TWI631889B - Electromagnetic wave shielding composite film - Google Patents
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
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- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
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Abstract
本發明之電磁波屏蔽複合膜,其結構特徵在於多層吸波結構(Multi-Layered Absorbing Stack Structure),其至少包括:一反射層、一吸波層及一入射層,其中藉由吸波層之電阻值高於反射層之電阻值,可引導電磁波來回游離於吸波層與反射層之間,促使空間入射的電磁波能量衰減,並減少或消除反射的電磁波。據此,本發明之電磁波屏蔽複合膜具有多層吸波結構,可阻止電磁波對鄰近線路及元件的干擾,此外,多層吸波結構之厚度具薄型化特色,可滿足軟性電路板的質量輕、材料薄、柔韌性好的要求。 The electromagnetic wave shielding composite film of the present invention is characterized by a multi-layered absorption structure (Multi-Layered Absorbing Stack Structure), which at least includes: a reflective layer, a absorbing layer, and an incident layer, wherein the resistance of the absorbing layer is adopted. The value is higher than the resistance value of the reflective layer, which can guide the electromagnetic wave to escape back and forth between the absorbing layer and the reflective layer, promote the attenuation of the incident electromagnetic wave energy in the space, and reduce or eliminate the reflected electromagnetic wave. According to this, the electromagnetic wave shielding composite film of the present invention has a multilayer wave absorbing structure, which can prevent electromagnetic waves from interfering with adjacent circuits and components. In addition, the thickness of the multilayer wave absorbing structure is thin, which can meet the requirements of light circuit board, light weight Thin, flexible requirements.
Description
本發明係有關一種電磁波屏蔽複合膜,尤指一種具有多層吸波結構之電磁波屏蔽複合膜。 The invention relates to an electromagnetic wave shielding composite film, in particular to an electromagnetic wave shielding composite film having a multi-layered absorbing structure.
為因應電子及通訊產品多功能的市場需求,電路基板的IC構裝需要更輕、薄、短、小;在功能上,則需要強大且高速訊號傳輸。因此,I/O腳數的密度勢必提高,而伴隨著IC腳位數目也得隨之增多。IC載板線路之間的距離越來越近,加上工作頻率朝向高寬頻化,使IC相互之間的電磁干擾(Electromagnetic Interference;EMI)情形越來越嚴重,因此如何有效電磁相容管理(Electromagnetic Compatibility;EMC),維持電子產品的正常訊號傳遞及提高可靠度將成為重要議題。 In order to meet the market demand for multifunctional electronic and communication products, the IC structure of circuit substrates needs to be lighter, thinner, shorter, and smaller; in terms of functions, it needs powerful and high-speed signal transmission. Therefore, the density of the number of I / O pins is bound to increase, and the number of IC pins must also increase. The distance between the IC carrier board lines is getting closer and closer, and the operating frequency is toward high-bandwidth, which makes the electromagnetic interference (EMI) situation between ICs more and more serious. Therefore, how to effectively manage electromagnetic compatibility ( Electromagnetic Compatibility (EMC), maintaining normal signal transmission of electronic products and improving reliability will become important issues.
市面上,軟板用電磁波屏蔽複合膜依施工方式大致可分為印製型導電漿料(Conductive Paste)與導電貼膠膜(Conductive Adhesive Film)兩大類。一般傳統印刷電路板(硬板)對於電磁波干擾防護措施,大多採用將導電性粉體(例如銀、銅、鎳等金屬)添加於高分子材料中,而形成印製型導電漿料。銀漿料具有極佳的儲存安定性,電磁波屏蔽效果是導電金屬材料中最佳者,但缺點是材料成本太高。銅漿料導電性好,電磁波屏蔽能力又僅次於銀漿料,但缺點是抗氧化能力差,在空氣下銅粉表面極易 生成導電性不佳的氧化銅。鎳漿料相對於銀、銅漿料的電磁波屏蔽能力薄弱許多,尤其是在頻率低於30MHz下,但其抗氧化能力較銅金屬來得優秀,粉體材料價格也比銀、銅金屬便宜許多,因此仍有其產品用途;目前軟板使用的電磁波屏蔽材料,因考量鎳漿料相較於銀、銅漿料要達到不錯的電磁波屏蔽特性需有較厚的塗層,因此軟板電磁波屏蔽材料大多仍採用銀、銅導電漿料。在製程上,印製型導電漿料具有加工方便、不需導電黏著膠,以及設備投資成本相對低廉等優勢,但其仍有諸多缺點尚待改善,如:導電漿料塗佈平整度與膜厚均勻性不易控制,產出效率偏低,為了達到較佳的電磁波屏蔽效益,需塗佈一定厚度的導電漿料,導致犧牲耐曲折特性。此外,印製導電層有氣孔或脫層等方面的疑慮,僅侷限於較不需大幅彎曲的軟板產品或硬板等方面的電磁波屏蔽之用,也就是高階軟板相關產品均不適合採用。 In the market, the electromagnetic wave shielding composite film for flexible boards can be roughly divided into two types: conductive conductive paste (Conductive Paste) and conductive adhesive film (Conductive Adhesive Film) according to the construction method. In general, conventional printed circuit boards (hard boards) for electromagnetic wave interference protection measures mostly use conductive powders (such as silver, copper, nickel and other metals) to be added to polymer materials to form printed conductive pastes. Silver paste has excellent storage stability, and the electromagnetic wave shielding effect is the best among conductive metal materials, but the disadvantage is that the material cost is too high. Copper paste has good conductivity, and its electromagnetic wave shielding ability is second only to silver paste. However, the disadvantage is that the oxidation resistance is poor, and the surface of copper powder is very easy in the air. This produces copper oxide with poor conductivity. Compared with silver and copper paste, the electromagnetic shielding ability of nickel paste is much weaker, especially at frequencies lower than 30MHz, but its oxidation resistance is better than that of copper metal. The price of powder materials is also much cheaper than silver and copper metal. Therefore, it still has its product use; the current electromagnetic shielding materials used in flexible boards, because of the nickel paste compared to silver and copper paste to achieve good electromagnetic shielding characteristics need a thicker coating, so flexible board electromagnetic shielding materials Most still use silver and copper conductive paste. In the manufacturing process, printed conductive paste has the advantages of convenient processing, no conductive adhesive is required, and relatively low investment cost of equipment, but it still has many disadvantages that need to be improved, such as: flatness of conductive paste coating and film Thickness uniformity is not easy to control, and the output efficiency is low. In order to achieve better electromagnetic wave shielding benefits, a conductive paste of a certain thickness needs to be coated, resulting in sacrificing resistance to bending. In addition, suspicions of printed conductive layers with pores or delamination are limited to electromagnetic wave shielding in areas such as flexible board products or hard boards that do not require significant bending, that is, high-end flexible board related products are not suitable for use.
第二種方式的電磁波屏蔽複合膜則是以真空濺鍍(Sputter)或蒸鍍(Evaporation)方式,在導電貼膠膜上沉積單層的銀導電金屬薄膜,藉此提升導電貼膠膜對電磁波干擾屏蔽能力。在考量金屬薄膜材料之可撓性、材料成本與電磁波屏蔽能力等因素下,銀薄膜的沉積厚度約在0.1μm。電磁波屏蔽膜的導電貼膠膜主要是由導電性粉體粒子,搭配具有一定固化交聯反應程度B-stage的高分子材料。一般常用的高分子材料有環氧樹脂(Epoxy Resin)、聚亞醯胺樹脂(Polyimide Resin)、矽樹脂(Silicon Resin)等。從材料成本與製程等方面考量,傳統導電貼膠膜所使用的高分子材料多由熱固化(Thermosetting)型環氧樹脂材料所組成。樹脂材料本身除了要有良好的黏著強度、高溫尺寸安定性,與保護軟板避免外在的化學、濕氣 與溶劑環境影響等膠膜基本功能特性外,為了符合軟板構裝加工性及軟板產品特性,在樹脂材料配方的反應機制設計上,需具備低溫快速硬化(~150℃)、適當的流變性與優異可撓彎曲性等。 The second method of electromagnetic wave shielding composite film is vacuum sputtering or evaporation, which deposits a single layer of silver conductive metal film on the conductive adhesive film, thereby improving the conductive adhesive film to electromagnetic waves. Interference shielding capability. Considering the flexibility of the metal thin film material, material cost, and electromagnetic wave shielding ability, the thickness of the silver thin film is about 0.1 μm. The conductive adhesive film of the electromagnetic wave shielding film is mainly composed of conductive powder particles and a polymer material having a certain degree of curing cross-linking reaction B-stage. Generally used polymer materials are epoxy resin (Epoxy Resin), polyimide resin (Polyimide Resin), silicone resin (Silicon Resin) and so on. Considering material cost and manufacturing process, the polymer materials used in traditional conductive adhesive films are mostly composed of thermosetting epoxy materials. The resin material itself must have good adhesive strength, high temperature dimensional stability, and protect the flexible board from external chemicals and moisture. In addition to the basic functional characteristics of the film, such as the effects of solvents and environmental influences, in order to meet the processability of flexible board assembly and flexible board product characteristics, the reaction mechanism design of the resin material formula requires rapid low temperature curing (~ 150 ° C) and appropriate flow. Denaturation and excellent flexibility.
以導電貼膠膜方式製作的電磁波屏蔽複合膜除了可以連續快速生產之外,其最大特點是搭配軟板時,具有極佳的可彎曲性、優越的機械接著性和高可靠度,因此導電貼膠膜是近年來廣受業界普遍採用的方式。導電貼膠膜可依電磁波屏蔽區域尺寸大小做合適裁剪,再施加快速熱壓合條件之下(150~170℃、3~10min),使導電貼膠膜內的導電粒子因樹脂材料受到熱壓而產生形變流動,進而與軟板上的接地走線接觸形成導電通路,之後再經一段時間,使樹脂達到完全交聯固化,以維持良好電性及物性,達到降低軟板接地走線的阻抗值,而降低電磁波干擾目的。由於其金屬薄膜沉積厚度約在0.1~1um之間,故可符合軟板所需的曲撓特性,且符合材料成本與電磁波屏蔽效益的需求,具有優越的彎曲性、機械性與可靠度。然而,此導電貼膠膜方式卻有研發及設備投資成本相對昂貴及無法有效屏蔽低頻率電磁波之缺點。 In addition to the electromagnetic wave shielding composite film produced by the conductive adhesive film method, in addition to continuous and rapid production, its biggest feature is that when it is used with a flexible board, it has excellent flexibility, superior mechanical adhesion and high reliability. Adhesive film is widely used in the industry in recent years. The conductive adhesive film can be appropriately cut according to the size of the electromagnetic wave shielding area, and then under rapid thermal compression conditions (150 ~ 170 ° C, 3 ~ 10min), the conductive particles in the conductive adhesive film are heat-pressed by the resin material. Deformation flow occurs, and then a conductive path is formed by contact with the ground trace on the flexible board. After a period of time, the resin is completely cross-linked and cured to maintain good electrical and physical properties and reduce the impedance of the ground trace on the flexible board. Value while reducing electromagnetic interference. Because the thickness of the metal thin film is between 0.1 and 1um, it can meet the flexural characteristics required for flexible boards, and meet the requirements of material cost and electromagnetic wave shielding benefits. It has superior bendability, mechanical properties, and reliability. However, this conductive adhesive film method has the disadvantages of relatively high R & D and equipment investment costs and inability to effectively shield low-frequency electromagnetic waves.
有鑑於上述缺點,目前仍亟需發展一種可展現優異全波段電磁波屏蔽效果、適合薄型化設計且可降低成本之電磁波屏蔽複合膜,以期應用於軟板電路板時可符合其需求。 In view of the above-mentioned shortcomings, it is still urgent to develop an electromagnetic wave shielding composite film that can exhibit excellent full-band electromagnetic wave shielding effects, is suitable for thin design, and can reduce costs, in order to meet its needs when applied to flexible circuit boards.
本發明之目的在於提供一種電磁波屏蔽複合膜,其利用多層吸波結構以提高全波段電磁波屏蔽效果,並同時可降低以導電貼膠膜方式製作電磁波屏蔽膜之成本,薄型化電磁波屏蔽複合膜之厚度,俾可簡化與 軟性電路板整合工序。 The purpose of the present invention is to provide an electromagnetic wave shielding composite film, which uses a multi-layered wave absorbing structure to improve the full-wave electromagnetic wave shielding effect, and at the same time can reduce the cost of manufacturing an electromagnetic wave shielding film by a conductive adhesive film. Thickness, 俾 can be simplified with Soft circuit board integration process.
為達成上述目的,本發明提供一種電磁波屏蔽複合膜,其包含:一入射層,其包含一導電填充材料;一吸波層,其係設置於該入射層之一側上;以及一反射層,其係設置於該吸波層上,以夾置該吸波層於該入射層與該反射層之間,其中該吸波層之電阻值高於該反射層之電阻值。 To achieve the above object, the present invention provides an electromagnetic wave shielding composite film including: an incident layer including a conductive filling material; a wave absorbing layer disposed on one side of the incident layer; and a reflective layer, It is arranged on the wave absorbing layer to sandwich the wave absorbing layer between the incident layer and the reflection layer, wherein the resistance value of the wave absorption layer is higher than the resistance value of the reflection layer.
據此,本發明係於該入射層上依序疊置該吸波層及該反射層,藉由該吸波層之電阻值高於該反射層之電阻值,因而引導電磁波來回游離於該吸波層與該反射層之間,促使空間入射的電磁波能量衰減,並減少或消除反射的電磁波,進而達到更佳之全波段電磁屏蔽效果。藉此,本發明具有多層吸波結構之電磁波屏蔽複合膜有利於薄型化設計,以展現軟板所需的曲撓特性。 According to this, the present invention sequentially stacks the absorbing layer and the reflective layer on the incident layer. The resistance value of the absorbing layer is higher than the resistance value of the reflecting layer, so the electromagnetic waves are guided back and forth to escape from the absorbing layer. Between the wave layer and the reflective layer, the energy of electromagnetic waves incident in space is attenuated, and the reflected electromagnetic waves are reduced or eliminated, thereby achieving a better full-wave electromagnetic shielding effect. In this way, the electromagnetic wave shielding composite film with the multilayer wave absorbing structure of the present invention is advantageous for thin design, so as to exhibit the flexural characteristics required for a flexible board.
於本發明中,該入射層中之該導電填充材料可為一石墨烯,其中該石墨烯可為至少一單層石墨烯、至少一多層石墨烯或其混合,且該石墨烯較佳係由化學氣相沈積法(Chemical Vapor Deposition;CVD)或機械剝離法(Mechanical Exfoliation)所製備出,其平均厚度範圍可約為0.2奈米至300奈米。 In the present invention, the conductive filling material in the incident layer may be a graphene, wherein the graphene may be at least one single-layer graphene, at least one multi-layer graphene, or a mixture thereof, and the graphene is preferably a It is prepared by a chemical vapor deposition method (Chemical Vapor Deposition; CVD) or a mechanical exfoliation method (Mechanical Exfoliation), and the average thickness thereof may range from about 0.2 nm to 300 nm.
碳系材料的遮蔽作用主要取決於表面反射,而該石墨烯的結構更有利於提高多次反射損耗,尤其,該石墨烯是一層一層緊密平行排列之片狀結構,其通過層與層的接觸實現導電通路,由於其接觸面大、電阻小,故導電能力較強,俾可達到優異的電磁波屏蔽效果。此外,可藉由改變該入射層中之該導電填充材料的含量比例,以調整該入射層之面電阻值,例如,以該入射層之總重量為基準,該入射層中可包含0.5至80重量百 分比之該導電填充材料,藉以整體提升導引電磁波入射進電磁波屏蔽複合膜,以確保電磁波能自軟性電路板上的接地銅薄墊片導引進該吸波層與該反射層。在此,該入射層之厚度可為5微米至25微米。 The shielding effect of carbon-based materials mainly depends on the surface reflection, and the structure of the graphene is more conducive to increasing the multiple reflection loss. In particular, the graphene is a layer-by-layer structure closely arranged in parallel, which passes through the layer-to-layer contact The conductive path is realized. Because of its large contact surface and low resistance, it has strong conductive ability, and can achieve excellent electromagnetic wave shielding effect. In addition, the area resistance value of the incident layer can be adjusted by changing the content ratio of the conductive filling material in the incident layer. For example, based on the total weight of the incident layer, the incident layer may include 0.5 to 80 Weight hundred The conductive filling material is proportioned to guide the electromagnetic wave incident into the electromagnetic wave shielding composite film as a whole to ensure that the electromagnetic wave can be introduced into the wave absorbing layer and the reflection layer from the grounded copper thin pad on the flexible circuit board. Here, the thickness of the incident layer may be 5 μm to 25 μm.
於本發明中,該入射層更包含一高分子材料,且該導電填充材料披覆於該高分子材料上或混摻於該高分子材料中,其中該高分子材料並無特殊限制,只要其具備膠膜基本功能特性且不影響電磁波屏蔽效果即可,其較佳為低黏度高分子材料,舉例包括:熱塑性塑膠、熱固性塑膠、熱固性橡膠、熱塑性黏彈體或導電高分子等。更具體地說,該高分子材料可選自由聚烯亞胺(PI)、聚乙烯(PE)、環氧樹脂(Epoxy)、聚對苯二甲酸乙二酯(PET)、聚碳酸酯(PC)、聚丙烯(PP)、雙馬來醯亞胺(BMI)及壓克力系高分子所組群組中之至少一者,但不限於此。例如,本發明之具體實施例係採用環氧樹脂,其具體舉例包括:雙酚A型環氧樹脂、苯酚酚醛清漆型環氧樹脂、縮水甘油醚型環氧樹脂和甲酚酚醛清漆型環氧樹脂、縮水甘油酯型環氧樹脂、縮水甘油胺型環氧樹脂、線型脂肪族族環氧樹脂、脂環環氧樹脂、雜環環氧樹脂、各種多官能團環氧樹脂和鹵代環氧樹脂物,但不限於此。上述之環氧樹脂可單獨或混合使用,且使用聚醯胺(Polyamide)作為環氧樹脂系統中之硬化劑,其具體舉例包括:芳族聚胺、雙氰胺、酸酐、及各種酚醛清漆樹脂,但不限於此。 In the present invention, the incident layer further includes a polymer material, and the conductive filling material is coated on or mixed with the polymer material, and the polymer material is not particularly limited as long as it is It is sufficient to have the basic functional characteristics of the adhesive film without affecting the electromagnetic wave shielding effect. It is preferably a low-viscosity polymer material. Examples include thermoplastic plastic, thermosetting plastic, thermosetting rubber, thermoplastic viscoelastic body, or conductive polymer. More specifically, the polymer material can be selected from polyimide (PI), polyethylene (PE), epoxy resin (Epoxy), polyethylene terephthalate (PET), and polycarbonate (PC ), Polypropylene (PP), bismaleimide (BMI), and acrylic polymers, but not limited thereto. For example, specific embodiments of the present invention use epoxy resin, and specific examples include: bisphenol A epoxy resin, phenol novolac epoxy resin, glycidyl ether epoxy resin, and cresol novolac epoxy resin. Resins, glycidyl ester epoxy resin, glycidylamine epoxy resin, linear aliphatic epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin, various polyfunctional epoxy resins and halogenated epoxy resins Things, but not limited to this. The above epoxy resins can be used alone or in combination. Polyamide is used as the hardener in the epoxy resin system. Specific examples include: aromatic polyamines, dicyandiamide, acid anhydrides, and various novolac resins. , But not limited to this.
於本發明中,該入射層更可視需求而選擇性添加適量之分散劑,其可為醇類分散劑,如聚乙烯醇(Polyvinyl Alcohol;PVA)、不同分子量之聚乙二醇(Polyethylene Glycol;PEG,MW=200~10,000)、乙醇(Ethyl Alcohol)、乙二醇(Ethylene Glycol)、丙二醇(Propylene Glycol)、丁二醇 (Butylene Glycol)、三甘醇(Butylene Glycol)、異丙醇(Isopropyl Alcohol;IPA)或其衍生物或混合物;陰離子分散劑(anion dispersing agent),如油酸鈉(C17H33COONa)、羧酸鹽、硫酸酯鹽(R-O-SO3Na)、磺酸鹽(R-SO3Na)、十二烷硫酸鈉(SDS)或其衍生物或混合物,但不限於此。此外,該入射層更可包括一消泡劑(defoamer),其具體舉例包括:有機矽氧烷、聚醚、矽和醚接枝、含胺、亞胺和醯胺類等等,但不限於此。 In the present invention, the incident layer may be optionally added with an appropriate amount of dispersant, which may be an alcohol dispersant, such as polyvinyl alcohol (Polyvinyl Alcohol; PVA), and polyethylene glycol (Polyethylene Glycol) with different molecular weights. PEG, MW = 200 ~ 10,000), Ethyl Alcohol, Ethylene Glycol, Propylene Glycol, Butylene Glycol, Butylene Glycol, Isopropyl Alcohol; IPA) or its derivative or mixture; anion dispersing agent, such as sodium oleate (C 17 H 33 COONa), carboxylate, sulfate (RO-SO 3 Na), sulfonate (R-SO 3 Na), sodium lauryl sulfate (SDS), or a derivative or mixture thereof, but is not limited thereto. In addition, the incident layer may further include a defoamer, and specific examples thereof include: organosiloxane, polyether, silicon and ether grafting, amines, imines, and amidines, etc., but is not limited to this.
於本發明中,該入射層更可視需求而選擇性添加適量之有機溶劑(Organic Solution),如丙酮、甲基乙基酮、甲苯、二甲苯、甲基異丁基酮、乙酸乙酯、乙二醇一甲醚、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺、甲醇或乙醇,但不限於此,其中上述之有機溶劑可單獨或混合使用。 In the present invention, the incident layer may be optionally added with an appropriate amount of an organic solvent (Organic Solution), such as acetone, methyl ethyl ketone, toluene, xylene, methyl isobutyl ketone, ethyl acetate, ethyl Glycol monomethyl ether, N, N-dimethylformamide, N, N-dimethylacetamide, methanol or ethanol, but it is not limited thereto, and the above organic solvents can be used alone or in combination.
於本發明中,該吸波層及該反射層之材料較佳為不同金屬材料,其可分別獨立選自由金、銀、銅、鐵、錫、鉛、鈷、鉻、鋁、鎳及其合金所組群組中之至少一者,其中可藉由材料選取及厚度控制,調整該吸波層及該反射層之電阻值。例如,可調整該吸波層具有10至100Ω/□之面電阻,該反射層具有0.2Ω/□以下之面電阻,藉此,由於該吸波層之電阻值高於該反射層,因而引導電磁波來回游離於該吸波層與該反射層之間,促使空間入射的電磁波能量衰減,並減少或消除反射的電磁波,進而達到更佳之全波段電磁屏蔽效果。此外,該吸波層及該反射層之形成方式並無特殊限制,其可藉由如化學沉積、蒸鍍、濺鍍或其他方式依序形成於該入射層表面(亦即,該吸波層之相對兩表面分別與該入射層及該反射層接觸),且其厚度分別可為0.02微米至0.3微米。藉此,由於該反射層與該吸波層很薄,故可很快吸收來自電子元件的全波段電磁波,以展現較佳之全波段電磁波 屏蔽效果。 In the present invention, the materials of the absorbing layer and the reflecting layer are preferably different metal materials, which can be independently selected from the group consisting of gold, silver, copper, iron, tin, lead, cobalt, chromium, aluminum, nickel, and alloys thereof. In at least one of the groups, the resistance values of the wave absorbing layer and the reflection layer can be adjusted by material selection and thickness control. For example, the wave absorbing layer can be adjusted to have a sheet resistance of 10 to 100 Ω / □, and the reflection layer has a sheet resistance of 0.2 Ω / □ or less, whereby the resistance value of the wave absorbing layer is higher than that of the reflection layer, thereby guiding The electromagnetic waves are scattered back and forth between the wave absorbing layer and the reflection layer, and the energy of electromagnetic waves incident in space is attenuated, and the reflected electromagnetic waves are reduced or eliminated, thereby achieving a better full-wave electromagnetic shielding effect. In addition, the formation method of the wave absorbing layer and the reflection layer is not particularly limited, and may be sequentially formed on the surface of the incident layer (for example, the wave absorbing layer) by, for example, chemical deposition, evaporation, sputtering, or other methods. The two opposite surfaces are respectively in contact with the incident layer and the reflective layer), and the thicknesses thereof may be 0.02 μm to 0.3 μm, respectively. As a result, since the reflective layer and the wave absorbing layer are very thin, the full-band electromagnetic wave from the electronic component can be quickly absorbed, so as to exhibit a better full-band electromagnetic wave. Shielding effect.
於本發明中,該電磁波屏蔽複合膜更可包含一絕緣層,其係設置於該反射層上(即,該反射層位於該絕緣層與該吸波層之間),其中該絕緣層之厚度可為1微米至5微米,該絕緣層之材料可選自由聚烯亞胺(PI)、聚乙烯(PE)、環氧樹脂(Epoxy)、聚對苯二甲酸乙二酯(PET)、聚碳酸酯(PC)、聚丙烯(PP)、雙馬來醯亞胺(BMI)及壓克力系高分子所組群組中之至少一者,但不限於此。此外,該電磁波屏蔽複合膜更可包含一離型膜及一轉寫膜,其中該離型膜係設置於該入射層之另一側上,而該轉寫膜則設置於該絕緣層上(即,該入射層位於該離型膜與該吸波層之間,該絕緣層位於該轉寫膜與該反射層之間),以保護該入射層、該吸波層及該反射層避免受到外界環境汙染(如水解、灰塵…等等),且該離型膜及該轉寫膜可於使用該電磁波屏蔽複合膜時撕去,在此該離型膜及該轉寫膜之材料可分別獨自選自由聚烯亞胺、環氧樹脂、聚乙烯、聚對苯二甲酸乙二酯、聚碳酸酯、聚丙烯、雙馬來醯亞胺及壓克力系高分子所組群組中之至少一者,且其厚度分別可為30微米至150微米。 In the present invention, the electromagnetic wave shielding composite film may further include an insulating layer disposed on the reflective layer (that is, the reflective layer is located between the insulating layer and the wave absorbing layer), wherein the thickness of the insulating layer is It can be 1 micron to 5 micron, and the material of the insulating layer can be selected from polyimide (PI), polyethylene (PE), epoxy resin (Epoxy), polyethylene terephthalate (PET), and polyethylene. At least one of the group consisting of carbonate (PC), polypropylene (PP), bismaleimide (BMI), and acrylic polymers, but is not limited thereto. In addition, the electromagnetic wave shielding composite film may further include a release film and a transfer film, wherein the release film is disposed on the other side of the incident layer, and the transfer film is disposed on the insulating layer ( That is, the incident layer is located between the release film and the wave absorbing layer, and the insulating layer is located between the transfer film and the reflection layer) to protect the incident layer, the wave absorbing layer and the reflection layer from being affected. External environmental pollution (such as hydrolysis, dust, etc.), and the release film and the transfer film can be torn off when the electromagnetic wave shielding composite film is used. Here, the materials of the release film and the transfer film can be separated respectively. Independently selected from the group consisting of polyethylenimine, epoxy resin, polyethylene, polyethylene terephthalate, polycarbonate, polypropylene, bismaleimide, and acrylic polymers At least one of them can have a thickness of 30 to 150 microns.
綜上所述,本發明可藉由於該入射層上依序形成具有不同電阻值之該吸波層與該反射層,以提高全波段電磁波屏蔽效果,其中該吸波層與該反射層之厚度分別約於300奈米以下(即,該吸波層與該反射層之總合厚度可下降至約600奈米),即可達到所需之全波段電磁波屏蔽效果,如此可大幅降低成本,並有利於薄型化設計,可滿足軟性電路板的質量輕、材料薄、柔韌性好的要求,且應用於軟性電路板時可節省保護膜(Coverlay)使用的厚度,甚至可以在不用保護膜(Coverlay)的情況下使用該電磁波屏蔽 複合膜,有利於簡化與軟性電路板整合工序。 In summary, in the present invention, the wave absorbing layer and the reflection layer having different resistance values are sequentially formed on the incident layer, so as to improve the shielding effect of electromagnetic waves in a full band, wherein the thickness of the wave absorbing layer and the reflection layer Below about 300 nanometers respectively (that is, the combined thickness of the absorbing layer and the reflective layer can be reduced to about 600 nanometers), the desired full-wave electromagnetic shielding effect can be achieved, which can greatly reduce costs and Conducive to thin design, can meet the requirements of light circuit board light weight, thin material, good flexibility, and can save the thickness of the protective film (Coverlay) when applied to the flexible circuit board, even without the protective film (Coverlay ) Case, use this electromagnetic shielding Composite film is helpful for simplifying the integration process with flexible circuit boards.
100‧‧‧電磁波屏蔽複合膜 100‧‧‧electromagnetic wave shielding composite film
102‧‧‧轉寫膜 102‧‧‧ transfer film
104‧‧‧絕緣層 104‧‧‧Insulation
106‧‧‧反射層 106‧‧‧Reflective layer
108‧‧‧吸波層 108‧‧‧ Absorber
110‧‧‧入射層 110‧‧‧ incident layer
112‧‧‧離型膜 112‧‧‧ release film
圖1係本發明具體實施例之電磁波屏蔽複合膜剖視圖。 FIG. 1 is a sectional view of an electromagnetic wave shielding composite film according to a specific embodiment of the present invention.
圖2係本發明實施例1之電磁波屏蔽複合膜測試結果圖。 FIG. 2 is a test result chart of the electromagnetic wave shielding composite film of Example 1 of the present invention.
圖3係本發明實施例2之電磁波屏蔽複合膜測試結果圖。 FIG. 3 is a test result chart of the electromagnetic wave shielding composite film of Example 2 of the present invention.
圖4係本發明實施例3之電磁波屏蔽複合膜測試結果圖。 FIG. 4 is a test result chart of the electromagnetic wave shielding composite film of Example 3 of the present invention.
圖5係本發明比較例1之電磁波屏蔽複合膜測試結果圖。 FIG. 5 is a test result chart of the electromagnetic wave shielding composite film of Comparative Example 1 of the present invention.
圖6係本發明比較例2之電磁波屏蔽複合膜測試結果圖。 FIG. 6 is a test result chart of the electromagnetic wave shielding composite film of Comparative Example 2 of the present invention.
以下係藉由特定的具體實施例說明本發明之實施方式,熟習此技藝之人士可由本說明書所揭示之內容輕易地了解本發明之其他優點與功效。本發明亦可藉由其他不同的具體實施例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。 The following is a description of specific embodiments of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the spirit of the present invention.
請參閱圖1,其係本發明具體實施例中之電磁波屏蔽複合膜剖視圖。如圖1所示,本發明之電磁波屏蔽複合膜100由上至下依序包含有轉寫膜102、絕緣層104、反射層106、吸波層108、入射層110及離型膜112。以下將於實施例1~3中詳細說明本發明電磁波屏蔽複合膜之製備方法並測試其電磁波屏蔽效果,並與比較例1~2之電磁波屏蔽複合膜進行測試結果比較。 Please refer to FIG. 1, which is a sectional view of an electromagnetic wave shielding composite film in a specific embodiment of the present invention. As shown in FIG. 1, the electromagnetic wave shielding composite film 100 of the present invention includes a transfer film 102, an insulating layer 104, a reflective layer 106, a wave absorbing layer 108, an incident layer 110, and a release film 112 in this order from top to bottom. The method for preparing the electromagnetic wave shielding composite film of the present invention will be described in detail in Examples 1 to 3 below, and its electromagnetic wave shielding effect will be tested, and the test results will be compared with the electromagnetic wave shielding composite films of Comparative Examples 1 to 2.
《實施例1》 << Example 1 >>
本實施例之電磁波屏蔽複合膜係由下列之製程步驟完成:以機械剝離法(Mechanical Exfoliation)製備出石墨烯,其平均厚度範圍可約為0.2奈米至300奈米,隨後將石墨烯(25重量百分比)、低黏度高分子黏結劑(40重量百分比之環氧樹脂)、硬化劑(15重量百分比之聚醯胺硬化劑)、分散劑(0.5重量百分比之陰離子分散劑)、有機溶劑(19重量百分比之丁酮、甲苯及乙酸乙酯之混合溶劑)及助劑(0.5重量百分比之消泡劑)等充分均勻混摻,並塗佈分散於PET離型膜112表面上,以形成具有高導電功能的入射層110,其厚度約為15微米;接著透過濺鍍方式在入射層110的表面依序生成厚度50奈米鎳鉻合金的吸波層108與厚度300奈米銅金屬的反射層106。另外,塗佈5微米厚度的環氧樹脂在PET轉寫膜102上,並加以80℃進行烘烤去除溶劑,以形成絕緣層104及轉寫膜102,最後將此絕緣層104及轉寫膜102與反射層106相互貼合,藉此製造出本實施例之電磁波屏蔽複合膜100。 The electromagnetic wave shielding composite film of this embodiment is completed by the following process steps: graphene is prepared by mechanical exfoliation, and its average thickness can range from about 0.2 nm to 300 nm, and then graphene (25 Weight percent), low viscosity polymer binder (40 weight percent epoxy resin), hardener (15 weight percent polyamide hardener), dispersant (0.5 weight percent anionic dispersant), organic solvent (19 Weight percent of methyl ethyl ketone, toluene and ethyl acetate mixed solvent) and auxiliary agent (0.5 weight percent of defoaming agent) are fully and uniformly mixed, and coated and dispersed on the surface of the PET release film 112 to form The conductive incident layer 110 has a thickness of about 15 micrometers. Then, a 50 nm-thick nickel-chromium alloy absorbing layer 108 and a 300 nm-thick copper metal reflective layer are sequentially formed on the surface of the incident layer 110 by sputtering. 106. In addition, a 5 micron-thick epoxy resin was coated on the PET transfer film 102, and the solvent was removed by baking at 80 ° C to form an insulating layer 104 and a transfer film 102. Finally, the insulating layer 104 and the transfer film 102 and the reflective layer 106 are adhered to each other, thereby manufacturing the electromagnetic wave shielding composite film 100 of this embodiment.
《實施例2》 << Example 2 >>
本實施例之電磁波屏蔽複合膜係由下列之製程步驟完成:以機械剝離法(Mechanical Exfoliation)製備出石墨烯,其平均厚度範圍可約為0.2奈米至300奈米,隨後將石墨烯(25重量百分比)與低黏度高分子黏結劑(40重量百分比之環氧樹脂)、硬化劑(15重量百分比之聚醯胺硬化劑)、分散劑(0.5重量百分比之陰離子分散劑)、有機溶劑(19重量百分比之丁酮、甲苯及乙酸乙酯之混合溶劑)及助劑(0.5重量百分比之消泡劑)等充分均勻混摻,並塗佈分散於PET離型膜112表面上,以形成具有高導電功能的入射層110,其厚度約為15微米;接著透過濺鍍方式在入射層110的表面依序生成厚度50奈米鎳鉻合金的吸波層108與厚度200奈米銀金屬的反射層106。另外,塗佈 5微米厚度的環氧樹脂在PET轉寫膜102上,並加以80℃烘烤去除溶劑,以形成絕緣層104及轉寫膜102,最後將此絕緣層104及轉寫膜102與反射層106相互貼合,藉此製造出本實施例含有石墨烯的電磁波屏蔽複合膜100。 The electromagnetic wave shielding composite film of this embodiment is completed by the following process steps: graphene is prepared by mechanical exfoliation, and its average thickness can range from about 0.2 nm to 300 nm, and then graphene (25 Weight percent) with low viscosity polymer binder (40 weight percent epoxy resin), hardener (15 weight percent polyamide hardener), dispersant (0.5 weight percent anionic dispersant), organic solvent (19 Weight percent of methyl ethyl ketone, toluene and ethyl acetate mixed solvent) and auxiliary agent (0.5 weight percent of defoaming agent) are fully and uniformly mixed, and coated and dispersed on the surface of the PET release film 112 to form The conductive incident incident layer 110 has a thickness of about 15 micrometers. Then, a 50 nm-thick nickel-chromium alloy absorbing layer 108 and a 200 nm-thick silver metal layer are sequentially formed on the surface of the incident layer 110 by sputtering. 106. In addition, coating A 5 micron-thick epoxy resin was deposited on the PET transfer film 102, and the solvent was baked at 80 ° C to form an insulating layer 104 and the transfer film 102. Finally, the insulating layer 104 and the transfer film 102 and the reflective layer 106 were formed. By bonding to each other, the electromagnetic wave shielding composite film 100 containing graphene in this embodiment is manufactured.
《實施例3》 "Example 3"
本實施例之電磁波屏蔽複合膜係由下列之製程步驟完成:以機械剝離法(Mechanical Exfoliation)製備出石墨烯,其平均厚度範圍可約為0.2奈米至300奈米,隨後將石墨烯(25重量百分比)與低黏度高分子黏結劑(40重量百分比之環氧樹脂)、硬化劑(15重量百分比之聚醯胺硬化劑)、分散劑(0.5重量百分比之陰離子分散劑)、有機溶劑(19重量百分比之丁酮、甲苯及乙酸乙酯之混合溶劑)及助劑(0.5重量百分比之消泡劑)等充分均勻混摻並塗佈分散於PET離型膜112表面上形成具有高導電功能的入射層110,其厚度約為15微米;接著透過濺鍍方式在入射層110的表面依序生成厚度50奈米鎳鉻合金的吸波層108與厚度300奈米鋁金屬的反射層106。另外塗佈5微米厚度的環氧樹脂在PET轉寫膜102上,並加以80℃烘烤去除溶劑,以形成絕緣層104及轉寫膜102,最後將此絕緣層104及轉寫膜102與反射層106相互貼合,藉此製造出本實施例含有石墨烯的電磁波屏蔽複合膜100。 The electromagnetic wave shielding composite film of this embodiment is completed by the following process steps: graphene is prepared by mechanical exfoliation, and its average thickness can range from about 0.2 nm to 300 nm, and then graphene (25 Weight percent) with low viscosity polymer binder (40 weight percent epoxy resin), hardener (15 weight percent polyamide hardener), dispersant (0.5 weight percent anionic dispersant), organic solvent (19 Weight percent of mixed solvent of methyl ethyl ketone, toluene and ethyl acetate) and auxiliaries (0.5 weight percent of defoamer) are fully and uniformly mixed and coated on the surface of the PET release film 112 to form a highly conductive The incident layer 110 has a thickness of about 15 micrometers; then, a 50 nm-thick nickel-chromium alloy absorbing layer 108 and a 300 nm-thick aluminum metal reflective layer 106 are sequentially formed on the surface of the incident layer 110 by sputtering. In addition, a 5 micron-thick epoxy resin was coated on the PET transfer film 102, and the solvent was baked at 80 ° C to form an insulating layer 104 and a transfer film 102. Finally, the insulating layer 104 and the transfer film 102 and The reflective layers 106 are adhered to each other, thereby manufacturing the electromagnetic wave shielding composite film 100 containing graphene in this embodiment.
《比較例1》 Comparative Example 1
本比較例之電磁波屏蔽複合膜與實施例1所述大致相同,惟不同處僅在於,本比較例之入射層110與反射層106間未形成吸波層108,亦即,本比較例係直接於入射層110表面生成厚度300奈米銅金屬的反射層106。 The electromagnetic wave shielding composite film of this comparative example is substantially the same as that described in Example 1, except that the difference is only that no absorbing layer 108 is formed between the incident layer 110 and the reflective layer 106 of this comparative example, that is, this comparative example is directly A reflective layer 106 of copper metal having a thickness of 300 nm is formed on the surface of the incident layer 110.
《比較例2》 Comparative Example 2
本比較例之電磁波屏蔽複合膜與實施例3所述大致相同,惟不同處僅在於,本比較例之入射層110與反射層106間未形成吸波層108,亦即,本比較例係直接於入射層110表面生成厚度300奈米鋁金屬的反射層106。 The electromagnetic wave shielding composite film of this comparative example is substantially the same as that described in Example 3, except that the difference is only that no absorbing layer 108 is formed between the incident layer 110 and the reflective layer 106 in this comparative example, that is, this comparative example is directly A reflective layer 106 of aluminum metal having a thickness of 300 nm is formed on the surface of the incident layer 110.
《測試例》 "Test case"
本測試例係採用HP8722型之向量網路分析儀(Vector Network Analyzer),搭配同軸夾具,並依據ASTM D4935-99標準規範,於30兆赫(MHz)至3吉赫(GHz)之電磁波頻段範圍內,對實施例1~3及比較例1~2製成之電磁波屏蔽複合膜進行電磁波屏蔽效能的測試。 This test example uses the HP8722 Vector Network Analyzer, with a coaxial fixture, and in accordance with ASTM D4935-99 standard specifications, in the electromagnetic wave frequency range of 30 megahertz (MHz) to 3 gigahertz (GHz) The electromagnetic shielding effectiveness of the electromagnetic shielding composite films made in Examples 1 to 3 and Comparative Examples 1 to 2 was tested.
據此,實施例1~3及比較例1~2之測試結果請參見圖2至6,其結果顯示,實施例1~3於各波段皆可展現優異的電磁波屏蔽效果(請見圖2至4),然而比較例1~2在低頻率幾乎無電磁波遮蔽效果(請見圖5至6)。由此可證實,本發明於入射層110與反射層106間設置電阻值大於反射層106之吸波層108確實可大幅提高電磁波屏蔽效果,以展現無法預期之優異功效。因此,本發明具有多層吸波結構之電磁波屏蔽複合膜100特別適用於電子裝置、線材及元件上之電磁波屏蔽,例如印刷電路板之電磁屏蔽結構,尤其適合作為軟性電路板抵抗電磁干擾之結構。 Accordingly, the test results of Examples 1 to 3 and Comparative Examples 1 to 2 are shown in FIGS. 2 to 6. The results show that Examples 1 to 3 can exhibit excellent electromagnetic shielding effects in each band (see FIGS. 2 to 2). 4), however, Comparative Examples 1 to 2 have almost no electromagnetic wave shielding effect at low frequencies (see Figs. 5 to 6). From this, it can be confirmed that the wave absorbing layer 108 provided between the incident layer 110 and the reflective layer 106 in the present invention with a resistance value greater than that of the reflective layer 106 can indeed greatly improve the electromagnetic wave shielding effect to exhibit an unexpectedly excellent effect. Therefore, the electromagnetic wave shielding composite film 100 of the present invention having a multilayer wave absorbing structure is particularly suitable for electromagnetic wave shielding on electronic devices, wires, and components, such as the electromagnetic shielding structure of a printed circuit board, and is particularly suitable as a structure for a flexible circuit board to resist electromagnetic interference.
上述實施例僅係為了方便說明而舉例而已,本發明所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述實施例。 The above embodiments are merely examples for the convenience of description. The scope of the claimed rights of the present invention should be based on the scope of the patent application, rather than being limited to the above embodiments.
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