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TWI429956B - Anti-glare film and image display device - Google Patents

Anti-glare film and image display device Download PDF

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Publication number
TWI429956B
TWI429956B TW096122004A TW96122004A TWI429956B TW I429956 B TWI429956 B TW I429956B TW 096122004 A TW096122004 A TW 096122004A TW 96122004 A TW96122004 A TW 96122004A TW I429956 B TWI429956 B TW I429956B
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glare film
reflectance
film
glare
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TW096122004A
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TW200809265A (en
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Tsutomu Furuya
Masato Kuwabara
Mari Okamura
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Sumitomo Chemical Co
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502Antiglare, refractive index matching layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504Diffusing, scattering, diffracting elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Laminated Bodies (AREA)

Description

防眩膜及影像顯示裝置Anti-glare film and image display device

本發明係有關顯示良好的防眩性能且為低模糊度(haze)之防眩(遮光)膜,以及具備該防眩膜之影像顯示裝置。The present invention relates to an anti-glare (light-shielding) film which exhibits good anti-glare performance and is low in haze, and an image display apparatus including the anti-glare film.

液晶顯示器或電漿顯示器面板、映像管(陰極射線管:CRT Cathode Ray Tube)顯示器、有機電激發光(EL electroluminescence)顯示器等之影像顯示裝置,當外光映入到該顯示面時,辨識性會明顯地受到損害。為了防止如此之外光的映入(reflection),在重視畫質的電視與個人電腦、在外光強烈之屋外使用之視訊攝影機(vedio camera)與數位照相機、以及利用反射光進行顯示之行動電話等中,以往係在影像顯示裝置的表面設置有防止外光的映入之薄膜層。此薄膜層大致分為由施加有利用光學多層膜產生的干擾之無反射處理的薄膜構成者,以及施加有透過在表面形成細微的凹凸而使入射光散射且映入影像模糊之防眩處理的薄膜所構成者。其中,前者之無反射薄膜由於必須形成均等的光學膜厚之多層膜,故成本增高。相對地後者之防眩膜,由於可以較廉價地製造,而廣泛地被運用在大型的個人電腦與監視器等之用途。An image display device such as a liquid crystal display or a plasma display panel, a CRT Cathode Ray Tube display, or an EL electroluminescence display, when the external light is reflected on the display surface, the visibility is Will be significantly damaged. In order to prevent the reflection of such light, a video camera and a personal computer that emphasize image quality, a vedio camera and a digital camera that are used outside the house where the external light is strong, and a mobile phone that displays by using reflected light, etc. Conventionally, a thin film layer that prevents reflection of external light is provided on the surface of the image display device. The film layer is roughly divided into a film which is formed by a non-reflective film to which interference generated by the optical multilayer film is applied, and an anti-glare treatment which transmits fine light and irregularities on the surface to scatter the incident light and blur the image. The film is composed of. Among them, the former non-reflective film has a higher cost because it is necessary to form a multilayer film having an equal optical film thickness. In contrast, the latter anti-glare film is widely used in large-sized personal computers and monitors because it can be manufactured at relatively low cost.

此種防眩膜以往係利用例如下述方法所製造,亦即,將分散有填充物的樹脂溶液塗布在基板上,且經調整塗布膜厚使填充物露出到塗布膜表面而在基板上形成不規則的凹凸。但是,此種透過分散填充物所製造的防眩膜,由於會因為樹脂溶液中的填充物之分散狀態或塗布狀態等而使凹凸的配置與形狀受到影響,故難以得到如預期的凹凸,而有在模糊度低者得不到足夠的防眩性能之問題。再者,此種習知的防眩膜配置於影像顯示裝置的表面時,由於散射光而使整個顯示面變成偏白色,且其顯示變成混濁的顏色,而有容易產生所謂白化(whitening)之問題。此外,隨著最近影像顯示裝置的高精細化,使影像顯示裝置的畫素與防眩膜的表面凹凸形狀干擾,結果產生亮度分布而變得看不清楚,而有容易產生所謂閃耀現象之問題。Such an anti-glare film is conventionally produced by, for example, applying a resin solution in which a filler is dispersed on a substrate, and adjusting the thickness of the coating film to expose the filler to the surface of the coating film to form on the substrate. Irregular bumps. However, such an anti-glare film produced by dispersing the filler causes influences on the arrangement and shape of the concavities and convexities due to the dispersion state or the coating state of the filler in the resin solution, and thus it is difficult to obtain the irregularities as expected. There is a problem that the anti-glare performance is not obtained when the degree of blur is low. Further, when such a conventional anti-glare film is disposed on the surface of the image display device, the entire display surface becomes whiteish due to the scattered light, and the display becomes a turbid color, which is liable to cause so-called whitening. problem. In addition, with the recent high definition of the image display device, the pixels of the image display device interfere with the surface uneven shape of the anti-glare film, and as a result, the brightness distribution becomes unclear, and there is a problem that a so-called sparkle phenomenon easily occurs. .

另一方面,亦有不含有填充物,而僅以形成在透明樹脂層表面之細微的凹凸來呈現防眩性的嘗試。例如日本特開2002-189106號公報揭示有一種防眩膜,係藉由於壓紋鑄模與透明樹脂薄膜之間以夾裝電離放射線硬化性樹脂之狀態使該電離放射線硬化性樹脂硬化,而形成三次元10點平均粗糙度以及三次元粗糙度基準面上之相鄰凸部彼此的平均距離分別滿足預定值之細微的凹凸,且將形成有該凹凸之電離放射線硬化性樹脂層設置在前述透明樹脂薄膜上。On the other hand, there is an attempt to exhibit anti-glare property only by forming fine irregularities on the surface of the transparent resin layer without containing a filler. For example, Japanese Laid-Open Patent Publication No. 2002-189106 discloses an anti-glare film which is formed by curing the ionizing radiation curable resin in a state in which an ionizing radiation curable resin is interposed between an embossing mold and a transparent resin film. The 10-point average roughness and the average distance between the adjacent convex portions on the three-dimensional roughness reference surface each satisfy a predetermined unevenness, and the ionizing radiation-curable resin layer on which the unevenness is formed is provided on the transparent resin. On the film.

此外,例如在日本特開平6-34961號公報、特開2004-45471號公報、特開2004-45472號公報等亦揭示有一種薄膜,其非配置在顯示裝置的顯示面之防眩膜,而是使用表面形成有細微的凹凸之薄膜作為配置在液晶顯示裝置的背面側之光擴散層。Further, a film which is not disposed on the display surface of the display device and which is not disposed on the display surface of the display device is disclosed in JP-A-H06-34961, JP-A-2004-45471, JP-A-2004-45472, and the like. A film in which fine irregularities are formed on the surface is used as a light diffusion layer disposed on the back side of the liquid crystal display device.

以薄膜的表面形成凹凸的方法而言,於上述特開2004-45471號公報與特開2004-45472號公報揭示有一種方法,係將電離放射線硬化性樹脂液填充到具有凹凸倒置形狀之壓紋滾筒,並使與凹版滾筒的旋轉方向同步而行進之透明基材接觸所填充的樹脂,而在透明基材接觸滾筒凹版時,使滾筒凹版與透明基材之間的樹脂硬化,且在硬化之同時令硬化樹脂與透明基材密合後,使硬化後的樹脂與透明基材之積層體從滾筒凹版剝離。In the method of forming an unevenness on the surface of the film, a method of filling an ionizing radiation curable resin liquid into an embossed shape having an uneven shape is disclosed in the above-mentioned Japanese Patent Publication No. 2004-45471 and JP-A-2004-45472. Rolling the film, and the transparent substrate traveling in synchronization with the rotation direction of the gravure cylinder contacts the filled resin, and when the transparent substrate contacts the gravure, the resin between the gravure and the transparent substrate is hardened and hardened. At the same time, the cured resin and the transparent substrate are brought into close contact with each other, and the laminated body of the cured resin and the transparent substrate is peeled off from the roll gravure.

利用此種手法時,由於可使用之電離放射線硬化性樹脂液的組成受到限制,又由於無法期待以溶媒稀釋後塗布時的平整性,故可預料到膜厚的均勻性有待改善之課題。再者,由於必須直接填充樹脂液到壓紋滾筒凹版,故為了確保凹凸面的均等性,壓紋滾筒凹板必需具備高的機械精確度,而有壓紋滾筒難以製作之課題。When such a method is used, the composition of the ionizing radiation-curable resin liquid that can be used is limited, and since the flatness at the time of application after dilution with a solvent cannot be expected, it is expected that the uniformity of the film thickness needs to be improved. Further, since it is necessary to directly fill the resin liquid to the embossing cylinder intaglio, in order to ensure the uniformity of the uneven surface, the embossing cylinder concave plate must have high mechanical precision, and the embossing cylinder is difficult to manufacture.

其次,以使用於在表面具有凹凸的薄膜之製作的滾筒之製作方法而言,於例如前述日本特開平6-34961號公報揭示有一種方法,係使用金屬等製作圓筒體,且於其表面利用電子彫刻、蝕刻、噴砂處理等之手法形成凹凸。此外,在日本特開2004-29240號公報,揭示有利用珠擊(Beads shot)法製作壓紋滾筒的方法,而在日本特開2004-90187號公報,揭示有一種經由下列步驟來製作壓紋滾筒之方法,該等方法包含:於壓紋滾筒的表面形成金屬電鍍層的步驟;對金屬電鍍層的表面進行鏡面研磨之步驟;於經鏡面研磨之金屬電鍍層面,使用陶瓷珠施以噴擊(blast)處理之步驟;以及視需要進行錘擊(peening)之步驟。In the method of producing a roll for use in the production of a film having irregularities on the surface, a method of producing a cylindrical body using a metal or the like is disclosed in the above-mentioned Japanese Patent Publication No. Hei 6-34961. Concavities and convexities are formed by techniques such as electronic engraving, etching, sand blasting, and the like. In addition, Japanese Laid-Open Patent Publication No. 2004-29240 discloses a method of producing an embossing cylinder by a bead shot method, and Japanese Laid-Open Patent Publication No. 2004-90187 discloses an embossing method by the following steps. a method of rolling, the method comprising: forming a metal plating layer on a surface of the embossing cylinder; performing a mirror polishing step on the surface of the metal plating layer; and spraying the ceramic plating layer on the mirror-polished metal plating layer (blast) the steps of processing; and the step of peening as needed.

於如此在壓紋滾筒的表面施行噴擊處理的狀態中,會因噴擊粒子的粒徑分布而產生凹凸徑分布,同時透過噴擊得到之凹陷的深度難以控制,而有要以優良的再現性獲得防眩機能優異的凹凸形狀之課題。In the state in which the surface of the embossing cylinder is subjected to the blasting treatment in this manner, the distribution of the uneven diameter is generated due to the particle size distribution of the blasting particles, and the depth of the dent obtained by the blasting is difficult to control, and excellent reproduction is required. The problem of obtaining an uneven shape of an anti-glare function is obtained.

此外,於前述日本特開2002-189106號公報,記載有最好使用鐵的表面經鍍鉻(chrome plated)之滾筒,且利用噴砂處理法與珠擊法形成凹凸型面。In the above-mentioned Japanese Patent Publication No. 2002-189106, it is described that a chrome plated roller having a surface of iron is preferably used, and a concave-convex surface is formed by a sandblasting method and a bead blasting method.

再者,亦記載在如此形成凹凸之型面,以提高使用時的耐久性為目的,而在施加鍍鉻等之後才使用為佳,藉此可謀求硬膜化以及防止腐蝕。另一方面,在前述專利文獻3與專利文獻4的各個實施例記載有在鐵心表面鍍鉻,且進行# 250之液體噴砂處理後,再度進行鍍鉻處理,而於表面形成細微的凹凸形狀。In addition, it is also described that the profile on which the irregularities are formed is used for the purpose of improving the durability during use, and it is preferably used after chrome plating or the like is applied, whereby the film formation and corrosion prevention can be achieved. On the other hand, in each of the examples of Patent Document 3 and Patent Document 4, it is described that the surface of the core is chrome-plated, and the liquid blasting treatment of #250 is performed, and then the chrome plating treatment is performed again to form a fine uneven shape on the surface.

如此之壓紋滾筒的製作方法,由於係在硬度高的鍍鉻上進行噴擊與珠擊,故不易形成凹凸,而且難以精確地控制所形成之凹凸的形狀。此外,亦如日本特開2004-29672號公報所記載,鍍鉻係取決於基底之材質及其形狀,且表面多為粗糙,又由於在藉著噴擊形成之凹凸上會形成因鍍鉻而產生細小的裂痕,故到底要形成怎樣的凹凸,有難以設計之課題。再者,由於有因鍍鉻產生之細小裂痕,故亦有最後得到的防眩膜之散射特性往不適宜的方向變化之課題。再者,亦有下列的課題,亦即,由於藉由壓紋滾筒母材表面之金屬種類與電鍍種類的組合,而使完成的滾筒表面變化繁多,故為了精確度良好地得到所需的表面凹凸形狀,必須選擇適當的滾筒表面之金屬種類與適當的電鍍種類。並且,即使得到所期望的表面凹凸形狀,也可能依電鍍種類導致使用時的耐久性變為不充分。In such a method of producing an embossing cylinder, since the embossing and the bead blasting are performed on the chrome plating having high hardness, it is difficult to form irregularities, and it is difficult to precisely control the shape of the formed irregularities. Further, as described in Japanese Laid-Open Patent Publication No. 2004-29672, chrome plating depends on the material of the substrate and its shape, and the surface is mostly rough, and fineness due to chrome plating is formed on the unevenness formed by the spray. The cracks, so what kind of bumps should be formed in the end, there is a problem that is difficult to design. Further, since there are fine cracks due to chrome plating, there is also a problem that the scattering characteristics of the finally obtained anti-glare film change in an unsuitable direction. Furthermore, there is also a problem in that the surface of the finished drum is varied by the combination of the metal type of the surface of the embossing cylinder base material and the type of plating, so that the desired surface is obtained accurately. For the uneven shape, it is necessary to select the appropriate metal type of the drum surface and the appropriate plating type. Further, even if a desired surface unevenness shape is obtained, the durability at the time of use may be insufficient depending on the type of plating.

在日本特開2000-284106號公報中,記載有於基材施加噴砂處理加工後,施加蝕刻步驟及/或薄膜的積層步驟。此外,於日本特開2006-53371號公報中,記載有一種防眩膜,係藉由使微粒子碰撞經研磨過的金屬表面而形成凹凸,且在該處施加無電解鍍鎳而作為模具,並藉由將該模具的凹凸面轉印至透明樹脂薄膜,而作成低模糊度且防眩性能優良的防眩膜。JP-A-2000-284106 discloses a step of laminating an etching step and/or a film after applying a blasting treatment to a substrate. Further, Japanese Laid-Open Patent Publication No. 2006-53371 discloses an anti-glare film in which irregularities are formed by causing fine particles to collide with a surface of a polished metal, and electroless nickel plating is applied thereto as a mold. By transferring the uneven surface of the mold to the transparent resin film, an anti-glare film having low blur and excellent anti-glare properties is produced.

本發明的課題在於提供一種防眩膜及使用該防眩膜之影像顯示裝置,不但顯示優良的防眩性能,並為低模糊度,且可防止白化引起的辨識性降低,同時配置在高精細的影像顯示裝置之表面時不產生閃耀。An object of the present invention is to provide an anti-glare film and an image display device using the anti-glare film, which not only exhibit excellent anti-glare performance, but also have low ambiguity, and can prevent deterioration in visibility due to whitening, and are arranged in high definition. The image display does not produce a glare when the surface of the device is displayed.

在本申請案申請人之2005年12月6日申請的日本特願2005-351617號中,提出一種可得到顯示優良防眩性能的方法,其係使平均顆粒直徑在15至35 μm之範圍的微粒子碰撞經研磨過的金屬表面而形成凹凸,且在該凹凸面施加無電解鍍鎳而作為模具,並將該模具的凹凸面轉印到透明樹脂薄膜。相同地,在2006年3月8日申請之日本特願2006-62440號中,提出一種方法,可得到對製造低模糊度且防眩性能優良的防眩膜甚有效的模具,該方法係在基材表面施以鍍銅或鍍鎳,並研磨該電鍍面,且將微粒子碰撞該研磨面而形成凹凸,且對該凹凸形狀施以鈍化之加工後,在該凹凸面施以鍍鉻。以此等方法,尤其以後者的方法為基礎,並且一再研究結果,而發現例如,若適當選擇碰撞微粒子時的條件等,則可得到正反射率比較小,且反射分佈曲線(reflection profile)較寬的防眩膜,而此防眩膜,係具有更優良的防眩性能,尤其即使變化視角,其顯示影像的變化亦很小。此外,亦發現可適當地評估該防眩性能之指標。In Japanese Patent Application No. 2005-351617, filed on Dec. 6, 2005, the entire disclosure of which is hereby incorporated by reference to the entire disclosure of The fine particles collide with the surface of the polished metal to form irregularities, and electroless nickel plating is applied to the uneven surface as a mold, and the uneven surface of the mold is transferred to the transparent resin film. In the same manner, Japanese Patent Application No. 2006-62440, filed on March 8, 2006, proposes a method for obtaining a mold which is effective for producing an anti-glare film having low ambiguity and excellent anti-glare property, and the method is The surface of the substrate is plated with copper or nickel, and the plated surface is polished, and the fine particles are caused to collide with the polished surface to form irregularities, and the uneven shape is subjected to passivation, and then the uneven surface is chrome-plated. Based on such methods, especially the latter methods, and repeatedly researching the results, it has been found that, for example, if the conditions for colliding the microparticles are appropriately selected, the positive reflectance is relatively small, and the reflection profile is relatively small. The wide anti-glare film, which has better anti-glare properties, especially the display image changes even if the viewing angle is changed. In addition, it has also been found that the index of the anti-glare property can be appropriately evaluated.

本發明係根據此種見解,並且加以種種的檢討而完成者。The present invention has been completed based on such findings and various reviews.

亦即,本發明之防眩膜,係在表面形成凹凸而構成,對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且,滿足以下(1)至(7)之任一必要條件。In other words, the anti-glare film of the present invention is formed by forming irregularities on the surface, and the reflectance R (30) having a reflection angle of 30° with respect to light incident at an incident angle of 30° is 0.04% or more and 0.2% or less, and the reflection angle is 40. The reflectance R (40) of ° is 0.005% or more and 0.02% or less, and the reflectance R (50) of the reflection angle of 50° is 0.0015% or less, and any of the following requirements (1) to (7) is satisfied.

(1)將相對於以入射角30°入射的光之反射角35°的方向之反射率設為R(35),而R(35)/R(30)的值為0.4以上0.8以下;(2)薄膜凹凸表面之任意的剖面曲線之算術平均高度Pa為0.09 μm以上0.21 μm以下;(3)薄膜凹凸表面之任意的剖面曲線之最大剖面高度pt為0.5 μm以上1.2 μm以下;(4)薄膜凹凸表面之任意的剖面曲線之平均長度PSm為12 μm以上20 μm以下;(5)以柱形圖表示薄膜的凹凸表面之各點的標高時,柱形圖的峰值係位於以最高點(高度100%)與最低點(高度0%)的中間點(高度50%)為中心之±10%以內的範圍;(6)在200 μm×200 μm之區域內具有150個以上350個以下的凸部;(7)以薄膜表面凹凸之凸部的頂點為母點,而對表面進行凡羅諾依(Voronoi)分割時,所形成之多角形的平均面積為100 μm2 上300 μm2 以下。(1) The reflectance in a direction of 35° with respect to a reflection angle of light incident at an incident angle of 30° is R (35), and the value of R(35)/R(30) is 0.4 or more and 0.8 or less; 2) The arithmetic mean height Pa of any profile curve of the uneven surface of the film is 0.09 μm or more and 0.21 μm or less; (3) The maximum profile height pt of any profile curve of the uneven surface of the film is 0.5 μm or more and 1.2 μm or less; (4) The average length PSm of any profile curve of the uneven surface of the film is 12 μm or more and 20 μm or less; (5) When the elevation of each point of the uneven surface of the film is represented by a histogram, the peak of the histogram is at the highest point ( The intermediate point (height 50%) of the height (100%) and the lowest point (height 0%) is within ±10% of the center; (6) has 150 or more and 350 or less in the area of 200 μm×200 μm protrusions; (7) at the apex of the convex portion of the uneven surface of the film as a base point, and the surface is Where the RONO by (the Voronoi) divided by the average area of a polygon formed of 100 μm 2 to 300 μm 2 or less on .

其中,滿足二個或二個以上為更有效,並且,滿足上述所有的必要條件亦有效。其中又以(1)R(35)/R(30)的值為0.4以上0.8以下之必要條件係重要。Among them, it is more effective to satisfy two or more, and it is also effective to satisfy all of the above-mentioned necessary conditions. Among them, the requirement that the value of (1) R (35) / R (30) is 0.4 or more and 0.8 or less is important.

該防眩膜係可使對於垂直入射光的模糊度設定為3%以上20%以下。此外,該防眩膜係使用暗部與亮部之寬度為0.5mm、1.0mm及2.0mm等3種光梳將以光的入射角45°測量之反射鮮明度的和設定為30%以下。This anti-glare film can set the degree of blurring of the normal incident light to 3% or more and 20% or less. Further, in the anti-glare film, the sum of the reflection sharpness measured at an incident angle of light of 45° is set to 30% or less using three kinds of optical combs having a width of a dark portion and a bright portion of 0.5 mm, 1.0 mm, and 2.0 mm.

該防眩膜可藉由下列方法而有利地製造,該方法係在金屬的表面施以鍍銅或鍍鎳,並研磨其電鍍表面後,使微粒子碰撞該研磨面而形成凹凸,且將該凹凸形狀施以鈍化加工後,在該凹凸面施以鍍鉻而作為模具,並將該模具的凹凸面轉印在透明樹脂薄膜,接著從模具剝下該轉印有凹凸之透明樹脂薄膜。The anti-glare film can be advantageously produced by applying copper plating or nickel plating to the surface of the metal, and grinding the surface of the plating surface, causing the fine particles to collide with the polishing surface to form irregularities, and the unevenness is formed. After the shape is subjected to passivation processing, chrome plating is applied to the uneven surface as a mold, and the uneven surface of the mold is transferred to a transparent resin film, and then the transparent resin film to which the unevenness is transferred is peeled off from the mold.

在進行該模具之製作時,碰撞到經研磨過的鍍銅或鍍鎳表面之微粒子,係以平均顆粒直徑為10至50 μm者,尤其以球形者為佳,且以微粒子碰撞時的壓力係以計示壓力(gauge pressure)為0.1至0.4MPa程度為佳。此外,在對藉由以微粒子碰撞形成的凹凸形狀施以鈍化加工,係採用蝕刻處理或鍍銅較為有利。採用蝕刻處理時,蝕刻量為1μm以上20μm以下,更宜為2μm以上10μm以下。另一方面,採用鍍銅時,其厚度為1μm以上20μm以下,更宜為4μm以上10μm以下。When the mold is produced, the particles colliding with the polished copper-plated or nickel-plated surface are those having an average particle diameter of 10 to 50 μm, especially those having a spherical shape, and the pressure system when the particles collide. It is preferred that the gauge pressure is from 0.1 to 0.4 MPa. Further, it is advantageous to apply etching treatment or copper plating to passivate the uneven shape formed by collision of fine particles. When the etching treatment is employed, the etching amount is 1 μm or more and 20 μm or less, and more preferably 2 μm or more and 10 μm or less. On the other hand, when copper plating is used, the thickness thereof is 1 μm or more and 20 μm or less, and more preferably 4 μm or more and 10 μm or less.

在該方法中,於鍍鉻後不研磨表面,而直接將鍍鉻面使用為模具的凹凸面者較為有利。理想的鍍鉻之厚度係為1μm以上10μm以下,更宜為2μm以上8μm以下。轉印模具的凹凸面之透明樹脂薄膜,係由在透明基材薄膜的表面形成有光硬化性樹脂層者所構成,而透過一邊將該光硬化性樹脂層按壓在模具的凹凸面且一邊使之硬化,便可將模具的凹凸面轉印在光硬化性樹脂層。In this method, it is advantageous to use the chrome-plated surface as the uneven surface of the mold without grinding the surface after chrome plating. The thickness of the ideal chrome plating is 1 μm or more and 10 μm or less, and more preferably 2 μm or more and 8 μm or less. The transparent resin film of the uneven surface of the transfer mold is formed by forming a photocurable resin layer on the surface of the transparent base film, and the photocurable resin layer is pressed against the uneven surface of the mold while being passed through. After the hardening, the uneven surface of the mold can be transferred to the photocurable resin layer.

本發明之防眩膜,係可與液晶顯示元件、電漿顯示器面板等之影像顯示手段進行組合,而作為影像顯示裝置。因此本發明之影像顯示裝置,係具備前述防眩膜與影像顯示手段,其中該防眩膜配置在影像顯示手段的辨識側(在本案說明書及申請專利範圍中,亦稱目視確認側)。The anti-glare film of the present invention can be combined with an image display means such as a liquid crystal display element or a plasma display panel to form an image display device. Therefore, the image display device of the present invention includes the anti-glare film and the image display means, wherein the anti-glare film is disposed on the identification side of the image display means (also referred to as the visual confirmation side in the present specification and the patent application).

以下,就本發明之適當的實施形態詳細說明。本發明的防眩膜,係由在表面形成細微的凹凸所構成,且相對於以入射角30°入射之光,反射角30°的反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且至少滿足以下(1)至(7)中至少一個必要條件。Hereinafter, a preferred embodiment of the present invention will be described in detail. The anti-glare film of the present invention is formed by forming fine irregularities on the surface, and has a reflectance R (30) of a reflection angle of 30° with respect to light incident at an incident angle of 30° of 0.04% or more and 0.2% or less. The reflectance R (40) at an angle of 40° is 0.005% or more and 0.02% or less, and the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and at least one of the following (1) to (7) is satisfied. .

(1)相對於以入射角30°入射的光,反射角35°的方向之反射率設為R(35),R(35)/R(30)的值為0.4以上0.8以下,(2)薄膜凹凸表面之任意剖面曲線之算術平均高度Pa為0.09 μm以上0.21 μm以下,(3)薄膜凹凸表面之任意剖面曲線之最大剖面高度Pt為0.5 μm以上1.2 μm以下,(4)薄膜凹凸表面之任意剖面曲線之平均長度PSm為1.2 μm以上20 μm以下,(5)以柱形圖表示薄膜的凹凸表面之各點的標高時,柱形圖的峰值,位於以最高點(高度100%)與最低點(高度0%)的中間點(高度50%)為中心之±10%以內的範圍,(6)在200 μm×200 μm之區域內具有150個以上350個以下的凸部,(7)以薄膜表面凹凸之凸部的頂點為母點而對該表面進行凡羅諾依(Voronoi)分割時形成之多角形的平均面積為100 μm3 以上300 μm3 以下。(1) The reflectance in the direction of the reflection angle of 35° with respect to the light incident at an incident angle of 30° is R(35), and the value of R(35)/R(30) is 0.4 or more and 0.8 or less, (2) The arithmetic mean height Pa of any profile curve of the uneven surface of the film is 0.09 μm or more and 0.21 μm or less, and (3) the maximum profile height Pt of any profile curve of the uneven surface of the film is 0.5 μm or more and 1.2 μm or less, and (4) the uneven surface of the film The average length PSm of the arbitrary profile curve is 1.2 μm or more and 20 μm or less. (5) When the elevation of each point of the uneven surface of the film is represented by a bar graph, the peak of the histogram is located at the highest point (height 100%). The middle point (height 50%) of the lowest point (height 0%) is within ±10% of the center, and (6) has 150 or more convex portions of 350 or less in the area of 200 μm×200 μm, (7) The average area of the polygon formed when the surface is subjected to Veronoi division with the apex of the convex portion of the film surface as the mother point is 100 μm 3 or more and 300 μm 3 or less.

其中,(1)係關於反射率特性之第四因素,此外(2)至(7)係關於表面凹凸的形狀之因素。Among them, (1) is the fourth factor regarding the reflectance characteristics, and (2) to (7) are factors related to the shape of the surface unevenness.

首先,說明有關可適當地評估防眩性能之指標。第1圖係示意性地表示光線對於防眩膜的入射方向與反射方向之斜視圖。在本發明中,對於從防眩膜11的法線12以30°的角度入射之入射光13,反射角30°的方向,亦即正反射方向15之反射率(亦即正反射率)設為R(30),並將反射角35°的方向之反射率設為R(35),將反射角40°的方向之反射率設為R(40),將反射角50°的方向之反射率設為R(50)時,使R(30)成為0.04以上0.2以下,R(40)成為0.005%以上0.02%以下,R(50)成為0.0015%以下,並且在一個形態中,使R(35)/R(30)的值成為0.4以上0.8以下。並且得知,藉由滿足此等必要條件,可得到顯示足夠的防眩性且為低模糊度,並可抑制白化及閃耀之防眩膜。在第1圖中,以符號16來表示以任意反射角θ之反射光,而測量反射率時的反射光之方向15、16,係設為包含入射光的方向13與法線12之面18內。First, an index indicating that the anti-glare performance can be appropriately evaluated will be described. Fig. 1 is a perspective view schematically showing an incident direction and a reflection direction of light rays to an anti-glare film. In the present invention, for the incident light 13 incident from the normal line 12 of the anti-glare film 11 at an angle of 30°, the direction of the reflection angle of 30°, that is, the reflectance of the regular reflection direction 15 (that is, the regular reflectance) is set. R (30), the reflectance in the direction of the reflection angle of 35° is R (35), the reflectance in the direction of the reflection angle of 40° is R (40), and the reflection in the direction of the reflection angle is 50°. When the ratio is R (50), R (30) is made 0.04 or more and 0.2 or less, R (40) is 0.005% or more and 0.02% or less, and R (50) is 0.0015% or less, and in one form, R ( 35) The value of /R(30) is 0.4 or more and 0.8 or less. Further, it has been found that by satisfying such necessary conditions, an anti-glare film which exhibits sufficient anti-glare property and which has low ambiguity and can suppress whitening and glare can be obtained. In Fig. 1, the reflected light at an arbitrary reflection angle θ is indicated by reference numeral 16, and the directions 15 and 16 of the reflected light when the reflectance is measured are set to include the direction 13 of the incident light and the face 18 of the normal line 18. Inside.

第2圖係將對於從第1圖之防眩膜11的法線12以30°的角度入射之入射光13的反射光16之反射角與反射率(反射率為對數刻度)繪製而成的曲線圖例。有時亦將表示如此之反射角與反射率的關係之曲線圖,或可從中讀取之各個反射角的反射率,稱之為反射分布(reflection profile)。如該曲線圖所示,正反射率R(30)係為對於以30°入射的入射光13之反射率的峰值(peals),而有反射角度愈從正反射方向之偏離,反射率愈降低之傾向。Fig. 2 is a diagram showing a reflection angle and a reflectance (reflectance of a logarithmic scale) of the reflected light 16 of the incident light 13 incident from the normal line 12 of the anti-glare film 11 of Fig. 1 at an angle of 30°. Curve legend. A graph showing such a relationship between the reflection angle and the reflectance, or a reflectance of each of the reflection angles from which it can be read, is sometimes referred to as a reflection profile. As shown in the graph, the regular reflectance R (30) is the peak of the reflectance of the incident light 13 incident at 30°, and the more the reflection angle deviates from the regular reflection direction, the lower the reflectance is. The tendency.

就正反射率R(30)為0.04%以上0.2%以下,反射角40°的反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且R(35)/R(30)的值為0.4以上0.8以下之點加以說明時,滿足上述必要條件之反射分布曲線的形狀,係為正反射率R(30)較低,且在正反射角附近之斜率較小,對於正反射率達1/10程度的反射率之角度具有從正反射方向±10°程度的開展,但廣角側的反射率被壓低者。透過將反射分布設為此種形狀,便成為低模糊度且具有優良的防眩性之防眩膜。反射分布不呈現此種形狀時,亦即,在正反射角附近的斜率較大,且對於正反射率達1/10程度的反射率之角度從正反射方向不具±10°程度的開展時,係意味著從正反射方向角度稍作變化而使反射率便急劇降低,結果使反射影像變得容易映入。The normal reflectance R (30) is 0.04% or more and 0.2% or less, the reflectance R (40) at a reflection angle of 40° is 0.005% or more and 0.02% or less, and the reflectance R (50) at a reflection angle of 50° is 0.0015% or less. When the value of R(35)/R(30) is 0.4 or more and 0.8 or less, the shape of the reflection profile satisfying the above-mentioned requirements is such that the positive reflectance R(30) is low and positive. The slope near the reflection angle is small, and the angle of the reflectance with a regular reflectance of about 1/10 has a degree of ±10° from the normal reflection direction, but the reflectance at the wide angle side is suppressed. By setting the reflection distribution to such a shape, it becomes an anti-glare film having low ambiguity and excellent anti-glare property. When the reflection distribution does not exhibit such a shape, that is, the slope near the regular reflection angle is large, and when the angle of the reflectance of the regular reflection rate of 1/10 is not ±10° from the regular reflection direction, This means that the reflectance is sharply changed from a slight change in the direction of the regular reflection direction, and as a result, the reflected image is easily reflected.

具體而言,對本發明之防眩膜反射任意的光源時,在正反射角±10°程度之範圍,可得到接近正反射光之反射光量,結果可使光源的影像充分散射而變得模糊。另一方面,在正反射角附近之斜率較大,且在未顯示開展的反射分布之防眩膜反射任意的光源時,藉由從正反射方向稍為變化角度,使來自光源的反射光急劇減少。此為正反射光與周邊的區別得以明確,亦即,意味著反射光成像而映入之情形。Specifically, when the anti-glare film of the present invention reflects an arbitrary light source, the amount of reflected light close to the regular reflection light can be obtained in the range of the positive reflection angle of ±10°, and as a result, the image of the light source can be sufficiently scattered and blurred. On the other hand, the slope near the regular reflection angle is large, and when the anti-glare film that does not show the reflection distribution that is reflected reflects an arbitrary light source, the reflected light from the light source is sharply reduced by slightly changing the angle from the regular reflection direction. . This distinguishes the difference between the specular reflected light and the periphery, that is, the case where the reflected light is imaged and reflected.

關於正反射率R(30),若其超過0.2%時,無法得到足夠的防眩機能而使辨識性降低。另一方面,由於正反射率R(30)太小時表示白化產生的傾向,故設為0.04%以上。關於R(40),因其太大時容易產生白化,故設為0.02%以下。另一方面,由於R(40)太小時無法顯示足夠的防眩性,故設為0.005%以上。關於R(50),由於其太大時容易產生白化,故設為0.0015%以下。從從白化之觀點來看,R(50)雖然愈小愈好,但實際上其下限為0.00001%程度。R(35)/R(30)的值係對應第1圖之30°附近的斜率,亦即對應在正反射角附近之斜率。原因是在第1圖中,反射率係以對數刻度表示之故。反射剖面於正反射角附近的傾斜為陡峭時,亦即,R(35)/R(30)的值低於0.4時,意味著光源的反射在正反射角附近急遽降低,結果反射影像映入,防眩性降低。若僅著眼於防止映入效果,而於正反射角附近之斜率幾近於0之情形,亦即R(35)/R(30)的值幾近於1之情形雖佳,但R(35)/R(30)的值超過0.8時容易發生白化,故將此值設為0.8以下為佳。When the regular reflectance R (30) exceeds 0.2%, sufficient anti-glare function cannot be obtained and the visibility is lowered. On the other hand, since the regular reflectance R (30) is too small to indicate the tendency of whitening, it is set to 0.04% or more. R (40) is 0.02% or less because it is likely to be whitened when it is too large. On the other hand, since R (40) is too small to display sufficient anti-glare property, it is set to 0.005% or more. R (50) is 0.0015% or less because it is likely to be whitened when it is too large. From the viewpoint of whitening, although R (50) is as small as possible, the lower limit is actually 0.00001%. The value of R(35)/R(30) corresponds to the slope around 30° of Fig. 1, that is, the slope near the positive reflection angle. The reason is that in Figure 1, the reflectance is expressed in logarithmic scale. When the inclination of the reflection profile near the positive reflection angle is steep, that is, when the value of R(35)/R(30) is less than 0.4, it means that the reflection of the light source is sharply lowered near the regular reflection angle, and the reflected image is reflected. , anti-glare is reduced. If you only focus on preventing the reflection effect, the slope near the positive reflection angle is almost zero, that is, the value of R(35)/R(30) is almost equal to 1, but R(35) When the value of /R(30) exceeds 0.8, whitening is likely to occur, so it is preferable to set the value to 0.8 or less.

在第2圖所示之反射分布例中,正反射率R(30)為約0.074%,R(40)為約0.013%,R(50)為約0.004%。此外,R(35)/R(30)的值為約0.6。In the reflection distribution example shown in Fig. 2, the regular reflectance R (30) is about 0.074%, R (40) is about 0.013%, and R (50) is about 0.004%. Further, the value of R(35)/R(30) is about 0.6.

依據本發明人等的調査,現在市面上的防眩膜之大部分係填充物分散之類型,在如該類型中,並未存在有正反射率R(30)為0.04%以上0.2%以下,反射角40°的反射率R(40)為0.005%以上0.02%以下,反射角50°的反射率R(50)為0.0015%以下,並且R(35)/R(30)的值為0.4以上0.8以下者,結果並未有兼備足夠的防眩性能與低模糊度之防眩膜。相對地,本發明規定之防眩膜係為顯示具有足夠的防眩性能的同時兼具模糊度低、抑制白化及閃耀之性能者。According to the investigation by the present inventors, most of the anti-glare films on the market today are of a type in which the filler is dispersed. In this type, there is no regular reflectance R (30) of 0.04% or more and 0.2% or less. The reflectance R (40) at a reflection angle of 40° is 0.005% or more and 0.02% or less, the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and the value of R(35)/R(30) is 0.4 or more. For those below 0.8, there is no anti-glare film with sufficient anti-glare performance and low ambiguity. In contrast, the anti-glare film specified by the present invention exhibits sufficient anti-glare properties while having low ambiguity and suppressing whitening and blazing performance.

測量防眩膜的反射率時,必須精確地測量0.001%以下的反射率。因此,使用動態範圍寬廣的檢測器較具效果。以此種檢測器而言,例如,可使用市場販賣的光功率表等,且在該光功率表的檢測器前設置光圈,並可使用以觀看防眩膜之角度達2。的方式設定之測角光度計(goniophotometer)來測量。以入射光而言,可使用380至780nm之可視光線,而以測量用光源而言,亦可使用將從鹵素燈泡等光源發出的光施以準直(collimate)者,或亦可使用雷射等單色光源且平行度高者。在背面平滑且透明的防眩膜的情況,由於來自防眩膜背面的反射可能影響到測量值,例如,以藉由使用黏著劑或水與甘油等的液體使防眩膜的平滑面光學密合於黒色的丙烯酸樹脂板,而可僅測量防眩膜最表面的反射率者為佳。When measuring the reflectance of the anti-glare film, it is necessary to accurately measure the reflectance of 0.001% or less. Therefore, it is more effective to use a detector with a wide dynamic range. In the case of such a detector, for example, a commercially available optical power meter or the like can be used, and an aperture is provided in front of the detector of the optical power meter, and can be used to view the angle of the anti-glare film up to 2. The method is set by a goniophotometer to measure. In the case of incident light, visible light of 380 to 780 nm may be used, and for the light source for measurement, collimation may be applied to light emitted from a light source such as a halogen bulb, or laser may be used. A monochromatic light source with a high degree of parallelism. In the case of an anti-glare film having a smooth and transparent back surface, since the reflection from the back surface of the anti-glare film may affect the measured value, for example, the smooth surface of the anti-glare film is optically dense by using an adhesive or a liquid such as water or glycerin. It is preferable to combine the color of the acrylic resin plate with the reflectance of the outermost surface of the anti-glare film.

此外,本發明的防眩膜,除了正反射率R(30)為0.04%以上0.2%以下,R(40)為0.005%以上0.02%以下,R(50)為0.0015%以下之外,亦可透過滿足之前的(2)至(7)所示的形狀因素中至少一個因素來達成。Further, the antiglare film of the present invention may have a regular reflectance R (30) of 0.04% or more and 0.2% or less, R (40) of 0.005% or more and 0.02% or less, and R (50) of 0.0015% or less. This is achieved by satisfying at least one of the shape factors shown in the previous (2) to (7).

首先,說明有關(2)的薄膜凹凸表面之任意的剖面曲線之算術平均高度Pa為0.09 μm以上0.21m以下之必要條件、(3)的薄膜凹凸表面之任意的剖面曲線之最大剖面高度Pt為0.5 μm以上1.2 μm以下之必要條件、以及(4)的薄膜凹凸表面之任意的剖面曲線之平均長度PSm為12 μm以上20 μm以下之必要條件。此等算術平均高度Pa、最大剖面高度Pt及平均長度PSm,係為JISB0601(=ISO4287)所規定者,且算術平均高度Pa,係與稱為中心線平均粗糙度的值相同。First, the arithmetic mean height Pa of an arbitrary cross-sectional curve of the film-obtrusing surface of (2) is required to be 0.09 μm or more and 0.21 m or less, and the maximum profile height Pt of any profile curve of the film-concave surface of (3) is The necessary condition of 0.5 μm or more and 1.2 μm or less and the average length PSm of any profile curve of the uneven surface of the film of (4) are necessary for 12 μm or more and 20 μm or less. The arithmetic mean height Pa, the maximum profile height Pt, and the average length PSm are defined by JIS B0601 (=ISO4287), and the arithmetic mean height Pa is the same as the value called the centerline average roughness.

凹凸表面的剖面曲線之算術平均高度Pa未達0.09 μm時,由於防眩膜表面變為幾近於平坦,且未呈現足夠的防眩性能,故不適宜。此外,算術平均高度Pa比0.21 μm更大時,由於表面形狀變粗糙,且發生白化與閃耀等之問題,故亦不適宜。凹凸表面的剖面曲線之最大剖面高度Pt未達0.5 μm時,由於防眩膜表面還是幾近於平坦,且未呈現足夠的防眩性能,故不適宜。此外,最大剖面高度Pt比1.2 μm更大時,由於表面形狀還是變粗糙,且發生白化與閃耀等之問題,故不適宜。凹凸表面的剖面曲線之平均長度PSm未達12 μm時,由於表面形狀變粗糙,且發生白化與閃耀等之問題,故不適宜。此外,平均長度PSm比20 μm更大時,由於防眩膜表面還是幾近為平坦,且未呈現足夠的防眩性,故不適宜。When the arithmetic mean height Pa of the cross-sectional curve of the uneven surface is less than 0.09 μm, since the surface of the anti-glare film becomes almost flat and does not exhibit sufficient anti-glare performance, it is not preferable. Further, when the arithmetic mean height Pa is larger than 0.21 μm, it is not suitable because the surface shape becomes rough and problems such as whitening and glare occur. When the maximum cross-sectional height Pt of the profile curve of the uneven surface is less than 0.5 μm, since the surface of the anti-glare film is almost flat and does not exhibit sufficient anti-glare performance, it is not suitable. Further, when the maximum cross-sectional height Pt is larger than 1.2 μm, the surface shape is roughened, and problems such as whitening and glare occur, which is not preferable. When the average length PSm of the cross-sectional curve of the uneven surface is less than 12 μm, the surface shape is rough, and problems such as whitening and glare occur, which is not preferable. Further, when the average length PSm is larger than 20 μm, since the surface of the anti-glare film is almost flat and does not exhibit sufficient anti-glare property, it is not preferable.

凹凸表面的剖面曲線之算術平均高度Pa、平均長度PSm及最大剖面高度Pt,係依照JISB0601,而可使用市場販賣之一般接觸式表面粗度儀來測量。此外,亦可利用共焦點顯微鏡、干擾顯微鏡、原子力顯微鏡(Atomic Force Microscope:AFM)等之裝置來測量表面形狀,亦可從該表面形狀之三次元資訊透過計算來求取。另外,由三次元資訊計算時,為了確保足夠的基準長度,最好是將200 μm×200 μm以上的區域測量3點以上,且以其平均值作為測量值。The arithmetic mean height Pa, the average length PSm, and the maximum profile height Pt of the profile curve of the concave-convex surface are measured in accordance with JIS B0601 using a commercially available general contact surface roughness meter. Further, the surface shape may be measured by a confocal microscope, an interference microscope, an atomic force microscope (AFM) or the like, or may be obtained by calculation from the three-dimensional information of the surface shape. Further, when calculating from the three-dimensional information, in order to secure a sufficient reference length, it is preferable to measure an area of 200 μm × 200 μm or more by three or more points, and use the average value as a measured value.

其次,說明有關利用柱形圖表示(5)的薄膜凹凸表面之各點的標高時,柱形圖的峰值位於以最高點(高度100%)與最低點(高度0%)的中間點(高度50%)為中心之±10以內的範圍之必要條件。該必要條件,係意味柱形圖的峰值,相對於峰值的標高與最低點的標高之差(最大標高)係位於40%到60%之範圍。峰值不存在於從中間點±10%以內時,換言之,在峰值出現於相對於最大標高較60%更大的位置或比40%更小的位置時,結果,由於表面形狀變粗糙,容易產生閃耀,故不適宜。此外,有外觀的質感亦降低之傾向。Next, when the elevation of each point of the uneven surface of the film of (5) is indicated by the histogram, the peak of the histogram is located at the middle point (height of the highest point (height 100%) and the lowest point (height 0%)). 50%) is a necessary condition for the range of ±10 within the center. This requirement means the peak value of the histogram, and the difference (maximum elevation) from the elevation of the peak to the elevation of the lowest point is in the range of 40% to 60%. The peak does not exist within ±10% from the intermediate point, in other words, when the peak appears at a position greater than 60% of the maximum elevation or a position smaller than 40%, as a result, the surface shape becomes rough, which is liable to occur. Shining, it is not suitable. In addition, there is a tendency that the texture of the appearance is also lowered.

於求取標高的柱形圖時,藉由共焦點顯微鏡、干擾顯微鏡、原子力顯微鏡(AFM)等裝置測量表面形狀,並求取防眩膜表面之各點的三次元座標值之後,再利用以下所示的演算法來決定。亦即,求取防眩膜表面的標高之最高點與最低點後,藉由將測量點標高與最低點標高之差(該點的高度),除以最高點與最低點之差(最大標高),而求取各點之相對的高度。透過將求得之相對的高度,以最高點為100,且最低點為0之柱形圖表示,來求取柱形圖的峰值位置。柱形圖係必須於頂點位置不受資料之誤差的影響之程度進行分割,宜分割顯示為10至30程度。另外在進行測量時,為了減少誤差,將200 μm×200 μm以上的區域測量3點以上,且以其平均值作為測量值。When obtaining the histogram of the elevation, the surface shape is measured by a confocal microscope, an interference microscope, an atomic force microscope (AFM), etc., and the ternary coordinate values of the points on the surface of the anti-glare film are obtained, and then the following is utilized. The algorithm shown is used to decide. That is, after obtaining the highest point and the lowest point of the elevation of the surface of the anti-glare film, by dividing the difference between the elevation of the measurement point and the elevation of the lowest point (the height of the point), the difference between the highest point and the lowest point (maximum elevation) ), and find the relative height of each point. The peak position of the histogram is obtained by plotting the relative heights obtained, with a bar graph with a highest point of 100 and a lowest point of 0. The column diagram must be segmented at the extent that the vertex position is not affected by the error of the data, and should be divided into 10 to 30 degrees. In addition, in order to reduce the error, the area of 200 μm × 200 μm or more is measured at three or more points, and the average value is used as the measured value.

於第3圖表示標高的柱形圖之例。在該圖中,横軸係相對於上述最高點標高與最低點標高的差(最大標高)之測量點的高度比例(單位%),且以5%單位進行分割。例如,最左的縱棒係表示高度的比例在0至5%的範圍之集合的分布,以下,隨著往右移動高度的比例以5%單位逐漸變大。在圖中,每隔横軸之3區段表示有刻度。縱軸表示高度的分布,為若積分便成為1之值。在該例中,峰值位置係出現在相對於最大標高45%至50%之位置。另外,表示後述的實施例及比較例之柱形圖的第11圖、第13圖、第15圖、第17圖及第19圖,其表示的方式亦與第3圖相同。An example of a histogram of the elevation is shown in Fig. 3. In the figure, the horizontal axis is the height ratio (unit %) of the measurement point with respect to the difference (maximum elevation) of the highest point elevation and the lowest point elevation, and is divided in units of 5%. For example, the leftmost vertical bar indicates a distribution in which the ratio of the height is in the range of 0 to 5%, and hereinafter, the ratio of the height to the right gradually increases in 5%. In the figure, the 3 segments of every horizontal axis indicate a scale. The vertical axis indicates the distribution of the height, and if it is integrated, it becomes a value of 1. In this example, the peak position appears at a position that is 45% to 50% relative to the maximum elevation. In addition, FIGS. 11 , 13 , 15 , 17 , and 19 showing the histograms of the examples and comparative examples described later are also the same as those of FIG. 3 .

其次,說明有關在(6)之200 μm×200 μm的區域內具有150個以上350個以下的凸部之必要條件。凹凸表面之凸部的數目少時,與高精細的影像顯示裝置加以組合使用時,由於會產生與畫素之干擾所引起的閃耀,而使影像變得不清楚,故不適宜。此外,凸部的數目變得太多時,結果表面凹凸形狀的傾斜角度變得急峻,而變得容易產生白化。Next, the necessity of having 150 or more convex portions of 350 or less in the region of 200 μm × 200 μm in (6) will be described. When the number of convex portions on the uneven surface is small, when used in combination with a high-definition image display device, the image is unclear due to the glare caused by the interference with the pixels, which is not preferable. Further, when the number of the convex portions becomes too large, as a result, the inclination angle of the surface uneven shape becomes sharp, and whitening is likely to occur.

在求取防眩膜的凹凸面之凸部的數目時,利用共焦點顯微鏡、干擾顯微鏡、原子力顯微鏡(AFM)等之裝置來測量表面形狀,且求取防眩膜表面之各點的三次元座標值後,藉由以下所示之演算法判定凸部,並計算其個數。亦即,著眼於防眩膜表面之任意點時,在該點的周圍,不存在有比著眼的點之標高更高的點,並且,該點的凹凸面之標高比凹凸面之最高點的標高與最低點的標高之中間更高時,設該點為凸部的頂點,以此方式計算求得之凸部的頂點數目,且作為凸部的數目。更具體而言,如第4圖所示,著眼於防眩膜表面之任意的點21,且以該點21為中心,描繪與防眩膜基準面23平行之半徑2 μm至5 μm的圓時,於包含在該圓的投影面24內之防眩膜表面22上的點中,不存在有比著眼之點21標高更高的點,並且,該點的凹凸面之標高比凹凸面之峰值的標高與最低點的標高之中間更高時,判定該點21為凸部的頂點,且求取凸部的數目。此時,上述圓24的半徑,係不計數樣本表面之細小的凹凸,此外,要求為不包含複數個凸部之程度的大小,宜為3 μm程度。於測量時,為了減少誤差,最好將200 μm×200 μm的區域測量3點以上,且以其平均值作為測量值。When the number of convex portions of the uneven surface of the anti-glare film is obtained, the surface shape is measured by a device such as a confocal microscope, an interference microscope, or an atomic force microscope (AFM), and a three-dimensional element of each point on the surface of the anti-glare film is obtained. After the coordinate value, the convex portion is determined by the algorithm shown below, and the number thereof is calculated. That is, when focusing on any point on the surface of the anti-glare film, there is no point higher than the elevation of the point of the eye around the point, and the elevation of the concave-convex surface of the point is higher than the highest point of the concave-convex surface. When the middle of the elevation of the elevation and the lowest point is higher, the point is the apex of the convex portion, and the number of vertices of the obtained convex portion is calculated as the number of convex portions. More specifically, as shown in Fig. 4, attention is paid to an arbitrary point 21 on the surface of the anti-glare film, and a circle having a radius of 2 μm to 5 μm parallel to the anti-glare film reference surface 23 is drawn around the point 21 At the point on the anti-glare film surface 22 included in the projection surface 24 of the circle, there is no point higher than the point 21 of the eye, and the height of the concave-convex surface of the point is larger than that of the uneven surface When the elevation of the peak is higher than the middle of the lowest point, it is determined that the point 21 is the apex of the convex portion, and the number of convex portions is obtained. At this time, the radius of the circle 24 is not to count the fine unevenness on the surface of the sample, and is preferably a size which does not include a plurality of convex portions, and is preferably about 3 μm. In order to reduce the error during measurement, it is preferable to measure an area of 200 μm × 200 μm by more than 3 points, and use the average value as a measured value.

使用共焦點顯微鏡時,宜將接物鏡的倍率設為50倍程度,且降低解像度來測量。此係因為以高解像度進行測量時,也會測量到樣本表面細小的凹凸,而對凸部的計算造成障礙之故。另外,將接物鏡設為低倍率時,由於高度方向的解像度亦降低,故在凹凸較少的樣本之情況亦會變得難以測量表面形狀。在這種情況時,亦可於以高倍率的接物鏡進行測量後,於所得到之資料施以低通濾波器處理以去除空間頻率高的成分,且使在凹凸表面觀察到之細小的閃耀變得看不見後,再計算凸部的個數。When using a confocal microscope, it is advisable to set the magnification of the objective lens to 50 times and reduce the resolution to measure. This is because when measuring with high resolution, the unevenness of the surface of the sample is also measured, which hinders the calculation of the convex portion. Further, when the objective lens is set to a low magnification, the resolution in the height direction is also lowered, so that it is difficult to measure the surface shape in the case of a sample having less unevenness. In this case, after the measurement with the high-magnification objective lens, the obtained data is subjected to a low-pass filter treatment to remove the component having a high spatial frequency, and the fine glint observed on the uneven surface. After it becomes invisible, the number of convex parts is calculated.

最後,說明有關以(7)的薄膜表面凹凸之凸部的頂點為母點且將其表面進行凡羅諾依分割時形成之多角形的平均面積為100 μm2 以上300 μm2 以下之必要條件。首先,說明有關凡羅諾依分割,於平面上配置幾個點(簡稱為母點)時,依據該平面內之任意的點最接近哪個母點來分割該平面而得到之圖稱為凡羅諾依圖,且將該分割稱為凡羅諾依分割。於第5圖表示以防眩膜的表面之凸部的頂點為母點而對該表面進行凡羅諾依分割的例子,而四角的點26,26為母點,包含一個母點之各個多角形27,27為藉由凡羅諾依分割而形成之區域,稱為凡羅諾依區域或凡羅諾依多角形者,而在以下稱為凡羅諾依多角形。在此圖中,關於周圍之薄薄地塗滿的部分28,28,容於後面說明。關於凡羅諾依圖,母點的數目與凡羅諾依區域的數目為一致。Finally, the necessary conditions for the average area of the polygon formed when the apex of the convex portion of the film surface irregularities of (7) is the mother point and the surface is divided by the vanorone is 100 μm 2 or more and 300 μm 2 or less. . First of all, when the Van Rooney segmentation is performed, when several points (referred to as mother points) are arranged on a plane, the figure is obtained by dividing the plane according to which point is closest to any point in the plane. Noi diagram, and this division is called Van Rooney division. Fig. 5 shows an example in which the apex of the convex portion of the surface of the anti-glare film is taken as a mother point, and the surface is subjected to Veronoy division, and the points 26 and 26 of the four corners are mother points, including a plurality of mother points. The angles 27, 27 are regions formed by the division of the van Rooney, referred to as the Van Rooney region or the Van Rooney polygon, and are hereinafter referred to as the Van Rooney polygon. In this figure, the portions 28, 28 which are thinly coated around are described later. Regarding the Fanonuoyi map, the number of mother points is consistent with the number of the Fanonuoyi area.

以凸部的頂點為母點進行凡羅諾依分割時形成之凡羅諾依多角形的平均面積低於100 μm2 時,防眩膜表面之傾斜角度變為急峻,結果容易發生白化,故不適宜。此外,凡羅諾依多角形的平均面積比300 μm2 更大時,凹凸表面形狀變粗糙,且變得容易發生閃耀,故不適宜。When the average area of the polygons of the Van Roynoi formed by the vortex of the convex portion is less than 100 μm 2 , the inclination angle of the surface of the anti-glare film becomes sharp, and as a result, whitening is likely to occur. Not suitable. Further, when the average area of the polygon of the Ronoloi is larger than 300 μm 2 , the shape of the uneven surface becomes rough and it is liable to cause glare, which is not preferable.

於求取藉由進行以防眩膜表面之凸部的頂點作為母點之凡羅諾依分割而得到之凡羅諾依多角形的平均面積時,藉由共焦點顯微鏡、干擾顯微鏡、原子力顯微鏡(AFM)等裝置來測量表面形狀,並求取防眩膜表面之各點的三次元座標值後,藉由以下所示之演算法進行凡羅諾依分割,求取凡羅諾依多角形的平均面積。亦即,先依照參照第4圖說明之演算法而先求取防眩膜表面上的凸部之頂點,其次,投影該凸部的頂點到防眩膜基準面。之後,藉由將透過表面形狀的測量得到之三次元座標全部投影到該基準面,且使上述投影之所有的點歸屬於最接近的母點來進行凡羅諾依分割,並藉由求取分割而得到之多角形的面積,來求取凡羅諾依多角形的平均面積。於測量時,為了減少誤差,與測量視野的邊界接觸之凡羅諾依多角形,雖當作之前的凸部之數目來計算,但求取平均面積時則不算入。此外,為了減少測量誤差,最好是將200 μm×200 μm以上的區域測量3點以上,且以該平均值作為測量值。By performing the confocal microscope, the interference microscope, and the atomic force microscope by performing the average area of the polygons of the Van Rooney polygon obtained by dividing the apex of the convex portion on the surface of the glare film as the mother point. (AFM) and other devices to measure the surface shape, and obtain the ternary coordinate value of each point on the surface of the anti-glare film, and then perform the Vornoyin segmentation by the algorithm shown below to obtain the Van Rooney polygon. The average area. That is, first, the apex of the convex portion on the surface of the anti-glare film is first obtained according to the algorithm described with reference to Fig. 4, and then the vertex of the convex portion is projected to the anti-glare film reference surface. Then, by projecting all the three-dimensional coordinates obtained by the measurement of the shape of the surface onto the reference plane, and all the points of the projection are attributed to the closest parent point, the Fanonuo division is performed, and the method is obtained. The area of the polygon obtained by the division is used to obtain the average area of the polygon of the Van Rooney. In the measurement, in order to reduce the error, the polygon of the Ronoloi contact with the boundary of the measurement field of view is calculated as the number of the previous convex portions, but the average area is not counted. Further, in order to reduce the measurement error, it is preferable to measure an area of 200 μm × 200 μm or more by 3 points or more, and use the average value as a measured value.

如之前的部份說明,第5圖係表示以防眩膜的凸部頂點作為母點而進行凡羅諾依分割時的例子之凡羅諾依圖。多數的母點26,26係防眩膜之凸部頂點,且藉凡羅諾依分割,對一個母點26分配有一個凡羅諾依多角形27。在該圖中,與視野的邊界接觸,而薄薄地塗滿之凡羅諾依多角形28,28,如前述,於計算平均面積時係不計數。另外,在該圖中,僅對部分的母點及凡羅諾依多角形標示拉出線與符號,但母點與凡羅諾依多角形存在有多數之事實,由以上的說明與該圖當可容易理解。As described in the previous section, Fig. 5 is a diagram showing a van Rooney diagram of an example in which the vertices of the convex portions of the anti-glare film are used as a mother point to perform the division of the van Rono. Most of the parent points 26, 26 are the apex of the convex portion of the anti-glare film, and by dividing the Ronolyi, a parent point 26 is assigned a van Rooney polygon 27. In this figure, the van ronoi polygons 28, 28, which are in contact with the boundary of the field of view, are thinly painted, as described above, are not counted when calculating the average area. In addition, in the figure, only the partial mother point and the Van Rooney polygon indicate the pull-out line and the symbol, but the fact that there is a majority between the mother point and the Van Rooney polygon is explained by the above description and the figure. When it is easy to understand.

接著,本發明的防眩膜相對於垂直入射光之模糊度宜為3%以上20%以下。模糊度高時,由於該防眩膜使用於液晶面板時之正面對比會降低,故模糊度宜為20%以下。另一方面,模糊度低於3%時,防眩性變得不夠充份,而有辨識性降低之傾向。防眩膜的模糊度係可依照JISK76所示之方法來測量。Next, the degree of blurring of the antiglare film of the present invention with respect to the normal incident light is preferably 3% or more and 20% or less. When the ambiguity is high, since the front contrast of the anti-glare film used in the liquid crystal panel is lowered, the blurring degree is preferably 20% or less. On the other hand, when the degree of blur is less than 3%, the anti-glare property becomes insufficient, and the visibility tends to decrease. The degree of blur of the anti-glare film can be measured in accordance with the method shown in JIS K76.

此外,本發明之防眩膜,宜使用暗部與亮部的寬度為0.5mm、1.0mm及2.0mm之3種光梳以光的入射角45°測量之反射鮮明度的和為30%以下。反射鮮明度係以JISK7105所規定之方法測量。在該規格中,以作為使用在影像鮮明度的測量之光梳而言,係規定暗部與亮部的寬度之比為1:1,且其寬度為0.125mm、0.5mm、1.0mm及2.0mm之4種。其中,使用寬度0.125mm的光梳時,在本發明規定之防眩膜中,由於其測量值的誤差變大,故使用寬度0.125mm的光梳時的測量值不加入和內,而以使用寬度為0.5mm、1.0mm及2.0mm之3種光梳所測量之影像鮮明度的和稱為反射鮮明度。該定義的情況的反射鮮明度的最大值為300。該定義之反射鮮明度超過30%時,由於光源等之影像鮮明地映入,且防眩性差而不適宜。Further, in the antiglare film of the present invention, it is preferable to use a combination of three types of optical combs having a width of a dark portion and a bright portion of 0.5 mm, 1.0 mm, and 2.0 mm at a light incident angle of 45°, and a sum of reflection sharpness of 30% or less. The reflectance is measured by the method specified in JIS K7105. In this specification, the ratio of the width of the dark portion to the bright portion is 1:1 as the optical comb used for the measurement of the sharpness of the image, and the width is 0.125 mm, 0.5 mm, 1.0 mm, and 2.0 mm. 4 kinds. In the case of using an optical comb having a width of 0.125 mm, in the anti-glare film defined by the present invention, since the error of the measured value becomes large, the measured value when the optical comb having a width of 0.125 mm is used is not added and used, but is used. The sum of image sharpness measured by three kinds of optical combs having widths of 0.5 mm, 1.0 mm, and 2.0 mm is called reflection sharpness. The maximum value of the reflection sharpness of the case of this definition is 300. When the reflection sharpness of the definition exceeds 30%, the image of the light source or the like is clearly reflected, and the anti-glare property is unfavorable.

但是,反射鮮明度變為30%以下時,僅以反射鮮明度變得難以比較防眩性的優劣。此乃上述定義之反射鮮明度為30%以下時,使用寬度0.5mm、1.0mm及2.0mm的光梳之各個反射鮮明度,至多為10%程度,而使因測量誤差等造成之反射鮮明度的偏差變成無法忽視之故。However, when the reflectance is 30% or less, it is difficult to compare the anti-glare property with the reflection sharpness. When the reflection sharpness of the above definition is 30% or less, the reflection brightness of the optical combs having widths of 0.5 mm, 1.0 mm, and 2.0 mm is used, at most 10%, so that the reflection sharpness due to measurement error or the like is caused. The deviation becomes impossible to ignore.

因此本發明人等乃針對藉由如後述之製造方法得到的反射鮮明度為30%以下之防眩膜,藉著目視進行防眩性的優劣比較。藉由比較檢討目視之防眩性的評估結果與先前說明的反射分布,發現可適當地評估防眩膜的防眩性能之指標。Therefore, the inventors of the present invention have compared the advantages and disadvantages of the anti-glare property by visual observation of an anti-glare film having a reflection sharpness of 30% or less obtained by a production method as described later. By comparing the evaluation results of the visual anti-glare property with the reflection distribution described earlier, it was found that the index of the anti-glare property of the anti-glare film can be appropriately evaluated.

在本發明的防眩膜中,組合使用之高精細的影像顯示元件的畫素密度達到100ppi(Pixel per inch)為止仍不閃耀為佳。在100ppi以下的畫素密度看到閃耀時,難以與高精細的影像顯示元件組合使用,故不適宜。In the anti-glare film of the present invention, it is preferable that the high-definition image display element used in combination has a pixel density of 100 ppi (Pixel per inch). When the pixel density of 100 ppi or less is seen to be glaring, it is difficult to use it in combination with a high-definition image display element, which is not preferable.

閃耀可以利用以下的方法進行評估。首先,準備具有如第6圖以平面圖表示之單元體的圖案之光罩。在該圖中,單元體30係在透明的基板上,以線寬度10 μm形成鉤狀的鉻遮光圖案31,且未形成有該鉻遮光圖案31之部分成為開口部32。在後述之實施例中,單元體的尺寸為254 μm×84 μm(圖之縱×横),因此開口部的尺寸為244 μm×74 μm(圖之縱×横)者。圖示之單元體係縱橫排列多數而形成光罩。Shining can be evaluated using the following methods. First, a photomask having a pattern of a unit body as shown in plan view in Fig. 6 is prepared. In the figure, the unit body 30 is formed on a transparent substrate, and a hook-shaped chrome-shielding pattern 31 is formed with a line width of 10 μm, and a portion where the chrome-shielding pattern 31 is not formed is the opening 32. In the embodiment described later, the size of the unit body is 254 μm × 84 μm (vertical × horizontal), and therefore the size of the opening is 244 μm × 74 μm (vertical × horizontal). The illustrated unit system is arranged in a plurality of rows and columns to form a photomask.

然後,如在第7圖之示意剖面圖所示,使光罩33之鉻遮光圖案31朝上放置於光箱35,且將以黏著劑貼合防眩膜11至玻璃板37之樣本放置在光罩33上。於光箱35中配置有光源36。在該狀態,藉由從離樣本約30cm之位置39以目視觀察,來進行閃耀之官能評估。Then, as shown in the schematic cross-sectional view of Fig. 7, the chrome-shielding pattern 31 of the mask 33 is placed upside down on the light box 35, and the sample in which the anti-glare film 11 is adhered with the adhesive to the glass sheet 37 is placed. On the mask 33. A light source 36 is disposed in the light box 35. In this state, the sensory evaluation of the blaze was performed by visual observation from a position 39 of about 30 cm from the sample.

其次,說明有關適當地製造本發明之防眩膜的方法,以及於表面形成有凹凸以得到該防眩膜之金屬模具的製造方法。本發明之防眩膜係藉由下列方法而有利地製得,該方法係使用以預定形狀形成凹凸之金屬模具,將該模具的凹凸面轉印到透明樹脂薄膜,接著從模具剝下轉印有凹凸面之透明樹脂薄膜。在該方法中,為了得到具有凹凸的金屬模具,於金屬基材的表面施以鍍銅或鍍鎳,且於研磨該電鍍表面後,使微粒子碰撞該研磨面而形成凹凸,並在對該凹凸形狀施以鈍化加工後,在該凹凸面施以鍍鉻而作成模具。Next, a method for appropriately producing the antiglare film of the present invention, and a method for producing a metal mold having irregularities formed on the surface thereof to obtain the antiglare film will be described. The anti-glare film of the present invention is advantageously produced by a method of forming a metal mold having irregularities in a predetermined shape, transferring the uneven surface of the mold to a transparent resin film, and then peeling off the transfer from the mold. A transparent resin film having a concave-convex surface. In this method, in order to obtain a metal mold having irregularities, copper plating or nickel plating is applied to the surface of the metal substrate, and after the plating surface is polished, the fine particles are caused to collide with the polishing surface to form irregularities, and the unevenness is formed. After the shape is subjected to passivation processing, chrome plating is applied to the uneven surface to form a mold.

首先,以微粒子碰撞形成凹凸,並且於形成鍍鉻層之金屬基材的表面,施以鍍銅或鍍鎳。如此,藉由在用以構成模具之金屬表面施以鍍銅或鍍鎳,可提高後續處理之鍍鉻的密合性與光澤性。於鐵等之表面施以鍍鉻時,或在鍍鉻表面以噴砂法與珠擊法形成凹凸後再度施以鍍鉻時,如之前於先前技術欄所述,會有表面容易粗糙,且產生細小的裂痕,而對防眩膜的形狀造成不良的影響。相對於此,發明人等發現藉由在表面施以鍍銅或鍍鎳,可使如此不良情況消失。此乃因為鍍銅與鍍鎳的覆蓋性高,又平滑化作用強,因而可填滿金屬基材之微小的凹凸或孔巢等而形成平坦且具光澤的表面之故。透過上述鍍銅及鍍鎳的特性,被認為是因存在於金屬基材之微小的凹凸或孔巢所致之鍍鉻表面的粗糙可消除,此外,亦可認為由於鍍銅與鍍鎳之覆蓋性高,故減低細小的裂痕之產生。First, irregularities are formed by collision of fine particles, and copper plating or nickel plating is applied to the surface of the metal substrate on which the chromium plating layer is formed. Thus, by applying copper plating or nickel plating to the metal surface for constituting the mold, the adhesion and gloss of the chrome plating of the subsequent treatment can be improved. When chrome plating is applied to the surface of iron or the like, or when chrome plating is formed by blasting and bead blasting, and chrome plating is applied again, as described in the prior art column, the surface is easily roughened and fine cracks are generated. And adversely affect the shape of the anti-glare film. On the other hand, the inventors have found that such a problem can be eliminated by applying copper plating or nickel plating to the surface. This is because the copper plating and the nickel plating have high covering properties and a smoothing effect, so that the fine unevenness of the metal substrate or the hole nest can be filled to form a flat and shiny surface. Through the above-mentioned characteristics of copper plating and nickel plating, it is considered that the roughness of the chrome-plated surface due to minute irregularities or pores existing in the metal substrate can be eliminated, and it is also considered that the copper plating and the nickel plating are covered. High, so reduce the occurrence of small cracks.

在此所謂銅或鎳,除了可分別為純金屬之外,亦可為以銅為主體之合金,或以鎳為主體之合金。因此,在本說明書之所謂的銅,係意味包含銅及銅合金,而鎳係指包含鎳及鎳合金。鍍銅及鍍鎳係可分別以電解電鍍來進行或亦可利用無電解電鍍來進行,而通常採用電解電鍍。Here, copper or nickel may be an alloy mainly composed of copper or an alloy mainly composed of nickel, in addition to being pure metal. Therefore, the term "copper" as used in this specification means copper and a copper alloy, and nickel means nickel and a nickel alloy. The copper plating and the nickel plating may be performed by electrolytic plating or electroless plating, respectively, and electrolytic plating is usually employed.

以適於構成模具之金屬而言,由成本的觀點,可舉出鋁與鐵等。再由處理的方便性來看,輕量的鋁較佳。在此所謂的鋁與鐵,亦除了分別可為純金屬之外,亦可為鋁或鐵為主體之合金。在如此之金屬基材的表面施以鍍銅或鍍鎳,並且研磨該表面,而得到更平滑而具有光澤之表面後,使微粒子碰撞該表面而形成細微的凹凸,並施以鈍化該凹凸形狀之加工後,復於施以鍍鉻而構成模具。Examples of the metal suitable for constituting the mold include aluminum and iron from the viewpoint of cost. Further, from the viewpoint of handling convenience, lightweight aluminum is preferred. The so-called aluminum and iron may be aluminum or iron-based alloys in addition to pure metals. Applying copper plating or nickel plating to the surface of such a metal substrate, and grinding the surface to obtain a smoother and glossy surface, causing the fine particles to collide with the surface to form fine irregularities, and passivating the uneven shape After the processing, the mold is formed by applying chrome plating.

施行鍍銅或鍍鎳時,電鍍層若太薄,則無法完全排除基底金屬之影響,故該厚度宜為10 μm以上。電鍍層厚度的上限雖非臨界性,但由成本等之相關性來看,一般而言到500 μm為止之程度便足夠。When copper plating or nickel plating is performed, if the plating layer is too thin, the influence of the base metal cannot be completely excluded, so the thickness is preferably 10 μm or more. Although the upper limit of the thickness of the plating layer is not critical, it is generally sufficient to be 500 μm in terms of cost and the like.

金屬模具的形狀亦可為平坦的金屬板,或亦可為圓柱狀或筒狀的金屬滾筒。若使用金屬滾筒製作模具,能夠以連續性的捲筒狀製造防眩膜。The shape of the metal mold may also be a flat metal plate, or may be a cylindrical or cylindrical metal drum. When a mold is produced using a metal drum, an anti-glare film can be produced in a continuous roll shape.

第8圖係以使用平板之情況為例,而示意性地表示製得到金屬模具為止的步驟之剖面圖。第8圖之(A)係表示施以鍍銅或鍍鎳與鏡面研磨後的基板之剖面,並在基板41的表面形成電鍍層42,而該表面即為研磨面43。藉由使微粒子碰撞如此鏡面研磨後之電鍍層42的表面以形成凹凸。第8圖之(B)係使微粒子碰撞後的基板41之剖面示意圖,以微粒子碰撞,形成部分球面狀之細微的凹面44。Fig. 8 is a cross-sectional view showing a step of obtaining a metal mold, taking a case where a flat plate is used as an example. Fig. 8(A) shows a cross section of a substrate plated with copper, nickel and mirror-polished, and a plating layer 42 is formed on the surface of the substrate 41, and the surface is the polished surface 43. The irregularities are formed by causing the fine particles to collide with the surface of the electroplated layer 42 thus mirror-polished. Fig. 8(B) is a schematic cross-sectional view of the substrate 41 after the collision of the fine particles, and collides with the fine particles to form a partial spherical concave surface 44.

第8圖之(C)係在如此藉由微粒子形成凹凸之面,對凹凸形狀施以鈍化加工後的基板41之剖面示意圖,其中,(C1)係表示藉由蝕刻處理而使之鈍化的狀態,而(C2)係表示藉由鍍銅而使之鈍化的狀態。另外,在(C1)中,以虛線表示相當於藉由蝕刻而鈍化之前的(B)之部分球面狀凹面的狀態。在採用(C1)的蝕刻處理之例中,藉由蝕刻削去(B)所示的凹面44與銳角型突起,而形成部分球面上之銳角型突起被鈍化之形狀46a。另一方面,於採用(C2)的鍍銅之例中,在(B)所示之凹面44上形成鍍銅層45,藉此方式形成部分球面上之銳角型突起被鈍化之形狀46b。(C) is a schematic cross-sectional view of the substrate 41 subjected to passivation processing on the surface of the uneven shape by the fine particles, wherein (C1) shows a state of being passivated by etching treatment. And (C2) shows a state in which it is passivated by copper plating. Further, in (C1), a state corresponding to a partial spherical concave surface of (B) before being passivated by etching is indicated by a broken line. In the example of the etching treatment using (C1), the concave surface 44 and the acute-angle projection shown by (B) are removed by etching to form a shape 46a in which the acute-angle projection on the partial spherical surface is passivated. On the other hand, in the case of copper plating using (C2), a copper plating layer 45 is formed on the concave surface 44 shown in (B), whereby the shape 46b in which the acute-angle projections on the partial spherical surface are passivated is formed.

之後,藉由施加鍍鉻,將表面的凹凸形狀再加鈍化。第8圖之(D)係施以鍍鉻後之剖面示意圖,而其中之(D1)係於(CI)所示之藉由蝕刻而鈍化的凹凸面46a上施以鍍鉻者,而(D2)係在(C2)所示之鍍銅層45上施以鍍鉻者。Thereafter, the uneven shape of the surface is further passivated by applying chrome plating. Fig. 8(D) is a schematic cross-sectional view after chrome plating, wherein (D1) is applied to the embossed surface 46a which is passivated by etching as shown by (CI), and (D2) is A chrome plating is applied to the copper plating layer 45 shown in (C2).

在採用從(C1)到(D1)的蝕刻處理之例子中,在藉由(C)所示之蝕刻而鈍化之狀態的面46a上形成鍍鉻層47,而比起(C1)的凹凸面46a,該表面48係透過鍍鉻而成為更加鈍化之狀態,換言之即為凹凸形狀經緩和之狀態。此外,在採用從(C2)到(D2)的鍍銅之例中,於形成在基板41上的鍍銅或鍍鎳層42之細微凹面上形成鍍銅層45,復在其上形成鍍鉻層47,而該表面48係藉由鍍鉻而成為比(C2)之凹凸面46b更加鈍化之狀態,換言之,即為凹凸形狀經緩和之狀態。如此,使微粒子碰撞鍍銅或鍍鎳層42的表面而形成凹凸後,於該凹凸形狀施以鈍化加工的表面46(46a或46b),藉由施以鍍鉻,而可得到實質上不具平坦部之金屬模具。此外,如此之模具係適合製造具有理想的光學特性之防眩膜。In the example of the etching treatment from (C1) to (D1), the chrome plating layer 47 is formed on the surface 46a in a state of being passivated by the etching shown by (C), and the uneven surface 46a is compared with (C1). The surface 48 is etched into a more passivated state by chrome plating, in other words, the state in which the uneven shape is relaxed. Further, in the case of using copper plating from (C2) to (D2), a copper plating layer 45 is formed on the fine concave surface of the copper plating or nickel plating layer 42 formed on the substrate 41, and a chrome plating layer is formed thereon. 47, the surface 48 is in a state of being more passivated than the uneven surface 46b of (C2) by chrome plating, in other words, the state in which the uneven shape is relaxed. In this manner, after the fine particles are collided with the surface of the copper plating or nickel plating layer 42 to form irregularities, the surface 46 (46a or 46b) subjected to passivation is applied to the uneven shape, and chrome plating is applied to obtain substantially no flat portion. Metal mold. Moreover, such a mold is suitable for producing an anti-glare film having desired optical characteristics.

於由基材上的銅或鎳所構成之電鍍層,係在表面經研磨之狀態以微粒子碰撞者,尤其宜為研磨至接近鏡面之狀態。此係作為基材之金屬板與金屬滾筒,為了形成所期望之精確度,多施以切削與研削等之機械加工,因此而於基材表面留有加工痕跡之故。The plating layer composed of copper or nickel on the substrate is in a state in which the surface is ground by the particles, and it is particularly preferable to polish to a state close to the mirror surface. In this case, as a metal plate and a metal roll of a base material, in order to form a desired precision, machining such as cutting and grinding is often applied, so that processing marks remain on the surface of the substrate.

即使在施加有鍍銅或鍍鎳之狀態,亦會殘留上述加工痕跡,此外,在電鍍之狀態下,表面不一定完全成為平滑。在殘留有深刻的加工痕跡之狀態下,即使以微粒子碰撞使基材表面變形,亦有加工痕跡等之凹凸較藉由微粒子形成之凹凸深的情形,而有留下加工痕跡等之影響的可能性。Even in the state in which copper plating or nickel plating is applied, the above-described processing marks remain, and in the state of plating, the surface does not necessarily become completely smooth. In the state where the deep processing marks remain, even if the surface of the substrate is deformed by the collision of the fine particles, there are cases where the unevenness of the processing marks or the like is deeper than the unevenness formed by the fine particles, and there is a possibility that the processing marks and the like are left. Sex.

使用如此模具來製造防眩膜時,可能對光學特性造成無法預期的影響。When such an mold is used to manufacture an anti-glare film, it may have an unpredictable effect on optical characteristics.

施加有電鍍的基材表面之研磨方法並無特別的限制,可使用機械研磨法、電解研磨法、化學研磨法之任一者。以機械研磨法而言,例示有超級精磨法、研光(lapping)、流體研磨法、拋光法等。研磨後之表面粗度係以中心線平均粗糙度Ra表示,Ra宜為0.5 μm以下,Ra較宜為0.1 μm以下。Ra太大時,即使以微粒子碰撞使金屬的表面變形,由於變形前之表面粗度的影響可能會殘留,故不適宜。此外,關於Ra之下限,並無特別限制,從加工時間與加工成本的觀點來看,自然有其限度,故不必特別指定。The polishing method to which the surface of the substrate to be plated is applied is not particularly limited, and any of a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method can be used. The mechanical polishing method is exemplified by a super-finishing method, a lapping method, a fluid polishing method, a polishing method, and the like. The surface roughness after polishing is expressed by the center line average roughness Ra, and Ra is preferably 0.5 μm or less, and Ra is preferably 0.1 μm or less. When Ra is too large, even if the surface of the metal is deformed by collision of fine particles, the influence of the surface roughness before deformation may remain, which is not preferable. Further, the lower limit of Ra is not particularly limited, and from the viewpoint of processing time and processing cost, there is naturally a limit, and therefore it is not necessary to specify it.

以使微粒子碰撞基材之已施加電鍍的表面之方法而言,適合使用噴射加工法。噴射加工法係有噴砂法、珠擊法,液體搪磨法等。以使用在上述加工之粒子而言,以接近球形的形狀較有銳角之類的形狀為佳,此外,以於加工中不因破碎而出現有銳角之類的硬材質之粒子為佳。作為滿足此等條件之粒子,在陶瓷系的粒子中,宜使用球形氧化鋯之珠子,與氧化鋁的珠子。此外,在金屬系的粒子中,較佳的是鋼與不鏽鋼製的珠子。再者,亦可使用於樹脂黏合劑中支承有陶瓷與金屬的粒子之珠子。In the method of causing the fine particles to collide with the surface on which the plating has been applied, a spray processing method is suitably used. The jet processing method includes a sand blasting method, a bead blasting method, a liquid honing method, and the like. In the case of using the particles processed as described above, it is preferable to use a shape in which the shape close to a spherical shape is more acute, and it is preferable that particles having a hard material such as an acute angle are not formed during the processing. As the particles satisfying these conditions, in the ceramic-based particles, beads of spherical zirconia and beads of alumina are preferably used. Further, among the metal-based particles, steel and stainless steel beads are preferred. Further, it is also possible to use a bead which supports ceramic and metal particles in a resin binder.

作為用以碰撞基材經施加電鍍的表面之微粒子,可透過使用平均顆粒直徑為10至50 μm者,尤其是球形的微粒子,以製作具有優良的防眩性能之防眩膜。微粒子的平均粒徑比10 μm小時,難以在施加有電鍍之表面形成足夠的凹凸,而變得難以得到足夠的防眩性能。另一方面,微粒子的平均顆粒直徑比50 μm大時,表面凹凸容易變粗糙,而容易產生閃耀或質感降低。在此,於使用平均顆粒直徑為15 μm以下的微粒子進行加工時,宜採用粒子分散在適當的分散媒來進行加工之濕式噴擊法,使粒子不因靜電等而凝集。As the fine particles for colliding with the surface to which the substrate is applied, the anti-glare film having excellent anti-glare properties can be produced by using fine particles having an average particle diameter of 10 to 50 μm, especially spherical particles. When the average particle diameter of the fine particles is smaller than 10 μm, it is difficult to form sufficient irregularities on the surface to which the plating is applied, and it becomes difficult to obtain sufficient anti-glare performance. On the other hand, when the average particle diameter of the fine particles is larger than 50 μm, the surface unevenness is likely to be rough, and glare or texture deterioration is likely to occur. Here, when processing is performed using fine particles having an average particle diameter of 15 μm or less, it is preferable to use a wet spray method in which particles are dispersed in an appropriate dispersion medium, so that the particles are not aggregated by static electricity or the like.

此外,微粒子碰撞時之壓力、微粒子的使用量、從噴射微粒子之噴嘴到金屬表面為止之距離,亦影響到加工後的凹凸形狀,進而影響防眩膜的表面形狀,一般而言,亦可由計示壓力為0.1至0.4MPa程度的壓力、或者處理之金屬表面積每1cm2 為4至12g程度之微粒子量、從噴射微粒子之噴嘴到金屬表面為200mm至600mm程度之距離,只要按照使用之微粒子的種類與顆粒直徑、金屬的種類、噴射微粒子之噴嘴的形狀、所期望之凹凸形狀,來適當地選擇。In addition, the pressure at the time of collision of the fine particles, the amount of the fine particles used, and the distance from the nozzle for spraying the fine particles to the metal surface also affect the uneven shape after the processing, thereby affecting the surface shape of the anti-glare film, and generally, It illustrates a pressure of 0.1 to 0.4MPa degree of pressure, or the processing of the metal surface area per 1cm 2 of 4 to 12g extent of the amount of fine particles, from 200mm to 600mm from the extent of the injection nozzle to the metal surface of fine particles as long as the use of microparticles in accordance with the The type, the particle diameter, the type of the metal, the shape of the nozzle for spraying the fine particles, and the desired uneven shape are appropriately selected.

藉由使微粒子碰撞基材經施加電鍍的表面而形成之凹凸形狀,係任意的剖面曲線之算術平均高度Pa為0.1 μm以上1 μm以下,且該剖面曲線之算術平均高度Pa與平均長度PSm的比率Pa/PSm宜為0.02以上0.1以下。算術平均高度Pa比0.1 μm小,或比率Pa/PSm比0.02小時,在鍍鉻加工前,對凹凸形狀施以鈍化加工時,凹凸表面變成幾近於平坦面,而難以得到所期望的表面形狀之模具。此外,算術平均高度Pa比1 μm還大,或比率Pa/PSm比0.1還大時,不得不以強力的條件來進行鍍鉻加工前的凹凸形狀之鈍化加工,而容易變得難以控制表面形狀。The arithmetic mean height Pa of an arbitrary cross-sectional curve is 0.1 μm or more and 1 μm or less by causing the fine particles to collide with the surface of the substrate to which the plated surface is applied, and the arithmetic mean height Pa of the cross-sectional curve and the average length PSm The ratio Pa/PSm is preferably 0.02 or more and 0.1 or less. The arithmetic mean height Pa is smaller than 0.1 μm, or the ratio Pa/PSm is 0.02 hours. When the concave-convex shape is subjected to passivation processing before the chrome plating process, the uneven surface becomes almost flat, and it is difficult to obtain a desired surface shape. Mold. Further, when the arithmetic mean height Pa is larger than 1 μm or the ratio Pa/PSm is larger than 0.1, the passivation processing of the uneven shape before the chrome plating process has to be performed under strong conditions, and it is easy to make it difficult to control the surface shape.

依此方式,在鍍銅或鍍鎳表面形成有凹凸之基材,施加鈍化凹凸形狀的加工。以鈍化凹凸形狀之加工而言,如參照之前第8圖的(C)及(D)所說明者,宜為蝕刻處理或鍍銅。藉由進行蝕刻處理,以微粒子碰撞而形成之凹凸形狀的銳利部分會消失。藉此,作為模具使用時所製得之防眩膜的光學特性會往適宜的方向變化。此外,由於鍍銅係平滑化作用較強,故鈍化凹凸形狀之效果較鍍鉻強。藉此,作為模具使用時製得之防眩膜的光學特性往適合的方向變化。In this manner, a substrate having irregularities formed on the surface of the copper plating or the nickel plating is processed by applying a passivated uneven shape. For the processing of passivating the uneven shape, as described in (C) and (D) of Fig. 8 above, it is preferable to perform etching treatment or copper plating. By performing the etching treatment, the sharp portion of the uneven shape formed by the collision of the fine particles disappears. Thereby, the optical characteristics of the anti-glare film produced as a mold can be changed in an appropriate direction. In addition, since the copper plating system has a stronger smoothing effect, the effect of passivating the uneven shape is stronger than that of chrome plating. Thereby, the optical characteristics of the anti-glare film produced as a mold are changed in an appropriate direction.

蝕刻處理係通常使用三氯化鐵(FeCl3 )水溶液、二氮化銅(CuCl2 )水溶液、鹼性蝕刻液(Cu(NH3 )4 Cl2 )等,藉由使表面腐蝕來進行,亦可使用塩酸或硫酸等之強酸,還可使用藉由施加與電解電鍍時相反之電位之逆電解蝕刻。施加蝕刻處理後之凹凸的鈍化情況,係依基底金屬的種類、噴擊等手法得到之凹凸的大小與深度等而不同,故不能一概而論,但控制鈍化情況上最大的因素係蝕刻量。在此所謂蝕刻量,係指藉由蝕刻而削除之基材(電鍍層)的厚度。蝕刻量小時,藉由噴擊等之手法得到之凹凸的表面形狀之鈍化效果不充分,而該凹凸形狀轉印到透明薄膜所得到之防眩膜的光學特性不會太理想。另一方面,蝕刻量太大時,由於凹凸形狀幾乎消失,而成為幾近於平坦的模具,故變得無法顯示防眩性。因此,蝕刻量宜設為1 μm以上20 μm以下,並且更宜設為2 μm以上10 μm以下。The etching treatment is usually carried out by using an aqueous solution of ferric chloride (FeCl 3 ), an aqueous solution of copper (CuCl 2 ), an alkaline etching solution (Cu(NH 3 ) 4 Cl 2 ), or the like by etching the surface. A strong acid such as tannic acid or sulfuric acid can be used, and reverse electrolytic etching by applying a potential opposite to that of electrolytic plating can also be used. The passivation of the unevenness after the etching treatment is different depending on the type of the base metal, the size and depth of the unevenness obtained by the spraying method, and the like, and therefore cannot be generalized, but the largest factor in controlling the passivation is the etching amount. The amount of etching referred to herein means the thickness of the substrate (electroplated layer) which is removed by etching. When the etching amount is small, the passivation effect of the surface shape of the unevenness obtained by the method such as spraying is insufficient, and the optical characteristics of the anti-glare film obtained by transferring the uneven shape to the transparent film are not ideal. On the other hand, when the amount of etching is too large, the uneven shape is almost eliminated, and the mold is almost flat. Therefore, the anti-glare property cannot be displayed. Therefore, the etching amount is preferably 1 μm or more and 20 μm or less, and more preferably 2 μm or more and 10 μm or less.

採用鍍銅作為鈍化加工時,凹凸之鈍化情況由於係依基底金屬的種類、噴擊等手法所得到的凹凸之大小與深度,或電鍍的種類與厚度等而不同,故不能一概而論,但控制鈍化情況上最大的因素為電鍍厚度。鍍銅層的厚度薄時,藉由噴擊等之手法得到之凹凸的表面形狀之鈍化效果不充分,且該凹凸形狀轉印到透明薄膜所得到之防眩膜的光學特性不會太理想。另一方面,電鍍厚度太厚時,除了生產性變差之外,由於凹凸形狀幾近於消失,故無法顯現防眩性。因此,鍍銅之厚度宜設為1 μm以上20 μm以下,並且更宜為4 μm以上10 μm以下。When copper plating is used as the passivation process, the passivation of the unevenness is different depending on the type and thickness of the base metal, the size and depth of the unevenness obtained by the method such as the spray, or the type and thickness of the plating, so it cannot be generalized, but the passivation is controlled. The biggest factor in the situation is the plating thickness. When the thickness of the copper plating layer is small, the passivation effect of the surface shape of the unevenness obtained by the method such as spraying is insufficient, and the optical characteristics of the antiglare film obtained by transferring the uneven shape to the transparent film are not ideal. On the other hand, when the plating thickness is too thick, in addition to the deterioration in productivity, since the uneven shape almost disappears, the anti-glare property cannot be exhibited. Therefore, the thickness of the copper plating should be set to 1 μm or more and 20 μm or less, and more preferably 4 μm or more and 10 μm or less.

依此方式,將鍍銅或鍍鎳表面形成有凹凸之基材的表面形狀鈍化後,復施以鍍鉻而更進一步鈍化凹凸的表面之同時,製得該表面硬度提升之金屬板。此時之凹凸的鈍化情況,由於係依基底金屬的種類、噴擊等手法所得到之凹凸的大小與深度,以及電鍍的種類或厚度等而不同,故不能一概而論,但控制鈍化情況最大的因素還是電鍍厚度。鍍鉻層的厚度薄時,鍍鉻加工前所得到之凹凸的表面形狀之鈍化效果不充分,且該凹凸形狀轉印到透明薄膜而得到之防眩膜的光學特性不會太理想。另一方面,電鍍厚度太厚時,除了生產性變差之外,也會產生稱為小結節(nodule)之突起狀電鍍缺陷。因此,鍍鉻之厚度宜設為1 μm以上10 μm以下,並且更宜設為2 μm以上6 μm以下。In this manner, the surface shape of the base material on which the copper plating or the nickel plating surface is formed with the unevenness is passivated, and the surface of the surface hardness is improved while the surface of the uneven surface is further etched by chrome plating. The passivation of the concavities and convexities at this time differs depending on the type and thickness of the underlying metal, the size and depth of the concavities and the like, and the type or thickness of the plating, so it cannot be generalized, but the factor that controls the passivation is the largest. Or plating thickness. When the thickness of the chrome plating layer is small, the passivation effect of the surface shape of the unevenness obtained before the chrome plating process is insufficient, and the optical characteristics of the antiglare film obtained by transferring the uneven shape to the transparent film are not ideal. On the other hand, when the plating thickness is too thick, in addition to deterioration in productivity, a projection-like plating defect called a small nodule is generated. Therefore, the thickness of the chrome plating should be set to 1 μm or more and 10 μm or less, and more preferably 2 μm or more and 6 μm or less.

在本發明中,係採用於平板與滾筒等之表面有光澤、硬度高、摩擦係數小、且可提供良好的脫模性之鍍鉻。鍍鉻的種類並無特別制限,但宜使用被稱為所謂光澤鍍鉻或裝飾用鍍鉻等呈現良好光澤之鍍鉻。鍍鉻通常係利用電解來進行,而以該鍍浴(Plating Bath)而言,係使用含有鉻酸酐(CrO3 )與少量硫酸的水溶液。藉由調解電流密度與電解時間,可控制鍍鉻的厚度。In the present invention, it is used for chrome plating having a glossy surface, a high hardness, a small friction coefficient, and a good mold release property. The type of chrome plating is not particularly limited, but it is preferable to use chrome plating which is called gloss chrome plating or decorative chrome plating which exhibits good gloss. The chrome plating is usually carried out by electrolysis, and in the case of the plating bath, an aqueous solution containing chromic anhydride (CrO 3 ) and a small amount of sulfuric acid is used. The thickness of the chrome can be controlled by adjusting the current density and the electrolysis time.

施以鍍鉻的模具表面,其維克氏硬度(Vickers hardness)宜為800以上,較宜為1000以上。維克氏硬度低時,除了模具使用時的耐久性降低之外,因鍍鉻而使硬度降低之現象,於電鍍處理時,在鍍浴組成與電解條件等產生異常之可能性高,且在缺陷之產生狀況上造成不好的影響之可能性亦高。The surface of the chrome-plated mold is preferably a Vickers hardness of 800 or more, more preferably 1,000 or more. When the Vickers hardness is low, in addition to the decrease in durability when the mold is used, the hardness is lowered by chrome plating, and the plating bath composition is highly likely to cause an abnormality in the plating bath composition and the electrolytic condition, and is defective. The possibility of causing a bad influence on the production situation is also high.

在先前技術欄揭示之日本特開2002-189106號公報、特開2004-45472號公報、特開2004-90187號公報等,雖揭示有採用鍍鉻,但依模具之電鍍前的基底與鍍鉻之種類,多數於電鍍後會發生表面粗糙,或鍍鉻引起之微小的裂痕,結果,所製作之防眩層的光學特性會往不適宜的方向發展。電鍍表面為粗糙的狀態者,不適合作為防眩膜用的金屬模具。此乃因一般為了消除閃耀而在鍍鉻後對電鍍表面進行研磨,但如後述,在本發明中,電鍍後之表面的研磨並不適宜。在本發明中,透過在基底金屬施以鍍銅或鍍鎳,而解除了因鍍鉻而容易產生的不良情況。In the prior art, Japanese Laid-Open Patent Publication No. 2002-189106, JP-A-2004-45472, and JP-A-2004-90187, etc., disclose the use of chrome plating, but the type of substrate and chrome plating before plating according to the mold. Most of them will have surface roughness or slight cracks caused by chrome plating after plating. As a result, the optical properties of the anti-glare layer produced will develop in an unsuitable direction. The plated surface is rough and is not suitable as a metal mold for anti-glare film. This is because the plating surface is usually polished after chrome plating in order to eliminate the glare, but as will be described later, in the present invention, the polishing of the surface after plating is not preferable. In the present invention, by applying copper plating or nickel plating to the base metal, the problem that is easily caused by chrome plating is released.

施加鍍鉻前不施以鈍化凹凸形狀之加工時,為了使以微粒子碰撞而形成的凹凸形狀之銳利部分充分鈍化,必須加厚鍍鉻。然而,鍍鉻的厚度太厚時,由於容易產生小結節而不適宜。此外,使鍍鉻之厚度變薄時,無法將以微粒子碰撞而形成之凹凸形狀充分地鈍化,而得不到所期望之表面形狀的模具,故使用該模具製作之防眩膜亦無法表現優良的防眩性能。In the case where the passivation uneven shape is not applied before the chrome plating is applied, in order to sufficiently passivate the sharp portion of the uneven shape formed by the collision of the fine particles, it is necessary to thicken the chrome plating. However, when the thickness of the chrome plating is too thick, it is not preferable because it is easy to produce small nodules. Further, when the thickness of the chrome plating is made thin, the uneven shape formed by the collision of the fine particles cannot be sufficiently passivated, and the mold having the desired surface shape cannot be obtained, so that the antiglare film produced by using the mold cannot be excellent. Anti-glare performance.

於日本特開2002-189106號公報記載有藉由噴砂法與珠擊法對鐵的表面施以鍍鉻之滾筒形成凹凸模面後,再施加鍍鉻之技術,而於日本特開平6-34961號公報記載有於金屬表面利用蝕刻與噴砂等的手法形成凹凸之技術,此外,於日本特開2004-29240號公報及特開2004-90187號公報記載有在滾筒表面施加珠擊法與噴擊處理等之技術。但是,並未提及如本發明所示之方法,在以微粒子碰撞形成凹凸形狀後對表面形狀積極地施加鈍化之加工,再施以鍍鉻加工來鈍化表面凹凸形狀之方法,依據本案發明人等的檢討,若未如本發明所示之方法積極地施以鈍化表面形狀之加工,便無法製造具有優良的防眩性能之防眩膜。Japanese Laid-Open Patent Publication No. 2002-189106 discloses a technique in which a chrome-plated roller is formed on a surface of iron by a sand blasting method and a bead blasting method, and then a chrome plating technique is applied, and a technique of chrome plating is applied. A technique of forming a concavity and convexity by a method such as etching or sand blasting on a metal surface, and a method of applying a bead blasting method and a blasting treatment to a surface of a drum is described in Japanese Laid-Open Patent Publication No. 2004-29240 and No. 2004-90187. Technology. However, there is no mention of a method according to the present invention, in which a process of positively applying a passivation to a surface shape after collision of fine particles is formed, and a chrome plating process is applied to passivate the surface uneven shape, according to the inventor of the present invention. In the review, if the process of the passivated surface shape is not actively applied as in the method of the present invention, an anti-glare film having excellent anti-glare properties cannot be produced.

另外,不宜在形成有凹凸的金屬表面施以鍍鉻以外之電鍍。此係由於在鍍鉻以外之電鍍,硬度與耐摩耗性變低,而降低作為模具之耐久性,且易於使用中使凹凸受到磨損,或使模具損傷。從此種模具得到之防眩膜,難以得到充分的防眩功能之可能性較高,再者,在薄膜上產生缺陷之可能性亦高。Further, it is not preferable to apply plating other than chrome plating to the surface of the metal on which the irregularities are formed. In this case, since plating and plating are performed in addition to chrome plating, the hardness and the abrasion resistance are lowered, and the durability as a mold is lowered, and the unevenness is easily worn or the mold is damaged during use. The antiglare film obtained from such a mold is highly likely to have a sufficient antiglare function, and further, there is a high possibility that defects are generated in the film.

如於前述日本特開2004-90187號公報等所揭示,即研磨電鍍後的表面,在本發明並不適宜。理由在於由於藉由研磨,會在最表面產生平坦的部分,可能導致光學特性的悪化,或由於形狀的控制因素增加,而使再現性佳的形狀控制變為困難。第9圖係以微粒子碰撞得到的凹凸形狀之鈍化加工,在此,施加第8圖(C1)所示的蝕刻處理後,相同地對施加有(D1)所示之鍍鉻的面予以研磨時,產生平坦面的金屬板之剖面示意圖。形成在鍍銅或鍍鎳層42的表面之鍍鉻層47的表面凹凸48中,藉由研磨削除一部分凸部而產生平坦面49。於第9圖係表示對第8圖的(D1)所示之蝕刻後鍍鉻的表面進行研磨時之例,而進行第8圖之(D2)所示之鍍銅後鍍鉻時,若亦將該表面研磨,便同樣地產生平坦面。As disclosed in Japanese Laid-Open Patent Publication No. 2004-90187, the surface after polishing is not suitable for the present invention. The reason is that since the flat portion is generated on the outermost surface by the polishing, the optical characteristics may be degraded, or the shape control factor may be increased, and the shape control with good reproducibility may become difficult. Fig. 9 is a passivation process of the concavo-convex shape obtained by collision of fine particles. Here, after the etching treatment shown in Fig. 8 (C1) is applied, the surface to which the chrome plating shown by (D1) is applied is similarly polished. A schematic cross-sectional view of a metal sheet that produces a flat surface. In the surface unevenness 48 of the chrome plating layer 47 formed on the surface of the copper plating or nickel plating layer 42, a flat surface 49 is produced by grinding a part of the convex portion. Fig. 9 is a view showing an example of polishing the surface of the chrome plated after etching shown in (D1) of Fig. 8, and when chrome plating after copper plating shown in Fig. 8 (D2), The surface is ground to produce a flat surface.

其次,說明有關使用藉此方式得到之金屬模具,來製造防眩膜之步驟。藉由將以如上面說明之方法得到之金屬模具的形狀轉印到磁明樹脂薄膜,可得到防眩膜。模具形狀轉印到薄膜,宜藉由壓紋來進行。以壓紋而言,例示有使用光硬化性樹脂之UV壓紋法,使用熱可塑性樹脂之熱壓紋法。Next, a step of manufacturing an anti-glare film using the metal mold obtained by this method will be described. An anti-glare film can be obtained by transferring the shape of the metal mold obtained by the method as described above to the magnetic resin film. The shape of the mold is transferred to the film, which is preferably carried out by embossing. In the embossing, a UV embossing method using a photocurable resin and a thermal embossing method using a thermoplastic resin are exemplified.

在UV壓紋法中,係以在透明基材薄膜的表面形成光硬化性樹脂層,且一邊將該光硬化性樹脂層按壓在模具之凹凸面一邊使之硬化的方式,而將模具之凹凸面轉印到光硬化性樹脂層。具體而言,藉由於透明的基材薄膜上塗布紫外線硬化型樹脂,且將塗布之紫外線硬化型樹脂密合於金屬模具之狀態,從透明基材薄膜側照射紫外線而使紫外線硬化型樹脂硬化,之後從金屬模具將由硬化後的紫外線硬化型樹脂層所形成之透明基材薄膜予以剝離,而將金屬模具的形狀轉印到紫外線硬化型樹脂。紫外線硬化型樹脂的種類並無特別限制。此外,雖以紫外線硬化型樹脂表示,但透過適當選定光起始劑,比紫外線波長更長的可見光也能硬化之樹脂亦可使用。亦即,在此所謂的紫外線硬化型樹脂,亦包含此種可見光硬化型樹脂之總稱。另一方面,在熱壓紋法中,係以加熱狀態將透明的熱可塑性樹脂薄膜按壓在金屬模具,並將模具的表面形狀轉印到熱可塑性樹脂薄膜。在此等壓紋法中,從生產性的觀點來看,以UV壓紋法為佳。In the UV embossing method, a photocurable resin layer is formed on the surface of the transparent base film, and the photocurable resin layer is pressed against the uneven surface of the mold to be cured. The surface was transferred to a photocurable resin layer. Specifically, the ultraviolet curable resin is applied to the transparent base film, and the applied ultraviolet curable resin is adhered to the metal mold, and the ultraviolet curable resin is cured by irradiating ultraviolet rays from the transparent base film side. Thereafter, the transparent base film formed of the cured ultraviolet curable resin layer is peeled off from the metal mold, and the shape of the metal mold is transferred to the ultraviolet curable resin. The type of the ultraviolet curable resin is not particularly limited. Further, although it is represented by an ultraviolet curable resin, a resin which can be hardened by visible light having a wavelength longer than the ultraviolet light can be used by appropriately selecting a photoinitiator. In other words, the ultraviolet curable resin referred to herein also includes a general term for such a visible light curable resin. On the other hand, in the hot embossing method, a transparent thermoplastic resin film is pressed against a metal mold in a heated state, and the surface shape of the mold is transferred to the thermoplastic resin film. Among these embossing methods, the UV embossing method is preferred from the viewpoint of productivity.

可使用於防眩膜的製作之透明基材薄膜,實質上係只要於光學上為透明即可,可舉出例如:三乙酸纖維素(Triacetylcellulose)薄膜,聚對苯二甲酸乙二酯薄膜等之樹脂薄膜。The transparent base film which can be used for the production of the anti-glare film is substantially optically transparent, and examples thereof include a triacetyl cellulose film and a polyethylene terephthalate film. Resin film.

以紫外線硬化型樹脂而言,可使用市面販賣者。例如,將三羥甲基丙烷三丙烯酸酯(Trimethylol Propane Triacrylate)、季戊四醇四丙烯酸酯(pentaerythritol tetraacrylate)等多官能丙烯酸鹽,分別單獨使用或混合上述2種以上來使用,此外,可將混合“irgacure-907”、“irgacure184”(以上,Ciba Specialty Chemicals公司製造),"Lucirin TPO"(BASF公司製造)等之光聚合起始劑,作為紫外線硬化型樹脂。For the ultraviolet curable resin, a market seller can be used. For example, a polyfunctional acrylate such as Trimethylol Propane Triacrylate or pentaerythritol tetraacrylate may be used alone or in combination of two or more kinds thereof, and "irgacure" may be mixed. A photopolymerization initiator such as -907", "irgacure 184" (above, manufactured by Ciba Specialty Chemicals Co., Ltd.), "Lucirin TPO" (manufactured by BASF Corporation), or the like is used as an ultraviolet curable resin.

以使用於熱壓紋法之熱可塑性透明樹脂薄膜而言,實質上只要是透明者則任意材質皆可,例如,可使用以聚甲基丙烯酸甲酯、聚碳酸酯、聚對苯二甲酸乙二酯、三乙酸纖維素、降烯(Norbornene)系化合物為單體之非晶性環狀聚烯烴等之熱可塑性樹脂的溶劑鑄膜或擠製薄膜等。此等透明樹脂薄膜亦可成為採用以上說明的UV壓紋法時的透明基材薄膜。The thermoplastic transparent resin film used in the heat embossing method may be any material as long as it is transparent. For example, polymethyl methacrylate, polycarbonate, or polyethylene terephthalate may be used. Diester, cellulose triacetate, drop The Norbornene-based compound is a solvent cast film or an extruded film of a thermoplastic resin such as a monomeric amorphous cyclic polyolefin. These transparent resin films may also be transparent substrate films in the case of the UV embossing method described above.

如以上構成之本發明的防眩膜由於防眩效果佳,且可有效防止白化,故裝設於影像顯示裝置時辨識性佳。影像顯示裝置為液晶面板時,可將此防眩膜積層於偏光膜。亦即,一般而言偏光膜係多為於由吸附配向有碘或二色性染料之聚乙烯醇系樹脂薄膜所構成的偏光元件之至少一面積層有保護薄膜之形狀者,而於此種偏光膜之一方的面,若貼合如上述之賦予凹凸的防眩膜,便成為防眩性的偏光膜。此外,亦可藉由將如上述之賦予防眩性凹凸之薄膜,使用為保護薄膜兼防眩層,且以該凹凸面成為外側之方式貼合於偏光元件的一面,而作為防眩性的偏光膜。再者,在積層有保護薄膜之偏光膜中,透過於其罩面保護薄膜的表面賦予上述類型的防眩性的凹凸,亦可作為防眩性的偏光膜。The anti-glare film of the present invention having the above configuration is excellent in anti-glare effect and can effectively prevent whitening, so that it is excellent in visibility when mounted on an image display device. When the image display device is a liquid crystal panel, the anti-glare film can be laminated on the polarizing film. In other words, in general, the polarizing film is a shape of a protective film in at least one area of a polarizing element composed of a polyvinyl alcohol-based resin film which is adsorbed and bound to an iodine or a dichroic dye, and is polarized. When one of the surfaces of the film is bonded to the antiglare film which imparts irregularities as described above, it becomes an antiglare polarizing film. In addition, the film which is provided with the anti-glare unevenness as described above may be used as a protective film and an anti-glare layer, and may be bonded to one surface of the polarizing element so that the uneven surface is outward. Polarized film. Further, in the polarizing film in which the protective film is laminated, the anti-glare unevenness of the above type is imparted to the surface of the overcoat protective film, and it can also be used as an anti-glare polarizing film.

本發明之影像顯示裝置,係將具有如以上說明之特定的表面形狀之防眩膜與影像顯示手段組合者。在此影像顯示手段係以具備於上下基板間封入有液晶的液晶元件,並藉由施加的電壓使液晶的配向狀態變化而進行影像的顯示之液晶面板為代表性的顯示手段,但對於其他電漿顯示器面板、CRT面板、有機EL面板等一般熟知的各種面板,亦可適用本發明之防眩膜。而且,將上述之防眩膜配置於較影像顯示手段更靠辨識側,而構成影像顯示裝置。此時,防眩膜之凹凸面以成為外側(辨識側)的方式配置。防眩膜係亦可直接貼合於影像顯示手段之表面,或以液晶面板作為影像顯示手段時,例如前述,亦可介著偏光膜貼合在液晶面板之表面。如此具備本發明之防眩膜的影像顯示裝置,可藉由防眩膜具有之表面的凹凸將入射光予以散射來模糊映入影像,而提供優良的辨識性。The image display device of the present invention is a combination of an anti-glare film having a specific surface shape as described above and an image display means. In the image display means, a liquid crystal panel including a liquid crystal element in which a liquid crystal is sealed between the upper and lower substrates, and a liquid crystal alignment state is changed by an applied voltage, and a liquid crystal panel is displayed as a representative display means, but other electric power is used. The anti-glare film of the present invention can also be applied to various panels which are generally known, such as a slurry display panel, a CRT panel, and an organic EL panel. Further, the anti-glare film described above is disposed on the identification side of the image display means to constitute an image display device. At this time, the uneven surface of the anti-glare film is disposed so as to be the outer side (identification side). The anti-glare film may be directly bonded to the surface of the image display means, or when the liquid crystal panel is used as the image display means, for example, the polarizing film may be bonded to the surface of the liquid crystal panel. In the image display device having the anti-glare film of the present invention, the incident light can be scattered by the unevenness on the surface of the anti-glare film to blur the image, thereby providing excellent visibility.

此外,即使在將本發明的防眩膜使用於高度精細的影像顯示裝置時,亦不產生於習知的防眩膜所見的閃耀,而成為兼具低模糊度的同時,具有充分的防止映入、防止白化、抑制閃耀之性能者。Further, even when the anti-glare film of the present invention is used in a highly-fine image display device, it does not occur in the glare seen by the conventional anti-glare film, and has a low blurring degree and a sufficient anti-reflection film. Into, prevent whitening, and suppress the performance of shine.

以下揭示實施例,更具體地說明本發明,但本發明不受這些例子所限定。以下的例子之模具或防眩膜的評估方法如下。The invention is more specifically described below by way of examples, but the invention is not limited by these examples. The evaluation method of the mold or anti-glare film of the following examples is as follows.

1.模具的維克氏硬度之測量使用Krautkramer公司製造的超音波硬度計“MIC10”,且以依照JIS Z 2244之方法來測量維克氏硬度。測量僅於模具本身之表面進行。1. Measurement of Vickers hardness of a mold An ultrasonic hardness tester "MIC10" manufactured by Krautkramer Co., Ltd. was used, and Vickers hardness was measured in accordance with the method according to JIS Z 2244. The measurement is performed only on the surface of the mold itself.

2.防眩膜之光學特性的測量(反射率)從相對於薄膜法線呈30°傾斜之方向,照射來自He-Ne雷射之平行光線到防眩膜之凹凸面,來進行包含薄膜法線與照射方向的平面內之反射率的角度變化之測量。反射率之測量係皆使用横河電機(股)製造的“3292 03光電感測器”與“3292光功率計”。2. The measurement of the optical characteristics of the anti-glare film (reflectance) is performed by irradiating the parallel light from the He-Ne laser to the uneven surface of the anti-glare film from a direction inclined by 30° with respect to the normal line of the film. Measurement of the angular change in reflectance in the plane of the line and the direction of illumination. The reflectance measurement system uses the "3292 03 Optical Inductance Detector" and the "3292 Optical Power Meter" manufactured by Yokogawa Electric Co., Ltd.

(模糊度)使用符合JIS K 7136之村上色彩技術研究所(股)製造的模糊度儀“HM-150”型來測量防眩膜的模糊度。於進行測量時,為了防止樣本的翹曲,使用光學上為透明之黏著劑且以凹凸面成為表面之方式貼合於玻璃基板,並以該狀態進行測量。(Fuzziness) The ambiguity of the anti-glare film was measured using a ambiguity meter "HM-150" type manufactured by Murakami Color Technology Research Institute (JIS K 7136). In order to prevent warping of the sample, an optically transparent adhesive is applied to the glass substrate so that the uneven surface becomes a surface, and measurement is performed in this state.

(穿透鮮明度)使用符合JIS K 7105之SUGA試驗機(股)製造的映像性測量器“ICW-1DP”,來測量防眩膜的穿透鮮明度。此時亦為了防止樣本翹曲,使用光學上為透明的黏著劑且以凹凸面成為表面之方式貼合於玻璃基板後進行測量。以此狀態,使光線由玻璃側入射並進行測量。在此之測量值係使用暗部與亮部的寬度分別為0.125mm、0.5mm、1.0mm以及2.0mm之4種光梳所測量的值之合計值。此時的穿透鮮明度之最大值為400%。(Penetration sharpness) The visibility of the anti-glare film was measured using an image measuring instrument "ICW-1DP" manufactured by a SUGA test machine (JIS K 7105). At this time, in order to prevent the sample from being warped, the optically transparent adhesive was used, and the glass substrate was bonded to the surface so that the uneven surface became the surface, and then the measurement was performed. In this state, light is incident from the glass side and measured. The measured value here is the total value of the values measured by the four types of optical combs having the widths of the dark portion and the bright portion of 0.125 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively. The maximum penetration clarity at this time is 400%.

(反射鮮明度)使用與上述相同的映像性測量器“ICW-1DP”來測量防眩膜的反射鮮明度。此時,亦為了防止樣本的翹曲,使用光學上為透明的黏著劑且以凹凸面為表面之方式貼合於玻璃基板後進行測量。此外,為了防止來自背面玻璃面的反射,以水使2mm厚度的黒色丙烯酸樹脂板密合於貼有防眩膜之玻璃板的玻璃面,並以此狀態從樣本(防眩膜)側使光入射,進行測量。在此之測量值,如前述,係使用暗部與亮部的寬度分別為0.5mm、1.0mm以及2.0mm之3種光梳進行測量之值的合計值。(Reflective Brightness) The reflection sharpness of the anti-glare film was measured using the same image measuring instrument "ICW-1DP" as described above. At this time, in order to prevent the warpage of the sample, an optically transparent adhesive was used, and the glass substrate was bonded to the surface with the uneven surface as a surface, and then the measurement was performed. Further, in order to prevent reflection from the back glass surface, a 2 mm-thick ochre acrylic plate is adhered to the glass surface of the glass plate to which the anti-glare film is attached with water, and light is emitted from the sample (anti-glare film) side in this state. Incident, measurement. The measured value here is a total value of the values measured by using three types of optical combs having a width of the dark portion and the bright portion of 0.5 mm, 1.0 mm, and 2.0 mm as described above.

3.防眩膜的表面形狀之測量使用Sensofar公司製造的共焦點顯微鏡“PL μ 2300”來測量防眩膜的表面形狀。此時,亦為了防止樣本的翹曲,使用光學上為透明的黏著劑且以凹凸面為表面之方式貼合於玻璃基板之後進行測量。測量時,接物鏡的倍率設為50倍,並降低解像度來進行測量。此係以高解像度測量時,會測量到樣本表面之細小的凹凸,而影響到凸部的計數之故。3. Measurement of surface shape of anti-glare film The surface shape of the anti-glare film was measured using a confocal microscope "PL μ 2300" manufactured by Sensofar Co., Ltd. At this time, in order to prevent the warpage of the sample, an optically transparent adhesive was applied and the surface of the glass substrate was attached so that the uneven surface was a surface, and then the measurement was performed. When measuring, the magnification of the objective lens is set to 50 times, and the resolution is lowered to perform measurement. When measuring with high resolution, the small unevenness of the sample surface is measured, which affects the counting of the convex portion.

(剖面曲線之算術平均高度Pa,最大剖面高度Pt及平均長度PSm)以上述得到之測量資料為基礎,並藉由依照JIS B 0601之計算,來求取算術平均高度Pa、最大剖面高度Pt、及平均長度PSm。(The arithmetic mean height Pa of the profile curve, the maximum profile height Pt and the average length PSm) are based on the measurement data obtained above, and the arithmetic mean height Pa, the maximum profile height Pt, and the calculation are performed according to JIS B 0601. And the average length PSm.

(標高柱形圖)以利用以上的測量得到之防眩膜表面各點的三次元座標值為基礎,並依照上述的演算法將峰值(高度100%)與最低點(高度0%)之間以5%單位予以分割,而作成柱形圖,並求取其峰值位置。(the elevation column chart) is based on the ternary coordinate value of each point on the surface of the anti-glare film obtained by the above measurement, and the peak (height 100%) and the lowest point (height 0%) are obtained according to the above algorithm. Divide in 5% units, and make a column chart and find its peak position.

(凸部個數)以利用上述的測量得到之防眩膜表面各點的三次元座標值為基礎,依照先前參照第4圖所說明的演算法,求取存在於200 μm×200 μm的區域內之凸部的數目。(the number of convex portions) is based on the ternary coordinate value of each point on the surface of the anti-glare film obtained by the above measurement, and is obtained in an area of 200 μm × 200 μm according to the algorithm previously described with reference to FIG. The number of convex parts inside.

(進行凡羅諾依分割時之凡羅諾依多角形平均面積)以利用上述的測量得到之防眩膜表面各點的三次元座標值為基礎,依據先前參照第5圖所說明的演算法來計算,並求取凡羅諾依多角形的平均面積。(The average area of the polygon of the Ronoluoyi when performing the Ronoluo division) is based on the ternary coordinate value of each point on the surface of the anti-glare film obtained by the above measurement, according to the algorithm previously described with reference to FIG. To calculate and find the average area of the Van Rooney polygon.

4.防眩膜之防眩性能的評估(反射、白化及質感的目視評估)為了防止來自防眩膜的背面之反射,以凹凸面為表面之方式貼合防眩膜於黒色丙烯酸樹脂板,且在點亮有螢光燈之明亮的室內從凹凸面側以目視觀察,並以目視來評估螢光燈之映入的有無、白化之程度及質感。映入、白化以及質感,係分別在1到3的三段階並依據下述基準來進行評估。4. Evaluation of anti-glare performance of anti-glare film (visual evaluation of reflection, whitening, and texture) In order to prevent reflection from the back surface of the anti-glare film, an anti-glare film is attached to the green acrylic resin plate so that the uneven surface is a surface. In the bright room where the fluorescent lamp was lit, the surface of the uneven surface was visually observed, and the presence or absence of the fluorescent lamp, the degree of whitening, and the texture were visually evaluated. The reflection, whitening, and texture were evaluated in the three-stage order of 1 to 3, respectively, according to the following criteria.

映入 1.沒觀察到映入3.稍觀察到映入4.明確地觀察到映入 Reflected in 1. No observed reflection 3. Slightly observed to reflect 4. Obviously observed to reflect

白化 1.沒觀察到白化2.稍觀察到白化3.明確地觀察到白化 Whitening 1. No whitening was observed 2. A little whitening was observed 3. Clearly observed whitening

質感 1.跡點細小,質感佳,2.跡點稍粗,質感稍差,3.跡點明顯粗,質感差, Texture 1. The traces are small and the texture is good. 2. The traces are slightly thicker and the texture is slightly worse. 3. The traces are obviously thick and the texture is poor.

(閃耀之評估)閃耀係利用先前參照第6圖及第7圖所說明之方法來評估。亦即,製作具有第6圖所示之單元體的圖案之光罩,將其如第7圖所示,使光罩33之鉻遮光圖案31朝上並將其設置在光箱35,且將以20 μm厚度的黏著劑貼合防眩膜2於1.1mm厚的玻璃板37之樣本設置在光罩33上,並藉由從離樣本約30cm之位置39進行目視觀察,以7階段對閃耀之程度進行官能評估。級數1係閃耀完全未被確認之狀態,而級數7係為嚴重地觀察到閃耀之狀態,級數3係僅些微觀察到閃耀之狀態。另外,光罩之單元體,係使用第6圖之單元體縱×單元體橫為254 μm×84 μm,也就是第6圖之開口部縱×開口部橫為244 μm×74 μm者。(Evaluation of Shine) The blaze is evaluated using the method previously described with reference to Figures 6 and 7. That is, a reticle having a pattern of the unit body shown in FIG. 6 is formed, as shown in FIG. 7, the chrome-shielding pattern 31 of the reticle 33 is directed upward and placed in the light box 35, and A sample of the anti-glare film 2 adhered to the 1.1 mm-thick glass plate 37 with a thickness of 20 μm was placed on the reticle 33, and was visually observed by a position 39 from a position of about 30 cm from the sample, and the glare was performed in 7 stages. The degree of fascia evaluation. The number 1 is a state in which the blaze is completely unconfirmed, while the number 7 is a state in which the glare is severely observed, and the gradation 3 is only slightly observed in the state of glare. Further, in the unit body of the photomask, the horizontal length of the unit body and the horizontal direction of the unit body in Fig. 6 are 254 μm × 84 μm, that is, the opening portion of the sixth drawing and the horizontal portion of the opening portion are 244 μm × 74 μm.

[實施例1][Example 1]

準備於直徑200mm之鐵滾筒(依JIS之STKM13A)的表面經施以銅Ballard電鍍(Ballard plating)之元件。銅Ballard電鍍係由鍍銅層/薄的鍍銀層/表面鍍銅層所構成者,而整個電鍍層的厚度係約200 μm。將該鍍銅表面進行鏡面研磨,復於該研磨面,使用噴擊裝置(不二製作所(股)製造),並將TOSOH(股)製造的氧化鋯珠子“TZ-SX-17”(商品名,平均顆粒直徑20 μm),以珠子使用量8g/cm2 (滾筒的表面積每1cm2 的使用量,以下稱為「噴擊量」)、噴擊壓力0.25MPa(計示壓力,以下相同)、從噴射微粒子之噴嘴到金屬表面為止之距離300mm(以下稱為「噴擊距離」)之條件進行噴擊,而於表面形成凹凸。對於得到之具有凹凸之鍍銅鐵滾筒,以二氯化銅水溶液進行蝕刻。此時之蝕刻量係設定為4 μm。之後,進行鍍鉻加工,而製得金屬模具。此時,鍍鉻厚度設定為4 μm。得到的模具之表面的維克氏硬度為1,000。A surface of a 200 mm diameter iron drum (STKM13A according to JIS) was subjected to a copper ballard plating element. The copper Ballard plating system is composed of a copper plating layer/thin silver plating layer/surface copper plating layer, and the entire plating layer has a thickness of about 200 μm. The copper-plated surface was mirror-polished, and the glazed beads "TZ-SX-17" (trade name) manufactured by TOSOH (stock) was used in the polishing surface. , the average particle diameter is 20 μm), the amount of beads used is 8 g/cm 2 (the amount of surface area per 1 cm 2 of the drum, hereinafter referred to as "spray amount"), and the spray pressure is 0.25 MPa (measurement pressure, the same applies hereinafter) The nozzle is sprayed from a nozzle that sprays fine particles to a metal surface at a distance of 300 mm (hereinafter referred to as "spray distance"), and irregularities are formed on the surface. The obtained copper-plated iron drum having irregularities was etched with an aqueous solution of copper dichloride. The etching amount at this time was set to 4 μm. Thereafter, chrome plating was performed to obtain a metal mold. At this time, the chrome plating thickness was set to 4 μm. The surface of the obtained mold had a Vickers hardness of 1,000.

另外,將大日本印墨化學工業(股)製造之光硬化性樹脂組成物“GRANDIC 806T”(商品名)溶解在乙酸乙酯,成為50重量%濃度之溶液,再者,將為光聚合起始劑之“Lucirin T PO”(BASF公司製造,化學名:氧化三甲基苯二苯膦(2,4,6-trimethylbenzoyldiphenylphosphine oxide)),於每硬化性樹脂成分100重量份添加5重量份來調製塗布液。於厚度80 μm的三乙酸纖維素(TAC)薄膜上,以乾燥後的塗布厚度成為5 μm之方式塗布該塗布液,且在設定為60℃之乾燥機中乾燥3分鐘。將乾燥後之薄膜,以光硬化性樹脂組成物層在模具側之方式以橡膠滾筒按壓而使之密合於以上述方式製作之金屬模具的凹凸面。以此狀態,從TAC薄膜側,將來自強度20mW/cm2 之高壓水銀燈的光,以h線換算光量為200mJ/cm2 之方式予以照射,而使光硬化性樹脂組成物層硬化。之後,將TAC薄膜連同硬化樹脂一起從模具剝離,而得到於表面由具有凹凸之硬化樹脂與TAC薄膜的積層體所構成之透明防眩膜。In addition, the photocurable resin composition "GRANDIC 806T" (trade name) manufactured by Dainippon Ink Chemical Industry Co., Ltd. was dissolved in ethyl acetate to obtain a 50% by weight solution, and further, it will be photopolymerized. "Lucirin T PO" (manufactured by BASF Corporation, chemical name: 2,4,6-trimethylbenzoyldiphenylphosphine oxide), added 5 parts by weight per 100 parts by weight of the curable resin component The coating liquid was prepared. The coating liquid was applied to a cellulose triacetate (TAC) film having a thickness of 80 μm so as to have a coating thickness after drying of 5 μm, and dried in a dryer set at 60 ° C for 3 minutes. The dried film is pressed against the mold side by a rubber roller so that the photocurable resin composition layer is adhered to the uneven surface of the metal mold produced in the above manner. In this state, light from a high-pressure mercury lamp having a strength of 20 mW/cm 2 was irradiated from the TAC film side so that the amount of light converted into h lines was 200 mJ/cm 2 to cure the photocurable resin composition layer. Thereafter, the TAC film was peeled off from the mold together with the cured resin, and a transparent antiglare film having a layered body of a cured resin having irregularities and a TAC film was obtained.

關於得到之防眩膜,藉由上述手法對光學特性、凹凸表面形狀、以及防眩性能進行評估,並將其結果,與模具的製作條件同時表示於表1。此外,將反射率測量時得到之反射光的散射特性(反射分布曲線圖)表示於第10圖,且將標高的柱形圖表示於第11圖。另外,表1(A)中之反射鮮明度及穿透鮮明度的細目如下。With respect to the obtained antiglare film, the optical characteristics, the uneven surface shape, and the antiglare property were evaluated by the above-described methods, and the results were shown in Table 1 together with the mold production conditions. Further, the scattering characteristic (reflection profile) of the reflected light obtained at the time of measuring the reflectance is shown in Fig. 10, and the histogram of the elevation is shown in Fig. 11. In addition, the details of the reflection sharpness and the penetration sharpness in Table 1 (A) are as follows.

[第2至第3實施例以及第1至第2比較例][Second to Third Embodiments and First to Second Comparative Examples]

將模具製作時之噴擊壓力變更為如表1,而其他與第1實施例相同的方式,製作於表面具有凹凸之金屬模具。在任一例中得到的模具表面的維克氏硬度皆為1,000。使用各別的模具,以與第1實施例相同的方式,製造在表面由具有凹凸之硬化樹脂與TAC薄膜之積層體所構成之透明的防眩膜。將得到之防眩膜的光學特性、表面形狀以及防眩性能,與模具的製作條件同時表示於表1。在表1中,(A)係彙整模具製作條件與防眩膜的光學特性者,而(B)係彙整防眩膜的表面形狀與防眩性能者。The spray pressure at the time of mold production was changed to Table 1, and other metal molds having irregularities on the surface were produced in the same manner as in the first embodiment. The surface of the mold obtained in either case had a Vickers hardness of 1,000. A transparent antiglare film comprising a laminate of a cured resin having irregularities and a TAC film on the surface was produced in the same manner as in the first embodiment using a separate mold. The optical characteristics, surface shape, and antiglare property of the obtained antiglare film are shown in Table 1 together with the production conditions of the mold. In Table 1, (A) is a mold forming condition and an optical characteristic of an anti-glare film, and (B) is a surface shape and an anti-glare property of the anti-glare film.

此外,關於第2實施例及第3實施例,係分別將防眩膜之反射剖面的曲線圖與第1實施例的結果同時表示於第10圖,且將標高的柱形圖與第1實施例的結果同時表示於第11圖。關於第1比較例及第2比較例,係分別將防眩膜之反射分布的曲線圖表示於第12圖,且將標高的柱形圖表示於第13圖。In addition, in the second embodiment and the third embodiment, the graph of the reflection cross section of the anti-glare film and the result of the first embodiment are respectively shown in Fig. 10, and the columnar view of the elevation and the first embodiment are shown. The results of the examples are also shown in Figure 11. In the first comparative example and the second comparative example, a graph showing the reflection distribution of the anti-glare film is shown in Fig. 12, and a histogram of the elevation is shown in Fig. 13.

[第4實施例][Fourth embodiment]

除了將模具製作時的噴擊壓力變更為0.3MPa,將噴擊距離變更為450mm之外,其他與第1實施例相同地進行滾筒表面的噴擊加工,之後,採用鍍銅作為凹凸形狀之鈍化加工,且將此時之電鍍厚度設定為8 μm,其他係以與第1實施例相同的方式,製作表面具有凹凸之金屬模具。得到的模具之表面的維克氏硬度為1,000。使用該模具,以與第1實施例相同的方式,製作在表面由具有凹凸之硬化樹脂與TAC薄膜的積層體所構成之透明的防眩膜。將得到之防眩膜的光學特性、表面形狀以及防眩性能,與模具之製作條件同時表示於表1。此外,各別將防眩膜的反射剖面之曲線圖與第1比較例及第2比較例的結果同時表示於第12圖,且將標高之柱形圖與第1比較例及第2比較例的結果同時表示於第13圖。In the same manner as in the first embodiment, the surface of the drum was sprayed in the same manner as in the first embodiment except that the spray pressure at the time of mold production was changed to 0.3 MPa and the spray distance was changed to 450 mm. Thereafter, copper plating was used as the passivation of the uneven shape. The processing was carried out, and the plating thickness at this time was set to 8 μm, and in the same manner as in the first embodiment, a metal mold having irregularities on the surface was produced. The surface of the obtained mold had a Vickers hardness of 1,000. Using this mold, a transparent antiglare film having a laminate of a cured resin having irregularities and a TAC film on its surface was produced in the same manner as in the first embodiment. The optical characteristics, surface shape, and anti-glare property of the obtained anti-glare film are shown in Table 1 together with the production conditions of the mold. In addition, the graph of the reflection cross section of the anti-glare film and the results of the first comparative example and the second comparative example are shown in Fig. 12, and the histogram of the elevation is compared with the first comparative example and the second comparative example. The results are also shown in Figure 13.

如表1所示,由於第1比較例的正反射率R(30)超過0.2,且R(40)低於0.005%,故無法表現足夠的防眩性。由於第2比較例的正反射率R(30)低於0.04%,故白化嚴重。此外第1較例及第2比較例,亦未滿足其他本發明規定的必要條件之一部分,結果,無法兼備具有足夠的防眩性的同時為低模糊度之性能。As shown in Table 1, since the regular reflectance R (30) of the first comparative example exceeded 0.2 and R (40) was less than 0.005%, sufficient anti-glare property could not be exhibited. Since the positive reflectance R (30) of the second comparative example is less than 0.04%, whitening is severe. Further, in the first comparative example and the second comparative example, one of the necessary conditions specified by the other inventions is not satisfied, and as a result, it is not possible to have sufficient anti-glare properties and low ambiguity.

相對地,反射分布及表面形狀滿足本發明規定之第1至第4實施例之樣本,沒觀察到映入現象,白化亦少,且幾乎觀察不到閃耀,為表示有優良的防眩性能者。On the other hand, the reflection distribution and the surface shape satisfy the samples of the first to fourth embodiments of the present invention, no reflection phenomenon is observed, whitening is small, and almost no glare is observed, indicating that the antiglare property is excellent. .

[第3比較例及第4比較例][Third Comparative Example and Fourth Comparative Example]

將使用於噴擊加工之微粒子,變更為TOSOH(股)製造的氧化鋯珠子“TZ-B125”(商品名,平均顆粒直徑125 μm),且使噴擊量、噴擊壓力、噴擊距離,以及鈍化表面形狀之加工成為如表2所示,其他係以與第1實施例相同的方式,製作於表面具有凹凸之金屬模具。得到之任一模具的表面之維克氏硬度皆為1,000。使用各別的模具,以與第1實施例相同的方式,製作於表面由具有凹凸之硬化樹脂與TAC薄膜之積層體所構成之透明防眩膜。將得到之防眩膜的光學特性、表面形狀及防眩性能,與模具之製作條件同時表示於表2。在表2中,(A)係彙整模具製作條件與防眩膜的光學特性者,而(B)係彙整防眩膜的表面形狀與防眩性能者。此外,各別將防眩膜的反射分布之曲線圖表示於第14圖,且將標高之柱形圖表示於第15圖。The fine particles used for the spray processing were changed to zirconia beads "TZ-B125" (trade name, average particle diameter 125 μm) made of TOSOH (stock), and the amount of spray, the pressure of the spray, the distance of the spray, The processing of the passivated surface shape was as shown in Table 2, and other metal molds having irregularities on the surface were produced in the same manner as in the first embodiment. The surface of any of the obtained molds had a Vickers hardness of 1,000. A transparent antiglare film comprising a laminate of a cured resin having irregularities and a TAC film on the surface was produced in the same manner as in the first embodiment using a separate mold. The optical characteristics, surface shape, and anti-glare property of the obtained anti-glare film are shown in Table 2 together with the production conditions of the mold. In Table 2, (A) is a mold forming condition and an optical characteristic of the anti-glare film, and (B) is a surface shape and an anti-glare property of the anti-glare film. Further, a graph showing the reflection distribution of the anti-glare film is shown in Fig. 14, and a histogram of the elevation is shown in Fig. 15.

第3比較例及第4比較例未滿足本發明規定之必要條件,而在第3比較例中觀察到映入現象,在第4比較例中觀察到高級數之閃耀及質感的降低。The third comparative example and the fourth comparative example did not satisfy the requirements of the present invention, and a reflection phenomenon was observed in the third comparative example, and a decrease in the brilliance and texture of the high-order number was observed in the fourth comparative example.

在噴擊加工中,使用平均顆粒直徑大的微粒子時,在噴擊壓力弱,或噴擊距離遠時,雖為低模糊度,但發現變得容易產生映入之傾向。另一方面,在噴擊壓力強,或噴擊距離近時,雖具備足夠的防止映入性能,但閃耀明顯變為級數相當高,此外發現質感變差之傾向。為了得到呈現本發明規定之優良防眩性的同時為低模糊度的防眩膜,必須採用適當的模具製作條件。In the case of using a fine particle having a large average particle diameter in the blasting process, when the squirting pressure is weak or the squirting distance is long, the bluntness is low, but it is found to be likely to be reflected. On the other hand, when the spray pressure is strong or the spray distance is close, although sufficient reflection prevention performance is provided, the blaze is remarkably high in the number of stages, and the texture tends to be deteriorated. In order to obtain an anti-glare film which exhibits excellent anti-glare properties as specified in the present invention and which is low in blur, it is necessary to adopt appropriate mold making conditions.

[第5比較例及第6比較例][Fifth Comparative Example and Sixth Comparative Example]

將直徑300mm之鋁滾筒(依JIS之A5056)的表面進行鏡面研磨。於得到之鏡面研磨鋁滾筒的表面,將於第1實施例使用之相同的氧化鋯珠子“TZ-SX-17”以噴擊量8g/cm2 、噴擊壓力0.1MPa、噴擊距離450mm進行噴擊,而於表面形成凹凸。於得到之具有有凹凸之鋁滾筒以2種條件進行無電解光澤鍍鎳加工,來製作金屬模具。電鍍厚度係於電鍍結束後,使用β線膜厚測量器(商品名“FISCHERSCOPEMMS”,取自FISCHER INSTRUMENTS(股))進行實際測量。使用上述模具,以與第1實施例相同的方式,製造於表面由具有凹凸之硬化樹脂與TAC薄膜之積層膜所構成之透明的防眩膜。將得到之防眩膜的光學特性、表面形狀及防眩性能,與模具製作時之無電解鍍鎳厚度同時表示於表3。在此表中,(A)係彙整模具製作條件與防眩膜的光學特性,而(B)係彙整防眩模的表面形狀與防眩性能。又,分別將此防眩膜的反射分布表示於第16圖,且將標高的柱形圖表示於第17圖。The surface of a 300 mm diameter aluminum cylinder (according to JIS A5056) was mirror-polished. On the surface of the mirror-polished aluminum cylinder obtained, the same zirconia beads "TZ-SX-17" used in the first embodiment were sprayed at a rate of 8 g/cm 2 , a spray pressure of 0.1 MPa, and a spray distance of 450 mm. Spraying, and forming irregularities on the surface. A metal mold having a concave and convex aluminum roll obtained by electroless gloss nickel plating on two conditions was used. The plating thickness is after the plating is completed, and the beta film thickness gauge is used (trade name "FISCHERSCOPE" MMS", taken from FISCHER INSTRUMENTS, was used for actual measurement. Using the above mold, in the same manner as in the first embodiment, a transparent film made of a laminated film of a cured resin having irregularities and a TAC film was produced. The glare film, the optical characteristics, the surface shape and the anti-glare property of the obtained anti-glare film are shown in Table 3 together with the thickness of the electroless nickel plating at the time of mold production. In this table, (A) is the production condition of the mold. The optical characteristics of the anti-glare film, and (B) is the surface shape and anti-glare property of the anti-glare mold. Further, the reflection distribution of the anti-glare film is shown in Fig. 16, and the columnar view of the elevation is expressed in Figure 17.

如表3所示,由於第5比較例及第6比較例的樣本之正反射率R(30)皆超過0.2,此外,R(40)低於0.005%,故無法表現足夠的映入防止性能。此外,亦發生閃耀。As shown in Table 3, since the positive reflectances R (30) of the samples of the fifth comparative example and the sixth comparative example exceeded 0.2, and R (40) was less than 0.005%, sufficient reflection prevention performance could not be exhibited. . In addition, shine also occurs.

[第7至第12比較例][7th to 12th comparative examples]

關於使用住友化學(股)販賣之偏光板“sumikaran”為防眩層,且在紫外線硬化樹脂中分散有填充物所構成之防眩膜“AG1”、“AG3”、“AG5”、“AG6”,“AG8”、“SL6”(分別作為第7比較例至第12比較例),藉由前述手法對各別的光學特性、表面形狀及防眩性能進行評估,而將其結果表示在表4。在表4中,(A)係彙整防眩膜的光學特性者,而(B)係彙整防眩膜的表面形狀與防眩性能者。此外,分別將反射分布之曲線圖表示在第18圖,且將標高的柱形圖表示在第19圖。第18圖及第19圖中,個別的(A)係第7至第9比較例的結果,(B)係第10至第12比較例的結果。The anti-glare film "AG1", "AG3", "AG5", "AG6" formed by the polarizer "sumikaran" sold by Sumitomo Chemical Co., Ltd. is an anti-glare layer and is filled with a filler in the ultraviolet-curable resin. "AG8" and "SL6" (as the seventh comparative example to the twelfth comparative example, respectively), and the respective optical characteristics, surface shape, and anti-glare performance were evaluated by the above-described methods, and the results are shown in Table 4. . In Table 4, (A) is the optical characteristic of the anti-glare film, and (B) is the surface shape and anti-glare property of the anti-glare film. Further, a graph of the reflection distribution is shown in Fig. 18, and a histogram of the elevation is shown in Fig. 19. In Figs. 18 and 19, the individual (A) is the result of the seventh to ninth comparative examples, and the (B) is the result of the tenth to twelfth comparative examples.

如表4所示,第7至第12比較例中並無滿足本發明規定之必要條件者,結果,不存在有兼具足夠的映入防止、低模糊度、防止白化、及防止閃耀等所有條件之防眩膜。由於第7比較例及第8比較例之防眩膜的正反射率R(30)高於0.2%,R(40)低於0.005%,故無法顯示足夠的映入防止性能。此外,閃耀亦顯著。由於第9比較例及第11比較例之防眩膜的R(40)低於0.005%,故映入防止性能不足。由於第10比較例之防眩膜的R(50)高於0.0015%,故產生白化。由於第12比較例之防眩膜,在R(30)、R(40)及R(50)中雖滿足本發明之規定,但不滿足其他的必要條件,故結果未能兼備足夠的防止映入、低模糊度、防止白化、及防止閃耀等所有的條件。As shown in Table 4, in the seventh to twelfth comparative examples, those which satisfy the requirements of the present invention are not satisfied, and as a result, there is no sufficient reflection prevention, low ambiguity, prevention of whitening, and prevention of glare. Conditional anti-glare film. Since the antireflection film of the seventh comparative example and the eighth comparative example has a regular reflectance R (30) of more than 0.2% and R (40) of less than 0.005%, sufficient reflection preventing performance cannot be exhibited. In addition, the shine is also remarkable. Since the R (40) of the anti-glare film of the ninth comparative example and the eleventh comparative example is less than 0.005%, the reflection preventing performance is insufficient. Since the R (50) of the antiglare film of the tenth comparative example is higher than 0.0015%, whitening occurs. In the anti-glare film of the twelfth comparative example, although R (30), R (40), and R (50) satisfy the requirements of the present invention, they do not satisfy other necessary conditions, and as a result, they fail to have sufficient anti-reflection. All conditions such as in, low ambiguity, prevention of whitening, and prevention of glare.

依以上的結果,得知要達成本發明的標的光學特性,必須平衡地具備本發明規定之必要條件。Based on the above results, it was found that in order to achieve the optical characteristics of the target of the present invention, it is necessary to have the necessary conditions of the present invention in a balanced manner.

(產業上之可利用性)(industrial availability)

本發明之防眩膜,係既呈顯示有足夠的防止映入性能與防止反射性能,且模糊度低,又保持顯示影像之亮度,並能抑制白化及閃耀等,而具備優良的防眩性能者。此外,配置本發明的防眩膜之影像顯示裝置,具有優良的亮度與防眩性能、辨識性。The anti-glare film of the invention has the advantages of exhibiting sufficient anti-reflection performance and anti-reflection performance, low blur, maintaining the brightness of the displayed image, and suppressing whitening and glare, etc., and having excellent anti-glare performance. By. Further, the image display device in which the anti-glare film of the present invention is disposed has excellent brightness, anti-glare performance, and visibility.

對於液晶面板、電漿顯示器面板、CRT顯示器、有機EL顯示器等之各種顯示器,將本發明之防眩膜不是配置於影像顯示元件,而是配置於辨識側之方式來配置該防眩膜,如此便不會發生白化及閃耀,且可使映入影像模糊,而提供優良的辨識性。The anti-glare film of the present invention is disposed not on the image display element but also on the side of the identification side, such as a liquid crystal panel, a plasma display panel, a CRT display, or an organic EL display. Whitening and glare will not occur, and the image will be blurred, providing excellent recognition.

11...防眩膜11. . . Anti-glare film

12...薄膜法線12. . . Film normal

13...入射光線方向13. . . Incident light direction

15...正反射方向15. . . Positive reflection direction

16...任意反射方向16. . . Arbitrary reflection direction

18...包含入射光線方向與薄膜法線之面18. . . Contains the direction of incident light and the normal to the film

21...防眩膜上之任意點twenty one. . . Any point on the anti-glare film

22...防眩膜表面twenty two. . . Anti-glare film surface

23...薄膜基準面twenty three. . . Film datum

24...以防眩膜上之任意點為中心之圓朝薄膜基準面之投影圓twenty four. . . a projection circle centering on any point on the anti-glare film toward the reference plane of the film

26...凸部頂點之投影點(凡羅諾依分割的母點)26. . . Projection point of the apex of the convex part (the parent point of the ranuosie division)

27...凡羅諾依多角形27. . . Van Rooney Polygon

28...與不計算在平均值之測量視野邊界相接之凡羅諾依多角形28. . . Veronoid polygons that do not calculate the boundary of the measured field of view at the mean

30...光罩的單元體30. . . Photomask unit

31...光罩的鉻遮光圖案31. . . Chrome opaque pattern of the mask

32...光罩的開口部32. . . Opening of the mask

33...光罩33. . . Mask

35...光箱35. . . Light box

36...光源36. . . light source

37...玻璃板37. . . glass plate

39...閃耀的觀察位置39. . . Shining observation position

41...金屬基材41. . . Metal substrate

42...鍍銅或鍍鎳層42. . . Copper or nickel plating

43...研磨面43. . . Grinding surface

44...微粒子碰撞而形成之凹面44. . . Concave surface formed by collision of microparticles

45...鍍銅層45. . . Copper plating

46a...使微粒子碰撞而形成之凹凸面藉由蝕刻而鈍化之面46a. . . a surface that is formed by collision of fine particles and which is passivated by etching

46b...使微粒子碰撞而形成之凹凸面藉由鍍銅而鈍化之面46b. . . a surface that is formed by collision of fine particles and is passivated by copper plating

47...鍍鉻層47. . . Chrome plating

48...鍍鉻後殘留之凹凸面48. . . Residual surface after chrome plating

49...鍍鉻後的表面研磨時產生之平坦面49. . . Flat surface produced when chrome-plated surface is ground

θ...反射角θ. . . Reflection angle

第1圖係示意性地表示朝防眩膜之光的入射方向與反射方向之斜視圖。Fig. 1 is a perspective view schematically showing an incident direction and a reflection direction of light toward an anti-glare film.

第2圖係相對於從防眩膜的法線以30°的角度入射之光的反射光之反射角與反射率(反射率係對數刻度)的曲線圖例。Fig. 2 is a graph showing a graph of a reflection angle of reflected light and a reflectance (reflectance is a logarithmic scale) with respect to light incident at an angle of 30 from the normal line of the anti-glare film.

第3圖係將防眩膜的標高柱形圖以曲線圖表示之例。Fig. 3 is a diagram showing an example of an elevation chart of an anti-glare film in a graph.

第4圖係示意性地表示防眩膜之凸部判定的演算法之斜視圖。Fig. 4 is a perspective view schematically showing an algorithm for determining the convex portion of the anti-glare film.

第5圖係表示以防眩膜的凸部頂點為母點而進行凡羅諾依分割時的例子之凡羅諾依圖。Fig. 5 is a diagram showing a van Rooney diagram of an example in which the vertices of the convex portions of the anti-glare film are used as the mother point to perform the division of the Van Roynyi.

第6圖係表示閃耀評估用圖案的單元體之平面圖。第7圖係表示閃耀評估的狀態之剖面示意圖。Fig. 6 is a plan view showing a unit body of a pattern for blazing evaluation. Fig. 7 is a schematic cross-sectional view showing the state of the blaze evaluation.

第8圖(A)至(D)係按各個步驟表示用以製作本發明之防眩膜的模具之製造方法的剖面示意圖。Fig. 8 (A) to (D) are schematic cross-sectional views showing a method of manufacturing a mold for producing an antiglare film of the present invention in each step.

第9圖係表示鍍鉻後研磨表面的狀態之剖面示意圖。Fig. 9 is a schematic cross-sectional view showing a state in which the surface is polished after chrome plating.

第10圖係表示在第1至第3實施例得到之防眩膜的反射分布之曲線圖。Fig. 10 is a graph showing the reflection distribution of the anti-glare film obtained in the first to third embodiments.

第11圖係表示在第1至第3實施例得到之防眩膜的標高之柱形圖的曲線圖。Fig. 11 is a graph showing a histogram of the elevation of the anti-glare film obtained in the first to third embodiments.

第12圖係表示在第1至第2比較例及第4實施例得到之防眩膜的反射分布之曲線圖。Fig. 12 is a graph showing the reflection distribution of the anti-glare film obtained in the first to second comparative examples and the fourth embodiment.

第13圖係表示在第1至第2比較例及第4實施例得到的防眩膜之標高的柱形圖之曲線圖。Fig. 13 is a graph showing a histogram of the elevation of the anti-glare film obtained in the first to second comparative examples and the fourth embodiment.

第14圖係表示在第3比較例及第4比較例得到之防眩膜的反射分布之曲線圖。Fig. 14 is a graph showing the reflection distribution of the anti-glare film obtained in the third comparative example and the fourth comparative example.

第15圖係表示在第3比較例及第4比較例得到的防眩膜之標高的柱形圖之曲線圖。Fig. 15 is a graph showing a histogram of the elevation of the anti-glare film obtained in the third comparative example and the fourth comparative example.

第16圖係表示在第5比較例及第6比較例得到的防眩膜之反射分布之曲線圖。Fig. 16 is a graph showing the reflection distribution of the anti-glare film obtained in the fifth comparative example and the sixth comparative example.

第17圖係表示在第5比較例及第6比較例得到的防眩膜之標高的柱形圖之曲線圖。Fig. 17 is a graph showing a histogram of the elevation of the anti-glare film obtained in the fifth comparative example and the sixth comparative example.

第18圖(A)及(B)係表示有關第7至第12比較例的防眩膜之標高柱形圖之曲線圖。Fig. 18 (A) and (B) are graphs showing the elevation histograms of the anti-glare films of the seventh to twelfth comparative examples.

第19圖(A)及(B)係表示有關第7至第12比較例的防眩膜之反射分布的曲線圖。Fig. 19 (A) and (B) are graphs showing the reflection distribution of the anti-glare film of the seventh to twelfth comparative examples.

41...金屬基材41. . . Metal substrate

42...鍍銅或鍍鎳層42. . . Copper or nickel plating

43...研磨面43. . . Grinding surface

44...微粒子碰撞而形成之凹面44. . . Concave surface formed by collision of microparticles

45...鍍銅層45. . . Copper plating

46a...使微粒子碰撞而形成之凹凸面藉由蝕刻而鈍化之面46a. . . a surface that is formed by collision of fine particles and which is passivated by etching

46b...使微粒子碰撞而形成之凹凸面藉由鍍銅而鈍化之面46b. . . a surface that is formed by collision of fine particles and is passivated by copper plating

47...鍍鉻層47. . . Chrome plating

48...鍍鉻後殘留之凹凸面48. . . Residual surface after chrome plating

Claims (14)

一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且對於以入射角30°入射之光,將反射角35°的方向之反射率設為R(35),且R(35)/R(30)的值為0.4以上0.8以下。 An anti-glare film is formed by forming fine irregularities on a surface thereof, and is characterized in that a reflectance R (30) having a reflection angle of 30° is 0.04% or more and 0.2% or less, and a reflection angle, for light incident at an incident angle of 30°. The reflectance R (40) at 40° is 0.005% or more and 0.02% or less, the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and the reflection angle is 35° for light incident at an incident angle of 30°. The reflectance in the direction is R (35), and the value of R (35) / R (30) is 0.4 or more and 0.8 or less. 一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且將該防眩膜從形成有前述凹凸之表面切斷之任意的剖面曲線之算術平均高度Pa為0.09μm以上0.21μm以下。 An anti-glare film is formed by forming fine irregularities on a surface thereof, and is characterized in that a reflectance R (30) having a reflection angle of 30° is 0.04% or more and 0.2% or less, and a reflection angle, for light incident at an incident angle of 30°. The reflectance R (40) at 40° is 0.005% or more and 0.02% or less, and the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and the anti-glare film is cut off from the surface on which the unevenness is formed. The arithmetic mean height Pa of the cross-sectional curve is 0.09 μm or more and 0.21 μm or less. 一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且將該防眩膜從形成有前述凹凸之表面切斷之任意的剖面曲線之最大剖面高度Pt為0.5μm以上1.2μm以下。 An anti-glare film is formed by forming fine irregularities on a surface thereof, and is characterized in that a reflectance R (30) having a reflection angle of 30° is 0.04% or more and 0.2% or less, and a reflection angle, for light incident at an incident angle of 30°. The reflectance R (40) at 40° is 0.005% or more and 0.02% or less, and the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and the anti-glare film is cut off from the surface on which the unevenness is formed. The maximum profile height Pt of the profile curve is 0.5 μm or more and 1.2 μm or less. 一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率 R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且將該防眩膜從形成有前述凹凸之表面切斷之任意的剖面曲線之平均長度PSm為12μm以上20μm以下。 An anti-glare film is formed by forming fine irregularities on a surface, and is characterized by: a reflection angle of 30° with respect to light incident at an incident angle of 30° R (30) is 0.04% or more and 0.2% or less, the reflectance R (40) at a reflection angle of 40° is 0.005% or more and 0.02% or less, and the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and The average length PSm of the arbitrary cross-sectional curve cut by the anti-glare film from the surface on which the unevenness is formed is 12 μm or more and 20 μm or less. 一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且以顯示高度分布及高度/最大標高之柱形圖來表示該防眩膜之形成有前述凹凸之表面之各點的標高時,柱形圖的峰值位於以最高點(高度100%)與最低點(高度0%)之中間點(50%)為中心之±10%以內的範圍。 An anti-glare film is formed by forming fine irregularities on a surface thereof, and is characterized in that a reflectance R (30) having a reflection angle of 30° is 0.04% or more and 0.2% or less, and a reflection angle, for light incident at an incident angle of 30°. The reflectance R (40) at 40° is 0.005% or more and 0.02% or less, and the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and is represented by a histogram showing a height distribution and a height/maximum elevation. When the anti-glare film is formed with the elevation of each point of the surface of the concavity and convexity, the peak of the histogram is centered at the middle point (50%) of the highest point (height 100%) and the lowest point (height 0%). Within 10% range. 一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50)為0.0015%以下,並且在該防眩膜之200μm×200μm之區域內具有150個以上350個以下之凸部。 An anti-glare film is formed by forming fine irregularities on a surface thereof, and is characterized in that a reflectance R (30) having a reflection angle of 30° is 0.04% or more and 0.2% or less, and a reflection angle, for light incident at an incident angle of 30°. The reflectance R (40) at 40° is 0.005% or more and 0.02% or less, the reflectance R (50) at a reflection angle of 50° is 0.0015% or less, and 150 or more in the region of 200 μm × 200 μm of the anti-glare film. More than 350 convex parts. 一種防眩膜,係於表面形成細微的凹凸所構成,其特徵為:對於以入射角30°入射之光,反射角30°之反射率R(30)為0.04%以上0.2%以下,反射角40°之反射率R(40)為0.005%以上0.02%以下,反射角50°之反射率R(50) 為0.0015%以下,並且以該防眩膜之前述表面上形成之凹凸的凸部之頂點為母點而對其表面進行凡羅諾依(Voronoi)分割時所形成之多角形的平均面積為100μm2 以上300μm2 以下。An anti-glare film is formed by forming fine irregularities on a surface thereof, and is characterized in that a reflectance R (30) having a reflection angle of 30° is 0.04% or more and 0.2% or less, and a reflection angle, for light incident at an incident angle of 30°. The reflectance R (40) at 40° is 0.005% or more and 0.02% or less, and the reflectance R(50) at a reflection angle of 50° is 0.0015% or less, and the convex portion of the uneven surface formed on the surface of the anti-glare film is used. The average area of the polygon formed when the vertex is a mother point and the surface is subjected to Veronoi division is 100 μm 2 or more and 300 μm 2 or less. 如申請專利範圍第1項至第7項中任一項之防眩膜,其中,該防眩膜對垂直入射光之模糊度為3%以上20%以下。 The anti-glare film according to any one of claims 1 to 7, wherein the anti-glare film has a ambiguity of 3% or more and 20% or less with respect to normal incident light. 如申請專利範圍第1項至第7項中任一項之防眩膜,其中,該防眩膜使用暗部與亮部之寬度為0.5mm、1.0mm及2.0mm之3種光梳以光的入射角45°測量之反射鮮明度的和為30%以下。 The anti-glare film according to any one of the items 1 to 7, wherein the anti-glare film is made of three kinds of optical combs having a width of 0.5 mm, 1.0 mm, and 2.0 mm in a dark portion and a bright portion. The sum of the reflection sharpness measured at an incident angle of 45° was 30% or less. 如申請專利範圍第8項之防眩膜,其中,該防眩膜使用暗部與亮部之寬度為0.5mm、1.0mm及2.0mm之3種光梳以光的入射角45°測量之反射鮮明度的和為30%以下。 The anti-glare film of the eighth aspect of the patent application, wherein the anti-glare film uses three kinds of optical combs having a width of 0.5 mm, 1.0 mm, and 2.0 mm in a dark portion and a bright portion, and the reflection is measured at an incident angle of 45° of light. The sum of degrees is less than 30%. 一種影像顯示裝置,係具備申請專利範圍第1項至第7項中任一項之防眩膜以及影像顯示元件,而該防眩膜係配置在影像顯示元件之目視確認側。 An image display device comprising the anti-glare film and the image display element according to any one of claims 1 to 7, wherein the anti-glare film is disposed on a visual confirmation side of the image display element. 一種影像顯示裝置,係具備申請專利範圍第8項之防眩膜以及影像顯示元件,而該防眩膜係配置在影像顯示元件之目視確認側。 An image display device comprising an anti-glare film and an image display element according to claim 8 of the patent application, wherein the anti-glare film is disposed on a visual confirmation side of the image display element. 一種影像顯示裝置,係具備申請專利範圍第9項之防眩膜以及影像顯示元件,而該防眩膜係配置在影像顯示元件之目視確認側。 An image display device comprising an anti-glare film and an image display element according to claim 9 of the patent scope, wherein the anti-glare film is disposed on a visual confirmation side of the image display element. 一種影像顯示裝置,係具備申請專利範圍第10項之防眩膜以及影像顯示元件,而該防眩膜係配置在影像顯示元件之目視確認側。An image display device comprising an anti-glare film and an image display element of claim 10, wherein the anti-glare film is disposed on a visual confirmation side of the image display element.
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