TWI631488B - Transparent electrode patterned laminate and touch screen panel including the same - Google Patents

Abstract

Disclosed is a transparent electrode layer and a touch screen panel having the transparent electrode layer, the transparent electrode layer comprising: a transparent substrate having a transparent dielectric layer formed thereon; a first pattern connected to each other and a second pattern separated from each other, a first transparent electrode layer formed on the transparent dielectric layer; an insulating layer deposited on the first transparent electrode layer; and a second transparent electrode layer configured to pass through Contact holes formed in the insulating layer are electrically connected to each other to the bridge electrode of the second pattern; wherein the first transparent electrode layer has a thickness of 20 to 200 nm if the first transparent electrode layer has 20 nm or higher a thickness of less than 120 nm, the thickness ratio of the first transparent electrode layer to the second transparent electrode layer (the thickness of the first transparent electrode layer / the thickness of the second transparent electrode layer) is 0.15 to 0.375, and if The first transparent electrode layer has a thickness of 120 nm or more to 200 nm or less, and the thickness ratio of the second transparent electrode layer to the first transparent electrode layer (the thickness of the second transparent electrode layer / first transparent) Thickness of electrode layer It is 0.60 to 1.50, thereby greatly reducing the difference in reflectance at different positions.

Description

Transparent electrode pattern layer board and touch screen panel containing the same

The present invention relates to a transparent electrode layer and a touch screen panel including the same, and more particularly to a transparent electrode layer having low visibility and a touch screen panel having the transparent electrode layer.

In general, a touch screen is a screen equipped with a special input device to receive position input by touching the screen with a user's finger or stylus. The touch screen does not use a keyboard, but has a multi-layered board configuration in which the touch screen is recognized when a user's finger or object (eg, a stylus) touches a particular feature or location displayed on the screen. The location and direct receipt of the data via the screen image to actually process the information at a particular location by the software stored therein. In order to identify the position touched without reducing the visibility of the image displayed on the screen, it is generally necessary to use a transparent electrode in which a predetermined pattern is formed. When a transparent electrode is used in a touch screen panel, various structures are known in the related art. For example, a glass-ITO film-ITO film (GFF), a glass-ITO film (G1F), or a glass-only (G2) structure is used for the touch screen panel. Among these, GFF is the most commonly used structure and includes two transparent electrodes (indium tin oxide, ITO) formed by two layers of films required to implement the X-axis and the Y-axis. The GIF includes a first ITO film deposited on the rear surface of the glass, and the film is used as the second ITO film similarly to the conventional method. G2 is formed by depositing and patterning an ITO film for an X-axis on an inner surface of a piece of tempered glass, forming an insulating layer thereon, and patterning another layer of ITO film for the Y-axis. structure. When the power consumption is lowered, the transmittance in the GFF, G1F, and G2 is increased in this order, and thus the study on the G2 structure is actively performed. However, in the G2 structure using the patterned transparent electrode, the pattern portion and the non-pattern portion (pattern opening) of the transparent electrode may be visually different from each other. Therefore, the greater the difference in reflectance between the pattern portion and the non-pattern portion, the difference in reflectance clearly appears, and therefore the visibility as the appearance of the display element is reduced. In particular, in the capacitive touch panel, since the pattern-type transparent electrode is formed on the entire surface of the display unit of the display, even if the transparent electrode layer is patterned, the display device needs to have a good appearance. In order to improve such a problem, for example, Japanese Patent Laid-Open Publication No. 2008-98169 discloses a transparent conductive film in which a two-layer undercoat layer having different refractive indices is formed between a transparent substrate and a transparent conductive layer. Further, as its specific embodiment, the above patent further discloses a transparent conductive film having a refractive index of 1.7, a lanthanum oxide layer as a high refractive index layer (having a thickness of 10 nm or higher), and a refractive index of 1.43. A ruthenium dioxide layer (having a thickness of 30 nm) as a low refractive index layer, and an ITO thin film (having a thickness of 15 nm) having a refractive index of 1.95 as a transparent conductive layer were successively formed in this order. However, since the difference between the pattern portion and the non-pattern portion clearly appears in the transparent conductive film disclosed in the above patent, it is still insufficient to improve the appearance of the display device.

Accordingly, it is an object of the present invention to provide a transparent electrode laminate having low visibility due to slight differences in reflectance at different locations. Further, another object of the present invention is to provide a touch panel screen having a transparent electrode laminate. The above object of the present invention is achieved by the following features: (1) A transparent electrode laminate comprising: a transparent substrate having a transparent dielectric layer formed thereon; a first pattern connected to each other and separated from each other a second pattern forming a first transparent electrode layer on the transparent dielectric layer; an insulating layer deposited on the first transparent electrode layer; and a second transparent electrode layer configured to pass through the insulating layer Contact holes formed in the second to electrically connect the bridge electrodes of the second pattern; wherein the first transparent electrode layer has a thickness of 20 to 200 nm if the first transparent electrode layer has 20 nm or higher to less than 120 The thickness of nm, the thickness ratio of the first transparent electrode layer to the second transparent electrode layer (the thickness of the first transparent electrode layer / the thickness of the second transparent electrode layer) is 0.15 to 0.375, and if the first transparent The electrode layer has a thickness of 120 nm or more to 200 nm or less, and the thickness ratio of the second transparent electrode layer to the first transparent electrode layer (the thickness of the second transparent electrode layer / the first transparent electrode layer) The thickness) is 0.60 to 1.50. The transparent electrode layer plate according to the above item (1), wherein the first transparent electrode layer and the second transparent electrode layer respectively have a refractive index of 1.8 to 2.2. (3) The transparent electrode laminate according to the above item (1), wherein the insulating layer has a refractive index of 1.4 to 1.6. (4) The transparent electrode laminate according to the above item (1), wherein the transparent substrate has a thickness of 0.1 to 0.7 mm. (5) The transparent electrode laminate according to the above item (1), wherein the transparent substrate has a refractive index of 1.4 to 1.6. (6) The transparent electrode laminate according to the above item (1), wherein a plurality of transparent dielectric layers are formed on the transparent substrate. (7) The transparent electrode laminate according to the above item (1), wherein the transparent dielectric layer has a refractive index of 1.4 to 2.5. (8) The transparent electrode laminate according to the above item (6), wherein each of the plurality of transparent dielectric layers has a refractive index of 1.4 to 2.5. (9) The transparent electrode laminate according to the above item (1), wherein the transparent dielectric layer has a total thickness of 50 to 80 nm. (10) The transparent electrode laminate according to the above item (1), wherein the insulating layer has a thickness of 1,000 to 2,000 nm. The transparent electrode layer plate according to the above item (1), wherein the second transparent electrode layer is formed on the transparent dielectric layer, the insulating layer is formed on the second transparent electrode layer, and the first A transparent electrode layer is formed on the insulating layer. (12) The transparent electrode laminate according to the above (1), wherein the transparent electrode laminate further includes a side of a surface of the transparent substrate formed on the transparent electrode or the insulating layer Passivation layer on top. (13) The transparent electrode laminate according to the above item (12), wherein the passivation layer has a thickness of 2,000 nm or less. The transparent electrode laminate according to the above item (12), wherein the passivation layer has a refractive index of 1.4 to 1.6. (15) A touch screen panel comprising the transparent electrode laminate according to any one of the above items (1) to (14). According to these aspects as described above, since the transparent electrode layer plate of the present invention has various layers each having a thickness adjusted by a predetermined range, it may be caused by a pattern-type transparent electrode structure due to slight difference in reflectance at different positions, which may Shows low visibility. Further, according to the transparent electrode laminate of the present invention, when the transparent electrode laminate is applied to a touch panel having a G2 structure, it can exhibit high transmittance and low reflectance, and thus is usefully utilized.

100. . . First transparent electrode layer

110. . . First pattern

120. . . Second pattern

200. . . Second transparent electrode layer

300. . . Insulation

400. . . Contact hole

The above and other objects, features and other advantages of the present invention will become more <RTIgt; Schematic plan view; FIG. 2 is a schematic plan view illustrating a unit square of a transparent electrode laminate according to an embodiment of the present invention; and FIG. 3 is a view illustrating different positions of a transparent electrode laminate according to an embodiment of the present invention A schematic cross-sectional view of the laminate structure.

The invention discloses a transparent electrode layer board and a touch screen panel having the transparent electrode layer board, the transparent electrode layer board comprising: a transparent substrate having a transparent dielectric layer formed thereon; and a first pattern connected to each other And a second pattern formed on the transparent dielectric layer, a second transparent electrode layer formed on the transparent dielectric layer; an insulating layer deposited on the first transparent electrode layer; and a second transparent electrode layer configured to be configured The bridge electrode of the second pattern is electrically connected to each other due to contact holes formed in the insulating layer; wherein the first transparent electrode layer has a thickness of 20 to 200 nm if the first transparent electrode layer has 20 nm or higher To a thickness of less than 120 nm, the thickness ratio of the first transparent electrode layer to the second transparent electrode layer (the thickness of the first transparent electrode layer / the thickness of the second transparent electrode layer) is 0.15 to 0.375, and if The first transparent electrode layer has a thickness of 120 nm or more to 200 nm or less, and a thickness ratio of the second transparent electrode layer to the first transparent electrode layer (thickness of the second transparent electrode layer/first Transparent electrode layer Degree) is from 0.60 to 1.50, thereby greatly reducing the difference in reflectance at different positions. Hereinafter, preferred embodiments will be described to more specifically understand the present invention by referring to the examples and comparative examples. However, it will be apparent to those skilled in the art that the present invention is intended to provide a further understanding of the scope of the invention. Fig. 1 is a schematic plan view illustrating a transparent electrode laminate according to a specific embodiment of the present invention. As exemplified in FIG. 1, the transparent electrode layer plate of the present invention includes a first transparent electrode layer 100, a second transparent electrode layer 200, an insulating layer 300, and a contact hole 400. Further, the transparent electrode layer plate of the present invention may be formed on a transparent substrate (not shown), and further includes passivation on a side of the surface of the transparent substrate with respect to the transparent electrode or the insulating layer formed thereon Layer (not shown). As exemplified in Fig. 1, the transparent electrode laminate is formed in a predetermined pattern. The first transparent electrode layer 100 and the second transparent electrode layer 200 provide positional information at points touched by the user. The insulating layer 300 is deposited between the first transparent electrode layer 100 and the second transparent electrode layer 200 to be electrically isolated from each other, and the contact hole 400 is formed in the insulating layer 300 to electrically connect the first transparent electrode layer. 100 and the second transparent electrode layer 200. As described above, each component of the transparent electrode laminate is formed in a predetermined pattern, and because of this pattern structure, the transparent electrode laminate of the present invention may include various laminate structures depending on its position. Fig. 2 is a schematic plan view illustrating a unit square of a transparent electrode laminate according to a specific embodiment of the present invention. See Figure 2, depending on to The transparent electrode laminates can have five types of laminate structures, respectively, at different locations. Figure 3 schematically illustrates the to Laminate structure at different locations. As exemplified in FIG. 3, since the transparent electrode laminate has various layered structures, differences in reflectance, brightness, chromaticity, or the like for different positions may occur due to these various layered structures depending on their positions, And thereby undesirably increases the visibility of the pattern. Therefore, the function of the conventional transparent electrode layer as a transparent electrode is limited. Therefore, in order to solve the above problem, the transparent electrode layer sheet of the present invention includes a transparent electrode layer having a thickness adjusted in a predetermined range and an insulating layer, and therefore, it is possible to minimize the difference in reflectance at different positions. Hereinafter, a transparent electrode laminate according to a specific embodiment of the present invention will be described in more detail. (Transparent Electrode Layer) As illustrated in FIGS. 1 to 3, the transparent electrode layer according to an embodiment of the present invention includes a first transparent electrode layer and a second transparent electrode layer. The first transparent electrode layer 100 may be formed of a first pattern 110 connected to each other and a second pattern 120 separated from each other. The first pattern 110 and the second pattern 120 are arranged in the same column or row direction to provide information on the X and Y coordinates at the location touched by the user. Specifically, when the user's finger or an object such as a stylus touches the transparent substrate, the capacitance of the touched position is changed, and the information about the changed capacitance is via the first pattern 110, the second The pattern 120, the second transparent electrode layer 200, and the position detecting line are transmitted to a driving circuit (not shown). In addition, the difference in capacitance is converted into an electrical signal by X and Y input processing circuits (not shown) to measure the position touched, and the X and Y coordinates of the touched position are calculated based on the electrical signal. In this regard, the first pattern 110 and the second pattern 120 must be formed in the same layer (first transparent electrode layer), and the respective patterns must be electrically connected to each other to detect the touched position. . However, as described above, the first patterns 110 are connected to each other, and the second patterns 120 are separated from each other in an island form, thereby requiring an additional connection line to electrically connect the second patterns 120 to each other. connection. However, the connection line should not be electrically connected to the first pattern 110 and, therefore, must be formed in a different layer than the first transparent electrode layer 100. Therefore, the second transparent electrode layer 200 is formed in a different alternative layer from the first transparent electrode layer 100 to electrically connect the second patterns 120 to each other. That is, the second transparent electrode layer 200 is formed in a layer different from the first transparent electrode layer 100 such that the second transparent electrode layer 200 has a feature for forming in the insulating layer 300 via the following description. The hole 400 contacts the role of the bridge electrode that electrically connects the second pattern 120 of the first transparent electrode layer 100 to each other. Therefore, in the second and third figures, , as well as Positions respectively represent portions in which the first transparent electrode layer 100 is formed in a predetermined pattern to detect the touched area, and , as well as The positions respectively represent portions in which the second transparent electrode layer 200 is disposed to electrically connect the second pattern 120 formed in an island form. Herein, the second transparent electrode layer 200 must be electrically isolated from the first pattern 110 of the first transparent electrode layer 100. Therefore, the transparent electrode layer plate of the present invention includes the insulating layer 300 and the contact hole 400 (in FIG. 2 ), which will be described below. In the present invention, the first transparent electrode layer 100 may have a thickness of 20 to 200 nm. If the first transparent electrode layer 100 has a thickness of 20 nm or more to less than 120 nm, the thickness ratio of the first transparent electrode layer to the second transparent electrode layer (the thickness of the first transparent electrode layer / the first The thickness of the two transparent electrode layers is 0.15 to 0.375, preferably 0.17 to 0.3, and more preferably 0.17 to 0.23, and when the first transparent electrode layer 100 has a thickness of 120 nm or more to 200 nm or less The thickness ratio of the second transparent electrode layer to the first transparent electrode layer (the thickness of the second transparent electrode layer / the thickness of the first transparent electrode layer) is 0.60 to 1.50, preferably 0.70 to 1.20, and more Good is 0.8 to 1. If the thickness of the first transparent electrode layer 100 is out of the above range, the difference in reflectance at different positions may increase, thus causing an increase in the visibility of the pattern reflection. Specifically, when the thickness is less than 20 nm, the touch sensitivity can be lowered by increasing the resistance, and if the thickness is higher than 150 nm, the transmittance may be deteriorated. Further, it is preferable that the first and second transparent electrode layers 100 and 200 have refractive indices of 1.8 to 2.2, respectively. When these layers have a refractive index within the above range, the decrease in reflectance can be more improved. Any conventional conductive material known in the related art can be used for the first and second transparent electrode layers 100 and 200 without particular limitation. For example, the conductive material used to form the transparent electrode may include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO), poly (3) , 4-ethylenedioxythiophene) (PEDOT), carbon nanotubes (CNT), metal wires, and the like, which are used singly or in any combination of two or more thereof. It is preferred to use indium tin oxide (ITO). The metal used in the metal wire is not particularly limited, but may include, for example, silver (Ag), gold, aluminum, copper, iron, nickel, titanium, ruthenium, cadmium, or the like, which is alone or in two or more thereof. Use in any combination. The first and second transparent electrode layers 100 and 200 may be formed by various thin film deposition techniques such as a physical vapor deposition (PVD) method, a chemical vapor deposition (CVD) method, or the like. For example, the first and the second transparent electrode layers 100 and 200 may be formed by reactive sputtering, which is an example of a PVD method. Further, the first and second transparent electrode layers 100 and 200 may be formed by a printing process. In order to print a transparent electrode, various printing methods such as intaglio offset printing, reverse offset printing, screen printing, gravure printing, and the like can be used during the printing process. In particular, when the first and second transparent electrode layers 100 and 200 are formed by a printing process, the transparent electrode may be made of a printable paste material. For example, the transparent electrode can be made of a carbon nanotube (CNT), a conductive polymer, and a silver nanowire ink. In the present invention, the order of lamination of the first transparent electrode layer 100 and the second transparent electrode layer 200 is not particularly limited. Therefore, in another embodiment of the present invention, the lamination order of the first transparent electrode layer 100 and the second transparent electrode layer 200 shown in FIG. 3 can be changed. For example, the second transparent electrode layer is formed on the transparent substrate instead of the first transparent electrode layer, the insulating layer is formed thereon, and the first transparent electrode layer is formed on the insulating layer. (Insulating Layer and Contact Hole) The insulating layer 300 is formed between the first transparent electrode layer 100 and the second transparent electrode layer 200 to isolate the first transparent electrode layer 100 and the second transparent electrode layer 200 so as to avoid Electrical connection between them. However, as shown in FIG. 2 and FIG. 3, when the second transparent electrode layer 200 is electrically connected to the second pattern 120 of the adjacent first transparent electrode layer 100, the second transparent electrode layer 200 should be The first transparent electrode layer 100 is electrically connected, and therefore, a portion of the insulating layer 300 not formed thereon is required. Therefore, a portion of the insulating layer 300 not formed thereon is referred to as a contact hole 400 (in FIG. 2 ). Therefore, the second transparent electrode layer 200 and the first transparent electrode layer 100 (the second pattern 120 thereof) are electrically connected in the contact hole 400. In the present invention, the insulating layer 300 may have a thickness of 1,000 to 2,000 nm. If the thickness of the insulating layer 300 is not within the above range, the difference in reflectance at different positions may increase, thereby increasing the visibility of the pattern reflection. When the thickness is less than 1,000 nm, the touch sensitivity can be lowered by the reduced capacitance occurring between the transparent electrodes, and if the thickness is more than 2,000 nm, the effect derived from the thickness increase may not be further obtained. Preferably, the insulating layer 300 has a refractive index of 1.4 to 1.6. When the insulating layer 300 has a refractive index within the above range, the decrease in reflectance can be further improved. Any conventional insulating material known in the related art can be used for the insulating layer 300 without particular limitation. For example, the insulating layer 300 may be formed using a metal oxide in a desired pattern, such as cerium oxide, a transparent photosensitive resin composition, including a pressure gram resin, or a thermosetting resin composition. For example, the insulating layer 300 may be formed on the first transparent electrode layer 100 using a deposition or printing method. In the present invention, the contact hole 400 may be formed by such a method that a insulating layer is completely formed on the first transparent electrode layer 100, and then a plurality of holes are formed therein (hole method), or in addition to the first transparent The portion in which the electrode layer 100 is electrically connected to the second transparent electrode layer 200 is formed by such a method of forming an insulating layer on the first transparent electrode layer 100 (island method). (Transparent Substrate) A transparent substrate is a portion that forms the outermost surface of the touch screen panel and is in direct contact with a user's finger or an object such as a stylus. The transparent electrode laminate of the present invention is formed on one side with respect to a surface in direct contact with the user's finger or the object. The transparent substrate can be made of any material if it has high durability enough to protect the touch panel panel from external forces and allows the user to view the display very well, and can be used for forming a transparent substrate used in the related art. There are no special restrictions on any material. For example, glass, polyether oxime (PES), polyacrylate (PAR), polyether phthalimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET) can be used. ), polyphenylene sulfide (PPS), polyallyl alcohol ester, polyimide, polycarbonate (PC), cellulose triacetate (TAC), cellulose acetate propionate (CAP) or the like. It is preferred to use glass, and it is more preferable to use tempered glass. The transparent substrate according to the present invention may have a suitable thickness, for example, ranging from 0.1 to 0.7 mm. When the transparent substrate has a thickness within the above range, the decrease in reflectance can be further improved. Preferably, the transparent substrate has a refractive index of from 1.4 to 1.6. When the transparent substrate has a refractive index within the above range, the decrease in reflectance can be further improved. (Transparent Dielectric Layer) The transparent electrode layer according to the present invention includes a transparent dielectric layer formed between the transparent substrate and the first transparent electrode layer, so as to improve optical uniformity of the touch screen panel. That is to say, the transparent dielectric layer acts to reduce the difference in optical characteristics due to structural differences at different locations, and structural differences at different locations may be caused by the patterned transparent electrode structure. The transparent dielectric layer may be formed of ruthenium oxide, ruthenium dioxide, ruthenium oxide, indium oxide, or the like, which may be used singly or in any combination of two or more thereof. The transparent dielectric layer can be easily deposited in the form of a thin film by using a vapor deposition method, a sputtering process, an ion plating process, or the like. In the present invention, a plurality of transparent dielectric layers are formed on a transparent substrate, if necessary. In this case, each of the plurality of transparent dielectric layers may be formed of materials different from each other and have different refractive indices and thicknesses. Preferably, the transparent dielectric layer has a refractive index of 1.4 to 2.5 for reducing the reflectivity of the transparent electrode laminate. When the plurality of transparent dielectric layers are formed on a transparent substrate, it is preferred that each of the layers has a refractive index of 1.8 to 2.2. Regarding the decrease in reflectance, it is preferred that the transparent dielectric layer has a thickness of 50 to 80 nm. When the transparent substrate includes the plurality of transparent dielectric layers formed thereon, each of the layers may have a thickness whose total thickness is out of the range outside the above range. (Passive Layer) In order to prevent the first and second transparent electrode layers 100 and 200 from being contaminated by exposure to an external environment (water, air, etc.), the transparent electrode laminate of the present invention is, if necessary, a transparent electrode laminate A passivation layer may be included on a side of the surface to which the transparent electrode is attached. The passivation layer can be prepared by using any material that can be used for the insulating layer 300. The passivation layer according to the present invention may have a suitable thickness, for example, 2,000 nm or less. When the passivation layer has a thickness within the above range, the decrease in reflectance can be further improved. Preferably, the passivation layer has a refractive index of from 1.4 to 1.6. When the passivation layer has a refractive index within the above range, the decrease in reflectance can be further improved. (Bonding Layer) In order to adhere to the display panel portion, the transparent electrode laminate of the present invention may include a bonding layer. The adhesive layer is prepared by applying a transparent curable resin composition and curing the composition (OCR), or pressing a bonding agent previously formed into a film shape onto the transparent electrode layer (OCA). The bonding layer can also affect the reflectivity of the transparent electrode laminate. Therefore, in order to reduce the reflectance of the transparent electrode layer, it is preferred that the bonding layer has an appropriate thickness and a refractive index. For example, the bonding layer may have a thickness of 0 to 250 μm and a refractive index of 1 to 1.6. When the adhesive layer has a thickness of 0 μm, the transparent electrode laminate does not have a bonding layer, and only an air gap is formed between the transparent electrode laminate and the touch panel. For example, the adhesive layer is not formed on a portion of the transparent electrode laminate that will actually display an image outside the edge portion formed by the adhesive layer. As described above, since the transparent electrode layer and the insulating layer have a thickness in a predetermined range, it is possible to minimize the difference in reflectance at different positions, and remarkably improve the transparency of the transparent electrode layer. Therefore, the transparent electrode laminate of the present invention can be used to manufacture a touch panel having excellent transparency by bonding the above-mentioned laminate to the display panel portion. Hereinafter, preferred embodiments will be described with reference to examples to more specifically understand the present invention. However, it will be apparent to those skilled in the art that the present invention may be The changes are fully included in the invention as defined by the scope of the appended claims. Exemplary Examples 1 to 9 and Comparative Examples 1 to 13 Transparent electrode laminates having the thicknesses shown in Table 1 below were produced in Examples 1 to 9 and Comparative Examples 1 to 13, respectively. Then, for each of the laminates, the average reflectance at different positions was measured thereon, and the difference between the maximum value and the minimum value of the average reflectance is shown in Table 1. As used herein, average reflectance means the average of reflectance in the range of 400 nm to 700 nm. Glass as a transparent substrate (refractive index: 1.51, extinction coefficient: 0), Nb ₂ O ₅ film as a transparent dielectric layer (refractive index: 2.32, extinction coefficient: 0), and SiO ₂ film (refractive index: 1.46, extinction coefficient: double layer of 0), ITO film as the first transparent electrode layer (refractive index: 1.8, extinction coefficient: 0.014), ITO film as the second transparent electrode layer (refractive index: 1.8, extinction coefficient: 0.014) and an acryl insulating material (refractive index: 1.51, extinction coefficient: 0) as an insulating layer and a passivation layer, and the refractive index and the extinction coefficient are determined with reference to light having a wavelength of 550 nm. The air described in the bonding layer item of Table 1 means that the bonding layer is not formed on the portion where the image is to be displayed, and the bonding layer is formed only on the bezel (edge) portion. Examples 10 to 22 and Comparative Examples 14 to 20 respectively produced transparent electrode laminates having the thicknesses shown in Table 2 below. Then, for each of the laminates, the average reflectance at different positions was measured thereon, and the difference between the maximum value and the minimum value of the average reflectance is shown in Table 2. As used herein, average reflectance means the average of reflectance in the range of 400 nm to 700 nm. Glass as a transparent substrate (refractive index: 1.51, extinction coefficient: 0), Nb ₂ O ₅ film as a transparent dielectric layer (refractive index: 2.32, extinction coefficient: 0), and SiO ₂ film (refractive index: 1.46, extinction coefficient: double layer of 0), ITO film as first transparent electrode layer (refractive index: 1.975, extinction coefficient: 0.014), ITO film as second transparent electrode layer (refractive index: 1.8, extinction coefficient: 0.014) and an acryl insulating material (refractive index: 1.51, extinction coefficient: 0) as an insulating layer and a passivation layer, and the refractive index and the extinction coefficient are determined with reference to light having a wavelength of 550 nm. The air described in the bonding layer item of Table 2 means that the bonding layer is not formed on the portion where the image is to be displayed, and the bonding layer is formed only on the bezel (edge) portion. Referring to Tables 1 and 2 above, since the difference between the maximum value and the minimum value of the average reflectance is 2% or less, the reflectance deviation at different positions is small, thereby exhibiting low visibility. Conversely, among the comparative examples, there are examples in which the maximum value of the average reflectance and the difference between the minimum values exceed 2%. Therefore, it was found that the reflectance deviation at different positions is large and the visibility is very high compared to the example. Further, among the comparative examples shown, Comparative Examples 7 and 20 have a thickness ratio between the first transparent electrode layer and the second transparent electrode layer outside the range described in the present invention, and average The difference in reflectance is 2% or less, but the first or the second transparent electrode layers of these Comparative Examples 7 and 20 have a thickness of 10 nm or less, respectively. When the thickness of the transparent electrode layer is 10 nm or less, the conductivity is lowered, and thus the basic function as an electrode is not achieved. In this regard, after depositing the ITO film at a thickness of 50 mm, a width of 50 mm, and a thickness of 0.7 mm (50 × 50 × 0.7 mm) on a glass substrate at a temperature of 120 ° C, at a center point thereof The resistance was measured, and the measurement results are shown in Table 3 below.

Referring to Table 3, it can be seen that the transparent electrode layer does not have excellent conductivity until the electrode has a thickness of at least 10 nm.

Claims (15)

A transparent electrode laminate comprising: a transparent substrate having a transparent dielectric layer formed thereon; a first transparent electrode layer formed in a first pattern connected to each other and a second pattern separated from each other a transparent dielectric layer; an insulating layer deposited on the first transparent electrode layer; and a second transparent electrode layer configured to electrically connect to each other via a contact hole formed in the insulating layer a bridge electrode of the second pattern; wherein the first transparent electrode layer has a thickness of 20 to 200 nm, wherein the second transparent electrode layer has a thickness of 100 to 350 nm, if the first transparent electrode layer has a thickness of 20 nm or higher a thickness of less than 120 nm, a thickness ratio of the first transparent electrode layer to the second transparent electrode layer (thickness of the first transparent electrode layer / thickness of the second transparent electrode layer) is 0.15 to 0.375, and if The first transparent electrode layer has a thickness of 120 nm or more to 200 nm or less, and a thickness ratio of the second transparent electrode layer to the first transparent electrode layer (thickness of the second transparent electrode layer/first Thickness of transparent electrode layer) It is 0.60 to 1.50. The transparent electrode layer plate of claim 1, wherein the first transparent electrode layer and the second transparent electrode layer respectively have a refractive index of 1.8 to 2.2. The transparent electrode laminate according to claim 1, wherein the insulating layer has a refractive index of 1.4 to 1.6. The transparent electrode laminate according to claim 1, wherein the transparent substrate has a thickness of 0.1 to 0.7 mm. The transparent electrode laminate according to claim 1, wherein the transparent substrate has a refractive index of 1.4 to 1.6. The transparent electrode laminate according to claim 1, wherein a plurality of transparent dielectric layers are formed on the transparent substrate. The transparent electrode laminate of claim 1, wherein the transparent dielectric layer has a refractive index of 1.4 to 2.5. The transparent electrode laminate of claim 6, wherein each of the plurality of transparent dielectric layers has a refractive index of 1.4 to 2.5. The transparent electrode laminate of claim 1, wherein the transparent dielectric layer has a total thickness of 50 to 80 nm. The transparent electrode laminate according to claim 1, wherein the insulating layer has a thickness of 1,000 to 2,000 nm. The transparent electrode layer plate of claim 1, wherein the second transparent electrode layer is formed on the transparent dielectric layer, the insulating layer is formed on the second transparent electrode layer, and the first transparent electrode A layer is formed on the insulating layer. The transparent electrode layer plate according to claim 1, wherein the transparent electrode layer plate is further included on a side of a surface of the transparent substrate with respect to the transparent electrode or the insulating layer. A passivation layer. The transparent electrode laminate according to claim 12, wherein the passivation layer has a thickness of 2,000 nm or less. The transparent electrode laminate of claim 12, wherein the passivation layer has a refractive index of 1.4 to 1.6. A touch screen panel comprising the transparent electrode laminate according to any one of claims 1 to 14.