TWI843699B - Sealing sheet - Google Patents
Sealing sheet Download PDFInfo
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- TWI843699B TWI843699B TW107110684A TW107110684A TWI843699B TW I843699 B TWI843699 B TW I843699B TW 107110684 A TW107110684 A TW 107110684A TW 107110684 A TW107110684 A TW 107110684A TW I843699 B TWI843699 B TW I843699B
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- TW
- Taiwan
- Prior art keywords
- film
- resin composition
- sealing sheet
- mass
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- Prior art date
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- 238000007789 sealing Methods 0.000 title claims abstract description 111
- 239000011342 resin composition Substances 0.000 claims abstract description 97
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 74
- 230000035699 permeability Effects 0.000 claims abstract description 32
- 239000010408 film Substances 0.000 claims description 282
- 229910001701 hydrotalcite Inorganic materials 0.000 claims description 71
- 229960001545 hydrotalcite Drugs 0.000 claims description 71
- 229920005989 resin Polymers 0.000 claims description 62
- 239000011347 resin Substances 0.000 claims description 62
- 239000003822 epoxy resin Substances 0.000 claims description 46
- 229920000647 polyepoxide Polymers 0.000 claims description 46
- 230000004888 barrier function Effects 0.000 claims description 34
- 125000003700 epoxy group Chemical group 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 19
- 229920006255 plastic film Polymers 0.000 claims description 16
- 239000002985 plastic film Substances 0.000 claims description 16
- 239000013039 cover film Substances 0.000 claims description 6
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 claims 1
- 239000010410 layer Substances 0.000 description 157
- PWZFXELTLAQOKC-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide;tetrahydrate Chemical compound O.O.O.O.[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O PWZFXELTLAQOKC-UHFFFAOYSA-A 0.000 description 72
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 229920000139 polyethylene terephthalate Polymers 0.000 description 24
- 239000005020 polyethylene terephthalate Substances 0.000 description 24
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 21
- 239000000203 mixture Substances 0.000 description 21
- 239000000126 substance Substances 0.000 description 21
- 229920001577 copolymer Polymers 0.000 description 20
- -1 polyethylene terephthalate Polymers 0.000 description 20
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 150000008064 anhydrides Chemical group 0.000 description 18
- 229920005672 polyolefin resin Polymers 0.000 description 18
- 238000010521 absorption reaction Methods 0.000 description 17
- 239000002966 varnish Substances 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 15
- 229920001296 polysiloxane Polymers 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 238000001035 drying Methods 0.000 description 13
- 239000006087 Silane Coupling Agent Substances 0.000 description 12
- 239000011888 foil Substances 0.000 description 12
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 11
- 125000004018 acid anhydride group Chemical group 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- 150000001336 alkenes Chemical class 0.000 description 7
- 229920000180 alkyd Polymers 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 7
- 230000009467 reduction Effects 0.000 description 7
- 229920006395 saturated elastomer Polymers 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 229920005680 ethylene-methyl methacrylate copolymer Polymers 0.000 description 6
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical group CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 6
- 239000004848 polyfunctional curative Substances 0.000 description 6
- 239000012756 surface treatment agent Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229920005675 propylene-butene random copolymer Polymers 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 150000001343 alkyl silanes Chemical class 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 229920006287 phenoxy resin Polymers 0.000 description 4
- 239000013034 phenoxy resin Substances 0.000 description 4
- 229920001083 polybutene Polymers 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 238000000634 powder X-ray diffraction Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- AKSROGHADDORBX-UHFFFAOYSA-M 2-acetamidoacetate;tetrabutylphosphanium Chemical compound CC(=O)NCC([O-])=O.CCCC[P+](CCCC)(CCCC)CCCC AKSROGHADDORBX-UHFFFAOYSA-M 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 3
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000001110 calcium chloride Substances 0.000 description 3
- 229910001628 calcium chloride Inorganic materials 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229920006132 styrene block copolymer Polymers 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 3
- FWXNJWAXBVMBGL-UHFFFAOYSA-N 9-n,9-n,10-n,10-n-tetrakis(4-methylphenyl)anthracene-9,10-diamine Chemical compound C1=CC(C)=CC=C1N(C=1C2=CC=CC=C2C(N(C=2C=CC(C)=CC=2)C=2C=CC(C)=CC=2)=C2C=CC=CC2=1)C1=CC=C(C)C=C1 FWXNJWAXBVMBGL-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKJIRPAQVSHGFK-UHFFFAOYSA-N N-acetylglycine Chemical compound CC(=O)NCC(O)=O OKJIRPAQVSHGFK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- WSFMFXQNYPNYGG-UHFFFAOYSA-M dimethyl-octadecyl-(3-trimethoxysilylpropyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCC[Si](OC)(OC)OC WSFMFXQNYPNYGG-UHFFFAOYSA-M 0.000 description 2
- 150000002118 epoxides Chemical group 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 239000002608 ionic liquid Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 238000007348 radical reaction Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000013557 residual solvent Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 238000002411 thermogravimetry Methods 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 1H-imidazole silane Chemical compound [SiH4].N1C=NC=C1 ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 0.000 description 1
- XUZIWKKCMYHORT-UHFFFAOYSA-N 2,4,6-tris(diaminomethyl)phenol Chemical compound NC(N)C1=CC(C(N)N)=C(O)C(C(N)N)=C1 XUZIWKKCMYHORT-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- UHKPXKGJFOKCGG-UHFFFAOYSA-N 2-methylprop-1-ene;styrene Chemical compound CC(C)=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 UHKPXKGJFOKCGG-UHFFFAOYSA-N 0.000 description 1
- AWQFNUMHFNEWGS-UHFFFAOYSA-N 2-methylprop-1-ene;styrene Chemical group CC(C)=C.C=CC1=CC=CC=C1 AWQFNUMHFNEWGS-UHFFFAOYSA-N 0.000 description 1
- FWGGRLNXGGINBY-UHFFFAOYSA-N 3-[2-aminoethyl(dimethoxymethyl)silyl]propan-1-amine Chemical compound COC(OC)[SiH](CCN)CCCN FWGGRLNXGGINBY-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- CXXSQMDHHYTRKY-UHFFFAOYSA-N 4-amino-2,3,5-tris(oxiran-2-ylmethyl)phenol Chemical compound C1=C(O)C(CC2OC2)=C(CC2OC2)C(N)=C1CC1CO1 CXXSQMDHHYTRKY-UHFFFAOYSA-N 0.000 description 1
- NCAVPEPBIJTYSO-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate;2-(oxiran-2-ylmethoxymethyl)oxirane Chemical compound C1OC1COCC1CO1.OCCCCOC(=O)C=C NCAVPEPBIJTYSO-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000013032 Hydrocarbon resin Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910019015 Mg-Ag Inorganic materials 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920002402 Oppanol® B 100 Polymers 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 102000003978 Tissue Plasminogen Activator Human genes 0.000 description 1
- 108090000373 Tissue Plasminogen Activator Proteins 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- NRRUATPEGMDTTE-UHFFFAOYSA-N [SiH4].CO[Si](CCCOC(=O)C=C)(OC)OC Chemical compound [SiH4].CO[Si](CCCOC(=O)C=C)(OC)OC NRRUATPEGMDTTE-UHFFFAOYSA-N 0.000 description 1
- DUYKOAQJUCADEC-UHFFFAOYSA-N [SiH4].N1=NN=CC=C1 Chemical compound [SiH4].N1=NN=CC=C1 DUYKOAQJUCADEC-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical group 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002115 bismuth titanate Inorganic materials 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene group Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
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- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229920006270 hydrocarbon resin Polymers 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical group C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 150000003335 secondary amines Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- DFQPZDGUFQJANM-UHFFFAOYSA-M tetrabutylphosphanium;hydroxide Chemical compound [OH-].CCCC[P+](CCCC)(CCCC)CCCC DFQPZDGUFQJANM-UHFFFAOYSA-M 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- SAWDTKLQESXBDN-UHFFFAOYSA-N triethoxy(heptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)OCC SAWDTKLQESXBDN-UHFFFAOYSA-N 0.000 description 1
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/724—Permeability to gases, adsorption
- B32B2307/7242—Non-permeable
- B32B2307/7246—Water vapor barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/206—Organic displays, e.g. OLED
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2581/00—Seals; Sealing equipment; Gaskets
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Sealing Material Composition (AREA)
Abstract
本發明係提供一種密封用薄片,其係具有第1薄膜、樹脂組成物層及第2薄膜的密封用薄片,其特徵為樹脂組成物層為存在於第1薄膜及第2薄膜之間,第1薄膜及第2薄膜之水蒸氣透過度係各自為1(g/m2 /24hr)以下。The present invention provides a sealing sheet having a first film, a resin composition layer and a second film, wherein the resin composition layer exists between the first film and the second film, and the water vapor permeability of the first film and the second film is respectively less than 1 (g/m 2 /24hr).
Description
本發明係關於適於有機EL元件之密封等的密封用薄片。The present invention relates to a sealing sheet suitable for sealing an organic EL element, etc.
有機EL(Electroluminescence)元件係使用有機物質於發光材料的發光元件,近年成為眾人矚目的焦點。但是,有機EL元件係對水分極弱,有因水分而該亮度降低等之問題。為了自水分保護有機EL元件,所以進行使用具有樹脂組成物層的密封用薄片而密封有機EL元件。Organic EL (Electroluminescence) elements are luminescent elements that use organic substances as luminescent materials, and have become the focus of attention in recent years. However, organic EL elements are extremely weak to moisture, and there are problems such as the brightness being reduced by moisture. In order to protect organic EL elements from moisture, a sealing sheet having a resin composition layer is used to seal the organic EL elements.
密封用薄片係通常,由支撐體、樹脂組成物層、以及用以保護前述樹脂組成物層的覆蓋薄膜所構成(例如,專利文獻1)。The sealing sheet is generally composed of a support, a resin composition layer, and a cover film for protecting the resin composition layer (for example, Patent Document 1).
又,作為提昇密封用薄片之水分遮斷性的方法,已知於密封用薄片之樹脂組成物層調配半燒結水滑石(例如,專利文獻2)。 [先前技術文獻] [專利文獻]In addition, as a method for improving the moisture blocking property of a sealing sheet, it is known to mix semi-sintered hydrotalcite in the resin composition layer of the sealing sheet (for example, Patent Document 2). [Prior Art Document] [Patent Document]
[專利文獻1]日本特開2016-186843號公報 [專利文獻2]國際公開第2017/135112號[Patent Document 1] Japanese Patent Publication No. 2016-186843 [Patent Document 2] International Publication No. 2017/135112
[發明所欲解決之課題][The problem that the invention wants to solve]
於專利文獻1之段落[0015]及[0016]係記載將聚對苯二甲酸乙二酯等之塑膠薄膜、或具有障壁層的塑膠薄膜作為支撐體使用。但是,於該段落[0018]係僅記載「作為密封用薄片之覆蓋薄膜係可舉出與支撐體相同之塑膠薄膜」,未記載將具有障壁層的塑膠薄膜作為覆蓋薄膜使用。Paragraphs [0015] and [0016] of Patent Document 1 state that a plastic film such as polyethylene terephthalate or a plastic film having a barrier layer is used as a support. However, paragraph [0018] of the same patent document states only that "the covering film used as a sealing sheet may be a plastic film that is the same as the support", but does not state that a plastic film having a barrier layer is used as the covering film.
若將不具有障壁層、透濕性高的塑膠薄膜作為密封用薄片之覆蓋薄膜使用,則有於密封用薄片之保管時從覆蓋薄膜透過的水分混入樹脂組成物層的疑慮。該結果,密封用薄片之自水分保護有機EL元件的性能降低,若使用如此的密封用薄片而密封有機EL元件,則有有機EL裝置之壽命變短的疑慮。If a plastic film with high moisture permeability without a barrier layer is used as a cover film for a sealing sheet, there is a possibility that moisture that passes through the cover film will mix into the resin composition layer during storage of the sealing sheet. As a result, the performance of the sealing sheet in protecting the organic EL element from moisture is reduced. If such a sealing sheet is used to seal an organic EL element, there is a possibility that the life of the organic EL device will be shortened.
又,具有含有半燒結水滑石的樹脂組成物層的密封用薄片係可藉由半燒結水滑石而達成高的水分遮斷性,但半燒結水滑石係具有可逆性的吸收及放出水分的性質。因此,在含有半燒結水滑石的樹脂組成物層的密封用薄片係例如於密封用薄片之保管中,半燒結水滑石吸收水分,之後,將已吸收的水分放出至樹脂組成物層。若以包含如此地放出的水分的樹脂組成物層密封有機EL元件,則有有機EL裝置之壽命變短的疑慮。In addition, the sealing sheet having a resin composition layer containing semi-sintered hydrotalcite can achieve high water shielding properties by semi-sintered hydrotalcite, but semi-sintered hydrotalcite has the property of reversibly absorbing and releasing water. Therefore, in the sealing sheet having a resin composition layer containing semi-sintered hydrotalcite, for example, during the storage of the sealing sheet, the semi-sintered hydrotalcite absorbs water and then releases the absorbed water into the resin composition layer. If an organic EL element is sealed with a resin composition layer containing water released in this way, there is a concern that the life of the organic EL device will be shortened.
本發明係著眼於上述般的事情而為者,該目的係在提供可抑制保管時等之樹脂組成物層之吸水(特別是,含有半燒結水滑石的樹脂組成物層之吸水)的密封用薄片。 [用以解決課題之手段]The present invention is made in view of the above-mentioned matters, and its object is to provide a sealing sheet that can suppress water absorption of a resin composition layer (particularly, water absorption of a resin composition layer containing semi-sintered hydrotalcite) during storage. [Means for Solving the Problem]
為了達成上述目的而本發明者為重複專心致力研討的結果,發現藉由使用2片以後述的實施例所記載的方法測定的水蒸氣透過度(water vapour transmission rate,以下有簡稱為「WVTR」之情事)為1(g/m2 /24hr)以下的薄膜(以下有簡稱為「防濕性薄膜」之情事)。於該之間使樹脂組成物層存在,可抑制樹脂組成物層之吸水(特別是,含有半燒結水滑石的樹脂組成物層之吸水)。根據此知識見識的本發明係依照以下所述。As a result of repeated and intensive studies to achieve the above object, the inventors have found that by using two films (hereinafter referred to as "moisture-proof films") having a water vapor transmission rate (hereinafter referred to as "WVTR") of 1 (g/ m2 /24hr) or less as measured by the method described in the examples below, and placing a resin composition layer therebetween, water absorption of the resin composition layer (particularly, water absorption of the resin composition layer containing semi-sintered hydrotalcite) can be suppressed. The present invention based on this knowledge is as follows.
[1] 一種密封用薄片,其係具有第1薄膜、樹脂組成物層及第2薄膜的密封用薄片,其特徵為樹脂組成物層為存在於第1薄膜及第2薄膜之間,第1薄膜及第2薄膜之水蒸氣透過度係各自為1(g/m2 /24hr)以下。[1] A sealing sheet comprising a first film, a resin composition layer and a second film, wherein the resin composition layer is present between the first film and the second film, and the water vapor permeability of the first film and the second film is each less than 1 (g/m 2 /24hr).
[2] 如前述[1]之密封用薄片,其中,第1薄膜及第2薄膜之水蒸氣透過度係各自為0.01(g/m2 /24hr)以上、1(g/m2 /24hr)以下。 [3] 如前述[1]之密封用薄片,其中,第1薄膜及第2薄膜之水蒸氣透過度係各自為0.01(g/m2 /24hr)以上、0.5 (g/m2 /24hr)以下。 [4] 如前述[1]之密封用薄片,其中,第1薄膜及第2薄膜之水蒸氣透過度係各自為0.01(g/m2 /24hr)以上、0.2(g/m2 /24hr)以下。 [5] 如前述[1]之密封用薄片,其中,第1薄膜及第2薄膜之水蒸氣透過度係各自為0.05(g/m2 /24hr)以上、0.2 (g/m2 /24hr)以下。[2] The sealing sheet as described in [1] above, wherein the water vapor permeability of the first film and the second film is respectively 0.01 (g/m 2 /24hr) or more and 1 (g/m 2 /24hr) or less. [3] The sealing sheet as described in [1] above, wherein the water vapor permeability of the first film and the second film is respectively 0.01 (g/m 2 /24hr) or more and 0.5 (g/m 2 /24hr) or less. [4] The sealing sheet as described in [1] above, wherein the water vapor permeability of the first film and the second film is respectively 0.01 (g/m 2 /24hr) or more and 0.2 (g/m 2 /24hr) or less. [5] The sealing sheet according to [1] above, wherein the water vapor permeability of the first film and the second film is respectively 0.05 (g/m 2 /24hr) or more and 0.2 (g/m 2 /24hr) or less.
[6] 如前述[1]之密封用薄片,其中,第1薄膜之水蒸氣透過度為未達0.01(g/m2 /24hr),第2薄膜之水蒸氣透過度為0.01(g/m2 /24hr)以上、1(g/m2 /24hr)以下。[6] The sealing sheet as described in [1] above, wherein the water vapor permeability of the first film is less than 0.01 (g/m 2 /24hr), and the water vapor permeability of the second film is greater than 0.01 (g/m 2 /24hr) and less than 1 (g/m 2 /24hr).
[7] 如前述[6]之密封用薄片,其中,第1薄膜之水蒸氣透過度為0.005(g/m2 /24hr)以下。 [8] 如前述[6]之密封用薄片,其中,第1薄膜之水蒸氣透過度為0.001(g/m2 /24hr)以下。 [9] 如前述[6]之密封用薄片,其中,第1薄膜之水蒸氣透過度為0.0005(g/m2 /24hr)以下。[7] The sealing sheet as described in [6] above, wherein the water vapor permeability of the first film is 0.005 (g/m 2 /24hr) or less. [8] The sealing sheet as described in [6] above, wherein the water vapor permeability of the first film is 0.001 (g/m 2 /24hr) or less. [9] The sealing sheet as described in [6] above, wherein the water vapor permeability of the first film is 0.0005 (g/m 2 /24hr) or less.
[10] 如前述[6]~[9]中任一項之密封用薄片,其中,第2薄膜之水蒸氣透過度為0.01(g/m2 /24hr)以上、0.5(g/m2 /24hr)以下。 [11] 如前述[6]~[9]中任一項之密封用薄片,其中,第2薄膜之水蒸氣透過度為0.01(g/m2 /24hr)以上、0.2(g/m2 /24hr)以下。 [12] 如前述[6]~[9]中任一項之密封用薄片,其中,第2薄膜之水蒸氣透過度為0.05(g/m2 /24hr)以上、0.2(g/m2 /24hr)以下。[10] The sealing sheet as described in any one of [6] to [9] above, wherein the water vapor permeability of the second film is 0.01 (g/m 2 /24hr) or more and 0.5 (g/m 2 /24hr) or less. [11] The sealing sheet as described in any one of [6] to [9] above, wherein the water vapor permeability of the second film is 0.01 (g/m 2 /24hr) or more and 0.2 (g/m 2 /24hr) or less. [12] The sealing sheet as described in any one of [6] to [9] above, wherein the water vapor permeability of the second film is 0.05 (g/m 2 /24hr) or more and 0.2 (g/m 2 /24hr) or less.
[13] 如前述[1]之密封用薄片,其中,第1薄膜之水蒸氣透過度為0.0005(g/m2 /24hr)以下,第2薄膜之水蒸氣透過度為超過0.0005(g/m2 /24hr)、未達0.01(g/m2 /24hr)。[13] The sealing sheet as described in [1] above, wherein the water vapor permeability of the first film is less than 0.0005 (g/m 2 /24hr), and the water vapor permeability of the second film is more than 0.0005 (g/m 2 /24hr) and less than 0.01 (g/m 2 /24hr).
[14] 如前述[1]~[13]中任一項之密封用薄片,其中,第1薄膜及第2薄膜為具有基材及障壁層的薄膜。 [15] 如前述[14]之密封用薄片,其中,基材為塑膠薄膜。 [16] 如前述[14]或[15]之密封用薄片,其中,障壁層為包含無機膜。[14] A sealing sheet as described in any one of [1] to [13] above, wherein the first film and the second film are films having a substrate and a barrier layer. [15] A sealing sheet as described in [14] above, wherein the substrate is a plastic film. [16] A sealing sheet as described in [14] or [15] above, wherein the barrier layer comprises an inorganic film.
[17] 如前述[1]~[16]中任一項之密封用薄片,其中,樹脂組成物層為包含烯烴系樹脂及/或環氧樹脂。 [18] 如前述[1]~[17]中任一項之密封用薄片,其中,樹脂組成物層為包含半燒結水滑石。[17] A sealing sheet as described in any one of [1] to [16] above, wherein the resin composition layer comprises an olefinic resin and/or an epoxy resin. [18] A sealing sheet as described in any one of [1] to [17] above, wherein the resin composition layer comprises semi-sintered hydrotalcite.
[19] 如前述[1]~[18]中任一項之密封用薄片,其中,第1薄膜為具有脫模層的薄膜。 [20] 如前述[1]~[19]中任一項之密封用薄片,其中,第1薄膜及第2薄膜為具有脫模層的薄膜。[19] A sealing sheet as described in any one of [1] to [18] above, wherein the first film is a film having a release layer. [20] A sealing sheet as described in any one of [1] to [19] above, wherein the first film and the second film are films having a release layer.
[21] 如前述[1]~[20]中任一項之密封用薄片,其中,為有機EL元件之密封用。 [發明的效果][21] The sealing sheet as described in any one of [1] to [20] above, which is used for sealing an organic EL element. [Effects of the Invention]
藉由本發明,則可抑制密封用薄片之樹脂組成物層之吸水(特別是,含有半燒結水滑石的樹脂組成物層之吸水)。According to the present invention, it is possible to suppress water absorption of a resin composition layer of a sealing sheet (particularly water absorption of a resin composition layer containing semi-sintered hydrotalcite).
本發明之密封用薄片係具有第1薄膜、樹脂組成物層及第2薄膜,第1薄膜及第2薄膜雙方為防濕性薄膜。防濕性薄膜亦可為層合薄膜。第1薄膜及第2薄膜係可為相同者,亦可為相異者。又,第1薄膜及第2薄膜之WVTR之值係可為相同,亦可為相異。尚,在JIS等係將厚度為未達0.25mm者分類為薄膜,將厚度為超過0.25mm者分類為薄片,但本發明係不被如此的分類限制。The sealing sheet of the present invention comprises a first film, a resin composition layer and a second film, and both the first film and the second film are moisture-proof films. The moisture-proof film may also be a laminated film. The first film and the second film may be the same or different. Furthermore, the WVTR values of the first film and the second film may be the same or different. In JIS, a film having a thickness of less than 0.25 mm is classified as a film, and a film having a thickness of more than 0.25 mm is classified as a sheet, but the present invention is not limited by such classification.
防濕性薄膜之WVTR係理想為0.01(g/m2 /24hr)以上、1(g/m2 /24hr)以下,理想為0.5(g/m2 /24hr)以下,較理想為0.2(g/m2 /24hr)以下。此WVTR係藉由後述的實施例所記載的方法而測定的值。The WVTR of the moisture-proof film is preferably 0.01 (g/m 2 /24hr) or more and 1 (g/m 2 /24hr) or less, more preferably 0.5 (g/m 2 /24hr) or less, and more preferably 0.2 (g/m 2 /24hr) or less. This WVTR is a value measured by the method described in the Examples below.
作為第1薄膜及第2薄膜使用的防濕性薄膜之WVTR係可藉由適用本發明之密封用薄片的有機EL裝置之構造,適宜地設定理想的態樣。The WVTR of the moisture-proof film used as the first film and the second film can be appropriately set to an ideal state by the structure of the organic EL device to which the sealing sheet of the present invention is applied.
在有機EL裝置之構造設置具有高的防濕性的層的情況,在本發明的第1薄膜(支撐體)係使用WVTR為未達0.01(g/m2 /24hr)之防濕性薄膜(以下,有簡稱為「高防濕性薄膜」之情事)者為理想。高防濕性薄膜之WVTR係較理想為0.005(g/m2 /24hr)以下,更理想為0.001(g/m2 /24hr)以下,特別理想為0.0005(g/m2 /24hr)以下。高防濕性薄膜之WVTR之下限係無特別限定,較低的值為理想,0 (g/m2 /24hr)為最理想。在此情況,第2薄膜(覆蓋薄膜)係成為於密封時被剝離、廢棄。因此作為第2薄膜,由同時達成抑制保管時之樹脂組成物層之吸水和抑制成本的觀點,使用WVTR為0.01(g/m2 /24hr)以上、1(g/m2 /24hr)以下之防濕性薄膜(以下,有簡稱為「中防濕性薄膜」之情事)者為理想。在此情況,中防濕性薄膜之WVTR係由防濕性和成本之平衡視之,較理想為0.05(g/m2 /24hr)以上,較理想為0.5(g/m2 /24hr)以下,更理想為0.2(g/m2 /24hr)以下。When a layer having high moisture barrier properties is provided in the structure of an organic EL device, it is preferable to use a moisture barrier film having a WVTR of less than 0.01 (g/m 2 /24hr) (hereinafter referred to as "high moisture barrier film") as the first film (support) of the present invention. The WVTR of the high moisture barrier film is preferably 0.005 (g/m 2 /24hr) or less, more preferably 0.001 (g/m 2 /24hr) or less, and particularly preferably 0.0005 (g/m 2 /24hr) or less. There is no particular lower limit on the WVTR of the high moisture barrier film, but a lower value is preferable, and 0 (g/m 2 /24hr) is most preferable. In this case, the second film (cover film) is peeled off and discarded during sealing. Therefore, from the viewpoint of simultaneously suppressing the water absorption of the resin composition layer during storage and suppressing the cost, it is desirable to use a moisture-proof film (hereinafter referred to as "medium moisture-proof film") having a WVTR of 0.01 (g/m 2 /24hr) or more and 1 (g/m 2 /24hr) or less as the second film. In this case, the WVTR of the medium moisture-proof film is preferably 0.05 (g/m 2 /24hr) or more, more preferably 0.5 (g/m 2 /24hr) or less, and more preferably 0.2 (g/m 2 /24hr) or less, from the viewpoint of balancing moisture- proofness and cost.
又,例如在第1薄膜之WVTR為具有0.0005(g/m2 /24hr)以下之極高的防濕性的情況,作為第2薄膜,亦可使用WVTR為超過0.0005(g/m2 /24hr)、未達0.01 (g/m2 /24hr)之防濕性薄膜。WVTR為具有0.0005(g/m2 /24hr)以下之防濕性薄膜係作為障壁層,一般而言於塑膠薄膜藉由蒸鍍等而形成無機膜之複數層而製造,成為高成本。另一方面,作為WVTR為超過0.0005(g/m2 /24hr)、未達0.01 (g/m2 /24hr)之防濕性薄膜係例如可使用得以相對的低成本製造的附金屬箔之塑膠薄膜。因此,以將第1薄膜和第2薄膜設為上述構成,可設為取得抑制保管時之樹脂組成物層之吸水和成本之平衡的密封薄膜。在作為較低成本上係作為第2薄膜,使用上述之中防濕性薄膜為最佳。Furthermore, for example, when the WVTR of the first film is 0.0005 (g/m 2 /24hr) or less, which is an extremely high moisture barrier, a moisture barrier film having a WVTR of more than 0.0005 (g/m 2 /24hr) and less than 0.01 (g/m 2 /24hr) may be used as the second film. A moisture barrier film having a WVTR of 0.0005 (g/m 2 /24hr) or less is generally manufactured by forming multiple layers of inorganic films on a plastic film by evaporation, etc., which is expensive. On the other hand, as a moisture-proof film having a WVTR of more than 0.0005 (g/m 2 /24hr) and less than 0.01 (g/m 2 /24hr), for example, a plastic film with a metal foil that can be manufactured at a relatively low cost can be used. Therefore, by setting the first film and the second film to the above-mentioned structure, a sealing film that strikes a balance between suppressing water absorption of the resin composition layer during storage and cost can be set. In terms of relatively low cost, it is best to use the moisture-proof film mentioned above as the second film.
尚,作為第1薄膜及第2薄膜之雙方,若使用附金屬箔之薄膜等之不透明的防濕性薄膜,則樹脂組成物層之品質檢查變得困難,所以在作為第1薄膜及第2薄膜之一方使用不透明的防濕性薄膜的情況,作為另一方係使用透明的防濕性薄膜為最佳。透明的防濕性薄膜之透明性係不依該厚度,以D65光之全光線透過率為85%以上為最佳。所謂「不透明的防濕性薄膜」係被定義為「以D65光之全光線透過率為50%以下的防濕性薄膜」。全光線透過率係可使用Suga試驗機公司製之Haze meter-HZ-V3(鹵素燈),將空氣作為基準,以D65光測定。In addition, if an opaque moisture-proof film such as a film with metal foil is used as both the first film and the second film, it becomes difficult to inspect the quality of the resin composition layer. Therefore, when an opaque moisture-proof film is used as one of the first film and the second film, it is best to use a transparent moisture-proof film as the other. The transparency of a transparent moisture-proof film is not determined by the thickness, and the best is when the total light transmittance of D65 light is 85% or more. The so-called "opaque moisture-proof film" is defined as "a moisture-proof film with a total light transmittance of D65 light of less than 50%." The total light transmittance can be measured with D65 light using Haze meter-HZ-V3 (halogen lamp) manufactured by Suga Testing Instrument Co., Ltd., with air as the reference.
在有機EL裝置之構造,在由樹脂組成物層形成的密封層上直接設置無機膜的情況、或不需要高耐濕性層,不設置高耐濕性之層的情況係作為第1薄膜及第2薄膜之雙方,使用上述之中防濕性薄膜為理想。In the structure of an organic EL device, when an inorganic film is directly provided on a sealing layer formed of a resin composition layer, or when a high moisture resistant layer is not required or provided, it is ideal to use the above-mentioned moisture-proof film as both the first film and the second film.
尚,作為第1薄膜或第2薄膜之任一方或雙方,使用WVTR為超過1(g/m2 /24hr)的低防濕性薄膜的情況,成為難以得到本發明之效果。Furthermore, when a low moisture-proof film having a WVTR exceeding 1 (g/m 2 /24 hr) is used as either or both of the first film and the second film, it becomes difficult to obtain the effect of the present invention.
防濕性薄膜係理想為具有基材及障壁層的薄膜。在此所謂基材係意味著在前述薄膜中,障壁層以外之部分。The moisture-proof film is preferably a film having a substrate and a barrier layer. Here, the substrate means the portion other than the barrier layer in the aforementioned film.
基材係可為單層薄膜,亦可為層合薄膜。作為基材係例如可舉出聚乙烯、聚丙烯(PP)等之聚烯烴、聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等之聚酯、聚碳酸酯(PC)、聚醯亞胺(PI)、環烯烴聚合物(COP)、聚氯乙烯等之塑膠薄膜。塑膠薄膜係可僅為1種,亦可為2種以上。基材係理想為聚對苯二甲酸乙二酯薄膜、環烯烴聚合物薄膜、聚萘二甲酸乙二酯薄膜或聚碳酸酯薄膜,較理想為聚對苯二甲酸乙二酯薄膜或環烯烴聚合物薄膜。基材之厚度(基材為層合薄膜的情況係該全體之厚度)係理想為10~100μm,較理想為12.5~75μm,更理想為12.5~50μm。The substrate may be a single-layer film or a laminated film. Examples of the substrate include polyolefins such as polyethylene and polypropylene (PP), polyesters such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polyimide (PI), cycloolefin polymer (COP), polyvinyl chloride, and other plastic films. The plastic film may be only one type or two or more types. The substrate is preferably a polyethylene terephthalate film, a cycloolefin polymer film, a polyethylene naphthalate film, or a polycarbonate film, and more preferably a polyethylene terephthalate film or a cycloolefin polymer film. The thickness of the substrate (when the substrate is a laminated film, it is the thickness of the entire film) is preferably 10 to 100 μm, more preferably 12.5 to 75 μm, and even more preferably 12.5 to 50 μm.
作為障壁層係例如可舉出金屬箔(例如鋁箔)、二氧化矽蒸鍍膜、氮化矽膜、氧化矽膜等之無機膜。障壁層係亦可以複數之無機膜之複數層(例如金屬箔及二氧化矽蒸鍍膜)構成。又,障壁層係可由有機物和無機物構成,亦可為有機層和無機膜之複合多層。障壁層之厚度係理想為0.01~100μm,較理想為0.05~50μm,更理想為0.05~30μm。As the barrier layer, for example, inorganic films such as metal foil (e.g., aluminum foil), silicon dioxide evaporated film, silicon nitride film, silicon oxide film, etc. can be cited. The barrier layer can also be composed of multiple layers of multiple inorganic films (e.g., metal foil and silicon dioxide evaporated film). In addition, the barrier layer can be composed of organic and inorganic substances, and can also be a composite multilayer of organic layers and inorganic films. The thickness of the barrier layer is preferably 0.01 to 100 μm, more preferably 0.05 to 50 μm, and more preferably 0.05 to 30 μm.
WVTR為未達0.01(g/m2 /24hr)之防濕性薄膜(高防濕性薄膜),特別是WVTR為0.0005(g/m2 /24hr)以下之防濕性薄膜係例如,可於基材表面將氧化矽(二氧化矽)、氧化鋁、氧化鎂、氮化矽、氮氧化矽、SiCN、非晶矽等之無機膜,藉由化學氣相沈積法(例如藉由熱、電漿、紫外線、真空熱,真空電漿或真空紫外線所致的化學氣相沈積法)、或是藉由物理氣相沈積法(例如,真空蒸鍍法、濺鍍法、離子鍍法、雷射堆積法、分子束磊晶法)等而以單層或複層層合,進行製造(例如,參照日本特開2016-185705號公報、日本專利5719106號公報、日本專利5712509號公報、日本專利5292358號公報等)。為了防止無機膜之龜裂,所以將無機膜和透明平坦化層(例如,透明塑膠層)交互地層合為理想。以如此的方法製造的防濕性薄膜係具有透明性的薄膜。The moisture-proof film (high moisture-proof film) having a WVTR of less than 0.01 (g/m 2 /24hr), particularly the moisture-proof film having a WVTR of less than 0.0005 (g/m 2 /24hr) is, for example, an inorganic film of silicon oxide (silicon dioxide), aluminum oxide, magnesium oxide, silicon nitride, silicon oxynitride, SiCN, amorphous silicon, etc., can be deposited on the surface of a substrate by chemical vapor deposition (e.g., chemical vapor deposition by heat, plasma, ultraviolet, vacuum heat, vacuum plasma or vacuum ultraviolet), or by physical vapor deposition. The inorganic film is manufactured by a phase deposition method (e.g., vacuum evaporation, sputtering, ion plating, laser deposition, molecular beam epitaxy) in a single layer or multiple layers (e.g., see Japanese Patent Publication No. 2016-185705, Japanese Patent No. 5719106, Japanese Patent No. 5712509, Japanese Patent No. 5292358, etc.). In order to prevent cracking of the inorganic film, it is ideal to alternately laminate the inorganic film and the transparent planarization layer (e.g., a transparent plastic layer). The moisture-proof film manufactured by such a method is a transparent film.
又,在WVTR為未達0.01(g/m2 /24hr)之防濕性薄膜(高防濕性薄膜)中,作為WVTR為超過0.0005 (g/m2 /24hr)、未達0.01(g/m2 /24hr)之高防濕性薄膜係除了以上述方法製造的防濕性薄膜以外,例如可舉出SUS箔、鋁箔等之金屬箔、或使基材與金屬箔介由接著劑而貼合等之方法製造的防濕性薄膜。金屬箔、或是由基材和金屬箔所構成的防濕性薄膜係通常為不透明。In addition, among moisture-proof films (high moisture-proof films) having a WVTR of less than 0.01 (g/m 2 /24hr), high moisture-proof films having a WVTR of more than 0.0005 (g/m 2 /24hr) and less than 0.01 (g/m 2 /24hr) include, in addition to moisture-proof films produced by the above-mentioned methods, metal foils such as SUS foil and aluminum foil, or moisture-proof films produced by bonding a substrate and a metal foil via an adhesive. Metal foils or moisture-proof films composed of a substrate and a metal foil are generally opaque.
又WVTR為0.01(g/m2 /24hr)以上、1 (g/m2 /24hr)以下之防濕性薄膜(中防濕性薄膜)係例如作為障壁層,可以於基材表面蒸鍍包含氧化矽(二氧化矽)、氧化鋁、氧化鎂、氮化矽、氮氧化矽、SiCN、非晶矽等之無機物的無機膜的方法、或是於基材塗布由金屬氧化物和具有阻障性的有機樹脂所構成的塗覆液,進行乾燥的方法等製造(例如,參照日本特開2013-108103號公報、日本專利4028353號公報等)。以如此的方法製造的防濕性薄膜係具有透明性的薄膜。The moisture-proof film (medium moisture-proof film) with a WVTR of 0.01 (g/m 2 /24hr) or more and 1 (g/m 2 /24hr) or less can be produced, for example, as a barrier layer, by evaporating an inorganic film containing inorganic materials such as silicon oxide (silicon dioxide), aluminum oxide, magnesium oxide, silicon nitride, silicon oxynitride, SiCN, amorphous silicon, etc. on the surface of a substrate, or by applying a coating liquid composed of a metal oxide and an organic resin having barrier properties on the substrate and drying the coating liquid (for example, refer to Japanese Patent Publication No. 2013-108103, Japanese Patent Publication No. 4028353, etc.). The moisture-proof film produced by such a method is a transparent film.
防濕性薄膜亦使用市售品。作為中耐濕性薄膜之市售品係例如可舉出Kuraray公司製「KURARISTER CI」、三菱樹脂公司製「TECHBARRIER HX」、「TECHBARRIER LX」及「TECHBARRIER L」、大日本印刷公司製「IB-PET-PXB」、凸版印刷公司製「GL,GX系列」等,作為高耐濕性薄膜之市售品係例如可舉出東洋鋁公司製「PET luck AL1N30」、三菱樹脂公司製「X-BARRIER」等。Commercially available products are also used as moisture-proof films. Examples of commercially available products of medium moisture-resistant films include "KURARISTER CI" manufactured by Kuraray, "TECHBARRIER HX", "TECHBARRIER LX" and "TECHBARRIER L" manufactured by Mitsubishi Resin, "IB-PET-PXB" manufactured by Dai Nippon Printing, and "GL, GX Series" manufactured by Toppan Printing. Examples of commercially available products of high moisture-resistant films include "PET luck AL1N30" manufactured by Toyo Aluminum, and "X-BARRIER" manufactured by Mitsubishi Resin.
防濕性薄膜係亦可具有基材和障壁層以外之層。例如,為了防止無機膜之龜裂,所以將無機膜和透明平坦化層(例如,透明塑膠層)交互地層合為理想。又,亦可具有將塑膠薄膜,使用接著劑,貼合於障壁層及/或基材面的層合構造。在本發明中於接著劑無特別限定,可使用市售之接著劑。又,作為塑膠係例如可舉出聚乙烯、聚丙烯(PP)等之聚烯烴、聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等之聚酯、聚碳酸酯(PC)、聚醯亞胺(PI)、環烯烴聚合物(COP)、聚氯乙烯等。塑膠薄膜係可僅為1種,亦可為2種以上。The moisture-proof film may also have layers other than the substrate and the barrier layer. For example, in order to prevent cracking of the inorganic film, it is ideal to alternately laminate the inorganic film and the transparent planarization layer (for example, a transparent plastic layer). In addition, it may also have a laminated structure in which a plastic film is adhered to the barrier layer and/or the substrate surface using an adhesive. In the present invention, there is no particular limitation on the adhesive, and commercially available adhesives can be used. In addition, as plastics, for example, polyolefins such as polyethylene and polypropylene (PP), polyesters such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polyimide (PI), cycloolefin polymer (COP), polyvinyl chloride, etc. can be cited. The plastic film may be only one type or may be two or more types.
在本發明之密封用薄片,樹脂組成物層係存在於第1薄膜及第2薄膜之間。在第1薄膜與樹脂組成物層之間及/或第2薄膜與樹脂組成物層之間,在不阻礙本發明之效果的範圍,亦可包含其他之層。成為覆蓋薄膜的第2薄膜係在將密封薄膜層合於有機EL元件之前,為了使樹脂組成物層露出所以被剝離。成為支撐體的第1薄膜係在作為防濕性層安裝於裝置的情況係不剝離而照原樣使用,在不安裝的情況係在層合後之任一步驟被剝離。成為覆蓋薄膜的第2薄膜係為了設為容易剝離,所以在與樹脂組成物層接觸的面亦可具有脫模層。又,成為支撐體的第1薄膜亦在不安裝於裝置而以層合後之步驟被剝離的情況,例如於與樹脂組成物層接觸的面亦可具有脫模層。在第1薄膜被安裝於裝置,不被剝離的情況,通常,第1薄膜係不具有脫模層。尚,於有機EL裝置設置防濕性層的情況,亦可將第1薄膜照原樣作為防濕性層使用,亦可在剝離第1薄膜後,另外設置防濕性層。於有機EL裝置設置防濕性層、與圓偏光板、彩色濾光片或觸控面板的情況,在與樹脂組成物層係相反側之面,亦可設置圓偏光板、彩色濾光片或觸控面板。圓偏光板係一般而言藉由偏光板和1/4波長板而構成,圓偏光板之1/4波長板為被配置於樹脂組成物層。In the sealing sheet of the present invention, the resin composition layer exists between the first film and the second film. Other layers may be included between the first film and the resin composition layer and/or between the second film and the resin composition layer as long as the effect of the present invention is not hindered. The second film serving as a covering film is peeled off before laminating the sealing film on the organic EL element in order to expose the resin composition layer. The first film serving as a support is used as it is without being peeled off when it is installed in the device as a moisture-proof layer, and is peeled off at any step after lamination when it is not installed. The second film serving as the covering film may have a release layer on the surface in contact with the resin composition layer in order to facilitate peeling. Furthermore, when the first film serving as the support is not mounted on the device but is peeled off in a step after lamination, for example, the surface in contact with the resin composition layer may have a release layer. When the first film is mounted on the device and is not peeled off, the first film usually does not have a release layer. Furthermore, when a moisture-proof layer is provided in the organic EL device, the first film may be used as the moisture-proof layer as it is, or a moisture-proof layer may be provided separately after the first film is peeled off. When a moisture-proof layer, a circular polarizing plate, a color filter, or a touch panel is provided on an organic EL device, the circular polarizing plate, the color filter, or the touch panel may be provided on the surface opposite to the resin component layer. A circular polarizing plate is generally composed of a polarizing plate and a 1/4 wavelength plate, and the 1/4 wavelength plate of the circular polarizing plate is disposed on the resin component layer.
脫模層係例如可藉由於防濕性薄膜或包含防濕性薄膜的層合薄膜,塗布脫模劑,進行乾燥而形成。又,亦可藉由塗布脫模劑於塑膠薄膜,進行乾燥,形成具有脫模層的塑膠薄膜,接下來使用接著劑,使具有脫模層的塑膠薄膜與防濕性薄膜貼合。脫模劑之塗布後之乾燥溫度係例如為100~150℃,乾燥時間係例如為5~120分鐘。The release layer can be formed, for example, by applying a release agent to a moisture-proof film or a laminated film including a moisture-proof film and drying the film. Alternatively, a plastic film having a release layer can be formed by applying a release agent to a plastic film and drying the film, and then an adhesive is used to bond the plastic film having a release layer to the moisture-proof film. The drying temperature after applying the release agent is, for example, 100 to 150° C., and the drying time is, for example, 5 to 120 minutes.
作為脫模劑係例如可舉出聚矽氧系脫模劑、醇酸系脫模劑、氟系脫模劑、烯烴系脫模劑等。脫模層係由聚矽氧系脫模劑或醇酸系脫模劑所形成為理想。脫模層之厚度係理想為0.05~1μm,較理想為0.05~0.5μm,更理想為0.05~0.1μm。Examples of the release agent include silicone release agents, alkyd release agents, fluorine release agents, and olefin release agents. The release layer is preferably formed of silicone release agents or alkyd release agents. The thickness of the release layer is preferably 0.05 to 1 μm, more preferably 0.05 to 0.5 μm, and even more preferably 0.05 to 0.1 μm.
第1薄膜之厚度(第1薄膜為層合薄膜的情況係該全體之厚度)係理想為12.5~100μm,較理想為12.5~ 62.5μm,更理想為12.5~55μm。第2薄膜之厚度(第2薄膜為層合薄膜的情況係該全體之厚度)係理想為12.5~100μm,較理想為12.5~62.5μm,更理想為12.5~55μm。The thickness of the first film (the thickness of the entire film if the first film is a laminated film) is preferably 12.5 to 100 μm, more preferably 12.5 to 62.5 μm, and more preferably 12.5 to 55 μm. The thickness of the second film (the thickness of the entire film if the second film is a laminated film) is preferably 12.5 to 100 μm, more preferably 12.5 to 62.5 μm, and more preferably 12.5 to 55 μm.
在本發明中,於樹脂組成物層無特別限定,可使用一般周知之樹脂組成物而形成樹脂組成物層。為了良好地密封有機EL元件等,樹脂組成物層係包含烯烴系樹脂及/或環氧樹脂為理想。In the present invention, the resin composition layer is not particularly limited, and a generally known resin composition can be used to form the resin composition layer. In order to seal the organic EL element well, the resin composition layer preferably contains an olefin resin and/or an epoxy resin.
烯烴系樹脂係可僅為1種,亦可為2種以上。作為烯烴系樹脂係如為具有來自烯烴單體之骨架者則無特別限定。作為烯烴系樹脂係乙烯系樹脂、丙烯系樹脂、丁烯系樹脂、異丁烯系樹脂為理想。此等烯烴系樹脂係可舉均聚物,亦可為隨機共聚物、嵌段共聚物等之共聚物。作為共聚物係可舉出2種以上之烯烴之共聚物,及烯烴與非共軛二烯、苯乙烯等之烯烴以外之單體之共聚物。作為理想的共聚物之例,可舉出乙烯-非共軛二烯共聚物、乙烯-丙烯共聚物、乙烯-丙烯-非共軛二烯共聚物、乙烯-丁烯共聚物、丙烯-丁烯共聚物、丙烯-丁烯-非共軛二烯共聚物、苯乙烯-異丁烯共聚物、苯乙烯-異丁烯-苯乙烯共聚物等。作為聚烯烴系樹脂係例如可理想地使用異丁烯改質樹脂,苯乙烯-異丁烯改質樹脂,改質丙烯-丁烯樹脂等。The olefin resin may be only one or more than one. The olefin resin is not particularly limited as long as it has a skeleton derived from an olefin monomer. Ethylene resins, propylene resins, butylene resins, and isobutylene resins are preferred as olefin resins. These olefin resins may be homopolymers, or copolymers such as random copolymers and block copolymers. Copolymers may be copolymers of two or more olefins, and copolymers of olefins and monomers other than olefins such as non-conjugated dienes and styrene. As examples of desirable copolymers, there can be cited ethylene-non-conjugated diene copolymers, ethylene-propylene copolymers, ethylene-propylene-non-conjugated diene copolymers, ethylene-butene copolymers, propylene-butene copolymers, propylene-butene-non-conjugated diene copolymers, styrene-isobutylene copolymers, styrene-isobutylene-styrene copolymers, etc. As polyolefin resins, for example, isobutylene modified resins, styrene-isobutylene modified resins, modified propylene-butene resins, etc. can be preferably used.
烯烴系樹脂係由賦與接著性等之優異的物性的觀點視之,理想為包含由具有酸酐基(亦即,羰氧基羰基(-CO-O-CO-))的烯烴系樹脂及具有環氧基的烯烴系樹脂所構成的群中選擇至少一個,較理想為包含具有酸酐基的烯烴系樹脂及具有環氧基的烯烴系樹脂。From the viewpoint of imparting excellent physical properties such as adhesiveness, the olefinic resin preferably includes at least one selected from the group consisting of an olefinic resin having an acid anhydride group (i.e., a carbonyloxycarbonyl group (-CO-O-CO-)) and an olefinic resin having an epoxy group, and more preferably includes an olefinic resin having an acid anhydride group and an olefinic resin having an epoxy group.
作為酸酐基係可舉出例如,來自琥珀酸酐的基、來自馬來酸酐的基、來自戊二酸酐的基等。酸酐基係可為1種,亦可為2種以上。具有酸酐基的烯烴系樹脂係例如以具有酸酐基的不飽和化合物,將烯烴系樹脂在自由基反應條件下進行接枝改質而可得。又,亦可將具有酸酐基的不飽和化合物,與烯烴等一起進行自由基共聚。同樣地,具有環氧基的烯烴系樹脂係例如以縮水甘油基(甲基)丙烯酸酯、4-羥丁基丙烯酸酯縮水甘油醚,烯丙基縮水甘油醚等之具有環氧基的不飽和化合物,將烯烴系樹脂在自由基反應條件下進行接枝改質而可得。又,亦可將具有環氧基的不飽和化合物,與烯烴等一起進行自由基共聚。Examples of the anhydride group include a group derived from succinic anhydride, a group derived from maleic anhydride, and a group derived from glutaric anhydride. The anhydride group may be one or more. The anhydride group-containing olefinic resin may be obtained by, for example, grafting an unsaturated compound having an anhydride group onto an olefinic resin under free radical reaction conditions. In addition, the unsaturated compound having an anhydride group may be free radically copolymerized with an olefin or the like. Similarly, an olefinic resin having an epoxy group can be obtained by grafting an unsaturated compound having an epoxy group, such as glycidyl (meth)acrylate, 4-hydroxybutyl acrylate glycidyl ether, and allyl glycidyl ether, onto an olefinic resin under free radical reaction conditions. In addition, an unsaturated compound having an epoxy group can also be free radically copolymerized with an olefin or the like.
具有酸酐基的烯烴系樹脂中之酸酐基之濃度係0.05~10mmol/g為理想,0.1~5mmol/g為較理想。酸酐基之濃度係依照JIS K 2501之記載,藉由作為中和存在於樹脂1g中之酸所必要的氫氧化鉀之mg數而定義的酸價之值之可得。又,烯烴系樹脂中之具有酸酐基的烯烴系樹脂之量係理想為0~70質量%,較理想為10~50質量%。The concentration of the acid anhydride group in the olefinic resin having an acid anhydride group is preferably 0.05 to 10 mmol/g, more preferably 0.1 to 5 mmol/g. The concentration of the acid anhydride group is obtained by the acid value defined as the number of mg of potassium hydroxide required to neutralize the acid present in 1 g of the resin according to JIS K 2501. The amount of the olefinic resin having an acid anhydride group in the olefinic resin is preferably 0 to 70% by mass, more preferably 10 to 50% by mass.
具有環氧基的烯烴系樹脂中之環氧基之濃度係0.05~10mmol/g為理想,0.1~5mmol/g為較理想。環氧基濃度係根據JIS K 7236-1995而由可得的環氧當量求出。又,烯烴系樹脂中之具有環氧基的烯烴系樹脂之量係理想為0~70質量%,較理想為10~50質量%。The concentration of epoxy groups in the olefinic resin having epoxy groups is preferably 0.05 to 10 mmol/g, more preferably 0.1 to 5 mmol/g. The epoxy group concentration is determined from the available epoxy equivalent according to JIS K 7236-1995. The amount of the olefinic resin having epoxy groups in the olefinic resin is preferably 0 to 70% by mass, more preferably 10 to 50% by mass.
烯烴系樹脂係由賦與防濕性等之優異的物性的觀點視之,包含具有酸酐基的烯烴系樹脂及具有環氧基的烯烴系樹脂雙方為理想。如此的烯烴系樹脂係可藉由加熱酸酐基和環氧基而反應而形成交聯構造,形成於防濕性等優異的密封層(樹脂組成物層)。交聯構造形成亦可於密封後進行,但例如在有機EL元件等,密封對象為不耐熱者的情況,使用密封薄膜而密封,在製造該密封薄膜時先形成交聯構造為最佳。具有酸酐基的烯烴系樹脂與具有環氧基的烯烴系樹脂之比例係如可形成合適的交聯構造則無特別限定,但環氧基與酸酐基之莫耳比(環氧基:酸酐基)係理想為100:10~100:200,較理想為100:50~100:150,特別理想為100:90~100:110。From the perspective of imparting excellent physical properties such as moisture resistance, olefin resins preferably include both olefin resins having anhydride groups and olefin resins having epoxy groups. Such olefin resins can form a crosslinked structure by reacting the anhydride groups and epoxy groups by heating, forming a sealing layer (resin component layer) having excellent moisture resistance. The crosslinked structure can be formed after sealing, but in the case of an organic EL element, for example, where the sealing object is not heat-resistant, it is best to use a sealing film for sealing, and form the crosslinked structure first when the sealing film is manufactured. The ratio of the olefinic resin having anhydride groups to the olefinic resin having epoxy groups is not particularly limited as long as a suitable cross-linking structure can be formed, but the molar ratio of epoxy groups to anhydride groups (epoxy groups:anhydride groups) is preferably 100:10 to 100:200, more preferably 100:50 to 100:150, and particularly preferably 100:90 to 100:110.
烯烴系樹脂之數量平均分子量係無特別限定,但由帶來樹脂組成物清漆之良好的塗布性和與在樹脂組成物的其他成分之良好的相溶性的觀點視之,1,000,000以下為理想,750,000以下為較理想,500,000以下為更較理想,400,000以下為更理想,300,000以下為更加理想,200,000以下為特別理想,150,000以下為最理想。另一方面,由防止樹脂組成物清漆之塗布時之收縮龜裂、使形成的樹脂組成物層之防濕性顯現、使機械強度提昇的觀點視之,此之數量平均分子量係1,000以上為理想,3,000以上為較理想,5,000以上為更較理想,10,000以上為更理想,30,000以上為更加理想,50,000以上為特別理想。尚,在本發明的數量平均分子量係以凝膠滲透層析(GPC)法(聚苯乙烯換算)測定。藉由GPC法所致的數量平均分子量係具體而言,作為測定裝置使用島津製作所公司製LC-9A/RID-6A,作為管柱使用昭和電工公司製Shodex K-800P/K-804L/K-804L,作為移動相使用甲苯等,以管柱溫度40℃測定,可使用標準聚苯乙烯之校準曲線算出。The number average molecular weight of the olefinic resin is not particularly limited, but is preferably 1,000,000 or less, more preferably 750,000 or less, more preferably 500,000 or less, more preferably 400,000 or less, even more preferably 300,000 or less, particularly preferably 200,000 or less, and most preferably 150,000 or less from the viewpoint of providing good coating properties of the resin composition varnish and good compatibility with other components in the resin composition. On the other hand, from the viewpoint of preventing shrinkage cracking during application of the resin composition varnish, making the moisture-proof property of the formed resin composition layer manifest, and improving the mechanical strength, the number average molecular weight is preferably 1,000 or more, more preferably 3,000 or more, more preferably 5,000 or more, more preferably 10,000 or more, more preferably 30,000 or more, and particularly preferably 50,000 or more. In addition, the number average molecular weight in the present invention is measured by gel permeation chromatography (GPC) method (polystyrene conversion). Specifically, the number average molecular weight determined by the GPC method uses LC-9A/RID-6A manufactured by Shimadzu Corporation as a measuring apparatus, Shodex K-800P/K-804L/K-804L manufactured by Showa Denko K.K. as a column, toluene or the like as a mobile phase, and is measured at a column temperature of 40°C. The molecular weight can be calculated using a calibration curve of standard polystyrene.
烯烴系樹脂係由抑制因清漆之增黏所致的流動性之低下的觀點觀之,非晶性者為理想。在此,所謂非晶性係意味著烯烴系樹脂為不具有明確的融點,例如可使用在烯烴系樹脂之以DSC(示差掃描熱量測定)測定融點的情況未觀察到明確的波峰者。From the viewpoint of suppressing the decrease in fluidity due to the increase in viscosity of the varnish, an amorphous olefinic resin is preferable. Here, the amorphous olefinic resin means that the olefinic resin does not have a clear melting point. For example, an olefinic resin can be used in which no clear peak is observed when the melting point is measured by DSC (differential scanning calorimetry).
烯烴系樹脂之量係不特別限定。由良好的塗布性等之觀點視之,在使用烯烴系樹脂的情況,該量係每樹脂組成物層之全體(亦即,每樹脂組成物之非揮發份全體),80質量%以下為理想,75質量%以下為較理想,70質量%以下為更較理想,60質量%以下為更理想,55質量%以下為更加理想,50質量%以下為特別理想。另一方面,由使防濕性提昇,亦使透明性提昇的觀點視之,烯烴系樹脂之量係每樹脂組成物層之全體(亦即,每樹脂組成物之非揮發份全體),1質量%以上為理想,3質量%以上為較理想,5質量%以上為更較理想,7質量%以上為更理想,10質量%以上為更加理想,35質量%以上為特別理想,40質量%以上為最理想。The amount of the olefinic resin is not particularly limited. From the viewpoint of good coating properties, when the olefinic resin is used, the amount is preferably 80% by mass or less, more preferably 75% by mass or less, more preferably 70% by mass or less, more preferably 60% by mass or less, more preferably 55% by mass or less, and particularly preferably 50% by mass or less, based on the total amount of the resin composition layer (i.e., the total amount of non-volatile components of the resin composition). On the other hand, from the viewpoint of improving moisture resistance and transparency, the amount of the olefinic resin is preferably 1 mass % or more per the total amount of the resin composition layer (that is, the total amount of non-volatile components per resin composition), more preferably 3 mass % or more, more preferably 5 mass % or more, more preferably 7 mass % or more, even more preferably 10 mass % or more, particularly preferably 35 mass % or more, and most preferably 40 mass % or more.
接著,說明烯烴系樹脂之具體例。作為異丁烯系樹脂之具體例係可舉出BASF公司製「Oppanol B100」(黏度平均分子量:1,110,000)、BASF公司製「B50SF」(黏度平均分子量:400,000)。Next, specific examples of olefin resins are described. Specific examples of isobutylene resins include "Oppanol B100" (viscosity average molecular weight: 1,110,000) manufactured by BASF and "B50SF" (viscosity average molecular weight: 400,000) manufactured by BASF.
作為丁烯系樹脂之具體例係可舉出JX Energy公司製「HV-1900」(聚丁烯,數量平均分子量:2,900)、東邦化學工業公司製「HV-300M」(馬來酸酐改質液狀聚丁烯(「HV-300」(數量平均分子量:1,400)之改質品),數量平均分子量2,100,構成酸酐基的羧基之數:3.2個/1分子,酸價:43.4mg KOH/g,酸酐基濃度:0.77mmol/g)。Specific examples of butene resins include "HV-1900" manufactured by JX Energy Co., Ltd. (polybutene, number average molecular weight: 2,900), and "HV-300M" manufactured by Toho Chemical Industries, Ltd. (maleic anhydride-modified liquid polybutene ("HV-300" (number average molecular weight: 1,400) modified product), number average molecular weight 2,100, number of carboxyl groups constituting anhydride groups: 3.2/1 molecule, acid value: 43.4 mg KOH/g, anhydride group concentration: 0.77 mmol/g).
作為苯乙烯-異丁烯共聚物之具體例係可舉出Kaneka公司製「SIBSTAR T102」(苯乙烯-異丁烯-苯乙烯嵌段共聚物,數量平均分子量:100,000,苯乙烯含量:30質量%)、星光PMC公司製「T-YP757B」(馬來酸酐改質苯乙烯-異丁烯-苯乙烯嵌段共聚物,酸酐基濃度:0.464mmol/g,數量平均分子量:100,000)、星光PMC公司「T-YP766」(甲基丙烯酸縮水甘油酯改質苯乙烯-異丁烯-苯乙烯嵌段共聚物,環氧基濃度:0.638mmol/g,數量平均分子量:100,000)、星光PMC公司「T-YP8920」(馬來酸酐改質苯乙烯-異丁烯-苯乙烯共聚物,酸酐基濃度:0.464 mmol/g,數量平均分子量:35,800)、星光PMC公司「T-YP8930」(甲基丙烯酸縮水甘油酯改質苯乙烯-異丁烯-苯乙烯共聚物,環氧基濃度:0.638mmol/g,數量平均分子量:48,700)。A specific example of styrene-isobutylene copolymer is "SIBSTAR T102" (styrene-isobutylene-styrene block copolymer, number average molecular weight: 100,000, styrene content: 30% by mass), "T-YP757B" (maleic anhydride modified styrene-isobutylene-styrene block copolymer, anhydride group concentration: 0.464mmol/g, number average molecular weight: 100,000) manufactured by Starlight PMC, "T-YP766" (methacrylate glycidyl modified styrene-isobutylene-styrene block copolymer, epoxy group concentration: 0.638mmol/g, number average molecular weight: 100,000) manufactured by Starlight PMC, "T-YP8920" (maleic anhydride modified styrene-isobutylene-styrene copolymer, anhydride group concentration: 0.464 mmol/g, number average molecular weight: 35,800), Starlight PMC's "T-YP8930" (methacrylate-modified styrene-isobutylene-styrene copolymer, epoxy concentration: 0.638mmol/g, number average molecular weight: 48,700).
作為乙烯系樹脂或丙烯系樹脂之具體例係可舉出三井化學公司製「EPT X-3012P」(乙烯-丙烯-5-亞乙基-2-降莰烯共聚物、三井化學公司製「EPT 1070」(乙烯-丙烯-二環戊二烯共聚物)、三井化學公司製「TAFMER A 4085」(乙烯-丁烯共聚物)。Specific examples of the ethylene resin or propylene resin include "EPT X-3012P" manufactured by Mitsui Chemicals (ethylene-propylene-5-ethylidene-2-norbornene copolymer), "EPT 1070" manufactured by Mitsui Chemicals (ethylene-propylene-dicyclopentadiene copolymer), and "TAFMER A 4085" manufactured by Mitsui Chemicals (ethylene-butene copolymer).
作為乙烯-甲基丙烯酸甲酯共聚物之具體例係可舉出星光PMC公司製「T-YP429」(馬來酸酐改質乙烯-甲基丙烯酸甲酯共聚物(每個乙烯單位和甲基丙烯酸甲酯單位之合計100質量%之甲基丙烯酸甲酯單位之量:32質量%,酸酐基濃度:0.46mmol/g,數量平均分子量:2,300)之20質量%甲苯溶液)、星光PMC公司製「T-YP430」(馬來酸酐改質乙烯-甲基丙烯酸甲酯共聚物,每個乙烯單位和甲基丙烯酸甲酯單位之合計100質量%之甲基丙烯酸甲酯單位之量:32質量%,酸酐基濃度:1.18 mmol/g,數量平均分子量:4,500)、星光PMC公司製「T-YP 431」(甲基丙烯酸縮水甘油酯改質乙烯-甲基丙烯酸甲酯共聚物(環氧基濃度:0.64mmol/g,數量平均分子量:2,400)之20質量%甲苯溶液)、星光PMC公司製「T-YP 432」(甲基丙烯酸縮水甘油酯改質乙烯-甲基丙烯酸甲酯共聚物,環氧基濃度:1.63mmol/g,數量平均分子量:3,100)。Specific examples of ethylene-methyl methacrylate copolymers include "T-YP429" manufactured by Starlight PMC (a 20% by mass toluene solution of maleic anhydride-modified ethylene-methyl methacrylate copolymer (the amount of methyl methacrylate units per 100% by mass of the total of ethylene units and methyl methacrylate units: 32% by mass, anhydride group concentration: 0.46 mmol/g, number average molecular weight: 2,300)), "T-YP430" manufactured by Starlight PMC (a maleic anhydride-modified ethylene-methyl methacrylate copolymer, the amount of methyl methacrylate units per 100% by mass of the total of ethylene units and methyl methacrylate units: 32% by mass, anhydride group concentration: 1.18 mmol/g, number average molecular weight: 4,500), and "T-YP "T-YP 431" (20 mass% toluene solution of ethylene-methyl methacrylate copolymer modified with glycidyl methacrylate (epoxy group concentration: 0.64 mmol/g, number average molecular weight: 2,400)) manufactured by Starlight PMC Co., Ltd. (20 mass% toluene solution of ethylene-methyl methacrylate copolymer modified with glycidyl methacrylate (epoxy group concentration: 0.64 mmol/g, number average molecular weight: 2,400)), "T-YP 432" (ethylene-methyl methacrylate copolymer modified with glycidyl methacrylate, epoxy group concentration: 1.63 mmol/g, number average molecular weight: 3,100) manufactured by Starlight PMC Co., Ltd.
作為丙烯-丁烯共聚物之具體例係可舉出星光PMC公司製「T-YP341」(甲基丙烯酸縮水甘油酯改質丙烯-丁烯隨機共聚物(每丙烯單位和丁烯單位之合計100質量%之丁烯單位之量:29質量%,環氧基濃度:0.638 mmol/g),數量平均分子量:155,000)之20質量%Swasol溶液)、星光PMC公司製「T-YP279」(馬來酸酐改質丙烯-丁烯隨機共聚物,每丙烯單位和丁烯單位之合計100質量%之丁烯單位之量:36質量%,酸酐基濃度:0.464mmol/g,數量平均分子量:35,000)、星光PMC公司製「T-YP276」(甲基丙烯酸縮水甘油酯改質丙烯-丁烯隨機共聚物,每丙烯單位和丁烯單位之合計100質量%之丁烯單位之量:36質量%,環氧基濃度:0.638mmol/g),數量平均分子量:57,000)、星光PMC公司製「T-YP312」(馬來酸酐改質丙烯-丁烯隨機共聚物(每丙烯單位和丁烯單位之合計100質量%之丁烯單位之量:29質量%,酸酐基濃度:0.464mmol/g,數量平均分子量:60,900)之40質量%甲苯溶液、星光PMC公司製「T-YP313」(甲基丙烯酸縮水甘油酯改質丙烯-丁烯隨機共聚物(每丙烯單位和丁烯單位之合計100質量%之丁烯單位之量:29質量%,環氧基濃度:0.638mmol/g,數量平均分子量:155,000)之20質量%甲苯溶液)。As a specific example of propylene-butene copolymer, there is "T-YP341" manufactured by Starlight PMC (methacrylate glycidyl modified propylene-butene random copolymer (amount of butene units per 100% by mass of the total of propylene units and butene units: 29% by mass, epoxy group concentration: 0.638% by mass). mmol/g), number average molecular weight: 155,000), "T-YP279" manufactured by Starlight PMC (maleic anhydride modified propylene-butene random copolymer, the amount of butene units per 100% by mass of propylene units and butene units: 36% by mass, anhydride group concentration: 0.464mmol/g, number average molecular weight: 35,000), "T-YP276" manufactured by Starlight PMC (glycidyl methacrylate modified propylene-butene random copolymer, the amount of butene units per 100% by mass of propylene units and butene units: 36% by mass, epoxy group concentration: 0.638mmol/g), number average molecular weight "T-YP312" manufactured by Starlight PMC (a 40% toluene solution of a propylene-butene random copolymer modified with maleic anhydride (amount of butene units per 100% by mass of the total of propylene units and butene units: 29% by mass, anhydride group concentration: 0.464 mmol/g, number average molecular weight: 60,900), "T-YP313" manufactured by Starlight PMC (a 20% toluene solution of a propylene-butene random copolymer modified with glycidyl methacrylate (amount of butene units per 100% by mass of the total of propylene units and butene units: 29% by mass, epoxy group concentration: 0.638 mmol/g, number average molecular weight: 155,000)).
烯烴系樹脂為包含具有環氧基的烯烴系樹脂的情況,亦可使用可與環氧基反應,且具有酸酐基以外之官能基的烯烴系樹脂。作為前述官能基係例如可舉出羥基、酚性羥基、胺基、羧基及酸酐基等。When the olefinic resin includes an olefinic resin having an epoxy group, an olefinic resin that can react with an epoxy group and has a functional group other than an acid anhydride group may also be used. Examples of the functional group include a hydroxyl group, a phenolic hydroxyl group, an amino group, a carboxyl group, and an acid anhydride group.
烯烴系樹脂為包含具有酸酐基的烯烴系樹脂的情況,亦可使用可與酸酐基反應,且具有環氧基以外之官能基的烯烴系樹脂。作為前述官能基係例如可舉出羥基、1級或2級之胺基、硫醇基、環氧基、氧雜環丁烷基等。When the olefinic resin includes an olefinic resin having an acid anhydride group, an olefinic resin that can react with an acid anhydride group and has a functional group other than an epoxide group may also be used. Examples of the functional group include a hydroxyl group, a primary or secondary amine group, a thiol group, an epoxide group, and an oxacyclobutane group.
環氧樹脂係如為平均而每1分子具有2個以上之環氧基者,則可無限制地使用。作為環氧樹脂係例如可舉出雙酚A型環氧樹脂、氫化雙酚A型環氧樹脂、聯苯型環氧樹脂、聯苯芳烷基型環氧樹脂、萘酚型環氧樹脂、萘型環氧樹脂、雙酚F型環氧樹脂、含磷之環氧樹脂、雙酚S型環氧樹脂、芳香族縮水甘油胺型環氧樹脂(例如,四縮水甘油基二胺基二苯甲烷、三縮水甘油基-p-胺基苯酚、二縮水甘油基甲苯胺、二縮水甘油基苯胺)、脂環式環氧樹脂、脂肪族鏈狀環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、具有丁二烯結構的環氧樹脂、雙酚之二縮水甘油醚化物、萘二醇之二縮水甘油醚化物、苯酚類之二縮水甘油醚化物、及醇類之二縮水甘油醚化物、以及此等之環氧樹脂之烷基取代物、鹵化物及氫化物等。環氧樹脂係可僅為1種,亦可為2種以上。Epoxy resins may be used without limitation as long as they have two or more epoxy groups per molecule on average. Examples of epoxy resins include bisphenol A type epoxy resins, hydrogenated bisphenol A type epoxy resins, biphenyl type epoxy resins, biphenyl aralkyl type epoxy resins, naphthol type epoxy resins, naphthalene type epoxy resins, bisphenol F type epoxy resins, phosphorus-containing epoxy resins, bisphenol S type epoxy resins, aromatic glycidylamine type epoxy resins (e.g., tetraglycidyl diaminodiphenylmethane, triglycidyl-p-aminophenol, diglycidyl toluidine, diglycidyl glyceryl aniline), alicyclic epoxy resins, aliphatic chain epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, bisphenol A novolac type epoxy resins, epoxy resins having a butadiene structure, diglycidyl ethers of bisphenol, diglycidyl ethers of naphthalene diol, diglycidyl ethers of phenols, diglycidyl ethers of alcohols, and alkyl substituted products, halides and hydrogenated products of these epoxy resins. The epoxy resin may be only one type or two or more types.
環氧樹脂之環氧當量係由反應性等之觀點視之,理想為50~5,000,較理想為50~3,000,較理想為80~2,000,較理想為100~1,000,較理想為120~1,000,較理想為140~300。尚,所謂「環氧當量」係包含1克當量之環氧基的樹脂之克數(g/eq),按照JIS K 7236所規定的方法而測定。又,環氧樹脂之重量平均分子量係理想為5,000以下。The epoxy equivalent of the epoxy resin is preferably 50 to 5,000, more preferably 50 to 3,000, more preferably 80 to 2,000, more preferably 100 to 1,000, more preferably 120 to 1,000, and more preferably 140 to 300, from the viewpoint of reactivity. Here, the so-called "epoxy equivalent" is the number of grams of the resin containing 1 gram equivalent of epoxy groups (g/eq), and is measured according to the method specified in JIS K 7236. In addition, the weight average molecular weight of the epoxy resin is preferably 5,000 or less.
環氧樹脂係可為液狀或固體狀之任一者,亦可使用液狀環氧樹脂和固體狀環氧樹脂之雙方。在此,所謂「液狀」及「固體狀」係在常溫(25℃)及常壓(1大氣壓)之環氧樹脂之狀態。Epoxy resin can be either liquid or solid, and both liquid epoxy resin and solid epoxy resin can be used. Here, the so-called "liquid" and "solid" refer to the state of epoxy resin at room temperature (25°C) and normal pressure (1 atmosphere).
環氧樹脂之量係無特別限制。在使用環氧樹脂的情況,該量係每樹脂組成物層之全體(亦即,每樹脂組成物之非揮發份全體),20~80質量%為理想,30~70質量%為較理想,50~65質量%為更理想。The amount of epoxy resin is not particularly limited. When epoxy resin is used, the amount is the total amount per resin component layer (i.e., the total amount of non-volatile components per resin component), preferably 20 to 80 mass %, more preferably 30 to 70 mass %, and even more preferably 50 to 65 mass %.
由本發明之密封用薄片之水分遮斷性之觀點視之,樹脂組成物層係包含半燒結水滑石為理想。半燒結水滑石係可僅為1種,亦可為2種以上。From the viewpoint of the moisture blocking property of the sealing sheet of the present invention, it is preferable that the resin composition layer contains semi-sintered hydrotalcite. The semi-sintered hydrotalcite may be only one kind or two or more kinds.
水滑石係可分類為未燒結水滑石、半燒結水滑石及燒結水滑石。Hydrotalcite can be classified into unsintered hydrotalcite, semi-sintered hydrotalcite and sintered hydrotalcite.
未燒結水滑石係例如為如天然水滑石(Mg6 Al2 (OH)16 CO3 ・4H2 O)所代表的具有層狀之晶體結構的金屬氫氧化物,例如由成為基本骨架的層[Mg1-X AlX (OH)2 ]X + 和中間層[(CO3 )X/2 ・mH2 O]X- 所構成。在本發明的未燒結水滑石係包含合成水滑石等之類水滑石化合物的概念。作為類水滑石化合物係例如可舉出以下述式(I)及下述式(II)所示者。Unsintered hydrotalcite is a metal hydroxide having a layered crystal structure such as represented by natural hydrotalcite (Mg 6 Al 2 (OH) 16 CO 3・4H 2 O), and is composed of layers [Mg 1-X Al X (OH) 2 ] X + as a basic skeleton and intermediate layers [(CO 3 ) X/2・mH 2 O] X- . Unsintered hydrotalcite in the present invention is a concept including hydrotalcite compounds such as synthetic hydrotalcite. Examples of hydrotalcite-like compounds include those represented by the following formula (I) and the following formula (II).
(式中,M2 + 係表示Mg2 + 、Zn2 + 等之2價之金屬離子,M3 + 係表示Al3 + 、Fe3 + 等之3價之金屬離子,An- 係表示CO3 2- 、Cl- 、NO3 - 等之n價之陰離子,0<x<1,0≦m<1,n為正數)。 式(I)中,M2 + 係理想為Mg2 + ,M3 + 係理想為Al3 + ,An- 係理想為CO3 2- 。 (In the formula, M2 + represents a divalent metal ion such as Mg2 + , Zn2 + , etc., M3 + represents a trivalent metal ion such as Al3 + , Fe3 +, etc., An- represents an n-valent anion such as CO32- , Cl- , NO3- , etc., 0<x<1, 0≦m<1, and n is a positive number). In formula (I), M2 + is ideally Mg2 + , M3 + is ideally Al3 + , and An- is ideally CO32- .
(式中,M2 + 係表示Mg2 + 、Zn2 + 等之2價之金屬離子,An- 係表示CO3 2- 、Cl- 、NO3- 等之n價之陰離子,x為2以上之正數,z為2以下之正數,m為正數,n為正數)。 式(II)中,M2 + 係理想為Mg2 + ,An- 係理想為CO3 2- 。 (In the formula, M 2 + represents a divalent metal ion such as Mg 2 + and Zn 2 + , An- represents an n -valent anion such as CO 3 2- , Cl - , NO 3- , x is a positive number greater than or equal to 2, z is a positive number less than or equal to 2, m is a positive number, and n is a positive number.) In formula (II), M 2 + is preferably Mg 2 + , and An- is preferably CO 3 2- .
半燒結水滑石係稱燒結未燒結水滑石而可得,且具有層間水之量為減少或消失的層狀之晶體結構的金屬氫氧化物。所謂「層間水」係使用組成式而說明,則指上述的未燒結之天然水滑石及類水滑石化合物之組成式所記載之「H2 O」。Semi-sintered hydrotalcite is a metal hydroxide obtained by sintering unsintered hydrotalcite and having a layered crystal structure in which the amount of interlayer water is reduced or absent. The so-called "interlayer water" is explained using the composition formula and refers to the "H 2 O" described in the composition formula of the unsintered natural hydrotalcite and hydrotalcite-like compounds mentioned above.
另一方面,燒結水滑石係稱燒結未燒結水滑石或半燒結水滑石而可得,不僅層間水,且羥基亦因縮合脫水而消失,且具有非晶質構造的金屬氧化物。On the other hand, sintered hydrotalcite is obtained by sintering unsintered hydrotalcite or semi-sintered hydrotalcite, and not only interlayer water but also hydroxyl groups disappear due to condensation dehydration, and it is a metal oxide with an amorphous structure.
未燒結水滑石、半燒結水滑石及燒結水滑石係可藉由飽和吸水率而區別。半燒結水滑石之飽和吸水率係1質量%以上、未達20質量%。另一方面未燒結水滑石之飽和吸水率係未達1質量%,燒結水滑石之飽和吸水率係20質量%以上。Unsintered hydrotalcite, semi-sintered hydrotalcite and sintered hydrotalcite can be distinguished by their saturated water absorption. The saturated water absorption of semi-sintered hydrotalcite is 1% by mass or more and less than 20% by mass. On the other hand, the saturated water absorption of unsintered hydrotalcite is less than 1% by mass, and the saturated water absorption of sintered hydrotalcite is 20% by mass or more.
所謂在本發明的「飽和吸水率」係稱將未燒結水滑石、半燒結水滑石或燒結水滑石以天秤量取1.5g,測定初期質量後,在大氣壓下,在已設定為60℃、90%RH (相對濕度)的小型環境試驗器(espec公司製SH-222)靜置200小時的情況之相對於初期質量的質量增加率,可以下述式(i): 飽和吸水率(質量%) =100×(吸濕後之質量-初期質量)/初期質量 (i) 求出。The so-called "saturated water absorption rate" in the present invention refers to the mass increase rate relative to the initial mass when 1.5 g of unsintered hydrotalcite, semi-sintered hydrotalcite or sintered hydrotalcite is weighed on a scale, the initial mass is measured, and then the sample is placed in a small environmental tester (SH-222 manufactured by espec) set to 60°C and 90%RH (relative humidity) under atmospheric pressure for 200 hours. The mass increase rate can be calculated using the following formula (i): Saturated water absorption rate (mass %) = 100 × (mass after moisture absorption - initial mass) / initial mass (i).
半燒結水滑石之飽和吸水率係理想為3質量%以上、未達20質量%,較理想為5質量%以上、未達20質量%。The saturated water absorption rate of the semi-sintered hydrotalcite is preferably 3% by mass or more and less than 20% by mass, and more preferably 5% by mass or more and less than 20% by mass.
又,未燒結水滑石、半燒結水滑石及燒結水滑石係可藉由以熱重量分析而測定的熱重量減少率而區別。半燒結水滑石之在280℃的熱重量減少率係未達15質量%,且該在380℃的熱重量減少率係12質量%以上。另一方面,未燒結水滑石之在280℃的熱重量減少率係15質量%以上,燒結水滑石之在380℃的熱重量減少率係未達12質量%。In addition, unsintered hydrotalcite, semi-sintered hydrotalcite and sintered hydrotalcite can be distinguished by the thermogravimetric loss rate measured by thermogravimetric analysis. The thermogravimetric loss rate of semi-sintered hydrotalcite at 280°C is less than 15% by mass, and the thermogravimetric loss rate at 380°C is 12% by mass or more. On the other hand, the thermogravimetric loss rate of unsintered hydrotalcite at 280°C is 15% by mass or more, and the thermogravimetric loss rate of sintered hydrotalcite at 380°C is less than 12% by mass.
熱重量分析係使用日立High-Tech Science公司製TG/DTA EXSTAR6300,可於鋁製之樣本盤稱量5mg水滑石,在不加蓋而開放之狀態,在氮流量200mL/分之環境下,從30℃至550℃以昇溫速度10℃/分之條件進行。熱重量減少率係可以下述式(ii): 熱重量減少率(質量%) =100×(加熱前之質量-達到特定溫度時之質量)/加熱前 之質量 (ii) 求出。Thermogravimetric analysis was performed using TG/DTA EXSTAR6300 manufactured by Hitachi High-Tech Science. 5 mg of hydrotalcite was weighed on an aluminum sample plate. The plate was left uncovered and the temperature was raised from 30°C to 550°C at a rate of 10°C/min in an environment with a nitrogen flow rate of 200 mL/min. The thermogravimetric loss rate can be calculated using the following formula (ii): Thermogravimetric loss rate (mass %) = 100 × (mass before heating - mass when reaching a specific temperature) / mass before heating (ii).
又,未燒結水滑石、半燒結水滑石及燒結水滑石係可藉由以粉末X光繞射而測定的波峰及相對強度比而區別。半燒結水滑石係藉由粉末X光繞射而顯現2θ為於8~18˚附近分裂為二個的波峰、或是藉由二個波峰之合成而具有肩部的波峰,顯現於低角側的波峰或是肩部之繞射強度(=低角側繞射強度)、與顯現於高角側的波峰或是肩部之繞射強度(=高角側繞射強度)之相對強度比(低角側繞射強度/高角側繞射強度)為0.001~1,000。另一方面,未燒結水滑石係在8~18˚附近只有一個波峰、或是顯現於低角側的波峰或是肩部與顯現於高角側的波峰或是肩部之繞射強度之相對強度比成為前述之範圍外。燒結水滑石係於8˚~18˚之區域不具有特徵性的波峰,於43˚具有特徵性的波峰。粉末X光繞射測定係藉由粉末X光繞射裝置(PANalytical公司製,Empyrean),以對陰極CuKα(1.5405Å)、電壓:45V、電流:40mA、取樣寬:0.0260˚、掃描速度:0.0657˚/s、測定繞射角範圍(2θ):5.0131~79.9711˚之條件進行。波峰搜尋係利用繞射裝置附屬之軟體之波峰搜尋機能,可以「最小有義度:0.50、最小波峰搜尋:0.01˚、最大波峰搜尋:1.00˚、波峰基底寬:2.00˚、方法:2次微分之最小值」之條件進行。In addition, unsintered hydrotalcite, semi-sintered hydrotalcite and sintered hydrotalcite can be distinguished by the peaks and relative intensity ratios measured by powder X-ray diffraction. Semi-sintered hydrotalcite shows a peak split into two at about 8 to 18° or a peak with a shoulder by the combination of two peaks in 2θ by powder X-ray diffraction, and the relative intensity ratio (low-angle side diffraction intensity/high-angle side diffraction intensity) of the diffraction intensity of the peak or shoulder appearing on the low-angle side (= low-angle side diffraction intensity) and the diffraction intensity of the peak or shoulder appearing on the high-angle side (= high-angle side diffraction intensity) is 0.001 to 1,000. On the other hand, unsintered hydrotalcite has only one peak around 8-18°, or the relative intensity ratio of the diffraction intensity between the peak or shoulder appearing at the low angle and the peak or shoulder appearing at the high angle is outside the aforementioned range. Sintered hydrotalcite has no characteristic peak in the region of 8-18°, but has a characteristic peak at 43°. Powder X-ray diffraction measurement was performed by a powder X-ray diffraction device (Empyrean, PANalytical) with cathode CuKα (1.5405Å), voltage: 45V, current: 40mA, sampling width: 0.0260˚, scanning speed: 0.0657˚/s, and measurement diffraction angle range (2θ): 5.0131-79.9711˚. Peak search was performed using the peak search function of the software attached to the diffraction device under the conditions of "minimum significance: 0.50, minimum peak search: 0.01˚, maximum peak search: 1.00˚, peak base width: 2.00˚, method: minimum value of second derivative".
半燒結水滑石之BET比表面積係1~250m2 /g為理想,5~200m2 /g為較理想。半燒結水滑石之BET比表面積係可依照BET法,使用比表面積測定裝置(Macsorb HM Model 1210 Mountech公司製)而於試料表面使氮氣氣體吸附,使用BET多點法而算出。The BET specific surface area of semi-sintered hydrotalcite is preferably 1-250 m 2 /g, and more preferably 5-200 m 2 /g. The BET specific surface area of semi-sintered hydrotalcite can be calculated by the BET multi-point method using a specific surface area measuring device (Macsorb HM Model 1210 manufactured by Mountech) and adsorbing nitrogen gas on the sample surface.
半燒結水滑石之平均粒徑係1~1,000nm為理想,10~800nm為較理想。半燒結水滑石之平均粒徑係藉由雷射繞射散射式粒度分布測定(JIS Z 8825)而將粒度分布以體積基準作成時之該粒度分布之中位徑。The average particle size of semi-sintered hydrotalcite is preferably 1-1,000nm, and more preferably 10-800nm. The average particle size of semi-sintered hydrotalcite is the median diameter of the particle size distribution when the particle size distribution is made on a volume basis by laser diffraction scattering particle size distribution measurement (JIS Z 8825).
半燒結水滑石係可使用以表面處理劑進行表面處理者。作為使用於表面處理的表面處理劑係例如可使用高級脂肪酸、烷基矽烷類、矽烷偶合劑等,其中,尤其是高級脂肪酸、烷基矽烷類為合適。表面處理劑係可使用1種或2種以上。Semi-sintered hydrotalcite can be surface treated with a surface treatment agent. Examples of the surface treatment agent used for the surface treatment include higher fatty acids, alkyl silanes, and silane coupling agents. Among them, higher fatty acids and alkyl silanes are particularly suitable. One or more surface treatment agents can be used.
作為高級脂肪酸係例如可舉出硬脂酸、褐煤酸、肉荳蔻酸、棕櫚酸等之碳數18以上之高級脂肪酸,其中,尤其是硬脂酸為理想。此等係可使用1種或2種以上。Examples of the higher fatty acid include stearic acid, montanic acid, myristic acid, palmitic acid, and the like, and stearic acid is particularly preferred. One or more of these can be used.
作為烷基矽烷類係例如可舉出甲基三甲氧基矽烷,乙基三甲氧基矽烷,己基三甲氧基矽烷,辛基三甲氧基矽烷,癸基三甲氧基矽烷,十八烷基三甲氧基矽烷,二甲基二甲氧基矽烷,辛基三乙氧基矽烷,n-十八烷基二甲基(3-(三甲氧基矽烷基)丙基)氯化銨等。此等係可使用1種或2種以上。Examples of the alkylsilane include methyltrimethoxysilane, ethyltrimethoxysilane, hexyltrimethoxysilane, octyltrimethoxysilane, decyltrimethoxysilane, octadecyltrimethoxysilane, dimethyldimethoxysilane, octyltriethoxysilane, n-octadecyldimethyl(3-(trimethoxysilyl)propyl)ammonium chloride, etc. These may be used alone or in combination.
作為矽烷偶合劑係例如可舉出3-縮水甘油基氧基丙基三甲氧基矽烷、3-縮水甘油基氧基丙基三乙氧基矽烷、3-縮水甘油基氧基丙基(二甲氧基)甲基矽烷及2-(3,4-環氧環己基)乙基三甲氧基矽烷等之環氧系矽烷偶合劑;3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷及11-巰基十一烷基三甲氧基矽烷等之巰基系矽烷偶合劑;3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-胺基丙基二甲氧基甲基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、N-甲基胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷及N-(2-胺基乙基)-3-胺基丙基二甲氧基甲基矽烷等之胺基系矽烷偶合劑;3-脲基丙基三乙氧基矽烷等之脲基系矽烷偶合劑、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷及乙烯基甲基二乙氧基矽烷等之乙烯基系矽烷偶合劑;p-苯乙烯基三甲氧基矽烷等之苯乙烯基系矽烷偶合劑;3-丙烯醯氧基丙基三甲氧基矽烷及3-甲基丙烯醯氧基丙基三甲氧基矽烷等之丙烯酸酯系矽烷偶合劑;3-異氰酸酯丙基三甲氧基矽烷等之異氰酸酯系矽烷偶合劑、雙(三乙氧基矽烷基丙基)二硫醚、雙(三乙氧基矽烷基丙基)四硫醚等之硫醚系矽烷偶合劑;苯基三甲氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷、咪唑矽烷、三嗪矽烷等。此等係可使用1種或2種以上。Examples of the silane coupling agent include epoxy-based silane coupling agents such as 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxypropyl(dimethoxy)methylsilane, and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane; 3-butylpropyltrimethoxysilane, 3-butylpropyltriethoxysilane, 3-butylpropylmethyl 1-Aminopropyltrimethoxysilane, 11-Aminopropyltrimethoxysilane, 11-Aminopropyltriethoxysilane, 11-Aminopropyltrimeth ... Amine-based silane coupling agents such as (aminoethyl)-3-aminopropyl dimethoxymethyl silane; urea-based silane coupling agents such as 3-ureidopropyl triethoxy silane; vinyl-based silane coupling agents such as vinyl trimethoxy silane, vinyl triethoxy silane and vinyl methyl diethoxy silane; styrene-based silane coupling agents such as p-styrene trimethoxy silane; 3-acryloxypropyl trimethoxy silane Silane coupling agents include acrylate-based silane coupling agents such as 3-isocyanatepropyltrimethoxysilane, bis(triethoxysilylpropyl)disulfide, bis(triethoxysilylpropyl)tetrasulfide, and phenyltrimethoxysilane, methacryloyloxypropyltrimethoxysilane, imidazole silane, triazine silane, and the like. One or more of these may be used.
半燒結水滑石之表面處理係例如可使未處理之半燒結水滑石以混合機在常溫攪拌分散,同時藉由將表面處理劑進行添加噴霧而攪拌5~60分鐘而進行。作為混合機係可使用一般周知之混合機,可舉出例如V型摻合機、帶式摻合機、氣泡錐型摻合機等之摻合機、亨舍爾混合機及混凝土混合機等之混合機、球磨機、粗磨粉碎機等。又,亦可在以球磨機等粉碎半燒結水滑石時,添加前述之高級脂肪酸、烷基矽烷類或是矽烷偶合劑,進行表面處理。表面處理劑之使用量係依半燒結水滑石之種類或是表面處理劑之種類等而不同,但對於未被進行表面處理的半燒結水滑石100質量份而言,1~10質量份為理想。在本發明係已被表面處理的半燒結水滑石,亦被包含於「半燒結水滑石」。The surface treatment of the semi-sintered hydrotalcite can be carried out, for example, by stirring and dispersing the untreated semi-sintered hydrotalcite at room temperature with a mixer, and at the same time adding the surface treatment agent by spraying and stirring for 5 to 60 minutes. As the mixer, a generally known mixer can be used, for example, a V-type blender, a belt blender, a bubble cone blender, a Henschel mixer, a concrete mixer, a ball mill, a coarse grinding mill, etc. can be cited. In addition, when the semi-sintered hydrotalcite is pulverized with a ball mill, the aforementioned higher fatty acid, alkyl silane or silane coupling agent can be added to carry out the surface treatment. The amount of the surface treatment agent used varies depending on the type of semi-sintered hydrotalcite or the type of the surface treatment agent, but is preferably 1 to 10 parts by mass for 100 parts by mass of the semi-sintered hydrotalcite that has not been surface treated. In the present invention, the semi-sintered hydrotalcite that has been surface treated is also included in the "semi-sintered hydrotalcite".
於半燒結水滑石之量無特別限定。由密封用薄片之水分遮斷性之觀點視之,在使用半燒結水滑石的情況,該量係每樹脂組成物層之全體(亦即,每樹脂組成物之非揮發份全體),3~50質量%為理想,5~45質量%為較理想,10~40質量%為更理想。The amount of the semi-sintered hydrotalcite is not particularly limited. From the viewpoint of the moisture shielding property of the sealing sheet, when the semi-sintered hydrotalcite is used, the amount is preferably 3 to 50 mass %, more preferably 5 to 45 mass %, and even more preferably 10 to 40 mass % per the total amount of the resin composition layer (that is, the total amount of non-volatile components per resin composition).
作為半燒結水滑石係例如可舉出「DHT-4C」(協和化學工業公司製,平均粒徑:400nm)、「DHT-4A-2」(協和化學工業公司製,平均粒徑:400nm)等。作為燒結水滑石係例如可舉出「KW-2200」(協和化學工業公司製,平均粒徑:400nm)等,作為未燒結水滑石係例如可舉出「DHT-4A」」(協和化學工業公司製,平均粒徑:400nm)等。Examples of semi-sintered hydrotalcites include "DHT-4C" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle size: 400 nm) and "DHT-4A-2" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle size: 400 nm). Examples of sintered hydrotalcites include "KW-2200" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle size: 400 nm), and examples of unsintered hydrotalcites include "DHT-4A" (manufactured by Kyowa Chemical Industry Co., Ltd., average particle size: 400 nm).
樹脂組成物層係亦可包含與上述的烯烴系樹脂、環氧樹脂及半燒結水滑石係不同的其他成分。對其他成分係無限制,作為密封用之樹脂組成物之成分可使用一般周知者。作為其他成分係例如可舉出硬化劑、硬化促進劑、與烯烴系樹脂及環氧樹脂不同的其他之樹脂、與半燒結水滑石不同的其他無機填充劑、矽烷偶合劑等。此等之其他成分係均可僅為1種,亦可為2種以上。The resin composition layer may also contain other components different from the above-mentioned olefin resin, epoxy resin and semi-sintered hydrotalcite. There is no limitation on the other components, and generally known components of the resin composition for sealing can be used. Examples of other components include hardeners, hardening accelerators, other resins different from olefin resins and epoxy resins, other inorganic fillers different from semi-sintered hydrotalcite, and silane coupling agents. These other components may be only one or more.
在使用具有環氧基的烯烴系樹脂及/或環氧樹脂的情況,為了該硬化,使用硬化劑、或是併用硬化劑及硬化促進劑為理想。When using an olefinic resin and/or an epoxy resin having an epoxy group, it is desirable to use a hardener, or to use a hardener and a hardening accelerator in combination for the hardening.
在本發明,樹脂組成物層係亦可包含與烯烴系樹脂及環氧樹脂係不同的其他之樹脂。作為其他樹脂係例如可舉出增黏樹脂、與烯烴系樹脂係不同的熱可塑性樹脂(例如,苯氧基樹脂等)。苯氧基樹脂係與環氧樹脂同樣地,可具有環氧基。苯氧基樹脂之環氧當量係理想為超過5,000、16,000以下,較理想為10,000以上、16,000以下。In the present invention, the resin composition layer may also include other resins different from the olefinic resin and the epoxy resin. Examples of other resins include tackifying resins and thermoplastic resins different from the olefinic resin (e.g., phenoxy resins). Phenoxy resins may have epoxy groups, similar to epoxy resins. The epoxy equivalent of the phenoxy resin is preferably greater than 5,000 and less than 16,000, and more preferably greater than 10,000 and less than 16,000.
在本發明,樹脂組成物層係亦可包含與半燒結水滑石係不同的其他無機填充劑。作為其他之無機填充劑係例如可舉出未燒結水滑石、燒結水滑石、滑石、二氧化矽、氧化鋁、硫酸鋇、黏土、雲母、氫氧化鋁、氫氧化鎂、碳酸鈣、碳酸鎂、氮化硼、硼酸鋁、鈦酸鋇、鈦酸鍶、鈦酸鈣、鈦酸鎂、 鈦酸鉍、氧化鈦、鋯酸鋇、鋯酸鈣等。其他無機填充劑之量係每樹脂組成物層之全體(亦即,每樹脂組成物之非揮發份全體),理想為0~12質量%,較理想為0~10質量%,更理想為0~8質量%。In the present invention, the resin composition layer may also contain other inorganic fillers different from the semi-sintered hydrotalcite. Examples of other inorganic fillers include unsintered hydrotalcite, sintered hydrotalcite, talc, silica, aluminum oxide, barium sulfate, clay, mica, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, boron nitride, aluminum borate, barium titanate, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, calcium zirconate, and the like. The amount of other inorganic fillers is the total amount of each resin composition layer (that is, the total amount of non-volatile matter in each resin composition), preferably 0-12% by mass, more preferably 0-10% by mass, and even more preferably 0-8% by mass.
樹脂組成物層之厚度係理想為5~75μm,較理想為10~50μm,更理想為15~50μm。The thickness of the resin composition layer is preferably 5 to 75 μm, more preferably 10 to 50 μm, and even more preferably 15 to 50 μm.
例如藉由於第1薄膜(支撐體)塗布及乾燥樹脂組成物清漆,形成樹脂組成物層,層合第2薄膜(覆蓋薄膜)於所得到的樹脂組成物層,可製造本發明之密封用薄片。For example, the sealing sheet of the present invention can be manufactured by coating and drying a resin composition varnish on a first film (support) to form a resin composition layer, and laminating a second film (covering film) on the obtained resin composition layer.
樹脂組成物清漆係將樹脂組成物之成分與有機溶劑,以使用混練滾筒或旋轉混合機等而混合而調製。樹脂組成物清漆之非揮發份係理想為20~80質量%,較理想為30~70質量%。The resin composition varnish is prepared by mixing the components of the resin composition with an organic solvent using a kneading drum or a rotary mixer. The non-volatile matter of the resin composition varnish is preferably 20 to 80% by mass, more preferably 30 to 70% by mass.
作為有機溶劑係例如可舉出丙酮、甲基乙基酮(MEK)、環己酮等之酮類;乙酸乙酯、乙酸丁酯、醋酸溶纖劑、丙二醇單甲基醚乙酸酯及卡必醇乙酸酯等之乙酸酯類;溶纖劑及丁基卡必醇等之卡必醇類;甲苯及二甲苯等之芳香族烴類;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等;溶劑油等之芳香族系混合溶劑。又,作為芳香族系混合溶劑之商品,例如可舉出「Swasol」(丸善石油公司製)、「Ipsol」(出光興產公司製)。有機溶劑係可僅為1種,亦可為2種以上。Examples of organic solvents include ketones such as acetone, methyl ethyl ketone (MEK), and cyclohexanone; acetates such as ethyl acetate, butyl acetate, acetic acid solvent, propylene glycol monomethyl ether acetate, and carbitol acetate; carbitols such as solvent and butyl carbitol; aromatic hydrocarbons such as toluene and xylene; dimethylformamide, dimethylacetamide, N-methylpyrrolidone, and aromatic mixed solvents such as solvent oil. In addition, as commercial products of aromatic mixed solvents, examples include "Swasol" (manufactured by Maruzen Oil Co., Ltd.) and "Ipsol" (manufactured by Idemitsu Kosan Co., Ltd.). The organic solvent may be only one kind or two or more kinds.
用以形成樹脂組成物層的乾燥條件無特別限制,但乾燥溫度係例如為80~130℃,乾燥時間係例如為3~60分鐘。在樹脂組成物層為包含環氧樹脂的情況,乾燥溫度係理想為80~100℃,乾燥時間係理想為5~90分鐘。在樹脂組成物層為不包含環氧樹脂,而為包含烯烴系樹脂的情況,乾燥溫度係理想為80~130℃,乾燥時間係理想為15~60分鐘。The drying conditions for forming the resin composition layer are not particularly limited, but the drying temperature is, for example, 80 to 130° C., and the drying time is, for example, 3 to 60 minutes. When the resin composition layer contains an epoxy resin, the drying temperature is preferably 80 to 100° C., and the drying time is preferably 5 to 90 minutes. When the resin composition layer does not contain an epoxy resin but contains an olefin resin, the drying temperature is preferably 80 to 130° C., and the drying time is preferably 15 to 60 minutes.
藉由於第1薄膜上形成樹脂組成物層後,層合第2薄膜於所得到的樹脂組成物層,可製造密封用薄片。藉由於第2薄膜上形成樹脂組成物層後,層合第1薄膜於所得到的樹脂組成物層,亦可製造密封用薄片。為了層合,可使用一般周知之機器,例如,輥層合機、沖壓機、真空加壓式層疊機等。 [實施例]A sealing sheet can be manufactured by forming a resin composition layer on a first film and then laminating a second film on the resulting resin composition layer. A sealing sheet can also be manufactured by forming a resin composition layer on a second film and then laminating a first film on the resulting resin composition layer. For lamination, generally known machines such as a roll laminator, a punch, a vacuum press laminator, etc. can be used. [Example]
以下,舉出實施例而更具體地說明本發明,但本發明係並非因以下之實施例而受到限制,當然可在可適於上述、下述之趣旨的範圍加以適當地變更而實施,該等均被包含在本發明之技術上的範圍。The present invention is described in more detail below with reference to embodiments. However, the present invention is not limited to the embodiments below, and can be implemented with appropriate modifications within the scope of the above and below purposes, all of which are included in the technical scope of the present invention.
<薄膜> 將在以下之實施例、比較例使用的防濕性薄膜、附脫模層之PET薄膜、以後述的方法測定的WVTR等記載於下述表1。<Film> The moisture-proof films and PET films with release layers used in the following embodiments and comparative examples, and the WVTR measured by the method described below are shown in the following Table 1.
在實施例1~5及比較例1,製作密封薄膜,該密封薄膜係將第1薄膜(支撐體)及第2薄膜(覆蓋薄膜)一起在有機EL裝置之密封層(樹脂組成物層或是該硬化物層)之形成前後被剝離設為前提。在實施例之密封薄膜,使用以下之附脫模層之防濕性薄膜,該附脫模層之防濕性薄膜係第1薄膜及第2薄膜一起,於上述表1之防濕性薄膜之障壁層之相反面形成脫模層。 「附聚矽氧脫模層之薄膜A」:於薄膜A之障壁層之相反側之面,設置聚矽氧脫模層的防濕性薄膜。 「附醇酸脫模層之PET+薄膜A」:以接著劑貼合附醇酸脫模層之PET之脫模層之相反側之面與薄膜A之障壁層之相反側之面的防濕性薄膜(薄膜全體之厚度55μm)。 「附聚矽氧脫模層之PET+薄膜A」:以接著劑貼合附聚矽氧脫模層之PET之脫模層之相反側之面與薄膜A之障壁層之相反側之面的防濕性薄膜(薄膜全體之厚度55μm)。 「附聚矽氧脫模層之PET+薄膜B」:以接著劑貼合附聚矽氧脫模層之PET之脫模層之相反側之面與薄膜B之障壁層之相反側之面的防濕性薄膜(薄膜全體之厚度55μm)。 「附聚矽氧脫模層之PET+薄膜C」:以接著劑貼合附聚矽氧脫模層之PET之脫模層之相反側之面與薄膜C之障壁層之相反側之面的防濕性薄膜(薄膜全體之厚度55μm)。 「附聚矽氧脫模層之薄膜D」:於薄膜D之障壁層(鋁箔)之相反側之面,設置聚矽氧脫模層的防濕性薄膜(薄膜全體之厚度55μm)。 尚,在比較例及實施例使用的「附聚矽氧脫模層之PET」係於聚對苯二甲酸乙二酯薄膜之單面設置聚矽氧脫模層的薄膜。 尚,在比較例及實施例使用的「附醇酸脫模層之PET」係於聚對苯二甲酸乙二酯薄膜之單面設置醇酸脫模層的薄膜。In Examples 1 to 5 and Comparative Example 1, a sealing film is prepared, and the sealing film is based on the premise that the first film (support body) and the second film (covering film) are peeled off before or after the formation of the sealing layer (resin composition layer or the hardened layer) of the organic EL device. In the sealing film of the embodiment, the following moisture-proof film with a release layer is used, and the moisture-proof film with a release layer is a first film and a second film together, and a release layer is formed on the opposite side of the barrier layer of the moisture-proof film in Table 1 above. "Film A with polysilicone release layer": A moisture-proof film with a polysilicone release layer is provided on the surface opposite to the barrier layer of film A. "PET + Film A with alkyd release layer": a moisture-proof film (the thickness of the entire film is 55μm) in which the opposite side of the release layer of PET with alkyd release layer is bonded to the opposite side of the barrier layer of Film A with an adhesive. "PET + Film A with silicone release layer": a moisture-proof film (the thickness of the entire film is 55μm) in which the opposite side of the release layer of PET with silicone release layer is bonded to the opposite side of the barrier layer of Film A with an adhesive. "PET with silicone release layer + film B": a moisture-proof film (the thickness of the entire film is 55μm) in which the release layer of PET with silicone release layer is bonded to the opposite side of the barrier layer of film B with an adhesive. "PET with silicone release layer + film C": a moisture-proof film (the thickness of the entire film is 55μm) in which the release layer of PET with silicone release layer is bonded to the opposite side of the barrier layer of film C with an adhesive. "Film D with a silicone release layer": A moisture-proof film with a silicone release layer is provided on the surface opposite to the barrier layer (aluminum foil) of film D (the thickness of the entire film is 55μm). Also, the "PET with a silicone release layer" used in the comparative examples and the exemplary embodiments is a film with a silicone release layer provided on one side of a polyethylene terephthalate film. Also, the "PET with an alkyd release layer" used in the comparative examples and the exemplary embodiments is a film with an alkyd release layer provided on one side of a polyethylene terephthalate film.
<樹脂組成物清漆之製造> 製造例1:烯烴系樹脂組成物清漆之製造 於含環己烷之飽和烴樹脂(荒川化學公司製「Alcon P125」)之60質量%Swasol溶液130質量份,以三輥機分散馬來酸酐改質液狀聚異丁烯(東邦化學工業公司製「HV-300M」)35質量份、聚丁烯(JX Energy公司製「HV-1900」)60質量份及半燒結水滑石(協和化學工業公司製「DHT-4C」)100質量份,得到混合物。於已得到的混合物,調配甲基丙烯酸縮水甘油酯改質聚丙烯-聚丁烯共聚物之20質量%Swasol溶液(星光PMC公司製「T-YP341」)200質量份、陰離子聚合型硬化劑(2,4,6-參(二胺基甲基)酚)0.5質量份及甲苯16質量份,將已得到的混合物以高速旋轉混合機均勻地分散,得到烯烴系樹脂組成物清漆。<Manufacturing of resin composition varnish> Manufacturing Example 1: Manufacturing of olefin resin composition varnish In 130 parts by mass of 60 mass % Swasol solution of a saturated hydrocarbon resin containing cyclohexane ("Alcon P125" manufactured by Arakawa Chemicals Co., Ltd.), 35 parts by mass of liquid polyisobutylene modified with maleic anhydride ("HV-300M" manufactured by Toho Chemical Industries, Ltd.), 60 parts by mass of polybutene ("HV-1900" manufactured by JX Energy Co., Ltd.) and 100 parts by mass of semi-sintered hydrotalcite ("DHT-4C" manufactured by Kyowa Chemical Industries, Ltd.) were dispersed using a three-roll mill to obtain a mixture. 200 parts by weight of a 20% by weight Swasol solution of a polypropylene-polybutene copolymer modified with glycidyl methacrylate ("T-YP341" manufactured by Starlight PMC), 0.5 parts by weight of anionic polymerization hardener (2,4,6-tris(diaminomethyl)phenol) and 16 parts by weight of toluene were mixed into the obtained mixture, and the obtained mixture was uniformly dispersed in a high-speed rotary mixer to obtain an olefin resin composition varnish.
製造例2:環氧樹脂組成物清漆之製造 混練液狀雙酚A型環氧樹脂(三菱化學公司製「jER828EL」,環氧當量:約185)56質量份、矽烷偶合劑(信越化學工業公司製「KBM403」)1.2質量份、滑石粉末(日本滑石公司製「FG15」)2質量份及半燒結水滑石(協和化學工業公司製「DHT-4A-2」)15質量份後,以三輥研磨機進行分散,得到混合物。在使硬化促進劑(San-Apro公司製「U-3512T」)1.5質量份溶解於苯氧基樹脂(三菱化學公司製「YL7213」)之35質量%甲基乙基酮(MEK)溶液81質量份的混合物,首先調配已調製的藉由三輥研磨機而分散的混合物、和固形雙酚A型環氧樹脂之溶液(三菱化學公司製「jER1001」)之80質量%MEK溶液30質量份、和有機溶劑分散型膠體二氧化矽(非晶質二氧化矽粒徑10~15nm,非揮發份:30質量%、溶劑:MEK、日產化學工業公司製「MEK-EC-2130Y」)20質量份、和離子液體硬化劑(N-乙醯甘胺酸四丁基鏻鹽)3質量份,以高速旋轉混合機均勻地分散,得到環氧樹脂組成物清漆。Production Example 2: Production of epoxy resin composition varnish 56 parts by mass of liquid bisphenol A epoxy resin ("jER828EL" manufactured by Mitsubishi Chemical Corporation, epoxy equivalent: about 185), 1.2 parts by mass of silane coupling agent ("KBM403" manufactured by Shin-Etsu Chemical Industries, Ltd.), 2 parts by mass of talc powder ("FG15" manufactured by Nippon Talc Co., Ltd.) and 15 parts by mass of semi-sintered hydrotalcite ("DHT-4A-2" manufactured by Kyowa Chemical Industries, Ltd.) were kneaded and dispersed in a three-roll mill to obtain a mixture. A mixture of 1.5 parts by weight of a curing accelerator ("U-3512T" manufactured by San-Apro) dissolved in 81 parts by weight of a 35% by weight methyl ethyl ketone (MEK) solution of a phenoxy resin ("YL7213" manufactured by Mitsubishi Chemical) was prepared by first dispersing the mixture using a three-roll mill and 80 parts by weight of a solution of a solid bisphenol A epoxy resin ("jER1001" manufactured by Mitsubishi Chemical). 30 parts by mass of a MEK solution, 20 parts by mass of an organic solvent-dispersed colloidal silica (amorphous silica particle size 10-15 nm, non-volatile matter: 30% by mass, solvent: MEK, "MEK-EC-2130Y" manufactured by Nissan Chemical Industries, Ltd.), and 3 parts by mass of an ionic liquid hardener (tetrabutylphosphonium N-acetylglycine) were uniformly dispersed in a high-speed rotary mixer to obtain an epoxy resin composition varnish.
尚,上述離子液體硬化劑(N-乙醯甘胺酸四丁基鏻鹽)係用以下之順序合成。對於四丁基氫氧化鏻41.4質量%水溶液(北興化學工業公司製)20.0g,在0℃加入N-乙醯基甘胺酸(東京化成工業公司製)3.54g,攪拌10分鐘。使用蒸發器而減壓至40~50mmHg,在60~80℃以2小時,在90℃以5小時濃縮。在室溫再度溶解於乙酸乙酯(純正化學公司製)14.2ml,使用蒸發器而減壓至40~50mmHg,在70~90℃濃縮3小時。將N-乙醯甘胺酸四丁基鏻鹽11.7g(純度:96.9質量%)作為油狀化合物而得。The above-mentioned ionic liquid hardener (tetrabutylphosphonium N-acetylglycine) was synthesized by the following procedure. 3.54 g of N-acetylglycine (Tokyo Chemical Industry Co., Ltd.) was added to 20.0 g of a 41.4 mass% aqueous solution of tetrabutylphosphonium hydroxide (produced by Hokko Chemical Industry Co., Ltd.) at 0°C, and stirred for 10 minutes. The mixture was depressurized to 40-50 mmHg using an evaporator, and concentrated at 60-80°C for 2 hours and at 90°C for 5 hours. The mixture was dissolved again in 14.2 ml of ethyl acetate (produced by Junsei Chemical Co., Ltd.) at room temperature, depressurized to 40-50 mmHg using an evaporator, and concentrated at 70-90°C for 3 hours. 11.7 g (purity: 96.9 mass %) of N-acetylglycine tetrabutylphosphonium salt was obtained as an oily compound.
<密封用薄片之製造> 實施例1 將附聚矽氧脫模層之PET+薄膜A作為第1薄膜使用,將附聚矽氧脫模層之薄膜A作為第2薄膜使用。將在製造例1所得到的烯烴系樹脂組成物清漆,於第1薄膜之脫模層面,以模具塗佈機均勻地塗布,藉由在130℃加熱60分鐘,得到具有厚度20μm之樹脂組成物層的密封用薄片(樹脂組成物層中之殘留溶媒量:約1質量%)。接下來,以所得到的密封用薄片之樹脂組成物層與第2薄膜之脫模層面接觸之方式,貼合此等同時將密封用薄片捲取為輥狀。將輥狀之密封用薄片縱切為507mm,得到尺寸507×336mm之密封用薄片。將所得到的密封用薄片之構成,表示於以下之表2。<Manufacturing of Sealing Sheet> Example 1: PET+film A with a silicone release layer is used as the first film, and film A with a silicone release layer is used as the second film. The olefin resin composition varnish obtained in Manufacturing Example 1 is evenly applied to the release layer of the first film using a mold coater, and heated at 130°C for 60 minutes to obtain a sealing sheet having a resin composition layer with a thickness of 20 μm (the amount of residual solvent in the resin composition layer: about 1 mass %). Next, the obtained sealing sheet was rolled up into a roll while the resin composition layer of the obtained sealing sheet was in contact with the release layer of the second film. The rolled sealing sheet was cut into 507 mm lengthwise to obtain a sealing sheet with a size of 507×336 mm. The composition of the obtained sealing sheet is shown in Table 2 below.
實施例2~10及比較例1~3 將下述表2及表3所示的薄膜作為第1薄膜或第2薄膜使用,除了使用在製造例1或2所得到的烯烴系樹脂組成物清漆或環氧樹脂組成物清漆而形成樹脂組成物層以外係基本上與實施例1以同樣之方式進行,製造實施例2~10及比較例1~3之密封用薄片(樹脂組成物層之厚度20μm)。將所得到的密封用薄片之構成,表示於以下之表2及3。Examples 2 to 10 and Comparative Examples 1 to 3 The films shown in Tables 2 and 3 below were used as the first film or the second film. The sealing sheets of Examples 2 to 10 and Comparative Examples 1 to 3 (the thickness of the resin composition layer was 20 μm) were manufactured in basically the same manner as in Example 1, except that the olefin resin composition varnish or epoxy resin composition varnish obtained in Preparation Example 1 or 2 was used to form the resin composition layer. The composition of the obtained sealing sheets is shown in Tables 2 and 3 below.
尚,在使用環氧樹脂組成物清漆的實施例10及比較例3係在環氧樹脂組成物清漆之塗布後,以80~100℃(平均90℃)乾燥5分鐘,形成環氧樹脂組成物層(樹脂組成物層中之殘留溶媒量:約2質量%)。In Example 10 and Comparative Example 3 using the epoxy resin composition varnish, after the epoxy resin composition varnish was applied, it was dried at 80-100° C. (90° C. on average) for 5 minutes to form an epoxy resin composition layer (the amount of residual solvent in the resin composition layer: about 2 mass %).
又,在不具有脫模層的薄膜X或薄膜E作為第1薄膜使用的實施例6~10以及比較例2及3係以第2薄膜上之樹脂組成物層與第1薄膜之障壁層為接觸之方式,貼合此等同時將密封用薄片捲取為輥狀。In Examples 6 to 10 and Comparative Examples 2 and 3 in which a film X or a film E without a release layer is used as the first film, the resin composition layer on the second film is in contact with the barrier layer of the first film, and the sealing sheet is rolled up into a roll while these are attached.
<測定方法> (1) 水蒸氣透過度(WVTR)之測定 將記載於表1的薄膜A~薄膜X、聚矽氧剝離處理PET及醇酸剝離處理PET之水蒸氣透過度,用以下之方式進行而測定。首先,製作由薄膜沖裁為60mmφ的試驗片。按照JIS Z 0208:1976,於透過面積2.826×10-3 m2 (60mmφ)的鋁製之透濕杯量取氯化鈣7.5g,於此透濕杯安裝試驗片。放入氯化鈣,將已安裝試驗片的透濕杯之初期質量以精密天秤測定。接著,於溫度40℃及濕度90%RH之恆溫試驗室將前述透濕杯靜置24小時後,放入氯化鈣,將已安裝試驗片的透濕杯之透濕後之質量以精密天秤測定。將質量增加量(=透濕後之質量-初期質量)設為水蒸氣之透過量,由水蒸氣之透過量、透過面積及靜置時間,算出水蒸氣透過度(g/m2 /24hr)。<Measurement method> (1) Measurement of water vapor permeability (WVTR) The water vapor permeability of Film A to Film X, silicone peel-treated PET and alkyd peel-treated PET listed in Table 1 was measured in the following manner. First, a test piece of 60 mm φ was punched out from the film. According to JIS Z 0208:1976, 7.5 g of calcium chloride was measured in an aluminum permeable cup with a permeable area of 2.826×10 -3 m 2 (60 mm φ), and the test piece was mounted in the permeable cup. Calcium chloride was placed in the permeable cup, and the initial mass of the test piece mounted in the permeable cup was measured using a precision balance. Next, place the above-mentioned permeable cup in a constant temperature test room at 40℃ and 90%RH for 24 hours, then put calcium chloride in it and measure the mass of the permeable cup with the test piece installed after permeation with a precision balance. The mass increase (= mass after permeation - initial mass) is set as the water vapor permeation, and the water vapor permeability (g/ m2 /24hr) is calculated from the water vapor permeation, permeation area and standing time.
(2) 含水量之測定1 將以實施例1~5及比較例1所製造的密封用薄片之放置前後之樹脂組成物層之含水量,用以下之方式進行而測定。(2) Determination of moisture content 1 The moisture content of the resin composition layer of the sealing sheets manufactured in Examples 1 to 5 and Comparative Example 1 before and after being placed was determined in the following manner.
首先,將製造後8小時內之密封用薄片切為7cm平方,將剝離第1及第2薄膜而得的樹脂組成物層作為放置前之樣本而使用,將該含水量,使用電量滴定法之卡爾費雪水分測定裝置(三菱化學Analytech公司製「微量水分測定裝置CA-200」)而測定。將放置前之含水量表示於下述表2。First, the sealing sheet within 8 hours after production was cut into 7 cm squares, and the resin composition layer obtained by peeling off the first and second films was used as a sample before storage. The water content was measured using a Karl Fischer moisture measuring device ("Trace Moisture Measuring Device CA-200" manufactured by Mitsubishi Chemical Analytech) using electrometric titration. The moisture content before storage is shown in the following Table 2.
裝置係由設置可加熱的樣本的玻璃容器、和包含滴定加熱樣本時已氣化的水分的反應液的滴定裝置所構成。已氣化的水分係藉由流動流量:250±25ml/min之氮,由玻璃容器移動至滴定裝置之反應液側。測定係於已取代為氮環境下(水蒸氣量<0.1ppm(質量基準))的玻璃容器內,投入樣本,在130℃之條件下滴定已氣化的水分之量,算出樹脂組成物層之含水量。尚,記載於以下的含水量之單位「ppm」為質量基準。The device is composed of a glass container for placing a heatable sample and a titration device for titrating a reaction liquid containing water vaporized when the heated sample is heated. The vaporized water is moved from the glass container to the reaction liquid side of the titration device by a nitrogen flow rate of 250±25ml/min. The measurement is performed by placing a sample in a glass container replaced with a nitrogen environment (water vapor content <0.1ppm (mass standard)), titrating the amount of vaporized water at 130℃, and calculating the water content of the resin composition layer. The unit "ppm" of the water content listed below is the mass standard.
又,將已切為7cm平方的密封用薄片在溫度25℃及濕度50%RH之環境下放置7日後,與上述同樣地將剝離第1及第2薄膜而得的樹脂組成物層作為放置後之樣本而使用,同樣地測定該含水量。將放置後之含水量表示於下述表2。In addition, the sealing sheet cut into 7 cm square was placed in an environment of temperature 25°C and humidity 50% RH for 7 days, and the resin composition layer obtained by peeling off the first and second films was used as a sample after the placement in the same manner as above, and the water content was measured in the same manner. The water content after the placement is shown in the following Table 2.
用上述之方式進行而算出已測定的放置後之含水量與放置前之含水量之比(亦即,放置後之含水量/放置前之含水量,以下有記載為「含水量之比」)。此比亦表示於下述表2。The ratio of the measured water content after placement to the water content before placement (i.e., water content after placement/water content before placement, hereinafter referred to as "water content ratio") is calculated in the above manner. This ratio is also shown in Table 2 below.
由放置後之含水量、及放置後之含水量與放置前之含水量之比,用以下之基準評估密封用薄片。此結果亦表示於下述表。 (含水量之基準) ○(良好):放置後之含水量為未達9000ppm,且含水量之比為未達1.5 △(可):放置後之含水量為未達9000ppm,且含水量之比為1.5以上、或是放置後之含水量為9000ppm以上,且含水量之比為未達1.5 ×(不良):放置後之含水量為9000ppm以上,且含水量之比為1.5以上The sealing sheet is evaluated based on the moisture content after placement and the ratio of the moisture content after placement to the moisture content before placement using the following criteria. The results are also shown in the table below. (Moisture content criteria) ○ (Good): The moisture content after placement is less than 9000ppm, and the moisture content ratio is less than 1.5. △ (Acceptable): The moisture content after placement is less than 9000ppm, and the moisture content ratio is 1.5 or more, or the moisture content after placement is more than 9000ppm, and the moisture content ratio is less than 1.5. × (Poor): The moisture content after placement is more than 9000ppm, and the moisture content ratio is 1.5 or more.
(3) 含水量之測定2 除了將切為7cm平方,剝離第2薄膜而得的實施例6~10以及比較例2及3之密封用薄片(亦即,已切為7cm平方的樹脂組成物層及第1薄膜之層合體)作為含水量測定用之樣本使用以外係與含水量之測定1以同樣之方式進行,測定此等之放置前後之含水量,算出含水量之比,以上述基準評估。將此等之結果表示於下述表3。(3) Determination of moisture content 2 The same method as the determination of moisture content 1 was used except that the sealing sheets of Examples 6 to 10 and Comparative Examples 2 and 3 (i.e., the laminate of the resin composition layer and the first film cut into 7 cm squares) obtained by peeling off the second film were used as samples for moisture content determination. The moisture content before and after being placed was measured, and the moisture content ratio was calculated and evaluated based on the above-mentioned criteria. These results are shown in the following Table 3.
(4) 發光面積減少開始時間之測定 以後述之方式進行,使用實施例1、2、4、7及8、以及比較例1~3之放置前後之密封用薄片而密封有機EL元件,測定該發光面積減少開始時間,進行評估。尚,作為放置前之密封用薄片,使用製造後24小時以內之密封用薄片。又,作為放置後之密封用薄片,使用在溫度25℃及濕度50%RH)之環境下放置7日的密封用薄片。(4) Determination of the time when the luminous area starts to decrease In the manner described below, the organic EL element is sealed using the sealing sheets before and after the placement of Examples 1, 2, 4, 7 and 8, and Comparative Examples 1 to 3, and the time when the luminous area starts to decrease is measured for evaluation. In addition, as the sealing sheet before placement, a sealing sheet used within 24 hours after production is used. In addition, as the sealing sheet after placement, a sealing sheet that has been placed in an environment of temperature 25°C and humidity 50% RH for 7 days is used.
在實施例1、2及4以及比較例1之密封用薄片係使用剝離第2薄膜,貼合PET luck AL1N30的密封用薄片,剝離第1薄膜,以後述之方式密封有機EL元件。在實施例7及8、以及比較例2及3之密封用薄片係使用已剝離第2薄膜的密封用薄片(亦即,樹脂組成物層及第1薄膜之層合體),以後述之方式密封有機EL元件。In Examples 1, 2, and 4 and Comparative Example 1, the sealing sheet used was a sealing sheet of PET luck AL1N30, the first film was peeled off, and the organic EL element was sealed in the manner described below. In Examples 7 and 8 and Comparative Examples 2 and 3, the sealing sheet used was a sealing sheet (i.e., a laminate of the resin composition layer and the first film) from which the second film was peeled off, and the organic EL element was sealed in the manner described below.
將無鹼玻璃25mm×25mm平方,以已煮沸的異丙醇洗淨5分鐘,在150℃乾燥30分鐘以上。使用將距端部之距離設為4mm的遮罩,於前述玻璃之上,用以下順序蒸鍍,六氮聯三苯并苯碳腈(HATCN)(厚度10nm)、9,9’-二苯基-6-(9-苯基)-9H-咔唑-3-基)-9H,9’H-3,3’-雙咔唑(TrisPCz)(厚度40nm)、5質量%之9,10-雙(N,N-二-對甲苯基胺基)蒽(TTPA)-參(8-羥基喹啉)鋁(Alq3)(厚度30nm)、參(8-羥基喹啉)鋁(Alq3)(厚度30nm)、LiF(厚度0.5nm),Mg-Ag(厚度5nm),得到有機EL裝置元件。Wash a 25 mm x 25 mm square of alkali-free glass with boiled isopropyl alcohol for 5 minutes and dry it at 150°C for more than 30 minutes. Using a mask set at a distance of 4 mm from the end, hexazotriphenylcarbonitrile (HATCN) (thickness 10 nm), 9,9'-diphenyl-6-(9-phenyl)-9H-carbazole-3-yl)-9H,9'H-3,3'-biscarbazole (TrisPCz) (thickness 40 nm), 5 mass% 9,10-bis(N,N-di-p-tolylamino)anthracene (TTPA)-tris(8-hydroxyquinoline)aluminum (Alq3) (thickness 30 nm), tris(8-hydroxyquinoline)aluminum (Alq3) (thickness 30 nm), LiF (thickness 0.5 nm), and Mg-Ag (thickness 5 nm) were evaporated on the above-mentioned glass in the following order to obtain an organic EL device element.
接著於有機EL裝置元件之上,以電容耦合型電漿(CCP: Capacitively Coupled Plasma),蒸鍍無機膜(SiN)(厚度500nm),得到附無機膜之有機EL裝置元件。在手套工作箱內,以上述之密封用薄片之樹脂組成物層、與附無機膜之有機EL裝置元件相接之方式,將此等以熱層疊機(FUJiPLA公司製LamipackerDAiSY A4(LPD2325)貼合,得到附無機膜之有機EL元件以密封用薄片密封的評估用樣本。Next, an inorganic film (SiN) (500 nm thick) was deposited on the organic EL device element by capacitively coupled plasma (CCP) to obtain an organic EL device element with an inorganic film. In a glove box, the resin composition layer of the sealing sheet and the organic EL device element with an inorganic film were bonded together by a thermal laminator (LamipackerDAiSY A4 (LPD2325) manufactured by FUJiPLA) to obtain an evaluation sample in which the organic EL device with an inorganic film was sealed with a sealing sheet.
關於以具有環氧樹脂組成物層的比較例3之密封用薄片密封附無機膜之有機EL元件的評估樣本,其係於貼合後將樣本以溫度100℃加熱60分鐘,使該環氧樹脂組成物層硬化。Regarding the evaluation sample of the inorganic film-attached organic EL element sealed with the sealing sheet of Comparative Example 3 having an epoxy resin composition layer, the sample was heated at 100° C. for 60 minutes after bonding to cure the epoxy resin composition layer.
藉由KEYENCE之顯微鏡,算出暗點以外之評估用樣本之發光面積,將此值設為初期值。Using a KEYENCE microscope, the luminous area of the evaluation sample excluding the dark spot was calculated and this value was set as the initial value.
接著,於已設定在溫度85℃及濕度85%RH的小型環境試驗器(espec公司製SH-222)將評估用樣本保管特定時間,於每個特定時間小時,測定評估用樣本之發光面積。Next, the evaluation sample was stored in a small environmental tester (SH-222 manufactured by espec) set at a temperature of 85°C and a humidity of 85%RH for a specific period of time, and the luminous area of the evaluation sample was measured every specific hour.
將已保管於小型環境試驗器的評估用樣本之發光面積為相較於該初期值而成為未達95面積%的時間,作為發光面積減少開始時間而算出,以下述基準進行評估。密封用薄片之樹脂組成物層之含水量越低,發光面積減少開始時間變得越長。將結果表示於下述表2及3。尚,在未測定發光面積減少開始時間的實施例及比較例係在下述表2及3記載為「-」。 (發光面積減少開始時間之基準) ○(良好):發光面積減少開始時間為1000小時以上 △(可):發光面積減少開始時間為800小時以上、未達1000小時 ×(不良):發光面積減少開始時間為未達800小時The time when the luminous area of the evaluation sample stored in the small environmental tester becomes less than 95% of the initial value is calculated as the start time of the luminous area reduction, and the evaluation is performed according to the following criteria. The lower the water content of the resin composition layer of the sealing sheet, the longer the start time of the luminous area reduction becomes. The results are shown in the following Tables 2 and 3. In addition, the examples and comparative examples in which the start time of the luminous area reduction was not measured are recorded as "-" in the following Tables 2 and 3. (Criteria for the start time of the luminous area reduction) ○ (Good): The luminous area reduction started more than 1000 hours △ (Acceptable): The luminous area reduction started more than 800 hours but less than 1000 hours × (Poor): The luminous area reduction started less than 800 hours
如表2及3所示,具備WVTR為1(g/m2 /24hr)以下的第1及第2薄膜的密封用薄片係即使在溫度25℃及濕度50%RH之環境下放置7日,亦可抑制該樹脂組成物層之吸水(亦即,含水量之增大),使用如此的密封用薄片,則可增長有機EL裝置之壽命(發光面積減少開始時間)。 [產業上之可利用性]As shown in Tables 2 and 3, the sealing sheet having the first and second films with WVTR of 1 (g/m 2 /24hr) or less can suppress the water absorption (i.e., increase in water content) of the resin composition layer even when placed in an environment of 25°C and 50%RH for 7 days. The use of such a sealing sheet can extend the life of the organic EL device (the time when the light-emitting area starts to decrease). [Industrial Applicability]
本發明之密封用薄片係有用於有機EL元件等之電子零件之密封。The sealing sheet of the present invention is used for sealing electronic parts such as organic EL elements.
本案係將已在日本申請的日本特願2017-065143號作為基礎,該內容係全部包含於本案說明書。This case is based on Japanese Patent Application No. 2017-065143, which has been filed in Japan, and all of its contents are included in this specification.
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