TWI551442B - Layered ceramic electronic components and pressureless sintering method co - Google Patents
Layered ceramic electronic components and pressureless sintering method co Download PDFInfo
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本發明係有關一種將高介電常數陶瓷材料(High permittivity dielectrics)與低介電常數陶瓷材料(Low permittivity dielectrics)於還原氣氛下進行無壓共燒結處理方式,尤指一種可得到理想的共燒匹配性與反應性,並減少元件電致伸縮性的積層電子陶瓷元件及其無壓共燒結製法。 The invention relates to a method for non-compressive co-sintering of high permittivity dielectrics and low permittivity dielectrics under a reducing atmosphere, in particular to obtain an ideal co-firing. A laminated electronic ceramic component that matches and reacts and reduces electrostrictivity of the element and its pressureless co-sintering process.
由於不同材料系統具有其不同的本質特性,如何在將個別優勢整合於元件特性上,將不同材料系統透過『共燒』方式(Co-firing)進行結合,便成為一重要的關鍵技術。 Because different material systems have different essential characteristics, how to integrate individual advantages into component characteristics and combine different material systems through Co-firing is an important key technology.
如中華民國專利563271中,即利用磁性材料(氧化鐵)及非磁性材料(玻璃)共燒,藉由不同材料的電性提供共模濾波器不同部分之電性需求,改善不同濾波器型式之電氣特性。 For example, in the Republic of China Patent No. 563271, the magnetic material (iron oxide) and the non-magnetic material (glass) are co-fired, and the electrical requirements of different parts of the common mode filter are provided by the electrical properties of different materials, thereby improving the different filter types. Electrical characteristics.
美國專利4746557中,則將磁性生胚薄帶(Magnetic Green Sheet)所形成之電感及介電生胚薄帶(Dielectric Green Sheet)所形成之電容同時設計於一元件中,於800℃~1000℃之溫度下將具電感與電容特性之材料共燒結,整合出一兼具電感(Inductor)及電容(Capacitor)特性之元件。 In U.S. Patent 4,746,557, the inductor formed by the magnetic green sheet and the capacitance formed by the Dielectric Green Sheet are simultaneously designed in one element at 800 ° C to 1000 ° C. The material with inductance and capacitance characteristics is co-sintered at a temperature to integrate an element having both Inductor and Capacitor characteristics.
中華民國專利I367504中,則提到一高度整合的晶片壓敏電阻器製作方式,該電阻器主要係將功能性薄片製作於絕緣陶瓷基體上,其中所提及之功能性薄片包含介電陶瓷材料、壓電陶瓷材料、磁性陶瓷材料半導體材料等,利用絕緣陶瓷基體進行拋光以形成複數溝槽來增進界面處之接合強度,提升異質陶瓷共燒的效果。 In the Republic of China Patent No. I367504, a highly integrated wafer varistor is described. The resistor is mainly made of a functional sheet on an insulating ceramic substrate, wherein the functional sheet mentioned comprises a dielectric ceramic material. The piezoelectric ceramic material, the magnetic ceramic material semiconductor material, etc. are polished by the insulating ceramic substrate to form a plurality of grooves to improve the joint strength at the interface and improve the co-firing effect of the heterogeneous ceramic.
除了前述提及不同組成與特性之陶瓷材料間的共燒專利技術外,強調具低溫共燒特性(共燒溫度<950℃)之專利亦相當多,例如美國專利5144526中,使用了以低介電陶瓷材料為主的結構設計,並於元件結構中插入一層高介電陶瓷材料進行低溫共燒(LTCC)所實現之電容器元件。中華民國專利428300,係藉由低介電陶瓷材料包覆高介電陶瓷材料搭配不同電極型式之設計來製作被動元件。 In addition to the aforementioned co-fired patented technology between ceramic materials of different compositions and characteristics, there are also many patents emphasizing low-temperature co-firing characteristics (co-firing temperature <950 ° C), for example, in U.S. Patent 5,144,526, A ceramic component-based structural design, in which a high dielectric ceramic material is inserted into the component structure for capacitor element realization by low temperature co-firing (LTCC). The Republic of China Patent No. 428300 is a passive component fabricated by coating a high dielectric ceramic material with a different dielectric type of a low dielectric ceramic material.
而美國杜邦公司也採用不同高、低介電陶瓷材料之概念來進行共燒,並提出一系列專利,在其美國專利6827800及中華民國專利I226319中,主要帶(Primary Tape)中加入內部侷限帶(Constraining Layer),同時在表層某一端加入一釋放層(Release Layer)已產生能使x、y方向之收縮互相抑制之結構,其中主要帶之介電常數介於6~10之間,而內部侷限帶介電常數則介於10~5000之間。 DuPont also uses the concept of different high- and low-dielectric ceramic materials for co-firing, and proposes a series of patents. In its US patent 6827800 and the Republic of China patent I226319, the internal tape is added to the primary tape. (Constraining Layer), at the same time adding a release layer (Release Layer) at one end of the surface layer has produced a structure that can suppress the shrinkage of the x and y directions, wherein the main band has a dielectric constant between 6 and 10, while the internal The dielectric constant of the confinement band is between 10 and 5000.
此外,其美國專利7068492、7067026及中華民國專利I277512、I308106、I280955中,使用高介電材料之介電常數大於8以上,而低介電材料則係低於8以下,且將主要帶之介電常數修正至7~9之間,並說明同時採用三個或三個以上不同介電材料薄帶來達到平坦、無畸變、零收縮之陶瓷元件或複合物或模組或封裝之製作方法。該公司於美國專利20060162844及中華民國專利 I278879中,再進一步針對使用之介電材料特性進行修正,於前述設計之主要帶與內部侷限帶中插入一高介電常數帶結構進行電容器之共燒,其中所採用之高介電常數帶之介電常數至少要20,所使用之高、低介電材料之k值範圍均低於250以下,上述之杜邦公司專利均採用低溫共燒的方式進行,即燒結溫度低於950℃。美國專利7141129中,則提到採用介電材料之k值範圍大於2000,且低介電材料之K值範圍依然小於20之共燒技術,但該專利依然係屬於低溫共燒的技術範疇。 In addition, in U.S. Patent No. 7,068,492, 70, 670, 626 and the Republic of China Patent Nos. I277512, I308106, and I280955, the dielectric constant of a high dielectric material is greater than 8 or higher, and the low dielectric material is less than 8 or less. The electrical constant is corrected to between 7 and 9, and illustrates the use of three or more different dielectric materials to achieve a flat, distortion-free, zero-shrink ceramic component or composite or module or package. The company is in US patent 20060162844 and the Republic of China patent In I278879, the characteristics of the dielectric material used are further corrected, and a high dielectric constant band structure is inserted into the main band of the above design and the internal confinement band to perform co-firing of the capacitor, wherein the high dielectric constant band is used. The dielectric constant is at least 20, and the k values of the high and low dielectric materials used are all below 250. The above DuPont patents are all carried out by low temperature co-firing, that is, the sintering temperature is lower than 950 °C. In U.S. Patent No. 7,141,129, a co-firing technique is adopted in which the k-value range of the dielectric material is greater than 2000, and the K-value of the low-dielectric material is still less than 20, but the patent is still in the technical field of low-temperature co-firing.
然而,考量現今積層電子陶瓷元件(如積層陶瓷電容器)之製造技術與材料成本,高溫式(>1100℃)的還原氣氛燒結製程仍屬主流。故,如何將上述共燒概念導入現行的燒結製程中,使得所製作之元件具有更多元特性,即為本領域所欲解決之課題。 However, considering the manufacturing technology and material cost of today's laminated electronic ceramic components (such as laminated ceramic capacitors), the high temperature (>1100 ° C) reducing atmosphere sintering process is still the mainstream. Therefore, how to introduce the above-mentioned co-firing concept into the current sintering process, so that the fabricated components have more meta-characteristics, is the subject to be solved in the art.
為解決上述習知技術之問題,本發明之一目的係在於提供一種將高介電常數陶瓷材料與低介電常數陶瓷材料於還原氣氛下進行無加壓共燒結(Non-constrained sintering)處理方式,以得到理想的共燒匹配性與反應性的積層電子陶瓷元件及其無壓共燒結製法。 In order to solve the above problems of the prior art, an object of the present invention is to provide a non-constrained sintering treatment method for a high dielectric constant ceramic material and a low dielectric constant ceramic material under a reducing atmosphere. In order to obtain an ideal co-firing matching and reactive laminated electronic ceramic component and its pressureless co-sintering method.
為解決上述習知技術之問題,本發明之另一目的係在於提供一種可保持高介電常數陶瓷材料的高電容值介電特性,並利用低介電常數陶瓷材料之低壓電與低散逸係數特性之優點,同時減少元件電致伸縮性的積層電子陶瓷元件及其無壓共燒結製法。 In order to solve the above problems of the prior art, another object of the present invention is to provide a high-capacitance dielectric property capable of maintaining a high dielectric constant ceramic material, and to utilize low-voltage electricity and low dissipation of a low dielectric constant ceramic material. A laminated electronic ceramic component having the advantages of coefficient characteristics and reducing electrostrictivity of the element and its pressureless co-sintering method.
為解決上述習知技術之問題,本發明之另一目的係在於提供一種具低介電損耗、高絕緣電阻、高絕緣破壞電壓及溫度穩定性佳的積層電子陶瓷元件及其無壓共燒結製法。 In order to solve the above problems of the prior art, another object of the present invention is to provide a laminated electronic ceramic component having low dielectric loss, high insulation resistance, high dielectric breakdown voltage and temperature stability, and a pressureless co-sintering method thereof. .
為達成上述之目的,本發明之積層電子陶瓷元件及其無壓共燒結製法透過材料組成結構之選擇與共燒製程參數控制,使得高/低介電常數陶瓷材料,可於還原氣氛下(氧分壓:10-12~10-20atm)進行無壓共燒製作,工作溫度大於等於1150℃。 In order to achieve the above object, the laminated electronic ceramic component of the present invention and the pressureless co-sintering method thereof are controlled by the selection of the material composition structure and the co-firing process parameter, so that the high/low dielectric constant ceramic material can be under a reducing atmosphere (oxygen Partial pressure: 10 -12 ~ 10 -20 atm) is produced by pressureless co-firing, and the working temperature is greater than or equal to 1150 °C.
其中,高介電常數陶瓷材料之k值>1500;低介電常數陶瓷材料之K值<100。同時,透過交錯積層設計,使用高介電常數陶瓷材料或低介電常數陶瓷材料,作為積層電子陶瓷元件之反應層或覆蓋層結構,形成同時具有高介電常數陶瓷材料及低介電常數陶瓷材料之積層電子陶瓷元件,其結構內部電極則採用鎳金屬。 Among them, the high dielectric constant ceramic material has a k value of > 1500; and the low dielectric constant ceramic material has a K value of <100. At the same time, through the staggered laminate design, a high dielectric constant ceramic material or a low dielectric constant ceramic material is used as a reaction layer or a cap layer structure of the laminated electronic ceramic component to form a ceramic material having both a high dielectric constant and a low dielectric constant ceramic. A laminated electronic ceramic component of the material, the internal electrode of which is made of nickel metal.
本發明之積層電子陶瓷元件及其無壓共燒結製法,提供一種可於還原氣氛下高溫無壓共燒的介電陶瓷組成物與製法,係利用鈣鈦礦結構(Perovskite)材料系間彼此晶格結構形貌相近,高溫作用下交互反應性較佳,形成反應結構,提高不同材料組成物間共燒之異質介面的束縛性。 The laminated electronic ceramic component of the invention and the pressureless co-sintering method thereof provide a dielectric ceramic composition and a preparation method capable of high-temperature pressureless co-firing in a reducing atmosphere, which are mutually crystallized by using a perovskite structure. The lattice structure is similar, and the interaction is better under high temperature, forming a reaction structure and improving the binding of the heterogeneous interface between the co-firing of different material compositions.
其中,高介電常數陶瓷材料主要為鈦酸鋇基(BaTiO3-based)之強介電性材料為主體,其Ba/Ti之莫耳比介於0.99~1.06之間,粉體粒徑大小(D50)範圍則在0.1至0.5μm之間,並加入多種氧化物添加劑,使得此材料組成物可於還原氣氛下燒結,燒結後材料介電常數大於1000。 Among them, the high dielectric constant ceramic material is mainly composed of a BaTiO 3 -based ferroelectric material, and the molar ratio of Ba/Ti is between 0.99 and 1.06, and the particle size is small. (D 50 ) ranges from 0.1 to 0.5 μm and various oxide additives are added so that the material composition can be sintered under a reducing atmosphere, and the material has a dielectric constant of more than 1000 after sintering.
氧化物添加劑組成,以主相鈦酸鋇使用重量為100重量%為基礎,其包含:0.32~2.70wt%碳酸鋇(BaCO3)、0~0.06wt%三氧化鉬(MoO3)、0.20~0.55wt%二氧化矽(SiO2)、0.17~0.72wt%氧化釔(Y2O3)、0.04~0.34wt%氧化鎂(MgO)、0~0.07wt%五氧化二鈮(Nb2O5)、0.11~0.28wt%碳酸錳(MnCO3)、0~1.61wt%氧化鐿(Yb2O3)、0~0.51wt%氧化鋁(Al2O3)、0~0.50wt%碳酸鈣(CaCO3)、0~0.21wt%二氧化鋯(ZrO2)、0~0.05wt%三氧化二釤(Sm2O3)、0~0.28wt%氧化鏑(Dy2O3)、0~0.10wt%二氧化鈦(TiO2)、0~0.04wt%五氧化二釩(V2O5)、0~0.13wt%碳酸鍶(SrCO3)及0~0.23wt%一氧化錫(SnO)。並可利用上述氧化物添加劑組態與主相粉體粒徑大小,控制介電特性及其所需之共燒結溫度與氣氛環境。 The oxide additive composition is based on 100% by weight of the main phase barium titanate, which comprises: 0.32 to 2.70 wt% barium carbonate (BaCO 3 ), 0 to 0.06 wt% molybdenum trioxide (MoO 3 ), 0.20~ 0.55wt% cerium oxide (SiO 2 ), 0.17~0.72wt% yttrium oxide (Y 2 O 3 ), 0.04~0.34wt% magnesium oxide (MgO), 0~0.07wt% bismuth pentoxide (Nb 2 O 5 ), 0.11~0.28wt% manganese carbonate (MnCO 3 ), 0~1.61wt% yttrium oxide (Yb 2 O 3 ), 0~0.51wt% alumina (Al 2 O 3 ), 0~0.50wt% calcium carbonate ( CaCO 3 ), 0~0.21wt% zirconium dioxide (ZrO 2 ), 0~0.05wt% antimony trioxide (Sm 2 O 3 ), 0~0.28wt% yttrium oxide (Dy 2 O 3 ), 0~0.10 Wt% titanium dioxide (TiO 2 ), 0-0.04 wt% vanadium pentoxide (V 2 O 5 ), 0-0.13 wt% strontium carbonate (SrCO 3 ), and 0-0.23 wt% tin oxide (SnO). The above oxide additive configuration can be used to control the particle size of the main phase powder, control the dielectric properties and the desired co-sintering temperature and atmosphere environment.
較佳者,上述氧化物添加劑組成,其包含:0.32~2.70wt%碳酸鋇(BaCO3)、0.001~0.06wt%三氧化鉬(MoO3)、0.20~0.55wt%二氧化矽(SiO2)、0.17~0.72wt%氧化釔(Y2O3)、0.04~0.34wt%氧化鎂(MgO)、0.001~0.07wt%五氧化二鈮(Nb2O5)、0.11~0.28wt%碳酸錳(MnCO3)、0.001~1.61wt%氧化鐿(Yb2O3)、0.001~0.51wt%氧化鋁(Al2O3)、0.001~0.50wt%碳酸鈣(CaCO3)、0.001~0.21wt%二氧化鋯(ZrO2)、0.001~0.05wt%三氧化二釤(Sm2O3)、0.001~0.28wt%氧化鏑(Dy2O3)、0.001~0.10wt%二氧化鈦(TiO2)、0.001~0.04wt%五氧化二釩(V2O5)、0.001~0.13wt%碳酸鍶(SrCO3)及0.001~0.23wt%一氧化錫(SnO)。 Preferably, the composition of the above oxide additive comprises: 0.32 to 2.70 wt% of barium carbonate (BaCO 3 ), 0.001 to 0.06 wt% of molybdenum trioxide (MoO 3 ), and 0.20 to 0.55 wt% of cerium oxide (SiO 2 ). , 0.17~0.72wt% yttrium oxide (Y 2 O 3 ), 0.04~0.34wt% magnesium oxide (MgO), 0.001~0.07wt% bismuth pentoxide (Nb 2 O 5 ), 0.11~0.28wt% manganese carbonate ( MnCO 3 ), 0.001 to 1.61% by weight of yttrium oxide (Yb 2 O 3 ), 0.001 to 0.51% by weight of aluminum oxide (Al 2 O 3 ), 0.001 to 0.50% by weight of calcium carbonate (CaCO 3 ), 0.001 to 0.21% by weight Zirconium oxide (ZrO 2 ), 0.001 to 0.05 wt% of antimony trioxide (Sm 2 O 3 ), 0.001 to 0.28 wt% of yttrium oxide (Dy 2 O 3 ), 0.001 to 0.10 wt% of titanium oxide (TiO 2 ), 0.001~ 0.04 wt% vanadium pentoxide (V 2 O 5 ), 0.001 to 0.13 wt% strontium carbonate (SrCO 3 ), and 0.001 to 0.23 wt% tin oxide (SnO).
其中,低介電常數陶瓷材料均係以常介電相陶瓷材料為主體,介電常數低於100,但具優越低介電損耗(Low Dissipation Factor,DF<0.1%)及穩定的溫度介電特性(Temperature-Capacitance Coefficient,△C/C≦1000ppm in -55℃~125℃),為使得此材料具有可還原氣氛下燒結特性,並加入適當添加劑成份。 Among them, low dielectric constant ceramic materials are mainly dielectric ceramic materials with dielectric constant below 100, but have excellent low dielectric loss (Low Dissipation Factor, DF<0.1%) and stable temperature dielectric. Characteristics (Temperature-Capacitance Coefficient, △C/C≦1000ppm in -55 ° C ~ 125 ° C), in order to make this material has a sintering characteristics in a reductive atmosphere, and add appropriate additives.
低介電常數陶瓷材料粉體粒徑大小(D50)範圍則在0.3至0.6μm之間,係包含:21.42~35.85wt%碳酸鈣(CaCO3)、0~21.31wt%碳酸鍶(SrCO3)、0~7.97wt%碳酸鋇(BaCO3)、0~11.20wt%氧化鎂(MgO)、1.36~14.86wt%二氧化鈦(TiO2)、6.74~51.30wt%二氧化鋯(ZrO2)、0~5.83wt%氧化鋅(ZnO)、0~1.30wt%碳酸錳(MnCO3)、0.59~26.58wt%二氧化矽(SiO2)、0.16~1.53wt%二氧化鉿(HfO2)、0~0.11wt%五氧化二鉭(Ta2O5)、0~0.12wt%氧化釔(Y2O3)及0~0.18wt%氧化鋁(Al2O3)。並可透過上述材料組成變化與粉體粒徑大小,調整介電特性、燒結溫度與所適合的燒結氣氛環境條件。 The low dielectric constant ceramic material has a particle size (D 50 ) ranging from 0.3 to 0.6 μm, and includes: 21.42 to 35.85 wt% calcium carbonate (CaCO 3 ), and 0 to 21.31 wt% strontium carbonate (SrCO 3 ). ), 0~7.97wt% barium carbonate (BaCO 3 ), 0~11.20wt% magnesium oxide (MgO), 1.36~14.86wt% titanium dioxide (TiO 2 ), 6.74~51.30wt% zirconium dioxide (ZrO 2 ), 0 ~5.83wt% zinc oxide (ZnO), 0~1.30wt% manganese carbonate (MnCO 3 ), 0.59~26.58wt% cerium oxide (SiO 2 ), 0.16~1.53wt% cerium oxide (HfO 2 ), 0~ 0.11 wt% of tantalum pentoxide (Ta 2 O 5 ), 0 to 0.12 wt% of yttrium oxide (Y 2 O 3 ), and 0 to 0.18 wt% of alumina (Al 2 O 3 ). The dielectric composition, the sintering temperature and the suitable sintering atmosphere environmental conditions can be adjusted by the composition change of the above materials and the particle size of the powder.
較佳者,上述低介電常數陶瓷材料,其包含:21.42~35.85wt%碳酸鈣(CaCO3)、0.001~21.31wt%碳酸鍶(SrCO3)、0.001~7.97wt%碳酸鋇(BaCO3)、0.001~11.20wt%氧化鎂(MgO)、1.36~14.86wt%二氧化鈦(TiO2)、6.74~51.30wt%二氧化鋯(ZrO2)、0.001~5.83wt%氧化鋅(ZnO)、0.001~1.30wt%碳酸錳(MnCO3)、0.59~26.58wt%二氧化矽(SiO2)、0.16~1.53wt%二氧化鉿(HfO2)、0.001~0.11wt%五氧化二鉭(Ta2O5)、0.001~0.12wt%氧化釔(Y2O3)及0.001~0.18wt%氧化鋁(Al2O3)。 Preferred are the low dielectric constant ceramic material, comprising: 21.42 ~ 35.85wt% calcium carbonate (CaCO 3), 0.001 ~ 21.31wt % strontium carbonate (SrCO 3), 0.001 ~ 7.97wt % barium carbonate (BaCO 3) 0.001~11.20wt% magnesium oxide (MgO), 1.36~14.86wt% titanium dioxide (TiO 2 ), 6.74~51.30wt% zirconium dioxide (ZrO 2 ), 0.001~5.83wt% zinc oxide (ZnO), 0.001~1.30 Wt% manganese carbonate (MnCO 3 ), 0.59~26.58wt% cerium oxide (SiO 2 ), 0.16~1.53wt% cerium oxide (HfO 2 ), 0.001~0.11wt% bismuth pentoxide (Ta 2 O 5 ) 0.001 to 0.12 wt% of yttrium oxide (Y 2 O 3 ) and 0.001 to 0.18 wt% of alumina (Al 2 O 3 ).
接著,以高介電常數陶瓷材料及低介電常數陶瓷材料作為基礎,以鎳金屬或其合金作為電極,分別製作成高介電常數陶瓷層、高介電常數電極層(即已塗佈金屬電極之高介電常數陶瓷層)、低介電常數陶瓷層與低介電常數電極層(即已塗佈金屬電極低介電常數陶瓷層)。 Then, based on the high dielectric constant ceramic material and the low dielectric constant ceramic material, nickel metal or its alloy is used as an electrode to form a high dielectric constant ceramic layer and a high dielectric constant electrode layer (ie, coated metal). a high dielectric constant ceramic layer of the electrode), a low dielectric constant ceramic layer and a low dielectric constant electrode layer (ie, a metal dielectric low dielectric constant ceramic layer).
接著,藉由高介電常數陶瓷結構層與低介電常數陶瓷結構層組成元件內部反應層,此兩種結構層之交錯積層設計可為對稱式或非對稱式。此反應層中,高介電常數陶瓷結構層與低介電常數陶瓷結構層至少存在一種。 Next, the internal reaction layer of the element is composed of a high dielectric constant ceramic structure layer and a low dielectric constant ceramic structure layer, and the staggered laminate design of the two structural layers may be symmetric or asymmetric. In the reaction layer, at least one of a high dielectric constant ceramic structural layer and a low dielectric constant ceramic structural layer exists.
上述之高介電常數陶瓷層及高介電常數電極層係組成有高介電常數陶瓷結構層,上述之低介電常數陶瓷層及低介電常數電極層係組成有低介電常數陶瓷結構層。 The high dielectric constant ceramic layer and the high dielectric constant electrode layer are composed of a high dielectric constant ceramic structural layer, and the low dielectric constant ceramic layer and the low dielectric constant electrode layer are composed of a low dielectric constant ceramic structure. Floor.
其中,高介電常數陶瓷結構層中透過高介電常數電極層之交錯積層設計,達到電容特性。並利用電極間交錯面積大小,與控制電極間高介電常數陶瓷層厚度,進而達到調控電容值的目的。其中,電極圖樣形式可為連續式、非連續式或浮動式等。高介電常數陶瓷結構層,亦可全為陶瓷層。在此高介電常數陶瓷層與高介電常數電極層之高介電常數陶瓷基材,可為在單一燒結條件下處理之相同或相近組成物成分。 Among them, the high dielectric constant ceramic structure layer is designed by a staggered laminate of high dielectric constant electrode layers to achieve capacitance characteristics. And the size of the staggered area between the electrodes is used, and the thickness of the high dielectric constant ceramic layer between the electrodes is controlled, thereby achieving the purpose of regulating the capacitance value. The electrode pattern can be continuous, discontinuous or floating. The high dielectric constant ceramic structural layer may also be entirely a ceramic layer. The high dielectric constant ceramic substrate of the high dielectric constant ceramic layer and the high dielectric constant electrode layer may be the same or similar composition components treated under a single sintering condition.
其中,低介電常數陶瓷結構層中透過低介電常數電極層之交錯積層設計,達到電容特性。並利用電極間交錯面積大小,與控制電極間低介電常數陶瓷層厚度,進而達到調控電容值的目的。其中,電極圖樣形式可為連續式或、非連續式或浮動式等。此低介電常數陶瓷結構層,亦可全為陶瓷層。在此低介電常數陶瓷層與低介電常數電極層之低介電常數陶瓷基材,可為在單一燒結條件下處理之相同或相近組成物成分。 Among them, the low dielectric constant ceramic structure layer is designed by a staggered laminate of low dielectric constant electrode layers to achieve capacitance characteristics. And the use of the cross-sectional area between the electrodes, and the thickness of the low dielectric constant ceramic layer between the control electrodes, thereby achieving the purpose of regulating the capacitance value. Wherein, the electrode pattern form may be continuous or discontinuous or floating. The low dielectric constant ceramic structural layer may also be entirely a ceramic layer. The low dielectric constant ceramic substrate of the low dielectric constant ceramic layer and the low dielectric constant electrode layer may be the same or similar composition components treated under a single sintering condition.
其中,高介電常數陶瓷層、高介電常數電極層、低介電常數陶瓷層與低介電常數電極層,可為相同或不相同之厚度尺寸。 The high dielectric constant ceramic layer, the high dielectric constant electrode layer, the low dielectric constant ceramic layer and the low dielectric constant electrode layer may be the same or different thickness dimensions.
其中,高介電常數陶瓷結構層中電極厚度與低介電常數陶瓷結構層中電極層之電極厚度,亦可為相同或不相同之厚度尺寸,且各電極層厚度皆需小於或等於對應的高介電常數陶瓷結構層與低介電常數陶瓷結構層厚度。 Wherein, the electrode thickness in the high dielectric constant ceramic structure layer and the electrode thickness of the electrode layer in the low dielectric constant ceramic structure layer may also be the same or different thickness sizes, and the thickness of each electrode layer needs to be less than or equal to the corresponding High dielectric constant ceramic structural layer and low dielectric constant ceramic structural layer thickness.
上述之覆蓋層結構為低介電常數陶瓷層或高介電常數陶瓷層中至少一種,上及下兩面覆蓋層之厚度與組成上,可為相同或不相同,所述覆蓋層之厚度至少大於30μm。且覆蓋層之陶瓷材料組成與反應層之陶瓷材料組成,可為相同或不相同。 The cover layer structure is at least one of a low dielectric constant ceramic layer or a high dielectric constant ceramic layer, and the thickness and composition of the upper and lower cover layers may be the same or different, and the thickness of the cover layer is at least greater than 30 μm. And the ceramic material composition of the cover layer and the ceramic material of the reaction layer may be the same or different.
又,上述各結構層間之結合區,可透過相同或不同之陶瓷層,或陶瓷層與電極層相互接合進行燒結,作為共燒反應結合界面。 Further, the bonding regions between the respective structural layers may be sintered through the same or different ceramic layers, or the ceramic layers and the electrode layers may be joined to each other to form a co-firing reaction bonding interface.
此外,本發明係透過下述方式進行無壓共燒結製作,進而將兩種或兩種以上材料系統於還原氣氛下共燒,並實現於元件製作。此共燒結製法流程如下:首先,將根據前述完成積層結構之電容器元件本體,以溫度T1進行預燒除製程;其後將預燒除後之電容器元件本體,以高於溫度T1之溫度T2進行燒除製程,上述氣氛控制在10-6~10-12atm氧分壓;接著,持續將溫度升高至T3,同時通入濕氣、氫或氮混合氣,控制於還原氣氛(10-12~10-20atm氧分壓)下,進行異質材料間之燒結(Sintering)製程;最終,將燒結溫度調降至溫度T4,並通入溼氣、氮與氧混合氣,控制於氧分壓10-7~10-15atm下,以進行再氧化(Re-oxidation)製程,其中T3>T4>T2T1,且此高溫共燒曲線可於還原氣氛下進行。其中,前述所提及之預燒除及燒除製程之溫度T1和T2係以200℃~900℃之溫度進行,預燒除及燒除製程可分別或合併進行;燒結製程之溫度T3範圍則係在1150℃~1350 ℃間;而再氧化製程之溫度T4範圍則落在950℃~1150℃之間。同時各製程之升、降溫速率需控制在1.5℃/min~15℃/min範圍內。 Further, the present invention is produced by pressureless co-sintering in the following manner, and further, two or more kinds of material systems are co-fired in a reducing atmosphere, and are realized in element fabrication. The co-sintering process is as follows: First, the capacitor element body according to the above-mentioned completed laminated structure is subjected to a pre-burning process at a temperature T1; thereafter, the pre-burned capacitor element body is subjected to a temperature T2 higher than the temperature T1. In the burn-off process, the above atmosphere is controlled at an oxygen partial pressure of 10 -6 to 10 -12 atm; then, the temperature is continuously raised to T3, and a mixture of moisture, hydrogen or nitrogen is introduced to control the reducing atmosphere (10 -12). Sintering process between heterogeneous materials at ~10 -20 atm partial pressure; finally, the sintering temperature is lowered to temperature T4, and a mixture of moisture, nitrogen and oxygen is introduced to control the oxygen partial pressure. 10 -7 ~ 10 -15 atm for re-oxidation process, where T3>T4>T2 T1, and the high temperature co-firing curve can be carried out under a reducing atmosphere. Wherein, the temperatures T1 and T2 of the pre-burning and burning process mentioned above are carried out at a temperature of 200 ° C to 900 ° C, and the pre-burning and burning processes may be carried out separately or in combination; the temperature T3 range of the sintering process is The temperature is between 1150 ° C and 1350 ° C; while the temperature T4 of the reoxidation process falls between 950 ° C and 1150 ° C. At the same time, the rise and fall rates of each process should be controlled within the range of 1.5 °C / min ~ 15 ° C / min.
S01~S02‧‧‧步驟流程 S01~S02‧‧‧Step process
S021~S024‧‧‧步驟流程 S021~S024‧‧‧Step procedure
100‧‧‧第一覆蓋層 100‧‧‧ first cover
200‧‧‧第二覆蓋層 200‧‧‧second cover
300‧‧‧反應層 300‧‧‧Reaction layer
400‧‧‧鎳金屬電極層 400‧‧‧ Nickel metal electrode layer
500‧‧‧高介電常數陶瓷結構層 500‧‧‧High dielectric constant ceramic structure
501‧‧‧高介電常數陶瓷層 501‧‧‧High dielectric constant ceramic layer
502‧‧‧高介電常數電極層 502‧‧‧High dielectric constant electrode layer
600‧‧‧低介電常數陶瓷結構層 600‧‧‧Low dielectric constant ceramic structural layer
601‧‧‧低介電常數陶瓷層 601‧‧‧Low dielectric constant ceramic layer
602‧‧‧低介電常數電極層 602‧‧‧Low dielectric constant electrode layer
圖1A係為本發明高介電常數陶瓷結構層之無壓共燒結製法之流程圖;圖1B係為步驟S02之細部流程圖;圖2係為本發明高介電常數陶瓷結構層之示意圖;圖3係為本發明低介電常數陶瓷結構層之示意圖;圖4係為本發明積層電子陶瓷元件之示意圖;圖5A係為鎳金屬電極層連續印刷示意圖;圖5B係為鎳金屬電極層不連續印刷示意圖;以及圖5C係為鎳金屬電極層浮動印刷示意圖。 1A is a flow chart of a pressureless co-sintering method for a high dielectric constant ceramic structural layer of the present invention; FIG. 1B is a detailed flow chart of step S02; FIG. 2 is a schematic view of a high dielectric constant ceramic structural layer of the present invention; 3 is a schematic view of a low dielectric constant ceramic structural layer of the present invention; FIG. 4 is a schematic view of a laminated electronic ceramic component of the present invention; FIG. 5A is a schematic diagram of continuous printing of a nickel metal electrode layer; FIG. 5B is a nickel metal electrode layer. A schematic diagram of continuous printing; and Figure 5C is a schematic diagram of floating printing of a nickel metal electrode layer.
以下將描述具體之實施例以說明本發明之實施態樣,惟其並非用以限制本發明所欲保護之範疇。 The specific embodiments are described below to illustrate the embodiments of the invention, but are not intended to limit the scope of the invention.
請參閱圖1A~1B,本發明積層電子陶瓷元件之無壓溫共燒結製法,其流程包括:S01:將k值(介電常數)大於1500以上高介電常數陶瓷結層及k值小於100的低介電常數陶瓷結構層交錯積層形成積層電子陶瓷元件; S02:將積層電子陶瓷元件於還原氣氛10-6~10-20atm環境下進行溫度1150℃~1350℃無壓燒結。 1A-1B, the pressureless temperature co-sintering method of the laminated electronic ceramic component of the present invention comprises the following steps: S01: a high dielectric constant ceramic junction layer with a k value (dielectric constant) greater than 1500 and a k value of less than 100. The low dielectric constant ceramic structure layer is alternately laminated to form a laminated electronic ceramic component; S02: the laminated electronic ceramic component is subjected to pressureless sintering at a temperature of 1150 ° C to 1350 ° C in a reducing atmosphere of 10 -6 ~ 10 -20 atm.
其中,將積層電子陶瓷元件於還原氣氛10-6~10-20atm環境下進行燒結,其流程包括:S021:將積層電子陶瓷元件以200℃~900℃進行預燒除;S022:將預燒除後的積層電子陶瓷元件於還原氣氛10-6~10-12atm環境,並高於預燒除的溫度進行燒除;S023:將溫度提高至1150℃~1350℃,同時通入濕氣、氮及氫混合氣,並於還原氣氛10-12~10-20atm環境下,進行異質材質間之燒結製作;S024:將溫度調降至950℃~1150℃,並通入濕氣、氮及氫混合氣,於還原氣氛10-7~10-15atm環境下進行再氧化製程。 Wherein, the laminated electronic ceramic component is sintered in a reducing atmosphere at a temperature of 10 -6 to 10 -20 atm, wherein the process comprises: S021: pre-burning the laminated electronic ceramic component at 200 ° C to 900 ° C; S022: pre-burning The removed laminated electronic ceramic component is fired in a reducing atmosphere of 10 -6 ~ 10 -12 atm and higher than the pre-burning temperature; S023: the temperature is raised to 1150 ° C ~ 1350 ° C, and moisture is introduced at the same time. Nitrogen and hydrogen mixed gas, and sintered in a heterogeneous material in a reducing atmosphere of 10 -12 ~ 10 -20 atm; S024: The temperature is lowered to 950 ° C ~ 1150 ° C, and the moisture, nitrogen and The hydrogen mixed gas is subjected to a reoxidation process in a reducing atmosphere of 10 -7 to 10 -15 atm.
上述之高介電常數陶瓷結構層係利用高介電常數陶瓷材料製作而成,以下舉例說明高介電常數陶瓷材料之組成及高介電常數陶瓷結構層之製作方法: The high dielectric constant ceramic structural layer described above is made of a high dielectric constant ceramic material. The following is an example of a composition of a high dielectric constant ceramic material and a method for fabricating a high dielectric constant ceramic structural layer:
實施例1-1:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,介電常數(以下稱為k值)為4500。主相材料為BaTiO3,Ba/Ti之莫耳比=0.99,粉體粒徑大小(D50)為0.5μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):1.22重量%、MoO3(三氧化鉬):0.05重量%、SiO2(二氧化矽):0.46重量%、Y2O3(氧化釔):0.34重量%、MgO(氧化鎂):0.2 重量%、Nb2O5(五氧化二鈮):0.05重量%、MnCO3(碳酸錳):0.13重量%、Al2O3(氧化鋁):0.22重量%、ZrO2(二氧化鋯):0.04重量%。 Example 1-1: The composition of the high dielectric constant ceramic material included a main phase material and an oxide additive, and a dielectric constant (hereinafter referred to as k value) was 4500. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 0.99, the particle size (D 50 ) is 0.5 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 1.22% by weight, MoO 3 (molybdenum trioxide): 0.05% by weight, SiO 2 (cerium oxide): 0.46% by weight, Y 2 O 3 (cerium oxide): 0.34% by weight, MgO (magnesium oxide): 0.2% by weight, Nb 2 O 5 (antimony pentoxide): 0.05% by weight, MnCO 3 (manganese carbonate): 0.13% by weight, Al 2 O 3 (alumina): 0.22% by weight, ZrO 2 (zirconium dioxide): 0.04% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-2:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為2200。主相材料為BaTiO3,Ba/Ti之莫耳比為1.03,粉體粒徑大小(D50)為0.3μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):2.27重量%、MoO3(三氧化鉬):0.05重量%、SiO2(二氧化矽):0.55重量%、Y2O3(氧化釔):0.3重量%、MgO(氧化鎂):0.2重量%、Nb2O5(五氧化二鈮):0.07重量%、MnCO3(碳酸錳):0.11重量%、Yb2O3(氧化鐿):0.49重量%、Sm2O3(三氧化二釤):0.03重量%、Dy2O3(氧化鏑):0.18重量%。 Example 1-2: High dielectric constant The composition of the ceramic material consisted of a main phase material and an oxide additive having a k value of 2,200. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.03, the particle size (D 50 ) is 0.3 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 2.27 wt%, MoO 3 (molybdenum trioxide): 0.05 wt%, SiO 2 (ceria): 0.55 wt%, Y 2 O 3 (yttria): 0.3 wt%, MgO (magnesium oxide): 0.2% by weight, Nb 2 O 5 (antimony pentoxide): 0.07% by weight, MnCO 3 (manganese carbonate): 0.11% by weight, Yb 2 O 3 (cerium oxide): 0.49% by weight, Sm 2 O 3 (antimony trioxide): 0.03 wt%, Dy 2 O 3 (yttria): 0.18 wt%.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-3:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為4000。主相材料為BaTiO3,Ba/Ti之莫耳比=1.03,粉體粒徑大小(D50) 為0.4μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):0.99重量%、MoO3(三氧化鉬):0.06重量%、SiO2(二氧化矽):0.49重量%、Y2O3(氧化釔):0.67重量%、MgO(氧化鎂):0.2重量%、Nb2O5(五氧化二鈮):0.06重量%、MnCO3(碳酸錳):0.13重量%、Yb2O3(氧化鐿):0~0.33重量%、Al2O3(氧化鋁):0.42重量%、ZrO2(二氧化鋯):0.15重量%、Dy2O3(氧化鏑):0.12重量%、TiO2(二氧化鈦):0.1重量%。 Example 1-3: The composition of the high dielectric constant ceramic material includes a main phase material and an oxide additive having a k value of 4,000. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.03, the particle size (D 50 ) is 0.4 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 0.99 wt%, MoO 3 (molybdenum trioxide): 0.06 wt%, SiO 2 (cerium oxide): 0.49 wt%, Y 2 O 3 (cerium oxide): 0.67 wt%, MgO (magnesium oxide): 0.2% by weight, Nb 2 O 5 (niobium pentoxide): 0.06 wt%, MnCO 3 (manganese carbonate): 0.13 wt%, Yb 2 O 3 (ruthenium oxide): 0 to 0.33 wt% Al 2 O 3 (alumina): 0.42% by weight, ZrO 2 (zirconium dioxide): 0.15% by weight, Dy 2 O 3 (cerium oxide): 0.12% by weight, and TiO 2 (titanium dioxide): 0.1% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-4:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為3300。主相材料為BaTiO3,Ba/Ti之莫耳比=1.05,粉體粒徑大小(D50)為0.35μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):0.82重量%、MoO3(三氧化鉬):0.03重量%、SiO2(二氧化矽):0.22重量%、Y2O3(氧化釔):0.17重量%、MgO(氧化鎂):0.04重量%、MnCO3(碳酸錳):0.28重量%、Yb2O3(氧化鐿):0.82重量%、Al2O3(氧化鋁):0.17重量%。 Examples 1-4: High dielectric constant ceramic materials consisting of a main phase material and an oxide additive having a k value of 3,300. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.05, the particle size (D 50 ) is 0.35 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 0.82% by weight, MoO 3 (molybdenum trioxide): 0.03% by weight, SiO 2 (cerium oxide): 0.22% by weight, Y 2 O 3 (cerium oxide): 0.17% by weight, MgO (magnesium oxide): 0.04% by weight, MnCO 3 (manganese carbonate): 0.28% by weight, Yb 2 O 3 (cerium oxide): 0.82% by weight, and Al 2 O 3 (alumina): 0.17% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作 出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (phthalate or phosphate) is fully stirred to form a ceramic slurry, which is coated and formed. A high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed, and then a nickel metal electrode is printed on the high dielectric constant ceramic layer to form a high dielectric constant ceramic electrode layer.
實施例1-5:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為2500。主相材料為BaTiO3,Ba/Ti之莫耳比=0.99,粉體粒徑大小(D50)為0.25μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):1.81重量%、MoO3(三氧化鉬):0.04重量%、SiO2(二氧化矽):0.43重量%、Y2O3(氧化釔):0.44重量%、MgO(氧化鎂):0.08重量%、Nb2O5(五氧化二鈮):0.06重量%、MnCO3(碳酸錳):0.27重量%、Yb2O3(氧化鐿):1.6重量%、Al2O3(氧化鋁):0.22重量%、CaCO3(碳酸鈣):0.12重量%、ZrO2(二氧化鋯):0.15重量%。 Examples 1-5: The composition of the high dielectric constant ceramic material includes a main phase material and an oxide additive having a k value of 2,500. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 0.99, the particle size (D 50 ) is 0.25 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 1.81% by weight, MoO 3 (molybdenum trioxide): 0.04% by weight, SiO 2 (cerium oxide): 0.43% by weight, Y 2 O 3 (cerium oxide): 0.44% by weight, MgO (magnesium oxide): 0.08 wt%, Nb 2 O 5 (niobium pentoxide): 0.06 wt%, MnCO 3 (manganese carbonate): 0.27 wt%, Yb 2 O 3 (ruthenium oxide): 1.6 wt%, Al 2 O 3 (alumina): 0.22% by weight, CaCO 3 (calcium carbonate): 0.12% by weight, ZrO 2 (zirconium dioxide): 0.15% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-6:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為2000。主相材料為BaTiO3,Ba/Ti之莫耳比=1.03,粉體粒徑大小(D50)為0.15μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):1.19重量%、MoO3(三氧化鉬):0.06重量%、SiO2(二氧化矽):0.48重量%、Y2O3(氧化釔):0.44重量%、MgO(氧化鎂):0.2重量%、Nb2O5(五氧化二鈮):0.06重量%、MnCO3(碳酸錳):0.13重量%、Yb2O3(氧化鐿):1.03重量%、Al2O3(氧化鋁):0.51重量%、CaCO3(碳酸鈣):0.5重量%。 Examples 1-6: The composition of the high dielectric constant ceramic material includes a main phase material and an oxide additive having a k value of 2,000. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.03, the particle size (D 50 ) is 0.15 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 1.19 wt%, MoO 3 (molybdenum trioxide): 0.06 wt%, SiO 2 (ceria): 0.48 wt%, Y 2 O 3 (yttria): 0.44 wt%, MgO (magnesium oxide): 0.2% by weight, Nb 2 O 5 (antimony pentoxide): 0.06% by weight, MnCO 3 (manganese carbonate): 0.13% by weight, Yb 2 O 3 (cerium oxide): 1.03% by weight, Al 2 O 3 (alumina): 0.51% by weight, CaCO 3 (calcium carbonate): 0.5% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-7:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為3500。主相材料為BaTiO3,Ba/Ti之莫耳比=1.06,粉體粒徑大小(D50)為0.35μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):1.06重量%、MoO3(三氧化鉬):0.03重量%、SiO2(二氧化矽):0.25重量%、Y2O3(氧化釔):0.72重量%、MgO(氧化鎂):0.34重量%、Nb2O5(五氧化二鈮):0.05重量%、MnCO3(碳酸錳):0.19重量%、Al2O3(氧化鋁):0.2重量%、ZrO2(二氧化鋯):0.21重量%、V2O5(五氧化二釩):0.04重量%、SrCO3(碳酸鍶):0.12重量%。 Example 1-7: The composition of the high dielectric constant ceramic material consisted of a main phase material and an oxide additive having a k value of 3,500. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.06, the particle size (D 50 ) is 0.35 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 1.06 wt%, MoO 3 (molybdenum trioxide): 0.03 wt%, SiO 2 (cerium oxide): 0.25% by weight, Y 2 O 3 (cerium oxide): 0.72% by weight, MgO (magnesium oxide): 0.34% by weight, Nb 2 O 5 (niobium pentoxide): 0.05% by weight, MnCO 3 (manganese carbonate): 0.19% by weight, Al 2 O 3 (alumina): 0.2% by weight, ZrO 2 (zirconia): 0.21% by weight, V 2 O 5 (vanadium pentoxide): 0.04% by weight, SrCO 3 (cerium carbonate): 0.12% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalate or phosphate) is sufficiently stirred to form a ceramic slurry, and then a nickel metal electrode is printed on the high dielectric constant ceramic layer to form a high dielectric constant ceramic electrode layer.
實施例1-8:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為2400。主相材料為BaTiO3,Ba/Ti之莫耳比=1.06,粉體粒徑大小(D50)為0.25μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):0.32重量%、SiO2(二氧化矽):0.2重量%、Y2O3(氧化釔):0.23重量%、MgO(氧化鎂):0.13重量%、Nb2O5(五氧化二鈮):0.02重量%、MnCO3(碳 酸錳):0.19重量%、Yb2O3(氧化鐿):1.31重量%、Al2O3(氧化鋁):0.21重量%、SnO(一氧化錫):0.23重量%。 Example 1-8: The composition of the high dielectric constant ceramic material consisted of a main phase material and an oxide additive having a k value of 2,400. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.06, the particle size (D 50 ) is 0.25 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 0.32% by weight, SiO 2 (cerium oxide): 0.2% by weight, Y 2 O 3 (cerium oxide): 0.23% by weight, MgO (magnesium oxide): 0.13% by weight, Nb 2 O 5 (antimony pentoxide): 0.02% by weight, MnCO 3 (manganese carbonate): 0.19% by weight, Yb 2 O 3 (cerium oxide): 1.31% by weight, Al 2 O 3 (alumina): 0.21% by weight, SnO (tin oxide): 0.23 wt%.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-9:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為3400。主相材料為BaTiO3,Ba/Ti之莫耳比=1.06,粉體粒徑大小(D50)為0.35μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):0.74重量%、MoO3(三氧化鉬):0.02重量%、SiO2(二氧化矽):0.25重量%、Y2O3(氧化釔):0.23重量%、MgO(氧化鎂):0.1重量%、Nb2O5(五氧化二鈮):0.03重量%、MnCO3(碳酸錳):0.25重量%、Yb2O3(氧化鐿):0.17重量%、Al2O3(氧化鋁):0.21重量%、ZrO2(二氧化鋯):0.12重量%、SrCO3(碳酸鍶):0.13重量%。 Examples 1-9: High dielectric constant ceramic materials consisting of a main phase material and an oxide additive having a k value of 3,400. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.06, the particle size (D 50 ) is 0.35 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 0.74% by weight, MoO 3 (molybdenum trioxide): 0.02% by weight, SiO 2 (cerium oxide): 0.25% by weight, Y 2 O 3 (cerium oxide): 0.23% by weight, MgO (magnesium oxide): 0.1% by weight, Nb 2 O 5 (antimony pentoxide): 0.03% by weight, MnCO 3 (manganese carbonate): 0.25% by weight, Yb 2 O 3 (cerium oxide): 0.17% by weight, Al 2 O 3 (alumina): 0.21% by weight, ZrO 2 (zirconium dioxide): 0.12% by weight, and SrCO 3 (cerium carbonate): 0.13% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
實施例1-10:高介電常數陶瓷材料之組成包括主相材料與氧化物添加劑,k值為2950。主相材料為BaTiO3,Ba/Ti之莫耳比=1.01,粉體粒徑大小 (D50)為0.45μm,氧化物添加劑組成(以主相BaTiO3使用重量為100重量%為基礎),包括:BaCO3(碳酸鋇):2.70重量%、MoO3(三氧化鉬):0.04重量%、SiO2(二氧化矽):0.48重量%、Y2O3(氧化釔):0.54重量%、MgO(氧化鎂):0.04重量%、MnCO3(碳酸錳):0.25重量%、Sm2O3(三氧化二釤):0.05重量%、Dy2O3(氧化鏑):0.28重量%。 Examples 1-10: High dielectric constant ceramic materials consisting of a main phase material and an oxide additive having a k value of 2,950. The main phase material is BaTiO 3 , the molar ratio of Ba/Ti is 1.01, the particle size (D 50 ) is 0.45 μm, and the oxide additive composition is based on 100% by weight of the main phase BaTiO 3 . Including: BaCO 3 (cerium carbonate): 2.70% by weight, MoO 3 (molybdenum trioxide): 0.04% by weight, SiO 2 (cerium oxide): 0.48% by weight, Y 2 O 3 (cerium oxide): 0.54% by weight, MgO (magnesium oxide): 0.04% by weight, MnCO 3 (manganese carbonate): 0.25% by weight, Sm 2 O 3 (antimony trioxide): 0.05% by weight, Dy 2 O 3 (yttria): 0.28% by weight.
將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出厚度於2~5μm的高介電常數陶瓷層,接著,再於高介電常數陶瓷層上印刷鎳金屬電極以形成高介電常數陶瓷電極層。 The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a high dielectric constant ceramic layer having a thickness of 2 to 5 μm is formed by coating, and then printed on a high dielectric constant ceramic layer. A nickel metal electrode to form a high dielectric constant ceramic electrode layer.
上述之高介電常數陶瓷結構層係利用高介電常數陶瓷材料製作而成,以下舉例說明低介電常數陶瓷材料之組成及低介電常數陶瓷結構層之製作方法: The high dielectric constant ceramic structural layer described above is made of a high dielectric constant ceramic material. The following is an example of a composition of a low dielectric constant ceramic material and a method for fabricating a low dielectric constant ceramic structural layer:
實施例2-1:低介電常數陶瓷材料之組成包括共同相材料與其他氧化物添加劑,k值為10,將低介電常數陶瓷材料總重量訂為100重量%,先將共同相材料:CaCO3(碳酸鈣):11.38重量%、MgO(氧化鎂):0.05重量%、TiO2(二氧化鈦):10.07重量%、ZrO2(二氧化鋯):6.74重量%、HfO2(二氧化鉿):0.15重量%,加入於水中並添加分散劑,充分攪拌後乾燥,再於1100℃~1350℃下煆燒成相,共同相材料之粉體粒徑大小(D50)範圍控制在0.33μm。並於共同相材料中添加其他氧化物添加劑,氧化物添加劑成份如下:BaCO3(碳酸鋇):7.97重量%、CaCO3(碳酸鈣):19.65重量%、MgO(氧化鎂):11.15重量%、ZnO(氧化鋅):5.83重量%、 SiO2(二氧化矽):26.58重量%、Al2O3(氧化鋁):0.18重量%。將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出低介電常數陶瓷層,低介電常數陶瓷層厚度為3~6μm。 Embodiment 2-1: The composition of the low dielectric constant ceramic material includes the common phase material and other oxide additives, the k value is 10, and the total weight of the low dielectric constant ceramic material is set to 100% by weight, and the common phase material is first: CaCO 3 (calcium carbonate): 11.38% by weight, MgO (magnesium oxide): 0.05% by weight, TiO 2 (titanium dioxide): 10.07% by weight, ZrO 2 (zirconium dioxide): 6.74% by weight, HfO 2 (cerium oxide) 0.15 wt%, added to water and added with a dispersant, thoroughly stirred, dried, and then calcined at 1100 ° C to 1350 ° C to form a phase, and the particle size (D 50 ) of the common phase material was controlled to be 0.33 μm. And adding other oxide additives to the common phase material, the oxide additive components are as follows: BaCO 3 (cerium carbonate): 7.97 wt%, CaCO 3 (calcium carbonate): 19.65 wt%, MgO (magnesium oxide): 11.15 wt%, ZnO (zinc oxide): 5.83 wt%, SiO 2 (ceria): 26.58 wt%, and Al 2 O 3 (alumina): 0.18 wt%. The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalic acid ester or the phosphate ester) is sufficiently stirred to form a ceramic slurry, and a low dielectric constant ceramic layer is formed by coating, and the low dielectric constant ceramic layer has a thickness of 3 to 6 μm.
實施例2-2:低介電常數陶瓷材料之組成包括共同相材料與氧化物添加劑,k值為30,將低介電常數陶瓷材料總重量訂為100重量%,先將共同相材料:CaCO3(碳酸鈣):22.05重量%、SrCO3(碳酸鍶):20.4重量%、MgO(氧化鎂):0.07重量%、TiO2(二氧化鈦):1.36重量%、ZrO2(二氧化鋯):51.3重量%、HfO2(二氧化鉿):1.53重量%,加入於水中並添加分散劑,充分攪拌後乾燥,再於1100℃~1350℃下煆燒成相,共同相材料之粉體粒徑大小(D50)範圍控制在0.34μm。並於共同相材料中添加氧化物添加劑,氧化物添加劑成份如下:BaCO3(碳酸鋇):1.21重量%、MnCO3(碳酸錳):0.67重量%、SiO2(二氧化矽):1.41重量%。將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出低介電常數陶瓷層,低介電常數陶瓷層厚度為3~6μm。 Embodiment 2-2: The composition of the low dielectric constant ceramic material includes a common phase material and an oxide additive, the k value is 30, and the total weight of the low dielectric constant ceramic material is set to 100% by weight, and the common phase material: CaCO is first used. 3 (calcium carbonate): 22.05% by weight, SrCO 3 (cerium carbonate): 20.4% by weight, MgO (magnesium oxide): 0.07% by weight, TiO 2 (titanium dioxide): 1.36% by weight, ZrO 2 (zirconium dioxide): 51.3 % by weight, HfO 2 (cerium oxide): 1.53% by weight, added to water and added with a dispersing agent, fully stirred, dried, and then calcined at 1100 ° C ~ 1350 ° C to form a phase, the powder size of the common phase material The (D 50 ) range was controlled at 0.34 μm. And adding an oxide additive to the common phase material, the oxide additive component is as follows: BaCO 3 (cerium carbonate): 1.21% by weight, MnCO 3 (manganese carbonate): 0.67% by weight, SiO 2 (cerium oxide): 1.41% by weight . The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalic acid ester or the phosphate ester) is sufficiently stirred to form a ceramic slurry, and a low dielectric constant ceramic layer is formed by coating, and the low dielectric constant ceramic layer has a thickness of 3 to 6 μm.
實施例2-3:低介電常數陶瓷材料之組成包括共同相材料與氧化物添加劑,k值為31,將低介電常數陶瓷材料總重量訂為100重量%,先將共同相材料:CaCO3(碳酸鈣):21.42重量%、SrCO3(碳酸鍶):21.31重量%、MgO(氧化鎂):0.91重量%、TiO2(二氧化鈦):1.69重量%、ZrO2(二氧化鋯):50.15重量%、HfO2(二氧 化鉿):1.23重量%,加入於水中並添加分散劑,充分攪拌後乾燥,再於1100℃~1350℃下煆燒成相,共同相材料之粉體粒徑大小(D50)範圍控制在0.41μm。並於共同相材料中添加氧化物添加劑,氧化物添加劑成份如下:MnCO3(碳酸錳):0.9重量%、SiO2(二氧化矽):1.91重量%、Ta2O5(五氧化二鉭):0.11重量%、Y2O3(氧化釔):0.1重量%。將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出低介電常數陶瓷層,低介電常數陶瓷層厚度為3~6μm。 Embodiment 2-3: The composition of the low dielectric constant ceramic material includes a common phase material and an oxide additive, the k value is 31, and the total weight of the low dielectric constant ceramic material is set to 100% by weight, and the common phase material is first: CaCO 3 (calcium carbonate): 21.42% by weight, SrCO 3 (cerium carbonate): 21.31% by weight, MgO (magnesium oxide): 0.91% by weight, TiO 2 (titanium dioxide): 1.69 % by weight, ZrO 2 (zirconium dioxide): 50.15 % by weight, HfO 2 (cerium oxide): 1.23% by weight, added to water and added with a dispersing agent, fully stirred, dried, and then calcined at 1100 ° C ~ 1350 ° C to form a phase, the powder size of the common phase material The (D 50 ) range was controlled at 0.41 μm. And adding an oxide additive to the common phase material, the oxide additive component is as follows: MnCO 3 (manganese carbonate): 0.9% by weight, SiO 2 (cerium oxide): 1.91% by weight, Ta 2 O 5 (bisanthine pentoxide) : 0.11% by weight, Y 2 O 3 (cerium oxide): 0.1% by weight. The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalic acid ester or the phosphate ester) is sufficiently stirred to form a ceramic slurry, and a low dielectric constant ceramic layer is formed by coating, and the low dielectric constant ceramic layer has a thickness of 3 to 6 μm.
實施例2-4:低介電常數陶瓷材料之組成包括共同相材料與氧化物添加劑,k值為65,將低介電常數陶瓷材料總重量訂為100重量%,先將共同相材料:CaCO3(碳酸鈣):21.97重量%、SrCO3(碳酸鍶):20.32重量%、TiO2(二氧化鈦):11.16重量%、ZrO2(二氧化鋯):43.5重量%、HfO2(二氧化鉿):0.97重量%,加入於水中並添加分散劑,充分攪拌後乾燥,再於1100℃~1350℃下煆燒成相,共同相材料之粉體粒徑大小(D50)範圍控制在0.51μm。並於共同相材料中添加氧化物添加劑,氧化物添加劑成份如下:MnCO3(碳酸錳):1.14重量%、SiO2(二氧化矽):0.94重量%。將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出低介電常數陶瓷層,低介電常數陶瓷層厚度為3~6μm。 Embodiment 2-4: The composition of the low dielectric constant ceramic material comprises a common phase material and an oxide additive, the k value is 65, and the total weight of the low dielectric constant ceramic material is set to 100% by weight, and the common phase material is first: CaCO 3 (calcium carbonate): 21.97% by weight, SrCO 3 (cerium carbonate): 20.32% by weight, TiO 2 (titanium dioxide): 11.16% by weight, ZrO 2 (zirconium dioxide): 43.5% by weight, HfO 2 (cerium oxide) : 0.97 wt%, added to water and added with a dispersing agent, thoroughly stirred, dried, and then calcined at 1100 ° C to 1350 ° C to form a phase, the particle size (D 50 ) of the common phase material is controlled to be 0.51 μm. An oxide additive was added to the common phase material, and the oxide additive component was as follows: MnCO 3 (manganese carbonate): 1.14% by weight, SiO 2 (cerium oxide): 0.94% by weight. The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalic acid ester or the phosphate ester) is sufficiently stirred to form a ceramic slurry, and a low dielectric constant ceramic layer is formed by coating, and the low dielectric constant ceramic layer has a thickness of 3 to 6 μm.
實施例2-5:低介電常數陶瓷材料之組成包括共同相材料與氧化物添加劑,k值為70,將低介電常數陶瓷材料總重量訂為100重量%,先將共同相材 料:CaCO3(碳酸鈣):35.85重量%、MgO(氧化鎂):0.15重量%、TiO2(二氧化鈦):14.86重量%、ZrO2(二氧化鋯):45.98重量%、HfO2(二氧化鉿):1.15重量%,加入於水中並添加分散劑,充分攪拌後乾燥,再於1100℃~1350℃下煆燒成相,共同相材料之粉體粒徑大小(D50)範圍控制在0.54μm。並於共同相材料中添加氧化物添加劑,氧化物添加劑成份如下:MnCO3(碳酸錳):1.3重量%、SiO2(二氧化矽):0.59重量%、Y2O3(氧化釔):0.12重量%。將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出低介電常數陶瓷層,低介電常數陶瓷層厚度為3~6μm。 Embodiment 2-5: The composition of the low dielectric constant ceramic material comprises a common phase material and an oxide additive, the k value is 70, and the total weight of the low dielectric constant ceramic material is set to 100% by weight, and the common phase material is first: CaCO 3 (calcium carbonate): 35.85% by weight, MgO (magnesium oxide): 0.15% by weight, TiO 2 (titanium dioxide): 14.86% by weight, ZrO 2 (zirconium dioxide): 45.98% by weight, HfO 2 (cerium oxide): 1.15% by weight, added to water and added a dispersing agent, fully stirred, dried, and then calcined at 1100 ° C ~ 1350 ° C to form a phase, the particle size (D 50 ) of the common phase material is controlled to 0.54 μm. And adding an oxide additive to the common phase material, the oxide additive component is as follows: MnCO 3 (manganese carbonate): 1.3% by weight, SiO 2 (cerium oxide): 0.59% by weight, Y 2 O 3 (yttrium oxide): 0.12 weight%. The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalic acid ester or the phosphate ester) is sufficiently stirred to form a ceramic slurry, and a low dielectric constant ceramic layer is formed by coating, and the low dielectric constant ceramic layer has a thickness of 3 to 6 μm.
實施例2-6:低介電常數陶瓷材料之組成包括共同相材料與氧化物添加劑,k值為81,將低介電常數陶瓷材料總重量訂為100重量%,先將共同相材料:CaCO3(碳酸鈣):23.21重量%、SrCO3(碳酸鍶):20.98重量%、TiO2(二氧化鈦):14.15重量%、ZrO2(二氧化鋯):38.16重量%、HfO2(二氧化鉿):1.02重量%,加入於水中並添加分散劑,充分攪拌後乾燥,再於1100℃~1350℃下煆燒成相,共同相材料之粉體粒徑大小(D50)範圍控制在0.56μm。並於共同相材料中添加氧化物添加劑,氧化物添加劑成份如下:MnCO3(碳酸錳):1.29重量%、SiO2(二氧化矽):1.19重量%。將上述組成物於有機溶劑(甲苯與醇類混和溶劑)中搭配適量分散劑(陰離子型界面活性劑),經研磨分散後,加入黏結劑(聚乙烯醇缩丁醛類樹脂)與塑化劑(鄰苯二甲酸酯類或磷酸酯類)充分攪拌形成陶瓷漿料,經塗佈成型製作出低介電常數陶瓷層,低介電常數陶瓷層厚度為3~6μm。 Embodiment 2-6: The composition of the low dielectric constant ceramic material comprises a common phase material and an oxide additive, the k value is 81, and the total weight of the low dielectric constant ceramic material is set to 100% by weight, and the common phase material is first: CaCO 3 (calcium carbonate): 23.21% by weight, SrCO 3 (cerium carbonate): 20.98% by weight, TiO 2 (titanium dioxide): 14.15% by weight, ZrO 2 (zirconium dioxide): 38.16% by weight, HfO 2 (cerium oxide) : 1.02% by weight, added to water and added with dispersant, fully stirred, dried, and then calcined at 1100 ° C ~ 1350 ° C, the particle size (D 50 ) of the common phase material is controlled at 0.56 μ m . An oxide additive was added to the common phase material, and the oxide additive component was as follows: MnCO 3 (manganese carbonate): 1.29 wt%, SiO 2 (cerium oxide): 1.19 wt%. The above composition is mixed with an appropriate amount of a dispersing agent (anionic surfactant) in an organic solvent (toluene and an alcohol mixed solvent), and after being dispersed by grinding, a binder (polyvinyl butyral resin) and a plasticizer are added. (The phthalates or phosphates) are sufficiently stirred to form a ceramic slurry, and a low dielectric constant ceramic layer is formed by coating, and the low dielectric constant ceramic layer has a thickness of 3 to 6 μm .
此外,上所述者僅為本發明之較佳實施態樣,非用以限定本發明實施之範圍,大凡依本發明申請專利範圍及發明說明書內容所揭示之技術思想而為之簡單的等效變化與修飾,皆應仍屬本發明專利涵蓋之範圍內,如BaO的起始物可為BaCO3,BaC2O4、Ba(C2H5OO)2等;Mn2CO3的起始物可為MnO2等。 In addition, the above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, and is simply equivalent according to the technical idea disclosed in the scope of the present invention and the contents of the description of the invention. Variations and modifications should still fall within the scope of the present invention. For example, the starting materials of BaO may be BaCO 3 , BaC 2 O 4 , Ba(C 2 H 5 OO) 2 , etc.; the initiation of Mn 2 CO 3 The substance may be MnO 2 or the like.
接著,將上述製作方式所得到高介電常數陶瓷層、高介電常數電極層、低介電常數陶瓷層與低介電常數電極層,利用不同交錯積層組合來製作積層電子陶瓷元件其中包括:至少一覆蓋層、至少一反應層及至少一鎳金屬電極層。其中,覆蓋層為高介電常數陶瓷層或低介電常數陶瓷層,反應層交錯積層於覆蓋層之間或覆蓋層一側,反應層為高介電常數陶瓷結構層或低介電常數陶瓷結構層,鎳金屬電極層位於反應層交錯積層位置。 Next, the high dielectric constant ceramic layer, the high dielectric constant electrode layer, the low dielectric constant ceramic layer and the low dielectric constant electrode layer obtained by the above-described production method are combined by using different interlaced layers to form a laminated electronic ceramic component, including: At least one cover layer, at least one reaction layer, and at least one nickel metal electrode layer. Wherein, the cover layer is a high dielectric constant ceramic layer or a low dielectric constant ceramic layer, and the reaction layers are alternately laminated between the cover layers or the cover layer side, and the reaction layer is a high dielectric constant ceramic structure layer or a low dielectric constant ceramic. The structural layer, the nickel metal electrode layer is located at the staggered stacking position of the reaction layer.
請參閱圖2~5C,上述之積層電子陶瓷元件主要包括第一覆蓋層100、第二覆蓋層200、交錯積層於第一覆蓋層100與第二覆蓋層200間之反應層300及位於反應層300交錯積層位置之鎳金屬電極層400,第一覆蓋層100為高介電常數陶瓷層501或低介電常數陶瓷層601,第二覆蓋層為高介電常數陶瓷層501或低介電常數陶瓷層601,反應層300為高介電常數陶瓷結構層500、低介電常數陶瓷結構層600或包含高介電常數陶瓷結構層500及低介電常數陶瓷結構層600。 Referring to FIGS. 2 to 5C, the laminated electronic ceramic component mainly includes a first cover layer 100, a second cover layer 200, a reaction layer 300 interleaved between the first cover layer 100 and the second cover layer 200, and a reaction layer. 300 staggered laminated nickel metal electrode layer 400, the first covering layer 100 is a high dielectric constant ceramic layer 501 or a low dielectric constant ceramic layer 601, and the second covering layer is a high dielectric constant ceramic layer 501 or a low dielectric constant The ceramic layer 601, the reaction layer 300 is a high dielectric constant ceramic structure layer 500, a low dielectric constant ceramic structure layer 600 or a high dielectric constant ceramic structure layer 500 and a low dielectric constant ceramic structure layer 600.
請配合參閱表一,為積層電子陶瓷元件之第一覆蓋層、第二覆蓋層及反應層之交錯積層結構類型表,其中,高介電常數陶瓷結構層500包括高介電常數陶瓷層501及高介電常數電極層502,低介電常數陶瓷結構層600包括低介電常數陶瓷層601及低介電常數電極層602,高介電常數電極層502為表面印刷有鎳金屬電極層400之高介電常數陶瓷層501,低介電常數電極層602為表面印刷有鎳金屬電極層400之低介電常數陶瓷層601,且鎳金屬電極層601為連續、不連續或浮動印刷。 Please refer to Table 1, which is a cross-stacked structure type list of a first cladding layer, a second cladding layer and a reaction layer of the laminated electronic ceramic component, wherein the high dielectric constant ceramic structural layer 500 comprises a high dielectric constant ceramic layer 501 and The high dielectric constant electrode layer 502, the low dielectric constant ceramic structure layer 600 includes a low dielectric constant ceramic layer 601 and a low dielectric constant electrode layer 602, and the high dielectric constant electrode layer 502 is printed with a nickel metal electrode layer 400 on the surface. The high dielectric constant ceramic layer 501, the low dielectric constant electrode layer 602 is a low dielectric constant ceramic layer 601 on which a nickel metal electrode layer 400 is printed, and the nickel metal electrode layer 601 is continuous, discontinuous or floating.
其中,疊層型式X型之結構係第一覆蓋層100及第二覆蓋層200為高介電常數陶瓷層501,反應層300為交錯積層之高介電常數陶瓷結構層500。 The laminated type X structure is a first cap layer 100 and a second cap layer 200 is a high dielectric constant ceramic layer 501, and the reactive layer 300 is a staggered laminated high dielectric constant ceramic structure layer 500.
其中,疊層型式A型之結構係第一覆蓋層100為高介電常數陶瓷層501,第二覆蓋層200為低介電常數陶瓷層601,反應層300為交錯積層之高介電常數陶瓷結構層500。 Wherein, the laminated type A structure is that the first cover layer 100 is a high dielectric constant ceramic layer 501, the second cover layer 200 is a low dielectric constant ceramic layer 601, and the reaction layer 300 is a high dielectric constant ceramic of a staggered laminate. Structure layer 500.
其中,疊層型式B型之結構係第一覆蓋層100及第二覆蓋層200為低介電常數陶瓷層600,反應層300為交錯積層之高介電常數陶瓷結構層500。 The laminated type B structure first first layer 100 and the second cover layer 200 are low dielectric constant ceramic layers 600, and the reaction layer 300 is a high dielectric constant ceramic structure layer 500 which is staggered.
其中,疊層型式C型及D型之結構係第一覆蓋層100及第二覆蓋層200為低介電常數陶瓷層600,反應層300為高介電常數陶瓷結構層500與低介電常數陶瓷結構層600交錯積層。 Wherein, the stacked type C and D structures are the first cover layer 100 and the second cover layer 200 are low dielectric constant ceramic layers 600, and the reaction layer 300 is a high dielectric constant ceramic structure layer 500 and a low dielectric constant. The ceramic structural layers 600 are alternately laminated.
上述第一覆蓋層100、第二覆蓋層200及反應層300之交錯積層後,透過端電極膏沾附(Dipping)、燒附(Curing)、電鍍(Plating)等製程完成元件端電極,並量測元件特性差異,透過不同介電材料成份與元件交錯積層結構,經 燒結所得到的電性所示。相較於單一材料的積層電容元件(見表二-疊層形式為X者),整合不同兩種材料之積層電容元件,在電氣特性上,除可維持相同的電容值水準外,在散逸係數、絕緣電阻、破壞電壓與壓電特性(電致伸縮性)上,透過不同的疊層設計,皆有明顯的提升。並將經由共燒結製作之元件透過超音波顯微鏡(Scanning Acoustic Microscopy)分析(如表二所示),以每組條件3000顆元件取樣數進行元件結構缺陷觀察,結果發現皆無內部缺陷存在,故透過本發明將兩種或兩種以上材料系統於還原氣氛下共燒,並可完全實現於電子陶瓷元件製作。 After the first cover layer 100, the second cover layer 200 and the reaction layer 300 are interlaced, the terminal electrode is completed by a process such as Dipping, Curing, Plating, etc. Measuring the difference in component characteristics, staggering the laminated structure through different dielectric material components and components, The electrical properties obtained by sintering are shown. Compared with a laminated capacitor element of a single material (see Table 2 - Stacked form of X), a laminated capacitor element of two different materials is integrated, in terms of electrical characteristics, in addition to maintaining the same capacitance value level, the dissipation factor Insulation resistance, breakdown voltage and piezoelectric characteristics (electrostrictive) are significantly improved through different laminate designs. The components fabricated by co-sintering were analyzed by ultrasonic scanning (Scanning Acoustic Microscopy) (as shown in Table 2), and the structural defects of the components were observed with a sample number of 3000 components per set of conditions, and it was found that no internal defects existed. The invention co-fires two or more material systems under a reducing atmosphere, and can be completely realized in the production of electronic ceramic components.
綜上所述,本案不僅於技術思想上確屬創新,並具備習用之傳統結構所不及之功效,已充分符合新穎性及進步性之法定新型專利要件,爰依法提出申請,懇請 貴局核准本件新型專利申請案,以勵創作,至感德便。 To sum up, this case is not only innovative in terms of technical thinking, but also has the effect of the traditional structure that is not in use. It has fully complied with the statutory new patent requirements of novelty and progressiveness, and applied for it according to law. I urge you to approve this article. The new type of patent application, to encourage creation, to the sense of virtue.
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