TWI871484B - Contact probe - Google Patents
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- TWI871484B TWI871484B TW110129583A TW110129583A TWI871484B TW I871484 B TWI871484 B TW I871484B TW 110129583 A TW110129583 A TW 110129583A TW 110129583 A TW110129583 A TW 110129583A TW I871484 B TWI871484 B TW I871484B
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Abstract
[課題] 提供一種接觸探針,其可將前端部確實地接觸於被測定體的檢查點,且可不削傷或劃傷被測定體之檢查點。 [解決手段] 一種接觸探針10,係具有:本體部14,其於金屬導體11的外周具有絕緣被膜12;及端部16,其形成於金屬導體11之兩端且不具有絕緣被膜12,且藉由朝軸線方向施加負載使之彎曲,獲得對被測定體20的接觸壓力以測定電氣特性,其中,端部16中之至少與被測定體20接觸之側的端部16的形狀係曲面,當將曲面的曲率半徑設為R,且將金屬導體11的直徑設為D時,R係在大於0.5D且為5D以下的範圍內。 [Topic] Provide a contact probe that can reliably contact the tip of the probe with the inspection point of the object to be measured without scratching or damaging the inspection point of the object to be measured. [Solution] A contact probe 10 comprises: a body 14 having an insulating film 12 on the outer periphery of a metal conductor 11; and end portions 16 formed at both ends of the metal conductor 11 and not having an insulating film 12, and being bent by applying a load in an axial direction to obtain a contact pressure on a measured object 20 to measure electrical characteristics, wherein the shape of at least the end portion 16 on the side in contact with the measured object 20 is a curved surface, and when the curvature radius of the curved surface is set to R and the diameter of the metal conductor 11 is set to D, R is within a range of greater than 0.5D and less than 5D.
Description
本發明係關於一種接觸探針,其使用於電子零件及基板等之電氣特性的檢查。The present invention relates to a contact probe used for inspecting the electrical characteristics of electronic components and substrates.
近年來,使用有用於智慧型手機及攜帶電話等之高密度安裝基板、或組入個人電腦等的BGA(Ball Grid Array)及CSP(Chip Size Package)等IC封裝基板等各種之電路基板。 這些電路基板於安裝前後之步驟中被進行例如直流電阻值之測定及導通檢查等,以檢查其電氣特性的良否。 In recent years, various circuit boards have been used, including high-density mounting boards for smartphones and portable phones, and IC packaging boards such as BGA (Ball Grid Array) and CSP (Chip Size Package) for personal computers. These circuit boards are tested for electrical characteristics such as DC resistance measurement and continuity testing before and after installation.
例如,如專利文獻1所示,電氣特性之良否的檢查,係使用連接於檢查裝置之檢查裝置用治具(以下,有時可稱為探針單元)進行。 具體而言,藉由使安裝於探針單元之前端的針形(pin-shape)接觸探針之前端接觸於作為測定對象的電路基板(以下,有時可稱為被測定體)的電極(以下,有時可稱為檢查點)而進行。 For example, as shown in Patent Document 1, the inspection of the quality of electrical characteristics is performed using an inspection device jig (hereinafter, sometimes referred to as a probe unit) connected to the inspection device. Specifically, the inspection is performed by making the front end of the pin-shaped contact probe mounted on the front end of the probe unit contact the electrode (hereinafter, sometimes referred to as an inspection point) of the circuit substrate (hereinafter, sometimes referred to as a measured object) as the measurement object.
於專利文獻2中,記載有接觸探針之前端部的形狀可適宜選擇半球形、圓錐形、前端具有半球形的圓錐形、前端具有平坦形狀之圓錐形中的任一種形狀。Patent document 2 states that the shape of the front end portion of the contact probe can be appropriately selected from any of a hemispherical shape, a cone shape, a cone shape with a hemispherical front end, and a cone shape with a flat front end.
於專利文獻3中,記載有接觸探針之前端部的形狀為平坦形狀者。 [先前技術文獻] [專利文獻] Patent document 3 states that the front end of the contact probe has a flat shape. [Prior art document] [Patent document]
專利文獻1:日本特開2002-131334號公報 專利文獻2:日本特開2007-322369號公報 專利文獻3:日本特開2013-024716號公報 Patent document 1: Japanese Patent Publication No. 2002-131334 Patent document 2: Japanese Patent Publication No. 2007-322369 Patent document 3: Japanese Patent Publication No. 2013-024716
[發明欲解決之課題][Problems to be solved by the invention]
誠如前述專利文獻1及專利文獻2之記載,若接觸探針之前端部的形狀為半球形,則接觸探針之前端部會自被測定體的檢查點過分滑動,以致於接觸探針之前端部不接觸檢查點,從而可能無法進行正確的檢查。As described in the aforementioned Patent Documents 1 and 2, if the front end of the contact probe is hemispherical, the front end of the contact probe may slide excessively from the inspection point of the object to be measured, so that the front end of the contact probe does not contact the inspection point, and thus a correct inspection may not be performed.
此外,如專利文獻2之記載,於接觸探針之前端部的形狀為圓錐形、前端具有半球形的圓錐形、前端具有平坦形狀的圓錐形的情況下,由於與被測定體之檢查點的接觸面積變小,因此,隨著近年來電極之狹間距化趨勢,而可能變得難以使接觸探針之前端部接觸於各檢查點進行檢查。Furthermore, as described in Patent Document 2, when the shape of the front end of the contact probe is a cone, a cone with a hemispherical front end, or a cone with a flat front end, since the contact area with the inspection point of the object to be measured becomes smaller, it may become difficult to make the front end of the contact probe contact each inspection point for inspection as the electrode spacing has been narrowing in recent years.
此外,如專利文獻3之記載,於接觸探針之前端部的形狀為平坦形狀之情況下,雖然可充分確保與被測定體之檢查點的接觸面積,但由於在接觸探針之前端部產生有直角之邊緣部,因此於該邊緣部與檢查點接觸之情況下,可能將檢查點削除或劃傷。Furthermore, as described in Patent Document 3, when the front end of the contact probe is flat, the contact area with the inspection point of the object to be measured can be sufficiently ensured, but since a right-angled edge is generated at the front end of the contact probe, the inspection point may be removed or scratched when the edge contacts the inspection point.
爰此,本發明係為了解決前述課題而完成,其目的在於提供一種接觸探針,其可將接觸探針之前端部確實地接觸於被測定體的檢查點,且可緩減對被測定體之檢查點造成的削傷或劃傷。 [用以解決課題之手段] Therefore, the present invention is completed to solve the above-mentioned problem, and its purpose is to provide a contact probe that can make the front end of the contact probe contact the inspection point of the object to be measured reliably and can reduce the damage or scratches caused to the inspection point of the object to be measured. [Means for solving the problem]
根據本發明之接觸探針,一種接觸探針,係具有:本體部,其於針狀之金屬導體的外周具有絕緣被膜;及端部,其形成於前述金屬導體之兩端且不具有前述絕緣被膜,且藉由朝軸線方向施加負載使之彎曲,獲得對被測定體的接觸壓力以測定電氣特性,其特徵在於:前述端部中之至少與被測定體接觸之側的端部的形狀係曲面,當將該曲面的曲率半徑設為R,且將前述金屬導體的直徑設為D時,R係在大於0.5D且為5D以下的範圍內。 藉由採用此構成,由於可將與被測定體接觸之端部作成大致接近平坦形狀的曲面,因此於接觸被測定體的檢查點時不會過分滑動,此外,由於邊緣部並非直角,因此可與檢查點面接觸,可保護檢查點不被削傷或劃傷。 According to the contact probe of the present invention, a contact probe comprises: a body having an insulating film on the outer periphery of a needle-shaped metal conductor; and end portions formed at both ends of the metal conductor and not having the insulating film, and being bent by applying a load in the axial direction to obtain a contact pressure on a measured object to measure electrical characteristics, wherein the shape of the end portion of at least the side in contact with the measured object is a curved surface, and when the curvature radius of the curved surface is set to R and the diameter of the metal conductor is set to D, R is within a range of greater than 0.5D and less than 5D. By adopting this structure, the end portion that contacts the object to be measured can be made into a curved surface that is roughly flat, so it will not slide excessively when contacting the inspection point of the object to be measured. In addition, since the edge is not a right angle, it can contact the inspection point surface, protecting the inspection point from being cut or scratched.
此外,其特徵在於:前述曲率半徑R也可為D以上。In addition, the feature is that the aforementioned curvature radius R can also be greater than D.
此外,其特徵在於:前述金屬導體之直徑,也可為8μm以上且為180μm以下。 [發明之效果] In addition, the invention is characterized in that the diameter of the metal conductor can be greater than 8 μm and less than 180 μm. [Effect of the invention]
根據本發明,可提供一種可確實地接觸被測定體的檢查點,且不會削傷或劃傷被測定體之檢查點的接觸探針。According to the present invention, a contact probe can be provided which can reliably contact the inspection point of the object to be measured without cutting or scratching the inspection point of the object to be measured.
[用以實施發明的形態][Form used to implement the invention]
以下,根據圖式對本發明之接觸探針之實施形態詳細地進行說明。 圖1為接觸探針之示意俯視圖,圖2為使用接觸探針執行被測定體之電氣特性等檢查時的說明圖。 The following is a detailed description of the implementation form of the contact probe of the present invention based on the drawings. Figure 1 is a schematic top view of the contact probe, and Figure 2 is an explanatory diagram of using the contact probe to perform an inspection of the electrical characteristics of the object to be measured.
接觸探針10,係由截面圓形的極細之圓柱狀(針狀)的金屬導體11構成,且具有本體部14,該具有本體部14係於金屬導體11之外周具有絕緣被膜12。於金屬導體11之兩端形成有不具絕緣被膜12之端部16。 接觸探針10係以藉由朝軸線方向施加負載使之彎曲,獲得對被測定體的接觸壓力以檢查電氣特性之方式構成。 The contact probe 10 is composed of a very fine cylindrical (needle-shaped) metal conductor 11 with a circular cross section, and has a body 14 having an insulating film 12 on the outer periphery of the metal conductor 11. Ends 16 without the insulating film 12 are formed at both ends of the metal conductor 11. The contact probe 10 is constructed in such a way that a load is applied in the axial direction to bend it to obtain a contact pressure on the object to be measured to check the electrical characteristics.
(使用接觸探針之電氣特性的檢查方法) 根據圖2對接觸探針之使用態樣進行說明。 在此所示的例中,將IC封裝基板等作為被測定體20,將形成於被測定體20之表面的複數個電極作為檢查點22,且使接觸探針10之端部16接觸於該檢查點22。 (Inspection method of electrical characteristics using contact probe) The use of the contact probe is described based on FIG. 2. In the example shown here, an IC package substrate or the like is used as the object to be measured 20, a plurality of electrodes formed on the surface of the object to be measured 20 are used as inspection points 22, and the end 16 of the contact probe 10 is brought into contact with the inspection points 22.
檢查用之治具即探針單元30,具有複數個接觸探針10。 探針單元30具有保持複數個接觸探針10之上端部的上板32、及導引接觸探針10之下端部的下板,上板32與下板34之間係藉由支撐柱36支撐。 於下板34形成有孔徑略大於接觸探針10之下端部的導引孔,接觸探針10之下端部可於導引孔內沿軸向移動。 此外,於上板32配置有與複數個接觸探針10之各上端部電性連接的複數條引線37。複數條引線37連接於測定機(未圖示)或電源(未圖示)。 The jig for inspection, i.e., the probe unit 30, has a plurality of contact probes 10. The probe unit 30 has an upper plate 32 for holding the upper ends of the plurality of contact probes 10, and a lower plate for guiding the lower ends of the contact probes 10, and the upper plate 32 and the lower plate 34 are supported by support columns 36. A guide hole having a diameter slightly larger than the lower end of the contact probe 10 is formed on the lower plate 34, and the lower end of the contact probe 10 can move axially in the guide hole. In addition, a plurality of leads 37 electrically connected to each upper end of the plurality of contact probes 10 are arranged on the upper plate 32. The plurality of leads 37 are connected to a measuring machine (not shown) or a power source (not shown).
如圖2之右圖所示,於被測定體20之上方,以各接觸探針10之下端部與被測定體20之各檢查點22的位置對向之方式配置探針單元30。 並且,以使各接觸探針10之下端部接觸被測定體20之各檢查點22之方式使探針單元30下降,並且,如圖2之右圖所示,自上方朝下方對探針單元30進行加壓。 於是,沿著接觸探針10之軸線方向施加負載而使接觸探針10彎曲。此時,接觸探針10之端部16,係以因接觸探針10彎曲而產生的彈性力所形成之既定接觸壓力與檢查點22接觸。 As shown in the right figure of FIG. 2 , the probe unit 30 is arranged above the object 20 to be measured so that the lower end of each contact probe 10 is opposite to the position of each inspection point 22 of the object 20 to be measured. Furthermore, the probe unit 30 is lowered so that the lower end of each contact probe 10 contacts the inspection point 22 of the object 20 to be measured, and, as shown in the right figure of FIG. 2 , the probe unit 30 is pressurized from the top to the bottom. Thus, a load is applied along the axial direction of the contact probe 10 to bend the contact probe 10. At this time, the end 16 of the contact probe 10 contacts the inspection point 22 with a predetermined contact pressure formed by the elastic force generated by the bending of the contact probe 10.
(金屬導體) 作為金屬導體11,採用具有高導電性及高彈性模量的金屬線(也稱為金屬彈簧線)。作為使用於金屬導體11之金屬材料,可適宜地使用鎢、錸鎢、鈹銅等銅合金、鈀合金、銅銀合金等。 (Metal conductor) As the metal conductor 11, a metal wire (also called a metal spring wire) having high electrical conductivity and high elastic modulus is used. As the metal material used for the metal conductor 11, copper alloys such as tungsten, tungsten rhodium, and benzene copper, palladium alloys, and copper-silver alloys can be appropriately used.
為了抑制金屬導體11與被測定體20之檢查點22或檢測裝置的引線37之接觸電阻值的上升,也可根據需要於金屬導體11之前述金屬材料表面設置鍍敷層。作為形成鍍敷層的金屬,可列舉鎳、金、銠等金屬及金合金等合金。鍍敷層可為單層或多層。作為多層的鍍敷層,較佳為例如於鎳鍍敷層上形成有鍍金層者。鍍敷層之厚度並無特別限制,例如可設定為1μm以上且為5μm以下。In order to suppress the increase in the contact resistance value between the metal conductor 11 and the inspection point 22 of the object to be measured 20 or the lead 37 of the detection device, a plating layer can be provided on the surface of the aforementioned metal material of the metal conductor 11 as needed. Examples of metals forming the plating layer include metals such as nickel, gold, and rhodium, and alloys such as gold alloys. The plating layer can be a single layer or multiple layers. As a multi-layer plating layer, it is preferred that a gold plating layer is formed on a nickel plating layer. There is no particular limitation on the thickness of the plating layer, and for example, it can be set to be greater than 1 μm and less than 5 μm.
根據近年來的狹間距化要求而趨向於細徑化,本實施形態之金屬導體11之導體直徑,可適宜地使用8μm以上且為180μm以下者。並且較佳為,可使用導體直徑為10μm以上且為110μm以下的範圍內者。 金屬導體11係以成為既定直徑之針形導體的方式藉由冷延伸或熱延伸等塑性加工所製造。 In recent years, the metal conductor 11 has a tendency to be finer in diameter due to the demand for narrower pitch. The conductor diameter of the metal conductor 11 of this embodiment can be preferably 8 μm or more and 180 μm or less. Preferably, the conductor diameter can be within the range of 10 μm or more and 110 μm or less. The metal conductor 11 is manufactured by plastic working such as cold stretching or hot stretching to become a needle-shaped conductor of a predetermined diameter.
再者,為了容易將接觸探針10安裝於探針單元30,且不會卡絆於探針單元30之下板34的導引孔內,而不妨礙接觸探針10之運動,較佳為採用直線度高之金屬導體11,具體而言,較佳為,直線度係曲率半徑1000mm以上。 直線度高之金屬導體11,係藉由對設置絕緣被膜12之前的細長金屬線進行直線矯正處理而獲得。直線矯正處理,例如藉由轉模(rotary die)式直線矯正裝置等進行。 Furthermore, in order to easily install the contact probe 10 on the probe unit 30 and prevent it from getting stuck in the guide hole of the lower plate 34 of the probe unit 30 and hindering the movement of the contact probe 10, it is preferred to use a metal conductor 11 with high straightness. Specifically, it is preferred that the straightness is a curvature radius of 1000 mm or more. The metal conductor 11 with high straightness is obtained by performing a straightness correction process on the thin and long metal wire before the insulating film 12 is provided. The straightness correction process is performed, for example, by a rotary die type straightness correction device.
(端部) 金屬導體11之兩端部中的一端部16接觸於被測定體20之檢查點22。 如圖3所示,本實施形態之接觸探針10,係將至少金屬導體11之兩端部中的與被測定體20之檢查點22接觸的端部16的形狀作成曲面。 此外,於將該曲面的曲率半徑設為R,且將金屬導體11之直徑設為D時,可適宜採用R大於0.5D且為5D以下(以下,有時可表現為0.5D<R≦5D)的構成。 惟,作成如上述之條件的曲面,不僅僅於一端部16,而且還可將兩端部形成為如上述之條件的曲面。 (End) One end 16 of the two ends of the metal conductor 11 contacts the inspection point 22 of the object 20 to be measured. As shown in FIG3 , the contact probe 10 of the present embodiment is a contact probe 10 in which at least the shape of the end 16 of the two ends of the metal conductor 11 that contacts the inspection point 22 of the object 20 to be measured is formed into a curved surface. In addition, when the radius of curvature of the curved surface is set to R and the diameter of the metal conductor 11 is set to D, a configuration in which R is greater than 0.5D and less than 5D (hereinafter, it may be expressed as 0.5D<R≦5D) can be appropriately adopted. However, in order to form a curved surface under the above conditions, not only one end 16 but also both ends can be formed into curved surfaces under the above conditions.
藉由將端部16之曲面的曲率半徑R設為0.5D<R≦5D,可將與被測定體20之檢查點22接觸的端部16形成為大致接近平坦形狀的曲面。 因此,當使端部16與被測定體20之檢查點22接觸時不會過分滑動。此外,由於端部16之邊緣部非直角,因此可相對於檢查點22進行面接觸,可抑制削傷或劃傷檢查點22。並且,可充分地確保與檢查點22之接觸面積。 By setting the curvature radius R of the curved surface of the end portion 16 to 0.5D<R≦5D, the end portion 16 that contacts the check point 22 of the measured object 20 can be formed into a curved surface that is approximately close to a flat shape. Therefore, when the end portion 16 contacts the check point 22 of the measured object 20, it will not slide excessively. In addition, since the edge of the end portion 16 is not a right angle, it can make surface contact with the check point 22, which can suppress the cutting or scratching of the check point 22. In addition, the contact area with the check point 22 can be fully ensured.
如上述,若將金屬導體11之直徑設為8μm以上且為180μm以下,則例如於D=8μm的情況下,端部16的曲率半徑R在4μm<R≦40μm的範圍內,於D=180μm的情況下,端部16的曲率半徑R在90μm<R≦900μm的範圍內。As mentioned above, if the diameter of the metal conductor 11 is set to be greater than 8μm and less than 180μm, then, for example, when D=8μm, the curvature radius R of the end 16 is in the range of 4μm<R≦40μm, and when D=180μm, the curvature radius R of the end 16 is in the range of 90μm<R≦900μm.
此外,如圖4所示,本實施形態之接觸探針10,可適宜於配置在被測定體20之2個檢查點22之中間的情況下使用。再者,雖然於圖4中圖示了半球形的檢查點22,但檢查點22之形狀不限於如上述的形狀。 於此情況下,端部不會相對於半球形的檢查點22過分滑動,並且可充分確保與檢查點22之接觸面積。此外,由於端部16的邊緣部非直角,因此可與檢查點22面接觸而不會將2個檢查點22削傷或劃傷。 In addition, as shown in FIG. 4 , the contact probe 10 of this embodiment can be used when it is arranged between two inspection points 22 of the object 20 to be measured. Furthermore, although a hemispherical inspection point 22 is illustrated in FIG. 4 , the shape of the inspection point 22 is not limited to the above-mentioned shape. In this case, the end portion will not slide excessively relative to the hemispherical inspection point 22, and the contact area with the inspection point 22 can be fully ensured. In addition, since the edge of the end portion 16 is not a right angle, it can contact the inspection point 22 surface without cutting or scratching the two inspection points 22.
作為將金屬導體11之端部16形成為前述形狀的方法,係藉由對金屬導體11之端部16進行研磨加工而進行。 研磨加工可藉由使用研磨砂紙、或使用鑽石砂輪而進行。此外,也可使用可研磨針形之金屬材料的公知研磨加工機。 As a method of forming the end 16 of the metal conductor 11 into the aforementioned shape, the end 16 of the metal conductor 11 is ground. The grinding process can be performed by using abrasive paper or a diamond grinding wheel. In addition, a known grinding machine that can grind needle-shaped metal materials can also be used.
(絕緣被膜) 絕緣被膜12只要為具有絕緣性的被膜,則對其材料並無特別限制,但可適宜使用選自聚胺基甲酸酯樹脂、尼龍樹脂、聚酯樹脂、環氧樹脂、聚酯醯亞胺樹脂、聚醯胺樹脂、聚醯胺醯亞胺樹脂等中的1種或2種以上的樹脂材料。 此外,由這些樹脂構成的絕緣被膜12,其耐熱性係根據樹脂的種類而變化,因此可考慮在被測定體20之檢查時產生的熱或周圍環境溫度而任意選擇。 (Insulating film) The insulating film 12 is not particularly limited in material as long as it is an insulating film, but one or more resin materials selected from polyurethane resin, nylon resin, polyester resin, epoxy resin, polyesterimide resin, polyamide resin, polyamideimide resin, etc. can be used appropriately. In addition, the heat resistance of the insulating film 12 composed of these resins varies depending on the type of resin, so it can be arbitrarily selected in consideration of the heat generated during the inspection of the measured body 20 or the ambient temperature.
絕緣被膜12之厚度,只要為可確保電氣絕緣性之程度的厚度即可,可考慮與金屬導體11之直徑的關係,於1μm以上且為30μm以下的範圍內適宜地設定。 較佳為,絕緣被膜12,係作為烤漆被膜形成於金屬導體11。由於烤漆被膜係藉由反復之塗料塗佈與烘烤的連續步驟而形成,因此生產性良好,與金屬導體11之間的密接性高,且可進一步提高被膜強度。 The thickness of the insulating film 12 can be set appropriately within a range of 1 μm to 30 μm, as long as it can ensure electrical insulation, in consideration of the relationship with the diameter of the metal conductor 11. Preferably, the insulating film 12 is formed on the metal conductor 11 as a baking varnish film. Since the baking varnish film is formed by repeated coating and baking steps, it has good productivity, high adhesion to the metal conductor 11, and can further improve the film strength.
再者,於本實施形態中,形成有自金屬導體11之各個端部16除去既定長度的絕緣被膜12之區域。除去絕緣被膜12之區域的長度,可根據探針單元30之構造等適宜地設定。Furthermore, in the present embodiment, a region where the insulating film 12 is removed by a predetermined length is formed from each end portion 16 of the metal conductor 11. The length of the region where the insulating film 12 is removed can be appropriately set according to the structure of the probe unit 30 and the like.
(實施例) 於以下的實施例中,作為金屬導體11,係使用細長之錸鎢線(外徑D:0.025mm)。 絕緣被膜12係設為2層構造,第1絕緣被膜,係使用胺基甲酸乙酯樹脂系烤漆塗料作為第1絕緣被膜用塗料,且以1μm的厚度形成第1絕緣被膜。第2絕緣被膜,係使用與第1絕緣被膜相同的烤漆塗料,作為相對於該烤漆塗料100重量份含有顏料(BASF Japan Ltd.製,商品名稱:Irgazin(註冊商標))4重量份的第2絕緣被膜用烤漆塗料,以2.5μm的厚度形成第2絕緣被膜。 (Example) In the following example, a thin and long tungsten rhodium wire (outer diameter D: 0.025 mm) is used as the metal conductor 11. The insulating film 12 is set to a two-layer structure, and the first insulating film uses a urethane resin-based baking varnish as a coating for the first insulating film, and the first insulating film is formed with a thickness of 1 μm. The second insulating film is formed by using the same baking varnish as the first insulating film, and containing 4 parts by weight of pigment (manufactured by BASF Japan Ltd., trade name: Irgazin (registered trademark)) relative to 100 parts by weight of the baking varnish to form the second insulating film with a thickness of 2.5 μm.
使用標準切割機對形成有絕緣被膜12(總厚約為3.5μm)之細長接觸探針進行切割,切割出長度為10mm的附有絕緣被膜的接觸探針,且對附有該絕緣被膜的接觸探針之兩端部的既定長度進行雷射剝離,製作成由圖1所示之態樣構成的接觸探針10。 當藉由研磨加工裝置對金屬導體11進行加工時,藉由適宜調整研磨角度及時間等而調整端部16的形狀。 A standard cutting machine is used to cut a thin and long contact probe with an insulating film 12 (total thickness of about 3.5 μm) to cut a contact probe with an insulating film of 10 mm in length, and a predetermined length of both ends of the contact probe with the insulating film is laser stripped to produce a contact probe 10 having the configuration shown in FIG. 1. When the metal conductor 11 is processed by a grinding processing device, the shape of the end 16 is adjusted by appropriately adjusting the grinding angle and time, etc.
並且,於將絕緣被膜12剝離而露出的金屬導體11之表面,藉由鍍敷設置厚度為1μm的鎳鍍敷層後,再於其上面設置厚度為0.2μm的金鍍敷層,形成總厚度為1.2μm的鍍敷層。Furthermore, a nickel plating layer with a thickness of 1 μm is formed on the surface of the metal conductor 11 exposed by peeling off the insulating film 12, and then a gold plating layer with a thickness of 0.2 μm is formed thereon, so that a plating layer with a total thickness of 1.2 μm is formed.
圖5顯示於變更了前述實施例之接觸探針10之端部16的曲面之曲率半徑R的情況下之、進行了端部16的相對於檢查點22的滑動、檢查點22之損傷之評價後的結果。再者,於本實施例中,金屬導體11之直徑D恆定。 再者,對作為比較例1之端部的曲率半徑R為0.5D的情況、作為比較例2之端部為平坦形狀的情況、及作為比較例3之端部為銳角的情況進行了評價。 FIG5 shows the result of evaluating the sliding of the end 16 relative to the inspection point 22 and the damage of the inspection point 22 when the curvature radius R of the curved surface of the end 16 of the contact probe 10 of the aforementioned embodiment is changed. Furthermore, in this embodiment, the diameter D of the metal conductor 11 is constant. Furthermore, the evaluation was performed for the case where the curvature radius R of the end as Comparative Example 1 is 0.5D, the case where the end as Comparative Example 2 is a flat shape, and the case where the end as Comparative Example 3 is a sharp angle.
順帶言之,圖6圖示有圖5之實施例及比較例中之接觸探針10的端部形狀的概略。 圖6A中,端部為曲面。 圖6B中,端部為平坦形狀。 圖6C中,端部為銳角。 Incidentally, FIG6 schematically illustrates the shape of the end of the contact probe 10 in the embodiment and the comparative example of FIG5. In FIG6A, the end is a curved surface. In FIG6B, the end is a flat shape. In FIG6C, the end is a sharp angle.
滑動評價的方法,對接觸探針10之端部16與被測定體20進行了10000次接觸試驗,其中,對於產生滑動之次數為9次以下之情況採用評價A,對於產生滑動之次數為10次以上且為99次以下之情況採用評價B,對於產生滑動之次數為100次以上之情況採用評價C。The sliding evaluation method is to conduct a contact test of 10,000 times between the end 16 of the contact probe 10 and the measured object 20. Among them, if the number of sliding times is less than 9 times, evaluation A is adopted, if the number of sliding times is more than 10 times and less than 99 times, evaluation B is adopted, and if the number of sliding times is more than 100 times, evaluation C is adopted.
損傷評價方法,對接觸探針10之端部16與被測定體20進行了10000次接觸試驗,其中,對於無損傷的情況採用評價A,對於具有損傷的情況採用評價B。The damage evaluation method is to conduct a contact test of 10,000 times between the end 16 of the contact probe 10 and the object 20 to be measured, wherein the evaluation A is adopted for the case of no damage, and the evaluation B is adopted for the case of damage.
以下,對各實施例進行說明。 實施例1之端部,R=5D,對應模型為圖6A。實施例1之滑動評價為A,損傷評價為A。 Each embodiment is described below. The end of embodiment 1, R=5D, the corresponding model is Figure 6A. The sliding evaluation of embodiment 1 is A, and the damage evaluation is A.
實施例2之端部,R=4D,對應模型為圖6A。實施例2之滑動評價為A,損傷評價為A。The end of Example 2, R=4D, the corresponding model is Figure 6A. The sliding evaluation of Example 2 is A, and the damage evaluation is A.
實施例3之端部,R=3D,對應模型為圖6A。實施例3之滑動評價為A,損傷評價為A。The end of Example 3, R=3D, the corresponding model is Figure 6A. The sliding evaluation of Example 3 is A, and the damage evaluation is A.
實施例4之端部,R=2D,對應模型為圖6A。實施例4之滑動評價為A,損傷評價為A。The end of Example 4, R=2D, the corresponding model is Figure 6A. The sliding evaluation of Example 4 is A, and the damage evaluation is A.
實施例5之端部,R=1.5D,對應模型為圖6A。實施例5之滑動評價為A,損傷評價為A。The end of Example 5, R=1.5D, the corresponding model is Figure 6A. The sliding evaluation of Example 5 is A, and the damage evaluation is A.
實施例6之端部,R=D,對應模型為圖6A。實施例6之滑動評價為A,損傷評價為A。The end of Example 6, R=D, the corresponding model is Figure 6A. The sliding evaluation of Example 6 is A, and the damage evaluation is A.
實施例7之端部,R=0.9D,對應模型為圖6A。實施例7之滑動評價為B,損傷評價為A。The end of Example 7 has R=0.9D, and the corresponding model is Figure 6A. The sliding evaluation of Example 7 is B, and the damage evaluation is A.
實施例8之端部,R=0.7D,對應模型為圖6A。實施例8之滑動評價為B,損傷評價為A。The end of Example 8, R=0.7D, the corresponding model is Figure 6A. The sliding evaluation of Example 8 is B, and the damage evaluation is A.
再者,比較例1之端部,R=0.5D,形狀雖然與實施例1〜實施例8相同,但曲率半徑形成為大於實施例1〜8。比較例1之滑動評價為C,損傷評價為A。Furthermore, the end portion of Comparative Example 1, R=0.5D, has the same shape as that of Examples 1 to 8, but the radius of curvature is larger than that of Examples 1 to 8. The sliding evaluation of Comparative Example 1 is C, and the damage evaluation is A.
比較例2之端部係平坦形狀,對應模型為圖6B。比較例2之滑動評價為A,損傷評價為B。The end of Comparative Example 2 is flat, and the corresponding model is Figure 6B. The sliding evaluation of Comparative Example 2 is A, and the damage evaluation is B.
比較例3之端部係前端尖銳的銳角,對應模型為圖6C。比較例3之滑動評價為A,損傷評價為B。The tip of Comparative Example 3 is a sharp corner at the front end, and the corresponding model is Figure 6C. The sliding evaluation of Comparative Example 3 is A, and the damage evaluation is B.
由圖5之結果判明,於如比較例1那樣接觸探針10之端部為曲面,且其曲率半徑R為R≦0.5D之情況下容易滑動,因此滑動評價變差。 此外,若如比較例2那樣接觸探針之端部為平坦形狀,雖然滑動評價無問題,但會出現損傷。 並且,若如比較例3那樣接觸探針之端部為銳角,雖然滑動評價無問題,但會出現損傷。 因此,可以判明於接觸探針10之端部為曲面,且其曲率半徑R為0.5D<R≦5D之情況下,變得不易滑動,且也不會損傷,故而較佳。 From the results of FIG. 5 , it is clear that when the end of the contact probe 10 is a curved surface and the curvature radius R is R≦0.5D as in Comparative Example 1, it is easy to slide, so the sliding evaluation becomes poor. In addition, if the end of the contact probe is flat as in Comparative Example 2, although there is no problem with the sliding evaluation, damage will occur. Furthermore, if the end of the contact probe is sharp as in Comparative Example 3, although there is no problem with the sliding evaluation, damage will occur. Therefore, it can be determined that when the end of the contact probe 10 is a curved surface and the curvature radius R is 0.5D<R≦5D, it becomes difficult to slide and will not be damaged, so it is better.
再者,實施例1〜6的滑動評價及損傷評價雙方皆為A。因此,如實施例1〜6所示,還判明D≦R≦5D之R的範圍更優異。Furthermore, both the sliding evaluation and the damage evaluation of Examples 1 to 6 were A. Therefore, as shown in Examples 1 to 6, it was also found that the range of R of D≦R≦5D was more excellent.
10:接觸探針 11:金屬導體 12:絕緣被膜 14:本體部 16:端部 20:被測定體 22:檢查點 30:探針單元 32:上板 34:下板 36:支撐柱 37:引線 10: Contact probe 11: Metal conductor 12: Insulation coating 14: Main body 16: End 20: Measured object 22: Inspection point 30: Probe unit 32: Upper plate 34: Lower plate 36: Support column 37: Lead wire
圖1為接觸探針之示意俯視圖。 圖2為顯示接觸探針之使用態樣的說明圖。 圖3為接觸探針之端部的放大圖。 圖4為顯示接觸探針之端部接觸於2個檢查點時的說明圖。 圖5為將變更端部之形狀且實施滑動試驗及損傷試驗的情況下之結果匯總後的表。 圖6A〜圖6C為顯示於圖5之表中對應的端部形狀的說明圖。 FIG1 is a schematic top view of the contact probe. FIG2 is an explanatory diagram showing the use of the contact probe. FIG3 is an enlarged view of the end of the contact probe. FIG4 is an explanatory diagram showing the end of the contact probe in contact with two inspection points. FIG5 is a table summarizing the results of the sliding test and the damage test when the shape of the end is changed. FIG6A to FIG6C are explanatory diagrams of the corresponding end shapes shown in the table of FIG5.
16:端部 16: End
D:金屬導體的直徑 D: Diameter of metal conductor
R:曲率半徑 R: Radius of curvature
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JP2020-168338 | 2020-10-05 | ||
JP2020168338A JP2022060711A (en) | 2020-10-05 | 2020-10-05 | Contact probe |
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