TWI632835B - Circuit board structure and manufacturing method thereof - Google Patents
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Abstract
一種電路板結構,包括基板、線路、及獨立金屬墊。所述基板包含有位於相反側的第一板面與第二板面。所述線路與獨立金屬墊設置於基板的第一板面,並且所述獨立金屬墊與線路呈間隔設置且相互電性隔離。其中,所述獨立金屬墊包含有設置於第一板面的接合部及形成於上述接合部上的硬金層。藉此,本發明提供一種具有獨立金屬墊的電路板結構。此外,本發明另提供一種電路板結構製造方法。 A circuit board structure comprising a substrate, a line, and a separate metal pad. The substrate includes a first plate surface and a second plate surface on opposite sides. The circuit and the independent metal pad are disposed on the first board surface of the substrate, and the independent metal pads are spaced apart from the line and electrically isolated from each other. The independent metal pad includes a joint portion disposed on the first plate surface and a hard gold layer formed on the joint portion. Thereby, the present invention provides a circuit board structure having a separate metal pad. In addition, the present invention further provides a method of fabricating a circuit board structure.
Description
本發明涉及一種電路板,尤其涉及一種具有獨立金屬墊的電路板及其製造方法。 The present invention relates to a circuit board, and more particularly to a circuit board having a separate metal pad and a method of fabricating the same.
現有電路板結構在成形金手指的時候,大致依循圖1至圖3所示的步驟,具體說明如下。如圖1,在基板1a上成形有金屬層2a,並且金屬層2a包含待鍍金區21a及非鍍金區22a,而位於上述待鍍金區21a兩側的非鍍金區22a是以防焊層3a覆蓋。如圖2,在金屬層2a的待鍍金區21a上形成金層4a,並且上述金層4a包含有功能區塊41a與無效區塊42a。如圖3,去除功能區塊41a上側的部分無效區塊42a及非鍍金區22a。 The existing circuit board structure generally follows the steps shown in FIG. 1 to FIG. 3 when forming a gold finger, as described below. As shown in FIG. 1, a metal layer 2a is formed on a substrate 1a, and the metal layer 2a includes a gold-plated region 21a and a non-gold-plated region 22a, and the non-gold-plated regions 22a on both sides of the gold-plated region 21a are covered with a solder resist layer 3a. . As shown in Fig. 2, a gold layer 4a is formed on the gold-plated region 21a of the metal layer 2a, and the gold layer 4a includes a functional block 41a and an ineffective block 42a. As shown in FIG. 3, the partial inactive block 42a and the non-gold plated area 22a on the upper side of the functional block 41a are removed.
依上所述,現有電路板結構100a在金層4a的功能區塊41a之相反兩側,還留有相連接的無效區塊42a(如圖3),並且現有電路板結構100a在圖3的步驟中還必須去除已完成鍍金的區塊。因此,現有電路板結構100a顯然產生許多不必要的貴金屬(如:金)浪費。 According to the above, the existing circuit board structure 100a is left on the opposite sides of the functional block 41a of the gold layer 4a, and there are also connected ineffective blocks 42a (as shown in FIG. 3), and the existing circuit board structure 100a is in FIG. It is also necessary to remove the blocks that have been completely plated in the step. Therefore, the existing circuit board structure 100a apparently generates a lot of unnecessary precious metal (e.g., gold) waste.
於是,本發明人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本發明。 Accordingly, the inventors believe that the above-mentioned defects can be improved, and that the invention has been studied with great interest and with the use of scientific principles, and finally proposes a present invention which is rational in design and effective in improving the above-mentioned defects.
本發明實施例公開一種電路板結構及其製造方法,用來有效地改善現有電路板結構所可能產生的缺失。 The embodiment of the invention discloses a circuit board structure and a manufacturing method thereof for effectively improving the defects that may occur in the existing circuit board structure.
本發明實施例公開一種電路板結構,包括:一基板,包含有位於相反側的一第一板面與一第二板面;一線路,設置於所述基板的所述第一板面;以及一獨立金屬墊,設置於所述基板的所述第一板面,所述獨立金屬墊與所述線路呈間隔設置且相互電性隔離;其中,所述獨立金屬墊包含有設置於所述第一板面的一接合部及形成於所述接合部上的一硬金層。 The embodiment of the invention discloses a circuit board structure, comprising: a substrate comprising a first board surface and a second board surface on opposite sides; a line disposed on the first board surface of the substrate; a separate metal pad disposed on the first board surface of the substrate, the independent metal pad being spaced apart from the line and electrically isolated from each other; wherein the independent metal pad includes a first metal pad a joint portion of a plate surface and a hard gold layer formed on the joint portion.
優選地,所述接合部包含有設置於所述第一板面的一銅層及連接所述銅層與所述硬金層的一鎳層,所述銅層與所述線路具有相同的高度。 Preferably, the joint portion includes a copper layer disposed on the first plate surface and a nickel layer connecting the copper layer and the hard gold layer, the copper layer having the same height as the line .
優選地,所述銅層側壁未包覆於所述硬金層,並且所述銅層的寬度自鄰近所述第一板面朝向遠離所述第一板面逐漸地縮小。 Preferably, the sidewall of the copper layer is not covered by the hard gold layer, and the width of the copper layer is gradually reduced from adjacent to the first board surface away from the first board surface.
優選地,所述硬金層的外側部位凸伸出所述銅層。 Preferably, an outer portion of the hard gold layer protrudes from the copper layer.
優選地,所述電路板結構進一步包括有設置於所述第一板面的一防焊層,所述防焊層圍繞於所述獨立金屬墊外側,並且所述線路至少部分埋置於所述防焊層,而所述獨立金屬墊未接觸於所述防焊層。 Preferably, the circuit board structure further includes a solder resist layer disposed on the first board surface, the solder resist layer surrounding the outer side of the independent metal pad, and the line is at least partially embedded in the a solder resist layer, and the separate metal pads are not in contact with the solder resist layer.
優選地,所述硬金層相較於所述第一板面的高度不小於所述防焊層相較於所述第一板面的高度。 Preferably, the height of the hard gold layer compared to the first plate surface is not less than the height of the solder resist layer compared to the first plate surface.
本發明實施例也公開一種電路板結構製造方法,包括:提供一基板與設置於所述基板上的一導電層;其中,所述基板包含有位於相反側的一第一板面與一第二板面,所述導電層設置於所述第一板面;在所述導電層的一預定區塊上形成有一鍵結層及設置於所述鍵結層的一硬金層;以及將所述導電層蝕刻成所述預定區塊及與所述預定區塊相互分離的一線路;其中,所述預定區塊、所述鍵結層、及所述硬金層合稱為一獨立金屬墊。 The embodiment of the invention also discloses a method for manufacturing a circuit board structure, comprising: providing a substrate and a conductive layer disposed on the substrate; wherein the substrate comprises a first plate surface and a second surface on opposite sides a plate surface, the conductive layer is disposed on the first plate surface; a bonding layer and a hard gold layer disposed on the bonding layer are formed on a predetermined block of the conductive layer; The conductive layer is etched into the predetermined block and a line separated from the predetermined block; wherein the predetermined block, the bonding layer, and the hard gold layer are collectively referred to as a separate metal pad.
優選地,在所述導電層上設置有一圖案層;其中,所述圖案層具有一圖形孔,以裸露所述導電層的所述預定區塊;在所述圖形孔內的所述預定區塊上依序成形所述鍵結層與所述硬金層,而 後去除所述圖案層。 Preferably, a patterned layer is disposed on the conductive layer; wherein the patterned layer has a pattern hole to expose the predetermined block of the conductive layer; the predetermined block in the graphic hole Forming the bonding layer and the hard gold layer sequentially, and The pattern layer is then removed.
優選地,在所述硬金層及所述導電層的一預定線路區塊上形成一遮蔽層,並蝕刻未被所述遮蔽層所覆蓋的所述導電層部位,以使所述導電層成形為所述預定區塊及所述線路,而後去除所述遮蔽層。 Preferably, a shielding layer is formed on a predetermined line block of the hard gold layer and the conductive layer, and the conductive layer portion not covered by the shielding layer is etched to form the conductive layer The predetermined block and the line are removed, and then the shielding layer is removed.
優選地,所述電路板製造方法進一步包括:於所述第一板面形成一防焊層,並使所述防焊層圍繞於所述獨立金屬墊外側且將所述線路的至少部分埋置於其內。 Preferably, the circuit board manufacturing method further comprises: forming a solder resist layer on the first board surface, and surrounding the solder resist layer around the independent metal pad and embedding at least part of the line Within it.
綜上所述,本發明實施例所公開的電路板結構及其製造方法,可無須移除任何硬金層而形成獨立金屬墊,並且所述獨立金屬墊不會連接任何無效區塊,以避免電路板結構產生不必要的貴金屬(如:金)浪費。 In summary, the circuit board structure and the manufacturing method thereof disclosed in the embodiments of the present invention can form a separate metal pad without removing any hard gold layer, and the independent metal pad does not connect any invalid blocks to avoid The board structure creates unnecessary waste of precious metals (eg gold).
再者,由於本實施例的電路板結構在形成獨立金屬墊的過程中,無須如習知般以非鍍金區作為待鍍金區之導引,所以本實施例的電路板結構能夠在基板上的任何位置形成有獨立金屬墊,進而使基板上的獨立金屬墊之外型、尺寸、位置、及密度,較不會受到限制,藉以有效地促進電路板結構的發展。 Moreover, since the circuit board structure of the embodiment does not need to be a non-gold plating area as a guide for the gold plating area as in the process of forming the independent metal pad, the circuit board structure of the embodiment can be on the substrate. Separate metal pads are formed at any position, so that the shape, size, position, and density of the independent metal pads on the substrate are not limited, thereby effectively promoting the development of the circuit board structure.
為能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,但是此等說明與附圖僅用來說明本發明,而非對本發明的保護範圍作任何的限制。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying claims limit.
100a‧‧‧現有電路板結構 100a‧‧‧ Existing board structure
1a‧‧‧基板 1a‧‧‧Substrate
2a‧‧‧金屬層 2a‧‧‧metal layer
21a‧‧‧待鍍金區 21a‧‧‧Gold-plated area
22a‧‧‧非鍍金區 22a‧‧‧Non-plated area
3a‧‧‧防焊層 3a‧‧‧ solder mask
4a‧‧‧金層 4a‧‧‧ gold layer
41a‧‧‧功能區塊 41a‧‧‧ functional block
42a‧‧‧無效區塊 42a‧‧‧ Invalid block
100‧‧‧電路板結構 100‧‧‧Circuit board structure
1‧‧‧基板 1‧‧‧Substrate
11‧‧‧第一板面 11‧‧‧ first board
12‧‧‧第二板面 12‧‧‧ second board
13‧‧‧貫孔 13‧‧‧Tongkong
2’‧‧‧預定線路區塊 2’‧‧‧ Scheduled Line Blocks
2‧‧‧線路 2‧‧‧ lines
3‧‧‧獨立金屬墊 3‧‧‧Independent metal mat
31’‧‧‧預定區塊 31’‧‧‧Predetermined block
31‧‧‧銅層 31‧‧‧ copper layer
32‧‧‧鍵結層(鎳層) 32‧‧‧ Bonding layer (nickel layer)
33‧‧‧硬金層 33‧‧‧ hard gold layer
34‧‧‧接合部 34‧‧‧ joints
4‧‧‧防焊層 4‧‧‧ solder mask
41‧‧‧開孔 41‧‧‧Opening
10‧‧‧導電層 10‧‧‧ Conductive layer
20‧‧‧圖案層 20‧‧‧pattern layer
201‧‧‧圖形孔 201‧‧‧graphic hole
30‧‧‧遮蔽層 30‧‧‧Shielding layer
H1、H2‧‧‧高度 H1, H2‧‧‧ height
圖1為現有電路板結構的製造步驟(一)。 FIG. 1 is a manufacturing step (1) of a conventional circuit board structure.
圖2為現有電路板結構的製造步驟(二)。 2 is a manufacturing step (2) of a conventional circuit board structure.
圖3為現有電路板結構的製造步驟(三)。 FIG. 3 is a manufacturing step (3) of the conventional circuit board structure.
圖4A為本發明電路板結構製造方法的步驟S110之示意圖。 4A is a schematic diagram of step S110 of the method for fabricating a circuit board structure of the present invention.
圖4B為圖4A沿IVB-IVB剖線的剖視示意圖。 4B is a cross-sectional view of FIG. 4A taken along line IVB-IVB.
圖5A為本發明電路板結構製造方法的步驟S120與步驟S130之示意圖。 FIG. 5A is a schematic diagram of steps S120 and S130 of the method for manufacturing a circuit board structure according to the present invention.
圖5B為圖5A沿VB-VB剖線的剖視示意圖。 Figure 5B is a cross-sectional view taken along line VB-VB of Figure 5A.
圖6A為本發明電路板結構製造方法的步驟S140之示意圖。 FIG. 6A is a schematic diagram of step S140 of the method for fabricating a circuit board structure according to the present invention.
圖6B為圖6A沿VIB-VIB剖線的剖視示意圖。 Figure 6B is a cross-sectional view taken along line VIB-VIB of Figure 6A.
圖7A為本發明電路板結構製造方法的步驟S150之示意圖。 FIG. 7A is a schematic diagram of step S150 of the method for fabricating a circuit board structure according to the present invention.
圖7B為圖7A沿VⅡB-VⅡB剖線的剖視示意圖。 Figure 7B is a cross-sectional view taken along line VIIB-VIIB of Figure 7A.
圖8A為本發明電路板結構製造方法的步驟S160之示意圖。 FIG. 8A is a schematic diagram of step S160 of the method for fabricating a circuit board structure according to the present invention.
圖8B為圖8A沿VⅢB-VⅢB剖線的剖視示意圖。 Figure 8B is a cross-sectional view taken along line VIIIB-VIIIB of Figure 8A.
圖8C為圖8B中的VⅢC部位的局部放大示意圖。 Fig. 8C is a partially enlarged schematic view showing the portion VIIIC of Fig. 8B.
請參閱圖4A至圖8C,為本發明的實施例,需先說明的是,本實施例對應附圖所提及的相關數量與外型,僅用來具體地說明本發明的實施方式,以便於了解本發明的內容,而非用來侷限本發明的保護範圍。 Please refer to FIG. 4A to FIG. 8C, which are the embodiments of the present invention. It should be noted that the related embodiments and the appearances mentioned in the drawings are only used to specifically describe the embodiments of the present invention. It is to be understood that the scope of the invention is not intended to limit the scope of the invention.
本實施例提供一種電路板結構100及其製造方法,上述電路板結構100例如是應用在伺服器或半導體測試等方面,但本發明不以此為限。再者,為便於理解本實施例,下述將先大致說明電路板結構製造方法的各個步驟(如:步驟S110~步驟S160),而後再接著介紹所述電路板結構100的構造特徵。其中,在說明電路板結構製造方法的各個步驟時,圖式僅以局部區塊作為示意,此並非用以侷限本發明的數量與實施範圍。 The embodiment provides a circuit board structure 100 and a manufacturing method thereof. The circuit board structure 100 is applied to a server or a semiconductor test, for example, but the invention is not limited thereto. Furthermore, in order to facilitate the understanding of the present embodiment, various steps of the circuit board structure manufacturing method (for example, steps S110 to S160) will be briefly described below, and then the structural features of the circuit board structure 100 will be described later. In the description of the various steps of the method of manufacturing the circuit board structure, the drawings are only illustrated by local blocks, which are not intended to limit the scope and implementation scope of the present invention.
步驟S110:請參閱圖4A和圖4B所示,提供一基板1與設置於所述基板1上的一導電層10。其中,所述基板1包含有位於相反側的一第一板面11(如圖4B中的基板1頂面)與一第二板面12(如圖4B中的基板1底面),並且所述導電層10設置於上述基板1的第一板面11。 Step S110: Referring to FIG. 4A and FIG. 4B, a substrate 1 and a conductive layer 10 disposed on the substrate 1 are provided. The substrate 1 includes a first board surface 11 on the opposite side (such as the top surface of the substrate 1 in FIG. 4B) and a second board surface 12 (such as the bottom surface of the substrate 1 in FIG. 4B), and the The conductive layer 10 is provided on the first plate surface 11 of the substrate 1 described above.
進一步地說,本實施例的導電層10是通過銅電鍍方式成形於 基板的整個第一板面11,但本發明不受限於此。舉例來說,在一未繪示的實施例中,所述導電層10也可以是通過銅箔壓合方式成形於基板1的第一板面11。 Further, the conductive layer 10 of the present embodiment is formed by copper plating. The entire first plate surface 11 of the substrate, but the invention is not limited thereto. For example, in an embodiment not shown, the conductive layer 10 may also be formed on the first board surface 11 of the substrate 1 by a copper foil pressing method.
再者,本實施例的基板1也可以形成有自所述第一板面11貫穿至第二板面12的多個貫孔13,並於上述每個貫孔13內設有連接於所述導電層10的一導電材料(圖中未示出),但本發明不以此為限。 Furthermore, the substrate 1 of the present embodiment may be formed with a plurality of through holes 13 penetrating from the first plate surface 11 to the second plate surface 12, and connected to the through holes 13 in the through holes 13 A conductive material (not shown) of the conductive layer 10, but the invention is not limited thereto.
步驟S120:請參閱圖5A和圖5B所示,在所述導電層10上設置有一圖案層20。其中,所述圖案層20具有一圖形孔201,以裸露所述導電層10的一預定區塊31’。 Step S120: Referring to FIG. 5A and FIG. 5B, a patterned layer 20 is disposed on the conductive layer 10. The pattern layer 20 has a pattern hole 201 to expose a predetermined block 31' of the conductive layer 10.
進一步地說,本實施例的圖案層20是在導電層10上先貼附乾膜,而後將上述乾膜以曝光顯影方式形成具有特定形狀的圖形孔201,藉以使圖形孔201能夠露出設計者所需之特定形狀的預定區塊31’。其中,上述圖案層20的成形過程中,較佳的環境條件為溫度20℃~24℃、濕度50%~60%。因此,本實施例所採用的步驟S120可以依據設計者的不同需求,而實現各種形狀的預定區塊31’,藉以跳脫習知金手指的長條狀限制。 Further, the pattern layer 20 of the present embodiment has a dry film attached to the conductive layer 10, and then the dry film is formed into a pattern hole 201 having a specific shape by exposure and development, so that the pattern hole 201 can be exposed to the designer. A predetermined block 31' of a particular shape is desired. Among them, in the forming process of the pattern layer 20, the preferable environmental conditions are a temperature of 20 ° C to 24 ° C and a humidity of 50% to 60%. Therefore, the step S120 employed in the embodiment can realize the predetermined block 31' of various shapes according to the different needs of the designer, thereby jumping away from the long strip limit of the conventional gold finger.
步驟S130:請參閱圖5A和圖5B所示,在所述圖形孔201內的預定區塊31’上依序成形一鍵結層32與一硬金層(hard gold layer)33,進一步地說,在所述導電層10的預定區塊31’上以例如電鍍方式沉積形成有上述鍵結層32及設置於鍵結層32的硬金層33;而後去除所述圖案層20。 Step S130: Referring to FIG. 5A and FIG. 5B, a bonding layer 32 and a hard gold layer 33 are sequentially formed on the predetermined block 31' in the pattern hole 201, and further, The bonding layer 32 and the hard gold layer 33 disposed on the bonding layer 32 are deposited on the predetermined block 31' of the conductive layer 10 by, for example, electroplating; and then the pattern layer 20 is removed.
其中,所述鍵結層32與硬金層33於本實施例中是大致填滿上述圖形孔201,亦即,上述硬金層33外表面大致齊平於圖案層20的外表面,但本發明不受限於此。 In this embodiment, the bonding layer 32 and the hard gold layer 33 substantially fill the pattern hole 201, that is, the outer surface of the hard gold layer 33 is substantially flush with the outer surface of the pattern layer 20, but The invention is not limited thereto.
再者,由於所述硬金層33與材質為銅的導電層10之間難以 穩固地結合,所以本實施例是通過鍵結層32來使硬金層33能夠穩固地附著於導電層10上。更詳細地說,本實施例的鍵結層32為鎳層32,並且所述鎳層32能夠分別與硬金層33及材質為銅的導電層10產生強度較佳的鍵結。 Furthermore, it is difficult to be between the hard gold layer 33 and the conductive layer 10 made of copper. The bonding is firmly performed, so in the present embodiment, the hard gold layer 33 can be firmly attached to the conductive layer 10 by the bonding layer 32. In more detail, the bonding layer 32 of the present embodiment is a nickel layer 32, and the nickel layer 32 can be bonded to the hard gold layer 33 and the copper-clad conductive layer 10, respectively.
步驟S140:請參閱圖6A和圖6B所示,在所述硬金層33及導電層10的一預定線路區塊2’上形成一遮蔽層30。也就是說,設計者能透過特定圖案的遮蔽層30覆蓋導電層10的預定線路區塊2’,來成形所需要的線路圖案。其中,上述預定線路區塊2’與預定區塊31’為導電層10中相互分離的兩個部位,並且本實施例的預定線路區塊2’可以設置於上述基板1設有貫孔13的部位上,但不以此為限。 Step S140: Referring to FIG. 6A and FIG. 6B, a masking layer 30 is formed on the hard gold layer 33 and a predetermined line block 2' of the conductive layer 10. That is, the designer can cover the predetermined line block 2' of the conductive layer 10 through the masking layer 30 of the specific pattern to form the desired line pattern. The predetermined line block 2 ′ and the predetermined block block ′′ are two locations separated from each other in the conductive layer 10 , and the predetermined line block 2 ′ of the embodiment may be disposed on the substrate 1 and provided with the through hole 13 . On the part, but not limited to this.
進一步地說,本實施例的遮蔽層30是在硬金層33與導電層10上先貼附乾膜,而後將導電層10上的乾膜以曝光顯影方式形成具有特定形狀的遮蔽層30,藉以使遮蔽層30能夠覆蓋設計者所需之特定形狀的預定線路區塊2’。其中,上述遮蔽層30的成形過程中,較佳的環境條件為溫度20℃~24℃、濕度50%~60%。因此,本實施例所採用的步驟S140可以依據設計者的不同需求,而實現各種形狀的預定線路區塊2’。 Further, the shielding layer 30 of the present embodiment is first attached with a dry film on the hard gold layer 33 and the conductive layer 10, and then the dry film on the conductive layer 10 is formed into a shielding layer 30 having a specific shape by exposure and development. Thereby, the shielding layer 30 can cover a predetermined line block 2' of a specific shape required by the designer. Among them, in the forming process of the shielding layer 30, the preferable environmental conditions are a temperature of 20 ° C to 24 ° C and a humidity of 50% to 60%. Therefore, the step S140 employed in the embodiment can realize the predetermined line block 2' of various shapes according to different needs of the designer.
步驟S150:請參閱圖7A和圖7B所示,通過蝕刻上述未被遮蔽層30覆蓋的導電層10部位,以使所述導電層10成形為(或留下)銅層31(即預定區塊31’)及至少一線路2(即預定線路區塊2’),而後去除所述遮蔽層30。也就是說,將所述導電層10蝕刻成銅層31及與上述銅層31相互分離的至少一線路2。上述銅層31(即預定區塊31’)、鍵結層32、及硬金層33於本實施例中合稱為一獨立金屬墊3。 Step S150: Referring to FIG. 7A and FIG. 7B, the conductive layer 10 is formed by etching the portion of the conductive layer 10 covered by the unmasked layer 30 to form (or leave) the copper layer 31 (ie, a predetermined block). 31') and at least one line 2 (i.e., predetermined line block 2'), and then the masking layer 30 is removed. That is, the conductive layer 10 is etched into a copper layer 31 and at least one line 2 separated from the copper layer 31. The copper layer 31 (i.e., the predetermined block 31'), the bonding layer 32, and the hard gold layer 33 are collectively referred to as a separate metal pad 3 in this embodiment.
其中,上述”蝕刻”於本實施例中是以化學蝕刻方式實施,並 且上述化學蝕刻較佳是採用的不會侵蝕硬金層33的蝕刻液,藉以利於獨立金屬墊3的硬金層33能夠維持設計者所預定的外型,但本發明不受限於此。 Wherein, the above "etching" is performed by chemical etching in the embodiment, and Moreover, the above chemical etching is preferably an etching liquid which does not erode the hard gold layer 33, whereby the hard gold layer 33 of the individual metal pad 3 can maintain the appearance predetermined by the designer, but the invention is not limited thereto.
再者,所述獨立金屬墊3的硬金層33於本實施例中適用於接觸式連接,藉以通過碰觸外部元件而形成連通,進而應用在伺服器或半導體測試等方面,但本發明不以此為限。 Furthermore, the hard gold layer 33 of the independent metal pad 3 is suitable for the contact connection in the embodiment, whereby the communication is formed by touching the external component, and is applied to the servo or semiconductor test, etc., but the present invention does not This is limited to this.
步驟S160:請參閱圖8A和圖8B所示,於所述基板1的第一板面11形成一防焊層4,並使所述防焊層4圍繞於所述獨立金屬墊3外側且將所述線路2的至少部分埋置於其內。進一步地說,所述防焊層4能設有用來露出部分線路2的至少一開孔41,以使上述經由開孔41露出的線路2部位能夠連接(如:焊接或插接等)於一外部元件。 Step S160: Referring to FIG. 8A and FIG. 8B, a solder resist layer 4 is formed on the first board surface 11 of the substrate 1, and the solder resist layer 4 is surrounded by the outside of the independent metal pad 3 and At least a portion of the line 2 is embedded therein. Further, the solder resist layer 4 can be provided with at least one opening 41 for exposing part of the line 2, so that the portion of the line 2 exposed through the opening 41 can be connected (eg, soldered or plugged, etc.) External components.
再者,所述防焊層4在成形的過程中,較佳是防焊層4未接觸於獨立金屬墊3,並且所述硬金層33相較於第一板面11的高度H1不小於所述防焊層4相較於第一板面11的高度H2,但本發明不受限於此。 Moreover, in the process of forming the solder resist layer 4, it is preferable that the solder resist layer 4 is not in contact with the independent metal pad 3, and the height H1 of the hard gold layer 33 is not smaller than the height H1 of the first board surface 11. The solder resist layer 4 is higher than the height H2 of the first plate surface 11, but the invention is not limited thereto.
據此,經由實施上述步驟S110~S160之後,即可製造完成本實施例的電路板結構100,但上述各個步驟S110~S160在實際運用時,能夠以合理的方式置換、變化或取代,而不侷限於本實施例所載。舉例來說,所述基板1的第一板面11與第二板面12可以皆成形有獨立金屬墊3,或者是上述第一板面11與第二板面12的其中之一成形有獨立金屬墊3。 Accordingly, after the above steps S110 to S160 are performed, the circuit board structure 100 of the present embodiment can be manufactured, but the above steps S110 to S160 can be replaced, changed or replaced in a reasonable manner without being used in practice. Limited to the present embodiment. For example, the first plate surface 11 and the second plate surface 12 of the substrate 1 may be formed with a separate metal pad 3, or one of the first plate surface 11 and the second plate surface 12 may be formed separately. Metal pad 3.
再者,本實施例於下述將接著說明經由實施步驟S110~S160所完成的電路板結構100之構造特徵,但本發明的電路板結構100並不侷限於以步驟S110~S160所完成。 Furthermore, in the present embodiment, the structural features of the circuit board structure 100 completed by the steps S110 to S160 will be described below, but the circuit board structure 100 of the present invention is not limited to the steps S110 to S160.
請參閱圖8A至圖8C,所述電路板結構100包括一基板1、設置於所述基板1且相互分離的一線路2與一獨立金屬墊3、及設置於所述基板1的一防焊層4。其中,所述基板1包含有位於相反側的一第一板面11與一第二板面12,並且上述線路2、獨立金屬墊3、及防焊層4皆設置於基板1的第一板面11。 Referring to FIG. 8A to FIG. 8C , the circuit board structure 100 includes a substrate 1 , a line 2 and a separate metal pad 3 disposed on the substrate 1 and separated from each other, and a solder mask disposed on the substrate 1 . Layer 4. The substrate 1 includes a first board surface 11 and a second board surface 12 on opposite sides, and the circuit 2, the independent metal pad 3, and the solder resist layer 4 are disposed on the first board of the substrate 1. Face 11.
再者,所述獨立金屬墊3與線路2呈間隔設置且相互電性隔離,並且所述獨立金屬墊3包含有設置於上述第一板面11的一接合部34及形成於接合部34上的一硬金層33。 Furthermore, the independent metal pads 3 are spaced apart from each other and electrically isolated from each other, and the independent metal pads 3 include a joint portion 34 disposed on the first plate surface 11 and formed on the joint portion 34. A hard gold layer 33.
更詳細地說,所述接合部34於本實施例中包含有設置於所述基板1第一板面11的一銅層31及連接上述銅層31與硬金層33的一鎳層32,並且本實施例中的銅層31與線路2是通過相同的導電層10所製造而具有相同的高度。須說明的是,本實施例的接合部34雖是以銅層31與鎳層32為例,但本發明的接合部34不排除以其他構造或材質取代上述銅層31與鎳層32。 In more detail, the bonding portion 34 includes a copper layer 31 disposed on the first board surface 11 of the substrate 1 and a nickel layer 32 connecting the copper layer 31 and the hard gold layer 33. Also, the copper layer 31 and the wiring 2 in this embodiment are manufactured by the same conductive layer 10 to have the same height. It should be noted that the bonding portion 34 of the present embodiment is exemplified by the copper layer 31 and the nickel layer 32. However, the bonding portion 34 of the present invention does not exclude the replacement of the copper layer 31 and the nickel layer 32 by other structures or materials.
進一步地說,所述銅層31側壁未包覆於所述硬金層33與鎳層32,並且銅層31的寬度自鄰近第一板面11朝向遠離第一板面11(如圖8B中的由下而上之方向)逐漸地縮小。所述硬金層33與鎳層32的寬度大致相等,並且所述硬金層33與鎳層32的外側部位凸伸出上述銅層3,而所述硬金層33相較於第一板面11的高度H1不小於(如:大於)所述防焊層4相較於第一板面11的高度H2。 Further, the sidewall of the copper layer 31 is not covered by the hard gold layer 33 and the nickel layer 32, and the width of the copper layer 31 is from the adjacent first board surface 11 away from the first board surface 11 (as shown in FIG. 8B). The bottom-up direction gradually shrinks. The hard gold layer 33 and the nickel layer 32 have substantially the same width, and the outer portions of the hard gold layer 33 and the nickel layer 32 protrude from the copper layer 3, and the hard gold layer 33 is compared to the first plate. The height H1 of the face 11 is not less than (e.g., greater than) the height H2 of the solder resist layer 4 compared to the first plate face 11.
另,所述防焊層4圍繞於獨立金屬墊3外側,並且所述線路2至少部分埋置於所述防焊層4內。其中,所述獨立金屬墊3較佳是未接觸於防焊層4。 In addition, the solder resist layer 4 surrounds the outside of the individual metal pad 3, and the line 2 is at least partially embedded in the solder resist layer 4. Wherein, the independent metal pad 3 is preferably not in contact with the solder resist layer 4.
綜上所述,本發明實施例所公開電路板結構及其製造方法,可無須移除任何硬金層33而形成獨立金屬墊3,並且所述獨立金屬墊3不會連接任何無效區塊,以避免電路板結構100產生不必 要的貴金屬浪費。 In summary, the circuit board structure and the manufacturing method thereof disclosed in the embodiments of the present invention can form the independent metal pad 3 without removing any hard gold layer 33, and the independent metal pad 3 does not connect any invalid blocks. To avoid the need for the board structure 100 to be generated The precious metal is wasted.
再者,由於本實施例的電路板結構100在形成獨立金屬墊3的過程中,無須如習知般以非鍍金區作為待鍍金區之導引(如圖1),所以本實施例的電路板結構100能夠在基板1上的任何位置形成有獨立金屬墊3,進而使基板1上的獨立金屬墊3之外型、尺寸、位置、及密度,較不會受到限制,藉以有效地促進電路板結構100的發展。 Furthermore, since the circuit board structure 100 of the present embodiment does not need to use a non-gold plating area as a guide for the gold plating area (see FIG. 1) in the process of forming the independent metal pad 3, the circuit of the embodiment The board structure 100 can be formed with a separate metal pad 3 at any position on the substrate 1, so that the appearance, size, position, and density of the independent metal pad 3 on the substrate 1 are not limited, thereby effectively promoting the circuit. The development of the board structure 100.
以上所述僅為本發明的優選可行實施例,並非用來侷限本發明的保護範圍,凡依本發明申請專利範圍所做的均等變化與修飾,皆應屬本發明的權利要求書的保護範圍。 The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the present invention. The equivalents and modifications made by the scope of the present invention should fall within the scope of the claims of the present invention. .
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