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TWI683088B - Substrate inspection device, substrate processing apparatus, substrate inspection method and substrate processing method - Google Patents

Substrate inspection device, substrate processing apparatus, substrate inspection method and substrate processing method Download PDF

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TWI683088B
TWI683088B TW107129208A TW107129208A TWI683088B TW I683088 B TWI683088 B TW I683088B TW 107129208 A TW107129208 A TW 107129208A TW 107129208 A TW107129208 A TW 107129208A TW I683088 B TWI683088 B TW I683088B
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TW201923306A (en
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松尾友宏
中川幸治
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日商斯庫林集團股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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Abstract

產生表示基板之一面的圖像之實際圖像資料。於基於實際圖像資料之圖像上,設定排列於基板之第1直徑方向之複數個單位區域。針對複數個單位區域之各者算出構成該單位區域之複數個像素之平均值,作為平均像素值,對複數個單位區域之平均像素值進行平滑化處理。算出預先規定之單位區域之平滑化後之平均像素值、與各單位區域之平滑化處理後之平均像素值之差量。將自各單位區域向與第1直徑方向正交之第2直徑方向平行延伸之帶狀區域內之各像素值,加上對應於該單位區域之差量,產生顯示用圖像資料。Generate actual image data representing the image of one side of the substrate. On the image based on the actual image data, a plurality of unit areas arranged in the first diameter direction of the substrate are set. For each of the plurality of unit areas, the average value of the plurality of pixels constituting the unit area is calculated as the average pixel value, and the average pixel value of the plurality of unit areas is smoothed. Calculate the difference between the smoothed average pixel value of a predetermined unit area and the average pixel value of each unit area after smoothing. Each pixel value in the band-shaped region extending parallel to the second diameter direction orthogonal to the first diameter direction from each unit area is added to the difference corresponding to the unit area to generate image data for display.

Description

基板檢查裝置、基板處理裝置、基板檢查方法及基板處理方法Substrate inspection device, substrate processing device, substrate inspection method and substrate processing method

本發明係關於進行基板檢查之基板檢查裝置、基板處理裝置、基板檢查方法及基板處理方法。The present invention relates to a substrate inspection device, a substrate processing device, a substrate inspection method, and a substrate processing method that perform substrate inspection.

於基板處理裝置中,使藉由旋轉卡盤水平支持之基板旋轉。於該狀態下,藉由對基板上表面之中央部噴出抗蝕劑液等塗佈液,而於基板之表面全體形成塗佈膜。藉由使塗佈膜曝光後進行顯影,而於塗佈膜形成特定之圖案。此處,若基板之表面為不均一狀態,則於基板之每個部分,曝光後之狀態產生波動,產生基板之處理不良。因此,有進行基板之表面狀態檢查之情況。In the substrate processing apparatus, the substrate horizontally supported by the rotating chuck is rotated. In this state, by spraying a coating liquid such as a resist solution onto the central portion of the upper surface of the substrate, a coating film is formed on the entire surface of the substrate. By exposing the coating film and developing it, a specific pattern is formed on the coating film. Here, if the surface of the substrate is in a non-uniform state, the state after exposure will fluctuate in each part of the substrate, resulting in poor processing of the substrate. Therefore, the surface condition of the substrate may be checked.

於專利文獻1,記載有宏觀檢查半導體晶圓等試料之檢查裝置。該檢查裝置中,向載置於載物台上之試料照射向與試料之表面平行之X方向線狀延伸之照明光,自試料表面之線狀區域反射之光藉由成像透鏡成像於檢測器(線感測器相機)之受光面。藉由使載物台向正交於X方向且平行於試料表面之Y方向移動,由檢測器拍攝於試料表面上之複數個線狀區域反射之光。藉此,產生試料表面之全體圖像。基於產生之圖像之亮度值進行試料之良否判定。Patent Document 1 describes an inspection device that macroscopically inspects samples such as semiconductor wafers. In this inspection device, the sample placed on the stage is irradiated with illumination light extending linearly in the X direction parallel to the surface of the sample, and the light reflected from the linear region on the surface of the sample is imaged on the detector by the imaging lens (Line sensor camera) light receiving surface. By moving the stage in the Y direction orthogonal to the X direction and parallel to the sample surface, the light reflected by the plurality of linear regions on the sample surface is captured by the detector. By this, the entire image of the sample surface is generated. Determine the quality of the sample based on the brightness value of the generated image.

[專利文獻1]日本專利特開2015-127653號公報[Patent Document 1] Japanese Patent Laid-Open No. 2015-127653

[發明所欲解決之問題][Problems to be solved by the invention]

根據上述檢查裝置,可使用藉由攝像產生之試料之圖像進行目視檢查。但,藉由攝像產生之試料之圖像中,實際上有應以相同顏色、亮度或濃度表示之複數個部分以互不相同之顏色、亮度或濃度表示之情形。該情形時,難以判定圖像上試料之表面狀態之缺陷有無。According to the inspection device described above, visual inspection can be performed using the image of the sample generated by imaging. However, in the image of the sample generated by the camera, there are actually a plurality of parts that should be expressed in the same color, brightness, or density in different colors, brightness, or density. In this case, it is difficult to determine whether there is a defect in the surface condition of the sample on the image.

本發明之目的係提供一種基板檢查裝置、基板處理裝置、基板檢查方法及基板處理方法,其於使用基板之圖像的目視檢查中,使用者可容易且正確地判定有無缺陷。 [解決問題之技術手段]An object of the present invention is to provide a substrate inspection device, a substrate processing device, a substrate inspection method, and a substrate processing method. In a visual inspection using an image of a substrate, a user can easily and accurately determine the presence or absence of a defect. [Technical means to solve the problem]

(1)按照本發明之一態樣之基板檢查裝置係具備:保持部,其保持基板;攝像部,其拍攝由保持部保持之基板之一面,產生表示基板之一面之圖像的實際圖像資料;平滑化部,其針對基於實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行平滑化處理;及修正部,其算出複數個單位區域中預先規定之單位區域的平滑化處理後之平均像素值與各單位區域之平滑化處理後的平均像素值之差量,且對自各單位區域向正交於第1直徑方向之第2直徑方向平行延伸之帶狀區域內之各像素值加上對應於該單位區域之差量。(1) A substrate inspection apparatus according to one aspect of the present invention includes: a holding portion that holds a substrate; an imaging portion that captures a surface of the substrate held by the holding portion and generates an actual image representing an image of the substrate surface Data; a smoothing unit, which calculates the average pixel value of each of the plurality of unit areas that constitute the unit area on the image based on the actual image data for each of the plurality of unit areas arranged in the first diameter direction of the substrate , Smoothing the average pixel value of the plurality of unit areas; and the correction section, which calculates the average pixel value after smoothing of the predetermined unit area in the plurality of unit areas and the smoothing processing of each unit area The average pixel value difference is added to each pixel value in the band-shaped region extending parallel to the second diameter direction orthogonal to the first diameter direction from each unit region.

該基板檢查裝置中,藉由拍攝由保持部保持之基板之一面,而產生表示基板之一面之圖像之實際圖像資料。針對複數個單位區域之各者算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行平滑化處理。In this substrate inspection device, actual image data representing an image of one side of the substrate is generated by photographing one side of the substrate held by the holding portion. For each of the plurality of unit areas, the average value of the plurality of pixels constituting the unit area is calculated as an average pixel value, and the average pixel value of the plurality of unit areas is smoothed.

算出複數個單位區域中預先規定之單位區域之平滑化處理後之平均像素值與各單位區域之平滑化處理後之平均像素值之差量。對自各單位區域向第2直徑方向平行延伸之帶狀區域內之各像素值加上對應於該單位區域之差量。藉此,基於修正後之實際圖像資料之圖像中,各帶狀區域內之複數個像素之平均值與預先規定之單位區域之平均像素值相等或大致相等。因此,基於修正後之實際圖像資料之圖像中,抑制視認成第1直徑方向之基板之一面的複數個部分之平均色不同。其結果,使用基於修正後之實際圖像資料之圖像的目視檢查中,可容易且正確地判定基板之表面狀態之缺陷有無。Calculate the difference between the average pixel value after the smoothing process of the predetermined unit area in the plurality of unit areas and the average pixel value after the smoothing process of each unit area. To each pixel value in the band-shaped region extending parallel to the second diameter direction from each unit region, a difference corresponding to the unit region is added. In this way, in the image based on the corrected actual image data, the average value of the plurality of pixels in each strip-shaped area is equal to or approximately equal to the average pixel value of the predetermined unit area. Therefore, in the image based on the corrected actual image data, it is suppressed that the average color of the plural portions of one surface of the substrate regarded as the first diameter direction is different. As a result, in the visual inspection using the image based on the corrected actual image data, the presence or absence of defects in the surface state of the substrate can be easily and accurately determined.

(2)平滑化處理亦可為利用移動中值法之平滑化處理。(2) The smoothing process may also be a smoothing process using the moving median method.

該情形時,藉由利用移動中值法之平滑化處理,適當地減低局部平均像素值之波動。In this case, by using the smoothing process of the moving median method, the fluctuation of the local average pixel value is appropriately reduced.

(3)於基板之一面上,形成於第1直徑方向具有週期性圖案之膜,利用移動中值法之平滑化處理所使用之寬度亦可大於第1直徑方向之圖案之週期。(3) On a surface of the substrate, a film formed with a periodic pattern in the first diameter direction may have a width that is greater than the period of the pattern in the first diameter direction by the smoothing process using the moving median method.

該情形時,適當減低因形成於基板之一面上之膜的圖案所致之平均像素值之波動。In this case, the fluctuation of the average pixel value due to the pattern of the film formed on one surface of the substrate is appropriately reduced.

(4)構成複數個單位區域各者之各像素包含R像素、B像素及G像素,平滑化部亦可針對每個像素種類進行平滑化處理,修正部針對每個像素種類進行複數個差量之算出處理,且針對每個像素種類進行複數個差量之相加處理。(4) Each pixel constituting each of the plurality of unit areas includes R pixels, B pixels, and G pixels, and the smoothing unit may also perform smoothing processing for each pixel type, and the correction unit performs plural differences for each pixel type The calculation process is performed, and a plurality of differences are added for each pixel type.

該情形時,抑制於基於修正後之實際圖像資料之圖像上,視認為第1直徑方向之基板之一面的複數個部分之平均色相不同。In this case, it is considered that the average hue of a plurality of parts of one surface of the substrate in the first diameter direction is different on the image based on the corrected actual image data.

(5)按照本發明之另一態樣之基板檢查裝置係具備:保持部,其保持基板;攝像部,其拍攝由保持部保持之基板之一面,產生表示基板之一面之圖像的實際圖像資料;平滑化部,其針對基於實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行利用移動中值法之第1平滑化處理;偏差算出部,其算出各單位區域之第1平滑化處理前之平均像素值與第1平滑化處理後之平均像素值之差量作為偏差;偏差最大值算出部,其藉由對複數個單位區域之偏差進行利用移動最大法之第2平滑化處理,算出第2平滑化處理後之複數個偏差作為複數個偏差最大值;偏差最小值算出部,其藉由對複數個單位區域之偏差進行利用移動最小法之第3平滑化處理,算出第3平滑化處理後之複數個偏差作為複數個偏差最小值;差量最大值算出部,其算出各單位區域之第1平滑化處理後之平均像素值與偏差最大值之相加值作為差量最大值;差量最小值算出部,其算出各單位區域之第1平滑化處理後之平均像素值與偏差最小值之相加值作為差量最小值;基準範圍決定部,其決定對應於預先規定之單位區域之差量最小值至差量最大值之範圍作為基準範圍;及修正部,其以使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域向正交於第1直徑方向之第2直徑方向平行延伸之各帶狀區域內之各像素值適合於修正後之範圍之方式進行修正。(5) A substrate inspection device according to another aspect of the present invention includes: a holding portion that holds a substrate; an imaging portion that takes a picture of a surface of the substrate held by the holding portion and generates an actual image representing an image of the substrate surface Image data; a smoothing unit, which calculates the average of the plurality of pixels constituting the unit area as the average pixel for each of the plurality of unit areas arranged in the first diameter direction of the substrate on the image based on the actual image data Value, the first smoothing process using the moving median method is performed on the average pixel value of a plurality of unit areas; the deviation calculation unit calculates the average pixel value before the first smoothing process of each unit area and the first smoothing process The difference between the average pixel values afterwards is used as the deviation; the deviation maximum value calculation unit calculates the plural deviations after the second smoothing process by performing the second smoothing process using the moving maximum method on the deviations of the plural unit regions As a plurality of deviation maximum values; a deviation minimum value calculation unit that calculates the plurality of deviations after the third smoothing process as the plurality of deviations by performing the third smoothing process using the moving minimum method on the deviations of the plurality of unit areas The minimum value; the difference maximum value calculation unit, which calculates the sum of the average pixel value after the first smoothing process of each unit area and the deviation maximum value as the maximum difference value; the difference minimum value calculation unit, which calculates each The sum of the average pixel value after the first smoothing process of the unit area and the minimum deviation value is taken as the minimum difference; the reference range determination unit determines the minimum difference to the maximum difference corresponding to the predetermined unit area The range of values is used as a reference range; and a correction section that corrects the range corresponding to each unit area from the minimum difference to the maximum difference with the reference range, and to make the unit area orthogonal to The pixel values in the band-shaped regions extending in parallel in the first diametric direction and the second diametric direction are corrected in a manner suitable for the corrected range.

該基板檢查裝置中,藉由拍攝由保持部保持之基板之一面,而產生表示基板之一面的圖像之實際圖像資料。針對複數個單位區域之各者算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行利用移動中值法之第1平滑化處理。該情形時,適當地減低局部平均像素值之波動。In this substrate inspection device, actual image data representing an image of one surface of the substrate is generated by photographing one surface of the substrate held by the holding portion. For each of the plurality of unit areas, the average value of the plurality of pixels constituting the unit area is calculated as the average pixel value, and the average pixel value of the plurality of unit areas is subjected to the first smoothing process using the moving median method. In this case, the fluctuation of the local average pixel value is appropriately reduced.

算出各單位區域之第1平滑化處理前之平均像素值與第1平滑化處理後之平均像素值之差量作為偏差。對複數個單位區域之偏差進行利用移動最大法之第2平滑化處理,算出第2平滑化處理後之複數個偏差作為複數個偏差最大值。又,對複數個單位區域之偏差進行利用移動最小法之第3平滑化處理,算出第3平滑化處理後之複數個偏差作為複數個偏差最小值。The difference between the average pixel value before the first smoothing process and the average pixel value after the first smoothing process in each unit area is calculated as a deviation. The second smoothing process using the moving maximum method is performed on the deviations of the plurality of unit areas, and the plurality of deviations after the second smoothing process is calculated as the maximum value of the plurality of deviations. In addition, the third smoothing process using the moving minimum method is performed on the deviations of the plurality of unit areas, and the plurality of deviations after the third smoothing process is calculated as the minimum value of the plurality of deviations.

藉由將各單位區域之第1平滑化處理後之平均像素值與偏差最大值相加而算出差量最大值,藉由將各單位區域之第1平滑化處理後之平均像素值與偏差最小值相加而算出差量最小值。The maximum difference is calculated by adding the average pixel value after the first smoothing process of each unit area to the maximum deviation, and by the average pixel value after the first smoothing process of each unit area and the minimum deviation The values are added to calculate the minimum difference.

決定對應於預先規定之單位區域之差量最小值至差量最大值之範圍作為基準範圍。以對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以自各單位區域向第2直徑方向平行延伸之各帶狀區域內之各像素值適合於修正後之範圍之方式進行修正。藉此,基於修正後之實際圖像資料之圖像中,各帶狀區域內之複數個像素之平均值與預先規定之單位區域之平均像素值相等或大致相等。又,以各帶狀區域內之各像素值適合於基準範圍之方式表示。因此,基於修正後之實際圖像資料之圖像中,抑制視認為第1直徑方向之基板之一面的複數個部分之平均色不同。其結果,使用基於修正後之實際圖像資料之圖像的目視檢查中,可容易且正確地判定基板之表面狀態之缺陷有無。The range from the minimum value to the maximum value of the difference corresponding to the predetermined unit area is determined as the reference range. The correction is made so that the range corresponding to the minimum difference to the maximum difference of each unit area is consistent with the reference range, and the pixel values in each band-shaped area extending parallel from each unit area in the second diameter direction are suitable Make corrections within the revised range. In this way, in the image based on the corrected actual image data, the average value of the plurality of pixels in each strip-shaped area is equal to or approximately equal to the average pixel value of the predetermined unit area. In addition, each pixel value in each band-shaped area is expressed so as to fit within the reference range. Therefore, in the image based on the actual image data after the correction, the average color of the plural portions of one surface of the substrate viewed in the first diameter direction is suppressed from being different. As a result, in the visual inspection using the image based on the corrected actual image data, the presence or absence of defects in the surface state of the substrate can be easily and accurately determined.

(6)於基板之一面上,形成於第1直徑方向具有週期性圖案之膜,利用移動中值法之第1平滑化處理、利用移動最大法之第2平滑化處理及利用移動最小法之第3平滑化處理所使用之寬度,亦可大於第1直徑方向之圖案之週期。(6) On a surface of the substrate, a film having a periodic pattern in the first diameter direction is formed by the first smoothing process using the moving median method, the second smoothing process using the moving maximum method, and the one using the moving minimum method The width used for the third smoothing process may be greater than the period of the pattern in the first diameter direction.

該情形時,適當地減低因形成於基板之一面上之膜的圖案所致之平均像素值、偏差最大值、偏差最小值之波動。In this case, the fluctuation of the average pixel value, the maximum deviation value, and the minimum deviation value due to the pattern of the film formed on one surface of the substrate is appropriately reduced.

(7)亦可係構成複數個單位區域各者之各像素包含R像素、B像素及G像素,平滑化部針對每個像素種類進行第1平滑化處理,偏差算出部針對每個像素種類進行複數個偏差之算出處理,偏差最大值算出部針對每個像素種類進行複數個差量最大值之算出處理,偏差最小值算出部針對每個像素種類進行複數個差量最小值之算出處理,差量最大值算出部針對每個像素種類進行複數個差量最大值之算出處理,差量最小值算出部針對每個像素種類進行複數個差量最小值之算出處理,基準範圍決定部針對每個像素種類進行基準範圍之決定處理,修正部針對每個像素種類進行使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之修正處理,及使各帶狀區域內之各像素值適合於修正後範圍之修正處理。(7) Each pixel constituting each of the plurality of unit areas may include R pixels, B pixels, and G pixels, the smoothing unit performs the first smoothing process for each pixel type, and the deviation calculation unit performs for each pixel type The calculation process of a plurality of deviations, the deviation maximum calculation unit performs the calculation process of a plurality of maximum differences for each pixel type, and the deviation minimum calculation unit performs a calculation process of a plurality of minimum differences for each pixel type, difference The amount maximum calculation unit performs calculation processing of a plurality of difference maximum values for each pixel type, the difference minimum calculation unit performs calculation processing of a plurality of difference minimum values for each pixel type, and the reference range determination unit For the pixel type, the reference range is determined, and the correction section performs correction processing for each pixel type to make the range corresponding to the minimum value of the difference between each unit area and the maximum value of the difference coincide with the reference range, and to make each band area Each pixel value is suitable for the correction process of the corrected range.

該情形時,抑制於基於修正後之實際圖像資料之圖像上,視認為第1直徑方向之基板之一面的複數個部分之平均色相不同。In this case, it is considered that the average hue of a plurality of parts of one surface of the substrate in the first diameter direction is different on the image based on the corrected actual image data.

(8)平滑化部亦可對於針對位於複數個單位區域之一部分即基於實際圖像資料之圖像上的基板之第1直徑方向之一端部之複數個單位區域應分別算出之平均像素值,基於針對位於隣接於該一端部之部分的複數個單位區域算出之複數個平均像素值進行推定,基於推定結果決定分別對應於位於一端部之複數個單位區域之複數個平均像素值。(8) The smoothing unit may also calculate the average pixel value for each of the unit regions located at one end of the first diameter direction of the substrate on the part of the plurality of unit regions, that is, the image based on the actual image data, Based on the estimation of the plurality of average pixel values calculated for the plurality of unit regions located at the portion adjacent to the one end, the plurality of average pixel values corresponding to the plurality of unit regions located at one end are determined based on the estimation result.

根據上述構成,位於基於實際圖像資料之圖像上的基板之一端部之複數個單位區域之複數個平均像素值,係基於位於隣接於該一端部之部分的複數個單位區域之平均像素值而推定。基於推定結果決定分別對應於位於一端部之複數個單位區域之複數個平均像素值。藉此,抑制視認為基於修正後之實際圖像資料之圖像中基板之一端部之平均色與隣接於一端部之部分的平均色大幅不同。According to the above configuration, the plurality of average pixel values of the plurality of unit regions at one end of the substrate on the image based on the actual image data are based on the average pixel values of the plurality of unit regions at the portion adjacent to the one end And presumed. Based on the estimation result, it is determined that a plurality of average pixel values corresponding to a plurality of unit regions at one end, respectively. By this, it is suppressed that the average color at one end of the substrate in the image based on the corrected actual image data is significantly different from the average color at the portion adjacent to the one end.

(9)亦可係攝像部具有線狀之攝像區域,其於由保持部保持之基板之一面上的第1直徑方向平行延伸,基板檢查裝置進而具備移動部,其以使攝像區域於第2直徑方向通過由保持部保持之基板之一面之方式,使攝像部與保持部相對移動。(9) The imaging section may have a linear imaging area that extends parallel to the first diameter direction on one surface of the substrate held by the holding section, and the substrate inspection device further includes a moving section so that the imaging area is at the second In the diameter direction, the imaging unit and the holding unit are relatively moved by one surface of the substrate held by the holding unit.

該情形時,藉由攝像部與保持部之相對移動產生表示基板之一面的全體圖像之實際圖像資料。因此,抑制攝像部之大型化。In this case, the actual image data representing the entire image of one surface of the substrate is generated by the relative movement of the imaging unit and the holding unit. Therefore, the enlargement of the imaging unit is suppressed.

(10)按照本發明之進而其他態樣之基板處理裝置係具備:塗佈處理部,其藉由將處理液供給於基板之一面,而於基板之一面形成膜;上述之基板檢查裝置,其檢查藉由塗佈處理部形成膜之基板;及搬送裝置,其於塗佈處理部與基板檢查裝置之間搬送基板。(10) A substrate processing apparatus according to still another aspect of the present invention includes: a coating processing section that forms a film on one surface of the substrate by supplying a processing liquid to one surface of the substrate; the above-described substrate inspection apparatus, which Inspecting a substrate formed with a film by a coating processing section; and a conveying device that conveys the substrate between the coating processing section and the substrate inspection device.

該基板處理裝置中,藉由上述基板檢查裝置檢查經形成膜之基板之一面上之表面狀態。藉此,使用表示基板之一面之圖像的目視檢查中,可容易且正確地判定形成於基板之一面上之膜的缺陷有無。其結果,減低基板之處理不良產生。In this substrate processing apparatus, the surface state of one surface of the film-formed substrate is inspected by the above substrate inspection apparatus. Thereby, in the visual inspection using the image representing one side of the substrate, the presence or absence of defects of the film formed on one side of the substrate can be easily and accurately determined. As a result, the occurrence of defective processing of the substrate is reduced.

(11)按照本發明之進而其他態樣之基板檢查方法係包含以下步驟:拍攝由保持部保持之基板之一面,產生表示基板之一面的圖像之實際圖像資料;針對於基於實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行平滑化處理;及算出複數個單位區域中預先規定之單位區域的平滑化處理後之平均像素值與各單位區域之平滑化處理後的平均像素值之差量,且對自各單位區域向正交於第1直徑方向之第2直徑方向平行延伸之帶狀區域內之各像素值加上對應於該單位區域之差量。(11) According to still another aspect of the present invention, the substrate inspection method includes the following steps: photographing one side of the substrate held by the holding portion, and generating actual image data representing an image of one side of the substrate; Each of the plurality of unit areas arranged in the first diameter direction of the substrate on the image of the data, calculates the average value of the plurality of pixels constituting the unit area as the average pixel value, and smoothes the average pixel value of the plurality of unit areas Processing; and calculating the difference between the average pixel value after the smoothing process of the predetermined unit area in the plurality of unit areas and the average pixel value after the smoothing process of each unit area, and for each unit area to be orthogonal to Each pixel value in the band-shaped region extending parallel to the second diameter direction in the first diameter direction is added to the difference corresponding to the unit area.

該基板檢查方法中,藉由拍攝由保持部保持之基板之一面,而產生表示基板之一面的圖像之實際圖像資料。針對複數個單位區域之各者算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行平滑化處理。In this substrate inspection method, actual image data representing an image of one surface of the substrate is generated by photographing one surface of the substrate held by the holding portion. For each of the plurality of unit areas, the average value of the plurality of pixels constituting the unit area is calculated as an average pixel value, and the average pixel value of the plurality of unit areas is smoothed.

算出複數個單位區域中預先規定之單位區域之平滑化處理後之平均像素值與各單位區域之平滑化處理後之平均像素值之差量。對自各單位區域向第2直徑方向平行延伸之帶狀區域內之各像素值加上對應於該單位區域之差量。藉此,基於修正後之實際圖像資料之圖像中,各帶狀區域內之複數個像素之平均值與預先規定之單位區域之平均像素值相等或大致相等。因此,基於修正後之實際圖像資料之圖像中,抑制視認成第1直徑方向之基板之一面的複數個部分之平均色不同。其結果,使用基於修正後之實際圖像資料之圖像的目視檢查中,可容易且正確地判定基板之表面狀態之缺陷有無。Calculate the difference between the average pixel value after the smoothing process of the predetermined unit area in the plurality of unit areas and the average pixel value after the smoothing process of each unit area. To each pixel value in the band-shaped region extending parallel to the second diameter direction from each unit region, a difference corresponding to the unit region is added. In this way, in the image based on the corrected actual image data, the average value of the plurality of pixels in each strip-shaped area is equal to or approximately equal to the average pixel value of the predetermined unit area. Therefore, in the image based on the corrected actual image data, it is suppressed that the average color of the plural portions of one surface of the substrate regarded as the first diameter direction is different. As a result, in the visual inspection using the image based on the corrected actual image data, the presence or absence of defects in the surface state of the substrate can be easily and accurately determined.

(12)平滑化處理亦可為利用移動中值法之平滑化處理。(12) The smoothing process may also be a smoothing process using the moving median method.

(13)於基板之一面上,形成於第1直徑方向具有週期性圖案之膜,利用移動中值法之平滑化處理所使用之寬度亦可大於第1直徑方向之圖案之週期。(13) On a surface of the substrate, a film having a periodic pattern in the first diameter direction is formed, and the width used in the smoothing process by the moving median method may be greater than the period of the pattern in the first diameter direction.

(14)亦可係構成複數個單位區域各者之各像素包含R像素、B像素及G像素,進行平滑化處理之步驟包含針對每個像素種類進行平滑化處理,相加步驟包含針對每個像素種類進行複數個差量之算出處理,且針對每個像素種類進行複數個差量之相加處理。(14) It is also possible that each pixel constituting each of the plurality of unit areas includes R pixels, B pixels, and G pixels. The step of smoothing includes smoothing for each pixel type, and the step of adding includes each The pixel type performs calculation processing of a plurality of differences, and performs the addition processing of a plurality of differences for each pixel type.

(15)按照本發明之進而其他態樣之基板檢查方法係包含以下步驟:拍攝由保持部保持之基板之一面,產生表示基板之一面之圖像的實際圖像資料;針對於基於實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行利用移動中值法之第1平滑化處理;算出各單位區域之第1平滑化處理前之平均像素值與第1平滑化處理後之平均像素值之差量作為偏差;藉由對複數個單位區域之偏差進行利用移動最大法之第2平滑化處理,算出第2平滑化處理後之複數個偏差作為複數個偏差最大值;藉由對複數個單位區域之偏差進行利用移動最小法之第3平滑化處理,算出第3平滑化處理後之複數個偏差作為複數個偏差最小值;算出各單位區域之第1平滑化處理後之平均像素值與偏差最大值之相加值作為差量最大值;算出各單位區域之第1平滑化處理後之平均像素值與偏差最小值之相加值作為差量最小值;決定對應於預先規定之單位區域之差量最小值至差量最大值之範圍作為基準範圍;及以使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域向正交於第1直徑方向之第2直徑方向平行延伸之各帶狀區域內之各像素值適合於修正後之範圍之方式進行修正。(15) According to still another aspect of the present invention, the substrate inspection method includes the following steps: photographing one side of the substrate held by the holding portion, and generating actual image data representing an image of one side of the substrate; Each of the plurality of unit areas arranged in the first diameter direction of the substrate on the image of the data, calculates the average value of the plurality of pixels constituting the unit area as the average pixel value, and uses the average pixel value of the plurality of unit areas The first smoothing process of the moving median method; calculate the difference between the average pixel value of each unit area before the first smoothing process and the average pixel value after the first smoothing process as the deviation; The deviation of the second smoothing process using the moving maximum method is calculated, and the plurality of deviations after the second smoothing process are calculated as the maximum value of the plural deviations; the third smoothing using the moving minimum method is performed on the deviations of the plurality of unit areas In the smoothing process, the plurality of deviations after the third smoothing process is calculated as the minimum value of the plurality of deviations; the sum of the average pixel value after the first smoothing process in each unit area and the maximum deviation is calculated as the maximum difference; Calculate the sum of the average pixel value after the first smoothing process of each unit area and the minimum deviation as the minimum difference; determine the range from the minimum difference to the maximum difference corresponding to the predetermined unit area as The reference range; and the correction is made in such a way that the range corresponding to the minimum difference to the maximum difference of each unit area is consistent with the reference range, and so that the second diameter from each unit area is orthogonal to the first diameter direction The pixel values in the band-shaped regions extending in parallel are corrected in a manner suitable for the corrected range.

該基板檢查方法中,藉由拍攝由保持部保持之基板之一面,而產生表示基板之一面的圖像之實際圖像資料。針對複數個單位區域之各者算出構成該單位區域之複數個像素之平均值作為平均像素值,對複數個單位區域之平均像素值進行利用移動中值法之第1平滑化處理。該情形時,適當地減低局部平均像素值之波動。In this substrate inspection method, actual image data representing an image of one surface of the substrate is generated by photographing one surface of the substrate held by the holding portion. For each of the plurality of unit areas, the average value of the plurality of pixels constituting the unit area is calculated as the average pixel value, and the average pixel value of the plurality of unit areas is subjected to the first smoothing process using the moving median method. In this case, the fluctuation of the local average pixel value is appropriately reduced.

算出各單位區域之第1平滑化處理前之平均像素值與第1平滑化處理後之平均像素值之差量作為偏差。對複數個單位區域之偏差進行利用移動最大法之第2平滑化處理,算出第2平滑化處理後之複數個偏差作為複數個偏差最大值。又,對複數個單位區域之偏差進行利用移動最小法之第3平滑化處理,算出第3平滑化處理後之複數個偏差作為複數個偏差最小值。The difference between the average pixel value before the first smoothing process and the average pixel value after the first smoothing process in each unit area is calculated as a deviation. The second smoothing process using the moving maximum method is performed on the deviations of the plurality of unit areas, and the plurality of deviations after the second smoothing process is calculated as the maximum value of the plurality of deviations. In addition, the third smoothing process using the moving minimum method is performed on the deviations of the plurality of unit areas, and the plurality of deviations after the third smoothing process is calculated as the minimum value of the plurality of deviations.

藉由將各單位區域之第1平滑化處理後之平均像素值與偏差最大值相加而算出差量最大值,藉由將各單位區域之第1平滑化處理後之平均像素值與偏差最小值相加而算出差量最小值。The maximum difference is calculated by adding the average pixel value after the first smoothing process of each unit area to the maximum deviation, and by the average pixel value after the first smoothing process of each unit area and the minimum deviation The values are added to calculate the minimum difference.

決定對應於預先規定之單位區域之差量最小值至差量最大值之範圍作為基準範圍。以對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域向第2直徑方向平行延伸之各帶狀區域內之各像素值適合於修正後之範圍之方式進行修正。藉此,基於修正後之實際圖像資料之圖像中,各帶狀區域內之複數個像素之平均值與預先規定之單位區域之平均像素值相等或大致相等。又,以各帶狀區域內之各像素值適合於基準範圍之方式表示。因此,基於修正後之實際圖像資料之圖像中,抑制視認成第1直徑方向之基板之一面的複數個部分之平均色不同。其結果,使用基於修正後之實際圖像資料之圖像的目視檢查中,可容易且正確地判定基板之表面狀態之缺陷有無。The range from the minimum value to the maximum value of the difference corresponding to the predetermined unit area is determined as the reference range. The correction is made so that the range corresponding to the minimum difference to the maximum difference of each unit area coincides with the reference range, and the pixel values in each band-shaped area extending from each unit area in the second diameter direction in parallel The method is suitable for correction after correction. In this way, in the image based on the corrected actual image data, the average value of the plurality of pixels in each strip-shaped area is equal to or approximately equal to the average pixel value of the predetermined unit area. In addition, each pixel value in each band-shaped area is expressed so as to fit within the reference range. Therefore, in the image based on the corrected actual image data, it is suppressed that the average color of the plural portions of one surface of the substrate regarded as the first diameter direction is different. As a result, in the visual inspection using the image based on the corrected actual image data, the presence or absence of defects in the surface state of the substrate can be easily and accurately determined.

(16)於基板之一面上,形成於第1直徑方向具有週期性圖案之膜,利用移動中值法之第1平滑化處理、利用移動最大法之第2平滑化處理及利用移動最小法之第3平滑化處理所使用之寬度,亦可大於第1直徑方向之圖案之週期。(16) On a surface of the substrate, a film having a periodic pattern in the first diameter direction is formed by the first smoothing process using the moving median method, the second smoothing process using the moving maximum method, and the film using the moving minimum method The width used for the third smoothing process may be greater than the period of the pattern in the first diameter direction.

(17)亦可係構成複數個單位區域各者之各像素包含R像素、B像素及G像素,進行第1平滑化處理之步驟包含針對每個像素種類進行第1平滑化處理,算出偏差之步驟包含針對每個像素種類進行複數個偏差之算出處理,算出偏差最大值之步驟包含針對每個像素種類進行複數個差量最大值之算出處理,算出偏差最小值之步驟包含針對每個像素種類進行複數個差量最小值之算出處理,算出差量最大值之步驟包含針對每個像素種類進行複數個差量最大值之算出處理,算出差量最小值之步驟包含針對每個像素種類進行複數個差量最小值之算出處理,決定基準範圍之步驟包含針對每個像素種類進行基準範圍之決定處理,修正步驟包含針對每個像素種類進行使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之修正處理,及使各帶狀區域內之各像素值適合修正後之範圍之修正處理。(17) Each pixel constituting each of the plurality of unit areas may include R pixels, B pixels, and G pixels, and the step of performing the first smoothing process includes performing the first smoothing process for each pixel type to calculate the deviation The step includes calculating a plurality of deviations for each pixel type, the step of calculating the maximum deviation includes the calculation processing of a plurality of maximum differences for each pixel type, and the step of calculating the minimum deviation includes each pixel type Perform the calculation process of the plurality of minimum differences, the step of calculating the maximum difference includes the calculation process of the plurality of maximum differences for each pixel type, the step of calculating the minimum difference includes the complex number for each pixel type The calculation process of each difference minimum value, the step of determining the reference range includes the determination process of the reference range for each pixel type, and the correction step includes performing the minimum value of the difference corresponding to each unit area to the difference for each pixel type The correction process in which the range of the maximum value is consistent with the reference range, and the correction process of adapting each pixel value in each band region to the corrected range.

(18)按照本發明之進而其他態樣之基板處理方法係包含以下步驟:藉由將處理液供給於基板之一面,而於基板之一面形成膜;及使用上述基板檢查方法,檢查於一面經形成膜之基板。(18) A substrate processing method according to yet another aspect of the present invention includes the steps of: forming a film on one side of the substrate by supplying a processing liquid to one side of the substrate; and using the above-mentioned substrate inspection method to inspect one side The film-forming substrate.

該基板處理方法中,藉由上述基板檢查方法檢查經形成膜之基板之一面上之表面狀態。藉此,使用表示基板之一面之圖像的目視檢查中,可容易且正確地判定形成於基板之一面上之膜的缺陷有無。其結果,減低基板之處理不良產生。 [發明之效果]In this substrate processing method, the surface state of one surface of the film-formed substrate is inspected by the above substrate inspection method. Thereby, in the visual inspection using the image representing one side of the substrate, the presence or absence of defects of the film formed on one side of the substrate can be easily and accurately determined. As a result, the occurrence of defective processing of the substrate is reduced. [Effect of invention]

根據本發明,於使用基板之圖像的目視檢查中,使用者可容易且正確地判定有無缺陷。According to the present invention, the user can easily and accurately determine the presence or absence of defects in the visual inspection of the image using the substrate.

以下,針對本發明實施形態之基板檢查裝置、基板處理裝置、基板檢查方法及基板處理方法,使用圖式進行說明。於以下之說明中,所謂基板,是指半導體基板、液晶顯示裝置或有機EL(Electro Luminescence:電致發光)顯示裝置等之FPD(Flat Panel Display:平板顯示器)用基板、光碟用基板、磁碟用基板、光磁碟用基板、光罩用基板、陶瓷基板或太陽電池用基板等。又,本實施形態中作為檢查對象使用之基板具有一面(主面)及另一面(背面),於其一面上形成有於互相正交之2方向具有週期性圖案之膜。各方向之圖案週期係根據使該基板曝光之曝光裝置中可以1發(shot)曝光之範圍大小(晶粒尺寸)決定。作為形成於基板上之一面上之膜,列舉例如抗蝕劑膜、抗反射膜、抗蝕劑覆蓋膜等。Hereinafter, the substrate inspection apparatus, the substrate processing apparatus, the substrate inspection method, and the substrate processing method according to the embodiments of the present invention will be described using drawings. In the following description, the substrate refers to a substrate for FPD (Flat Panel Display), a substrate for an optical disc, a magnetic disk for a semiconductor substrate, a liquid crystal display device, an organic EL (Electro Luminescence) display device, etc. Substrates, substrates for optomagnetic discs, substrates for photomasks, ceramic substrates, substrates for solar cells, etc. In addition, the substrate used as the inspection target in this embodiment has one side (main surface) and the other side (back surface), and a film having a periodic pattern in two directions orthogonal to each other is formed on one surface. The pattern period in each direction is determined according to the size (grain size) of the exposure device that can expose the substrate in one shot. Examples of the film formed on one surface of the substrate include a resist film, an anti-reflection film, and a resist cover film.

[1]第1實施形態[1] The first embodiment

(1)基板檢查裝置之構成 圖1係第1實施形態之基板檢查裝置之外觀立體圖,圖2係顯示圖1之基板檢查裝置200之內部構成之模式性側視圖,圖3係顯示圖1之基板檢查裝置200之內部構成之模式性俯視圖。如圖1所示,基板檢查裝置200具有框體部210。框體部210包含矩形狀之底面部211及矩形狀之4個側面部212~215。側面部212、214分別位於底面部211之長度方向之兩端部,側面部213、215分別位於底面部211之短邊方向(寬度方向)之兩端部。框體部210具有大致矩形狀之上部開口。框體部210亦可進而包含閉塞上部開口之上表面部。(1) Structure of the substrate inspection apparatus FIG. 1 is an external perspective view of the substrate inspection apparatus of the first embodiment, FIG. 2 is a schematic side view showing the internal structure of the substrate inspection apparatus 200 of FIG. 1, and FIG. 3 is a diagram of FIG. 1. A schematic plan view of the internal structure of the substrate inspection device 200. As shown in FIG. 1, the substrate inspection device 200 has a frame portion 210. The frame portion 210 includes a rectangular bottom surface portion 211 and four rectangular side portions 212 to 215. The side portions 212 and 214 are located at both ends of the bottom portion 211 in the longitudinal direction, and the side portions 213 and 215 are located at both ends of the bottom portion 211 in the short direction (width direction). The frame portion 210 has a substantially rectangular upper opening. The frame portion 210 may further include an upper surface portion that closes the upper opening.

以下,將底面部211之短邊方向稱為左右方向,將底面部211之長度方向稱為前後方向。又,於左右方向,將自側面部215朝向側面部213之方向定義為右方,將其反方向定義為左方。再者,於前後方向,將自側面部214朝向側面部212之方向定義為前方,將其反方向定義為後方。於側面部212至側面部213之前部之部分,形成有用以於框體部210之外部與內部之間搬送基板W之縫隙狀之開口部216。Hereinafter, the short side direction of the bottom surface portion 211 is referred to as a left-right direction, and the longitudinal direction of the bottom surface portion 211 is referred to as a front-back direction. In the left-right direction, the direction from the side surface portion 215 toward the side surface portion 213 is defined as the right side, and the direction opposite thereto is defined as the left side. Furthermore, in the front-rear direction, the direction from the side portion 214 toward the side portion 212 is defined as the front, and the opposite direction is defined as the rear. A slit-shaped opening 216 for transferring the substrate W between the outside and inside of the frame body 210 is formed in the portion from the side portion 212 to the front portion of the side portion 213.

於框體部210內,收納有投光部220、反射部230、攝像部240、基板保持裝置250、移動部260及切痕檢測部270。In the frame body portion 210, a light projecting portion 220, a reflecting portion 230, an imaging portion 240, a substrate holding device 250, a moving portion 260, and a cut detection portion 270 are housed.

投光部220例如包含1個或複數個光源,以於左右方向延伸之方式,安裝於框體部210之側面213、215之內面。反射部230例如包含鏡,以於投光部220之後方且左右方向延伸之方式,安裝於框體部210之側面部213、215之內面。The light projection unit 220 includes, for example, one or a plurality of light sources, and is mounted on the inner surfaces of the side surfaces 213 and 215 of the frame body 210 so as to extend in the left-right direction. The reflection part 230 includes, for example, a mirror, and is attached to the inner surfaces of the side parts 213 and 215 of the frame part 210 so as to extend behind the light projection part 220 and in the left-right direction.

攝像部240於較反射部230更後方之位置,安裝於框體部210之底面部211上。攝像部240包含以複數個像素於左右方向延伸之方式線狀排列之攝像元件及1個或複數個聚光透鏡。本例中,使用彩色CCD(電荷耦合元件)線感測器作為攝像元件。另,亦可使用彩色CMOS(互補性金屬氧化膜半導體)線感測器作為攝像元件。The imaging unit 240 is attached to the bottom surface 211 of the frame body 210 at a position behind the reflection unit 230. The imaging unit 240 includes imaging elements arranged linearly so that a plurality of pixels extend in the left-right direction, and one or a plurality of condenser lenses. In this example, a color CCD (charge coupled element) line sensor is used as the imaging element. In addition, a color CMOS (Complementary Metal Oxide Film Semiconductor) line sensor can also be used as the imaging element.

反射部230具有朝向斜下後方之反射面,配置於攝像部240之視野內。藉由反射部230之反射面,於投光部220及反射部230之下方,形成攝像部240之攝像區域。攝像部240之攝像區域於左右方向線狀延伸。The reflecting unit 230 has a reflecting surface that faces diagonally downward and rearward, and is arranged in the field of view of the imaging unit 240. The reflection surface of the reflection part 230 forms an imaging area of the imaging part 240 below the light projection part 220 and the reflection part 230. The imaging area of the imaging unit 240 extends linearly in the left-right direction.

如後述,將檢查對象之基板W自開口部216搬入框體部210內,搬入之基板W通過投光部220之下方。投光部220將於左右方向較基板W之直徑更長延伸之剖面線狀之光向斜下後方出射。如圖2所示,自投光部220向斜下後方出射之光之一部分,於攝像部240之攝像區域藉由基板W之一面(上表面)向斜上後方反射,藉由反射部230向後方反射,且藉由攝像部240受光。As will be described later, the substrate W to be inspected is carried into the frame portion 210 from the opening 216, and the carried substrate W passes under the light projection 220. The light projecting section 220 emits the cross-sectional light extending in the left-right direction longer than the diameter of the substrate W obliquely downward and rearward. As shown in FIG. 2, part of the light emitted obliquely downward and rearward from the light projecting section 220 is reflected obliquely upward and rearward by a surface (upper surface) of the substrate W in the imaging area of the imaging section 240, and is reflected by the reflective section 230 It is reflected from the rear and received by the imaging unit 240.

基板保持裝置250例如為旋轉卡盤,包含驅動裝置251及旋轉保持部252。驅動裝置251例如為電動馬達,具有旋轉軸251a。於驅動裝置251,設置未圖示之編碼器。旋轉保持部252安裝於驅動裝置251之旋轉軸251a之前端,以保持檢查對象之基板W之狀態繞垂直軸旋轉驅動。The substrate holding device 250 is, for example, a spin chuck, and includes a driving device 251 and a spin holding part 252. The driving device 251 is, for example, an electric motor, and has a rotating shaft 251a. The driving device 251 is provided with an encoder (not shown). The rotation holding portion 252 is attached to the front end of the rotation shaft 251a of the driving device 251, and is driven to rotate around the vertical axis while maintaining the substrate W to be inspected.

如圖3所示,移動部260包含複數個(本例中為2個)引導構件261及移動保持部262。複數個引導構件261以於左右方向排列之方式且於前後方向延伸之方式,安裝於框體部210之底面部211。移動保持部262構成為一面保持基板保持裝置250,一面可沿複數個引導構件261於前後方向移動。藉由基板保持裝置250保持基板W之狀態下,使移動保持部262於前後方向移動,而使基板W通過投光部220之下方。As shown in FIG. 3, the moving part 260 includes a plurality of (two in this example) guide members 261 and a moving holding part 262. The plurality of guide members 261 are attached to the bottom surface portion 211 of the frame body portion 210 so as to be aligned in the left-right direction and extend in the front-rear direction. The movement holding portion 262 is configured to hold the substrate holding device 250 while being movable along the plurality of guide members 261 in the front-rear direction. With the substrate holding device 250 holding the substrate W, the movement holding portion 262 is moved in the front-rear direction, and the substrate W is passed under the light projection portion 220.

切痕檢測部270例如為包含投光元件及受光元件之反射型光電感測器,安裝於框體部210之側面部215之內面之前上部。檢查對象之基板W之周緣部位於切痕檢測部270之下方時,切痕檢測部270向下方出射光且接收來自基板W之反射光。此處,於位於切痕檢測部270下方之基板W之部分形成切痕之情形時,切痕檢測部270之受光量減低。切痕檢測部270基於來自藉由基板保持裝置250旋轉之基板W之反射光的受光量,檢測基板W之切痕有無。另,亦可使用透過型光電感測器作為切痕檢測部270。The cut detection unit 270 is, for example, a reflective photoelectric sensor including a light-emitting element and a light-receiving element, and is attached to the upper portion in front of the inner surface of the side portion 215 of the frame body 210. When the peripheral portion of the substrate W to be inspected is located below the cut detection unit 270, the cut detection unit 270 emits light downward and receives the reflected light from the substrate W. Here, when a cut is formed in the portion of the substrate W located below the cut detection unit 270, the amount of light received by the cut detection unit 270 decreases. The cut detection unit 270 detects the presence or absence of a cut on the substrate W based on the received light amount of the reflected light from the substrate W rotated by the substrate holding device 250. In addition, a transmission type photoelectric sensor may be used as the cut detection unit 270.

如圖1所示,於框體部210之外部,設有控制裝置400及顯示部280。控制裝置400控制投光部220、攝像部240、基板保持裝置250、移動部260、切痕檢測部270及顯示部280。顯示部280顯示成為檢查對象之基板W之缺陷有無之自動判定結果、及目視檢查用基板W之圖像。控制裝置400之細節將於後述。另,圖2及圖3中,省略控制裝置400及顯示部280之圖示。As shown in FIG. 1, a control device 400 and a display unit 280 are provided outside the housing 210. The control device 400 controls the light projection unit 220, the imaging unit 240, the substrate holding device 250, the moving unit 260, the cut detection unit 270, and the display unit 280. The display unit 280 displays an automatic determination result of the presence or absence of a defect of the substrate W to be inspected, and an image of the substrate W for visual inspection. The details of the control device 400 will be described later. In addition, in FIGS. 2 and 3, illustration of the control device 400 and the display unit 280 is omitted.

上述基板檢查裝置200中,成為檢查對象之基板W之檢查時,拍攝該基板W之一面全體。針對該攝像時之動作進行說明。初始狀態下,如圖1所示,基板保持裝置250位於框體部210內之前部。該狀態下,將攝像對象之基板W通過開口部216,搬入框體部210內,並藉由基板保持裝置250保持。In the substrate inspection apparatus 200 described above, when inspecting the substrate W to be inspected, the entire surface of the substrate W is imaged. The operation at the time of imaging will be described. In the initial state, as shown in FIG. 1, the substrate holding device 250 is located in the front part inside the frame part 210. In this state, the substrate W to be imaged is carried into the frame portion 210 through the opening 216 and held by the substrate holding device 250.

接著,藉由基板保持裝置250使基板W旋轉1次,且藉由切痕檢測部270對基板W之周緣部出射光,藉由切痕檢測部270接收其反射光。藉此,檢測基板W之切痕,判定基板W之朝向。其後,以基板W朝向特定方向之方式,藉由基板保持裝置250使基板W旋轉。Next, the substrate W is rotated once by the substrate holding device 250, and the light is emitted to the peripheral portion of the substrate W by the cut detection unit 270, and the reflected light is received by the cut detection unit 270. With this, the cut of the substrate W is detected, and the orientation of the substrate W is determined. Thereafter, the substrate W is rotated by the substrate holding device 250 so that the substrate W faces a specific direction.

接著,於自投光部220出射光之狀態下,藉由移動部260將基板W向後方移動。此時,藉由基板W通過投光部220之下方,而對基板W之一面全體照射於左右方向延伸之剖面線狀之光。如上述,於攝像部240之攝像區域,自基板W反射之光藉由反射部230進而反射,並被引導至攝像部240。攝像部240之攝像元件藉由以特定之取樣週期接收自基板W之一面反射之光,而依序拍攝基板W之一面上之前後方向之複數個部分。構成攝像元件之各像素輸出表示對應於受光量之值的像素資料。藉此,基於自攝像部240輸出之複數個像素資料,產生表示基板W之一面上之全體圖像之圖像資料。Next, in a state where light is emitted from the light projecting section 220, the substrate W is moved backward by the moving section 260. At this time, the entire surface of the substrate W is irradiated with cross-sectional light extending in the left-right direction by the substrate W passing under the light projecting portion 220. As described above, in the imaging area of the imaging unit 240, the light reflected from the substrate W is further reflected by the reflecting unit 230 and guided to the imaging unit 240. The imaging element of the imaging unit 240 receives the light reflected from one surface of the substrate W at a specific sampling period, and sequentially photographs a plurality of parts in the front-back direction on one surface of the substrate W. Each pixel constituting the imaging element outputs pixel data indicating a value corresponding to the amount of received light. With this, based on the plurality of pixel data output from the imaging section 240, image data representing the entire image on one surface of the substrate W is generated.

其後,停止投光部220之光出射,藉由移動部260將基板自較反射部230更後方之位置移動至較投光部220更前方之位置。最後,將基板W通過開口216搬出至框體210之外部。Thereafter, the light output of the light projecting section 220 is stopped, and the substrate is moved from a position rearward of the reflecting section 230 to a position forward of the light projecting section 220 by the moving section 260. Finally, the substrate W is carried out through the opening 216 to the outside of the frame 210.

(2)基於藉由攝像產生之圖像資料之圖像 圖4(a)係顯示表示基板之一面之實際圖像之一例之圖,圖4(b)係顯示使用圖1之基板檢查裝置200,基於藉由拍攝圖4(a)之基板W而產生之圖像資料之先前圖像之一例之圖。於圖4(a)所示之基板W之一面上成為不存在缺陷者。另,於圖4(a)、(b)中,省略切痕之圖示。(2) An image based on image data generated by imaging FIG. 4(a) is a diagram showing an example of an actual image showing one side of a substrate, and FIG. 4(b) is a diagram showing the use of the substrate inspection apparatus 200 of FIG. , Based on an example of the previous image of the image data generated by photographing the substrate W of FIG. 4(a). On one surface of the substrate W shown in FIG. 4(a), there is no defect. In addition, in Figs. 4(a) and (b), the illustration of the cut is omitted.

圖4(a)之圖像中,基板W之一面上之複數個部分之平均顏色全體均一。藉此,可明確視認形成於基板W之一面上之膜的週期圖案。相對於此,於圖4(b)之圖像上,如陰影所示,基板W之兩端部及該等附近,係以與包含基板W之中心之中央部不同之顏色表示。針對其理由進行説明。In the image of FIG. 4(a), the average color of the plural portions on one surface of the substrate W is uniform. With this, the periodic pattern of the film formed on one surface of the substrate W can be clearly viewed. On the other hand, in the image of FIG. 4(b), as shown by hatching, the two ends of the substrate W and the vicinity thereof are represented by colors different from the central portion including the center of the substrate W. The reason will be explained.

設置於上述攝像部240之攝像元件之各像素係由接收紅色光之R像素、接收綠色光之G像素及接收藍色光之B像素構成。形成於基板W上之膜的光之折射率隨波長而不同。又,有基板W上之膜的光之透過率及反射率亦隨波長而不同之情形。因此,若於基板W之一面反射,向攝像部240之攝像元件之攝像面入射之光的入射角不同,則R像素、G像素及B像素之受光量之比率不同。藉此,因向攝像部240之攝像面之光的入射角,而圖像資料之R像素值、G像素值及B像素值之比率不同。圖像之顏色係藉由色相、明度及彩度之組合決定。如上述,R像素值、G像素值及B像素值之比率不同時,色相將變得不同。又,即使上述比率相等之情形時,R像素值、G像素值及B像素值不同時,亮度亦不同。該等結果可知,若光向攝像部240之攝像面之入射角不同,則由圖像資料表示之圖像的顏色不同。Each pixel of the imaging element provided in the imaging unit 240 is composed of an R pixel that receives red light, a G pixel that receives green light, and a B pixel that receives blue light. The refractive index of light of the film formed on the substrate W varies with wavelength. In addition, the transmittance and reflectance of light of the film on the substrate W may also vary with wavelength. Therefore, if it is reflected on one surface of the substrate W and the incident angle of light incident on the imaging surface of the imaging element of the imaging unit 240 is different, the ratio of the received light amounts of the R pixel, G pixel, and B pixel is different. As a result, the ratio of the R pixel value, the G pixel value, and the B pixel value of the image data is different due to the angle of incidence of light on the imaging surface of the imaging unit 240. The color of an image is determined by the combination of hue, lightness, and saturation. As described above, when the ratio of the R pixel value, the G pixel value, and the B pixel value is different, the hue will be different. Furthermore, even when the above ratios are equal, when the R pixel value, the G pixel value, and the B pixel value are different, the brightness is also different. From these results, it can be seen that if the incident angle of light to the imaging surface of the imaging unit 240 is different, the color of the image represented by the image data is different.

圖5係顯示圖1之基板檢查裝置200中藉由攝像部240拍攝基板W之一面全體之狀態之模式性俯視圖。如圖5所示,定義通過由基板保持裝置250保持之基板W之中心WC,於前後方向延伸且與基板W之一面垂直之第1假想面VS1。又,於投光部220及反射部230之後方,定義與前後方向正交之第2假想面VS2。再者,於第1假想面VS1與第2假想面VS2之交線上,定義假想點VP。FIG. 5 is a schematic plan view showing the state in which the entire surface of one surface of the substrate W is imaged by the imaging unit 240 in the substrate inspection apparatus 200 of FIG. 1. As shown in FIG. 5, a first virtual surface VS1 extending in the front-rear direction and perpendicular to one surface of the substrate W is defined by the center WC of the substrate W held by the substrate holding device 250. In addition, behind the light projecting section 220 and the reflecting section 230, a second virtual plane VS2 orthogonal to the front-rear direction is defined. Furthermore, a virtual point VP is defined on the intersection of the first virtual surface VS1 and the second virtual surface VS2.

攝像部240之攝像面242配置於第2假想面VS2上,且攝像面242之中心配置於假想點VP。該情形時,可使光自左右方向之基板W之一端部WE1及另一端部WE2向攝像部240之攝像面242入射之入射角γ相等。但,若反射部230至攝像部242之前後方向之距離較短,則光自基板W之一端部WE1及另一端部WE2向攝像部240之攝像面242入射之入射角γ與光自基板W之中心WC向攝像部240之攝像面242入射之入射角0之差量變大。基板檢查裝置200中,為了抑制框體部210之前後方向之大型化,而增大反射部230至攝像面242之前後方向之距離較困難。因此,基板W之一端部WE1及另一端部WE2之圖像之顏色與包含基板W之中心WC之基板W之中央部圖像之顏色相比大幅不同。The imaging surface 242 of the imaging unit 240 is disposed on the second virtual surface VS2, and the center of the imaging surface 242 is disposed at the virtual point VP. In this case, the incident angle γ of light incident on the imaging surface 242 of the imaging unit 240 from one end WE1 and the other end WE2 of the substrate W in the left-right direction can be made equal. However, if the distance between the reflecting portion 230 and the imaging portion 242 is short, the incident angle γ of light incident on the imaging surface 242 of the imaging portion 240 from one end WE1 and the other end WE2 of the substrate W and the light from the substrate W The difference of the incident angle 0 at which the center WC enters the imaging surface 242 of the imaging unit 240 increases. In the substrate inspection apparatus 200, in order to suppress the enlargement of the front-back direction of the frame portion 210, it is difficult to increase the distance between the reflection portion 230 and the front-back direction of the imaging surface 242. Therefore, the color of the image of one end WE1 and the other end WE2 of the substrate W is greatly different from the color of the image of the center portion of the substrate W including the center WC of the substrate W.

如上述,若於基於圖像資料之圖像上,基板W之兩端部及該等附近以與基板W之中央部不同之顏色表示,則使用該圖像之基板W之目視檢查中,於圖像上進行缺陷之判定較困難。因此,基板檢查裝置200中,以基板W之一面上之複數個部分之平均顏色相等或大致相等之方式,修正由攝像產生之圖像資料,產生目視檢查用之顯示用圖像資料。As described above, if on the image based on the image data, both ends and the vicinity of the substrate W are expressed in a different color from the central portion of the substrate W, then the visual inspection of the substrate W using the image, in It is difficult to judge defects on the image. Therefore, in the substrate inspection apparatus 200, the image data generated by imaging is corrected in such a manner that the average colors of a plurality of parts on one surface of the substrate W are equal or approximately equal, and display image data for visual inspection is generated.

(3)第1實施形態之圖像顯示用資料之產生方法 圖6~圖18係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。以下之說明中,將基板檢查裝置200中藉由拍攝基板W產生之圖像資料稱為實際圖像資料。實際圖像資料包含表示R像素之受光量之值、表示G像素之受光量之值、及表示B像素之受光量之值,作為每個像素之資訊。又,基於實際圖像資料之基板W之圖像中,將基板W之一直徑方向稱為X方向,將與X方向正交之基板W之另一直徑方向稱為Y方向。X方向對應於圖1之基板檢查裝置200之左右方向,Y方向對應於圖1之基板檢查裝置200之前後方向。(3) Method for generating data for image display in the first embodiment FIG. 6 to FIG. 18 are diagrams for explaining the method for generating data for image display in the first embodiment. In the following description, the image data generated by photographing the substrate W in the substrate inspection device 200 is referred to as actual image data. The actual image data includes the value representing the light receiving amount of the R pixel, the value representing the light receiving amount of the G pixel, and the value representing the light receiving amount of the B pixel as information for each pixel. In addition, in the image of the substrate W based on the actual image data, one of the diameter directions of the substrate W is called the X direction, and the other diameter direction of the substrate W orthogonal to the X direction is called the Y direction. The X direction corresponds to the left-right direction of the substrate inspection apparatus 200 of FIG. 1, and the Y direction corresponds to the front-back direction of the substrate inspection apparatus 200 of FIG. 1.

首先,如圖6所示,基於實際圖像資料之圖像中,於基板W之Y方向之中央部,設定排列於X方向之複數個單位區域UA。各單位區域UA包含複數個像素PI,於X方向具有1像素量之寬度,及於Y方向具有100像素量之長度。藉此,各單位區域UA對應於X方向之各像素位置。另,單位區域UA之Y方向之長度只要大於X方向之寬度且小於基板W之直徑即可。First, as shown in FIG. 6, in an image based on actual image data, a plurality of unit areas UA arranged in the X direction are set at the central portion of the substrate W in the Y direction. Each unit area UA includes a plurality of pixels PI, has a width of 1 pixel in the X direction, and has a length of 100 pixels in the Y direction. With this, each unit area UA corresponds to each pixel position in the X direction. In addition, the length of the unit area UA in the Y direction may be longer than the width in the X direction and smaller than the diameter of the substrate W.

接著,算出所設定之各單位區域UA內之複數個像素PI之R像素之平均值、G像素之平均值及B像素之平均值。將針對各單位區域UA算出之R像素之平均值、G像素之平均值及B像素之平均值分別設為對應於該單位區域UA之R像素之平均像素值、G像素之平均像素值及B像素之平均像素值。基於RGB之平均像素值之比率及該等值之大小所得之顏色成為代表各單位區域UA內之複數個像素PI之顏色的平均色。另,亦可將各單位區域UA內之複數個像素PI之R像素之中央值、G像素之中央值及B像素之中央值,分別設為R像素之平均像素值、G像素之平均像素值及B像素之平均像素值。Next, the average value of the R pixels, the average value of the G pixels, and the average value of the B pixels of the plurality of pixels PI in each unit area UA are calculated. The average value of R pixels, the average value of G pixels, and the average value of B pixels calculated for each unit area UA are set to the average pixel value of R pixels, the average pixel value of G pixels, and B corresponding to the unit area UA, respectively The average pixel value of the pixel. The color obtained based on the ratio of the average pixel values of RGB and the magnitude of these values becomes the average color representing the colors of the plurality of pixels PI in each unit area UA. In addition, the central value of the R pixels, the central value of the G pixels, and the central value of the B pixels of the plurality of pixels PI in each unit area UA can be respectively set as the average pixel value of the R pixel and the average pixel value of the G pixel And the average pixel value of B pixels.

圖7係藉由圖表顯示自實際圖像資料算出之RGB之平均像素值之一例。圖7中,縱軸表示像素值,橫軸表示基板W之圖像上之X方向之像素位置。又,橫軸之一端部(左端部)表示基板W之圖像上之X方向之一端部(左端部)之像素位置,橫軸之另一端部(右端部)表示基板W之圖像上之X方向之另一端部(右端部)之像素位置。再者,圖7中,自X方向之一端部至另一端部連結R像素之平均像素值的線係以一點鏈線(以下稱為R平均像素值線RR)表示,自X方向之一端部至另一端部連結G像素之平均像素值的線係以點線(以下稱為G平均像素值線RG)表示,自X方向之一端部至另一端部連結B像素之平均像素值的線係以實線(以下稱為B平均像素值線RB)表示。根據圖7之圖表可知,基板W之中央部之RGB之平均像素值之比率,與基板W之兩端部及其附近之RGB之平均像素值之比率不同。FIG. 7 shows an example of the average pixel value of RGB calculated from actual image data by a graph. In FIG. 7, the vertical axis represents the pixel value, and the horizontal axis represents the pixel position in the X direction on the image of the substrate W. Also, one end (left end) of the horizontal axis represents the pixel position of one end (left end) in the X direction on the image of the substrate W, and the other end (right end) of the horizontal axis represents the image of the substrate W The pixel position at the other end (right end) in the X direction. In addition, in FIG. 7, the line connecting the average pixel value of the R pixel from one end in the X direction to the other end is represented by a one-point chain line (hereinafter referred to as the R average pixel value line RR), from one end in the X direction The line connecting the average pixel value of the G pixel to the other end is represented by a dotted line (hereinafter referred to as the G average pixel value line RG), and the line connecting the average pixel value of the B pixel from one end in the X direction to the other end It is represented by a solid line (hereinafter referred to as B average pixel value line RB). According to the graph of FIG. 7, the ratio of the average pixel value of RGB in the central portion of the substrate W is different from the ratio of the average pixel value of RGB in the both ends of the substrate W and its vicinity.

接著,為獲得形成於基板W之一面上之膜的圖案之X方向之週期,針對R平均像素值線RR、G平均像素值線RG及B平均像素值線RB之各者,依序算出於包含基板W之中心之一部分區域(以下稱為中央區域)於X方向連續排列之k(k為2以上之自然數)個平均像素值之資料,與自其中央區域向X方向逐個像素錯開之位置上於X方向連續排列之k個平均像素值之資料的相關係數。本實施形態中,將k設為200左右。Next, in order to obtain the period in the X direction of the pattern of the film formed on one surface of the substrate W, for each of the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB, sequentially calculate The data including k (k is a natural number of 2 or more) average pixel values of a part of the area (hereinafter referred to as the central area) of the center of the substrate W continuously arranged in the X direction are offset from the central area of the pixel by pixel in the X direction Correlation coefficient of the data of k average pixel values continuously arranged in the X direction. In this embodiment, k is set to about 200.

圖8係藉由圖表顯示自圖7之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB算出之相關係數之一例。圖8中,縱軸表示相關係數,橫軸表示基板W之圖像上之X方向之像素位置。又,圖8中,對應於R平均像素值線RR之相關係數係以一點鏈線表示,對應於G平均像素值線RG之相關係數係以點線表示,對應於B平均像素值線RB之相關係數係以實線表示。FIG. 8 is a graph showing an example of correlation coefficients calculated from the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB of FIG. 7. In FIG. 8, the vertical axis represents the correlation coefficient, and the horizontal axis represents the pixel position in the X direction on the image of the substrate W. In addition, in FIG. 8, the correlation coefficient corresponding to the R average pixel value line RR is represented by a dotted line, and the correlation coefficient corresponding to the G average pixel value line RG is represented by a dotted line, corresponding to the B average pixel value line RB The correlation coefficient is represented by a solid line.

接著,自針對R平均像素值線RR、G平均像素值線RG及B平均像素值線RB分別算出之3種相關關係,選擇表示於像素位置之方向顯著之週期性之相關係數。圖8之例中,選擇對應於B平均像素值線RB之相關係數。所選擇之相關係數之波形中,如圖8中之空心箭頭所示,識別超出預先規定之臨限值th0且對應於基板W之中央區域之峰值,作為中央峰值。Next, from the three correlations calculated for the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB, respectively, select a correlation coefficient that represents a significant periodicity in the direction of the pixel position. In the example of FIG. 8, the correlation coefficient corresponding to the B average pixel value line RB is selected. In the waveform of the selected correlation coefficient, as shown by the hollow arrow in FIG. 8, a peak exceeding the predetermined threshold th0 and corresponding to the central region of the substrate W is identified as the central peak.

接著,如圖8中粗實線箭頭所示,針對中央峰值,擷取超出預先規定之臨限值th0且與中央峰值相鄰之2個峰值中之任一者。又,算出中央峰值與擷取之峰值間的X方向之距離(像素數)。將如此算出之距離設為形成於基板W之一面上之膜的圖案之X方向之週期(以下稱為圖案週期)。Next, as indicated by the thick solid arrows in FIG. 8, for the central peak, any one of the two peaks that exceeds the predetermined threshold th0 and is adjacent to the central peak is extracted. Furthermore, the distance (number of pixels) in the X direction between the central peak and the captured peak is calculated. The distance calculated in this way is a period in the X direction of the pattern of the film formed on one surface of the substrate W (hereinafter referred to as a pattern period).

接著,針對圖7所示之RGB之平均像素值,進行利用移動中值法之平滑化處理。具體而言,針對各單位區域UA,以該單位區域UA之一方(左方)以1圖案週期量,及該單位區域UA之另一方(右方)以1圖案週期量之寬度算出移動中央值。如此,以對圖案週期之2倍值加上「1」之寬度,算出X方向之移動中央值。藉此,適當減低因膜之圖案所致的平均像素值之波動。Next, the average pixel value of RGB shown in FIG. 7 is smoothed by the moving median method. Specifically, for each unit area UA, one of the unit areas UA (left side) is calculated with a pattern period and the other of the unit area UA (right side) is calculated with a width of 1 pattern period. . In this way, the center value of the movement in the X direction is calculated by adding a width of "1" to the double value of the pattern period. In this way, the fluctuation of the average pixel value caused by the pattern of the film is appropriately reduced.

圖9中,藉由圖7之R平均像素值線RR平滑化所得之第1的R基準曲線R1係以一點鏈線表示,藉由圖7之G平均像素值線RG平滑化所得之第1的G基準曲線G1係以點線表示,藉由圖7之B平均像素值線RB平滑化所得之第1的B基準曲線B1係以實線表示。In FIG. 9, the first R reference curve R1 smoothed by the R average pixel value line RR of FIG. 7 is represented by a dotted line, and the first R reference curve smoothed by the G average pixel value line RG of FIG. 7 The G reference curve G1 is represented by a dotted line, and the first B reference curve B1 smoothed by the B average pixel value line RB of FIG. 7 is represented by a solid line.

有於基板W之一面上,於外周端部及其附近未形成膜之情形。或者,膜形成於外周端部及其附近之情形時,形成於外周端部及其附近之膜的圖案亦具有與形成於基板W之中央部之膜的圖案不同之週期性。因此,如圖9中粗二點鏈線所示,儘管第1的R基準曲線R1、第1的G基準曲線G1及第1的B基準曲線B1平滑化,仍會於X方向之兩端部大幅紊亂。There is a case where no film is formed on one surface of the substrate W at the outer peripheral end and its vicinity. Alternatively, when the film is formed at the outer peripheral end and its vicinity, the pattern of the film formed at the outer peripheral end and its vicinity also has a different periodicity from the pattern of the film formed at the central portion of the substrate W. Therefore, as shown by the thick two-dot chain line in FIG. 9, although the first R reference curve R1, the first G reference curve G1, and the first B reference curve B1 are smoothed, they are still at both ends in the X direction Significantly disordered.

因此,推定出假設基板W之圖像上之一端部不紊亂時應算出之一端部之平均像素值。具體而言,包含基板W之圖像上之一端部之1圖案週期量之理想的平均像素值係藉由與該部分相鄰之另1圖案週期量之平均像素值予以推定。Therefore, it is estimated that the average pixel value at one end should be calculated assuming that one end on the image of the substrate W is not disturbed. Specifically, the ideal average pixel value of one pattern period of one end on the image including the substrate W is estimated from the average pixel value of another pattern period adjacent to the part.

圖10(a)係顯示自X方向之一端部遠離約2圖案週期量之第1的R基準曲線R1、第1的G基準曲線G1及第1的B基準曲線B1。此處,將自一端部遠離2圖案週期之像素位置設為p0 ,將自像素位置p0 向一端部遠離小於1圖案週期之任意距離之像素位置設為pn 。又,將自一端部遠離1圖案週期之像素位置設為p'0 ,將自像素位置p'0 向一端部遠離小於1圖案週期之任意距離之像素位置設為p'n 。像素位置p'0 、p'n 間之距離與像素位置p0 、pn 間之距離相等。FIG. 10(a) shows the first R reference curve R1, the first G reference curve G1, and the first B reference curve B1 that are away from an end in the X direction by about two pattern periods. Here, the pixel position farther from the one end part by 2 pattern periods is set to p 0 , and the pixel position farther from the pixel position p 0 to the one end part by any distance less than 1 pattern period is set to p n . Further, since the end portion remote from the position of the pixel pattern period of 1 to p '0, since the pixel position p' away from the pixel position of any pattern is less than the distance set period p 'n-0 to the end portion. The distance between the pixel position of the pixel position p 0 p '0, p' n, equal to the distance between the p n.

該情形時,針對第1的R基準曲線R1,將像素位置p0 之像素值設為R0 ,將像素位置pn 之像素值設為Rn ,將像素位置p'0 之像素值設為R'0 之情形時,像素位置p'n 之理想像素值R'n 可基於下式(1)推定。 R'n =(Rn -R0 )+R'0 …(1)In this case, for the first R reference curve R1, the pixel value of the pixel position p 0 is set to R 0 , the pixel value of the pixel position p n is set to R n , and the pixel value of the pixel position p′ 0 is set to R 'when the case of 0, the pixel position p' n of the pixel value over the R 'n-can be estimated based on the formula (1). R'n = (R n -R 0 )+R' 0 …(1)

又,針對第1的G基準曲線G1,將像素位置p0 之像素值設為G0 ,將像素位置pn 之像素值設為Gn ,將像素位置p'0 之像素值設為G'0 之情形時,像素位置p'n 之理想像素值G'n 可基於下式(2)推定。 G'n =(Gn -G0 )+G'0 …(2)Also, for the first G reference curve G1, the pixel value at the pixel position p 0 is set to G 0 , the pixel value at the pixel position p n is set to G n , and the pixel value at the pixel position p′ 0 is set to G′ when the case of 0, the pixel location p 'over the value of the pixel n G' n can be estimated based on the following equation (2). G 'n = (G n -G 0) + G' 0 ... (2)

再者,針對第1的B基準曲線B1,將像素位置p0 之像素值設為B0 ,將像素位置pn 之像素值設為Bn ,將像素位置p'0 之像素值設為B'0 之情形時,像素位置p'n 之理想像素值B'n 可基於下式(3)推定。 B'n =(Bn -B0 )+B'0 …(3)Furthermore, for the first B reference curve B1, the pixel value at the pixel position p 0 is set to B 0 , the pixel value at the pixel position p n is set to B n , and the pixel value at the pixel position p′ 0 is set to B 'is 0 case, the pixel position p' over the value B of the pixel n 'n can be estimated based on the formula (3). B'n = (B n -B 0 )+B' 0 …(3)

使用上述式(1)、(2)、(3),推定X方向之包含一端部之1圖案週期量之平均像素值,決定推定結果,作為位於一端部之1圖案週期量之複數個單位區域UA之RGB平均像素值。藉此,如圖10(b)所示,將第1的R基準曲線R1、第1的G基準曲線G1及第1的B基準曲線B1之一端部之紊亂去除。Using the above formulas (1), (2), and (3), the average pixel value of one pattern period in one end in the X direction is estimated, and the estimation result is determined as a plurality of unit areas of one pattern period in one end The average pixel value of RGB in UA. Thereby, as shown in FIG. 10(b), the disorder of one end of the first R reference curve R1, the first G reference curve G1, and the first B reference curve B1 is removed.

又,對於包含基板W之圖像上之另一端部之1圖案週期量之理想平均像素值,亦係藉由與該部分相鄰之另1圖案週期量之平均像素值予以推定。圖10(c)係顯示自X方向之另一端部遠離約2圖案週期量之第1的R基準曲線R1、第1的G基準曲線G1及第1的B基準曲線B1。本例中,將自另一端部遠離2圖案週期之像素位置設為p0 ,將自像素位置p0 向另一端部遠離小於1圖案週期之任意距離之像素位置設為pn 。又,將自另一端部遠離1圖案週期之像素位置設為p'0 ,將自像素位置p'0 向另一端部遠離小於1圖案週期之任意距離之像素位置設為p'n 。像素位置p'0 、p'n 間之距離與像素位置p0 、pn 間之距離相等。In addition, the ideal average pixel value for one pattern period on the other end of the image including the substrate W is also estimated by the average pixel value for another pattern period adjacent to the portion. FIG. 10(c) shows the first R reference curve R1, the first G reference curve G1, and the first B reference curve B1 that are away from the other end in the X direction by about 2 pattern periods. In this example, the pixel position farther from the other end by 2 pattern periods is set to p 0 , and the pixel position farther from the pixel position p 0 to the other end than any pattern period is set to p n . Further, the other end portion remote from the position of the pixel pattern period of 1 to p '0, since the pixel position p' away from the pixel position of any pattern is less than the distance set period p 'n-0 to the other end portion. The distance between the pixel position of the pixel position p 0 p '0, p' n, equal to the distance between the p n.

該情形時,使用上述式(1)、(2)、(3),推測X方向之包含另一端部之1圖案週期量之平均像素值,決定推定結果,作為位於另一端部之1圖案週期量之複數個單位區域UA之RGB平均像素值。藉此,如圖10(d)所示,將第1的R基準曲線R1、第1的G基準曲線G1及第1的B基準曲線B1之另一端部之紊亂去除。圖11係顯示基於推定結果修正兩端部之第1的R基準曲線R1、第1的G基準曲線G1及第1的B基準曲線B1之全體。In this case, the above formulas (1), (2), and (3) are used to estimate the average pixel value of one pattern period in the X direction including the other end, and the estimation result is determined as one pattern period at the other end The RGB average pixel value of a plurality of unit areas UA. As a result, as shown in FIG. 10(d), the disorder of the other ends of the first R reference curve R1, the first G reference curve G1, and the first B reference curve B1 is removed. FIG. 11 shows the correction of the total of the first R reference curve R1, the first G reference curve G1, and the first B reference curve B1 at both ends based on the estimation result.

接著,亦對於圖7之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB表示之平均像素值,推定假設基板W之圖像上之一端部無紊亂時應算出之兩端部之平均像素值,基於推定結果修正兩端部之平均像素值。此處,為更正確地求得膜之圖案產生紊亂之像素位置之範圍(以下稱為無用範圍),進行以下處理。Next, for the average pixel value represented by the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB in FIG. 7, it is estimated that it should be calculated assuming that one end on the image of the substrate W is not disturbed The average pixel value at both ends is corrected based on the estimation result. Here, in order to more accurately determine the range of pixel positions where the pattern of the film is disturbed (hereinafter referred to as a useless range), the following processing is performed.

首先,針對各單位區域UA,算出由圖7之R平均像素值線RR表示之平滑化前之平均像素值與由圖11之第1R基準曲線R1表示之平滑化後之平均像素值之差量絕對值,作為R像素之偏差評估值。又,針對各單位區域UA,算出由圖7之G平均像素值線RG表示之平滑化前之平均像素值與由圖11之第1的G基準曲線G1表示之平滑化後之平均像素值之差量絕對值,作為G像素之偏差評估值。再者,針對各單位區域UA,算出由圖7之B平均像素值線RB表示之平滑化前之平均像素值與由圖11之第1的B基準曲線B1表示之平滑化後之平均像素值之差量絕對值,作為B像素之偏差評估值。圖12係顯示B像素之偏差評估值。另,R像素及G像素之偏差評估值以例如與B像素之偏差評估值大致重疊之方式算出。First, for each unit area UA, the difference between the average pixel value before smoothing indicated by the R average pixel value line RR in FIG. 7 and the average pixel value after smoothing indicated by the first R reference curve R1 in FIG. 11 is calculated The absolute value is used as the deviation evaluation value of R pixels. Also, for each unit area UA, the average pixel value before smoothing indicated by the G average pixel value line RG in FIG. 7 and the average pixel value after smoothing indicated by the first G reference curve G1 in FIG. 11 are calculated. The absolute value of the difference is used as the deviation evaluation value of G pixels. Furthermore, for each unit area UA, the average pixel value before smoothing indicated by the B average pixel value line RB in FIG. 7 and the average pixel value after smoothing indicated by the first B reference curve B1 in FIG. 11 are calculated The absolute value of the difference is taken as the evaluation value of the deviation of B pixels. FIG. 12 shows the evaluation value of the deviation of B pixels. In addition, the deviation evaluation value of the R pixel and the G pixel is calculated so as to substantially overlap the deviation evaluation value of the B pixel, for example.

接著,針對由圖7之R平均像素值線RR表示之平滑化前之平均像素值,算出每單位區域UA與該單位區域UA相鄰之左右2個單位區域UA之平均像素值之差量絕對值,作為R像素之差量評估值。又,針對由圖7之G平均像素值線RG表示之平滑化前之平均像素值,算出每單位區域UA與該單位區域UA相鄰之左右2個單位區域UA之平均像素值之差量絕對值,作為G像素之差量評估值。再者,針對由圖7之B平均像素值線RB表示之平滑化前之平均像素值,算出每單位區域UA與該單位區域UA相鄰之左右2個單位區域UA之平均像素值之差量絕對值,作為B像素之差量評估值。圖13係顯示B像素之差量評估值。另,R像素及G像素之差量評估值例如以與B像素之差量評估值大致重疊之方式算出。Next, for the average pixel value before smoothing represented by the R average pixel value line RR of FIG. 7, the absolute difference between the average pixel values of the two unit areas UA adjacent to each unit area UA and the unit area UA is calculated. Value as the difference evaluation value of R pixels. In addition, for the average pixel value before smoothing represented by the G average pixel value line RG in FIG. 7, the absolute difference between the average pixel values of the two unit areas UA adjacent to each unit area UA and the unit area UA is calculated. Value as the difference evaluation value of G pixels. Furthermore, for the average pixel value before smoothing indicated by the B average pixel value line RB in FIG. 7, the difference between the average pixel values of the two unit areas UA adjacent to each unit area UA and the unit area UA is calculated The absolute value is used as the difference evaluation value of B pixels. Fig. 13 shows the evaluation value of the difference of B pixels. In addition, the difference evaluation value of the R pixel and the G pixel is calculated, for example, so as to substantially overlap with the difference evaluation value of the B pixel.

其後,基於RGB之偏差評估值及差量評估值,決定包含基板W之圖像上之X方向之一端部之無用範圍。圖14(a)係顯示自X方向之一端部遠離約2圖案週期量之RGB之偏差評估值。又,圖14(b)係顯示自X方向之一端部遠離約2圖案週期量之RGB之差量評估值。另,圖14(a)、(b)及後述之圖14(c)、(d)中,對應於R像素之評估值係以一點連線表示,對應於G像素之評估值係以點線表示,對應於B像素之評估值係以實線表示。Thereafter, based on the deviation evaluation value and the difference evaluation value of RGB, a useless range including one end portion in the X direction on the image of the substrate W is determined. FIG. 14(a) shows the evaluation value of the deviation of RGB away from an end in the X direction by about 2 pattern periods. In addition, FIG. 14(b) shows the evaluation value of the difference of RGB away from an end in the X direction by about 2 pattern periods. In addition, in FIGS. 14(a) and (b) and FIGS. 14(c) and (d) described later, the evaluation value corresponding to the R pixel is indicated by a dotted line, and the evaluation value corresponding to the G pixel is indicated by a dotted line Indicates that the evaluation value corresponding to the B pixel is indicated by a solid line.

此處,針對偏差評估值,如圖14(a)所示,設為預先規定臨限值th1者。又,針對差量評估值,如圖14(b)所示,設為預先規定臨限值th2者。該狀態下,針對自X方向之一端部向另一端部之每個單位區域UA(每1像素),判定RGB之所有偏差評估值是否為臨限值th1以下且RGB之所有差量評估值是否為臨限值th2以下。因此,首先決定RGB之所有偏差評估值變為臨限值th1以下且RGB之所有差量評估值變為臨限值th2以下時之單位區域UA之像素位置至一端部之範圍,作為無用範圍UN1。Here, regarding the deviation evaluation value, as shown in FIG. 14(a), the threshold value th1 is predetermined. In addition, as shown in FIG. 14(b), the difference evaluation value is assumed to be a threshold value th2 predetermined. In this state, for each unit area UA (per 1 pixel) from one end in the X direction to the other end, it is determined whether the evaluation value of all deviations of RGB is below the threshold th1 and the evaluation value of all differences of RGB The threshold is below th2. Therefore, first determine the range from the pixel position of the unit area UA to one end when the evaluation values of all deviations of RGB become below the threshold th1 and the evaluation values of all differences of RGB become below the threshold th2, as the useless range UN1 .

其後,基於RGB之偏差評估值及差量評估值,決定包含基板W之圖像上之X方向之另一端部之無用範圍。圖14(c)係顯示自X方向之另一端部遠離約2圖案週期量之RGB之偏差評估值。又,圖14(d)係顯示自X方向之另一端部遠離約2圖案週期量之RGB之差量評估值。Thereafter, based on the deviation evaluation value and the difference evaluation value of RGB, the useless range of the other end portion in the X direction on the image including the substrate W is determined. FIG. 14(c) shows the evaluation value of the deviation of RGB away from the other end in the X direction by about 2 pattern periods. In addition, FIG. 14(d) shows the evaluation value of the difference in RGB away from the other end in the X direction by about 2 pattern periods.

關於另一端部,亦與上述一端部之例基本同樣地,針對自X方向之另一端部向一端部之每個單位區域UA(每1像素),判定RGB之所有偏差評估值是否為臨限值th1以下且RGB之所有差量評估值是否為臨限值th2以下。因此,首先決定RGB之所有偏差評估值變為臨限值th1以下且RGB之所有差量評估值變為臨限值th2以下時之單位區域UA之像素位置至另一端部之範圍,作為無用範圍UN2。Regarding the other end, also in the same way as the example of the above one end, for each unit area UA (per 1 pixel) from the other end in the X direction to one end, it is determined whether all the deviation evaluation values of RGB are critical If the value is below th1 and all the difference evaluation values of RGB are below the threshold th2. Therefore, first determine the range from the pixel position of the unit area UA to the other end of the unit area UA when all the deviation evaluation values of RGB become below the threshold value th1 and all the difference evaluation values of RGB become below the threshold value th2 UN2.

其後,如圖15(a)中陰影所示,將圖7之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB中由位於圖14(a)、(b)之無用範圍UN1之部分所示之平均像素值進行修正。具體而言,與圖10(a)之例同樣地,基於與無用範圍UN1相鄰之1圖案週期量之RGB之平均像素值,推定無用範圍UN1中應算出之RGB之理想平均像素值。又,決定推動結果作為位於無用範圍UN1之複數個單位區域UA之RGB之平均像素值。藉此,如圖15(b)所示,修正R平均像素值線RR、G平均像素值線RG及B平均像素值線RB。Thereafter, as shown by hatching in FIG. 15(a), the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB of FIG. 7 are located in FIG. 14(a), (b). The average pixel value shown in the part of the useless range UN1 is corrected. Specifically, as in the example of FIG. 10( a ), based on the average pixel value of RGB of one pattern period adjacent to the unnecessary range UN1, the ideal average pixel value of RGB to be calculated in the unnecessary range UN1 is estimated. Furthermore, the result of the determination is determined as the average pixel value of RGB in the plural unit areas UA located in the useless range UN1. As a result, as shown in FIG. 15(b), the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB are corrected.

其後,如圖15(c)中陰影所示,將圖7之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB中由位於圖14(c)、(d)之無用範圍UN2之部分所示之平均像素值進行修正。具體而言,與圖10(c)之例同樣地,基於與無用範圍UN2之部分相鄰之1圖案週期量之RGB之平均像素值,推定無用範圍UN2中應算出之RGB之理想平均像素值。又,決定推定結果作為位於無用範圍UN2之複數個單位區域UA之RGB之平均像素值。藉此,如圖15(d)所示,修正R平均像素值線RR、G平均像素值線RG及B平均像素值線RB。圖16係顯示基於推定結果,兩端部經修正之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB全體。Thereafter, as shown by hatching in FIG. 15(c), the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB of FIG. 7 are located in FIGS. 14(c) and (d). The average pixel value shown in the part of the useless range UN2 is corrected. Specifically, as in the example of FIG. 10(c), based on the average pixel value of RGB of one pattern period adjacent to the part of the useless range UN2, the ideal average pixel value of RGB to be calculated in the useless range UN2 is estimated . Furthermore, the estimation result is determined as the average pixel value of RGB in the plural unit areas UA located in the useless range UN2. Thereby, as shown in FIG. 15(d), the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB are corrected. FIG. 16 shows the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB corrected at both ends based on the estimation result.

接著,針對由兩端部經修正之圖16之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB之各者所示之RGB之平均像素值,與圖9之例同樣地,進行利用移動中值法之平滑化處理。藉此,適當減低因膜之圖案所致的平均像素值之波動。另,此處,亦可取代移動中值法,進行利用移動平均法之平滑化處理。Next, for the average pixel value of RGB shown in each of the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB of FIG. 16 modified from both ends, as in the example of FIG. 9 Similarly, smoothing processing using the moving median method is performed. In this way, the fluctuation of the average pixel value caused by the pattern of the film is appropriately reduced. In addition, here, instead of the moving median method, smoothing processing using the moving average method may be performed.

圖17中,藉由圖16之R平均像素值線RR平滑化所得之第2的R基準曲線R2係以一點鏈線表示,藉由圖16之G平均像素值線RG平滑化所得之第2的G基準曲線G2係以點線表示,藉由圖16之平均像素值線RB平滑化所得之第2的B基準曲線B2係以實線表示。In FIG. 17, the second R reference curve R2 smoothed by the R average pixel value line RR of FIG. 16 is represented by a dotted line, and the second R reference curve smoothed by the G average pixel value line RG of FIG. 16 The G reference curve G2 is represented by a dotted line, and the second B reference curve B2 smoothed by the average pixel value line RB of FIG. 16 is represented by a solid line.

此處,如圖18中粗實線所示,自對應於X方向之各像素位置之各單位區域UA定義於基板W之圖像上於Y方向延伸之帶狀區域BA。Here, as shown by the thick solid line in FIG. 18, each unit area UA corresponding to each pixel position in the X direction is defined on a band-shaped area BA extending in the Y direction on the image of the substrate W.

接著,將使X方向之第2的R基準曲線R2所示之所有平均像素值與特定基準值一致之修正處理,應用於實際圖像資料之所有R像素值。本例中,將由第2的R基準曲線R2所示之R像素之平均像素值中位於基板W中心之單位區域UA的平均像素值設為基準值Rv。又,針對各單位區域,算出由基準值Rv與第2的R基準曲線R2所示之平均像素值之差量。再者,對自各單位區域UA向Y方向延伸之帶狀區域BA內之各像素之R像素值,加上對應於該單位區域UA之差量。關於該修正處理,使用X方向及Y方向之軸所規定之平面座標系,將基板W之圖像上之任意像素之R像素值記作R(x,y) ,將對應於該像素之X方向之像素位置之第2的R基準曲線R2上之平均像素值記作Rx 之情形時,修正後之R像素值R'(x,y) 可以下述式(4)表示。 R'(x,y) =R(x,y) -Rx +Rv…(4)Next, a correction process that matches all the average pixel values shown in the second R reference curve R2 in the X direction with the specific reference value is applied to all R pixel values of the actual image data. In this example, the average pixel value of the unit area UA located at the center of the substrate W among the average pixel values of the R pixels shown by the second R reference curve R2 is set as the reference value Rv. Further, for each unit area, the difference between the reference value Rv and the average pixel value indicated by the second R reference curve R2 is calculated. Furthermore, the difference between the R pixel value of each pixel in the band-shaped area BA extending from each unit area UA in the Y direction is added to the unit area UA. Regarding this correction process, using the plane coordinate system defined by the axes in the X direction and the Y direction, the R pixel value of any pixel on the image of the substrate W is denoted as R (x, y) , which corresponds to the X of the pixel When the average pixel value on the second R reference curve R2 of the pixel position in the direction is recorded as R x , the corrected R pixel value R′ (x, y) can be expressed by the following formula (4). R' (x,y) = R (x,y) -R x + Rv…(4)

又,對於實際圖像資料之所有G像素值,亦進行與對上述R像素值之修正處理相同之修正處理。本例中,將由第2的G基準曲線G2所示之G像素之平均像素值中位於基板W中心之單位區域UA之平均像素值設為基準值Gv。關於該修正處理,將基板W之圖像上之任意像素之G像素值記作G(x,y) ,將對應於該像素之X方向之像素位置之第2的G基準曲線G2上之平均像素值記作Gx 之情形時,修正後之G像素值G'(x,y) 可以下述式(5)表示。 G'(x,y) =G(x,y) -Gx +Gv…(5)In addition, for all the G pixel values of the actual image data, the same correction process as that for the R pixel value described above is also performed. In this example, the average pixel value of the unit area UA located at the center of the substrate W among the average pixel values of the G pixels shown by the second G reference curve G2 is set as the reference value Gv. Regarding this correction process, the G pixel value of any pixel on the image of the substrate W is denoted as G (x, y) , and the average value on the second G reference curve G2 corresponding to the pixel position in the X direction of the pixel When the pixel value is written as G x , the corrected G pixel value G′ (x, y) can be expressed by the following formula (5). G' (x,y) = G (x,y) -G x +Gv…(5)

再者,對於實際圖像資料之所有B像素值,亦進行與對上述R像素值之修正處理相同之修正處理。本例中,將由第2的B基準曲線B2所示之B像素之平均像素值中位於基板W中心之單位區域UA之平均像素值設為基準值Bv 。關於該修正處理,將基板W之圖像上之任意像素之B像素值記作B(x,y) ,將對應於該像素之X方向之像素位置之第2的B基準曲線B2上之平均像素值記作Bx 之情形時,修正後之B像素值B'(x,y) 可以下述式(6)表示。 B'(x,y) =B(x,y) -Bx +Bv …(6)Furthermore, for all the B pixel values of the actual image data, the same correction process as that for the above R pixel value is also performed. In this example, the average pixel value of the unit area UA located at the center of the substrate W among the average pixel values of the B pixels shown by the second B reference curve B2 is set as the reference value B v . Regarding this correction process, the B pixel value of any pixel on the image of the substrate W is denoted as B (x, y) , and the average on the second B reference curve B2 corresponding to the pixel position in the X direction of the pixel When the pixel value is recorded as B x , the corrected B pixel value B′ (x, y) can be expressed by the following formula (6). B' (x,y) = B (x,y) -B x +B v …(6)

藉由使用上述式(4)、(5)、(6)對實際圖像資料之所有像素進行修正,產生顯示用圖像資料。藉此,由顯示用圖像資料表示之圖像中,左右方向之基板W之一面上之複數個帶狀區域BA之平均顏色相等或大致相等。By using the above formulas (4), (5), (6) to correct all pixels of the actual image data, display image data is generated. As a result, in the image represented by the image data for display, the average colors of the plurality of band-shaped areas BA on one surface of the substrate W in the left-right direction are equal or approximately equal.

(4)基板檢查裝置200之控制系統 圖19係顯示第1實施形態之基板檢查裝置200之控制系統之方塊圖。控制裝置400係藉由CPU(中央運算處理裝置)、RAM(隨機存取記憶體)及ROM(唯讀記憶體)構成,如圖19所示,具有控制部401、圖像產生部402、判定部403、圖像判定記憶部404及顯示用圖像資料產生部405。控制裝置400中,藉由CPU執行記憶於ROM或其他記憶媒體之電腦程式,實現上述各功能部。另,控制裝置400之功能構成要素之一部分或全部亦可藉由電子電路等硬體實現。(4) Control system of substrate inspection apparatus 200 FIG. 19 is a block diagram showing a control system of the substrate inspection apparatus 200 of the first embodiment. The control device 400 is composed of a CPU (Central Processing Unit), RAM (Random Access Memory) and ROM (Read Only Memory). As shown in FIG. 19, it has a control unit 401, an image generation unit 402, and The unit 403, the image determination memory unit 404, and the display image data generation unit 405. In the control device 400, the CPU executes a computer program stored in a ROM or other storage medium to realize the above-mentioned functional units. In addition, some or all of the functional components of the control device 400 can also be implemented by hardware such as electronic circuits.

關於基板保持裝置250及切痕檢測部270,控制部401自基板保持裝置250之驅動裝置251(圖2)之編碼器取得輸出信號,檢測驅動裝置251之旋轉角度(基板W之旋轉角度),且取得切痕檢測部270之切痕檢測結果。控制部401基於檢測出切痕時之驅動裝置251之旋轉角度,判定基板W之朝向,基於判定結果,控制基板保持裝置250之動作。Regarding the substrate holding device 250 and the cut detection unit 270, the control unit 401 obtains an output signal from the encoder of the driving device 251 (FIG. 2) of the substrate holding device 250, detects the rotation angle of the driving device 251 (the rotation angle of the substrate W), And the result of the cut detection by the cut detection unit 270 is obtained. The control unit 401 determines the direction of the substrate W based on the rotation angle of the drive device 251 when the cut is detected, and controls the operation of the substrate holding device 250 based on the determination result.

關於投光部220、移動部260及攝像部240,控制部401以拍攝保持於基板保持裝置250之基板W之一面全體之方式,控制投光部220、移動部260及攝像部240。Regarding the light projecting unit 220, the moving unit 260, and the imaging unit 240, the control unit 401 controls the light projecting unit 220, the moving unit 260, and the imaging unit 240 so as to capture the entire surface of the substrate W held on the substrate holding device 250.

圖像產生部402基於自攝像部240輸出之複數個像素資料,產生表示基板W之一面上之全體圖像之圖像資料。判定部403基於圖像產生部402中產生之圖像資料,自動判定基板W之一面上之表面狀態之缺陷有無。圖像判定記憶部404記憶利用判定部403之缺陷有無之自動判定結果。The image generation unit 402 generates image data representing the entire image on one surface of the substrate W based on the plurality of pixel data output from the imaging unit 240. The determination unit 403 automatically determines whether or not there is a defect in the surface state on one surface of the substrate W based on the image data generated in the image generation unit 402. The image determination memory unit 404 memorizes the automatic determination result of the presence or absence of a defect in the use determination unit 403.

顯示用圖像資料產生部405將圖像產生部402中產生之圖像資料設為上述實際圖像資料,基於實際圖像資料產生表示應顯示於顯示部280之圖像之顯示用圖像資料。The display image data generating unit 405 sets the image data generated in the image generating unit 402 as the above-mentioned actual image data, and generates display image data indicating the image to be displayed on the display unit 280 based on the actual image data .

更具體而言,顯示用圖像資料產生部405包含平滑化部411及修正部412。平滑化部411針對基於實際圖像資料之圖像上排列於X方向之複數個單位區域UA(圖6)之各者,算出構成該單位區域UA之複數個像素之平均像素值。又,平滑化部411對複數個單位區域UA之平均像素值進行平滑化處理。More specifically, the display image data generation unit 405 includes a smoothing unit 411 and a correction unit 412. The smoothing unit 411 calculates the average pixel value of the plurality of pixels constituting the unit area UA for each of the plurality of unit areas UA (FIG. 6) arranged in the X direction on the image based on the actual image data. Moreover, the smoothing unit 411 smoothes the average pixel value of the plurality of unit areas UA.

另,平滑化部411亦可針對位於基板W之兩端部之複數個單位區域UA之各者,藉由對其他複數個單位區域UA算出之平均像素值,來推定應算出之理想平均像素值,基於推定結果,決定位於基板W之兩端部之複數個單位區域UA之平均像素值。In addition, the smoothing unit 411 may also estimate the ideal average pixel value to be calculated for each of the plurality of unit regions UA located at both ends of the substrate W by calculating the average pixel value for the other plurality of unit regions UA Based on the estimation result, the average pixel value of the plurality of unit areas UA located at both ends of the substrate W is determined.

修正部412算出位於基板W之中心之單位區域UA之平滑化後之平均像素值、與各單位區域UA之平滑化後之平均像素值之差量。又,修正部412以將自各單位區域UA向Y方向延伸之帶狀區域BA(圖18)內之各像素值,加上對應於該單位區域UA之差量之方式,修正實際圖像資料。藉此,產生顯示用圖像資料。The correction unit 412 calculates the difference between the smoothed average pixel value of the unit area UA located at the center of the substrate W and the smoothed average pixel value of each unit area UA. Furthermore, the correction unit 412 corrects the actual image data by adding each pixel value in the band-shaped area BA (FIG. 18) extending from each unit area UA in the Y direction to the difference corresponding to the unit area UA. By this, image data for display is generated.

圖像判定記憶部404進而記憶由顯示用圖像資料產生部405產生之顯示用圖像資料。基於記憶於圖像判定記憶部404之自動判定結果及顯示用圖像資料,將圖像顯示於顯示部280。The image determination storage unit 404 further stores the display image data generated by the display image data generation unit 405. The image is displayed on the display unit 280 based on the automatic determination result stored in the image determination memory unit 404 and the image data for display.

(5)缺陷判定處理 如上述,基板檢查裝置200中,藉由圖1之控制裝置400自動判定基板W之一面上之表面狀態之缺陷有無,且為了目視檢查而對使用者顯示表示基板W之一面之圖像。將該等一連串處理稱為缺陷判定處理。圖20係第1實施形態之缺陷判定處理之流程圖。此處,將應檢查之基板W稱為檢查基板W。(5) Defect determination process As described above, in the substrate inspection device 200, the control device 400 of FIG. 1 automatically determines the presence or absence of defects on the surface state of one surface of the substrate W, and displays the information indicating the substrate W to the user for visual inspection An image of one side. This series of processing is called defect determination processing. FIG. 20 is a flowchart of the defect determination process in the first embodiment. Here, the substrate W to be inspected is referred to as an inspection substrate W.

於缺陷判定處理開始前,預先以高精度進行檢查,準備於該檢查中判定為無缺陷之基板作為樣本基板。圖19之控制部401及圖像產生部402首先藉由拍攝無缺陷之樣本基板,產生表示樣本基板之一面之圖像資料(步驟S11)。Before starting the defect determination process, an inspection is performed with high accuracy in advance, and a substrate determined to be defect-free during the inspection is prepared as a sample substrate. The control unit 401 and the image generation unit 402 of FIG. 19 first generate image data representing one surface of the sample substrate by photographing the sample substrate without defects (step S11).

接著,控制部401及圖像產生部402藉由拍攝檢查基板W,產生表示檢查基板W之一面之圖像資料(步驟S12)。又,圖19之判定部403基於樣本基板之圖像資料及檢查基板W之圖像資料,自動判定檢查基板W之表面狀態之缺陷有無(步驟S13)。圖19之圖像判定記憶部404記憶自動判定結果(步驟S14)。Next, the control unit 401 and the image generation unit 402 generate image data representing one surface of the inspection substrate W by imaging the inspection substrate W (step S12). Furthermore, the determination unit 403 of FIG. 19 automatically determines whether or not there is a defect in the surface state of the inspection substrate W based on the image data of the sample substrate and the image data of the inspection substrate W (step S13). The image determination memory unit 404 of FIG. 19 stores the automatic determination result (step S14).

接著,圖19之平滑化部411將步驟S12之處理中產生之圖像資料設為實際圖像資料,針對於基於實際圖像資料之圖像上排列於X方向之複數個單位區域UA(圖6)之各者,算出構成該單位區域UA之複數個像素之平均像素值(步驟S15)。又,平滑化部411對複數個單位區域UA之平均像素值進行平滑化處理(步驟S16)。Next, the smoothing unit 411 of FIG. 19 sets the image data generated in the process of step S12 as actual image data, for a plurality of unit areas UA (FIG. 6) Each of them calculates the average pixel value of the plurality of pixels constituting the unit area UA (step S15). Further, the smoothing unit 411 smoothes the average pixel value of the plurality of unit areas UA (step S16).

接著,圖19之修正部412算出位於檢查基板W之中心之單位區域UA之平滑化後之平均像素值與各單位區域UA之平滑化後之平均像素值之差量(步驟S17)。又,修正部412對自各單位區域UA延伸之帶狀區域BA(圖18)內之各像素值加上對應於該單位區域UA之差量(步驟S18)。藉此,產生顯示用圖像資料。圖像判定記憶部404記憶顯示用圖像資料(步驟S19)。Next, the correction unit 412 of FIG. 19 calculates the difference between the smoothed average pixel value of the unit area UA located at the center of the inspection substrate W and the smoothed average pixel value of each unit area UA (step S17). Further, the correction unit 412 adds the difference corresponding to the unit area UA to each pixel value in the strip area BA (FIG. 18) extending from each unit area UA (step S18). By this, image data for display is generated. The image determination storage unit 404 stores the display image data (step S19).

其後,圖像判定記憶部404使基於自動判定結果及顯示用圖像資料之圖像顯示於圖19之顯示部280(步驟S20)。該狀態下,使用者可藉由視認顯示於顯示部280之檢查基板W之圖像,進行檢查基板W之一面之目視檢查。Thereafter, the image determination storage unit 404 causes the image based on the automatic determination result and the display image data to be displayed on the display unit 280 in FIG. 19 (step S20). In this state, the user can perform a visual inspection of one side of the inspection substrate W by viewing the image of the inspection substrate W displayed on the display unit 280.

上述缺陷判定處理中,步驟S13、S14之處理可於步驟S15~S19之處理後進行,亦可與步驟S15~S19之處理同時進行。In the above defect determination processing, the processing of steps S13 and S14 may be performed after the processing of steps S15 to S19, or may be performed simultaneously with the processing of steps S15 to S19.

步驟S13之處理中判定為有缺陷之檢查基板W,或步驟S20之處理中藉由使用者之目視檢查判定為有缺陷之檢查基板W成為精密檢查或再生處理之對象。The inspection substrate W determined to be defective in the process of step S13, or the inspection substrate W determined to be defective by the visual inspection by the user in the process of step S20 becomes an object of precision inspection or regeneration processing.

(6)第1實施形態之效果 (a)第1實施形態之基板檢查裝置200中,藉由拍攝基板W之一面,產生表示基板W之一面之圖像之實際圖像資料。針對設定於基於實際圖像資料之圖像上之複數個單位區域UA之各者,算出構成該單位區域UA之複數個像素之平均值作為平均像素值,對複數個單位區域UA之平均像素值進行平滑化處理。(6) Effect of the first embodiment (a) In the substrate inspection apparatus 200 of the first embodiment, by imaging one side of the substrate W, actual image data representing an image of one side of the substrate W is generated. For each of the plurality of unit areas UA set on the image based on the actual image data, the average value of the plurality of pixels constituting the unit area UA is calculated as the average pixel value, and the average pixel value of the plurality of unit areas UA Perform smoothing.

算出位於基板W中心之單位區域UA之平滑化後之平均像素值與各單位區域UA之平滑化處理後之平均像素值之差量。對自各單位區域UA向Y方向平行延伸之帶狀區域BA內之各像素值加上對應於該單位區域UA之差量。藉此,基於顯示用圖像資料之圖像中,各帶狀區域BA內之複數個像素之平均值與位於基板W之中心之單位區域UA之平均像素值相等或大致相等。因此,基於顯示用圖像資料之圖像中,抑制視認為X方向之基板W之一面的複數個部分之平均顏色不同。其結果,使用基於顯示用圖像資料之圖像的目視檢查中,可容易且正確地判定基板W之表面狀態之缺陷有無。The difference between the smoothed average pixel value of the unit area UA located at the center of the substrate W and the smoothed average pixel value of each unit area UA is calculated. A difference corresponding to the unit area UA is added to each pixel value in the strip-shaped area BA extending parallel to the Y direction from each unit area UA. As a result, in the image based on the image data for display, the average value of the plurality of pixels in each band-shaped area BA is equal to or approximately equal to the average pixel value of the unit area UA located at the center of the substrate W. Therefore, in the image based on the image data for display, the average color of the plural portions of one surface of the substrate W that is regarded as the X direction is suppressed. As a result, in the visual inspection using the image based on the image data for display, the presence or absence of defects in the surface state of the substrate W can be easily and accurately determined.

(b)本實施形態中,對針對各單位區域UA算出之平均像素值,進行利用移動中值法之平滑化處理。又,基於平滑化後之平均像素值修正實際圖像資料,產生顯示用圖像資料。該情形時,藉由利用移動中值法之平滑化處理,適當地減低局部平均像素值之波動。(b) In this embodiment, the average pixel value calculated for each unit area UA is smoothed by the moving median method. In addition, the actual image data is corrected based on the smoothed average pixel value to generate image data for display. In this case, by using the smoothing process of the moving median method, the fluctuation of the local average pixel value is appropriately reduced.

(c)本實施形態中,針對構成1個像素之R像素、G像素及B像素之每個種類,進行平均像素值之算出處理、平均像素值之平滑化處理及實際圖像資料之修正處理。藉此,抑制視認為於基於顯示用圖像資料之圖像上,以基板W之一面的X方向之複數個部分的平均色相不同。(c) In this embodiment, for each type of R pixel, G pixel, and B pixel constituting one pixel, an average pixel value calculation process, an average pixel value smoothing process, and actual image data correction process are performed . Thereby, it is suppressed that the average hue of the plural portions in the X direction of one surface of the substrate W is regarded as an image based on the image data for display.

(d)本實施形態中,位於基於實際圖像資料之圖像上的基板W之兩端部之複數個單位區域UA之理想平均像素值,係基於位於隣接於該兩端部之部分的複數個單位區域UA之平均像素值推定。決定推定結果作為分別對應於位於各端部之複數個單位區域UA之複數個平均像素值。藉此,基於針對各單位區域UA決定之平均像素值,產生顯示用圖像資料。其結果,抑制視認為基於顯示用圖像資料之圖像中以基板W之兩端部之平均顏色與隣接於兩端部之部分的平均顏色大幅不同。(d) In the present embodiment, the ideal average pixel value of the plurality of unit areas UA at both ends of the substrate W located on the image based on the actual image data is based on the complex number at the portions adjacent to the two ends The average pixel value of each unit area UA is estimated. The estimation result is determined as a plurality of average pixel values respectively corresponding to a plurality of unit areas UA located at each end. With this, based on the average pixel value determined for each unit area UA, image data for display is generated. As a result, it is suppressed that the image based on the image data for display shows that the average color of both ends of the substrate W and the average color of the portions adjacent to both ends are significantly different.

(e)本實施形態之基板檢查裝置200中,藉由投光部220、反射部230及攝像部240與基板保持裝置250之相對移動,產生表示基板W之一面的全體圖像之圖像資料。因此,抑制攝像部240之大型化。(e) In the substrate inspection apparatus 200 of the present embodiment, by the relative movement of the light projecting section 220, the reflecting section 230, the imaging section 240, and the substrate holding device 250, image data representing the entire image of one surface of the substrate W is generated . Therefore, the enlargement of the imaging unit 240 is suppressed.

[2]第2實施形態 第2實施形態之基板檢查裝置具有與第1實施形態之圖1之基板檢查裝置200基本相同之構成。本實施形態之基板檢查裝置200中,圖像顯示用資料之產生方法與第1實施形態之圖像顯示用資料之產生方法不同。[2] Second Embodiment The substrate inspection apparatus of the second embodiment has substantially the same configuration as the substrate inspection apparatus 200 of FIG. 1 of the first embodiment. In the substrate inspection apparatus 200 of this embodiment, the method of generating data for image display is different from the method of generating data for image display of the first embodiment.

(1)第2實施形態之圖像顯示用資料之產生方法 圖21~圖24係用以說明第2實施形態之圖像顯示用資料之產生方法之圖。首先,以與第1實施形態之圖像顯示用資料之產生方法相同之順序,算出由圖16之R平均像素值線RR、G平均像素值線RG及B平均像素值線RB表示之RGB平均像素值。(1) Method for generating data for image display in the second embodiment FIG. 21 to FIG. 24 are diagrams for explaining the method for generating data for image display in the second embodiment. First, the RGB average represented by the R average pixel value line RR, the G average pixel value line RG, and the B average pixel value line RB of FIG. 16 is calculated in the same order as the method for generating the image display data of the first embodiment. Pixel values.

又,藉由對算出之RGB平均像素值進行利用移動中值法之平滑化處理,算出由圖17之第2的R基準曲線R2、第2的G基準曲線G2及第2的B基準曲線B2表示之平滑化後之RGB平均像素值。Furthermore, by performing smoothing processing using the moving median method on the calculated RGB average pixel value, the second R reference curve R2, the second G reference curve G2, and the second B reference curve B2 of FIG. 17 are calculated. Represents the average RGB pixel value after smoothing.

接著,針對各單位區域UA,算出由圖16之R平均像素值線RR表示之平滑化前之平均像素值與由圖17之第2的R基準曲線R2表示之平滑化後之平均像素值之差量,作為R像素之偏差評估值。又,針對各單位區域UA,算出由圖16之G平均像素值線RG表示之平滑化前之平均像素值與由圖17之第2的G基準曲線G2表示之平滑化後之平均像素值之差量,作為G像素之偏差評價值。再者,針對各單位區域UA,算出由圖16之B平均像素值線RB表示之平滑化前之平均像素值與由圖17之第2的B基準曲線B2表示之平滑化後之平均像素值之差量,作為B像素之偏差評估值。圖21係分別以一點鏈線、點線及實線表示所算出之R像素、G像素及B像素之偏差評估值。Next, for each unit area UA, the average pixel value before smoothing represented by the R average pixel value line RR in FIG. 16 and the average pixel value after smoothing represented by the second R reference curve R2 in FIG. 17 are calculated. The difference is used as the deviation evaluation value of R pixels. Also, for each unit area UA, the average pixel value before smoothing indicated by the G average pixel value line RG in FIG. 16 and the average pixel value after smoothing indicated by the second G reference curve G2 in FIG. 17 are calculated. The difference is taken as the deviation evaluation value of G pixels. Furthermore, for each unit area UA, the average pixel value before smoothing indicated by the B average pixel value line RB in FIG. 16 and the average pixel value after smoothing indicated by the second B reference curve B2 in FIG. 17 are calculated The difference is used as the deviation evaluation value of B pixels. Fig. 21 shows the calculated deviation evaluation values of the R pixel, G pixel, and B pixel with a dotted chain line, a dotted line, and a solid line, respectively.

接著,針對圖21所示之RGB之偏差評估值之各者,進行利用移動最大法之平滑化處理。具體而言,針對各單位區域UA,於該單位區域UA之一方(左方)以1圖案週期量,及於該單位區域UA之另一方(右方)以1圖案週期量算出寬度移動最大值。如此,以對圖案週期之2倍值加上「1」之寬度,算出X方向之移動最大值。藉此,適當減低因膜之圖案所致的移動最大值之波動。將藉由該平滑化處理算出之移動最大值稱為偏差最大值。Next, for each of the deviation evaluation values of RGB shown in FIG. 21, smoothing processing by the moving maximum method is performed. Specifically, for each unit area UA, one width of the unit area UA (left) is calculated by 1 pattern period, and the other area of the unit area UA (right) is calculated by 1 pattern period. . In this way, the maximum value of the movement in the X direction is calculated by adding the width of "1" to the double value of the pattern period. By this, the fluctuation of the maximum movement value due to the pattern of the film is appropriately reduced. The maximum movement value calculated by this smoothing process is called the maximum deviation.

又,針對圖21所示之RGB之偏差評估值之各者,進行利用移動最小法之平滑化處理。具體而言,針對各單位區域UA,於該單位區域UA之一方(左方)以1圖案週期量,及於該單位區域UA之另一方(右方)以1圖案週期量之寬度算出移動最小值。如此,以對圖案週期之2倍值加上「1」之寬度,算出X方向之移動最小值。藉此,適當減低因膜之圖案所致的移動最小值之波動。將藉由該平滑化處理算出之移動最小值稱為偏差最小值。In addition, for each of the RGB deviation evaluation values shown in FIG. 21, smoothing processing by the moving minimum method is performed. Specifically, for each unit area UA, the minimum movement is calculated with one pattern period on one side (left side) of the unit area UA, and with one pattern period width on the other side (right side) of the unit area UA value. In this way, the minimum value of the movement in the X direction is calculated by adding a width of "1" to the double value of the pattern period. With this, the fluctuation of the moving minimum value due to the pattern of the film is appropriately reduced. The minimum movement value calculated by this smoothing process is called the minimum deviation value.

圖22中,對應於R像素之偏差最大值及偏差最小值分別係由一點鏈線RDmax、RDmin表示。又,對應於G像素之偏差最大值及偏差最小值分別係由點線GDmax、GDmin表示。再者,對應於B像素之偏差最大值及偏差最小值分別係由實線BDmax、BDmin表示。In FIG. 22, the maximum deviation value and the minimum deviation value corresponding to the R pixel are represented by one-dot chain lines RDmax and RDmin, respectively. In addition, the maximum deviation and the minimum deviation corresponding to the G pixel are indicated by dotted lines GDmax and GDmin, respectively. In addition, the maximum deviation and the minimum deviation corresponding to the B pixel are indicated by solid lines BDmax and BDmin, respectively.

接著,針對圖22所示之RGB之偏差最大值及偏差最小值之各者,進行利用移動平均法之平滑化處理。具體而言,針對各單位區域UA,於該單位區域UA之一方(左方)以1圖案週期量,及於該單位區域UA之另一方(右方)以1圖案週期量之寬度,算出移動平均值。如此,以對圖案週期之2倍值加上「1」之寬度,算出X方向之移動平均值。Next, for each of the maximum and minimum deviations of RGB shown in FIG. 22, smoothing processing by the moving average method is performed. Specifically, for each unit area UA, one unit (left) of the unit area UA is calculated with one pattern period, and the other side (right) of the unit area UA is calculated with a width of one pattern period. average value. In this way, the moving average value in the X direction is calculated by adding a width of "1" to the double value of the pattern period.

圖23中,對應於R像素之平滑化後之偏差最大值及偏差最小值分別係由一點鏈線RDmax、RDmin表示。又,對應於G像素之平滑化後之偏差最大值及偏差最小值分別係由點線GDmax、GDmin表示。再者,對應於B像素之平滑化後之偏差最大值及偏差最小值分別係由實線BDmax、BDmin表示。In FIG. 23, the maximum deviation and the minimum deviation after smoothing corresponding to the R pixels are represented by one-dot chain lines RDmax and RDmin, respectively. In addition, the smoothed maximum deviation and minimum deviation corresponding to the G pixel are indicated by dotted lines GDmax and GDmin, respectively. In addition, the smoothed maximum and minimum deviations corresponding to B pixels are represented by solid lines BDmax and BDmin, respectively.

接著,針對各單位區域UA,算出由圖17之第2的R基準曲線R2表示之平均像素值與由圖23之一點鏈線RDmax表示之偏差最大值之相加值,作為對應於R像素之差量最大值。又,針對各單位區域UA,算出由圖17之第2的R基準曲線R2表示之平均像素值與由圖23之一點鏈線RDmin表示之偏差最大值之相加值,作為對應於R像素之差量最小值。又,對於G像素及B像素,亦與R像素之例同樣地,針對各單位區域UA,算出差量最大值及差量最小值。Next, for each unit area UA, the sum of the average pixel value represented by the second R reference curve R2 in FIG. 17 and the maximum deviation value represented by a dotted line RDmax in FIG. 23 is calculated as the value corresponding to the R pixel. Maximum difference. Further, for each unit area UA, the sum of the average pixel value represented by the second R reference curve R2 in FIG. 17 and the maximum deviation value represented by a dotted line RDmin in FIG. 23 is calculated as the value corresponding to the R pixel. The minimum difference. In addition, for the G pixel and the B pixel, as in the example of the R pixel, for each unit area UA, the maximum difference value and the minimum difference value are calculated.

圖24中,對應於R像素之差量最大值及差量最小值分別係由一點鏈線R3max、R3min表示。又,對應於G像素之差量最大值及差量最小值分別係由點線G3max、G3min表示。再者,對應於B像素之差量最大值及差量最小值分別係由實線B3max、B3min表示。In FIG. 24, the maximum difference value and the minimum difference value corresponding to the R pixels are represented by one-dot chain lines R3max and R3min, respectively. In addition, the maximum value and minimum value of the difference corresponding to the G pixel are indicated by dotted lines G3max and G3min, respectively. Furthermore, the maximum value and minimum value of the difference corresponding to the B pixel are respectively indicated by solid lines B3max and B3min.

接著,針對RGB像素之各者,決定對預先規定之單位區域UA算出之差量最小值至差量最大值之範圍,作為基準範圍。本例中,決定對應於位於基板W中心之單位區域UA之差量最小值至差量最大值之範圍,作為基準範圍。又,以使對應於各單位區域UA之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域UA向Y方向延伸之帶狀區域BA內之各像素值適合於修正後之範圍之方式進行修正。Next, for each of the RGB pixels, a range from the minimum value of the difference calculated to the predetermined unit area UA to the maximum value of the difference is determined as a reference range. In this example, the range from the minimum difference to the maximum difference corresponding to the unit area UA located at the center of the substrate W is determined as the reference range. Furthermore, the correction is made so that the range corresponding to the minimum value of the difference between each unit area UA and the maximum value of the difference coincides with the reference range, and each of the band-shaped areas BA extending from each unit area UA in the Y direction The pixel value is corrected in a manner suitable for the corrected range.

關於該修正處理,使用X方向及Y方向之軸所規定之平面座標系,將基板W之圖像上之任意像素之R像素值記作R(x,y) ,將對應於該像素之X方向之像素位置之圖24之一點鏈線R3max、R3min上之差量最大值及差量最小值記作maxRx 、minRx ,將對應於位於基板W中心之單位區域UA之R像素之差量最大值及差量最小值分別記作maxRv、minRv之情形時,修正後之R像素之值R'(x,y) 可以下述式(7)表示。 R'(x,y) ={(R(x,y) -minRx )÷(maxRx -minRx )}×(maxRv-minRv)+minRv…(7)Regarding this correction process, using the plane coordinate system defined by the axes in the X direction and the Y direction, the R pixel value of any pixel on the image of the substrate W is denoted as R (x, y) , which corresponds to the X of the pixel The maximum and minimum value of the difference on the chain line R3max and R3min of one of the dots in Figure 24 in the direction of the pixel position are recorded as maxR x and minR x , which will correspond to the difference of the R pixels of the unit area UA located in the center of the substrate W When the maximum value and the minimum value of the difference are respectively recorded as maxRv and minRv, the corrected value R′ (x, y) of the R pixel can be expressed by the following formula (7). R' (x,y) = {(R (x,y) -minR x )÷(maxR x -minR x )}×(maxRv-minRv)+minRv…(7)

又,將基板W之圖像上之任意像素之G像素值記作G(x,y) ,將對應於該像素之X方向之像素位置之圖24之點線G3max、G3min上之差量最大值及差量最小值記作maxGx 、minGx ,將對應於位於基板W中心之單位區域UA之G像素之差量最大值及差量最小值分別記作maxGv、minGv之情形時,修正後之G像素之值G'(x,y) 可以下述式(8)表示。 G'(x,y) ={(G(x,y) -minGx )÷(maxGx -minGx )}×(maxGv-minGv)+minGv…(8)Also, the G pixel value of any pixel on the image of the substrate W is denoted as G (x, y) , and the difference between the dotted lines G3max and G3min in FIG. 24 corresponding to the pixel position of the pixel in the X direction is the largest The value and the minimum value of the difference are denoted as maxG x and minG x . When the maximum value and the minimum value of the difference of the G pixels corresponding to the unit area UA located in the center of the substrate W are respectively recorded as maxGv and minGv, after correction The value G' (x, y) of the G pixel can be expressed by the following formula (8). G' (x,y) = {(G (x,y) -minG x )÷(maxG x -minG x )}×(maxGv-minGv)+minGv…(8)

再者,將基板W之圖像上之任意像素之B像素值記作B(x,y) ,將對應於該像素之X方向之像素位置之圖24之實線B3max、B3min上之差量最大值及差量最小值記作maxBx 、minBx ,將對應於位於基板W中心之單位區域UA之B像素之差量最大值及差量最小值分別記作maxBv、minBv之情形時,修正後之B像素之值B'(x,y) 可以下述式(9)表示。 B'(x,y) ={(B(x,y) -minBx )÷(maxBx -minBx )}×(maxBv-minBv)+minBv…(9)Furthermore, the B pixel value of any pixel on the image of the substrate W is denoted as B (x, y) , and the difference between the solid lines B3max and B3min of FIG. 24 corresponding to the pixel position in the X direction of the pixel in FIG. 24 The maximum value and the minimum value of the difference are recorded as maxB x and minB x . When the maximum value and the minimum value of the difference corresponding to the B pixel of the unit area UA located in the center of the substrate W are respectively recorded as maxBv and minBv, the correction The value B' (x, y) of the following B pixel can be expressed by the following formula (9). B' (x,y) = {(B (x,y) -minB x )÷(maxB x -minB x )}×(maxBv-minBv)+minBv…(9)

藉由使用上述式(7)、(8)、(9)對實際圖像資料之所有像素進行修正,產生顯示用圖像資料。藉此,由顯示用圖像資料表示之圖像中,左右方向之基板W之一面上之複數個帶狀區域BA之平均顏色相等或大致相等。By using the above equations (7), (8), (9) to correct all pixels of the actual image data, image data for display is generated. As a result, in the image represented by the image data for display, the average colors of the plurality of band-shaped areas BA on one surface of the substrate W in the left-right direction are equal or approximately equal.

(2)基板檢查裝置200之控制系統 第2實施形態之基板檢查裝置200之控制系統除了顯示用圖像資料產生部405之功能構成外,具有與圖19之例相同之構成。圖25係顯示第2實施形態之顯示用圖像資料產生部405之功能構成之方塊圖。(2) Control system of substrate inspection apparatus 200 The control system of the substrate inspection apparatus 200 of the second embodiment has the same configuration as the example of FIG. 19 except for the functional configuration of the display image data generating section 405. FIG. 25 is a block diagram showing the functional configuration of the display image data generating section 405 of the second embodiment.

如圖25所示,第2形態之顯示用圖像資料產生部405包含平滑化部421、偏差算出部422、偏差最大值算出部423、偏差最小值算出部424、差量最大值算出部425、差量最小值算出部426、基準範圍決定部427及修正部428。As shown in FIG. 25, the display image data generation unit 405 of the second aspect includes a smoothing unit 421, a deviation calculation unit 422, a deviation maximum value calculation unit 423, a deviation minimum value calculation unit 424, and a difference maximum value calculation unit 425 , The minimum difference calculation unit 426, the reference range determination unit 427, and the correction unit 428.

平滑化部421與第1實施形態之圖19之平滑化部411同樣地,針對於基於實際圖像資料之圖像上排列於X方向之複數個單位區域UA(圖6)之各者,算出複數個像素之平均像素值。又,平滑化部421對複數個單位區域UA之平均像素值進行利用移動中值法之平滑化處理。The smoothing unit 421, like the smoothing unit 411 of FIG. 19 of the first embodiment, calculates for each of a plurality of unit regions UA (FIG. 6) arranged in the X direction on an image based on actual image data The average pixel value of multiple pixels. Further, the smoothing unit 421 performs smoothing processing using the moving median method on the average pixel values of the plurality of unit areas UA.

另,平滑化部421亦可與平滑化部411同樣地,推定位於基板W之兩端部之複數個單位區域UA之理想平均像素值,基於推定結果決定位於基板W之兩端部之複數個單位區域UA之平均像素值。In addition, the smoothing unit 421 may estimate the ideal average pixel value of the plurality of unit areas UA positioned at both ends of the substrate W, and determine the plurality of plural pixels located at both ends of the substrate W based on the estimation result, similar to the smoothing unit 411 The average pixel value of the unit area UA.

偏差算出部422算出各單位區域UA之平滑化前之平均像素值與平滑化後之平均像素值之差量,作為偏差評估值。偏差最大值算出部423藉由對各單位區域UA之偏差評估值進行利用移動最大法之平滑化處理,而對各單位區域UA算出偏差最大值。偏差最小值算出部424藉由對各單位區域UA之偏差評估值進行利用移動最小法之平滑化處理,而對各單位區域UA算出偏差最小值。The deviation calculation unit 422 calculates the difference between the average pixel value before smoothing and the average pixel value after smoothing of each unit area UA as a deviation evaluation value. The maximum deviation calculation unit 423 calculates the maximum deviation for each unit area UA by performing a smoothing process using the moving maximum method on the deviation evaluation value of each unit area UA. The deviation minimum value calculation unit 424 calculates the minimum deviation value for each unit area UA by performing a smoothing process using the moving minimum method on the deviation evaluation value of each unit area UA.

另,偏差最大值算出部423亦可對針對複數個單位區域UA算出之偏差最大值,進行利用移動平均法之平滑化處理。又,偏差最小值算出部424亦可對針對複數個單位區域UA算出之偏差最小值,進行利用移動平均法之平滑化處理。In addition, the maximum deviation calculation unit 423 may perform smoothing processing using the moving average method on the maximum deviation calculated for the plurality of unit areas UA. Furthermore, the minimum deviation calculation unit 424 may perform smoothing processing using the moving average method on the minimum deviation calculated for the plurality of unit areas UA.

差量最大值算出部425針對各單位區域UA算出利用移動中值法之平滑化後之平均像素值與偏差最大值之相加值,作為差量最大值。差量最小值算出部426針對各單位區域UA算出利用移動中值法之平滑化後之平均像素值與偏差最小值之相加值,作為差量最小值。基準範圍決定部427決定對位於基板W中心之單位區域UA算出之差量最小值至差量最大值之範圍,作為基準範圍。The difference maximum value calculation unit 425 calculates the sum of the average pixel value smoothed by the moving median method and the maximum deviation value for each unit area UA as the maximum difference value. The difference minimum value calculation unit 426 calculates the sum of the average pixel value smoothed by the moving median method and the minimum deviation value for each unit area UA as the minimum difference value. The reference range determining unit 427 determines the range of the minimum difference to the maximum difference calculated for the unit area UA located at the center of the substrate W as the reference range.

修正部428以使對應於各單位區域UA之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域UA向Y方向延伸之帶狀區域BA(圖18)內之各像素值適合於修正後之範圍之方式進行修正。藉此,產生顯示用圖像資料。The correction unit 428 corrects the range corresponding to each unit area UA from the minimum difference value to the maximum difference value to match the reference range, and makes the band-shaped area BA extending from each unit area UA in the Y direction (FIG. 18) Each pixel value in the correction is adapted to the corrected range. By this, image data for display is generated.

(3)缺陷判定處理 第2實施形態之缺陷判定處理中,用以產生顯示用圖像資料之處理與第1實施形態之缺陷判定處理不同。圖26係第2實施形態之缺陷判定處理之流程圖。以下之說明中,將圖20所示之第1實施形態之缺陷判定處理中步驟S11~S14之一連串處理稱為自動判定處理。又,此處,將應檢查之基板W稱為檢查基板W。(3) Defect determination process In the defect determination process of the second embodiment, the process for generating display image data is different from the defect determination process of the first embodiment. Fig. 26 is a flowchart of defect determination processing in the second embodiment. In the following description, one of the series of steps S11 to S14 in the defect determination process of the first embodiment shown in FIG. 20 is called an automatic determination process. In addition, here, the substrate W to be inspected is referred to as an inspection substrate W.

如圖26所示,若開始缺陷判定處理,則圖19之控制部401、圖像產生部402、判定部403及圖像判定記憶部404進行自動判定處理(步驟S20)。接著,圖25之平滑化部421將自動判定處理中產生之檢查基板W之圖像資料設為實際圖像資料,針對於基於實際圖像資料之圖像上排列於X方向之複數個單位區域UA(圖6)之各者,算出構成該單位區域UA之複數個像素之平均像素值(步驟S21)。又,平滑化部421對複數個單位區域UA之平均像素值進行平滑化處理(步驟S22)。As shown in FIG. 26, when the defect determination process is started, the control unit 401, the image generation unit 402, the determination unit 403, and the image determination storage unit 404 of FIG. 19 perform automatic determination processing (step S20). Next, the smoothing unit 421 of FIG. 25 sets the image data of the inspection substrate W generated in the automatic determination process as actual image data, for a plurality of unit areas arranged in the X direction on the image based on the actual image data Each of UA (FIG. 6) calculates the average pixel value of the plurality of pixels constituting the unit area UA (step S21). Further, the smoothing unit 421 smoothes the average pixel value of the plurality of unit areas UA (step S22).

接著,圖25之偏差算出部422對各單位區域UA算出偏差評估值(步驟S23)。又,圖25之偏差最大值算出部423藉由對所算出之偏差評估值進行利用移動最大法之平滑化處理,而對各單位區域UA算出偏差最大值(步驟S24)。再者,圖25之偏差最小值算出部424藉由對所算出之偏差評估值進行利用移動最小法之平滑化處理,而對各單位區域UA算出偏差最小值(步驟S25)。Next, the deviation calculation unit 422 of FIG. 25 calculates the deviation evaluation value for each unit area UA (step S23). Further, the maximum deviation calculation unit 423 of FIG. 25 calculates the maximum deviation for each unit area UA by performing smoothing processing using the moving maximum method on the calculated deviation evaluation value (step S24). Furthermore, the minimum deviation calculation unit 424 of FIG. 25 calculates the minimum deviation for each unit area UA by performing smoothing processing using the moving minimum method on the calculated deviation evaluation value (step S25).

其後,圖25之差量最大值算出部425針對各單位區域UA,藉由將平滑化後之平均像素值與偏差最大值相加,算出差量最大值(步驟S26)。又,圖25之差量最小值算出部426針對各單位區域UA,藉由將平滑化後之平均像素值與偏差最小值相加,算出差量最小值(步驟S27)。Thereafter, the difference maximum value calculation unit 425 of FIG. 25 calculates the difference maximum value for each unit area UA by adding the smoothed average pixel value and the deviation maximum value (step S26). Further, the difference minimum value calculation unit 426 of FIG. 25 calculates the minimum difference value by adding the smoothed average pixel value and the minimum deviation value for each unit area UA (step S27).

接著,圖25之基準範圍決定部427決定對位於基板W中心之單位區域UA算出之差量最小值至差量最大值之範圍,作為基準範圍(步驟S28)。最後,圖25之修正部428以使對應於各單位區域UA之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域UA向Y方向延伸之帶狀區域BA(圖18)內之各像素值適合於修正後之範圍之方式進行修正(步驟S29)。藉此,產生顯示用圖像資料。圖19之圖像判定記憶部404記憶顯示用圖像資料(步驟S30)。Next, the reference range determining unit 427 of FIG. 25 determines the range of the minimum difference to the maximum difference calculated for the unit area UA located at the center of the substrate W as the reference range (step S28). Finally, the correction unit 428 of FIG. 25 corrects the range corresponding to each unit area UA from the minimum difference to the maximum difference with the reference range, and extends the band from each unit area UA in the Y direction Each pixel value in the shape area BA (FIG. 18) is corrected in such a way that it fits within the corrected range (step S29). By this, image data for display is generated. The image determination memory unit 404 of FIG. 19 stores the image data for display (step S30).

其後,圖像判定記憶部404使基於自動判定結果及顯示用圖像資料之圖像顯示於圖19之顯示部280(步驟S31)。該狀態下,使用者可藉由視認顯示於顯示部280之檢查基板W之圖像,進行檢查基板W之一面之目視檢查。Thereafter, the image determination memory unit 404 causes the image based on the automatic determination result and the display image data to be displayed on the display unit 280 of FIG. 19 (step S31). In this state, the user can perform a visual inspection of one side of the inspection substrate W by viewing the image of the inspection substrate W displayed on the display unit 280.

本實施形態之缺陷判定處理中,步驟S20之自動判定處理中,圖20之步驟S13、S14之處理可於步驟S21~S30之處理後進行,亦可與步驟S21~S30之處理同時進行。In the defect determination process of this embodiment, in the automatic determination process of step S20, the processes of steps S13 and S14 in FIG. 20 may be performed after the processes of steps S21 to S30, or may be performed simultaneously with the processes of steps S21 to S30.

(4)第2實施形態之效果 (a)第2實施形態之基板檢查裝置200中,與第1實施形態之顯示用圖像資料之產生順序同樣地,對複數個單位區域UA之各者,算出圖16所示之平均像素值。又,藉由對複數個單位區域UA之平均像素值進行利用移動中值法之平滑化處理,算出圖17所示之平滑化後之平均像素值。此時,藉由進行利用移動中值法之平滑化處理,適當減低局部平均像素值之波動。(4) Effects of the second embodiment (a) In the substrate inspection apparatus 200 of the second embodiment, the plurality of unit areas UA of each of the plurality of unit areas UA are the same as the generation order of the display image data of the first embodiment, The average pixel value shown in FIG. 16 is calculated. Furthermore, by performing smoothing processing using the moving median method on the average pixel values of the plurality of unit areas UA, the smoothed average pixel values shown in FIG. 17 are calculated. At this time, by performing smoothing processing using the moving median method, the fluctuation of the local average pixel value is appropriately reduced.

其後,算出各單位區域UA之平滑化前之平均像素值與平滑化後之平均像素值之差量,作為偏差評估值。對複數個單位區域UA之偏差評估值進行利用移動最大法之平滑化處理,算出平滑化後之複數個偏差評估值,作為複數個偏差最大值。又,對複數個單位區域UA之偏差評估值進行利用移動最小法之平滑化處理,算出平滑化後之複數個偏差評估值,作為複數個偏差最小值。Thereafter, the difference between the average pixel value before smoothing of each unit area UA and the average pixel value after smoothing is calculated as the deviation evaluation value. The deviation evaluation value of the plurality of unit areas UA is smoothed by the moving maximum method, and the plurality of deviation evaluation values after smoothing are calculated as the maximum value of the plurality of deviations. In addition, the deviation evaluation value of the plurality of unit areas UA is subjected to smoothing processing using the moving minimum method, and the smoothed plurality of deviation evaluation values are calculated as the minimum value of the plurality of deviations.

針對各單位區域UA,藉由將利用移動中值法平滑化後之平均像素值與偏差最大值相加,算出差量最大值。又,針對各單位區域UA,藉由將利用移動中值法平滑化後之平均像素值與偏差最小值相加,算出差量最小值。For each unit area UA, the maximum difference value is calculated by adding the average pixel value smoothed by the moving median method to the maximum deviation value. In addition, for each unit area UA, the minimum value of the difference is calculated by adding the average pixel value smoothed by the moving median method to the minimum deviation value.

決定對應於位於基板W中心之單位區域UA之差量最小值至差量最大值之範圍,作為基準範圍。以對應於各單位區域UA之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域UA向Y方向延伸之各帶狀區域BA內之各像素值適合於修正後之範圍之方式進行修正。藉此,基於顯示用圖像資料之圖像中,各帶狀區域BA內之複數個像素之平均值與位於基板W之中心之單位區域UA之平均像素值相等或大致相等。又,以各帶狀區域BA內之各像素值適合於基準範圍之方式表示。因此,基於顯示用圖像資料之圖像中,抑制視認為X方向之基板W之一面的複數個部分之平均顏色不同。其結果,使用基於顯示用圖像資料之圖像的目視檢查中,可容易且正確地判定基板W之表面狀態之缺陷有無。The range of the minimum difference to the maximum difference corresponding to the unit area UA located at the center of the substrate W is determined as the reference range. The correction is made in such a way that the range corresponding to the minimum difference to the maximum difference of each unit area UA is consistent with the reference range, and that each pixel value in each strip area BA extending from each unit area UA in the Y direction The method is suitable for correction after correction. As a result, in the image based on the image data for display, the average value of the plurality of pixels in each band-shaped area BA is equal to or approximately equal to the average pixel value of the unit area UA located at the center of the substrate W. In addition, each pixel value in each band-shaped area BA is expressed so as to fit within the reference range. Therefore, in the image based on the image data for display, the average color of the plural portions of one surface of the substrate W that is regarded as the X direction is suppressed. As a result, in the visual inspection using the image based on the image data for display, the presence or absence of defects in the surface state of the substrate W can be easily and accurately determined.

(b)本實施形態中,針對構成1個像素之R像素、G像素及B像素之每個種類,進行平均像素值之算出處理、平均像素值之平滑化處理、偏差評估值之算出處理、差量最大值之算出處理、差量最小值之算出處理、差量最大值之算出處理、差量最小值之算出處理、基準範圍之決定處理及實際圖像資料之修正處理。藉此,於基於顯示用圖像資料之圖像上,抑制視認為基板W之一面的X方向之複數個部分的平均色相不同。(b) In this embodiment, for each type of R pixel, G pixel, and B pixel constituting one pixel, an average pixel value calculation process, an average pixel value smoothing process, and a deviation evaluation value calculation process are performed, Calculation of maximum difference, calculation of minimum difference, calculation of maximum difference, calculation of minimum difference, determination of reference range, and correction of actual image data. As a result, on the image based on the image data for display, the average hue of a plurality of portions in the X direction that is regarded as one surface of the substrate W is suppressed.

[3]第3實施形態 第3實施形態之基板處理裝置具備第1或第2實施形態之基板檢查裝置200。圖27係顯示第3實施形態之基板處理裝置之全體構成之模式性方塊圖。如圖27所示,基板處理裝置100與曝光裝置500隣接設置,具備第1或第2實施形態之基板檢查裝置200,且具備控制裝置110、搬送裝置120、塗佈裝置130、顯影處理部140及熱處理部150。[3] Third Embodiment The substrate processing apparatus of the third embodiment includes the substrate inspection apparatus 200 of the first or second embodiment. FIG. 27 is a schematic block diagram showing the overall configuration of the substrate processing apparatus according to the third embodiment. As shown in FIG. 27, the substrate processing apparatus 100 is provided adjacent to the exposure apparatus 500, and includes the substrate inspection apparatus 200 of the first or second embodiment, and includes a control apparatus 110, a transport apparatus 120, a coating apparatus 130, and a development processing section 140 And heat treatment section 150.

控制裝置110例如包含CPU及記憶體、或微電腦,控制搬送裝置120、塗佈處理部130、顯影處理部140及熱處理部150之動作。又,控制裝置110將用以檢查基板W之一面的表面狀態之指令賦予基板檢查裝置200之控制裝置400(圖1)。The control device 110 includes, for example, a CPU, a memory, or a microcomputer, and controls operations of the transport device 120, the coating processing unit 130, the development processing unit 140, and the heat treatment unit 150. Furthermore, the control device 110 gives a command for inspecting the surface state of one surface of the substrate W to the control device 400 of the substrate inspection device 200 (FIG. 1 ).

搬送裝置120於塗佈處理部130、顯影處理部140、熱處理部150、基板檢查裝置200及曝光裝置500之間搬送基板W。The transport device 120 transports the substrate W between the coating processing unit 130, the development processing unit 140, the heat treatment unit 150, the substrate inspection device 200, and the exposure device 500.

塗佈處理部130包含複數個處理單元PU。於處理單元PU,設置處理液噴嘴132,其對藉由旋轉卡盤131旋轉之基板供給用以形成抗蝕劑膜之處理液。各處理單元PU於未處理之基板W之一面上形成抗蝕劑膜(塗佈處理)。對形成有抗蝕劑膜之塗佈處理後之基板W,進行曝光裝置500之曝光處理。The coating processing unit 130 includes a plurality of processing units PU. The processing unit PU is provided with a processing liquid nozzle 132 that supplies a processing liquid for forming a resist film to the substrate rotated by the spin chuck 131. Each processing unit PU forms a resist film on one surface of the unprocessed substrate W (coating process). The substrate W after the coating process with the resist film formed thereon is subjected to exposure processing by the exposure device 500.

顯影處理部140藉由對曝光裝置500之曝光處理後之基板W供給顯影液,進行基板W之顯影處理。熱處理部150於塗佈處理部130之塗佈處理、顯影處理部140之顯影處理、及曝光裝置500之曝光處理前後,進行基板W之熱處理。The development processing unit 140 performs development processing of the substrate W by supplying a developing solution to the substrate W after the exposure processing of the exposure device 500. The heat treatment section 150 performs heat treatment of the substrate W before and after the coating treatment by the coating treatment section 130, the development treatment by the development treatment section 140, and the exposure treatment by the exposure device 500.

基板檢查裝置200進行藉由塗佈處理部130形成抗蝕劑膜後之基板W之檢查(缺陷判定處理)。例如,基板檢查裝置200進行塗佈處理部130之塗佈處理後且曝光裝置500之曝光處理前之基板W之檢查。此時,使用者可藉由視認基於顯示用圖像資料顯示於顯示部280之圖像,進行基板W之目視檢查。The substrate inspection apparatus 200 performs inspection (defect determination processing) of the substrate W after the resist film is formed by the coating processing section 130. For example, the substrate inspection device 200 performs inspection of the substrate W after the coating process by the coating processing unit 130 and before the exposure process of the exposure device 500. At this time, the user can visually inspect the substrate W by viewing the image displayed on the display unit 280 based on the image data for display.

搬送裝置120將判定為無缺陷之基板W搬送至曝光裝置500。另一方面,搬送裝置120不將判定為有缺陷之基板W搬送至曝光裝置500。藉此,防止對存在缺陷之基板W進行曝光處理。The transfer device 120 transfers the substrate W determined to be non-defective to the exposure device 500. On the other hand, the transport device 120 does not transport the substrate W determined to be defective to the exposure device 500. This prevents exposure of the defective substrate W.

又,基板檢查裝置200亦可進行塗佈處理部130之塗佈處理後且曝光裝置500之曝光處理後且顯影處理部140之顯影處理後之基板W之檢查。或者,基板檢查裝置200亦可進行塗佈處理部130之塗佈處理後且曝光裝置500之曝光處理後且顯影處理部140之顯影處理前之基板W之檢查。該等情形時,使用者可藉由視認基於基板W之檢查時產生之顯示用圖像資料之圖像,進行基板W之目視檢查。In addition, the substrate inspection apparatus 200 may inspect the substrate W after the coating processing by the coating processing section 130, after the exposure processing by the exposure device 500, and after the development processing by the development processing section 140. Alternatively, the substrate inspection apparatus 200 may inspect the substrate W after the coating process by the coating processing unit 130 and after the exposure process by the exposure device 500 and before the development process by the development processing unit 140. In such cases, the user can perform a visual inspection of the substrate W by viewing the image based on the display image data generated during the inspection of the substrate W.

上述基板處理裝置100中,亦可於塗佈處理部130設置對基板W形成抗反射膜之處理單元。該情形時,熱處理部150亦可進行用以提高基板W與抗反射膜之密著性之密著強化處理。又,亦可於塗佈處理部130,設置形成用以保護形成於基板W上之抗蝕劑膜之抗蝕劑覆蓋膜之處理單元。In the above substrate processing apparatus 100, a processing unit for forming an anti-reflection film on the substrate W may be provided in the coating processing unit 130. In this case, the heat treatment unit 150 may also perform an adhesion strengthening process to improve the adhesion between the substrate W and the anti-reflection film. In addition, a processing unit for forming a resist cover film for protecting the resist film formed on the substrate W may be provided in the coating processing portion 130.

於基板W之一面形成上述抗反射膜及抗蝕劑覆蓋膜之情形時,亦可於各膜之形成後利用基板檢查裝置200進行基板W的檢查。When the anti-reflection film and the resist cover film are formed on one surface of the substrate W, the substrate W may be inspected by the substrate inspection apparatus 200 after the formation of each film.

本實施形態之基板處理裝置100中,藉由圖1之基板檢查裝置200,檢查形成有抗蝕劑膜、抗反射膜、抗蝕劑覆蓋膜等膜之基板W之一面上的表面狀態。藉此,使用表示基板W之一面之圖像的目視檢查中,可容易且正確地判定形成於基板W之一面上之膜的缺陷有無。其結果,減低基板W之處理不良之產生。In the substrate processing apparatus 100 of this embodiment, the surface state of one surface of the substrate W on which films such as a resist film, an anti-reflection film, and a resist cover film are formed is inspected by the substrate inspection device 200 of FIG. 1. Thereby, in the visual inspection using the image representing one side of the substrate W, it is possible to easily and accurately determine the presence or absence of defects of the film formed on one side of the substrate W. As a result, the occurrence of defective processing of the substrate W is reduced.

[4]其他實施形態 (a)上述實施形態中,設定於基於實際圖像資料之圖像上之各單位區域UA之X方向的寬度雖設定為1個像素量,但本發明不限於此。各單位區域UA之X方向之寬度亦可具有2像素或3像素左右之數像素寬度。[4] Other embodiments (a) In the above embodiment, the width of each unit area UA set on the image based on the actual image data in the X direction is set to one pixel, but the present invention is not limited to this. The width of each unit area UA in the X direction may also have a width of several pixels of about 2 pixels or 3 pixels.

(b)第1實施形態中,用以產生顯示用圖像資料之修正處理中,複數個單位區域UA中位於基板W中心之單位區域UA之平均像素值係作為基準值使用,但本發明不限於此。亦可使用位於基板W中心以外預先規定之X方向之像素位置之單位區域UA的平均像素值,作為基準值。(b) In the first embodiment, in the correction process for generating image data for display, the average pixel value of the unit area UA located in the center of the substrate W among the plurality of unit areas UA is used as the reference value, but the present invention does not Limited to this. As the reference value, the average pixel value of the unit area UA of the pixel position in the predetermined X direction outside the center of the substrate W may also be used.

(c)第2實施形態中,用以產生顯示用圖像資料之修正處理中,決定複數個單位區域UA中位於基板W中心之單位區域UA之差量最小值至差量最大值之範圍作為基準範圍,但本發明不限於此。亦可決定位於基板W中心以外預先規定之X方向之像素位置之單位區域UA之差量最小值至差量最大值之範圍作為基準範圍。(c) In the second embodiment, in the correction process for generating the image data for display, the range from the minimum difference to the maximum difference of the unit area UA located in the center of the substrate W among the plurality of unit areas UA is determined as The reference range, but the invention is not limited to this. The range from the minimum difference to the maximum difference of the unit area UA of the pixel position in the predetermined X direction outside the center of the substrate W may also be determined as the reference range.

(d)上述實施形態中,藉由於攝像部240使用彩色攝像元件,構成實際圖像資料之各像素資料包含R像素值、G像素值及B像素值,但本發明不限於此。亦可於攝像部240使用單色之攝像元件。該情形時,基於顯示用圖像資料之圖像中,亦抑制視認為X方向之基板W之一面的複數個部分之平均亮度不同。(d) In the above embodiment, since the imaging unit 240 uses a color imaging element, each pixel data constituting the actual image data includes R pixel values, G pixel values, and B pixel values, but the present invention is not limited to this. It is also possible to use a monochrome imaging device for the imaging unit 240. In this case, in the image based on the image data for display, the average brightness of a plurality of portions of one surface of the substrate W regarded as the X direction is also suppressed.

(e)上述實施形態中,每針對1片基板W進行缺陷判定處理,對複數個單位區域UA之各者算出平均像素值,但本發明不限於此。對具有共通之表面構造之複數個基板W進行缺陷判定處理之情形時,例如亦可自藉由拍攝樣本基板或第1片檢查基板W所得之實際圖像資料算出複數個單位區域UA之平均像素值,將算出結果記憶於控制裝置400之記憶體。該情形時,進行第2片以後之基板W之缺陷判定處理時,可使用記憶於記憶體之複數個單位區域UA之平均像素值。因此,無需每進行缺陷判定處理算出複數個單位區域UA之平均像素值。藉此,可簡化第2片以後之顯示用圖像資料產生時之處理。(e) In the above embodiment, the defect determination process is performed for each substrate W, and the average pixel value is calculated for each of the plurality of unit areas UA, but the present invention is not limited to this. In the case of performing defect determination processing on a plurality of substrates W having a common surface structure, for example, the average pixel of a plurality of unit areas UA can also be calculated from actual image data obtained by photographing a sample substrate or the first inspection substrate W Value, the calculated result is memorized in the memory of the control device 400. In this case, the average pixel value of the plurality of unit areas UA stored in the memory can be used when the defect determination processing of the second and subsequent substrates W is performed. Therefore, it is not necessary to calculate the average pixel value of the plurality of unit areas UA every time the defect determination process is performed. By this, the processing at the time of generating the image data for display after the second piece can be simplified.

或者,亦可於控制裝置400之記憶體,記憶針對複數個單位區域UA之平均像素值預先規定之設計資料。該情形時,亦可簡化顯示用圖像資料產生時之處理。Alternatively, the design data predetermined for the average pixel value of the plurality of unit areas UA may be stored in the memory of the control device 400. In this case, the processing at the time of generating the image data for display can also be simplified.

(f)第1實施形態之圖像顯示用資料之產生方法中,基於圖16所示之平均像素值與圖17所示之平滑化後之平均像素值,進行用以獲得顯示用圖像資料之修正處理,但本發明不限於此。亦可基於圖7所示之平均像素值與圖9所示之平滑化後之平均像素值,進行用以獲得顯示用圖像資料之修正處理。(f) In the method for generating image display data according to the first embodiment, based on the average pixel value shown in FIG. 16 and the smoothed average pixel value shown in FIG. 17, it is used to obtain image data for display Correction process, but the invention is not limited to this. Based on the average pixel value shown in FIG. 7 and the smoothed average pixel value shown in FIG. 9, correction processing for obtaining image data for display may also be performed.

(g)第2實施形態之圖像顯示用資料之產生方法中,基於圖16所示之平均像素值與圖17所示之平滑化後之平均像素值,算出用以獲得顯示用圖像資料之偏差評估值,但本發明不限於此。亦可基於圖7所示之平均像素值與圖9所示之平滑化後之平均像素值,算出用以獲得顯示用圖像資料之偏差評估值。(g) In the method for generating image display data according to the second embodiment, based on the average pixel value shown in FIG. 16 and the smoothed average pixel value shown in FIG. 17, the image data for display is calculated to obtain Evaluation of the deviation, but the invention is not limited to this. Alternatively, based on the average pixel value shown in FIG. 7 and the smoothed average pixel value shown in FIG. 9, a deviation evaluation value for obtaining image data for display may be calculated.

(h)上述實施形態之基板檢查裝置200中,攝像部240具有於一方向延伸之攝像區域,但本發明不限於此。攝像部240亦可具有面狀之攝像區域。即,作為攝像部240之攝像元件,亦可使用複數個像素矩陣狀排列之彩色CCD區域感測器或CMOS區域感測器。(h) In the substrate inspection apparatus 200 of the above embodiment, the imaging unit 240 has an imaging area extending in one direction, but the present invention is not limited to this. The imaging unit 240 may have a planar imaging area. That is, as the imaging element of the imaging unit 240, a color CCD area sensor or a CMOS area sensor arranged in a matrix of a plurality of pixels may be used.

該情形時,例如藉由以由攝像部240之攝像區域涵蓋基板W之一面全體之方式,設置攝像部240,而無需使攝像部240與基板保持裝置250於前後方向相對移動。藉此,可縮短基板W之檢查時需要之時間。In this case, for example, by arranging the imaging unit 240 such that the imaging area of the imaging unit 240 covers the entire surface of the substrate W, there is no need to relatively move the imaging unit 240 and the substrate holding device 250 in the front-rear direction. This can shorten the time required for the inspection of the substrate W.

(i)上述實施形態中,於基板檢查裝置200設置反射部230,但本發明不限於此。以攝像部240直接接收來自基板W之光之方式構成之情形時,亦可不設置反射部230。(i) In the above embodiment, the reflection part 230 is provided in the substrate inspection device 200, but the present invention is not limited to this. When the imaging unit 240 is configured to directly receive the light from the substrate W, the reflection unit 230 may not be provided.

(j)上述實施形態中,移動部260構成為使基板保持裝置250相對於移動部260、投光部220、反射部230及攝像部240於前後方向移動,但本發明不限於此。移動部260亦可構成為以攝像部240之攝像區域通過基板W之一面全體之方式,使投光部220、反射部230及攝像部240相對於基板保持裝置250於前後方向移動。(j) In the above embodiment, the moving part 260 is configured to move the substrate holding device 250 relative to the moving part 260, the light projecting part 220, the reflecting part 230, and the imaging part 240, but the present invention is not limited to this. The moving section 260 may be configured to move the light projecting section 220, the reflecting section 230, and the imaging section 240 relative to the substrate holding device 250 in the front-rear direction so that the imaging area of the imaging section 240 passes through the entire surface of the substrate W.

[5]技術方案之各構成要素與實施形態之各構成要素之對應關係 以下,對技術方案之各構成要素與實施形態之各要素對應之例進行說明,但本發明不限定於下述之例。[5] Correspondence between each component of the technical solution and each component of the embodiment The following describes an example in which each component of the technical solution corresponds to each component of the embodiment, but the present invention is not limited to the following examples .

上述實施形態中,基板保持裝置250及控制部401為保持部之例,攝像部240及圖像產生部402為攝像部之例,移動部260及控制部401為移動部之例。In the above embodiment, the substrate holding device 250 and the control unit 401 are examples of holding units, the imaging unit 240 and the image generating unit 402 are examples of imaging units, and the moving unit 260 and control unit 401 are examples of moving units.

又,第1實施形態中,將圖16之平均像素值藉由移動中值法平滑化之處理為平滑化處理之例,第2實施形態中,將圖16之平均像素值藉由移動中值法平滑化之處理為第1平滑化處理之例,第2實施形態中,基於圖16所示之平均像素值與圖17所示之平滑化後之平均像素值算出之偏差評估值為偏差之例。Furthermore, in the first embodiment, the process of smoothing the average pixel value of FIG. 16 by the moving median method is an example of smoothing processing, and in the second embodiment, the average pixel value of FIG. 16 is changed by the moving median The method of smoothing by method is an example of the first smoothing process. In the second embodiment, the deviation evaluation value calculated based on the average pixel value shown in FIG. 16 and the average pixel value after smoothing shown in FIG. 17 is the deviation example.

又,第2實施形態中,將圖21之偏差評估值藉由移動最大法平滑化之處理為第2平滑化處理之例,第2實施形態中,將圖21之偏差評估值藉由移動最小法平滑化之處理為第3平滑化處理之例。Furthermore, in the second embodiment, the process of smoothing the deviation evaluation value of FIG. 21 by the moving maximum method is an example of the second smoothing process. In the second embodiment, the deviation evaluation value of FIG. 21 is minimized by moving The process of normal smoothing is an example of the third smoothing process.

作為技術方案之各構成要素,亦可使用具有記載於技術方案之構成或功能之其他各種要素。 [產業上之可利用性]As each constituent element of the technical solution, other various elements having the configuration or function described in the technical solution can also be used. [Industry availability]

本發明可有效利用於各種基板之表面檢查。The invention can be effectively used for surface inspection of various substrates.

100‧‧‧基板處理裝置110‧‧‧控制裝置120‧‧‧搬送裝置130‧‧‧塗佈處理部131‧‧‧旋轉卡盤132‧‧‧處理液噴嘴140‧‧‧顯影處理部150‧‧‧熱處理部200‧‧‧基板檢查裝置210‧‧‧框體部211‧‧‧底面部212~215‧‧‧側面部216‧‧‧開口部220‧‧‧投光部230‧‧‧反射部240‧‧‧攝像部250‧‧‧基板保持裝置251‧‧‧驅動裝置252‧‧‧旋轉保持部260‧‧‧移動部261‧‧‧引導構件262‧‧‧移動保持部270‧‧‧切痕檢測部280‧‧‧顯示部400‧‧‧控制裝置401‧‧‧控制部402‧‧‧圖像產生部403‧‧‧判定部404‧‧‧圖像判定記憶部405‧‧‧顯示用圖像資料產生部411‧‧‧平滑化部412‧‧‧修正部421‧‧‧平滑化部422‧‧‧偏差算出部423‧‧‧偏差最大值算出部424‧‧‧偏差最小值算出部425‧‧‧差量最大值算出部426‧‧‧差量最小值算出部427‧‧‧基準範圍決定部428‧‧‧修正部500‧‧‧曝光裝置B1‧‧‧第1B基準曲線B3max、B3min‧‧‧實線BA‧‧‧帶狀區域BDmax、BDmin‧‧‧實線G1‧‧‧第1G基準曲線G3max、G3min‧‧‧點線GDmax、GDmin‧‧‧點線PI‧‧‧像素P1‧‧‧第1R基準曲線R3max、R3min‧‧‧一點鏈線RB‧‧‧B平均像素值線RDmax、RDmin‧‧‧一點鏈線RG‧‧‧G平均像素值線RR‧‧‧R平均像素值S11~S20‧‧‧步驟S20~S31‧‧‧步驟UA‧‧‧單位區域UN1、UN2‧‧‧無用範圍VP‧‧‧假想點VS1‧‧‧第1假想面VS2‧‧‧第2假想面W‧‧‧基板WC‧‧‧基板W之中心WE1‧‧‧基板W之一端部WE2‧‧‧基板W之另一端部100‧‧‧Substrate processing device 110‧‧‧Control device 120‧‧‧Transport device 130‧‧‧Coating processing unit 131‧‧‧Rotating chuck 132‧‧‧Process liquid nozzle 140‧‧‧Development processing unit 150‧ ‧‧Heat treatment part 200‧‧‧Substrate inspection device 210‧‧‧Frame part 211‧‧‧Bottom part 212~215‧‧‧Side part 216‧‧‧Opening part 220‧‧‧Projection part 230‧‧‧Reflection Part 240‧‧‧Camera part 250‧‧‧Substrate holding device 251‧‧‧Drive device 252‧‧‧Rotary holding part 260‧‧‧Moving part 261‧‧‧Guide member 262‧‧‧Move holding part 270‧‧‧ Cut detection unit 280‧‧‧Display unit 400‧‧‧Control device 401‧‧‧Control unit 402‧‧‧Image generation unit 403‧‧‧Judgment unit 404‧‧‧Image judgment memory unit 405‧‧‧Display Image data generation unit 411‧‧‧ smoothing unit 412‧‧‧ correction unit 421‧‧‧ smoothing unit 422‧‧‧ deviation calculation unit 423‧‧‧ deviation maximum calculation unit 424‧‧‧ minimum deviation calculation 425‧‧‧Maximum difference calculation unit 426‧‧‧Minimum difference calculation unit 427‧‧‧Base range determination unit 428‧‧‧ Correction unit 500‧‧‧ Exposure device B1‧‧‧1B reference curve B3max 、B3min‧‧‧Solid line BA‧‧‧Zone zone BDmax, BDmin‧‧‧Solid line G1‧‧‧ 1G reference curve G3max, G3min‧‧‧Point line GDmax, GDmin‧‧‧Point line PI‧‧‧ Pixel P1‧‧‧1st reference curve R3max, R3min‧‧‧ point chain line RB‧‧‧B average pixel value line RDmax, RDmin‧‧‧ point chain line RG‧‧‧G average pixel value line RR‧‧‧R Average pixel value S11~S20‧‧‧Step S20~S31‧‧‧Step UA‧‧‧Unit area UN1, UN2‧‧‧Useless range VP‧‧‧Imaginary point VS1‧‧‧The first virtual surface VS2‧‧‧ 2 Imaginary surface W‧‧‧substrate WC‧‧‧center of substrate W WE1‧‧‧ one end of substrate W WE2‧‧‧‧other end of substrate W

圖1係第1實施形態之基板檢查裝置之外觀立體圖。 圖2係顯示圖1之基板檢查裝置之內部構成之模式性側視圖。 圖3係顯示圖1之基板檢查裝置之內部構成之模式性俯視圖。 圖4(a)係顯示表示基板之一面的實際圖像之一例之圖,圖4(b)係顯示基於圖像資料之先前圖像之一例之圖。 圖5係顯示圖1之基板檢查裝置中藉由攝像部拍攝基板之一面全體之狀態之模式性俯視圖。 圖6係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖7係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖8係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖9係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖10(a)~(d)係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖11係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖12係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖13係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖14(a)~(d)係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖15(a)~(d)係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖16係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖17係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖18係用以說明第1實施形態之圖像顯示用資料之產生方法之圖。 圖19係顯示第1實施形態之基板檢查裝置之控制系統之方塊圖。 圖20係第1實施形態之缺陷判定處理之流程圖。 圖21係用以說明第2實施形態之圖像顯示用資料之產生方法之圖。 圖22係用以說明第2實施形態之圖像顯示用資料之產生方法之圖。 圖23係用以說明第2實施形態之圖像顯示用資料之產生方法之圖。 圖24係用以說明第2實施形態之圖像顯示用資料之產生方法之圖。 圖25係顯示第2實施形態之顯示用圖像資料產生部之功能構成之方塊圖。 圖26係第2實施形態之缺陷判定處理之流程圖。 圖27係顯示第3實施形態之基板處理裝置之全體構成之模式性方塊圖。Fig. 1 is an external perspective view of a substrate inspection device according to a first embodiment. FIG. 2 is a schematic side view showing the internal structure of the substrate inspection device of FIG. 1. FIG. 3 is a schematic plan view showing the internal structure of the substrate inspection device of FIG. 1. FIG. 4(a) is a diagram showing an example of an actual image on one side of a substrate, and FIG. 4(b) is a diagram showing an example of a previous image based on image data. FIG. 5 is a schematic plan view showing a state in which the entire surface of a substrate is imaged by an imaging unit in the substrate inspection device of FIG. 1. FIG. 6 is a diagram for explaining a method of generating data for image display according to the first embodiment. 7 is a diagram for explaining a method of generating data for image display according to the first embodiment. FIG. 8 is a diagram for explaining a method of generating data for image display according to the first embodiment. FIG. 9 is a diagram for explaining a method of generating data for image display according to the first embodiment. 10(a) to (d) are diagrams for explaining a method of generating data for image display according to the first embodiment. FIG. 11 is a diagram for explaining a method of generating data for image display according to the first embodiment. FIG. 12 is a diagram for explaining a method of generating data for image display according to the first embodiment. FIG. 13 is a diagram for explaining a method of generating data for image display according to the first embodiment. 14(a) to (d) are diagrams for explaining a method of generating data for image display according to the first embodiment. 15(a) to (d) are diagrams for explaining a method of generating data for image display according to the first embodiment. FIG. 16 is a diagram for explaining a method of generating data for image display according to the first embodiment. FIG. 17 is a diagram for explaining the method of generating image display data according to the first embodiment. FIG. 18 is a diagram for explaining a method of generating image display data according to the first embodiment. FIG. 19 is a block diagram showing the control system of the substrate inspection apparatus of the first embodiment. FIG. 20 is a flowchart of the defect determination process in the first embodiment. FIG. 21 is a diagram for explaining a method of generating data for image display according to the second embodiment. Fig. 22 is a diagram for explaining a method of generating data for image display according to the second embodiment. FIG. 23 is a diagram for explaining a method of generating data for image display according to the second embodiment. FIG. 24 is a diagram for explaining a method of generating data for image display according to the second embodiment. FIG. 25 is a block diagram showing the functional configuration of the display image data generating section of the second embodiment. Fig. 26 is a flowchart of defect determination processing in the second embodiment. FIG. 27 is a schematic block diagram showing the overall configuration of the substrate processing apparatus according to the third embodiment.

S11~S20‧‧‧步驟 S11~S20‧‧‧Step

Claims (18)

一種基板檢查裝置,其包含:保持部,其保持基板;攝像部,其拍攝由上述保持部保持之基板之一面,產生表示基板之上述一面之圖像的實際圖像資料;平滑化部,其針對基於上述實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值作為平均像素值,對上述複數個單位區域之平均像素值進行平滑化處理;及修正部,其算出上述複數個單位區域中預先規定之單位區域的上述平滑化處理後之平均像素值、與各單位區域之上述平滑化處理後的平均像素值之差量,且將自各單位區域向正交於上述第1直徑方向之第2直徑方向平行延伸之帶狀區域內之各像素值,加上對應於該單位區域之差量。 A substrate inspection device includes: a holding portion that holds a substrate; an imaging portion that photographs a surface of the substrate held by the holding portion to generate actual image data representing an image of the surface of the substrate; a smoothing portion that For each of the plurality of unit areas arranged in the first diameter direction of the substrate on the image based on the actual image data, the average value of the plurality of pixels constituting the unit area is calculated as the average pixel value, and for the plurality of units The average pixel value of the area is smoothed; and a correction section that calculates the average pixel value after the smoothing processing of the unit area predetermined in the plurality of unit areas and the average after the smoothing processing of each unit area The difference of the pixel values, and each pixel value in the band-shaped region extending parallel to the second diameter direction orthogonal to the first diameter direction from each unit area is added to the difference corresponding to the unit area. 如請求項1之基板檢查裝置,其中上述平滑化處理為利用移動中值法之平滑化處理。 The substrate inspection apparatus according to claim 1, wherein the above-mentioned smoothing processing is smoothing processing using a moving median method. 如請求項2之基板檢查裝置,其中於基板之上述一面上,形成於上述第1直徑方向上具有週期性圖案之膜,利用上述移動中值法之平滑化處理所使用之寬度,大於上述第1直徑方向之上述圖案之週期。 The substrate inspection device according to claim 2, wherein the film having a periodic pattern in the first diameter direction formed on the one surface of the substrate has a width used for smoothing processing by the moving median method is larger than the above 1 The period of the above pattern in the diameter direction. 如請求項1至3中任一項之基板檢查裝置,其中構成上述複數個單位區域各者之各像素包含R像素、B像素及G像素,上述平滑化部針對每個像素種類進行上述平滑化處理,上述修正部針對每個像素種類進行上述複數個差量之算出處理,且針對每個像素種類進行上述複數個差量之相加處理。 The substrate inspection device according to any one of claims 1 to 3, wherein each pixel constituting each of the plurality of unit areas includes R pixels, B pixels, and G pixels, and the smoothing section performs the smoothing for each pixel type In the processing, the correction unit performs the calculation process of the plurality of differences for each pixel type, and performs the addition process of the plurality of differences for each pixel type. 一種基板檢查裝置,其包含:保持部,其保持基板;攝像部,其拍攝由上述保持部保持之基板之一面,產生表示基板之上述一面之圖像的實際圖像資料;平滑化部,其針對基於上述實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值作為平均像素值,對上述複數個單位區域之平均像素值進行利用移動中值法之第1平滑化處理;偏差算出部,其算出各單位區域之上述第1平滑化處理前之平均像素值與上述第1平滑化處理後之平均像素值之差量,作為偏差;偏差最大值算出部,其藉由對上述複數個單位區域之偏差進行利用移動最大法之第2平滑化處理,算出上述第2平滑化處理後之複數個偏差,作為複數個偏差最大值;偏差最小值算出部,其藉由對上述複數個單位區域之偏差進行利用移動最小法之第3平滑化處理,算出上述第3平滑化處理後之複數個偏差,作為複數個偏差最小值;差量最大值算出部,其算出各單位區域之上述第1平滑化處理後之平 均像素值、與上述偏差最大值之相加值,作為差量最大值;差量最小值算出部,其算出各單位區域之上述第1平滑化處理後之平均像素值、與上述偏差最小值之相加值,作為差量最小值;基準範圍決定部,其決定將對應於上述複數個單位區域中預先規定之單位區域之差量最小值至差量最大值之範圍,作為基準範圍;及修正部,其以使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之方式進行修正,且以使自各單位區域向正交於上述第1直徑方向之第2直徑方向平行延伸之各帶狀區域內之各像素值,適合於修正後之範圍之方式進行修正。 A substrate inspection device includes: a holding portion that holds a substrate; an imaging portion that photographs a surface of the substrate held by the holding portion to generate actual image data representing an image of the surface of the substrate; a smoothing portion that For each of the plurality of unit areas arranged in the first diameter direction of the substrate on the image based on the actual image data, the average value of the plurality of pixels constituting the unit area is calculated as the average pixel value, and for the plurality of units The average pixel value of the area is subjected to the first smoothing process using the moving median method; the deviation calculation unit calculates the average pixel value before the first smoothing process of each unit area and the average pixel after the first smoothing process The difference between the values is used as a deviation; the maximum deviation calculation unit calculates the plurality of deviations after the second smoothing process by performing the second smoothing process using the moving maximum method on the deviations of the plurality of unit areas, As a plurality of deviation maximum values; a deviation minimum value calculation unit that calculates the plurality of deviations after the third smoothing process by performing the third smoothing process using the moving minimum method on the deviations of the plurality of unit areas, as A plurality of minimum deviations; a maximum difference calculation unit that calculates the level after the first smoothing process in each unit area The average pixel value and the sum of the deviation maximum value are regarded as the maximum difference; the difference minimum calculation unit calculates the average pixel value after the first smoothing process of each unit area and the minimum deviation The added value is regarded as the minimum difference; the reference range determination unit determines the range corresponding to the predetermined minimum unit area among the plurality of unit areas as the reference range; and The correction unit performs correction so that the range corresponding to the minimum value of the difference from each unit area to the maximum value of the difference coincides with the reference range, and the second area orthogonal to the first diameter direction from each unit area to the second The pixel values in the band-shaped regions extending in parallel in the diameter direction are suitable for correction in the corrected range. 如請求項5之基板檢查裝置,其中於基板之上述一面上,形成於上述第1直徑方向具有週期性圖案之膜,利用上述移動中值法之第1平滑化處理、利用上述移動最大法之第2平滑化處理、及利用上述移動最小法之第3平滑化處理所使用之寬度,係大於上述第1直徑方向之上述圖案之週期。 The substrate inspection device according to claim 5, wherein a film having a periodic pattern in the first diameter direction is formed on the one surface of the substrate, using the first smoothing process of the moving median method, using the moving maximum method The width used in the second smoothing process and the third smoothing process using the above-mentioned moving minimum method is larger than the period of the pattern in the first diameter direction. 如請求項5或6之基板檢查裝置,其中構成上述複數個單位區域各者之各像素包含R像素、B像素及G像素,上述平滑化部針對每個像素種類進行上述第1平滑化處理,上述偏差算出部針對每個像素種類,進行上述複數個偏差之算出處理,上述偏差最大值算出部針對每個像素種類,進行上述複數個差量最大值之算出處理, 上述偏差最小值算出部針對每個像素種類,進行上述複數個差量最小值之算出處理,差量最大值算出部針對每個像素種類,進行上述複數個差量最大值之算出處理,差量最小值算出部針對每個像素種類,進行上述複數個差量最小值之算出處理,基準範圍決定部針對每個像素種類進行上述基準範圍之決定處理,上述修正部針對每個像素種類進行使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之修正處理、及使各帶狀區域內之各像素值適合於修正後之範圍之修正處理。 The substrate inspection apparatus according to claim 5 or 6, wherein each pixel constituting each of the plurality of unit areas includes R pixels, B pixels, and G pixels, and the smoothing section performs the first smoothing process for each pixel type, The deviation calculation unit performs the calculation process of the plurality of deviations for each pixel type, and the deviation maximum calculation unit performs the calculation process of the plurality of maximum differences for each pixel type, The minimum deviation calculation unit performs the calculation process of the plurality of minimum differences for each pixel type, and the maximum difference calculation unit performs the calculation process of the plurality of maximum differences for each pixel type. The minimum value calculation unit performs the calculation process of the plurality of difference minimum values for each pixel type, the reference range determination unit performs the determination process of the reference range for each pixel type, and the correction unit performs correspondence for each pixel type The correction process in which the range of the minimum difference to the maximum difference in each unit area is consistent with the reference range, and the correction process of adapting each pixel value in each band region to the corrected range. 如請求項1至3、5或6中任一項之基板檢查裝置,其中上述平滑化部係將就上述複數個單位區域之一部分,即位於基於上述實際圖像資料之圖像上的基板之第1直徑方向之一端部之複數個單位區域應分別算出之平均像素值,基於針對位於隣接於該一端部之部分的複數個單位區域算出之複數個平均像素值進行推定,且基於推定結果決定分別對應於位於上述一端部之複數個單位區域之複數個平均像素值。 The substrate inspection device according to any one of claims 1 to 3, 5, or 6, wherein the smoothing section is a part of the plurality of unit areas, that is, the substrate located on the image based on the actual image data The average pixel values of the plurality of unit regions at one end in the first diameter direction should be calculated separately, based on the estimation of the plurality of average pixel values calculated for the plurality of unit regions located at the part adjacent to the one end, and determined based on the estimation result Each corresponds to a plurality of average pixel values of the plurality of unit regions located at the one end. 如請求項1至3、5或6中任一項之基板檢查裝置,其中上述攝像部具有線狀之攝像區域,該線狀之攝像區域於由上述保持部保持之基板之上述一面上的上述第1直徑方向平行延伸,上述基板檢查裝置進而包含移動部,其以使上述攝像區域於上述第2直徑方向通過由上 述保持部保持之基板之上述一面之方式,使上述攝像部與上述保持部相對移動。 The substrate inspection apparatus according to any one of claims 1 to 3, 5, or 6, wherein the imaging section has a linear imaging area on the one surface of the substrate held by the holding section The first diametric direction extends in parallel, and the substrate inspection device further includes a moving portion that passes the imaging area in the second diametric direction. The above-mentioned one side of the substrate held by the holding section moves the imaging section and the holding section relatively. 一種基板處理裝置,其包含:塗佈處理部,其藉由將處理液供給於基板之一面,而於基板之一面形成膜;如請求項1至3、5或6中任一項之基板檢查裝置,其檢查藉由上述塗佈處理部形成膜之基板;及搬送裝置,其於上述塗佈處理部與上述基板檢查裝置之間搬送基板。 A substrate processing apparatus comprising: a coating processing section which forms a film on one surface of a substrate by supplying a processing liquid to one surface of the substrate; such as the substrate inspection of any one of claims 1 to 3, 5 or 6 An apparatus that inspects a substrate on which a film is formed by the coating processing section; and a transport device that transports the substrate between the coating processing section and the substrate inspection apparatus. 一種基板檢查方法,其包含以下步驟:實際圖像資料產生之步驟,其拍攝由保持部保持之基板之一面,產生表示基板之上述一面的圖像之實際圖像資料;平滑化處理之步驟,其針對於基於上述實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值,作為平均像素值,對上述複數個單位區域之平均像素值進行平滑化處理;及相加步驟,其算出上述複數個單位區域中預先規定之單位區域的上述平滑化處理後之平均像素值、與各單位區域之上述平滑化處理後的平均像素值之差量,且將自各單位區域向正交於上述第1直徑方向之第2直徑方向平行延伸之帶狀區域內之各像素值,加上對應於該單位區域之差量。 A substrate inspection method including the following steps: a step of generating actual image data, which takes a side of the substrate held by the holding portion, generates actual image data representing an image of the above side of the substrate; a step of smoothing processing, For each of a plurality of unit areas arranged in the first diameter direction of the substrate on the image based on the actual image data, the average value of the plurality of pixels constituting the unit area is calculated as the average pixel value. The average pixel values of the plurality of unit areas are smoothed; and an addition step, which calculates the average pixel value after the smoothing processing of the predetermined unit area in the plurality of unit areas, and the smoothing of each unit area The difference between the average pixel values after processing, and each pixel value in the band-shaped region extending parallel to the second diameter direction orthogonal to the first diameter direction from each unit area, plus the difference corresponding to the unit area the amount. 如請求項11之基板檢查方法,其中上述平滑化處理為利用移動中值法之平滑化處理。 The substrate inspection method according to claim 11, wherein the smoothing processing is smoothing processing using a moving median method. 如請求項12之基板檢查方法,其中於基板之上述一面上,形成於上述第1直徑方向具有週期性圖案之膜,利用上述移動中值法之平滑化處理所使用之寬度,係大於上述第1直徑方向之上述圖案之週期。 The substrate inspection method according to claim 12, wherein the film formed on the above-mentioned one side of the substrate and having a periodic pattern in the first diameter direction is used for the smoothing process using the moving median method is larger than the above-mentioned 1 The period of the above pattern in the diameter direction. 如請求項11至13中任一項之基板檢查方法,其中構成上述複數個單位區域各者之各像素包含R像素、B像素及G像素,進行上述平滑化處理之步驟係包含針對每個像素種類進行上述平滑化處理,上述相加步驟係包含針對每個像素種類進行上述複數個差量之算出處理,並針對每個像素種類進行上述複數個差量之相加處理。 The substrate inspection method according to any one of claims 11 to 13, wherein each pixel constituting each of the plurality of unit areas includes R pixels, B pixels, and G pixels, and the step of performing the above-described smoothing process includes each pixel The above-mentioned smoothing process is performed for each type, and the adding step includes performing the calculation processing of the plurality of differences for each pixel type, and performing the addition processing of the plurality of differences for each pixel type. 一種基板檢查方法,其包含以下步驟:拍攝由保持部保持之基板之一面,產生表示基板之上述一面之圖像的實際圖像資料;針對於基於上述實際圖像資料之圖像上排列於基板之第1直徑方向之複數個單位區域之各者,算出構成該單位區域之複數個像素之平均值,作為平均像素值,對上述複數個單位區域之平均像素值進行利用移動中值法之第1平滑化處理;算出各單位區域之上述第1平滑化處理前之平均像素值、與上述第1 平滑化處理後之平均像素值之差量,作為偏差;藉由對上述複數個單位區域之偏差進行利用移動最大法之第2平滑化處理,算出上述第2平滑化處理後之複數個偏差,作為複數個偏差最大值;藉由對上述複數個單位區域之偏差進行利用移動最小法之第3平滑化處理,算出上述第3平滑化處理後之複數個偏差,作為複數個偏差最小值;算出各單位區域之上述第1平滑化處理後之平均像素值、與上述偏差最大值之相加值,作為差量最大值;算出各單位區域之上述第1平滑化處理後之平均像素值、與上述偏差最小值之相加值,作為差量最小值;決定將對應於上述複數個單位區域中預先規定之單位區域之差量最小值至差量最大值之範圍,作為基準範圍;及修正步驟,其以使對應於各單位區域之差量最小值至差量最大值之範圍、與基準範圍一致之方式進行修正,且以使自各單位區域向正交於上述第1直徑方向之第2直徑方向平行延伸之各帶狀區域內之各像素值,適合於修正後之範圍之方式進行修正。 A substrate inspection method, comprising the steps of: photographing a surface of a substrate held by a holding portion, and generating actual image data representing an image of the above surface of the substrate; aiming at an image based on the actual image data arranged on the substrate Each of the plurality of unit areas in the first diameter direction calculates the average value of the plurality of pixels constituting the unit area, and as the average pixel value, applies the moving median method to the average pixel value of the plurality of unit areas 1 smoothing process; calculate the average pixel value of each unit area before the first smoothing process, and the first The difference between the average pixel values after the smoothing process is used as the deviation; by performing the second smoothing process using the moving maximum method on the deviation of the plurality of unit areas, the plurality of deviations after the second smoothing process are calculated, As the maximum value of the plural deviations; by performing the third smoothing process using the moving minimum method on the deviations of the plural unit areas, the plural deviations after the third smoothing treatment are calculated as the minimum values of the plural deviations; The sum of the average pixel value after the first smoothing process of each unit area and the maximum value of the deviation is the maximum value of the difference; the average pixel value after the first smoothing process of each unit area is calculated, and The sum of the above minimum deviations is taken as the minimum difference; it is determined that the range corresponding to the predetermined minimum unit area of the plurality of unit areas above the maximum difference is used as the reference range; and the correction step , Which is corrected so that the range corresponding to the minimum value of the difference between each unit area to the maximum value of the difference is consistent with the reference range, and so that the second diameter orthogonal to the above-mentioned first diameter direction from each unit area Each pixel value in each band-shaped area extending in a parallel direction is suitable for correction in the corrected range. 如請求項15之基板檢查方法,其中於基板之上述一面上,形成於上述第1直徑方向具有週期性圖案之膜,利用上述移動中值法之第1平滑化處理、利用上述移動最大法之第2平滑化處理、及利用上述移動最小法之第3平滑化處理所使用之寬度,係大於上述第1直徑方向之上述圖案之週期。 The substrate inspection method according to claim 15, wherein a film having a periodic pattern in the first diameter direction is formed on the one surface of the substrate, using the first smoothing process of the moving median method, using the moving maximum method The width used in the second smoothing process and the third smoothing process using the above-mentioned moving minimum method is larger than the period of the pattern in the first diameter direction. 如請求項15或16之基板檢查方法,其中構成上述複數個單位區域各者之各像素包含R像素、B像素及G像素,進行上述第1平滑化處理之步驟係包含針對每個像素種類進行上述第1平滑化處理,算出上述偏差之步驟係包含針對每個像素種類進行上述複數個偏差之算出處理,算出上述偏差最大值之步驟係包含針對每個像素種類進行上述複數個差量最大值之算出處理,算出上述偏差最小值之步驟係包含針對每個像素種類進行上述複數個差量最小值之算出處理,算出上述差量最大值之步驟係包含針對每個像素種類進行上述複數個差量最大值之算出處理,算出上述差量最小值之步驟係包含針對每個像素種類進行上述複數個差量最小值之算出處理,決定上述基準範圍之步驟係包含針對每個像素種類進行上述基準範圍之決定處理,上述修正步驟係包含針對每個像素種類進行使對應於各單位區域之差量最小值至差量最大值之範圍與基準範圍一致之修正處理、及使各帶狀區域內之各像素值適合於修正後之範圍之修正處理。 The substrate inspection method according to claim 15 or 16, wherein each pixel constituting each of the plurality of unit areas includes R pixels, B pixels, and G pixels, and the step of performing the first smoothing process includes performing for each pixel type In the first smoothing process, the step of calculating the deviation includes calculating the plurality of deviations for each pixel type, and the step of calculating the maximum deviation includes performing the plurality of maximum differences for each pixel type The calculation process, the step of calculating the minimum deviation includes the calculation process of the plurality of minimum values for each pixel type, and the step of calculating the maximum difference includes the plurality of differences for each pixel type The calculation of the maximum value of the amount, the step of calculating the minimum value of the difference includes the calculation of the plurality of minimum values of the difference for each pixel type, and the step of determining the reference range includes the above reference for each pixel type For the range determination process, the above-mentioned correction step includes performing correction processing for each pixel type to make the range corresponding to each unit area from the minimum difference to the maximum difference equal to the reference range, and to make the Each pixel value is suitable for the correction process of the corrected range. 一種基板處理方法,其包含以下步驟:藉由將處理液供給於基板之一面,而於基板之一面形成膜;及 使用如請求項11至13、15或16中任一項之基板檢查方法,檢查於上述一面形成有上述膜之基板。 A substrate processing method, comprising the steps of: forming a film on one surface of a substrate by supplying a processing liquid to one surface of the substrate; and Using the substrate inspection method according to any one of claims 11 to 13, 15, or 16, inspect the substrate on which the film is formed on the one side.
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