TWI849200B - Optical layered body and display device using the same - Google Patents
Optical layered body and display device using the same Download PDFInfo
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- TWI849200B TWI849200B TW109128087A TW109128087A TWI849200B TW I849200 B TWI849200 B TW I849200B TW 109128087 A TW109128087 A TW 109128087A TW 109128087 A TW109128087 A TW 109128087A TW I849200 B TWI849200 B TW I849200B
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- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
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- B32B7/023—Optical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
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- G—PHYSICS
- G02—OPTICS
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G—PHYSICS
- G02—OPTICS
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- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
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Abstract
Description
本發明係關於光學積層體及使用該光學積層體的顯示裝置。 The present invention relates to an optical multilayer body and a display device using the optical multilayer body.
近年來,隨著液晶顯示裝置之急速普及,智慧型手機或車用用途等在陽光之強外光下使用的情形增加。在如此陽光之強外光下係在戴上具有偏光特性之太陽眼鏡(偏光太陽眼鏡)之狀態下使用,透過偏光太陽眼鏡視覺確認液晶顯示裝置時,會因視覺確認方向不同液晶顯示裝置會變暗,視覺確認性會顯著降低。 In recent years, with the rapid popularization of liquid crystal display devices, the use of smart phones or car applications under strong sunlight has increased. When using such strong sunlight, wearing sunglasses with polarized characteristics (polarized sunglasses), when visually confirming the liquid crystal display device through polarized sunglasses, the liquid crystal display device will become darker due to different visual confirmation directions, and visual confirmation will be significantly reduced.
專利文獻1記載有一種視覺確認性改善方法,係使用白色發光二極體作為液晶顯示裝置之背光,並在偏光片之視覺確認者側,將具有3000至30000nm之延遲之高分子膜以偏光片吸收軸與高分子膜慢軸的夾角成為約45°之方式配置使用。根據專利文獻1之視覺確認性改善方法可改善通過偏光太陽眼鏡觀察畫面時之視覺確認性。但是,使用如此位相差值之高的高分子膜時,在長時間放置於高溫環境下時,液晶顯示裝置黑顯示時的正面輝度會上升,在不戴上偏光太陽眼鏡視覺確認畫面時,視覺確認性會降低。
[先前技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
專利文獻1:日本特開2011-215646號公報。 Patent document 1: Japanese Patent Publication No. 2011-215646.
本發明之目的為提供解決上述課題,係關於一種光學積層體,即使在放置於高溫環境下後,無論是否存在偏光太陽眼鏡,其皆可具有視覺確認性良好。 The purpose of the present invention is to provide a solution to the above-mentioned problem, which is about an optical layered body that can have good visual confirmation even after being placed in a high temperature environment, regardless of the presence of polarized sunglasses.
本發明者努力檢討之結果發現,在液晶顯示裝置之視覺確認側表面所使用偏光板表面經介黏著劑將具有3000至30000nm之位相差值之高分子膜(以下僅稱為「高位相差膜」)以偏光片之吸收軸與高分子膜之慢軸的夾角成為約45°之方式貼合的液晶顯示裝置在高溫環境下長時間放置時,液晶顯示裝置黑顯示時之正面輝度會上升,認為其理由如下。 As a result of diligent research, the inventors of the present invention have found that when a liquid crystal display device in which a polymer film with a phase difference value of 3000 to 30000nm (hereinafter referred to as "high phase difference film") is bonded to the surface of the polarizing plate used on the visual confirmation side of the liquid crystal display device via an adhesive in such a way that the angle between the absorption axis of the polarizing plate and the slow axis of the polymer film is about 45° is placed in a high temperature environment for a long time, the front brightness of the liquid crystal display device in black display will increase. The reason is believed to be as follows.
高位相差膜是在高溫以高延伸倍率延伸,並在殘留應力下冷卻而製造。若將如此高位相差膜傾斜貼合之偏光板長時間保存於高溫環境下,則高位相差膜之斜方向殘留應力會釋放。推測該斜方向應力也會施加於偏光板之保護膜,尤其配置於偏光片與液晶顯示裝置之間之保護膜,會相對於偏光片之吸收軸產生具有傾斜光軸之位相差,而會產生漏光。 High phase difference film is made by stretching at high temperature and high stretching ratio, and cooling under residual stress. If the polarizing plate with such high phase difference film is stored in a high temperature environment for a long time, the oblique residual stress of the high phase difference film will be released. It is speculated that the oblique stress will also be applied to the protective film of the polarizing plate, especially the protective film arranged between the polarizer and the liquid crystal display device, which will produce a phase difference with an oblique optical axis relative to the absorption axis of the polarizer, and will cause light leakage.
根據上述推測而發現若於液晶裝置側之保護膜使用光彈性模數低且為特定值者,則可解決上述課題,從而完成本發明。推測光彈性模數低之保護膜不易產生具有傾斜光軸之位相差者。 Based on the above speculation, it is found that if the protective film on the liquid crystal device side has a low photoelastic modulus and a specific value, the above problem can be solved, thereby completing the present invention. It is speculated that a protective film with a low photoelastic modulus is less likely to produce a phase difference with a tilted optical axis.
本發明係提供以下所例示光學積層體及使用該光學積層體的顯示裝置。 The present invention provides the optical multilayer body exemplified below and a display device using the optical multilayer body.
[1]一種光學積層,係依序具備偏光板及高位相差膜,前述偏光板係具有偏光片、及積層於前述偏光片之與前述高位相差膜側為相反側的面之保護膜,前述高位相差膜之面內位相差值為3000至30000nm,前述高位相差膜之慢軸與前述偏光片之吸收軸的夾角角度為40°至50°,前述保護膜之光彈性係數的絕對值為8×10-12Pa-1以下。 [1] An optical stack comprises a polarizing plate and a high retardation film in sequence, wherein the polarizing plate comprises a polarizer and a protective film laminated on the surface of the polarizer opposite to the high retardation film, the in-plane retardation value of the high retardation film is 3000 to 30000 nm, the angle between the slow axis of the high retardation film and the absorption axis of the polarizer is 40° to 50°, and the absolute value of the photoelastic coefficient of the protective film is less than 8×10 -12 Pa -1 .
[2]如[1]所述之光學積層體,其中前述保護膜係含有選自由(甲基)丙烯酸系樹脂、聚苯乙烯系樹脂、及順丁烯二醯亞胺系樹脂所構成之群組中之至少一種。 [2] The optical laminate as described in [1], wherein the protective film contains at least one selected from the group consisting of (meth)acrylic resin, polystyrene resin, and butylene diimide resin.
[3]如[1]所述之光學積層體,其中前述保護膜係含有環狀烯烴系樹脂。 [3] The optical layered structure as described in [1], wherein the protective film contains a cyclic olefin resin.
[4]如[1]至[3]中任一項所述之光學積層體,其中前述保護膜之面內位相差值為10nm以下。 [4] An optical multilayer as described in any one of [1] to [3], wherein the in-plane phase difference of the protective film is less than 10 nm.
[5]如[1]至[3]中任一項所述之光學積層體,其中前述保護膜之面內位相差值為50nm至300nm。 [5] An optical multilayer as described in any one of [1] to [3], wherein the in-plane phase difference of the protective film is 50nm to 300nm.
[6]如[1]至[5]中任一項所述之光學積層體,其中前述高位相差膜之厚度為200μm以下。 [6] An optical multilayer as described in any one of [1] to [5], wherein the thickness of the high phase difference film is less than 200 μm.
[7]如[1]至[6]中任一項所述之光學積層體,其中前述高位相差膜與前述偏光板係經介黏著劑層而積層。 [7] An optical laminate as described in any one of [1] to [6], wherein the high phase difference film and the polarizing plate are laminated via an adhesive layer.
[8]一種顯示裝置,係於顯示元件積層有[1]至[7]中任一項所述之光學積層體。 [8] A display device having an optical multilayer body as described in any one of [1] to [7] stacked on a display element.
根據本發明係關於可提供一種光學積層體,即使在放置於高溫環境下後,無論是否存在偏光太陽眼鏡,其皆可具有視覺確認性良好。 According to the present invention, an optical laminate can be provided, which can have good visual confirmation even after being placed in a high temperature environment, regardless of the presence of polarized sunglasses.
1:偏光板 1: Polarizing plate
4:前面板 4:Front panel
10:偏光片 10: Polarizer
11:第1保護膜 11: 1st protective film
12:第2保護膜 12: Second protective film
13:高位相差膜 13: High phase difference film
14、15、16:黏著劑層 14, 15, 16: Adhesive layer
100:光學積層體 100: Optical multilayers
圖1係表示光學積層體之層構成的概略剖面圖一例。 Figure 1 is an example of a schematic cross-sectional view showing the layer structure of an optical laminate.
圖2係表示積層前面板之光學積層體之層構成的概略剖面圖一例。 Figure 2 is an example of a schematic cross-sectional view showing the layer structure of the optical laminate of the laminate front panel.
(用語及記號之定義) (Definition of terms and symbols)
本說明書中的用語及記號定義如下。 The definitions of terms and symbols in this manual are as follows.
(1)折射率(nx、ny、nz) (1) Refractive index (nx, ny, nz)
「nx」為面內折射率最大之方向(亦即慢軸方向)之折射率,「ny」為在面內與慢軸直交之方向之折射率,「nz」為厚度方向之折射率。 "nx" is the refractive index in the direction with the largest refractive index in the plane (i.e. the slow axis direction), "ny" is the refractive index in the direction orthogonal to the slow axis in the plane, and "nz" is the refractive index in the thickness direction.
(2)面內位相差值 (2) In-plane phase difference
面內位相差值(Re[λ])為在23℃,波長λ(nm)中膜面內的位相差值。Re[λ]為以膜厚度為d(nm)時以Re[λ]=(nx-ny)×d所求。 The in-plane phase difference (Re[λ]) is the phase difference in the film plane at 23°C and wavelength λ (nm). Re[λ] is obtained by Re[λ]=(nx-ny)×d when the film thickness is d (nm).
(3)厚度方向之位相差值 (3) Phase difference in thickness direction
厚度方向之位相差值(Rth[λ])為在23℃、波長λ(nm)中膜厚度方向之位相差值。Rth[λ]為以膜厚度為d(nm)時以Rth[λ]=((nx+ny)/2-nz)×d所求。 The phase difference in the thickness direction (Rth[λ]) is the phase difference in the film thickness direction at 23°C and wavelength λ(nm). Rth[λ] is obtained by Rth[λ]=((nx+ny)/2-nz)×d when the film thickness is d(nm).
<光學積層體> <Optical layered structure>
本發明之光學積層體係依序具備偏光板及高位相差膜。構成偏光板之偏光片與保護膜例如可經介接著層而積層。接著層可舉例如後述黏著劑層或接著劑層。 The optical laminate of the present invention sequentially comprises a polarizing plate and a high phase difference film. The polarizer and the protective film constituting the polarizing plate can be laminated via a bonding layer, for example. The bonding layer can be, for example, an adhesive layer or a bonding agent layer described later.
以下參照圖1說明本發明之光學積層體之層構成一例。又,圖1中未表示用以貼合偏光片10與保護膜11、12之接著層。圖1所示光學積層體100係具有以下層構成:偏光板1係於偏光片10一面積層第1保護膜11並於偏光片10另一面積層第2保護膜12,該偏光板1與高位相差膜13係經介黏著劑層14而積層。又,光學積層體100在第1保護膜11中與偏光片10為相反側的面具有黏著劑層15。黏著劑層15可為用以貼合於顯示元件等之黏著劑層。
An example of the layer structure of the optical laminate of the present invention is described below with reference to FIG1. In addition, FIG1 does not show the bonding layer for bonding the
<偏光板> <Polarizing plate>
本發明中偏光板是指具有偏光片及至少1片保護膜之積層體。偏光板所具備保護膜可具有後述硬塗層、抗反射層、防靜電層等表面處理層。偏光片與保護膜例如可透過接著劑層或黏著劑層而積層。以下說明偏光板所具備構件。 In the present invention, the polarizing plate refers to a laminate having a polarizer and at least one protective film. The protective film of the polarizing plate may have a surface treatment layer such as a hard coating layer, an anti-reflection layer, and an anti-static layer described below. The polarizer and the protective film may be laminated, for example, through a bonding agent layer or an adhesive layer. The components of the polarizing plate are described below.
(1)偏光片 (1) Polarizer
偏光板1所具備偏光片10可為吸收型偏光片,其具有吸收具有與其吸收軸平行之振動面之線性偏光,並透過具有與吸收軸直交(與透過軸平行)之振動面之線性偏光的性質。偏光片10適合使用於經單軸延伸聚乙烯醇系樹脂膜吸附配向二色性色素之偏光片。偏光片10例如可藉由包括以下步驟之方法而製造,亦即,單軸延伸聚乙烯醇系樹脂膜之步驟;以二色性色素染色聚乙烯醇系樹脂膜,藉此吸附二色性色素之步驟;將吸附二色性色素之聚乙烯醇系樹脂膜以硼酸水溶液等交聯液處理之步驟;及在交聯液處理後水洗之步驟。
The
聚乙烯醇系樹脂可使用將聚乙酸乙烯酯系樹脂皂化者。聚乙酸乙烯酯系樹脂除了乙酸乙烯酯均聚物之聚乙酸乙烯酯以外,可舉出與可與乙酸乙烯酯共聚之其他單體的共聚物等。可與乙酸乙烯酯共聚之其他單體之例包括不飽和羧酸類、烯烴類、乙烯基醚類、不飽和磺酸類、及具有銨基之(甲基)丙烯醯胺類等。 Polyvinyl alcohol resins can be saponified polyvinyl acetate resins. Polyvinyl acetate resins include copolymers with other monomers copolymerizable with vinyl acetate, in addition to polyvinyl acetate homopolymers. Examples of other monomers copolymerizable with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl ethers, unsaturated sulfonic acids, and (meth)acrylamides having ammonium groups.
本說明書中「(甲基)丙烯酸」是指選自由丙烯酸及甲基丙烯酸之至少一者。「(甲基)丙烯醯基」、「(甲基)丙烯酸酯」等亦同。 In this specification, "(meth)acrylic acid" refers to at least one selected from acrylic acid and methacrylic acid. The same applies to "(meth)acryl", "(meth)acrylate", etc.
聚乙烯醇系樹脂之皂化度通常為85至100mol%,較佳為98mol%以上。聚乙烯醇系樹脂可經改質,例如可使用以醛類改質之聚乙烯醇縮甲醛或聚乙烯醇縮乙醛等。聚乙烯醇系樹脂之平均聚合度通常為1000至10000,較佳為1500至5000。聚乙烯醇系樹脂之平均聚合度可根據JIS K 6726而求。 The saponification degree of polyvinyl alcohol resin is usually 85 to 100 mol%, preferably 98 mol% or more. Polyvinyl alcohol resin can be modified, for example, polyvinyl formal or polyvinyl acetaldehyde modified with aldehydes can be used. The average polymerization degree of polyvinyl alcohol resin is usually 1000 to 10000, preferably 1500 to 5000. The average polymerization degree of polyvinyl alcohol resin can be obtained according to JIS K 6726.
將如此聚乙烯醇系樹脂製膜者係使用作為偏光片之原料膜。聚乙烯醇系樹脂之製膜方法並無特別限定,可採用習知方法。聚乙烯醇系 原料膜之厚度並無特別限制,但例如為了使偏光片厚度成為25μm以下,較佳為使用40至75μm者。更佳為45μm以下。 The polyvinyl alcohol resin film is used as a raw material film for a polarizer. The method for making a polyvinyl alcohol resin film is not particularly limited, and a known method can be used. The thickness of the polyvinyl alcohol raw material film is not particularly limited, but for example, in order to make the thickness of the polarizer less than 25μm, it is preferably 40 to 75μm. More preferably, it is less than 45μm.
聚乙烯醇系樹脂膜之單軸延伸可在二色性色素染色前、與染色同時、或染色後進行。在染色後進行單軸延伸時,該單軸延伸可在交聯處理前或交聯處理中進行。又,可在該等複數的階段中進行單軸延伸。 The uniaxial stretching of the polyvinyl alcohol-based resin film can be performed before, during, or after dyeing with a dichroic pigment. When the uniaxial stretching is performed after dyeing, the uniaxial stretching can be performed before or during the crosslinking treatment. Furthermore, the uniaxial stretching can be performed in multiple stages.
單軸延伸時,可在周速相異之輥間單軸延伸,也可使用熱輥單軸延伸。又,單軸延伸可為在大氣中延伸之乾式延伸、或使用溶劑或水使聚乙烯醇系樹脂膜在膨潤狀態下延伸之濕式延伸。延伸倍率通常為3至8倍。 During uniaxial stretching, it can be done between rollers with different circumferential speeds, or it can be done using hot rollers. In addition, uniaxial stretching can be done by dry stretching in the atmosphere, or by wet stretching using a solvent or water to stretch the polyvinyl alcohol resin film in a swollen state. The stretching ratio is usually 3 to 8 times.
以二色性色素染色聚乙烯醇系樹脂膜之方法例如可採用將該膜浸漬於含有二色性色素之水溶液之方法。二色性色素係使用碘或二色性有機染料。又,聚乙烯醇系樹脂膜較佳為在染色處理前預先實施水浸漬處理。 The method of dyeing the polyvinyl alcohol resin film with a dichroic dye can be, for example, a method of immersing the film in an aqueous solution containing a dichroic dye. The dichroic dye is iodine or a dichroic organic dye. In addition, the polyvinyl alcohol resin film is preferably subjected to a water immersion treatment before the dyeing treatment.
二色性色素染色後之交聯處理通常採用將經染色聚乙烯醇系樹脂膜浸漬於含硼酸之水溶液之方法。二色性色素使用碘時,該含硼酸之水溶液較佳為含有碘化鉀。 The crosslinking treatment after dichroic dyeing is usually carried out by immersing the dyed polyvinyl alcohol resin film in an aqueous solution containing boric acid. When iodine is used as the dichroic dye, the aqueous solution containing boric acid preferably contains potassium iodide.
偏光片之厚度通常為50μm以下,較佳為5至30μm,更佳為5至25μm以下,又更佳為5至20μm以下。藉由使偏光片厚度為該等範圍,可防止製造偏光片時之破裂或破裂等並維持處理性,且可兼具高光學特性。又,藉由使偏光片厚度成為20μm以下,可進一步抑制放置於高溫環境下時之視覺確認性降低。 The thickness of the polarizer is usually less than 50μm, preferably 5 to 30μm, more preferably 5 to 25μm, and even more preferably 5 to 20μm. By making the thickness of the polarizer within these ranges, cracks or breakages during the manufacture of the polarizer can be prevented and the handling properties can be maintained, and high optical properties can be achieved. In addition, by making the thickness of the polarizer less than 20μm, the reduction in visual confirmation when placed in a high temperature environment can be further suppressed.
偏光片可使用例如日本特開2016-170368號公報所記載之在液晶化合物聚合硬化膜中配向二色性色素者。二色性色素可使用在波長380至800nm之範圍內具有吸收者,較佳為使用有機染料。二色性色素可舉例如偶氮化合物。液晶化合物為可在配向下聚合之液晶化合物,可在分子內具有聚合性基。又,如WO2011/024891所記載,可由液晶性二色性色素形成偏光片。 Polarizers can use, for example, dichroic dyes aligned in a liquid crystal compound polymerization cured film as described in Japanese Patent Publication No. 2016-170368. Dichroic dyes can be used that have absorption in the wavelength range of 380 to 800nm, preferably organic dyes. Examples of dichroic dyes include azo compounds. Liquid crystal compounds are liquid crystal compounds that can be polymerized under alignment and can have polymerizable groups in the molecule. In addition, as described in WO2011/024891, polarizers can be formed from liquid crystal dichroic dyes.
(2)保護膜 (2) Protective film
本發明所使用偏光板1係具有偏光片10、及積層於偏光片10之與高位相差膜13側為相反側的面之第1保護膜11。偏光板1係具有相當於第1保護膜11之至少1片保護膜,進一步可具有積層於偏光片10之高位相差膜13側的面之相當於第2保護膜12之其他保護膜。
The
(第1保護膜11) (1st protective film 11)
第1保護膜11在溫度23℃的光彈性係數絕對值為8×10-12Pa-1以下。認為藉由使用如此光彈性係數較小之第1保護膜11,而可減少放置於高溫環境下時隨著高位相差膜13之收縮應力所產生第1保護膜11的應變所造成的位相差值,其結果,即使在放置於高溫環境下後,無論是否存在偏光太陽眼鏡,其皆可具有視覺確認性良好。
The absolute value of the photoelastic coefficient of the first
第1保護膜11並無特別限制,可為光彈性係數絕對值為8×10-12Pa-1以下之透光性(較佳為光學性透明)熱塑性樹脂,例如鏈狀聚烯烴系樹脂(聚丙烯系樹脂等)、環狀聚烯烴系樹脂(降莰烯系樹脂等)之類之聚烯烴系樹脂;三乙酸纖維素、二乙酸纖維素之類之纖維素系樹脂;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯之類之聚酯系樹脂;聚碳酸酯系樹脂;
甲基丙烯酸甲酯系樹脂之類之(甲基)丙烯酸系樹脂;聚苯乙烯系樹脂;聚氯乙烯系樹脂;丙烯腈/丁二烯/苯乙烯系樹脂;丙烯腈/苯乙烯系樹脂;聚乙酸乙烯酯系樹脂;聚偏二氯乙烯系樹脂;聚醯胺系樹脂;聚縮醛系樹脂;改質聚苯醚系樹脂;聚碸系樹脂;聚醚碸系樹脂;聚芳酯系樹脂;聚醯胺醯亞胺系樹脂;聚醯亞胺系樹脂;順丁烯二醯亞胺系樹脂等所構成的膜。
The first
尤其,第1保護膜11較佳為使用光彈性係數較小者。亦即環狀聚烯烴系樹脂較佳為使用含有選自由(甲基)丙烯酸系樹脂、聚苯乙烯系樹脂、及順丁烯二醯亞胺系樹脂所構成之群組中至少一種的膜。
In particular, the first
第1保護膜11之溫度23℃的光彈性係數較佳為0.05×10-12至8.0×10-12Pa-1,更佳為0.1×10-12至5.0×10-12Pa-1,又更佳為0.2×10-12至3.0×10-12Pa-1。又,光彈性係數為以後述實施例所述方法測定的值。
The photoelastic coefficient of the first
保護膜11之面內位相差值若在前述光彈性係數之範圍內,則較佳為使用調整為10nm以下或50至300nm者。尤其,較佳為形成10nm以下的膜,藉此可獲得更高的效果。其原因為:具有位相差的膜會藉由高位相差膜之斜方向應力緩和而改變位相差值,同時其光學軸也會變化,藉此會增大黑顯示時的漏光。於液晶顯示裝置等使用位相差膜作為光學補償膜時,可於成對使用之另一片偏光板配置前述光學補償膜,此亦為有用的設計手段。又,除非另有說明,位相差值為波長550nm中的值,為以後述實施例所述方法測定的值。
If the in-plane phase difference value of the
環狀聚烯烴系樹脂為以環狀烯烴作為聚合單元聚合之樹脂的合稱,可舉例如日本特開平1-240517號公報、日本特開平3-14882號公報、日本特開平3-122137號公報等所記載之樹脂。環狀聚烯烴系樹脂之具 體舉可舉出環狀烯烴之開環(共)聚合物、環狀烯烴之加成聚合物、環狀烯烴與乙烯、丙烯之類之鏈狀烯烴的共聚物(較具代表性為隨機共聚物)、及將該等以不飽和羧酸或其衍生物改質之接枝聚合物、以及該等的氫化物。其中較佳為利用使用降莰烯或多環降莰烯系單體之類之降莰烯系單體作為環狀烯烴之降莰烯系樹脂。 Cyclic polyolefin resins are a general term for resins that use cyclic olefins as polymerized units, and examples thereof include resins described in Japanese Patent Application Laid-Open No. 1-240517, Japanese Patent Application Laid-Open No. 3-14882, and Japanese Patent Application Laid-Open No. 3-122137. Specific examples of cyclic polyolefin resins include ring-opening (co)polymers of cyclic olefins, addition polymers of cyclic olefins, copolymers of cyclic olefins and chain olefins such as ethylene and propylene (most typically random copolymers), graft polymers obtained by modifying these with unsaturated carboxylic acids or their derivatives, and hydrogenated products thereof. Among them, the preferred is a norbornene resin using a norbornene monomer such as norbornene or a polycyclic norbornene monomer as the cyclic olefin.
由環狀烯烴系樹脂製造保護膜之方法並無特別限制,適當地選擇因應其樹脂之方法即可。例如採用將溶解於溶劑之樹脂流延於金屬製帶或轉筒,乾燥去除溶劑而得膜之溶劑澆鑄法;及將樹脂加熱至其熔融溫度以上混煉並由模擠出,藉由冷卻轉筒冷卻,藉此獲得膜之熔融擠出法。其中以生產性之觀點來看,較佳為採用熔融擠出法。 There is no particular limitation on the method of making a protective film from a cyclic olefin resin. You can choose a method that is appropriate for the resin. For example, a solvent casting method is used to cast a resin dissolved in a solvent onto a metal strip or a drum, and then the solvent is dried to remove the solvent to obtain a film; and a melt extrusion method is used to heat the resin to a temperature above its melting point, knead it, extrude it, and cool it with a cooling drum to obtain a film. From the perspective of productivity, the melt extrusion method is preferred.
前述環狀烯烴系樹脂膜在波長550nm中的面內位相差值Re[550]較佳為10nm以下,更佳為7nm以下,又更佳為5nm以下,特佳為3nm以下,最佳為1nm以下。波長550nm中的環狀烯烴系樹脂膜之厚度方向位相差值Rth[550]較佳為15nm以下,更佳為10nm以下,又更佳為5nm以下,特佳為3nm以下,最佳為1nm以下。 The in-plane phase difference value Re[550] of the aforementioned cyclic olefin resin film at a wavelength of 550nm is preferably less than 10nm, more preferably less than 7nm, even more preferably less than 5nm, particularly preferably less than 3nm, and most preferably less than 1nm. The thickness direction phase difference value Rth[550] of the cyclic olefin resin film at a wavelength of 550nm is preferably less than 15nm, more preferably less than 10nm, even more preferably less than 5nm, particularly preferably less than 3nm, and most preferably less than 1nm.
接著說明為使前述環狀烯烴系樹脂膜之位相差值滿足上述條件之控制方法。為了使面內位相差值成為10nm以下,需要極力減低殘留於面內方向之延伸時的應變,又,為了使厚度方向位相差成為本發明之特定值以下,需要極力減低殘留於厚度方向的應變。 Next, the control method for making the phase difference of the aforementioned cyclic olefin resin film satisfy the above conditions is described. In order to make the in-plane phase difference value less than 10nm, it is necessary to minimize the strain remaining in the in-plane direction during extension. In addition, in order to make the thickness direction phase difference less than the specific value of the present invention, it is necessary to minimize the strain remaining in the thickness direction.
例如在前述溶劑澆鑄法中,係採用將乾燥該流延樹脂溶液時產生之面內方向殘留延伸應變、及厚度方向殘留收縮應變藉由熱處理而緩和之方法等。又,在前述熔融擠出法中,係採用為了防止樹脂膜在由模擠 出到冷卻之間延伸,故極力減少模到冷卻轉筒的距離,且以不延伸膜之方式控制擠出量及冷卻轉筒的旋轉速度之方法等。又,也可採用與前述熔融擠出法同樣之將殘留於所得膜之應變藉由熱處理而緩和之方法。 For example, in the aforementioned solvent casting method, a method is adopted to relax the residual extension strain in the in-plane direction and the residual contraction strain in the thickness direction generated when the cast resin solution is dried by heat treatment. In addition, in the aforementioned melt extrusion method, in order to prevent the resin film from stretching between extrusion and cooling, a method is adopted in which the distance from the mold to the cooling drum is minimized, and the extrusion amount and the rotation speed of the cooling drum are controlled in a manner that does not stretch the film. In addition, a method of relaxing the strain remaining in the obtained film by heat treatment, similar to the aforementioned melt extrusion method, can also be adopted.
又,在滿足本發明之光彈性係數之範圍內可成為具有作為液晶顯示裝置之光學補償膜的功能之位相差膜。如此位相差膜可藉由將前述環狀烯烴系樹脂膜並賦予面內位相差值而製作。延伸可以習知縱單軸延伸或拉幅機橫單軸延伸、同時雙軸延伸、逐次雙軸延伸等進行,並以獲得所求位相差值之方式延伸即可。 Furthermore, within the range of the photoelastic coefficient of the present invention, a phase difference film having the function of an optical compensation film for a liquid crystal display device can be formed. Such a phase difference film can be prepared by giving the aforementioned annular olefin resin film an in-plane phase difference value. Stretching can be performed by conventional longitudinal uniaxial stretching, horizontal uniaxial stretching on a tenter, simultaneous biaxial stretching, sequential biaxial stretching, etc., and stretching can be performed in a manner that obtains the desired phase difference value.
例如橫向電場效應模式之液晶顯示裝置較佳為使用面內位相差調整至50至300nm之位相差膜。具體而言可使用日本特開2010-20287號報所記載之位相差膜或日本專利3880996號報所記載之位相差膜等。 For example, a liquid crystal display device in a horizontal electric field effect mode preferably uses a phase difference film with an in-plane phase difference adjusted to 50 to 300 nm. Specifically, the phase difference film described in Japanese Patent Publication No. 2010-20287 or the phase difference film described in Japanese Patent No. 3880996 can be used.
前述環狀烯烴系樹脂膜之厚度較佳為10μm至200μm,更佳為10μm至100μm,最佳為10μm至65μm。若厚度未達10μm則有強度降低之虞。若厚度超過200μm則有透明性降低之虞。 The thickness of the aforementioned cyclic olefin resin film is preferably 10μm to 200μm, more preferably 10μm to 100μm, and most preferably 10μm to 65μm. If the thickness is less than 10μm, the strength may be reduced. If the thickness exceeds 200μm, the transparency may be reduced.
(甲基)丙烯酸系樹脂為以具有(甲基)丙烯醯基之化合物作為主要構成單體之樹脂。(甲基)丙烯酸系樹脂之具體例例如包括:聚甲基丙烯酸甲酯之類之聚(甲基)丙烯酸酯;甲基丙烯酸甲酯-(甲基)丙烯酸共聚物;甲基丙烯酸甲酯-(甲基)丙烯酸酯共聚物;甲基丙烯酸甲酯-丙烯酸酯-(甲基)丙烯酸共聚物;(甲基)丙烯酸甲酯-苯乙烯共聚物(MS樹脂等);甲基丙烯酸甲酯與具有脂環族烴基之化合物的共聚物(例如甲基丙烯酸甲酯-甲基丙烯酸環己酯共聚物,甲基丙烯酸甲酯-(甲基)丙烯酸降莰酯共聚物等)。較 佳為使用以聚(甲基)丙烯酸甲酯之類之聚(甲基)丙烯酸C1-6烷酯為主成分之聚合物,更佳為使用以甲基丙烯酸甲酯為主成分(50至100重量%,較佳為70至100重量%)之甲基丙烯酸甲酯系樹脂。 (Meth)acrylic resins are resins having a compound having a (meth)acryloyl group as a main constituent monomer. Specific examples of (meth)acrylic resins include: poly(meth)acrylates such as polymethyl methacrylate; methyl methacrylate-(meth)acrylic acid copolymers; methyl methacrylate-(meth)acrylic acid copolymers; methyl methacrylate-(meth)acrylic acid copolymers; methyl methacrylate-acrylic acid ester-(meth)acrylic acid copolymers; methyl (meth)acrylate-styrene copolymers (MS resins, etc.); copolymers of methyl methacrylate and compounds having alicyclic hydrocarbon groups (e.g. methyl methacrylate-cyclohexyl methacrylate copolymers, methyl methacrylate-norbornene (meth)acrylate copolymers, etc.). It is preferred to use a polymer containing poly(meth)acrylic acid C 1-6 alkyl esters such as poly(methyl)acrylate as a main component, and it is more preferred to use a methyl methacrylate-based resin containing methyl methacrylate as a main component (50 to 100% by weight, preferably 70 to 100% by weight).
前述(甲基)丙烯酸系樹脂膜在波長550nm中的面內位相差值Re[550]較佳為10nm以下,更佳為7nm以下,又更佳為5nm以下,特佳為3nm以下,最佳為1nm以下。波長550nm中的(甲基)丙烯酸系樹脂膜之厚度方向位相差值Rth[550]較佳為15nm以下,更佳為10nm以下,又更佳為5nm以下,特佳為3nm以下,最佳為1nm以下。為了使面內位相差及厚度方向位相差在該範圍,例如可使用後述具有戊二醯亞胺構造之(甲基)丙烯酸系樹脂。 The in-plane phase difference Re[550] of the aforementioned (meth) acrylic resin film at a wavelength of 550nm is preferably less than 10nm, more preferably less than 7nm, more preferably less than 5nm, particularly preferably less than 3nm, and most preferably less than 1nm. The thickness direction phase difference Rth[550] of the (meth) acrylic resin film at a wavelength of 550nm is preferably less than 15nm, more preferably less than 10nm, more preferably less than 5nm, particularly preferably less than 3nm, and most preferably less than 1nm. In order to make the in-plane phase difference and the thickness direction phase difference within this range, for example, the (meth) acrylic resin having a pentamidoamine structure described later can be used.
前述(甲基)丙烯酸系樹脂可進一步具有其他構造單元。其他構造單元可舉例如構成內酯環、聚碳酸酯、聚乙烯醇、乙酸纖維素、聚酯、聚芳酯、聚醯亞胺、聚烯烴等之構造單元、後述通式(1)所示構造單元。展現負雙折射之構造單元可舉例如源自於苯乙烯系單體、順丁烯二醯亞胺系單體等之構造單元、聚甲基丙烯酸甲酯之構造單元、後述通式(3)所示構造單元等。 The aforementioned (meth) acrylic resin may further have other structural units. Other structural units include structural units constituting lactone rings, polycarbonates, polyvinyl alcohol, cellulose acetate, polyesters, polyarylates, polyimides, polyolefins, etc., and structural units represented by the general formula (1) described below. Structural units exhibiting negative birefringence include structural units derived from styrene monomers, styrene diimide monomers, etc., structural units of polymethyl methacrylate, and structural units represented by the general formula (3) described below.
前述(甲基)丙烯酸系樹脂較佳為使用具有內酯環構造或戊二醯亞胺構造之(甲基)丙烯酸系樹脂。具有內酯環構造或戊二醯亞胺構造之(甲基)丙烯酸系樹脂其耐熱性優異。更佳為具有戊二醯亞胺構造之(甲基)丙烯酸系樹脂。若使用具有戊二醯亞胺構造之(甲基)丙烯酸系樹脂,則如上述可得低透濕且位相差及紫外線透過率小之(甲基)丙烯酸系樹脂膜。具有戊二醯亞胺構造之(甲基)丙烯酸系樹脂(以下稱為戊二醯亞胺樹脂)例如為 日本特開2006-309033號公報、日本特開2006-317560號公報、日本特開2006-328329號公報、日本特開2006-328334號公報、日本特開2006-337491號公報、日本特開2006-337492號公報、日本特開2006-337493號公報、日本特開2006-337569號公報、日本特開2007-009182號公報、日本特開2009-161744號公報所記載。該等記載係作為參考適用於本說明書。 The aforementioned (meth) acrylic resin is preferably a (meth) acrylic resin having a lactone ring structure or a glutarimide structure. The (meth) acrylic resin having a lactone ring structure or a glutarimide structure has excellent heat resistance. A (meth) acrylic resin having a glutarimide structure is more preferred. If a (meth) acrylic resin having a glutarimide structure is used, a (meth) acrylic resin film having low moisture permeability and small phase difference and ultraviolet transmittance can be obtained as described above. The (meth) acrylic resin having a glutarimide structure (hereinafter referred to as glutarimide resin) is described in, for example, Japanese Patent Publication No. 2006-309033, Japanese Patent Publication No. 2006-317560, Japanese Patent Publication No. 2006-328329, Japanese Patent Publication No. 2006-328334, Japanese Patent Publication No. 2006-337491, Japanese Patent Publication No. 2006-337492, Japanese Patent Publication No. 2006-337493, Japanese Patent Publication No. 2006-337569, Japanese Patent Publication No. 2007-009182, and Japanese Patent Publication No. 2009-161744. These descriptions are applicable to this specification as a reference.
較佳為上述戊二醯亞胺樹脂包括下述通式(1)所示構造單元(以下稱為戊二醯亞胺單元)、及下述通式(2)所示構造單元(以下稱為(甲基)丙烯酸酯單元)。 Preferably, the above-mentioned pentylene imide resin includes a structural unit represented by the following general formula (1) (hereinafter referred to as pentylene imide unit) and a structural unit represented by the following general formula (2) (hereinafter referred to as (meth)acrylate unit).
式(1)中,R1及R2分別獨立地為氫或碳數1至8之烷基,R3為包括氫、碳數1至18之烷基、碳數3至12之環烷基、或碳數5至15之芳香環的取代基。式(2)中,R4及R5分別獨立地為氫或碳數1至8之烷基,R6為包括氫、碳數1至18之烷基、碳數3至12之環烷基、或碳數5至15之芳香環的取代基。 In formula (1), R1 and R2 are independently hydrogen or an alkyl group having 1 to 8 carbon atoms, and R3 is a substituent including hydrogen, an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or an aromatic ring having 5 to 15 carbon atoms. In formula (2), R4 and R5 are independently hydrogen or an alkyl group having 1 to 8 carbon atoms, and R6 is a substituent including hydrogen, an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or an aromatic ring having 5 to 15 carbon atoms.
戊二醯亞胺樹脂視需要可進一步含有下述通式(3)所示構造單元(以下稱為芳香族乙烯基單元)。 The glutaramide resin may further contain a structural unit represented by the following general formula (3) (hereinafter referred to as an aromatic vinyl unit) as necessary.
式(3)中,R7為氫或碳數1至8之烷基,R8為碳數6至10之芳基。 In formula (3), R7 is hydrogen or an alkyl group having 1 to 8 carbon atoms, and R8 is an aryl group having 6 to 10 carbon atoms.
上述通式(1)中,較佳為R1及R2分別獨立地為氫或甲基,R3為氫、甲基、丁基、或環己基,又更佳為R1為甲基,R2為氫,R3為甲基。 In the above general formula (1), preferably, R1 and R2 are independently hydrogen or methyl, and R3 is hydrogen, methyl, butyl, or cyclohexyl. More preferably, R1 is methyl, R2 is hydrogen, and R3 is methyl.
上述戊二醯亞胺樹脂中作為戊二醯亞胺單元可僅含有單一種類,也可含有上述通式(1)中的R1、R2、及R3相異之複數種類。 The glutarimide resin may contain only a single type of glutarimide unit, or may contain a plurality of types in which R 1 , R 2 , and R 3 in the general formula (1) are different.
戊二醯亞胺單元可藉由使上述通式(2)所示(甲基)丙烯酸酯單元醯亞胺化而形成。又,戊二醯亞胺單元也可藉由將順丁烯二酸酐等酸酐、或如此酸酐與碳數1至20之直鏈或支鏈之醇的半酯;丙烯酸、甲基丙烯酸、順丁烯二酸、順丁烯二酸酐、伊康酸、伊康酸酐、巴豆酸、延胡索酸、檸康酸等α、β-乙烯性不飽和羧酸等醯亞胺化而形成。 The glutarimide unit can be formed by imidizing the (meth)acrylate unit represented by the above general formula (2). In addition, the glutarimide unit can also be formed by imidizing an acid anhydride such as maleic anhydride, or a half ester of such an acid anhydride and a linear or branched alcohol having 1 to 20 carbon atoms; acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, crotonic acid, fumaric acid, citric acid, etc. α, β-ethylenically unsaturated carboxylic acids.
上述通式(2)中,較佳為R4及R5分別獨立地為氫或甲基,R6為氫或甲基,又更佳為R4為氫,R5為甲基,R6為甲基。 In the above general formula (2), preferably, R4 and R5 are independently hydrogen or methyl, and R6 is hydrogen or methyl. More preferably, R4 is hydrogen, R5 is methyl, and R6 is methyl.
上述戊二醯亞胺樹脂中作為(甲基)丙烯酸酯單元可僅含有單一種類,也可含有上述通式(2)中的R4、R5、及R6相異之複數種類。 The glutarimide resin may contain only a single type of (meth)acrylate unit, or may contain a plurality of types in which R 4 , R 5 , and R 6 in the general formula (2) are different.
上述戊二醯亞胺樹脂中,作為上述通式(3)所示芳香族乙烯基單元較佳為含有苯乙烯、α-甲基苯乙烯等,又更佳為含有苯乙烯。藉由具有如此芳香族乙烯基單元而可降低戊二醯亞胺構造之正雙折射性,可得更低位相差之(甲基)丙烯酸系樹脂膜。 In the above-mentioned pentylene imide resin, the aromatic vinyl unit represented by the above-mentioned general formula (3) preferably contains styrene, α-methylstyrene, etc., and more preferably contains styrene. By having such an aromatic vinyl unit, the positive birefringence of the pentylene imide structure can be reduced, and a (meth) acrylic resin film with a lower phase difference can be obtained.
上述戊二醯亞胺樹脂中作為芳香族乙烯基單元可僅含有單一種類,也可含有R7及R8相異之複數種類。 The glutarimide resin may contain only a single aromatic vinyl unit or may contain a plurality of aromatic vinyl units in which R7 and R8 are different.
上述戊二醯亞胺樹脂中的上述戊二醯亞胺單元含有量例如較佳為依存於R3之構造等而變化。戊二醯亞胺單元含有量以戊二醯亞胺樹脂之總構造單元為基準較佳為1重量%至80重量%,更佳為1重量%至70重量%,又更佳為1重量%至60重量%,特佳為1重量%至50重量%。若戊二醯亞胺單元含有量在如此範圍,則可獲得耐熱性優異低位相差之(甲基)丙烯酸系樹脂膜。 The content of the pentylimide unit in the pentylimide resin preferably varies depending on the structure of R 3 , etc. The content of the pentylimide unit is preferably 1 wt % to 80 wt %, more preferably 1 wt % to 70 wt %, even more preferably 1 wt % to 60 wt %, and particularly preferably 1 wt % to 50 wt % based on the total structural units of the pentylimide resin. If the content of the pentylimide unit is within such a range, a (meth) acrylic resin film having excellent heat resistance and low phase difference can be obtained.
上述戊二醯亞胺樹脂中的上述芳香族乙烯基單元含有量可因應目的或所求特性而適當設定。根據用途不同,芳香族乙烯基單元含有量亦可為0。含有芳香族乙烯基單元時,其含有量以戊二醯亞胺樹脂之戊二醯亞胺單元為基準較佳為10重量%至80重量%,更佳為20重量%至80重量%,又更佳為20重量%至60重量%,特佳為20重量%至50重量%。若芳香族乙烯基單元含有量在如此範圍,則可得低位相差且耐熱性及機械性強度優異之(甲基)丙烯酸系樹脂膜。 The content of the above-mentioned aromatic vinyl unit in the above-mentioned pentylimide resin can be appropriately set according to the purpose or the desired characteristics. Depending on the application, the content of the aromatic vinyl unit can also be 0. When the aromatic vinyl unit is contained, its content is preferably 10% to 80% by weight based on the pentylimide unit of the pentylimide resin, more preferably 20% to 80% by weight, more preferably 20% to 60% by weight, and particularly preferably 20% to 50% by weight. If the content of the aromatic vinyl unit is within this range, a (meth) acrylic resin film with low phase difference and excellent heat resistance and mechanical strength can be obtained.
上述戊二醯亞胺樹脂中可視需要進一步共聚有戊二醯亞胺單元、(甲基)丙烯酸酯單元、及芳香族乙烯基單元以外之其他構造單元。其他構造單元可舉例如丙烯腈或甲基丙烯腈等腈系單體、順丁烯二醯亞胺、 N-甲基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺等順丁烯二醯亞胺系單體所構成之構造單元。該等其他構造單元於上述戊二醯亞胺樹脂中可直接共聚或接枝共聚。 The above-mentioned pentylene imide resin may be further copolymerized with other structural units other than pentylene imide units, (meth)acrylate units, and aromatic vinyl units as needed. Other structural units include nitrile monomers such as acrylonitrile or methacrylonitrile, structural units composed of cis-butenediamide monomers such as succinimide, N-methylsuccinimide, N-phenylsuccinimide, and N-cyclohexylsuccinimide. These other structural units can be directly copolymerized or grafted in the above-mentioned pentylene imide resin.
上述(甲基)丙烯酸系樹脂膜可因應目的含有任意適當之添加劑。添加劑可舉例如受阻苯酚系、磷系、硫系等抗氧化劑;耐光穩定劑、紫外線吸收劑、耐候穩定劑、熱穩定劑等穩定劑;玻璃纖維、碳纖維等補強材;近紅外線吸收劑;磷酸三(二溴丙基)酯、磷酸三烯丙酯、氧化銻等阻燃劑;陰離子系、陽離子系、非離子系之界面活性劑等抗靜電劑;無機顏料、有機顏料、染料等著色劑;有機填料或無機填料;樹脂改質劑;塑化劑;滑劑;位相差降低劑等。所含有添加劑之種類、組合、含有量等可因應目的或所求特性適當設定。 The (meth)acrylic resin film may contain any appropriate additives according to the purpose. Additives include, for example, hindered phenol-based, phosphorus-based, sulfur-based antioxidants; stabilizers such as light stabilizers, ultraviolet absorbers, weathering stabilizers, and thermal stabilizers; reinforcing materials such as glass fiber and carbon fiber; near-infrared absorbers; flame retardants such as tris(dibromopropyl) phosphate, triallyl phosphate, and antimony oxide; antistatic agents such as anionic, cationic, and non-ionic surfactants; colorants such as inorganic pigments, organic pigments, and dyes; organic fillers or inorganic fillers; resin modifiers; plasticizers; lubricants; phase difference reducing agents, etc. The type, combination, and amount of additives contained can be appropriately set according to the purpose or desired characteristics.
上述(甲基)丙烯酸系樹脂膜之製造方法並無特別限定,例如可將(甲基)丙烯酸系樹脂、紫外線吸收劑、視需要之其他聚合物或添加劑等以任意適當混合方法充分混合,並作為預備熱塑性樹脂組成物而進行膜成型。或者可將(甲基)丙烯酸系樹脂、紫外線吸收劑、視需要之其他聚合物或添加劑等分別形成個別溶液後混合形成均勻混合液後,在進行膜成型。 The method for producing the (meth)acrylic resin film is not particularly limited. For example, the (meth)acrylic resin, the ultraviolet absorber, other polymers or additives as required, etc. can be fully mixed by any appropriate mixing method and used as a pre-prepared thermoplastic resin composition for film molding. Alternatively, the (meth)acrylic resin, the ultraviolet absorber, other polymers or additives as required can be formed into individual solutions and then mixed to form a uniform mixed solution before film molding.
製造上述熱塑性樹脂組成物時,例如以均質混合器等任意適當混合機將上述膜原料預混合後,將所得混合物擠出混煉。此時,擠出混煉所使用混合機並無特別限定,例如可使用單軸擠出機、雙軸擠出機等擠出機或加壓捏合機等任意適當混合機。 When manufacturing the above-mentioned thermoplastic resin composition, the above-mentioned film raw materials are pre-mixed with any appropriate mixer such as a homogenizer, and the obtained mixture is extruded and kneaded. At this time, the mixer used for extrusion and kneading is not particularly limited, for example, an extruder such as a single-screw extruder, a double-screw extruder, or any appropriate mixer such as a pressure kneading machine can be used.
上述膜成型之方法可舉例如溶液澆鑄法(溶液流延法)、熔融擠出法、壓延法、壓縮成型法等任意適當膜成型法。較佳為熔融擠出法。 熔融擠出法不使用溶劑,故可降低因製造成本或溶劑對地球環境或作業環境造成的負荷。 The above-mentioned film forming method can be any appropriate film forming method such as solution casting (solution casting), melt extrusion, calendering, compression molding, etc. The melt extrusion method is preferred. The melt extrusion method does not use solvents, so it can reduce the burden of manufacturing costs or solvents on the earth's environment or the working environment.
上述熔融擠出法可舉例如T模法、充氣法等。成型溫度較佳為150至350℃,更佳為200至300℃。 The above-mentioned melt extrusion method can be exemplified by T-die method, inflation method, etc. The molding temperature is preferably 150 to 350°C, more preferably 200 to 300°C.
以上述T模法進行膜成型時,於習知單軸擠出機或雙軸擠出機前端部裝設T模,並將膜狀擠出的膜捲繞,而可得輥狀膜。此時,藉由適當地調整捲繞輥之溫度並於擠出方向延伸,藉此亦可進行單軸延伸。又,藉由在與擠出方向垂直之方向將膜延伸,藉此亦可進行同時雙軸延伸,逐次雙軸延伸等。 When the film is formed by the T-die method, a T-die is installed at the front end of a conventional single-axis extruder or a double-axis extruder, and the film extruded in a film-like state is wound up to obtain a roll-shaped film. At this time, by appropriately adjusting the temperature of the winding roll and stretching in the extrusion direction, uniaxial stretching can also be performed. In addition, by stretching the film in a direction perpendicular to the extrusion direction, simultaneous biaxial stretching, sequential biaxial stretching, etc. can also be performed.
在獲得上述所求位相差的範圍內,上述(甲基)丙烯酸系樹脂膜可為未延伸膜或延伸膜之任一者。延伸膜時可為單軸延伸膜或雙軸延伸膜之任一者。雙軸延伸膜時可為同時雙軸延伸膜或逐次雙軸延伸膜之任一者。 In the range of obtaining the above-mentioned desired phase difference, the above-mentioned (meth) acrylic resin film can be either an unstretched film or a stretched film. In the case of a stretched film, it can be either a uniaxially stretched film or a biaxially stretched film. In the case of a biaxially stretched film, it can be either a simultaneously biaxially stretched film or a sequentially biaxially stretched film.
上述延伸溫度較佳為膜原料之熱塑性樹脂組成物之玻璃轉移溫度附近,具體而言較佳為(玻璃轉移溫度-30℃)至(玻璃轉移溫度+30℃),更佳為(玻璃轉移溫度-20℃)至(玻璃轉移溫度+20℃)之範圍內。若延伸溫度未達(玻璃轉移溫度-30℃),則有所得膜的霧度變大、或膜破裂或撕裂而無法獲得特定延伸倍率之虞。相反地,若延伸溫度超過(玻璃轉移溫度+30℃),則所得膜厚度不均變大,有無法充分改善延伸率、撕裂傳播強度、及耐揉疲勞等力學性質之傾向。又,有容易產生膜黏著於輥之問題之傾向。 The above-mentioned stretching temperature is preferably near the glass transition temperature of the thermoplastic resin composition of the film raw material, specifically, preferably (glass transition temperature -30°C) to (glass transition temperature +30°C), and more preferably (glass transition temperature -20°C) to (glass transition temperature +20°C). If the stretching temperature does not reach (glass transition temperature -30°C), there is a risk that the fog of the obtained film will increase, or the film will break or tear and the specific stretching ratio cannot be obtained. On the contrary, if the stretching temperature exceeds (glass transition temperature +30°C), the uneven thickness of the obtained film will increase, and there is a tendency that the mechanical properties such as elongation, tear propagation strength, and flexural fatigue resistance cannot be fully improved. In addition, there is a tendency to easily cause the problem of film adhesion to the roller.
上述延伸倍率較佳為1.1至3倍,更佳為1.3至2.5倍。若延伸倍率在如此範圍,則可大幅改善膜之延伸率、撕裂傳播強度、及耐揉疲勞等力學性質。結果可減少厚度不均,雙折射實質上為零(因此位相差較小),並可製造霧度較小的膜。 The above stretching ratio is preferably 1.1 to 3 times, and more preferably 1.3 to 2.5 times. If the stretching ratio is within this range, the mechanical properties of the film, such as elongation, tear propagation strength, and flexural fatigue resistance, can be greatly improved. As a result, the thickness unevenness can be reduced, the birefringence is substantially zero (so the phase difference is smaller), and a film with less haze can be produced.
上述(甲基)丙烯酸系樹脂膜中,為了使其光學性等方性或機械性特性安定化,故可在延伸處理後進行熱處理(退火)等。熱處理條件可採用任意適當條件。 In order to stabilize the optical isotropy or mechanical properties of the above-mentioned (meth) acrylic resin film, heat treatment (annealing) etc. may be performed after the stretching treatment. Any appropriate conditions may be adopted for the heat treatment.
上述(甲基)丙烯酸系樹脂膜之厚度較佳為10μm至200μm,更佳為15μm至100μm,最佳為15μm至65μm。若厚度未達10μm則有強度降低之虞。若厚度超過200μm則有透明性降低之虞。 The thickness of the (meth) acrylic resin film is preferably 10 μm to 200 μm, more preferably 15 μm to 100 μm, and most preferably 15 μm to 65 μm. If the thickness is less than 10 μm, the strength may be reduced. If the thickness exceeds 200 μm, the transparency may be reduced.
(第2保護膜12) (Second protective film 12)
第2保護膜12可使用可使用記載作為第1保護膜11的膜之上述樹脂膜,也可使用其他樹脂膜。例如較佳為使用鏈狀烯烴系樹脂膜、纖維素系樹脂膜。
The second
鏈狀聚烯烴系樹脂除了聚乙烯樹脂(乙烯均聚物之聚乙烯樹脂、或以乙烯為主體之共聚物)、聚丙烯樹脂(丙烯均聚物之聚丙烯樹脂、或以丙烯為主體之共聚物)之類之鏈狀烯烴均聚物以外,可舉出2種以上之鏈狀烯烴所構成的共聚物。 Chain polyolefin resins include chain olefin homopolymers such as polyethylene resin (polyethylene resin of ethylene homopolymer or copolymer with ethylene as the main component) and polypropylene resin (polypropylene resin of propylene homopolymer or copolymer with propylene as the main component), as well as copolymers composed of two or more chain olefins.
纖維素酯系樹脂為纖維素與脂肪酸的酯。纖維素酯系樹脂之具體例包括三乙酸纖維素、二乙酸纖維素、三丙酸纖維素、二丙酸纖維素。又,亦可舉出該等的共聚物、或羥基一部分以其他取代基修飾者。該等中特佳為三乙酸纖維素(triacetylcellulose)。 Cellulose ester resins are esters of cellulose and fatty acids. Specific examples of cellulose ester resins include cellulose triacetate, cellulose diacetate, cellulose tripropionate, and cellulose dipropionate. In addition, copolymers of these resins or resins in which a portion of the hydroxyl groups is modified with other substituents can also be cited. Among these, triacetylcellulose is particularly preferred.
第2保護膜12之厚度通常為1至100μm,但以強度或處理性等觀點來看,較佳為5至60μm,更佳為10至55μm,又更佳為15至50μm。
The thickness of the second
如上述,第2保護膜12也可於其外面(與偏光片為相反側的面)具備硬塗層、防眩層、光漫射層、抗反射層、低折射率層、防靜電層、防汙層之類之表面處理層(塗層)。又,第2保護膜12之厚度係包括表面處理層的厚度。
As mentioned above, the second
(3)接著層 (3) Next layer
保護膜(第1保護膜11及第2保護膜12)例如可經介接著層而貼合於偏光片。接著層例如為接著劑層或黏著劑層。形成接著劑層之接著劑可使用水系接著劑、活性能量線硬化性接著劑或熱硬化性接著劑,較佳為水系接著劑、活性能量線硬化性接著劑。
The protective film (the first
黏著劑層可使用後述者。 The adhesive layer may be the one described below.
水系接著劑可舉出聚乙烯醇系樹脂水溶液所構成的接著劑、水系二液型胺甲酸乙酯系乳液接著劑等。其中適合使用聚乙烯醇系樹脂水溶液所構成的水系接著劑。聚乙烯醇系樹脂除了乙酸乙烯酯均聚物之聚乙酸乙烯酯進行皂化處理而得之乙烯醇均聚物以外,可使用乙酸乙烯酯與可與其共聚之其他單體的共聚物經皂化處理而得之聚乙烯醇系共聚物、或該等的羥基部分改質之改質聚乙烯醇系聚合物等。水系接著劑可含有醛化合物(乙二醛等)、環氧化合物、三聚氰胺系化合物、羥甲基化合物、異氰酸酯化合物、胺化合物、多價金屬鹽等交聯劑。 Examples of water-based adhesives include adhesives composed of polyvinyl alcohol resin aqueous solutions and water-based two-component urethane emulsion adhesives. Among them, water-based adhesives composed of polyvinyl alcohol resin aqueous solutions are suitable. In addition to vinyl alcohol homopolymers obtained by saponifying polyvinyl acetate, which is a vinyl acetate homopolymer, polyvinyl alcohol copolymers obtained by saponifying copolymers of vinyl acetate and other monomers copolymerizable therewith, or modified polyvinyl alcohol polymers in which the hydroxyl groups of these monomers are modified can be used. Water-based adhesives may contain crosslinking agents such as aldehyde compounds (such as glyoxal), epoxy compounds, melamine compounds, hydroxymethyl compounds, isocyanate compounds, amine compounds, and polyvalent metal salts.
使用水系接著劑時,較佳為在偏光片與保護膜貼合後實施去除水系接著劑中所含的水之乾燥步驟。乾燥步驟後,例如可設置在20至45℃之溫度熟化之熟化步驟。 When using a water-based adhesive, it is preferred to perform a drying step to remove the water contained in the water-based adhesive after the polarizer and the protective film are attached. After the drying step, a curing step may be performed at a temperature of 20 to 45°C, for example.
上述活性能量線硬化性接著劑是指含有藉由紫外線、可見光、電子線、X射線之類之活性能量線的照射而硬化之硬化性化合物的接著劑,較佳為紫外線硬化性接著劑。 The above-mentioned active energy ray-curable adhesive refers to an adhesive containing a curable compound that is cured by irradiation with active energy rays such as ultraviolet rays, visible light, electron rays, and X-rays, and is preferably an ultraviolet ray-curable adhesive.
上述硬化性化合物可為陽離子聚合性之硬化性化合物或自由基聚合性之硬化性化合物。陽離子聚合性之硬化性化合物可舉例如環氧系化合物(分子內具有1個或2個以上環氧基之化合物)、或氧環丁烷系化合物(分子內具有1個或2個以上氧環丁烷環之化合物)、或該等的組合。自由基聚合性之硬化性化合物可舉例如(甲基)丙烯酸系化合物(分子內具有1個或2個以上(甲基)丙烯醯氧基之化合物)、或具有自由基聚合性雙鍵之其他乙烯基系化合物、或該等的組合。可併用陽離子聚合性之硬化性化合物與自由基聚合性之硬化性化合物。活性能量線硬化性接著劑通常進一步含有開始上述硬化性化合物之硬化反應的陽離子聚合起始劑及/或自由基聚合起始劑。 The curable compound may be a cationically polymerizable curable compound or a free radically polymerizable curable compound. Examples of cationically polymerizable curable compounds include epoxy compounds (compounds having one or more epoxy groups in the molecule), or cyclohexane compounds (compounds having one or more cyclohexane rings in the molecule), or combinations thereof. Examples of free radically polymerizable curable compounds include (meth)acrylic compounds (compounds having one or more (meth)acryloyloxy groups in the molecule), or other vinyl compounds having free radically polymerizable double bonds, or combinations thereof. Cationic polymerizable curable compounds and free radically polymerizable curable compounds may be used together. Active energy ray-curable adhesives usually further contain cationic polymerization initiators and/or free radical polymerization initiators that initiate the curing reaction of the above-mentioned curable compounds.
貼合偏光片與保護膜時,為了提高接著性,故可於該等至少任一者之貼合面實施表面活化處理。表面活化處理可舉出電暈處理、電漿處理、放電處理(輝光放電處理等)、火炎處理、臭氧處理、UV臭氧處理、電離活性線處理(紫外線處理、電子線處理等)之類之乾式處理;使用水或丙酮等溶劑之超音波處理、皂化處理、底塗處理之類之濕式處理。該等表面活化處理可單獨進行或組合2種以上。 When laminating the polarizer and the protective film, in order to improve the adhesion, a surface activation treatment can be performed on the laminating surface of at least one of them. The surface activation treatment can include dry treatments such as corona treatment, plasma treatment, discharge treatment (fluorescence discharge treatment, etc.), flame treatment, ozone treatment, UV ozone treatment, ionizing active ray treatment (ultraviolet ray treatment, electron beam treatment, etc.); wet treatments such as ultrasonic treatment using solvents such as water or acetone, saponification treatment, and primer treatment. These surface activation treatments can be performed alone or in combination of two or more.
於偏光片兩面貼合保護膜時,用以貼合該等保護膜之接著劑可為同種接著劑或異種接著劑。 When the protective films are laminated on both sides of the polarizer, the adhesives used to laminate the protective films can be the same adhesive or different adhesives.
本發明之光學積層體可為於偏光片10經介黏著劑14直接積層高位相差膜之構成。此時可省略第2保護膜12。
The optical laminate of the present invention can be a structure in which a high phase difference film is directly laminated on the
<高位相差膜13>
<High
本發明之光學積層體具有為了確保透過偏光太陽眼鏡之視覺確認性之高位相差膜13。高位相差膜13為具有雙折射性之透明熱塑性樹脂膜所構成。本說明書中,「高位相差」是指波長550nm中的面內位相差值Re[550]為3000nm以上。高位相差膜13在波長550nm中的面內位相差值Re[550]較佳為3000nm以上,又更佳為5000nm以上,特佳為7000nm以上。高位相差膜13之面內位相差Re[550]上限值為30000nm。藉由使用如此的膜而可抑制透過偏光太陽眼鏡視覺確認液晶顯示裝置時因應視角之色相變化。
The optical multilayer of the present invention has a high
高位相差膜13例如可藉由延伸熱塑性樹脂膜而得。具體熱塑性樹脂可舉出聚乙烯、聚丙烯等聚烯烴系樹脂;降莰烯系聚合物等環狀聚烯烴系樹脂;聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂;(甲基)丙烯酸、聚(甲基)丙烯酸甲酯等(甲基)丙烯酸系樹脂;三乙酸纖維素、二乙酸纖維素及乙酸丙酸纖維素等纖維素酯系樹脂;聚乙烯醇及聚乙酸乙烯酯等乙烯醇系樹脂;聚碳酸酯系樹脂;聚苯乙烯系樹脂;聚芳酯系樹脂;聚碸系樹脂;聚醚碸系樹脂;聚醯胺系樹脂;聚醯亞胺系樹脂;聚醚酮系樹脂;聚苯硫醚系樹脂;聚苯醚系樹脂、及該等之混合物、共聚物等。以
易獲得性或透明性之觀點來看,較佳為聚對苯二甲酸乙二酯、纖維素酯、環狀烯烴系樹脂或聚碳酸酯。
The high
藉由對於該等熱塑性樹脂進行單軸或雙軸之熱延伸處理而形成具有所求位相差值的膜即可。延伸倍率通常為1.1至6倍,較佳為1.1至4倍。 The thermoplastic resins can be subjected to uniaxial or biaxial heat stretching to form a film with the desired phase difference. The stretching ratio is usually 1.1 to 6 times, preferably 1.1 to 4 times.
又,較佳為使用可以輥對輥(roll-to-roll)製造之方式在斜方向延伸之方法。斜方向延伸方法只要可連續地將配向軸傾斜於所求角度者,則無特別限定,可採用習知延伸方法。如此延伸方法可舉例如日本特開昭50-83482號公報或日本特開平2-113920號公報所記載方法。藉由延伸於膜賦予位相差性時,延伸後厚度係藉由延伸前厚度或延伸倍率而決定。 Furthermore, it is preferable to use a method that can be stretched in an oblique direction by roll-to-roll manufacturing. The oblique stretching method is not particularly limited as long as the alignment axis can be continuously tilted to the desired angle, and a known stretching method can be adopted. Such a stretching method can be exemplified by the method described in Japanese Patent Publication No. 50-83482 or Japanese Patent Publication No. 2-113920. When the film is given a phase difference by stretching, the thickness after stretching is determined by the thickness before stretching or the stretching ratio.
高位相差膜13之慢軸與偏光片10之吸收軸的夾角角度為40°至50°,更佳為42°至48°,特佳為約45°。藉此可抑制透過偏光太陽眼鏡視覺確認液晶顯示裝置時正面輝度的降低。
The angle between the slow axis of the high
高位相差膜13之厚度較佳為200μm以下,更佳為150μm以下,特佳為100μm以下。藉由使高位相差膜13之厚度為200μm以下,而可抑制光學積層體100之捲曲,可抑制貼合於液晶顯示裝置時有氣泡等不良。高位相差膜13之厚度可為10μm以上,也可為30μm以上。
The thickness of the high
將光學積層體100設置於液晶顯示裝置之液晶單元的視覺確認者側,藉此可在不需其他高位相差的膜下,可抑制通過偏光太陽眼鏡視覺確認液晶顯示裝置時視覺確認性的降低。具體而言可抑制正面輝度降低、及因應視角之色相變化(顏色偏移)。高位相差膜13中可視需要積層硬塗層或防眩層。
The
<黏著劑層14>
<
黏著劑層14為積層偏光板1與高位相差膜13者。黏著劑層14可用以(甲基)丙烯酸系樹脂、橡膠系樹脂、胺甲酸乙酯系樹脂、酯系樹脂、聚矽氧系樹脂、聚乙烯醚系樹脂之類之樹脂為主成分之黏著劑組成物構成。其中較佳為以透明性、耐候性、耐熱性等優異之(甲基)丙烯酸系樹脂為基礎聚合物之黏著劑組成物。黏著劑組成物可為活性能量線硬化型或熱硬化型。黏著劑層之厚度通常為3至30μm,較佳為3至25μm。
The
黏著劑組成物所使用(甲基)丙烯酸系樹脂(基礎聚合物)適合使用例如以(甲基)丙烯酸丁酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯之類之(甲基)丙烯酸酯之1種或2種以上為單體之聚合物或共聚物。基礎聚合物中較佳為共聚極性單體。極性單體可舉例如(甲基)丙烯酸、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸羥基乙酯、(甲基)丙烯醯胺、(甲基)丙烯酸N、N-二甲胺基乙酯、(甲基)丙烯酸環氧丙酯之類之具有羧基、羥基、醯胺基、胺基、環氧基等之單體。 The (meth)acrylic resin (base polymer) used in the adhesive composition is suitable for using a polymer or copolymer with one or more (meth)acrylates such as butyl (meth)acrylate, ethyl (meth)acrylate, isooctyl (meth)acrylate, 2-ethylhexyl (meth)acrylate as monomers. The base polymer is preferably a copolymerized polar monomer. Examples of polar monomers include monomers having carboxyl, hydroxyl, amide, amino, epoxy, etc., such as (meth)acrylic acid, 2-hydroxypropyl (meth)acrylate, hydroxyethyl (meth)acrylate, (meth)acrylamide, N, N-dimethylaminoethyl (meth)acrylate, and glycidyl (meth)acrylate.
黏著劑組成物可為僅含有上述基礎聚合物者,但通常進一步含有交聯劑。交聯劑可舉例如2價以上金屬離子且在羧基之間形成羧酸金屬鹽者;多胺化合物且在羧基之間形成醯胺鍵結者;聚環氧化合物或多元醇且在羧基之間形成酯鍵者;聚異氰酸酯化合物且在羧基之間形成醯胺鍵結者。其中較佳為聚異氰酸酯化合物。 The adhesive composition may contain only the above-mentioned base polymer, but usually further contains a crosslinking agent. Examples of the crosslinking agent include metal ions with a valence of two or more and forming carboxyl metal salts between carboxyl groups; polyamine compounds and forming amide bonds between carboxyl groups; polyepoxide compounds or polyols and forming ester bonds between carboxyl groups; polyisocyanate compounds and forming amide bonds between carboxyl groups. Polyisocyanate compounds are preferred.
黏著劑層14之儲藏彈性模數在頻率1Hz、溫度23℃中較佳為0.001至0.350MPa,更佳為0.001至0.200MPa,又更佳為0.001至0.100MPa,特佳為0.010至0.100MPa。儲藏彈性模數若超過前述範圍,
則高溫環境下的高位相差膜13之收縮應力緩和不充分,會誘發第1保護膜11的應變並使無偏光太陽眼鏡之一般視覺確認性降低。又,低於前述範圍則會產生高溫環境下的剝離等問題。
The storage elastic modulus of the
黏著劑層14之厚度較佳為5至200μm,更佳為7至100μm,又更佳為8至80μm,特佳為10至50μm。
The thickness of the
<顯示裝置> <Display device>
本發明之光學積層體可經介黏著劑15積層於液晶單元,並構成液晶表裝置。黏著劑15可使用黏著劑14所記載之上述組成、特性、及厚度者,可與黏著劑層14相同或相異。
The optical multilayer of the present invention can be laminated on the liquid crystal unit via the adhesive 15 to form a liquid crystal display device. The adhesive 15 can use the above-mentioned composition, characteristics, and thickness recorded in the adhesive 14, and can be the same as or different from the
<前面板> <Front panel>
光學積層體100可於其視覺確認側表面配置前面板而使用。前面板可經介接著層而積層於光學積層體100。接著層可舉例如前述黏著劑層或接著劑層。圖2為表示在光學積層體100之視覺確認側表面配置前面板4之積層體構成的剖面圖。如圖2所示,前面板4可在光學積層體100中的高位相差膜13上經介黏著劑層16而積層。
The
前面板可舉出在玻璃、樹脂膜之至少一面含有硬塗層所成者等。玻璃例如可使用高透過玻璃或強化玻璃。尤其在使用薄透明面材時較佳為實施化學強化的玻璃。玻璃厚度例如可為100μm至5mm。 The front panel may be made of glass or a resin film with a hard coating on at least one side. For example, high-transmittance glass or reinforced glass may be used. In particular, when using a thin transparent surface material, chemically reinforced glass is preferred. The glass thickness may be, for example, 100 μm to 5 mm.
於樹脂膜至少一面含有硬塗層所成的前面板並非如現有玻璃為硬直,而可具有可撓特性。硬塗層厚度無特別限定,例如可為5至100μm。 The front panel having a hard coating layer on at least one side of the resin film is not rigid like the existing glass, but can have flexible properties. The thickness of the hard coating layer is not particularly limited, for example, it can be 5 to 100μm.
樹脂膜可為具有含有降莰烯或多環降莰烯系單體之類之環烯烴之單體單元的環烯烴系衍生物、纖維素(二乙酸纖維素、三乙酸纖維素、乙酸纖維素丁酸酯、異丁酯纖維素、丙醯基纖維素、丁醯基纖維素、乙醯基丙醯基纖維素)乙烯-乙酸乙烯酯共聚物、聚環烯烴、聚酯、聚苯乙烯、聚醯胺、聚醚醯亞胺、聚丙烯酸酯、聚醯亞胺、聚醯胺醯亞胺、聚醚碸、聚碸、聚乙烯、聚丙烯、聚甲基戊烯、聚氯乙烯、聚偏二氯乙烯、聚乙烯醇、聚乙烯醇縮乙醛、聚醚酮、聚醚醚酮、聚甲基丙烯酸甲酯、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚碳酸酯、聚胺甲酸乙酯、環氧基等高分子所形成的膜。樹脂膜可使用未延伸、單軸或雙軸延伸膜。該等高分子分別可單獨或混合2種以上使用。樹脂膜較佳為透明性及耐熱性優異之聚醯胺醯亞胺膜或聚醯亞胺膜、單軸或雙軸延伸聚酯膜、透明性及耐熱性優異且可對應膜的大型化之環烯烴系衍生物膜、聚甲基丙烯酸甲酯膜、及透明性與無光學性異向性之三乙酸纖維素及異丁酯纖維素膜。樹脂膜厚度可為5至200μm,較佳為20至100μm。 The resin film may be a cycloolefin derivative having a monomer unit containing a cycloolefin such as norbornene or a polycyclic norbornene monomer, cellulose (cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, isobutyl cellulose, propylene cellulose, butyryl cellulose, acetylacetyl cellulose), ethylene-vinyl acetate copolymer, polycycloolefin, polyester, polystyrene, polyamide, polyetherimide, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, polyvinyl acetate, Films formed from polymers such as acrylate, polyimide, polyamide imide, polyether sulfone, polysulfone, polyethylene, polypropylene, polymethylpentene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polyvinyl acetal, polyether ketone, polyether ether ketone, polymethyl methacrylate, polyethylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyurethane, and epoxy. The resin film may be an unstretched, uniaxially or biaxially stretched film. These polymers may be used alone or in combination of two or more. The resin film is preferably a polyamide imide film or polyimide film with excellent transparency and heat resistance, a uniaxially or biaxially stretched polyester film, a cycloolefin derivative film with excellent transparency and heat resistance and capable of supporting large-scale film, a polymethyl methacrylate film, and a transparent cellulose triacetate and isobutyl cellulose film with no optical anisotropy. The thickness of the resin film can be 5 to 200 μm, preferably 20 to 100 μm.
硬塗組成物含有照射光或熱能量而形成交聯構造之反應性材料,使該硬塗組成物硬化,藉此可形成前述硬塗層。可藉由同時含有光硬化型(甲基)丙烯酸酯單體、或寡聚物及光硬化型環氧基單體、或寡聚物之硬塗組成物的硬化,而形成前述硬塗層。前述光硬化型(甲基)丙烯酸酯單體可含有選自由環氧基(甲基)丙烯酸酯、胺甲酸乙酯(甲基)丙烯酸酯及聚酯(甲基)丙烯酸酯所構成之群組中之1種以上。前述環氧基(甲基)丙烯酸酯可相對於環氧化合物與具有(甲基)丙烯醯基之羧酸反應。 The hard coat composition contains a reactive material that forms a cross-linked structure by irradiating light or heat energy, and the hard coat composition is cured to form the aforementioned hard coat layer. The aforementioned hard coat layer can be formed by curing a hard coat composition that contains a photocurable (meth)acrylate monomer or oligomer and a photocurable epoxy monomer or oligomer at the same time. The aforementioned photocurable (meth)acrylate monomer can contain one or more selected from the group consisting of epoxy (meth)acrylate, urethane (meth)acrylate and polyester (meth)acrylate. The aforementioned epoxy (meth)acrylate can react with a carboxylic acid having a (meth)acryloyl group relative to an epoxy compound.
硬塗組成物可進一步含有選自由溶劑、光起始劑及添加劑所構成之群組中之一種以上。添加劑可含有選自由無機奈米粒子、調平劑及穩定劑所構成之群組中之一種以上,此外可進一步含有該技術領域一般使用之各成分,例如抗氧化劑、UV吸收劑、界面活性劑、潤滑劑、防汙劑等。 The hard coating composition may further contain one or more selected from the group consisting of solvents, photoinitiators and additives. The additive may contain one or more selected from the group consisting of inorganic nanoparticles, levelers and stabilizers, and may further contain various components generally used in the technical field, such as antioxidants, UV absorbers, surfactants, lubricants, antifouling agents, etc.
(實施例) (Implementation example)
以下以實施例進一步具體說明本發明,但本發明並不限定於該等例。例中,含有量或使用量表示份及%,在未特別說明下為重量基準。又,以下例中,各物性之測定係用以下方法進行。 The present invention is further described in detail below with examples, but the present invention is not limited to these examples. In the examples, the content or usage amount is expressed in parts and %, and is based on weight unless otherwise specified. In addition, in the following examples, the determination of each physical property is carried out using the following method.
[測定方法] [Measurement method]
(1)膜厚度之測定方法 (1) Film thickness measurement method
使用Nikon股份有限公司製數位測微計之MH-15M測定。 Measured using the MH-15M digital micrometer manufactured by Nikon Corporation.
(2)位相差值之測定方法 (2) Phase difference measurement method
使用位相差測定裝置KOBRA-WPR(王子測量機器股份有限公司製)測定。除非另有說明,位相差值是指波長550nm中的值。 The phase difference measurement device KOBRA-WPR (manufactured by Oji Measuring Instruments Co., Ltd.) was used for measurement. Unless otherwise specified, the phase difference value refers to the value at a wavelength of 550nm.
(3)光彈性係數之測定方法 (3) Determination method of photoelastic coefficient
使用位相差測定裝置KOBRA-WPR(王子測量機器股份有限公司製),一邊夾取樣品(尺寸1.5cm×6cm)兩端施加應力(0.5N至8N),一邊測定樣品中央之位相差值(23℃/波長550nm),由應力及位相差值之函數傾斜而計算。 Using the phase difference measuring device KOBRA-WPR (manufactured by Oji Measuring Instruments Co., Ltd.), the sample (size 1.5cm×6cm) is clamped and stress (0.5N to 8N) is applied at both ends, while the phase difference value (23℃/wavelength 550nm) at the center of the sample is measured and calculated from the functional inclination of stress and phase difference value.
(4)儲藏彈性模數之測定方法: (4) Determination method of storage elastic modulus:
黏著劑層之儲藏彈性模數(G’)係根據以下(I)至(III)而測定。 The storage elastic modulus (G’) of the adhesive layer is measured according to the following (I) to (III).
(I)由黏著劑層以25±1mg分別取出2個試料,分別成型為略球狀。 (I) Take out two samples of 25±1 mg each from the adhesive layer and shape them into a spherical shape.
(II)將上述(I)所得2個試料貼合於I型冶具的上下面,上下面皆以L型冶具夾取。測定試料之構成為L型治具/黏著劑/I型治具/黏著劑/L型冶具。 (II) The two samples obtained in (I) above are attached to the upper and lower surfaces of the I-type jig, and the upper and lower surfaces are clamped by the L-type jig. The structure of the test sample is L-type jig/adhesive/I-type jig/adhesive/L-type jig.
(III)如此製作之試料使用動態黏彈性測定裝置〔DVA-220,IT測量控制股份有限公司製〕在溫度23℃,頻率1Hz,初期應變1N之條件下測定儲藏彈性模數(G’)。 (III) The sample prepared in this way is used to measure the storage elastic modulus (G') at a temperature of 23°C, a frequency of 1 Hz, and an initial strain of 1 N using a dynamic viscoelasticity measuring device [DVA-220, manufactured by IT Measurement & Control Co., Ltd.].
(5)輝度測定方法: (5) Luminance measurement method:
使用topcon股份有限公司製分光放射輝度計SR-UL1測定。又,測定係在2°視野進行。 The measurement was performed using the SR-UL1 spectroradiometer manufactured by Topcon Co., Ltd. The measurement was performed in a 2° field of view.
[製造例1]偏光片1之製作
[Manufacturing Example 1] Manufacturing of
將平均聚合度約2,400、皂化度99.9莫耳%以上之聚乙烯醇所構成的厚度75μm之聚乙烯醇膜以乾式單軸延伸為約5倍,進一步在保持緊張狀態下浸漬於60℃純水1分鐘後,於碘/碘化鉀/水之重量比為0.05/5/100之水溶液在28℃浸漬60秒。其後,於碘化鉀/硼酸/水之重量比為8.5/8.5/100之水溶液在72℃浸漬300秒。接著以26℃純水洗淨20秒後,在65℃乾燥,而得於聚乙烯醇吸附配向碘之厚度28μm之偏光片1。
A 75μm thick polyvinyl alcohol film made of polyvinyl alcohol with an average polymerization degree of about 2,400 and a saponification degree of more than 99.9 mol% was stretched to about 5 times in a dry uniaxial manner, and then immersed in 60°C pure water for 1 minute while maintaining tension, and then immersed in an aqueous solution of iodine/potassium iodide/water with a weight ratio of 0.05/5/100 at 28°C for 60 seconds. Thereafter, it was immersed in an aqueous solution of potassium iodide/boric acid/water with a weight ratio of 8.5/8.5/100 at 72°C for 300 seconds. Then, it was washed with 26°C pure water for 20 seconds and dried at 65°C to obtain a 28μm
[製造例2]偏光片2之製作 [Manufacturing Example 2] Manufacturing of Polarizer 2
將平均聚合度約2,400、皂化度99.9莫耳%以上之聚乙烯醇所構成的厚度50μm之聚乙烯醇膜以乾式單軸延伸為約5倍,進一步在保持緊張狀態下浸漬於60℃純水1分鐘後,於碘/碘化鉀/水之重量比為0.05/5/100之 水溶液在28℃浸漬60秒。其後,於碘化鉀/硼酸/水之重量比為8.5/8.5/100之水溶液在72℃浸漬300秒。接著以26℃純水洗淨20秒後,在65℃乾燥,而得於聚乙烯醇吸附配向碘之厚度18μm之偏光片2。 A 50μm thick polyvinyl alcohol film made of polyvinyl alcohol with an average polymerization degree of about 2,400 and a saponification degree of more than 99.9 mol% was stretched to about 5 times in a dry uniaxial manner, and then immersed in 60°C pure water for 1 minute while maintaining tension, and then immersed in an aqueous solution of iodine/potassium iodide/water with a weight ratio of 0.05/5/100 at 28°C for 60 seconds. Thereafter, it was immersed in an aqueous solution of potassium iodide/boric acid/water with a weight ratio of 8.5/8.5/100 at 72°C for 300 seconds. Then, it was washed with pure water at 26°C for 20 seconds and dried at 65°C to obtain a polarizer 2 with a thickness of 18μm with iodine adsorbed and aligned on polyvinyl alcohol.
[保護膜之準備] [Preparation of protective film]
保護膜A: Protective film A:
厚度40μm之三乙酸纖維素膜〔KONICA MINOLTA OPTO股份有限公司製商品名「KC4UYW」〕。 Cellulose triacetate membrane with a thickness of 40μm [KC4UYW manufactured by KONICA MINOLTA OPTO Co., Ltd.].
保護膜B: Protective film B:
將日本特開2010-284840號公報之製造例1所述之醯亞胺化MS樹脂顆粒(重量平均分子量:105,000)100重量份以100.5kPa、100℃乾燥12小時,於單軸擠出機以模溫度270℃從T模擠出並成型為膜狀(厚度160μm)。進一步將該膜在其搬送方向於150℃環境下延伸(厚度80μm),接著於與膜搬送方向直交方向於150℃環境下延伸,而得厚度40μm之保護膜B((甲基)丙烯酸系樹脂膜)。保護膜B在波長550nm中的面內位相差值Re為0.5nm,厚度方向之位相差值Rth為0.82nm。所得膜之光彈性係數為2.0×10-12Pa-1。 100 parts by weight of imidized MS resin particles (weight average molecular weight: 105,000) described in Production Example 1 of Japanese Patent Publication No. 2010-284840 were dried at 100.5 kPa and 100°C for 12 hours, extruded from a T die at a die temperature of 270°C in a uniaxial extruder and formed into a film (thickness 160 μm). The film was further stretched in an environment of 150°C in its conveying direction (thickness 80 μm), and then stretched in an environment of 150°C in a direction orthogonal to the film conveying direction, to obtain a protective film B ((meth) acrylic resin film) with a thickness of 40 μm. The in-plane phase difference Re of the protective film B at a wavelength of 550 nm was 0.5 nm, and the phase difference Rth in the thickness direction was 0.82 nm. The photoelastic coefficient of the obtained film was 2.0×10 -12 Pa -1 .
保護膜C: Protective film C:
相對於保護膜B,除了將醯亞胺化MS樹脂顆粒取代為日本特開2008-191426之比較例1所述之丙烯酸系共聚物之透明顆粒以外,以相同方式獲得厚度為40μm之保護膜C((甲基)丙烯酸系樹脂膜)。保護膜C在波長550nm中的面內位相差值Re為0.8nm,厚度方向之位相差值Rth為1.02nm。所得膜之光彈性係數為2.1×10-12Pa-1。 A protective film C ((meth) acrylic resin film) with a thickness of 40 μm was obtained in the same manner as protective film B, except that the imidized MS resin particles were replaced with transparent particles of an acrylic copolymer described in Comparative Example 1 of Japanese Patent Application Laid-Open No. 2008-191426. The in-plane phase difference Re of protective film C at a wavelength of 550 nm was 0.8 nm, and the phase difference Rth in the thickness direction was 1.02 nm. The photoelastic coefficient of the obtained film was 2.1×10 -12 Pa -1 .
保護膜D: Protective film D:
相對於保護膜B,除了將醯亞胺化MS樹脂顆粒取代為日本特開2008-191426之實施例1所述之丙烯酸系共聚物之透明顆粒以外,以相同方式獲得厚度為40μm之保護膜D((甲基)丙烯酸系樹脂膜)。保護膜D在波長550nm中的面內位相差值Re為0.4nm,厚度方向之位相差值Rth為0.73nm。所得膜之光彈性係數為1.3×10-12Pa-1。 In contrast to protective film B, a protective film D ((meth)acrylic resin film) with a thickness of 40 μm was obtained in the same manner except that the imidized MS resin particles were replaced with transparent particles of an acrylic copolymer described in Example 1 of Japanese Patent Application Laid-Open No. 2008-191426. The in-plane phase difference Re of protective film D at a wavelength of 550 nm was 0.4 nm, and the phase difference Rth in the thickness direction was 0.73 nm. The photoelastic coefficient of the obtained film was 1.3×10 -12 Pa -1 .
保護膜E: Protective film E:
厚度23μm之降莰烯系樹脂膜〔日本ZEON股份有限公司製商品名「ZF14-023」〕。保護膜E在波長550nm中的面內位相差值Re為0.7nm,厚度方向之位相差值Rth為4.2nm。光彈性係數為1.6×10-12Pa-1。 A 23μm thick norbornene resin film [ZF14-023 manufactured by ZEON Co., Ltd., Japan]. The in-plane phase difference Re of the protective film E at a wavelength of 550nm is 0.7nm, and the phase difference Rth in the thickness direction is 4.2nm. The photoelastic coefficient is 1.6×10 -12 Pa -1 .
保護膜F: Protective film F:
相對於國際公開2017/094485之製造例3所述經斜方向延伸之1/4波長板A1,除了延伸方向為長方向以外,以相同方式製作輥狀之1/4波長板。該1/4波長板(保護膜F)之厚度為35μm,慢軸為長方向,面內位相差值Re為136nm。又,所得膜之光彈性係數為4.0×10-12Pa-1。 Compared with the 1/4 wavelength plate A1 stretched in an oblique direction as described in Manufacturing Example 3 of International Publication No. 2017/094485, a rolled 1/4 wavelength plate was prepared in the same manner except that the stretching direction was the long direction. The thickness of the 1/4 wavelength plate (protective film F) was 35 μm, the slow axis was the long direction, and the in-plane phase difference Re was 136 nm. In addition, the photoelastic coefficient of the obtained film was 4.0×10 -12 Pa -1 .
保護膜G: Protective film G:
相對於國際公開2017/094485之製造例5所述之經斜方向延伸之1/4波長板B4,除了延伸方向為長方向以外,以相同方式製作輥狀之1/4波長板。該1/4波長板(保護膜G)之厚度為47μm,慢軸為長方向,面內位相差值Re為140nm。又,所得膜之光彈性係數為6.0×10-12Pa-1。 Compared with the obliquely extended 1/4 wavelength plate B4 described in Manufacturing Example 5 of International Publication No. 2017/094485, a rolled 1/4 wavelength plate was produced in the same manner except that the extending direction was the long direction. The thickness of the 1/4 wavelength plate (protective film G) was 47 μm, the slow axis was the long direction, and the in-plane phase difference Re was 140 nm. In addition, the photoelastic coefficient of the obtained film was 6.0×10 -12 Pa -1 .
保護膜H: Protective film H:
厚度20μm之三乙酸纖維素膜〔FUJIFILM股份有限公司製商品名「ZRG20SL」〕。保護膜H在波長550nm中的面內位相差值Re為1.1nm,厚度方向之位相差值Rth為1.3nm。光彈性係數為9.4×10-12Pa-1。 Thick 20μm cellulose triacetate film [product name "ZRG20SL" manufactured by FUJIFILM Co., Ltd.]. The in-plane phase difference Re of the protective film H at a wavelength of 550nm is 1.1nm, and the phase difference Rth in the thickness direction is 1.3nm. The photoelastic coefficient is 9.4×10 -12 Pa -1 .
[接著劑之調製] [Preparation of follow-up agent]
將含有乙醯乙醯基之改質PVA系樹脂(三菱化學股份有限公司製:GOHSENX Z-410)50g溶解於950g純水,在90℃加熱2小時後冷卻至常溫,而得PVA溶液A。 Dissolve 50g of modified PVA resin containing acetyl group (GOHSENX Z-410 manufactured by Mitsubishi Chemical Co., Ltd.) in 950g of pure water, heat at 90℃ for 2 hours and then cool to room temperature to obtain PVA solution A.
接著以各化合物成為下述濃度之方式摻配前述PVA溶液A、順丁烯二酸、乙二醛、純水,而調製PVA系接著劑。 Then, the aforementioned PVA solution A, maleic acid, glyoxal, and pure water are mixed in such a way that each compound has the following concentrations to prepare a PVA-based adhesive.
[準備高位相差膜] [Preparing high phase difference film]
使用東洋紡股份有限公司製COSMOSHINE SRF(Super Retardation Film)(厚度80μm)。面內位相差值Re[550]為8400nm。 COSMOSHINE SRF (Super Retardation Film) (thickness 80μm) manufactured by Toyobo Co., Ltd. was used. The in-plane phase difference value Re[550] is 8400nm.
[準備黏著劑] [Prepare adhesive]
黏著劑A:市售厚度15μm之薄片狀丙烯酸系黏著劑(儲藏彈性模數0.06MPa) Adhesive A: Commercially available 15μm thick sheet-like acrylic adhesive (storage elastic modulus 0.06MPa)
黏著劑B:市售厚度25μm之薄片狀丙烯酸系黏著劑(儲藏彈性模數0.06MPa) Adhesive B: Commercially available 25μm thick sheet-like acrylic adhesive (storage elastic modulus 0.06MPa)
[實施例1] [Implementation Example 1]
於製造例1所得偏光片1單面塗佈接著劑A並貼合保護膜A(第2保護膜),於偏光片另一面塗佈接著劑A並貼合保護膜B(第1保護膜)。其後乾燥而得偏光板A。又,貼合該等材料時可於各材料之貼合面實施電暈處理。
Adhesive A is applied to one side of the
於高位相差膜單面貼合黏著劑A。又,貼合該等材料時可於各材料之貼合面實施電暈處理。 Adhesive A is applied to one side of the high phase difference film. In addition, when attaching these materials, a corona treatment can be performed on the bonding surface of each material.
將如此製作之偏光板之保護膜A面與高位相差膜之黏著劑面以偏光片之吸收軸與高位相差膜之慢軸的夾角角度θ成為45°之方式貼合,而製作光學積層體A。又,貼合該等材料時可於各材料之貼合面實施電暈處理。 The protective film A surface of the polarizing plate and the adhesive surface of the high phase difference film are bonded together in such a way that the angle θ between the absorption axis of the polarizing plate and the slow axis of the high phase difference film becomes 45°, thereby manufacturing the optical laminate A. In addition, when bonding these materials, the bonding surfaces of each material can be subjected to a corona treatment.
最後於所得光學積層體A之保護膜B面貼合黏著劑B。又,貼合該等材料時可於各材料之貼合面實施電暈處理。 Finally, adhesive B is bonded to the protective film B surface of the obtained optical laminate A. In addition, when bonding these materials, corona treatment can be performed on the bonding surface of each material.
[實施例2至8及比較例1] [Examples 2 to 8 and Comparative Example 1]
相對於上述實施例1所製作之光學積層體A,除了使用表1所述之第1保護膜及/或偏光片以外,係以與實施例1相同方式製作貼合有黏著劑B之光學積層體B至I(實施例2至8及比較例1)。 Compared to the optical laminate A prepared in the above-mentioned Example 1, in addition to using the first protective film and/or polarizer described in Table 1, optical laminates B to I (Examples 2 to 8 and Comparative Example 1) bonded with adhesive B are prepared in the same manner as in Example 1.
[參考例1] [Reference Example 1]
相對於上述實施例1之附有黏著劑B之光學積層體A,除了以使偏光板之吸收軸與高位相差膜之慢軸之夾角成為90°之方式貼合以外,以相同方式製作附有黏著劑B之光學積層體J(參考例1)。 Compared to the optical laminate A with adhesive B in the above-mentioned Example 1, an optical laminate J with adhesive B is prepared in the same manner except that the absorption axis of the polarizing plate and the slow axis of the high phase difference film are bonded so that the angle between them becomes 90° (reference example 1).
[參考例2] [Reference Example 2]
製造例1所得偏光片單面塗佈接著劑A並貼合保護膜A,於偏光片另一面塗佈接著劑A並貼合保護膜H。其後乾燥而得偏光板K。又,貼合該等材料時可於各材料之貼合面實施電暈處理。 The polarizer obtained in Manufacturing Example 1 is coated with adhesive A on one side and laminated with protective film A, and the other side of the polarizer is coated with adhesive A and laminated with protective film H. After drying, a polarizing plate K is obtained. In addition, when laminating these materials, a corona treatment can be performed on the laminating surface of each material.
於所得光學積層體K之保護膜H面貼合黏著劑B,而得附黏著劑層之內面偏光板。又,貼合該等材料時可於各材料之貼合面實施電暈處理。 Adhesive B is bonded to the protective film H surface of the obtained optical laminate K to obtain an inner polarizing plate with an adhesive layer. In addition, when bonding these materials, a corona treatment can be performed on the bonding surface of each material.
(評估用樣品A之製作) (Preparation of sample A for evaluation)
將附有黏著劑B之光學積層體A裁切為20mm×20mm之大小,經介黏著劑B貼合於厚度0.7mm、30mm×30mm之大小之無鹼玻璃。將附有黏著劑B之光學積層體K(無貼合高位相差膜)裁切為20mm×20mm之大小,在上述無鹼玻璃未貼合光學積層體A側,以偏光板之吸收軸互相成為正交偏光鏡之方式經介黏著劑B貼合光學積層體K,而製作評估用樣品A。 The optical laminate A with adhesive B was cut into a size of 20mm×20mm, and was bonded to an alkali-free glass with a thickness of 0.7mm and a size of 30mm×30mm via adhesive B. The optical laminate K with adhesive B (without high phase difference film bonded) was cut into a size of 20mm×20mm, and was bonded to the side of the alkali-free glass where the optical laminate A was not bonded via adhesive B in such a way that the absorption axes of the polarizing plates formed orthogonal polarizers, thereby producing the evaluation sample A.
(評估用樣品B至K之製作) (Preparation of evaluation samples B to K)
相對於評估用樣品A,除了將光學積層體A分別取代為光學積層體B至K以外,以相同方式製作評估用樣品B至K。 Evaluation samples B to K were prepared in the same manner as evaluation sample A, except that optical laminate A was replaced by optical laminates B to K, respectively.
(黑輝度變化之評估) (Evaluation of blackness change)
將上述所製作評估用樣品A至K之光學積層體K貼合側至於20000cd/m2之輝度之白色背光模組之照射面,由評估樣品側(高位相差膜)側測定輝度(黑輝度1)後,在溫度95℃之加熱環境下保管240小時後,冷卻至常溫後再次測定輝度(黑輝度2),計算黑輝度2相對於黑輝度1之變化率(%),而作為黑輝度變化。
The optical multilayer K of the evaluation samples A to K prepared above was bonded to the irradiation surface of a white backlight module with a brightness of 20000 cd/ m2 . The brightness (black brightness 1) was measured from the evaluation sample side (high phase difference film) side. After being stored in a heated environment at a temperature of 95°C for 240 hours, the brightness (black brightness 2) was measured again after being cooled to room temperature. The change rate (%) of black brightness 2 relative to
具體而言為: Specifically:
黑輝度變化(%)={|黑輝度2-黑輝度1|/黑輝度1}×100
Darkness change (%) = {|Darkness 2 -
藉此求黑輝度變化。評估結果示於表1。 This is used to determine the change in blackness. The evaluation results are shown in Table 1.
由表1所示結果可知: From the results shown in Table 1, we can see that:
1.將高位相差膜45°貼合之光學積層體在高溫耐久試驗後黑輝度會上升,但藉由使用光彈性係數為8.0×10-12Pa-1以下之第1保護膜,可抑制高溫耐久試驗後之黑輝度上升。 1. The black brightness of the optical multilayer body with high retardation film laminated at 45° will increase after the high temperature durability test. However, by using the first protective film with a photoelastic coefficient of 8.0×10 -12 Pa -1 or less, the increase in black brightness after the high temperature durability test can be suppressed.
2.除此之外,藉由使偏光片之厚度為20μm以下(採用偏光片2),而可進一步抑制高溫耐久試驗後之黑輝度上升。 2. In addition, by making the thickness of the polarizer less than 20μm (using polarizer 2), the increase in black brightness after the high-temperature durability test can be further suppressed.
1:偏光板 1: Polarizing plate
4:前面板 4:Front panel
10:偏光片 10: Polarizer
11:第1保護膜 11: 1st protective film
12:第2保護膜 12: Second protective film
13:高位相差膜 13: High phase difference film
14、15、16:黏著劑層 14, 15, 16: Adhesive layer
100:光學積層體 100: Optical multilayers
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