TWI719896B - Die bonding device, peeling unit, chuck and manufacturing method of semiconductor device - Google Patents
Die bonding device, peeling unit, chuck and manufacturing method of semiconductor device Download PDFInfo
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- TWI719896B TWI719896B TW109115701A TW109115701A TWI719896B TW I719896 B TWI719896 B TW I719896B TW 109115701 A TW109115701 A TW 109115701A TW 109115701 A TW109115701 A TW 109115701A TW I719896 B TWI719896 B TW I719896B
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- 239000004065 semiconductor Substances 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000013078 crystal Substances 0.000 claims abstract description 36
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- 238000005520 cutting process Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 17
- 230000004048 modification Effects 0.000 description 12
- 238000012986 modification Methods 0.000 description 12
- 230000032258 transport Effects 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 6
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- 210000000078 claw Anatomy 0.000 description 4
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- 230000002250 progressing effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
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- Condensed Matter Physics & Semiconductors (AREA)
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Abstract
本發明的課題是在於提供一種可使晶粒的剛性提升的技術。 其解決手段為一種黏晶裝置,係具備: 夾頭,其係吸附切割膠帶上的晶粒;及 剝離單元,其係具備:與前述切割膠帶之中位於前述晶粒的下方之處抵接的可動平台,及吸附前述切割膠帶之中位於比前述晶粒更外側周邊之處的固定平台,從前述切割膠帶剝離前述晶粒。 前述可動平台係具有用以使前述晶粒彎曲成上面凹陷的凹部。 前述夾頭的下面係具有與前述彎曲的晶粒的上面嵌合的曲面。 The subject of the present invention is to provide a technology that can increase the rigidity of the crystal grains. The solution is a die-bonding device, which is equipped with: The chuck, which absorbs the dies on the cutting tape; and The peeling unit is provided with: a movable platform that abuts against the dicing tape located below the die, and a fixed platform that absorbs the dicing tape at a peripheral edge more than the die. The dicing tape peels off the aforementioned die. The movable platform has a concave portion for bending the crystal grain into a depression on the upper surface. The lower surface of the chuck has a curved surface that fits with the upper surface of the curved die.
Description
本案是有關黏晶裝置,例如可適用於處理薄晶粒的黏晶機。This case is about die bonding devices, such as die bonding machines that can handle thin die.
一般在將被稱為晶粒的半導體晶片搭載於例如配線基板或導線架等(以下總稱為基板)的表面的黏晶機中,一般使用夾頭等的吸附噴嘴來搬送晶粒至基板上,賦予推壓力,且藉由加熱接合材來進行接合的動作(作業)會被重複進行。Generally, in a die bonder that mounts a semiconductor wafer called a die on the surface of, for example, a wiring board or a lead frame (hereinafter collectively referred to as a substrate), a suction nozzle such as a chuck is generally used to transfer the die to the substrate. The operation (work) of applying a pressing force and heating the bonding material to perform bonding is repeated.
在利用黏晶機等的黏晶裝置之晶粒接合工程中,有從半導體晶圓(以下稱為晶圓)剝離被分割的晶粒的剝離工程。在剝離工程中,從切割膠帶背面藉由頂起銷或區塊來頂起晶粒,從被保持於晶粒供給部的切割膠帶,1個1個剝離,使用夾頭等的吸附噴嘴來搬送至基板上。In the die bonding process using a die bonding device such as a die bonder, there is a peeling process for peeling the divided die from a semiconductor wafer (hereinafter referred to as a wafer). In the peeling process, the die is lifted from the back of the dicing tape by lifting pins or blocks, and the dicing tape held in the die supply part is peeled off one by one, and transported using suction nozzles such as chucks. To the substrate.
近年來,以推動半導體裝置的高密度安裝的目的,封裝的薄型化日益進展。例如,在配線基板上立體地安裝複數片的晶粒的層疊封裝被實用化。在組合如此的層疊封裝時,為了防止封裝厚的增加,而被要求將晶粒的厚度薄至30μm以下。 [先前技術文獻] [專利文獻] In recent years, for the purpose of promoting high-density mounting of semiconductor devices, the thinning of packages has been progressing day by day. For example, a multilayer package in which a plurality of dies are three-dimensionally mounted on a wiring board has been put into practical use. In order to prevent an increase in package thickness when such a package on package is combined, the thickness of the die is required to be as thin as 30 μm or less. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開2018-120938號公報[Patent Document 1] JP 2018-120938 A
(發明所欲解決的課題)(The problem to be solved by the invention)
一旦晶粒變薄,則相較於切割膠帶的黏著力,晶粒的剛性極低。 本案的課題是在於提供一種可使晶粒的剛性提升的技術。 其他的課題及新穎的特徵是可由本說明書的記述及附圖明確得知。 (用以解決課題的手段) Once the die becomes thinner, the rigidity of the die is extremely low compared to the adhesive force of the dicing tape. The subject of this case is to provide a technology that can increase the rigidity of the die. Other issues and novel features can be clearly understood from the description of this specification and the drawings. (Means to solve the problem)
若簡單地說明本案之中代表性者的概要,則如下述般。 亦即,黏晶裝置是具備: 夾頭,其係吸附切割膠帶上的晶粒;及 剝離單元,其係具備:與前述切割膠帶之中位於前述晶粒的下方之處抵接的可動平台,及吸附前述切割膠帶之中位於比前述晶粒更外側周邊之處的固定平台,從前述切割膠帶剝離前述晶粒。 前述可動平台係具有用以使前述晶粒彎曲成上面凹陷的凹部。 前述夾頭的下面係具有與前述彎曲的晶粒的上面嵌合的曲面。 [發明的效果] If you briefly explain the outline of the representative person in this case, it will be as follows. That is, the die bonding device is equipped with: The chuck, which absorbs the dies on the cutting tape; and The peeling unit is provided with: a movable platform that abuts against the dicing tape located below the die, and a fixed platform that absorbs the dicing tape at a peripheral edge more than the die. The dicing tape peels off the aforementioned die. The movable platform has a concave portion for bending the crystal grain into a depression on the upper surface. The lower surface of the chuck has a curved surface that fits with the upper surface of the curved die. [Effects of the invention]
若根據本案,則可使晶粒的剛性提升。According to this case, the rigidity of the crystal grains can be improved.
以下,利用圖面來說明有關實施例及變形例。但,在以下的說明中,有對於同一構成要素附上同一符號而省略重複的說明的情形。另外,圖面為了使說明更加明確,相較於實際的形態,有時模式性地表示各部的寬度、厚度、形狀等,但到底是一例,並非限定本發明的解釋者。 [實施例] Hereinafter, the relevant embodiments and modified examples will be described with reference to the drawings. However, in the following description, the same reference numerals are attached to the same constituent elements, and overlapping descriptions may be omitted. In addition, in order to make the description clearer, the drawings sometimes schematically show the width, thickness, shape, etc. of each part compared to the actual form, but they are merely examples and do not limit the interpreter of the present invention. [Example]
圖1是表示實施例的黏晶機的概略的上面圖。圖2是在圖1中由箭號A方向來看時,說明拾取頭及接合頭的動作的圖。Fig. 1 is a top view showing the outline of the die bonder of the embodiment. Fig. 2 is a diagram illustrating the operation of the pickup head and the bonding head when viewed from the direction of arrow A in Fig. 1.
黏晶裝置之一例的黏晶機10是大致區分具有:晶粒供給部1、拾取部2、中間平台部3、接合部4、搬送部5、基板供給部6、基板搬出部7及監視控制各部的動作的控制部8,該晶粒供給部1是供給安裝於基板S的晶粒D,該基板S是印刷成為一個或複數的最終1封裝的製品區域(以下稱為封裝區域P)。Y軸方向為黏晶機10的前後方向,X軸方向為左右方向。晶粒供給部1會被配置於黏晶機10的前面側,接合部4會被配置於後面。The
首先,晶粒供給部1是供給安裝於基板S的封裝區域P的晶粒D。晶粒供給部1是具有:保持晶圓11的晶圓保持台12,及從晶圓11頂起晶粒D的以點線所示的剝離單元13。晶粒供給部1是藉由未圖示的驅動手段來移動於XY軸方向,使拾取的晶粒D移動至剝離單元13的位置。First, the
拾取部2是具有:拾取晶粒D的拾取頭21,及使拾取頭21移動於Y軸方向的拾取頭的Y驅動部23,以及使夾頭22昇降、旋轉及X軸方向移動的未圖示的各驅動部。拾取頭21是具有將被頂起的晶粒D吸引保持於前端的夾頭22(圖2也參照),從晶粒供給部1拾取晶粒D,載置於中間平台31。拾取頭21是具有使夾頭22昇降、旋轉及X軸方向移動的未圖示的各驅動部。The pick-up unit 2 has: a pick-
中間平台部3是具有:暫時性地載置晶粒D的中間平台31,及用以識別中間平台31上的晶粒D的平台識別攝影機32。The intermediate platform 3 has an
接合部4是從中間平台31拾取晶粒D,接合於被搬送來的基板S的封裝區域P上,或以層疊於已經被接合於基板S的封裝區域P上的晶粒上的形式來接合。接合部4是具有:具備與拾取頭21同樣地將晶粒D吸附保持於前端的夾頭42(圖3也參照)的接合頭41,及使接合頭41移動於Y軸方向的Y驅動部43,以及攝取基板S的封裝區域P的位置識別標記(未圖示),識別接合位置的基板識別攝影機44。藉由如此的構成,接合頭41是根據平台識別攝影機32的攝像資料來修正拾取位置・姿勢,從中間平台31拾取晶粒D,根據基板識別攝影機44的攝像資料來將晶粒D接合於基板。The bonding
搬送部5是具有:抓住基板S搬送的基板搬送爪51,及基板S移動的搬送道52。基板S是以沿著搬送道52而設的未圖示的滾珠螺桿來驅動被設在搬送道52的基板搬送爪51的未圖示的螺帽,藉此移動。基板搬送爪51是亦可藉由傳動帶來驅動。藉由如此的構成,基板S是從基板供給部6沿著搬送道52來移動至接合位置,接合後,移動至基板搬出部7,將基板S交給基板搬出部7。The
控制部8是具備:儲存監視控制黏晶機10的上述的各部的動作的程式(軟體)的記憶體,及實行被儲存於記憶體的程式的中央處理裝置(CPU)。The control unit 8 is a memory that stores a program (software) that monitors and controls the operations of the above-mentioned components of the
其次,利用圖3、4來說明有關晶粒供給部1的構成。圖3是表示圖1的晶粒供給部的外觀立體圖的圖。圖4是表示圖1的晶粒供給部的主要部的概略剖面圖。Next, the structure of the crystal
晶粒供給部1是具備:移動於水平方向(XY軸方向)的晶圓保持台12,及移動於上下方向的剝離單元13。晶圓保持台12是具有:保持晶圓環14的擴張環15,及將被保持於晶圓環14且接著複數的晶粒D的切割膠帶16定位於水平的支撐環17。剝離單元13是被配置於支撐環17的內側。The die
晶粒供給部1是在晶粒D的剝離時,使保持晶圓環14的擴張環15下降。其結果,被保持於晶圓環14的切割膠帶16會被拉伸,晶粒D的間隔會擴大,藉由剝離單元13從晶粒D下方作用於晶粒D,使晶粒D的拾取性提升。另外,將晶粒接著於基板的接著劑是由液狀成為薄膜狀,在晶圓11與切割膠帶16之間貼附被稱為晶粒附接膜(Die Attach Film:DAF)18的薄膜狀的接著材料。就具有晶粒附接膜18的晶圓11而言,切割是對於晶圓11與晶粒附接膜18進行。因此,在剝離工程中,從切割膠帶16剝離晶圓11與晶粒附接膜18。另外,晶粒附接膜18是被貼附於晶粒D的背面,但有省略晶粒D來說明剝離工程的情形。The die
其次,利用圖5~7來說明有關剝離單元13及被安裝於拾取頭21的夾頭22。圖5是說明圖4的剝離單元的圖,圖5(a)是上面圖,圖5(b)是圖5(a)的B-B線的可動平台的剖面圖。圖6是說明圖4的剝離單元的構成及動作的圖,圖6(a)是圖5(a)的B-B線的主要部、切割膠帶、晶粒及夾頭的剖面圖,圖6(b)是圖5(a)的C-C線的主要部、切割膠帶、晶粒及夾頭的剖面圖,圖6(c)是從圖6(a)可動平台移動的狀態的主要部、切割膠帶、晶粒及夾頭的剖面圖。圖7是說明圖2的夾頭的圖,圖7(a)是夾頭及夾頭夾具的B方向的側面圖,圖7(b)是夾頭及夾頭夾具的C方向的側面圖。Next, the
剝離單元13的框體131是圓筒形狀,具備位於上面的中央的作為開口部的溝部132a及其周邊的固定平台132以及溝部132a內的可動平台133。溝部132a的平面視的形狀是被構成X軸方向比Y軸方向更長的矩形狀。可動平台133是平面形狀比溝部132a更小,被構成X軸方向比Y軸方向更長的矩形狀。可動平台133是可移動於上下方向(Z軸方向)及水平方向的作為第一方向的X軸方向。The
在剝離單元13的上面的周邊部所設的固定平台132是設有複數的吸引口(未圖示)。另外,亦可設置連結該複數的吸引口的複數的溝。該吸引口及該溝的各者的內部是使剝離單元13上昇而使其上面接觸於切割膠帶16的背面時,藉由未圖示的吸引機構來減壓。此時,切割膠帶16的背面會被吸引至下方,與剝離單元13的上面緊貼。固定平台132是緊貼拾取對象的晶粒D的外側周邊的切割膠帶16。另外,可動平台133的下方的吸引口141的吸引機構與固定平台132的吸引機構是亦可為獨立,個別地進行吸附的ON/OFF。剝離單元13是具備:根據來自控制部8的指令,使可動平台133滑動的未圖示的滑塊驅動機構。The fixed
其次,說明有關剝離單元13與可動平台133的詳細。在剝離單元13的框體131的上面是具備:固定平台132,及從固定平台132朝向剝離單元13的框體131的內部凹陷的溝部132a,以及被設在溝部132a的剝離單元13的外周側,比溝部132a的底面更突出的凸部132b。溝部132a的側面132f是與位於凸部132b的兩側的引導面132g同一面,從剝離單元13的內周側朝向外周側而直線狀地延伸。凸部132b是位於引導面132g之間平坦地持有表面的階差,其高度是比溝部132a的深度更小。溝部132a的底面與凸部132b的表面是以從凸部132b的底面朝向凸部132b的表面延伸的傾斜面132c來連接。在溝部132a的底面是設有作為連通至剝離單元13的內部的孔的吸引口141。Next, the details of the peeling
在溝部132a是安裝有:與溝部132a及側面132f的面間的寬度大致同一寬度,從溝部132a沿著溝部132a的方向而滑動的可動平台133。可動平台133是沿著滑動方向(X軸方向)來朝向溝部132a的端面132e的側為後端133a,凸部132b側的端為前端133c。可動平台133是具備:凹面狀,在其上經由切割膠帶16來搭載晶粒D的搭載部133h,及接著搭載部133h,從搭載面朝向下方向而傾斜的傾斜部133g。可動平台133的滑動方向的長度是比溝部132a的滑動方向的長度更短,可動平台133的搭載部133h的厚度是比溝部132a的深度更大,因此若可動平台133的後端133a與溝部132a的端面132e隔著間隙,可動平台133嵌入溝部132a,則可動平台133的表面的搭載部133h是比固定平台132的上面高。可動平台133的側面133b及溝部132a的側面132f是構成滑動面。又,以可動平台133的後端133a及溝部132a的端面132e所形成的間隙是朝向剝離單元13的內面來延伸於上下方向而構成吸引切割膠帶16的縱溝。又,以可動平台133的兩側的側面133b及溝部132a的兩側的側面132f所形成的間隙是朝向剝離單元13的內面來延伸於上下方向而構成吸引切割膠帶16的縱溝。The
由於被構成為以上般,因此在剝離單元13的上面是形成有藉由溝部132a的側面132f、端面132e及引導面132g所包圍的コ的字形的吸引開口140,經由吸引口141來與剝離單元13的內部連通。Since it is configured as described above, the upper surface of the peeling
如圖5(b)所示般,可動平台133的經由切割膠帶16來搭載晶粒D的搭載部133h是厚度會隨著從後端133a側的附近位置朝向前端133c側而變薄,在後端133a是設有倒角133i。又,設有:越從搭載部133h朝向前端133c,越從表面(上面)側朝向背面(下面)側傾斜的傾斜部133g。搭載部133h之中從後端133a側往前端133c側朝向下方傾斜的部分,比傾斜部133g更傾斜緩和的傾斜部133g的前端133c側是被設於晶粒D不載於上面的區域,搭載部133h的長度是比晶粒D的長度更短。可動平台133的背面側是成為平面。如圖6(b)所示般,在來自X軸方向的剖面視(與X軸方向正交的YZ面)中Y軸方向比Z軸方向更長的矩形狀的上邊會以向下凹的曲線所形成。亦即,搭載部133h的表面是如圓管的內側表面(R形狀面)般形成向上凹的曲面。藉此,使晶粒D彎曲。另外,利用此彎曲之晶粒D所產生的彎曲是在與剝離單元13接觸前的狀態中與在切割膠帶16上翹曲的晶粒同程度。例如,從彎曲的晶粒D的谷的底到晶粒D的端部的高度是超過0μm,20μm以下。As shown in FIG. 5(b), the thickness of the mounting
又,溝部132a的寬度,亦即吸引開口140的寬度是比可動平台133的寬度大若干,可動平台133的寬度與晶粒D的寬度是分別大略相同,溝部132a的各側面132f與可動平台133的各側面133b是以能夠滑動的方式隔著間隙而對向。In addition, the width of the
如圖7所示般,夾頭22是被安裝於被設在拾取頭21的夾頭夾具25。如圖6(a)及圖7(a)所示般,夾頭22是來自作為第二方向的Y軸方向的側面視及剖面視,X軸方向(滑動方向)比Z軸方向(上下方向)更長的矩形狀,如圖6(b)及圖7(b)所示般,在來自X軸方向的側面視及剖面視(與X軸方向正交的YZ面的剖面視)中Y軸方向比Z軸方向更長的矩形狀的下邊會以向下凸的曲線所形成。亦即,夾頭22的吸附晶粒D的吸附面22a是形成如圓柱的外側表面(R形狀面)般的凸的曲面。亦即,夾頭22的吸附面22a是以凸的曲面所形成,而使能夾著晶粒D及切割膠帶16來與可動平台133的搭載部133h的凹的曲面嵌合。藉此,晶粒D的彎曲會被維持。As shown in FIG. 7, the
其次,利用圖3、4、6來說明有關利用根據上述構成的剝離單元13之拾取動作。Next, referring to Figs. 3, 4, and 6, a description will be given of a pick-up operation using the
首先,將紫外線照射至被定位於圖3及圖4所示的晶圓保持台12的切割膠帶16。藉此,被塗佈於切割膠帶16的黏著劑會硬化而其黏著性降低,因此切割膠帶16與晶粒附接膜18的界面會容易剝離。First, ultraviolet rays are irradiated to the dicing
其次,控制部8是藉由使晶圓保持台12的擴張環15下降,將被接著於切割膠帶16的周邊部的晶圓環14壓低至下方。如此一來,切割膠帶16會接受從其中心部朝向周邊部的強的張力而無鬆弛地拉伸於水平方向。Next, the control unit 8 lowers the
其次,如圖4所示般,控制部8是以拾取對象的晶粒D會位於剝離單元13的正上方之方式水平移動(間距移動)晶圓保持台12,以剝離單元13的上面會接觸於切割膠帶16的背面之方式將剝離單元13移動至上面。此時,如圖6(a)所示般,可動平台133的後端133a是成為隔著間隙來對向於溝部132a的端面132e之位置,可動平台133的前端133c側的下面是載於溝部132a的表面,藉由溝部132a來支撐。又,如圖6(a)(b)所示般,可動平台133的表面的搭載部133h是比固定平台132的上面高。Secondly, as shown in FIG. 4, the control unit 8 moves the wafer holding table 12 horizontally (pitch movement) so that the die D to be picked up will be directly above the peeling
一旦剝離單元13的固定平台132與可動平台133的搭載部133h的上面 被緊貼於切割膠帶16的下面,則控制部8停止剝離單元13的上昇。此時,控制部8是藉由固定平台132的吸引口及溝、以及固定平台132與可動平台133之間的間隙來吸附切割膠帶16。此時,如圖6(b)所示般,晶粒D及切割膠帶16是彎曲成仿效可動平台133的搭載部133h的上面的凹的曲面之形狀。Once the upper surfaces of the fixed
控制部8是使拾取頭21(夾頭22)下降,定位於拾取的晶粒D上,將夾頭22著陸而藉由夾頭22的吸引孔(未圖示)來吸附晶粒D。此時,夾頭22的下面的凸的曲面是經由晶粒D及切割膠帶16來與可動平台133的搭載部133h的上面的凹的曲面嵌合,晶粒D的彎曲被維持。The control unit 8 lowers the pickup head 21 (chuck 22), positions it on the picked die D, and lands the
控制部8是停止利用固定平台132及吸引口141之切割膠帶16的吸附(吸附OFF),使可動平台133滑動。另外,吸附OFF是亦可以接近大氣壓的壓力來微弱吸附。The control part 8 stops the suction (suction OFF) of the dicing
一旦可動平台133朝向剝離單元13的外周側開始滑動,則可動平台133的背面會接觸於連接凸部132b與溝部132a的底面的傾斜面132c。然後,若進一步可動平台133滑動,則可動平台133的背面沿著傾斜面132c而上昇。然後,若進一步可動平台133滑動,則可動平台133的前端133c越過傾斜面132c,可動平台133的背面接觸於凸部132b的表面。之後,控制部8是藉由固定平台132及吸引口141來以接近真空的壓力開始吸附(吸附ON)。由於可動平台133的下面是被支撐於圖6(c)所示的凸部132b的表面,因此可動平台133的下面是從溝部132a的底面分離。在此之前,可動平台133是在可動平台133的背面成為與溝部132a的表面大致平行的狀態下滑動。藉此,如圖6(c)所示般,位於吸引口141的上方的晶粒D的一部分會從切割膠帶16的表面16a剝離。Once the
一旦使可動平台133滑動,則晶粒D是幾乎從切割膠帶16剝離,因此控制部8是使夾頭22上昇而拾取晶粒D。一旦拾取晶粒D,則控制部8是使可動平台133回到初期位置,使吸引口141的壓力、固定平台132的吸附壓力回到大氣壓而結束拾取動作。Once the
其次,利用圖8來說明有關使用實施例的黏晶機之半導體裝置的製造方法。圖8是表示利用圖1的黏晶機之半導體裝置的製造方法的流程圖。Next, FIG. 8 is used to explain the manufacturing method of the semiconductor device using the die bonder of the embodiment. FIG. 8 is a flowchart showing a method of manufacturing a semiconductor device using the die bonder of FIG. 1.
(步驟S11:晶圓・基板搬入工程)
將保持切割膠帶16的晶圓環14儲存於晶圓盒(未圖示),搬入至黏晶機10,該切割膠帶16是貼附有從晶圓11分割的晶粒D。控制部8是從充填有晶圓環14的晶圓盒供給晶圓環14至晶粒供給部1。並且,準備基板S,搬入至黏晶機10。控制部8是在基板供給部6將基板S安裝於基板搬送爪51。
(Step S11: Wafer and substrate import process)
The
(步驟S12:拾取工程)
控制部8是如上述般剝離晶粒D,從晶圓11拾取剝離的晶粒D。如此一來,與晶粒附接膜18一起從切割膠帶16剝離的晶粒D是被吸附、保持於夾頭22而搬送至其次工程(步驟S13)。然後,一旦將晶粒D搬送至其次工程的夾頭22回到晶粒供給部1,則按照上述的程序,從切割膠帶16剝離其次的晶粒D,以後按照同樣的程序,從切割膠帶16,1個1個剝離晶粒D。
(Step S12: Pick up the project)
The control unit 8 peels the die D as described above, and picks up the peeled die D from the
(步驟S13:接合工程)
控制部8是將拾取的晶粒搭載於基板S上或層疊於已接合的晶粒上。控制部8是將從晶圓11拾取的晶粒D載置於中間平台31,以接合頭41來從中間平台31再度拾取晶粒D,接合於被搬送來的基板S。
(Step S13: Joining process)
The control unit 8 mounts the picked-up die on the substrate S or stacks it on the bonded die. The control unit 8 places the die D picked up from the
(步驟S14:基板搬出工程)
控制部8是以基板搬出部7來從基板搬送爪51取出接合有晶粒D的基板S。從黏晶機10搬出基板S。
(Step S14: Board unloading process)
The control unit 8 is the
如上述般,晶粒D是經由晶粒附接膜18來安裝於基板S上,從黏晶機搬出。然後,在打線接合工程,經由Au線來與基板S的電極電性連接。接著,安裝有晶粒D的基板S會被搬入至黏晶機,第2晶粒D會經由晶粒附接膜18來層疊於被安裝在基板S上的晶粒D上,從黏晶機搬出之後,在打線接合工程,經由Au線來與基板S的電極電性連接。第2晶粒D是以前述的方法來從切割膠帶16剝離之後,被搬送至黏晶工程來層疊於晶粒D上。上述工程重複預定次數之後,將基板S搬送至模製工程,以模製樹脂(未圖示)來密封複數個的晶粒D及Au線,藉此完成層疊封裝。As described above, the die D is mounted on the substrate S via the die attach
若根據實施例,則由於在滑動的可動平台設置R(凹)形狀而使晶粒彎曲,因此可提高晶粒的剖面2次力矩,剛性提升,可對應於伴隨剝離的應力。就容易理解的比喻而言,若將薄的紙例如A4大小的複印用紙設為水平,以手指來捏住薄紙的端,則藉由薄紙的自重,與捏住的端相反側的端會垂至下方。另一方面,若使薄紙彎曲(變形)成為上面會形成凹陷,以手指來捏住端,則與捏住的端相反側的端不會垂至下方,薄紙維持形狀。According to the embodiment, since the R (concave) shape is provided on the sliding movable platform, the crystal grains are bent. Therefore, the cross-sectional secondary moment of the crystal grains can be increased, the rigidity can be improved, and it can respond to the stress accompanying peeling. For an easy-to-understand analogy, if thin paper such as A4 size copy paper is set horizontally and the end of the thin paper is pinched with your fingers, the weight of the thin paper will cause the end opposite to the pinched end to hang down. To the bottom. On the other hand, if the thin paper is bent (deformed) to form a depression on the upper surface, and the end is pinched with fingers, the end on the opposite side to the pinched end does not hang down, and the thin paper maintains its shape.
如上述般,將在基板上立體地安裝複數個的晶粒的層疊封裝予以組合時,為了防止封裝厚的增加,被要求將晶粒的厚度薄至30μm以下。另外,晶粒的厚度是比晶粒附接膜的厚度更厚。另一方面,切割膠帶的厚度是100μm程度,所以切割膠帶的厚度是形成晶粒的厚度的3~5倍。As described above, when combining a stack package in which a plurality of dies are three-dimensionally mounted on a substrate, in order to prevent an increase in package thickness, it is required to reduce the thickness of the die to 30 μm or less. In addition, the thickness of the die is thicker than the thickness of the die attach film. On the other hand, the thickness of the dicing tape is about 100 μm, so the thickness of the dicing tape is 3 to 5 times the thickness of the formed die.
若欲使如此薄的晶粒從切割膠帶剝離,則追隨切割膠帶的變形之晶粒的變形會更容易顯著地發生,但在本實施例的黏晶機是可減低從切割膠帶拾取晶粒時的晶粒的變形。藉此,可使厚度為30μm以下的晶粒(稱為薄晶粒)之從切割膠帶的剝離安定化。藉此,可改善包含3D NAND(三次元構造的NAND型快閃記憶體)的薄晶粒的品質及生產性。If such a thin die is to be peeled from the dicing tape, the deformation of the die following the deformation of the dicing tape will be more likely to occur significantly. However, the die bonder of this embodiment can reduce the pick-up of the die from the dicing tape. Deformation of the grains. Thereby, the peeling of crystal grains (referred to as thin crystal grains) having a thickness of 30 μm or less from the dicing tape can be stabilized. As a result, the quality and productivity of thin dies including 3D NAND (NAND flash memory with three-dimensional structure) can be improved.
<變形例> 以下,舉幾個例子表示實施例的代表性的變形例。在以下的變形例的說明中,對於具有與在上述的實施例說明者同樣的構成及機能的部分是可使用與上述的實施例同樣的符號。而且,有關如此的部分的說明是在技術上不矛盾的範圍內,可適當援用上述的實施例的說明。又,上述的實施例的一部分及複數的變形例的全部或一部分可在技術上不矛盾的範圍內適當複合地適用。 <Modifications> Hereinafter, a few examples are given to show representative modifications of the embodiment. In the description of the following modification examples, parts having the same configuration and functions as those described in the above-mentioned embodiment may use the same reference numerals as in the above-mentioned embodiment. In addition, the description of such a part is within a range that is not technically contradictory, and the description of the above-mentioned embodiment can be appropriately used. In addition, part of the above-mentioned embodiment and all or part of the plural modified examples can be appropriately combined and applied within a range that is not technically contradictory.
(第一變形例) 其次,利用圖9~11來說明有關第一變形例的剝離單元的構成。圖9是第一變形例的剝離單元的上面圖。圖10是說明圖9的剝離單元的構成與動作的圖,圖10(a)是圖9的E-E線的剝離單元的剖面圖,圖10(b)是圖9的F-F線的剝離單元的剖面圖。圖11是說明圖9的剝離單元的構成與動作的圖,圖11(a)是圖9的E-E線的剝離單元與夾頭的剖面圖,圖11(b)是圖9的F-F線的剝離單元與夾頭的剖面圖。 (First modification) Next, the structure of the peeling unit related to the first modified example will be described using FIGS. 9 to 11. Fig. 9 is a top view of a peeling unit according to a first modification. 10 is a diagram illustrating the structure and operation of the peeling unit in FIG. 9, FIG. 10(a) is a cross-sectional view of the peeling unit along the EE line of FIG. 9, and FIG. 10(b) is a cross-sectional view of the peeling unit along the FF line in FIG. 9 Figure. Fig. 11 is a diagram illustrating the structure and operation of the peeling unit of Fig. 9, Fig. 11(a) is a cross-sectional view of the peeling unit and the chuck along the EE line of Fig. 9, and Fig. 11(b) is the peeling of the FF line of Fig. 9 Sectional view of the unit and the chuck.
如圖9所示般,剝離單元13的框體131是圓筒形狀,具備:位於上面的中央的開口部132o及其周邊的固定平台132以及開口部132o內的可動平台133。在開口部132o是設有上下動的可動平台133,在固定平台132是設有複數的吸引口(未圖示)及複數的溝(未圖示)。吸引口及溝的各者的內部是使剝離單元13上昇而使其上面接觸於切割膠帶16的背面時,藉由未圖示的吸引機構來減壓,而使切割膠帶16的背面會緊貼於固定平台132的上面。As shown in FIG. 9, the
可動平台133是以將切割膠帶16頂起至上方的四個的區塊102a~102d所構成。四個的區塊102a~102d是在最外側的環狀的區塊102a的內側配置環狀的區塊102b,更在其內側配置環狀的區塊102c,更在其內側配置柱狀的區塊102d。The
在固定平台132與外側的區塊102a之間、及四個的區塊102a~102d之間是設有間隙G。該等的間隙G的內部是可藉由未圖示的吸引機構來減壓,一旦切割膠帶16的背面接觸於剝離單元13的上面,則切割膠帶16會被吸引至下方,緊貼於區塊102a~102d的上面。A gap G is provided between the
區塊102a的平面視的形狀是與成為剝離的對象的晶粒D相同的長方形,其大小是比晶粒D的大小更稍微小。被配置於區塊102a的內側的平面視框狀的區塊102b的大小是比區塊102a的大小更小1mm~3mm程度。又,被配置於區塊102b的內側的區塊102c的大小是比區塊102b更小1mm~3mm程度。又,被配置於區塊102c的內側的區塊102d的大小是比區塊102c更小1mm~3mm程度小。另外,區塊102d的寬度是比區塊102a~102c的任一各的寬度(外側的邊與內側的邊之間的長度)更大。在本實施例中,考慮加工的容易度等,將區塊102a~102d的形狀形成長方形,但並非被限定於此,例如亦可形成橢圓形。The shape of the
如圖10所示般,上述的四個的區塊102a~102d的各者的上面的高度是在初期狀態中彼此相異,區塊102a的頂起量是比區塊102b的頂起量大,區塊102b的頂起量是比區塊102c的頂起量更大,區塊102c的頂起量是比區塊102d的頂起量更大,內側的區塊是比外側低0~20μm程度。亦即,以被吸附於可動平台133的表面的晶粒D及切割膠帶會如球狀面(SR形狀面)般形成向上凹的曲面之方式設定區塊102a~102d的高度。藉此,晶粒D會彎曲。另外,利用此彎曲之晶粒D所產生的彎曲是在與剝離單元13接觸前的狀態中與在切割膠帶16上翹曲的晶粒同程度。並且,區塊102a是比剝離單元13的上面周邊部(固定平台132)的高度更稍微低。As shown in FIG. 10, the height of the upper surface of each of the above-mentioned four
區塊102a~102d的各者是獨立,可上下移動,移動量也可藉由控制部8來變更。Each of the
圖12是說明圖11的夾頭的圖,圖12(a)是夾頭及夾頭夾具的E方向的側面圖,圖12(b)是夾頭及夾頭夾具的F方向的側面圖。Fig. 12 is a diagram illustrating the chuck of Fig. 11, Fig. 12(a) is a side view of the chuck and the chuck jig in the E direction, and Fig. 12(b) is a side view of the chuck and the chuck jig in the F direction.
如圖12所示般,夾頭22是被安裝於被設在拾取頭21的夾頭夾具25。如圖12(a)所示般,夾頭22是在來自Y軸方向的側面視及剖面視(XZ面的剖面視)中X軸方向比Z軸方向(上下方向)更長的矩形狀的下邊會以向下凸的曲線所形成,如圖12(b)所示般,在來自X軸方向的側面視及剖面視(與X軸方向交叉的面,例如正交的YZ面的剖面視)中Y軸方向比Z軸方向更長的矩形狀的下邊會以向下凸的曲線所形成。亦即,夾頭22的吸附晶粒D的吸附面22a是形成球狀面(SR形狀面)。亦即,夾頭22的吸附面22a是以凸的曲面所形成,而使能與被形成於可動平台133的區塊102a~102d的晶粒D及切割膠帶16的凹的曲面嵌合。藉此,晶粒D的彎曲會被維持。As shown in FIG. 12, the
其次,利用圖3、4、10來說明有關利用根據上述構成的剝離單元13之拾取動作。Next, referring to Figs. 3, 4, and 10, a description will be given of a pick-up operation using the
首先,與實施例同樣地將紫外線照射至被定位於圖3及圖4所示的晶圓保持台12的切割膠帶16。藉此,被塗佈於切割膠帶16的黏著劑會硬化而其黏著性降低,因此切割膠帶16與晶粒附接膜18的界面會容易剝離。First, the dicing
其次,與實施例同樣,藉由使晶圓保持台12的擴張環15下降,將被接著於切割膠帶16的周邊部的晶圓環14壓低至下方。如此一來,切割膠帶16會接受從其中心部朝向周邊部的強的張力而無鬆弛地拉伸於水平方向。Next, as in the embodiment, by lowering the
其次,如圖4所示般,以剝離單元13的中心部(區塊102a~102d)會位於成為剝離的對象的一個的晶粒D(位於同圖的中央部的晶粒D)的正下面之方式使晶圓保持台12移動,且使夾頭22移動至此晶粒D的上方。在被支撐於拾取頭21的夾頭22的底面是設有內部會被減壓的吸附口(未圖示),可選擇性地只吸附、保持成為剝離的對象的一個的晶粒D。Next, as shown in FIG. 4, the center of the peeling unit 13 (
其次,如圖10所示般,將區塊102a、區塊102b、區塊102c及區塊102d的上面設為不同的高度,形成比固定平台132的上面稍微降低的狀態(上述的初期狀態),使剝離單元13上昇而使其上面接觸於切割膠帶16的背面,且將前述的固定平台132的吸引口、溝及間隙G的內部減壓。藉此,與成為剝離的對象的晶粒D鄰接的其他的晶粒D的下方的切割膠帶16會被緊貼於固定平台132,且成為剝離的對象的晶粒D的下方的切割膠帶16會緊貼於區塊102a~102d的上面,在晶粒D及切割膠帶16形成凹的曲面。另一方面,與剝離單元13的上昇幾乎同時使夾頭22下降,使其底面接觸於成為剝離的對象的晶粒D的上面,藉此吸附晶粒D且輕壓至下方。Next, as shown in FIG. 10, the upper surfaces of the
其次,如圖11所示般,仍舊維持四個的區塊102a、區塊102b、區塊102c及區塊102d的彼此的位置關係,同時頂起至上方而將荷重施加於切割膠帶16的背面,與切割膠帶16一起頂起晶粒D而將周邊剝離。Secondly, as shown in FIG. 11, the positional relationship of the four
其次,若將被配置於最外側的區塊102a拉下至下方,則晶粒附接膜18與切割膠帶16的剝離會開始。此時,將與成為剝離的對象的晶粒D鄰接的其他的晶粒D的下方的切割膠帶16吸引至下方,使緊貼於固定平台132,藉此可防止其他的晶粒D的剝離。將區塊102a拉下至下方時,為了使晶粒D的剝離促進,將區塊102a、區塊102b、區塊102c及區塊102d的間隙G的內部減壓,藉此將晶粒D的下方的切割膠帶16吸引至下方。並且,將固定平台132的溝的內部減壓,使接觸於固定平台132的切割膠帶16緊貼於固定平台132的上面。Secondly, if the
其次,若將配置於離最外側第二個的區塊102b拉下至下方,則晶粒附接膜18與切割膠帶16的剝離會朝晶粒D的中心方向進展。此時,區塊102a的上面是位於比固定平台132的上面更低,但區塊102b的上面是位於比固定平台132的上面更高。Secondly, if the
其次,若將配置於離最外側第三個的區塊102c拉下至下方,則晶粒附接膜18與切割膠帶16的剝離會更往晶粒D的中心方向進展。此時,區塊102a、區塊102b及區塊102c的上面是位於比固定平台132的上面更低。Secondly, if the
然後,將區塊102d拉下至下方,且將夾頭22拉上至上方,藉此晶粒附接膜18會從切割膠帶16完全地剝離。Then, the
若根據第一變形例,則由於藉由構成可動平台的複數的區塊來設置凹部形狀而使晶粒彎曲,因此與實施例同樣地可提高晶粒的剖面2次力矩,剛性提升,可對應於伴隨剝離的應力。According to the first modification example, since the shape of the concave portion is provided by the plural blocks constituting the movable platform, the crystal grains are bent. Therefore, the second moment of the cross section of the crystal grains can be increased similarly to the embodiment, and the rigidity can be improved. For the stress accompanying peeling.
(第二變形例)
第一變形例是由圖10(b)所示的狀態,從外側的區塊依次拉下,但亦可從內側的區塊依序頂起而將晶粒D從切割膠帶16剝離。亦即,首先,將區塊102d比區塊102a更高頂起。其次,將區塊102c比區塊102a更高,比區塊102d更低頂起。其次,將區塊102b比區塊102a更高,比區塊102c更低頂起。其次,將區塊102a比區塊102b更低頂起。
(Second modification)
In the first modification, the state shown in FIG. 10( b) is pulled down sequentially from the outer block, but the die D may be peeled off from the dicing
以上,根據實施例及變形例來具體說明本發明者們所研發的發明,但本發明是不被限定於上述實施例及變形例,當然可實施各種變更。In the above, the invention developed by the inventors has been specifically described based on the embodiment and the modification. However, the present invention is not limited to the above-mentioned embodiment and the modification. Of course, various modifications can be implemented.
例如,實施例是說明在可動平台的前方設置用以剝離的凸部(階差)的例子,但亦可不設凸部(階差),水平移動可動平台,或可動平台是亦可為水平移動,且上下移動。For example, the embodiment illustrates an example in which a convex portion (step difference) for peeling is provided in front of the movable platform, but the convex portion (step difference) may not be provided, and the movable platform can be moved horizontally, or the movable platform can also be moved horizontally. , And move up and down.
又,變形例是說明可動平台以四個的區塊所構成的例子,但亦可為未滿四個或五個以上的區塊。In addition, the modified example is an example in which the movable platform is composed of four blocks, but it may be less than four or more than five blocks.
又,亦可平行地排列七個的長方形的區塊來構成區塊102a~102d,中央的1個的區塊構成內側的區塊102d,其兩側的3個的區塊構成中間的區塊102a~102c,最外側的2個的區塊構成外側的區塊102a。此情況,夾頭22是與實施例同樣地矩形狀,長的矩形狀的下邊會以向下凸的曲線所形成,夾頭22的吸附晶粒D的吸附面22a是亦可形成圓柱的外側表面(R形狀面)般的凸的曲面。In addition, seven rectangular blocks can be arranged in parallel to form
又,實施例是說明使用晶粒附接膜的例子,但亦可設置在基板塗佈接著劑的預製(preform)部,而不使用晶粒附接膜。In addition, the embodiment is an example of using a die attach film, but it can also be provided in a preform part where the substrate is coated with an adhesive instead of using the die attach film.
又,實施例是說明有關以拾取頭來從晶粒供給部拾取晶粒而載置於中間平台,以接合頭來將被載置於中間平台的晶粒接合於基板的黏晶機,但並非被限定於此,可適用於從晶粒供給部拾取晶粒的半導體製造裝置。例如,無中間平台與拾取頭,以接合頭來將晶粒供給部的晶粒接合於基板的黏晶機也可適用。In addition, the embodiment describes a die bonder that uses a pickup head to pick up die from the die supply part and place it on the intermediate platform, and uses a bonding head to bond the die placed on the intermediate platform to the substrate, but it is not Limited to this, it can be applied to a semiconductor manufacturing apparatus that picks up a die from a die supply part. For example, a die bonder that does not have an intermediate platform and a pick-up head, and uses a bonding head to bond the die of the die supply part to the substrate is also applicable.
8:控制部 10:黏晶機(黏晶裝置) 13:剝離單元 132:固定平台 133:可動平台 16:切割膠帶 22:夾頭 D:晶粒8: Control Department 10: Chip bonding machine (bonding device) 13: Stripping unit 132: Fixed platform 133: movable platform 16: cutting tape 22: Chuck D: Die
[圖1]是由上來看實施例的黏晶機的概念圖。 [圖2]是說明圖1的拾取頭及接合頭的動作的圖。 [圖3]是表示圖1的晶粒供給部的外觀立體圖的圖。 [圖4]是表示圖1的晶粒供給部的主要部的概略剖面圖。 [圖5]是說明圖4的剝離單元的圖。 [圖6]是說明圖4的剝離單元的構成及動作的圖。 [圖7]是說明圖2的夾頭的圖。 [圖8]是表示利用圖1的黏晶機之半導體裝置的製造方法的流程圖。 [圖9]是第一變形例的剝離單元的上面圖。 [圖10]是說明圖9的剝離單元的構成與動作的圖。 [圖11]是說明圖9的剝離單元的構成與動作的圖。 [圖12]是說明圖11的夾頭的圖。 [Fig. 1] is a conceptual diagram of the die bonder of the embodiment viewed from above. [Fig. 2] A diagram for explaining the operation of the pickup head and the bonding head of Fig. 1. [Fig. [Fig. 3] Fig. 3 is a diagram showing an external perspective view of the crystal grain supply part of Fig. 1. [Fig. 4] is a schematic cross-sectional view showing the main part of the crystal grain supply part of Fig. 1. [Fig. [Fig. 5] is a diagram illustrating the peeling unit of Fig. 4. [Fig. [Fig. 6] is a diagram illustrating the configuration and operation of the peeling unit in Fig. 4. [Fig. 7] is a diagram illustrating the chuck of Fig. 2. [Fig. 8] is a flowchart showing a method of manufacturing a semiconductor device using the die bonder of Fig. 1. [Fig. [Fig. 9] is a top view of the peeling unit of the first modification. Fig. 10 is a diagram illustrating the configuration and operation of the peeling unit in Fig. 9. [Fig. 11] is a diagram illustrating the configuration and operation of the peeling unit in Fig. 9. [Fig. 12] is a diagram illustrating the chuck of Fig. 11. [Fig.
16:切割膠帶 16: cutting tape
22:夾頭 22: Chuck
131:框體 131: Frame
132a:溝部 132a: Groove
132b:凸部 132b: convex
132c:傾斜面 132c: Inclined surface
132f:側面 132f: side
132g:引導面 132g: guide surface
133:可動平台 133: movable platform
141:吸引口 141: Attraction
D:晶粒 D: Die
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050081986A1 (en) * | 2003-10-15 | 2005-04-21 | Heung-Kyu Kwon | Die bonding apparatus and method for bonding semiconductor chip using the same |
US20100055878A1 (en) * | 2006-05-23 | 2010-03-04 | Renesas Technology Corp. | Fabrication Method of Semiconductor Device |
US20150348882A1 (en) * | 2014-06-02 | 2015-12-03 | Infineon Technologies Ag | Three-dimensional stack of leaded package and electronic member |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4226489B2 (en) * | 2004-02-25 | 2009-02-18 | 日東電工株式会社 | Chip pickup method |
JP2005322815A (en) | 2004-05-11 | 2005-11-17 | Matsushita Electric Ind Co Ltd | Manufacturing apparatus and manufacturing method of semiconductor apparatus |
JP4664150B2 (en) * | 2005-08-05 | 2011-04-06 | ルネサスエレクトロニクス株式会社 | Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
JP5160135B2 (en) | 2007-04-18 | 2013-03-13 | キヤノンマシナリー株式会社 | Semiconductor device manufacturing apparatus and manufacturing method |
JP4397429B1 (en) | 2009-03-05 | 2010-01-13 | 株式会社新川 | Semiconductor die pickup apparatus and pickup method |
JP5284144B2 (en) | 2009-03-11 | 2013-09-11 | 芝浦メカトロニクス株式会社 | Semiconductor chip pickup device and pickup method |
KR101562021B1 (en) * | 2009-08-11 | 2015-10-20 | 삼성전자주식회사 | Semiconductor chip attaching apparatus and semiconductor chip attaching method |
JP5813432B2 (en) * | 2011-09-19 | 2015-11-17 | ファスフォードテクノロジ株式会社 | Die bonder and bonding method |
KR101385443B1 (en) | 2013-09-13 | 2014-04-16 | 이향이 | Pick-up transfer collet for semiconductor chip |
JP6349496B2 (en) | 2014-02-24 | 2018-07-04 | 株式会社新川 | Semiconductor die pickup apparatus and pickup method |
JP6018670B2 (en) | 2015-06-15 | 2016-11-02 | 株式会社東芝 | Die bonding apparatus and die bonding method |
CN107251212B (en) * | 2016-01-29 | 2020-08-18 | 业纳光学系统有限公司 | Method and apparatus for removing microchips from a wafer and applying the microchips to a substrate |
JP6621771B2 (en) | 2017-01-25 | 2019-12-18 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
JP6653273B2 (en) * | 2017-01-26 | 2020-02-26 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
JP6941513B2 (en) * | 2017-09-07 | 2021-09-29 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing equipment and manufacturing method of semiconductor equipment |
JP6967411B2 (en) | 2017-09-19 | 2021-11-17 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing equipment, semiconductor equipment manufacturing methods and collets |
-
2019
- 2019-09-17 JP JP2019168865A patent/JP7377654B2/en active Active
-
2020
- 2020-05-12 TW TW109115701A patent/TWI719896B/en active
- 2020-07-02 KR KR1020200081390A patent/KR102430326B1/en active IP Right Grant
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050081986A1 (en) * | 2003-10-15 | 2005-04-21 | Heung-Kyu Kwon | Die bonding apparatus and method for bonding semiconductor chip using the same |
US20100055878A1 (en) * | 2006-05-23 | 2010-03-04 | Renesas Technology Corp. | Fabrication Method of Semiconductor Device |
US20150348882A1 (en) * | 2014-06-02 | 2015-12-03 | Infineon Technologies Ag | Three-dimensional stack of leaded package and electronic member |
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