[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

TWI841538B - Method for manufacturing laminate containing hardening bonding material - Google Patents

Method for manufacturing laminate containing hardening bonding material Download PDF

Info

Publication number
TWI841538B
TWI841538B TW107132266A TW107132266A TWI841538B TW I841538 B TWI841538 B TW I841538B TW 107132266 A TW107132266 A TW 107132266A TW 107132266 A TW107132266 A TW 107132266A TW I841538 B TWI841538 B TW I841538B
Authority
TW
Taiwan
Prior art keywords
bonding material
manufacturing
bonding
hardening
evaluation sample
Prior art date
Application number
TW107132266A
Other languages
Chinese (zh)
Other versions
TW201920540A (en
Inventor
谷井翔太
森野彰規
下岡澄生
Original Assignee
日商Dic股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Dic股份有限公司 filed Critical 日商Dic股份有限公司
Publication of TW201920540A publication Critical patent/TW201920540A/en
Application granted granted Critical
Publication of TWI841538B publication Critical patent/TWI841538B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)

Abstract

本發明是有關於一種含硬化性接合材的積層體的製造方法,其製造包含被接著體(C1)與接合材(X)的積層體,所述製造方法依次包括:步驟[1],對接合材(X)的反應部位進行活化;步驟[2],將接合材(X)貼附於被接著體(C1);以及步驟[3],使接合材(X)硬化。根據本發明,可製造構件的固定容易、即便於短時間且低溫下亦可完成施工的新穎的積層體,因此可用於將專門用於圖像顯示裝置的各種構件彼此牢固地接合的材料中。The present invention relates to a method for manufacturing a laminate containing a hardening bonding material, wherein the laminate comprises a bonded body (C1) and a bonding material (X), and the manufacturing method sequentially comprises: step [1] of activating a reactive site of the bonding material (X); step [2] of attaching the bonding material (X) to the bonded body (C1); and step [3] of hardening the bonding material (X). According to the present invention, a novel laminate can be manufactured that is easy to fix components and can be constructed in a short time and at a low temperature, and can therefore be used in materials for firmly bonding various components used specifically for image display devices.

Description

含硬化性接合材的積層體的製造方法Method for manufacturing laminate containing hardening bonding material

本發明是有關於一種積層體的製造方法,所述積層體使用了可用於圖像顯示裝置中使用的構件的積層的接合材。 The present invention relates to a method for manufacturing a laminate using a laminated bonding material that can be used as a component used in an image display device.

近年來,作為電視機、智慧型手機、個人助理裝置(Personal Assistant Device,PAD)、平板電腦、汽車導航系統等的顯示裝置,廣泛使用液晶顯示裝置。 In recent years, liquid crystal display devices have been widely used as display devices for televisions, smart phones, personal assistant devices (PADs), tablet computers, car navigation systems, etc.

作為所述液晶顯示裝置,通常已知具備將液晶顯示面板、面狀照明裝置(背光裝置)、電路板(基板)或安裝有其他電子零件的底盤、散熱器等構件積層而成的構成,所述面狀照明裝置(背光裝置)重疊配置於所述液晶顯示面板的背面並對液晶顯示面板進行照明,所述散熱器使自零件產生的熱擴散。 As the liquid crystal display device, it is generally known that it has a structure in which components such as a liquid crystal display panel, a planar lighting device (backlight device), a circuit board (substrate) or a chassis on which other electronic components are mounted, and a heat sink are stacked. The planar lighting device (backlight device) is overlapped and arranged on the back of the liquid crystal display panel to illuminate the liquid crystal display panel, and the heat sink diffuses the heat generated by the components.

為了積層所述液晶顯示裝置的構件,通常以牢固地固定構件彼此且防止經時的構件的脫落為目的,大多使用藉由使該些的構件彼此之間介隔存在由環氧系接著劑、胺基甲酸酯系接著劑等接著劑構成的接合層而使兩個構件彼此接合的方法(例如參照專利文獻1)。 In order to stack the components of the liquid crystal display device, the purpose is usually to firmly fix the components to each other and prevent the components from falling off over time. Most of them use a method of bonding the two components to each other by interposing a bonding layer composed of an epoxy adhesive, a urethane adhesive, etc. between the components (for example, refer to Patent Document 1).

另外,於使所述構件彼此接合的方法中,例如於在積層的構件表面具有撓曲或凹凸的情況下,為了於塗佈接著劑並使接 著劑追隨於撓曲或凹凸後去除塗佈面的厚度不均,而包括如下步驟:藉由對塗佈的接著劑進行刮擦而使塗佈了接著劑的面平滑化,其後積層另一構件(例如參照專利文獻2)。 In addition, in the method of bonding the components to each other, for example, when the surface of the component to be layered has warps or bumps, in order to remove the uneven thickness of the coated surface after applying the adhesive and making the adhesive follow the warps or bumps, the method includes the following steps: smoothing the surface coated with the adhesive by scraping the applied adhesive, and then layering another component (for example, refer to Patent Document 2).

於現在的製造中,為了確保所述積層步驟所需的施工時間,必須使用硬化時間長的接著劑。其結果,直至所述積層步驟後的接著劑顯現出充分的接合強度為止需要進行長時間養護的步驟。 In current manufacturing, in order to ensure the construction time required for the above-mentioned lamination step, an adhesive with a long curing time must be used. As a result, a long curing step is required until the adhesive after the above-mentioned lamination step shows sufficient bonding strength.

作為促進所述積層步驟後的接著劑的硬化的進行的方法,亦研究了接著劑的加熱硬化,但有所述液晶顯示裝置的構件因硬化時的熱受損之虞。另外,存在如下問題:由於每個構件的熱膨脹差,因冷卻時產生的構件間的應變而使構件發生變形,或者接合材與構件間產生裂紋而剝離等,從而於使用接著劑的接合方法中存在課題。 As a method to promote the curing of the adhesive after the lamination step, the heat curing of the adhesive has also been studied, but there is a risk that the components of the liquid crystal display device will be damaged by the heat during curing. In addition, there are problems in the bonding method using adhesives, such as deformation of the components due to the strain between the components generated during cooling due to the difference in thermal expansion of each component, or cracks between the bonding material and the components causing separation.

另外,若為了縮短所述硬化時間而使用常溫下的硬化性優異的接著劑,則無法確保所述積層步驟所需的施工時間,另外為了於積層前進行硬化,有時於積層時不會顯現出充分的接合強度。 In addition, if an adhesive with excellent curability at room temperature is used in order to shorten the curing time, the construction time required for the lamination step cannot be guaranteed. In addition, in order to harden before lamination, sufficient bonding strength may not be exhibited during lamination.

除此以外,作為於低溫短時間下完成硬化的方法,亦研究了利用光的照射的接合法,但於無法透過光的構件中無法使用,應用構件受到限制,實用化困難。 In addition, as a method to complete hardening at low temperature in a short time, a bonding method using light irradiation has also been studied, but it cannot be used in components that cannot transmit light, and the application components are limited, making practical application difficult.

根據以上背景,現在強烈要求一種新穎的接合方法,其於短時間且低溫下完成施工,且即便對於不透光的材料亦可較佳 地接合。 Based on the above background, there is now a strong demand for a novel joining method that can complete the construction in a short time and at a low temperature, and can better join even for opaque materials.

[現有技術文獻] [Prior art literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利第5546136號公報 [Patent document 1] Japanese Patent No. 5546136

[專利文獻2]日本專利特開2003-136677號公報 [Patent Document 2] Japanese Patent Publication No. 2003-136677

本發明所欲解決的課題在於提供一種新穎的積層體的製造方法,其即便於短時間且低溫下亦完成施工,且即便對於不透光的材料亦可較佳地接合。 The problem that the present invention aims to solve is to provide a novel method for manufacturing a laminate, which can be constructed in a short time and at a low temperature, and can be better bonded even to opaque materials.

本發明者等人著眼於積層體的製造方法並進行了努力研究,結果發現藉由包括下述[1]~[3]的步驟的製造方法而解決所述課題,從而完成了本發明。 The inventors of the present invention focused on the manufacturing method of the laminate and conducted diligent research. As a result, they found that the problem can be solved by a manufacturing method including the following steps [1] to [3], thereby completing the present invention.

即,本發明為一種含硬化性接合材的積層體的製造方法,其製造包含被接著體(C1)與接合材(X)的積層體,所述製造方法依次包括:步驟[1],對接合材(X)的反應部位進行活化;步驟[2],貼附於被接著體(C1);以及步驟[3],使接合材(X)硬化。 That is, the present invention is a method for manufacturing a laminate containing a hardenable bonding material, wherein the laminate comprises a bonded body (C1) and a bonding material (X), and the manufacturing method sequentially comprises: step [1], activating the reaction site of the bonding material (X); step [2], attaching the bonding material (X) to the bonded body (C1); and step [3], hardening the bonding material (X).

本發明中,使接合材(X)的反應部位活化,因此可於短時間且低溫下進行接合材(X)的硬化反應。 In the present invention, the reaction site of the bonding material (X) is activated, so that the hardening reaction of the bonding material (X) can be carried out in a short time and at a low temperature.

本發明中,於使接合材(X)的反應部位活化後可貼附於被接著體(C1),因此可應用於無法透過光的構件等各種構件中。 In the present invention, after activating the reaction site of the bonding material (X), it can be attached to the adherend (C1), so it can be applied to various components such as components that cannot transmit light.

本發明的含硬化性接合材的積層體的製造方法是如下製造方法,其製造包含被接著體(C1)與接合材(X)的積層體,所述製造方法依次包括:步驟[1],對接合材(X)的反應部位進行活化;步驟[2],使接合材(X)貼附於被接著體(C1);以及步驟[3],使接合材(X)硬化。 The manufacturing method of the laminate containing a hardenable bonding material of the present invention is the following manufacturing method, wherein the manufacturing method comprises the following steps: step [1], activating the reaction site of the bonding material (X); step [2], attaching the bonding material (X) to the bonded body (C1); and step [3], hardening the bonding material (X).

本發明的製造方法於對所述接合材(X)的反應部位進行活化後貼附於被接著體(C1),因此可於提高接合材(X)的反應性的狀態下進行硬化。藉此,與不進行活化的狀態相比,可進行低溫下的硬化。另外,與不進行活化的狀態相比,可進行短時間內的硬化。 The manufacturing method of the present invention attaches the bonding material (X) to the adherend (C1) after activating the reactive part of the bonding material (X), so that the bonding material (X) can be hardened in a state where the reactivity is improved. In this way, hardening can be performed at a lower temperature than in a state where activation is not performed. In addition, hardening can be performed in a shorter time than in a state where activation is not performed.

本發明的製造方法於步驟[1]中進行對所述接合材(X)的反應部位進行活化的步驟,所述接合材(X)於材料中具有反應部位。所謂所述反應部位,是指藉由賦予外部刺激而受到活化從而成為可與其他部位反應的狀態的部位。 The manufacturing method of the present invention includes a step of activating the reaction site of the bonding material (X) in step [1], wherein the bonding material (X) has a reaction site in the material. The so-called reaction site refers to a site that is activated by applying an external stimulus and becomes capable of reacting with other sites.

對接合材(X)的反應部位進行活化的方法有熱、光、濕氣等,並不限定於此,但較佳為使用熱或光,更佳為使用光。藉由光而受到活化的所述接合材(X)的保存穩定性良好,且可於 低溫下對反應部位進行活化。另外,外部刺激可單獨使用,亦可併用使用多種。 Methods for activating the reactive part of the bonding material (X) include heat, light, moisture, etc., but are not limited thereto. However, it is preferred to use heat or light, and it is more preferred to use light. The bonding material (X) activated by light has good storage stability, and the reactive part can be activated at low temperature. In addition, the external stimulus can be used alone or in combination.

作為利用所述光對反應部位進行活化的方法,可列舉光自由基聚合、光陽離子聚合、光陰離子聚合,使用光陽離子聚合或光陰離子聚合由於在硬化時不受氧的阻礙,且於照射光後亦繼續進行反應,另外即便對於不透過光的構件,亦可於對接合材照射光後與被接著體積層,因此較佳。進而,使用光陽離子聚合由於光照射時的反應性優異,容易獲得硬化後的高接合性,因此更佳。另外,該些聚合方法可單獨使用,亦可併用使用多種。 As methods for activating the reaction sites using the light, photoradical polymerization, photocation polymerization, and photoion polymerization can be listed. Photocation polymerization or photoion polymerization is preferred because it is not hindered by oxygen during curing and continues to react even after irradiation with light. In addition, even for components that do not transmit light, it can be bonded to the bonded volume layer after irradiating the bonding material with light. Furthermore, photocation polymerization is preferred because it has excellent reactivity during light irradiation and is easy to obtain high bonding after curing. In addition, these polymerization methods can be used alone or in combination.

另外,本發明的製造方法是如下製造方法,其製造介隔接合材(X)而包含被接著體(C1)與被接著體(C2)的積層體,所述製造方法依次包括:步驟[01],將接合材(X)貼附於被接著體(C2);步驟[1],對接合材(X)的反應部位進行活化;步驟[2],貼附於被接著體(C1);以及步驟[3],使接合材(X)硬化,於所述步驟[01]與步驟[1]之間、以及所述步驟[2]與步驟[3]之間的至少一者中包括進行階差追隨的步驟(養護步驟)[02]。 In addition, the manufacturing method of the present invention is a manufacturing method for manufacturing a laminated body including a bonded body (C1) and a bonded body (C2) separated by a bonding material (X), the manufacturing method sequentially comprising: step [01] of attaching the bonding material (X) to the bonded body (C2); step [1] of activating the reaction site of the bonding material (X); step [2] of attaching to the bonded body (C1); and step [3] of hardening the bonding material (X), wherein a step of performing step tracking (maintenance step) [02] is included between the step [01] and the step [1], and between the step [2] and the step [3].

所述步驟[02]的進行階差追隨的步驟中,對被接著體(C1)及/或被接著體(C2)中存在撓曲及/或凹凸者貼附所述接合材(X),並進行填埋撓曲及/或凹凸的步驟。 In the step of performing step-difference tracking in step [02], the bonding material (X) is attached to the adherend (C1) and/or adherend (C2) where there are bends and/or bumps, and the bends and/or bumps are filled.

關於所述步驟[02],藉由經過對所述接合材(X)的反應部位進行活化的步驟[1]而開始硬化,因此於利用本製造法進行接合的被接著體中的任一者存在撓曲及/或凹凸的情況下,於充分 確保用以使所述接合材對所述撓曲及/或凹凸進行階差追隨的時間(養護時間)的方面而言,步驟[02]較佳為於所述步驟[01]後且所述步驟[1]之前進行。 Regarding the step [02], hardening begins after the step [1] of activating the reaction site of the bonding material (X). Therefore, if any of the adherends to be bonded by the present manufacturing method has warps and/or irregularities, in order to sufficiently ensure the time (curing time) for the bonding material to follow the steps of the warps and/or irregularities, the step [02] is preferably performed after the step [01] and before the step [1].

所述步驟[01]亦可於積層的構件不受損或者接合材不過度變形流動的範圍內包括進行加熱的步驟。藉由包括所述進行加熱的步驟,於將所述接合材(X)貼附於所述被接著體(C2)時,可更牢固地密接而獲得高接合強度。 The step [01] may also include a heating step within a range where the laminated components are not damaged or the bonding material does not deform or flow excessively. By including the heating step, when the bonding material (X) is attached to the adherend (C2), it can be more firmly bonded and a high bonding strength can be obtained.

於所述步驟[01]中,進行加熱的溫度較佳為10℃以上且150℃以下,更佳為20℃以上且120℃以下,進而佳為30℃以上且100℃以下,最佳為40℃以上且90℃以下。藉由設為所述範圍內,可抑制構件的損傷,另外一面抑制接合材的過度的變形,一面更牢固地密接而獲得高接合強度。 In the step [01], the heating temperature is preferably 10°C or higher and 150°C or lower, more preferably 20°C or higher and 120°C or lower, further preferably 30°C or higher and 100°C or lower, and most preferably 40°C or higher and 90°C or lower. By setting the temperature within the above range, damage to the components can be suppressed, while excessive deformation of the bonding material can be suppressed, and a higher bonding strength can be obtained by more firmly bonding.

所述步驟[02]亦可於積層的構件不受損或者接合材不過度變形流動的範圍內包括進行加熱的步驟。藉由包括所述進行加熱的步驟,可於所述接合材(X)對所述被接著體(C2)進行階差追隨時縮短所述接合材(X)的階差追隨所需的時間,於短時間內完成本發明的製造方法。 The step [02] may also include a heating step within the range where the laminated components are not damaged or the bonding material does not deform excessively and flow. By including the heating step, the time required for the bonding material (X) to follow the bonded body (C2) can be shortened at any time, and the manufacturing method of the present invention can be completed in a short time.

於所述步驟[02]中,進行加熱的溫度較佳為20℃以上且150℃以下,更佳為40℃以上且120℃以下,進而佳為55℃以上且100℃以下,最佳為70℃以上且90℃以下。藉由設為所述範圍內,可一面抑制積層的構件的損傷、或者接合材的階差追隨時的過度的變形,一面進行階差追隨。 In the step [02], the heating temperature is preferably 20°C or higher and 150°C or lower, more preferably 40°C or higher and 120°C or lower, further preferably 55°C or higher and 100°C or lower, and most preferably 70°C or higher and 90°C or lower. By setting the temperature within the above range, the step tracking can be performed while suppressing damage to the laminated components or excessive deformation of the bonding material during the step tracking.

所述步驟[2]較佳為於進行所述步驟[1]後於24小時以內進行,更佳為於12小時以內進行,進而佳為於3小時以內進行,最佳為於1小時以內進行。藉由設為所述範圍內,可於將所述接合材(X)貼附於被接著體(C1)時更牢固地密接而獲得高接合強度。 The step [2] is preferably performed within 24 hours after the step [1], more preferably within 12 hours, further preferably within 3 hours, and most preferably within 1 hour. By setting it within the above range, when the bonding material (X) is attached to the adherend (C1), it can be more firmly bonded and a high bonding strength can be obtained.

所述步驟[2]亦可於不發生積層的構件的損傷、或者不會藉由構件間產生應變而使構件變形、或者接合材與構件間不產生裂紋的範圍內,一面進行加熱一面貼附。藉由包括所述進行加熱的步驟,可於將所述接合材(X)貼附於被接著體(C1)時更牢固地密接而獲得高接合強度。 The step [2] can also be performed while heating and bonding within a range where the component is not damaged by the accumulation, the component is not deformed by the strain between the components, or cracks are not generated between the bonding material and the component. By including the heating step, when the bonding material (X) is bonded to the adherend (C1), it is possible to obtain a higher bonding strength by more firmly bonding.

於所述步驟[2]中,進行加熱的溫度較佳為10℃以上且150℃以下,更佳為20℃以上且120℃以下,進而佳為30℃以上且100℃以下,最佳為40℃以上且80℃以下。藉由設為所述範圍內,可抑制構件的損傷,另外一面抑制接合材的過度的變形,一面更牢固地密接而獲得高接合強度。 In the step [2], the heating temperature is preferably 10°C to 150°C, more preferably 20°C to 120°C, further preferably 30°C to 100°C, and most preferably 40°C to 80°C. By setting the temperature within the above range, damage to the components can be suppressed, while excessive deformation of the bonding material can be suppressed, and a higher bonding strength can be obtained by more firmly bonding.

所述步驟[3]包括使所述接合材(X)硬化的步驟。藉由使所述接合材(X)硬化,接合材(X)與被接著體(C1)可更牢固地密接而獲得高接合強度。 The step [3] includes the step of hardening the bonding material (X). By hardening the bonding material (X), the bonding material (X) and the adherend (C1) can be more firmly bonded to obtain a high bonding strength.

所述步驟[3]亦可於不發生積層的構件的損傷、或者不會藉由構件間產生應變而使構件變形、或者接合材與構件間不產生裂紋的範圍內包括進行加熱的步驟。藉由包括所述進行加熱的步驟,可於使所述接合材(X)與被接著體(C1)積層後縮短所述接 合材(X)的硬化所需的時間,於短時間內完成本發明的製造方法。 The step [3] may also include a heating step within a range where no damage to the laminated components occurs, no deformation of the components occurs due to strain between the components, or no cracks occur between the bonding material and the components. By including the heating step, the time required for the bonding material (X) to harden after the bonding material (X) and the adherend (C1) are laminated can be shortened, and the manufacturing method of the present invention can be completed in a short time.

於所述步驟[3]中,進行加熱的溫度較佳為20℃以上且150℃以下,更佳為40℃以上且120℃以下,進而佳為55℃以上且100℃以下,最佳為70℃以上且90℃以下。藉由設為所述範圍內,可抑制構件的損傷,另外防止由於構件間產生應變而導致的構件的變形、或者接合材與構件間產生的裂紋。 In the step [3], the heating temperature is preferably 20°C or higher and 150°C or lower, more preferably 40°C or higher and 120°C or lower, further preferably 55°C or higher and 100°C or lower, and most preferably 70°C or higher and 90°C or lower. By setting the temperature within the above range, damage to the components can be suppressed, and deformation of the components caused by strain between the components or cracks between the bonding material and the components can be prevented.

所述接合材(X)於所述步驟[01]中較佳為貼附時的儲存彈性係數為5.0×103Pa以上的範圍內,更佳為5.0×104Pa~1.0×108Pa的範圍內,進而佳為5.0×105Pa~1.0×107Pa。藉由設為所述範圍內,可使所述接合材的硬化前的操作容易且抑制接合材變形流動的情況。 The bonding material (X) preferably has a storage modulus of 5.0×10 3 Pa or more during bonding in the step [01], more preferably 5.0×10 4 Pa to 1.0×10 8 Pa, and even more preferably 5.0×10 5 Pa to 1.0×10 7 Pa. By setting the storage modulus within the above range, the bonding material can be easily handled before hardening and deformation and flow of the bonding material can be suppressed.

進而,作為所述接合材(X),於所述步驟[02]中,較佳為階差追隨時的接合材(X)的儲存彈性係數未滿5.0×103Pa,更佳為1.0×103Pa以下,進而佳為1.0×102Pa以下。藉由設為所述範圍內,可獲得進一步提高對階差部的追隨性的接合材。 Furthermore, in the step [02], the storage elastic coefficient of the bonding material (X) when following the step is preferably less than 5.0×10 3 Pa, more preferably less than 1.0×10 3 Pa, and even more preferably less than 1.0×10 2 Pa. By setting the bonding material within the above range, a bonding material having further improved followability to the step portion can be obtained.

所述步驟[3]後的於25℃下的接合材(X)的儲存彈性係數較佳為1.0×105Pa以上,更佳為1.0×106Pa以上,進而佳為1×108Pa以上。藉由設為所述範圍內,可進一步提高所述接合材(X)的硬化物的接合強度。 The storage elastic coefficient of the bonding material (X) at 25°C after the step [3] is preferably 1.0×10 5 Pa or more, more preferably 1.0×10 6 Pa or more, and even more preferably 1×10 8 Pa or more. By setting it within the above range, the bonding strength of the cured product of the bonding material (X) can be further improved.

再者,所述接合材(X)的儲存彈性係數是以頻率1.0Hz測定時的數值。 Furthermore, the storage elastic coefficient of the bonding material (X) is a value measured at a frequency of 1.0 Hz.

作為本發明的製造方法中使用的接合材(X),可使用含 有後述的聚合性化合物等的組成物,所述聚合性化合物只要藉由外部刺激而引發聚合,則並無特別限定。 As the bonding material (X) used in the manufacturing method of the present invention, a composition containing the polymerizable compound described later can be used. The polymerizable compound is not particularly limited as long as it is polymerized by external stimulation.

作為所述接合材(X),就硬化前的操作性優異,且厚度調整容易的方面而言,較佳為使用預先成形為片狀者。 As the bonding material (X), it is preferred to use one that is pre-formed into a sheet shape in terms of excellent workability before hardening and easy thickness adjustment.

作為所述片狀的接合材,較佳為使用厚度為50μm~2000μm的範圍內的接合材,更佳為使用100μm~1000μm的接合材,最佳為使用200μm~800μm的接合材。藉由設為所述範圍內,硬化前的操作性優異,且即便對於在被接著體表面具有凹凸或撓曲等階差者亦可進行追隨。 As the sheet-shaped bonding material, it is preferred to use a bonding material with a thickness in the range of 50μm to 2000μm, more preferably 100μm to 1000μm, and most preferably 200μm to 800μm. By setting it within the above range, the operability before hardening is excellent, and even those with unevenness or curvature on the surface of the adherend can be followed.

作為所述聚合性化合物,較佳為含有熱聚合性化合物、光聚合性化合物,但由於使用光聚合性化合物,可使所述接合材(X)的製造步驟[1]之前的保存穩定性提高,且可於低溫下對反應部位進行活化,因此更佳。 As the polymerizable compound, it is preferred to contain a thermopolymerizable compound or a photopolymerizable compound, but the use of a photopolymerizable compound is more preferred because it can improve the storage stability of the bonding material (X) before the manufacturing step [1] and can activate the reaction site at a low temperature.

作為所述光聚合性化合物,例如可列舉光自由基聚合性化合物、光陽離子聚合性化合物、光陰離子聚合性化合物等。該些可單獨使用,亦可併用使用,使用光陽離子聚合性化合物或光陰離子聚合性化合物由於在硬化時不受氧的阻礙,且於光照射後亦繼續進行反應,另外於對接合材照射光後與被接著體積層,藉此即便對於不透過光的構件亦可進行積層,因此較佳。進而,使用光陽離子聚合性化合物由於光照射後的反應性優異,容易獲得硬化後的高接合性,因此更佳。 As the photopolymerizable compound, for example, there can be listed photoradical polymerizable compounds, photocationic polymerizable compounds, photoanion polymerizable compounds, etc. These can be used alone or in combination. The use of photocationic polymerizable compounds or photoanion polymerizable compounds is preferred because they are not hindered by oxygen during curing and continue to react after light irradiation. In addition, after irradiating the bonding material with light, they are layered with the bonded volume, thereby laminating even components that do not transmit light. Furthermore, the use of photocationic polymerizable compounds is more preferred because they have excellent reactivity after light irradiation and are easy to obtain high bonding after curing.

作為所述陽離子聚合性化合物,只要為於一分子中具有 一個以上的陽離子聚合性的官能基的化合物即可,並無特別限定。作為光陽離子聚合性化合物,較佳為於一分子中具有一個以上的環氧基、氧雜環丁基、羥基、乙烯醚基、環硫基、乙烯亞胺基、噁唑啉基(oxazoline)等陽離子聚合性的官能基的化合物。其中,於獲得高硬化性與硬化後的接合強度的方面而言,更佳為具有環氧基的陽離子聚合性化合物。 The cationic polymerizable compound is not particularly limited as long as it is a compound having one or more cationic polymerizable functional groups in one molecule. As the photo-cationic polymerizable compound, a compound having one or more cationic polymerizable functional groups such as epoxy group, cyclobutyl group, hydroxyl group, vinyl ether group, cyclothio group, ethyleneimine group, oxazoline group, etc. in one molecule is preferred. Among them, cationic polymerizable compounds having epoxy groups are more preferred in terms of obtaining high curability and bonding strength after curing.

作為所述環氧樹脂,可使用在一分子中具有一個以上環氧基的化合物。具體而言,可使用雙酚A型環氧樹脂、雙酚F型環氧樹脂、聯苯型環氧樹脂、四甲基聯苯型環氧樹脂、聚羥基萘型環氧樹脂、異氰酸酯改質環氧樹脂、10-(2,5-二羥基苯基)-9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物改質環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、己二醇型環氧樹脂、三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、二環戊二烯-苯酚加成反應型環氧樹脂、苯酚芳烷基型環氧樹脂、萘酚酚醛清漆型環氧樹脂、萘酚芳烷基型環氧樹脂、萘酚-苯酚共縮酚醛清漆型環氧樹脂、萘酚-甲酚共縮酚醛清漆型環氧樹脂、芳香族烴甲醛樹脂改質苯酚樹脂型環氧樹脂、聯苯改質酚醛清漆型環氧樹脂、三羥甲基丙烷型環氧樹脂、脂環式環氧樹脂、具有環氧基的丙烯酸樹脂、具有環氧基的聚胺基甲酸酯樹脂、具有環氧基的聚酯樹脂、具有可撓性的環氧樹脂等。 As the epoxy resin, a compound having one or more epoxy groups in one molecule can be used. Specifically, bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, tetramethylbiphenyl type epoxy resin, polyhydroxynaphthalene type epoxy resin, isocyanate modified epoxy resin, 10-(2,5-dihydroxyphenyl)-9,10-dihydro-9-oxo-10-phosphophenanthrene-10-oxide modified epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, hexanediol type epoxy resin, triphenylmethane type epoxy resin, tetraphenylethane type epoxy resin, dicyclopentadiene-phenol addition reaction type epoxy resin, Epoxy resins, phenol aralkyl type epoxy resins, naphthol novolac type epoxy resins, naphthol aralkyl type epoxy resins, naphthol-phenol co-phenol novolac type epoxy resins, naphthol-cresol co-phenol novolac type epoxy resins, aromatic hydrocarbon formaldehyde resin modified phenol resin type epoxy resins, biphenyl modified novolac type epoxy resins, trihydroxymethylpropane type epoxy resins, aliphatic epoxy resins, acrylic resins with epoxy groups, polyurethane resins with epoxy groups, polyester resins with epoxy groups, flexible epoxy resins, etc.

其中,作為所述環氧樹脂,使用脂環式環氧樹脂或多官能脂肪族型環氧樹脂,由於所述陽離子聚合性優異,因此可獲得 硬化性優異的接合材。 Among them, as the epoxy resin, an aliphatic epoxy resin or a multifunctional aliphatic epoxy resin is used, and since the cationic polymerization property is excellent, a bonding material with excellent curing property can be obtained.

進而,亦可於該些中調配或加成其他樹脂成分等來提高可撓性,或者實現接著力或彎曲力的提高,作為所述改質體,可使用末端含羧基的丁二烯-丙烯腈橡膠(carboxyl-terminated butadiene acrylonitrile,CTBN)改質環氧樹脂;使丙烯酸橡膠、丙烯腈丁二烯橡膠(acrylonitrile butadiene rubber,NBR)、苯乙烯丁二烯橡膠(styrene butadiene rubber,SBR)、丁基橡膠或異戊二烯橡膠等各種橡膠進行樹脂分散的環氧樹脂;利用所述液狀橡膠改質的環氧樹脂;添加丙烯酸、胺基甲酸酯、脲、聚酯、苯乙烯等各種樹脂而成的環氧樹脂;螯合物改質環氧樹脂;多元醇改質環氧樹脂等。 Furthermore, other resin components may be blended or added to these resins to improve flexibility, or to improve adhesion or bending strength. As the modified body, carboxyl-terminated butadiene acrylonitrile (CTBN) can be used to modify epoxy resin; acrylic rubber, acrylonitrile butadiene rubber (NBR), styrene butadiene rubber (SBR) can be modified to improve the elasticity of the epoxy resin. Epoxy resins dispersed in various rubbers such as butyl rubber, SBR), butyl rubber or isoprene rubber; epoxy resins modified by the liquid rubber; epoxy resins added with various resins such as acrylic acid, urethane, urea, polyester, styrene, etc.; chelate-modified epoxy resins; polyol-modified epoxy resins, etc.

作為具有環氧基以外的陽離子聚合性的官能基的光陽離子聚合性化合物的具體例,可列舉:1,4-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、1,4-雙[(3-甲基-3-氧雜環丁基甲氧基)甲基]苯、3-甲基-3-縮水甘油基氧雜環丁烷、3-乙基-3-縮水甘油基氧雜環丁烷、3-甲基-3-羥基甲基氧雜環丁烷、3-乙基-3-羥基甲基氧雜環丁烷、二{1-乙基(3-氧雜環丁基)}甲醚等氧雜環丁烷化合物。 Specific examples of photocationically polymerizable compounds having a cationically polymerizable functional group other than an epoxide group include 1,4-bis[(3-ethyl-3-oxocyclobutylmethoxy)methyl]benzene, 1,4-bis[(3-methyl-3-oxocyclobutylmethoxy)methyl]benzene, 3-methyl-3-glycidyloxycyclobutane, 3-ethyl-3-glycidyloxycyclobutane, 3-methyl-3-hydroxymethyloxycyclobutane, 3-ethyl-3-hydroxymethyloxycyclobutane, di{1-ethyl(3-oxocyclobutyl)}methyl ether and other oxycyclobutane compounds.

作為本發明的製造方法中使用的接合材(X),可使用除了所述聚合性化合物以外視需要含有其他成分的接合材。 As the bonding material (X) used in the manufacturing method of the present invention, a bonding material containing other components as needed in addition to the above-mentioned polymerizable compound can be used.

作為本發明的製造方法中使用的接合材(X),較佳為使用可與所述聚合性化合物反應的聚合起始劑。 As the bonding material (X) used in the manufacturing method of the present invention, it is preferred to use a polymerization initiator that can react with the polymerizable compound.

作為所述聚合起始劑,只要為藉由外部刺激而受到活化 的起始劑即可,例如若為使用陽離子聚合性化合物作為所述聚合性化合物的情況,則較佳為使用具有可與陽離子聚合性的官能基反應的官能基者。 As the polymerization initiator, any initiator that is activated by external stimulation may be used. For example, if a cationic polymerizable compound is used as the polymerizable compound, it is preferred to use a functional group that can react with a cationic polymerizable functional group.

另外,作為所述聚合起始劑,有光聚合起始劑與熱聚合起始劑,可將其單獨使用,亦可併用兩種以上。其中,為了獲得低溫下的反應與良好的硬化反應,較佳為使用藉由光作為外部刺激而進行反應的光聚合起始劑。藉此,可不發生積層的構件的損傷、或者不會藉由構件間產生應變而使構件變形、或者接合材與構件間不產生裂紋而獲得高接合強度。 In addition, as the polymerization initiator, there are photopolymerization initiators and thermal polymerization initiators, which can be used alone or in combination. Among them, in order to obtain a reaction at a low temperature and a good curing reaction, it is better to use a photopolymerization initiator that reacts with light as an external stimulus. In this way, high bonding strength can be obtained without damaging the stacked components, or deforming the components due to strain between the components, or cracks between the bonding materials and the components.

作為所述光,可使用紫外線或可見光等適宜的光,但較佳為使用300nm以上且420nm以下的波長的光。 As the light, appropriate light such as ultraviolet light or visible light can be used, but it is preferred to use light with a wavelength of more than 300nm and less than 420nm.

作為所述光聚合起始劑,只要為藉由光而受到活化者即可,例如可列舉光自由基聚合起始劑、光陽離子聚合起始劑、光陰離子聚合起始劑,例如若為使用光陽離子聚合性化合物作為所述聚合性化合物的情況,則較佳為使用光陽離子聚合起始劑。 As the photopolymerization initiator, any one that is activated by light may be used, for example, a photoradical polymerization initiator, a photocationic polymerization initiator, and a photoanionic polymerization initiator. For example, if a photocationic polymerization compound is used as the polymerizable compound, it is preferred to use a photocationic polymerization initiator.

作為所述光陽離子聚合起始劑,只要可藉由所使用的波長的光而引發陽離子聚合性的官能基的開環反應,則並無特別限定,可較佳地使用藉由300nm~370nm的波長的光而引發陽離子聚合性的官能基的開環反應且在超過370nm的波長區域內為惰性的化合物,作為所述化合物,例如可列舉芳香族重氮鎓鹽、芳香族碘鎓鹽、芳香族鋶鎓鹽等鎓鹽類。 As the photo-cationic polymerization initiator, there is no particular limitation as long as it can induce the ring-opening reaction of the cationic polymerizable functional group by light of the wavelength used. Preferably, a compound can be used that can induce the ring-opening reaction of the cationic polymerizable functional group by light of a wavelength of 300nm to 370nm and is inert in the wavelength region exceeding 370nm. Examples of the compound include onium salts such as aromatic diazonium salts, aromatic iodonium salts, and aromatic stigmatinium salts.

作為所述鎓鹽類的具體例,例如可列舉:歐普托瑪 (Optomer)SP-150、歐普托瑪(Optomer)SP-170、歐普托瑪(Optomer)SP-171(均為艾迪科(ADEKA)公司製造)、UVE-1014(通用電氣(General Electronic)公司製造)、歐尼凱(OMNICAT)250、歐尼凱(OMNICAT)270(均為IGM勒森(IGM Resin)公司製造)、豔佳固(IRGACURE)290(巴斯夫(BASF)公司製造)、桑艾德(Sunaide)SI-60L、桑艾德(Sunaide)SI-80L、桑艾德(Sunaide)SI-100L(均為三新化學工業公司製造)、CPI-100P、CPI-101A、CPI-200K(均為三亞普羅(San-Apro)公司製造)等。 Specific examples of the onium salts include: Optomer SP-150, Optomer SP-170, Optomer SP-171 (all manufactured by ADEKA), UVE-1014 (manufactured by General Electronic), OMNICAT 250, OMNICAT 270 (all manufactured by IGM Resin), IRGACURE 290 (manufactured by BASF), Sunaide SI-60L, Sunaide SI-80L, Sunaide SI-100L (all manufactured by San-Shin Chemical Industry), CPI-100P, CPI-101A, CPI-200K (all manufactured by San-Apro), etc.

再者,所述光陽離子聚合起始劑可單獨使用,亦可併用兩種以上。進而,亦可使用有效活性波長不同的多種光陽離子聚合起始劑來進行兩階段硬化。 Furthermore, the photo-catalytic ion polymerization initiator can be used alone or in combination of two or more. Furthermore, multiple photo-catalytic ion polymerization initiators with different effective active wavelengths can be used to perform two-stage curing.

所述光陽離子聚合起始劑亦可視需要併用蒽系、噻噸酮系等的增感劑。 The photocatalytic ion polymerization initiator can also be used together with anthracene-based, thiothionone-based, and other sensitizers as needed.

作為所述光陽離子聚合起始劑的調配比例,相對於所述光陽離子聚合起始劑100質量份,較佳為於0.001質量份~30質量份的範圍內使用,更佳為於0.01質量份~20質量份的範圍內使用,進而佳為於0.1質量份~10質量份的範圍內使用。若所述光陽離子聚合起始劑的調配比例過少,則高接合強度的顯現所需的硬化變得不充分,若過多則硬化性提高,但有時於照射光後可貼附的時間變得過短。 As for the mixing ratio of the photo-cationic polymerization initiator, it is preferably used in the range of 0.001 to 30 parts by mass, more preferably in the range of 0.01 to 20 parts by mass, and further preferably in the range of 0.1 to 10 parts by mass relative to 100 parts by mass of the photo-cationic polymerization initiator. If the mixing ratio of the photo-cationic polymerization initiator is too small, the hardening required for the manifestation of high bonding strength becomes insufficient. If it is too large, the hardening property is improved, but sometimes the time for attachment after light irradiation becomes too short.

作為所述接合材(X),就硬化前的操作性優異,且厚度調整容易的方面而言,較佳為使用重量平均分子量為2000~ 2000000的範圍內的接著性樹脂。更佳的重量平均分子量的範圍為5000~1000000,進而佳的重量平均分子量的範圍為5000~800000。若重量平均分子量過小,則硬化前的接合材的凝聚力不足,藉由於經時產生接合材的滲出等而操作性下降。另外,若重量平均分子量過大,則有時與所述聚合性化合物的相容性下降。 As the bonding material (X), it is preferred to use an adhesive resin with a weight average molecular weight in the range of 2000 to 2000000 in terms of excellent workability before curing and easy thickness adjustment. A more preferred weight average molecular weight range is 5000 to 1000000, and a further preferred weight average molecular weight range is 5000 to 800000. If the weight average molecular weight is too small, the cohesion of the bonding material before curing is insufficient, and the workability is reduced due to the leakage of the bonding material over time. In addition, if the weight average molecular weight is too large, the compatibility with the polymerizable compound may be reduced.

作為所述接著性樹脂,例如可列舉聚酯、聚胺基甲酸酯、聚(甲基)丙烯酸酯等。該些接著性樹脂可為均聚物,亦可為共聚物。另外,該些接著性樹脂可單獨使用,亦可併用兩種以上。 Examples of the adhesive resin include polyester, polyurethane, poly(meth)acrylate, etc. These adhesive resins may be homopolymers or copolymers. In addition, these adhesive resins may be used alone or in combination of two or more.

作為所述接著性樹脂,於常溫下具有黏著性,使得將所述接合材積層於被接著體時的貼附性提高,因此較佳。為了賦予所述接著性樹脂的黏著性,較佳為所述接著性樹脂的玻璃轉移溫度為-40℃~20℃的範圍內,更佳為-30℃~10℃的範圍內。藉由為所述範圍內的玻璃轉移溫度,可對黏著劑層賦予黏著性且賦予高彈性係數,可提高所述接合材的接合強度。再者,所述接著性樹脂的玻璃轉移溫度例如可作為如下溫度而計算出,所述溫度是可藉由使用動態黏彈性試驗機(流變(Rheometrics)公司製造、商品名:阿里斯(ARES)2KSTD),將試驗片夾入作為同一試驗機的測定部的平行圓盤之間,並測定頻率1.0Hz下的儲存彈性係數(G')與損耗彈性係數(G")而算出的損耗正切(Tanδ)成為最大值時的溫度。 As the adhesive resin, it is preferred that the adhesive resin has adhesiveness at room temperature, so that the adhesion of the bonding material when layered on the adherend is improved. In order to give the adhesive resin adhesiveness, it is preferred that the glass transition temperature of the adhesive resin is in the range of -40°C to 20°C, and more preferably in the range of -30°C to 10°C. By giving the glass transition temperature in the above range, the adhesive layer can be given adhesiveness and a high elastic modulus, and the bonding strength of the bonding material can be improved. Furthermore, the glass transition temperature of the adhesive resin can be calculated, for example, as the temperature at which the loss tangent (Tanδ) calculated by sandwiching the test piece between parallel disks as the measuring part of the dynamic viscoelastic tester (manufactured by Rheometrics, trade name: ARES 2KSTD) and measuring the storage elastic modulus (G') and loss elastic modulus (G") at a frequency of 1.0 Hz reaches a maximum value.

所述接著性樹脂可交聯,因此亦可導入可與交聯劑或所述聚合性化合物中所含的官能基反應的官能基。作為所述官能 基,例如可列舉羥基、羧基、環氧基、胺基等,較佳為於不成為所述聚合性化合物的聚合阻礙的範圍內適時選擇。 The adhesive resin can be cross-linked, so a functional group that can react with the cross-linking agent or the functional group contained in the polymerizable compound can also be introduced. Examples of the functional group include hydroxyl, carboxyl, epoxy, and amine groups, and it is preferred to select them appropriately within the range that does not hinder the polymerization of the polymerizable compound.

相對於所述硬化性樹脂100質量份,所述接著性樹脂較佳為於5質量份~900質量份的範圍內使用,更佳為於10質量份~700質量份的範圍內使用,進而佳為於20質量份~400質量份的範圍內使用。若所述接著性樹脂的調配比例過多,則高接合強度的顯現所需的硬化變得不充分,若過少則硬化前的操作性提高,但有時接合所需的強度下降。 The adhesive resin is preferably used in a range of 5 to 900 parts by mass relative to 100 parts by mass of the curable resin, more preferably in a range of 10 to 700 parts by mass, and further preferably in a range of 20 to 400 parts by mass. If the mixing ratio of the adhesive resin is too high, the hardening required for the manifestation of high bonding strength becomes insufficient, and if it is too low, the workability before hardening is improved, but the strength required for bonding is sometimes reduced.

作為所述接合材(X),如上所述較佳為使用預先成形為片狀等任意的形狀者。於使得將含有所述聚合性化合物等的組成物成形為所述片狀等時的作業效率提高的方面而言,作為所述組成物,較佳為使用除了聚合性化合物或聚合起始劑以外含有溶媒者。 As the bonding material (X), it is preferred to use one that is pre-formed into any shape such as a sheet as described above. In order to improve the working efficiency when forming the composition containing the polymerizable compound into the sheet, it is preferred to use one that contains a solvent in addition to the polymerizable compound or the polymerization initiator.

作為所述溶媒,例如可使用:乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯等酯系溶劑;丙酮、甲基乙基酮、甲基異丁基酮、二異丁基酮、環己酮等酮系溶劑;甲苯、二甲苯等芳香族烴系溶劑等。 As the solvent, for example, ester solvents such as methyl acetate, ethyl acetate, propyl acetate, and butyl acetate; ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, and cyclohexanone; aromatic hydrocarbon solvents such as toluene and xylene, etc. can be used.

另外,作為所述接合材(X),可使用含有其他成分者。作為所述其他成分,例如可使用氫氧化鋁、氧化鋁、氮化鋁、氫氧化鎂、氧化鎂、雲母、滑石、氮化硼、玻璃片等填料等。 In addition, as the bonding material (X), those containing other components can be used. As the other components, for example, fillers such as aluminum hydroxide, aluminum oxide, aluminum nitride, magnesium hydroxide, magnesium oxide, mica, talc, boron nitride, and glass flakes can be used.

另外,作為所述接合材(X),除了所述者以外,亦可於不損及本發明的效果的範圍內使用例如含有填充劑、軟化劑、穩 定劑、接著促進劑、調平劑、消泡劑、塑化劑、黏著賦予樹脂、纖維類、抗氧化劑、紫外線吸收劑、水解防止劑、增黏劑、顏料等著色劑等添加劑者。 In addition, as the bonding material (X), in addition to the above-mentioned ones, additives such as fillers, softeners, stabilizers, adhesion promoters, leveling agents, defoaming agents, plasticizers, adhesive resins, fibers, antioxidants, ultraviolet absorbers, hydrolysis inhibitors, thickeners, pigments and other coloring agents may also be used within the scope that does not impair the effects of the present invention.

本發明的接合材(X)可藉由將所述聚合性化合物與所述聚合起始劑或溶媒等任意成分混合而製造。 The bonding material (X) of the present invention can be produced by mixing the polymerizable compound with any component such as the polymerization initiator or solvent.

於混合所述成分來製造接合材(X)時,亦可視需要使用溶解器、蝶形混合機(Butterfly Mixer)、BDM雙軸混合機、行星式混合機(Planetary Mixer)等,較佳為使用溶解器、蝶形混合機,於使用所述導電性填料的情況下,於提高該些的分散性的方面而言,較佳為使用行星式混合機。 When mixing the above components to produce the bonding material (X), a dissolver, butterfly mixer, BDM double-shaft mixer, planetary mixer, etc. may be used as needed. Dissolvers and butterfly mixers are preferred. When the above conductive fillers are used, a planetary mixer is preferred in terms of improving the dispersibility of the fillers.

再者,所述聚合起始劑較佳為於使接合材(X)硬化前或者成形為片狀等之前使用。 Furthermore, the polymerization initiator is preferably used before the bonding material (X) is hardened or formed into a sheet, etc.

另外,片狀的接合材例如可藉由如下方式製造,即,於製造含有所述聚合性化合物與所述聚合起始劑或溶媒等任意成分的組成物後,例如塗敷於剝離襯墊(release liner)的表面並使其乾燥等。 In addition, the sheet-shaped bonding material can be manufactured, for example, by manufacturing a composition containing the polymerizable compound and any components such as the polymerization initiator or solvent, and then applying the composition to the surface of a release liner and drying the composition.

關於所述乾燥,於抑制進行片狀的接合材的硬化反應的方面而言,適宜的是於較佳為40℃~120℃、更佳為50℃~90℃左右的溫度下進行。另外,可抑制溶媒等的快速的揮發所導致的片材表面的發泡,因此較佳。 Regarding the drying, in order to suppress the hardening reaction of the sheet-shaped bonding material, it is suitable to be carried out at a temperature of preferably 40°C to 120°C, more preferably 50°C to 90°C. In addition, it is preferable because it can suppress the foaming of the sheet surface caused by the rapid volatilization of the solvent, etc.

所述片狀的接合材亦可於使用前由所述剝離襯墊夾持。 The sheet-shaped bonding material may also be clamped by the peeling pad before use.

作為所述剝離襯墊,例如可使用:牛皮紙、玻璃紙、道林紙 (woodfree paper)等紙;聚乙烯、聚丙烯(定向聚丙烯(oriented polypropylene,OPP)、流延聚丙烯(casting polypropylene,CPP))、聚對苯二甲酸乙二酯等樹脂膜;積層有所述紙與樹脂膜的層疊紙、於利用黏土或聚乙烯醇等對所述紙實施了填充處理而得者的單面或兩面實施矽酮系樹脂等的剝離處理者等。 As the peeling pad, for example, kraft paper, glassine paper, woodfree paper, etc. can be used; resin films such as polyethylene, polypropylene (oriented polypropylene (OPP), cast polypropylene (CPP)), polyethylene terephthalate, etc.; laminated paper with the above paper and resin film, paper filled with clay or polyvinyl alcohol, etc., and peeling treatment with silicone resin, etc., is applied to one or both sides of the paper, etc.

本發明的積層體於硬化前比較柔軟,因此對被接著體的階差追隨性優異,且於硬化後變得非常硬,因此可充分接合被接著體,故而可用於將專門用於圖像顯示裝置的各種構件彼此牢固地接合的材料中。 The laminate of the present invention is relatively soft before hardening, so it has excellent step tracking performance for the adherend, and becomes very hard after hardening, so it can fully bond the adherend. Therefore, it can be used in materials that firmly bond various components specifically used for image display devices.

作為所述圖像顯示裝置,例如可列舉電腦、行動電話、智慧型手機、平板個人電腦(Personal Computer,PC)等移動終端(個人數位助理(Personal Digital Assistant,PDA))、遊戲機、電視機(TV)、汽車導航、觸控面板、數碼繪圖板等使用搭載有液晶顯示器(Liquid crystal display,LCD)、電漿顯示器(plasma display,PDP)或電致發光(electroluminescent,EL)、有機EL、微發光二極體(light emitting diode,LED)、量子點(quantum dot,QD)等的圖像顯示面板的平面型圖像顯示裝置的構成構件。作為構成構件,例如可列舉圖像顯示面板、電路基板、背蓋(rear cover)、邊框、框架、底盤等。 As the image display device, for example, there can be listed the components of a flat image display device using an image display panel equipped with a liquid crystal display (LCD), plasma display (PDP) or electroluminescent (EL), organic EL, light emitting diode (LED), quantum dot (QD), etc., such as a mobile terminal (Personal Digital Assistant (PDA)), game console, television (TV), car navigation, touch panel, digital drawing tablet, etc. As the components, for example, there can be listed the image display panel, circuit substrate, rear cover, frame, frame, chassis, etc.

[實施例] [Implementation example]

以下,對實施例及比較例進行具體說明。 The following is a detailed description of the implementation examples and comparative examples.

<丙烯酸共聚物(1)的製備> <Preparation of acrylic copolymer (1)>

丙烯酸共聚物的製備於具備攪拌機、冷流冷卻器、溫度計、滴加漏斗及氮氣導入口的反應容器中,使丙烯酸正丁酯25質量份、丙烯酸2-甲氧基乙酯80質量份、丙烯酸2-羥基乙酯1質量份及作為聚合起始劑的2,2'-偶氮雙異丁腈0.2質量份溶解於乙酸乙酯100質量份中,於進行氮氣置換後,於80℃下進行8小時聚合,而獲得固體成分為50質量%、重量平均分子量為75萬的丙烯酸共聚物(1)。再者,玻璃轉移溫度為-25℃。 Preparation of acrylic copolymer In a reaction vessel equipped with a stirrer, cold flow cooler, thermometer, dropping funnel and nitrogen inlet, 25 parts by mass of n-butyl acrylate, 80 parts by mass of 2-methoxyethyl acrylate, 1 part by mass of 2-hydroxyethyl acrylate and 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator were dissolved in 100 parts by mass of ethyl acetate, and after nitrogen substitution, polymerization was carried out at 80°C for 8 hours to obtain an acrylic copolymer (1) with a solid content of 50% by mass and a weight average molecular weight of 750,000. The glass transition temperature was -25°C.

<聚胺基甲酸酯(1)的製備> <Preparation of polyurethane (1)>

於反應容器中將使1,5-戊二醇、1,6-己二醇及碳酸二烷基酯反應而獲得的數量平均分子量為2000的脂肪族聚碳酸酯多元醇50質量份與使1,6-己二醇及己二酸反應而獲得的數量平均分子量為4500的聚酯多元醇30質量份混合,於減壓條件下加熱為100℃,藉此進行脫水至水分率成為0.05質量%為止。 In a reaction vessel, 50 parts by mass of aliphatic polycarbonate polyol with a number average molecular weight of 2000 obtained by reacting 1,5-pentanediol, 1,6-hexanediol and dialkyl carbonate and 30 parts by mass of polyester polyol with a number average molecular weight of 4500 obtained by reacting 1,6-hexanediol and adipic acid were mixed, and heated to 100°C under reduced pressure to dehydrate until the moisture content reached 0.05% by mass.

其次,於將使所述脂肪族聚碳酸酯多元醇及所述聚酯多元醇的混合物冷卻至70℃而得者與二環己基甲烷-4,4'-二異氰酸酯14.5質量份混合後,升溫至100℃,反應3小時。其後,以成為固體成分50質量%的方式製備甲基乙基酮,藉此獲得聚胺基甲酸酯(1)。再者,玻璃轉移溫度為-28℃。 Next, the mixture of the aliphatic polycarbonate polyol and the polyester polyol was cooled to 70°C and mixed with 14.5 parts by weight of dicyclohexylmethane-4,4'-diisocyanate, and then heated to 100°C and reacted for 3 hours. Thereafter, methyl ethyl ketone was prepared in such a manner that the solid content was 50% by weight, thereby obtaining polyurethane (1). The glass transition temperature was -28°C.

<接合材料(A-1)的製備> <Preparation of bonding material (A-1)>

將EX-321L(長瀨精細化工(nagasechemtex)公司製造、三羥甲基丙烷聚縮水甘油醚型環氧樹脂)50質量份、所述丙烯酸共聚物(1)100質量份、CPI-100P(三亞普羅(San-Apro)公司製 造、鋶鎓鹽系)2質量份、布努克(BURNOCK)DN980(DIC股份有限公司製造、六亞甲基二異氰酸酯型的異氰酸酯交聯劑)0.20質量份混合,而獲得接合性樹脂塗料(a-1)。 EX-321L (manufactured by Nagase Chemtex, a trihydroxymethylpropane polyglycidyl ether type epoxy resin) 50 parts by mass, the acrylic copolymer (1) 100 parts by mass, CPI-100P (manufactured by San-Apro, a coronium salt system) 2 parts by mass, and BURNOCK DN980 (manufactured by DIC Corporation, a hexamethylene diisocyanate type isocyanate crosslinking agent) 0.20 parts by mass were mixed to obtain an adhesive resin coating (a-1).

其次,使用棒狀的金屬敷料器,以乾燥後的厚度成為100μm的方式將所述接合性樹脂塗料(a-1)塗敷於脫模襯墊(厚度75μm的聚對苯二甲酸乙二酯膜的單面藉由矽酮化合物而受到剝離處理者)的表面。 Next, the bonding resin coating (a-1) was applied to the surface of a release liner (a polyethylene terephthalate film having a thickness of 75 μm and subjected to a release treatment on one side with a silicone compound) using a rod-shaped metal applicator so that the thickness after drying was 100 μm.

進而,將所述塗敷物於85℃的乾燥機中投入5分鐘進行乾燥,於乾燥後的塗敷物的單面貼合脫模襯墊(厚度38μm的聚對苯二甲酸乙二酯膜的單面藉由矽酮化合物而受到剝離處理者)。其後藉由於40℃下進行72小時熟化,而獲得厚度100μm的片狀的接合材料(A-1)。 Furthermore, the coating was placed in a dryer at 85°C for 5 minutes for drying, and a release liner (one side of a 38μm thick polyethylene terephthalate film subjected to a release treatment using a silicone compound) was attached to one side of the dried coating. After that, the coating was aged at 40°C for 72 hours to obtain a sheet-shaped bonding material (A-1) with a thickness of 100μm.

再者,所述接合材料(A-1)具有光聚合起始劑,另外具有環氧基作為反應部位,因此藉由照射光,可對環氧基的硬化反應進行活化。 Furthermore, the bonding material (A-1) has a photopolymerization initiator and an epoxy group as a reaction site, so the curing reaction of the epoxy group can be activated by irradiating light.

所述接合材料(A-1)的於23℃下的儲存彈性係數為1.7×104Pa,70℃下的儲存彈性係數為2.9×103Pa。 The bonding material (A-1) had a storage elastic coefficient of 1.7×10 4 Pa at 23°C and a storage elastic coefficient of 2.9×10 3 Pa at 70°C.

再者,所述接合材料(A-1)的於23℃及70℃下的儲存彈性係數使用動態黏彈性試驗機(流變(Rheometrics)公司製造、商品名:阿里斯(ARES)2KSTD),將試驗片夾入作為同一試驗機的測定部的平行圓盤之間,於升溫速度3℃/分鐘、測定頻率1.0Hz、測定溫度範圍0℃~200℃的範圍內測定而分別計算出。作為 所述測定中使用的試驗片,使用在去除所述接合材料(A-1)的其中一面的剝離襯墊後以成為厚度1mm的方式積層並裁切為包含直徑8mm的大小的圓狀者。 Furthermore, the storage elastic coefficient of the bonding material (A-1) at 23°C and 70°C was calculated by sandwiching the test piece between parallel disks as the measuring part of the same tester using a dynamic viscoelastic tester (manufactured by Rheometrics, trade name: ARES 2KSTD) and measuring at a heating rate of 3°C/min, a measuring frequency of 1.0 Hz, and a measuring temperature range of 0°C to 200°C. As the test piece used in the measurement, a test piece was used that was laminated to a thickness of 1mm after removing the peeling pad on one side of the bonding material (A-1) and cut into a circular shape including a diameter of 8mm.

<接合材料(A-2)的製備> <Preparation of bonding material (A-2)>

除了使用CEL-2021P(大賽璐(Daicel)公司製造、脂環式環氧樹脂)來代替EX-321L(長瀨精細化工(nagasechemtex)公司製造、三羥甲基丙烷聚縮水甘油醚型環氧樹脂)50質量份以外,利用與所述接合材料(A-1)的製備相同的方法獲得接合性樹脂塗料(a-2)及接合材料(A-2)。 The bonding resin coating (a-2) and bonding material (A-2) were obtained by the same method as the preparation of the bonding material (A-1), except that CEL-2021P (manufactured by Daicel Corporation, epoxy resin) was used instead of 50 parts by mass of EX-321L (manufactured by Nagase Chemtex Corporation, trihydroxymethylpropane polyglycidyl ether type epoxy resin).

再者,所述接合材料(A-2)具有光聚合起始劑,另外具有環氧基作為反應部位,因此藉由照射光,可對環氧基的硬化反應進行活化。 Furthermore, the bonding material (A-2) has a photopolymerization initiator and an epoxy group as a reaction site, so the curing reaction of the epoxy group can be activated by irradiating light.

所述接合材料(A-2)的於23℃下的儲存彈性係數為9.3×103Pa,70℃下的儲存彈性係數為1.0×103Pa。 The bonding material (A-2) had a storage elastic coefficient of 9.3×10 3 Pa at 23°C and a storage elastic coefficient of 1.0×10 3 Pa at 70°C.

<接合材料(A-3)的製備> <Preparation of bonding material (A-3)>

除了使用DICY-7(三菱化學股份有限公司製造、二氰二胺(dicyandiamide))2.0質量份來代替CPI-100P以外,利用與所述接合材料(A-1)的製備相同的方法獲得接合性樹脂塗料(a-3)及接合材料(A-3)。 The bonding resin coating (a-3) and bonding material (A-3) were obtained by the same method as the preparation of the bonding material (A-1), except that 2.0 parts by mass of DICY-7 (dicyandiamide, manufactured by Mitsubishi Chemical Co., Ltd.) was used instead of CPI-100P.

再者,所述接合材料(A-3)具有熱聚合起始劑,另外具有環氧基作為反應部位,因此藉由進行加熱,可對環氧基的硬化反應進行活化。 Furthermore, the bonding material (A-3) has a thermal polymerization initiator and an epoxy group as a reaction site, so the curing reaction of the epoxy group can be activated by heating.

所述接合材料(A-3)的於23℃下的儲存彈性係數為9.6×103Pa,70℃下的儲存彈性係數為1.0×103Pa。 The bonding material (A-3) had a storage elastic coefficient of 9.6×10 3 Pa at 23°C and a storage elastic coefficient of 1.0×10 3 Pa at 70°C.

作為本實施例及比較例中使用的被接著體,將表面平滑的厚度0.05mm的鋁板裁切為寬度15mm×長度150mm,並將其設為被接著體(I)。另外,將表面平滑的厚度1.0mm的環氧基玻璃板(新神戶電機公司製造/KEL-GEF)裁切為寬度15mm×長度150mm,並將其設為被接著體(II)。再者,所述被接著體(I)及所述被接著體(II)為不透光材料。 As the adherend used in this embodiment and the comparative example, a smooth surface aluminum plate with a thickness of 0.05 mm was cut into a width of 15 mm × a length of 150 mm, and it was set as the adherend (I). In addition, a smooth surface epoxy glass plate with a thickness of 1.0 mm (manufactured by Shin Kobe Electric Co., Ltd./KEL-GEF) was cut into a width of 15 mm × a length of 150 mm, and it was set as the adherend (II). Furthermore, the adherend (I) and the adherend (II) are opaque materials.

<接合材料(A-4)的製備> <Preparation of bonding material (A-4)>

除了使用100質量份的聚胺基甲酸酯(1)來代替丙烯酸共聚物(1),且將CEL-2021P(大賽璐(Daicel)公司製造、脂環式環氧樹脂)的使用量自50質量份變更為21質量份,將CPI-100P(三亞普羅(San-Apro)公司製造、鋶鎓鹽系、固體成分濃度50%)的使用量自2質量份變更為2.9質量份,將布努克(BURNOCK)DN980(DIC股份有限公司製造、六亞甲基二異氰酸酯型的異氰酸酯交聯劑)的使用量自0.20質量份變更為0質量份以外,利用與所述接合材料(A-1)的製備相同的方法獲得接合性樹脂塗料(a-4)及接合材料(A-4)。 Adhesive resin coating (a-4) and bonding material (A-4) were obtained by the same method as the preparation of bonding material (A-1), except that 100 parts by mass of polyurethane (1) was used instead of acrylic copolymer (1), the amount of CEL-2021P (manufactured by Daicel, epoxide resin) was changed from 50 parts by mass to 21 parts by mass, the amount of CPI-100P (manufactured by San-Apro, coronium salt system, solid content concentration 50%) was changed from 2 parts by mass to 2.9 parts by mass, and the amount of BURNOCK DN980 (manufactured by DIC Corporation, hexamethylene diisocyanate type isocyanate crosslinking agent) was changed from 0.20 parts by mass to 0 parts by mass.

再者,所述接合材料(A-4)具有光聚合起始劑,另外具有環氧基作為反應部位,因此藉由照射光,可對環氧基的硬化反應進行活化。 Furthermore, the bonding material (A-4) has a photopolymerization initiator and an epoxy group as a reaction site, so the curing reaction of the epoxy group can be activated by irradiating light.

所述接合材料(A-4)的於23℃下的儲存彈性係數為 4.9×104Pa,70℃下的儲存彈性係數為1.2×101Pa。 The bonding material (A-4) had a storage elastic coefficient of 4.9×10 4 Pa at 23° C. and a storage elastic coefficient of 1.2×10 1 Pa at 70° C.

(實施例1) (Implementation Example 1)

將使所述接合材料(A-1)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,於23℃下貼附於所述被接著體(I)。 The bonding material (A-1) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and attached to the adherend (I) at 23°C.

於自所述貼附物上負載1kg的狀態下,於70℃環境下靜置30分鐘。 With 1 kg loaded on the attached object, place it in a 70°C environment for 30 minutes.

於所述放置後,自所述貼附物解除1kg負載,於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,對露出的接合材的表層使用無電極燈(融合燈H閥)照射250mJ/cm2的紫外線。 After the above-mentioned placement, the 1 kg load was removed from the attached object and placed in an environment of 23°C for 30 minutes. Thereafter, the peeling pad was removed from the other side of the test sample, and the surface of the exposed bonding material was irradiated with 250 mJ/ cm2 of ultraviolet light using an electrodeless lamp (fusion lamp H valve).

於所述照射後,於23℃下放置2分鐘,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 After the irradiation, place at 23°C for 2 minutes, attach the adherend (II) to the surface of the irradiated bonding material layer, and use a hot pressing device heated to 40°C to perform press bonding for 10 seconds at a pressure of 0.5MPa.

將所述壓製壓接後的積層體於70℃下加熱放置1小時,於23℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X-1)。 The laminated body after pressing and bonding was heated at 70°C for 1 hour, placed in a 23°C environment for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X-1).

所述評價樣品(X-1)的製作所需的時間為2小時32分鐘10秒。另外,所述評價樣品(X-1)的硬化所需的時間為1小時。 The time required for the preparation of the evaluation sample (X-1) is 2 hours, 32 minutes and 10 seconds. In addition, the time required for the hardening of the evaluation sample (X-1) is 1 hour.

於所述評價樣品(X-1)中,分別夾持(chucking)所述被接著體(I)及所述被接著體(II)的端部,使用拉伸試驗機, 以拉伸速度10mm/分鐘朝180度方向進行拉伸試驗,藉此求出所述評價樣品(X-1)的剪切接著力。此時的所述評價樣品(X-1)的剪切接著力為920Pa。 In the evaluation sample (X-1), the ends of the adherend (I) and the adherend (II) are chucking, and a tensile tester is used to perform a tensile test in a 180-degree direction at a tensile speed of 10 mm/min, thereby obtaining the shear adhesion of the evaluation sample (X-1). At this time, the shear adhesion of the evaluation sample (X-1) is 920 Pa.

另外,利用與所述評價樣品(X-1)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B-1)的於25℃下的儲存彈性係數為5.7×105Pa。 The storage elastic modulus at 25°C of the cured product (B-1) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X-1) was 5.7×10 5 Pa.

另外,所述片狀的接合材料(A-1)的硬化物(B-1)的於25℃下的儲存彈性係數使用動態黏彈性測定裝置(TA儀器(TA Instruments)公司製造、RSA III),於升溫速度3℃/分鐘、測定頻率1.0Hz、測定溫度範圍0℃~200℃的範圍內進行測定,分別計算出25℃及100℃下的儲存彈性係數(G')。 In addition, the storage elastic coefficient of the cured product (B-1) of the sheet-shaped bonding material (A-1) at 25°C was measured using a dynamic viscoelasticity measuring device (manufactured by TA Instruments, RSA III) at a heating rate of 3°C/min, a measuring frequency of 1.0 Hz, and a measuring temperature range of 0°C to 200°C, and the storage elastic coefficient (G') at 25°C and 100°C was calculated respectively.

(實施例2) (Example 2)

將使所述接合材料(A-1)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,於23℃下貼附於所述被接著體(I)。 The bonding material (A-1) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and attached to the adherend (I) at 23°C.

將所述貼附物於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,對露出的接合材的表層使用無電極燈(融合燈H閥)照射250mJ/cm2的紫外線。 The adhered article was placed in an environment of 23°C for 30 minutes. Thereafter, the peeling pad was removed from the other side of the test sample, and the exposed surface of the bonding material was irradiated with ultraviolet light of 250 mJ/ cm2 using an electrodeless lamp (fusion lamp H valve).

於所述照射後,於23℃下放置2分鐘,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 After the irradiation, place at 23°C for 2 minutes, attach the adherend (II) to the surface of the irradiated bonding material layer, and use a hot pressing device heated to 40°C to perform press bonding for 10 seconds at a pressure of 0.5MPa.

將所述壓製壓接後的積層體於70℃下加熱放置1小時,於23 ℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X-2)。 The laminated body after pressing and bonding was heated at 70°C for 1 hour, placed in a 23°C environment for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X-2).

所述評價樣品(X-2)的製作所需的時間為2小時2分鐘10秒。另外,使所述評價樣品(X-2)硬化所需的時間為1小時。 The time required to prepare the evaluation sample (X-2) is 2 hours, 2 minutes and 10 seconds. In addition, the time required to harden the evaluation sample (X-2) is 1 hour.

利用與實施例1相同的方法求出評價樣品(X-2)的剪切接著力。此時的所述評價樣品(X-2)的剪切接著力為880Pa。 The shear adhesion of the evaluation sample (X-2) was calculated using the same method as in Example 1. The shear adhesion of the evaluation sample (X-2) at this time was 880 Pa.

另外,利用與所述評價樣品(X-2)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B-2)的於25℃下的儲存彈性係數為4.9×105Pa。 The storage elastic modulus at 25°C of the cured product (B-2) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X-2) was 4.9×10 5 Pa.

(實施例3) (Implementation Example 3)

除了使用所述接合材料(A-2)以外,利用與實施例1相同的方法製作評價樣品(X-3)。 Except for using the bonding material (A-2), the evaluation sample (X-3) was prepared using the same method as Example 1.

所述評價樣品(X-3)的製作所需的時間為2小時32分鐘10秒。另外,所述評價樣品(X-3)的硬化所需的時間為1小時。 The time required for the preparation of the evaluation sample (X-3) is 2 hours, 32 minutes and 10 seconds. In addition, the time required for the hardening of the evaluation sample (X-3) is 1 hour.

利用與實施例1相同的方法求出評價樣品(X-3)的剪切接著力。此時的所述評價樣品(X-3)的剪切接著力為1100Pa。 The shear adhesion of the evaluation sample (X-3) was calculated using the same method as in Example 1. At this time, the shear adhesion of the evaluation sample (X-3) was 1100 Pa.

另外,利用與所述評價樣品(X-3)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B-3)的於25℃下的儲存彈性係數為6.3×106Pa。 The storage elastic modulus at 25°C of the cured product (B-3) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X-3) was 6.3×10 6 Pa.

(實施例4) (Implementation Example 4)

除了使用所述接合材料(A-4),且將使用無電極燈(融合燈 H閥)的紫外線照射量自250mJ/cm2變更為500mJ/cm2以外,利用與實施例1相同的方法製作評價樣品(X-4)。 An evaluation sample (X-4) was prepared in the same manner as in Example 1 except that the bonding material (A-4) was used and the ultraviolet irradiation dose using an electrodeless lamp (fusion lamp H valve) was changed from 250 mJ/cm 2 to 500 mJ/cm 2 .

所述評價樣品(X-4)的製作所需的時間為2小時32分鐘10秒。另外,所述評價樣品(X-4)的硬化所需的時間為1小時。 The time required for the preparation of the evaluation sample (X-4) is 2 hours, 32 minutes and 10 seconds. In addition, the time required for the hardening of the evaluation sample (X-4) is 1 hour.

利用與實施例1相同的方法求出評價樣品(X-4)的剪切接著力。此時的所述評價樣品(X-4)的剪切接著力為3700Pa。 The shear adhesion strength of the evaluation sample (X-4) was calculated using the same method as in Example 1. At this time, the shear adhesion strength of the evaluation sample (X-4) was 3700 Pa.

另外,利用與所述評價樣品(X-4)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B-4)的於25℃下的儲存彈性係數為5.8×108Pa。 The storage elastic modulus at 25°C of the cured product (B-4) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X-4) was 5.8×10 8 Pa.

(實施例5) (Example 5)

將使所述接合材料(A-4)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,於23℃下貼附於所述被接著體(I)。 The bonding material (A-4) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and attached to the adherend (I) at 23°C.

其後,將所述貼附物於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,對露出的接合材的表層使用無電極燈(融合燈H閥)照射500mJ/cm2的紫外線。 Thereafter, the adhered article was placed in an environment of 23°C for 30 minutes. Thereafter, the peeling pad was removed from the other side of the test sample, and the exposed surface of the bonding material was irradiated with ultraviolet light at 500 mJ/ cm2 using an electrodeless lamp (fusion lamp H valve).

於所述照射後,於23℃下放置2分鐘,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 After the irradiation, place at 23°C for 2 minutes, attach the adherend (II) to the surface of the irradiated bonding material layer, and use a hot pressing device heated to 40°C to perform press bonding for 10 seconds at a pressure of 0.5MPa.

其後,於自所述貼附物上負載1kg的狀態下,於70℃環境下靜置5分鐘。 Afterwards, the attached object was loaded with 1 kg and placed in a 70°C environment for 5 minutes.

於所述放置後,自所述貼附物解除1kg負載,於70℃下加熱放置55分鐘,於23℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X-5)。 After the placement, the 1 kg load was removed from the attached object, heated at 70°C for 55 minutes, placed in a 23°C environment for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X-5).

所述評價樣品(X-5)的製作所需的時間為2小時2分鐘10秒。另外,所述評價樣品(X-5)的硬化所需的時間為1小時。 The time required to prepare the evaluation sample (X-5) is 2 hours, 2 minutes and 10 seconds. In addition, the time required to harden the evaluation sample (X-5) is 1 hour.

利用與實施例1相同的方法求出評價樣品(X-5)的剪切接著力。此時的所述評價樣品(X-5)的剪切接著力為3500Pa。 The shear adhesion strength of the evaluation sample (X-5) was calculated using the same method as in Example 1. At this time, the shear adhesion strength of the evaluation sample (X-5) was 3500 Pa.

另外,利用與所述評價樣品(X-5)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B-5)的於25℃下的儲存彈性係數為4.3×108Pa。 The storage elastic modulus at 25°C of the cured product (B-5) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X-5) was 4.3×10 8 Pa.

(比較例1) (Comparison Example 1)

將使所述接合材料(A-1)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,並貼附所述被接著體(I)。 The bonding material (A-1) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and the adherend (I) is attached.

於自所述貼附物上負載1kg的狀態下,於70℃環境下靜置30分鐘。 With 1 kg loaded on the attached object, place it in a 70°C environment for 30 minutes.

於所述放置後,自所述貼附物解除1kg負載,於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 After the placement, the 1kg load is removed from the attached object and placed in an environment of 23°C for 30 minutes. Thereafter, the peeling pad is removed from the other side of the test sample, and the adherend (II) is attached to the surface of the irradiated bonding material layer, and a hot press device heated to 40°C is used to perform press bonding for 10 seconds under a pressure of 0.5MPa.

於所述壓接後,自貼附的所述被接著體(I)側使用無電極燈(融合燈H閥)照射250mJ/cm2的紫外線。 After the crimping, 250 mJ/ cm2 of ultraviolet light is irradiated from the adhered object (I) side using an electrodeless lamp (fusion lamp H valve).

將所述照射後的積層體於70℃下加熱放置1小時,於23℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X'-1)。 The irradiated laminate was heated at 70°C for 1 hour, placed in a 23°C environment for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X'-1).

所述評價樣品(X'-1)的製作所需的時間為2小時30分鐘10秒。另外,所述評價樣品(X'-1)的硬化所需的時間為1小時。 The time required for the preparation of the evaluation sample (X'-1) is 2 hours, 30 minutes and 10 seconds. In addition, the time required for the hardening of the evaluation sample (X'-1) is 1 hour.

利用與實施例1相同的方法求出評價樣品(X'-1)的剪切接著力。此時的所述評價樣品(X'-1)的剪切接著力為40Pa。 The shear adhesion of the evaluation sample (X'-1) was calculated using the same method as in Example 1. The shear adhesion of the evaluation sample (X'-1) was 40 Pa at this time.

另外,利用與所述評價樣品(X'-1)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B'-1)的於25℃下的儲存彈性係數為1.7×104Pa。 The storage elastic modulus at 25° C. of the cured product (B′-1) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X′-1) was 1.7×10 4 Pa.

(比較例2) (Comparison Example 2)

將使所述接合材料(A-1)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,並貼附所述被接著體(I)。 The bonding material (A-1) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and the adherend (I) is attached.

將所述貼附物於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 The adhered object was placed in an environment of 23°C for 30 minutes. Afterwards, the peeling pad was removed from the other side of the test sample, and the adherend (II) was attached to the surface of the irradiated bonding material layer, and a hot press device heated to 40°C was used to perform press bonding for 10 seconds under a pressure of 0.5MPa.

於所述壓接後,自貼附的所述被接著體(II)側使用無電極燈(融合燈H閥)照射250mJ/cm2的紫外線。 After the crimping, 250 mJ/ cm2 of ultraviolet light was irradiated from the adhered object (II) side using an electrodeless lamp (fusion lamp H valve).

將所述照射後的積層體於70℃下加熱放置1小時,於23℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X'-2)。 The irradiated laminate was heated at 70°C for 1 hour, placed in a 23°C environment for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X'-2).

所述評價樣品(X'-2)的製作所需的時間為2小時10秒。另外,所述評價樣品(X'-2)的硬化所需的時間為1小時。 The time required for the preparation of the evaluation sample (X'-2) is 2 hours and 10 seconds. In addition, the time required for the hardening of the evaluation sample (X'-2) is 1 hour.

利用與實施例1相同的方法求出評價樣品(X'-2)的剪切接著力。此時的所述評價樣品(X'-2)的剪切接著力為38Pa。 The shear adhesion of the evaluation sample (X'-2) was calculated using the same method as in Example 1. The shear adhesion of the evaluation sample (X'-2) at this time was 38 Pa.

另外,利用與所述評價樣品(X'-2)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B'-2)的於25℃下的儲存彈性係數為1.7×104Pa。 The storage elastic modulus at 25°C of the cured product (B'-2) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X'-2) was 1.7×10 4 Pa.

(比較例3) (Comparison Example 3)

將使所述接合材料(A-3)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,並貼附所述被接著體(I)。 The bonding material (A-3) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and the adherend (I) is attached.

於自所述貼附物上負載1kg的狀態下,於70℃環境下靜置30分鐘。 With 1 kg loaded on the attached object, place it in a 70°C environment for 30 minutes.

於所述放置後,自所述貼附物解除1kg負載,於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 After the placement, the 1kg load is removed from the attached object and placed in an environment of 23°C for 30 minutes. Thereafter, the peeling pad is removed from the other side of the test sample, and the adherend (II) is attached to the surface of the irradiated bonding material layer, and a hot press device heated to 40°C is used to perform press bonding for 10 seconds under a pressure of 0.5MPa.

將所述加壓後的積層體於180℃下加熱放置1小時,於23℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X'-3)。 The pressurized laminate was heated at 180°C for 1 hour, placed in a 23°C environment for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X'-3).

所述評價樣品(X'-3)的製作所需的總時間為2小時30分鐘10秒。另外,所述評價樣品(X'-3)的硬化所需的時間為1小時。藉由目視確認評價樣品(X'-3),結果被接著體(II)劣化,變色為黃色。 The total time required for the preparation of the evaluation sample (X'-3) was 2 hours, 30 minutes and 10 seconds. In addition, the time required for the hardening of the evaluation sample (X'-3) was 1 hour. By visually checking the evaluation sample (X'-3), it was found that the adhesive (II) was deteriorated and changed color to yellow.

利用與實施例1相同的方法求出評價樣品(X'-3)的剪切接著力。此時的所述評價樣品(X'-3)的剪切接著力為203Pa。 The shear adhesion of the evaluation sample (X'-3) was calculated using the same method as in Example 1. The shear adhesion of the evaluation sample (X'-3) at this time was 203Pa.

另外,利用與所述評價樣品(X'-3)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B'-3)的於25℃下的儲存彈性係數為7.5×106Pa。 The storage elastic modulus at 25° C. of the cured product (B′-3) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X′-3) was 7.5×10 6 Pa.

(比較例4) (Comparison Example 4)

將使所述接合材料(A-3)裁切為寬度10mm×長度10mm的大小而得者設為試驗樣品。去除所述試驗樣品的一個剝離襯墊,並貼附所述被接著體(I)。 The bonding material (A-3) is cut into a size of 10 mm in width x 10 mm in length and used as a test sample. One of the peeling pads of the test sample is removed and the adherend (I) is attached.

於自所述貼附物上負載1kg的狀態下,於70℃環境下靜置30分鐘。 With 1 kg loaded on the attached object, place it in a 70°C environment for 30 minutes.

於所述放置後,自所述貼附物解除1kg負載,於23℃的環境下放置30分鐘。其後,自所述試驗樣品的另一面去除剝離襯墊,將所述被接著體(II)貼附於所述照射後的接合材層的表面,使用加熱為40℃的熱壓製裝置,於以0.5MPa加壓的狀態下進行10秒壓製壓接。 After the placement, the 1kg load is removed from the attached object and placed in an environment of 23°C for 30 minutes. Thereafter, the peeling pad is removed from the other side of the test sample, and the adherend (II) is attached to the surface of the irradiated bonding material layer, and a hot press device heated to 40°C is used to perform press bonding for 10 seconds under a pressure of 0.5MPa.

將所述加壓後的積層體於70℃下加熱放置3小時,於23℃環境下放置30分鐘並進行冷卻,而將所得者設為評價樣品(X'-4)。 The pressurized laminate was heated at 70°C for 3 hours, placed at 23°C for 30 minutes and cooled, and the obtained product was set as the evaluation sample (X'-4).

所述評價樣品(X'-4)的製作所需的時間為4小時30分鐘10秒。另外,使所述評價樣品(X'-4)硬化所需的時間為3小時。 The time required to prepare the evaluation sample (X'-4) is 4 hours, 30 minutes and 10 seconds. In addition, the time required to harden the evaluation sample (X'-4) is 3 hours.

利用與實施例1相同的方法求出評價樣品(X'-4)的剪切接著力。此時的所述評價樣品(X'-4)的剪切接著力為115Pa。 The shear adhesion of the evaluation sample (X'-4) was calculated using the same method as in Example 1. The shear adhesion of the evaluation sample (X'-4) at this time was 115 Pa.

另外,利用與所述評價樣品(X'-4)相同的硬化方法而獲得的片狀的接合材料(A-1)的硬化物(B'-4)的於25℃下的儲存彈性係數為6.5×104Pa。 The storage elastic modulus at 25°C of the cured product (B'-4) of the sheet-shaped bonding material (A-1) obtained by the same curing method as that of the evaluation sample (X'-4) was 6.5×10 4 Pa.

Figure 107132266-A0305-02-0031-2
Figure 107132266-A0305-02-0031-2

Figure 107132266-A0305-02-0031-3
Figure 107132266-A0305-02-0031-3

根據所述結果可知,實施例1~實施例5中,可於短時 間且低溫下製作積層體,且即便對於不透明的被接著體,亦可獲得充分的接合。另一方面,比較例1~比較例2中,雖於短時間且低溫下製作積層體,但接合材料不硬化,無法獲得充分的接合。另外,比較例3中,雖可以短時間獲得接合,但硬化需要高溫,因此被接著體被觀察到劣化。比較例4中,雖可以低溫獲得接合,但需要大量的時間。 According to the above results, in Examples 1 to 5, a laminate can be made in a short time and at a low temperature, and sufficient bonding can be obtained even for an opaque adherend. On the other hand, in Comparative Examples 1 to 2, although the laminate is made in a short time and at a low temperature, the bonding material does not harden and sufficient bonding cannot be obtained. In addition, in Comparative Example 3, although bonding can be obtained in a short time, high temperature is required for hardening, so degradation of the adherend is observed. In Comparative Example 4, although bonding can be obtained at a low temperature, a lot of time is required.

Claims (7)

一種含硬化性接合材的積層體的製造方法,其製造間隔接合材(X)而包含被接著體(C1)與被接著體(C2)的積層體,所述含硬化性接合材的積層體的製造方法依次包括:步驟[01],將所述接合材(X)貼附於所述被接著體(C2);步驟[1],對所述接合材(X)的反應部位藉由照光進行活化;步驟[2],將所述接合材(X)貼附於所述被接著體(C1);以及步驟[3],使所述接合材(X)硬化,於所述步驟[01]與所述步驟[1]之間、以及所述步驟[2]與所述步驟[3]之間的至少一者中包括步驟[02],所述步驟[02]為進行階差追隨的養護步驟,所述步驟[3]包括進行加熱的步驟,所述接合材(X)包含丙烯酸共聚物或聚胺基甲酸酯、及環氧樹脂、以及光陽離子聚合起始劑,所述步驟[3]後的於25℃下的所述接合材(X)的儲存彈性係數為1.0×105Pa以上。 A method for manufacturing a laminate containing a hardening bonding material, wherein the laminate comprises a bonded body (C1) and a bonded body (C2) separated by a bonding material (X), the method comprising: step [01] of attaching the bonding material (X) to the bonded body (C2); step [1] of activating the reaction site of the bonding material (X) by irradiating light; step [2] of attaching the bonding material (X) to the bonded body (C1); and step [3] of activating the bonded body (C2). The bonding material (X) is hardened, and at least one of the steps [01] and [1] and between the steps [2] and [3] includes a step [02], wherein the step [02] is a curing step for performing step-following, and the step [3] includes a heating step, wherein the bonding material (X) comprises an acrylic copolymer or a polyurethane, an epoxy resin, and a photo-cationic polymerization initiator, and the storage elastic coefficient of the bonding material (X) at 25°C after the step [3] is greater than 1.0×10 5 Pa. 如申請專利範圍第1項所述的含硬化性接合材的積層體的製造方法,其中所述步驟[02]包括進行加熱的步驟。 A method for manufacturing a laminate containing a hardening bonding material as described in Item 1 of the patent application, wherein the step [02] includes a heating step. 如申請專利範圍第1項或第2項所述的含硬化性接合材的積層體的製造方法,其中所述步驟[2]及所述步驟[01]中的至少一個步驟包括進行加熱的步驟。 A method for manufacturing a laminate containing a hardening bonding material as described in item 1 or 2 of the patent application, wherein at least one of step [2] and step [01] includes a heating step. 如申請專利範圍第1項或第2項所述的含硬化性接合材的積層體的製造方法,其中於所述步驟[01]中,貼附時的所述接合材(X)的儲存彈性係數為5.0×103Pa以上;於所述步驟[02]中,階差追隨時的所述接合材(X)的儲存彈性係數未滿5.0×103Pa。 The method for manufacturing a laminate containing a hardenable bonding material as described in claim 1 or 2, wherein in step [01], the storage elastic coefficient of the bonding material (X) during bonding is greater than 5.0×10 3 Pa; and in step [02], the storage elastic coefficient of the bonding material (X) during step tracking is less than 5.0×10 3 Pa. 如申請專利範圍第1項或第2項所述的含硬化性接合材的積層體的製造方法,其中所述接合材(X)為片狀。 A method for manufacturing a laminate containing a hardening bonding material as described in item 1 or 2 of the patent application, wherein the bonding material (X) is in sheet form. 如申請專利範圍第1項或第2項所述的含硬化性接合材的積層體的製造方法,其中所述丙烯酸共聚物或聚胺基甲酸酯的重量平均分子量為2000~2000000。 A method for manufacturing a laminate containing a curable bonding material as described in item 1 or 2 of the patent application, wherein the weight average molecular weight of the acrylic copolymer or polyurethane is 2000~2000000. 如申請專利範圍第1項或第2項所述的含硬化性接合材的積層體的製造方法,其中所述積層體用於圖像顯示裝置。 A method for manufacturing a laminate containing a hardening bonding material as described in item 1 or 2 of the patent application scope, wherein the laminate is used for an image display device.
TW107132266A 2017-09-27 2018-09-13 Method for manufacturing laminate containing hardening bonding material TWI841538B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017186326 2017-09-27
JP2017-186326 2017-09-27

Publications (2)

Publication Number Publication Date
TW201920540A TW201920540A (en) 2019-06-01
TWI841538B true TWI841538B (en) 2024-05-11

Family

ID=65901377

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107132266A TWI841538B (en) 2017-09-27 2018-09-13 Method for manufacturing laminate containing hardening bonding material

Country Status (4)

Country Link
JP (1) JP6798622B2 (en)
CN (1) CN111108162A (en)
TW (1) TWI841538B (en)
WO (1) WO2019065268A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3719089B1 (en) * 2019-04-02 2024-07-31 3M Innovative Properties Company Process of manufacturing a curable precursor of a structural adhesive composition
EP3719088B1 (en) * 2019-04-02 2024-09-04 3M Innovative Properties Company Curable precursor of a structural adhesive composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW588192B (en) * 2001-04-16 2004-05-21 Sharp Kk Bonding sheet, laminated sheet, and liquid crystal display device
TW201438904A (en) * 2013-02-12 2014-10-16 Mitsubishi Plastics Inc Transparent double-sided adhesive sheet, laminate obtained using same for constituting image display device, process for producing said laminate, and image display device obtained using said laminate
TW201542378A (en) * 2014-03-10 2015-11-16 Mitsubishi Plastics Inc Method for manufacturing layered body used to constitute image display device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1026218A1 (en) * 1999-02-05 2000-08-09 Minnesota Mining And Manufacturing Company UV-curable polyester/epoxy adhesive
JP2001134736A (en) * 1999-11-09 2001-05-18 Sekisui Chem Co Ltd Ic card and producing method therefor
JP2011184582A (en) * 2010-03-09 2011-09-22 Three M Innovative Properties Co Adhesive sheet for optical use
KR101927012B1 (en) * 2015-01-21 2018-12-07 가부시키가이샤 데라오카 세이사쿠쇼 Pressure-sensitive adhesive sheet, process for producing same, and process for producing optical member using same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW588192B (en) * 2001-04-16 2004-05-21 Sharp Kk Bonding sheet, laminated sheet, and liquid crystal display device
TW201438904A (en) * 2013-02-12 2014-10-16 Mitsubishi Plastics Inc Transparent double-sided adhesive sheet, laminate obtained using same for constituting image display device, process for producing said laminate, and image display device obtained using said laminate
TW201542378A (en) * 2014-03-10 2015-11-16 Mitsubishi Plastics Inc Method for manufacturing layered body used to constitute image display device

Also Published As

Publication number Publication date
WO2019065268A1 (en) 2019-04-04
TW201920540A (en) 2019-06-01
JPWO2019065268A1 (en) 2020-04-02
CN111108162A (en) 2020-05-05
JP6798622B2 (en) 2020-12-09

Similar Documents

Publication Publication Date Title
JP5151982B2 (en) Pressure sensitive adhesive and pressure sensitive adhesive film
JP6064937B2 (en) Adhesive composition, adhesive polarizing plate and liquid crystal display device
WO2017078050A1 (en) Curable resin film, and first protective film forming sheet
WO2017078047A1 (en) First protective film forming sheet, method for forming first protective film, and method for manufacturing semiconductor chip
WO2017082106A1 (en) Bonding method, bonded structure and bonding kit
JP2009108113A (en) Pressure-sensitive adhesive and pressure-sensitive adhesive film
JP6230761B2 (en) First protective film forming sheet
JP6449795B2 (en) Curing type adhesive sheet
TWI841538B (en) Method for manufacturing laminate containing hardening bonding material
KR20180098050A (en) Adhesive multi-layer film for Optical film of Display
WO2017078056A1 (en) Curable resin film and first protective film forming sheet
JP6304852B2 (en) Kit for thermosetting resin film and second protective film forming film, thermosetting resin film, first protective film forming sheet, and method for forming first protective film for semiconductor wafer
CN112449649B (en) Adhesive and adhesive sheet
WO2017078055A1 (en) Curable resin film and first protective film forming sheet
JP7111485B2 (en) Bonded structure manufacturing method
JP6381828B2 (en) Thermosetting resin film, first protective film forming sheet, and first protective film forming method
WO2017078042A1 (en) Protective film forming sheet
WO2017078036A1 (en) Curable resin film and first protective film forming sheet
WO2017061364A1 (en) Heat-curable resin film and sheet for forming first protective film
JP6206828B1 (en) Curable resin film, first protective film forming sheet and bump forming surface protecting method
TWI859665B (en) Film-shaped adhesive for flexible device, adhesive sheet for flexible device, and method for manufacturing flexible device
TWI847428B (en) Resin composition for flexible device, film-like adhesive for flexible device, adhesive sheet for flexible device, and method for manufacturing flexible device
JP2020143237A (en) Adhesive composition
WO2017078045A1 (en) Curable resin film and first protective film forming sheet
TW202328386A (en) Film-like adhesive for flexible device, adhesive sheet for flexible device, and method for manufacturing flexible device