TWI758507B - Polyimide precursor composition, preparation method thereof and polyimide substrate prepared from the composition - Google Patents
Polyimide precursor composition, preparation method thereof and polyimide substrate prepared from the composition Download PDFInfo
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Abstract
Description
發明領域 本發明是有關於一種聚醯亞胺前驅物組成物、其製備方法及一種由該組成物所製備之聚醯亞胺基材。該聚醯亞胺前驅物組成物具有高固含量與低黏度而有利於製備基材,並且在室溫下的儲存穩定性是優異的。此外,該聚醯亞胺基材在耐熱性與機械性質上是優異的,而使得它適合供作為顯示器基材。FIELD OF THE INVENTION The present invention relates to a polyimide precursor composition, a preparation method thereof, and a polyimide substrate prepared from the composition. The polyimide precursor composition has high solid content and low viscosity, which is favorable for preparing substrates, and has excellent storage stability at room temperature. In addition, the polyimide substrate is excellent in heat resistance and mechanical properties, making it suitable for use as a display substrate.
發明背景 一般而言,聚醯亞胺(PI)樹脂意指一種由下列所製得之高度耐熱的樹脂:一芳香族二酐與一芳香族二胺或一芳香族二異氰酸鹽進行聚合作用以產生一聚醯胺酸衍生物,接而該聚醯胺酸衍生物在高溫下進行閉環作用與脫水作用以醯亞胺化。此外,一聚醯亞胺樹脂是一種不溶性且不熔性之高度耐熱的樹脂。由於它在熱氧化抗性、耐熱性、輻射抗性、低溫特性以及化學抗性方面上的優異特性,它已被廣泛地用於各種不同的工業中,例如,作為供用於汽車、航空以及航太領域中的高階耐熱材料,以及作為用於半導體與TFT-LCDs之絕緣塗層、電介質膜以及電極保護膜的電子材料(參見韓國專利第1472920號)。BACKGROUND OF THE INVENTION In general, polyimide (PI) resin means a highly heat-resistant resin prepared by polymerizing an aromatic dianhydride with an aromatic diamine or an aromatic diisocyanate act to produce a polyamide derivative, and then the polyamide derivative undergoes ring closure and dehydration at high temperature to imidize. In addition, a polyimide resin is a highly heat-resistant resin that is insoluble and infusible. Because of its excellent properties in thermal oxidation resistance, heat resistance, radiation resistance, low temperature properties, and chemical resistance, it has been widely used in various industries, for example, as a High-order heat-resistant materials in the solar field, and electronic materials as insulating coatings, dielectric films, and electrode protection films for semiconductors and TFT-LCDs (see Korean Patent No. 1472920).
近年來,已藉由製造聚醯亞胺樹脂(亦即一聚醯亞胺前驅物組成物)薄膜的便利方法來開發在光學特性、機械特性以及熱特性上優異的聚醯亞胺基材。已被知曉的是,在製備一聚醯亞胺前驅物組成物時,若一芳香族二酐與一芳香族胺的莫耳比接近於1:1,該聚醯亞胺前驅物組成物的分子量會提升,透過熱化學醯亞胺化而由此所製備的基材比起上述莫耳比偏離1:1的情況,具有更佳的物理性質。然而,一聚醯亞胺前驅物的分子量越高且其中的固含量越高,該聚醯亞胺前驅物組成物的黏度則越高,其使得更難去操作該聚醯亞胺前驅物組成物並由此來製備基材。此外,具有高黏度的聚醯亞胺前驅物組成物在室溫下具有低的儲存穩定性。若該聚醯亞胺前驅物具有低的分子量,由該聚醯亞胺前驅物所製得的聚醯亞胺基材之耐熱性與機械性質可能會不足。此外,若一聚醯亞胺前驅物組成物含有低的固含量,它會引發一個問題:需要從所製得的基材中移除大量的溶劑,而製造成本與時間可能會增加。In recent years, polyimide substrates excellent in optical, mechanical, and thermal properties have been developed by a convenient method of making films of polyimide resins (ie, a polyimide precursor composition). It has been known that when a polyimide precursor composition is prepared, if the molar ratio of an aromatic dianhydride and an aromatic amine is close to 1:1, the polyimide precursor composition has a The molecular weight will increase, and the substrates prepared therefrom through thermochemical imidization have better physical properties than those described above where the molar ratio deviates from 1:1. However, the higher the molecular weight of a polyimide precursor and the higher the solids content therein, the higher the viscosity of the polyimide precursor composition, which makes it more difficult to manipulate the polyimide precursor composition and the substrates are prepared therefrom. In addition, the polyimide precursor composition with high viscosity has low storage stability at room temperature. If the polyimide precursor has a low molecular weight, the heat resistance and mechanical properties of the polyimide substrate prepared from the polyimide precursor may be insufficient. Furthermore, if a polyimide precursor composition contains a low solids content, it raises a problem that a large amount of solvent needs to be removed from the prepared substrate, and manufacturing cost and time may increase.
發明概要技術問題 Summary of Invention Technical Problem
因此,本發明的目的在於提供一種具有高固含量與低黏度且在室溫下的儲存穩定性優異的聚醯亞胺前驅物組成物。Therefore, an object of the present invention is to provide a polyimide precursor composition with high solid content, low viscosity and excellent storage stability at room temperature.
此外,本發明的另一個目的在於提供一種聚醯亞胺基材,其在耐熱性與機械性質上是優異,而使得該聚醯亞胺基材適合供作為顯示器基材。問題的解決辦法 Furthermore, another object of the present invention is to provide a polyimide substrate which is excellent in heat resistance and mechanical properties, making the polyimide substrate suitable for use as a display substrate. solution to the problem
為了達成上述目的,於此提供一種聚醯亞胺前驅物組成物,其包含: 一由一聚醯胺酸組成物所製備之聚醯胺酸溶液,該聚醯胺酸組成物包含一芳香族二酐與一芳香族二胺,該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA),該芳香族二胺包含對苯二胺(PPD); 一具有至少四個羧基的芳香族羧酸; 一三級胺固化劑;以及 一抗氧化劑。In order to achieve the above object, a polyimide precursor composition is provided, comprising: a polyamide solution prepared from a polyamide composition, the polyamide composition comprising an aromatic Dianhydride and an aromatic diamine, the aromatic dianhydride comprising 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA), the aromatic diamine comprising p-phenylenediamine (PPD); an aromatic carboxylic acid having at least four carboxyl groups; a tertiary amine curing agent; and an antioxidant.
為了達成其他目的,於此提供一種聚醯亞胺基材,其是藉由施用、乾燥以及固化該聚醯亞胺前驅物組成物而製得。To achieve other objects, a polyimide substrate is provided herein, which is prepared by applying, drying, and curing the polyimide precursor composition.
又,為了達成其他目的,於此提供一種用於製備一聚醯亞胺前驅物組成物的方法,其包含: (1)藉由使一芳香族二酐與一芳香族二胺混合與反應以製備一聚醯胺酸溶液,該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA),該芳香族二胺包含對苯二胺(PPD); (2)將該聚醯胺酸溶液、一三級胺固化劑以及一抗氧化劑混合以製備一混合物;以及 (3)將該混合物與一具有至少四個羧基的芳香族羧酸混合。本發明的效用 Furthermore, in order to achieve other objects, there is provided a method for preparing a polyimide precursor composition, comprising: (1) mixing and reacting an aromatic dianhydride and an aromatic diamine to Prepare a polyamic acid solution, the aromatic dianhydride comprises 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA), and the aromatic diamine comprises p-phenylenediamine (PPD); ( 2) mixing the polyamic acid solution, a tertiary amine curing agent, and an antioxidant to prepare a mixture; and (3) mixing the mixture with an aromatic carboxylic acid having at least four carboxyl groups. Utility of the present invention
依據本發明的聚醯亞胺前驅物組成物具有高固含量與低黏度並且在室溫下的儲存穩定性是優異的。此外,由該組成物所製得的聚醯亞胺基材適合在一用於製造一顯示器的方法之熱處理步驟中黏著至一玻璃或一無機層上,並且在像是耐熱性與熱尺寸穩定性的機械性質上是優異的。The polyimide precursor composition according to the present invention has high solid content and low viscosity and is excellent in storage stability at room temperature. In addition, the polyimide substrate made from the composition is suitable for adhering to a glass or an inorganic layer in a heat treatment step of a method for manufacturing a display, and is stable in conditions such as heat resistance and thermal dimensional stability The mechanical properties are excellent.
實施本發明的最佳態樣 本發明的聚醯亞胺前驅物組成物包含一由一聚醯胺酸組成物所製備之聚醯胺酸溶液,該聚醯胺酸組成物包含一芳香族二酐與一芳香族二胺,該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA),該芳香族二胺包含對苯二胺(PPD);一具有至少四個羧基的芳香族羧酸;一三級胺固化劑;以及一抗氧化劑。 聚醯胺酸溶液 Best Practices for Carrying Out the Invention The inventive polyimide precursor composition comprises a polyamide solution prepared from a polyamide composition comprising an aromatic diamide anhydride and an aromatic diamine, the aromatic dianhydride comprising 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA), the aromatic diamine comprising p-phenylenediamine (PPD); a an aromatic carboxylic acid having at least four carboxyl groups; a tertiary amine curing agent; and an antioxidant. Polyamide solution
該聚醯胺酸溶液是由一聚醯胺酸組成物所製備,該聚醯胺酸組成物包含一芳香族二酐與一芳香族二胺,該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA),該芳香族二胺包含對苯二胺(PPD)。The polyamic acid solution is prepared from a polyamic acid composition comprising an aromatic dianhydride and an aromatic diamine, the aromatic dianhydride comprising 3,4,3' ,4'-biphenyltetracarboxylic dianhydride (BPDA), the aromatic diamine includes p-phenylenediamine (PPD).
該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA)。The aromatic dianhydride includes 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA).
此外,該芳香族二酐可進一步包含至少一個選自於由下列所構成之群組中的芳香族二酐:焦蜜石酸二酐(PMDA)、3,3',4,4'-二苯基酮四羧酸二酐(BTDA)、2,3,3',4'-聯苯四羧酸二酐、1H,3H-萘并[2,3-c:6,7-c']二呋喃-1,3,6,8-四酮、2,3,6,7-萘四羧酸二酐、1,4,5,8-萘四羧酸二酐、4,4'-氧雙鄰苯二甲酸酐、4,4'-氧雙(2-苯并呋喃-1,3-二酮)、4-[(1,3-二氧-1,3-二氫-2-苯并呋喃-5-基)氧基]-2-苯并呋喃-1,3-二酮,以及5,5'-磺醯基雙-1,3-異苯并呋喃二酮。In addition, the aromatic dianhydride may further comprise at least one aromatic dianhydride selected from the group consisting of: pyrometic acid dianhydride (PMDA), 3,3',4,4'-dianhydride Phenyl ketone tetracarboxylic dianhydride (BTDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride, 1H,3H-naphtho[2,3-c:6,7-c'] Difuran-1,3,6,8-tetraone, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 4,4'-oxygen Diphthalic anhydride, 4,4'-oxybis(2-benzofuran-1,3-dione), 4-[(1,3-dioxo-1,3-dihydro-2-benzene furan-5-yl)oxy]-2-benzofuran-1,3-dione, and 5,5'-sulfonylbis-1,3-isobenzofurandione.
具體地,該芳香族二酐可包含3,4,3',4'-聯苯四羧酸二酐(BPDA),或它可包含3,4,3',4'-聯苯四羧酸二酐(BPDA)與焦蜜石酸二酐(PMDA)。此外,該芳香族二酐可包含3,4,3',4'-聯苯四羧酸二酐(BPDA)與3,3',4,4'-二苯基酮四羧酸二酐(BTDA),或者它可包含3,4,3',4'-聯苯四羧酸二酐(BPDA)、焦蜜石酸二酐(PMDA),以及3,3',4,4'-二苯基酮四羧酸二酐(BTDA)。Specifically, the aromatic dianhydride may comprise 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA), or it may comprise 3,4,3',4'-biphenyltetracarboxylic acid Dianhydride (BPDA) and pyromite dianhydride (PMDA). In addition, the aromatic dianhydride may comprise 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA) and 3,3',4,4'-diphenylketone tetracarboxylic dianhydride ( BTDA), or it may contain 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA), pyromite dianhydride (PMDA), and 3,3',4,4'-diphenyl dianhydride Phenyl ketone tetracarboxylic dianhydride (BTDA).
該聚醯胺酸組成物可包含,每100莫耳的芳香族二胺有0.1至70莫耳之額外的芳香族二酐。具體地,該聚醯胺酸組成物可包含,每100莫耳的芳香族二胺有2至65莫耳之額外的芳香族二酐。更具體地,該聚醯胺酸組成物可包含,每100莫耳的該二胺有42至99莫耳的BPDA以及0.1至57莫耳的PMDA,或者92至99莫耳的BPDA。The polyamic acid composition may contain 0.1 to 70 moles of additional aromatic dianhydride per 100 moles of aromatic diamine. Specifically, the polyamic acid composition may contain 2 to 65 moles of additional aromatic dianhydride per 100 moles of aromatic diamine. More specifically, the polyamic acid composition may comprise 42 to 99 moles of BPDA and 0.1 to 57 moles of PMDA, or 92 to 99 moles of BPDA per 100 moles of the diamine.
此外,該聚醯胺酸組成物可包含,每100莫耳的該二胺有0.1至5莫耳或0.1至3莫耳的BTDA。In addition, the polyamic acid composition may contain 0.1 to 5 moles or 0.1 to 3 moles of BTDA per 100 moles of the diamine.
為了增進耐熱性、熱尺寸穩定性以及模數,對苯二胺可以每1.0莫耳的全部芳香族二胺中有0.8至1.0莫耳的比例來使用。與其他芳香族二胺(諸如二胺基苯基醚)相較之下,對苯二胺是一具線性的單體並且具有降低所製得的薄膜之熱膨脹係數的優點。In order to improve heat resistance, thermal dimensional stability, and modulus, p-phenylenediamine may be used in a ratio of 0.8 to 1.0 mol per 1.0 mol of the total aromatic diamine. Compared to other aromatic diamines such as diaminophenyl ether, p-phenylenediamine is a linear monomer and has the advantage of reducing the thermal expansion coefficient of the resulting films.
除了對苯二胺以外,該芳香族二胺可進一步包含至少一個選自於由下列所構成之群組中的芳香族二胺:二胺基苯基醚、o-苯二胺、m-苯二胺、2,6-二胺基-吡啶、4,4'-二胺基二苯基碸、2-(4-胺基苯基)-1H-苯并噁唑-5-胺、2-(4-胺基苯基)-5-胺基苯并咪唑、6-胺基-2-(p-胺基苯基)苯并噁唑,以及4,4''-二胺基-p-三苯。In addition to p-phenylenediamine, the aromatic diamine may further comprise at least one aromatic diamine selected from the group consisting of: diaminophenyl ether, o-phenylenediamine, m-benzene Diamine, 2,6-diamino-pyridine, 4,4'-diaminodiphenyl benzene, 2-(4-aminophenyl)-1H-benzoxazol-5-amine, 2- (4-Aminophenyl)-5-aminobenzimidazole, 6-amino-2-(p-aminophenyl)benzoxazole, and 4,4''-diamino-p- Triphenyl.
除了該芳香族二酐與該芳香族二胺之外,該聚醯胺酸組成物可包含一反應溶劑。該反應溶劑可為一以醯胺為基礎的非質子性溶劑。具體地,該反應溶劑可為選自於由下列所構成之群組中的至少一者:N,N'-二甲基甲醯胺(DMF)、N,N'-二甲基乙醯胺(DMAc)、N-甲基吡咯啶酮(NMP)、乙腈、四氫呋喃(THF)、3-甲酚(m-Cresol)、1,1,3,3-四甲基脲(TMU)、二甲亞碸(DMSO),以及γ-丁內酯。In addition to the aromatic dianhydride and the aromatic diamine, the polyamic acid composition may contain a reaction solvent. The reaction solvent can be an amide-based aprotic solvent. Specifically, the reaction solvent may be at least one selected from the group consisting of: N,N'-dimethylformamide (DMF), N,N'-dimethylacetamide (DMAc), N-methylpyrrolidone (NMP), acetonitrile, tetrahydrofuran (THF), 3-cresol (m-Cresol), 1,1,3,3-tetramethylurea (TMU), dimethyl Diene (DMSO), and γ-butyrolactone.
該聚醯胺酸溶液是由該聚醯胺酸組成物所製得。具體地,該聚醯胺酸溶液可藉由令該聚醯胺酸組成物反應而製得。該反應可於30至90℃下進行。The polyamic acid solution is prepared from the polyamic acid composition. Specifically, the polyamic acid solution can be prepared by reacting the polyamic acid composition. The reaction can be carried out at 30 to 90°C.
該聚醯胺酸溶液於23℃下可具有1,000至20,000cP的黏度。具體地,該聚醯胺酸溶液於23℃下可具有2,000至10,000cP的黏度。The polyamide solution may have a viscosity of 1,000 to 20,000 cP at 23°C. Specifically, the polyamic acid solution may have a viscosity of 2,000 to 10,000 cP at 23°C.
該聚醯胺酸溶液可具有10,000至200,000或15,000至150,000的重量平均分子量。 芳香族羧酸The polyamic acid solution may have a weight average molecular weight of 10,000 to 200,000 or 15,000 to 150,000. Aromatic carboxylic acid
該芳香族羧酸具有至少四個羧基。它作用為增進耐熱性、熱尺寸穩定性以及機械性質,同時降低所製得的聚醯胺酸溶液的黏度。具體地,該芳香族羧酸可為一具有四個羧基的芳香族羧酸。The aromatic carboxylic acid has at least four carboxyl groups. It acts to improve heat resistance, thermal dimensional stability and mechanical properties, while reducing the viscosity of the prepared polyamide solution. Specifically, the aromatic carboxylic acid may be an aromatic carboxylic acid having four carboxyl groups.
更具體地,該芳香族羧酸可包含選自於由下列所構成之群組中的至少一者:焦蜜石酸(PMA)、3,3',4,4'-聯苯四羧酸(BPTA)、1,2,3,4-苯四羧酸、二苯基酮-3,3',4,4'-四羧酸、吡嗪四羧酸、2,3,6,7-萘四羧酸,以及萘-1,4,5,8-四羧酸。更具體地,該芳香族羧酸可包含選自於由下列所構成之群組中的至少一者:焦蜜石酸與3,3',4,4'-聯苯四羧酸。更具體地,該芳香族羧酸可包含焦蜜石酸或3,3',4,4'-聯苯四羧酸。More specifically, the aromatic carboxylic acid may comprise at least one selected from the group consisting of pyrometic acid (PMA), 3,3',4,4'-biphenyltetracarboxylic acid (BPTA), 1,2,3,4-benzenetetracarboxylic acid, diphenylketone-3,3',4,4'-tetracarboxylic acid, pyrazinetetracarboxylic acid, 2,3,6,7- Naphthalene tetracarboxylic acid, and naphthalene-1,4,5,8-tetracarboxylic acid. More specifically, the aromatic carboxylic acid may comprise at least one selected from the group consisting of pyromic acid and 3,3',4,4'-biphenyltetracarboxylic acid. More specifically, the aromatic carboxylic acid may comprise pyromic acid or 3,3',4,4'-biphenyltetracarboxylic acid.
該聚醯胺酸組成物可包含,每100莫耳的芳香族二胺有1至8莫耳的芳香族羧酸。具體地,該聚醯亞胺前驅物組成物可包含,每100莫耳的聚醯胺酸有1至7莫耳或1至6莫耳的芳香族羧酸。 三級胺固化劑The polyamic acid composition may contain 1 to 8 moles of aromatic carboxylic acid per 100 moles of aromatic diamine. Specifically, the polyimide precursor composition may contain 1 to 7 moles or 1 to 6 moles of an aromatic carboxylic acid per 100 moles of the polyamide acid. Tertiary amine curing agent
該三級胺固化劑可包含選自於由下列所構成之群組中的至少一者:β-甲吡啶、異喹啉、三伸乙二胺,以及吡啶。具體地,該三級胺固化劑可包含三伸乙二胺以及選自於由下列所構成之群組中的至少一者:β-甲吡啶、異喹啉,以及吡啶。三伸乙二胺作用為確保該聚醯亞胺前驅物組成物在低溫下固化並且增進所製得的基材之耐熱性。The tertiary amine curing agent may comprise at least one selected from the group consisting of beta-picoline, isoquinoline, triethylenediamine, and pyridine. Specifically, the tertiary amine curing agent may comprise triethylenediamine and at least one selected from the group consisting of β-picoline, isoquinoline, and pyridine. Triethylenediamine acts to ensure that the polyimide precursor composition is cured at low temperatures and to improve the heat resistance of the resulting substrate.
該聚醯亞胺前驅物組成物可包含,每100莫耳的聚醯胺酸有0.1至50莫耳的三級胺固化劑。具體地,該聚醯亞胺前驅物組成物可包含,每100莫耳的聚醯胺酸有0.1至2莫耳的三伸乙二胺。更具體地,該聚醯亞胺前驅物組成物可包含,每100莫耳的聚醯胺酸有0.1至2莫耳的三伸乙二胺以及5至50莫耳之選自於由下列所構成之群組中的至少一者:β-甲吡啶、異喹啉,以及吡啶。 抗氧化劑The polyimide precursor composition may contain 0.1 to 50 moles of tertiary amine curing agent per 100 moles of polyimide. Specifically, the polyimide precursor composition may contain 0.1 to 2 moles of triethylenediamine per 100 moles of polyimide. More specifically, the polyimide precursor composition may comprise 0.1 to 2 moles of triethylenediamine and 5 to 50 moles of triethylenediamine per 100 moles of polyamide acid selected from the group consisting of: At least one of the group consisting of: beta-picoline, isoquinoline, and pyridine. Antioxidants
該抗氧化劑作用為降低在該聚醯亞胺前驅物組成物中的醯胺基團的反應性,藉此防止在製備一基材的製程中之熱處理期間由該醯胺基團的反應性所導致的氧化作用。The antioxidant acts to reduce the reactivity of the amide groups in the polyimide precursor composition, thereby preventing damage caused by the reactivity of the amide groups during thermal processing in the process of making a substrate lead to oxidation.
該抗氧化劑可具有400℃或更高或者400至480℃之5%重量分解的溫度。具體地,該抗氧化劑可為選自於由下列所構成之群組中的至少一者:由下列化學式1所示的化合物、磷酸三乙酯,以及磷酸三甲酯。 [化學式1] The antioxidant may have a temperature of 400°C or higher or 5% by weight decomposition temperature of 400 to 480°C. Specifically, the antioxidant may be at least one selected from the group consisting of a compound represented by the following Chemical Formula 1, triethyl phosphate, and trimethyl phosphate. [Chemical formula 1]
在上述化學式1中,n為一由0至4的整數。In the above Chemical Formula 1, n is an integer from 0 to 4.
更具體地,該抗氧化劑可為磷酸三苯酯(TPP),其中n為0(TPP,磷酸三苯酯),或者可為其中n為一由1至4的整數之化合物的混合物(CAS 1003300-73-9)。More specifically, the antioxidant may be triphenyl phosphate (TPP), where n is 0 (TPP, triphenyl phosphate), or may be a mixture of compounds where n is an integer from 1 to 4 (CAS 1003300 -73-9).
該聚醯亞胺前驅物組成物可包含,以該聚醯亞胺前驅物組成物的總重為基礎,0.1至2%重量的抗氧化劑。具體地,該聚醯亞胺前驅物組成物可包含,以該聚醯亞胺前驅物組成物的總重為基礎,0.2至1.5%重量或0.2至1%重量的抗氧化劑。聚醯亞胺基材 The polyimide precursor composition may comprise, based on the total weight of the polyimide precursor composition, 0.1 to 2% by weight of an antioxidant. Specifically, the polyimide precursor composition may include, based on the total weight of the polyimide precursor composition, 0.2 to 1.5% by weight or 0.2 to 1% by weight of an antioxidant. Polyimide substrate
依據本發明的聚醯亞胺基材是藉由施用、乾燥以及固化如上所述的聚醯亞胺前驅物組成物而製得。具體地,該聚醯亞胺基材可藉由將如上所述的聚醯亞胺前驅物組成物施用於一支撐基材上並將它乾燥與固化,繼而將其剝離而製得。Polyimide substrates according to the present invention are prepared by applying, drying and curing the polyimide precursor compositions described above. Specifically, the polyimide substrate can be prepared by applying the polyimide precursor composition as described above to a support substrate, drying and curing it, and then peeling it off.
該支撐基材可為一玻璃基材、一金屬板,或類似之物。The support substrate can be a glass substrate, a metal plate, or the like.
可視所施用的聚醯亞胺前驅物組成物的厚度而在乾燥溫度與乾燥時間的方面上來調整該乾燥與固化。例如,該乾燥與固化可藉由一包含下列的方法來進行:於20至120℃的溫度下進行乾燥歷時5至60分鐘,以一為1至8℃/分鐘的速率將溫度升高到450至500℃,於450至500℃下進行熱處理歷時30至60分鐘,以及以一為1至8℃/分鐘的速率冷卻至20至120℃。The drying and curing can be adjusted in terms of drying temperature and drying time depending on the thickness of the applied polyimide precursor composition. For example, the drying and curing can be carried out by a method comprising: drying at a temperature of 20 to 120°C for 5 to 60 minutes, increasing the temperature to 450°C at a rate of 1 to 8°C/min to 500°C, heat treatment at 450 to 500°C for 30 to 60 minutes, and cooling to 20 to 120°C at a rate of 1 to 8°C/min.
該聚醯亞胺基材可具有400至500℃的玻璃轉化溫度與6至12GPa的模數,以及在50至400℃下具有1至8ppm/℃的熱膨脹係數。具體地,該聚醯亞胺基材可具有420至480℃的玻璃轉化溫度與6至11GPa的模數,以及在50至400℃下具有2至8ppm/℃的熱膨脹係數。The polyimide substrate may have a glass transition temperature of 400 to 500°C, a modulus of 6 to 12 GPa, and a thermal expansion coefficient of 1 to 8 ppm/°C at 50 to 400°C. Specifically, the polyimide substrate may have a glass transition temperature of 420 to 480°C, a modulus of 6 to 11 GPa, and a thermal expansion coefficient of 2 to 8 ppm/°C at 50 to 400°C.
該聚醯亞胺基材可具有550至620℃之1%重量分解的熱解溫度,以及以10µm的基材厚度為基礎,對於550nm的波長的光具有40至80%的透射率。具體地,該聚醯亞胺基材可具有550至600℃之1%重量分解的熱解溫度,以及以10µm的基材厚度為基礎,對於550nm的波長的光具有50至75%的透射率。The polyimide substrate may have a pyrolysis temperature of 550 to 620° C. for 1% weight decomposition, and a transmittance of 40 to 80% for light at a wavelength of 550 nm based on a substrate thickness of 10 μm. Specifically, the polyimide substrate may have a pyrolysis temperature of 550 to 600°C for 1% weight decomposition, and a transmittance of 50 to 75% for light at a wavelength of 550 nm based on a substrate thickness of 10 µm .
該聚醯亞胺基材可具有200至500Mpa的抗拉強度與0.01至10N/cm的剝離強度,以及在480℃下具有1至12小時之1%重量分解的分解時間。具體地,該聚醯亞胺基材可具有250至460Mpa的抗拉強度與0.5至5N/cm的剝離強度,以及在480℃下具有2至10小時之1%重量分解的分解時間。The polyimide substrate may have a tensile strength of 200 to 500 MPa and a peel strength of 0.01 to 10 N/cm, and a decomposition time of 1 to 12 hours at 480° C. for 1% by weight decomposition. Specifically, the polyimide substrate may have a tensile strength of 250 to 460 MPa and a peel strength of 0.5 to 5 N/cm, and a decomposition time of 2 to 10 hours at 480° C. for 1% by weight decomposition.
該聚醯亞胺基材的平均厚度可為3至30µm。用於製備一聚醯亞胺前驅物組成物的方法 The polyimide substrate can have an average thickness of 3 to 30 µm. Method for preparing a polyimide precursor composition
依據本發明之用於製備一聚醯亞胺前驅物組成物的方法包含: (1)藉由使一芳香族二酐與一芳香族二胺混合與反應以製備一聚醯胺酸溶液,該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA),該芳香族二胺包含對苯二胺(PPD); (2)將該聚醯胺酸溶液、一三級胺固化劑以及一抗氧化劑混合以製備一混合物;以及 (3)將該混合物與一具有至少四個羧基的芳香族羧酸混合。 步驟(1)The method for preparing a polyimide precursor composition according to the present invention comprises: (1) preparing a polyimide solution by mixing and reacting an aromatic dianhydride and an aromatic diamine, the The aromatic dianhydride includes 3,4,3',4'-biphenyltetracarboxylic dianhydride (BPDA), and the aromatic diamine includes p-phenylenediamine (PPD); (2) the polyamide acid solution , a tertiary amine curing agent, and an antioxidant are mixed to prepare a mixture; and (3) the mixture is mixed with an aromatic carboxylic acid having at least four carboxyl groups. step 1)
在此步驟中,一聚醯胺酸溶液是藉由使一芳香族二酐與一芳香族二胺混合與反應而製得,該芳香族二酐包含3,4,3',4'-聯苯四羧酸二酐(BPDA),該芳香族二胺包含對苯二胺(PPD)。In this step, a polyamic acid solution is prepared by mixing and reacting an aromatic dianhydride containing a 3,4,3',4'-diamine Benzenetetracarboxylic dianhydride (BPDA), the aromatic diamine includes p-phenylenediamine (PPD).
該步驟(1)可在30至90℃下進行。This step (1) can be carried out at 30 to 90°C.
在該步驟(1)中,一聚醯胺酸溶液可藉由一反應溶劑、3,4,3',4'-聯苯四羧酸二酐、一額外的芳香族二酐以及一芳香族二胺反應而製得,或者藉由使3,4,3',4'-聯苯四羧酸二酐、一額外的芳香族二酐以及一芳香族二胺混合與反應而製得。具體地,該步驟(1)可包含(1-1)使一反應溶劑、3,4,3',4'-聯苯四羧酸二酐、一額外的芳香族二酐以及一芳香族二胺混合與反應,以製備於23℃下具有100至10,000cP的黏度之一第一反應物;以及(1-2)將一芳香族二酐溶液(具有5%重量的固含量)分批添加至該第一反應物中而使得該第一反應物於23℃下的黏度為1,000至20,000cP,以及使生成物反應以製備一第二反應物。In this step (1), a polyamide acid solution can be prepared by a reaction solvent, 3,4,3',4'-biphenyltetracarboxylic dianhydride, an additional aromatic dianhydride and an aromatic It is prepared by reacting a diamine, or by mixing and reacting 3,4,3',4'-biphenyltetracarboxylic dianhydride, an additional aromatic dianhydride, and an aromatic diamine. Specifically, the step (1) may include (1-1) making a reaction solvent, 3,4,3',4'-biphenyltetracarboxylic dianhydride, an additional aromatic dianhydride and an aromatic dianhydride Amines are mixed and reacted to prepare a first reactant having a viscosity of 100 to 10,000 cP at 23°C; and (1-2) an aromatic dianhydride solution (having a solids content of 5% by weight) is added in portions into the first reactant so that the viscosity of the first reactant at 23° C. is 1,000 to 20,000 cP, and the resultant is reacted to prepare a second reactant.
該額外的芳香族二酐可為選自於由下列所構成之群組中的至少一者:焦蜜石酸二酐(PMDA)、3,3',4,4'-二苯基酮四羧酸二酐(BTDA)、2,3,3',4'-聯苯四羧酸二酐、1H,3H-萘并[2,3-c:6,7-c']二呋喃-1,3,6,8-四酮、2,3,6,7-萘四羧酸二酐、1,4,5,8-萘四羧酸二酐、4,4'-氧雙鄰苯二甲酸酐、4,4'-氧雙(2-苯并呋喃-1,3-二酮)、4-[(1,3-二氧-1,3-二氫-2-苯并呋喃-5-基)氧基]-2-苯并呋喃-1,3-二酮,以及5,5'-磺醯基雙-1,3-異苯并呋喃二酮。The additional aromatic dianhydride may be at least one selected from the group consisting of: pyromite dianhydride (PMDA), 3,3',4,4'-diphenylketone tetra Carboxylic dianhydride (BTDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride, 1H,3H-naphtho[2,3-c:6,7-c']difuran-1 ,3,6,8-tetraketone, 2,3,6,7-naphthalene tetracarboxylic dianhydride, 1,4,5,8-naphthalene tetracarboxylic dianhydride, 4,4'-oxybisphthalate Formic anhydride, 4,4'-oxybis(2-benzofuran-1,3-dione), 4-[(1,3-dioxo-1,3-dihydro-2-benzofuran-5 -yl)oxy]-2-benzofuran-1,3-dione, and 5,5'-sulfonylbis-1,3-isobenzofurandione.
該反應溶劑可為一以醯胺為基礎的非質子性溶劑。具體地,該反應溶劑可為選自於由下列所構成之群組中的至少一者:N,N'-二甲基甲醯胺、N,N'-二甲基乙醯胺,以及N-甲基吡咯啶酮(NMP)。The reaction solvent can be an amide-based aprotic solvent. Specifically, the reaction solvent may be at least one selected from the group consisting of: N,N'-dimethylformamide, N,N'-dimethylacetamide, and N - Methylpyrrolidone (NMP).
該第一反應物可藉由使100莫耳的芳香族二胺、42至99莫耳的BPDA以及0.1至57莫耳之額外的芳香族二酐混合,或者使100莫耳的芳香族二胺與92至99莫耳的BPDA混合,以及使該混合物於30至90℃下反應而製得。The first reactant can be prepared by mixing 100 moles of aromatic diamine, 42 to 99 moles of BPDA, and 0.1 to 57 moles of additional aromatic dianhydride, or 100 moles of aromatic diamine Prepared by mixing with 92 to 99 moles of BPDA and reacting the mixture at 30 to 90°C.
該第二反應物可藉由將每100莫耳的芳香族二胺0.1至57莫耳之額外的芳香族二酐溶液分批添加至該第一反應物中,繼而於30至90℃下使該生成物反應而製得。此外,該第二反應物可藉由將每100莫耳的芳香族二胺42至99莫耳的BPDA添加至該第一反應物中並且於30至90℃下使該生成物反應,繼而分批小量添加額外的芳香族二酐溶液來將該生成物在23℃下的黏度調整至1,000至20,000cP而製得。The second reactant can be added batchwise to the first reactant by adding 0.1 to 57 moles of additional aromatic dianhydride solution per 100 moles of aromatic diamine, followed by annealing at 30 to 90°C. The product is obtained by reacting. In addition, the second reactant can be separated by adding 42 to 99 moles of BPDA per 100 moles of aromatic diamine to the first reactant and reacting the resultant at 30 to 90° C. Prepared by adding additional aromatic dianhydride solution in small batches to adjust the viscosity of the resultant to 1,000 to 20,000 cP at 23°C.
該額外的芳香族二酐溶液的固含量可為1至10%重量或2至8%重量。該額外的芳香族二酐溶液的溶劑可相同於該反應溶劑。The solids content of the additional aromatic dianhydride solution may be 1 to 10% by weight or 2 to 8% by weight. The solvent of the additional aromatic dianhydride solution may be the same as the reaction solvent.
此外,該額外的芳香族二酐溶液可以10至30分鐘的間隔來添加。再者,該第二反應物可在添加焦蜜石酸二酐溶液時進行攪拌。Additionally, the additional aromatic dianhydride solution may be added at intervals of 10 to 30 minutes. Furthermore, the second reactant may be stirred during the addition of the pyromic acid dianhydride solution.
該聚醯胺酸溶液在23℃下可具有1,000至20,000cP的黏度。具體地,該聚醯胺酸溶液在23℃下可具有2,000至10,000cP的黏度。 步驟(2)The polyamide solution may have a viscosity of 1,000 to 20,000 cP at 23°C. Specifically, the polyamic acid solution may have a viscosity of 2,000 to 10,000 cP at 23°C. Step (2)
在此步驟中,使該聚醯胺酸溶液、一三級胺固化劑以及一抗氧化劑混合以製備一混合物。In this step, the polyamic acid solution, a tertiary amine curing agent and an antioxidant are mixed to prepare a mixture.
該三級胺固化劑與該抗氧化劑的種類是如同在該聚醯亞胺前驅物組成物中所界定的。The tertiary amine curing agent and the antioxidant species are as defined in the polyimide precursor composition.
該步驟(2)可在30至90℃下進行。具體地,該步驟(2)可在40至80℃下進行。This step (2) can be carried out at 30 to 90°C. Specifically, this step (2) may be performed at 40 to 80°C.
該三級胺固化劑可以每100莫耳的聚醯胺酸0.1至50莫耳的用量來使用。具體地,該三級胺固化劑可包含,每100莫耳的聚醯胺酸有5至50莫耳的吡啶、β-甲吡啶或異喹啉,以及0.1至2莫耳的三伸乙二胺。The tertiary amine curing agent can be used in an amount of 0.1 to 50 moles per 100 moles of the polyamic acid. Specifically, the tertiary amine curing agent may comprise 5 to 50 moles of pyridine, β-picoline or isoquinoline, and 0.1 to 2 moles of triethylenediene per 100 moles of polyamide acid. amine.
以該聚醯亞胺前驅物組成物的總重為基礎,該抗氧化劑可以0.1至2%重量的用量來使用。具體地,以該聚醯亞胺前驅物組成物的總重為基礎,該抗氧化劑可以0.2至1%重量的用量來使用。 步驟(3)The antioxidant may be used in an amount of 0.1 to 2% by weight based on the total weight of the polyimide precursor composition. Specifically, the antioxidant may be used in an amount of 0.2 to 1% by weight based on the total weight of the polyimide precursor composition. Step (3)
在此步驟中,將該混合物與一具有至少四個羧基的芳香族羧酸混合。In this step, the mixture is mixed with an aromatic carboxylic acid having at least four carboxyl groups.
該步驟(3)可在30至90℃下進行。具體地,該步驟(3)可在40至80℃下進行。This step (3) can be carried out at 30 to 90°C. Specifically, this step (3) can be carried out at 40 to 80°C.
該芳香族羧酸可以每100莫耳的芳香族二胺1至8莫耳的用量來使用。具體地,該芳香族羧酸可以每100莫耳的芳香族二胺1至6莫耳的用量來使用。實施本發明的具體例 The aromatic carboxylic acid can be used in an amount of 1 to 8 moles per 100 moles of the aromatic diamine. Specifically, the aromatic carboxylic acid may be used in an amount of 1 to 6 moles per 100 moles of the aromatic diamine. SPECIFIC EXAMPLES OF IMPLEMENTING THE INVENTION
下文中,本發明藉由下列實施例而被詳細地說明。下列實施例意欲用來進一步例示說明本發明。本發明的範疇不受限於此。[ 實施例] Hereinafter, the present invention is explained in detail by the following examples. The following examples are intended to further illustrate the present invention. The scope of the present invention is not limited to this. [ Example]
在下列實施例與比較例中所使用之化合物的縮寫如下。 -3,4,3',4'-聯苯四羧酸二酐:BPDA -焦蜜石酸二酐:PMDA -對苯二胺:PPD -3,3',4,4'-二苯基酮四羧酸二酐:BTDA -N-甲基吡咯啶酮:NMP -焦蜜石酸:PMA -3,3',4,4'-聯苯四羧酸:BPTA -異喹啉:IQ -三伸乙二胺:DABCOThe abbreviations of the compounds used in the following Examples and Comparative Examples are as follows. -3,4,3',4'-biphenyltetracarboxylic dianhydride: BPDA -Pyromelic acid dianhydride: PMDA -p-phenylenediamine: PPD -3,3',4,4'-diphenyl Ketotetracarboxylic dianhydride: BTDA -N-Methylpyrrolidone: NMP -Pyromelic acid: PMA -3,3',4,4'-Biphenyltetracarboxylic acid: BPTA -Isoquinoline: IQ - Triethylenediamine: DABCO
此外,在下列實施例與比較例中所使用的抗氧化劑為ADEKA Co., Ltd的ADK STAB FP-900L(下文中意指為“FP-900L”)。實施例1 :製備一聚醯亞胺前驅物組成物 In addition, the antioxidant used in the following Examples and Comparative Examples was ADK STAB FP-900L (hereinafter referred to as "FP-900L") of ADEKA Co., Ltd. Example 1 : Preparation of a polyimide precursor composition
將300g的NMP裝入一裝配有一攪拌器與氮氣入口/出口的500ml反應器中同時導入氮氣。在將該反應器的溫度設定為30℃後,將27.19g的PPD、35.74g的BPDA、0.87g的BTDA以及28.00g的PMDA添加至其中,並且攪拌該混合物直到完全溶解與反應。當反應完成時,將1.44g的PMDA溶解於呈5%重量的濃度之NMP中,其是以10分鐘的間隔來添加直到該混合物於23℃下的黏度達至6,000cP。之後,每100莫耳的聚醯胺酸依序添加1莫耳的DABCO與10莫耳的IQ。以該聚醯胺酸的總重為基礎添加呈1%重量的濃度之FP-900L,繼而進行攪拌。接著,每100莫耳的PPD添加4莫耳的PMA。將生成物充分地攪拌直到反應完成。接著添加NMP來將總固含量調整至20%重量,藉此製備一聚醯亞胺前驅物組成物(23℃下具有3,500cP的黏度,具有20%重量的固含量以及23,000g/莫耳的重量平均分子量)。 重量平均分子量300 g of NMP was charged into a 500 ml reactor equipped with a stirrer and nitrogen inlet/outlet while introducing nitrogen. After the temperature of the reactor was set to 30°C, 27.19 g of PPD, 35.74 g of BPDA, 0.87 g of BTDA, and 28.00 g of PMDA were added thereto, and the mixture was stirred until complete dissolution and reaction. When the reaction was complete, 1.44 g of PMDA was dissolved in NMP at a concentration of 5% by weight, which was added at 10 minute intervals until the viscosity of the mixture at 23°C reached 6,000 cP. After that, 1 mole of DABCO and 10 moles of IQ were added sequentially per 100 moles of polyamide. FP-900L was added at a concentration of 1% by weight based on the total weight of the polyamide, followed by stirring. Next, 4 moles of PMA were added per 100 moles of PPD. The resultant was stirred well until the reaction was complete. Next, NMP was added to adjust the total solids to 20% by weight, thereby preparing a polyimide precursor composition (viscosity of 3,500 cP at 23°C, solids of 20% by weight and 23,000 g/mol of weight average molecular weight). weight average molecular weight
重量平均分子量是使用得自於Agilent Technologies的HPLC 1260 Infinity II型來進行量測。具體地,將該聚醯亞胺前驅物組成物以1%重量的濃度溶解於一移動相NMP溶液中,透過一0.45µm濾紙來進行過濾,接著拿來進行量測。該聚醯亞胺前驅物組成物的重量平均分子量是在PLgel 5mm Mixed-D管柱、0.9ml/min的流速以及50℃的量測溫度之條件下來進行量測。在量測之前,在與如上所述相同的量測條件下將聚苯乙烯用來作為標準物質,俾以獲得一用來量測重量平均分子量的校正曲線。 黏度與儲存穩定性The weight average molecular weight was measured using an HPLC 1260 Infinity Model II from Agilent Technologies. Specifically, the polyimide precursor composition was dissolved in a mobile phase NMP solution at a concentration of 1% by weight, filtered through a 0.45µm filter paper, and then used for measurement. The weight average molecular weight of the polyimide precursor composition was measured under the conditions of a PLgel 5mm Mixed-D column, a flow rate of 0.9 ml/min, and a measurement temperature of 50°C. Before the measurement, polystyrene was used as a standard substance under the same measurement conditions as described above to obtain a calibration curve for measuring the weight-average molecular weight. Viscosity and Storage Stability
該聚醯亞胺前驅物組成物的黏度是在室溫(23℃)下使用得自於Thermo Electron的Rheostress 600型黏度計來進行量測。此外,令它處於室溫(23℃)下歷時30天之後,再次量測黏度。若在儲存時黏度變化為10%或更多則儲存穩定性被評估為低,而若在儲存時黏度變化低於10%則儲存穩定性被評估為高。實施例2 The viscosity of the polyimide precursor composition was measured at room temperature (23°C) using a Rheostress 600 viscometer from Thermo Electron. Furthermore, after allowing it to stand at room temperature (23°C) for 30 days, the viscosity was measured again. The storage stability was evaluated as low if the viscosity change on storage was 10% or more, and the storage stability was evaluated as high if the viscosity change on storage was less than 10%. Example 2
使用與實施例1相同的方法來製備一聚醯亞胺前驅物組成物(於23℃下具有3,300cP的黏度,具有20%的固含量以及22,000g/莫耳的重量平均分子量),除了沒有使用PMDA來作為芳香族二酐,以及BPDA是以每100莫耳的PPD 95莫耳的含量來使用。比較例1 A polyimide precursor composition (having a viscosity of 3,300 cP at 23°C, having a solids content of 20% and a weight average molecular weight of 22,000 g/mol) was prepared using the same method as in Example 1, except that no PMDA was used as the aromatic dianhydride, and BPDA was used in a content of 95 moles per 100 moles of PPD. Comparative Example 1
使用與實施例1相同的方法來製備一聚醯亞胺前驅物組成物(於23℃下具有270,000cP的黏度,具有20%的固含量以及220,000g/莫耳的重量平均分子量),除了令54莫耳的PMDA作為芳香族二酐來與100莫耳的PPD反應,其起始反應器溫度為20℃,並且沒有使用三級胺固化劑、芳香族羧酸組分以及抗氧化劑。在此情況下,由於高黏度而難以獲得均勻呈一薄膜的聚醯亞胺基材,其使得無法去量測該基材的物理性質。亦證實的是,該聚醯亞胺前驅物組成物自身的儲存穩定性是低的。比較例2 A polyimide precursor composition (having a viscosity of 270,000 cP at 23°C, having a solids content of 20% and a weight average molecular weight of 220,000 g/mol) was prepared using the same method as in Example 1, except that the 54 moles of PMDA was reacted with 100 moles of PPD as an aromatic dianhydride with an initial reactor temperature of 20°C and no tertiary amine curing agent, aromatic carboxylic acid components and antioxidants were used. In this case, it is difficult to obtain a uniform polyimide substrate in a thin film due to the high viscosity, which makes it impossible to measure the physical properties of the substrate. It was also confirmed that the storage stability of the polyimide precursor composition itself was low. Comparative Example 2
使用與比較例1相同的方法來製備一聚醯亞胺前驅物組成物(於23℃下具有4,000cP的黏度,具有20%的固含量以及24,000g/莫耳的重量平均分子量),除了令50莫耳的PMDA作為芳香族二酐來與100莫耳的PPD反應。在此情況下,該組成物隨著時間的儲存穩定性是低的。在經歷一段時間之後,由於黏度顯著地減少而難以獲得均勻呈一薄膜的聚醯亞胺基材,其使得無法去量測該基材的物理性質。比較例3 至6 A polyimide precursor composition (having a viscosity of 4,000 cP at 23° C., having a solids content of 20% and a weight average molecular weight of 24,000 g/mol) was prepared using the same method as in Comparative Example 1, except that the 50 mol of PMDA was reacted with 100 mol of PPD as an aromatic dianhydride. In this case, the storage stability of the composition over time is low. After a period of time, it is difficult to obtain a uniform polyimide substrate as a thin film due to a significant reduction in viscosity, which makes it impossible to measure the physical properties of the substrate. Comparative Examples 3 to 6
使用與實施例1相同的方法來製備各個聚醯亞胺前驅物組成物,除了使用如下面表1中所示的芳香族二酐組分、芳香族羧酸組分、三級胺固化劑以及抗氧化劑。 [表1]
令實施例1與2以及比較例1至6的聚醯亞胺前驅物組成物個別於1,500rpm或更高下進行高速旋轉以移除氣泡。之後,使用一旋轉塗佈機將經消泡的聚醯亞胺前驅物組成物施用於一玻璃基材上。接著,令它於氮氣氛圍下且於120℃下進行乾燥歷時30分鐘,以2℃/min的速率加熱至450℃,於450℃下進行熱處理歷時60分鐘,並且以2℃/min的速率冷卻至30℃,藉此而製得一聚醯亞胺基材。之後,將它浸泡於蒸餾水中以使該聚醯亞胺基材自該玻璃基材上剝離。由此所製得之聚醯亞胺基材的厚度為10µm。The polyimide precursor compositions of Examples 1 and 2 and Comparative Examples 1 to 6 were individually rotated at high speed at 1,500 rpm or higher to remove air bubbles. Thereafter, the defoamed polyimide precursor composition was applied to a glass substrate using a spin coater. Next, it was dried under nitrogen atmosphere at 120°C for 30 minutes, heated to 450°C at a rate of 2°C/min, heat treated at 450°C for 60 minutes, and cooled at a rate of 2°C/min to 30°C, thereby preparing a polyimide substrate. After that, it was soaked in distilled water to peel the polyimide substrate from the glass substrate. The resulting polyimide substrate had a thickness of 10 µm.
所製得之聚醯亞胺基材的厚度是使用得自於Anritsu的電子薄膜厚度測定器來進行量測。測試例:評估物理性質 The thickness of the prepared polyimide substrate was measured using an electronic film thickness meter from Anritsu. Test Example: Evaluation of Physical Properties
在製備例中所製得之聚醯亞胺基材是藉由下列方法來進行物理性質量測。結果顯示於表2中。 (1)玻璃轉化溫度The polyimide substrates prepared in the preparation examples were subjected to physical quality measurement by the following methods. The results are shown in Table 2. (1) Glass transition temperature
將該聚醯亞胺基材裁切成4mm的寬度以及20mm的長度,接著使用得自於TA的Dynamic Mechanical Analysis Q800型在介於室溫與550℃之間的溫度範圍內以5℃/min的提升速率並在氮氣氛圍下來進行玻璃轉化溫度量測。該玻璃轉化溫度是以依據儲存模數與耗損模數的比率所計算之tan δ的最大波峰來決定。 (2)1%重量分解的溫度The polyimide substrate was cut to a width of 4 mm and a length of 20 mm and then used a Dynamic Mechanical Analysis model Q800 from TA at 5°C/min over a temperature range between room temperature and 550°C and the glass transition temperature measurement was carried out under nitrogen atmosphere. The glass transition temperature is determined by the maximum peak of tan δ calculated from the ratio of storage modulus to loss modulus. (2) 1% weight decomposition temperature
1%重量分解的溫度是使用得自於TA的熱重分析Q50型來進行量測。將該聚醯亞胺基材於氮氣氛圍下以10℃/min的速率加熱至150℃,並令其處於恆溫下歷時30分鐘以移除水分。接著,將溫度以10℃/min的速率提升至600℃以量測減少1%重量的溫度。 (3)熱膨脹係數(CTE)The 1% weight decomposition temperature was measured using a Thermogravimetric Analysis Model Q50 from TA. The polyimide substrate was heated to 150°C at a rate of 10°C/min under nitrogen atmosphere and allowed to stand at a constant temperature for 30 minutes to remove moisture. Next, the temperature was raised to 600°C at a rate of 10°C/min to measure the temperature for 1% weight loss. (3) Coefficient of Thermal Expansion (CTE)
熱膨脹係數是使用得自於TA的熱機械分析Q400型來進行量測。將該聚醯亞胺基材裁切成2mm的寬度以及10mm的長度,於氮氣氛圍下且於0.05N的張力下以10℃/min的速率從室溫升溫至480℃接著以10℃/min的速率來進行冷卻。量測在50℃與400℃之間的區域的斜率。 (4)模數與抗拉強度The coefficient of thermal expansion was measured using a Thermomechanical Analysis Model Q400 from TA. The polyimide substrate was cut into a width of 2 mm and a length of 10 mm, and was heated from room temperature to 480° C. at a rate of 10° C./min under a nitrogen atmosphere and a tension of 0.05 N, followed by 10° C./min. rate for cooling. The slope of the region between 50°C and 400°C is measured. (4) Modulus and tensile strength
將該聚醯亞胺基材裁切成10mm的寬度以及40mm的長度,依據ASTM D-882使用得自於Instron的Instron5564 UTM來量測模數與抗拉強度。在此情況下,用於量測的十字頭速度(cross head speed)為5mm/min。 (5)550nm波長的光之透射率The polyimide substrate was cut to a width of 10 mm and a length of 40 mm, and the modulus and tensile strength were measured according to ASTM D-882 using Instron 5564 UTM from Instron. In this case, the cross head speed used for the measurement was 5 mm/min. (5) Transmittance of light with a wavelength of 550 nm
得自於Perkin Elmer的Lambda 465型用來作為UV-Vis分光光度計。測量在550nm模式下的透射率。 [表2]
如表1與2所證實的,實施例1與2的聚醯亞胺前驅物組成物具有低黏度與高儲存穩定性,即使它們具有20%重量的高固含量。此外,由實施例1與2的聚醯亞胺前驅物組成物所製得的聚醯亞胺基材在耐熱性、模數、抗拉強度以及透光率上是優異的,亦具有低熱膨脹係數。As demonstrated in Tables 1 and 2, the polyimide precursor compositions of Examples 1 and 2 have low viscosity and high storage stability, even though they have a high solids content of 20% by weight. In addition, the polyimide substrates prepared from the polyimide precursor compositions of Examples 1 and 2 are excellent in heat resistance, modulus, tensile strength and light transmittance, and also have low thermal expansion coefficient.
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