TWI521683B - Erasable programmable single-poly nonvolatile memory - Google Patents

Description

Programmable erasable single polysilicon layer non-volatile memory

The present invention relates to a nonvolatile memory, and more particularly to a single polycrystalline germanium layer non-volatile memory with programmable erasability.

Please refer to FIG. 1 , which is a schematic diagram of a programmable dual-poly nonvolatile memory. The non-volatile memory of the programmable dual polysilicon layer is also referred to as a floating-gate transistor. The non-volatile memory includes two gates that are stacked and not in contact, with a control gate 12 connected to the control line (C) and a floating gate 14 below. In the p-substrate, an n-type source doped region is connected to the source line (S) and an n-type drain doped region (n type drain doped region) ) Connect to the bungee line (D).

For example, in the programmed state, the drain line (D) provides a high voltage (eg, +16V), the source line (S) provides a ground voltage (Ground), and the control line (C) provides a Control voltage (eg +25V). Therefore, when electrons pass through the n-channel to the drain line (D) from the source line (S), hot carriers, such as hot electrons, are controlled by the gate. The control voltage on 12 is attracted to and injected into the floating gate 14. At this time, the floating gate 14 accumulates a lot of carriers, and thus can be regarded as the first storage state (for example, "0").

In the not-programmed state, there is no carrier in the floating gate 14, so it can be regarded as a second storage state (for example, "1").

In other words, the first storage state and the second storage state will cause a change in the drain current (id) of the floating gate transistor and the characteristic (id-Vgs characteristic) of the gate source voltage (Vgs). Therefore, the storage state of the floating gate transistor can be known from the variation of the drain current (id) and the gate source voltage (Vgs) characteristic (id-Vgs characteristic).

However, the non-volatile memory of the double poly germanium layer requires a large number of fabrication steps to be completed due to the need to separately fabricate the floating gate 14 and the control gate 12, and is incompatible with the process of a conventional standard CMOS transistor.

U.S. Patent 6,678,190 discloses a programmable single polycrystalline germanium layer non-volatile memory. Please refer to FIG. 2A, which is a schematic diagram of a conventional programmable polycrystalline germanium layer non-volatile memory; FIG. 2B is a diagram of a conventional programmable polycrystalline germanium layer non-volatile memory. View; Figure 2C is a circuit diagram of a conventional single polycrystalline germanium non-volatile memory.

As shown in Figures 2A through 2C, conventional single crystal polycrystalline germanium non-volatile memory systems include two serially connected p-type transistors. The first p-type electro-crystal system is used as a select transistor, and a select gate 24 is connected to a select gate voltage (V _SG ), the first p-type source/汲 region ( p type source/drain region 21 is connected to a source line voltage (V _SL ). Furthermore, the second p-type source/germanium region 22 can be regarded as a p-type drain region of the first p-type transistor and a p-type source region of the second p-type transistor (p type source region) ) Connected to each other. The second p-type transistor includes a floating gate 26 above it, and the third p-type source/german region 23 is connected to a bit line voltage ( _VBL ). Furthermore, the two p-type electro-crystal system is fabricated in an N-well region (NW) connected to an N-well voltage (V _NW ).

Furthermore, by appropriately controlling the selection gate voltage (V _SG ), the source line voltage (V _SL ), the bit line voltage (V _BL ), and the N-type well voltage (V _NW ), it is possible to make the conventional device The programmable single polysilicon layer non-volatile memory enters the program state or the read state.

Since the conventional p-type transistor has only one gate 24, 26 in the programmable single polycrystalline germanium non-volatile memory, it is completely compatible with the standard CMOS transistor process.

However, the non-volatile memory of Figure 1 and Figures 2A to 2C only has a programmable function. It can only inject the hot carrier into the floating gate using electrical characteristics, and cannot use the electrical characteristics to float. The storage carrier in the gate is removed, and only the ultraviolet light (ultraviolet light) illumination method can be used to remove the storage carrier in the floating gate, thereby achieving the function of data erasing. Therefore, such a non-volatile memory system is called a one-time programming memory (OTP memory).

Therefore, how to improve the above-mentioned programmable polycrystalline germanium layer non-volatile memory, and achieve a single polycrystalline germanium layer non-volatile memory with programmable erasability, that is, to achieve a multi-time memory (multi-times) Programming memory (MTP memory for short) is the object of the present invention.

SUMMARY OF THE INVENTION The object of the present invention is to provide a single polycrystalline germanium layer non-volatile memory with programmable erasability. The conventional non-volatile memory is modified to achieve a single polycrystalline germanium layer non-volatile memory with programmable erasability.

The invention relates to a single polycrystalline germanium non-volatile memory with programmable erasability, comprising: a substrate structure; a first p-type transistor comprising a selective gate connected to a selective gate voltage, a first a p-type source/german region is connected to a source line voltage and a second p-type source/german region; a second p-type transistor includes the second p-type source/turn region, and a third p-type source The /汲 region is connected to a one-bit line voltage, and a floating gate, wherein the first p-type source/turn region, the second p-type source/turn region, and the third p-type source/turn region are formed An N-type well region; and a wipe-off region adjacent to the floating gate, and the erase gate region includes a P-type The well region and an n-type source/german region are connected to a erase line voltage; wherein the P-type well region and the N-type well region are formed in the substrate structure.

In order to better understand the above and other aspects of the present invention, the preferred embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

12‧‧‧Control gate

14‧‧‧Floating gate

21‧‧‧First p-type source/汲 area

22‧‧‧Second p-type source/汲 area

23‧‧‧ Third p-type source/汲 area

24‧‧‧Select gate

26‧‧‧Floating gate

31‧‧‧First p-type source/汲 area

32‧‧‧Second p-type source/汲 area

33‧‧‧ Third p-type source/汲 area

34‧‧‧Select gate

35, 95‧‧‧ erasing gate area

36‧‧‧Floating gate

38‧‧‧n type source/汲 area

39‧‧‧Isolation structure

48‧‧‧p-doped region

92‧‧‧n type source/汲 area

94‧‧‧Double diffusion doped region

Figure 1 is a schematic diagram of a conventional programmable polycrystalline germanium layer non-volatile memory.

2A to 2C are schematic diagrams showing a conventional programmable polycrystalline germanium layer non-volatile memory.

3A to 3D illustrate a first embodiment of a single polycrystalline germanium layer non-volatile memory having a programmable erasable in the present invention.

The substrate structure shown in Fig. 4 is a P-type substrate.

The substrate structure shown in Fig. 5 includes a P-type substrate and a deep N-type well region (DNW).

The substrate structure shown in FIG. 6 includes a fourth p-type region (p4), an n-type barrier layer (NBL), and a P-type substrate.

7A to 7C are diagrams showing a second embodiment of a single polycrystalline germanium layer non-volatile memory with programmable erasable in the present invention.

The substrate structure shown in Fig. 8 includes a P-type substrate and a deep N-type well region (DNW).

The substrate structure shown in FIG. 9 includes a fourth p-type region (p4), an n-type barrier layer (NBL), and a P-type substrate.

Figure 10 shows two biasing methods in the erased state.

Please refer to FIG. 3A to FIG. 3D, which illustrate a first embodiment of a single polycrystalline germanium layer non-volatile memory with programmable erasable in the present invention. its 3A is a top view of the first embodiment; FIG. 3B is a first direction (a1 a2 direction) cross-sectional view of the first embodiment; and FIG. 3C is a second direction (b1 b2 direction of the first embodiment) A cross-sectional view; and, a 3D view is an equivalent circuit diagram of the first embodiment.

As can be seen from FIGS. 3A and 3B, the first embodiment of the present invention includes two series-connected p-type transistors fabricated in an N-type well region (NW). Three p-type source/deuterium regions 31, 32, 33 are included in the N-well region NW, and two polysilicon layers are included above the surface between the three p-type source/deuterium regions 31, 32, 33. The gates 34, 36 are formed.

The first p-type electro-emissive system is used as the selection transistor, the selection gate 34 is connected to a selection gate voltage (V _SG ), and the first p-type source/german region 31 is connected to the source line voltage (V _SL ). Furthermore, the second p-type source/german region 32 can be considered to be interconnected with the p-type drain region of the first p-type transistor and the p-type source region of the second p-type transistor. The second p-type transistor includes a floating gate 36 above it, and a third p-type source/german region 33 is connected to the bit line voltage (V _BL ). The N-type well region (NW) is connected to an N-type well region voltage (V _NW ).

In general, the floating gate 36 and the select gate 34 can serve as a mask during the ion-distribution process of forming the three p-type source/german regions 31, 32, 33, thus in the N-well region. The floating gate 36 and the selection gate 34 above (NW) belong to the p-type gate.

3A and 3C, the first embodiment of the present invention further includes an n-type transistor, or a combination of a floating gate 36 and an erase gate region 35. Components. The n-type transistor is fabricated in a P-type well region (PW). An n-type source/turn region 38 is included in the P-well region (PW). In other words, the erase gate region 35 includes a P-type well region (PW) and an n-type source/turn region 38.

As shown in FIG. 3A, the floating gate 36 extends outwardly and adjacent to the erase gate region 35. Thus, floating gate 36 can be considered a gate of an n-type transistor, while n-type source/german region 38 can be considered to be interconnected with an n-type source region and an n-type drain region. Furthermore, the n-type source/german region 38 is connected to an erase line voltage (V _EL ). The P-type well region (PW) is connected to a P-type well region voltage (V _PW ). Furthermore, it can be seen from FIG. 3C that an isolating structure 39 is formed between the erase gate region 35 and the N-type well region (NW). The isolation structure 39 is, for example, shallow trench isolation (STI). ).

In the ion implantation process of forming the n-type source/german region 38, the floating gate 36 can serve as a mask layer, and thus the floating gate 36 above the erase gate region 35 belongs to the n-type gate.

Further, various different substrate structures and P-type well regions (PW) applied to the first embodiment will be described in detail below. As shown in Fig. 4, the substrate structure is a P-type substrate.

As shown in Fig. 4, the N-type well region (NW) and the P-type well region (PW) of the first embodiment are formed in a P-type substrate. Furthermore, the P-type well regions (PW) include a first p-type region (p1), two second p-type regions (p2), and a third p-type region (p3). Wherein, the doping amount of the second p-type region (p2) is greater than or equal to the doping amount of the first p-type region (p1); and the doping amount of the third p-type region (p3) is greater than or equal to the first p Doping amount of the type region (p1).

Furthermore, the first p-type region (p1) is formed below the surface of the P-shaped substrate and is in contact with the n-type source/german region 38. The third p-type region (p3) is formed below the first p-type region (p1). The first p-type region (p1) and the third p-type region (p3) are surrounded by the second p-type region (p2), and the second p-type region (p2) is formed under the isolation structure 39.

An advantage of the structure of the fourth embodiment of the present invention is that the junction breakdown voltage between the first p-type region (p1) and the n-type source/german region 38 can be increased, so that the present invention can be programmed The erase efficiency of the single polycrystalline germanium layer non-volatile memory will be effectively improved.

Referring to FIG. 5, the substrate structure includes a P-type substrate and a deep N-type well region (DNW). Among them, the deep N-type well region (DNW) is formed in the P-type substrate, and the deep N-type well region (DNW) is connected to the deep N-type well region voltage (V _DNW ).

As shown in Fig. 5, the N-type well region (NW) and P of the first embodiment The well zone (PW) is formed in a deep N-well zone (DNW) in the substrate structure. Furthermore, the P-type well regions (PW) include a first p-type region (p1), two second p-type regions (p2), and a third p-type region (p3). Wherein, the doping amount of the second p-type region (p2) is greater than or equal to the doping amount of the first p-type region (p1); and the doping amount of the third p-type region (p3) is greater than or equal to the first p-type region ( The doping amount of p1).

Furthermore, the first p-type region (p1) is formed below the surface of the substrate structure and is in contact with the n-type source/german region 38. The third p-type region (p3) is formed below the first p-type region (p1). The first p-type region (p1) and the third p-type region (p3) are surrounded by the second p-type region (p2), and the second p-type region (p2) is formed under the isolation structure 39.

A first advantage of the structure of the fifth embodiment of the present invention is that the junction breakdown voltage between the first p-type region (p1) and the n-type source/german region 38 can be increased, so that the present invention has a programmable erasable single The erasing efficiency of the polycrystalline germanium layer non-volatile memory will be effectively improved. In addition, the second advantage is that the second p-type region (p2) can improve the lateral punch through effect between the n-type source/german region 38 and the N-type well region (NW) in the high temperature environment; The triple p-type region (p3) can improve the vertical punch through effect between the n-type source/german region 38 and the deep N-well region (DNW) in a high temperature environment.

Referring to FIG. 6, the substrate structure includes a fourth p-type region (p4), an n-type barrier layer (NBL), and a P-type substrate. The n-type barrier layer is an n-type region. Wherein, an n-type barrier layer (NBL) is formed in the P-type substrate, and the fourth p-type region (p4) is located above the n-type barrier layer (NBL) and is in contact with the n-type barrier layer (NBL).

As shown in Fig. 6, the N-type well region (NW) and the P-type well region (PW) of the first embodiment are formed in the fourth p-type region (p4) in the substrate structure. Furthermore, the P-type well regions (PW) include a first p-type region (p1), two second p-type regions (p2), and a third p-type region (p3). Wherein, the doping amount of the second p-type region (p2) is greater than or equal to the doping amount of the first p-type region (p1); and the doping amount of the third p-type region (p3) is greater than or equal to the first p-type region ( The doping amount of p1). In addition, the fourth p-type region The doping amount of (p4) is equal to the doping amount of the P-type substrate. Alternatively, the doping amount of the fourth p-type region (p4) is greater than or equal to the doping amount of the third p-type region (p3); or the doping amount of the fourth p-type region (p4) is less than or equal to the second p-type region The doping amount of (p2).

Furthermore, the first p-type region (p1) is formed below the surface of the substrate structure and is in contact with the n-type source/german region 38. The third p-type region (p3) is formed below the first p-type region (p1). The first p-type region (p1) and the third p-type region (p3) are surrounded by the second p-type region (p2), and the second p-type region (p2) is formed under the isolation structure 39.

A first advantage of the structure of Fig. 6 of the present invention is that the junction breakdown voltage between the first p-type region (p1) and the n-type source/german region 38 can be increased, so that the present invention has a programmable erasable single The erasing efficiency of the polycrystalline germanium layer non-volatile memory will be effectively improved. In addition, the second advantage is that the second p-type region (p2) can improve the lateral punch through effect between the n-type source/german region 38 and the N-type well region (NW) in the high temperature environment; The triple p-type region (p3) can improve the vertical punch through effect between the n-type source/german region 38 and the n-type barrier layer (NBL) in a high temperature environment. The third advantage is that the fourth p-type region (p4) and the P-type well region (PW) are used to isolate the N-type well region (NW), so that the N-type well region (NW) uses independent bias operation, and thus The voltage stress between the floating gate 36 and the N-type well region (NW) is reduced.

Please refer to FIG. 7A to FIG. 7C, which illustrate a second embodiment of a single polycrystalline germanium layer non-volatile memory with programmable erasable in the present invention. Here, FIG. 7A is a top view of the second embodiment; FIG. 7B is a second direction (b1 b2 direction) cross-sectional view of the second embodiment; and, FIG. 7C is an equivalent circuit diagram of the second embodiment. Since the cross-sectional view of the first direction (a1 a2 direction) is the same as that of the first embodiment, it will not be described again.

As shown in Fig. 7A, a second embodiment of the present invention includes two series-connected p-type transistors fabricated in an N-type well region (NW). Three p-type source/deuterium regions 31, 32, 33 are included in the N-well region NW, and two polysilicon layers are included above the surface between the three p-type source/deuterium regions 31, 32, 33. Gate 34, 36.

The first p-type electro-emissive system is used as the selection transistor, the selection gate 34 is connected to a selection gate voltage (V _SG ), and the first p-type source/german region 31 is connected to the source line voltage (V _SL ). Furthermore, the second p-type source/german region 32 can be considered to be interconnected with the p-type drain region of the first p-type transistor and the p-type source region of the second p-type transistor. The second p-type transistor includes a floating gate 36 above it, and a third p-type source/german region 33 is connected to the bit line voltage (V _BL ). The N-type well region (NW) is connected to an N-type well region voltage (V _NW ).

As can be seen from FIGS. 7A and 7B, the second embodiment of the present invention further includes an n-type transistor fabricated in a P-type well region (PW). The n-type transistor can also be considered as an element comprising a combination of a floating gate 36 and an erase gate region 95. In other words, the erase gate region 95 includes a P-type well region (PW), an n-type source/german region 92, and a double diffused drain (DDD) doped region 94. Of course, the double diffusion drain (DDD) doped region 94 is an n-type region. Furthermore, an n-type source/germanium region 92 and a double-diffused-drain (DDD) doped region 94 are formed in the P-type well region (PW), and the n-type source/german region 92 is formed in the double-diffused drain (DDD) doping. In the miscellaneous area 94. In addition, the reticle used in fabricating the double diffused drain (DDD) doped region 94 can be reused over the etch erase gate region 95 after completing the double diffused drain (DDD) doped region 94. The gate oxide layer. Therefore, the thickness of the gate oxide layer above the erase gate region 95 will be smaller than the gate oxide layer under the floating gate 36. Thus, a lower erase line voltage (V _EL ) can be used in the erase state.

As shown in FIG. 7A, the floating gate 36 extends outwardly and adjacent to the erase gate region 95. Furthermore, the double diffused drain (DDD) doped region 94 and the n-type source/german region 92 can be considered to be interconnected with the n-type source region and the n-type drain region. The P-type well zone (PW) is connected to a P-type well zone voltage (V _PW ). Furthermore, as can be seen from Fig. 7B, the isolation structure 39 is formed between the P-type well region (PW) and the N-type well region (NW).

Further, various different substrate structures and P-type well regions (PW) applied to the second embodiment will be described in detail below. As shown in FIG. 8, the substrate structure includes a P-type substrate and a deep N-type well region (DNW). Among them, the deep N-type well region (DNW) is formed in the P-type substrate, and the deep N-type well region (DNW) is connected to the deep N-type well region voltage (V _DNW ).

As shown in Fig. 8, the N-type well region (NW) and the P-type well region (PW) of the second embodiment are formed in a deep N-type well region (DNW) in the substrate structure. Furthermore, the P-type well regions (PW) include a first p-type region (p1), two second p-type regions (p2), and a third p-type region (p3). Wherein, the doping amount of the second p-type region (p2) is greater than or equal to the doping amount of the first p-type region (p1); and the doping amount of the third p-type region (p3) is greater than or equal to the first p-type region ( The doping amount of p1). The doping amount of the N-type well region (NW) is greater than or equal to the doping amount of the double diffusion drain (DDD) doping region 94; and the doping amount of the first p-type region (p1) is greater than or equal to the double diffusion dipole (DDD) The doping amount of the doping region 94.

Furthermore, the first p-type region (p1) is formed below the surface of the substrate structure and is in contact with the double diffusion drain (DDD) doped region 94. The third p-type region (p3) is formed below the first p-type region (p1). The first p-type region (p1) and the third p-type region (p3) are surrounded by the second p-type region (p2), and the second p-type region (p2) is formed under the isolation structure 39.

A first advantage of the structure of Figure 8 of the present invention is that the junction breakdown voltage between the first p-type region (p1) and the double-diffused drain (DDD) doped region 94 can be increased, so that the present invention is programmable The erase efficiency of the erased single polysilicon layer non-volatile memory will be effectively improved. In addition, a second advantage is that the second p-type region (p2) can improve the side breakdown effect between the double diffusion drain (DDD) doped region 94 and the N-type well region (NW) in a high temperature environment; The type region (p3) can improve the vertical breakdown effect between the double diffused drain (DDD) doped region 94 and the deep N type well region (DNW) in a high temperature environment.

Referring to FIG. 9, the substrate structure includes a fourth p-type region (p4), an n-type barrier layer (NBL), and a P-type substrate. The n-type barrier layer is an n-type region. Wherein, an n-type barrier layer (NBL) is formed in the P-type substrate, and the fourth p-type region (p4) is located above the n-type barrier layer (NBL) and is in contact with the n-type barrier layer (NBL).

As shown in Fig. 9, the N-type well region (NW) and the P-type well region (PW) of the second embodiment are formed in the fourth p-type region (p4) in the substrate structure. Furthermore, P The well zones (PW) include a first p-type region (p1), two second p-type regions (p2), and a third p-type region (p3). Wherein, the doping amount of the second p-type region (p2) is greater than or equal to the doping amount of the first p-type region (p1); and the doping amount of the third p-type region (p3) is greater than or equal to the first p-type region ( The doping amount of p1). In addition, the doping amount of the fourth p-type region (p4) is equal to the doping amount of the P-type substrate. Alternatively, the doping amount of the fourth p-type region (p4) is greater than or equal to the doping amount of the third p-type region (p3); or the doping amount of the fourth p-type region (p4) is less than or equal to the second p-type region The doping amount of (p2).

Furthermore, the first p-type region (p1) is formed below the surface of the substrate structure and is in contact with the double diffusion drain (DDD) doped region 94. The third p-type region (p3) is formed below the first p-type region (p1). The first p-type region (p1) and the third p-type region (p3) are surrounded by the second p-type region (p2), and the second p-type region (p2) is formed under the isolation structure 39.

A first advantage of the structure of the ninth embodiment of the present invention is that the junction breakdown voltage between the first p-type region (p1) and the double-diffused-drain (DDD) doped region 94 can be increased, so that the present invention is programmable. The erase efficiency of the erased single polysilicon layer non-volatile memory will be effectively improved. In addition, the second advantage is that the two second p-type regions (p2) can improve the side breakdown effect between the double diffused drain (DDD) doped region 94 and the N-type well region (NW) in a high temperature environment (lateral Punch through effect); the third p-type region (p3) can improve the vertical punch through effect between the double diffused drain (DDD) doped region 94 and the deep N-type well region (DNW) in a high temperature environment. ). The third advantage is that the fourth p-type region (p4) and the P-type well region (PW) are used to isolate the N-type well region (NW), so that the N-type well region (NW) has independent bias operation, and thus The voltage stress between the floating gate 36 and the N-type well region (NW) is reduced.

Furthermore, when the first embodiment and the second embodiment of the present invention are constructed in the deep N-type well region (DNW) of the substrate structure in FIGS. 5 and 8, a plurality of bias methods can be used for Erase the status. As shown in Fig. 10, there are two kinds of biasing methods. When the first method is applied to the erase state, the source line voltage (V _SL ) and the bit line voltage (V _BL ) are 0V to V _EE , the N type well voltage (V _NW ) and the word line voltage (V) _WL ) and deep N-type well voltage (V _DNW ) is V _EE , erase line voltage (V _EL ) P-type well voltage (V _PW ) is -V _ee . Among them, V _EE is a positive voltage between +6.5V~+20V, and -V _ee is a negative voltage between -6.5V~-20V. Also, the first method exits the hot carrier with the Fowler-Nordhiem (FN) effect.

When the second method is applied to the erase state, the source line voltage (V _SL ) is floating, the bit line voltage (V _BL ) is 0V, the N-type well voltage (V _NW ) and the word line The voltage (V _WL ) and the deep N-type well region voltage (V _DNW ) are V _EE , and the erase line voltage (V _EL ) P-type well region voltage (V _PW ) is -V _ee . Among them, V _EE is a positive voltage between +6.5V~+18V, and -V _ee is a negative voltage between -6.5V~-18V. Moreover, the second method exits the hot carrier with the effect of Hot Hole (HH). The HH effect may be a band-to-band hoe hole (BBHH) effect, a Substrate hoe hole (SHH) effect, and a drain avalanche hoe hole (DAHH). )effect.

As can be seen from the above description, the single polycrystalline germanium layer non-volatile memory of the present invention can improve the disadvantages of the prior art that only ultraviolet light can be used to remove the storage carrier. That is, the present invention can provide a line voltage (VEL) to be erased and change the storage state of the non-volatile memory.

In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

36‧‧‧Floating gate

38‧‧‧n type source/汲 area

39‧‧‧Isolation structure

Claims (14)

A single polycrystalline germanium non-volatile memory with programmable erasability, comprising: a substrate structure; a first p-type transistor comprising a select gate connected to a select gate voltage, a first p-type source / The 汲 region is connected to a source line voltage and a second p-type source/汲 region; a second p-type transistor includes the second p-type source/汲 region, and a third p-type source/汲 region is connected to a one-line voltage, and a floating gate, wherein the first p-type source/turn region, the second p-type source/turn region, and the third p-type source/turn region are formed in an N-type well region And a wiper region adjacent to the floating gate, and the erase gate region includes a P-type well region, a first n-type region, and an n-type source/turn region, the n-type source/汲The region is connected to a wipe line voltage, and the first n-type region is located between the P-type well region and the n-type source/turn region; wherein the P-type well region and the N-type well region are formed on the substrate structure And wherein the P-type well region comprises: a first p-type region formed under the surface of the substrate structure and contacting the first n-type region; a second p-type region; and a third p-type region formed under the first p-type region; and the second p-type regions surround the first p-type region and the third p-type region . A single polycrystalline germanium non-volatile memory having a programmable erasable memory according to the first aspect of the invention, wherein the first n-type region is a double-diffused germanium doped region. The programmable polymorphizable non-volatile memory of the first and second p-type regions, wherein the doping amount of the second p-type region is greater than or equal to the doping amount of the first p-type region. And the doping amount of the third p-type region is greater than or Equal to the doping amount of the first p-type region. The single polycrystalline germanium non-volatile memory with programmable erasable according to claim 1, wherein the substrate structure comprises: a P-type substrate; and a deep N-type well region is formed on the P-shaped substrate The deep N-type well region is in contact with the N-type well region, the second p-type regions, and the third p-type region, and the deep N-type well region is connected to a deep N-type well region voltage. The single polycrystalline germanium non-volatile memory with programmable erasable according to claim 1, wherein the substrate structure comprises: a P-type substrate; and a second n-type region formed on the P-type substrate And a fourth p-type region formed over the second n-type region, wherein the fourth p-type region is in contact with the second n-type region; wherein the fourth p-type region is more in contact with the N-type region a well region, the second p-type regions, and the third p-type region. The single polycrystalline germanium non-volatile memory having the programmable erasable according to claim 5, wherein the fourth p-type region has a doping amount greater than or equal to a doping amount of the P-type substrate. The programmable polymorphizable non-volatile memory of the fourth p-type region, wherein the doping amount of the fourth p-type region is greater than or equal to the doping amount of the third p-type region, as described in claim 5 And the doping amount of the fourth p-type region is less than or equal to the doping amount of the second p-type region. A single polycrystalline non-volatile memory with programmable erasability, including: a substrate structure; a first p-type transistor comprising a select gate connected to a select gate voltage, a first p-type source/turn region connected to a source line voltage and a second p-type source/汲a second p-type transistor including the second p-type source/german region, a third p-type source/german region connected to a one-bit line voltage, and a floating gate, wherein the first p-type a source/汲 region, the second p-type source/汲 region, and the third p-type source/german region are formed in an N-type well region; and a wipe gate region adjacent to the floating gate, and the The erase gate region includes a P-type well region and an n-type source/german region, the n-type source/turn region is connected to a erase line voltage; wherein the P-type well region and the N-type well region are formed on the substrate And wherein the P-type well region includes: a first p-type region formed under the surface of the substrate structure and contacting the n-type source/german region; a plurality of second p-type regions; and, a third p-type region is formed under the first p-type region; and the second p-type regions surround the first p-type region and the third p-type region. The single polycrystalline germanium non-volatile memory of the programmable palladium according to claim 8, wherein the doping amount of the second p-type region is greater than or equal to the doping amount of the first p-type region. And the doping amount of the third p-type region is greater than or equal to the doping amount of the first p-type region. The single polycrystalline germanium non-volatile memory with programmable erasable according to claim 8 , wherein the substrate structure is a P-type substrate, wherein the P-type substrate is in contact with the N-type well region, The second p-type regions and the third p-type regions. As described in item 8 of the patent application, there is a single program that can be erased. The wafer non-volatile memory, wherein the substrate structure comprises: a P-type substrate; and a deep N-type well region is formed in the P-shaped substrate, wherein the deep N-type well region is in contact with the N-type well region, The second p-type regions and the third p-type regions. The single polycrystalline germanium non-volatile memory with programmable erasable according to claim 8, wherein the substrate structure comprises: a P-type substrate; and a second n-type region formed on the P-type substrate And a fourth p-type region formed over the second n-type region, wherein the fourth p-type region is in contact with the second n-type region; wherein the fourth p-type region is more in contact with the N-type region a well region, the second p-type regions, and the third p-type region. The programmable polymorphizable non-volatile memory of claim 12, wherein the fourth p-type region has a doping amount greater than or equal to a doping amount of the P-type substrate. The single polycrystalline germanium non-volatile memory of the programmable practicable region, wherein the doping amount of the fourth p-type region is greater than or equal to the doping amount of the third p-type region. And the doping amount of the fourth p-type region is less than or equal to the doping amount of the second p-type region.