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TWI599679B - Method of forming metal line - Google Patents

Method of forming metal line Download PDF

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Publication number
TWI599679B
TWI599679B TW103114517A TW103114517A TWI599679B TW I599679 B TWI599679 B TW I599679B TW 103114517 A TW103114517 A TW 103114517A TW 103114517 A TW103114517 A TW 103114517A TW I599679 B TWI599679 B TW I599679B
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dyes
photosensitive composition
film layer
metal wire
forming
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TW103114517A
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Chinese (zh)
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TW201540869A (en
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鍾顯政
謝育材
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達興材料股份有限公司
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Priority to TW103114517A priority Critical patent/TWI599679B/en
Priority to CN201510187237.XA priority patent/CN105039939A/en
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Publication of TWI599679B publication Critical patent/TWI599679B/en

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  • Chemically Coating (AREA)

Description

形成金屬導線的方法 Method of forming a metal wire

本發明是有關於一種形成金屬導線的方法,且特別是有關於一種以無電電鍍法形成金屬導線的方法。 This invention relates to a method of forming metal wires, and more particularly to a method of forming metal wires by electroless plating.

觸控面板(touch screen)是一種允許使用者藉由觸碰螢幕而對元件施予控制的裝置;由於它提供了有效、自然、活潑的人機互動界面,目前已在許多電子產品中獲得廣泛應用。 A touch screen is a device that allows a user to control a component by touching the screen; since it provides an effective, natural, and lively human-computer interaction interface, it has been widely used in many electronic products. application.

圖1是一種習知的觸控面板的上視圖。參考圖1,觸控面板10包括基底110,其可區分為顯示區112和周邊區114。多個感應電極E配置在顯示區112中,且相鄰的感應電極E之間透過縱向或橫向的橋接線C電性連接。配置在周邊區114的走線130把各個由感應電極E和橋接線C構成的串列連接到連接部130a,以和外部電路(未繪示)電性連接。其中,橋接線C可以由微細金屬導線製成;感應電極E的材料可能是銦錫氧化物(ITO),或者也可以由微細金屬導線M構成,如圖1的局部放大圖所示。 FIG. 1 is a top view of a conventional touch panel. Referring to FIG. 1, the touch panel 10 includes a substrate 110 that can be divided into a display area 112 and a peripheral area 114. A plurality of sensing electrodes E are disposed in the display region 112, and adjacent sensing electrodes E are electrically connected through the longitudinal or lateral bridge wires C. The traces 130 disposed in the peripheral region 114 connect the series of the sensing electrodes E and the bridge wires C to the connecting portion 130a to be electrically connected to an external circuit (not shown). The bridge wire C may be made of a fine metal wire; the material of the sensing electrode E may be indium tin oxide (ITO), or may be composed of a fine metal wire M, as shown in a partially enlarged view of FIG.

使用微細金屬導線需克服的問題在於,由於金屬材料本身的高反射性質,即使金屬導線的寬度下降到數十微米等級,仍可能被使用者察覺。因此,已有研究者對降低金屬導線可視度的方法進行研究。例如,參照圖2和圖3,這些圖式繪示了已知的兩種降低金屬導線可視度的技術。圖2所示 的技術是先在基底400上形成金屬導線402,再在金屬導線402的表面形成低反射層404;圖3所示的技術則是先在覆蓋板500上形成低反射層504,再在低反射層504上形成金屬導線502,兩者的精神均在於在金屬導線和觀察者的位置之間置入一層低反射層,使金屬導線比較難以察覺。然而,這些技術仍有步驟繁瑣、膜層的尺寸控制不易等問題。 A problem to be overcome with the use of fine metal wires is that, due to the highly reflective nature of the metal material itself, even if the width of the metal wire drops to the tens of microns level, it may be perceived by the user. Therefore, researchers have studied methods for reducing the visibility of metal wires. For example, referring to Figures 2 and 3, these figures illustrate two known techniques for reducing the visibility of metal wires. Figure 2 shows The technique is to first form a metal wire 402 on the substrate 400, and then form a low-reflection layer 404 on the surface of the metal wire 402. The technique shown in FIG. 3 is to first form a low-reflection layer 504 on the cover plate 500, and then in the low-reflection layer. A metal wire 502 is formed on layer 504, both of which are characterized by the placement of a low reflective layer between the metal wire and the observer's position, making the metal wire less noticeable. However, these techniques still have problems such as cumbersome steps and difficulty in controlling the size of the film layer.

本發明提供一種形成金屬導線的方法,可以降低金屬導線的可視度。 The present invention provides a method of forming a metal wire that can reduce the visibility of the metal wire.

本發明的形成金屬導線的方法包括以下步驟。將感光性組合物塗布於基底;使該基底上的該感光性組合物進行UV光照射硬化,形成含有催化劑圖案的膜層;再施以無電電鍍法以形成金屬導線;其中該感光性組合物包括醋酸鈀、低反射率材料、光起始劑、光可聚合單體及/或寡聚物,以及溶劑;且該光可聚合單體及/或寡聚物包括以下兩種成分:N-乙烯吡咯烷酮,以及N-乙烯吡咯烷酮以外的光可聚合單體及/或寡聚物。 The method of forming a metal wire of the present invention comprises the following steps. Applying the photosensitive composition to the substrate; subjecting the photosensitive composition on the substrate to UV light irradiation to form a film layer containing a catalyst pattern; and applying an electroless plating method to form a metal wire; wherein the photosensitive composition Including palladium acetate, a low reflectivity material, a photoinitiator, a photopolymerizable monomer and/or oligomer, and a solvent; and the photopolymerizable monomer and/or oligomer comprises the following two components: N- Vinylpyrrolidone, and photopolymerizable monomers and/or oligomers other than N-vinylpyrrolidone.

在一種實施方式中,該含有催化劑圖案的膜層是對該感光性組合物進行光蝕刻(photolithography)而形成的,或者是以噴墨印刷、膠印、轉印、網版印刷該感光性組合物後進行光硬化而形成的。 In one embodiment, the catalyst layer-containing film layer is formed by photolithography of the photosensitive composition, or is inkjet printing, offset printing, transfer, screen printing of the photosensitive composition. It is formed by photohardening.

在一種實施方式中,該低反射率材料為對可見光的反射率在80%以下的材料。 In one embodiment, the low reflectivity material is a material having a reflectance to visible light of less than 80%.

在一種實施方式中,該低反射材料包括碳黑;鉻、鈦或鋯的單氮化物或單氧化物;或前述材料的組合。 In one embodiment, the low reflective material comprises carbon black; a single nitride or monooxide of chromium, titanium or zirconium; or a combination of the foregoing.

在一種實施方式中,該低反射率材料包括偶氮染料(azo dyes)、蒽醌染料(anthraquinone dyes)、酞菁染料(phthalocyanine dyes)、醌亞胺染料(quinoneimine dyes)、喹啉染料(quinoline dyes)、硝基染料(nitro dyes)、羰基染料(carbonyl dyes)、次甲基染料(methine dyes)或其組合。 In one embodiment, the low reflectivity material comprises azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes (quinoline) Dyes), nitro dyes, carbonyl dyes, methine dyes, or combinations thereof.

在一種實施方式中,所述以無電電鍍法形成該金屬導線的步驟包括無電鍍銅、無電鍍銀或前述兩者的組合。 In one embodiment, the step of forming the metal wire by electroless plating comprises electroless copper plating, electroless silver plating, or a combination of the two.

本發明的觸控顯示裝置的製造方法包括前述形成金屬導線的方法。 A method of manufacturing a touch display device of the present invention includes the aforementioned method of forming a metal wire.

本發明的觸控顯示裝置由前述觸控顯示裝置的製造方法製成。 The touch display device of the present invention is fabricated by the method of manufacturing the touch display device.

基於上述,本發明的技術方案可以透過簡單的程序製作出可視度低的金屬導線,使觸控面板具有更好的表現能力。 Based on the above, the technical solution of the present invention can produce a metal wire with low visibility through a simple program, so that the touch panel has better performance capability.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例作詳細說明如下。 The above described features and advantages of the present invention will be more apparent from the following description.

10‧‧‧觸控面板 10‧‧‧Touch panel

100、110‧‧‧基底 100, 110‧‧‧ base

112‧‧‧顯示區 112‧‧‧ display area

114‧‧‧周邊區 114‧‧‧The surrounding area

130‧‧‧走線 130‧‧‧Wiring

130a‧‧‧連接部 130a‧‧‧Connecting Department

200‧‧‧感光性組合物 200‧‧‧Photosensitive composition

201‧‧‧膜層 201‧‧‧ film layer

301‧‧‧經無電鍍後的膜層 301‧‧ ‧ electroless plating

302、402、502‧‧‧金屬導線 302, 402, 502‧‧‧Metal wires

304‧‧‧低反射材料 304‧‧‧Low reflective material

306‧‧‧其他成分 306‧‧‧Other ingredients

404、504‧‧‧低反射層 404, 504‧‧‧ low reflection layer

C‧‧‧橋接線 C‧‧‧Bridge wiring

E‧‧‧感應電極 E‧‧‧Induction electrode

M‧‧‧微細金屬導線 M‧‧‧Micro metal wire

圖1是一種習知的觸控面板的上視圖。 FIG. 1 is a top view of a conventional touch panel.

圖2和圖3呈現習知的兩種金屬導線和低反射層結合的態樣。 Figures 2 and 3 show the combination of two conventional metal wires and a low reflection layer.

圖4是根據本發明第一實施方式所繪示的形成金屬導線的流程。 4 is a flow chart of forming a metal wire according to a first embodiment of the present invention.

在本文中,由「一數值至另一數值」表示的範圍,是一種避免在說明書中一一列舉該範圍中的所有數值的概要性表示方式。因此,記載了 某一特定數值範圍,等同於揭露了該數值範圍內的任意數值以及由該數值範圍內的任意數值界定出的較小數值範圍,如同在說明書中明文寫出該任意數值和該較小數值範圍一樣。例如,記載「尺寸為10~100μm」的範圍,就等同於揭露了「尺寸為20μm~50μm」的範圍,無論說明書中是否列舉其他數值。 In the present specification, the range represented by "a value to another value" is a schematic representation that avoids enumerating all the values in the range in the specification. Therefore, it is recorded A particular range of values is equivalent to the disclosure of any value in the range of values and the range of values defined by any value in the range of values, as in the specification. same. For example, the description of the range of "10 to 100 μm in size" is equivalent to exposing the range of "20 μm to 50 μm in size", regardless of whether other values are listed in the specification.

圖4繪示了形成金屬導線的流程。以下將參照圖4來說明本發明的其中一種實施方式的各項細節。 Figure 4 illustrates the flow of forming a metal wire. Details of one of the embodiments of the present invention will be described below with reference to FIG.

在此實施方式中,形成金屬導線的方法包括以下步驟。 In this embodiment, the method of forming a metal wire includes the following steps.

首先,將感光性組合物200塗布於基底100。此處,基底100的材料不受特別限制。若以製造觸控顯示裝置為例,可以是適於該目的的任意透明材料,例如玻璃或塑膠材料;其中塑膠材料又可列舉聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、聚萘二甲酸乙二醇酯(polyethylene naphthalate,PEN)和聚碳酸酯(polycarbonate)等實例。此外,基底100可以是硬質基底,也可以具有可撓性。 First, the photosensitive composition 200 is applied to the substrate 100. Here, the material of the substrate 100 is not particularly limited. For example, in the manufacture of a touch display device, any transparent material suitable for the purpose, such as a glass or a plastic material, wherein the plastic material is polyethylene terephthalate (PET) or polynaphthalene. Examples of polyethylene naphthalate (PEN) and polycarbonate (polycarbonate). Further, the substrate 100 may be a rigid substrate or may have flexibility.

感光性組合物200是可以透過照射UV光而硬化(cure),並在其中生成用於無電電鍍的催化劑的組合物;且較佳是藉由照UV光就得以將其內含成分轉變為催化劑的組合物。就此而言,感光性組合物200包括醋酸鈀(化學式Pd(O2CCH3)2,或Pd(OAc)2)、光起始劑、光可聚合單體及/或寡聚物,以及溶劑。 The photosensitive composition 200 is a composition which can be cured by irradiation of UV light and in which a catalyst for electroless plating is formed; and it is preferred to convert its contents into a catalyst by irradiation of UV light. Compositions. In this regard, the photosensitive composition 200 includes palladium acetate (chemical formula Pd(O 2 CCH 3 ) 2 , or Pd(OAc) 2 ), a photoinitiator, a photopolymerizable monomer and/or an oligomer, and a solvent. .

醋酸鈀可以任意形式加入感光性組合物200中,例如添加呈粉體狀態或膠體粒子狀態的醋酸鈀。 Palladium acetate may be added to the photosensitive composition 200 in any form, for example, palladium acetate in a state of a powder or a colloidal particle.

光起始劑不受特別限制,只要具有起始光可聚合化合物之聚合的能力即可,其實例包括:Ciba公司的產品Darocur 1173(2-hydroxy-2-methyl-1-phenyl-propan-1-one,2-羥基-2-甲基-1-苯基-1-丙 酮);BASF公司的產品Irgacure 184(1-hydroxy-cyclohexyl-phenyl-ketone,1-羥基環己基苯基甲酮)、Irgacure 369(2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone,2-芐基-2-二甲基氨基-1-(4-嗎啉苯基)丁酮)、Irgacure 651(2,2-dimethoxy-1,2-diphenylethan-1-one,安息香雙甲醚)、Irgacure 2959(1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propane-1-one,2-羥基-4'-(2-羥乙氧基)-2-甲基苯丙酮)、Irgacure 819(phenyl bis(2,4,6-trimethylbenzoyl)phosphine oxide,苯基雙(2,4,6-三甲基苯甲醯基)氧化膦)、Irgacure 1700(25%的雙(2,6-二甲氧基苯甲醯基)(2,4,4-三甲基戊基)氧化膦及75%的2-羥基-2-甲基-1-苯基-1-丙酮的混合物;Mixture of 25% bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethyl pentyl)phosphineoxide and 75% 2-hydroxy-2-methyl-1-phenyl-propan-1-one))、Irgacure TPO(diphenyl(2,4,6-trimethylbenzoyl)-phosphineoxide,(2,4,6-三甲基苯甲醯基)二苯基氧化膦)。可以單獨使用一種光起始劑,或將兩種以上光起始劑混合使用。 The photoinitiator is not particularly limited as long as it has the ability to initiate polymerization of the photopolymerizable compound, and examples thereof include: Ciba's product Darocur 1173 (2-hydroxy-2-methyl-1-phenyl-propan-1) -one, 2-hydroxy-2-methyl-1-phenyl-1-propene Ketone); product of Irfaacure 184 (1-hydroxy-cyclohexyl-phenyl-ketone, 1-hydroxycyclohexyl phenyl ketone), Irgacure 369 (2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)- 1-butanone, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butanone, Irgacure 651 (2,2-dimethoxy-1,2-diphenylethan-1-one, benzoin Dimethyl ether), Irgacure 2959 (1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propane-1-one, 2-hydroxy-4'-(2-hydroxyethyl) Oxy)-2-methylpropiophenone), Irgacure 819 (phenyl bis(2,4,6-trimethylbenzoyl)phosphine oxide, phenylbis(2,4,6-trimethylbenzylidene)phosphine oxide) Irgacure 1700 (25% bis(2,6-dimethoxybenzylidene) (2,4,4-trimethylpentyl)phosphine oxide and 75% 2-hydroxy-2-methyl- Mixture of 1-phenyl-1-propanone; Mixture of 25% bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethyl pentyl)phosphineoxide and 75% 2-hydroxy-2-methyl-1-phenyl- Propan-1-one)), Irgacure TPO (diphenyl(2,4,6-trimethylbenzoyl)-phosphineoxide, (2,4,6-trimethylbenzylidene)diphenylphosphine oxide). A photoinitiator may be used alone or in combination of two or more photoinitiators.

光可聚合單體及/或寡聚物包括以下兩種成分:第一成分是N-乙烯吡咯烷酮,第二成分則包括N-乙烯吡咯烷酮以外的光可聚合單體及/或寡聚物。 The photopolymerizable monomer and/or oligomer comprises the following two components: the first component is N-vinylpyrrolidone, and the second component comprises a photopolymerizable monomer and/or oligomer other than N-vinylpyrrolidone.

在感光性組合物200受UV光照而硬化時,第一成分和第二成分會在光起始劑的作用下進行聚合反應,兩者共同構成光硬化產物(膜層201,請見圖4和0030段起始的說明)的聚合物基質,而催化劑散布於其中,其所需的UV照射能量密度為1500-10000J/cm2When the photosensitive composition 200 is hardened by UV light, the first component and the second component are subjected to polymerization under the action of a photoinitiator, and the two together constitute a photohardening product (film layer 201, see FIG. 4 and The polymer matrix of the initial description of 0030, in which the catalyst is interspersed, has a UV energy density of 1500-10000 J/cm 2 .

第二成分可以是會受光起始劑的催化而開始進行聚合反應的單體及/或寡聚物,其材料可以是本發明所屬技術領域中所知的光可聚合單體 及/或寡聚物,且又不屬於N-乙烯吡咯烷酮者,如單官能、雙官能、三官能、四官能或六官能化合物。單官能化合物如丙烯酸異莰酯(Isobornylacrylate,IBOA,如Sartomer的SR506D)、辛基/癸基丙烯酸酯(Octyl decyl acrylate,ODA,如Sartomer的SR484)、丙烯酸己內酯(Caprolactone acrylatem如Sartomer的SR495)或丙烯酸十二烷酯(Lauryl acrylate,如Sartomer的SR335)。雙官能化合物如三丙二醇二丙烯酸酯(Tripropylene glycol diacrylate,TPGDA,如AKZO Nobel Resins的Actilane 424)、1,6-己二醇二丙烯酸酯(1,6-hexanediol diacrylate,HDDA,如AKZO Nobel Resins的Actilane 425)、二丙二醇二丙烯酸酯(Dipropylene glycol diacrylate,DPGDA,如Sartomer的SR508)、丙氧化(2)新戊二醇二丙烯酸酯(Propoxylated(2)neopentyl glycol diacrylate,PONPGDA,如Sartomer的SR9003)、三環癸烷二甲醇二丙烯酸酯(Tricyclodecanedimethanol diacrylate,TCDDMDA,如Sartomer的SR833S)或聚乙二醇(400)二丙烯酸酯(Polyethylene glycol 400 diacrylate,PEG400DA,如Sartomer的SR344)。三官能化合物如三羥甲基丙烷三丙烯酸酯(trimethylol propane triacrylate,TMPTA,如AKZO Nobel Resins的Actilane 431)、乙氧化(3)三羥甲基丙烷三丙烯酸酯(ethoxylated(3)trimethylol propane triacrylate,如Sartomer的SR454)或乙氧化(6)三羥甲基丙烷三丙烯酸酯(ethoxylated(6)trimethylol propane triacrylate,如Sartomer的SR499)。四官能化合物,如四官能基聚酯丙烯酸酯低聚物(tetrafunctional polyester acrylate oligomer,如AKZO Nobel Resins的Actilane505)、乙氧化季戊四醇四丙烯酸酯(ethoxylated pentaerythritol tetraacrylate,PPTTA,如AKZO Nobel Resins的Actilane 440)或雙-三羥甲基丙烷四丙烯酸酯(ditrimethylolpropane tetraacrylate,di TMPTA,如AKZO Nobel Resins的Actilane 44)。六官能化合物如二季戊 四醇六丙烯酸酯(dipentaerythritol hexaacrylate,DPHA,如AKZO Nobel Resins的Actilane 450)。 The second component may be a monomer and/or an oligomer which is subjected to polymerization by a photocatalyst, and the material may be a photopolymerizable monomer known in the art to which the present invention pertains. And/or oligomers, and not belonging to N-vinylpyrrolidone, such as monofunctional, difunctional, trifunctional, tetrafunctional or hexafunctional compounds. Monofunctional compounds such as Isobornylacrylate (IBOA, such as SR506D from Sartomer), Octyl decyl acrylate (ODA, such as Sartomer's SR484), Caprolactone acrylatem (Sartomer's SR495) ) or Lauryl acrylate (such as Sartomer's SR335). Bifunctional compounds such as Tripropylene glycol diacrylate (TPGDA, such as Actilane 424 from AKZO Nobel Resins), 1,6-hexanediol diacrylate (HDDA), such as AKZO Nobel Resins Actilane 425), Dipropylene glycol diacrylate (DPGDA, such as Sartomer's SR508), Propoxylated (2) neopentyl glycol diacrylate (PONPGDA, such as Sartomer's SR9003) , Tricyclodecanedimethanol diacrylate (TCDDMDA, such as Sartomer's SR833S) or polyethylene glycol (400) diacrylate (PEG400DA, such as Sartomer's SR344). Trifunctional compounds such as trimethylol propane triacrylate (TMPTA, such as Actilane 431 of AKZO Nobel Resins), ethoxylated (3) trimethylol propane triacrylate, Such as Sartomer's SR454) or ethoxylated (6) trimethylol propane triacrylate (such as Sartomer's SR499). Tetrafunctional compounds, such as tetrafunctional polyester acrylate oligomers (such as Actilane 505 from AKZO Nobel Resins), ethoxylated pentaerythritol tetraacrylate (PPTTA, such as Actilane 440 from AKZO Nobel Resins) Or ditrimethylolpropane tetraacrylate (di TMPTA, such as Actilane 44 from AKZO Nobel Resins). Hexafunctional compound Dipentaerythritol hexaacrylate (DPHA, such as Actilane 450 from AKZO Nobel Resins).

溶劑不受特別限制,其可以是本發明所屬技術領域中所知的任意一種適於分散溶解感光性組合物200的各種成分的溶劑,如甲乙酮(methylethylketone)、乙腈、乙酸乙酯、氯仿、二丙酮醇(diacetone alcohol)、3-甲氧基丙醇(3-methoxy propanol)、甲苯(toluene)、乳酸乙酯(ethyl lactate)、甲基溶纖素(methylcellosolve)、乙基溶纖素(ethylcellosolve)、丙基溶纖素(propylcellosolve)、乙二醇二甲醚(ethylene glycol dimethylether)、乙二醇二乙醚(ethylene glycol diethylether)、乙二醇甲乙醚(ethylene glycol methylethylether)、丙二醇二甲醚(propylene glycol dimethylether)、丙二醇二乙醚(propylglycol diethylether)、丙二醇甲乙醚(propylene glycol methylethylether)、2-乙氧基丙醇(2-ethoxypropanol)、2-甲氧基丙醇(2-methoxypropanol)、3-甲氧基丁醇(3-methoxybutanol)、環戊酮(cyclopentanone)、環己酮(cyclohexanone)、丙二醇甲醚醋酸酯(propyleneglycol methylether acetate,PGMEA)、丙二醇乙醚醋酸酯(propyleneglycol ethylether acetate)、3-甲氧基丁基乙酸酯(3-methoxybutyl acetate)、3-乙氧基丙酸乙酯(ethoxyethylpropionate,EEP)、乙基3-乙氧基丙酸酯(ethyl 3-ethoxy propionate)、乙基溶纖素醋酸酯(ethyl cellosolve acetate)、甲基溶纖素醋酸酯(methyl cellosolve acetate)、乙酸丁酯(butyl acetate)或二丙二醇單甲醚(dipropylene glycol monomethylether)。可以單獨使用一種溶劑,或組合使用兩種以上的溶劑。 The solvent is not particularly limited, and may be any solvent suitable for dispersing and dissolving various components of the photosensitive composition 200, such as methylethylketone, acetonitrile, ethyl acetate, chloroform, and the like, which are known in the art to which the present invention pertains. Diacetone alcohol, 3-methoxy propanol, toluene, ethyl lactate, methylcellosolve, ethylcellosolve ), propylcellosolve, ethylene glycol dimethylether, ethylene glycol diethylether, ethylene glycol methylethylether, propylene glycol dimethyl ether Propylene glycol dimethylether), propylglycol diethylether, propylene glycol methylethylether, 2-ethoxypropanol, 2-methoxypropanol, 3- 3-methoxybutanol, cyclopentanone, cyclohexanone, propyleneglycol methylether acetate, PGMEA), propyleneglycol ethylether acetate, 3-methoxybutyl acetate, ethoxyethylpropionate (EEP), ethyl 3-B Ethyl 3-ethoxy propionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate or dipropylene glycol Dipropylene glycol monomethylether. One solvent may be used alone or two or more solvents may be used in combination.

除了前述各成分以外,感光性組合物200還包括低反射率材料。所謂「低反射率」材料,指對可見光的反射率在80%以下的材料,其可以是無機或有機材料,例如碳黑;鉻、鈦或鋯的單氮化物或單氧化物;偶氮 染料(azo dyes);蒽醌染料(anthraquinone dyes);酞菁染料(phthalocyanine dyes);醌亞胺染料(quinoneimine dyes);喹啉染料(quinoline dyes);硝基染料(nitro dyes);羰基染料(carbonyl dyes);次甲基染料(methine dyes)或其組合。 In addition to the foregoing components, the photosensitive composition 200 further includes a low reflectance material. The "low reflectance" material means a material having a reflectance of visible light of 80% or less, which may be an inorganic or organic material such as carbon black; a mono-nitride or a mono-oxide of chromium, titanium or zirconium; azo Azo dyes; anthraquinone dyes; phthalocyanine dyes; quinoneimine dyes; quinoline dyes; nitro dyes; carbonyl dyes Carbonyl dyes); methine dyes or combinations thereof.

前述感光性組合物200中各種成分的比例,原則上沒有特別限制,在配製感光性組合物200時,可視以下要素來調整其相對比例,如:溶劑對各成分的分散溶解能力、光起始劑促使光可聚合單體及/或寡聚物進行聚合反應的能力、膜層201對基底100的附著力和其中的催化劑對隨後的無電電鍍的催化能力之間的權衡等等。 The ratio of the various components in the photosensitive composition 200 is not particularly limited in principle. When the photosensitive composition 200 is prepared, the relative proportions thereof may be adjusted according to the following factors, such as the solvent dispersing ability of each component, and the light initiation. The trade-off between the ability of the photopolymerizable monomer and/or oligomer to polymerize, the adhesion of the film layer 201 to the substrate 100, and the catalytic ability of the catalyst to subsequent electroless plating, and the like.

如圖4所示,接著,使基底100上的感光性組合物200進行光硬化,形成含有催化劑圖案的膜層201。在進行光硬化之前,也可以對感光性組合物200進行烘烤。 As shown in FIG. 4, the photosensitive composition 200 on the substrate 100 is then photocured to form a film layer 201 containing a catalyst pattern. The photosensitive composition 200 may also be baked before photocuring.

作為催化劑前驅體而存在於感光性組合物200中的醋酸鈀在UV光的照射下可以還原成金屬鈀,在下一階段無電電鍍步驟中作為催化劑。 The palladium acetate present as the catalyst precursor in the photosensitive composition 200 can be reduced to metallic palladium under irradiation of UV light, and serves as a catalyst in the next electroless plating step.

再者,需說明的是,圖4是將感光性組合物200繪示成圖案化的態樣,這種實施方式可以是透過以噴墨印刷、膠印、轉印、網版印刷感光性組合物200來進行的。在塗布感光性組合物200之後,只要使它照UV光硬化,即形成膜層201。在這種實施方式中,最初塗布在基底100上時,感光性組合物200的寬度可以在0.5μm到50μm之間。當然,本發明也可藉由其他實施方式實現,例如塗布一層完整覆蓋基底100表面的感光性組合物,再進行曝光、顯影等光蝕刻步驟,而形成圖案化的膜層201。 In addition, it should be noted that FIG. 4 illustrates the photosensitive composition 200 as a patterned state, and this embodiment may be through inkjet printing, offset printing, transfer, screen printing photosensitive composition. 200 to carry out. After the photosensitive composition 200 is applied, the film layer 201 is formed as long as it is cured by UV light. In this embodiment, the photosensitive composition 200 may have a width of between 0.5 μm and 50 μm when initially coated on the substrate 100. Of course, the present invention can also be realized by other embodiments, for example, coating a photosensitive composition that completely covers the surface of the substrate 100, and then performing a photolithography step such as exposure, development, etc., to form the patterned film layer 201.

如圖4所示,接著,再施以無電電鍍法以形成包括金屬導線302的膜層301。具體作法例如是將表面上形成有膜層201的基底100浸入含金屬鹽類的電鍍液中,藉由催化劑的作用,使金屬離子還原在膜層201中的 鈀位置。在本實施方式中,無電電鍍步驟可以是無電鍍銅、無電鍍銀或前述兩者的組合,換言之,所得的金屬導線302可以是銅導線、銀導線或具有銅銀多層膜結構的導線。關於無電鍍銀的詳細條件,可以參考歐洲專利公開號EP 0292087的內容;關於無電鍍銅的詳細條件,可以參考國際專利公開號WO 2012140428的內容,該案也涉及感光性組合物的成分,讀者可一併參考之。申請人在此將前述兩案的整體內容援引加入本文,使其可作為說明與修改本文的依據。 As shown in FIG. 4, an electroless plating method is then applied to form a film layer 301 including metal wires 302. Specifically, for example, the substrate 100 having the film layer 201 formed on the surface thereof is immersed in a plating solution containing a metal salt, and the metal ions are reduced in the film layer 201 by the action of the catalyst. Palladium position. In the present embodiment, the electroless plating step may be electroless copper plating, electroless silver plating, or a combination of the two, in other words, the resulting metal wire 302 may be a copper wire, a silver wire, or a wire having a copper-silver multilayer film structure. For details on the conditions of electroless silver plating, reference is made to the contents of European Patent Publication No. EP 0292087; for detailed conditions of electroless copper plating, reference is made to the content of International Patent Publication No. WO 2012140428, which also relates to the composition of photosensitive compositions, the reader Can be referred to together. The Applicant hereby incorporates the entire contents of the foregoing two examples, which are hereby incorporated by reference.

膜層301的厚度在100nm到2μm之間,其寬度在0.5μm到50μm之間。 The film layer 301 has a thickness of between 100 nm and 2 μm and a width of between 0.5 μm and 50 μm.

具體而言,膜層301包括金屬導線302和低反射材料304。其中,金屬導線302是由無電電鍍所沈積的金屬,低反射材料304則是0028段記載的該些低反射材料中的一種。當然,膜層301中還可以包括其他成分306,例如保留在基底100上的光聚合產物。如前文所述,當感光性組合物200受UV光照射時,內含的第一成分和第二成分會進行聚合反應,形成膜層201的聚合物基質。然而,第一成分(N-乙烯吡咯烷酮)是親水性的,因此膜層201在進行無電電鍍時會膨潤,在膜層201內產生一些與外部連通的空間,使電鍍液能夠進入膜層201的內部,與催化劑接觸並沈積金屬。 Specifically, the film layer 301 includes a metal wire 302 and a low reflection material 304. Wherein, the metal wire 302 is a metal deposited by electroless plating, and the low reflection material 304 is one of the low reflection materials described in paragraph 0028. Of course, other components 306, such as photopolymerizable products remaining on the substrate 100, may also be included in the film layer 301. As described above, when the photosensitive composition 200 is irradiated with UV light, the contained first component and second component undergo polymerization to form a polymer matrix of the film layer 201. However, the first component (N-vinylpyrrolidone) is hydrophilic, so that the film layer 201 swells when electroless plating is performed, and some space communicating with the outside is generated in the film layer 201, so that the plating solution can enter the film layer 201. Internally, it contacts the catalyst and deposits metal.

此外,低反射材料304能夠降低最後得到的金屬導線302的可視程度,藉此,本實施方式的形成金屬導線的方法適用於觸控顯示裝置的製作,可以提高觸控顯示裝置的顯示品質。基於此理由,本發明也涉及一種觸控顯示裝置的製造方法及由該方法獲得的觸控顯示裝置。 In addition, the low-reflection material 304 can reduce the visibility of the metal lead 302 obtained. Therefore, the method for forming the metal wire in the embodiment is suitable for the production of the touch display device, and the display quality of the touch display device can be improved. For this reason, the present invention also relates to a method of manufacturing a touch display device and a touch display device obtained by the method.

本發明提供的觸控顯示裝置的製造方法的特徵在於,使用了第一實施方式中的形成金屬導線的方法,至於其他步驟、材料則可以由已知的技術中任意選擇。簡言之,觸控顯示裝置的製造方法包括在透明基底上形 成金屬導線、在透明保護層上形成金屬導線(此二步驟中至少一者使用了第一實施方式的方法),以及藉由絕緣黏著層接合透明保護層和透明基底的步驟。 The method of manufacturing a touch display device according to the present invention is characterized in that the method of forming a metal wire in the first embodiment is used, and other steps and materials can be arbitrarily selected from known techniques. In short, a method of manufacturing a touch display device includes forming a transparent substrate Forming a metal wire, forming a metal wire on the transparent protective layer (at least one of the two steps uses the method of the first embodiment), and bonding the transparent protective layer and the transparent substrate by an insulating adhesive layer.

綜上所述,本發明提供一種形成金屬導線的方法、使用該方法的觸控顯示裝置的製造方法,以及由此獲得的觸控顯示裝置,可以透過簡單的程序製作出可視度低的金屬導線,使觸控面板具有更好的表現能力。 In summary, the present invention provides a method of forming a metal wire, a method of manufacturing the touch display device using the same, and a touch display device obtained thereby, which can produce a metal wire with low visibility through a simple program. To make the touch panel have better performance.

雖然已以實施例對本發明作說明如上,然而,其並非用以限定本發明。任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍的前提內,當可作些許的更動與潤飾。故本申請案的保護範圍當以後附的申請專利範圍所界定者為準。 Although the present invention has been described above by way of examples, it is not intended to limit the invention. Any changes and modifications may be made without departing from the spirit and scope of the invention. Therefore, the scope of protection of this application is subject to the definition of the scope of the patent application attached.

100‧‧‧基底 100‧‧‧Base

200‧‧‧感光性組合物 200‧‧‧Photosensitive composition

201‧‧‧膜層 201‧‧‧ film layer

301‧‧‧經無電鍍後的膜層 301‧‧ ‧ electroless plating

302‧‧‧金屬導線 302‧‧‧Metal wire

304‧‧‧低反射材料 304‧‧‧Low reflective material

306‧‧‧其他成分 306‧‧‧Other ingredients

Claims (8)

一種形成金屬導線的方法,包括將感光性組合物塗布於基底;使該基底上之該感光性組合物進行UV光硬化,形成一含有催化劑圖案之膜層;再施以無電電鍍法以形成金屬導線;其中該感光性組合物包括醋酸鈀(Palladium acetate)、低反射率材料、光起始劑、光可聚合單體及/或寡聚物,和溶劑,且該光可聚合單體及/或寡聚物包括:N-乙烯吡咯烷酮,以及N-乙烯吡咯烷酮以外的光可聚合單體及/或寡聚物,其中該含有催化劑圖案之膜層中的催化劑為鈀,且是藉由UV光照射醋酸鈀而形成。 A method of forming a metal wire comprising: applying a photosensitive composition to a substrate; subjecting the photosensitive composition on the substrate to UV light curing to form a film layer containing a catalyst pattern; and applying an electroless plating method to form a metal a wire; wherein the photosensitive composition comprises Palladium acetate, a low reflectivity material, a photoinitiator, a photopolymerizable monomer and/or an oligomer, and a solvent, and the photopolymerizable monomer and/or Or the oligomer comprises: N-vinylpyrrolidone, and a photopolymerizable monomer and/or oligomer other than N-vinylpyrrolidone, wherein the catalyst in the catalyst layer-containing film layer is palladium and is UV light It is formed by irradiating palladium acetate. 如申請專利範圍第1項所述之方法,其中該含有催化劑圖案之膜層是對該感光性組合物進行光蝕刻而形成的,或者是以噴墨印刷、膠印、轉印、網版印刷該感光性組合物後進行UV光硬化而形成的。 The method of claim 1, wherein the film layer containing the catalyst pattern is formed by photolithography of the photosensitive composition, or by inkjet printing, offset printing, transfer printing, screen printing. The photosensitive composition is formed by UV-curing. 如申請專利範圍第1項所述之方法,其中該低反射率材料為對可見光的反射率在80%以下的材料。 The method of claim 1, wherein the low reflectance material is a material having a reflectance of visible light of 80% or less. 如申請專利範圍第1項所述之方法,其中該低反射材料包括碳黑;鉻、鈦或鋯的單氮化物或單氧化物;或前述材料的組合。 The method of claim 1, wherein the low reflective material comprises carbon black; a single nitride or monooxide of chromium, titanium or zirconium; or a combination of the foregoing. 如申請專利範圍第1項所述之方法,其中該低反射率材料包括偶氮染料(azo dyes)、蒽醌染料(anthraquinone dyes)、酞菁染料(phthalocyanine dyes)、醌亞胺染料(quinoneimine dyes)、喹啉染料(quinoline dyes)、硝基染料(nitro dyes)、羰基染料(carbonyl dyes)、次甲基染料(methine dyes)或其組合。 The method of claim 1, wherein the low reflectivity material comprises azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes. ), quinoline dyes, nitro dyes, carbonyl dyes, methine dyes, or combinations thereof. 如申請專利範圍第1項所述之方法,其中所述以無電電鍍法形成該 金屬導線的步驟包括無電鍍銅、無電鍍銀或前述兩者的組合。 The method of claim 1, wherein the forming is performed by electroless plating The steps of the metal wires include electroless copper plating, electroless silver plating, or a combination of the two. 一種觸控顯示裝置的製造方法,包括申請專利範圍第1項至第6項中任一項所述的形成金屬導線的方法。 A method of manufacturing a touch display device, comprising the method of forming a metal wire according to any one of claims 1 to 6. 一種觸控顯示裝置,由申請專利範圍第7項所述的觸控顯示裝置的製造方法製成。 A touch display device is manufactured by the method for manufacturing a touch display device according to claim 7.
TW103114517A 2014-04-22 2014-04-22 Method of forming metal line TWI599679B (en)

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