭狀等可近似球體的多面體形狀的略球狀。The shape of the microparticles (D) may be spherical, chain-like, needle-like, plate-like, flake-like, rod-like, or fibrous, but spherical shape is preferred. Here, the spherical shape refers to a substantially spherical shape including a polyhedron shape that can approximate a sphere, such as an ellipsoid, an egg shape, a flat candy shape, and a cocoon shape, in addition to a spherical shape.
作為微粒子(D)的構成成分,可列舉,與作為微粒子(E)的構成成分所例示者相同者。 微粒子(D)可單獨1種,或是組合2種以上使用。 此等當中,從易於獲得透明性佳的硬化物而言,作為微粒子(D),以二氧化矽、金屬氧化物、礦物為佳,以二氧化矽為更佳。Examples of the constituents of the microparticles (D) include the same ones as those exemplified as the constituents of the microparticles (E). Fine particles (D) may be used alone or in combination of two or more. Among these, silicon dioxide, metal oxides, and minerals are preferable as fine particles (D), and silicon dioxide is more preferable in terms of obtaining a hardened product with good transparency.
二氧化矽當中,從易於獲得在塗佈步驟中操作性更佳的硬化性組合物而言,以表面修飾二氧化矽為佳,以疎水性的表面修飾二氧化矽為更佳。 作為疎水性的表面修飾二氧化矽,可列舉,在表面與三甲基矽基等的三碳數1~20的三烷基矽基;二甲基矽基等的二碳數1~20的烷基矽基;辛基矽基等的碳數1~20的烷基鍵結的二氧化矽;以聚矽氧油處理表面的二氧化矽等。 疎水性的表面修飾二氧化矽可藉由例如,藉由在二氧化矽粒子,使用具有三碳數1~20的三烷基矽基、二碳數1~20的烷基矽基、碳數1~20的烷基矽基等的矽烷偶合劑進行表面修飾,或是,二氧化矽粒子以聚矽氧油進行處理而獲得。此外,作為表面修飾二氧化矽,可將市售品直接使用。Among the silicas, the surface-modified silica is preferable, and the water-repellent surface-modified silica is more preferable in view of the ease of obtaining a curable composition with better workability in the coating step. Examples of water-repellent surface-modified silica include, on the surface, a trialkylsilyl group with 1 to 20 carbon atoms such as trimethylsilyl, and a trialkylsilyl group with 1 to 20 carbon atoms such as dimethylsilyl. Alkylsilyl; octylsilyl and other alkyl-bonded silica with 1 to 20 carbon atoms; silica treated with polysiloxane oil on the surface, etc. Hydrophobic surface-modified silica can be obtained by, for example, using a trialkylsilyl group with a three-carbon number of 1-20, an alkylsilyl group with a two-carbon number of 1-20, and a carbon number of Surface modification with silane coupling agent such as alkyl silyl group of 1~20, or silicon dioxide particles treated with polysiloxane oil. In addition, as the surface-modified silica, a commercially available product can be used as it is.
本發明的硬化性組合物含有微粒子(D)[(D)成分]時,(D)成分的含量並無特別限制,但其量以上述(A)成分與(D)成分的質量比[(A)成分:(D)成分],以成為100:0.1~100:90的量為佳,以100:0.2~100:60為更佳,以100:0.3~100:50為更佳,以100:0.5~100:40為更佳,以100:0.8~100:30為更佳。藉由使用(D)成分在上述範圍,更能顯現添加(D)成分的效果。When the curable composition of the present invention contains microparticles (D) [(D) component], the content of (D) component is not particularly limited, but the amount is based on the mass ratio of the above-mentioned (A) component to (D) component [( A) Components: (D) Components], preferably 100:0.1~100:90, more preferably 100:0.2~100:60, more preferably 100:0.3~100:50, 100 : 0.5~100:40 is better, 100:0.8~100:30 is better. By using (D)component in the said range, the effect of adding (D)component can be expressed more.
本發明的硬化性組合物,在不阻礙本發明目的的範圍,亦可含有上述(A)~(E)成分以外的其他成分((F)成分)。 作為(F)成分,可列舉,抗氧化劑、紫外線吸收劑、光穩定劑等。The curable composition of the present invention may contain other components (component (F)) other than the above-mentioned components (A) to (E) within the range that does not hinder the object of the present invention. As (F) component, antioxidant, a ultraviolet absorber, a light stabilizer, etc. are mentioned.
抗氧化劑是為了防止加熱時的氧化劣化而添加。作為抗氧化劑,可列舉,磷系抗氧化劑、酚系抗氧化劑、硫系抗氧化劑等。Antioxidants are added to prevent oxidative deterioration during heating. Examples of antioxidants include phosphorus antioxidants, phenolic antioxidants, sulfur antioxidants, and the like.
作為磷系抗氧化劑,可列舉,亞磷酸鹽類、氧雜磷雜菲氧化物(oxaphosphaphenanthrene oxide)類等。作為酚系抗氧化劑,可列舉,單酚類、雙酚類、高分子型酚類等。作為硫系抗氧化劑,可列舉,二月桂基-3,3’-硫代二丙酸酯、二肉豆蔻基-3,3’-硫代二丙酸酯、二硬脂醯基-3,3’-硫代二丙酸酯等。Examples of phosphorus-based antioxidants include phosphites, oxaphosphaphenanthrene oxides, and the like. Examples of the phenolic antioxidant include monophenols, bisphenols, high molecular weight phenols, and the like. Examples of sulfur-based antioxidants include dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearoyl-3, 3'-thiodipropionate, etc.
此等抗氧化劑可單獨一種,或是組合二種以上使用。抗氧化劑的使用量,相對於(A)成分,通常為10質量%以下。These antioxidants may be used alone or in combination of two or more. The usage-amount of an antioxidant is 10 mass % or less normally with respect to (A) component.
紫外線吸收劑是以提升所得的硬化物的耐光性為目的而添加。 作為紫外線吸收劑,可列舉,水楊酸類、二苯基酮類、苯并三唑類、受阻胺類等。 紫外線吸收劑可單獨一種,或是組合二種以上使用。 紫外線吸收劑的使用量,相對於(A)成分,通常為10質量%以下。The ultraviolet absorber is added for the purpose of improving the light resistance of the obtained cured product. Examples of the ultraviolet absorber include salicylic acids, benzophenones, benzotriazoles, hindered amines, and the like. The ultraviolet absorber may be used alone or in combination of two or more. The usage-amount of a ultraviolet absorber is 10 mass % or less normally with respect to (A) component.
光穩定劑是以提升所得的硬化物的耐光性為目的而添加。 作為光穩定劑,可列舉,例如,聚[{6-(1,1,3,3,-四甲基丁基)胺基-1,3,5-三嗪-2,4-二基}{(2,2,6,6-四甲基-4-哌啶)亞胺基}六亞甲基{(2,2,6,6-四甲基-4-哌啶)亞胺基}]等的受阻胺類等。 此等光穩定劑可單獨一種,或是組合二種以上使用。 (F)成分的總使用量,相對於(A)成分,通常為20質量%以下。The light stabilizer is added for the purpose of improving the light resistance of the obtained cured product. As the light stabilizer, for example, poly[{6-(1,1,3,3,-tetramethylbutyl)amino-1,3,5-triazine-2,4-diyl} {(2,2,6,6-tetramethyl-4-piperidine)imino}hexamethylene {(2,2,6,6-tetramethyl-4-piperidine)imino} ] and other hindered amines. These photostabilizers may be used alone or in combination of two or more. (F) The total usage-amount of a component is 20 mass % or less normally with respect to (A) component.
本發明的硬化性組合物亦可含有溶媒。溶媒只要是能夠溶解或分散本發明的硬化性組合物的成分者則無特別限定。 作為溶媒,以具有254℃以上的沸點的溶媒(以下,有時記載為「溶媒(S1)」)為佳。 溶媒(S1)的沸點為254℃以上,以254~300℃為佳。 在此,沸點是指在1013hPa時的沸點(在本說明書中皆同)。The curable composition of the present invention may also contain a solvent. The solvent is not particularly limited as long as it can dissolve or disperse the components of the curable composition of the present invention. As the solvent, a solvent having a boiling point of 254° C. or higher (hereinafter, may be described as “a solvent (S1)”) is preferable. The boiling point of the solvent (S1) is above 254°C, preferably 254~300°C. Here, the boiling point means the boiling point at 1013 hPa (it is the same in this specification).
作為溶媒(S1),沸點為254℃以上,且,只要是能夠溶解硬化性聚倍半矽氧烷化合物(A)者則無特別限制。 此類的溶媒(S1),其揮發速度比較慢。因此,含有溶媒(S1)的硬化性組合物,因為即使在塗佈後長時間放置後,黏度變化小,能夠與才剛塗佈完後同樣地優異地安裝光元件等。The solvent (S1) is not particularly limited as long as it has a boiling point of 254° C. or higher and can dissolve the curable polysilsesquioxane compound (A). This type of solvent (S1) has a relatively slow volatilization speed. Therefore, since the curable composition containing the solvent (S1) has little change in viscosity even after being left for a long time after coating, it is possible to mount an optical element or the like excellently like immediately after coating.
作為溶媒(S1),具體而言,可列舉,三伸丙二醇正丁醚(沸點274℃)、1,6-己二醇二丙烯酸酯(沸點260℃)、二乙二醇二丁醚(沸點256℃)、三乙二醇丁基甲醚(沸點261℃)、聚乙二醇二甲醚(沸點264~294℃)、四乙二醇二甲醚(沸點275℃)、聚乙二醇單甲醚(沸點290~310℃)等。 此等當中,作為溶媒(S1),從更易於獲得本發明的效果的觀點而言,以三伸丙二醇正丁醚、1,6-己二醇二丙烯酸酯為佳。 溶媒(S1)可單獨1種,或是組合2種以上使用。As the solvent (S1), specifically, triethylene glycol n-butyl ether (boiling point 274°C), 1,6-hexanediol diacrylate (boiling point 260°C), diethylene glycol dibutyl ether (boiling point 256°C), triethylene glycol butyl methyl ether (boiling point 261°C), polyethylene glycol dimethyl ether (boiling point 264~294°C), tetraethylene glycol dimethyl ether (boiling point 275°C), polyethylene glycol monomethyl ether Ether (boiling point 290~310°C), etc. Among them, as the solvent (S1), tripropylene glycol n-butyl ether and 1,6-hexanediol diacrylate are preferable from the viewpoint of obtaining the effect of the present invention more easily. The solvent (S1) may be used alone or in combination of two or more.
本發明的硬化性組合物亦可含有溶媒(S1)以外的溶媒。 作為溶媒(S1)以外的溶媒,以沸點為200℃以上未滿254℃的溶媒(以下,有時記載為「溶媒(S2)」)為佳。 作為溶媒(S2),只要是沸點為200℃以上未滿254℃,且,能夠溶解硬化性聚倍半矽氧烷化合物(A)者則無特別限制。 藉由併用溶媒(S1)與溶媒(S2),而提升硬化性組合物的硬化性。The curable composition of the present invention may contain solvents other than the solvent (S1). The solvent other than the solvent (S1) is preferably a solvent having a boiling point of not less than 200°C and not more than 254°C (hereinafter, sometimes referred to as "the solvent (S2)"). The solvent (S2) is not particularly limited as long as it has a boiling point of 200° C. to less than 254° C. and can dissolve the curable polysilsesquioxane compound (A). The curability of the curable composition is improved by using the solvent (S1) and the solvent (S2) in combination.
作為溶媒(S2)的具體例,可列舉,二乙二醇單丁基醚乙酸酯(沸點247℃)、二丙二醇正丁醚(沸點229℃)、苯甲醇(沸點204.9℃)、二丙二醇甲醚乙酸酯(沸點209℃)、二乙二醇丁基甲基醚(沸點212℃)、二丙二醇正丙醚(沸點212℃)、三伸丙二醇二甲醚(沸點215℃)、三乙二醇二甲醚(沸點216℃)、二乙二醇單乙醚乙酸酯(沸點217.4℃)、二乙二醇正丁醚(沸點230℃)、乙二醇單苯基醚(沸點245℃)、三伸丙二醇甲基醚(沸點242℃)、丙二醇苯基醚(沸點243℃)、三乙二醇單甲基醚(沸點249℃)等。 此等當中,作為溶媒(S2),從易於獲得其效果而言,以醇系溶媒為佳,以二乙二醇單丁基醚乙酸酯、二丙二醇正丁醚為佳,以二乙二醇單丁基醚乙酸酯為更佳。Specific examples of the solvent (S2) include diethylene glycol monobutyl ether acetate (boiling point 247°C), dipropylene glycol n-butyl ether (boiling point 229°C), benzyl alcohol (boiling point 204.9°C), dipropylene glycol Methyl ether acetate (boiling point 209°C), diethylene glycol butyl methyl ether (boiling point 212°C), dipropylene glycol n-propyl ether (boiling point 212°C), tripropylene glycol dimethyl ether (boiling point 215°C), triethylene glycol Alcohol dimethyl ether (boiling point 216°C), diethylene glycol monoethyl ether acetate (boiling point 217.4°C), diethylene glycol n-butyl ether (boiling point 230°C), ethylene glycol monophenyl ether (boiling point 245°C), Tripropylene glycol methyl ether (boiling point 242°C), propylene glycol phenyl ether (boiling point 243°C), triethylene glycol monomethyl ether (boiling point 249°C), etc. Among these, as the solvent (S2), in terms of the ease of obtaining its effect, alcohol-based solvents are preferred, diethylene glycol monobutyl ether acetate and dipropylene glycol n-butyl ether are preferred, and diethylene glycol monobutyl ether acetate is preferred. Alcohol monobutyl ether acetate is more preferred.
併用溶媒(S1)與溶媒(S2)時,具體而言,以三伸丙二醇正丁醚(溶媒(S1))與二乙二醇單丁基醚乙酸酯(溶媒(S2))的組合、1,6-己二醇二丙烯酸酯(溶媒(S1))與二乙二醇單丁基醚乙酸酯(溶媒(S2))的組合、三伸丙二醇正丁醚(溶媒(S1))與二丙二醇正丁醚(溶媒(S2))的組合、1,6-己二醇二丙烯酸酯(溶媒(S1))與二丙二醇正丁醚(有機溶媒(S2))的組合為佳。When the solvent (S1) and the solvent (S2) are used together, specifically, a combination of tripropylene glycol n-butyl ether (the solvent (S1)) and diethylene glycol monobutyl ether acetate (the solvent (S2)), A combination of 1,6-hexanediol diacrylate (vehicle (S1)) and diethylene glycol monobutyl ether acetate (vehicle (S2)), tripropylene glycol n-butyl ether (vehicle (S1)) and A combination of dipropylene glycol n-butyl ether (vehicle (S2)) and a combination of 1,6-hexanediol diacrylate (vehicle (S1)) and dipropylene glycol n-butyl ether (organic solvent (S2)) are preferable.
本發明的硬化性組合物含有溶媒時,其的含量為使固體成分濃度較佳成為50~95質量%,更佳成為60~85質量%的量。藉由使固體成分濃度於此範圍內,變得易於獲得在塗佈步驟中操作性佳的硬化性組合物。When the curable composition of the present invention contains a solvent, its content is such that the solid content concentration becomes preferably 50 to 95% by mass, more preferably 60 to 85% by mass. By setting the solid content concentration within this range, it becomes easy to obtain a curable composition with good handleability in the coating step.
本發明的硬化性組合物含有溶媒(S1)及/或溶媒(S2)時,此等溶媒的合計量,相對於全部溶媒,通常為50~100質量%,以70~100質量%為佳,以90~100質量%為更佳。When the curable composition of the present invention contains the solvent (S1) and/or the solvent (S2), the total amount of these solvents is usually 50 to 100% by mass, preferably 70 to 100% by mass, based on the total solvent. 90~100% by mass is more preferable.
本發明的硬化性組合物含有溶媒(S1)時,溶媒(S1)的含量,相對於溶媒(S1)與溶媒(S2)的合計量,通常為20~100質量%,以30~85質量%為佳,以50~80質量%為更佳。When the curable composition of the present invention contains a solvent (S1), the content of the solvent (S1) is usually 20 to 100% by mass, preferably 30 to 85% by mass, based on the total amount of the solvent (S1) and the solvent (S2). Preferably, 50-80% by mass is more preferable.
滿足與溶媒量有關的此等條件的硬化性組合物為使接著性及濕潤擴散性(與上述液滴擴散有關的特性)適度地平衡者。A curable composition that satisfies these conditions related to the amount of the solvent has an appropriate balance between adhesiveness and wet spreadability (the above-mentioned characteristics related to droplet spreading).
本發明的硬化性組合物可藉由例如,將上述(A)成分與(E)成分、以及根據需要此等以外的成分以特定比例混合,進行脫氣而調製。 混合方法、脫氣方法並無特別限定,可利用習知的方法。The curable composition of this invention can be prepared, for example, by mixing said (A) component, (E) component, and components other than these in a specific ratio as needed, and degassing. The mixing method and the degassing method are not particularly limited, and known methods can be used.
本發明的硬化性組合物含有硬化性聚倍半矽氧烷化合物(A)。因此,本發明的硬化性組合物其硬化性佳,且,折射率低。此外,本發明的硬化性組合物有利於作為接著強度高的硬化物的形成材料。The curable composition of the present invention contains a curable polysilsesquioxane compound (A). Therefore, the curable composition of the present invention has good curability and low refractive index. In addition, the curable composition of the present invention is advantageous as a material for forming a cured product having high adhesive strength.
本發明的硬化性組合物的在25℃時的折射率(nD),通常為1.380~1.434,以1.380~1.430為佳,以1.380~1.428為更佳,以1.380~1.425為進一步更佳。 硬化性組合物的折射率(nD),可藉由實施例中記載的方法而測定。The refractive index (nD) at 25° C. of the curable composition of the present invention is usually 1.380 to 1.434, preferably 1.380 to 1.430, more preferably 1.380 to 1.428, and still more preferably 1.380 to 1.425. The refractive index (nD) of a curable composition can be measured by the method described in an Example.
再者,本發明的硬化性組合物含有(E)成分。因此,如下述,藉由使用本發明的硬化性組合物,可形成耐剝離性佳的硬化物。In addition, the curable composition of this invention contains (E)component. Therefore, as described below, by using the curable composition of the present invention, a cured product having excellent peeling resistance can be formed.
2)硬化物 本發明的硬化物為將本發明的硬化性組合物進行硬化而獲得者。 作為使本發明的硬化性組合物硬化的方法,可列舉,加熱硬化。使其硬化時的加熱溫度,通常為100~200℃,加熱時間通常為由10分鐘至20小時,以由30分鐘至10小時為佳。2) Hardened The cured product of the present invention is obtained by curing the curable composition of the present invention. As a method of hardening the curable composition of this invention, heating hardening is mentioned. The heating temperature for hardening is usually 100-200°C, and the heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.
本發明的硬化物為接著強度高,耐熱性佳者。 本發明的硬化物是否具有此等特性,例如,可以如下述般進行確認。亦即,在矽晶片的鏡面上,塗佈特定量的本發明的硬化性組合物,將塗佈面搭載於被黏著物上,壓附,進行加熱處理使其硬化。將其放置在預先加熱至預定溫度(例如,23℃、100℃)的黏結強度試驗機的測定台上30秒,離被黏著物50μm高度的位置附近,在相對於接著面的水平方向(剪切方向)施加應力,測定試驗片與被黏著物間的接著力。The cured product of the present invention has high bonding strength and good heat resistance. Whether or not the cured product of the present invention has these characteristics can be confirmed as follows, for example. That is, a specific amount of the curable composition of the present invention is coated on the mirror surface of a silicon wafer, the coated surface is mounted on an adherend, pressed, and heat-treated to be cured. Place it on the measuring table of the bond strength testing machine preheated to a predetermined temperature (for example, 23°C, 100°C) for 30 seconds, near the position of 50 μm height from the adherend, in the horizontal direction relative to the bonding surface (shear Tangential direction) to apply stress to measure the adhesive force between the test piece and the adherend.
本發明的硬化物的接著力,在23℃時以60N/4mm2 以上為佳,以80N/4mm2 以上為更佳,以100N/4mm2 以上為特別佳。此外,硬化物的接著力,在100℃時以30N/4mm2 以上為佳,以40N/4mm2 以上為更佳,以50N/4mm2 以上為進一步更佳,以60N/4mm2 以上為特別佳。 在本說明書中,「4mm2 」是指2mm×2mm(單邊為2mm的正方形)。The adhesive force of the cured product of the present invention is preferably at least 60N/ 4mm2 at 23°C, more preferably at least 80N/ 4mm2 , and particularly preferably at least 100N/ 4mm2 . In addition, the adhesion force of the cured product is preferably 30N/4mm2 or above at 100°C, more preferably 40N/4mm2 or above, still more preferably 50N/4mm2 or above, and especially 60N/ 4mm2 or above good. In this specification, "4mm 2 " means 2mm x 2mm (a square with a side of 2mm).
再者,本發明的硬化物為含有(E)成分的硬化性組合物進行硬化而得者,耐剝離性佳。 本發明的硬化物是否耐剝離性佳,例如,可以如下述般進行確認。 在LED導線框架,塗佈硬化性組合物,壓附藍寶石晶片,在170℃進行2小時加熱處理使其硬化後,將密封材注入至杯內,在120℃加熱1小時,再加上在150℃進行加熱處理,獲得硬化物的試驗片。此試驗片暴露於85℃,85%RH的環境168小時,以預熱160℃,最高溫度成為260℃的加熱時間1分鐘的IR回焊進行處理,接著,以熱循環測試機,在-40℃及+100℃放置各30分的試驗作為1循環,實施500循環。之後,去除密封材,檢驗此時元件是否一起剝離。在本發明的硬化物中,剝離的概率通常為50%以下,以25%以下為更佳。In addition, the cured product of the present invention is obtained by curing the curable composition containing the component (E), and is excellent in peeling resistance. Whether or not the cured product of the present invention has good peeling resistance can be confirmed, for example, as follows. On the LED lead frame, apply the curable composition, press the sapphire wafer, heat it at 170°C for 2 hours to harden it, pour the sealing material into the cup, heat it at 120°C for 1 hour, and then add it at 150°C It heat-processed at ℃, and obtained the test piece of hardened|cured material. The test piece was exposed to an environment of 85°C and 85%RH for 168 hours, and was treated with IR reflow with a heating time of 1 minute at a temperature of 160°C and a maximum temperature of 260°C. The test of standing for 30 minutes each at °C and +100°C was regarded as one cycle, and 500 cycles were implemented. Thereafter, the sealing material was removed, and it was checked whether or not the elements were peeled off together at this time. In the cured product of the present invention, the probability of peeling is usually 50% or less, more preferably 25% or less.
由於具有上述特性,本發明的硬化物適合作為光元件固定材使用。Due to the above properties, the cured product of the present invention is suitable for use as an optical element fixing material.
3)硬化性組合物的使用方法 本發明的方法為將本發明的硬化性組合物作為光元件固定材用接著劑或光元件固定材用密封材的使用方法。 作為光元件,可列舉,LED、LD等的發光元件、收光元件、複合光元件、光積體電路等。3) How to use the curable composition The method of the present invention is a method of using the curable composition of the present invention as an adhesive for an optical element fixing material or a sealing material for an optical element fixing material. Examples of the optical element include light-emitting elements such as LEDs and LDs, light-receiving elements, composite optical elements, and optical integrated circuits.
(光元件固定材用接著劑) 本發明的硬化性組合物適合作為光元件固定材用接著劑使用。 作為將本發明的硬化性組合物作為光元件固定材用接著劑的使用方法,可列舉,於作為接著對象的材料(光元件及其基板等)的單面或雙面的接著面塗佈該組合物,壓附後,使其加熱硬化,使作為接著對象的材料彼此牢固地接著的方法。本發明的硬化性組合物的塗佈量並無特別限定,只要是藉由使其硬化,使作為接著對象的材料彼此能夠牢固地接著的量即可。通常,硬化性組合物的塗膜的厚度成為0.5~5μm的量,以成為1~3μm的量為佳。(Adhesive for optical element fixing material) The curable composition of the present invention is suitably used as an adhesive for optical element fixing materials. As a method of using the curable composition of the present invention as an adhesive for an optical element fixing material, coating the adhesive surface on one or both sides of a material to be bonded (optical element and its substrate, etc.) After the composition is pressed, it is heated and hardened, and the materials to be bonded are firmly bonded to each other. The application amount of the curable composition of the present invention is not particularly limited, as long as it is an amount capable of firmly bonding materials to be bonded by curing the composition. Usually, the thickness of the coating film of a curable composition is 0.5-5 micrometers, Preferably it is 1-3 micrometers.
用以接著光元件的基板材料,可列舉,鈉鈣玻璃、耐熱性硬質玻璃等的玻璃類;陶瓷;藍寶石;鐵、銅、鋁、金、銀、鉑、鉻、鈦及其金屬的合金、不銹鋼(SUS302、SUS304、SUS304L、SUS309等)等的金屬類;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、乙烯-乙酸乙烯酯共聚物、聚苯乙烯、聚碳酸酯、聚甲基戊烯、聚碸、聚醚醚酮、聚醚碸、聚伸苯硫醚、聚醚醯亞胺、聚醯亞胺、聚醯胺、丙烯酸樹脂、降莰烯系樹脂、環烯烴樹脂、玻璃環氧樹脂等的合成樹脂等。Substrate materials for bonding optical elements include glass such as soda-lime glass and heat-resistant hard glass; ceramics; sapphire; iron, copper, aluminum, gold, silver, platinum, chromium, titanium and their metal alloys, Metals such as stainless steel (SUS302, SUS304, SUS304L, SUS309, etc.); polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, ethylene-vinyl acetate copolymer, Polystyrene, polycarbonate, polymethylpentene, polyether ether ketone, polyether ether ketone, polyphenylene sulfide, polyether imide, polyimide, polyamide, acrylic resin, Synthetic resins such as norbornene-based resins, cycloolefin resins, glass epoxy resins, etc.
使其加熱硬化時的加熱溫度,雖然是根據使用的硬化性組合物等,但通常為100~200℃。加熱時間通常為從10分鐘至20小時,以從30分鐘至10小時為佳。The heating temperature for heating and hardening depends on the curable composition used and the like, but is usually 100 to 200°C. The heating time is usually from 10 minutes to 20 hours, preferably from 30 minutes to 10 hours.
>光元件固定材用密封材> 本發明的硬化性組合物適合作為光元件固定材用密封材使用。 作為將本發明的硬化性組合物作為光元件固定材用密封材的使用方法,可列舉,例如,將該組合物成形為期望的形狀,獲得內裝有光元件的成形體後,藉由使其加熱硬化,製造光元件密封體的方法等。 作為將本發明的硬化性組合物成形為期望的形狀的方法,並未特別限定,可採用通常的轉移成形法(transfer molding)、注模法等的已知的塑模法。>Sealing material for optical element fixing material> The curable composition of the present invention is suitably used as a sealing material for optical element fixing materials. As a method of using the curable composition of the present invention as a sealing material for an optical element fixing material, for example, after molding the composition into a desired shape to obtain a molded body containing an optical element, by using It is hardened by heating, a method of manufacturing an optical element sealing body, and the like. The method for molding the curable composition of the present invention into a desired shape is not particularly limited, and known molding methods such as transfer molding and injection molding can be used.
加熱硬化時的加熱溫度,雖然是依照使用的硬化性組合物等,但通常為100~200℃。加熱時間通常從10分鐘至20小時,以從30分鐘至10小時為佳。The heating temperature during heat curing depends on the curable composition used, etc., but is usually 100 to 200°C. The heating time is usually from 10 minutes to 20 hours, preferably from 30 minutes to 10 hours.
由於所得的光元件密封體使用本發明的硬化性組合物,因此耐熱性佳,且接著強度高。 [實施例]Since the obtained optical element sealing body uses the curable composition of this invention, it is excellent in heat resistance, and adhesive strength is high. [Example]
以下,舉例實施例更詳細說明本發明。但是,本發明並非限於以下實施例者。 各例中的部及%,若無特別說明,則為質量基準。Hereinafter, the present invention will be described in more detail by way of examples. However, the present invention is not limited to those of the following examples. Parts and % in each example are mass standards unless otherwise specified.
(實施例1) 在300mL的茄型燒瓶中,導入3,3,3-三氟丙基三甲氧基矽烷17.0g(77.7mmol)及甲基三乙氧基矽烷32.33g(181.3mmol)後,一邊將其攪拌,一邊加入在蒸餾水14.0g中溶解35%鹽酸0.0675g(HCl的量為0.65mmol,相對於矽烷化合物的合計量,為0.25mol%)所得的水溶液,將全體在30℃攪拌2小時,接著升溫至70℃攪拌20小時。 一邊繼續攪拌內容物,一邊於其中加入28%氨水0.0394g(NH3 的量為0.65mmol)與乙酸丙酯46.1g的混合溶液,使反應液pH成為6.9,直接在70℃攪拌60分鐘。 將反應液放置冷卻至室溫後,於其中,加入乙酸丙酯50g及水100g進行分液處理,獲得含有反應生成物的有機層。於此有機層中加入硫酸鎂進行乾燥處理。過濾去除硫酸鎂後,將有機層以蒸餾器濃縮,接著,藉由將所得的濃縮物進行真空乾燥,獲得硬化性聚倍半矽氧烷化合物(1)。(Example 1) After introducing 17.0 g (77.7 mmol) of 3,3,3-trifluoropropyltrimethoxysilane and 32.33 g (181.3 mmol) of methyltriethoxysilane into a 300 mL eggplant-shaped flask, While stirring this, an aqueous solution obtained by dissolving 0.0675 g of 35% hydrochloric acid (0.65 mmol of HCl, 0.25 mol % relative to the total amount of silane compounds) in 14.0 g of distilled water was added, and the whole was stirred at 30° C. for 2 hours, then heated to 70°C and stirred for 20 hours. While continuing to stir the contents, a mixed solution of 28% ammonia water 0.0394g (the amount of NH3 is 0.65mmol) and propyl acetate 46.1g was added thereto to make the pH of the reaction solution 6.9, and it was directly stirred at 70°C for 60 minutes. After the reaction liquid was left to cool to room temperature, 50 g of propyl acetate and 100 g of water were added thereto for liquid separation treatment to obtain an organic layer containing a reaction product. Magnesium sulfate was added to this organic layer for drying treatment. After removing magnesium sulfate by filtration, the organic layer was concentrated with a distiller, and then, the obtained concentrate was vacuum-dried to obtain a curable polysilsesquioxane compound (1).
於硬化性聚倍半矽氧烷化合物(1)100份中,加入20份平均一次粒徑為7nm的二氧化矽填料,10份平均一次粒徑為0.8μm的聚矽氧填料。再者,加入30份作為溶劑的二乙二醇單丁基醚乙酸酯:三伸丙二醇正丁醚=40:60(質量比)的混合溶劑後,攪拌全體。 藉由三軸輥軋機(triple roll mill)進行分散處理後,加入1,3,5-N-參[3-(三甲氧基矽基)丙基]三聚異氰酸30份、3-(三甲氧基矽基)丙基琥珀酸酐3份,再者,作為溶劑的二乙二醇單丁基醚乙酸酯:三伸丙二醇正丁醚=40:60(質量比)的混合溶劑,充分混合全體,藉由進行脫氣,獲得固體成分濃度82%的硬化性組合物(1)。To 100 parts of curable polysilsesquioxane compound (1), add 20 parts of silica filler with an average primary particle diameter of 7 nm, and 10 parts of polysiloxane filler with an average primary particle diameter of 0.8 μm. Furthermore, after adding 30 parts of diethylene glycol monobutyl ether acetate as a solvent: Tripropylene glycol n-butyl ether=40:60 (mass ratio) mixed solvent, the whole thing was stirred. After dispersion treatment by triple roll mill, 30 parts of 1,3,5-N-para[3-(trimethoxysilyl)propyl]isocyanuric acid, 3-( 3 parts of trimethoxysilyl) propyl succinic anhydride, moreover, the mixed solvent of diethylene glycol monobutyl ether acetate as solvent: tripropylene glycol n-butyl ether=40:60 (mass ratio), fully The whole was mixed and degassed to obtain a curable composition (1) with a solid content concentration of 82%.
(實施例2) 除了將加入28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更為120分鐘之外,其餘與實施例1相同,獲得硬化性聚倍半矽氧烷化合物(2)及硬化性組合物(2)。(Example 2) Except that the stirring time after adding the mixed solution of 28% ammonia water and propyl acetate was changed to 120 minutes, all the other were the same as in Example 1 to obtain the hardening polysilsesquioxane compound (2) and the hardening composition ( 2).
(實施例3) 除了將加入28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更為90分鐘之外,其餘與實施例1相同,獲得硬化性聚倍半矽氧烷化合物(3)及硬化性組合物(3)。(Example 3) Except that the stirring time after adding the mixed solution of 28% ammonia water and propyl acetate was changed to 90 minutes, all the other were the same as in Example 1 to obtain the hardening polysilsesquioxane compound (3) and the hardening composition ( 3).
(實施例4) 除了將加入28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更為50分鐘之外,其餘與實施例1相同,獲得硬化性聚倍半矽氧烷化合物(4)及硬化性組合物(4)。(Example 4) Except that the stirring time after adding the mixed solution of 28% ammonia water and propyl acetate was changed to 50 minutes, all the other were the same as in Example 1 to obtain the hardening polysilsesquioxane compound (4) and the hardening composition ( 4).
(實施例5) 除了將加入28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更為40分鐘之外,其餘與實施例1相同,獲得硬化性聚倍半矽氧烷化合物(5)及硬化性組合物(5)。(Example 5) Except that the stirring time after adding the mixed solution of 28% ammonia water and propyl acetate was changed to 40 minutes, all the other were the same as in Example 1 to obtain hardening polysilsesquioxane compound (5) and hardening composition ( 5).
(比較例1) 依照WO2017/110948號的實施例8的方法,獲得硬化性聚倍半矽氧烷化合物(6)。 接著,於硬化性聚倍半矽氧烷化合物(6)100份中,加入平均一次粒徑為7nm的二氧化矽填料20份,平均一次粒徑為0.8μm的聚矽氧填料10份。再者,加入30份作為溶劑的二乙二醇單丁基醚乙酸酯後,攪拌全體。 以三軸輥軋機進行分散處理後,添加1,3,5-N-參[3-(三甲氧基矽基)丙基]三聚異氰酸10份,3-(三甲氧基矽基)丙基琥珀酸酐3份,再者,以使用E型黏度計在25℃、200s-1 的條件進行測定時的黏度成為4.5Pa・s的方式,添加二乙二醇單丁基醚乙酸酯,充分混合全體,藉由進行脫氣,獲得硬化性組合物(6)。 且,在WO2017/110948號的段落(0115),雖然作為鹽酸的使用量記載為「相對於矽烷化合物的合計量為0.25mol%」,但從導入量計算時,正確為「相對於矽烷化合物的合計量約1.6mol%」。在以下的比較例2、3中亦相同。(Comparative Example 1) According to the method of Example 8 of WO2017/110948, a curable polysilsesquioxane compound (6) was obtained. Next, 20 parts of silica filler with an average primary particle diameter of 7 nm and 10 parts of polysiloxane filler with an average primary particle diameter of 0.8 μm were added to 100 parts of curable polysilsesquioxane compound (6). Furthermore, after adding 30 parts of diethylene glycol monobutyl ether acetate as a solvent, the whole was stirred. After dispersing with a three-axis rolling mill, add 10 parts of 1,3,5-N-para[3-(trimethoxysilyl)propyl]isocyanuric acid, 3-(trimethoxysilyl) 3 parts of propyl succinic anhydride, and diethylene glycol monobutyl ether acetate was added so that the viscosity when measured with an E-type viscometer at 25°C and 200 s -1 became 4.5 Pa·s , fully mixed the whole, and degassed to obtain a curable composition (6). In addition, in paragraph (0115) of WO2017/110948, although the amount of hydrochloric acid used is described as "0.25 mol% relative to the total amount of silane compounds", when calculating from the amount introduced, it is correctly "0.25 mol% relative to the amount of silane compounds". The total amount is about 1.6 mol%. The same applies to Comparative Examples 2 and 3 below.
(比較例2) 依照WO2017/110948號的實施例9的方法,獲得硬化性聚倍半矽氧烷化合物(7)。 接著,依照與比較例1相同的方法,獲得硬化性組合物(7)。(comparative example 2) According to the method of Example 9 of WO2017/110948, a curable polysilsesquioxane compound (7) was obtained. Next, according to the method similar to Comparative Example 1, curable composition (7) was obtained.
(比較例3) 依照WO2017/110948號的實施例10的方法,獲得硬化性聚倍半矽氧烷化合物(8)。 接著,依照與比較例1相同的方法,獲得硬化性組合物(8)。(comparative example 3) According to the method of Example 10 of WO2017/110948, a curable polysilsesquioxane compound (8) was obtained. Next, according to the same method as Comparative Example 1, a curable composition (8) was obtained.
(比較例4) 於300mL的茄型燒瓶中,導入甲基三乙氧基矽烷71.37g(400mmol)後,一邊攪拌,一邊加入在蒸餾水21.6g中溶解35%鹽酸0.1g(相對於矽烷化合物的合計量,為0.25mol%)的水溶液,將全體在30℃攪拌2小時,接著升溫至70℃攪拌5小時。 一邊繼續攪拌內容物,一邊於其中加入乙酸丙酯140g與28%氨水0.12g(相對於矽烷化合物的合計量,NH3 為0.5mol%),在70℃攪拌3小時。 將反應液冷卻至室溫後,使用純水,清洗有機層至水層的pH成為7為止。 將有機層以蒸餾器濃縮,將濃縮物進行真空乾燥,獲得硬化性聚倍半矽氧烷化合物(9)。 接著,藉由與實施例1相同的方法,獲得硬化性組合物(9)。(Comparative Example 4) In a 300mL eggplant-shaped flask, 71.37g (400mmol) of methyltriethoxysilane was introduced, and while stirring, 0.1g of 35% hydrochloric acid dissolved in 21.6g of distilled water (relative to the amount of silane compound) was added. The total amount was 0.25 mol %) of the aqueous solution, the whole was stirred at 30° C. for 2 hours, and then the temperature was raised to 70° C. and stirred for 5 hours. While continuing to stir the contents, 140 g of propyl acetate and 0.12 g of 28% ammonia water (0.5 mol% of NH 3 relative to the total amount of silane compounds) were added thereto, and stirred at 70° C. for 3 hours. After cooling the reaction liquid to room temperature, the organic layer was washed with pure water until the pH of the aqueous layer became 7. The organic layer was concentrated with a distiller, and the concentrate was vacuum-dried to obtain a curable polysilsesquioxane compound (9). Next, by the same method as in Example 1, a curable composition (9) was obtained.
(比較例5) 除了將加入28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更為240分鐘之外,其餘與實施例1相同,獲得硬化性聚倍半矽氧烷化合物(10)及硬化性組合物(10)。(comparative example 5) Except that the stirring time after adding the mixed solution of 28% ammonia water and propyl acetate was changed to 240 minutes, all the other were the same as in Example 1 to obtain the hardening polysilsesquioxane compound (10) and the hardening composition ( 10).
使用在實施例及比較例所得的硬化性聚倍半矽氧烷化合物(1)~(10)以及硬化性組合物(1)~(10),分別進行以下的測定、試驗。結果如第1表所示。Using curable polysilsesquioxane compounds (1) to (10) and curable compositions (1) to (10) obtained in Examples and Comparative Examples, the following measurements and tests were performed, respectively. The results are shown in Table 1.
[質量平均分子量測定] 硬化性聚倍半矽氧烷化合物的質量平均分子量(Mw)藉由以下的裝置及條件進行測定。 裝置名稱:HLC-8220GPC,東曹股份有限公司製 管柱:依序連接TSKgel GMHXL、TSKgel GMHXL及TSKgel 2000HXL者 溶媒:四氫呋喃 標準物質:聚苯乙烯 注入量:20μl 測定溫度:40℃ 流速:0.6ml/分 偵測器:示差折射計[Measurement of mass average molecular weight] The mass average molecular weight (Mw) of a curable polysilsesquioxane compound was measured with the following apparatus and conditions. Device name: HLC-8220GPC, manufactured by Tosoh Co., Ltd. Column: connected to TSKgel GMHXL, TSKgel GMHXL and TSKgel 2000HXL in sequence Solvent: Tetrahydrofuran Standard material: polystyrene Injection volume: 20μl Measuring temperature: 40°C Flow rate: 0.6ml/min Detector: Differential Refractometer
[29 Si-NMR測定] 裝置:Bruker BioSpin公司製AV-50029 Si-NMR共振頻率:99.352MHz 探針:5mmφ溶液探針 測定溫度:室溫(25℃) 試料旋轉數:20kHz 測定法:反門控去偶合法(Inverse gated decoupling)29 Si偏折角:90∘29 Si 90∘脈波幅寬:8.0μs 重複時間:5s 累積次數:9200次 觀測寬:30kHz[Measurement of 29 Si-NMR] Apparatus: AV-500 manufactured by Bruker BioSpin Co., Ltd. 29 Si-NMR resonance frequency: 99.352 MHz Probe: 5 mmφ solution probe Measurement temperature: room temperature (25° C.) Number of sample rotations: 20 kHz Measurement method: reverse Inverse gated decoupling method (Inverse gated decoupling) 29 Si deflection angle: 90∘ 29 Si 90∘ pulse width: 8.0μs repetition time: 5s accumulation times: 9200 observation width: 30kHz
>29 Si-NMR試料製作方法> 為了縮短弛緩時間,添加作為弛緩試劑的Fe(acac)3 進行測定。 聚倍半矽氧烷濃度:15% Fe(acac)3 濃度:0.6% 測定溶媒:丙酮 內部標準:TMS> 29 Si-NMR sample preparation method > In order to shorten the relaxation time, Fe(acac) 3 as a relaxation reagent was added for measurement. Polysilsesquioxane concentration: 15% Fe(acac) 3 concentration: 0.6% Determination solvent: acetone Internal standard: TMS
>波形處理解析> 針對傅利葉轉換後的光譜的各波峰,藉由波峰峰頂的位置求得化學偏移,進行積分。>Waveform Processing Analysis> For each peak of the Fourier-transformed spectrum, the chemical shift is obtained from the position of the peak top and integrated.
[折射率測定] 將硬化性組合物吐出在水平面上,藉由使筆型屈光計(ATAGO公司製,PEN-RI)的測定面在25℃壓附,測定折射率(nD)。[Measurement of Refractive Index] The curable composition was discharged on a horizontal surface, and the refractive index (nD) was measured by pressing the measurement surface of a pen refractometer (manufactured by ATAGO, PEN-RI) at 25°C.
[硬化性評價] 以流變儀(Anton Paar公司製,MCR302),使用20mm的平行板,以試驗起始溫度為80℃,升溫速度5℃/分,剪切應變1%,頻率1Hz,測定剪切應力。剪切應力成為2000Pa的溫度作為硬化溫度。 [hardening evaluation] The shear stress was measured with a rheometer (manufactured by Anton Paar, MCR302) using a 20 mm parallel plate, with a test start temperature of 80° C., a heating rate of 5° C./min, a shear strain of 1%, and a frequency of 1 Hz. The temperature at which the shear stress becomes 2000 Pa was defined as the hardening temperature.
[黏度評價] [Viscosity evaluation]
以流變儀(Anton Paar公司製,MCR301),使用半徑50mm,錐角度0.5°的錐板,分別測定在25℃的剪切速度為2s-1與剪切速度為200s-1的黏度。由所得的測定值求得觸變指數(剪切速度為2s-1的黏度/剪切速度為200s-1的黏度)。 Using a rheometer (manufactured by Anton Paar, MCR301), using a cone-plate with a radius of 50 mm and a cone angle of 0.5°, the viscosity at a shear rate of 2 s −1 and a shear rate of 200 s −1 at 25° C. was measured. The thixotropic index (viscosity at a shear rate of 2 s −1 /viscosity at a shear rate of 200 s −1 ) was obtained from the obtained measured values.
[接著強度測定] [adhesion strength measurement]
在單邊為2mm的正方形(面積為4mm2)的矽晶片的鏡面,將硬化性組合物以分別成為厚度約為2μm的方式塗佈,將塗佈面壓載於被黏著物(鍍銀銅板)上。之後,在170℃進行2小時加熱處理及硬化,獲得附試驗片的被黏著物。將此附試驗片的被黏著物放置在預先加熱至預定溫度(23℃、100℃)的黏結強度試驗機(DAGE公司製,Series 4000)的測定台上30秒,離被黏著物100μm的高度的位置附近,以速度200μm/s在相對於接著面的水平方向(剪切方向)施加應力,測定分別在23℃及100℃時的試驗片與被黏著物間的接著強度(N/4mm2)。 On the mirror surface of a silicon wafer with a side of 2 mm square (area 4 mm 2 ), apply the curable composition to a thickness of approximately 2 μm, and press the coated surface on the adherend (silver-plated copper plate) )superior. Thereafter, heat treatment and curing were performed at 170° C. for 2 hours to obtain an adherend with a test piece. Place the adherend with the test piece on the measuring table of the adhesive strength tester (DAGE, Series 4000) preheated to a predetermined temperature (23°C, 100°C) for 30 seconds, at a height of 100 μm from the adherend Near the position, apply stress in the horizontal direction (shear direction) relative to the bonding surface at a speed of 200μm/s, and measure the bonding strength between the test piece and the adherend at 23°C and 100°C respectively (N/4mm 2 ).
[耐破裂性評價] [Crack resistance evaluation]
在單邊為0.5mm的正方形(面積為0.25mm2)的玻璃晶片的鏡面,將硬化性組合物以厚度成為約2μm的方式塗佈,將塗佈面壓載於被黏著物(鍍銀銅板)上。之後,在170℃進行2小時加熱處理使其硬化,獲得附試驗片的被黏著物。使用數位顯微鏡(VHX-1000,Keyence製),觀察從玻璃晶片滲出的樹脂部(填料部位),計數具有破裂的樣品的數量,破裂發生率為0%以上未滿25%評價為「A」,25%以上未滿50%評價為「B」,50%以上100%評價為「C」。 On the mirror surface of a glass wafer with a square ( 0.25mm2 area) of 0.5mm on one side, apply the curable composition to a thickness of about 2μm, and press the coated surface on the adherend (silver-plated copper plate) )superior. Thereafter, heat treatment was performed at 170° C. for 2 hours to harden, and an adherend with a test piece was obtained. Using a digital microscope (VHX-1000, manufactured by Keyence), the resin part (filler part) exuded from the glass wafer was observed, and the number of samples with cracks was counted, and the rate of crack occurrence was rated as "A" from 0% to 25%. More than 25% but less than 50% are evaluated as "B", and 50% or more and 100% are evaluated as "C".
[耐剝離性評價] [Peel resistance evaluation]
在LED導線框架(Enomoto公司製,5050 D/G PKG LEADFRAME),將硬化性組合物以0.4mmφ程度塗佈,壓附在單邊為0.5mm的正方形(面積為0.25mm2)的藍寶石晶片。之後,在170℃進行2小時加熱處理使其硬化後,將密封材(信越化學工業公司製,LPS-3419)注入至杯內,在120℃加熱1小時,再加上在150℃加熱1小時,獲得試驗片。 此試驗片暴露於85℃,85%RH的環境中168小時,以預熱160℃,最高溫度成為260℃的加熱時間1分鐘的IR回焊(回焊爐:相模理工公司製,製品名「WL-15-20DNX型」)進行處理。之後,以熱循環測試機,在-40℃及+100℃放置各30分鐘的試驗做為1循環,實施500循環。之後,進行去除密封材的操作,檢驗此時元件是否一起剝落。此試驗針對各硬化性組合物各別進行100次。 計數元件一起剝落的次數,剝離發生率為25%以下的話評價為「A」,大於25%,50%以下的話評價為「B」,大於50%的話評價為「C」。The curable composition was applied to an LED lead frame (manufactured by Enomoto, 5050 D/G PKG LEADFRAME) at about 0.4 mmφ, and pressed onto a sapphire wafer with a square (area: 0.25 mm 2 ) of 0.5 mm on one side. After that, heat treatment at 170°C for 2 hours to harden, pour the sealant (Shin-Etsu Chemical Co., Ltd., LPS-3419) into the cup, heat at 120°C for 1 hour, and then heat at 150°C for 1 hour , to obtain test pieces. This test piece was exposed to an environment of 85°C and 85%RH for 168 hours, preheated at 160°C, and the maximum temperature was 260°C for 1 minute of IR reflow (reflow furnace: manufactured by Sagami Riko Co., Ltd., product name " WL-15-20DNX type") for processing. Afterwards, with the thermal cycle tester, the test of standing at -40°C and +100°C for 30 minutes each was regarded as one cycle, and 500 cycles were implemented. Thereafter, an operation of removing the sealing material was carried out, and it was checked whether or not the elements were peeled off together at this time. This test was performed 100 times for each curable composition. The number of times the components peeled off at the same time was counted, and if the peeling occurrence rate was 25% or less, it was rated as "A", if it was more than 25%, 50% or less, it was rated as "B", and if it was more than 50%, it was rated as "C".
[第1表]
由第1表可知以下事項。 可知在實施例1~5所得的硬化性聚倍半矽氧烷化合物(1)~(5),29 Si-NMR測定的結果,Z2的値於20~40%的範圍內。此外,硬化性聚倍半矽氧烷化合物(1)~(5)的質量平均分子量皆在4000~11000的範圍內。 含有此等硬化性聚倍半矽氧烷化合物的硬化性組合物(1)~(5),其折射率(nD)低,在較低的溫度充分地硬化。 此外,硬化性組合物(1)~(5)的硬化物,其接著強度高。The following matters can be seen from Table 1. It can be seen that in the curable polysilsesquioxane compounds (1)-(5) obtained in Examples 1-5, as a result of 29 Si-NMR measurement, the value of Z2 is in the range of 20-40%. In addition, the mass average molecular weights of the curable polysilsesquioxane compounds (1)-(5) are all in the range of 4000-11000. Curable compositions (1) to (5) containing such curable polysilsesquioxane compounds have a low refractive index (nD) and are sufficiently cured at a relatively low temperature. In addition, the cured products of the curable compositions (1) to (5) have high adhesive strength.
另一方面,比較1~3分別為使用專利文獻4的實施例8~10的硬化性聚倍半矽氧烷化合物[硬化性聚倍半矽氧烷化合物(6)~(8)]者。 在專利文獻4的實施例中,為了彌補具有氟烷基的矽烷化合物的反應性低,使用酸觸媒的量較多。因此,此方法僅能獲得Z2値小的硬化性聚倍半矽氧烷化合物。此外,由於3,3,3-三氟丙基三甲氧基矽烷的導入量增加,硬化性聚倍半矽氧烷化合物的質量平均分子量低下。 由於此等原因,比較例1~3的硬化性組合物(6)~(8),在硬化性、硬化物的接著強度中,較實施例1~5的硬化性組合物(1)~(5)更差。On the other hand, Comparisons 1 to 3 are those using the curable polysilsesquioxane compounds [curable polysilsesquioxane compounds (6) to (8)] of Examples 8 to 10 of Patent Document 4, respectively. In the example of Patent Document 4, in order to compensate for the low reactivity of the silane compound having a fluoroalkyl group, a large amount of the acid catalyst is used. Therefore, this method can only obtain hardening polysilsesquioxane compounds with small Z2 values. In addition, the mass average molecular weight of the curable polysilsesquioxane compound decreased due to the increased introduction amount of 3,3,3-trifluoropropyltrimethoxysilane. For these reasons, the curable compositions (6) to (8) of Comparative Examples 1 to 3 are better than the curable compositions (1) to (8) of Examples 1 to 5 in terms of curability and adhesive strength of cured products 5) Worse.
在比較例4所得的硬化性聚倍半矽氧烷化合物(9),不具有來自3,3,3-三氟丙基三甲氧基矽烷的重複單元。因此,硬化性組合物(9)的折射率(nD)成為大的値。 此外,硬化性聚倍半矽氧烷化合物(9)由於Z2値小,硬化性組合物(9)的硬化性不足。The curable polysilsesquioxane compound (9) obtained in Comparative Example 4 did not have a repeating unit derived from 3,3,3-trifluoropropyltrimethoxysilane. Therefore, the refractive index (nD) of the curable composition (9) becomes a large value. Furthermore, since the curable polysilsesquioxane compound (9) has a small Z2 value, the curability of the curable composition (9) is insufficient.
在比較例5所得的硬化性聚倍半矽氧烷化合物(10)為分子量過大者。其結果為硬化性組合物(10),在硬化性、硬化物的接著強度中,較實施例1~5的硬化性組合物(1)~(5)更差。The curable polysilsesquioxane compound (10) obtained in Comparative Example 5 had an excessively large molecular weight. As a result, the curable composition (10) was inferior to the curable compositions (1) to (5) of Examples 1 to 5 in terms of curability and adhesive strength of cured products.
無。none.
無。none.
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