TWI710834B - Display panel and method of fabricating thereof - Google Patents

Abstract

A display panel including a first substrate, a second substrate, a display medium layer, a color filter element, a surrounding color filter element, a sealant, a spacer, and a surrounding spacer is provided. The display medium layer and the sealant surrounding thereof are located between the first substrate and the second substrate. The color filter element includes a first filter pattern, a second filter pattern, and a third filter pattern. The surrounding color filter element includes at least two of a surrounding first filter pattern, a surrounding second filter pattern, and a surrounding third filter pattern. The spacer is disposed on at least one of the first filter pattern, the second filter pattern, and the third filter pattern. The surrounding spacer is disposed on at least one of the surrounding first filter pattern, the surrounding second filter pattern, and the surrounding third filter pattern.

Description

Display panel and manufacturing method thereof

The present invention relates to a semiconductor and its manufacturing method, and more particularly to a display panel and its manufacturing method.

Generally, in the process of forming a display panel, a sealant is disposed in a non-display area of the display panel to surround the display medium layer with two oppositely disposed substrates to prevent the display medium layer from overflowing. In order to prevent the height of the space filled with the display medium layer from being too small when pressing two oppositely arranged substrates, a spacer with hardness is usually mixed into the sealant. However, since the color filter pattern is provided in the display area (as opposed to the non-display area not provided), the display area and the non-display area of the assembled display panel are prone to height differences. In addition, how to reduce the cost of manufacturing display panels is also an important issue.

The present invention provides a display panel whose display area and non-display area do not have a height difference.

The present invention provides a manufacturing method of a display panel. The display area and the non-display area of the display panel manufactured by the manufacturing method do not have a height difference, and the cost of manufacturing the display panel can be reduced.

The display panel of the present invention has a display area and a non-display area, and includes a first substrate, a second substrate, a display medium layer, a color filter element, a peripheral color filter element, a sealant, at least one spacer, and at least one peripheral gap Things. The second substrate is opposite to the first substrate. The display medium layer is disposed in the display area and between the first substrate and the second substrate. The color filter element is disposed between the first substrate and the second substrate and located in the display area. The color filter element includes at least one first filter pattern, at least one second filter pattern, and at least one third filter pattern. The peripheral color filter element is disposed between the first substrate and the second substrate and is located in the non-display area. The peripheral color filter element includes at least two of at least one first peripheral filter pattern, at least one second peripheral filter pattern, and at least one third peripheral filter pattern. The sealant is disposed between the first substrate and the second substrate. The sealant is located in the non-display area and surrounds the display medium layer. At least one spacer is disposed on at least one of at least one first filter pattern, at least one second filter pattern, and at least one third filter pattern. At least one peripheral spacer is disposed on at least one of the first peripheral filter pattern, the second peripheral filter pattern, and the third peripheral filter pattern. The peripheral color filter element and at least one peripheral spacer are located in the frame glue.

The manufacturing method of the display panel of the present invention includes the following steps. Provide a second substrate. At least one first filter pattern in the display area and at least one first peripheral filter pattern in the non-display area are formed on the second substrate by the photomask. At least one second filter pattern in the display area and at least one second peripheral filter pattern in the non-display area are formed on the second substrate by the same photomask. At least one third filter pattern is formed in the display area. At least one spacer located in the display area and at least one peripheral spacer located in the non-display area are formed. At least one spacer is located on at least one of at least one first filter pattern, at least one second filter pattern, and at least one third filter pattern. At least one peripheral spacer is located on at least one of at least one first peripheral filter pattern and at least one second peripheral filter pattern. The sealant is arranged on the second substrate. The sealant is located in the non-display area and surrounds the display area. At least one first peripheral filter pattern, at least one second peripheral filter pattern, and at least one peripheral spacer are located in the sealant. The second substrate is paired with the first substrate.

Based on the above, the present invention can reduce the manufacturing cost due to the saving of the use of the mask in the process of manufacturing the display panel. In addition, because the present invention arranges the spacers and the peripheral spacers on the filter patterns exposed by the same photomask, the heights of the filter patterns exposed by the same photomask are more consistent, so the spacers can be avoided The top surface of the display panel is not aligned with the top surface of the peripheral spacers, resulting in a non-display area in the subsequent assembly of the display panel and a height difference in the display area.

In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

In order to make the features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings. As those skilled in the art would realize, the described embodiments may be modified in various different ways without departing from the spirit or scope of the present invention.

In the drawings, the thickness of each element and the like are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being “on”, or “connected to,” or “overlapped with, another element,” it may be directly on another element. On or connected to another element, or intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connected" can refer to physical and/or electrical connections.

It should be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers and/or parts, these elements, components, regions, and/or Or part should not be restricted by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Therefore, the “first element,” “component,” “region,” “layer,” or “portion” discussed below may be referred to as a second element, component, region, layer or portion without departing from the teachings herein.

The terminology used here is only for the purpose of describing specific embodiments and is not limiting. As used herein, unless the content clearly indicates otherwise, the singular forms "a", "an" and "the" are intended to include plural forms, including "at least one." "Or" means "and/or". As used herein, the term "and/or" includes any and all combinations of one or more of the related listed items. It should also be understood that when used in this specification, the terms "including" and/or "including" designate the presence of the features, regions, wholes, steps, operations, elements, and/or components, but do not exclude one or more The existence or addition of other features, regions as a whole, steps, operations, elements, components, and/or combinations thereof.

In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship between one element and another element, as shown in the figure. It should be understood that relative terms are intended to include different orientations of the device other than those shown in the figures. For example, if the device in one figure is turned over, elements described as being on the "lower" side of other elements will be oriented on the "upper" side of the other elements. Therefore, the exemplary term "lower" may include an orientation of "lower" and "upper", depending on the specific orientation of the drawing. Similarly, if the device in one figure is turned over, elements described as "below" or "beneath" other elements will be oriented "above" the other elements. Thus, the exemplary terms "below" or "below" can include an orientation of above and below.

As used herein, "about", "substantially", or "approximately" includes the stated value and the average value within the acceptable deviation range of the specific value determined by a person of ordinary skill in the art, taking into account the measurement in question and the The specific amount of measurement-related error (ie, the limitation of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%.

Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of related technologies and the present invention, and will not be interpreted as idealized or excessive The formal meaning, unless explicitly defined as such in this article.

The exemplary embodiments are described herein with reference to cross-sectional views that are schematic diagrams of idealized embodiments. Therefore, a change in the shape of the diagram as a result of, for example, manufacturing technology and/or tolerance can be expected. Therefore, the embodiments described herein should not be interpreted as being limited to the specific shape of the area as shown herein, but include, for example, shape deviations caused by manufacturing. For example, areas shown or described as flat may generally have rough and/or non-linear characteristics. In addition, the acute angles shown may be rounded. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to show the precise shape of the regions, and are not intended to limit the scope of the claims.

1A to 1G are cross-sectional flowcharts of a method of manufacturing a display panel according to a first embodiment of the invention.

Referring to FIG. 1A, a second substrate 200 is provided. The second substrate 200 has, for example, a display area AR and a non-display area NR. It should be noted that only a part of the second substrate 200 is shown in FIG. 1A. In one embodiment, the non-display area NR surrounds the display area AR. The second substrate 200 may include a rigid substrate or a flexible substrate, and the material thereof is, for example, glass, plastic, or other suitable materials, or a combination of the foregoing, but is not limited thereto.

1B, at least one first filter pattern 110a located in the AR in the display area and at least one first peripheral filter pattern 110b located in the non-display area NR are formed on the second substrate 200 by the photomask 300. For example, in this embodiment, the first filter pattern 110a and the first peripheral filter pattern 110b are both red filter patterns, but not limited to this, the first filter pattern 110a and the first peripheral filter pattern 110b Other colors are also possible. For example, the first filter pattern 110a and the first peripheral filter pattern 110b may both be green filter patterns, or the first filter pattern 110a and the first peripheral filter pattern 110b may both be blue Filter patterns, etc. In this embodiment, forming at least one first filter pattern 110a and at least one first peripheral filter pattern 110b may include the following steps, for example. First, a first filter layer (not shown) is formed on the second substrate 200. Next, the photomask 300 is used to perform a patterning process on the first filter layer. The patterning process may include, for example, an exposure process and a development process, but is not limited thereto. In this embodiment, the width P and the sub-pixel pitch of the first filter pattern 110a formed in the display area AR and the first peripheral filter pattern 110b formed in the non-display area NR are the same, but it is not limited thereto. The width P of the first peripheral filter pattern 110b and the sub-pixel pitch may not be equal.

1C, at least one second filter pattern 120a located in the display area AR and at least one second peripheral filter pattern 120b located in the non-display area NR are formed on the second substrate 200 by the photomask 300. For example, the second filter pattern 120a and the second peripheral filter pattern 120b are both green filter patterns, but not limited to this, the second filter pattern 120a and the second peripheral filter pattern 120b can also be other colors. For example, the second filter pattern 120a and the second peripheral filter pattern 120b may both be red filter patterns, or the second filter pattern 120a and the second peripheral filter pattern 120 may both be blue filter patterns or the like. In this embodiment, forming at least one second filter pattern 120a and at least one second peripheral filter pattern 120b may include the following steps, for example. First, a second filter layer (not shown) is formed on the second substrate 200. Then, the photomask 300 is moved a distance of N×P in the first direction d1 relative to the second substrate 200 to align the photomask 300 at the positions where the second filter pattern 120a and the second peripheral filter pattern 120b are to be formed. In this embodiment, N=2. That is, the mask 300 is moved relative to the second substrate 200 in the first direction d1 by two sub-pixel pitches, that is, the distance between the width P of the two first peripheral filter patterns 110b. The above-mentioned moving step may be, for example, fixing the second substrate 200 and moving the photomask 300 in the first direction d1, but is not limited to this. In other words, the aforementioned moving step can also be, for example, fixing the photomask 300 and moving the second substrate 200 in a direction opposite to the first direction d1. After that, the photomask 300 is used to perform a patterning process on the second filter layer. Since the second peripheral filter pattern 120b and the first peripheral filter pattern 110b are formed using the same photomask, the second peripheral filter pattern 120b has the same width P as the first peripheral filter pattern 110b (second filter pattern The width of the pattern 120a is the same, and will not be repeated here).

1D, at least one third filter pattern 130a is formed in the display area AR. In an embodiment, at least one third filter pattern 130a located in the display area AR and at least one third peripheral filter pattern 130b located in the non-display area NR may be formed separately. In this embodiment, the third filter pattern 130a and the third peripheral filter pattern 130b are both blue filter patterns, but not limited to this, the third filter pattern 130a and the third peripheral filter pattern 130b can also be Other colors, for example, the third filter pattern 130a and the third peripheral filter pattern 130b may both be red filter patterns, or the third filter pattern 130a and the third peripheral filter pattern 130b may both be green filter patterns, etc. . In this embodiment, forming at least one third filter pattern 130a may include the following steps, for example. First, a third filter layer (not shown) is formed on the second substrate 200. Then, the photomask 300 is moved by a distance of N×P in the second direction d2 relative to the second substrate 200, so that the photomask 300 returns to where it was when the first filter pattern 110a and the first peripheral filter pattern 110b were formed. position. In this embodiment, N=2. That is, the mask 300 is moved relative to the second substrate 200 in the second direction d2 by two sub-pixel pitches, that is, the distance between the width P of the two first peripheral filter patterns 110b. Then, continue to move the photomask 300 relative to the second substrate 200 in the second direction d2 by a distance of N×P. In this embodiment, N=2. That is, the mask 300 is moved relative to the second substrate 200 in the second direction d2 by two sub-pixel pitches, that is, the distance between the width P of the two first peripheral filter patterns 110b, so that the mask 300 is aligned The positions where the third filter pattern 130a and the third filter pattern 130b are to be formed are quasi. In this embodiment, the second direction d2 is opposite to the first direction d1. The above-mentioned moving step may be, for example, fixing the second substrate 200 and moving the photomask 300 in the second direction d2, but is not limited to this. In other words, the above-mentioned moving step can also be, for example, fixing the photomask 300 and moving the second substrate 200 in the first direction d1 opposite to the second direction d2. After that, the photomask 300 is used to perform a patterning process on the third filter layer. Since the third peripheral filter pattern 130b and the first peripheral filter pattern 110b are formed using the same mask, the third peripheral filter pattern 130b has the same width P as that of the first peripheral filter pattern 110b (third filter pattern). The width of the pattern 130a is the same, and will not be repeated here). However, the method of forming at least one third filter pattern 130a is not limited to the above-mentioned process. In other words, in another embodiment, another mask (not shown) may be used to form at least one third filter pattern 130a only in the display area AR (that is, the third filter pattern 130a is not formed in the non-display area NR). Three-periphery filter pattern 130b).

In this embodiment, the distance between adjacent ones of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a is p, that is, the distance between the sub-pixels is p, and the first periphery The distance between adjacent ones of the filter pattern 110b, the second peripheral filter pattern 120b, and the third peripheral filter pattern 130b is D, D=n·p, and n is a positive integer. In this embodiment, n=2, but not limited to this.

In some embodiments, the filter patterns (first filter pattern 110a, second filter pattern 120a, and third filter pattern 130a) and peripheral filter patterns (first peripheral filter pattern 110b, second peripheral filter pattern 110b) are formed. Before the filter pattern 120b and the third peripheral filter pattern 130b), a black matrix (not shown) can be selectively disposed on the second substrate 200. The material of the black matrix can be, for example, black resin, metal with low reflectivity (for example: chromium) or other suitable materials. The black matrix may have a plurality of openings to expose the filter pattern and the peripheral filter pattern.

In this embodiment, since at least the same photomask 300 is used when forming the first filter pattern 110a and the first peripheral filter pattern 110b, the second filter pattern 120a and the second peripheral filter pattern 120b, there is no need to Multiple masks are used to form each color filter pattern. That is, the present invention can save the use of the photomask and thus reduce the manufacturing cost.

1E, at least one spacer 140a located in the display area AR and at least one peripheral spacer 140b located in the non-display area NR are formed. Forming at least one spacer 140a and at least one peripheral spacer 140b may include the following steps, for example. First, a spacer layer (not shown) is formed on the second substrate 200. Next, a patterning process is performed on the spacer layer. The spacer 140a and the peripheral spacer 140b are, for example, a photosensitive spacer (Photo Spacer; PS). That is, the material of the spacer 140a and the peripheral spacer 140b is, for example, photosensitive resin. At least one spacer 140a is located on at least one of at least one first filter pattern 110a, at least one second filter pattern 120a, and at least one third filter pattern 130a, and at least one peripheral spacer 140b is located on at least one second filter pattern. At least one of a peripheral filter pattern 110b and at least one second peripheral filter pattern 120b. In this embodiment, at least one spacer 140a is located on at least one first filter pattern 110a, and at least one peripheral spacer 140b is located on at least one first peripheral filter pattern 110b. In detail, at least one spacer 140a, for example, overlaps with at least one first filter pattern 110a, and at least one peripheral spacer 140b, for example, overlaps with at least one first peripheral filter pattern 110b. In this embodiment, the stacking sequence of the superimposed first filter pattern 110a and the spacer 140a along the normal direction of the second substrate 200 is along with the superimposed first peripheral filter pattern 110b and the peripheral spacer 140b. The stacking sequence of the second substrate 200 in the normal direction is substantially the same. In one embodiment, the height of the first filter pattern 110a overlapped with the spacer 140a is c1, and the height of the first peripheral filter pattern 110b overlapped with the peripheral spacer 140b is c2, c1 and c2 Essentially the same. In addition, in an embodiment, the height of the at least one spacer 140a and the first filter pattern 110a that are overlapped is h1, and the at least one peripheral spacer 140b and the at least one first peripheral filter pattern 110b overlapped The height of is h2, and h1 and h2 are substantially the same. In detail, the top surface of the spacer 140a and the top surface of the peripheral spacer 140b are substantially aligned (that is, located at a substantially equal height).

In this embodiment, peripheral spacers 140b are arranged in the non-display area NR, and the spacers 140a and the peripheral spacers 140b are arranged on the same mask 300 to expose the same color filter layer (ie, the first filter pattern 110a And on the first peripheral filter pattern 110b), since the same mask 300 is used to expose the filter layers of the same color, the heights of the filter layers of the same color are more consistent. Therefore, the top surface of the spacer 140a and the top surface of the peripheral spacer 140b can be avoided. The trimming results in a non-display area NR and a height difference in the display area AR in the subsequent assembly of the display panel.

Please refer to FIG. 1F, the sealant 150 is disposed on the second substrate 200. In detail, the sealant 150 is disposed in the non-display area NR and surrounds the display area AR, for example. In addition, at least one first peripheral filter pattern 110b, at least one second peripheral filter pattern 120b, and at least one peripheral spacer 130b are located in the sealant 150, but the invention is not limited thereto. In detail, in other embodiments, the sealant 150 may also be disposed on the first substrate 100. After that, the display medium layer 160 is disposed on the second substrate 200. In detail, the display medium layer 160 is filled in, for example, a space surrounded by the sealant 150 (ie, located in the display area AR). The display medium layer 160 may include non-self-luminous materials, such as liquid crystal molecules, electrophoretic display medium, or other applicable mediums as examples, but not limited thereto. In other embodiments, the display medium layer 160 may include self-luminous materials, such as inorganic materials, organic materials, or other suitable materials, or a combination of the foregoing materials, or a combination of non-self-luminous materials.

1G, the second substrate 200 and the first substrate 100 are paired to form a display panel 10a. In this embodiment, at least one first filter pattern 110a, at least one second filter pattern 120a, and at least one third filter pattern 130a are color filter elements 400 of the display panel 10a, and at least one first peripheral filter The light pattern 110b, the at least one second peripheral filter pattern 120b and the at least one third peripheral filter pattern 130b are the peripheral color filter elements 500 of the display panel 10a, but are not limited thereto. The peripheral color filter element 500 may include at least two of at least one first peripheral filter pattern 110b, at least one second peripheral filter pattern 120b, and at least one third peripheral filter pattern 130b. For example, the peripheral color filter element 500 may only include at least one first peripheral filter pattern 110b and at least one second peripheral filter pattern 120b. The first substrate 100 may be, for example, a Thin Film Transistor Array (TFT array) substrate, but is not limited to this. In detail, the first substrate 100 may, for example, include a plurality of switch elements (not shown), a plurality of signal lines (not shown), and a plurality of pixel electrodes (not shown). The switching element may be, for example, various semiconductor elements. For example, the switching element is a semiconductor element such as a transistor or a diode, and the material of the switching element is, for example, polycrystalline silicon, monocrystalline silicon, nanocrystalline silicon, microcrystalline silicon, amorphous silicon, carbon nanotube/rod , Organic semiconductor materials, oxide semiconductors, or other suitable materials, or a combination of the foregoing materials. In an embodiment, the switching element includes a gate, a source, a channel layer, and a drain. A gate insulating layer is arranged between the gate and the channel layer. The switching element can be a top gate type transistor, a bottom gate type transistor, a three-dimensional channel type transistor, or other suitable types. The signal line may be, for example, at least one of at least one scan line, at least one data line, at least one common electrode line, and at least one power supply line. The signal line is electrically connected to the switching element, for example. For example, the scan line is electrically connected to the gate, the source and drain are each electrically connected to the channel layer, the data line is electrically connected to the source, and the common electrode line can be coupled to the pixel electrode to be electrically connected to the drain. pole. The pixel electrode can be electrically connected with the switching element. The pixel electrode may be, for example, a transmissive pixel electrode, a reflective pixel electrode, or a semi-transmissive and semi-reflective pixel electrode. The above-mentioned transmissive pixel electrode can be a single layer or multiple layers, and its materials include indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, carbon nanotubes/ Rod, metal or alloy less than 60 angstroms, or other suitable materials. The above-mentioned reflective pixel electrode can be a single layer or multiple layers, and its material includes metal, alloy, or other suitable materials.

2 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention.

Please refer to FIG. 2. FIG. 2 is a schematic cross-sectional view of a display panel according to a second embodiment of the present invention. The embodiment in FIG. 2 is similar to the embodiment in FIG. 1G and some elements and descriptions in FIG. 2 and their effects are omitted, which can be referred to the foregoing description, which will not be repeated here. In this embodiment, the widths P1 of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a are respectively larger than the first peripheral filter pattern 110b, the second peripheral filter pattern 120b, and the third peripheral filter pattern. The width P2 of the filter pattern 130b. In addition, in this embodiment, by adjusting the distance moved by the photomask 300 during the patterning process (please refer to the embodiments shown in FIGS. 1B to 1D), for example, the respective filter patterns can be Each peripheral filter pattern has the following configuration relationship: the third peripheral filter pattern 130b located in the non-display area NR, for example, partially overlaps the first peripheral filter pattern 110b, and the third filter pattern located in the display area AR The light pattern 130a is, for example, located between the first filter pattern 110a and the second filter pattern 120a. Moreover, in this embodiment, at least one spacer 140a is located on the at least one second filter pattern 120a, and at least one peripheral spacer 140b is located on the at least one second peripheral filter pattern 120b. In detail, at least one spacer 140a, for example, overlaps with at least one second filter pattern 120a, and at least one peripheral spacer 140b, for example, overlaps with at least one second peripheral filter pattern 120b. In this embodiment, the stacking sequence of the overlapped second filter pattern 120a and the spacer 140a along the normal direction of the second substrate 200 and the overlapped second peripheral filter pattern 120b and the peripheral spacer 140b are The stacking sequence of the second substrate 200 in the normal direction is substantially the same. In one embodiment, the height of the second filter pattern 120a overlapped with the spacer 140a is c3, and the height of the second peripheral filter pattern 120b overlapped with the peripheral spacer 140b is c4, c3 and c4 Essentially the same. In addition, in one embodiment, the height of the at least one spacer 140a and the second filter pattern 120a that are overlapped is h3, and the at least one peripheral spacer 140b and the at least one second peripheral filter pattern 120b overlapped The height of is h4, and h3 and h4 are substantially the same. In detail, the top surface of the spacer 140a and the top surface of the peripheral spacer 140b are substantially aligned (that is, located at a substantially equal height).

In some embodiments, the distance between adjacent two of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a is p, that is, the sub-pixel pitch is p, and the first peripheral filter The distance between adjacent two of the light pattern, the second peripheral filter pattern and the third peripheral filter pattern 130b is D, D=n·p, and n is a positive integer. In this embodiment, n=1, but not limited to this.

3 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention.

Please refer to FIG. 3. FIG. 3 is a schematic cross-sectional view of a display panel according to a third embodiment of the present invention. The embodiment in FIG. 3 is similar to the embodiment in FIG. 1G, and some elements and descriptions in FIG. 3 and their effects are omitted, which can refer to the foregoing description, which will not be repeated here. In this embodiment, the widths P3 of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a are each larger than the first peripheral filter pattern 110b, the second peripheral filter pattern 120b, and the third filter pattern. The width P4 of the peripheral filter pattern 130b. In addition, in this embodiment, by adjusting the distance moved by the photomask 300 during the patterning process (please refer to the embodiments shown in FIGS. 1B to 1D), for example, the respective filter patterns can be Each peripheral filter pattern has a configuration relationship as described below: the third peripheral filter pattern 130b located in the non-display area NR, for example, partially overlaps the first peripheral filter pattern 110b, and the second filter pattern located in the display area AR The light pattern 120a is partially overlapped on the first filter pattern 110a, and the third filter pattern 130a in the display area AR is partially overlapped on the first filter pattern 110a and the second filter pattern 120a. Furthermore, in this embodiment, at least one spacer 140a is located on at least one third filter pattern 130a, and at least one peripheral spacer 140b is located on at least one third peripheral filter pattern 130b. In detail, at least one spacer 140a, for example, overlaps with at least one third filter pattern 130a and at least one first filter pattern 110a (that is, at the third filter pattern partially overlapped with the first filter pattern 110a). Pattern 130a), and at least one peripheral spacer 140b, for example, overlaps with at least one third peripheral filter pattern 130b and at least one first peripheral filter pattern 110b (ie, is located partially overlapped with the first peripheral filter pattern 11b on the third peripheral filter pattern 130b). In this embodiment, the stacking sequence of the first filter pattern 110a, the third filter pattern 130a, and the spacer 140a that are superimposed along the normal direction of the second substrate 200 is the same as the superimposed first peripheral filter pattern The stacking sequence of 110b, the third peripheral filter pattern 130b, and the peripheral spacer 140b along the normal direction of the second substrate 200 is substantially the same. In an embodiment, the height of the third filter pattern 130a and the first filter pattern 110a overlapped with the spacer 140a is c5, and the third peripheral filter pattern 130b overlaps with the peripheral spacer 140b and The height of the first peripheral filter pattern 110b is c6, and c5 and c6 are substantially the same. In addition, in one embodiment, the height of the overlapped spacer 140a, the third filter pattern 130a, and the first filter pattern 110a is h5, and the overlapped at least one peripheral spacer 140b, the third peripheral filter The height of the light pattern 130b and the first peripheral filter pattern 110b is h6, and h5 and h6 are substantially the same. In detail, the top surface of the spacer 140a and the top surface of the peripheral spacer 140b are substantially aligned (that is, located at a substantially equal height).

In some embodiments, the distance between adjacent ones of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a is p, that is, the distance between the sub-pixels is p, and the first periphery The distance between two adjacent ones of the filter pattern, the second peripheral filter pattern and the third peripheral filter pattern 130b is D, D=n·p, and n is a positive integer. In this embodiment, n=1, but not limited to this.

In the above embodiment, the first peripheral filter pattern 110b, the second peripheral filter pattern 120b, and the third peripheral filter pattern 130b are provided in the sealant 150, but it is not limited thereto. For example, the sealant 150 is also The second peripheral filter pattern 120b may not be provided but only the first peripheral filter pattern 110b and the third peripheral filter pattern 130b are provided.

4 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the invention.

Please refer to FIG. 4, which is a schematic cross-sectional view of a display panel according to a fourth embodiment of the present invention. The embodiment of FIG. 4 is similar to the embodiment of FIG. 1G and some elements and descriptions in FIG. 4 and their effects are omitted, which can be referred to the foregoing description, which will not be repeated here. In this embodiment, the widths P5 of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a are each larger than the first peripheral filter pattern 110b, the second peripheral filter pattern 120b, and the third filter pattern. The width P6 of the peripheral filter pattern 130b. In addition, in this embodiment, by adjusting the distance moved by the photomask 300 during the patterning process (please refer to the embodiments shown in FIGS. 1B to 1D), for example, the respective filter patterns can be Each peripheral filter pattern has a configuration relationship as described below: the first peripheral filter pattern 110b, the second peripheral filter pattern 120b, and the third peripheral filter pattern 130b in the non-display area NR are alternately arranged in sequence, and are located in The first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a of the display area AR are also alternately arranged in sequence. Furthermore, in this embodiment, at least one spacer 140a is located on at least one third filter pattern 130a, and at least one peripheral spacer 140b is located on at least one third peripheral filter pattern 130b. In detail, at least one spacer 140a, for example, overlaps with at least one third filter pattern 130a, and at least one peripheral spacer 140b, for example, overlaps with at least one third peripheral filter pattern 130b. In one embodiment, the height of the third filter pattern 130a overlapped with the spacer 140a is c7, and the height of the third peripheral filter pattern 130b overlapped with the peripheral spacer 140b is c8, c7 and c8 Essentially the same. In addition, in one embodiment, the height of the overlapped spacer 140a and the third filter pattern 130a is h7, and the height of the overlapped peripheral spacer 140b and the third peripheral filter pattern 130b is h8, And h7 and h8 are substantially the same. In detail, the top surface of the spacer 140a and the top surface of the peripheral spacer 140b are substantially aligned (that is, located at a substantially equal height).

In some embodiments, the distance between adjacent ones of the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a is p, that is, the distance between the sub-pixels is p, and the first periphery The distance between two adjacent ones of the filter pattern, the second peripheral filter pattern and the third peripheral filter pattern 130b is D, D=n·p, and n is a positive integer. In this embodiment, n=1, but not limited to this.

In summary, since the present invention uses the same mask when forming the first filter pattern and the first peripheral filter pattern and the second filter pattern and the second peripheral filter pattern at least, there is no need to use multiple lights. Mask to form each color filter pattern. That is, the present invention can save the use of the photomask and thus reduce the manufacturing cost. In addition, because the filter patterns arranged in the display area and the peripheral filter patterns arranged in the non-display area of the present invention have a similar arrangement relationship, and the spacers and the peripheral spacers are arranged in the same mask for exposure. On the filter pattern of the same color, the height of the filter pattern of the same color exposed by the same mask is more consistent. Therefore, it can avoid that the top surface of the spacer and the top surface of the peripheral spacer are not aligned and cause subsequent follow-up Assembling the display panel produces a non-display area and a high-low level difference in the display area.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.

10a, 10b, 10c, 10d‧‧‧Display panel 100‧‧‧First substrate 110a‧‧‧First filter pattern 110b‧‧‧First peripheral filter pattern 120a‧‧‧Second filter pattern 120b‧‧ ‧Second peripheral filter pattern 130a‧‧‧Third filter pattern 130b‧‧‧Third peripheral filter pattern 140a‧‧‧Spacer 140b‧‧‧Perimeter spacer 150‧‧‧Seal 160‧‧‧Display Dielectric layer 200‧‧‧Second substrate 300‧‧‧Mask 400‧‧‧Color filter element 500‧‧‧ Peripheral color filter element AR‧‧‧Display area c1, c2, c3, c4, c5, c6, c7, c8, h1, h2, h3, h4, h5, h6, h7, h8‧‧‧ height d1, d2, X, Y‧‧ direction D‧‧‧ pitch NR‧‧‧non-display area p‧‧‧ Sub-pixel pitch P, P1, P2, P3, P4, P5, P6‧‧‧Width R1, R2, R3, R4, R5‧‧‧Repeat unit

1A to 1G are cross-sectional flowcharts of a method of manufacturing a display panel according to a first embodiment of the invention. 2 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention. 3 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention. 4 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the invention.

10a‧‧‧Display Panel

100‧‧‧First substrate

110a‧‧‧First filter pattern

110b‧‧‧First peripheral filter pattern

120a‧‧‧Second filter pattern

120b‧‧‧Second peripheral filter pattern

130a‧‧‧Third filter pattern

130b‧‧‧The third peripheral filter pattern

140a‧‧‧Interstitial objects

140b‧‧‧Perimeter spacer

150‧‧‧Frame glue

160‧‧‧Display medium layer

200‧‧‧Second substrate

400‧‧‧Color filter element

500‧‧‧peripheral color filter element

AR‧‧‧Display area

h1, h2‧‧‧height

D‧‧‧Pitch

NR‧‧‧Non-display area

p‧‧‧second pixel pitch

P‧‧‧Width

Claims (13)

A display panel includes a display area and a non-display area. The display panel includes: a first substrate; a second substrate disposed opposite to the first substrate; a display medium layer disposed in the display area and located in the Between the first substrate and the second substrate; a color filter element, disposed between the first substrate and the second substrate and located in the display area, the color filter element including at least one first filter pattern, At least one second filter pattern and at least one third filter pattern, wherein the at least one first filter pattern, the at least one second filter pattern, and the at least one third filter pattern are adjacent to each other The pitch is p; a peripheral color filter element is disposed between the first substrate and the second substrate and is located in the non-display area, and the peripheral color filter element includes at least one first peripheral filter pattern and at least one second At least two of the peripheral filter pattern and the at least one third peripheral filter pattern, wherein the at least one first peripheral filter pattern, the at least one second peripheral filter pattern, and the at least one third peripheral filter pattern The distance between adjacent two is D, D=n‧p, and n is a positive integer; a sealant is arranged between the first substrate and the second substrate, and the sealant is located in the non-display area and surrounds the Display medium layer; at least one spacer disposed on at least one of the at least one first filter pattern, the at least one second filter pattern, and the at least one third filter pattern; and At least one peripheral spacer is disposed on at least one of the first peripheral filter pattern, the second peripheral filter pattern, and the third peripheral filter pattern, wherein the peripheral color filter element and the at least one peripheral The spacer is located in the sealant, wherein the at least one spacer overlaps the at least one first filter pattern and the at least one second filter pattern, and the at least one peripheral spacer and the at least one first peripheral filter overlap The light pattern and the at least one second peripheral filter pattern are overlapped, and the heights of the at least one spacer, the at least one first filter pattern, and the at least one second filter pattern overlapped The heights of the at least one peripheral spacer, the at least one first peripheral filter pattern, and the at least one second peripheral filter pattern are substantially the same. The display panel according to claim 1, wherein the stacking sequence of the overlapping color filter element and the at least one spacer along a normal direction of the display panel and the overlapping peripheral color filter The stacking sequence of the light element and the at least one peripheral spacer along the normal direction of the display panel is substantially the same. The display panel according to claim 2, wherein the color filter element overlapped with the spacer includes the at least one first filter pattern, and the peripheral color filter overlapped with the peripheral spacer The light element includes the at least one first peripheral filter pattern, and the first filter pattern and the at least one first peripheral filter pattern have the same color. The display panel according to claim 2, wherein the at least one first filter pattern overlapped with the spacer and the at least one first peripheral filter pattern overlapped with the peripheral spacer The color is the same, and the at least one second filter pattern overlapped with the spacer and the at least one second periphery overlapped with the peripheral spacer The color of the filter pattern is the same. The display panel according to claim 1, wherein the height of the overlapped color filter element and the at least one spacer is as high as the height of the overlapped peripheral color filter element and the at least one spacer The height is essentially the same. In the display panel described in item 1 of the scope of patent application, the spacer includes a photosensitive resin. The display panel described in claim 1, wherein the height of the color filter element superimposed with the spacer and the height of the peripheral color filter element superimposed with the peripheral spacer are substantially the same . The display panel according to claim 1, wherein the peripheral color filter element includes the at least one first peripheral filter pattern, the at least one second peripheral filter pattern, and the at least one third peripheral filter pattern . The display panel according to claim 1, wherein the colors of the first filter pattern, the second filter pattern and the third filter pattern are different, and the colors are selected from red, green, and blue. set. The display panel according to claim 1, wherein the first filter pattern and the first peripheral filter pattern have the same color, the second filter pattern and the second peripheral filter pattern have the same color, and The color of the third filter pattern is the same as that of the third peripheral filter pattern. A manufacturing method of a display panel, the display panel including a display area and a non-display area, the manufacturing method including: A first substrate and a second substrate are provided; at least one first filter pattern in the display area and at least one first peripheral filter pattern in the non-display area are formed on the second substrate by a photomask By the mask to form at least one second filter pattern located in the display area and at least one second peripheral filter pattern located in the non-display area on the second substrate; forming at least one second filter pattern located in the display area Three filter patterns; forming at least one spacer located in the display area and at least one peripheral spacer located in the non-display area, the at least one spacer located in the at least one first filter pattern and the at least one second filter pattern And on at least one of the at least one third filter pattern, the at least one peripheral spacer is located on at least one of the at least one first peripheral filter pattern and the at least one second peripheral filter pattern; A sealant is on the first substrate or the second substrate, wherein the sealant is located in the non-display area and surrounds the display area; and the second substrate is paired with the first substrate, wherein the at least one first periphery The filter pattern, the at least one second peripheral filter pattern, and the at least one peripheral spacer are located in the sealant, wherein the at least one spacer, the at least one first filter pattern and the at least one second filter pattern Overlap, the at least one peripheral spacer and the at least one first peripheral filter pattern and the at least one second peripheral filter pattern overlap, and the at least one spacer and the at least one first filter overlapped The heights of the light pattern and the at least one second filter pattern are substantially the same as the heights of the at least one peripheral spacer, the at least one first peripheral filter pattern and the at least one second peripheral filter pattern that are overlapped. According to the manufacturing method of the display panel described in claim 11, the step of forming the at least one third filter pattern in the display area includes: The at least one third filter pattern in the display area and the at least one third peripheral filter pattern in the non-display area are formed by the photomask. The manufacturing method of the display panel according to claim 11, wherein the at least one spacer and the at least one first filter pattern overlap, and the at least one peripheral spacer and the at least one first peripheral filter The patterns are overlapped, and the height of the overlapped at least one spacer and the first filter pattern is substantially the same as the height of the overlapped at least one peripheral spacer and the at least one first peripheral filter pattern.

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