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TWI750226B - Hard coat film for adhering inorganic compound layer, and transparent conductive film and touch panel using the hard coat film - Google Patents

Hard coat film for adhering inorganic compound layer, and transparent conductive film and touch panel using the hard coat film Download PDF

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TWI750226B
TWI750226B TW106131880A TW106131880A TWI750226B TW I750226 B TWI750226 B TW I750226B TW 106131880 A TW106131880 A TW 106131880A TW 106131880 A TW106131880 A TW 106131880A TW I750226 B TWI750226 B TW I750226B
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hard coat
layer
inorganic compound
coat film
particles
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TW106131880A
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Chinese (zh)
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TW201827227A (en
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中山一
濱村昌実
佐瀬輝弘
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日商木本股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/18Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer of foamed material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/546Flexural strength; Flexion stiffness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/724Permeability to gases, adsorption
    • B32B2307/7242Non-permeable
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208Touch screens

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  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)

Abstract

本發明係以提供一種具有可提升與無機化合物層的接著性之硬塗層的硬塗膜為目的。尤以提供一種不太會隨時間經過而變化,可良好地維持接著性的硬塗膜為目的。   解決手段為,本發明之硬塗膜係用來在硬塗層上接著無機化合物層。硬塗層係包含經修飾成具有反應性的粒子與黏結劑樹脂,且前述粒子的含量,相對於前述黏結劑樹脂固含量的100重量份為1重量份以上60重量份以下。The present invention aims to provide a hard coat film having a hard coat layer capable of improving adhesion with an inorganic compound layer. In particular, the purpose is to provide a hard coat film which does not change with the passage of time and can maintain good adhesion. The solution is that the hard coat film of the present invention is used to adhere an inorganic compound layer on the hard coat layer. The hard coat layer includes particles modified to be reactive and a binder resin, and the content of the particles is 1 part by weight or more and 60 parts by weight or less with respect to 100 parts by weight of the solid content of the binder resin.

Description

無機化合物層接著用之硬塗膜、及使用該硬塗膜之透明導電性膜及觸控面板Hard coat film for following inorganic compound layer, and transparent conductive film and touch panel using the hard coat film

[0001] 本發明係有關於一種適用於電極膜、阻氣膜等之具有用來接著無機化合物層的硬塗層之硬塗膜。[0001] The present invention relates to a hard coat film having a hard coat layer for adhering an inorganic compound layer, which is suitable for electrode films, gas barrier films, and the like.

[0002] 觸控面板所使用的電極膜係在層合於透明基材表面的硬塗層上藉由濺鍍法形成ITO(摻錫氧化銦)膜,並在ITO膜上藉由蝕刻形成電極圖型而作成。   專利文獻1揭示一種在硬塗層上形成如ITO之透明導電層時,此等層具有良好的接著性之硬塗膜之技術。   然而,對於在硬塗層上形成有ITO膜的電極膜,存在有ITO膜的部分與去除掉ITO的部分會產生光學特性(透射率、色相、反射率等)的差異,而發生電極圖型顯露的現象,致外觀變差。因此,近年來,電極膜係採用將用來調整光學特性的光學調整層配置於硬塗層與ITO膜之間的構成。藉此,存在有ITO膜的部分的光學特性、與去除掉ITO膜而使光學調整層露出的部分的光學特性的差異變小,使得電極圖型變得較不顯眼。 [先前技術文獻] [專利文獻]   [0003]   [專利文獻1] 日本特開2015-183168號公報The electrode film used in the touch panel is formed by sputtering on the hard coat layer laminated on the surface of the transparent substrate to form an ITO (tin-doped indium oxide) film, and an electrode is formed on the ITO film by etching pattern made. Patent Document 1 discloses a technique of forming a transparent conductive layer such as ITO on a hard coat layer, such that the layer has a hard coat film with good adhesion. However, in the electrode film in which the ITO film is formed on the hard coat layer, there is a difference in optical characteristics (transmittance, hue, reflectance, etc.) between the portion where the ITO film is present and the portion where the ITO is removed, and electrode patterning occurs. The phenomenon of revealing, resulting in poor appearance. Therefore, in recent years, the electrode film system adopts a structure in which an optical adjustment layer for adjusting optical properties is arranged between the hard coat layer and the ITO film. Thereby, the difference between the optical characteristics of the part where the ITO film is present and the optical characteristics of the part where the ITO film is removed and the optical adjustment layer is exposed becomes smaller, and the electrode pattern becomes less conspicuous. [Prior Art Document] [Patent Document] [0003] [Patent Document 1] Japanese Patent Laid-Open No. 2015-183168

[發明所欲解決之課題]   [0004] 如上述,在硬塗層與ITO膜之間具有光學調整層的電極膜,由於係在硬塗層上藉由濺鍍法形成光學調整層,因此便需要具有與光學調整層的接著性良好之硬塗層的膜。尤其是,為了提高電極膜的可靠性,而期望不太會隨時間經過而變化,可良好地維持與光學調整層的接著性。   [0005] 專利文獻1雖揭示藉由對硬塗層摻混既定的疏水化二氧化矽凝膠及特定的調平劑,可達到硬塗層與ITO之良好的接著性,但關於與光學調整層的接著性卻無任何揭示或教示。   [0006] 因此,本發明係以提供一種具有可提升與無機化合物層的接著性之硬塗層的硬塗膜(下稱「硬塗膜」)為目的。尤以提供一種不太會隨時間經過而變化,可良好地維持接著性的硬塗膜為目的。 [解決課題之手段]   [0007] 本發明之硬塗膜係用來在硬塗層上接著無機化合物層。硬塗層係包含經修飾成具有反應性的粒子與黏結劑樹脂,且前述粒子的含量,相對於前述黏結劑樹脂固含量的100重量份為1重量份以上60重量份以下。   [0008] 又,本發明之硬塗膜,較佳的是前述粒子的平均粒徑為100nm以上1000nm以下。   [0009] 又,本發明之硬塗膜,較佳的是當前述粒子以一次粒子的凝聚體構成二次粒子時,前述一次粒子的粒徑為1nm以上100nm以下。   [0010] 又,本發明之硬塗膜,較佳的是前述粒子為二氧化矽、氧化鋁、鈦、氧化鋯、碳酸鈣、碳酸鎂、硫酸鋇、或此等的2種以上之組合。   [0011] 又,本發明之硬塗膜,較佳的是前述粒子係具有丙烯醯基、羥基、羧基、胺基、環氧基、異氰酸酯基、或此等官能基的2種以上之組合。   [0012] 又,本發明之硬塗膜,較佳的是以依據 JIS-K5600-5-1(1999)之圓筒形心軸法所測得的前述硬塗層之耐彎曲試驗的值為6mm以下。   [0013] 又,本發明之硬塗膜,較佳的是在對前述膜層合無機化合物層,並進行煮沸處理後的沙漏交叉切割剝離試驗中,無機化合物層僅由硬塗層部分地剝落或較此更良好。   [0014] 又,本發明之硬塗膜,較佳的是前述無機化合物層為光學調整層或氣體阻隔層。   [0015] 又,本發明之硬塗膜,較佳的是前述無機化合物為SiO2 或Nb2 Ox (惟4≦x≦5)。   [0016] 又,本發明之硬塗膜,較佳的是前述無機化合物層係以單層或多層所構成。   [0017] 又,本發明之透明導電性膜,其特徵為使用上述之本發明之硬塗膜。   [0018] 又,本發明之觸控面板,其特徵為使用上述之本發明之硬塗膜。 [發明之效果]   [0019] 根據本發明,可提升無機化合物層與硬塗層的接著性。尤其是,其不太會隨時間經過而變化,可良好地維持接著性。[Problems to be Solved by the Invention] [0004] As described above, the electrode film having the optical adjustment layer between the hard coat layer and the ITO film, since the optical adjustment layer is formed on the hard coat layer by the sputtering method, it is easy to A film having a hard coat layer with good adhesion to the optical adjustment layer is required. In particular, in order to improve the reliability of the electrode film, it is desirable that it is less likely to change with time, and that the adhesion to the optical adjustment layer can be maintained favorably. Although Patent Document 1 discloses that by mixing a predetermined hydrophobized silica gel and a specific leveling agent into the hard coat layer, good adhesion between the hard coat layer and ITO can be achieved, but it is not related to optical adjustment. The continuity of the layers is not revealed or taught in any way. [0006] Therefore, the present invention aims to provide a hard coat film (hereinafter referred to as "hard coat film") having a hard coat layer that can improve adhesion with an inorganic compound layer. In particular, the purpose is to provide a hard coat film which does not change with the passage of time and can maintain good adhesion. [MEANS TO SOLVE THE PROBLEM] [0007] The hard coat film of the present invention is used to adhere an inorganic compound layer on the hard coat layer. The hard coat layer includes particles modified to be reactive and a binder resin, and the content of the particles is 1 part by weight or more and 60 parts by weight or less with respect to 100 parts by weight of the solid content of the binder resin. [0008] Also, in the hard coat film of the present invention, it is preferable that the average particle diameter of the aforementioned particles is 100 nm or more and 1000 nm or less. [0009] Furthermore, in the hard coat film of the present invention, it is preferable that the particle diameter of the primary particles is not less than 1 nm and not more than 100 nm when the particles constitute secondary particles as aggregates of primary particles. [0010] Also, in the hard coat film of the present invention, it is preferable that the aforementioned particles be a combination of two or more of silicon dioxide, aluminum oxide, titanium, zirconium oxide, calcium carbonate, magnesium carbonate, barium sulfate, or these. [0011] Also, in the hard coat film of the present invention, it is preferable that the aforementioned particle system has a combination of two or more of acryl group, hydroxyl group, carboxyl group, amino group, epoxy group, isocyanate group, or these functional groups. Also, the hard coating film of the present invention is preferably based on the value of the bending resistance test of the aforementioned hard coating measured by the cylindrical mandrel method of JIS-K5600-5-1 (1999). 6mm or less. Also, in the hard coat film of the present invention, preferably, in the above-mentioned film lamination inorganic compound layer, and carrying out the hourglass cross-cut peeling test after the boiling treatment, the inorganic compound layer is only partially peeled off by the hard coat layer. or better. [0014] Also, in the hard coat film of the present invention, preferably the aforementioned inorganic compound layer is an optical adjustment layer or a gas barrier layer. [0015] Also, in the hard coat film of the present invention, preferably the inorganic compound is SiO 2 or Nb 2 O x (only 4≦x≦5). [0016] Also, the hard coat film of the present invention, preferably the above-mentioned inorganic compound layer is composed of a single layer or multiple layers. [0017] Also, the transparent conductive film of the present invention is characterized by using the above-mentioned hard coat film of the present invention. [0018] Furthermore, the touch panel of the present invention is characterized by using the above-mentioned hard coat film of the present invention. [Effect of the Invention] [0019] According to the present invention, the adhesion between the inorganic compound layer and the hard coat layer can be improved. In particular, it is unlikely to change with time, and the adhesiveness can be maintained favorably.

[0021] 以下,參照圖1至圖5,對本發明之用來接著無機化合物層40的硬塗膜1之實施形態加以說明。此外,無機化合物層40,只要為具有無機化合物的層,則可為包含無機化合物的層之情形,亦可為無機化合物其本身的層之情形。   [0022] 本發明之硬塗膜1,其特徵為具有硬塗層20,硬塗層20係包含經修飾成具有反應性的粒子(反應性修飾粒子)21與黏結劑樹脂22,且反應性修飾粒子21的含量,相對於黏結劑樹脂22的100重量份為1重量份以上60重量份以下。   [0023] 本發明之實施形態,作為其基本構成,係如圖1(a)所示,具備支持體10與形成於支持體10上的硬塗層20。硬塗膜1非僅為圖1(a)所示者,亦可為硬塗層單層的膜(圖1(b)),也可在支持體10之與形成有硬塗層20的面相反之一側的面具備背塗層(圖1(c))。   [0024] 此種硬塗膜1係如圖2所示,在硬塗層20上層合無機化合物層40。此時,硬塗層20係對無機化合物層40具有優良的接著性。   [0025] 首先,就構成硬塗層20的反應性修飾粒子21與黏結劑樹脂22加以說明。   [0026] 黏結劑樹脂22係具有作為後述之反應性修飾粒子21的黏結劑之機能。黏結劑樹脂22較佳具有反應性官能基。此時,其與反應性修飾粒子21的反應性官能基鍵結,可有效地防止反應性修飾粒子21的脫落。作為黏結劑樹脂22的反應性官能基,可舉出丙烯醯基、羥基、羧基、胺基、環氧基、異氰酸酯基等。   [0027] 就黏結劑樹脂22而言,可單獨使用或以2種以上組合游離輻射線硬化性樹脂、熱硬化性樹脂、熱塑性樹脂等的樹脂,可視目的區分使用。其中,需要更優良的硬度時,較佳使用游離輻射線硬化樹脂。   [0028] 作為游離輻射線硬化性樹脂,可舉出可藉由照射游離輻射線(紫外線或電子束)而達到交聯硬化的樹脂,特佳使用例如1分子中具有1或2個以上之(甲基)丙烯醯基的丙烯酸樹脂。作為此丙烯酸系化合物,可舉出胺基甲酸酯(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、環氧(甲基)丙烯酸酯、三聚氰胺(甲基)丙烯酸酯、多氟烷基(甲基)丙烯酸酯、矽氧烷(甲基)丙烯酸酯等。   [0029] 作為熱硬化性樹脂,可舉出例如聚酯丙烯酸酯系樹脂、聚胺基甲酸酯丙烯酸酯系樹脂、環氧丙烯酸酯系樹脂、環氧系樹脂、三聚氰胺系樹脂、酚系樹脂、聚矽氧系樹脂等。   [0030] 作為熱塑性樹脂,可舉出例如聚酯系樹脂、丙烯酸系樹脂、聚碳酸酯系樹脂、纖維素系樹脂、縮醛系樹脂、乙烯基系樹脂、聚乙烯系樹脂、聚苯乙烯系樹脂、聚丙烯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、氟系樹脂等。   [0031] 又,黏結劑樹脂22更佳包含一定量的高分子量樹脂。藉由組合高分子量樹脂與後述之反應性修飾粒子21,可對硬塗層20在不損及硬度下賦予某種程度的柔軟性,而能夠提高無機化合物層40對硬塗層20的錨定效應。藉此,可進一步提升硬塗層20與無機化合物層40的接著性。   高分子量樹脂係指重量平均分子量(Mw)為10000以上的樹脂,較佳為10000~150000,更佳為30000~100000。   就高分子量樹脂而言,可單獨使用或以2種以上組合游離輻射線硬化性樹脂、熱硬化性樹脂、熱塑性樹脂等的樹脂。作為游離輻射線硬化性樹脂、熱硬化性樹脂、熱塑性樹脂的實例,係與上述列舉作為黏結劑樹脂22之游離輻射線硬化性樹脂、熱硬化性樹脂、熱塑性樹脂的實例者相同。   就其含量,相對於黏結劑樹脂22(固含量)100重量份,為1重量份以上50重量份以下,更佳為5重量份以上40重量份以下。此外,當黏結劑樹脂22包含高分子量樹脂時,「黏結劑樹脂22(固含量)」係指包含高分子量樹脂之黏結劑樹脂22全體的固含量。   [0032] 反應性修飾粒子21係有助於提升硬塗層20對無機化合物層40的接著性、及隨時間經過維持接著性。   反應性修飾粒子21係一種藉由對無機系粒子的表面實施修飾處理,而對無機系粒子的表面賦予反應性官能基的粒子。反應性官能基透過與黏結劑樹脂22的反應性官能基鍵結,而防止反應性修飾粒子21從硬塗層20脫落。又,經推察透過具有反應性官能基,在高溫多濕狀態下仍可維持與無機化合物層的接著性。   作為無機系粒子的一例,可舉出二氧化矽、氧化鋁、鈦、氧化鋯、碳酸鈣、碳酸鎂、硫酸鋇等,可單獨或以2種以上組合使用此等無機系粒子。作為反應性官能基,可例示例如丙烯醯基、羥基、羧基、胺基、環氧基、異氰酸酯基等,可單獨及組合使用此等反應性官能基的2種以上。   [0033] 反應性修飾粒子21的含量,為了使其發揮對無機化合物層40的接著性,反應性修飾粒子21的下限值,相對於黏結劑樹脂22(固含量)的100重量份為1重量份以上,較佳為3重量份以上,更佳為5重量份以上,最佳為10重量份以上。另一方面,反應性修飾粒子21的上限值不特別限定,惟相對於黏結劑樹脂22(固含量)的100重量份為60重量份以下,較佳為40重量份以下,更佳為30重量份以下。   反應性修飾粒子21的含量少於上述範圍時,與無機化合物層40的接著性有減弱的傾向。另一方面,多於上述範圍時,則不易保持透明性而不佳。   [0034] 反應性修飾粒子21只要為既定的大小,則可為一次粒子或屬凝聚體的二次粒子;而為了進一步獲得接著性,較佳為二次粒子。對於將屬一次粒子之凝聚體的二次粒子作為反應性修飾粒子21使用時,比起僅使用同等大小之一次粒子的情形接著性更為提升的理由尚且不明,研判可能是朝表面突出的粒子與無機化合物層40的接觸面積增加所致。   反應性修飾粒子21的平均粒徑(包含以一次粒子或由一次粒子構成的凝聚體形式之二次粒子)係隨硬塗層20的厚度而異,無法一概而論,惟下限值為100nm以上,較佳為110nm以上,更佳為130nm以上。又,上限值為1000nm以下,較佳為800nm以下,更佳為600nm以下。再者,上述中,當反應性修飾粒子21以屬一次粒子之凝聚體的二次粒子所構成時,屬該二次粒子之構成物的一次粒子的平均粒徑,其下限值為1nm以上,較佳為20nm以上,更佳為30nm以上。又,上限值為100nm以下,較佳為80nm以下,更佳為60nm以下。   藉由使反應性修飾粒子21的平均粒徑或者反應性修飾粒子21以二次粒子構成時的一次粒子的平均粒徑為上述之下限值以上,可獲得對無機化合物層40的接著性。另一方面,藉由使此等的平均粒徑分別為上述之上限值以下,可獲得可使用於透明用途的透光性。   此外,粒子的平均粒徑係指可藉由雷射繞射・散射法測得之體積平均粒徑(D50)的值。   [0035] 硬塗層20中,亦可進一步依據硬化方法而包含光起始劑、硬化劑等。   作為光起始劑,可舉出苯乙酮類、二苯甲酮類、米氏酮、安息香、苄基甲基縮酮、苯甲醯基苯甲酸酯、α-醯基肟酯、噻噸酮類等的光自由基聚合起始劑、或鎓鹽類、磺酸酯、有機金屬錯合物等的光陽離子聚合起始劑。   又,作為硬化劑,可配合適合之樹脂適宜使用聚異氰酸酯、胺基樹脂、環氧樹脂、羧酸等的化合物。   [0036] 硬塗層20中,在不妨害性能的範圍內,除上述之黏結劑樹脂、高分子樹脂、反應性修飾粒子、光起始劑、硬化劑外,亦可進一步包含抗靜電劑、分散劑、凝集劑、紫外線吸收劑、抗氧化劑、調平劑等的添加劑。   [0037] 硬塗層20的厚度(參照圖1(a)之L),當硬塗膜1具備支持體10時,為0.1~10.0μm,較佳為0.5~5.0μm,更佳為1.0~3.0μm。又,當硬塗膜1除支持體10外亦具備背塗層30時,則為0.1~10.0μm,較佳為1.0~5.0μm,更佳為1.0~3.0μm。透過具有此種厚度,可改善硬塗層20與無機化合物層40的接著性。   此外,若為硬塗層單層時,其厚度為0.1~10.0μm,較佳為0.5~5.0μm,更佳為1.0~3.0μm。藉由使厚度達0.1μ以上,則具有與無機化合物層40的接著性,同時可使塗膜強度更充分,並使操作性更良好。   硬塗層20的厚度係使用反射分光膜厚計(大塚電子 FE-300)來測定。   [0038] 其次,就硬塗膜1具有支持體10時的支持體10加以說明。支持體10只要是光學透明性高的塑膠膜則可不特別限制地使用。例如,可使用聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚碳酸酯、聚環烯烴、聚乙烯、聚碳酸酯、聚丙烯、聚苯乙烯、三醋酸纖維素、丙烯酸、聚氯乙烯、降莰烯化合物等。其中,以機械強度或尺寸穩定性優良而言,較佳為經拉伸加工,尤為經雙軸拉伸加工的聚對苯二甲酸乙二酯膜。又,為提升與硬塗層20的接著性,亦較佳使用對表面實施過電暈放電處理、或設有易接著層者。此外,支持體10的厚度,通常較佳為6~250μ左右,更佳為23~188μm左右。   支持體10較佳具透光性,具體而言,總透光率(JISK7136)為85%以上,較佳為90%以上。   [0039] 又,硬塗膜1亦可如上述,在支持體10之與硬塗層20相反的面進一步具備背塗層30(圖1(c))。   此時,背塗層30不特別限定,可選自硬塗層、黏著層、抗靜電層等,且亦可具備上述之硬塗層20。   [0040] 硬塗膜1的製作方法不特別限定,例如,具有支持體10時,可將使上述之硬塗層20之材料溶解或分散於適當的溶媒而成的硬塗層用塗佈液,以如棒式塗佈之周知方法塗佈於支持體上,加以乾燥,並視需求照射紫外線來製作。又,藉由預先在支持體10上形成脫模層,將硬塗層20形成於支持體10上後,剝離去除該支持體10,可作成由硬塗層單層構成的膜。又,若為具有背塗層30的硬塗膜1時,可在具備硬塗層20之支持體10之與硬塗層20相反之一側的面,以如棒式塗佈之周知方法塗佈使其溶解或分散於適當的溶媒而成的背塗層用塗佈液上,加以乾燥,並視需求照射紫外線來製作。   [0041] 其次,就硬塗層20的特性加以說明。硬塗層20所應具備之特性為接著性及柔軟性。   [0042] 首先,接著性可例如在層合無機化合物層而未經任何處理的狀態(下稱「初始接著性試驗」)與進行過屬促進耐候性試驗之煮沸處理後的狀態(下稱「煮沸後接著性試驗」)此2種狀態下進行沙漏交叉切割剝離試驗,根據其結果進行優劣的判定來評定。沙漏交叉切割剝離試驗由於係如後述,將無機化合物層40的表面交叉切割成如沙漏般的形狀來進行剝離,因此,可在比交叉切割呈棋盤格狀更嚴峻的條件下評定接著性的優劣。   [0043] 於此,初始接著性試驗方法(沙漏交叉切割剝離試驗方法)如下。   [0044] 對硬塗膜1濺鍍無機化合物(例如SiO2 、Nb2 Ox (惟4≦x≦5)等),而製作形成有厚度約200nm之無機化合物層40的試片(試片製作步驟)。   [0045] 其次,如圖3所示,以線段DD’及線段EE’呈平行,且此等線段之間的寬度為2cm的方式,對無機化合物層40的表面劃出切痕。接著,以線段FF’及線段GG’彼此交叉,且線段FF’及GG’的一端部分別與線段DD’相交、線段FF’及GG’的另一端部分別與線段EE’相交的方式,對無機化合物層40的表面劃出切痕。此時,以由線段DD’、EE’、FF’及GG’所形成的二個三角形ABC及AB’C’形成頂角30度且高度1cm的等腰三角形的方式劃出切痕。於此,茲以線段FF´及線段GG’交叉的點為頂點A、以線段DD’上之線段GG’及線段FF’的交點分別為點B與點C,以線段EE’上之線段GG’及線段FF’的交點分別為點B’與點C’(切割步驟)。   [0046] 以被覆於劃出切痕所形成的二個等腰三角形的方式黏貼膠帶(NICHIBAN公司製,Cellotape(註冊商標)),將黏貼之膠帶以既定的角度及速度撕除(第1次剝離)。接著,對第1次剝離後的試片,使用重新準備的膠帶,在進行過第1次剝離的同一處,再度同樣地進行剝離試驗(第2次剝離)。此外,除上述切割方式及連續地在同一處進行2次剝離以外,係依據JIS K5600-5-6所規定的交叉切割法來進行(剝離步驟)。   [0047] 依循初始接著性試驗方法進行試驗,於本發明中,就硬塗層的接著性,較佳為經第2次剝離,無機化合物層40完全未由硬塗層20剝落者。透過具有此種接著性,可提升對無機化合物層40之隨時間經過的接著性。   [0048] 再者,煮沸後接著性試驗方法與初始接著性試驗方法的不同點在於,在上述所說明之初始接著性試驗方法的試片製作步驟後,於切割步驟前具有對試片製作步驟中所得之試片以既定的時間使用純水進行煮沸處理的步驟(煮沸處理步驟)。   此外,就煮沸處理步驟,當無機化合物層40為SiO2 時係煮沸6小時。又,當無機化合物層40為Nb2 Ox (惟4≦x≦5)時則煮沸1小時。   [0049] 依循煮沸後接著性試驗方法進行試驗,於本發明中,就硬塗層的接著性,較佳為經第1次或第2次剝離,無機化合物層40僅由硬塗層20部分地剝落或較此更良好者;更佳為比經第1次或第2次剝離,無機化合物層40僅由硬塗層20部分地剝落者更良好者;再更佳為經第2次剝離,無機化合物層40完全未由硬塗層20剝落者。   透過具有此種接著性,可提升在高溫多濕下對無機化合物層40的接著性。   [0050] 或者,組合初始接著性試驗及煮沸後接著性試驗法時,於本發明中,就硬塗層20的接著性,較佳為比經初始接著性試驗的第2次剝離,無機化合物層40完全未由硬塗層20剝落者且經煮沸後接著性試驗的第1次剝離,無機化合物層40僅由硬塗層20部分地剝落更良好者;更佳為比經初始接著性試驗的第2次剝離,無機化合物層40完全未由硬塗層20剝落者且經煮沸後接著性試驗的第2次剝離,無機化合物層40僅由硬塗層20部分地剝落更良好者。   透過具有此種接著性,在如高溫多濕之嚴峻的環境下,也不易隨時間經過發生變化,可維持初始的接著性。   [0051] 此外,硬塗層20的柔軟性能以耐彎曲試驗來評定。耐彎曲試驗的值,係隨硬塗層20的材料或厚度而異,或者,當硬塗膜1具有支持體10及背塗層30時則隨彼等的種類或厚度而異,因此,於本說明書中,作為支持體,係使用Teijin Du Pont公司製附易接著之PET膜「KFL10W」的膜厚125μm,並在背面未層合有易接著層以外之層的條件下進行耐彎曲性試驗。   於本發明中,耐彎曲試驗的值(於硬塗層初次發生龜裂或由支持體剝落之鐵棒的直徑)係以較佳為6mm以下,更佳為2mm以下較為理想。藉由使耐彎曲試驗的值為既定值以下,硬塗層20即具有柔軟性,且可提升對無機化合物層40的接著性。此外,耐彎曲試驗的值為以依據 JIS-K5600-5-1(1999)之圓筒形心軸法所測得的值。   [0052] 其次,就本發明之硬塗膜1所應具備之光學特性加以說明。   [0053] 就硬塗膜1的光學特性而言,總透光率(JISK7136)較佳為85%以上,更佳為90%以上。透過具備此種透光性,不會妨害黏貼有硬塗膜1之顯示裝置等的辨識性,而能夠賦予對無機化合物層40的接著性。   [0054] 硬塗膜1的霧度(JISK7136)較佳為4.0%以下,更佳為2.0%以下,再更佳為1.0%以下,最佳為0.8%以下。依據粒子的平均粒徑來調整其含量,可保持合宜之霧度。   [0055] 其次,以圖1(a)所示結構之硬塗膜1為例,說明硬塗膜1之應用例。   圖2示出層合有無機化合物層40之硬塗膜(層合體)2的一例。層合體2係在硬塗膜1的硬塗層20上接著無機化合物層40而形成層合體。   [0056] 作為無機化合物層40,可舉出光學調整層50或氣體阻隔層51。   在硬塗層20上層合光學調整層50時,硬塗膜1可使用於附有光學調整層的膜3(圖2)。又,如圖4(a)所示,藉由在光學調整層50上進一步層合透明導電膜60,本實施形態之硬塗膜1可用於透明導電性膜4。附有光學調整層的膜3及透明導電性膜4可作為靜電電容式或電阻膜式的觸控面板之電極片構件使用。   [0057] 作為光學調整層50的無機化合物,只要是供調整透明導電膜60的光學特性者即可,可舉出SiO2 、Nb2 Ox (惟4≦x≦5)等。又,光學調整層50能以單層或多層構成。若為單層時,如圖5(a)所示,作為光學調整層50,例如將SiO2 膜形成於硬塗層20上。若為多層時,則如圖5(b)所示,例如將Nb2 Ox (惟4≦x≦5)膜及SiO2 膜依序層合於硬塗層20上。SiO2 或Nb2 Ox (惟4≦x≦5)之層合可為向來周知之方法,由濺鍍法或蒸鍍法成膜。   [0058] 作為透明導電膜60,可舉出由摻錫氧化銦(ITO)、氧化鋅(ZnO)、摻鋁氧化鋅(AZO)、銀、銅或銅之合金、奈米碳管等構成的膜。透明導電膜60之層合可為向來周知之方法,由DC濺鍍或RF濺鍍等的濺鍍法或蒸鍍法成膜。使用於靜電電容式觸控面板時,對形成之透明導電膜60實施蝕刻處理而形成所要的電極圖型(圖4(b))。   形成有此種電極圖型時,光學調整層50係用以使此電極圖型無法被看見。例如,若為具備ITO電極圖型的透明導電性膜4時,係如圖4(b)所示,光學調整層50可縮小由ITO去除部分反射的光71與由ITO殘留部分反射的光70之光學特性(反射率、色相、透射率等)的差,而使ITO電極圖型不易被看見。   [0059] 另一方面,在硬塗層20上層合氣體阻隔層51時,硬塗膜1可使用於適於EL顯示器、EL照明、太陽電池等的阻氣膜5(圖2)。作為氣體阻隔層51的無機化合物,可舉出鎂、鈦、鋁、銦、矽、錫、及彼等之氧化物,此等可單獨使用或者組合2種以上。基於加工性或成本觀點,較佳使用鋁或氧化鋁。氣體阻隔層51在硬塗層20上之層合可為向來周知之方法,由濺鍍法或蒸鍍法成膜。   [0060] 根據本發明之硬塗膜1,可提升硬塗層20對無機化合物層40的接著性。尤其是,其不太會隨時間經過而變化,可良好地維持接著性。 [實施例]   [0061] 以下說明本發明之保護膜的實施例。此外,在以下實施例,除非特別合先敘明,否則「%」及「份」均為重量基準。   [0062] <實施例1>   在厚度125μm之聚對苯二甲酸乙二酯膜(Teijin Du Pont公司製 KFL10W)的其中一面塗佈下述配方之硬塗用塗敷液並加以乾燥後,照射紫外線使其硬化,形成厚度2.0μm的硬塗層,而製成實施例1之硬塗膜。   [0063] <硬塗用塗敷液> ・黏結劑樹脂 游離輻射線硬化型樹脂 30份 (UNIDIC 17-813:DIC公司,固含量80%) 高分子量樹脂 15份 (ACRYDIC A195:DIC公司,固含量40%) (重量平均分子量:85000) ・反應性修飾粒子分散液 15份 (SIRMIBK30WT%-M06:CIK NanoTek公司,固含量30%) (二氧化矽粒子:平均一次粒徑30nm、平均二次粒徑200~300nm) ・稀釋溶劑 60份 ・光起始劑 0.4份 (IRGACURE 184:BASF公司)   [0064] <實施例2>   除將實施例1之硬塗用塗敷液中反應性修飾粒子的重量份變更為30以外,係以與實施例1同樣的方式製得實施例2之保護膜。   [0065] <實施例3>   除將實施例1之硬塗用塗敷液中反應性修飾粒子的重量份變更為60以外,係以與實施例1同樣的方式製得實施例3之保護膜。   [0066] <比較例1>   除去除實施例1之硬塗用塗敷液中的反應性修飾粒子以外,係以與實施例1同樣的方式製得比較例1之保護膜。   [0067] 對上述實施例及比較例中所製造之保護膜評定下述特性。   [0068] 1.光學特性   依循JISK7136測定方法,藉由霧度計(Suga Test Instruments公司,型式HGM-2K)、彩色電腦(Suga Test Instruments公司,型式SM-4),以各保護膜的硬塗層為入光面,測定總透光率(Tt)及霧度(Haze)。   [0069] 3.就「耐彎曲性」,係基於依據JIS-K5600-5-1(1999)之耐彎曲性(圓筒形心軸法),準備直徑約為3mm與7mm的鐵棒,用各鐵棒將附有硬塗層的保護膜以硬塗層20為外側的方式分別翻折捲繞,以目視觀察在該捲繞部分的硬塗層20是否發生龜裂或由支持體剝落。其結果,將用3mm的鐵棒無法確認龜裂或由支持體剝落者評為「○」;用3mm的鐵棒雖可確認龜裂或由支持體剝落,但用7mm的鐵棒無法確認龜裂或由支持體剝落者評為「△」;用任一種鐵棒皆確認出龜裂或由支持體剝落者評為「×」。   [0070] 4.初始接著性試驗(沙漏交叉切割剝離試驗)   在上述實施例及比較例中所製造之硬塗膜的硬塗層上,以濺鍍裝置(SHIBAURA MECHATRONICS製:CFS-4EP-LL)濺鍍SiO2 或Nb2 Ox (惟4≦x≦5),製成形成有厚度約200nm之無機化合物層40的試片(試片製作步驟)。   [0071] 其次,如圖3所示,以線段DD’及線段EE’呈平行,且此等線段之間的寬度為2cm的方式,對無機化合物層40的表面劃出切痕。接著,以線段FF’及線段GG’彼此交叉,且線段FF’及GG’的一端部分別與線段DD’相交、線段FF’及GG’的另一端部分別與線段EE’相交的方式,對無機化合物層40的表面劃出切痕。此時,以由線段DD’、EE’、FF’及GG’所形成的二個三角形ABC及AB’C’形成頂角30度且高度1cm的等腰三角形的方式劃出切痕。於此,茲以線段FF’及線段GG’交叉的點為頂點A、以線段DD’上之線段GG’及線段FF’的交點分別為點B與點C,以線段EE’上之線段GG’及線段FF’的交點分別為點B’與點C’(切割步驟)。   [0072] 以被覆於劃出切痕所形成的二個等腰三角形的方式黏貼膠帶(NICHIBAN公司製,Cellotape(註冊商標)),將黏貼之膠帶以既定的角度及速度撕除(第1次剝離)。接著,對第1次剝離後的試片,使用重新準備的膠帶,在進行過第1次剝離的同一處,再度同樣地進行剝離試驗(第2次剝離)。此外,除上述切割方式及連續地在同一處進行2次剝離以外,係依據JISK5600-5-6所規定的交叉切割法來進行(剝離步驟)。   [0073] 於此剝離試驗中,將無機化合物層40完全未由硬塗層20剝落者評為○(無剝離);無機化合物層40由硬塗層20部分地剝落者評為△(有部分剝離);無機化合物層40幾乎全部由硬塗層20剝落者評為×(全部剝離)。   [0074] 5.煮沸後接著性試驗法   當無機化合物層為SiO2 時,在上述說明之初始接著性試驗的試片製作步驟後,將試片以純水煮沸6小時(煮沸處理步驟)。接著進行上述說明之切割步驟、剝離步驟,將無機化合物層40完全未由硬塗層20剝落者評為○(無剝離);無機化合物層40由硬塗層20部分地剝落者評為△(有部分剝離);無機化合物層40幾乎全部由硬塗層20剝落者評為×(全部剝離)。   當無機化合物層為Nb2 Ox (惟4≦x≦5)時,除了在上述煮沸處理步驟中,煮沸時間為1小時以外係以與上述SiO2 之情形同樣的方式進行試驗及評定。   [0075] 將結果示於表1。   [0076]

Figure 02_image001
[0077] 就接著性之評定,實驗例1~3的膜之初始接著性試驗之對SiO2 及Nb2 Ox (惟4≦x≦5)的接著性,經第1次及第2次剝離全為「無剝離」。又,此等實施例之煮沸後接著性試驗之對SiO2 的接著性,經第1次剝離,為「無剝離」,經第二次則為「有部分剝離」或「無剝離」;對Nb2 Ox (惟4≦x≦5)的接著性,實施例1以外者,經第1次及第2次此兩次剝離全為「無剝離」。   另一方面,比較例1的膜對SiO2 及Nb2 Ox (惟4≦x≦5)的接著性之評定,在初始接著性試驗中係較實施例1~3者為差,在煮沸後接著性試驗中為「全部剝離」。   此等結果顯示,具有反應性修飾粒子21之實施例1~3的膜,即使在如高溫多濕之嚴峻的環境下,也不易隨時間經過發生變化,可維持初始之對無機化合物層40的接著性。   [0078] 就柔軟性,實施例1~3較比較例1更具有柔軟性。從而,可知透過硬塗層20具備適度的柔軟性,可提升對無機化合物層40的接著性。[0021] Hereinafter, with reference to FIGS. 1 to 5, an embodiment of the hard coat film 1 for adhering the inorganic compound layer 40 of the present invention will be described. In addition, as long as the inorganic compound layer 40 is a layer which has an inorganic compound, it may be a layer containing an inorganic compound, and may be a layer of the inorganic compound itself. The hard coat film 1 of the present invention is characterized by having a hard coat layer 20, and the hard coat layer 20 comprises particles (reactive modified particles) 21 and a binder resin 22 modified to have reactivity, and the reactive The content of the modification particles 21 is 1 part by weight or more and 60 parts by weight or less with respect to 100 parts by weight of the binder resin 22 . Embodiment of the present invention, as its basic constitution, is shown in Figure 1 (a), possesses support 10 and the hard coat 20 formed on support 10. The hard coat film 1 is not only the one shown in FIG. 1( a ), but may also be a single-layer hard coat film ( FIG. 1( b )), or may be formed between the support 10 and the surface on which the hard coat layer 20 is formed. The surface on the opposite side is provided with a back coating (FIG. 1(c)). [0024] Such a hard coat film 1 is shown in FIG. 2, and an inorganic compound layer 40 is laminated on the hard coat layer 20. At this time, the hard coat layer 20 has excellent adhesion to the inorganic compound layer 40 . [0025] First, the reactive modified particles 21 and the binder resin 22 constituting the hard coat layer 20 will be described. [0026] The binder resin 22 has a function as a binder for the reactive modified particles 21 to be described later. The binder resin 22 preferably has reactive functional groups. At this time, it is bonded to the reactive functional group of the reactive modified particle 21, and the detachment of the reactive modified particle 21 can be effectively prevented. As a reactive functional group of the binder resin 22, an acryl group, a hydroxyl group, a carboxyl group, an amine group, an epoxy group, an isocyanate group, etc. are mentioned. [0027] As for the binder resin 22, it can be used alone or in combination of two or more kinds of resins such as ionizing radiation curable resin, thermosetting resin, thermoplastic resin, etc., and can be used according to the purpose. Among them, when higher hardness is required, ionizing radiation curing resin is preferably used. As ionizing radiation curable resin, can enumerate by irradiating ionizing radiation (ultraviolet or electron beam) to achieve cross-linking and hardening of resin, it is particularly preferable to use, for example, 1 or 2 or more ( Meth)acryloyl acrylic resin. Examples of the acrylic compound include urethane (meth)acrylate, polyester (meth)acrylate, epoxy (meth)acrylate, melamine (meth)acrylate, and polyfluoroalkane. base (meth)acrylate, siloxane (meth)acrylate, etc. As the thermosetting resin, for example, polyester acrylate-based resin, polyurethane acrylate-based resin, epoxy acrylate-based resin, epoxy-based resin, melamine-based resin, and phenol-based resin can be cited , polysiloxane resin, etc. As thermoplastic resin, for example, polyester-based resin, acrylic resin, polycarbonate-based resin, cellulose-based resin, acetal-based resin, vinyl-based resin, polyethylene-based resin, polystyrene-based resin can be enumerated Resin, polypropylene resin, polyamide resin, polyimide resin, fluorine resin, etc. [0031] Also, the binder resin 22 preferably contains a certain amount of high molecular weight resin. By combining the high molecular weight resin and the reactive modified particles 21 described later, a certain degree of flexibility can be imparted to the hard coat layer 20 without impairing the hardness, and the anchoring of the inorganic compound layer 40 to the hard coat layer 20 can be improved. effect. Thereby, the adhesion between the hard coat layer 20 and the inorganic compound layer 40 can be further improved. The high molecular weight resin refers to a resin having a weight average molecular weight (Mw) of 10,000 or more, preferably 10,000 to 150,000, and more preferably 30,000 to 100,000. The high molecular weight resins may be used alone or in combination of two or more types of resins such as ionizing radiation curable resins, thermosetting resins, thermoplastic resins, and the like. Examples of the ionizing radiation curable resin, thermosetting resin, and thermoplastic resin are the same as those listed above as examples of the ionizing radiation curable resin, thermosetting resin, and thermoplastic resin as the binder resin 22 . The content thereof is 1 part by weight or more and 50 parts by weight or less, more preferably 5 parts by weight or more and 40 parts by weight or less, relative to 100 parts by weight of the binder resin 22 (solid content). In addition, when the binder resin 22 contains a high molecular weight resin, "the binder resin 22 (solid content)" refers to the solid content of the entire binder resin 22 containing the high molecular weight resin. [0032] The reactive modified particles 21 contribute to improving the adhesion of the hard coat layer 20 to the inorganic compound layer 40 and maintaining the adhesion over time. The reactive modified particle 21 is a particle in which a reactive functional group is imparted to the surface of the inorganic particle by modifying the surface of the inorganic particle. The reactive functional groups are bonded to the reactive functional groups of the binder resin 22 to prevent the reactive modified particles 21 from falling off from the hard coat layer 20 . Furthermore, it is presumed that by having a reactive functional group, the adhesion to the inorganic compound layer can be maintained under high temperature and high humidity conditions. Examples of the inorganic particles include silica, alumina, titanium, zirconia, calcium carbonate, magnesium carbonate, barium sulfate, and the like, and these inorganic particles may be used alone or in combination of two or more. As a reactive functional group, an acryl group, a hydroxyl group, a carboxyl group, an amine group, an epoxy group, an isocyanate group etc. are mentioned, for example, These reactive functional groups can be used individually or in combination of 2 or more types. The content of the reactive modified particles 21, in order to exert the adhesion to the inorganic compound layer 40, the lower limit of the reactive modified particles 21 is 1 with respect to 100 parts by weight of the binder resin 22 (solid content). The weight part or more is preferably 3 weight parts or more, more preferably 5 weight parts or more, and most preferably 10 weight parts or more. On the other hand, the upper limit of the reactive modified particles 21 is not particularly limited, but is 60 parts by weight or less, preferably 40 parts by weight or less, more preferably 30 parts by weight relative to 100 parts by weight of the binder resin 22 (solid content). parts by weight or less. When the content of the reactive modified particles 21 is less than the above-mentioned range, the adhesion with the inorganic compound layer 40 tends to be weakened. On the other hand, when it exceeds the said range, it will become difficult to maintain transparency, and it will become unfavorable. [0034] As long as the reactive modified particles 21 are of a predetermined size, they can be primary particles or secondary particles belonging to aggregates; and in order to further obtain adhesiveness, they are preferably secondary particles. The reason why the adhesion is more improved when secondary particles that are aggregates of primary particles are used as the reactive modification particles 21 compared to the case where only primary particles of the same size are used is not known, but it is considered that the particles protrude toward the surface. This is due to the increase in the contact area with the inorganic compound layer 40 . The average particle diameter of the reactive modified particles 21 (including secondary particles in the form of primary particles or aggregates of primary particles) varies with the thickness of the hard coat layer 20 and cannot be generalized, but the lower limit is 100 nm or more. It is preferably 110 nm or more, more preferably 130 nm or more. Moreover, the upper limit is 1000 nm or less, preferably 800 nm or less, and more preferably 600 nm or less. Furthermore, in the above, when the reactive modified particles 21 are composed of secondary particles that are aggregates of primary particles, the lower limit of the average particle diameter of the primary particles that are the constituents of the secondary particles is 1 nm or more. , preferably 20 nm or more, more preferably 30 nm or more. Moreover, the upper limit is 100 nm or less, preferably 80 nm or less, and more preferably 60 nm or less. Adhesion to the inorganic compound layer 40 can be obtained by setting the average particle diameter of the reactive modified particles 21 or the average particle diameter of the primary particles when the reactive modified particles 21 are composed of secondary particles to be equal to or larger than the above lower limit value. On the other hand, by making these average particle diameters into each of the said upper limit or less, the translucency which can be used for transparent use can be obtained. In addition, the average particle diameter of a particle means the value of the volume average particle diameter (D50) which can be measured by the laser diffraction/scattering method. [0035] The hard coat layer 20 may further contain a photoinitiator, a curing agent, and the like depending on the curing method. Examples of the photoinitiator include acetophenones, benzophenones, Michler's ketone, benzoin, benzyl methyl ketal, benzyl benzoate, α-acyl oxime ester, thiol Photo-radical polymerization initiators such as xanthones, or photocationic polymerization initiators such as onium salts, sulfonic acid esters, and organometallic complexes. Moreover, as a hardening|curing agent, compounds, such as a polyisocyanate, an amine resin, an epoxy resin, a carboxylic acid, can be used suitably by mix|blending suitable resin. In the hard coat layer 20, within the scope of not impairing the performance, in addition to the above-mentioned binder resin, polymer resin, reactive modified particles, photoinitiator, hardener, antistatic agent, Additives for dispersants, flocculants, UV absorbers, antioxidants, levelers, etc. The thickness of hard coat 20 (referring to the L of Fig. 1 (a)), when hard coat 1 has support 10, is 0.1~10.0 μm, preferably 0.5~5.0 μm, more preferably 1.0~1.0 μm 3.0 μm. Moreover, when the hard coat film 1 is provided with the back coat layer 30 in addition to the support body 10, it is 0.1-10.0 micrometers, Preferably it is 1.0-5.0 micrometers, More preferably, it is 1.0-3.0 micrometers. By having such a thickness, the adhesion between the hard coat layer 20 and the inorganic compound layer 40 can be improved. In addition, in the case of a single hard coat layer, the thickness thereof is 0.1 to 10.0 μm, preferably 0.5 to 5.0 μm, and more preferably 1.0 to 3.0 μm. By setting the thickness to 0.1 μ or more, the adhesion to the inorganic compound layer 40 can be obtained, and the strength of the coating film can be more sufficient, and the handleability can be improved. The thickness of the hard coat layer 20 was measured using a reflection spectrometer (Otsuka Electronics FE-300). Next, the support body 10 when the hard coat film 1 has the support body 10 is explained. The support 10 can be used without particular limitation as long as it is a plastic film with high optical transparency. For example, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polycarbonate, polycycloolefin, polyethylene, polycarbonate, polypropylene, polyphenylene can be used Ethylene, cellulose triacetate, acrylic acid, polyvinyl chloride, norbornene compounds, etc. Among them, a polyethylene terephthalate film that has been stretched, especially biaxially stretched, is preferred because of its excellent mechanical strength or dimensional stability. Moreover, in order to improve the adhesiveness with the hard-coat layer 20, it is also preferable to use the thing which performed the corona discharge treatment on the surface, or provided the easy-adhesion layer. In addition, the thickness of the support body 10 is usually preferably about 6 to 250 μm, and more preferably about 23 to 188 μm. The support 10 preferably has light transmittance, and specifically, the total light transmittance (JISK7136) is 85% or more, preferably 90% or more. Again, hard coat film 1 can also be as above-mentioned, and is further provided with back coat layer 30 (Fig. 1 (c)) on the opposite side of support body 10 with hard coat layer 20. At this time, the back coat layer 30 is not particularly limited, and can be selected from a hard coat layer, an adhesive layer, an antistatic layer, etc., and may also include the above-mentioned hard coat layer 20 . The making method of hard coat film 1 is not particularly limited, for example, when having support 10, can make the material of above-mentioned hard coat 20 dissolve or be dispersed in the hard coat coating liquid that suitable solvent forms. , coated on the support by a known method such as bar coating, dried, and irradiated with ultraviolet rays as required. In addition, by forming a mold release layer on the support 10 in advance, after forming the hard coat layer 20 on the support 10, the support 10 is peeled off and removed to form a film composed of a single hard coat layer. Also, in the case of the hard coat film 1 having the back coat layer 30, the surface of the support 10 having the hard coat layer 20 on the opposite side to the hard coat layer 20 may be coated by a known method such as bar coating. The cloth is dissolved or dispersed in a coating liquid for a back coat layer formed by an appropriate solvent, dried, and produced by irradiating ultraviolet rays as needed. [0041] Next, the characteristics of the hard coat layer 20 will be described. The properties that the hard coat layer 20 should have are adhesion and flexibility. First of all, the adhesion can be, for example, in the state where the inorganic compound layer is laminated without any treatment (hereinafter referred to as "initial adhesion test") and the state after boiling treatment which is a test for promoting weather resistance (hereinafter referred to as "the initial adhesion test"). "Adhesion test after boiling") The hourglass cross-cut peeling test was carried out in these two states, and the quality was judged and evaluated according to the results. The hourglass cross-cut peeling test is performed by cross-cutting the surface of the inorganic compound layer 40 into an hourglass-like shape, as described later, and therefore, the adhesiveness can be evaluated under conditions more severe than cross-cutting in a checkerboard shape. . Here, the initial adhesion test method (hourglass cross-cut peeling test method) is as follows. [0044] The hard coating film 1 is sputtered with an inorganic compound (such as SiO 2 , Nb 2 O x (4≦x≦5), etc.), and a test piece (test piece) having an inorganic compound layer 40 with a thickness of about 200 nm is formed. production steps). [0045] Next, as shown in FIG. 3 , the surface of the inorganic compound layer 40 is scribed in a manner that the line segment DD' and the line segment EE' are parallel, and the width between these line segments is 2 cm. Next, the line segments FF' and GG' intersect with each other, one end of the line segments FF' and GG' respectively intersect with the line segment DD', and the other ends of the line segments FF' and GG' respectively intersect with the line segment EE'. The surface of the inorganic compound layer 40 is scratched. At this time, the incision was drawn so that the two triangles ABC and AB'C' formed by the line segments DD', EE', FF', and GG' formed an isosceles triangle with an apex angle of 30 degrees and a height of 1 cm. Here, the point where the line segment FF´ and the line segment GG' intersect is taken as the vertex A, the intersection point of the line segment GG' and the line segment FF' on the line segment DD' is taken as the point B and the point C respectively, and the line segment GG on the line segment EE' The intersection points of ' and line segment FF' are point B' and point C' respectively (cutting step). The tape (Nichiban, Cellotape (registered trademark)) was applied so as to cover the two isosceles triangles formed by the cut marks, and the pasted tape was torn off at a predetermined angle and speed (the first time). stripped). Next, with respect to the test piece after the 1st peeling, the peeling test (2nd peeling) was similarly performed again in the same place where the 1st peeling was performed using the newly prepared tape. In addition, it carried out according to the cross-cut method prescribed|regulated to JISK5600-5-6 except the said dicing method and peeling twice continuously at the same place (peeling step). [0047] The test is carried out according to the initial adhesion test method. In the present invention, the adhesion of the hard coat layer is preferably the second peeling, and the inorganic compound layer 40 is not peeled off from the hard coat layer 20 at all. By having such adhesiveness, the time-lapse adhesiveness to the inorganic compound layer 40 can be improved. Furthermore, the difference between the adhesion test method after boiling and the initial adhesion test method is that after the test piece making step of the initial adhesion test method described above, there is a test piece making step before the cutting step. The test piece obtained in the process of boiling treatment with pure water for a predetermined period of time (boiling treatment step). In addition, as for the boiling treatment step, when the inorganic compound layer 40 is SiO 2 , it is boiled for 6 hours. In addition, when the inorganic compound layer 40 is Nb 2 O x (only 4≦x≦5), it is boiled for 1 hour. The test is carried out according to the test method for adhesion after boiling. In the present invention, the adhesion of the hard coat layer is preferably peeled off for the first time or the second time, and the inorganic compound layer 40 is only composed of 20 parts of the hard coat layer. peeled off or better than this; more preferably, better than the first or second peeling, the inorganic compound layer 40 is only partially peeled off from the hard coat layer 20; more preferably after the second peeling , the inorganic compound layer 40 is not peeled off by the hard coat layer 20 at all. By having such adhesiveness, the adhesiveness to the inorganic compound layer 40 under high temperature and high humidity can be improved. Alternatively, when combining the initial adhesion test and the boiling back adhesion test method, in the present invention, with regard to the adhesion of the hard coat layer 20, it is preferable to peel off the inorganic compound for the second time than the initial adhesion test. If the layer 40 is not peeled off from the hard coat layer 20 at all, and the first peeling of the adhesion test after boiling, the inorganic compound layer 40 is only partially peeled off from the hard coat layer 20. Better; better than the initial adhesion test In the second peeling, the inorganic compound layer 40 was not peeled off from the hard coat layer 20 at all, and the second peeling of the post-boiling adhesion test, the inorganic compound layer 40 was only partially peeled off from the hard coat layer 20. By having such adhesiveness, even in severe environments such as high temperature and high humidity, it is not easy to change with the passage of time, and the initial adhesiveness can be maintained. [0051] In addition, the softness properties of the hard coat layer 20 were evaluated in a bending resistance test. The value of the bending resistance test varies depending on the material or thickness of the hard coat layer 20, or, when the hard coat film 1 has the support 10 and the back coat layer 30, depending on the type or thickness of those, therefore, in In this specification, as a support, a PET film with a film thickness of 125 μm “KFL10W” manufactured by Teijin Du Pont Co., Ltd. with an easily adhesive bond was used, and the bending resistance test was carried out on the condition that no layers other than the easily bondable layer were laminated on the back surface. . In the present invention, the value of the bending resistance test (diameter of the iron rod at which cracks first occurred in the hard coat layer or peeled off from the support) is preferably 6 mm or less, more preferably 2 mm or less. By setting the value of the bending resistance test to be equal to or less than a predetermined value, the hard coat layer 20 has flexibility, and the adhesiveness to the inorganic compound layer 40 can be improved. In addition, the value of the bending resistance test is the value measured by the cylindrical mandrel method based on JIS-K5600-5-1 (1999). Next, the optical properties that the hard coat film 1 of the present invention should possess will be described. [0053] Regarding the optical properties of the hard coat film 1, the total light transmittance (JISK7136) is preferably 85% or more, more preferably 90% or more. By having such light transmittance, it is possible to impart adhesiveness to the inorganic compound layer 40 without impairing the visibility of the display device etc. to which the hard coat film 1 is attached. The haze (JISK7136) of the hard coat film 1 is preferably 4.0% or less, more preferably 2.0% or less, still more preferably 1.0% or less, and most preferably 0.8% or less. By adjusting the content according to the average particle size of the particles, a suitable haze can be maintained. Next, take the hard coat film 1 of the structure shown in FIG. 1(a) as an example to illustrate the application example of the hard coat film 1. FIG. 2 shows an example of the hard coat film (laminate) 2 in which the inorganic compound layer 40 is laminated. The laminate 2 is formed by adhering the inorganic compound layer 40 to the hard coat layer 20 of the hard coat film 1 to form a laminate. [0056] As the inorganic compound layer 40, an optical adjustment layer 50 or a gas barrier layer 51 can be mentioned. When the optical adjustment layer 50 is laminated on the hard coat layer 20 , the hard coat film 1 can be used for the optical adjustment layer-attached film 3 ( FIG. 2 ). Furthermore, as shown in FIG. 4( a ), by further laminating the transparent conductive film 60 on the optical adjustment layer 50 , the hard coat film 1 of the present embodiment can be used for the transparent conductive film 4 . The film 3 with an optical adjustment layer and the transparent conductive film 4 can be used as electrode sheet members of an electrostatic capacitance type or resistive film type touch panel. [0057] As the inorganic compound of the optical adjustment layer 50, as long as it is used to adjust the optical properties of the transparent conductive film 60, SiO 2 , Nb 2 O x (only 4≦x≦5) and the like can be cited. In addition, the optical adjustment layer 50 can be constituted by a single layer or a plurality of layers. In the case of a single layer, as shown in FIG. 5( a ), as the optical adjustment layer 50 , for example, a SiO 2 film is formed on the hard coat layer 20 . In the case of multiple layers, as shown in FIG. 5( b ), for example, a Nb 2 O x (only 4≦x≦5) film and a SiO 2 film are sequentially laminated on the hard coat layer 20 . The lamination of SiO 2 or Nb 2 O x (only 4≦x≦5) can be a conventionally known method, and a film is formed by a sputtering method or an evaporation method. As the transparent conductive film 60, those composed of tin-doped indium oxide (ITO), zinc oxide (ZnO), aluminum-doped zinc oxide (AZO), silver, copper or copper alloy, carbon nanotubes, etc. can be mentioned. membrane. The lamination of the transparent conductive film 60 may be a conventionally known method, and the film may be formed by a sputtering method such as DC sputtering or RF sputtering, or a vapor deposition method. When used in an electrostatic capacitance type touch panel, an etching process is performed on the formed transparent conductive film 60 to form a desired electrode pattern (FIG. 4(b)). When such an electrode pattern is formed, the optical adjustment layer 50 serves to make the electrode pattern invisible. For example, in the case of the transparent conductive film 4 having an ITO electrode pattern, as shown in FIG. 4( b ), the optical adjustment layer 50 can reduce the light 71 reflected by the removed portion of ITO and the light 70 reflected by the remaining portion of ITO The difference in optical properties (reflectivity, hue, transmittance, etc.) makes the ITO electrode pattern difficult to see. [0059] On the other hand, when the gas barrier layer 51 is laminated on the hard coat layer 20, the hard coat film 1 can be used as a gas barrier film 5 suitable for EL displays, EL lighting, solar cells, and the like (FIG. 2). Examples of the inorganic compound of the gas barrier layer 51 include magnesium, titanium, aluminum, indium, silicon, tin, and oxides thereof, and these may be used alone or in combination of two or more. From the viewpoint of workability or cost, aluminum or alumina is preferably used. Lamination of the gas barrier layer 51 on the hard coat layer 20 may be performed by a conventionally known method, and may be formed by sputtering or vapor deposition. [0060] According to the hard coat film 1 of the present invention, the adhesion of the hard coat layer 20 to the inorganic compound layer 40 can be improved. In particular, it is unlikely to change with time, and the adhesiveness can be maintained favorably. [Examples] [0061] Examples of the protective film of the present invention will be described below. In addition, in the following examples, unless otherwise stated, "%" and "part" are based on weight. <Example 1> The coating liquid for hard coating of the following formula was applied to one side of a polyethylene terephthalate film (KFL10W, manufactured by Teijin Du Pont) with a thickness of 125 μm, dried, and then irradiated. It was hardened with ultraviolet rays to form a hard coat layer having a thickness of 2.0 μm, and the hard coat film of Example 1 was prepared. <Coating liquid for hard coating> ・Binder resin 30 parts of ionizing radiation curing resin (UNIDIC 17-813: DIC company, solid content 80%) 15 parts of high molecular weight resin (ACRYDIC A195: DIC company, solid content Content 40%) (weight average molecular weight: 85000) ・15 parts of reactive modified particle dispersion (SIRMIBK30WT%-M06: CIK NanoTek, solid content 30%) (Silicon dioxide particles: average primary particle size 30 nm, average secondary particle size Particle size 200-300nm) ・60 parts of dilution solvent ・0.4 part of photoinitiator (IRGACURE 184: BASF Corporation) The protective film of Example 2 was produced in the same manner as in Example 1 except that the parts by weight were changed to 30. <Example 3> The protective film of Example 3 was prepared in the same manner as in Example 1, except that the weight parts of the reactive modified particles in the coating solution for hard coating of Example 1 were changed to 60 . <Comparative Example 1> A protective film of Comparative Example 1 was prepared in the same manner as in Example 1 except that the reactive modified particles in the coating liquid for hard coating of Example 1 were removed. [0067] The following properties were evaluated for the protective films manufactured in the above-described examples and comparative examples. 1. optical properties follow JISK7136 measuring method, by haze meter (Suga Test Instruments company, type HGM-2K), color computer (Suga Test Instruments company, type SM-4), with the hard coating of each protective film The layer was the light incident surface, and the total light transmittance (Tt) and the haze (Haze) were measured. 3. Regarding "bending resistance", based on the bending resistance (cylindrical mandrel method) according to JIS-K5600-5-1 (1999), prepare iron rods with diameters of about 3 mm and 7 mm, and use Each iron rod was folded and wound with the hard coat layer attached with the hard coat layer 20 on the outside, and the hard coat layer 20 at the wound portion was visually observed for cracking or peeling off from the support. As a result, those who could not confirm cracks or peel off from the support with a 3 mm iron rod were rated as "○"; with a 3 mm iron rod, although cracks or peeling from the support were confirmed with a 3 mm iron rod, they could not be confirmed with a 7 mm iron rod. Those with cracks or peeling off of the support were rated as "△"; those with any type of iron bars were identified as cracks or peeled off from the support, and rated as "X". 4. Initial Adhesion Test (Hourglass Cross Cut Peeling Test) On the hard coat layer of the hard coat film manufactured in the above-mentioned embodiment and the comparative example, with a sputtering device (manufactured by SHIBAURA MECHATRONICS: CFS-4EP-LL ) by sputtering SiO 2 or Nb 2 O x (only 4≦x≦5) to prepare a test piece having an inorganic compound layer 40 having a thickness of about 200 nm (test piece production step). [0071] Next, as shown in FIG. 3 , a notch is drawn on the surface of the inorganic compound layer 40 in a manner that the line segment DD' and the line segment EE' are parallel, and the width between these line segments is 2 cm. Next, the line segments FF' and GG' intersect with each other, one end of the line segments FF' and GG' respectively intersect with the line segment DD', and the other ends of the line segments FF' and GG' respectively intersect with the line segment EE'. The surface of the inorganic compound layer 40 is scratched. At this time, the incision was drawn so that the two triangles ABC and AB'C' formed by the line segments DD', EE', FF', and GG' formed an isosceles triangle with an apex angle of 30 degrees and a height of 1 cm. Here, the point where the line segment FF' and the line segment GG' intersect is the vertex A, the intersection point of the line segment GG' and the line segment FF' on the line segment DD' is the point B and the point C, respectively, and the line segment GG' on the line segment EE' The intersection points of ' and line segment FF' are point B' and point C' respectively (cutting step). A tape (Nichiban, Cellotape (registered trademark)) was applied so as to cover the two isosceles triangles formed by the cut marks, and the pasted tape was torn off at a predetermined angle and speed (the first time). stripped). Next, with respect to the test piece after the 1st peeling, the peeling test (2nd peeling) was similarly performed again in the same place where the 1st peeling was performed using the newly prepared tape. In addition, it carried out based on the cross-cut method prescribed|regulated to JISK5600-5-6 except the said dicing method and peeling twice continuously at the same place (peeling step). In this peeling test, the inorganic compound layer 40 is rated as ○ (no peeling) by those who are not peeled off from the hard coat layer 20 at all; the inorganic compound layer 40 is rated as △ (partially peeled off by the hard coat layer 20 peeling); almost all of the inorganic compound layer 40 peeled off from the hard coat layer 20 was rated as × (all peeled off). 5. Test method for adhesion after boiling When the inorganic compound layer is SiO 2 , after the test piece preparation step of the initial adhesion test described above, the test piece is boiled with pure water for 6 hours (boiling treatment step). Next, the cutting step and the peeling step described above are performed, and the case where the inorganic compound layer 40 is not peeled off from the hard coat layer 20 at all is rated as ○ (no peeling); the case where the inorganic compound layer 40 is partially peeled off from the hard coat layer 20 is rated as Δ ( Partial peeling); almost all of the inorganic compound layer 40 peeled off from the hard coat layer 20 was rated as × (complete peeling). When the inorganic compound layer was Nb 2 O x (only 4≦x≦5), the test and evaluation were carried out in the same manner as in the case of SiO 2 above except that in the above boiling treatment step, the boiling time was 1 hour. The results are shown in Table 1. [0076]
Figure 02_image001
As for the evaluation of the adhesion, the adhesion to SiO 2 and Nb 2 O x (only 4≦x≦5) of the initial adhesion test of the films of Experimental Examples 1 to 3, after the first and second times Stripping is all "no stripping". In addition, the adhesion to SiO 2 in the adhesion test after boiling of these examples is "no peeling" after the first peeling, and "partial peeling" or "no peeling" after the second peeling; The adhesiveness of Nb 2 O x (only 4≦x≦5), except for Example 1, was “no peeling” after the first and second peeling. On the other hand, the evaluation of the adhesion of the film of Comparative Example 1 to SiO 2 and Nb 2 O x (only 4≦x≦5) was inferior to that of Examples 1 to 3 in the initial adhesion test. In the post-adhesion test, it was "all peeled off". These results show that the films of Examples 1 to 3 having the reactive modified particles 21 are not easily changed over time even in severe environments such as high temperature and high humidity, and can maintain the initial adhesion to the inorganic compound layer 40 . Continuity. In terms of flexibility, Examples 1 to 3 are more flexible than Comparative Example 1. Therefore, it can be seen that the transparent hard coat layer 20 has moderate flexibility, and the adhesiveness to the inorganic compound layer 40 can be improved.

[0079]1‧‧‧硬塗膜20‧‧‧硬塗層21‧‧‧反應性修飾粒子22‧‧‧黏結劑樹脂40‧‧‧無機化合物層50‧‧‧光學調整層51‧‧‧氣體阻隔層[0079] 1‧‧‧Hard coating film 20‧‧‧Hard coating layer 21‧‧‧Reactive modified particles 22‧‧‧Binder resin 40‧‧‧Inorganic compound layer 50‧‧‧Optical adjustment layer 51‧‧‧ gas barrier

[0020]   圖1(a)為表示本發明之硬塗膜之實施形態的一例的剖面圖;(b)為表示本發明之硬塗膜之實施形態的另一例的剖面圖;(c)為表示本發明之硬塗膜之實施形態的又一例的剖面圖。   圖2為表示層合有無機化合物層之硬塗膜的一例的剖面圖。   圖3為說明沙漏交叉切割剝離試驗中之切痕形狀的俯視圖。   圖4(a)為表示應用本發明之硬塗膜之透明導電性膜的一例的剖面圖;(b)為說明透明導電膜經蝕刻處理之(a)之透明導電性膜的剖面結構及由透明導電性膜反射的光的圖。   圖5(a)為在硬塗層上層合有SiO2 膜的本發明之硬塗膜的剖面圖;(b)依序在硬塗層上層合有Nb2 Ox (惟4≦x≦5)膜及SiO2 膜的本發明之硬塗膜的剖面圖。Fig. 1 (a) is a sectional view showing an example of the embodiment of the hard coating film of the present invention; (b) is a sectional view showing another example of the embodiment of the hard coating film of the present invention; (c) is A cross-sectional view showing still another example of the embodiment of the hard coat film of the present invention. FIG. 2 is a cross-sectional view showing an example of a hard coat film in which an inorganic compound layer is laminated. FIG. 3 is a plan view illustrating the shape of the cut in the hourglass cross-cut peel test. 4(a) is a cross-sectional view showing an example of a transparent conductive film to which the hard coat film of the present invention is applied; (b) is a cross-sectional view illustrating the transparent conductive film of (a) after the transparent conductive film is etched and the structure of the transparent conductive film A graph of light reflected by a transparent conductive film. Fig. 5(a) is a cross-sectional view of the hard coat film of the present invention with a SiO 2 film laminated on the hard coat layer; (b) Nb 2 O x (only 4≦x≦5) is sequentially laminated on the hard coat layer ) film and the cross-sectional view of the hard coat film of the present invention of the SiO 2 film.

1‧‧‧硬塗膜 1‧‧‧Hard coating

10‧‧‧支持體 10‧‧‧Support

20‧‧‧硬塗層 20‧‧‧Hard coating

21‧‧‧反應性修飾粒子 21‧‧‧Reactive Modified Particles

22‧‧‧黏結劑樹脂 22‧‧‧Binder resin

30‧‧‧背塗層 30‧‧‧Back Coating

L‧‧‧硬塗層的厚度 L‧‧‧Thickness of hard coating

Claims (12)

一種硬塗膜,其係具有用來接著無機化合物層的硬塗層之硬塗膜,其特徵為:前述硬塗層係包含經修飾成具有反應性的粒子與黏結劑樹脂,前述粒子的含量,相對於前述黏結劑樹脂固含量的100重量份為1重量份以上60重量份以下,且依據JIS-K5600-5-1(1999)之圓筒形心軸法所測得的前述硬塗層之耐彎曲試驗的值為6mm以下。 A hard coat film having a hard coat layer for adhering an inorganic compound layer, characterized in that: the hard coat layer comprises particles modified to have reactivity and a binder resin, and the content of the particles is , with respect to 100 parts by weight of the solid content of the aforementioned binder resin is 1 part by weight to 60 parts by weight, and the hard coat layer measured according to the cylindrical mandrel method of JIS-K5600-5-1 (1999) The value of the bending resistance test is 6mm or less. 一種硬塗膜,其係具有用來接著無機化合物層的硬塗層之硬塗膜,其特徵為:前述硬塗層係包含經修飾成具有反應性的粒子與黏結劑樹脂,前述粒子的含量,相對於前述黏結劑樹脂固含量的100重量份為1重量份以上60重量份以下,且在對前述膜層合無機化合物層,並進行煮沸處理後的沙漏交叉切割剝離試驗中,無機化合物層僅由硬塗層部分地剝落或較此更良好。 A hard coat film having a hard coat layer for adhering an inorganic compound layer, characterized in that: the hard coat layer comprises particles modified to have reactivity and a binder resin, and the content of the particles is , with respect to 100 parts by weight of the solid content of the binder resin, 1 part by weight to 60 parts by weight, and in the hourglass cross-cut peeling test after laminating the inorganic compound layer on the film and performing the boiling treatment, the inorganic compound layer Only partially peeled off by the hard coat or better. 如請求項1或2之硬塗膜,其中前述粒子的平均粒徑為100nm以上1000nm以下。 The hard coat film according to claim 1 or 2, wherein the average particle diameter of the particles is 100 nm or more and 1000 nm or less. 如請求項1或2之硬塗膜,其中當前述粒子以一次粒子的凝聚體構成二次粒子時,前述一次粒子的粒徑為1nm以上100nm以下。 The hard coat film according to claim 1 or 2, wherein when the particles constitute secondary particles as aggregates of primary particles, the particle diameter of the primary particles is 1 nm or more and 100 nm or less. 如請求項1或2之硬塗膜,其中前述粒子為無機系粒子,且為二氧化矽、氧化鋁、鈦、氧化鋯、碳酸鈣、碳酸鎂、硫酸鋇、或此等的2種以上之組合。 The hard coat film according to claim 1 or 2, wherein the particles are inorganic particles and are silicon dioxide, aluminum oxide, titanium, zirconium oxide, calcium carbonate, magnesium carbonate, barium sulfate, or two or more of these. combination. 如請求項1或2之硬塗膜,其中前述粒子係具有丙烯醯基、羥基、羧基、胺基、環氧基、異氰酸酯基、或此等官能基的2種以上之組合。 The hard coat film according to claim 1 or 2, wherein the particles have an acryl group, a hydroxyl group, a carboxyl group, an amine group, an epoxy group, an isocyanate group, or a combination of two or more of these functional groups. 如請求項2之硬塗膜,其中以依據JIS-K5600-5-1(1999)之圓筒形心軸法所測得的前述硬塗層之耐彎曲試驗的值為6mm以下。 The hard coat film according to claim 2, wherein the value of the bending resistance test of the hard coat layer measured by the cylindrical mandrel method according to JIS-K5600-5-1 (1999) is 6 mm or less. 如請求項1或2之硬塗膜,其中前述無機化合物層為光學調整層或氣體阻隔層。 The hard coat film according to claim 1 or 2, wherein the inorganic compound layer is an optical adjustment layer or a gas barrier layer. 如請求項1或2之硬塗膜,其中前述無機化合物層為SiO2或Nb2Ox(惟4≦x≦5)。 The hard coat film according to claim 1 or 2, wherein the inorganic compound layer is SiO 2 or Nb 2 O x (only 4≦x≦5). 如請求項1或2之硬塗膜,其中前述無機化合物層係以單層或多層所構成。 The hard coat film according to claim 1 or 2, wherein the inorganic compound layer is composed of a single layer or multiple layers. 一種透明導電性膜,其係使用如請求項1至10中任一項之硬塗膜。 A transparent conductive film using the hard coat film according to any one of claims 1 to 10. 一種觸控面板,其係使用如請求項1至10中任一項之硬塗膜。 A touch panel using the hard coat film according to any one of claims 1 to 10.
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