TWI615203B - Atomizer - Google Patents
Atomizer Download PDFInfo
- Publication number
- TWI615203B TWI615203B TW105136046A TW105136046A TWI615203B TW I615203 B TWI615203 B TW I615203B TW 105136046 A TW105136046 A TW 105136046A TW 105136046 A TW105136046 A TW 105136046A TW I615203 B TWI615203 B TW I615203B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- container
- bottom plate
- spacer film
- oscillator
- Prior art date
Links
Landscapes
- Special Spraying Apparatus (AREA)
Abstract
一種霧化裝置,包含一第一容器、一第二容器、一間隔膜及一振盪器,該第二容器疊設於該第一容器,該第一容器用以容置一第一液體,該第二容器用以容置含有複數個奈米粒子的一第二液體,該間隔膜用以間隔該第一液體及該第二液體,該振盪器藉由該第一液體傳遞一振盪波至該間隔膜,再藉由該間隔膜傳遞該振盪波至該第二液體,以對該第二液體進行振盪霧化,該間隔膜可避免該第二液體中的該些奈米粒子沉積於該振盪器,而造成該振盪器損毀無法使用或導致該振盪器的振盪效能降低。An atomizing device comprising a first container, a second container, a spacer film and an oscillator, the second container being stacked on the first container, the first container for accommodating a first liquid, The second container is configured to receive a second liquid containing a plurality of nano particles, the spacer film is configured to space the first liquid and the second liquid, and the oscillator transmits an oscillation wave to the first liquid a spacer film, wherein the oscillating wave is transmitted to the second liquid by the spacer film to oscillate and atomize the second liquid, and the spacer film prevents the nano particles in the second liquid from being deposited on the oscillation The oscillator is destroyed and cannot be used or the oscillation performance of the oscillator is reduced.
Description
本發明是關於一種霧化裝置,其用以霧化一包含有複數個奈米粒子的液體(即第二液體),並且藉由一間隔膜間隔該包含有該些奈米粒子的液體與一用以傳遞振波的液體(即第一液體),以避免該些奈米粒子沉積於一振盪器,而造成振盪器損毀無法使用或導致該振盪器的振盪效能降低。The present invention relates to an atomizing device for atomizing a liquid containing a plurality of nanoparticles (ie, a second liquid), and spacing the liquid containing the nanoparticles with a spacer film The liquid (ie, the first liquid) used to transmit the vibration wave to prevent the nanoparticles from being deposited on an oscillator, causing the oscillator to be destroyed or the oscillation performance of the oscillator to be lowered.
為有效降低工件切削時的潤滑冷卻效果,會在潤滑液中加入奈米粒子,並將含有奈米粒子的潤滑液置入於一具有一振盪器的霧化裝置中,並直接以該振盪器對該含有奈米粒子的潤滑液進行霧化,以使該潤滑液形成霧氣,該霧氣並搭載該奈米粒子附著於一切削刀具或一被切削物體,以對該切削刀具及該被切削物體進行散熱及潤滑,由於該振盪器直接接觸含有奈米粒子的該潤滑液,因此部分的奈米粒子會與潤滑液中的沉墊物質結合而沉積附著於該振盪器上,將導致該振盪器的振盪效能降低,因而縮短該振盪器的使用壽命或造成該振盪器損毀。In order to effectively reduce the lubricating and cooling effect of the workpiece during cutting, nano particles are added to the lubricating liquid, and the lubricating liquid containing the nano particles is placed in an atomizing device having an oscillator, and the oscillator is directly used. The lubricating liquid containing the nano particles is atomized to form a mist which is attached to the cutting tool or a workpiece to mount the cutting tool and the object to be cut. For heat dissipation and lubrication, since the oscillator directly contacts the lubricating liquid containing the nanoparticles, part of the nanoparticles will be deposited on the oscillator in combination with the mat material in the lubricating fluid, which will result in the oscillator. The oscillation performance is reduced, thereby shortening the life of the oscillator or causing damage to the oscillator.
本發明之主要目的在於提供一種霧化裝置,其用以使一包含有複數個奈米粒子的液體(即第二液體)霧化,並且該霧化裝置是以一間隔膜間隔包含有該些奈米粒子的該液體(即第二液體)與一用以傳遞振波的液體(即第一液體),一振盪器藉由該傳遞振波的液體(即第一液體)傳遞一振盪波至該間隔膜,再藉由該間隔膜傳遞該振盪波至包含有該些奈米粒子的該液體(即該第二液體),以對包含有該些奈米粒子的該液體進行振盪霧化,該間隔膜可避免包含有該些奈米粒子的該液體(即第二液體)中的該些奈米粒子沉積於該振盪器,而造成該振盪器損毀無法使用或導致該振盪器的振盪效能降低。The main object of the present invention is to provide an atomizing device for atomizing a liquid containing a plurality of nanoparticles (ie, a second liquid), and the atomizing device includes the spacers at intervals of a film. The liquid of the nanoparticle (ie, the second liquid) and a liquid (ie, the first liquid) for transmitting the vibration wave, and an oscillator transmits an oscillation wave to the liquid (ie, the first liquid) that transmits the vibration wave to The spacer film transmits the oscillating wave to the liquid containing the nano particles (ie, the second liquid) by the spacer film to oscillate and atomize the liquid containing the nano particles. The spacer film can prevent the nano particles in the liquid (ie, the second liquid) containing the nano particles from being deposited on the oscillator, thereby causing the oscillator to be damaged or unable to use or causing oscillation performance of the oscillator. reduce.
本發明的一種霧化裝置包含一第一容器、一第二容器、一間隔膜以及一振盪器,該第一容器具有一第一底板、一第一環牆及一第一容置空間,該第一底板結合該第一環牆,且該第一環牆環繞該第一容置空間,該第一容置空間用以容置一第一液體,當該第一容置空間容置有該第一液體時,該第一液體的一液面至該第一底板之間具有一第一高度,該第二容器疊設於該第一容器,該第二容器具有一第二底板、一第二環牆及一第二容置空間,該第二底板結合該第二環牆,且該第二環牆環繞該第二容置空間,該第二容置空間用以容置包含有複數個奈米粒子的一第二液體,該第二底板具有一開口,該開口位於該第一容置空間中,且該開口至該第一底板之間具有一第二高度,該第二高度不大於該第一高度,該間隔膜覆蓋該開口,該間隔膜的一第一表面用以接觸該第一液體,該間隔膜的一第二表面用以接觸包含有該些奈米粒子的第二液體,該振盪器設置於該第一容器,該振盪器藉由該第一容置空間中該第一液體傳遞一振盪波至該間隔膜,再藉由該間隔膜傳遞該振盪波至該第二液體,以對該第二容置空間中的該第二液體進行振盪,使該第二液體被霧化而形成一搭載該些奈米粒子的霧氣。An atomizing device of the present invention comprises a first container, a second container, a spacer film and an oscillator. The first container has a first bottom plate, a first ring wall and a first receiving space. The first bottom plate is coupled to the first ring wall, and the first ring wall surrounds the first accommodating space, the first accommodating space is for accommodating a first liquid, and the first accommodating space is received by the first accommodating space. The first liquid has a first height between the liquid level of the first liquid and the first bottom plate, the second container is stacked on the first container, and the second container has a second bottom plate a second ring wall and a second accommodating space, the second bottom plate is coupled to the second ring wall, and the second ring wall surrounds the second accommodating space, and the second accommodating space is used for accommodating the plurality of accommodating spaces. a second liquid of the nanoparticle, the second bottom plate has an opening, the opening is located in the first receiving space, and the opening has a second height between the first bottom plate, the second height is not greater than The first height, the spacer film covers the opening, and a first surface of the spacer film is used to contact the opening a second surface of the spacer film for contacting the second liquid containing the nano particles, the oscillator being disposed in the first container, wherein the oscillator is in the first accommodating space a liquid transmits an oscillating wave to the spacer film, and the oscillating wave is transmitted to the second liquid through the spacer film to oscillate the second liquid in the second accommodating space, so that the second liquid is Atomization forms a mist containing the nanoparticles.
本發明的一種霧化裝置包含一第一容器、一第二容器、一間隔膜以及一振盪器,該第一容器用以容置一第一液體,該第二容器疊設於該第一容器,該第二容器用以容置包含有複數個奈米粒子的一第二液體,該間隔膜用以間隔該第一液體及該包含有該些奈米粒子的第二液體,該間隔膜的一第一表面用以接觸該第一液體,該間隔膜的一第二表面用以接觸包含有該些奈米粒子的第二液體,該振盪器用以對該第一液體進行振盪,該振盪器藉由該第一液體傳遞一振盪波至該間隔膜,再藉由該間隔膜傳遞該振盪波至該第二液體,以對該第二液體進行振盪,以使該第二液體被霧化而形成一搭載該些奈米粒子的霧氣。An atomizing device of the present invention comprises a first container, a second container, a spacer film and an oscillator, the first container is for accommodating a first liquid, and the second container is stacked on the first container The second container is configured to receive a second liquid containing a plurality of nano particles, the spacer film is configured to space the first liquid and the second liquid containing the nano particles, the spacer film a first surface for contacting the first liquid, a second surface of the spacer film for contacting a second liquid containing the nano particles, the oscillator for oscillating the first liquid, the oscillation Transmitting an oscillating wave to the spacer film by the first liquid, and transmitting the oscillating wave to the second liquid through the spacer film to oscillate the second liquid, so that the second liquid is atomized A mist is formed to mount the nanoparticles.
請參閱第3圖,本發明的一實施例,一種霧化裝置100其藉由一間隔膜130間隔一第一液體114及一包含有複數個奈米粒子P的第二液體124,該奈米粒子P可選自於石墨基粒子(graphite-based particle),如奈米碳管及石墨稀等或奈米鑽石、二硫化鉬等粒子,該第二液體124可選自於水、礦物油、植物油等液體,並以一振盪器140對該第一液體114進行振盪,該振盪器140藉由該第一液體114傳遞一振盪波W至該間隔膜130,再藉由該間隔膜130傳遞該振盪波W至該第二液體124,以對該第二容置空間113中的該第二液體124進行振盪,以使該第二液體124被霧化而形成一搭載該些奈米粒子P的霧氣A。Referring to FIG. 3, an atomization device 100 is separated from a first liquid 114 by a spacer film 130 and a second liquid 124 containing a plurality of nano particles P. The particles P may be selected from graphite-based particles, such as carbon nanotubes and graphite thinner or nano-diamonds, molybdenum disulfide or the like, and the second liquid 124 may be selected from water, mineral oil, a liquid such as a vegetable oil oscillates the first liquid 114 by an oscillator 140. The oscillator 140 transmits an oscillating wave W to the spacer film 130 through the first liquid 114, and transmits the spacer film 130. Oscillation wave W to the second liquid 124 to oscillate the second liquid 124 in the second accommodating space 113, so that the second liquid 124 is atomized to form a nanoparticle P Mist A.
請參查第1及2圖,該霧化裝置100包含一第一容器110及一第二容器120,該第二容器120疊設於該第一容器110,或者在不同的實施例中,該第一容器110與該第二容器120可為一體成型。Referring to Figures 1 and 2, the atomizing device 100 includes a first container 110 and a second container 120. The second container 120 is stacked on the first container 110, or in various embodiments, The first container 110 and the second container 120 may be integrally formed.
請參查第2及3圖,在本實施例中,該第一容器110具有一第一底板111、一第一環牆112及一第一容置空間113,該第一底板111結合該第一環牆112,且該第一環牆112環繞該第一容置空間113,該第一容置空間113用以容置一第一液體114,該第一液體114可選自於水、礦物油、植物油等液體,該第二容器120具有一第二底板121、一第二環牆122及一第二容置空間123,該第二底板121結合該第二環牆122,且該第二環牆122環繞該第二容置空間123,該第二容置空間123用以容置一包含有複數個奈米粒子P的第二液體124。Referring to FIGS. 2 and 3, in the embodiment, the first container 110 has a first bottom plate 111, a first ring wall 112, and a first receiving space 113. The first bottom plate 111 is combined with the first bottom plate 111. a first wall 114 is disposed around the first accommodating space 113. The first accommodating space 113 is configured to receive a first liquid 114. The first liquid 114 may be selected from the group consisting of water and minerals. The second container 120 has a second bottom plate 121, a second ring wall 122 and a second accommodating space 123. The second bottom plate 121 is coupled to the second ring wall 122, and the second The annular wall 122 surrounds the second accommodating space 123, and the second accommodating space 123 is for accommodating a second liquid 124 containing a plurality of nano particles P.
請參查第2及3圖,該第二容器120的該第二底板121具有一開口121A,且該開口121A位於該第一容置空間113中,該開口121A至該第一底板111之間具有一第二高度H2,該間隔膜130覆蓋該開口121A,該間隔膜130的一第一表面131用以接觸該第一液體114,該間隔膜130的一第二表面132用以接觸包含有該些奈米粒子P的該第二液體124,在本實施例中,該間隔膜130具有一傳遞部130A及一連接部130B,該開口121A顯露該傳遞部130A,該連接部130B結合於該第二容器120的該第二底板121。The second bottom plate 121 of the second container 120 has an opening 121A, and the opening 121A is located in the first accommodating space 113, and the opening 121A is between the first bottom plate 111. The first surface 131 of the spacer film 130 is for contacting the first liquid 114, and a second surface 132 of the spacer film 130 is used for contacting In the present embodiment, the spacer film 130 has a transmitting portion 130A and a connecting portion 130B. The opening 121A exposes the transmitting portion 130A, and the connecting portion 130B is coupled to the second liquid 124. The second bottom plate 121 of the second container 120.
請參查第3圖,該振盪器140設置於該第一容器110,該振盪器140電性連接一驅動控制器S,該驅動控制器S用以驅動該振盪器140,並使該振盪器140產生一振盪波W,該振盪器140可選自於超音波振盪器、壓電陶瓷片振盪器等振盪器140。 Referring to FIG. 3, the oscillator 140 is disposed in the first container 110. The oscillator 140 is electrically connected to a driving controller S. The driving controller S is configured to drive the oscillator 140 and make the oscillator. An oscillator wave W is generated 140. The oscillator 140 may be selected from an oscillator 140 such as an ultrasonic oscillator or a piezoelectric ceramic plate oscillator.
請參查第3圖,當該第一容置空間113容置有該第一液體114時,該第一液體114的一液面114A至該第一底板111之間具有一第一高度H1,該開口121A至該第一底板111之間的該第二高度H2不大於該第一高度H1,以使該間隔膜130浸泡於該第一液體114中,當該振盪器140產生該振盪波W時,該振盪器140藉由該第一容置空間113中該第一液體114傳遞該振盪波W至該間隔膜130,再藉由該間隔膜130傳遞該振盪波W至該第二液體124,以對該第二容置空間113中的該第二液體124進行振盪,使該第二液體124被霧化而形成一搭載該些奈米粒子P的霧氣A。 Referring to FIG. 3, when the first accommodating space 113 accommodates the first liquid 114, a first surface height H1 is formed between a liquid surface 114A of the first liquid 114 and the first bottom plate 111. The second height H2 between the opening 121A and the first bottom plate 111 is not greater than the first height H1, so that the spacer film 130 is immersed in the first liquid 114, and the oscillator 140 generates the oscillation wave W. The oscillator 140 transmits the oscillating wave W to the spacer film 130 through the first liquid 114 in the first accommodating space 113, and transmits the oscillating wave W to the second liquid 124 through the spacer film 130. The second liquid 124 in the second accommodating space 113 is oscillated to atomize the second liquid 124 to form a mist A on which the nano particles P are mounted.
請參查第3圖,搭載該些奈米粒子P的該霧氣A可經由一噴嘴X對一切削刀具(圖未繪出)或一被切削物體(圖未繪出)進行散熱及潤滑,在本實施例中,該第二容器120另具有一入液口125,該入液口125用以補充包含有該些奈米粒子P的該第二液體124,較佳地,該第二容器120另具有一充氣孔126,該充氣孔126用以填充一氣體至該第二容置空間123中,以利該搭載該些奈米粒子P的霧氣A經由該噴嘴X對一切削刀具(圖未繪出)或一被切削物體(圖未繪出)進行散熱及潤滑。 Please refer to FIG. 3, the mist A carrying the nano particles P can be cooled and lubricated by a nozzle X for a cutting tool (not shown) or a workpiece (not shown). In this embodiment, the second container 120 further has a liquid inlet 125 for supplementing the second liquid 124 containing the nano particles P. Preferably, the second container 120 Another inflating hole 126 is configured to fill a gas into the second accommodating space 123, so that the mist A carrying the nano particles P passes through the nozzle X to a cutting tool (Fig. Draw) or a cut object (not shown) for heat dissipation and lubrication.
請參查第2及3圖,該振盪器140設置於該第一容器110,在本實施例中,該振盪器140設置於該第一容器110的該第一底板111,較佳地,該霧化裝置100另包含一管體150,該管體150設置於該第一底板111與該第二底板121之間,且該管體150位於該第一容器110的該第一液體114中,即位於該第一容置空間113的該第一液體114中,該管體150具有一通孔151,該管體150設置於該第一容置空間113,且該管體150結合於該第一底板111,該管體150具有一第三高度H3, 該第三高度H3小於該第一高度H1,以使該第一液體114可同時容置於該通孔151及該第一容置空間113中,該通孔151位於該開口121A與該振盪器140之間,且該通孔151對準該開口121A,在本實施例中,該通孔151中的該第一液體114用以傳遞該振盪波W至該間隔膜130。 Referring to FIGS. 2 and 3, the oscillator 140 is disposed in the first container 110. In the embodiment, the oscillator 140 is disposed on the first bottom plate 111 of the first container 110. Preferably, the The atomizing device 100 further includes a tube body 150 disposed between the first bottom plate 111 and the second bottom plate 121, and the tube body 150 is located in the first liquid 114 of the first container 110, That is, the first liquid 114 in the first accommodating space 113, the tubular body 150 has a through hole 151, the tubular body 150 is disposed in the first accommodating space 113, and the tubular body 150 is coupled to the first a bottom plate 111 having a third height H3, The third height H3 is smaller than the first height H1, so that the first liquid 114 can be accommodated in the through hole 151 and the first accommodating space 113 at the same time. The through hole 151 is located at the opening 121A and the oscillator. Between the 140, the through hole 151 is aligned with the opening 121A. In the embodiment, the first liquid 114 in the through hole 151 is used to transmit the oscillating wave W to the spacer film 130.
請參查第2及3圖,較佳地,該間隔膜130的該傳遞部130A位於該開口121A與該通孔151之間,以避免該間隔膜130被該振盪波W振盪而脫離該第二底板121,而造成該第二液體124流入該第一容置空間113中,進而接觸該振盪器140。 Please refer to FIGS. 2 and 3 . Preferably, the transmitting portion 130A of the spacer film 130 is located between the opening 121A and the through hole 151 to prevent the spacer film 130 from being oscillated by the oscillation wave W to be separated from the first portion. The second bottom plate 121 causes the second liquid 124 to flow into the first accommodating space 113 to contact the oscillator 140.
請參查第3圖,由於該間隔膜130間隔該第一液體114與包含有該些奈米粒子P的該第二液體124,因此設置於該第一容器110的該振盪器140產生的該振盪波W,可藉由該第一液體114將該振盪波W傳遞至該間隔膜130,再藉由該間隔膜130傳遞該振盪波W至包含有該些奈米粒子P的該第二液體124,以對該第二液體124進行振盪霧化而形成一搭載該些奈米粒子P的霧氣A,且由於該間隔膜130間隔該第一液體114與包含有該些奈米粒子P的該第二液體124,因此可避免該第二液體124中的該些奈米粒子P及該第二液體124的殘留物沉積於該振盪器140,而造成該振盪器1400損毀無法使用或導致該振盪器140的振盪效能降低。 Referring to FIG. 3, since the spacer film 130 is spaced apart from the first liquid 114 and the second liquid 124 containing the nano particles P, the oscillator 140 disposed in the first container 110 generates the same The oscillating wave W is transmitted to the spacer film 130 by the first liquid 114, and the oscillating wave W is transmitted to the second liquid containing the nano particles P by the spacer film 130. 124, the second liquid 124 is oscillated and atomized to form a mist A carrying the nano particles P, and the spacer film 130 is spaced apart from the first liquid 114 and the nanoparticle P The second liquid 124 can prevent the residues of the nano particles P and the second liquid 124 in the second liquid 124 from being deposited on the oscillator 140, causing the oscillator 1400 to be damaged or unable to use or cause the oscillation. The oscillation performance of the device 140 is lowered.
本發明之保護範圍當視後附之申請專利範圍所界定者為準,任何熟知此項技藝者,在不脫離本發明之精神和範圍內所作之任何變化與修改,均屬於本發明之保護範圍。 The scope of the present invention is defined by the scope of the appended claims, and any changes and modifications made by those skilled in the art without departing from the spirit and scope of the invention are within the scope of the present invention. .
100‧‧‧霧化裝置 100‧‧‧Atomizer
110‧‧‧第一容器 110‧‧‧First container
111‧‧‧第一底板 111‧‧‧ first bottom plate
112‧‧‧第一環牆 112‧‧‧First ring wall
113‧‧‧第一容置空間 113‧‧‧First accommodation space
114‧‧‧第一液體 114‧‧‧First liquid
114A‧‧‧液面 114A‧‧‧ liquid level
120‧‧‧第二容器 120‧‧‧Second container
121‧‧‧第二底板 121‧‧‧second bottom plate
121A‧‧‧開口 121A‧‧‧ openings
122‧‧‧第二環牆 122‧‧‧second ring wall
123‧‧‧第二容置空間 123‧‧‧Second accommodation space
124‧‧‧第二液體 124‧‧‧Second liquid
125‧‧‧入液口 125‧‧‧Inlet
126‧‧‧充氣孔 126‧‧‧Inflatable hole
130‧‧‧間隔膜 130‧‧‧ spacer film
130A‧‧‧傳遞部 130A‧‧‧Transmission Department
130B‧‧‧連接部 130B‧‧‧Connecting Department
131‧‧‧第一表面 131‧‧‧ first surface
132‧‧‧第二表面 132‧‧‧ second surface
140‧‧‧振盪器 140‧‧‧Oscillator
150‧‧‧管體 150‧‧‧ tube body
151‧‧‧通孔 151‧‧‧through hole
A‧‧‧霧氣 A‧‧‧ fog
H1‧‧‧第一高度 H1‧‧‧ first height
H2‧‧‧第二高度 H2‧‧‧second height
H3‧‧‧第三高度 H3‧‧‧ third height
P‧‧‧奈米粒子 P‧‧‧ nano particles
S‧‧‧驅動控制器 S‧‧‧Drive Controller
W‧‧‧振盪波 W‧‧‧Oscillation wave
X‧‧‧噴嘴 X‧‧‧ nozzle
第1圖:本發明「霧化裝置」的立體圖。 第2圖:本發明「霧化裝置」的立體分解圖。 第3圖:本發明「霧化裝置」的剖視圖。Fig. 1 is a perspective view of the "atomizing device" of the present invention. Fig. 2 is an exploded perspective view showing the "atomizing device" of the present invention. Fig. 3 is a cross-sectional view showing the "atomizing device" of the present invention.
100‧‧‧霧化裝置 100‧‧‧Atomizer
110‧‧‧第一容器 110‧‧‧First container
111‧‧‧第一底板 111‧‧‧ first bottom plate
112‧‧‧第一環牆 112‧‧‧First ring wall
113‧‧‧第一容置空間 113‧‧‧First accommodation space
114‧‧‧第一液體 114‧‧‧First liquid
114A‧‧‧液面 114A‧‧‧ liquid level
120‧‧‧第二容器 120‧‧‧Second container
121‧‧‧第二底板 121‧‧‧second bottom plate
121A‧‧‧開口 121A‧‧‧ openings
122‧‧‧第二環牆 122‧‧‧second ring wall
123‧‧‧第二容置空間 123‧‧‧Second accommodation space
124‧‧‧第二液體 124‧‧‧Second liquid
125‧‧‧入液口 125‧‧‧Inlet
126‧‧‧充氣孔 126‧‧‧Inflatable hole
130‧‧‧間隔膜 130‧‧‧ spacer film
130A‧‧‧傳遞部 130A‧‧‧Transmission Department
130B‧‧‧連接部 130B‧‧‧Connecting Department
131‧‧‧第一表面 131‧‧‧ first surface
132‧‧‧第二表面 132‧‧‧ second surface
140‧‧‧振盪器 140‧‧‧Oscillator
150‧‧‧管體 150‧‧‧ tube body
151‧‧‧通孔 151‧‧‧through hole
A‧‧‧霧氣 A‧‧‧ fog
H1‧‧‧第一高度 H1‧‧‧ first height
H2‧‧‧第二高度 H2‧‧‧second height
H3‧‧‧第三高度 H3‧‧‧ third height
P‧‧‧奈米粒子 P‧‧‧ nano particles
S‧‧‧驅動控制器 S‧‧‧Drive Controller
W‧‧‧振盪波 W‧‧‧Oscillation wave
X‧‧‧噴嘴 X‧‧‧ nozzle
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW105136046A TWI615203B (en) | 2016-11-04 | 2016-11-04 | Atomizer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW105136046A TWI615203B (en) | 2016-11-04 | 2016-11-04 | Atomizer |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI615203B true TWI615203B (en) | 2018-02-21 |
TW201817496A TW201817496A (en) | 2018-05-16 |
Family
ID=62016207
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105136046A TWI615203B (en) | 2016-11-04 | 2016-11-04 | Atomizer |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI615203B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113440037A (en) * | 2021-07-23 | 2021-09-28 | 深圳金海智控科技有限公司 | Intelligent soap liquid machine |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5361989A (en) * | 1992-07-30 | 1994-11-08 | D.P. Medical | Device for generating a mist from a liquid, especially a medication |
US6357671B1 (en) * | 1999-02-04 | 2002-03-19 | Siemens Elema Ab | Ultrasonic nebulizer |
TWM307412U (en) * | 2006-09-01 | 2007-03-11 | You-Ji Lin | Improved structure of ultrasonic atomizer |
TW201536480A (en) * | 2014-03-24 | 2015-10-01 | Wei-Tai Huang | Nanofluid minimal quantity lubrication device |
-
2016
- 2016-11-04 TW TW105136046A patent/TWI615203B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5361989A (en) * | 1992-07-30 | 1994-11-08 | D.P. Medical | Device for generating a mist from a liquid, especially a medication |
US6357671B1 (en) * | 1999-02-04 | 2002-03-19 | Siemens Elema Ab | Ultrasonic nebulizer |
TWM307412U (en) * | 2006-09-01 | 2007-03-11 | You-Ji Lin | Improved structure of ultrasonic atomizer |
TW201536480A (en) * | 2014-03-24 | 2015-10-01 | Wei-Tai Huang | Nanofluid minimal quantity lubrication device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113440037A (en) * | 2021-07-23 | 2021-09-28 | 深圳金海智控科技有限公司 | Intelligent soap liquid machine |
Also Published As
Publication number | Publication date |
---|---|
TW201817496A (en) | 2018-05-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5637216B2 (en) | Loop heat pipe and electronic equipment | |
TWI532533B (en) | Atomizer | |
TWI615203B (en) | Atomizer | |
TWI572449B (en) | Nanofluid minimal quantity lubrication device | |
JP2008049220A (en) | Method and device for separating particle | |
CN105683662A (en) | Humidifier and atomizer module | |
JP4990707B2 (en) | Ultrasonic fog generator | |
JP4947365B2 (en) | Atomizer | |
JPWO2006129807A1 (en) | Solution reactor and reaction method | |
JP4938357B2 (en) | Cleaning method and cleaning equipment | |
JP2016185506A (en) | Ultrasonic atomization device | |
JP4289968B2 (en) | Portable ultrasonic atomizer | |
TW201313342A (en) | Improved ultrasonic cleaning method and apparatus | |
JP2017225488A (en) | Temperature controller | |
JP4255818B2 (en) | Ultrasonic cleaning nozzle and ultrasonic cleaning device | |
JP4669926B2 (en) | Ultrasonic cleaning equipment | |
JP2008264705A (en) | Ultrasonic atomizing apparatus | |
KR100722789B1 (en) | Megasonic cleaning apparatus for flat panel display | |
TW201529173A (en) | Submersible ultrasonic nebulization device | |
JP4626749B2 (en) | Mist generator | |
TWM585658U (en) | Atomizer and atomizing structure thereof | |
WO2022070622A1 (en) | Atomization device | |
KR20190119410A (en) | Apparatus and method for producing distilled water | |
JP2012011360A (en) | Ultrasonic atomizer | |
EP1775027A1 (en) | Micro-droplet generator |