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TWI570160B - Epoxy silicone resin and a hardened resin composition using the same - Google Patents

Epoxy silicone resin and a hardened resin composition using the same Download PDF

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TWI570160B
TWI570160B TW101132159A TW101132159A TWI570160B TW I570160 B TWI570160 B TW I570160B TW 101132159 A TW101132159 A TW 101132159A TW 101132159 A TW101132159 A TW 101132159A TW I570160 B TWI570160 B TW I570160B
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epoxy
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resin
general formula
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TW201410743A (en
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長谷修一郎
高島智行
谷口裕一
尼拉真 庫馬 歇里斯他
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新日鐵住金化學股份有限公司
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Description

環氧聚矽氧樹脂及使用其之硬化性樹脂組成物 Epoxy polyoxyn resin and curable resin composition using the same

本發明係有關具有環狀矽氧烷鍵結之環氧聚矽氧樹脂,及以其為必須成分之具有優良光學特性、硬度、彎曲特性、耐熱著色性、耐光著色性之熱硬化性樹脂組成物,特別是有關適用於電子材料領域及光半導體材料領域之熱硬化性樹脂組成物。 The present invention relates to an epoxy polyoxyxene resin having a cyclic siloxane coupling, and a thermosetting resin composition having excellent optical properties, hardness, bending property, heat resistance coloring property, and light coloring resistance as essential components thereof. In particular, it relates to a thermosetting resin composition suitable for use in the field of electronic materials and in the field of optical semiconductor materials.

環氧樹脂因具有優良電特性、接合性、耐熱性等,故主要使用於塗料領域、土木領域、電器領域等多數用途,特別是苯酚A型二縮水甘油醚、雙酚F型二縮水甘油醚、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂等之芳香族環氧樹脂為,具有優良耐水性、接合性、機械物性、耐熱性、電絕緣性、經濟性等而被廣泛使用於組合各種硬化劑。但該等樹脂因含有芳香環,故易因紫外線等而變質,故於要求耐候性、耐光性之領域內使用上受限。 Epoxy resin is mainly used in many fields such as coatings, civil engineering, and electrical appliances because of its excellent electrical properties, bonding properties, heat resistance, etc., especially phenol A diglycidyl ether and bisphenol F diglycidyl ether. An aromatic epoxy resin such as a phenol novolak type epoxy resin or a cresol novolac type epoxy resin is widely used for excellent water resistance, bonding property, mechanical properties, heat resistance, electrical insulation properties, economy, and the like. Used to combine various hardeners. However, since these resins contain an aromatic ring, they are easily deteriorated by ultraviolet rays or the like, and thus are limited in use in fields requiring weather resistance and light resistance.

有關環氧樹脂組成物,其硬化物具有較高之硬度,故具有優良處理性,於低輸出力之白色LED密封用途可得必要之耐久性,因此多半使用於低輸出力用途。但於高輸出力LED中,易因增加發光量及發熱量而發生變色,故缺點為難得到充分之壽命。為了防止因增加發熱量而變色,而使用具有較高玻璃化溫度之環氧樹脂,但該類具有高彈性之環氧樹脂的強度、撓性等之彎曲特性比一般環氧樹 脂低,因此於切粒等之削切加工及激烈溫度變化之環境中會有易使密封材料破裂等之課題。又因近年來LED之發光波長的短波長化,故連續使用時會發生變色而有易降低發光輸出力等之課題。因此密封材料於改善耐熱著色性、耐光性的同時需具有機械強度。 The epoxy resin composition has a high hardness and therefore has excellent handleability, and can be used for low-output white LED sealing applications, so it is mostly used for low output applications. However, in a high-output LED, it is easy to change color due to an increase in the amount of light emitted and the amount of heat generated, so that it is difficult to obtain a sufficient life. In order to prevent discoloration due to increased heat generation, an epoxy resin having a higher glass transition temperature is used, but the bending property of the strength, flexibility, and the like of the epoxy resin having high elasticity is higher than that of a general epoxy tree. Since the fat is low, there is a problem that the sealing material is easily broken in an environment where the cutting and the like are cut and the temperature is changed drastically. Further, in recent years, the wavelength of the light emitted from the LED is shortened, so that discoloration occurs during continuous use, and the light-emitting output is easily lowered. Therefore, the sealing material needs to have mechanical strength while improving heat resistance coloring resistance and light resistance.

近年來從事開發以具有優良的耐熱‧耐光變黃性之聚矽氧樹脂為基材之LED密封材料,及曾有藉由氫矽烷基與鏈烯基之加成反應之樹脂組成物、使用硬化劑將具有環氧基之聚矽氧樹脂硬化所得之樹脂組成物之報告。 In recent years, we have been developing LED sealing materials based on polyoxyxylene resins with excellent heat resistance and light yellowing resistance, and resin compositions which have been subjected to addition reaction of hydroquinone and alkenyl groups, and hardeners. A report of a resin composition obtained by hardening a polyoxyxylene resin having an epoxy group.

又,聚矽氧樹脂及主鏈持有聚矽氧骨架之環氧樹脂多半具有來自聚矽氧骨架之高可動性,但缺點為硬化物之硬度較低、表面易發黏及強度較低。因此易因附著塵埃等而使透明性變差,製造LED時難處理,而使製造方法、結構、設計及用途受限。又,含有苯基之具有高硬度之聚矽氧骨架的樹脂雖可改善處理性,但會有強度、撓性問題及易因開關燈時激烈的溫度變化等而破裂等之缺點。既使含有環氧環己基之環氧當量較低之樹脂可改善表面硬度等處理性,但聚矽氧之優點受損,仍無法承受LED密封材料之要求,故需進一步改善。又,有關聚烯烴化合物與具有氫矽烷基之有機聚矽氧烷所形成之樹脂組成物,也要求改善強度、變黃方面。 Further, the polyoxyxene resin and the epoxy resin having a polyfluorene skeleton in the main chain mostly have high mobility from the polyfluorene skeleton, but the disadvantage is that the hardness of the cured product is low, the surface is sticky and the strength is low. Therefore, the transparency is deteriorated due to adhesion of dust or the like, and it is difficult to handle the LED, and the manufacturing method, structure, design, and use are limited. Further, although a resin containing a polyphenylene skeleton having a high hardness of a phenyl group can improve handling properties, it has disadvantages such as strength, flexibility, and breakage due to a severe temperature change at the time of switching lamps. Even if the resin having a lower epoxy equivalent of epoxycyclohexyl group can improve the handleability such as surface hardness, the advantages of polyfluorene oxide are impaired, and the requirements of the LED sealing material cannot be withstood, so further improvement is required. Further, the resin composition formed of the polyolefin compound and the organopolyoxane having a hydrofluorenyl group is also required to have improved strength and yellowing.

又,搭載於行動電話及監視器之背光上的LED數量多,因此需經過電路基板上一併焊接安裝之回流步驟。依環境而使用無鉛焊接安裝時需將LED封裝體全體曝露於 260℃之回流爐內,因此會因激烈之溫度變化而使密封材料著色、破裂,及密封材料與接合部位之接合力不足而剝離,且會因密封材料膨脹而發生金屬斷線等之損傷,故需求提升合格率及生產性。 Moreover, since the number of LEDs mounted on the backlight of the mobile phone and the monitor is large, it is necessary to perform a reflow step of soldering and mounting on the circuit board. Exposing the LED package to the entire lead-free soldering installation according to the environment In the reflow furnace at 260 ° C, the sealing material is colored and broken due to the intense temperature change, and the bonding force between the sealing material and the joint portion is insufficient to be peeled off, and the metal material is broken due to the expansion of the sealing material. Therefore, demand increases the pass rate and productivity.

如上述既使以具有優良耐候性之聚矽氧樹脂為基材,也無法得到完全符合LED密封材料所要求之物性,故需求具有充分硬度、強度、撓性及優良耐熱著色、耐UV著色性之具有與環氧樹脂相同之量產性、處理性之材料。 As described above, even if the polyfluorene resin having excellent weather resistance is used as the substrate, and the physical properties required for the LED sealing material are not obtained, it is required to have sufficient hardness, strength, flexibility, and excellent heat-resistant coloring and UV-resistant coloring. It has the same mass productivity and handleability as epoxy resin.

專利文獻1曾揭示來自具有氫矽烷基之聚有機矽氧烷樹脂與具有鏈烯基之聚有機矽氧烷樹脂的加成反應之樹脂組成物。專利文獻2曾揭示含有苯基之硬化性聚有機矽氧烷組成物及使用其之光半導體元件密封劑及光半導體裝置。專利文獻3曾揭示需持有支鏈具有環氧環己基之直鏈及環狀矽氧烷構造之環氧聚矽氧樹脂。專利文獻4曾揭示至少主鏈之兩末端具有二縮水甘油基三聚異氰酸基烷基之有機聚矽氧烷及含有其之組成物。專利文獻5曾揭示具有2個氫矽烷基之有機矽化合物,與1分子中具有2個加成反應性碳-碳雙鍵之多環式烴的加成反應生成物,及含有1分子中至少具有2個加成反應性碳-碳雙鍵之加成反應生成物,與具有Si-H基之化合物的組成物。專利文獻6曾揭示主鏈之兩末端具有二縮水甘油基三聚異氰酸基烷基之有機聚矽氧烷及含有其之組成物。專利文獻7及8曾揭示樹脂中配有異氰酸基環,且末端具有環氧基之環氧聚矽氧樹脂及含有其之組成物。但該等專利文獻所記載之熱硬化 性樹脂組成物無法得到充分之上述特性。 Patent Document 1 discloses a resin composition derived from an addition reaction of a polyorganosiloxane having a hydroquinone group and a polyorganosiloxane having an alkenyl group. Patent Document 2 discloses a composition of a curable polyorganosiloxane containing a phenyl group, an optical semiconductor element sealing agent using the same, and an optical semiconductor device. Patent Document 3 discloses an epoxy polyoxyxylene resin which is required to have a linear and cyclic siloxane having a branched epoxy group. Patent Document 4 discloses an organopolysiloxane having a diglycidyltrimeric isocyanatoalkyl group at both ends of a main chain and a composition containing the same. Patent Document 5 discloses an addition reaction product of an organic ruthenium compound having two hydrofluorenyl groups and a polycyclic hydrocarbon having two addition-reactive carbon-carbon double bonds in one molecule, and at least one molecule A composition having an addition reaction product of two addition-reactive carbon-carbon double bonds and a compound having a Si-H group. Patent Document 6 discloses an organopolysiloxane having a diglycidyltrimeric isocyanatoalkyl group at both ends of a main chain and a composition containing the same. Patent Documents 7 and 8 disclose an epoxy polyoxyxene resin having an isocyanato ring in the resin and having an epoxy group at the terminal, and a composition containing the same. However, the heat hardening described in the patent documents The above resin composition cannot obtain sufficient characteristics as described above.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

[專利文獻1]特開2010-248413號公報 [Patent Document 1] JP-A-2010-248413

[專利文獻2]特開2010-084118號公報 [Patent Document 2] JP-A-2010-084118

[專利文獻3] WO2008/133108 [Patent Document 3] WO2008/133108

[專利文獻4]特開2009-275206號公報 [Patent Document 4] JP-A-2009-275206

[專利文獻5]特開2008-069210號公報 [Patent Document 5] JP-A-2008-069210

[專利文獻6]特開2010-285563號公報 [Patent Document 6] JP-A-2010-285563

[專利文獻7]特開2008-274004號公報 [Patent Document 7] JP-A-2008-274004

[專利文獻8] WO2007/074813 [Patent Document 8] WO2007/074813

發明之概要 Summary of invention

本發明之目的為,提供一種硬化物之硬度較高、具有優良耐熱著色性、耐UV著色性、強度及撓性,既使回流、熱循環下封裝體損傷較少之適用於電子材料領域及光半導體密封用之熱硬化性樹脂組成物。其他目的為,提供一種適用為上述熱硬化性樹脂組成物之材料之環氧聚矽氧樹脂。 An object of the present invention is to provide a cured product having high hardness, excellent heat-resistant coloring property, UV coloring resistance, strength and flexibility, and is suitable for use in the field of electronic materials even in the case of less damage due to reflow and thermal cycling. A thermosetting resin composition for sealing an optical semiconductor. Another object is to provide an epoxy polyoxynoxy resin which is suitable as a material of the above thermosetting resin composition.

本發明係有關特徵為,一般式(1)所表示,環氧當量(g/eq)為200至2000之環氧聚矽氧樹脂。 The present invention relates to an epoxy polyoxyl resin having an epoxy equivalent (g/eq) of from 200 to 2,000, represented by the general formula (1).

式中,R1表示碳數1至10之1價烴基,可各自相同或相異。R2表示碳數1至20之2價烴基,內部具有1至3個醚鍵結性氧原子。E1為具有至少1個環氧基之1價之有機殘基,Z為2價之有機殘基。l、m獨立為0至3之整數,且1≦l+m≦4。n為0<n≦100之數。 In the formula, R 1 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms, which may be the same or different. R 2 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and has 1 to 3 ether-bonding oxygen atoms inside. E 1 is a monovalent organic residue having at least one epoxy group, and Z is a divalent organic residue. l, m is independently an integer from 0 to 3, and 1≦l+m≦4. n is the number of 0 < n ≦ 100.

一般式(1)中之E1為,式(2)所表示之有機殘基。 In the general formula (1), E 1 is an organic residue represented by the formula (2).

一般式(1)中之Z為,一般式(3)、(4)或(22)所表示之2價之有機殘基。 Z in the general formula (1) is a divalent organic residue represented by the general formula (3), (4) or (22).

一般式(3)中,R3表示甲基或苯基,可各自相同或相異。k為0至100之數。 In the general formula (3), R 3 represents a methyl group or a phenyl group, and may be the same or different. k is the number from 0 to 100.

一般式(4)中,R4表示甲基或苯基,可各自相同或相異。i、j獨立為0至3之整數,且1≦i+j≦4。 In the general formula (4), R 4 represents a methyl group or a phenyl group, and may be the same or different. i, j are independently integers from 0 to 3, and 1 ≦ i + j ≦ 4.

一般式(22)中,R23表示碳數1至10之烴基,R24表示氫原子或碳數1至10之烴基。 In the general formula (22), R 23 represents a hydrocarbon group having 1 to 10 carbon atoms, and R 24 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms.

又,本發明係特徵為,上述環氧聚矽氧樹脂之製造方法中,使一般式(5)所表示之兩末端含有SiH之環狀有機矽氧烷,與未達理論量之兩末端含有乙烯基之化合物反 應後,使用1分子中具有至少1個以上之環氧基,且1分子中具有1個碳-碳雙鍵之與SiH基具有反應性之環氧樹脂,對殘存之SiH基進行末端密封反應的環氧樹脂之製造方法。 Further, in the method for producing an epoxy polyoxyxene resin, the cyclic organosiloxane having SiH at both ends represented by the general formula (5) is contained at both ends of the theoretical amount. Vinyl compound After that, an epoxy resin having at least one epoxy group in one molecule and having one carbon-carbon double bond in one molecule and reacting with an SiH group is used to carry out terminal sealing reaction on the remaining SiH group. A method of manufacturing an epoxy resin.

式中,R1、l、m與一般式(1)同義。 Wherein R 1 , l, m are synonymous with the general formula (1).

上述兩末端含有乙烯基之化合物如,一般式(6)、(7)或(25)所表示之兩末端含有乙烯基之聚有機矽氧烷或兩末端含有乙烯基之三聚異氰酸衍生物。 The above-mentioned compound having a vinyl group at both ends, such as a polyorganosiloxane having a vinyl group at both terminals represented by the general formula (6), (7) or (25) or a trimeric isocyanic acid having a vinyl group at both terminals Things.

式中,R3、k與一般式(3)同義。R4、i、j與一般式(4)同義。式(25)中,R25表示氫原子或碳數1至10之烴基,R26表示碳數1至8之烴基,R27表示氫原子或甲基。 Wherein R 3 and k are synonymous with the general formula (3). R 4 , i, and j are synonymous with the general formula (4). In the formula (25), R 25 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, R 26 represents a hydrocarbon group having 1 to 8 carbon atoms, and R 27 represents a hydrogen atom or a methyl group.

與SiH基具有反應性之環氧樹脂如,單烯丙基二縮水甘油基三聚異氰酸酯。 An epoxy resin reactive with a SiH group such as monoallyl diglycidyl trimer isocyanate.

又,本發明係特徵為,以環氧樹脂、硬化劑(B)及硬化促進劑(C)為必須成分之熱硬化性樹脂組成物中,環氧樹脂成分含有上述之環氧聚矽氧樹脂之熱硬化性樹脂組成物。以下將添加於熱硬化性樹脂組成物之上述環氧聚矽氧樹脂稱為環氧聚矽氧樹脂(A)。 Further, the present invention is characterized in that the epoxy resin component contains the above epoxy polyoxynoxy resin as a thermosetting resin composition containing an epoxy resin, a curing agent (B) and a curing accelerator (C) as essential components. A thermosetting resin composition. Hereinafter, the above epoxy polyoxyl resin to be added to the thermosetting resin composition is referred to as an epoxy polyoxyl resin (A).

硬化劑(B)如,酸酐或室溫下液狀之胺化合物。又,硬化促進劑(C),如4級銨鹽或4級鏻鹽。 The hardener (B) is, for example, an acid anhydride or a liquid amine compound at room temperature. Further, a hardening accelerator (C) such as a 4-grade ammonium salt or a 4-grade phosphonium salt.

上述環氧樹脂成分較佳為,含有環氧聚矽氧樹脂(A)與室溫下液狀之環氧樹脂(D),又相對於環氧聚矽氧樹脂(A)100重量份,添加5至150重量份之室溫下液狀之環氧樹脂(D),環氧樹脂混合物之環氧當量為 180至1000。 The epoxy resin component preferably contains an epoxy polyoxynoxy resin (A) and a liquid epoxy resin (D) at room temperature, and is added to 100 parts by weight of the epoxy polyoxyl resin (A). 5 to 150 parts by weight of the liquid epoxy resin (D) at room temperature, the epoxy equivalent of the epoxy resin mixture is 180 to 1000.

上述熱硬化性樹脂組成物可另含有白色顏料(E),白色顏料(E)較佳為,由二氧化矽、氧化鈦、氧化鋁、氧化鎂、氧化鋯及無機中空粒子中所選出之至少1種。 The thermosetting resin composition may further contain a white pigment (E), and the white pigment (E) is preferably at least selected from the group consisting of cerium oxide, titanium oxide, aluminum oxide, magnesium oxide, zirconium oxide, and inorganic hollow particles. 1 species.

又,本發明為,使用上述熱硬化性樹脂組成物密封之LED裝置。 Moreover, this invention is an LED device which seals using the said thermosetting resin composition.

下面將詳細說明本發明之實施形態。 Embodiments of the present invention will be described in detail below.

本發明之環氧聚矽氧樹脂為上述一般式(1)所表示,又,環氧當量為200至2000。 The epoxy polyoxynene resin of the present invention is represented by the above general formula (1), and has an epoxy equivalent of from 200 to 2,000.

一般式(1)中,R1表示碳數1至10之烴基。烴基如,甲基、乙基、丙基、異丙基、n-丁基、己基、苯基、萘基等但非限於該等,可相同或相異。就易取得性及作為熱硬化性樹脂組成物用,實施熱處理所得之硬化物時之耐熱著色性、耐光著色性等之物性觀點,R1較佳為甲基。 In the general formula (1), R 1 represents a hydrocarbon group having 1 to 10 carbon atoms. The hydrocarbon group such as methyl, ethyl, propyl, isopropyl, n-butyl, hexyl, phenyl, naphthyl and the like, but not limited thereto, may be the same or different. The R 1 is preferably a methyl group from the viewpoint of physical properties such as heat-resistant colorability and light-resistant coloring property when the cured product obtained by heat treatment is used as the thermosetting resin composition.

一般式(1)中,l、m各自為0至3之整數,且符合1≦l+m≦4。就易取得性,l、m之值較佳為l=1、m=1。n為平均值(數平均),n表示大於0且100以下之數。就作為硬化物用時之耐熱著色性、耐光著色性、機械物性之觀點,n之數較佳為0.05≦n≦30,更佳為0.05≦n≦20,特佳為0.1至10。本發明之環氧聚矽氧樹脂為n不同之分子之混合物時,可存在n為0之成分,但n為0之成分不為100%,又,n為0之成分較佳為0至90wt%,更佳為0至70wt%。 In the general formula (1), l and m are each an integer of 0 to 3, and conform to 1≦l+m≦4. In terms of easy availability, the values of l and m are preferably l=1 and m=1. n is an average value (number average), and n represents a number greater than 0 and less than 100. The number of n is preferably 0.05 ≦ n ≦ 30, more preferably 0.05 ≦ n ≦ 20, and particularly preferably 0.1 to 10, from the viewpoints of heat-resistant colorability, light coloring resistance, and mechanical properties when used as a cured product. When the epoxy polyoxyxene resin of the present invention is a mixture of n different molecules, a component in which n is 0 may be present, but a component in which n is 0 is not 100%, and a component in which n is 0 is preferably 0 to 90 wt. %, more preferably 0 to 70% by weight.

一般式(1)中,R2表示碳數1至20之2價之烴 基,內部可具有1至3個醚鍵結性氧原子。該類結構如,伸甲基、伸乙基、伸丙基、伸異丙基、異亞丙基、伸丁基、伸異丁基、伸己基、伸二甲苯基、伸十二烷基、下述一般式(8)所表示之基等,但非限定於該等。就作為硬化物用時之物性,R2較佳為C1-6之烴基,更佳為伸丙基。 In the general formula (1), R 2 represents a hydrocarbon group having a carbon number of 1 to 20, and may have 1 to 3 ether-bonding oxygen atoms inside. Such structures are, for example, methyl, ethyl, propyl, isopropyl, isopropylidene, butyl, isobutyl, hexyl, xylylene, dodecyl, lower The base or the like represented by the general formula (8) is described, but is not limited thereto. R 2 is preferably a C1-6 hydrocarbon group, more preferably a stretching propyl group, as the physical properties of the cured product.

(式中,h表示1至3之數)。 (where h represents the number from 1 to 3).

一般式(1)中,Z表示2價之有機殘基。較佳為內部含有Si之有機殘基,或碳數1至20之2價之烴基,又,烴基之內部可具有1至3個醚鍵結性氧原子。 In the general formula (1), Z represents a divalent organic residue. It is preferably an organic residue containing Si internally or a hydrocarbon group having a carbon number of 1 to 20, and further, the inside of the hydrocarbon group may have 1 to 3 ether-bonding oxygen atoms.

上述2價之烴基為,內部可具有1至3個醚鍵結性氧原子,例如,伸乙基、伸丙基、伸丁基、伸己基、伸癸基、伸十二烷基,或一般式(9)至(16)所表示之基。 The above divalent hydrocarbon group may have 1 to 3 ether-bonding oxygen atoms in the interior, for example, an ethyl group, a propyl group, a butyl group, a hexyl group, a decyl group, a dodecyl group, or a general group. The groups represented by the formulae (9) to (16).

一般式(9)至(16)中,R5為碳數1至17之烴基。R6、R7、R8、R9、R10、R11表示碳數1至20之烴基,內部可具有氧原子。X表示碳數1至20之烴基、氧 原子、硫原子、羧基、磺醯基、亞磺醯基或單鍵。 In the general formulae (9) to (16), R 5 is a hydrocarbon group having 1 to 17 carbon atoms. R 6 , R 7 , R 8 , R 9 , R 10 and R 11 represent a hydrocarbon group having 1 to 20 carbon atoms and may have an oxygen atom inside. X represents a hydrocarbon group having 1 to 20 carbon atoms, an oxygen atom, a sulfur atom, a carboxyl group, a sulfonyl group, a sulfinylene group or a single bond.

Z較佳為內部含有Si之有機基,具有例如下述一般式(17)至(21)所表示之有機基。 Z is preferably an organic group containing Si in the inside, and has, for example, an organic group represented by the following general formulas (17) to (21).

一般式(16)至(21)中,R12、R14、R17表示碳數1至10之2價之烴基,內部可具有芳香族環。R13、R16、R19表示碳數1至10之1價之烴基。R15表示伸苯基或伸萘基。R18表示碳數1至20之2價之烴基,內部可具有芳 香族環,也可具有醚鍵結性氧原子。R3及k與一般式(3)同義,R4、i、j與一般式(4)同義,R20、R21表示碳數1至10之2價烴基。 In the general formulae (16) to (21), R 12 , R 14 and R 17 each represent a hydrocarbon group having a carbon number of 1 to 10 and may have an aromatic ring inside. R 13 , R 16 and R 19 represent a monovalent hydrocarbon group having 1 to 10 carbon atoms. R 15 represents a phenyl or a naphthyl group. R 18 represents a hydrocarbon group having a carbon number of 1 to 20, and may have an aromatic ring or an ether-bonded oxygen atom. R 3 and k are synonymous with the general formula (3), R 4 , i, j are synonymous with the general formula (4), and R 20 and R 21 represent a divalent hydrocarbon group having 1 to 10 carbon atoms.

但Z非限定於該等,可添加2種以上之結構。其中就易取得性、本發明之環氧聚矽氧樹脂之易製造性、作為硬化物用時之耐熱著色性、耐光著色性、機械物性之觀點,Z較佳為一般式(19)或一般式(20)所表示之結構,更佳為一般式(3)、(4)或(22)所表示之2價之有機殘基。 However, Z is not limited to these, and two or more types of structures may be added. Among them, Z is preferably a general formula (19) or a general viewpoint from the viewpoints of ease of availability, ease of manufacturability of the epoxy polyoxyxene resin of the present invention, heat-resistant colorability when used as a cured product, light-resistant colorability, and mechanical properties. The structure represented by the formula (20) is more preferably a divalent organic residue represented by the general formula (3), (4) or (22).

一般式(3)、(4)中,R3、R4獨立表示甲基或苯基。k為0至100之數。i、j獨立為0至3之整數,且i+j為1至4之整數。更佳為一般式(3)或(19)中R3為甲基、0≦k≦20,一般式(4)或(20)中R4為甲基、i=1、j=1。 In the general formulae (3) and (4), R 3 and R 4 independently represent a methyl group or a phenyl group. k is the number from 0 to 100. i, j are independently integers from 0 to 3, and i+j is an integer from 1 to 4. More preferably, in the general formula (3) or (19), R 3 is a methyl group and 0 ≦ k ≦ 20, and in the general formula (4) or (20), R 4 is a methyl group, i = 1, and j = 1.

一般式(22)中,R23表示碳數1至10之烴基。該類烴基如,伸甲基、伸乙基、伸丙基、伸異丙基、伸亞丙基、伸丁基、伸異丁基、伸己基、伸癸基等之伸烷基,但非限定於該等。就作為硬化物用時之物性,R23較佳為C1-6之烴基,更佳為伸丙基。 In the general formula (22), R 23 represents a hydrocarbon group having 1 to 10 carbon atoms. Such hydrocarbon groups are, for example, methyl, ethyl, propyl, isopropyl, propylene, butyl, isobutyl, hexyl, decyl, etc. Limited to these. R 23 is preferably a hydrocarbon group of C1-6, more preferably a propyl group, as the physical properties of the cured product.

一般式(22)中,R24為氫原子或碳數1至10之烴基。該烴基之具體例如,甲基、乙基、丙基、丁基、異戊基、苯基、苄基、甲苯醯基、萘基等之烷基、芳烷基、芳基,但非限定該等。較佳如苯基、苄基等之具有芳香族環之烴基。就原料易取得性,作為硬化物用時之物性,R4 較佳為氫原子、甲基、苯基,更佳為氫原子、甲基。 In the general formula (22), R 24 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms. Specific examples of the hydrocarbon group include an alkyl group, an aralkyl group, and an aryl group of a methyl group, an ethyl group, a propyl group, a butyl group, an isopentyl group, a phenyl group, a benzyl group, a tolyl group, a naphthyl group, and the like, but are not limited thereto. Wait. A hydrocarbon group having an aromatic ring such as a phenyl group or a benzyl group is preferred. The material is easily accessible, and R 4 is preferably a hydrogen atom, a methyl group or a phenyl group, and more preferably a hydrogen atom or a methyl group.

一般式(1)中,E1為具有至少1個環氧基之1價之有機殘基,較佳為式(2)所表示之環氧三聚異氰酸基。 In the general formula (1), E 1 is a monovalent organic residue having at least one epoxy group, and preferably an epoxytrimeric isocyanate group represented by the formula (2).

本發明之環氧聚矽氧樹脂適用本發明之製造方法製造。本發明之環氧聚矽氧樹脂之製造方法為,使上述一般式(5)所表示之兩末端含有SiH之環狀有機矽氧烷,與未達理論量之兩末端含有乙烯基之化合物反應後,使用1分子中具有至少1個以上之環氧基,且1分子中具有1個碳-碳雙鍵之與SiH基具有反應性之環氧樹脂進行末端密封反應。一般式(5)中,與一般式(1)相同之記號具有相同意義。 The epoxy polyoxyxylene resin of the present invention is produced by the production method of the present invention. The epoxy polyoxyxylene resin of the present invention is produced by reacting a cyclic organosiloxane having SiH at both ends represented by the above general formula (5) with a compound having a vinyl group at both ends of a theoretical amount. Thereafter, an end-sealing reaction is carried out using an epoxy resin having at least one epoxy group in one molecule and having one carbon-carbon double bond in one molecule and having reactivity with the SiH group. In the general formula (5), the same symbols as in the general formula (1) have the same meaning.

上述兩末端含有乙烯基之化合物較佳如,一般式(6)或一般式(7)所表示之兩末端含有乙烯基之聚有機矽氧烷,或一般式(25)所表示之兩末端含有乙烯基之三聚異氰酸衍生物,但非限定於該等。一般式(6)或一般式(7)所表示之兩末端含有乙烯基之聚有機矽氧烷為,賦予一般式(3)或一般式(4)所表示之Z,因此與一般式(3)或(4)相同之記號具有相同意義。賦予上述一般式(9)至(20)所表示之Z的兩末端含有乙烯基之化合物可藉由上述而理解。一般式(25)中,R25表示氫原子或碳數1至10之烴基,R26表示碳數1至8之烴基,R27表示氫原子或甲基。R25係對應一般式(22)之R24The compound having a vinyl group at both ends is preferably a polyorganosiloxane having a vinyl group at both terminals represented by the general formula (6) or the general formula (7), or both ends represented by the general formula (25). A vinyl trimeric isocyanate derivative, but is not limited thereto. The polyorganosiloxane having a vinyl group at both ends represented by the general formula (6) or the general formula (7) is a Z represented by the general formula (3) or the general formula (4), and thus is equivalent to the general formula (3). ) or (4) the same mark has the same meaning. The compound containing a vinyl group at both terminals of Z represented by the above general formulas (9) to (20) can be understood from the above. In the general formula (25), R 25 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, R 26 represents a hydrocarbon group having 1 to 8 carbon atoms, and R 27 represents a hydrogen atom or a methyl group. R 25 corresponds to R 24 of the general formula (22).

一般式(25)所表示之兩末端含有乙烯基之三聚異氰 酸衍生物可為已知之物無特別限定,可選用各種化合物。例如二烯丙基三聚異氰酸、二甲基烯丙基三聚異氰酸、單甲基二烯丙基三聚異氰酸酯、單甲基二甲基烯丙基三聚異氰酸酯、單乙基二烯丙基三聚異氰酸酯、單乙基二甲基烯丙基三聚異氰酸酯、單丙基二烯丙基三聚異氰酸酯、單丙基二甲基烯丙基三聚異氰酸酯、單異戊基二烯丙基三聚異氰酸酯、單異戊基二甲基烯丙基三聚異氰酸酯、單苯基二烯丙基三聚異氰酸酯、單苯基二甲基烯丙基三聚異氰酸酯、單萘基二烯丙基三聚異氰酸酯、單萘基二甲基丙烯基三聚異氰酸酯等,但非限定於該等,必要時可併用2種以上。其中較佳結構之三聚異氰酸衍生物化合物為,二烯丙基三聚異氰酸、單甲基二烯丙基三聚異氰酸酯、單苯基二烯丙基三聚異氰酸酯,特佳為二烯丙基三聚異氰酸、單甲基二烯丙基三聚異氰酸酯。 a trimeric isocyanide containing a vinyl group at both ends represented by the general formula (25) The acid derivative is not particularly limited as long as it is known, and various compounds can be selected. For example, diallyl isocyanuric acid, dimethylallyl isocyanuric acid, monomethyl diallyl isocyanate, monomethyl dimethylallyl isocyanate, monoethyl Diallyl isocyanurate, monoethyl dimethylallyl isocyanate, monopropyl diallyl isocyanate, monopropyl dimethylallyl isocyanate, monoisoamyl Allyl trimeric isocyanate, monoisoamyl dimethylallyl isocyanurate, monophenyl diallyl isocyanate, monophenyl dimethylallyl isocyanate, mononaphthyl diene The propyl trimeric isocyanate, the mononaphthyl dimethyl propylene trimeric isocyanate, and the like are not limited thereto, and two or more kinds may be used in combination if necessary. The preferred structure of the trimeric isocyanic acid derivative compound is diallyl isocyanuric acid, monomethyl diallyl isocyanate, monophenyl diallyl isocyanurate, particularly preferably Diallyl isocyanuric acid, monomethyl diallyl isocyanurate.

又,前述兩末端含有乙烯基之三聚異氰酸衍生物,亦可使用USPatent第2830051號公報所記載般,例如於氯化鋁、氯化鐵或活性白土般之路易斯酸之存在下,及必要時使用添加有苯酚等受體之二甲苯等之反應溶劑,使三烯丙基三聚氰酸酯反應而得二烯丙基三聚氰酸之方法所得必要時可再與烷基鹵化物反應,進行N-烷基化亦可。又,適用Journal of Organic chemistry vol.35,No.7,p.2253-2257(1970)所記載,使用二甲基甲醯胺般非質子性之極性溶劑,使烯丙基異氰酸酯與氰酸鉀反應後,藉由酸中和而得二烯丙基三聚異氰酸之方法所得,又必要時可另與烷基 鹵化物進行N-烷基化。另如Journal of American Chemical Society vol.51,p.2221(1929)所記載,使苯基異氰酸酯與甲基胺基甲酸酯反應形成單苯基三聚異氰酸後,與烯丙基鹵化物反應可得單苯基二烯丙基三聚異氰酸酯。但非限定於該等,業者可以較佳之形態實施而得兩末端含有乙烯基之三聚異氰酸衍生物化合物。 Further, the trimeric isocyanic acid derivative containing a vinyl group at the both ends may be used, for example, in the presence of a Lewis acid such as aluminum chloride, iron chloride or activated clay, as described in US Pat. No. 2830051, and If necessary, a method of reacting a triallyl cyanuric acid with a reaction solvent such as xylene with a phenol or the like added thereto to obtain a diallyl cyanuric acid may be further mixed with an alkyl halide. The reaction may be carried out by N-alkylation. Further, as described in Journal of Organic Chemistry vol. 35, No. 7, p. 2253-2257 (1970), an allyl isocyanate and potassium cyanate are obtained by using a non-protic polar solvent such as dimethylformamide. After the reaction, the method of obtaining a diallyl isocyanuric acid by neutralization with an acid, and if necessary, an alkyl group The halide is N-alkylated. Further, as described in Journal of American Chemical Society vol. 51, p. 2221 (1929), after reacting phenyl isocyanate with methyl carbamate to form monophenyltrial isocyanate, and allyl halide The reaction yields monophenyl diallyl isocyanate. However, the present invention is not limited to these, and the present invention can be carried out in a preferred form to obtain a trimeric isocyanate derivative compound having a vinyl group at both terminals.

本發明之製造方法特佳為,先將兩末端含有SiH基之聚有機矽氧烷投入反應系內,其次使用必會殘留未反應之SiH基之量,逐次添加兩末端含有乙烯基之化合物,確認結束反應後,使用與SiH基具有反應性之環氧樹脂進行末端密封反應。兩末端含有乙烯基之化合物之使用量可為,以具有雙鍵之環氧樹脂進行末端密封時,符合上述環氧當量之量,無特別限定,但與兩末端含有乙烯基之化合物結束反應時較佳為,兩末端含有SiH基之聚有機矽氧烷殘存20至80%之SiH基。又,由前述理由得知,較佳為使用一般式(1)中,E1為一般式(2)所表示之環氧三聚異氰酸基、R2為伸丙基、R1為甲基、m=1、l=1之原料。又,較佳為使用Z為一般式(3)、(4)或(22)所表示之基,且R3為甲基、0≦k≦20,及一般式(7)中之R4為甲基、i=1、j=1之原料。又,一般式(6)、一般式(7)或(25)所表示之聚有機矽氧烷或兩末端含有乙烯基之三聚異氰酸衍生物可2種以上併用。 The production method of the present invention is particularly preferable in that a polyorganosiloxane containing SiH groups at both ends is first introduced into a reaction system, and secondly, an amount of unreacted SiH groups is left in the use, and a compound containing a vinyl group at both ends is sequentially added. After confirming the completion of the reaction, the terminal sealing reaction was carried out using an epoxy resin reactive with SiH groups. The compound having a vinyl group at both ends may be used in an amount of the above epoxy equivalent when the terminal is sealed with an epoxy resin having a double bond, and is not particularly limited, but is terminated when a compound having a vinyl group at both terminals is terminated. Preferably, the SiH group-containing polyorganosiloxane contains 20 to 80% of SiH groups at both ends. Further, for the reason described above, it is preferred to use the general formula (1), E 1 is an epoxy trimeric isocyanate group represented by the general formula (2), R 2 is a stretching propyl group, and R 1 is an A group. The raw materials of the base, m=1, and l=1. Further, it is preferable to use Z as a group represented by the general formula (3), (4) or (22), and R 3 is a methyl group, 0 ≦ k ≦ 20, and R 4 in the general formula (7) is A raw material of methyl group, i=1, j=1. Further, two or more kinds of polyorganosiloxanes represented by the general formula (6), the general formula (7) or (25), or a trimeric isocyanic acid derivative having a vinyl group at both terminals may be used in combination.

上述與SiH基具有反應性之環氧樹脂為,1分子中具有至少1個以上之環氧基,且1分子中具有1個與SiH基 具有反應性之碳-碳雙鍵之物。例如,o-烯丙基苯基縮水甘油醚、2-烯丙基-4-甲基苯基縮水甘油醚、2-烯丙基-5-甲基苯基縮水甘油醚、2-烯丙基-6-甲基苯基縮水甘油醚等之單環型環氧樹脂及其核氫化環氧樹脂;1-甲基-4-異丙烯基環己烯氧化物、1,4-二甲基-4-乙烯基環己烯氧化物、4-乙烯基-1-己烯-2-氧化物、乙烯基降莰烯單氧化物、二環戊二烯單氧化物等之含有環狀結構之烯烴化合物所衍生之環氧樹脂;單烯丙基二縮水甘油基三聚異氰酸酯等之環結構中含有雜原子之環氧樹脂等,但非限定於該等。又,該等環氧樹脂可2種以上併用於反應。其中與SiH基具有反應性之環氧樹脂特佳為,可賦予一般式(2)所表示之有機殘基之單烯丙基二縮水甘油基三聚異氰酸酯。 The epoxy resin having reactivity with the SiH group has at least one epoxy group in one molecule and one SiH group in one molecule. A reactive carbon-carbon double bond. For example, o-allylphenyl glycidyl ether, 2-allyl-4-methylphenyl glycidyl ether, 2-allyl-5-methylphenyl glycidyl ether, 2-allyl Monocyclic epoxy resin such as -6-methylphenyl glycidyl ether and its nuclear hydrogenated epoxy resin; 1-methyl-4-isopropenylcyclohexene oxide, 1,4-dimethyl- Olefin containing cyclic structure such as 4-vinylcyclohexene oxide, 4-vinyl-1-hexene-2-oxide, vinyl norbornene monooxide, dicyclopentadiene monooxide An epoxy resin derived from a compound; an epoxy resin containing a hetero atom in a ring structure such as monoallyl diglycidyl trimer isocyanate; and the like, but is not limited thereto. Further, these epoxy resins may be used in combination of two or more kinds. The epoxy resin which is reactive with the SiH group is particularly preferably a monoallyl diglycidyl tripolyisocyanate which can impart an organic residue represented by the general formula (2).

上述以外之方法如,反應時一併將兩末端含有SiH基之環狀有機矽氧烷、兩末端含有乙烯基之聚有機矽氧烷、單烯丙基二縮水甘油基三聚異氰酸酯投入反應系內進行氫矽烷基化反應,或混合與SiH基具有反應性之具有碳-碳雙鍵之成分用的兩末端含有乙烯基之聚有機矽氧烷,及單烯丙基二縮水甘油基三聚異氰酸酯後投入反應系內,再投入兩末端含有SiH基之聚有機矽氧烷進行氫矽烷基化,此時因相對於單烯丙基二縮水甘油基三聚異氰酸酯的兩末端含有乙烯基之聚有機矽氧烷的氫矽烷基化反應之反應速度明顯較快,故反應系內易選擇性生成不具有環氧基之矽氧烷樹脂。因此所得之環氧聚矽氧樹脂會發生相分離而白濁 化喪失透明性,又既使未白濁化,硬化物物性之方面也無法得到本發明之效果而不宜。 In addition to the above, for example, a reaction is carried out, and a cyclic organic siloxane having SiH groups at both ends, a polyorganosiloxane having a vinyl group at both terminals, and a monoallyl diglycidyl isocyanate are introduced into the reaction system. a hydroquinone alkylation reaction, or a mixture of a carbon-carbon double bond reactive with a SiH group, a polyorganosiloxane having a vinyl group at both ends, and a monoallyl diglycidyl trimer After the isocyanate is introduced into the reaction system, the polyorganosiloxane containing SiH groups at both ends is further subjected to hydroquinone alkylation, and at this time, the copolymerization of the vinyl group is contained at both ends of the monoallyl diglycidyl trimeric isocyanate. The reaction rate of the hydroquinone alkylation reaction of the organic siloxane is obviously faster, so that it is easy to selectively form a decyl alkane resin having no epoxy group in the reaction system. Therefore, the obtained epoxy polyoxyl resin will undergo phase separation and become cloudy. The transparency is lost, and even if it is not cloudy, the effect of the present invention cannot be obtained in terms of the physical properties of the cured product.

氫矽烷基加成反應廣為人知係於貴金屬觸媒之存在下進行。所使用之觸媒可為已知之各種貴金屬或其錯合物。貴金屬觸媒如,鉑、銠、鈀、釕或銥等但非限定於該等,必要時可使用2種以上。又,可使用該等金屬固定於微粒子狀載體材料,例如碳、活性碳、氧化鋁、二氧化矽等所得之物。 The hydroquinone alkyl addition reaction is widely known to be carried out in the presence of a noble metal catalyst. The catalyst used may be any of the various noble metals or complexes thereof known. The noble metal catalyst is, for example, platinum, rhodium, palladium, iridium or iridium, and the like, and may be used in combination of two or more kinds as necessary. Further, these metals may be used for fixing to a particulate carrier material such as carbon, activated carbon, alumina, cerium oxide or the like.

貴金屬之錯合物如,鉑鹵化合物(PtCl4、H2PtCl6-6H2O、Na2PtCl6-4H2O等)、鉑-烯烴錯合物、鉑-醇錯合物、鉑-醇鹽錯合物、鉑-醚錯合物、鉑-碳醯錯合物、鉑-酮錯合物、鉑-1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷等之鉑-乙烯基矽氧烷錯合物、雙(γ-皮考啉)-鉑二氯化物、三伸甲基二吡啶-鉑二氯化物、二環戊二烯-鉑二氯化物、環辛二烯-鉑二氯化物、環戊二烯-鉑二氯化物、雙(炔基)雙(三苯基膦)鉑錯合物、雙(炔基)(環辛二烯)鉑錯合物、氯化銠、三(三苯基膦)銠氯化物、四銨-銠氯化物錯合物等但非特別限定,必要時可使用2種以上。 Complexes of noble metals such as platinum halide compounds (PtCl 4 , H 2 PtCl 6 -6H 2 O, Na 2 PtCl 6 -4H 2 O, etc.), platinum-olefin complexes, platinum-alcohol complexes, platinum- Alkoxide complex, platinum-ether complex, platinum-carbon ruthenium complex, platinum-ketone complex, platinum-1,3-divinyl-1,1,3,3-tetramethyl Platinum-vinyl oxime complexes such as decane, bis(γ-picoline)-platinum dichloride, tri-methyldipyridine-platinum dichloride, dicyclopentadiene-platinum Chloride, cyclooctadiene-platinum dichloride, cyclopentadiene-platinum dichloride, bis(alkynyl)bis(triphenylphosphine)platinum complex, bis(alkynyl)(cyclooctadiene) The platinum complex, the ruthenium chloride, the tris(triphenylphosphine) ruthenium chloride, the tetraammine-ruthenium chloride complex, and the like are not particularly limited, and two or more kinds may be used as necessary.

上述貴金屬觸媒可各自單獨,或預先溶解於溶解用溶劑後投入反應系內使用。貴金屬觸媒之使用比例無特別限定,但相對於一般反應所使用之原料之合計重量為0.1 ppm至100000 ppm,較佳為1ppm至10000 ppm之範圍。 The noble metal catalysts may be used alone or in advance in a solvent for dissolution and then used in a reaction system. The ratio of use of the noble metal catalyst is not particularly limited, but the total weight of the raw materials used for the general reaction is from 0.1 ppm to 100,000 ppm, preferably from 1 ppm to 10,000 ppm.

氫矽烷基加成反應可於無溶劑下進行反應,但必要時 可以有機溶劑稀釋反應系,其可為不會影響反應之物無特別限制。例如,二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等之鹵系烴類;丙酮、甲基乙基酮、甲基異丁基酮、環己酮、環戊酮等之脂肪族酮類;苯、甲苯、鄰二甲苯、間二甲苯、對二甲苯、氯苯、二氯苯等之芳香族類;二乙二醇二甲基醚、三乙二醇二甲基醚等之醚類;乙酸乙酯、乙酸-n-丁酯等之酯類。該等有機溶劑可選擇2種以上混合溶劑形態使用。 Hydroquinone alkyl addition reaction can be carried out without solvent, but if necessary The reaction system may be diluted with an organic solvent, and it may be one which does not affect the reaction, and is not particularly limited. For example, halogenated hydrocarbons such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane; acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, cyclopentanone Aliphatic ketones; aromatics such as benzene, toluene, o-xylene, m-xylene, p-xylene, chlorobenzene, dichlorobenzene; diethylene glycol dimethyl ether, triethylene glycol dimethyl Ethers such as ethers; esters of ethyl acetate, n-butyl acetate, and the like. These organic solvents may be used in the form of a mixture of two or more kinds.

氫矽烷基加成反應之溫度條件無特別限定,一般為0℃至200℃,較佳為30℃至180℃。0℃以下進行反應時會耗時而不利於經濟面。200℃以上進行反應時會使環氧基與氫矽烷基部位進行加成反應,而難控制反應。 The temperature condition of the hydroquinone alkyl addition reaction is not particularly limited and is usually from 0 ° C to 200 ° C, preferably from 30 ° C to 180 ° C. When the reaction is carried out below 0 ° C, it takes time and is not advantageous for the economic side. When the reaction is carried out at 200 ° C or more, an addition reaction of an epoxy group with a hydroquinone moiety is caused, and it is difficult to control the reaction.

本發明之環氧聚矽氧樹脂之環氧當量為200至2000。該範圍時可得具有優良透明性、耐熱著色性、玻璃化溫度、撓性之硬化物。環氧當量超出該範圍時,會使硬化物脆化,且表面硬度低會發黏,而成為耐熱著色性變差等之原因故不宜。 The epoxy polyoxynene resin of the present invention has an epoxy equivalent of from 200 to 2,000. In this range, a cured product having excellent transparency, heat-resistant coloring property, glass transition temperature, and flexibility can be obtained. When the epoxy equivalent is outside this range, the cured product is embrittled, and the surface hardness is low, which is sticky, and it is unfavorable because the heat-resistant coloring property is deteriorated.

其次將說明本發明之熱硬化性樹脂組成物。熱硬化性樹脂組成物為,以環氧樹脂、硬化劑(B)及硬化促進劑(C)為必須成分,且環氧樹脂成分含有本發明之環氧聚矽氧樹脂。說明熱硬化性樹脂組成物時,將本發明之環氧聚矽氧樹脂稱為環氧聚矽氧樹脂(A)。 Next, the thermosetting resin composition of the present invention will be explained. The thermosetting resin composition contains an epoxy resin, a curing agent (B), and a curing accelerator (C) as essential components, and the epoxy resin component contains the epoxy polyoxynene resin of the present invention. When the thermosetting resin composition is described, the epoxy polyoxynene resin of the present invention is referred to as an epoxy polyoxyl resin (A).

本發明之熱硬化性樹脂組成物所含之硬化劑(B)可為,已知之環氧樹脂之硬化劑用物,適用各種化合物。例 如適用有機胺化合物、二氰二醯胺及其衍生物;2-甲基咪唑、2-乙基-4-甲基咪唑等之咪唑及其衍生物;雙酚A、雙酚F、溴化雙酚A、萘二醇、4,4’-雙酚等之2價酚化合物;苯酚或萘酚類與甲醛或二甲苯二醇類之縮合反應所得之酚醛清漆樹脂或芳烷基苯酚樹脂;酸酐與多價有機醇之反應所得之多價羧酸;琥珀酸酐、馬來酸酐、酞酸酐、六氫酞酸酐、甲基化六氫酞酸酐、裸酸酐、氫化裸酸酐、偏苯三酸酐、均苯四酸酐等之酸酐;由己二酸胼化合物、具有硫鎓陽離子、碘鎓陽離子之有機陽離子分子、與四氟硼陰離子、六氟磷陰離子、六氟砷陰離子、六氟銻陰離子等之陰離子種所構成之鎓鹽化合物等所形成之陽離子硬化劑,必要時可使用2種以上。本發明中,特別是為了得到透明性、耐熱著色性、耐光著色性;硬化劑較佳為液狀之胺基化合物(包括胺基樹脂)或酸酐,更佳為六氫酞酸酐、甲基化六氫酞酸酐、氫化裸酸酐。 The curing agent (B) contained in the thermosetting resin composition of the present invention may be a known hardening agent for an epoxy resin, and various compounds may be used. example Such as organic amine compounds, dicyandiamide and its derivatives; 2-methylimidazole, 2-ethyl-4-methylimidazole and other imidazoles and their derivatives; bisphenol A, bisphenol F, bromination a divalent phenol compound such as bisphenol A, naphthalene diol or 4,4′-bisphenol; a novolac resin or an aralkyl phenol resin obtained by condensation reaction of phenol or naphthol with formaldehyde or xylene glycol; a polyvalent carboxylic acid obtained by the reaction of an acid anhydride with a polyvalent organic alcohol; succinic anhydride, maleic anhydride, phthalic anhydride, hexahydrophthalic anhydride, methylated hexahydrophthalic anhydride, bare anhydride, hydrogenated bare anhydride, trimellitic anhydride, pyromelli-4 An acid anhydride or the like; an anion species consisting of a bismuth adipate compound, an organic cation molecule having a sulfonium cation, an iodonium cation, a tetrafluoroborate anion, a hexafluorophosphorus anion, a hexafluoroarsenic anion, and a hexafluoroantimonium anion; The cationic hardening agent formed by the salt compound or the like may be used in combination of two or more kinds as necessary. In the present invention, in particular, in order to obtain transparency, heat-resistant coloring property, and light-resistant coloring property, the curing agent is preferably a liquid amino compound (including an amine-based resin) or an acid anhydride, more preferably hexahydrophthalic anhydride, methylation. Hexahydrophthalic anhydride, hydrogenated bare anhydride.

硬化促進劑(C)可為已知之環氧樹脂之硬化促進劑用物,適用各種化合物。例如,3級胺及其鹽類、咪唑類及其鹽類、有機膦化合物及其鹽類、辛酸鋅、辛酸錫等之有機金屬鹽,必要時可使用2種以上。特別是為了得到本發明之效果,硬化促進劑較佳為4級銨鹽類、有機膦化合物、4級鏻鹽類,更佳之觸媒為4級鏻鹽類。 The hardening accelerator (C) may be a known hardening accelerator for epoxy resins, and various compounds are suitable. For example, an organic metal salt such as a tertiary amine and a salt thereof, an imidazole or a salt thereof, an organic phosphine compound and a salt thereof, zinc octylate or tin octylate may be used in combination of two or more kinds as necessary. In particular, in order to obtain the effects of the present invention, the hardening accelerator is preferably a 4-grade ammonium salt, an organic phosphine compound, or a 4-grade sulfonium salt, and more preferably a catalyst is a 4-grade sulfonium salt.

本發明之熱硬化樹脂組成物為,以上述(A)、(B)及(C)成分為必須成分,但為了調整黏度、硬化速度等,業者可依較佳形態為目的,使用(A)成分以外 之1分子中具有2個以上之環氧基,且室溫下為液狀之環氧樹脂或環氧化合物作為(D)成分使用。此時(A)與(D)之混合物中環氧當量(g/eq)為180至1000之範圍時可得本發明之效果。 In the thermosetting resin composition of the present invention, the components (A), (B), and (C) described above are essential components. However, in order to adjust the viscosity, the curing rate, and the like, the manufacturer may use (A) for the purpose of the preferred embodiment. Outside the ingredients An epoxy resin or an epoxy compound having two or more epoxy groups in one molecule and liquid at room temperature is used as the component (D). When the epoxy equivalent (g/eq) in the mixture of (A) and (D) is in the range of from 180 to 1,000, the effects of the present invention can be obtained.

(D)成分為不同於(A)成分之環氧樹脂,可選擇單獨或混合後室溫下為液狀之物的各種化合物。例如,間苯二酚、氫醌、2,5-二叔丁基氫醌等之單環型二價酚類所衍生的環氧樹脂之芳香環被核氫化物;1,3-萘二醇、1,4-萘二醇、1,5-萘二醇、1,6-萘二醇、2,7萘二醇等之萘二醇類所衍生之環氧樹脂,及其芳香環被核氫化之物;4,4’-異亞丙基二苯酚、4,4’-異亞丙基雙(2-甲基苯酚)、4,4’-異亞丙基雙(2,6-二甲基苯酚)、4,4’-二羥基二苯基甲烷、4,4’-二羥基-3,3’-二甲基二苯基甲烷、4,4’-二羥基-3,3’,5,5’-四甲基二苯基甲烷、4,4’-副-亞丁基雙苯酚、4,4’-異亞丙基雙(2-叔-丁基苯酚)、4,4’-環亞己基二苯酚、4,4’-亞丁基雙(6-叔-丁基-2-甲基)苯酚等之酚類所衍生之環氧樹脂,及其芳香環被核氫化之環氧樹脂等。 The component (D) is an epoxy resin different from the component (A), and various compounds which are liquid or not at room temperature may be selected, either alone or in combination. For example, an aromatic ring of an epoxy resin derived from a monocyclic divalent phenol such as resorcinol, hydroquinone or 2,5-di-tert-butylhydroquinone is a nuclear hydride; 1,3-naphthenediol An epoxy resin derived from a naphthalene glycol such as 1,4-naphthalenediol, 1,5-naphthalenediol, 1,6-naphthalenediol or 2,7-naphthalenediol, and an aromatic ring thereof Hydrogenated; 4,4'-isopropylidenediphenol, 4,4'-isopropylidene bis(2-methylphenol), 4,4'-isopropylidene bis (2,6-di Methylphenol), 4,4'-dihydroxydiphenylmethane, 4,4'-dihydroxy-3,3'-dimethyldiphenylmethane, 4,4'-dihydroxy-3,3' , 5,5'-tetramethyldiphenylmethane, 4,4'-by-butylene bisphenol, 4,4'-isopropylidene bis(2-tert-butylphenol), 4,4' An epoxy resin derived from a phenol such as cyclohexylidenediol or 4,4'-butylidenebis(6-tert-butyl-2-methyl)phenol, and an aromatic ring-nucleated hydrogenated epoxy Resin, etc.

又,(D)成分如下述一般式(31)至(35)所列舉之脂環式環氧樹脂。 Further, the component (D) is an alicyclic epoxy resin as exemplified in the following general formulas (31) to (35).

(式中,g、f表示1至20之整數)。 (wherein g and f represent an integer from 1 to 20).

又,(D)成分如下述一般式(36)所表示之脂環式環氧樹脂。 Further, the component (D) is an alicyclic epoxy resin represented by the following general formula (36).

(R32SiO3/2)w(R33R34SiO)x(Me3SiO1/2)y (36)(式中,R32至R34各自為內部可含有環氧基之碳數1至20之烴基、芳香族基,又內部可具有1至3個醚性氧原子。但R32至R34中,需1個以上含有環氧基。又,R33、R34不可同時含有環氧基。w至y為符合w+x+y=1、0≦w<1、0<x<1、0<y<0.75之數)。 (R 32 SiO 3/2 ) w (R 33 R 34 SiO) x (Me 3 SiO 1/2 ) y (36) (wherein R 32 to R 34 are each a carbon number which may contain an epoxy group internally) The hydrocarbon group and the aromatic group to 20 may have 1 to 3 etheric oxygen atoms in the interior. However, in R 32 to R 34 , one or more epoxy groups are required. Further, R 33 and R 34 may not contain a ring at the same time. The oxy group, w to y, is in accordance with w+x+y=1, 0≦w<1, 0<x<1, and 0<y<0.75).

(D)成分非限定於上述環氧樹脂,必要時可使用2種以上。 The component (D) is not limited to the above epoxy resin, and two or more kinds thereof may be used as necessary.

環氧樹脂成分為,以環氧聚矽氧樹脂(A)為必須成分,又含有必要時所添加之液狀環氧樹脂(D)及其他環氧樹脂。環氧樹脂(D)之添加量相對於環氧聚矽氧樹脂(A)100重量份較佳為5至150重量份,環氧樹脂成分全體之環氧當量較佳為180至1000之範圍。又,環氧樹脂成分中之環氧聚矽氧樹脂(A)之含量為40 wt%以上,較佳為60 wt%以上。 The epoxy resin component is an epoxy resin (A) as an essential component, and further contains a liquid epoxy resin (D) and other epoxy resins added as necessary. The amount of the epoxy resin (D) to be added is preferably 5 to 150 parts by weight based on 100 parts by weight of the epoxy polyoxyl resin (A), and the epoxy equivalent of the entire epoxy resin component is preferably in the range of 180 to 1,000. Further, the content of the epoxy polyoxyl resin (A) in the epoxy resin component is 40% by weight or more, preferably 60% by weight or more.

本發明之熱硬化性樹脂組成物使用於LED密封用途時,較佳為添加防氧化劑,以防止加熱時氧化變質而得著色較少之硬化物。 When the thermosetting resin composition of the present invention is used for LED sealing applications, it is preferred to add an antioxidant to prevent oxidative deterioration upon heating to obtain a cured product having less coloration.

防氧化劑可為已知之物適用各種化合物。例如,2,6-tert-丁基-p-甲酚、丁基化羥基茴香醚、2,6-tert-丁基-p-乙基苯酚、硬脂醯-β-(3,5-二-tert-丁基-4,4-羥基苯基)丙酸酯等之單酚類-2,2-伸甲基雙(4-甲基-6-tert-丁基苯酚)、2,2-伸甲基雙(4-乙基-6-tert-丁基苯酚)、4,4’-硫雙(3-甲基-6-tert-丁基苯酚)等之雙酚類、1,1,3-三(2-甲基-4-羥基-5-tert-丁基苯基)丁烷、1,3,5-三甲基-2,4,6-三(3,5-二-tert-丁基-4-羥基苄基)苯、四[伸甲基-3-(3,5-二-tert-丁基-4-羥基苯基)丙酸酯]甲烷等之高分子型酚類、9,10-二氫-9-噁-10-磷雜菲-10-氧化物、10-(3,5-二-tert-丁基-4-羥基苄基)-9,10-二氫-9-噁-10-磷雜菲-10-氧化物、10-癸氧基-9,10-二氫-9-噁-10-磷雜菲-10-氧化物等之噁磷雜菲氧化物類、二月桂基3,3’-二月桂基3,3’-硫二丙酸酯、二肉豆蔻基3,3’-二月桂基3,3’-硫二丙 酸酯、二硬脂醯3,3’-二月桂基3,3’-硫二丙酸酯、季戊四醇基四(3-月桂基硫丙酸酯)等之含有酯骨架之硫醚化合物系防氧化劑。該等防氧化劑於必要時可使用2種以上。 The antioxidant can be a known compound for various compounds. For example, 2,6-tert-butyl-p-cresol, butylated hydroxyanisole, 2,6-tert-butyl-p-ethylphenol, stearin-β-(3,5-di Monophenols such as -tert-butyl-4,4-hydroxyphenyl)propionate-2,2-extended methylbis(4-methyl-6-tert-butylphenol), 2,2- a bisphenol such as methyl bis(4-ethyl-6-tert-butylphenol) or 4,4'-thiobis(3-methyl-6-tert-butylphenol), 1,1, 3-tris(2-methyl-4-hydroxy-5-tert-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-tert Polymeric phenols such as -butyl-4-hydroxybenzyl)benzene, tetrakis(methyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] 9,10-Dihydro-9-oxo-10-phosphaphenanthrene-10-oxide, 10-(3,5-di-tert-butyl-4-hydroxybenzyl)-9,10-dihydrogen Oxaphosphorus phenanthrene oxidation of -9-oxo-10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxo-10-phosphaphenanthrene-10-oxide Species, 2 lauryl 3,3'-dilauryl 3,3'-thiodipropionate, dimyristyl 3,3'-dilauryl 3,3'-thiodipropyl An ester-containing thioether compound such as an acid ester, distearyl 3,3'-dilauryl 3,3'-thiodipropionate or pentaerythritol tetrakis(3-lauryl thiopropionate) Oxidizer. These antioxidants may be used in combination of two or more kinds as necessary.

又,本發明之熱硬化性樹脂組成物可添加其他熱硬化性樹脂。該類熱硬化性樹脂如,不飽和聚酯樹脂、熱硬化性丙烯酸樹脂、熱硬化性胺基樹脂、熱硬化三聚氰胺樹脂、熱硬化性脲樹脂、熱硬化性胺基甲酸酯樹脂、熱硬化性環氧丙烷樹脂、熱硬化性環氧/環氧丙烷複合樹脂等非限定於該等。 Further, other thermosetting resins may be added to the thermosetting resin composition of the present invention. Such thermosetting resins such as unsaturated polyester resins, thermosetting acrylic resins, thermosetting amine-based resins, thermosetting melamine resins, thermosetting urea resins, thermosetting urethane resins, and thermosetting The propylene oxide resin, the thermosetting epoxy/propylene oxide composite resin, and the like are not limited thereto.

本發明之硬化性樹脂組成物為,以上述(A)至(C)成分為必須成分,但又以樹脂成分(包含其他樹脂、硬化後成為部分樹脂之成分。例如單體、硬化劑、硬化促進劑,但不包含溶劑、填充劑)之60wt%以上,較佳為80wt%以上,更佳為90wt%以上為(A)成分至(B)成分為佳。又,(A)成分、(B)成分及(C)成分之添加比例較佳以下述方法決定。 The curable resin composition of the present invention contains the components (A) to (C) as essential components, but also contains a resin component (including other resins and components which become partial resins after curing. For example, monomers, hardeners, and hardening) The promoter (but not including the solvent or the filler) is preferably 60% by weight or more, preferably 80% by weight or more, more preferably 90% by weight or more, and more preferably the component (A) to the component (B). Further, the addition ratio of the component (A), the component (B) and the component (C) is preferably determined by the following method.

(B)成分不為陽離子硬化劑時,(A)成分之環氧當量與(B)成分之硬化劑中之官能基的當量比較佳為0.8至1.5之範圍。該範圍以外時既使硬化後也會殘留未反應之環氧基或硬化劑中之官能基,而降低形成硬化物之硬度及耐熱性等之機能故不宜。又,硬化促進劑之(C)成分之添加比例,相對於(A)成分與(B)成分之合計較佳為0.1wt%至5wt%之範圍。未達0.1wt%時會減緩凝膠化時間而降低硬化時之剛性故會降低作業性,相反地超 過5.0wt%時成形途中促進硬化,而易發生未充填。 When the component (B) is not a cationic curing agent, the epoxy equivalent of the component (A) and the equivalent of the functional group in the hardener of the component (B) are preferably in the range of 0.8 to 1.5. When it is outside this range, the functional group in the unreacted epoxy group or the curing agent remains after hardening, and the function of forming the hardness and heat resistance of the cured product is not preferable. Moreover, the addition ratio of the component (C) of the hardening accelerator is preferably in the range of 0.1% by weight to 5% by weight based on the total of the components (A) and (B). When it is less than 0.1% by weight, the gelation time is slowed down and the rigidity at the time of hardening is lowered, so that workability is lowered, and vice versa. When it is over 5.0% by weight, it hardens during the forming, and it is easy to be unfilled.

(B)成分為陽離子之硬化劑時,相對於(A)成分100重量份為0.01至10重量份,較佳為0.1重量份至5重量份。未達0.01重量份時易發生硬化不良,相反地超過5重量份時,將不利於耐熱著色性觀點。 When the component (B) is a cationic hardener, it is 0.01 to 10 parts by weight, preferably 0.1 part by weight to 5 parts by weight, per 100 parts by weight of the component (A). When the amount is less than 0.01 part by weight, the curing failure tends to occur, and when it exceeds 5 parts by weight, it is disadvantageous in terms of heat-resistant coloring property.

本發明之熱硬化性樹脂組成物含有(E)白色顏料時,可形成適用於光反射用之熱硬化性樹脂組成物。 When the thermosetting resin composition of the present invention contains (E) a white pigment, it can form a thermosetting resin composition suitable for light reflection.

白色顏料(E)可選擇已知之材料用各種之物。例如,二氧化矽、氧化鋁、氧化鎂、氧化銻、氧化鈦、氧化鋯等之金屬氧化物、矽酸鹼玻璃、鋁矽酸玻璃、硼矽酸鹼玻璃、白砂等之無機中空粒子等但非限定於該等,必要時可併用2種以上。較佳之白色顏料為,由二氧化矽、氧化鈦、氧化鋁、氧化鎂、氧化鋯及無機中空粒子中所選出之至少1種,就熱傳導性及光反射特性之觀點較佳為氧化鋁及氧化鈦。 The white pigment (E) can be selected from various materials for known materials. For example, metal oxides such as cerium oxide, aluminum oxide, magnesium oxide, cerium oxide, titanium oxide, and zirconium oxide, inorganic silicate glass, aluminosilicate glass, borosilicate glass, white sand, etc. It is not limited to these, and if necessary, two or more types can be used together. A preferred white pigment is at least one selected from the group consisting of cerium oxide, titanium oxide, aluminum oxide, magnesium oxide, zirconium oxide and inorganic hollow particles, and alumina and oxidation are preferred from the viewpoints of thermal conductivity and light reflection characteristics. titanium.

上述白色顏料(E)之含量,以樹脂組成物全量為基準下較佳為10至85vol%之範圍。白色顏料(E)之含量為10vol%以下時,白色度將不足無法得到充分硬化物之光反射性。又,超過85vol%時,可能使樹脂組成物之混練性、成型性變差。 The content of the above white pigment (E) is preferably in the range of 10 to 85 vol% based on the total amount of the resin composition. When the content of the white pigment (E) is 10 vol% or less, the whiteness is insufficient to obtain the light reflectivity of the sufficiently cured product. Moreover, when it exceeds 85 vol%, the kneadability and moldability of the resin composition may be deteriorated.

適用於光反射用之熱硬化性樹脂組成物為了提升與白色顏料(E)之表面接合性等,可使用偶合劑等之添加劑。偶合劑,具有環氧基、胺基、硫醇基、丙烯酸基、乙烯基異氰酸酯基中任何一種之烷氧基矽烷類或烷氧基鈦酸 酯類,可選擇已知之材料用各種之物。該類添加劑之使用量無特別限定,可由業者決定較佳之量。但一般為樹脂組成物全量為基準下之5wt%以下。 The thermosetting resin composition for light reflection can be used as an additive such as a coupling agent in order to improve the surface bondability with the white pigment (E). a coupling agent having an alkoxy decane or an alkoxy titanate having any one of an epoxy group, an amine group, a thiol group, an acryl group, and a vinyl isocyanate group. For esters, various materials can be selected for known materials. The amount of the additive to be used is not particularly limited, and a preferred amount can be determined by the manufacturer. However, it is generally 5% by weight or less based on the total amount of the resin composition.

本發明之熱硬化性樹脂適用為電子構件時,其用途、製造步驟可為已知之物無特別限定。例如作為半導體密封材料時可使用,本發明之熱硬化性樹脂組成物混合二氧化矽等之填料後,以捏和機或加熱之3座輥混練再薄片化,其後送入密封用模具之空孔中熱硬化之輸送模式之方式。又可使用,混合室溫下液狀之硬化劑後,必要使用二氧化矽、氧化鋁、氧化鈦等之填料等調整為所希望之黏度後再將樹脂注入一定位置之分配方式。 When the thermosetting resin of the present invention is used as an electronic member, the use and the production steps thereof are not particularly limited. For example, it can be used as a semiconductor sealing material, and the thermosetting resin composition of the present invention is mixed with a filler such as cerium oxide, and then kneaded by a kneader or a heated three-seat roll to be thinned, and then fed to a sealing mold. The mode of heat hardening in the empty hole. Further, after mixing a liquid hardening agent at room temperature, it is necessary to adjust the viscosity to a desired viscosity by using a filler such as cerium oxide, aluminum oxide or titanium oxide, and then to inject the resin into a predetermined position.

均勻分散混合本發明之熱硬化性樹脂組成物之方法無特別限定,業者可以較佳之方法實施。例如,使用混合輥、擠壓機、捏和機、滾軸、壓出機、自轉/公轉攪拌混合機等之裝置混煉各種成分後,冷卻所得之混練物再粉碎之方法。又,混練時就分散性之觀點,較佳以熔融狀態可處理樹脂組成物之溫度進行。 The method of uniformly dispersing and mixing the thermosetting resin composition of the present invention is not particularly limited, and can be carried out by a preferred method. For example, a method of kneading various components using a mixing roll, an extruder, a kneader, a roller, an extruder, a spinning/revolving stirring mixer, and the like, and then cooling the obtained kneaded material and pulverizing it. Further, from the viewpoint of dispersibility at the time of kneading, it is preferred to carry out the temperature at which the resin composition can be treated in a molten state.

本發明之熱硬化性樹脂組成物使用分散混合、冷卻粉碎後,打錠為薄片狀之輸送模式等之方法,可得成型體。此時凹模成型於預先實施金屬配線之引線框上,可適用為光半導體搭載用筐體。又,塗佈、加壓成型於銅箔上,可得白色之銅張層合板。該白色銅張層合板適用為光半導體搭載用電路基板。 The thermosetting resin composition of the present invention can be obtained by a method in which dispersion, mixing, cooling and pulverization are carried out, and the tablet is in a sheet-like transport mode. At this time, the female mold is formed on the lead frame in which the metal wiring is previously formed, and is applicable to the optical semiconductor mounting housing. Further, it is applied and pressure-molded on a copper foil to obtain a white copper sheet laminate. This white copper sheet laminate is suitably used as a circuit board for mounting an optical semiconductor.

本發明之熱硬化性樹脂組成物適用為電子構件時,其 用途、製造步驟可為已知之物無特別限定。例如,作為半導體密封材料時可使用,本發明之熱硬化性樹脂組成物混合二氧化矽等之填料後,以捏和機或加熱之3座輥混練再薄片化,其後送入密封用模具之空孔中熱硬化之輸送模式方式。又可使用,混合室溫下液狀之硬化劑後,必要時使用二氧化矽、氧化鋁、氧化鈦等之填料等調整為所希望之黏度,再將樹脂入一定位置之分配方式。 When the thermosetting resin composition of the present invention is applied to an electronic member, The use and the production steps are not particularly limited as long as they are known. For example, when it is used as a semiconductor sealing material, the thermosetting resin composition of the present invention is mixed with a filler such as ruthenium dioxide, and then kneaded by a kneader or a heated three-seat roll to be thinned, and then fed to a sealing mold. The mode of heat hardening in the air hole. Further, after mixing a liquid hardening agent at room temperature, if necessary, a filler such as ceria, alumina, or titanium oxide may be used to adjust the desired viscosity, and then the resin may be placed in a predetermined position.

又可使用,使電路基板,例如玻璃纖維布等之基材含浸本發明之熱硬化性樹脂組成物後,藉由加壓成型貼合銅箔之方法,或藉由鑄造法等將本發明之熱硬化性樹脂組成物塗佈於銅箔上,再貼合所希望之基材之方法。 Further, after the substrate of the circuit board, for example, a glass fiber cloth, is impregnated with the thermosetting resin composition of the present invention, the copper foil is bonded by press molding, or the present invention is used by a casting method or the like. A method in which a thermosetting resin composition is applied onto a copper foil and then bonded to a desired substrate.

又,作為密封、保護基板與半導體之接合部之底部填充膠用時可使用,混合室溫下液狀之硬化劑後,必要時使用二氧化矽、氧化鋁、氧化鈦、橡膠粒子等之填料等調整為所希望之黏度,再將樹脂注入一定位置之分配方式。 In addition, it can be used as a primer for sealing and bonding the substrate to the semiconductor. When a liquid hardener is mixed at room temperature, a filler such as cerium oxide, aluminum oxide, titanium oxide or rubber particles is used if necessary. Then adjust to the desired viscosity, and then inject the resin into a certain position.

又,光學構件用途如,光學透鏡、光半導體用密封劑、光半導體用白色成型材料、光半導體接合劑等,但其用途非限定於該等,適用已知之用途、製造步驟。光學構件用樹脂組成物之一例如,光反射用熱硬化性樹脂組成物,其係如上述添加白色顏料(E)而得。 In addition, the use of the optical member is, for example, an optical lens, a sealing agent for an optical semiconductor, a white molding material for an optical semiconductor, an optical semiconductor bonding agent, etc., but the use thereof is not limited thereto, and a known use and manufacturing procedure are applied. One of the resin compositions for optical members is, for example, a thermosetting resin composition for light reflection, which is obtained by adding a white pigment (E) as described above.

例如光學透鏡材料可藉由分配方式、輸送模式方式等已知之步驟製造。 For example, the optical lens material can be fabricated by known steps such as dispensing mode, transport mode mode, and the like.

作為光半導體裝置(LED裝置)用密封劑用時適用,以金屬線等將光半導體元件接連於外部電極後,使用輸送 模式方式、裝瓶方式等已知之技術填充之方法。此時本發明之熱硬化性樹脂組成物為了轉換來自光半導體元件所發出之光線,可使用各種已知之螢光粉末。又,為了發現適當觸變性,可添加二氧化矽、Aerosil等已知之填料或矽烷偶合劑、表面活性劑等已知之添加劑。 When it is used as a sealant for an optical semiconductor device (LED device), the optical semiconductor element is connected to an external electrode by a metal wire or the like, and then used for transport. Method of filling with known techniques such as mode mode and bottling method. In this case, in order to convert the light emitted from the optical semiconductor element, the thermosetting resin composition of the present invention can use various known fluorescent powders. Further, in order to find appropriate thixotropy, a known filler such as cerium oxide or Aerosil or a known additive such as a decane coupling agent or a surfactant may be added.

光半導體用白色成型材料適用,混合本發明之熱硬化性樹脂組成物與二氧化矽、氧化鈦、氧化鋁等之填料後,以捏和機或加熱之3座輥混練再薄片化,其後送入密封用模具之空孔熱硬化之輸送模式方式。 The photo-semiconductor is suitably used for a white molding material, and after mixing the thermosetting resin composition of the present invention with a filler such as ceria, titanium oxide or alumina, it is kneaded by a kneader or a heated three-roller and then exfoliated. A transport mode in which the holes of the sealing mold are thermally hardened.

光半導體裝置用接合劑適用,使用輥等混練本發明之熱硬化性樹脂組成物,及必要時使用之二氧化矽、氧化鈦、氧化鋁、銀粉等之填料形成糊料後,以分配等方法塗佈於基材,或使用已知之薄膜材料,將其薄膜狀之物貼合於基材上,再安裝半導體元件進行熱硬化之方法等。 The bonding agent for an optical semiconductor device is applied, and a thermosetting resin composition of the present invention is kneaded by a roll or the like, and a paste such as ceria, titanium oxide, aluminum oxide or silver powder used as necessary to form a paste, and then dispensed. A method in which a film material is applied to a substrate, a film-like material is bonded to a substrate, and a semiconductor element is thermally cured.

本發明之熱硬化性樹脂組成物可使用旋塗機、棒塗機等以薄膜狀塗佈於特佛隆(登記商標)板、PET薄膜、聚醯亞胺等之基材上,熱硬化後剝離基材得薄膜物。 The thermosetting resin composition of the present invention can be applied to a substrate of a Teflon (registered trademark) plate, a PET film, a polyimide or the like in a film form using a spin coater, a bar coater or the like, and after heat curing. The substrate is peeled off to obtain a film.

經由上述方法所得之熱硬化性樹脂及熱硬化薄膜適用於已知之電子構件用途、光學構件用途等各種用途,可適用於可撓性印刷配線板、各向異性導電薄膜、覆蓋膜、芯片接合薄膜、層間絕緣材料等之電子構件用途、透明保護薄膜、光導波路用薄膜、光半導體薄膜等之光學構件用途。 The thermosetting resin and the thermosetting film obtained by the above method are suitable for various applications such as known electronic component applications and optical member applications, and are applicable to flexible printed wiring boards, anisotropic conductive films, cover films, and die-bonding films. Use of an electronic component such as an interlayer insulating material, a transparent protective film, an optical waveguide film, or an optical semiconductor film.

實施例 Example

下面將舉實施例具體說明本發明,但不超出其要旨下本發明非限定於下述實施例。 The present invention will be specifically described by way of examples, but the present invention is not limited to the following examples.

實施例1 Example 1

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷33重量份(SiH基為0.25當量)、二噁烷120重量份、碳附載鉑(鉑附載量3%)0.17重量份投入安裝攪拌馬達、回流冷卻管、氮管線之500mL可分式燒瓶中,攪拌下升溫至100℃。其次以1小時將一般式(6)中,R2為甲基、k之平均值為4之兩末端具有乙烯基之有機矽氧烷10重量份(乙烯基為0.04當量)投入反應系內。以凝膠滲透色譜法(GPC)確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯57重量份(乙烯基為0.21當量)溶解於二噁烷57重量份所得之溶液。結束投液後,將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1N之KOH/甲醇溶液中,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑後,得一般式(1)中l=1、m=1、n之平均值為0.2、R1為甲基、R2為丙基、E1為一般式(2)所表示之取代基、Z為一般式(3)所表示、R3為甲基、k之平均值為4之兩末 端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES1)88重量份。該樹脂之環氧當量為235,黏度(25℃)為680 Pa‧s。該樹脂之IR光譜如圖1所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, 33 parts by weight of a cyclic organosiloxane having a SiH group at both ends (SiH group is 0.25 equivalent), and dioxane 120 weight 0.17 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 500 mL separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 10 parts by weight (vinyl group: 0.04 equivalent) of the organic oxirane having a vinyl group at both ends of the general formula (6), R 2 being a methyl group and k having an average value of 4 was introduced into the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by gel permeation chromatography (GPC), 57 parts by weight of monoallyl diglycidyl trimer isocyanate (0.21 equivalent of vinyl group) was added in one hour to dissolve in 57 parts by weight of dioxane. Solution. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution to confirm that no hydrogen was generated, and the remaining platinum was filtered using diatomaceous earth. catalyst. After the solvent of the filtrate is distilled off using an evaporator, l=1, m=1, n of the general formula (1) have an average value of 0.2, R 1 is a methyl group, R 2 is a propyl group, and E 1 is a general formula ( 2) The substituent represented by Z, is represented by the general formula (3), R 3 is a methyl group, and the average value of k is 4, and the epoxy group of the trimeric isocyanato ring having an epoxy group at both ends is The epoxy resin (ES1) was 88 parts by weight. The resin had an epoxy equivalent of 235 and a viscosity (25 ° C) of 680 Pa‧s. The IR spectrum of this resin is shown in Figure 1.

實施例2 Example 2

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷33重量份(SiH基為0.25當量)、二噁烷150重量份、碳附載鉑(鉑附載量3%)0.32重量份投入安裝攪拌馬達、回流冷卻管、氮管線之500 mL可分式燒瓶中,攪拌下升溫至100℃。其次以1小時將一般式(6)中,R3為甲基、k之平均值為4之兩末端具有乙烯基之有機矽氧烷23重量份(乙烯基為0.1當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯44重量份(乙烯基為0.16當量)溶解於二噁烷44重量份所得之溶液。結束投液後,將內溫升溫至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1N之KOH/甲醇溶液中,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中l=1、m=1、n之平均值為0.7、R1為甲基、R2為丙基、E1為一般式(2)所表示之取代基、Z為一般式(3)所表示、R3為甲基、k之平均值為4之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES2) 91重量份。該樹脂之環氧當量為313,黏度為200 Pa‧s。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a ring-shaped organic alkane having a SiH group at both ends thereof is 33 parts by weight (SiH group is 0.25 equivalent), and dioxane is 150 weight. 0.32 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 500 mL separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 23 parts by weight (vinyl equivalent of 0.1 equivalent) of the organic oxirane having a vinyl group at both ends of the general formula (6), R 3 being a methyl group and k having an average value of 4 was introduced into the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 44 parts by weight of monoallyl diglycidyl trimeric isocyanate (the vinyl group was 0.16 equivalent) was added in one hour, and the resulting solution was dissolved in 44 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution to confirm that no hydrogen was generated, and the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate was distilled off using an evaporator to obtain l=1, m=1, n of the general formula (1), and the average value of n was 0.7, R 1 was a methyl group, R 2 was a propyl group, and E 1 was a general formula (2). The substituent represented by Z, is represented by the general formula (3), R 3 is a methyl group, and the average value of k is 4, and the epoxy polycondensation of the trimeric isocyanato ring having an epoxy group at both ends is used. Oxygen resin (ES2) 91 parts by weight. The resin had an epoxy equivalent of 313 and a viscosity of 200 Pa‧s.

實施例3 Example 3

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷30重量份(SiH基為0.22當量)、二噁烷150重量份、碳附載鉑(鉑附載量3%)0.17重量份投入安裝攪拌馬達、回流冷卻管、氮管線之500mL可分式燒瓶中,攪拌下升溫至100℃。其次以1小時將一般式(6)中,R3為甲基、k之平均值為8之兩末端具有乙烯基之有機矽氧烷26重量份(乙烯基為0.07當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯44重量份(乙烯基為0.16當量)溶解於二噁烷44重量份所得之溶液。結束投液後,將內溫升溫至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1N之KOH/甲醇溶液中,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑後,得一般式(1)中l=1、m=1、n之平均值為0.5、R1為甲基、R2為丙基、E1為一般式(2)所表示之取代基、Z為一般式(3)所表示、R3為甲基、k之平均值為8之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES3)91重量份。該樹脂之環氧當量為319,黏度為160 Pa‧ s。該樹脂之IR光譜如圖2所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, 30 parts by weight of a cyclic organic siloxane having a SiH group at both ends (SiH group is 0.22 equivalent), and dioxane 150 weight 0.17 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 500 mL separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, in the general formula (6), R 3 was a methyl group, and an average value of k was 8 and 26 parts by weight of a vinyl oxirane having a vinyl group (vinyl group of 0.07 equivalent) at both ends was put into the reaction system. After confirming that the molecular weight was stopped increasing by the GPC method, 44 parts by weight of monoallyl diglycidyl trimeric isocyanate (the vinyl group was 0.16 equivalent) was added in one hour, and the resulting solution was dissolved in 44 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution to confirm that no hydrogen was generated, and the remaining platinum was filtered using diatomaceous earth. catalyst. After the solvent of the filtrate is distilled off using an evaporator, l=1, m=1, n of the general formula (1) have an average value of 0.5, R 1 is a methyl group, R 2 is a propyl group, and E 1 is a general formula ( 2) The substituent represented by Z, is represented by the general formula (3), R 3 is a methyl group, and the average value of k is 8 and both ends have an epoxy group of an epoxy group-containing trimeric isocyanato ring. 91 parts by weight of a silicone resin (ES3). The resin had an epoxy equivalent of 319 and a viscosity of 160 Pa‧ s. The IR spectrum of this resin is shown in Figure 2.

實施例4 Example 4

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷134重量份(SiH基為1.0當量)、二噁烷350重量份、碳附載鉑(鉑附載量3%)0.70重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶中,攪拌下升溫至100℃。其次以1小時將一般式(6)中,R3為甲基、k之平均值為4之兩末端具有乙烯基之有機矽氧烷135重量份(乙烯基為0.56當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯124重量份(乙烯基為0.44當量)溶解於二噁烷124重量份所得之溶液。結束投液後,將內溫升溫至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為1.3、R1為甲基、R2為丙基、E1為一般式(2)所表示之取代基、Z為一般式(3)所表示、R3為甲基、k之平均值為4之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES4)347重量份。該樹脂之環氧當量為439,黏度為30 Pa‧s。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and 134 parts by weight of a cyclic organosiloxane having a SiH group at both ends (SiH group is 1.0 equivalent), and dioxane 350 weight 0.70 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, in the general formula (6), R 3 was a methyl group, and an average value of k was 4, and 135 parts by weight of a vinyl oxirane having a vinyl group at both ends (vinyl group of 0.56 equivalent) was placed in the reaction system. After confirming that the molecular weight was stopped by the GPC method, 124 parts by weight of monoallyl diglycidyl trimer isocyanate (0.44 equivalent of vinyl group) was added in one hour to dissolve the solution in 124 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the absence of hydrogen gas, the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 1.3, R 1 is a methyl group, R 2 is a propyl group, and E 1 is a general formula ( 2) The substituent represented by Z, is represented by the general formula (3), R 3 is a methyl group, and the average value of k is 4, and the epoxy group of the trimeric isocyanato ring having an epoxy group at both ends is The epoxy resin (ES4) was 347 parts by weight. The resin had an epoxy equivalent of 439 and a viscosity of 30 Pa‧s.

實施例5 Example 5

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷21重量份(SiH基為0.16當量)、二噁烷100重量份、碳附載鉑(鉑附載量3%)0.17重量份投入安裝攪拌馬達、回流冷卻管、氮管線之500 mL可分式燒瓶中,攪拌下升溫至100℃。其次以1小時將一般式(6)中,R3為甲基、k之平均值為18之兩末端具有乙烯基之有機矽氧烷54重量份(乙烯基為0.07當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯26重量份(乙烯基為0.09當量)溶解於二噁烷26重量份所得之溶液。結束投液後,將內溫升至110℃,於二噁烷烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為0.8、R1為甲基、R2丙基、E1為一般式(2)所表示之取代基、Z為一般式(3)所表示、R3為甲基、k之平均值為18之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES5)93重量份。該樹脂之環氧當量為541,黏度為8 Pa‧s。該樹脂之IR光譜如圖3所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a ring-shaped organic alkane having a SiH group at both ends thereof is 21 parts by weight (SiH group is 0.16 equivalent), and dioxane is 100% by weight. 0.17 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 500 mL separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 54 parts by weight (vinyl group: 0.07 equivalent) of an organic siloxane having a vinyl group at both ends of the general formula (6), R 3 being a methyl group and k having an average value of 18 was introduced into the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 26 parts by weight of monoallyl diglycidyl trimer isocyanate (0.09 equivalent of vinyl group) was added in one hour to dissolve a solution of 26 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the absence of hydrogen gas, the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 0.8, R 1 is a methyl group, R 2 propyl group, and E 1 is a general formula (2). The substituent represented by Z, is represented by the general formula (3), R 3 is a methyl group, and the average value of k is 18, and the epoxy polycondensation of the trimeric isocyanato ring having an epoxy group at both ends is used. Oxygen resin (ES5) 93 parts by weight. The resin had an epoxy equivalent of 541 and a viscosity of 8 Pa‧s. The IR spectrum of the resin is shown in Figure 3.

實施例6 Example 6

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷134重量份(SiH基為1.0當量)、二噁烷100重量份、碳附載鉑(鉑附載量3%)0.82重量份投入安裝攪拌馬達、回流冷卻管、氮管線之1 L可分式燒瓶中,攪拌下升溫至100℃。其次以1小時將一般式(7)中,R4為甲基、i=1、j=1之兩末端具有乙烯基之環狀有機矽氧烷72重量份(乙烯基為0.45當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯155重量份(乙烯基為0.55當量)溶解於二噁烷155重量份所得之溶液。結束投液後,將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為0.8、R1為甲基、R2為丙基、E1為一般式(2)所表示之取代基、Z為一般式(4)所表示、R4為甲基、i=1、j=1之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES6)321重量份。該樹脂之環氧當量為325,室溫下為不具流動性之固體狀樹脂。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and 134 parts by weight of a cyclic organosiloxane having a SiH group at both ends (SiH group is 1.0 equivalent), and dioxane 100 weight 0.8 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 1 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 72 parts by weight (vinyl equivalent of 0.45 equivalents) of a cyclic organooxane having a vinyl group at both ends of the general formula (7), R 4 being a methyl group, i=1, j=1, was put into the reaction in one hour. Department. After confirming that the molecular weight was stopped by the GPC method, 155 parts by weight of monoallyl diglycidyl trimer isocyanate (0.55 equivalent of vinyl group) was added in one hour to dissolve the solution of 155 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the absence of hydrogen gas, the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 0.8, R 1 is a methyl group, R 2 is a propyl group, and E 1 is a general formula ( 2) The substituent represented by Z, which is represented by the general formula (4), wherein R 4 is a methyl group, i=1, and j=1 has an epoxy group containing an epoxy group-containing trimeric isocyanato ring. Polyoxygenated resin (ES6) was 321 parts by weight. The resin had an epoxy equivalent of 325 and was a solid resin having no fluidity at room temperature.

合成例1 Synthesis Example 1

將式(37)所表示之有機氫化矽氧烷26.4重量份(SiH基為0.2當量)、二噁烷78重量份、碳附載鉑(鉑附載量3%)0.14重量份投入安裝攪拌馬達、回流冷卻管、氮管線之500 mL可分式燒瓶中,攪拌下升溫至100℃。其次以1小投入單烯丙基二縮水甘油基三聚氰酸酯56.2重量份(乙烯基為0.2當量)溶解於二噁烷56重量份所得之溶液。結束投液後,將內溫升至110℃,於二噁烷回流下進行反應。將反應液滴入0.1N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得兩末端及支鏈具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES7)74重量份。該樹脂之環氧當量為203,室溫下為不具流動性之半固體狀。 26.4 parts by weight of the organohydrogenated hydrazine represented by the formula (37) (0.2 equivalent of the SiH group), 78 parts by weight of dioxane, and 0.14 parts by weight of platinum (carbon supported amount of 3%) were placed in a stirring motor and refluxed. The 500 mL separable flask of the cooling tube and the nitrogen line was heated to 100 ° C with stirring. Next, 56.2 parts by weight of a monoallyl diglycidyl cyanurate (0.2 equivalent of a vinyl group) was dissolved in a solution of 56 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction solution was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the occurrence of no hydrogen gas, the residual platinum catalyst was used. The solvent of the filtrate was distilled off using an evaporator to obtain 74 parts by weight of an epoxy polyoxyl resin (ES7) having both ends and a trimeric isocyanato ring containing an epoxy group. The resin had an epoxy equivalent of 203 and was semi-solid in the absence of fluidity at room temperature.

實施例7至12 Examples 7 to 12

使用甲基化六氫酞酸酐(MH:酸酐當量168 g/eq.),以環氧樹脂與酸酐之當量比為1:1之條件添加 實施例1至6所得之環氧聚矽氧樹脂(ES1至6),充分混合後,相對於全體混合0.5重量%之硬化促進劑用之四-n-丁基鏻o,o’-二乙基偶磷基二硫酸酯(TBDP)。將該混合物真空脫氣後,於模具內以120℃下4小時、160℃下12小時之條件進行硬化,製作厚1 mm及4 mm之樹脂板。 Using methylated hexahydrophthalic anhydride (MH: anhydride equivalent 168 g/eq.), the equivalent ratio of epoxy resin to anhydride is 1:1. The epoxy polyoxynene resins (ES1 to 6) obtained in Examples 1 to 6 were sufficiently mixed, and then mixed with 0.5% by weight of the hardening accelerator for tetra-n-butyl fluorene, o'-diethyl Phenylphosphinodisulfate (TBDP). The mixture was degassed under vacuum, and then cured in a mold at 120 ° C for 4 hours and at 160 ° C for 12 hours to prepare a resin plate having a thickness of 1 mm and 4 mm.

實施例13 Example 13

(A)成分使用實施例3所得之環氧聚矽氧樹脂(ES3)70重量份,調製再添加(D)成分用之3,4-環氧環己烯基甲基-3’,4’-環氧環己烯羧酸酯(EpC:環氧當量130)30重量份之樹脂液。該樹脂液以環氧當量與酸酐當量之比為1:1之條件添加MH,充分混合後相對於全體混合0.5重量%的硬化促進劑用之TBDP。 (A) component 70 parts by weight of the epoxy polyoxyl resin (ES3) obtained in Example 3 was prepared, and 3,4-epoxycyclohexenylmethyl-3', 4' for the component (D) was prepared. - epoxycyclohexene carboxylate (EpC: epoxy equivalent 130) 30 parts by weight of a resin liquid. This resin liquid was added with MH under the condition that the ratio of the epoxy equivalent to the acid anhydride equivalent was 1:1, and the TBDP for the hardening accelerator was mixed with 0.5% by weight of the entire resin mixture.

實施例14 Example 14

(A)成分使用實施例1所得之環氧聚矽氧樹脂(ES4)70重量份,調製再添加(D)成分用之EpC 30重量份之樹脂液。該樹脂液以環氧當量與酸酐當量之比為1:1之條件添加MH,充分混合後相對於全體混合0.5重量%的硬化促進劑用之TBDP。 (A) Component 70 parts by weight of EpC for the component (D) was prepared by using 70 parts by weight of the epoxy polyoxyl resin (ES4) obtained in Example 1. This resin liquid was added with MH under the condition that the ratio of the epoxy equivalent to the acid anhydride equivalent was 1:1, and the TBDP for the hardening accelerator was mixed with 0.5% by weight of the entire resin mixture.

實施例15至20 Examples 15 to 20

使用二乙基甲苯二胺(DETDA:活性氫當量45 g/eq.),以環氧當量與活性氫當量之比為1:1之條件添加實施例1至6所得之環氧聚矽氧樹脂(A)(ES1至6),充分混合後相對於全體混合0.5重量%的硬化促進劑用之2-乙基-4-甲基咪唑(EIMZ)。 Use diethyltoluenediamine (DETDA: active hydrogen equivalent 45 g/eq.), the epoxy polyoxyl resin (A) (ES1 to 6) obtained in Examples 1 to 6 was added under the condition that the ratio of the epoxy equivalent to the active hydrogen equivalent was 1:1, and the mixture was sufficiently mixed with respect to The whole was mixed with 0.5% by weight of 2-ethyl-4-methylimidazole (EIMZ) for the hardening accelerator.

比較例1 Comparative example 1

不使用(A)成分下,使用3,4-環氧環己烯基甲基-3’,4’-環氧環己烯羧酸酯(EpC)26重量份、MH 34重量份以外,同實施例7製作樹脂板。 In the case of using the component (A), 26 parts by weight of 3,4-epoxycyclohexenylmethyl-3', 4'-epoxycyclohexenecarboxylate (EpC), and 34 parts by weight of MH were used. Example 7 A resin sheet was produced.

比較例2 Comparative example 2

不使用(A)成分下,使用三縮水甘油基三聚異氰酸酯(EpT,環氧當量100)20重量份、MH 34重量份以外,同比較例1製作樹脂板。 A resin plate was produced in the same manner as in Comparative Example 1, except that 20 parts by weight of triglycidyl trimeric isocyanate (EpT, epoxy equivalent 100) and 34 parts by weight of MH were used without using the component (A).

比較例3 Comparative example 3

使用((Me2CH2=CH)SiO1/2)1.0(MeSiO3/2)1.11(Me2SiO)0.05所表示之聚矽氧械脂100重量份、乙烯基當量為1,400 g/eq之兩末端含有乙烯基之二甲基矽氧烷油20重量份、氫矽烷基當量為64 g/eq之甲基氫化聚矽氧油48重量份,且相對於全重量混合硬化觸媒用之鉑-四乙烯基二矽氧烷錯合物之二甲苯溶液20 ppm。 100 parts by weight of a polysulfide resin represented by ((Me 2 CH 2 =CH)SiO 1/2 ) 1.0 (MeSiO 3/2 ) 1.11 (Me 2 SiO) 0.05 , and a vinyl equivalent of 1,400 g/eq 20 parts by weight of a vinyl dimethyl siloxane oil having a vinyl group and 48 parts by weight of a methylhydrogenated polyoxyxane having a hydroquinone equivalent of 64 g/eq at both ends, and a platinum for hardening catalyst is mixed with respect to the total weight - a tetraethylene dioxane complex in a xylene solution of 20 ppm.

比較例4 Comparative example 4

使用(C6H5)0.62(CH2=CH)0.38(CH3)0.38SiO1.31所表示苯基聚矽氧械脂30重量份、與氫矽烷基當量為163 g/eq之甲基氫化聚矽氧油16重量份,且相對於全重量混合硬化觸媒用之鉑-四乙烯基二矽氧烷錯合物之二甲苯溶液20 ppm。 30 parts by weight of phenyl polysulfide represented by (C 6 H 5 ) 0.62 (CH 2 =CH) 0.38 (CH 3 ) 0.38 SiO 1.31 , and the hydroquinone equivalent is 163. The g/eq methylhydrogenated polyoxyxane oil was 16 parts by weight, and 20 ppm of a platinum-tetravinyldioxane complex solution xylene solution for the hardening catalyst was mixed with respect to the total weight.

比較例5 Comparative Example 5

不使用(A)成分下,使用下述一般式(15)(R6SiO3/2)w(R7R8SiO)x(Me3SiO1/2)y (15)中,w=0、x=0.8、y=0.2所表示之R7為甲基、R8為2-(3,4-環氧環己基)乙基所表示之環氧聚矽氧樹脂(ESC,環氧當量207)42重量份、MH 27重量份以外,同實施例7製作樹脂板。 Without using the component (A), the following general formula (15) (R 6 SiO 3/2 ) w (R 7 R 8 SiO) x (Me 3 SiO 1/2 ) y (15) is used, w=0 , x=0.8, y=0.2, wherein R 7 is a methyl group, and R 8 is an epoxy polyoxyl resin represented by 2-(3,4-epoxycyclohexyl)ethyl (ESC, epoxy equivalent 207 A resin plate was produced in the same manner as in Example 7 except for 42 parts by weight and 27 parts by weight of MH.

比較例6 Comparative Example 6

不使用(A)成分下,使用合成例1所得之環氧聚矽氧樹脂(ES6)40.6重量份、MH 33.6重量份以外,進行與實施例7相同之操作,製作厚1 mm及4 mm之樹脂板。 The same operation as in Example 7 was carried out, except that the component (A) was used, except that 40.6 parts by weight of the epoxy polyoxyl resin (ES6) obtained in Synthesis Example 1 and 33.6 parts by weight of MH were used, and the thickness was 1 mm and 4 mm. Resin board.

比較例7 Comparative Example 7

使用1,3,5,7-四甲基環四矽氧烷與過量之乙烯基降莰烯之氫矽烷基化反應生成物(乙烯基當量:250 g/eq.)25重量份,及過量1,3,5,7-四甲基環四矽氧烷與乙烯基降莰 烯之氫矽烷基化反應生成物(SiH當量:160 g/eq.)16重量份,且相對於全重量混合硬化觸媒用之鉑-四乙烯基二矽氧烷錯合物之二甲苯溶液20 ppm。 25 parts by weight of a hydroquinone alkylation reaction product (vinyl equivalent: 250 g/eq.) of 1,3,5,7-tetramethylcyclotetraoxane with an excess of vinyl norbornene, and an excess amount 1,3,5,7-tetramethylcyclotetraoxane with vinyl hydrazine 16 parts by weight of a hydroquinone alkylation reaction product of the alkene (SiH equivalent: 160 g/eq.), and a xylene solution of a platinum-tetravinyldioxane complex according to a full weight mixed hardening catalyst 20 ppm.

將實施例7至20及比較例1至7所得之混合物真空脫氣後,於模具內以120℃下4小時、160℃下12小時之條件進行硬化,製作厚1 mm及4 mm之樹脂板。 The mixture obtained in Examples 7 to 20 and Comparative Examples 1 to 7 was vacuum-degassed, and then hardened in a mold at 120 ° C for 4 hours and at 160 ° C for 12 hours to prepare a resin plate having a thickness of 1 mm and 4 mm. .

以下述方法測定硬化後之樹脂板之物性。 The physical properties of the cured resin sheet were measured by the following methods.

(1)測定玻璃化溫度(Tg) (1) Determination of glass transition temperature (Tg)

使用精工電子工業(股)製熱應力變形測定裝置TMA/SS120U以30℃至270℃測定,再以線膨脹率變化之溫度作為玻璃化溫度。升溫速度為5℃/分。 The thermal stress deformation measuring apparatus TMA/SS120U manufactured by Seiko Instruments Inc. was used to measure at 30 ° C to 270 ° C, and the temperature at which the linear expansion ratio was changed was used as the glass transition temperature. The heating rate was 5 ° C / min.

(2)測定線膨脹率(CTE) (2) Determination of linear expansion ratio (CTE)

使用精工電子工業(股)製熱應力變形測定裝置TMA/SS120U以30℃至270℃測定,再由40℃與60℃等2點連結所得之直線之傾斜度算出線膨脹率。升溫速度為5℃/分。 The coefficient of linear expansion was calculated by measuring the inclination of a straight line obtained by joining two points of 40° C. and 60° C. using a thermal stress deformation measuring apparatus TMA/SS120U manufactured by Seiko Instruments Inc., at 30° C. to 270° C. The heating rate was 5 ° C / min.

(3)透光度 (3) Transmittance ‧初期透光度(IT) ‧Initial transmittance (IT)

使用日立製作所製自記分光光度計U-3410,測定厚1 mm硬化物之400 nm之透光度。 The transmittance of 400 nm of a 1 mm thick cured product was measured using a self-recording spectrophotometer U-3410 manufactured by Hitachi, Ltd.

‧UV試驗後之透光度(UVT) ‧Transparency (UVT) after UV test

使用Q面板公司製耐候性試驗機QUV,同初期透光度測定照射600小時UV後,厚4 mm之硬化物之400 nm的透光度。使用QUV燈之UVA 340 nm,黑面板溫度為55℃。 Using a Q panel company weathering tester QUV, the transmittance of 400 nm of the cured product having a thickness of 4 mm after the irradiation of 600 hours of UV was measured with the initial transmittance. The UVA 340 nm of the QUV lamp was used and the black panel temperature was 55 °C.

‧耐熱試驗後之透光度(HRT) ‧ Transmittance after heat test (HRT)

將厚1 nm之硬化物曝露於150℃之環境下,同初期透光度測定72小時後之400 nm之透光度。 The cured material having a thickness of 1 nm was exposed to an environment of 150 ° C, and the transmittance at 400 nm after 72 hours was measured with the initial transmittance.

‧長期耐熱試驗後之透光度(LHRT) ‧ Transmittance after long-term heat resistance test (LHRT)

將厚1 mm之硬化物曝露於150℃之環境下,同初期透光度測定480小時後之400 nm之透光度。 The cured material having a thickness of 1 mm was exposed to an environment of 150 ° C, and the transmittance at 400 nm after 480 hours was measured with the initial transmittance.

(4)測定硬度(肖氏D) (4) Determination of hardness (Shore D)

使用提庫洛(股)製硬度計TYPE-D,測定室溫下硬化物之表面硬度。 The surface hardness of the cured product at room temperature was measured using a Tikulu (manufactured) hardness tester TYPE-D.

(5)由模具取出後之硬化物形狀(形狀) (5) Shape (shape) of the cured product after being taken out by the mold

去除模具後,以目視判斷硬化物之均勻性及因硬化收縮所造成的硬化物破裂。 After the mold was removed, the uniformity of the cured product and the cracking of the cured product due to hardening shrinkage were visually judged.

A:均勻之硬化物。B:保有模具之形狀但硬化物中發生破裂。×:未保有模具形狀,樹脂破裂。 A: Uniform hardened material. B: The shape of the mold is retained but cracking occurs in the hardened material. ×: The shape of the mold was not retained, and the resin was broken.

(6)彎曲、撓性特性試驗 (6) Bending and flexibility test

依JIS-7171,使用80 mm×10 mm×4 mm之試驗片,藉由自動夾(島津製作所(股)製)測定彎曲彈性率、彎曲強度、彎曲撓性。又,A表示未斷裂。 According to JIS-7171, a test piece of 80 mm × 10 mm × 4 mm was used, and the bending elastic modulus, bending strength, and bending flexibility were measured by an automatic clamp (manufactured by Shimadzu Corporation). Also, A indicates that it has not been broken.

實施例7至20所得之硬化物的各試驗之測定結果如表1、2所示。 The measurement results of the respective tests of the cured products obtained in Examples 7 to 20 are shown in Tables 1 and 2.

比較例1至7所得之硬化物的各試驗之測定結果如表3所示。又,NM表示無法測,RT表示室溫。 The measurement results of the respective tests of the cured products obtained in Comparative Examples 1 to 7 are shown in Table 3. Also, NM means that it cannot be measured, and RT means room temperature.

實施例21至28、比較例8至14 Examples 21 to 28 and Comparative Examples 8 to 14

利用注器將添加實施例7至14、比較例1至7所得之混合物填入底部鍍銀之藍色LED用預鑄模封裝體內,以100℃下2小時、150℃下5小時之條件進行硬化密度,製作LED裝置。 The mixture obtained by adding the examples 7 to 14 and the comparative examples 1 to 7 was filled into a bottom-plated blue LED die-molded package by an injector, and hardened at 100 ° C for 2 hours and at 150 ° C for 5 hours. Density, making LED devices.

以下述方法測定密封後之LED裝置之物性。 The physical properties of the sealed LED device were measured in the following manner.

(7)回流試驗 (7) Reflow test

使密封後之LED封裝體通過設定為保持於260℃下15秒之回流爐3次,確認有無密封料著色、破裂、剝離。結果如表4所示。 The sealed LED package was passed through a reflow furnace set to be held at 260 ° C for 15 seconds, and it was confirmed whether or not the sealant was colored, broken, or peeled. The results are shown in Table 4.

(8)測定熱衝擊試驗 (8) Determination of thermal shock test

將密封後之LED封裝體供給-40℃至120℃、500次循環之試驗後,以顯微鏡確認有無破裂及密封料剝離。結果如表5所示。 After the sealed LED package was subjected to a test at -40 ° C to 120 ° C for 500 cycles, the presence or absence of cracking and peeling of the sealant was confirmed by a microscope. The results are shown in Table 5.

表4及5中,A表示無,X表示有。添加項中EX.7至14表示添加實施例7至14,CX.1至7表示添加比較例1至7。 In Tables 4 and 5, A means no, and X means yes. EX.7 to 14 in the additions indicate the addition of Examples 7 to 14, and CX.1 to 7 indicate the addition of Comparative Examples 1 to 7.

二烯丙基三聚異氰酸於美國專利第2830051號公報中,係由先將三烯丙基三聚異氰酸酯溶解於二甲苯中,再使用活性白土合成。 Diallyl isocyanuric acid is disclosed in U.S. Patent No. 2,083,051, which is obtained by dissolving triallyl isocyanurate in xylene and then using activated clay.

單甲基二烯丙基三聚異氰酸酯於US Patent第2830051號中,係先將三甲基三聚氰酸酯溶解於二甲苯中,加入苯酚後,使用活性白土合成單甲基三聚氰酸。其次所得之單甲基三聚氰酸於DMF溶劑中,使用烯丙基溴化物、氫氧化鈉與相關移動觸媒用之四乙基銨合成。 Monomethyl diallyl isocyanurate is disclosed in US Patent No. 2830051, in which trimethyl cyanurate is first dissolved in xylene, and after adding phenol, monomethyl cyanuric acid is synthesized using activated clay. . The resulting monomethyl cyanuric acid was synthesized in DMF solvent using allyl bromide, sodium hydroxide and tetraethylammonium for the relevant mobile catalyst.

實施例31 Example 31

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷180重量份(SiH基為1.36當量)、二噁烷220重量份、碳附載鉑(鉑附載量3%)0.83重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將二烯丙基三聚氰酸37重量份(乙烯基為0.35當量)投入 反應系內以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯281重量份(乙烯基為1.00當量)溶解於二噁烷280重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1 N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為0.3、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為氫原子之兩末端具有含有環氧基之三聚異氰酸基之環之環氧聚矽氧樹脂(ES21)470重量份。該樹脂之環氧當量為250,室溫下之性狀為固體狀,150℃下之黏度為0.12 Pa‧s。該樹脂之IR光譜如圖4所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and 180 parts by weight of a cyclic organosiloxane having a SiH group at both ends (SiH group is 1.36 equivalent), and dioxane 220 weight 0.83 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 37 parts by weight of diallyl cyanuric acid (with a vinyl group of 0.35 equivalent) was introduced into the reaction system over 1 hour. After confirming that the molecular weight stopped increasing by the GPC method, monoallyl diglycidyl trimerization was carried out in 1 hour. 281 parts by weight of an isocyanate (1.00 equivalent of a vinyl group) was dissolved in 280 parts by weight of a solution of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the absence of hydrogen gas, the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 0.3, R 1 is a methyl group, R 2 is a stretching propyl group, and E 1 is a general formula. (2) The organic residue represented, Z is an organic residue represented by the general formula (22), R 23 is a propyl group, and R 24 is a hydrogen atom. The epoxy ring of the epoxy resin (ES21) was 470 parts by weight. The resin had an epoxy equivalent of 250, a solid at room temperature, and a viscosity of 0.12 Pa‧s at 150 °C. The IR spectrum of this resin is shown in Fig. 4.

實施例32 Example 32

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷260重量份(SiH基為1.94當量)、二噁烷360重量份、碳附載鉑(鉑附載量3%)1.07重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將二烯丙基三聚異氰酸99重量份(乙烯基為0.94當量)投入反應系內。以GPC法確認分子量停止增加後,以1小 時投入單烯丙基二縮水甘油基三聚異氰酸酯281重量份(乙烯基為1.00當量)溶解於二噁烷281重量份所得之溶液。結束投液後,將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1 N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為0.9、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為氫原子之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES22)619重量份。該樹脂之環氧當量為325,室溫下之性狀為固體狀,150℃下之黏度為0.56 Pa‧s。該樹脂之IR光譜如圖5所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a ring-shaped organic alkane having a SiH group at both ends is 260 parts by weight (SiH group is 1.94 equivalent), and dioxane 360 weight 1.07 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 99 parts by weight of diallyl isocyanuric acid (the vinyl group was 0.94 equivalent) was placed in the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 281 parts by weight of monoallyl diglycidyl trimer isocyanate (1.00 equivalent of vinyl group) was added in one hour to dissolve the solution obtained by dissolving 281 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the absence of hydrogen gas, the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 0.9, R 1 is a methyl group, R 2 is a stretching propyl group, and E 1 is a general formula. (2) The organic residue represented, Z is an organic residue represented by the general formula (22), R 23 is a propyl group, and R 24 is a hydrogen atom. The base epoxy epoxide resin (ES22) was 619 parts by weight. The resin had an epoxy equivalent of 325, a solid at room temperature, and a viscosity of 0.56 Pa‧s at 150 °C. The IR spectrum of this resin is shown in Fig. 5.

實施例33 Example 33

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷203重量份(SiH基為1.52當量)、二噁烷310重量份、碳附載鉑(鉑附載量3%)0.75重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將二烯丙基三聚異氰酸106重量份(乙烯基為1.01當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯141重量份 (乙烯基為0.51當量)溶解於二噁烷141重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1 N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為2.0、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為氫原子之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES23)398重量份。該樹脂之環氧當量為455,室溫下之性狀為固體狀,150℃下之黏度為1.61 Pa‧s。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a ring-shaped organic alkane having a SiH group at both ends is 203 parts by weight (SiH group is 1.52 equivalent), and dioxane 310 weight 0.75 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 106 parts by weight of diallyl isocyanuric acid (1.01 equivalent of vinyl group) was placed in the reaction system over 1 hour. After confirming that the molecular weight was stopped by the GPC method, 141 parts by weight of monoallyl diglycidyl isocyanurate (containing 0.51 equivalent of vinyl group) was dissolved in 141 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that after the absence of hydrogen gas, the remaining platinum was filtered using diatomaceous earth. catalyst. The solvent of the filtrate was distilled off using an evaporator to obtain a general formula (1). l=1, m=1, n has an average value of 2.0, R 1 is a methyl group, R 2 is a stretching propyl group, and E 1 is a general formula. (2) The organic residue represented, Z is an organic residue represented by the general formula (22), R 23 is a propyl group, and R 24 is a hydrogen atom. The base epoxy epoxide resin (ES23) was 398 parts by weight. The resin had an epoxy equivalent of 455, a solid at room temperature, and a viscosity of 1.61 Pa‧s at 150 °C.

實施例34 Example 34

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷175重量份(SiH基為1.31當量)、二噁烷210重量份、碳附載鉑(鉑附載量3%)0.82重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將單甲基二烯丙基三聚異氰酸酯34重量份(乙烯基為0.31當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基基二縮水甘油基三聚異氰酸酯281重量份(乙烯基為1.0當量)溶解於二噁烷281重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷 回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1當量之氫氧化鉀/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為0.3、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為甲基之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES24)438重量份。該樹脂之環氧當量為250,室溫下之性狀為固體狀,150℃下之黏度為0.08 Pa‧s。該樹脂之IR光譜如圖6所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a cyclic organic oxane having a SiH group at both ends thereof is 175 parts by weight (SiH group is 1.31 equivalent), and dioxane 210 weight 0.82 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 34 parts by weight of monomethyl diallyl isocyanate (0.31 equivalent of vinyl group) was placed in the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 281 parts by weight of monoallyl diglycidyl trimer isocyanate (1.0 equivalent of vinyl group) was added in one hour to dissolve the solution obtained by dissolving 281 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into 0.1 equivalent of potassium hydroxide/methanol solution, and it was confirmed that no hydrogen was generated, and the residue was filtered using diatomaceous earth. Platinum catalyst. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 0.3, R 1 is a methyl group, R 2 is a stretching propyl group, and E 1 is a general formula. (2) The organic residue represented by Z, which is an organic residue represented by the general formula (22), wherein R 23 is a propyl group, and R 24 is a methyl group, and the terminal has an epoxy group-containing isocyanuric acid. The base epoxy epoxide resin (ES24) was 438 parts by weight. The resin had an epoxy equivalent of 250, a solid at room temperature, and a viscosity at 150 ° C of 0.08 Pa ‧ s. The IR spectrum of this resin is shown in Fig. 6.

實施例35 Example 35

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷257重量份(SiH基為1.91當量)、二噁烷360重量份、碳附載鉑(鉑附載量3%)107重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將單甲基二烯丙基三聚異氰酸酯102重量份(乙烯基為0.91當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯281重量份(乙烯基為1.0當量)溶解於二噁烷281重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水 甘油基三聚異氰酸酯之峰消失,將反應液滴入0.1 N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為0.9、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為甲基之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES25)565重量份。該樹脂之環氧當量為327,室溫下之性狀為固體狀,150℃下之黏度為0.11 Pa‧s。該樹脂之IR光譜如圖7所示。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a cyclic organic alkane having a SiH group at both ends is 257 parts by weight (SiH group is 1.91 equivalent), and dioxane 360 weight 107 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 102 parts by weight of monomethyl diallyl isocyanate (0.91 equivalent of vinyl group) was placed in the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 281 parts by weight of monoallyl diglycidyl trimer isocyanate (1.0 equivalent of vinyl group) was charged in 1 hour, and the solution was dissolved in 281 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution. After confirming that no hydrogen was generated, the remaining platinum was filtered using diatomaceous earth. Media. The solvent of the filtrate is distilled off using an evaporator to obtain a general formula (1), l=1, m=1, n has an average value of 0.9, R 1 is a methyl group, R 2 is a stretching propyl group, and E 1 is a general formula. (2) The organic residue represented by Z, which is an organic residue represented by the general formula (22), wherein R 23 is a propyl group, and R 24 is a methyl group, and the terminal has an epoxy group-containing isocyanuric acid. The base epoxy epoxide resin (ES25) was 565 parts by weight. The resin had an epoxy equivalent of 327, a solid at room temperature, and a viscosity at 150 ° C of 0.11 Pa‧s. The IR spectrum of this resin is shown in Fig. 7.

實施例36 Example 36

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷224重量份(SiH基為1.67當量)、二噁烷360重量份、碳附載鉑(鉑附載量3%)0.75重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將單甲基二烯丙基三聚異氰酸酯130重量份(乙烯基為1.17當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯141重量份(乙烯基為0.50當量)溶解於二噁烷141重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1當量 之氫氧化鉀/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為2.0、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為甲基之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES26)397重量份。該樹脂之環氧當量為460,室溫下之性狀為固體狀,150℃下之黏度為0.19 Pa‧s。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a ring-shaped organic alkane having a SiH group at both ends is 224 parts by weight (SiH group is 1.67 equivalent), and dioxane 360 weight 0.75 parts by weight of carbon-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 130 parts by weight of monomethyl diallyl isocyanate (1.17 equivalent of vinyl group) was placed in the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 141 parts by weight of monoallyl diglycidyl trimeric isocyanate (containing 0.50 equivalent of vinyl group) was dissolved in 141 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into 0.1 equivalent of potassium hydroxide/methanol solution, and it was confirmed that no hydrogen was generated, and the residue was filtered using diatomaceous earth. Platinum catalyst. The solvent of the filtrate was distilled off using an evaporator to obtain a general formula (1). l=1, m=1, n has an average value of 2.0, R 1 is a methyl group, R 2 is a stretching propyl group, and E 1 is a general formula. (2) The organic residue represented by Z, which is an organic residue represented by the general formula (22), wherein R 23 is a propyl group, and R 24 is a methyl group, and the terminal has an epoxy group-containing isocyanuric acid. The base epoxy epoxide resin (ES26) was 397 parts by weight. The resin had an epoxy equivalent of 460, a solid at room temperature, and a viscosity of 0.19 Pa‧s at 150 °C.

實施例37 Example 37

將一般式(5)中,R1為甲基、l=1、m=1之兩末端具有SiH基之環狀有機矽氧烷254重量份(SiH基為1.89當量)、二噁烷410重量份、碳附載鉑(鉑附載量3%)0.92重量份投入安裝攪拌馬達、回流冷卻管、氮管線之2 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時將單甲基二烯丙基三聚異氰酸酯156重量份(乙烯基為1.39當量)投入反應系內。以GPC法確認分子量停止增加後,以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯141重量份(乙烯基為0.50當量)溶解於二噁烷141重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當單烯丙基二縮水甘油基三聚異氰酸酯之峰消失時,將反應液滴入0.1當量之氫氧化鉀/甲醇溶液內,確認無法氫氣發生後,使用矽 藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得一般式(1)中,l=1、m=1、n之平均值為2.8、R1為甲基、R2為伸丙基、E1為一般式(2)所表示之有機殘基、Z為一般式(22)所表示之有機殘基、R23為伸丙基、R24為甲基之兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES27)486重量份。該樹脂之環氧當量為575,室溫下之性狀為固體狀,150℃下之黏度為0.26 Pa‧s。 In the general formula (5), R 1 is a methyl group, l=1, m=1, and a ring-shaped organic alkane having a SiH group at both ends is 254 parts by weight (SiH group is 1.89 equivalent), and dioxane 410 weight 0.92 parts by weight of platinum-supported platinum (platinum loading 3%) was placed in a 2 L separable flask equipped with a stirring motor, a reflux cooling tube, and a nitrogen line, and the temperature was raised to 100 ° C with stirring. Next, 156 parts by weight of monomethyl diallyl isocyanurate (1,39 equivalents of vinyl group) was placed in the reaction system over 1 hour. After confirming that the molecular weight was stopped increasing by the GPC method, 141 parts by weight of monoallyl diglycidyl trimeric isocyanate (containing 0.50 equivalent of vinyl group) was dissolved in 141 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of monoallyl diglycidyl trimeric isocyanate disappeared, the reaction was dropped into 0.1 equivalent of potassium hydroxide/methanol solution, and it was confirmed that hydrogen generation could not occur, and the residue was filtered using diatomaceous earth. Platinum catalyst. The solvent of the filtrate was distilled off using an evaporator to obtain a general formula (1). l=1, m=1, n has an average value of 2.8, R 1 is a methyl group, R 2 is a propyl group, and E 1 is a general formula. (2) The organic residue represented by Z, which is an organic residue represented by the general formula (22), wherein R 23 is a propyl group, and R 24 is a methyl group, and the terminal has an epoxy group-containing isocyanuric acid. The base epoxy epoxide resin (ES27) was 486 parts by weight. The resin had an epoxy equivalent of 575, a solid at room temperature, and a viscosity of 0.26 Pa‧s at 150 °C.

合成例11 Synthesis Example 11

將下述式所表示之有機氫化矽氧烷73重量份(SiH基為0.2當量)、二噁烷128重量份、碳附載鉑(鉑附載量3%)0.21重量份投入安裝攪拌馬達、回流冷卻管、氮管線之500 mL可分式燒瓶內,攪拌下升溫至100℃。其次以1小時投入單烯丙基二縮水甘油基三聚異氰酸酯56.2重量份(乙烯基為0.2當量)溶解於二噁烷56重量份所得之溶液。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。將反應液滴入0.1 N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。使用蒸發器餾去濾液之溶劑,得主鏈僅由二甲基矽氧烷構成,兩末端具有含有環氧基之三聚異氰酸基環之環氧聚矽氧樹脂(ES28)74重量份。該樹脂之環氧當量為320,室溫下為液狀,25℃下之黏度為5.9 Pa‧s。 73 parts by weight of an organic hydrogen hydride oxysilane represented by the following formula (0.2 equivalent of SiH group), 128 parts by weight of dioxane, and 0.21 part by weight of platinum (carbon loading 3%) were placed in a stirring motor and reflux-cooled. The 500 mL separable flask of the tube and nitrogen line was heated to 100 ° C with stirring. Next, 56.2 parts by weight of monoallyl diglycidyl trimer isocyanate (0.2 equivalent of vinyl group) was added in one hour to dissolve a solution of 56 parts by weight of dioxane. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction solution was dropped into a 0.1 N KOH/methanol solution, and it was confirmed that no hydrogen gas was generated, and the remaining platinum catalyst was filtered using diatomaceous earth. The solvent of the filtrate was distilled off using an evaporator to obtain 74 parts by weight of an epoxy polyoxyl resin (ES28) having a main chain consisting of only dimethyloxane and having an epoxy group-containing trimeric isocyanato ring at both ends. The resin had an epoxy equivalent of 320, was liquid at room temperature, and had a viscosity of 5.9 Pa‧s at 25 °C.

合成例12 Synthesis Example 12

將1,3,5,7-四甲基環四矽氧烷72重量份、二噁烷100重量份、碳附載鉑(鉑附載量3%)0.35重量份投入安裝攪拌馬達、回流冷卻管、氮管線之1 L可分式燒瓶內,攪拌下升溫至100℃。其次以1小時滴入三烯丙基三聚異氰酸酯25重量份溶解於二噁烷25重量份所得之溶液內。以GPC法確認分子量停止增加後,以2小時滴入4-乙烯基環己烷氧化物112重量份。結束投液後將內溫升至110℃,於二噁烷回流下進行反應。以GPC追踪反應,當4-乙烯基環己烯氧化物之峰消失時,將反應液滴入0.1 N之KOH/甲醇溶液內,確認無氫氣發生後,使用矽藻土過濾殘存之鉑觸媒。將三苯基膦0.1重量份加入該溶液內,使用蒸發器餾去濾液之溶劑,得樹脂之鏈中具有三聚異氰酸基環及環狀有機矽氧烷骨架,末端具有環氧基之環氧聚矽氧樹脂(ES29)。該樹脂之環氧當量為241。 72 parts by weight of 1,3,5,7-tetramethylcyclotetraoxane, 100 parts by weight of dioxane, and 0.35 parts by weight of carbon-supported platinum (3% of platinum loading) were placed in a stirring motor, a reflux cooling tube, and The 1 L separable flask of the nitrogen line was heated to 100 ° C with stirring. Next, 25 parts by weight of triallyl isocyanurate was added dropwise to the solution obtained by dissolving 25 parts by weight of dioxane in one hour. After confirming that the molecular weight was stopped by the GPC method, 112 parts by weight of 4-vinylcyclohexane oxide was added dropwise over 2 hours. After the completion of the liquid discharge, the internal temperature was raised to 110 ° C, and the reaction was carried out under reflux of dioxane. The reaction was followed by GPC. When the peak of 4-vinylcyclohexene oxide disappeared, the reaction was dropped into a 0.1 N KOH/methanol solution. After confirming that no hydrogen was generated, the residual platinum catalyst was filtered using diatomaceous earth. . 0.1 part by weight of triphenylphosphine was added to the solution, and the solvent of the filtrate was distilled off using an evaporator to obtain a trimeric isocyanato ring and a cyclic organoxanoxane skeleton in the chain of the resin, and an epoxy group at the terminal. Epoxy polyoxyl resin (ES29). The resin had an epoxy equivalent of 241.

實施例38至44 Examples 38 to 44

以兩者之當量比為1:1之條件,將實施例31至37所得之環氧聚矽氧樹脂(ES21至ES27)加入MH內,充 分混合後相對於全體混合0.5重量%的硬化促進劑用之TBDP。將該混合物真空脫氣後,於模具內以120℃下4小時、160℃下12小時之條件進行硬化,製作厚1 mm及4 mm之樹脂板。 The epoxy polyoxynoxy resins (ES21 to ES27) obtained in Examples 31 to 37 were added to MH under the condition that the equivalent ratio of the two was 1:1. After mixing, the TBDP used for mixing the 0.5% by weight of the hardening accelerator with respect to the whole was mixed. The mixture was degassed under vacuum, and then cured in a mold at 120 ° C for 4 hours and at 160 ° C for 12 hours to prepare a resin plate having a thickness of 1 mm and 4 mm.

實施例45 Example 45

(A)成分使用實施例35所得之環氧聚矽氧樹脂(ES25)70重量份,調製再添加(D)成分之EpC 30重量份之樹脂液。以環氧當量與酸酐當量之比為1:1之條件添加該樹脂液與MH,充分混合後相對於全體混合0.5重量的硬化促進劑用之TBDP。 (A) Component 70 parts by weight of EpC of the component (D) was added to 70 parts by weight of the epoxy polyoxynoxy resin (ES25) obtained in Example 35 to prepare a resin liquid. The resin liquid and MH were added under the condition that the ratio of the epoxy equivalent to the acid anhydride equivalent was 1:1, and the TBDP for the hardening accelerator was mixed with 0.5 kg by weight.

比較例15 Comparative Example 15

使用合成例11所得之環氧聚矽氧樹脂(ES28)32重量份、MH 17重量份取代EpC以外,同實施例38製作樹脂板。 A resin plate was produced in the same manner as in Example 38 except that 32 parts by weight of the epoxy polyoxyl resin (ES28) obtained in Synthesis Example 11 and 17 parts by weight of MH were used instead of EpC.

比較例16 Comparative Example 16

使用合成例12所得之環氧聚矽氧樹脂(ES29)24重量份、MH 17重量份取代EpC以外,同比較例15製作樹脂板。 A resin plate was produced in the same manner as in Comparative Example 15 except that 24 parts by weight of the epoxy polyoxynene resin (ES29) obtained in Synthesis Example 12 and 17 parts by weight of MH were used instead of EpC.

將實施例38至45、比較例15至16所得之混合物真空脫氣後,於模具內以120℃下4小時、160℃下12小時之條件進行硬化,製作厚1 mm及4 mm之樹脂板。 The mixture obtained in Examples 38 to 45 and Comparative Examples 15 to 16 was vacuum-degassed, and then hardened in a mold at 120 ° C for 4 hours and at 160 ° C for 12 hours to prepare a resin plate having a thickness of 1 mm and 4 mm. .

以同上述之方法測定硬化後,之樹脂板之物性。 The physical properties of the resin sheet after hardening were measured in the same manner as above.

評估發黏性之方法為,將硬化物放入聚乙烯製之袋內,將部分貼合者判斷為具有發黏性。表6及表7中,A表示無發黏性,×表示有發黏性。 The tackiness is evaluated by placing the cured product in a polyethylene bag and determining that the fitter is tacky. In Tables 6 and 7, A indicates no tackiness, and × indicates tackiness.

實施例38至45所得之硬化物之各試驗的測定結果如表6所示。 The measurement results of the respective tests of the cured products obtained in Examples 38 to 45 are shown in Table 6.

比較例15至16所得之硬化物之各試驗的測定結果如表7所示。 The measurement results of the respective tests of the cured products obtained in Comparative Examples 15 to 16 are shown in Table 7.

實施例46至53、比較例18 Examples 46 to 53 and Comparative Example 18

以(M):熔融二氧化矽:氧化鈦=15:74:11(wt%)之重量比例,將白色顏料(E)用之熔融二氧化矽及氧化鈦加入添加實施例38至45、及比較例2所得之混合物(M)內,使用2座輥以50℃熔融混練10分鐘得混練物。其次冷卻所得之混練物,粉碎後得白色固體狀之光反射用熱硬化性樹脂組成物。使用厚2 mm之黃銅製調距物,以成型模具溫度175℃、成型壓力5 MPa、硬化間300秒之條件將該組成物輸送成型後,由模具脫模後以150℃硬化12小時製作厚2 mm之試驗片。 Adding molten cerium oxide and titanium oxide for white pigment (E) to addition examples 38 to 45, and (M): molten cerium oxide: titanium oxide = 15:74:11 (wt%), and In the mixture (M) obtained in Comparative Example 2, the kneaded material was obtained by melt-kneading at 50 ° C for 10 minutes using a 2-seat roll. Next, the obtained kneaded material was cooled, and after pulverization, a thermosetting resin composition for light reflection in the form of a white solid was obtained. The composition was conveyed and formed by using a brass spacer made of 2 mm thick at a molding die temperature of 175 ° C, a molding pressure of 5 MPa, and a curing time of 300 seconds. After the mold was released from the mold, it was hardened at 150 ° C for 12 hours to make a thickness. 2 mm test piece.

比較例17、19至22 Comparative Example 17, 19 to 22

以(M):熔融二氧化矽:氧化鈦=15:74:11(wt%)之重量比例,將白色顏料(E)用之熔融二氧化矽及氧化鈦加入添加比較例1、3至4、15至16所得之混合物(M)內,使用自轉/公轉攪拌機以回轉數2000 rpm混合5分鐘,得白色糊料狀之光反射用熱硬化性樹脂組成物。使用厚2 mm之真銅製調距物,以模具溫度175℃、成型壓力1 MPa、硬化時間300秒之條件將該糊料狀之組成物加成成型後,由模具脫模後以150℃硬化12小時製作厚2 mm之試驗片。 Adding molten cerium oxide and titanium oxide for white pigment (E) by adding (M): molten cerium oxide: titanium oxide = 15:74:11 (wt%), adding Comparative Examples 1, 3 to 4 The mixture (M) obtained in 15 to 16 was mixed for 5 minutes at a number of revolutions of 2000 rpm using a spinning/revolving mixer to obtain a thermosetting resin composition for light reflection of a white paste. The paste composition was formed by using a true copper bran having a thickness of 2 mm and molding at a mold temperature of 175 ° C, a molding pressure of 1 MPa, and a curing time of 300 seconds. After the mold was released from the mold, it was hardened at 150 ° C. A test piece having a thickness of 2 mm was produced in 12 hours.

(11)脫模時有無變形(變形) (11) Whether there is deformation (deformation) during demolding

進行輸送成型或加壓成型後脫模時,以目視確認脫模時應力是否會造成試驗片變形,以判斷成型時之形狀保持性。表8及9中,A表示無變形,×表示會變形。 When the mold was released after the conveyance molding or the press molding, it was visually confirmed whether the stress at the time of demolding caused deformation of the test piece to determine the shape retention property at the time of molding. In Tables 8 and 9, A indicates no deformation, and × indicates deformation.

(12)測定反射率 (12) Determination of reflectivity ‧初期反射率(IRF) ‧Infrared reflectivity (IRF)

使用日立製作所製自記分光光度計U-3410,測定波長460 nm之光反射率。 The light reflectance at a wavelength of 460 nm was measured using a self-recording spectrophotometer U-3410 manufactured by Hitachi, Ltd.

‧初期耐熱試驗後之反射率(HRF) ‧ Reflectance (HRF) after initial heat test

將厚2 mm之硬化物曝露於150℃之環境下,72小時後同初期反射率測定460 nm之反射率。 The cured material having a thickness of 2 mm was exposed to an environment of 150 ° C, and the reflectance at 460 nm was measured with the initial reflectance after 72 hours.

‧長期耐熱試驗後之反射率(LHRF) ‧ Reflectance after long-term heat resistance test (LHRF)

將厚2 mm之硬化物曝露於150℃之環境下,480小時後同初期反射率測定460 nm之反射率。 The cured material having a thickness of 2 mm was exposed to an environment of 150 ° C, and the reflectance at 460 nm was measured with the initial reflectance after 480 hours.

實施例46至53所得之白色硬化物之測定結果如表8所示。 The measurement results of the white cured products obtained in Examples 46 to 53 are shown in Table 8.

比較例17至22所得之硬化物之各試驗的測定結果如表9所示。比較例17至22所使用之混合物(M)依序為比較例1至4、15至16之混合物(M)。 The measurement results of the respective tests of the cured products obtained in Comparative Examples 17 to 22 are shown in Table 9. The mixture (M) used in Comparative Examples 17 to 22 was sequentially a mixture (M) of Comparative Examples 1 to 4 and 15 to 16.

實施例54至61、比較例23至28 Examples 54 to 61 and Comparative Examples 23 to 28

利用注器將添加實施例38至45、比較例17至22所得之混合物填入底部鍍銀之電接合發光元件之藍色LED用封裝體內,以100℃下2小時、150℃下5小時之條件進行硬化密封,製作LED裝置。 The mixture obtained by adding the examples 38 to 45 and the comparative examples 17 to 22 was filled in a blue LED package with a bottom silver plated electrojunction light-emitting device by means of an injector, and was dried at 100 ° C for 2 hours and at 150 ° C for 5 hours. The conditions were hardened and sealed to produce an LED device.

對密封後之LED裝置進行回流試驗,結果如表10所示,又進行熱衝擊試驗,結果如表11所示。試驗條件及表中記號之含義同表4及5。 The sealed LED device was subjected to a reflow test, and the results were shown in Table 10, and a thermal shock test was performed. The results are shown in Table 11. The test conditions and the meanings of the symbols in the table are the same as in Tables 4 and 5.

產業上利用可能性 Industrial use possibility

本發明之環氧聚矽氧樹脂為,作為硬化性樹脂組成物用時施加熱所得之硬化性樹脂可具有優良表面硬度、強度及撓性,且具有透明性,故可得具有優良耐熱著色性、耐光著色之硬化物或薄膜。因此適用於半導體、電路基板等之電子構件材料、及光學透鏡、光學片、光反射用白色成型材料等之光學構件材料,特別是可期待改善現今LED密封材料所存在之因熱或光而著色、回流安裝或熱循環環境下之破裂、斷線、與基材剝離之問題。 The epoxy polyoxynene resin of the present invention has excellent surface hardness, strength, and flexibility and is excellent in heat resistance when it is used as a curable resin composition, and has excellent heat resistance. , a light-resistant colored hardened or film. Therefore, it is suitable for electronic component materials such as semiconductors and circuit boards, and optical member materials such as optical lenses, optical sheets, and white reflective materials for light reflection, and in particular, it is expected to improve the color or heat of the current LED sealing materials. Cracking, wire breakage, and peeling from the substrate during reflow or thermal cycling.

圖1為,本發明之環氧聚矽氧樹脂(ES1)之IR光譜。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an IR spectrum of an epoxy polyoxynene resin (ES1) of the present invention.

圖2為,本發明之環氧聚矽氧樹脂(ES3)之IR光譜。 Figure 2 is an IR spectrum of the epoxy polyoxynene resin (ES3) of the present invention.

圖3為,本發明之環氧聚矽氧樹脂(ES5)之IR光譜。 Figure 3 is an IR spectrum of the epoxy polyoxynene resin (ES5) of the present invention.

圖4為,本發明之環氧聚矽氧樹脂(ES21)之IR光譜。 Figure 4 is an IR spectrum of the epoxy polyoxynene resin (ES21) of the present invention.

圖5為,本發明之環氧聚矽氧樹脂(ES22)之IR光譜。 Figure 5 is an IR spectrum of the epoxy polyoxynene resin (ES22) of the present invention.

圖6為,本發明之環氧聚矽氧樹脂(ES24)之IR光譜。 Figure 6 is an IR spectrum of the epoxy polyoxynene resin (ES24) of the present invention.

圖7為,本發明之環氧聚矽氧樹脂(ES25)之IR光譜。 Figure 7 is an IR spectrum of the epoxy polyoxynene resin (ES25) of the present invention.

Claims (15)

一種環氧聚矽氧樹脂,其特徵為一般式(1)所表示,環氧當量為200至2000g/eq, (式中,R1表示碳數1至10之1價之烴基,可各自相同或相異;R2表示碳數1至20之2價之烴基,內部可具有1至3個醚鍵結性氧原子;E1為式(2)所表示之1價之有機殘基;Z表示2價之有機殘基;l、m獨立為0至3之整數,且符合1≦l+m≦4;n為0<n≦100之數), An epoxy polyoxynene resin characterized by the general formula (1) having an epoxy equivalent of 200 to 2000 g/eq. (wherein R 1 represents a hydrocarbon group having a carbon number of 1 to 10, which may be the same or different; and R 2 represents a hydrocarbon group having a carbon number of 1 to 20 and may have 1 to 3 ether linkages inside. An oxygen atom; E 1 is a monovalent organic residue represented by formula (2); Z represents a divalent organic residue; l, m is independently an integer of 0 to 3, and conforms to 1≦l+m≦4; n is 0<n≦100), 如申請專利範圍第1項之環氧聚矽氧樹脂,其中一般式(1)中之Z為,一般式(3)或一般式(4)所表 示之2價之有機殘基, (式中,R3表示甲基或苯基,可各自相同或相異;k為0至100之數;R4表示甲基或苯基,可各自相同或相異;i、j獨立為0至3之整數,且1≦i+j≦4)。 The epoxy polyoxyxene resin according to claim 1, wherein Z in the general formula (1) is a divalent organic residue represented by the general formula (3) or the general formula (4), Wherein R 3 represents a methyl group or a phenyl group, which may be the same or different; k is a number from 0 to 100; R 4 represents a methyl group or a phenyl group, which may be the same or different; i, j are independently 0. To an integer of 3, and 1≦i+j≦4). 如申請專利範圍第1項之環氧聚矽氧樹脂,其中一般式(1)中之Z為,一般式(22)所表示之具有三聚異氰酸基環之2價之有機殘基, (式中,R23表示碳數1至10之烴基;R24表示氫原子或碳數1至10之烴基)。 An epoxy polyoxyxene resin according to claim 1, wherein Z in the general formula (1) is a divalent organic residue having a trimeric isocyanato ring represented by the general formula (22), (wherein R 23 represents a hydrocarbon group having 1 to 10 carbon atoms; and R 24 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms). 一種環氧聚矽氧樹脂之製造方法,其係如申請專利範圍第1項之環氧聚矽氧樹脂之製造方法,其特徵為使未達理論量之兩末端含有乙烯基之化合物,與一般式(5)所表示之兩末端含有SiH基之環狀有機矽氧烷反應,其次使用單烯丙基二縮水甘油基三聚異氰酸酯,對殘存之SiH基進行末端密封反應, (式中,R1、l、m與一般式(1)同義)。 The invention relates to a method for producing an epoxy polyoxyxene resin, which is a method for producing an epoxy polyoxyxene resin according to claim 1, which is characterized in that a compound having a vinyl group at both ends of the theoretical amount is not used. a cyclic organooxane reaction containing SiH groups at both ends represented by the formula (5), and then a monoallyl diglycidyl trimer isocyanate is used to carry out a terminal sealing reaction on the remaining SiH groups. (wherein, R 1 , l, m are synonymous with the general formula (1)). 如申請專利範圍第4項之環氧聚矽氧樹脂之製造方法,其中兩末端含有乙烯基之化合物為,一般式(6)或一般式(7)所表示之兩末端含有乙烯基之聚有機矽氧烷, (式中,R3表示甲基或苯基,可各自相同或相異;k為0至100之數;R4表示甲基或苯基,可各自相同或相異;i、j獨立為0至3之整數,且1≦i+j≦4)。 The method for producing an epoxy polyoxyxene resin according to claim 4, wherein the compound having a vinyl group at both ends is a polyorganic compound having a vinyl group at both ends represented by the general formula (6) or the general formula (7). Oxane, Wherein R 3 represents a methyl group or a phenyl group, which may be the same or different; k is a number from 0 to 100; R 4 represents a methyl group or a phenyl group, which may be the same or different; i, j are independently 0. To an integer of 3, and 1≦i+j≦4). 如申請專利範圍第4項之環氧聚矽氧樹脂之製造方法,其中兩末端含有乙烯基之化合物為,一般式(25)所表示之兩末端含有乙烯基之三聚異氰酸衍生物, (式中,R25表示氫原子或碳數1至10之烴基;R26表示碳數1至8之烴基;R27表示氫原子或甲基)。 The method for producing an epoxy polyoxyxene resin according to claim 4, wherein the compound having a vinyl group at both ends is a trimeric isocyanic acid derivative having a vinyl group at both ends represented by the general formula (25). (wherein R 25 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; R 26 represents a hydrocarbon group having 1 to 8 carbon atoms; and R 27 represents a hydrogen atom or a methyl group). 一種熱硬化性樹脂組成物,其特徵為以環氧樹脂 、硬化劑(B)及硬化促進劑(C)為必須成分之熱硬化性樹脂組成物中,環氧樹脂成分含有如申請專利範圍第1項之環氧聚矽氧樹脂之環氧聚矽氧樹脂(A)。 A thermosetting resin composition characterized by epoxy resin The hardener (B) and the hardening accelerator (C) are essential components of the thermosetting resin composition, and the epoxy resin component contains the epoxy polyoxyl resin of the epoxy polyoxyl resin as claimed in claim 1. Resin (A). 如申請專利範圍第7項之熱硬化性樹脂組成物,其中硬化劑(B)為,酸酐或室溫下液狀之胺化合物。 The thermosetting resin composition of claim 7, wherein the hardener (B) is an acid anhydride or a liquid amine compound at room temperature. 如申請專利範圍第7項之熱硬化性樹脂組成物,其中硬化促進劑(C)為,4級銨鹽或4級鏻鹽。 The thermosetting resin composition of claim 7, wherein the hardening accelerator (C) is a grade 4 ammonium salt or a grade 4 phosphonium salt. 如申請專利範圍第7項之熱硬化性樹脂組成物,其中環氧樹脂成分為,含有環氧聚矽氧樹脂(A)與室溫下液狀之環氧樹脂(D),又相對於環氧聚矽氧樹脂(A)100重量份,添加室溫下液狀之環氧樹脂(D)5至150重量份,環氧樹脂混合物之環氧當量為180至1000g/eq。 The thermosetting resin composition of claim 7, wherein the epoxy resin component comprises an epoxy polyoxyalkylene resin (A) and a liquid epoxy resin (D) at room temperature, and is opposite to the ring. 100 parts by weight of the oxygen polyoxygen resin (A), 5 to 150 parts by weight of the epoxy resin (D) at room temperature, and an epoxy equivalent of the epoxy resin mixture of 180 to 1000 g/eq. 一種熱硬化性樹脂組成物,其為如申請專利範圍第7項之熱硬化性樹脂組成物另含有白色顏料(E)。 A thermosetting resin composition which is a thermosetting resin composition according to claim 7 of the patent application, further contains a white pigment (E). 如申請專利範圍第11項之熱硬化性樹脂組成物,其中白色顏料為,由二氧化矽、氧化鈦、氧化鋁、氧化鎂、氧化鋯及無機中空粒子中所選出之至少1種。 The thermosetting resin composition of claim 11, wherein the white pigment is at least one selected from the group consisting of cerium oxide, titanium oxide, aluminum oxide, magnesium oxide, zirconium oxide, and inorganic hollow particles. 如申請專利範圍第7項之熱硬化性樹脂組成物,其中熱硬化性樹脂組成物為,光學構件用樹脂組成物、電子構件用樹脂組成物或光半導體構件用樹脂組成物。 The thermosetting resin composition of the seventh aspect of the invention, wherein the thermosetting resin composition is a resin composition for an optical member, a resin composition for an electronic member, or a resin composition for an optical semiconductor member. 如申請專利範圍第7項之熱硬化性樹脂組成物,其中熱硬化性樹脂組成物為,半導體用液狀密封樹脂組成物。 The thermosetting resin composition according to claim 7, wherein the thermosetting resin composition is a liquid sealing resin composition for a semiconductor. 一種LED裝置,其特徵為使用如申請專利範圍第13項之熱硬化性樹脂組成物密封。 An LED device characterized by using a thermosetting resin composition as claimed in claim 13 of the patent application.
TW101132159A 2012-09-04 2012-09-04 Epoxy silicone resin and a hardened resin composition using the same TWI570160B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200948846A (en) * 2008-03-28 2009-12-01 Shinetsu Chemical Co Epoxy-silicon mixed resin composition for sealing of light semiconductor element and transfer molding plate formed thereof
CN101824221A (en) * 2009-03-04 2010-09-08 日东电工株式会社 The composition that is used for heat-curable silicone
CN101346415B (en) * 2005-12-26 2012-06-27 株式会社钟化 Curable composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101346415B (en) * 2005-12-26 2012-06-27 株式会社钟化 Curable composition
TW200948846A (en) * 2008-03-28 2009-12-01 Shinetsu Chemical Co Epoxy-silicon mixed resin composition for sealing of light semiconductor element and transfer molding plate formed thereof
CN101824221A (en) * 2009-03-04 2010-09-08 日东电工株式会社 The composition that is used for heat-curable silicone

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